JP2013021938A - Mist sprinkling apparatus in plant factory - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an environment adjusting apparatus capable of controlling environment conditions such as temperature and humidity in a plant factory.SOLUTION: This environment adjusting apparatus is obtained by installing a cultivation shelf 2 formed in a multi-stage in a cultivation chamber 1, and arranging each a spray nozzle 3 sprinkling mist on the upper side of each stage, and a water tank 4 flooding nutritious liquid a at a fixed water level on the lower side. The spray nozzle 3 is connected to a spray device 6 through a spray tube 5.

Description

  The present invention sprays mist that has been made fine from several microns to several tens of microns from the spray nozzle spray hole into a cultivation facility, and effectively controls environmental conditions such as temperature and humidity in a closed space without ventilation. The present invention relates to a mist spraying device for a plant factory.

  In a closed space where the environment can be adjusted, the plant factory artificially controls the growth environment that affects plant growth, such as light, temperature, humidity, carbon dioxide concentration, illuminance, nutrient solution concentration, and pH. Compared to outdoor cultivation, there is an advantage that high quality pesticide-free vegetables can be cultivated stably throughout the year without being affected by the natural environment such as bad weather and pest damage.

Further, in order to maximize the growth ability of plants, it is necessary to increase the photosynthesis rate, and it is known that this photosynthesis rate depends on light conditions, temperature, humidity, carbon dioxide concentration, and the like.
Therefore, in order to grow plants efficiently and satisfactorily, environmental control equipment such as a ventilator and a carbon dioxide supply device is deployed, and ventilation, temperature control, humidity control, and other environmental conditions that are optimal for the growth of cultivated plants Must be managed centrally and the light conditions, temperature, humidity, carbon dioxide concentration, etc. must be finely controlled. However, if a ventilation device is installed in a plant factory and the inside of the cultivation room is ventilated, the inside air escapes to the outside and the carbon dioxide concentration controlled optimally decreases.

  Therefore, in patent document 1, as shown in FIG. 3, the partition cover 14 made from a transparent material is provided on the cultivation stand 13 provided with the artificial lighting equipment 12 in the upper part of the plant factory 11, and the whole environment in the plant factory 11 is provided. Instead, a method has been proposed in which only the environment in the cover 14 is made to have a high-concentration CO2 atmosphere to promote the growth of the plant 15.

  Although not shown in the figure, a pipe for supplying cold or warm air having an appropriate humidity from the air conditioner and CO2 gas from the CO2 supply device is connected to the cover 14, and cultivation is performed in the cover 14. The optimum environment of the plant 15 is maintained. Thereby, the energy required for maintaining the environment can be minimized, and the work space above the partition cover 14 can be ventilated, so that a better environment for the worker can be maintained.

  However, when such a partition cover 14 is provided, it takes time to install and remove the partition cover 14 and the work efficiency is greatly reduced. In addition, many sensors are required to finely control the plant growth environment, but the sensors interfere with work during planting and harvesting, so they can be temporarily removed or searched for the optimal measurement location. Increase the number or change the location. Therefore, if there is such a partition cover 14, the number of sensors cannot be changed or moved easily.

JP-A-6-30660

  The problems to be solved are as described above, and the present invention has been made for the purpose of providing an environmental adjusting device capable of effectively controlling environmental conditions such as temperature and humidity in a plant factory.

  Therefore, the present invention has the main feature of arranging a spray nozzle in the cultivation facility and controlling the temperature and humidity in the cultivation facility without spraying mist from the spray nozzle and ventilating.

  This invention arrange | positions a spray nozzle in cultivation facility, controls the temperature and humidity in a cultivation facility, without spraying mist from this spray nozzle and ventilating. Therefore, even if the temperature and humidity are controlled, the air inside does not escape to the outside, so the carbon dioxide concentration in the cultivation facility can always be kept constant.

It is a block diagram of the mist spraying apparatus of the plant factory which implemented this invention. It is a block diagram of a spray apparatus. It is explanatory drawing of the conventional plant factory.

  Embodiments of the present invention will be described below.

In FIG. 1, the block diagram of the mist spraying apparatus of the plant factory which implemented this invention is shown.
The plant factory mist spraying device has a cultivation shelf 2 formed in multiple stages in the cultivation room 1, spray nozzles 3 spraying the mist above each stage, and spraying the nutrient solution a at a constant water level below. The water tank 4 to be arranged is arranged respectively. The spray nozzle 3 is connected to a spray device 6 via a spray tube 5.

  The nutrient solution a is branched by a three-way valve V via a filter tank F that removes impurities from the tank T by a pump P, and one is cooled by a heat exchanger 7 and supplied to a spray device 6. The other is supplied from the three-way valve V to the water tank 4 positioned at the uppermost stage, then sequentially supplied to the lower water tank 4 through the left and right drainage pipes 8, and finally through the drainage pipe 8 of the water tank 4 positioned at the lowermost stage. To reflux.

  The nutrient solution a that has been refluxed to the tank T is again supplied to the water tank 4 of each stage by the pump P. As a result, the nutrient solution a is evenly distributed to all the aquariums 4, and uniform vegetables without uneven growth are grown.

  The drain pipe 8 has an inlet portion set at a predetermined height from the bottom of the water tank 4 so that the water level of the nutrient solution a can be kept constant. The nutrient solution a is circulated continuously or intermittently by the pump P in this way, so that the amount of dissolved oxygen in the nutrient solution is increased and the respiratory action of the roots can be sufficiently performed. Further, a part of the nutrient solution a is cooled by the heat exchanger 7 and supplied to the spray device 6, and is sprayed from the spray nozzle 3 above the cultivation shelf 2 in the form of a mist. Thereby, the temperature of the semi-closed space above the cultivation shelf 2 can be controlled without ventilation. Therefore, the carbon dioxide concentration does not decrease due to ventilation.

  As shown in FIG. 2, the spray device 6 includes a compressor 61, a liquid tank 62, and a regulator 63, and the spray nozzle 3 is attached to the tip of the spray tube 5. The spray pipe 5 is composed of an air feed pipe 51 and a liquid feed pipe 52, and the liquid tank 62 is filled with the nutrient solution a supplied from the tank T of the cultivation room 1. The spray device 6 may be a combination of ultrasonic vibration or plasma discharge and a blower in addition to such a spray type.

  With the above configuration, the pressure of the compressed air from the compressor 61 is adjusted by the regulator 63 to pressurize the liquid tank 62 having a sealed structure. As a result, a certain amount of nutrient solution a is pumped through the liquid feed pipe 52 to the spray nozzle 3. Since the compressed air of the compressor 61 is also supplied to the spray nozzle 3 via the air feed pipe 51, the compressed air is jet-jetted from the tip of the spray nozzle 3, and the nutrient solution a fed under pressure through the liquid feed pipe 52 is misted. Spray.

  The sprayed mist evaporates on the surface of the plant on the cultivation shelf 2 or in the vicinity thereof, and takes away latent heat of evaporation from the plant. As a result, the temperature of the plant can be temporarily reduced. At the same time, it prevents the photosynthesis rate from decreasing at high temperatures. The reason is described below.

  When plants become hot, the water vapor tension in the leaves increases and the transpiration rate increases. For this reason, the pores are closed to prevent moisture from evaporating, but this prevents a large amount of carbon dioxide necessary for photosynthesis from being taken in from the pores. As a result, the photosynthetic rate decreases even if the light amount and the carbon dioxide gas concentration are sufficient. However, even if the temperature rises and the leaf water vapor tension increases, the humidity in the atmosphere increases when mist is sprayed. If the humidity of the atmosphere is high and there is not much difference in relative humidity, the transpiration rate does not change much. Accordingly, the pores remain open, and a large amount of carbon dioxide can be taken in, thereby preventing a decrease in the photosynthesis rate. Thus, in order to enhance photosynthesis, it is necessary to increase the opening of the pores, thin the foliar boundary layer, reduce the diffusion resistance, and facilitate the incorporation of CO2 into the pores. It is necessary to maintain a moderate humidity.

DESCRIPTION OF SYMBOLS 1 Cultivation room 2 Cultivation shelf 3 Spray nozzle 4 Water tank 5 Spray pipe 51 Pneumatic feed pipe 52 Liquid feed pipe 6 Spray apparatus 61 Compressor 62 Liquid tank 63 Regulator 7 Heat exchanger 8 Drain pipe 11 Plant factory 12 Artificial lighting equipment 13 Grow 14 Partition cover 15 Plant F Filter tank P Pump T Tank V Three-way valve a Nutrient solution

Claims (3)

Place a spray nozzle in the cultivation facility,
A plant factory mist spraying device that controls the temperature and humidity in a cultivation facility without spraying mist from the spray nozzle and ventilating.   2. The mist spraying device for a plant factory according to claim 1, wherein the mist is a mist of a nutrient solution submerged by a water tank in a cultivation facility. Install a heat exchanger in the path to mist the nutrient solution,
The plant factory mist spraying apparatus according to claim 2, wherein the nutrient solution is cooled by the heat exchanger.

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