JP2013015644A - Method for manufacturing color filter and color filter - Google Patents

Abstract

A color filter manufacturing method for forming a frame pattern, an alignment mark, and the like arranged in a cross scan direction together with an image display unit pattern by a continuous exposure method.
The exposure light emitted from the exposure light source is selectively exposed on the exposure substrate by a blind shutter with a mask pattern of the exposure mask while continuously moving the rectangular exposure substrate. The alignment mark, the frame pattern, and the like are exposed by static exposure, and the image display portion pattern is exposed by scan exposure, and the color filter pattern is transferred to the substrate to be exposed.
[Selection] Figure 4

Description

  The present invention relates to a color filter for a display device, and more particularly, to a color filter manufacturing method and a color filter that are formed by transferring a pattern to a substrate to be exposed.

  Conventionally, in a photolithography process in manufacturing a color filter used in a display device such as a color liquid crystal display device, a method of performing batch exposure using an original exposure mask has been adopted. However, with the recent increase in the size of display devices, there has been a problem that the exposure mask of the collective exposure method becomes large and the cost for making it becomes enormous.

  To solve this problem, scan exposure uses an exposure machine equipped with multiple exposure heads equipped with small exposure masks, and repeats the pattern repeatedly by performing exposure while scanning each exposure head. A small mask continuous exposure method has been developed.

  In addition, this small mask continuous exposure method and an image detection unit are combined, and an EGIS (Exposure system Guided by Image Sensor) exposure method that controls the exposure position while reading the pattern of the first layer on the substrate in real time by the image detection unit. Has been developed. (For example, see Patent Documents 1 to 7)

JP 2006-292955 A JP 2006-330622 A JP 2007-41447 A JP 2008-9083 A JP 2008-99158 A JP 2010-256684 A International Publication No. 2009/145032

  However, in a continuous exposure method such as a small mask continuous exposure method, when a mercury light source is used as an exposure light source, only a stripe pattern parallel to the scanning direction of the exposure head, that is, the scanning direction can be transferred. Further, even when a blinking light source such as a YAG laser is used, basically, the same pattern can be repeatedly formed, and a repeated dot pattern of the display part pattern of the color filter can only be transferred.

  That is, the conventional continuous exposure method has the disadvantage that it is difficult to form dummy patterns and alignment marks arranged in the cross scan direction orthogonal to the scan direction.

  Therefore, conventionally, as a pattern of the first layer on the substrate to be exposed, an alignment mark or the like in the cross scan direction is formed in advance together with a black matrix (BM) in the conventional method, and the pattern of this first layer is detected by the image. The pattern after the second layer was formed by the EGIS exposure method while reading by the unit.

  An object of the present invention is to provide a color filter for forming side patterns such as dummy patterns and alignment marks arranged in a cross-scan direction orthogonal to a moving direction together with an image display portion pattern while continuously moving a substrate to be exposed. It is to provide a manufacturing method.

  The present invention employs the following configuration in order to solve the above problems.

  The method for manufacturing a color filter according to the present invention includes exposing a mask from exposure light emitted from an exposure light source through an exposure head including an exposure mask and a blind shutter while continuously moving a rectangular substrate to be exposed. Using an exposure apparatus that exposes the mask pattern on the substrate to be exposed, the image display unit pattern and two image display unit patterns arranged in the front and rear of the moving direction and extending in a direction perpendicular to the moving direction A color filter manufacturing method for continuously exposing a color filter pattern including a side pattern onto an exposed substrate, wherein the exposure substrate is stationary and the front side pattern is exposed. And a second exposure step for scanning exposure of the display pattern while moving the exposed substrate, and exposing the rear side pattern by stopping the exposed substrate. And a third exposure step that.

  The exposure mask has a front mask region, a center mask region, and a rear mask region as regions where mask patterns for exposing the front side pattern, the display pattern, and the rear side pattern, respectively, are formed. In the first exposure step, the front mask region is translucent, and other regions are shielded by the blind shutter, and in the second exposure step, the central mask region is translucent, The area is shielded by the blind shutter, and in the third exposure step, the rear mask area is transparent, and the other areas are shielded by the blind shutter.

  In addition, the first exposure step and the third exposure step are performed simultaneously. In this case, the front mask region and the rear mask region are transparent, and the central mask region is shielded by a blind shutter.

  In addition, the exposure apparatus has at least two rows in front and rear, which are arranged in parallel so as to cover the width of the exposed region on the substrate to be exposed, with the end portions of a predetermined length overlapped and shifted in the front and rear in the moving direction. The distance between the front and back of the exposure heads in each row is the same as the pitch distance of the continuous color filter pattern exposed on the substrate to be exposed or an integral multiple of the pitch distance. .

  The exposure light source is a blinking light source or a continuous light source.

  And the color filter concerning this invention is manufactured by the manufacturing method of the color filter in any one of the above-mentioned.

  According to the present invention, since it has the above-described features, the following can be achieved.

  That is, while continuously moving the rectangular substrate to be exposed, the exposure light irradiated from the exposure light source is exposed to the mask pattern of the exposure mask on the substrate to be exposed through an exposure head including an exposure mask and a blind shutter. A color filter pattern comprising an image display portion pattern and two side patterns arranged in a front portion and a rear portion in the moving direction of the image display portion pattern and extending in a direction orthogonal to the moving direction using an exposure apparatus that performs exposure Is a method of manufacturing a color filter that continuously exposes a substrate to be exposed, a first exposure step in which the substrate to be exposed is stationary and the front side pattern is exposed, and the substrate to be exposed is moved A second exposure step of scanning and exposing the display pattern; and a third exposure step of exposing the rear side pattern by stopping the exposed substrate. In, even while moving continuously exposed substrate, with the image display unit pattern, it is possible to expose the two side pattern in the shape extending in a direction perpendicular to the moving direction.

  The exposure mask has a front mask region, a center mask region, and a rear mask region as regions where mask patterns for exposing the front side pattern, the display pattern, and the rear side pattern, respectively, are formed. In the first exposure step, the front mask region is translucent, and other regions are shielded by the blind shutter, and in the second exposure step, the central mask region is translucent, The area is shielded by the blind shutter, and in the third exposure step, the rear mask area is transparent and the other areas are shielded by the blind shutter, so it is possible to expose three patterns with only one exposure mask. It becomes.

  Further, the first exposure step and the third exposure step are performed simultaneously. In this case, the front mask region and the rear mask region are transparent, and the central mask region is shielded by the blind shutter, so that they are adjacent to each other. The left side pattern and the right side pattern of the color filter pattern can be simultaneously formed using two mask patterns on the same exposure mask, and the distance between each other can be formed with high accuracy and separately. It can be formed in half the exposure time.

  In addition, the exposure apparatus has at least two rows in front and rear, which are arranged in parallel so as to cover the width of the exposed region on the substrate to be exposed, with the end portions of a predetermined length overlapped and shifted in the front and rear in the moving direction. The distance between the front and back of the exposure heads in each row is the same as the pitch distance of the continuous color filter pattern exposed on the substrate to be exposed or an integral multiple of the pitch distance. As a result, the exposure heads in each row can be simultaneously put together for static exposure or scan exposure.

  Further, since the exposure light source is a blinking light source such as a YAG laser or a continuous light source such as a high-pressure mercury lamp, it is possible to cope with both static exposure and scan exposure.

  And since the color filter concerning this invention is manufactured by the manufacturing method of the color filter in any one of the above-mentioned, while moving a to-be-exposed board | substrate continuously, it is a moving direction with an image display part pattern. It is possible to obtain a color filter having two side patterns extending in orthogonal directions.

The figure which looked at the color filter pattern concerning this embodiment from the upper part FIG. 2A is a schematic configuration diagram when the exposure apparatus is viewed from above, and FIG. 2B is a schematic cross-sectional view showing the configuration of the main part of the exposure apparatus according to the present embodiment. The figure which looked at the mask pattern of the exposure mask concerning this embodiment from the upper part FIG. 4A is a schematic configuration diagram when the exposure apparatus is viewed from above, and FIG. 4B is a schematic cross-sectional view showing the configuration of the main part of the exposure apparatus according to the present embodiment. FIG. 5A is a schematic configuration diagram when the exposure apparatus is viewed from above, and FIG. 5B is a schematic cross-sectional view showing the configuration of the main part of the exposure apparatus according to the present embodiment. FIG. 6A is a schematic configuration diagram when the exposure apparatus is viewed from above, and FIG. 6B is an upper view of the substrate to be exposed. Viewed from FIG. 7A is a schematic configuration diagram when the exposure apparatus is viewed from above, and FIG. 7B is an upper view of the substrate to be exposed. Viewed from FIG. 8A is a schematic configuration diagram when the exposure apparatus is viewed from above, and FIG. 8B is an upper view of the substrate to be exposed. Viewed from 9A and 9B show a main part of the exposure apparatus and the substrate to be exposed according to the present embodiment, and FIG. 9A is a schematic configuration diagram when the exposure apparatus is viewed from above, and FIG. Viewed from FIG. 10A is a schematic configuration diagram when the exposure apparatus is viewed from above, and FIG. 10B is an upper view of the substrate to be exposed. Viewed from FIG. 11A is a schematic configuration diagram when the exposure apparatus is viewed from above, and FIG. 11B is an upper view of the substrate to be exposed. Viewed from The figure which looked at the principal part of the exposure apparatus concerning this embodiment, and a to-be-exposed board | substrate from the upper direction The figure which looked at the principal part of the exposure apparatus concerning this embodiment, and a to-be-exposed board | substrate from the upper direction The figure which looked at the principal part of the exposure apparatus concerning this embodiment, and a to-be-exposed board | substrate from the upper direction The figure which looked at the principal part of the exposure apparatus concerning this embodiment, and a to-be-exposed board | substrate from the upper direction The figure which looked at the principal part of the exposure apparatus concerning this embodiment, and a to-be-exposed board | substrate from the upper direction The figure which looked at the principal part of the exposure apparatus concerning this embodiment, and a to-be-exposed board | substrate from the upper direction The figure which looked at the principal part of the exposure apparatus concerning this embodiment, and a to-be-exposed board | substrate from the upper direction The figure which looked at the principal part of the exposure apparatus concerning this embodiment, and a to-be-exposed board | substrate from the upper direction The figure which looked at the principal part of the exposure apparatus concerning this embodiment, and a to-be-exposed board | substrate from the upper direction

  Before describing embodiments of the present invention in detail, an outline of a color filter manufacturing method of the present invention will be described.

  In the manufacturing method of the present embodiment, an EGIS exposure machine equipped with an exposure stage for transporting the substrate to be exposed and a YAG laser as a light source is used. A rectangular glass substrate coated with a photosensitive resist is used as the substrate to be exposed. By repeating the process of repeatedly transferring the pattern parallel to the scan direction by the scan exposure and the process of stopping the scan operation and performing the pattern transfer in the cross scan direction by the static exposure, a predetermined color filter pattern is applied to the substrate to be exposed. Transferred to a photosensitive resist.

  After transferring the predetermined color filter pattern onto the substrate to be exposed, development was performed by a method similar to a known color filter manufacturing method, and a pattern made of a cured photosensitive resist was formed on the substrate by oven baking.

Here, in the formation of the first layer such as BM, the exposure apparatus determines the exposure start position and the exposure end position by reading movement information of the substrate to be exposed, and the substrate to be exposed with respect to the exposure head. Exposure is performed by mechanically controlling the position.
At this time, side patterns such as an alignment mark, a dummy pattern, and a frame pattern in the cross-scan direction are also transferred as the first layer pattern along with the BM.

In the formation of the second and subsequent layers, the pattern of the first layer is read by the image detection unit to determine the exposure start position and the exposure end position. Exposure is performed by controlling the position of the exposure head so as to follow this shift.
At this time, a dot pattern is formed in the image display area, and a dummy pattern in the cross-scan direction and a side pattern of the accessory mark are transferred, stacked, or supplemented.

In the manufacturing apparatus of this embodiment, a light shielding device having a blind shutter (light shielding blade) for shielding exposure light is disposed between the light source and the exposure mask. A predetermined pattern is transferred to the substrate to be exposed by selectively transmitting a predetermined mask region of the exposure mask so that a part of the exposure mask is shielded by the blind shutter and the other part is transmitted. .
In the present embodiment, each mask pattern for performing the scan exposure and the static exposure described above is formed on the same exposure mask.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

First, the color filter pattern 100 formed by the manufacturing method of this embodiment will be described.
FIG. 1 is a diagram of a color filter pattern 100 formed on a transparent substrate (substrate to be exposed) such as a glass substrate, as viewed from above, in the manufacturing method of the present embodiment. The color filter pattern 100 has a horizontally elongated image display part pattern 101 at the center, a right part pattern 102 on the right side, and a left part pattern 103 on the left side. The image display unit pattern 101 is an area where an image is displayed when the display device is used. The right side pattern 102 is provided with a right side dummy pattern or frame pattern 102a adjacent to the image display part pattern 101 on the inner side, and a right side alignment mark 102b on the outer side thereof. A dummy pattern or frame pattern 103a and a left alignment mark 103b are provided.

The right side pattern 102b and the left side pattern 103b are used for alignment when assembled as a display device.
As will be described later, the scanning direction in the present embodiment is the horizontal direction from the right side to the left side of the color filter pattern 100, and the patterns of the right side pattern 102 and the left side pattern 103 are perpendicular to the scanning direction. It is arranged in the direction of the cross scan direction.

(A. Still exposure)
In the present embodiment, the pattern arranged in the cross scan direction is formed by static exposure. First, the formation of the dummy pattern or frame pattern 102a and the alignment mark 102b provided on the right side pattern 102 of the color filter pattern 100 will be described.

  2A and 2B show the configuration of the main part of the exposure apparatus according to the present embodiment. FIG. 2A is a schematic block diagram when the exposure apparatus is viewed from above, and shows an exposure head 1 provided with an exposure mask 2 and a blind shutter 3. FIG. 2B is a schematic sectional view showing an exposure head 1 including an optical system for exposure. In FIG. 2B, a light beam emitted from a light source (not shown) becomes parallel light through a fly-eye lens (not shown), a condenser lens 5 and the like, and is irradiated as exposure light 4. The exposure light 4 is irradiated onto the exposure head 1, and the light-transmitted pattern is transferred to the photosensitive resist on the exposed substrate 6.

A mask pattern formed on the exposure mask 2 is shown in FIG. The exposure mask 2 has three regions: a central mask region 7 (central mask region), a left mask region 8 (front mask region) on the left side, and a right mask region 9 (rear mask region) on the right side. The first mask pattern 11 in the central mask area 7 corresponds to the image display area 101 of the color filter pattern 100.
The second mask pattern 12 in the left mask region 8 corresponds to the right side pattern 102 of the color filter pattern 100, and includes a second dummy or frame mask pattern 12a and a second alignment mark mask pattern 12b. The third mask pattern 13 in the right mask region 9 corresponds to the left side pattern 103 of the color filter pattern 100, and includes a third dummy or frame mask pattern 13a and a third alignment mark mask pattern 13b.

  As shown in FIGS. 2 (a) and 2 (b), the blind shutter 3 is composed of a plurality of light shielding plates 3a stacked one above the other. Each light shielding plate 3a is configured to be slidable in the scanning direction. By moving the light shielding plate 3a to expand and gather, all or one of the central mask region 7, the left mask region 8 and the right mask region 9 of the exposure mask 2 is collected. The portion is selectively shielded from light.

  In this step, in FIGS. 2A and 2B, the exposure light 4 is shielded from the central mask region 7 and the right mask region 9 by the blind shutter 3, and only the left mask region 8 is irradiated. The second mask pattern 12 on the left mask region irradiated with the exposure light 4 is transferred onto the stationary substrate 6 to be stationary, and the right side pattern 102 of the color filter pattern 100 is first exposed.

  Thus, since the pattern was formed on the exposed substrate 6 by the static exposure using the second mask pattern 12 of the exposure mask 2, a pattern in the cross scan direction can be formed.

  Next, with reference to FIGS. 4A and 4B, a process of simultaneously forming the pattern of the right side region 102 and the left side region 103 of the color filter pattern 100 by static exposure will be described. This is a process used when a plurality of color filter patterns 100 shown in FIG. 10 to be described later are arranged on the exposed substrate 6 in the scanning direction.

  As shown in FIGS. 4 (a) and 4 (b), the blind mask 3 shields the central mask area 7 of the exposure mask 2 and transmits the other areas so that the left mask area 8 and the right mask area. 9 is irradiated. Then, the second mask pattern 12 on the left mask region 8 and the third mask pattern 13 on the right mask region 9 are transferred onto the stationary substrate 6 to be exposed.

  As described above, since the pattern is formed on the exposed substrate 6 by the static exposure using the second mask pattern 12 and the third mask pattern 13 of the exposure mask 2, it is possible to form a pattern in the cross scan direction. It became.

  The formation of the left side pattern 103 and the right side pattern 102 of the adjacent color filter pattern 100 are simultaneously formed using the second mask pattern 12 and the third mask pattern 13 on the same exposure mask 2. It became possible. Then, it is possible to form the distance between the second mask pattern 12 and the third mask pattern 13 with high accuracy and in half the exposure time compared to the case where they are separately formed.

  When the last one of the continuous color filter patterns 100 is transferred in the vicinity of the left end of the substrate 6 to be exposed, the blind mask 3 shields the central mask region 7 and the left mask region of the exposure mask 2 from each other. Then, only the right mask region 9 is irradiated. Then, only the third mask pattern 13 on the right mask region 9 is transferred onto the stationary substrate 6 to be exposed.

(B. Scan exposure)
In the present embodiment, the image display unit pattern 101 of the color filter pattern 100 arranged in the scan direction is transferred by scan exposure.

  As shown in FIGS. 5A and 5B, the left mask region 8 and the right mask region 9 of the exposure mask 2 are shielded by the blind shutter 3, and only the central mask region 7 is irradiated. In addition, in the X direction indicated by the arrow on the lower side of FIG. 5B, the substrate 6 to be exposed is conveyed rightward by an exposure stage or a levitation conveyance unit (not shown) in accordance with scan exposure. In this way, the first mask pattern 11 provided in the central mask region 7 is transferred to the photosensitive resist on the exposed substrate 6 by continuous (scan) exposure using a repetitive pattern which is a conventional exposure method.

  In the vicinity of the scan exposure start position and the scan exposure end position, the exposure amount of the photosensitive resist on the exposed substrate 6 is adjusted by the blind shutter 3 so as to be the same as the other repeated pattern exposure areas. Details thereof will be described later.

(C. Pattern transfer by repeated scanning exposure and static exposure)
Next, a method for transferring the color filter pattern 100 by combining the scan exposure and the static exposure described above will be described with reference to FIGS. The structure of the main part of the exposure apparatus is the same as that shown in FIG. 2 and the like, but the sectional view is omitted. In this embodiment, the color filter patterns 100 are continuously formed at predetermined intervals by transferring the color filter patterns 100 side by side using the single exposure mask 2.

(C-1. Pattern transfer by still exposure (first group pattern))
The pattern transfer at the beginning of the formation of the first group of patterns of the present embodiment will be described with reference to FIGS. Here, FIG. 6A shows an arrangement configuration view of the exposure mask 2, the blind shutter 3, and the substrate to be exposed 6 when exposed from the top, and FIG. 6B is transferred by the exposure in this step. The exposure pattern on the exposed substrate 6 is shown.

  In this step, an exposure pattern similar to that described in FIG. 2 is formed on the substrate 6 to be exposed. That is, as shown in FIG. 6A, the exposure light 4 is partially blocked by the blind shutter 3, only the left mask region 8 is irradiated, and the second mask pattern 12 on the left mask region 8 is stationary. Is transferred onto the exposed substrate 6.

  FIG. 6B shows an exposure pattern of the right side pattern 102 of the color filter pattern 100 transferred in this step. Here, the exposed substrate 6 is transported by an exposure stage (not shown) or a floating transport unit and aligned with the exposure head 1, and the exposure pattern of the right side pattern 102 is located at a predetermined distance from the right end of the exposed substrate 6. It is formed. That is, the exposure apparatus determines the exposure start position and the exposure end position by reading movement information of the substrate to be exposed, mechanically controls the position of the substrate to be exposed with respect to the exposure head, and positions the substrate to be exposed. Still exposure is performed after 6 is stopped at a predetermined position.

  In the present embodiment, the exposure head 1 is fixed, and the substrate 6 to be exposed is transported and moved.

(C-2. Pattern transfer by continuous scan exposure (at the start of scan exposure) (first group pattern))
FIG. 7A shows a situation at the start of repeated pattern transfer in the scanning direction by continuous scanning exposure. First, the substrate 6 to be exposed is transported by a predetermined length and a predetermined distance in the X arrow direction. Next, the left shutter area 8 and the right mask area 9 of the exposure mask 2 are shielded by the blind shutter 3, and the blind shutter 3 is moved within the area of the central mask area 7 in accordance with the right end of the image display area 101. Partially transmit light and perform pattern transfer.
In this way, as shown in FIG. 7B, a portion of the image display area 101 adjacent to the right side pattern 102 is transferred onto the substrate 6 to be exposed.

(C-3. Pattern transfer by continuous scanning exposure (intermediate area of scanning exposure) (first group pattern))
FIG. 8A shows a situation in an intermediate region of repeated pattern transfer in the scanning direction by continuous scanning exposure. In this step, the same pattern as described in FIG. 5 is continuously formed on the substrate 6 to be exposed.

  That is, as shown in FIG. 8A, the left shutter area 8 and the right mask area 9 of the exposure mask 2 are shielded by the blind shutter 3, and almost the entire area of the central mask area 7 is transmitted and irradiated. The Further, the substrate 6 to be exposed is transported in the direction of the arrow X by an exposure stage or a floating transport unit (not shown) in accordance with the scan exposure. In this way, the first mask pattern 11 provided in the central mask region 7 is continuously transferred to the photosensitive resist on the exposed substrate 6 by continuous (scan) exposure using a repetitive pattern which is a conventional exposure method. Is done.

(C-4. Pattern transfer by continuous scanning exposure (at the end of scanning exposure) (first group pattern))
FIG. 9A shows a situation at the end of repeated pattern transfer in the scanning direction by continuous scanning exposure. Similar to the process described with reference to FIG. 7A, the left mask area 8 and the right mask area 9 of the exposure mask 2 are shielded by the blind shutter 3, and the image display area 101 in the area of the central mask area 7 is blocked. Pattern transfer is performed by moving the blind shutter 3 in accordance with the left end.
In steps (c-2), (c-3), and (c-4) described above, exposure is performed while adjusting the exposure amount of each area of the image display area 101 to be constant.
In this way, as shown in FIG. 9B, the image display area 101 is transferred onto the exposed substrate 6 to the photosensitive resist on the exposed substrate 6.

(C-5. Pattern transfer by still exposure (end pattern of first group and start pattern of second group))
FIG. 10A shows the pattern transfer status of the left side pattern 103 of the first group and the right side pattern 102 of the second group by still exposure. This process is the same as that described with reference to FIG. That is, as shown in FIG. 9A, the blind mask 3 shields the central mask area 7 of the exposure mask 2 and transmits the other areas so that the left mask area 8 and the right mask area 9 are irradiated. Is done. Then, the second mask pattern 12 on the left mask region 8 and the third mask pattern 13 on the right mask region 9 are transferred onto the stationary substrate 6 to be exposed.

  In this way, as shown in FIG. 10B, the first group of color filter patterns 100 and the second group of right side region 102 were exposed on the exposure mask 2.

(C-6. Pattern transfer by continuous scan exposure (at the start of scan exposure) (second group pattern))
FIG. 11A shows a situation at the start of repeated pattern transfer in the scan direction by continuous scan exposure for the second group of color filter patterns 100. The detailed description is as described in (c-2). In this way, as shown in FIG. 11B, the first part of the image display area 101 of the second group of color filter patterns 100 is transferred to the position adjacent to the right side pattern 102 on the substrate 6 to be exposed. Is done.

  By repeating the above steps (c-1) and subsequent steps, the color filter pattern 100 having a pattern in the cross scan direction can be continuously exposed on the exposure mask 2 at a predetermined interval.

(D. Pattern transfer by repeated scanning exposure and static exposure)
Pattern transfer by repeated scanning exposure and stationary exposure using a plurality of small masks on a large substrate will be described with reference to FIGS. The configuration of the main part of the exposure apparatus is the same as the configuration shown in the description of (c), but the figure of the formed exposure pattern is omitted.

  In this embodiment, a G8 (eighth generation) size exposure substrate 6 and a G8 size EGIS exposure machine are used. Further, five exposure heads 1 are arranged at predetermined intervals in the cross scan direction on the upstream side (A row) in the scan direction, and four exposure heads 1 are arranged in the cross scan direction on the downstream side (B row). They are arranged side by side so as to be positioned between the exposure heads 1 in the A row. By arranging the exposure heads 1 in two rows in the cross scan direction in this way, it becomes possible to expose almost the entire width of the substrate 6 to be exposed by the nine exposure masks 2 without any gaps.

  At this time, each exposure head 1 is formed with a mask pattern corresponding to the pattern or mark of the color filter pattern 100 included in the width of each exposure head 1 in the cross-scan direction. Then, using these exposure heads 1, for example, a total of 15 color filter patterns 100 of 5 in the vertical direction (vertical direction in the figure) × 3 in the horizontal direction (horizontal direction in the figure) are formed on the substrate 6 to be exposed. To form.

  Further, the horizontal interval between the exposure mask 2 in the A row and the exposure mask 2 in the B row is aligned so as to be the same as the repetition pitch interval that is the distance between the centers of the color filter patterns 100 adjacent in the scanning direction. Yes. With this configuration, as described later, it is possible to perform scan exposure or still exposure simultaneously with the exposure mask 2 in the A row and the exposure mask 2 in the B row.

  The color filter pattern 100 according to the present embodiment further includes a frame-like upper and lower pattern 104 above and below the pattern shown in FIG. (See Figure 17)

(D-1. Static exposure of the first group by the exposure head of row A)
As shown in FIG. 12, the beginning of the first group is statically exposed by the exposure head in row A. Here, the functions of the exposure mask 2 in the A row and the blind shutter 3 are as described in (c-1), and there are five right side patterns 102 on the exposed substrate 6 at the same time. A portion included in the width of the mask 2 is statically exposed. Here, since the exposure mask 2 in the B row is not on the substrate 6 to be exposed, the exposure mask 2 is covered with the blind shutter 3.

(D-2. First group scan exposure by exposure head in row A)
As shown in FIG. 13, the first group is scan-exposed by the exposure head of row A. Here, the functions of the exposure mask 2 and the blind shutter 3 in row A are as described in (c-2) to (c-4), and four image display unit patterns 101 are simultaneously formed on the substrate 6 to be exposed. The part is scan exposed. Here, the exposure mask 2 in the B row is covered with the blind shutter 3.

(D-3. Still exposure at the end of the first group and the start of the second group by the exposure head in the A row, and still exposure at the start of the first group by the exposure head in the B row)
As shown in FIG. 14, the end of the first group and the beginning of the second group are statically exposed by the exposure head of row A. Here, the functions of the exposure mask 2 and the blind shutter 3 in the A row are as described in (c-5), and the first group of five left side patterns 103 and the second group are simultaneously formed on the substrate 6 to be exposed. These four right side patterns 102, which are included in the width of the exposure mask 2 in the A column, are statically exposed.

The functions of the exposure mask 2 and the blind shutter 3 in the B row are as described in (c-1), and are the first group of four right side patterns 102 on the substrate 6 to be exposed, The portions included in the width of the exposure mask 2 in the row are subjected to static exposure.
That is, since the interval between the exposure mask 2 in the A row and the exposure mask 2 in the B row is configured to be the same as the repetition pitch interval of the color filter pattern 100, still exposure can be performed simultaneously.

(D-4. Second Group Scan Exposure by A Row Exposure Head and First Group Scan Exposure by B Row Exposure Head)
As shown in FIG. 15, the second group is scan-exposed by the A-line exposure head, and the first group is scanned by the B-line exposure head. Here, the functions of the exposure mask 2 and the blind shutter 3 in the A row and the B row are as described in (c-2) to (c-3). Here, since the interval between the exposure mask 2 in the A row and the exposure mask 2 in the B row is configured to be the same as the repetition pitch interval of the color filter pattern 100, it is possible to perform scanning exposure at the same time.

(D-5. Still exposure at the end of the second group and the start of the third group by the exposure head of the A row, and a static exposure at the end of the first group and the start of the second group by the exposure head of the B row)
As shown in FIG. 16, similarly to the description of (d-3), the end of the second group and the start of the third group are performed by the exposure head of the A row, and the end of the first group and the start of the third group by the exposure head of the B row. The beginning of the second group is exposed statically. Here, since the interval between the exposure mask 2 in the A row and the exposure mask 2 in the B row is configured to be the same as the repetition pitch interval of the color filter pattern 100, still exposure can be performed simultaneously.

(D-6. Third Group Scan Exposure by A Row Exposure Head and Second Group Scan Exposure by B Row Exposure Head)
As shown in FIG. 17, similarly to the description of (d-4), the third group is scanned and exposed by the A column exposure head, and the second group is scanned and exposed by the B column exposure head. Here, since the interval between the exposure mask 2 in the A row and the exposure mask 2 in the B row is configured to be the same as the repetition pitch interval of the color filter pattern 100, it is possible to perform scanning exposure at the same time.

(D-7. Still exposure at the end of the third group by the exposure head in the A row and static exposure at the end of the second group and the start of the third group by the exposure head in the B row)
As shown in FIG. 18, similarly to the description of (d-3), the end of the second group and the start of the third group are performed by the exposure head of the A row, and the end of the first group and the start of the third group are performed by the exposure head of the B row. The beginning of the second group is exposed statically. Here, since the interval between the exposure mask 2 in the A row and the exposure mask 2 in the B row is configured to be the same as the repetition pitch interval of the color filter pattern 100, still exposure can be performed simultaneously.

(D-8. Third Group Scan Exposure by B Row Exposure Head)
As shown in FIG. 19, the third group is scan-exposed by the exposure head in the B row. Here, the functions of the exposure mask 2 and the blind shutter 3 in the B row are as described in (c-2) to (c-3). Here, since the exposure mask 2 in the A row is not on the substrate 6 to be exposed, it is covered with the blind shutter 3.

(D-9. Still exposure at the end of the third group by the exposure head in row B)
As shown in FIG. 20, similarly to the description of (d-3), the end of the third group is statically exposed by the exposure head in the B row. Here, since the exposure mask 2 in the A row is not on the substrate 6 to be exposed, it is covered with the blind shutter 3.
As described in (d-1) to (d-9) above, pattern transfer is performed by repeating scan exposure and still exposure.

  In this embodiment, the interval in the scanning direction of the exposure masks 2 in the A and B rows is configured to be the same as the repetition pitch interval of the color filter pattern 100, but is not limited to this, and is an integral multiple of the repetition pitch interval. You may comprise in the distance.

  In this embodiment, the exposure masks 2 are arranged in two rows, ie, A row and B row, but may be arranged in two or more rows such as A row, B row, and C row. In this case, the interval between the A column and the B column, and the interval between the B column and the C column are configured to be the same as the repetition pitch interval of the color filter pattern 100 or a distance that is an integer multiple thereof, so Still exposure can be performed.

  The details of the color filter of the present invention are not limited to the above-described embodiments, and various modifications can be made. As an example, it is formed as a frame pattern having a rectangular frame shape in which side dummy patterns or frame patterns 102a and 103a arranged on the left and right sides of the color filter pattern 100 and an upper and lower pattern 104 such as a frame arranged above and below are connected. May be.

  In the continuous exposure method such as the small mask continuous exposure method, the present invention can form side patterns such as dummy patterns and alignment marks arranged in the cross-scan direction together with the image display portion pattern. On the other hand, the present invention can be applied to a manufacturing method of a color filter for transferring a pattern.

DESCRIPTION OF SYMBOLS 1 Exposure head 2 Exposure mask 3 Blind shutter 4 Exposure light 5 Condenser lens 6 Exposed substrate 7 Center mask area 8 Left mask area 9 Right mask area 11 1st mask pattern 12 2nd mask pattern 13 3rd mask pattern 100 Color filter pattern 101 Image display part pattern 102 Right side part pattern 103 Left part part pattern 104 Upper and lower part pattern

Claims (7)

While continuously moving the rectangular substrate to be exposed, the exposure light irradiated from the exposure light source is exposed to the mask pattern of the exposure mask on the substrate to be exposed through an exposure head including an exposure mask and a blind shutter. Using an exposure apparatus that exposes, an image display part pattern and two side patterns arranged in a front part and a rear part of the image display part pattern in the moving direction and extending in a direction perpendicular to the moving direction are provided. A color filter manufacturing method for continuously exposing a color filter pattern on the substrate to be exposed,
A first exposure step in which the substrate to be exposed is stationary and the front side pattern is exposed;
A second exposure step of scanning and exposing the display pattern while moving the substrate to be exposed;
And a third exposure step of exposing the rear side pattern with the exposed substrate stationary. The exposure mask includes a front mask region, a central mask region, and a rear portion as regions where mask patterns for exposing the front side pattern, the display pattern, and the rear side pattern, respectively, are formed. A mask area,
In the first exposure step, the front mask area is translucent, and the other areas are shielded by the blind shutter;
In the second exposure step, the central mask area is translucent, and the other areas are shielded by the blind shutter,
The method for manufacturing a color filter according to claim 1, wherein in the third exposure step, the rear mask region is translucent and the other regions are shielded by the blind shutter. Performing the first exposure step and the third exposure step simultaneously;
In this case, the front mask area and the rear mask area are translucent, and the central mask area is shielded by the blind shutter.   The exposure apparatus includes at least two rows in front and back that are arranged in parallel so as to cover the width of the exposure area on the substrate to be exposed, with end portions of a predetermined length overlapped and shifted in the front and rear directions of movement. A plurality of exposure heads are provided, and the distance between the front and back of each row of exposure heads is the same as the pitch distance of continuous color filter patterns exposed on the substrate to be exposed, or an integral multiple of the pitch distance. The manufacturing method of the color filter of Claim 1.   The method of manufacturing a color filter according to claim 1, wherein the exposure light source is a blinking light source.   The method for manufacturing a color filter according to claim 1, wherein the exposure light source is a continuous light source.   The color filter manufactured by the manufacturing method of the color filter in any one of Claims 1-6.

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