JP2013088600A - Ultraviolet irradiation device - Google Patents

Abstract

An object of the present invention is to prevent an abnormal load from being applied to a liquid crystal panel when the liquid crystal panel is transferred between an arm of a work transfer mechanism and a work stage.
A liquid crystal panel is carried in by a work transfer mechanism and delivered to pins 1A and 1B. The work stage drive mechanism 3 raises the work stage 2, and the liquid crystal panel is delivered to the work stage 2. A voltage is applied to the liquid crystal panel 20 from the probe PB, and ultraviolet light is irradiated from the light source unit 10 to perform processing on the liquid crystal panel. When the processing is finished, the work stage 2 is lowered, the liquid crystal panel is transferred to the pins 1A and 1B, and is held and carried out by the work transfer mechanism. Since the work stage 2 moves and delivers the liquid crystal panel, the liquid crystal panel can be prevented from slipping off from the pins 1A and 1B due to vibration or the like. Further, the pin 1B is formed in a plate shape and is difficult to bend, and the liquid crystal panel can be prevented from sliding down.
[Selection] Figure 1

Description

  The present invention relates to an ultraviolet irradiation device used in a manufacturing process of a liquid crystal panel.

A liquid crystal panel has a structure in which liquid crystal is sealed between two light-transmitting substrates (glass substrates). A large number of active elements (TFTs) and liquid crystal driving electrodes are formed on one glass substrate, An alignment film is formed. On the other glass substrate, a color filter, an alignment film, and a transparent electrode (ITO) are formed. Then, liquid crystal is sealed between the alignment films of both glass substrates, and the periphery is sealed with a sealing agent.
In the manufacturing process of such a liquid crystal panel, a photoreactive substance (monomer) that polymerizes in response to ultraviolet rays is included in the liquid crystal, and the liquid crystal panel is irradiated with ultraviolet rays while applying voltage to the photoreactive property. A technique for controlling the pretilt angle of liquid crystal by polymerizing a substance is known (Patent Document 1). Such a technique is commonly called PSA (technology) in the technical field.
As an ultraviolet irradiation apparatus for performing such a PSA treatment, the in-plane uniformity of ultraviolet illuminance on the light irradiation surface is high, the temperature rise of the liquid crystal panel during ultraviolet irradiation is small, and the temperature of the liquid crystal panel 20 is low. An apparatus having good in-plane uniformity is expected.

FIG. 6 is a cross-sectional view showing a configuration example of an ultraviolet irradiation device used for PSA applications.
The ultraviolet irradiation device includes a light source unit 10, a work stage 2, and a probe PB.
The light source unit 10 is configured by arranging a plurality of long lamps 11 that radiate ultraviolet rays in parallel at equal intervals in parallel to the left and right of FIG. ).
The lamp 11 is, for example, an excimer lamp in which xenon gas is sealed as a discharge gas inside a long rectangular cylindrical glass tube (enclosure). A phosphor is applied to the inner wall of the envelope of the lamp 11, and this phosphor is excited by ultraviolet light generated from xenon gas excited by dielectric barrier discharge in the envelope, and has a wavelength suitable for PSA processing. The region emits ultraviolet rays of 300 nm to 400 nm.

The work stage 2 is a stage that holds the liquid crystal panel 20 that performs PSA processing. A vacuum suction hole (not shown) for sucking and holding the liquid crystal panel 20 on the stage is formed in the periphery of the surface of the work stage 2.
The probe PB is a mechanism that applies a voltage to the liquid crystal panel 20 on the work stage 2 during ultraviolet irradiation. The probe PB is connected to the probe power supply 4. During ultraviolet irradiation, the tip of the probe PB comes into contact with the electrode 21 of the liquid crystal panel 20 on the work stage 2, and a voltage is applied from the probe power supply 4. The probe PB includes a moving mechanism (not shown) that moves the tip of the probe PB up and down.
The pin 1 is a mechanism for exchanging a workpiece to be processed (in this case, the liquid crystal panel 20) between the workpiece transfer device and the workpiece stage 2. A plurality of pins 1 are formed in a thin cylindrical shape so as to correspond to a peripheral portion where contact with the panel 20 is allowed, and are moved up and down by the pin driving mechanism 6.

The operation of this ultraviolet irradiation device will be described with reference to FIG.
(1) As shown in FIG. 7A, the liquid crystal panel 20 held by the arm 31 of the work transport mechanism 30 is carried onto the work stage 2 of the ultraviolet irradiation device.
(2) As shown in FIG. 7B, the pin driving mechanism 6 is driven and the pin 1 is raised. The arm 31 of the work transport mechanism 30 is slightly lowered, and the liquid crystal panel 20 is transferred from the arm 31 to the pin 1. The arm 31 retracts from the work stage 2 in the right direction in the figure.
(3) As shown in FIG. 8C, the pin driving mechanism 6 is driven and the pin 1 is lowered. The liquid crystal panel 20 is transferred from the pin 1 to the work stage 2. The work stage 2 holds the liquid crystal panel 20 by vacuum suction. The probe PB rises and the tip contacts the electrode 21 of the liquid crystal panel 20. A voltage is applied to the liquid crystal panel 20 from the probe PB, and ultraviolet light is irradiated from the light source unit 10 to the liquid crystal panel 20 on the work stage 2.
(4) When the processing is completed, the pin 1 is raised and the liquid crystal panel 20 is lifted as shown in FIG. The arm 31 of the work transport mechanism 30 is inserted between the liquid crystal panel 20 lifted by the pins 1 and the work stage 2.
(5) The arm 31 slightly rises and receives the liquid crystal panel 20 from the pin 1. Pin 1 is lowered. The liquid crystal panel 20 is held by the arm 31 and carried out.

JP 2010-256515 A

FIG. 9 shows a configuration example of the liquid crystal panel 20. On the liquid crystal panel 20 formed by sandwiching the sealing agent 24 between the two glass substrates 22 and 23, a plurality (four in this figure) of contours 25 (screens) are formed. A sealing agent is applied so as to surround each of the outlines 25 (screens), and the liquid crystal is confined therein.
The liquid crystal panel 20 has a limited portion where the pin 1 can contact. The so-called screen portion (inside the outline 25) where the image is displayed cannot be touched by the pin 1. The pin 1 may be in contact only with the peripheral part of the panel 20 that is not a screen, or between the screens of a plurality of screens formed on the panel 20.
It is desirable that the pins are thick in order to stably support the liquid crystal panel 20. However, the width of the portion that the pin may contact is narrow in order to effectively use the panel, and the thickness of the pin can only be about 2 mm to 3 mm in diameter.

On the other hand, the liquid crystal panel 20 has a side of about 2 m to 3 m, and its weight is about 20 kg to 30 kg. If such a panel is to be supported by a pin having a diameter of 2 mm to 3 mm in a narrow region around the panel, the following problem may occur.
(1) When the liquid crystal panel 20 is transferred to the pin 1 from the arm 31 of the work transfer device 30 or when the pin 1 tries to lift the liquid crystal panel 20 from the work stage 2, the panel 20 is supported by the pin 1. The However, as shown in FIG. 10, when the pin 1 moves up and down, since the pin 1 is thin, it is shaken by the vibration, and the panel slides down from the pin 1.
(2) The liquid crystal panel 20 is a thin glass substrate, and when supported by the pins 1, deflection due to its own weight occurs. When the self-weight deflection occurs, stress is generated in the lateral direction with respect to the pin 1 as shown in FIGS. Due to this stress, the pin 1 opens outward as shown in FIG. 11C, and the panel 20 falls inside the pin 1.

If the pins 1 are provided not only at the peripheral portion of the panel but also at the central portion, the lateral stress applied to the peripheral portion pins 1 can be slightly reduced. However, it is not enough as a countermeasure against the above problems.
That is, even if a pin is provided in the center portion, as shown in FIG. 12 (d), when the pin 1 provided in the peripheral portion is bent outward, the peripheral portion of the panel 20 is detached from the pin 1 and falls inside the pin. The panel 20 is bent and a load is applied to the panel 20. In some cases, the panel 20 may be damaged.
The present invention solves the above-mentioned problems, and an object of the present invention is to place the liquid crystal panel on the work stage from the arm of the work transport mechanism through the pin, or from the work stage through the pin. Thus, when the liquid crystal panel is delivered to the arm of the work transfer mechanism, the liquid crystal panel is prevented from being bent or detached from the pin, so that the liquid crystal panel is bent and a large load is applied to the liquid crystal panel.

When the liquid crystal panel is transferred between the pin and the work stage, the pin is not moved up and down, but the pin is fixed and the work stage is moved up and down with respect to the pin.
Moreover, the pin provided in the peripheral part or corner | angular part of a panel is made into the plate shape along the area | region which a pin may contact instead of the conventional cylindrical shape. In the following, a member that supports the panel at a plurality of positions including a plate-like support member is called a pin.
That is, in the present invention, the above-described problem is solved as follows.
(1) A panel support part for supporting a liquid crystal panel enclosing therein a liquid crystal containing a photoreactive substance, a light irradiation part for irradiating light to the liquid crystal panel supported by the panel support part, and Voltage applying means for applying a voltage to the liquid crystal panel 20, and irradiating the liquid crystal panel supported by the support portion with light from the light irradiating portion while applying voltage by the voltage applying means. Accordingly, in the liquid crystal panel manufacturing apparatus in which the photoreactive substance in the liquid crystal panel is reacted to form an alignment portion in the liquid crystal panel, the panel support portion is moved in the vertical direction between the flat stage and the flat stage. And a plurality of pins for supporting the liquid crystal panel when the liquid crystal panel is carried into and out of the panel support section. When delivered to the di-, and when passing the liquid crystal panel on the planar stage received in the pin, the pin without moving, moves the flat stage with respect to the pin.
(2) In the above (1), among the plurality of pins, the shape of the pin that supports the peripheral portion or corner portion of the liquid crystal panel is a plate shape, and the long side of the surface of the plate pin that is in contact with the liquid crystal panel is It arrange | positions in parallel with the edge | side of the said liquid crystal panel.

In the present invention, the following effects can be obtained.
(1) The pins are fixed, and the work stage is moved up and down with respect to the pins so that the liquid crystal panel is transferred from the pins to the work stage and from the work stage to the pins. It is possible to prevent a load from being applied to the panel by sliding the panel off the pin and bending the panel.
(2) The rigidity of the pin can be increased by making the pin into a plate shape. In particular, even if a force is applied obliquely to the plane of the pin, the pin does not open outward and the liquid crystal panel does not fall into the pin. For this reason, it can prevent that a load is applied to a panel because a panel bends.

It is sectional drawing which shows the structural example of the ultraviolet irradiation device of the Example of this invention. It is a perspective view which shows arrangement | positioning of the work stage and pin of 1st Example of this invention. It is a figure (1) explaining operation | movement of the ultraviolet irradiation device of the Example of this invention. It is a figure (2) explaining operation | movement of the ultraviolet irradiation device of the Example of this invention. It is a perspective view which shows arrangement | positioning of the work stage and pin of 2nd Example of this invention. It is sectional drawing which shows the structural example of an ultraviolet irradiation device. It is a figure (1) explaining operation | movement of the ultraviolet irradiation device shown in FIG. It is a figure (2) explaining operation | movement of the ultraviolet irradiation device shown in FIG. It is a figure which shows the structural example of a liquid crystal panel. FIG. 7 is a diagram (1) illustrating a problem when the liquid crystal panel is delivered via a pin in the ultraviolet irradiation device shown in FIG. 6. FIG. 7 is a diagram (2) illustrating a problem when the liquid crystal panel is delivered via a pin in the ultraviolet irradiation device shown in FIG. 6. FIG. 7 is a diagram (3) illustrating a problem when the liquid crystal panel is delivered via a pin in the ultraviolet irradiation device shown in FIG. 6.

In FIG. 1, the structural example of the ultraviolet irradiation device of the Example of this invention is shown with sectional drawing. 6 differs from the conventional apparatus shown in FIG. 6 in that the pin 1 is fixed and does not move in the vertical direction, and the work stage 2 is provided with a drive mechanism for moving the stage in the vertical direction. Other configurations are basically the same.
As shown in FIG. 1, the external line irradiation apparatus of the present embodiment includes a light source unit 10, a work stage 2, and a probe PB.
The light source unit 10 is configured by arranging a plurality of long lamps 11 that radiate ultraviolet rays in parallel at equal intervals in parallel to the left and right of FIG. 1 (in FIG. 1, the lamp 11 has a sectional view). ).
The lamp 11 is an excimer lamp in which xenon gas is sealed as a discharge gas inside the long rectangular cylindrical glass tube (sealed body). A phosphor is applied to the inner wall of the envelope of the lamp 11, and this phosphor is excited by ultraviolet light generated from xenon gas excited by dielectric barrier discharge in the envelope, and has a wavelength suitable for PSA processing. The region emits ultraviolet rays of 300 nm to 400 nm.

The work stage 2 is a stage that holds the liquid crystal panel 20 that performs PSA processing. A vacuum suction hole (not shown) for sucking and holding the liquid crystal panel 20 on the stage is formed in the periphery of the surface of the work stage 2. The work stage 2 is provided with a work stage drive mechanism 3 that moves the stage in the vertical direction in the figure.
The probe PB is a mechanism that applies a voltage to the liquid crystal panel 20 on the work stage 2 during ultraviolet irradiation. The probe PB is connected to the probe power supply 4.
During ultraviolet irradiation, the tip of the probe PB comes into contact with the electrode of the liquid crystal panel on the work stage 2, and a voltage is applied from the probe power supply 4. The probe PB includes a moving mechanism (not shown) that moves the tip of the probe PB up and down.
The pins 1 </ b> A and 1 </ b> B are mechanisms for exchanging the liquid crystal panel 20 between the work transfer device 30 and the work stage 2. The pins 1A and 1B are fixed to a frame 5 that does not move.

FIG. 2 is a perspective view showing the arrangement of the work stage 2 and the pins 1A and 1B of the first embodiment in the ultraviolet irradiation apparatus of the present invention. The figure shows a state where the work stage 2 is lowered. Further, a vacuum suction hole for sucking and holding the liquid crystal panel 20 is formed on the surface of the work stage 2, but it is omitted.
There are two types of pins that support the liquid crystal panel 20: pins 1A and 1B.
The pin 1 </ b> A is in contact with a region between the outline (screen) and the outline (screen) formed on the liquid crystal panel 20 to support the panel. The shape of the pin 1A is a columnar shape having a diameter of about 2 mm to 3 mm, similar to the conventional one. The work stage 2 has a through hole 2b through which the pin 1A passes.

The pins 1B are in contact with the peripheral part of the liquid crystal panel 20 and support the panel. The shape of the pin 1B is 2 mm to 3 mm in thickness, and is a flat plate shape that is long along the direction in which each side of the panel extends. That is, the long side of the surface in contact with the panel 20 is substantially parallel to the side of the panel 20.
A cutout 2 a for providing the pin 1 </ b> B is formed in the periphery of the work stage 2.
Making the pin 1B flat has the following advantages. As described above, the liquid crystal panel 20 is deflected by its own weight when being held by the pins 1A and 1B, thereby applying stress to the pin 1B in the lateral direction (outward direction of the work stage 2). However, the flat pin 1B has higher rigidity with respect to a lateral force than the cylindrical pin 1B, and is less likely to bend (difficult to spread outward).
Further, as for the pins provided at positions close to the corners of the work stage 2, as shown in FIG. 11, the stress due to the deflection of the liquid crystal panel 20 is applied obliquely to the plane of the pins 1B. The pin 1B does not bend against the force (does not spread outward).

In this way, by forming the pin 1B that contacts the peripheral portion of the liquid crystal panel 20 and supports the panel 20 in a flat plate shape, the pin 1B spreads toward the outside of the stage even if the panel 20 has stress due to its own weight deflection. Therefore, the liquid crystal panel 20 does not fall inside the pin 1B. In order to increase the rigidity of the pin, it is possible to use a cylindrical pin and thicken the part other than the contact part with the panel. However, a probe PB is provided outside the pin, and the pin is If it is thick, it may interfere with the probe PB.
Further, the pin 1A that supports the central portion of the liquid crystal panel 20 may be flat. However, the reason why the pin 1A is not made flat in this embodiment is that if the pin 1A is made flat, the through-hole formed in the work stage 2 must be elongated, and the rigidity of the work stage 2 is weakened. This is because of this.

The operation of this ultraviolet irradiation device will be described with reference to FIGS.
(1) As shown in FIG. 3A, the liquid crystal panel 20 held by the arm 31 of the work transport mechanism 30 is carried onto the work stage 2 of the ultraviolet irradiation device.
(2) As shown in FIG. 3B, the arm 31 of the work transport mechanism 30 is slightly lowered, and the liquid crystal panel 20 is transferred from the arm 31 to the pins 1A and 1B. The arm 31 retracts from the work stage 2 in the right direction in the figure.
(3) As shown in FIG. 4C, the work stage drive mechanism 3 is driven and the work stage 2 is raised. The liquid crystal panel 20 is delivered to the work stage 2 from the pins 1A and 1B. The work stage 2 holds the liquid crystal panel 20 by vacuum suction. The probe PB rises and the tip contacts the electrode 21 of the liquid crystal panel 20. A voltage is applied to the liquid crystal panel 20 from the probe PB, and ultraviolet light is irradiated from the light source unit 10 to the liquid crystal panel 20 on the work stage 2.
(4) When the processing is completed, the work stage 2 is lowered and the liquid crystal panel 20 is transferred to the pins 1A and 1B. Further, the probe PB is also lowered (becomes the state shown in FIG. 3B).
(5) The arm 31 of the work transport mechanism 30 is inserted between the liquid crystal panel 20 on the pins 1A and 1B and the work stage 2. The arm 31 is slightly raised and receives the liquid crystal panel 20 from the pin 1 (the state shown in FIG. 3A).
(6) The liquid crystal panel 20 is held by the arm 31 of the work transport mechanism 30 and carried out.

In FIG. 2, the case where a flat plate member is used as the pin has been described. However, when the pin member is provided at the corner of the work stage 2, a plate member formed in an L shape may be used.
FIG. 5 is a perspective view showing the arrangement of the work stage 2 and the pins 1 according to the second embodiment of the present invention. The figure shows a state where the work stage 2 is lowered. Further, a vacuum suction hole for sucking and holding the liquid crystal panel 20 is formed on the surface of the work stage 2, but it is omitted.
As shown in the figure, the shape of the four corners (corner portions) of the panel 20 is L-shaped for the plate-like pins 1B that are in contact with the periphery of the liquid crystal panel 20 and support the panel.
By making the pin L-shaped, the rigidity of the plate-like pin 1B is further increased. Therefore, the possibility that the liquid crystal panel 20 is detached from the pin 1 becomes lower. Therefore, in this case, the pin 1 supporting the peripheral portion other than the four corners of the liquid crystal panel 20 may be a conventional cylindrical one as shown in FIG.

1, 1A, 1B Pin 2 Work stage 2a Notch 2b Through hole 3 Work stage drive mechanism 4 Probe power supply 5 Frame 10 Light source 11 Lamp 20 Liquid crystal panel 30 Work transport mechanism 31 Arm PB Probe

Claims (2)

A panel support part for supporting a liquid crystal panel enclosing therein a liquid crystal containing a photoreactive substance, a light irradiation part for irradiating light to the liquid crystal panel supported by the panel support part, and the liquid crystal panel 20 Voltage application means for applying a voltage to,
By irradiating the liquid crystal panel supported by the support portion with light from the light irradiation portion while applying a voltage by the voltage applying means, the photoreactive substance in the liquid crystal panel is caused to react with the liquid crystal panel. In a liquid crystal panel manufacturing apparatus that forms an alignment portion inside a panel,
The panel support is
A planar stage;
A planar stage drive mechanism for moving the planar stage in the vertical direction;
A plurality of pins that support the liquid crystal panel when the liquid crystal panel is carried into and out of the panel support section;
When the liquid crystal panel on the pin is transferred to the flat stage and when the liquid crystal panel on the flat stage is transferred to the pin, the pin does not move and the flat stage moves with respect to the pin. An apparatus for manufacturing a liquid crystal panel. Of the plurality of pins, the shape of the pin that supports the peripheral portion or corner portion of the liquid crystal panel is plate-like, and the long side of the surface of the plate-like pin that contacts the liquid crystal panel is the side of the liquid crystal panel The liquid crystal panel manufacturing apparatus according to claim 1, wherein the liquid crystal panel manufacturing apparatus is arranged in parallel.

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