JP2013060545A - Phenolic resin composition - Google Patents
Phenolic resin composition Download PDFInfo
- Publication number
- JP2013060545A JP2013060545A JP2011200658A JP2011200658A JP2013060545A JP 2013060545 A JP2013060545 A JP 2013060545A JP 2011200658 A JP2011200658 A JP 2011200658A JP 2011200658 A JP2011200658 A JP 2011200658A JP 2013060545 A JP2013060545 A JP 2013060545A
- Authority
- JP
- Japan
- Prior art keywords
- group
- phenolic resin
- resin composition
- disulfide compound
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000005011 phenolic resin Substances 0.000 title claims abstract description 79
- 229920001568 phenolic resin Polymers 0.000 title claims abstract description 70
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 title claims abstract description 63
- 239000000203 mixture Substances 0.000 title claims abstract description 48
- -1 disulfide compound Chemical class 0.000 claims abstract description 47
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 14
- 239000001257 hydrogen Substances 0.000 claims abstract description 14
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims abstract description 13
- 150000001875 compounds Chemical class 0.000 claims abstract description 12
- 125000003118 aryl group Chemical group 0.000 claims abstract description 11
- 125000003277 amino group Chemical group 0.000 claims abstract description 10
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 9
- 125000003368 amide group Chemical group 0.000 claims abstract description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 8
- 125000003396 thiol group Chemical group [H]S* 0.000 claims abstract description 8
- 125000001424 substituent group Chemical group 0.000 claims abstract description 7
- 229920005989 resin Polymers 0.000 claims description 37
- 239000011347 resin Substances 0.000 claims description 37
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 claims description 16
- MERLDGDYUMSLAY-UHFFFAOYSA-N 4-[(4-aminophenyl)disulfanyl]aniline Chemical compound C1=CC(N)=CC=C1SSC1=CC=C(N)C=C1 MERLDGDYUMSLAY-UHFFFAOYSA-N 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- GUUVPOWQJOLRAS-UHFFFAOYSA-N diphenyl disulphide Natural products C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 abstract description 28
- 239000002184 metal Substances 0.000 abstract description 28
- 239000000463 material Substances 0.000 abstract description 7
- 239000003795 chemical substances by application Substances 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 18
- 239000000047 product Substances 0.000 description 12
- 238000002156 mixing Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 239000003822 epoxy resin Substances 0.000 description 9
- 229920000647 polyepoxide Polymers 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 150000008065 acid anhydrides Chemical class 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 4
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000020169 heat generation Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000011342 resin composition Substances 0.000 description 4
- 229920000877 Melamine resin Polymers 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 229920003987 resole Polymers 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- FKBMTBAXDISZGN-UHFFFAOYSA-N 5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CCC2C(=O)OC(=O)C12 FKBMTBAXDISZGN-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 2
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 1
- YPGMOWHXEQDBBV-QWWZWVQMSA-N (4S,5S)-1,2-dithiane-4,5-diol Chemical compound O[C@@H]1CSSC[C@H]1O YPGMOWHXEQDBBV-QWWZWVQMSA-N 0.000 description 1
- 0 *C(*)(*C(*)(*)SSC1(*)*)*1N Chemical compound *C(*)(*C(*)(*)SSC1(*)*)*1N 0.000 description 1
- CXWGKAYMVASWDQ-UHFFFAOYSA-N 1,2-dithiane Chemical compound C1CCSSC1 CXWGKAYMVASWDQ-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- XBNOMKROXZGMFW-UHFFFAOYSA-N 3-[(3-hydroxyphenyl)disulfanyl]phenol Chemical compound OC1=CC=CC(SSC=2C=C(O)C=CC=2)=C1 XBNOMKROXZGMFW-UHFFFAOYSA-N 0.000 description 1
- VWGKEVWFBOUAND-UHFFFAOYSA-N 4,4'-thiodiphenol Chemical compound C1=CC(O)=CC=C1SC1=CC=C(O)C=C1 VWGKEVWFBOUAND-UHFFFAOYSA-N 0.000 description 1
- NFVPEIKDMMISQO-UHFFFAOYSA-N 4-[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC=C(O)C=C1 NFVPEIKDMMISQO-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910005965 SO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- XAQHXGSHRMHVMU-UHFFFAOYSA-N [S].[S] Chemical group [S].[S] XAQHXGSHRMHVMU-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000007718 adhesive strength test Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- NIDNOXCRFUCAKQ-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2C(O)=O NIDNOXCRFUCAKQ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Substances FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- ZQKXQUJXLSSJCH-UHFFFAOYSA-N melamine cyanurate Chemical compound NC1=NC(N)=NC(N)=N1.O=C1NC(=O)NC(=O)N1 ZQKXQUJXLSSJCH-UHFFFAOYSA-N 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- RIWRFSMVIUAEBX-UHFFFAOYSA-N n-methyl-1-phenylmethanamine Chemical compound CNCC1=CC=CC=C1 RIWRFSMVIUAEBX-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000010680 novolac-type phenolic resin Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000011134 resol-type phenolic resin Substances 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明は、金属密着性及び硬化物の耐熱性に優れるフェノール系樹脂組成物に関する。 The present invention relates to a phenolic resin composition excellent in metal adhesion and heat resistance of a cured product.
熱硬化性樹脂の一種であるフェノール系樹脂は、機械的性質、耐熱性、寸法安定性、耐薬品性、耐水性に優れ、電気絶縁性や機械的強度が要求される電気・電子部品等のパッケージング材料やプリント配線用の銅張積層板等の工業部品、更に、木材用接着剤、塗料等に使用されている。 Phenolic resin, a kind of thermosetting resin, has excellent mechanical properties, heat resistance, dimensional stability, chemical resistance, water resistance, and electrical / electronic parts that require electrical insulation and mechanical strength. It is used for packaging materials and industrial parts such as copper-clad laminates for printed wiring, as well as wood adhesives and paints.
フェノール系樹脂のうち、フェノール樹脂は、一般的にはフェノール類とアルデヒド類との反応によって合成され、フェノール過剰の反応条件においてはノボラック型と呼ばれる熱可塑性の樹脂中間体が得られ、ホルムアルデヒド過剰の条件ではレゾール型と呼ばれる樹脂中間体が得られる。また、フェノール系樹脂としては、フェノール樹脂の他にも、硬化時に副生ガスを発生せず、優れた成形加工性や耐熱性を持つベンゾオキサジン樹脂が開発されている。 Among phenolic resins, phenolic resins are generally synthesized by a reaction between phenols and aldehydes, and under a phenol-excess reaction condition, a thermoplastic resin intermediate called a novolac type is obtained. Under the conditions, a resin intermediate called a resol type is obtained. In addition to phenolic resins, benzoxazine resins that do not generate by-product gas during curing and have excellent moldability and heat resistance have been developed as phenolic resins.
一方で、フェノール系樹脂は、金・銀・銅・アルミニウム等の難接着性金属との接着力の弱さが課題として挙げられる。金属との接着力が求められる用途としては、電子材料分野においては、半導体封止材料が挙げられ、リードフレーム(Cu、Au)等との密着性向上が望まれている。また、自動車部品分野においては、モーターの回転部品であるコンミテータ部品の金属セグメントと樹脂との密着性の低さが問題となっており、コンミテータ回転時に金属セグメントが浮いて段差が生じ、騒音等が発生し、信頼性が著しく低下してしまうため、金属密着性の向上が望まれている。 On the other hand, phenolic resins have a problem of weak adhesive strength with difficult-to-adhere metals such as gold, silver, copper, and aluminum. In the field of electronic materials, semiconductor encapsulating materials can be cited as applications requiring adhesive strength with metals, and improvements in adhesion with lead frames (Cu, Au) and the like are desired. In the automotive parts field, there is a problem of low adhesion between the metal segment of the commutator part, which is the rotating part of the motor, and the resin. When the commutator rotates, the metal segment floats, creating a level difference, causing noise, etc. It is generated and the reliability is remarkably lowered, so that improvement in metal adhesion is desired.
フェノール系樹脂の金属密着性を向上させる方法として、例えば、銅セグメント表面をカセイソーダと過硫酸カリウム水溶液によって煮沸処理し、酸化第二銅の皮膜を形成させる方法(特許文献1)、エポキシ基含有アクリル樹脂を配合する方法(特許文献2)、メラミンを配合する方法(特許文献3)、メラミンに加えてシリコンゲルを配合する方法(特許文献4)、メラミンシアヌレートを配合する方法(特許文献5)等が開示されている。 Examples of methods for improving the metal adhesion of phenolic resins include a method in which the copper segment surface is boiled with caustic soda and a potassium persulfate aqueous solution to form a cupric oxide film (Patent Document 1), and an epoxy group-containing acrylic. A method of blending resin (Patent Document 2), a method of blending melamine (Patent Document 3), a method of blending silicon gel in addition to melamine (Patent Document 4), a method of blending melamine cyanurate (Patent Document 5) Etc. are disclosed.
本発明は、金属密着性及び硬化物の耐熱性に優れるフェノール系樹脂組成物を提供することを目的とする。 An object of this invention is to provide the phenol-type resin composition excellent in metal adhesiveness and the heat resistance of hardened | cured material.
本発明は、フェノール系樹脂とジスルフィド化合物とを含有し、前記ジスルフィド化合物は、下記一般式(1)で表される化合物及び/又は下記一般式(2)で表される化合物を含有するフェノール系樹脂組成物である。 The present invention contains a phenolic resin and a disulfide compound, and the disulfide compound contains a compound represented by the following general formula (1) and / or a compound represented by the following general formula (2). It is a resin composition.
式(1)中、R1、R2は、水素、水酸基、メルカプト基、カルボキシル基、アミノ基、若しくは、アミド基を有する炭素数1〜16の脂肪族基又は芳香族基を示し、これらは互いに同一であってもよいし、異なっていてもよい。 Wherein (1), R 1, R 2 represents hydrogen, a hydroxyl group, a mercapto group, a carboxyl group, an amino group, or an aliphatic group or an aromatic group having 1 to 16 carbon atoms and having an amide group, they They may be the same or different.
式(2)中、nは1〜6の整数を表す。R3〜R8は、水素、水酸基、メルカプト基、カルボキシル基、アミノ基、アミド基、又は、これらの置換基を有する炭素数1〜16の脂肪族基若しくは芳香族基を示し、これらは互いに同一であってもよいし、異なっていてもよい。
以下に本発明を詳述する。
In formula (2), n represents an integer of 1 to 6. R 3 to R 8 represent hydrogen, a hydroxyl group, a mercapto group, a carboxyl group, an amino group, an amide group, or an aliphatic group having 1 to 16 carbon atoms or an aromatic group having these substituents. They may be the same or different.
The present invention is described in detail below.
従来のフェノール系樹脂の金属に対する密着性を向上させる方法のうち、特許文献1に開示されている方法は、フェノール系樹脂自体を改質するものではなく、特許文献2に開示されている方法では、フェノール系樹脂の金属密着性の向上効果は約1.5倍程度の僅かなものである。また、特許文献3、特許文献4、特許文献5に開示されている方法では、金属密着性は大きく向上するが、機械的強度や耐熱性に問題が生じる。そのため、フェノール系樹脂の優れた耐熱性を維持しつつ、銅等の金属に対する密着性を向上させることが必要とされていた。
そこで、本発明者らは、フェノール系樹脂組成物に、特定の構造を有するジスルフィド化合物を配合することにより、該フェノール系樹脂組成物の金属密着性及び硬化物の耐熱性を大きく向上させることができることを見出し、本発明を完成させるに至った。
Of the conventional methods for improving the adhesion of a phenolic resin to a metal, the method disclosed in Patent Document 1 does not modify the phenolic resin itself, but the method disclosed in Patent Document 2 The effect of improving the metal adhesion of the phenolic resin is as small as about 1.5 times. Further, in the methods disclosed in Patent Document 3, Patent Document 4, and Patent Document 5, the metal adhesion is greatly improved, but there is a problem in mechanical strength and heat resistance. Therefore, it has been required to improve the adhesion to metals such as copper while maintaining the excellent heat resistance of the phenolic resin.
Therefore, the present inventors can greatly improve the metal adhesion of the phenolic resin composition and the heat resistance of the cured product by blending the phenolic resin composition with a disulfide compound having a specific structure. The present inventors have found that the present invention can be accomplished and have completed the present invention.
フェノール系樹脂組成物に、特定の構造を有するジスルフィド化合物を配合することにより、該フェノール系樹脂組成物の金属密着性及び硬化物の耐熱性が大きく向上する理由としては、ジスルフィド化合物の硫黄−硫黄結合が開裂し、硫黄−金属の相互作用が形成されることによって金属密着性を向上させる効果と、該ジスルフィド化合物が特定の構造を有することによって反応系を熱的に安定化する効果とが組み合わさって発揮されていることが考えられる。 The reason why the metal adhesion of the phenolic resin composition and the heat resistance of the cured product are greatly improved by blending the phenolic resin composition with a disulfide compound having a specific structure is sulfur-sulfur of the disulfide compound. The effect of improving metal adhesion by the cleavage of the bond and the formation of a sulfur-metal interaction is combined with the effect of thermally stabilizing the reaction system due to the specific structure of the disulfide compound. It is thought that it is demonstrated.
本発明のフェノール系樹脂組成物は、ジスルフィド化合物を含有する。
上記ジスルフィド化合物を含有することにより、本発明のフェノール系樹脂組成物は、金属密着性及び硬化物の耐熱性に優れるものとなる。また、上記ジスルフィド化合物は、フェノール系樹脂の硬化を促進する触媒としての役割も有する。
The phenolic resin composition of the present invention contains a disulfide compound.
By containing the disulfide compound, the phenolic resin composition of the present invention is excellent in metal adhesion and heat resistance of the cured product. Moreover, the said disulfide compound also has a role as a catalyst which accelerates | stimulates hardening of a phenol-type resin.
上記ジスルフィド化合物は、上記一般式(1)で表される化合物及び/又は上記一般式(2)で表される化合物を含有する。 The disulfide compound contains a compound represented by the general formula (1) and / or a compound represented by the general formula (2).
金属に対する密着性を大きく向上させるため、上記一般式(1)において、R1、R2は、水素以外であることが好ましく、上記一般式(2)において、R3〜R8のうち、少なくとも1つの置換基は、水素以外であることが好ましい。 In order to greatly improve the adhesion to a metal, in the general formula (1), R 1 and R 2 are preferably other than hydrogen, and in the general formula (2), at least of R 3 to R 8 One substituent is preferably other than hydrogen.
本発明のフェノール系樹脂組成物は、得られるフェノール系樹脂組成物の硬化物が耐熱性に優れるものとなるため、上記一般式(1)で表される化合物として、下記一般式(3)で表されるジフェニルジスルフィド化合物を含有することが好ましい。 In the phenolic resin composition of the present invention, since the cured product of the obtained phenolic resin composition has excellent heat resistance, the compound represented by the general formula (1) is represented by the following general formula (3). It is preferable to contain the represented diphenyl disulfide compound.
式(3)中、R9、R10は、水素、水酸基、メルカプト基、カルボキシル基、アミノ基、アミド基、若しくは、これらの置換基を有する炭素数1〜10の脂肪族基又は芳香族基を示し、これらは互いに同一であってもよいし、異なっていてもよい。なかでも、金属に対する密着性を大きく向上させるため、R9、R10は、水素以外であることが好ましく、水酸基又はアミノ基であることがより好ましく、アミノ基であることが更に好ましい。上記一般式(3)で表されるジフェニルジスルフィド化合物としては、4,4’−ジチオジアニリンが更に好ましい。 In formula (3), R 9 and R 10 are hydrogen, a hydroxyl group, a mercapto group, a carboxyl group, an amino group, an amide group, or a C 1-10 aliphatic group or aromatic group having these substituents. These may be the same as or different from each other. Among these, in order to greatly improve the adhesion to metal, R 9 and R 10 are preferably other than hydrogen, more preferably a hydroxyl group or an amino group, and even more preferably an amino group. As the diphenyl disulfide compound represented by the general formula (3), 4,4′-dithiodianiline is more preferable.
上記ジスルフィド化合物の含有量は、フェノール系樹脂100重量部に対して、好ましい下限が0.01重量部、好ましい上限が20重量部である。上記ジスルフィド化合物の含有量が0.01重量部未満であると、得られるフェノール系樹脂組成物が金属密着性に劣るものとなることがある。上記ジスルフィド化合物の含有量が20重量部を超えると、得られるフェノール系樹脂組成物の硬化物が耐熱性や機械的強度に劣るものとなることがある。上記ジスルフィド化合物の含有量のより好ましい下限は0.1重量部、より好ましい上限は10重量部である。 The content of the disulfide compound is preferably 0.01 parts by weight and preferably 20 parts by weight with respect to 100 parts by weight of the phenolic resin. When the content of the disulfide compound is less than 0.01 parts by weight, the obtained phenolic resin composition may be inferior in metal adhesion. When content of the said disulfide compound exceeds 20 weight part, the hardened | cured material of the obtained phenol-type resin composition may become inferior to heat resistance or mechanical strength. The minimum with more preferable content of the said disulfide compound is 0.1 weight part, and a more preferable upper limit is 10 weight part.
本発明のフェノール系樹脂組成物は、フェノール系樹脂を含有する。
本明細書において上記「フェノール系樹脂」とは、硬化物中の繰り返し単位中に、フェノール構造を有する樹脂を意味する。
上記フェノール系樹脂としては、例えば、ベンゾオキサジン樹脂、ノボラック型フェノール樹脂やレゾール型フェノール樹脂等のフェノール樹脂等が挙げられる。なかでも、得られるフェノール系樹脂組成物を硬化させる際に副生ガスを発生させないことから、ベンゾオキサジン樹脂が好適である。
The phenolic resin composition of the present invention contains a phenolic resin.
In the present specification, the above “phenolic resin” means a resin having a phenol structure in a repeating unit in a cured product.
Examples of the phenolic resin include benzoxazine resins, phenolic resins such as novolac type phenolic resins and resol type phenolic resins, and the like. Among these, a benzoxazine resin is preferable because no by-product gas is generated when the resulting phenol-based resin composition is cured.
上記ベンゾオキサジン樹脂とは、ベンゾオキサジン環を有する化合物を意味する。
上記ベンゾオキサジン樹脂としては、例えば、下記一般式(4−1)又は(4−2)で表される樹脂、下記一般式(5−1)、(5−2)、(5−3)、又は、(5−4)で表される樹脂、下記一般式(6)で表される樹脂、ベンゾオキサジンの開環重合により得られる樹脂等が挙げられる。なかでも、一般式(4−1)又は(4−2)で表される樹脂が好ましく、一般式(4−1)で表される樹脂がより好ましい。
The benzoxazine resin means a compound having a benzoxazine ring.
Examples of the benzoxazine resin include resins represented by the following general formula (4-1) or (4-2), the following general formulas (5-1), (5-2), (5-3), Alternatively, a resin represented by (5-4), a resin represented by the following general formula (6), a resin obtained by ring-opening polymerization of benzoxazine, and the like can be given. Especially, resin represented by general formula (4-1) or (4-2) is preferable, and resin represented by general formula (4-1) is more preferable.
式(4−1)、(4−2)中、nは1〜4の整数を表し、Y1は、水素、炭素数1〜8のアルキル基、シクロアルキル基、アリール基、アリル基、又は、アラルキル基を表し、Y2は、炭素数1〜8のアルキル基、シクロアルキル基、アリール基、アリル基、又は、アラルキル基を表す。 In formulas (4-1) and (4-2), n represents an integer of 1 to 4, and Y 1 represents hydrogen, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group, an aryl group, an allyl group, or Represents an aralkyl group, and Y 2 represents an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group, an aryl group, an allyl group, or an aralkyl group.
式(5−1)〜(5−4)中、X1は、CH2、C(CH3)2、O、S、又は、SO2を表す。 In formulas (5-1) to (5-4), X 1 represents CH 2 , C (CH 3 ) 2 , O, S, or SO 2 .
式(6)中、nは整数を表し、特に限定されないが、1〜20であることが好ましく、X2は、水素、炭素数1〜8のアルキル基、炭素数1〜4のアルコキシ基、メチロール基、及び、フェニル基からなる群より選択される少なくとも1種の官能基を表し、X3は、下記式(7−1)、(7−2)、(7−3)又は(7−4)で表される置換基を表す。 In formula (6), n represents an integer and is not particularly limited, but is preferably 1 to 20, and X 2 is hydrogen, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, It represents at least one functional group selected from the group consisting of a methylol group and a phenyl group, and X 3 represents the following formula (7-1), (7-2), (7-3) or (7- The substituent represented by 4) is represented.
また、上記フェノール樹脂としては、例えば、下記一般式(8)で表される樹脂等が挙げられる。 Moreover, as said phenol resin, resin etc. which are represented by following General formula (8) are mentioned, for example.
式(8)中、nは整数を表し、特に限定されないが、1〜20であることが好ましく、X4は、水素、炭素数1〜8のアルキル基、炭素数1〜4のアルコキシ基、メチロール基、及び、フェニル基からなる群より選択される少なくとも1種の官能基を表し、X5、X6は、炭素数1〜10のアルキル基を示す。 In formula (8), n represents an integer and is not particularly limited, but is preferably 1 to 20, and X 4 is hydrogen, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, It represents at least one functional group selected from the group consisting of a methylol group and a phenyl group, and X 5 and X 6 represent an alkyl group having 1 to 10 carbon atoms.
本発明のフェノール系樹脂組成物は、必要に応じて、フェノール系樹脂以外のその他の樹脂を含有してもよい。
上記その他の樹脂としては、例えば、エポキシ樹脂、ユリア樹脂、メラミン樹脂、不飽和ポリエステル、ビニルエステル樹脂、ジアリルフタレート樹脂、ポリウレタン、ケイ素樹脂、ポリイミド、塩化ビニル樹脂、塩化ビニリデン樹脂、酢酸ビニル樹脂、ポリスチレン、メタクリル樹脂、ポリエチレン、ポリプロピレン、フッ素樹脂、ポリアミド、ポリアセタール、ポリカーボネート、ポリエステル、ポリフェニレンエーテル、ポリフェニレンスルフィド、ポリアリレート、ポリスルホン、ポリエーテルスルホン、ポリエーテルエーテルケトン、液晶性ポリマー等が挙げられる。
The phenolic resin composition of the present invention may contain other resins other than the phenolic resin, if necessary.
Examples of the other resin include epoxy resin, urea resin, melamine resin, unsaturated polyester, vinyl ester resin, diallyl phthalate resin, polyurethane, silicon resin, polyimide, vinyl chloride resin, vinylidene chloride resin, vinyl acetate resin, polystyrene. Methacrylic resin, polyethylene, polypropylene, fluororesin, polyamide, polyacetal, polycarbonate, polyester, polyphenylene ether, polyphenylene sulfide, polyarylate, polysulfone, polyethersulfone, polyetheretherketone, liquid crystalline polymer and the like.
上記フェノール系樹脂としてノボラック型フェノール樹脂又はレゾール型フェノール樹脂を用いる場合、本発明のフェノール系樹脂組成物は、硬化剤を含有することが好ましい。
上記ノボラック型フェノール樹脂を用いる場合の硬化剤としては、ヘキサミチレンテトラミンが一般的であり、本発明のフェノール系樹脂組成物においても用いることができる。また、上記レゾール型フェノール樹脂を用いる場合の硬化剤としては、水酸化ナトリウム、炭酸ナトリウム、アルカリ土類金属の水酸化物、アンモニアや第三級アミン等が挙げられる。
その他の硬化剤としては、例えば、アミン系硬化剤、酸無水物系硬化剤、ポリアミド系硬化剤、潜在性硬化剤である三フッ化ホウ素アミン錯体やジシアンジアミド等を、それぞれの用途に応じて使用することができる。
上記アミン系硬化剤としては、例えば、ジエチレントリアミンやトリエチレンテトラミン等の脂肪族ポリアミン、メタフェニレンジアミンやジアミノジフェニルメタンやジアミノジフェニルスルホン等の芳香族ポリアミンを使用することができる。しかしながら、上記アミン系硬化剤は金属に対して優れた接着性を示すものの、人体への毒性や高い粘性および着色の原因となる。
上記酸無水物系硬化剤としては、例えば、無水コハク酸、無水マレイン酸、無水フタル酸、無水ヘキサヒドロフタル酸、無水メチルヘキサヒドロフタル酸、無水メチルテトラヒドロフタル酸、無水ナジック酸、水素化無水ナジック酸、無水トリメット酸、無水ピロメリット酸等を用いることができる。
上記酸無水物系硬化剤は低い粘度で扱いやすく、配合物の可使時間が比較的長く、硬化物が電気絶縁性、機械的特性、耐熱安定性、耐薬品性に優れるものとなり、更に、上記アミン系硬化剤と比較して安全衛生性に優れている等の利点を有しており、LED素子等の光半導体の封止材料、半導体の封止材料、電気・電子絶縁材料に好適に用いることができる。これらの酸無水物系硬化剤の中でも、無水フタル酸、無水ヘキサヒドロフタル酸、無水メチルヘキサヒドロフタル酸が好適に用いられる。
これらの硬化剤は、単独で用いてもよいし、2種以上を組み合わせて用いてもよい。
When a novolac type phenol resin or a resol type phenol resin is used as the phenolic resin, the phenolic resin composition of the present invention preferably contains a curing agent.
As the curing agent in the case of using the novolac type phenol resin, hexamitylenetetramine is generally used and can also be used in the phenolic resin composition of the present invention. Moreover, as a hardening | curing agent in the case of using the said resol type phenol resin, sodium hydroxide, sodium carbonate, the hydroxide of alkaline-earth metal, ammonia, a tertiary amine, etc. are mentioned.
Examples of other curing agents include amine-based curing agents, acid anhydride-based curing agents, polyamide-based curing agents, and latent curing agents such as boron trifluoride amine complex and dicyandiamide. can do.
Examples of the amine curing agent include aliphatic polyamines such as diethylenetriamine and triethylenetetramine, and aromatic polyamines such as metaphenylenediamine, diaminodiphenylmethane, and diaminodiphenylsulfone. However, although the amine-based curing agent exhibits excellent adhesion to metals, it causes toxicity to the human body, high viscosity, and coloring.
Examples of the acid anhydride-based curing agent include succinic anhydride, maleic anhydride, phthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, nadic anhydride, and hydrogenated anhydride. Nadic acid, trimetic anhydride, pyromellitic anhydride, etc. can be used.
The above acid anhydride curing agent is easy to handle with low viscosity, the pot life is relatively long, the cured product is excellent in electrical insulation, mechanical properties, heat stability, chemical resistance, It has advantages such as superior safety and hygiene compared to the amine curing agent, and is suitable for optical semiconductor sealing materials such as LED elements, semiconductor sealing materials, and electrical / electronic insulating materials. Can be used. Among these acid anhydride curing agents, phthalic anhydride, hexahydrophthalic anhydride, and methylhexahydrophthalic anhydride are preferably used.
These curing agents may be used alone or in combination of two or more.
一般に酸無水物系硬化剤などの硬化剤は、ポットライフが長く毒性が小さいが、一方で、硬化反応が比較的緩やかに進行するため、硬化に高温、長時間を要することがある。したがって、必要に応じて硬化剤と硬化促進剤とを併用してもよい。 In general, a curing agent such as an acid anhydride curing agent has a long pot life and low toxicity, but on the other hand, the curing reaction proceeds relatively slowly, and thus curing may require a high temperature and a long time. Therefore, you may use a hardening | curing agent and a hardening accelerator together as needed.
上記硬化促進剤としては、例えば、ベンジルメチルアミン等の第三級アミンや2−エチル−4−メチルイミダゾール等のイミダゾール類等が挙げられる。
また、上記硬化剤として半導体封止材料に好適なフェノール樹脂を用いる場合、上記硬化促進剤として、2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール等のイミダゾール類、2−(ジメチルアミノメチル)フェノール、1,8−ジアザビシクロ(5.4.0)−ウンデセン−7等の第3級アミン類、トリフェニルホスフィン等のホスフィン類、オクチル酸スズ等の金属化合物等を用いることが好ましい。
Examples of the curing accelerator include tertiary amines such as benzylmethylamine and imidazoles such as 2-ethyl-4-methylimidazole.
When a phenol resin suitable for a semiconductor sealing material is used as the curing agent, imidazoles such as 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2- Use tertiary amines such as (dimethylaminomethyl) phenol and 1,8-diazabicyclo (5.4.0) -undecene-7, phosphines such as triphenylphosphine, and metal compounds such as tin octylate. Is preferred.
本発明のフェノール系樹脂組成物は、無機充填剤を含有してもよい。
上記無機充填剤としては、例えば、ガラス繊維、溶融シリカ、結晶シリカ、アルミナ、水酸化アルミニウム、クレー、タルク、カオリン等が挙げられる。
The phenolic resin composition of the present invention may contain an inorganic filler.
Examples of the inorganic filler include glass fiber, fused silica, crystalline silica, alumina, aluminum hydroxide, clay, talc, and kaolin.
本発明のフェノール系樹脂組成物は、離型剤を含有してもよい。
上記離型剤としては、例えば、ステアリン酸、ステアリン酸亜鉛、モンタン酸、ポリオレフィン等が挙げられる。
The phenolic resin composition of the present invention may contain a release agent.
Examples of the release agent include stearic acid, zinc stearate, montanic acid, and polyolefin.
本発明のフェノール系樹脂組成物は、シランカップリング剤を含有してもよい。
上記シランカップリング剤としては、例えば、アミノシラン、エポキシシラン、メルカプトシラン等が挙げられる。
The phenolic resin composition of the present invention may contain a silane coupling agent.
Examples of the silane coupling agent include amino silane, epoxy silane, mercapto silane, and the like.
本発明のフェノール系樹脂組成物は、着色剤を含有してもよい。
上記着色剤としては、例えば、無機顔料や、カーボンブラック等の有機顔料等が挙げられる。
The phenolic resin composition of the present invention may contain a colorant.
Examples of the colorant include inorganic pigments and organic pigments such as carbon black.
本発明のフェノール系樹脂組成物を製造する方法は特に限定されず、上記フェノール系樹脂と、上記ジスルフィド化合物と、必要に応じて添加するその他の樹脂や硬化剤等の添加剤を、3本ロール等を用いて混合する方法等が挙げられる。 The method for producing the phenolic resin composition of the present invention is not particularly limited, and the above-mentioned phenolic resin, the above disulfide compound, and additives such as other resins and curing agents to be added as necessary are three rolls. The method of mixing using etc. is mentioned.
上記フェノール系樹脂と上記ジスルフィド化合物とを混合する際の温度は特に限定されないが、混合する温度の好ましい下限は50℃、好ましい上限は250℃である。上記フェノール系樹脂と上記ジスルフィド化合物とを混合する際の温度が50℃未満であると、ジスルフィド化合物が均一に分散されず、得られるフェノール系樹脂組成物の硬化物が耐熱性や機械的強度に劣るものとなることがある。上記フェノール系樹脂と上記ジスルフィド化合物とを混合する際の温度が250℃を超えると、ジスルフィド化合物が分解し、得られるフェノール系樹脂組成物の硬化物が耐熱性に劣るものとなることがある。上記フェノール系樹脂と上記ジスルフィド化合物とを混合する際の温度のより好ましい下限は100℃、より好ましい上限は200℃である。 Although the temperature at the time of mixing the said phenol-type resin and the said disulfide compound is not specifically limited, The preferable minimum of the temperature to mix is 50 degreeC, and a preferable upper limit is 250 degreeC. When the temperature at the time of mixing the phenolic resin and the disulfide compound is less than 50 ° C., the disulfide compound is not uniformly dispersed, and the cured product of the resulting phenolic resin composition has high heat resistance and mechanical strength. May be inferior. When the temperature at the time of mixing the phenolic resin and the disulfide compound exceeds 250 ° C., the disulfide compound is decomposed, and the cured product of the resulting phenolic resin composition may be inferior in heat resistance. The more preferable lower limit of the temperature when mixing the phenolic resin and the disulfide compound is 100 ° C., and the more preferable upper limit is 200 ° C.
本発明のフェノール系樹脂組成物は、金属密着性及び硬化物の耐熱性に優れるものであるため、半導体封止材料や、モーターの回転部品であるコンミテータ部品等に好適に用いられる。また、その他、塗料、コーティング剤、印刷インキ、レジストインキ、接着剤、成形材料、電気絶縁材料等の用途に用いることができる。 Since the phenolic resin composition of the present invention is excellent in metal adhesion and heat resistance of a cured product, it is suitably used for semiconductor encapsulating materials, commutator parts that are rotating parts of motors, and the like. In addition, it can be used for applications such as paints, coating agents, printing inks, resist inks, adhesives, molding materials, and electrical insulating materials.
本発明によれば、金属密着性及び硬化物の耐熱性に優れるフェノール系樹脂組成物を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the phenol resin composition excellent in metal adhesiveness and the heat resistance of hardened | cured material can be provided.
以下に実施例を掲げて本発明を更に詳しく説明するが、本発明はこれら実施例のみに限定されない。 Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples.
(実施例1)
フェノール系樹脂として、ベンゾオキサジン樹脂(四国化成社製、「F−a型」)100重量部に対して、ジスルフィド化合物として4,4’−ジチオジアニリン(住友精化社製、「DTDA」)0.1重量部を加えて、140℃に加熱しながら混合し、フェノール系樹脂組成物を得た。
Example 1
As phenolic resin, 4,4′-dithiodianiline (manufactured by Sumitomo Seika Co., Ltd., “DTDA”) as a disulfide compound with respect to 100 parts by weight of benzoxazine resin (manufactured by Shikoku Chemicals, “Fa type”) 0.1 part by weight was added and mixed while heating to 140 ° C. to obtain a phenolic resin composition.
(実施例2)
4,4’−ジチオジアニリンの配合量を1重量部に変更したこと以外は、実施例1と同様にしてフェノール系樹脂組成物を得た。
(Example 2)
A phenolic resin composition was obtained in the same manner as in Example 1 except that the amount of 4,4′-dithiodianiline was changed to 1 part by weight.
(実施例3)
4,4’−ジチオジアニリンの配合量を2重量部に変更したこと以外は、実施例1と同様にしてフェノール系樹脂組成物を得た。
(Example 3)
A phenolic resin composition was obtained in the same manner as in Example 1 except that the amount of 4,4′-dithiodianiline was changed to 2 parts by weight.
(実施例4)
4,4’−ジチオジアニリンに代えて、3,3’−ジヒドロキシジフェニルジスルフィド(東京化成社製)2重量部を配合したこと以外は、実施例1と同様にしてフェノール系樹脂組成物を得た。
Example 4
A phenolic resin composition was obtained in the same manner as in Example 1 except that 2 parts by weight of 3,3′-dihydroxydiphenyl disulfide (manufactured by Tokyo Chemical Industry Co., Ltd.) was blended in place of 4,4′-dithiodianiline. It was.
(実施例5)
4,4’−ジチオジアニリンに代えて、1、2−ジチアン2重量部を配合したこと以外は、実施例1と同様にしてフェノール系樹脂組成物を得た。
(Example 5)
A phenolic resin composition was obtained in the same manner as in Example 1 except that 2 parts by weight of 1,2-dithiane was blended in place of 4,4′-dithiodianiline.
(実施例6)
4,4’−ジチオジアニリンに代えて、trans−4,5−ジヒドロキシ−1,2−ジチアン(アルドリッチ社製)2重量部を配合したこと以外は、実施例1と同様にしてフェノール系樹脂組成物を得た。
(Example 6)
Instead of 4,4′-dithiodianiline, a phenolic resin was used in the same manner as in Example 1 except that 2 parts by weight of trans-4,5-dihydroxy-1,2-dithiane (manufactured by Aldrich) was blended. A composition was obtained.
(比較例1)
4,4’−ジチオジアニリンを配合せず、ベンゾオキサジン樹脂のみを用いた。
(Comparative Example 1)
No 4,4′-dithiodianiline was used and only benzoxazine resin was used.
(比較例2)
4,4’−ジチオジアニリンに代えて、モノスルフィド化合物である4,4’−チオジフェノール(住友精化社製、「TDP」)2重量部を配合したこと以外は、実施例1と同様にしてフェノール系樹脂組成物を得た。
(Comparative Example 2)
Example 1 except that 2 parts by weight of 4,4′-thiodiphenol (manufactured by Sumitomo Seika Co., Ltd., “TDP”), which is a monosulfide compound, was blended in place of 4,4′-dithiodianiline. Similarly, a phenolic resin composition was obtained.
(比較例3)
4,4’−ジチオジアニリンに代えて、トリアジン化合物であるメラミンモノマー(東京化成社製)2重量部を配合したこと以外は、実施例1と同様にしてフェノール系樹脂組成物を得た。
(Comparative Example 3)
A phenolic resin composition was obtained in the same manner as in Example 1 except that 2 parts by weight of a melamine monomer (manufactured by Tokyo Chemical Industry Co., Ltd.) as a triazine compound was blended in place of 4,4′-dithiodianiline.
(比較例4)
ビスフェノールA型エポキシ樹脂(三菱化学社製、「jER828」)100重量部に対して、硬化剤としてリカシッドMH−700(新日本理化社製、4−メチルヘキサヒドロ無水フタル酸/ヘキサヒドロ無水フタル酸=70/30)90重量部、硬化促進剤として2−エチル−4−メチルイミダゾール(四国化成社製、「キュアゾール2E4MZ」)1重量部を添加し、エポキシ樹脂組成物を得た。
(Comparative Example 4)
Ricacid MH-700 (manufactured by Nippon Nippon Chemical Co., Ltd., 4-methylhexahydrophthalic anhydride / hexahydrophthalic anhydride = 100 parts by weight of bisphenol A type epoxy resin (manufactured by Mitsubishi Chemical Corporation, “jER828”) = 70/30) 90 parts by weight, 1 part by weight of 2-ethyl-4-methylimidazole (manufactured by Shikoku Kasei Co., Ltd., “Cureazole 2E4MZ”) was added as a curing accelerator to obtain an epoxy resin composition.
(比較例5)
ビスフェノールA型エポキシ樹脂(三菱化学社製、「jER828」)100重量部に対して、4,4’−ジチオジアニリン(住友精化社製、「DTDA」)2重量部を溶解させ、硬化剤としてリカシッドMH−700(新日本理化社製、4−メチルヘキサヒドロ無水フタル酸/ヘキサヒドロ無水フタル酸=70/30)90重量部、硬化促進剤として2−エチル−4−メチルイミダゾール(四国化成社製、「キュアゾール2E4MZ」)1重量部を添加し、エポキシ樹脂組成物を得た。
(Comparative Example 5)
A curing agent is prepared by dissolving 2 parts by weight of 4,4′-dithiodianiline (“DTDA”, manufactured by Sumitomo Seika Co., Ltd.) with respect to 100 parts by weight of a bisphenol A type epoxy resin (manufactured by Mitsubishi Chemical, “jER828”). 90 parts by weight of Ricacid MH-700 (manufactured by Shin Nippon Rika Co., Ltd., 4-methylhexahydrophthalic anhydride / hexahydrophthalic anhydride = 70/30), and 2-ethyl-4-methylimidazole (Shikoku Kasei Co., Ltd.) as a curing accelerator 1 part by weight of “Cureazole 2E4MZ” was added to obtain an epoxy resin composition.
<評価>
実施例1〜6及び比較例2、3で得られたフェノール系樹脂組成物、比較例1のベンゾオキサジン樹脂、及び、比較例4、5で得られたエポキシ樹脂組成物について以下の評価を行った。結果を表1〜3に示した。
<Evaluation>
The following evaluation was performed on the epoxy resin compositions obtained in Examples 1 to 6 and Comparative Examples 2 and 3, the benzoxazine resin of Comparative Example 1 and Comparative Examples 4 and 5. It was. The results are shown in Tables 1-3.
(90度剥離接着強度試験)
公称厚さ35μm、平滑面粗度Rz=0.25μmの電解銅箔(福田金属粉箔工業社製)を5cm以上×5cm以上の大きさに切断し、アセトンで防腐剤を洗浄した後、10%硝酸で30秒間エッチングし、蒸留水で洗浄した後、60℃で乾燥させて、試験片とした。
実施例及び比較例で得られたフェノール樹脂組成物、ベンゾオキサジン樹脂、エポキシ樹脂組成物をそれぞれアルミ板に塗布し、その上から得られた試験片の平滑面を重ね合わせた。150℃で3時間加熱した後、更に、180℃で3時間加熱して硬化させ、硬化後、幅1cmずつカッターで切れ目を入れ、90度剥離試験片とした。なお、アルミ板については、アセトンで脱脂後、研磨紙(600番)で研磨し、アセトンで研磨屑を除去し乾燥させたものを使用した。
得られた90度剥離試験片について、DAGE−SERISE4000(アークラック社製)を用いて、試験速度25mm/minの条件で90度剥離接着強度試験を実施した。
(90 degree peel adhesion strength test)
An electrolytic copper foil (manufactured by Fukuda Metal Powder Co., Ltd.) having a nominal thickness of 35 μm and a smooth surface roughness Rz = 0.25 μm was cut into a size of 5 cm to 5 cm and washed with acetone to wash the preservative. Etching with% nitric acid for 30 seconds, washing with distilled water, and drying at 60 ° C. gave a test piece.
The phenol resin composition, the benzoxazine resin, and the epoxy resin composition obtained in the examples and comparative examples were each applied to an aluminum plate, and the smooth surfaces of the test pieces obtained thereon were overlaid. After heating at 150 ° C. for 3 hours, the coating was further cured by heating at 180 ° C. for 3 hours. After curing, a 1 cm width was cut with a cutter to obtain a 90 ° peel test piece. The aluminum plate was degreased with acetone, then polished with abrasive paper (No. 600), the polishing debris removed with acetone and dried.
About the obtained 90 degree | times peeling test piece, the 90 degree | times peeling adhesive strength test was implemented on the conditions of the test speed of 25 mm / min using DAGE-SERISE4000 (made by an arc rack company).
(5%重量減少温度)
実施例及び比較例で得られたフェノール系樹脂組成物、ベンゾオキサジン樹脂、エポキシ樹脂組成物をそれぞれ150℃で3時間、180℃で3時間加熱して硬化させ、硬化物を細かく粉砕し測定試料とした。
得られた試験片について、示差熱熱重量同時測定装置(エスアイアイ・ナノテクノロジー社製、「TG/DTA6200」)を用いて、昇温条件35〜530℃、10℃/minで、5%重量減少温度を測定した。
(5% weight loss temperature)
The phenolic resin composition, benzoxazine resin, and epoxy resin composition obtained in Examples and Comparative Examples were cured by heating at 150 ° C. for 3 hours and 180 ° C. for 3 hours, respectively, and the cured product was finely pulverized and measured. It was.
About the obtained test piece, 5% weight by temperature increase conditions 35-530 degreeC and 10 degrees C / min using the differential thermothermal weight simultaneous measuring apparatus (the SII nanotechnology company make, "TG / DTA6200"). The decrease temperature was measured.
(発熱温度)
実施例3、4及び比較例3で得られたフェノール系樹脂組成物、並びに、比較例1のベンゾオキサジン樹脂について、示差走査熱量計(エスアイアイ・ナノテクノロジー社製、「DSC6220」)を用いて、35〜320℃、10℃/minの昇温条件で硬化時の発熱温度を測定した。
なお、表3に示した第一発熱温度並びに第二発熱温度の発熱開始温度及び発熱ピーク温度が低い方が、より低温で硬化することを示す。
(Exothermic temperature)
For the phenolic resin compositions obtained in Examples 3 and 4 and Comparative Example 3 and the benzoxazine resin of Comparative Example 1, using a differential scanning calorimeter (“DSC 6220” manufactured by SII Nanotechnology Inc.) The exothermic temperature at the time of hardening was measured on temperature rising conditions of 35-320 degreeC and 10 degrees C / min.
In addition, it shows that the one where the heat generation start temperature and the heat generation peak temperature of the first heat generation temperature and the second heat generation temperature shown in Table 3 are lower is cured at a lower temperature.
表1より、上記一般式(1)で表されるジスルフィド化合物又は上記一般式(2)で表されるジスルフィド化合物をフェノール系樹脂に添加すると、これらのジスルフィド化合物を添加していない比較例1と比べて、銅に対する剥離強度及び耐熱性の向上効果が見られた。実施例3においては、ベンゾオキサジン樹脂100重量部に対して4,4’−ジチオジアニリン2重量部の配合で剥離強度が約5倍向上した。
一方で、表2より、ジスルフィド結合を有しないものをフェノール系樹脂に添加した場合(比較例2)では、金属密着性の向上効果が見られず、また、トリアジン化合物を添加した場合(比較例3)では、金属密着性の向上は見られたが、得られたフェノール系樹脂組成物の硬化物が耐熱性に劣るものとなった。
また、比較例4、5の結果より、上記一般式(1)で表されるジスルフィド化合物はエポキシ樹脂に対しては優れた効果を示さないことが分かる。また、耐熱性に関しても、該ジスルフィド化合物を配合すると、低下が見られた。
また、表3より、ベンゾオキサジン樹脂のみを用いた場合(比較例1)に対して、上記一般式(1)で表されるジスルフィド化合物を添加すると、硬化温度がより低温となった(実施例3、4)。トリアジン化合物を添加した場合(比較例3)は、硬化温度が低くなったが、実施例のものと比べると効果は小さかった。
From Table 1, when the disulfide compound represented by the general formula (1) or the disulfide compound represented by the general formula (2) is added to the phenolic resin, Comparative Example 1 in which these disulfide compounds are not added and In comparison, the effect of improving the peel strength and heat resistance against copper was observed. In Example 3, the peel strength was improved about 5 times by adding 2 parts by weight of 4,4′-dithiodianiline to 100 parts by weight of the benzoxazine resin.
On the other hand, from Table 2, when a compound having no disulfide bond was added to the phenolic resin (Comparative Example 2), the effect of improving metal adhesion was not observed, and when a triazine compound was added (Comparative Example) In 3), although the metal adhesion was improved, the cured product of the obtained phenolic resin composition was inferior in heat resistance.
Moreover, it turns out that the disulfide compound represented by the said General formula (1) does not show the outstanding effect with respect to an epoxy resin from the result of Comparative Examples 4 and 5. In addition, a decrease in heat resistance was observed when the disulfide compound was added.
Moreover, from Table 3, when only the benzoxazine resin was used (Comparative Example 1), the addition of the disulfide compound represented by the general formula (1) resulted in a lower curing temperature (Examples). 3, 4). When the triazine compound was added (Comparative Example 3), the curing temperature was low, but the effect was less than that of the Example.
本発明によれば、金属密着性及び硬化物の耐熱性に優れるフェノール系樹脂組成物を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the phenol resin composition excellent in metal adhesiveness and the heat resistance of hardened | cured material can be provided.
Claims (5)
前記ジスルフィド化合物は、下記一般式(1)で表される化合物及び/又は下記一般式(2)で表される化合物を含有する
ことを特徴とするフェノール系樹脂組成物。
The disulfide compound contains a compound represented by the following general formula (1) and / or a compound represented by the following general formula (2).
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| JP2019505619A (en) * | 2015-12-16 | 2019-02-28 | コンパニー ゼネラール デ エタブリッスマン ミシュラン | Polybenzoxazines that can be used to coat metals and their bonding to rubber |
| WO2020194612A1 (en) * | 2019-03-27 | 2020-10-01 | 日立化成株式会社 | Resin composition, cured product, semiconductor element, and electronic device |
| JP2021156618A (en) * | 2020-03-25 | 2021-10-07 | 住友精化株式会社 | Adhesive force prediction method of adhesive force improver of metal resin molding, and adhesive force improver |
| WO2023038044A1 (en) * | 2021-09-08 | 2023-03-16 | 株式会社カネカ | Benzoxazine composition, and use thereof |
| CN116368194A (en) * | 2020-10-14 | 2023-06-30 | 株式会社力森诺科 | Composition, resin composition and method for producing composite |
| KR20240038614A (en) * | 2022-09-16 | 2024-03-25 | 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 | Photoresist underlayer composition |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002003704A (en) * | 2000-06-26 | 2002-01-09 | Toshiba Chem Corp | Sealing resin composition and semiconductor sealing device |
| JP2003147165A (en) * | 2001-08-29 | 2003-05-21 | Osaka City | Thermosetting resin composition |
| JP2006028476A (en) * | 2004-06-18 | 2006-02-02 | Matsushita Electric Works Ltd | Semiconductor sealing resin composition and semiconductor device using the same |
| JP2008174711A (en) * | 2006-12-20 | 2008-07-31 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
| JP2009007405A (en) * | 2007-06-26 | 2009-01-15 | Panasonic Electric Works Co Ltd | Epoxy resin composition for semiconductor encapsulation and semiconductor device |
| JP2010006877A (en) * | 2008-06-24 | 2010-01-14 | Panasonic Electric Works Co Ltd | Epoxy resin composition for sealing and semiconductor device |
| WO2010018008A1 (en) * | 2008-08-12 | 2010-02-18 | Huntsman Advanced Materials (Switzerland) Gmbh | Thermosetting composition |
-
2011
- 2011-09-14 JP JP2011200658A patent/JP6186108B2/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002003704A (en) * | 2000-06-26 | 2002-01-09 | Toshiba Chem Corp | Sealing resin composition and semiconductor sealing device |
| JP2003147165A (en) * | 2001-08-29 | 2003-05-21 | Osaka City | Thermosetting resin composition |
| JP2006028476A (en) * | 2004-06-18 | 2006-02-02 | Matsushita Electric Works Ltd | Semiconductor sealing resin composition and semiconductor device using the same |
| JP2008174711A (en) * | 2006-12-20 | 2008-07-31 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
| JP2009007405A (en) * | 2007-06-26 | 2009-01-15 | Panasonic Electric Works Co Ltd | Epoxy resin composition for semiconductor encapsulation and semiconductor device |
| JP2010006877A (en) * | 2008-06-24 | 2010-01-14 | Panasonic Electric Works Co Ltd | Epoxy resin composition for sealing and semiconductor device |
| WO2010018008A1 (en) * | 2008-08-12 | 2010-02-18 | Huntsman Advanced Materials (Switzerland) Gmbh | Thermosetting composition |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019505619A (en) * | 2015-12-16 | 2019-02-28 | コンパニー ゼネラール デ エタブリッスマン ミシュラン | Polybenzoxazines that can be used to coat metals and their bonding to rubber |
| WO2020194612A1 (en) * | 2019-03-27 | 2020-10-01 | 日立化成株式会社 | Resin composition, cured product, semiconductor element, and electronic device |
| JP2021156618A (en) * | 2020-03-25 | 2021-10-07 | 住友精化株式会社 | Adhesive force prediction method of adhesive force improver of metal resin molding, and adhesive force improver |
| CN116368194A (en) * | 2020-10-14 | 2023-06-30 | 株式会社力森诺科 | Composition, resin composition and method for producing composite |
| WO2023038044A1 (en) * | 2021-09-08 | 2023-03-16 | 株式会社カネカ | Benzoxazine composition, and use thereof |
| KR20240038614A (en) * | 2022-09-16 | 2024-03-25 | 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 | Photoresist underlayer composition |
| KR102805938B1 (en) | 2022-09-16 | 2025-05-09 | 듀폰 일렉트로닉 머티어리얼즈 인터내셔널, 엘엘씨 | Photoresist underlayer composition |
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