JP2012235070A - Lithography apparatus, and manufacturing method of article - Google Patents

Abstract

A drawing apparatus advantageous in maintaining a function of blanking charged particle beams is provided.
A charged particle beam drawing apparatus 1 is a drawing apparatus that performs drawing on a substrate with a plurality of charged particle beams. Here, the charged particle beam drawing apparatus 1 includes at least two blanking deflector arrays (blanking deflector arrays 14 and 19) including a plurality of deflectors for blanking a plurality of charged particle beams, respectively.
[Selection] Figure 1

Description

  The present invention relates to a drawing apparatus that performs drawing on a substrate with a plurality of charged particle beams, and an article manufacturing method using the drawing apparatus.

  2. Description of the Related Art In recent years, drawing apparatuses used for manufacturing devices such as semiconductor integrated circuits have been required to be improved in drawing accuracy due to miniaturization of elements, complicated circuit patterns, or increased pattern data capacity. One way to achieve this is to deflect a charged particle beam such as an electron beam and control ON / OFF of irradiation of the charged particle beam to draw predetermined drawing data at a predetermined position on the substrate to be processed. There are known drawing apparatuses that perform the above-described processing. For example, Patent Document 1 discloses a charged beam drawing apparatus that performs drawing on a substrate with a plurality of charged particle beams. This drawing apparatus has an optical system that divides, deflects, and forms an image of a charged particle beam emitted from a crossover of an electron gun into a plurality of charged particle beams. In many cases, this optical system employs a blanking deflector as a mechanism for switching ON / OFF of irradiation of a charged particle beam as described above.

Japanese Patent Laid-Open No. 9-7538

  However, in a drawing apparatus that performs drawing on a substrate with a plurality of charged particle beams as shown in Patent Document 1, when a blanking deflector fails due to a disconnection or the like, the drive circuit applies to the blanking deflector. A predetermined voltage cannot be applied. In this case, the failed blanking deflector cannot turn on / off the desired charged particle beam irradiation, and a so-called white defect occurs in which the charged particle beam that should be shielded from light is drawn on the substrate. As a result, the manufactured device has degraded performance or cannot exhibit predetermined performance. Therefore, it is necessary to replace the failed blanking deflector. However, the blanking deflector itself is expensive, and the replacement work is usually complicated because the blanking deflector is usually configured inside the electronic lens barrel. Also, the down time of the drawing apparatus becomes longer. In recent years, in order to improve the productivity of semiconductor integrated circuits, there is a tendency to increase the number of charged particle beams that can be simultaneously drawn and to increase the area to be drawn at a time. Therefore, since the incidence of failure of blanking deflectors tends to increase due to the refinement of charged particle beams and apertures, or the increase in the number of charged particle beams, countermeasures against this are urgently needed.

  The present invention has been made in view of such a situation, and an object of the present invention is to provide a drawing apparatus that is advantageous in maintaining the function of blanking a charged particle beam.

  In order to solve the above problems, the present invention is a drawing apparatus that performs drawing on a substrate with a plurality of charged particle beams, and includes a plurality of deflectors for blanking a plurality of charged particle beams, respectively. It is characterized by comprising at least two stages of vessel arrays.

  According to the present invention, for example, it is possible to provide a drawing apparatus that is advantageous in maintaining the function of blanking charged particle beams.

It is a figure which shows the structure of the charged particle beam drawing apparatus which concerns on 1st Embodiment of this invention. It is a figure which shows the structure which concerns on a 1st blanking deflector. It is a figure which shows the structure which concerns on the 2nd blanking deflector by a 1st example. It is a figure which shows the structure which concerns on the 2nd blanking deflector by a 2nd example. It is a figure which shows the structure of the charged particle beam drawing apparatus which concerns on 2nd Embodiment of this invention. It is a figure which shows the structure which concerns on a 3rd blanking deflector. It is a figure which shows the structure which concerns on a 4th blanking deflector. It is a figure which shows the structure of the charged particle beam drawing apparatus which concerns on 3rd Embodiment of this invention. It is a figure which shows the structure which concerns on a 5th blanking deflector.

  Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.

(First embodiment)
First, a charged particle beam drawing apparatus (hereinafter simply referred to as “drawing apparatus”) according to a first embodiment of the present invention will be described. Hereinafter, the drawing apparatus described in each embodiment deflects a plurality of electron beams (charged particle beams), and individually controls ON / OFF of irradiation of the electron beam, thereby transferring predetermined drawing data of the substrate to be processed. It is assumed that a multi-beam method for drawing at a predetermined position is adopted. Here, the charged particle beam is not limited to the electron beam as in the present embodiment, and may be another charged particle beam such as an ion beam. FIG. 1 is a diagram illustrating a configuration of a drawing apparatus according to the present embodiment. In each of the following drawings, the Z-axis is taken in the electron beam irradiation direction on the substrate to be processed, and the X-axis and Y-axis perpendicular to each other are taken in a plane perpendicular to the Z-axis. Further, in the following drawings, the same components as those in FIG. The drawing apparatus 1 includes an electron gun 2, an optical system 4 that divides, deflects, and forms an electron beam emitted from a crossover 3 of the electron gun 2 into a plurality of electron beams, and a substrate stage that holds a substrate to be processed. 5 and a control unit 6 that controls the operation of each component of the drawing apparatus 1. The electron beam is attenuated immediately in an atmospheric pressure atmosphere, and the internal pressure of the above components except the control unit 6 is appropriately adjusted by a vacuum exhaust system (not shown) for the purpose of preventing discharge due to a high voltage. Installed in the space. For example, the electron gun 2 and the optical system 4 are installed in an electron optical barrel 7 that is maintained at a high degree of vacuum. Similarly, the substrate stage 5 is installed in a chamber 9 that is maintained at a relatively lower degree of vacuum than in the electron optical column 7. Further, the substrate to be processed 10 is a wafer made of single crystal silicon, for example, and a photosensitive resist is applied on the surface thereof.

  The electron gun 2 is a mechanism that emits an electron beam by applying heat or an electric field. In the figure, the trajectory 2a of the electron beam emitted from the crossover 3 is indicated by a dotted line. The optical system 4 includes a collimator lens 11, an aperture array 12, a first electrostatic lens array 13, a first blanking deflector array 14, a first blanking aperture array 15, and a deflector array 16 in order from the electron gun 2 side. , And a second electrostatic lens array 17. Furthermore, in addition to the above configuration, the optical system 4 of the present embodiment includes a third electrostatic lens array 18 and a second blanking deflector array in order between the first blanking aperture array 15 and the deflector array 16. 19 and a second blanking aperture array 20. The collimator lens 11 is an optical element that is composed of an electromagnetic lens and converts the electron beam diverged at the crossover 3 into a parallel beam. The aperture array 12 has a plurality of circular openings arranged in a matrix, and is a mechanism for dividing the electron beam incident from the collimator lens 11 into a plurality of electron beams. The first electrostatic lens array 13 is composed of three electrode plates having a circular opening (in the figure, the three electrode plates are shown as one body). An optical element that forms an image of an electron beam. The first blanking deflector array 14 and the first blanking aperture array 15 are both arranged in a matrix, and a mechanism for performing ON (non-blanking state) / OFF (blanking state) operation of irradiation of each electron beam. It is. In particular, the first blanking aperture array 15 is disposed at a position where the first electrostatic lens array 13 first forms an electron beam crossover. The deflector array 16 is a mechanism that deflects an image on the surface of the substrate to be processed 10 placed on the substrate stage 5 in the X direction. Further, the second electrostatic lens array 17 forms an image of the electron beam that has passed through the second blanking aperture array 20 on the substrate 10 to be processed, or is applied to an electron beam detector 21 (described later) installed on the substrate stage 5. On the other hand, the optical element forms an image of the original crossover 3.

  Here, the configuration of the first blanking deflector array 14 will be described for the following reference. FIG. 2 is a schematic diagram showing the configuration of the first blanking deflector array 14. The first blanking deflector array 14 includes a plurality of blanking devices (blanking deflectors) B. In the present embodiment, 16 blanking devices B1a to B1a arranged in 4 × 4 on the XY plane are arranged. It is assumed that it is composed of B4d. Each blanking device B has an opening 50 through which the electron beam converged by the first electrostatic lens array 13 passes. Further, the electrode 51 and the ground electrode are opposed to each other on the side surface of the opening 50. 52. Each electrode 51 is connected to each drive circuit 34 a to 34 p in the first blanking drive circuit 34 corresponding to the electrode 51. On the other hand, the earth electrode 52 is connected to the ground earth 53 of the first blanking deflector array 14.

  Further, the third electrostatic lens array 18, the second blanking deflector array 19, and the second blanking aperture array 20 compensate for a problem that has occurred in the blanking device B constituting the first blanking deflector array 14. It is a mechanism to do. That is, the optical system 4 of this embodiment includes two stages of the first blanking deflector array 14 and the second blanking deflector array 19 as the blanking deflector array in the electron beam irradiation direction. Here, the configurations and operations of the third electrostatic lens array 18 and the second blanking aperture array 20 are the same as those of the first electrostatic lens array 13 and the first blanking aperture array 15, respectively. On the other hand, the configuration and operation of the second blanking deflector array 19, which is a feature of the present embodiment, will be described later.

  The substrate stage 5 can be appropriately moved (driven) in the six-axis directions while holding the substrate 10 to be processed by, for example, electrostatic adsorption, and its position is measured in real time by a laser length measuring instrument (not shown). Is done. Further, the substrate stage 5 is provided with an electron beam detector (detection unit) 21 for detecting the incident position of the electron beam. The electron beam detector 21 is configured to be installed on the substrate stage 5 in the present embodiment, but may be configured to be insertable at one or more locations on the electron beam path, for example. Furthermore, the electron beam detector 21 is not limited to the substrate stage 5 and may be separately installed on a dedicated stage.

  The control unit 6 includes various control circuits that control the operation of each component related to drawing of the drawing apparatus 1 and a main control unit 30 that controls each control unit. As each control circuit, first, the first to third lens control circuits 31, 32, and 33 control operations of the collimator lens 11, the first electrostatic lens array 13, and the second electrostatic lens array 17, respectively. The first blanking drive circuit 34 operates the first blanking deflector array 14 based on the blanking signal generated by the drawing pattern generation circuit 35, the bitmap conversion circuit 36 and the first blanking command generation circuit 37. To control. Here, the drawing pattern generation circuit 35 generates a drawing pattern, and this drawing pattern is converted into bitmap data by the bitmap converter 36. The blanking command generation circuit 37 generates the blanking signal based on the bitmap data. The deflection amplifier unit 38 controls the operation of the deflector array 16 based on the deflection signal generated by the deflection signal generation circuit 39. The electron beam detection circuit 40 detects the output (current value) of the electron beam detector 21 to determine whether or not the electron beam is irradiated, and transmits the determination result to the main control unit 30. The stage control circuit 41 calculates a command target value for the substrate stage 5 based on the stage position coordinates which are commands from the main control unit 30, and drives the substrate stage 5 so that the position after driving becomes this target value. Let The stage control circuit 41 continuously scans the substrate to be processed 10 (substrate stage 5) in the Y direction during pattern drawing. At this time, the deflector array 16 deflects the image on the surface of the substrate to be processed 10 in the X direction with reference to the length measurement result of the substrate stage 5 such as a laser length measuring device. Then, the first blanking deflector array 14 performs ON / OFF of the electron beam irradiation so that a target dose can be obtained on the substrate 10 to be processed. Further, the control unit 6 includes a fourth lens control circuit 42 for controlling the operation of the third electrostatic lens array 18. In addition, the control unit 6 controls the operation of the second blanking deflector array 19, a second blanking command generation circuit 43, a second blanking drive circuit 44, and a blanking device selection circuit 45. including. Each circuit related to the operation of the second blanking deflector array 19 will be described later.

  Next, the operation of the drawing apparatus 1 will be described. First, the blanking operation by the normal first blanking deflector array 14 will be described. The blanking devices B1a to B4d constituting the first blanking deflector array 14 individually apply a voltage to the electrode 51 based on a drive command signal from the blanking command generation circuit 37, thereby individually performing a blanking operation. To implement. That is, when a predetermined voltage is applied to the electrode 51, an electric field is generated in the opening 50 between the electrode 51 and the earth electrode 52, and the electron beam passing through the opening 50 is deflected by the electric field, Blanking is performed by one blanking aperture array 15. On the other hand, if no voltage is applied to the electrode 51, the electron beam passes without being blanked by the electric field.

  Here, when a failure occurs in any circuit or wiring or electrode 51 between the blanking command generation circuit 37 and each electrode 51, the first blanking drive circuit 34 determines a predetermined value for the electrode 51. This voltage cannot be applied. Therefore, because of this failure, the blanking device B cannot appropriately blank the electron beam passing through the opening 50 (becomes inoperable). So-called white defects are generated. This white defect may cause deterioration of the performance of the device to be manufactured or cause the device to not exhibit a predetermined performance. Therefore, in the present embodiment, when the blanking device B cannot perform blanking of the electron beam due to a failure of the first blanking deflector array 14, the first blanking of the electron beam is surely performed. A 2 blanking deflector array 19 is employed.

Next, the configuration of the second blanking deflector array 19 will be described. FIG. 3 is a schematic diagram showing a configuration related to the second blanking deflector array 19. The second blanking deflector array 19 corresponds to each arrangement of the blanking devices B configured in the first blanking deflector array 14 and has the same number (same number) of blanking devices as to the irradiation axis of the electron beam. B1a 'to B4d'. Each blanking device B ′ has an opening 60 through which the electron beam converged by the third electrostatic lens array 18 passes, as with the blanking device B, and further faces each other on the side surface of the opening 60. Thus, an electrode 61 and a ground electrode 62 are provided. Here, the ground electrode 62 is connected to the ground ground 63 of the second blanking deflector array 19 in the same manner as the ground electrode 52. On the other hand, each electrode 61 is connected to one of the output ports 45b _{A to} 45b _{D in} the blanking device selection circuit 45.

As a circuit for controlling the operation of each of the blanking devices B1a ′ to B4d ′, first, the second blanking command generation circuit 43 can transmit the following two pieces of information. First, the second blanking command generation circuit 43 applies to any one of the drive circuits in the second blanking drive circuit (drive circuit group) 44 when a failure occurs in a certain blanking device B. Then, drive command information corresponding to the position of the blanking device B is transmitted. Secondly, the second blanking command generation circuit 43 transmits fault address information of the faulty blanking device B to the blanking device selection circuit (selection circuit) 45. Next, the second blanking drive circuit 44 does not have 16 drive circuits corresponding to all of the blanking devices B ′ inside, but includes four drive circuits 44a to 44d. Next, the blanking device selection circuit 45 first has four input terminals _45a 1 _{~45a 4} for receiving a drive signal from the respective driving circuits 44a~44d in the second blanking drive circuit 44. In addition, the blanking device selection circuit 45 includes four output units 45b _{A to} 45b _D that transmit a drive signal to each blanking device B ′. Each of the output units 45b _{A to} 45b _D further includes four output terminals (for example, 45b _{A1 to} 45b _A4 ) connected to the electrodes 61 of the four blanking devices B ′. Here, in the present embodiment, the number of installed drive circuits, input terminals corresponding to the drive circuits, and output units and output terminals inside the drive circuits is four. This is because the arrangement of the blanking device B in the first blanking deflector array 14 is set to 4 × 4, which is suitable for simplifying the drive control of the blanking device B ′.

  Next, the blanking operation by the second blanking deflector array 19 will be described. First, as a first example, it is assumed that a failure has occurred in one blanking device B1a in the first blanking deflector array 14. FIG. FIG. 3 shows the state of each control circuit in this case. First, the control unit 6 confirms whether or not the blanking operation is performed in each blanking device B of the first blanking deflector array 14. As a confirmation procedure, first, the control unit 6 determines whether or not an electron beam is detected when a blanking operation is performed by each blanking device B by the electron beam detector 21 installed on the substrate stage 5. To do. Here, the electron beam does not reach the electron beam detector 21 if the blanking operation is normal, but reaches the electron beam detector 21 when a failure occurs in the blanking device B. Resulting in. In particular, the main control unit 30 recognizes the address of the blanking device B that has failed through the electron beam detection circuit 40. That is, in this example, the main control unit 30 recognizes that the blanking device B1a is out of order.

  Next, the main control unit 30 gives the second blanking command generation circuit 37 the bitmap information of the drawing pattern by the bitmap conversion circuit 36 and the address information of the acquired blanking device B1a that has failed. Send. Here, the second blanking command generation circuit 37 extracts bitmapped data of the address of the blanking device B1a that has failed from the bitmapped data based on the received address information. Then, the second blanking command generation circuit 37 transmits drive command information based on the data of the failed blanking device B1a to the drive circuit 44a in the second blanking drive circuit 44. In addition, the second blanking command generation circuit 37 transmits address information of the faulty blanking device B1a to the blanking device selection circuit 45 separately from the transmission of the driving command information. Here, the blanking device selection circuit 45 electrically connects the drive circuit 44a and the blanking device B1a ′ in the second blanking deflector array 19 based on the received address information of the blanking device B1a. . Thereby, the voltage output from the drive circuit 44a is applied to the electrode 61 of the blanking device B1a ′, and the electron beam transmitted through the opening 60 can be blanked. That is, even if the blanking device B1a in the first blanking deflector array 14 fails and cannot be blanked, the blanking device B1a ′ corresponding to that position in the second blanking deflector array 19 is replaced by a blank. You can rank.

  Next, a second example of the blanking operation by the second blanking deflector array 19 will be described on the assumption that a failure has occurred in the two blanking devices B1a and B2d in the first blanking deflector array 14. FIG. 4 is a schematic diagram showing the configuration of the second blanking deflector array 19, and particularly shows the state of each control circuit in this case. First, in this case as well, as in the first example, the control unit 6 confirms whether or not the blanking operation is performed in each blanking device B of the first blanking deflector array 14, and the blanking device Recognize that B1a and B2d are out of order.

  Next, the main control unit 30 provides the second blanking command generation circuit 37 with the two blanking devices B1a that have been identified, together with the data obtained by converting the drawing pattern into a bitmap by the bitmap conversion circuit 36. The address information of B2d is transmitted. Here, the second blanking command generation circuit 37 extracts bitmapped data of the addresses of the blanking devices B1a and B2d from the bitmapped data based on the received address information. Then, the second blanking command generation circuit 37 transmits the respective driving command information based on the data of the blanking devices B1a and B2d to the driving circuit 44a and the driving circuit 44b in the second blanking driving circuit 44. To do. In addition, the second blanking command generation circuit 37 transmits address information of the blanking devices B1a and B2d to the blanking device selection circuit 45. Here, the blanking device selection circuit 45 first electrically connects the drive circuit 44a and the blanking device B1a ′ in the second blanking deflector array 19 based on the received address information of the blanking device B1a. Connecting. Similarly, the blanking device selection circuit 45 electrically connects the drive circuit 44b and the blanking device B2d ′ in the second blanking deflector array 19 based on the received address information of the blanking device B2d. . Thereby, the voltage output from the drive circuit 44a is applied to the electrode 61 of the blanking device B1a ′, and the electron beam transmitted through the opening 60 can be blanked. Further, the voltage output from the drive circuit 44b is applied to the electrode 61 of the blanking device B2d ′, and the electron beam transmitted through the opening 60 can be blanked. That is, even when the two blanking devices B1a and B2d in the first blanking deflector array 14 fail and cannot be blanked, the blanking devices B1a ′ and B2d ′ corresponding to the two positions are used instead. Can be blanked.

In this second embodiment, since the blanking device B1a and B2d is if faulty, within the blanking device selection circuit 45, an input terminal 45a ₁ and an output terminal _{45b A1} is connected, at the same time, an input terminal 45a ₂ and an output terminal _{45b B4} are connected. Here, for example, a case is assumed in which, in addition to the blanking device B1a, a blanking device B1d existing in the same row as the blanking device B1a is malfunctioning. In this case, blanking the ranking device selection circuit within 45, with an input terminal 45a ₁ and an output terminal _{45b A1} is connected, the input terminal 45a ₂ from the driving circuit 44b, an output terminal _{45b A1} and same output unit 45b _A The output terminal 45b _A4 inside is connected.

  In particular, in this embodiment, the number of drive circuits constituting the second blanking drive circuit 44 is smaller than the number of installed blanking devices B ′ included in the second blanking deflector array 19. In other words, the failure probability of the blanking device B is calculated in advance, and drive circuits corresponding to the expected number of failures of the blanking device B are configured in the second blanking drive circuit 44 (more than the predicted number of failures). Therefore, the occurrence of white defects can be efficiently suppressed. In addition, since the number of drive circuits constituting the second blanking drive circuit 44 is small, the amount of heat generated from these drive circuits can be suppressed, and the size of the second blanking drive circuit 44 itself can be reduced. Can do. Furthermore, since the number of wirings for each drive circuit can be reduced, the overall size of the drawing apparatus 1 can be minimized, which is advantageous in terms of cost. In the future, when speeding up the drawing apparatus 1 using a plurality of electron beams as in the present embodiment, it is required to increase the number of electron beams that can be drawn and increase the drawing area. This is particularly effective when the number of failures of the blanking device B increases.

  As described above, according to the present embodiment, it is not necessary to replace expensive blanking deflectors one by one in response to a failure of the first blanking deflector array, and drawing is performed in the normal drawing procedure. It is possible to provide a drawing apparatus that can perform the above-described processing. Furthermore, since the failure of the first blanking deflector array can be dealt with immediately, the drawing time is not prolonged and the productivity is not lowered.

(Second Embodiment)
Next, a drawing apparatus according to the second embodiment of the present invention will be described. FIG. 5 is a schematic diagram illustrating a configuration of the drawing apparatus 70 according to the present embodiment. In FIG. 5, the same components as those in FIG. The first feature of the drawing apparatus 70 of the present embodiment is the following two points. First, the drawing device 70 selects a circuit for controlling normal operation at a position corresponding to the first blanking deflector array 14 in the first embodiment and a blanking device selection such as the second blanking deflector array 19. A first parallel circuit including a circuit including a circuit is provided. In addition, the drawing apparatus 70 includes a second parallel circuit similar to the first parallel circuit also at a position corresponding to the second blanking deflector array 19 in the first embodiment. In the optical system 4, the blanking deflector array controlled by the first parallel circuit described in detail below is the third blanking deflector array 71, while the blanking deflector array controlled by the second parallel circuit. Is a fourth blanking deflector array 72.

  FIG. 6 is a schematic diagram showing a configuration related to the third blanking deflector array 71, while FIG. 7 is a schematic diagram showing a configuration related to the fourth blanking deflector array 72. As a second feature of the present embodiment, the third and fourth blanking deflector arrays 71 and 72 are respectively arranged in a normal blanking device B arranged in 4 × 4 as in the first embodiment. It has a configuration in which a ranking operation and a compensation for failure are mixed. Specifically, the third blanking deflector array 71 includes 16 blanking devices B including B1a ′ to B2d ′ that perform compensation at the time of failure and B3a to B4d that perform normal blanking operation. On the other hand, the fourth blanking deflector array 72, contrary to these arrangements, has 16 blankings of B1a to B2d that perform normal blanking operation and B3a ′ to B4d ′ that perform compensation at the time of failure. Device B is included.

  Next, a circuit for controlling the operation of the third and fourth blanking deflector arrays 71 and 72 will be described. As a circuit for controlling the operation of the third blanking deflector array 71, first, the third blanking command generation circuit 73 and the fourth blanking command generation circuit 74 are each connected to the bitmap conversion circuit 36. The third blanking drive circuit (second drive circuit group) 75 is connected to the third blanking command generation circuit 73, and the second blanking device selection circuit (selection circuit) 76 is connected to the third blanking drive. Connected to circuit 75. The operations of the third blanking drive circuit 75 and the second blanking device selection circuit 76 correspond to the second blanking drive circuit 44 and the blanking device selection circuit 45 in the first embodiment, respectively. Here, since the number of blanking devices B to be controlled by these circuits is half that in the first embodiment, the number of drive circuits installed in the third blanking drive circuit 75 and the second blanking device B are controlled. The number of terminals in the ranking device selection circuit 76 is also halved. On the other hand, a fourth blanking drive circuit (first drive circuit group) 77 connected to the fourth blanking command generation circuit 74 corresponds to the first blanking drive circuit 34 in the first embodiment and is driven internally. Similar to the above, the number of installed circuits is half that in the first embodiment.

  On the other hand, the configuration of the circuit that controls the operation of the fourth blanking deflector array 72 is opposite to the configuration of the circuit that controls the operation of the third blanking deflector array 71. That is, first, the fifth blanking command generation circuit 78 and the sixth blanking command generation circuit 79 are each connected to the bitmap conversion circuit 36. A fifth blanking drive circuit (first drive circuit) 80 connected to the fifth blanking command generation circuit 78 corresponds to the first blanking drive circuit 34 in the first embodiment, and is an internal drive circuit. The number of installations is half of that in the first embodiment as described above. On the other hand, the sixth blanking drive circuit (second drive circuit) 81 is connected to the sixth blanking command generation circuit 79, and the third blanking device selection circuit (selection circuit) 82 is connected to the sixth blanking command generation circuit 79. Connected to the drive circuit 81. The operations of the fifth blanking drive circuit 81 and the third blanking device selection circuit 82 correspond to the second blanking drive circuit 44 and the blanking device selection circuit 45 in the first embodiment, respectively. Again, the number of drive circuits installed in the sixth blanking drive circuit 81 and the number of terminals in the third blanking device selection circuit 82 are each halved. Since the operation of each control circuit is the same as that of the corresponding control circuit in the first embodiment, the description thereof is omitted.

  Next, the blanking operation by the third and fourth blanking deflector arrays 71 and 72 will be described. The following description will be made assuming that a failure has occurred in one blanking device B1a in the fourth blanking deflector array 72. First, similarly to the first embodiment, the control unit 6 confirms whether or not the blanking operation is performed in each blanking device B. However, in the case of this embodiment, the blanking device B to be confirmed is the blanking devices B3a to B4d of the third blanking deflector array 71 and the blanking devices of the fourth blanking deflector array 72. B1a to B2d. Here, the main control unit 30 recognizes that the blanking device B1a has failed.

  Next, the main control unit 30 provides the third blanking command generation circuit 73 with the bitmap information of the drawing pattern by the bitmap conversion circuit 36 and the acquired address information of the blanking device B1a that has failed. Send. Here, the third blanking command generation circuit 73 extracts bitmapped data of the address of the blanking device B1a from the bitmapped data based on the received address information. Then, the third blanking command generation circuit 73 transmits drive command information based on the data of the blanking device B1a to the drive circuit 75a in the third blanking drive circuit 75. In addition, the third blanking command generation circuit 73 transmits the address information of the blanking device B1a to the second blanking device selection circuit 76. Here, the blanking device selection circuit 76 electrically connects the drive circuit 75a and the blanking device B1a ′ in the third blanking deflector array 71 based on the received address information of the blanking device B1a. Thereby, the voltage output from the drive circuit 75a is applied to the electrode 51 of the blanking device B1a ′, and the electron beam transmitted through the opening 50 can be blanked. That is, even if the blanking device B in one blanking deflector array fails and cannot be blanked, the blanking device B ′ corresponding to that position in the other blanking deflector array blanks instead. be able to. On the other hand, when a blanking device B in the third blanking deflector array 71 fails, the above procedure is reversed as it is.

  Thus, according to the present embodiment, the same effects as those of the first embodiment can be obtained, and the circuit scales of the third and fourth blanking deflector arrays 71 and 72 can be set to the same size. . Thereby, since each calorific value from the 3rd blanking deflector array 71 and the 4th blanking deflector array 72 can be made uniform, it cools more efficiently and it applies to each part in drawing device 70. It becomes possible to suppress the influence of heat.

(Third embodiment)
Next, a drawing apparatus according to the third embodiment of the present invention will be described. FIG. 8 is a schematic diagram illustrating a configuration of the drawing apparatus 90 according to the present embodiment. In FIG. 8, the same components as those in FIG. 1 are denoted by the same reference numerals, and description thereof is omitted. The drawing apparatus 90 according to the present embodiment is characterized by the positions of the second blanking drive circuit 44 and the blanking device selection circuit 45 in the circuit for controlling the operation of the second blanking deflector array 19 according to the first embodiment. The point is to reverse. That is, the operation of the fifth blanking deflector array 91 that performs compensation at the time of failure of the blanking device B in the present embodiment includes the seventh blanking command generation circuit 92, the seventh blanking device selection circuit 93, 7 blanking drive circuit 94 controls.

FIG. 9 is a schematic diagram showing the configuration of the fifth blanking deflector array 91. Here, the configuration of the fifth blanking deflector array 91 itself is the same as that of the second blanking deflector array 19 according to the first embodiment. As a circuit for controlling the operation of each of the blanking devices B1a ′ to B4d ′ constituting the fifth blanking deflector array 91, first, the seventh blanking command generation circuit 92 is connected to the seventh blanking device selection circuit 93. On the other hand, the following two pieces of information can be transmitted. First, when a failure occurs in a certain blanking device B, the seventh blanking command generation circuit 92 applies the blanking command to any one or more of the input terminals in the seventh blanking device selection circuit 93. Drive command information corresponding to the position of the ranking device B is transmitted. Second, the seventh blanking command generation circuit 92 transmits fault address information of the faulty blanking device B to the seventh blanking device selection circuit 93. Next, the seventh blanking device selection circuit 93 first has _four input terminals 93a _{1 to} 93a 4 that receive the drive command signal from the seventh blanking command generation circuit 92. In addition, the seventh blanking device selection circuit 93 has 16 output terminals _93b 1 _{~93b 16} for transmitting a driving signal to each blanking device B'.

Next, the blanking operation by the fifth blanking deflector array 91 will be described. The following description is based on the assumption that a failure has occurred in one blanking device B1a in the first blanking deflector array 14. First, similarly to the first embodiment, the control unit 6 confirms whether or not the blanking operation is performed in each blanking device B. Here, the main control unit 30 recognizes that the blanking device B1a has failed. Next, the main control unit 30 provides the seventh blanking command generation circuit 92 with the data obtained by converting the drawing pattern into a bitmap by the bitmap conversion circuit 36, and the address information of the acquired blanking device B1a that has failed. Send. Here, the seventh blanking command generation circuit 92 extracts the bitmapped data of the address of the blanking device B1a from the bitmapped data based on the received address information. Then, the seventh blanking command generation circuit 92 transmits drive command information based on the data of the blanking device B1a and address information of the blanking device B1a to the seventh blanking device selection circuit 93. Here, the seventh blanking device selection circuit 93 based on the blanking device B1a address information received, connects the input terminal 93a ₁ and an output terminal 93 b _1, a drive circuit 94a and the blanking device B1a' Are electrically connected. Thereby, the voltage output from the drive circuit 94a is applied to the electrode 61 of the blanking device B1a ′, and the electron beam transmitted through the opening 60 can be blanked. That is, even when the blanking device B1a in the first blanking deflector array 14 fails and cannot be blanked, the blanking device B1a ′ corresponding to the position can blank instead.

  As described above, according to the present embodiment, the same effect as that of the first embodiment can be obtained, and the seventh blanking device selection circuit 93 is arranged next to the seventh blanking command generation circuit 92, so that Wiring can be reduced. Further, the data amount of the drive command information output from the seventh blanking command generation circuit 92 only needs to be transmitted as many as the number of blanking devices B that are expected to fail, so that the overall circuit scale can be reduced.

  In each of the above embodiments, the optical system inside the drawing apparatus has a configuration including two blanking deflector arrays in the electron beam irradiation direction, but the present invention is not limited to this. It can also be applied to a case where a blanking deflector array is further provided. In addition, the blanking deflector array for normal blanking operation employed in each of the above embodiments is blocked in advance so that none of the blanking device B is blocked in the manufacturing stage. It is desirable to perform a process such as drilling on the opened opening. If there is nothing that blocks the opening of the blanking device B at the manufacturing stage, the drawing apparatus of the embodiment can cope with a failure of the blanking device B suitably.

(Product manufacturing method)
The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing an article such as a micro device such as a semiconductor device or an element having a fine structure. The manufacturing method includes a step of forming a latent image pattern on the photosensitive agent on the substrate coated with the photosensitive agent using the above drawing apparatus (a step of drawing on the substrate), and the latent image pattern is formed in the step. Developing the substrate. Further, the manufacturing method may include other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

  As mentioned above, although preferable embodiment of this invention was described, this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

DESCRIPTION OF SYMBOLS 1 Drawing apparatus 10 Substrate 14 First blanking deflector array 19 Second blanking deflector array B Blanking device B 'Compensating blanking device

Claims (8)

A drawing apparatus for drawing on a substrate with a plurality of charged particle beams,
At least two stages of blanking deflector arrays including a plurality of deflectors for blanking each of the plurality of charged particle beams;
A drawing apparatus characterized by that. The operation of one deflector of the plurality of deflectors included in one blanking deflector array of the at least two stages of blanking deflector arrays is compensated by the other one blanking deflector array. To be
The drawing apparatus according to claim 1. A controller for controlling the at least two-stage blanking deflector array;
The controller drives a deflector included in the other blanking deflector array corresponding to the deflector to be compensated;
The drawing apparatus according to claim 2. The control unit selects a deflector included in the another blanking deflector array corresponding to the deflector to be compensated; and
A driving circuit for driving the other blanking deflector array through the selection circuit,
The drawing apparatus according to claim 3. The control unit includes a drive circuit that drives the other blanking deflector array;
A selection circuit that selects, via the drive circuit, a deflector included in the other blanking deflector array corresponding to the deflector to be compensated;
The drawing apparatus according to claim 3. The number of the drive circuits is less than the number of the plurality of deflectors included in the other one blanking deflector array.
The drawing apparatus according to claim 4. A detector that detects a charged particle beam through the at least two-stage blanking deflector array;
The control unit identifies the deflector to be compensated based on the output of the detection unit;
The drawing apparatus according to claim 3. Drawing on a substrate using the drawing apparatus according to any one of claims 1 to 7,
Developing the substrate on which the drawing has been performed in the step;
A method for producing an article comprising:

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