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JP2012243614A - Insulated wire, and electric coil and motor using the same - Google Patents

Insulated wire, and electric coil and motor using the same Download PDF

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JP2012243614A
JP2012243614A JP2011113318A JP2011113318A JP2012243614A JP 2012243614 A JP2012243614 A JP 2012243614A JP 2011113318 A JP2011113318 A JP 2011113318A JP 2011113318 A JP2011113318 A JP 2011113318A JP 2012243614 A JP2012243614 A JP 2012243614A
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polyimide
insulated wire
layer
insulating layer
resin
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Masataka Shinami
正隆 志波
Masaaki Yamauchi
雅晃 山内
Kengo Yoshida
健吾 吉田
Yuji Hatanaka
悠史 畑中
Junichi Imai
惇一 今井
Jun Sugawara
潤 菅原
Toru Shimizu
亨 清水
Hideaki Saito
秀明 齋藤
Yudai Furuya
雄大 古屋
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Sumitomo Electric Industries Ltd
Sumitomo Electric Wintec Inc
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Sumitomo Electric Industries Ltd
Sumitomo Electric Wintec Inc
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Abstract

PROBLEM TO BE SOLVED: To provide an insulated wire which is superior in heat resistance and processing resistance, specially superior in heat resistance after processing, and to provide an electric coil and a motor using the insulated wire.SOLUTION: An insulated wire includes a conductor, and an insulating layer having two or more layers for coating the conductor. An outermost layer of the insulating layer is a single polyimide layer formed by once applying and baking a polyimide resin varnish containing a polyimide precursor resin as a main ingredient. A resin constituting the insulating layer except the outermost layer is preferable to be selected from the group consisting of polyamide-imide, polyesterimide, polyetherimide and an H-class polyester resin.

Description

本発明は絶縁電線およびそれを用いた電機コイル、モータに関し、特に耐熱性及び耐加工性に優れる絶縁電線に関する。   The present invention relates to an insulated wire and an electric coil and a motor using the insulated wire, and more particularly to an insulated wire excellent in heat resistance and workability.

モータ等のコイル用巻線として用いられる絶縁電線において、導体を被覆する絶縁層(絶縁皮膜)には、優れた絶縁性、導体に対する密着性、耐熱性、機械的強度等が求められている。絶縁層を形成する樹脂としてはポリイミド樹脂、ポリアミドイミド樹脂、ポリエステルイミド樹脂等がある。   In an insulated wire used as a coil winding for a motor or the like, an insulating layer (insulating film) covering a conductor is required to have excellent insulation, adhesion to the conductor, heat resistance, mechanical strength, and the like. Examples of the resin forming the insulating layer include polyimide resin, polyamideimide resin, and polyesterimide resin.

また適用電圧が高い電気機器、例えば高電圧で使用されるモータ等では、電気機器を構成する絶縁電線に高電圧が印加され、その絶縁皮膜表面で部分放電(コロナ放電)が発生しやすくなる。コロナ放電の発生により局部的な温度上昇やオゾンやイオンの発生が引き起こされやすくなり、その結果絶縁電線の絶縁被膜に劣化が生じることで早期に絶縁破壊を起こし、電気機器の寿命が短くなる。高電圧で使用される絶縁電線には上記の理由によりコロナ放電開始電圧の向上も求められており、そのためには絶縁層の誘電率を低くすることが有効であることが知られている。   In addition, in an electric device having a high applied voltage, for example, a motor used at a high voltage, a high voltage is applied to an insulated wire constituting the electric device, and partial discharge (corona discharge) is likely to occur on the surface of the insulating film. The generation of corona discharge tends to cause a local temperature rise and the generation of ozone and ions. As a result, the insulation coating of the insulated wire is deteriorated, resulting in early dielectric breakdown and shortening the life of the electrical equipment. Insulated wires used at high voltages are also required to improve the corona discharge starting voltage for the above reasons, and it is known that reducing the dielectric constant of the insulating layer is effective for this purpose.

ポリイミド樹脂は絶縁電線の絶縁層として汎用されている樹脂の中では特に耐熱性に優れている。また誘電率が低く機械特性にも優れるため、要求特性の高い絶縁電線の絶縁層として用いられている。たとえば特許文献1には耐熱区分がC種(180℃以上のクラス)のエナメル線として、導体直上にポリイミド樹脂エナメル皮膜層が塗布焼付けされているエナメル線が開示されている。また特許文献2には、銅線の外周面にポリイミドワニスを多重回塗布・焼付けした後、その上からポリアミドイミドワニスを少なくとも1回塗布・焼付けしてエナメル皮膜を形成したポリアミドイミドオーバーコートポリイミド絶縁電線が開示されている。   Polyimide resin is particularly excellent in heat resistance among resins widely used as insulating layers for insulated wires. Moreover, since it has a low dielectric constant and excellent mechanical properties, it is used as an insulating layer for insulated wires with high required properties. For example, Patent Document 1 discloses an enameled wire in which a polyimide resin enamel film layer is applied and baked directly on a conductor as an enameled wire having a heat resistance class C (class of 180 ° C. or higher). Patent Document 2 discloses a polyamide-imide overcoat polyimide insulation in which a polyimide varnish is applied and baked on the outer peripheral surface of a copper wire, and then a polyamide-imide varnish is applied and baked at least once to form an enamel film. An electric wire is disclosed.

特開平9−198932号公報JP-A-9-198932 特開平5−130759号公報Japanese Patent Laid-Open No. 5-130759

上記のようにポリイミド樹脂は耐熱性、機械的特性、電気特性に優れる材料であるが、耐加工性、特に耐摩耗性が悪いという問題がある。絶縁電線をコイルとして使用する際には、コイルの占積率を上げるために絶縁電線を大きく変形させる加工を行う。例えば絶縁電線を捲線してコイルを形成した後にコイルをスロット中に挿入したり、あらかじめ変形させた絶縁電線同士を溶接してコイルを形成したりする。絶縁層の耐摩耗性が悪いと加工時に絶縁層が損傷を受けやすく、絶縁皮膜の割れやピンホールが発生して電気特性が不良となるおそれがある。   As described above, a polyimide resin is a material having excellent heat resistance, mechanical properties, and electrical properties, but has a problem of poor work resistance, particularly wear resistance. When using an insulated wire as a coil, the insulated wire is greatly deformed to increase the space factor of the coil. For example, after forming the coil by winding the insulated wire, the coil is inserted into the slot, or the insulated wire deformed in advance is welded to form the coil. If the abrasion resistance of the insulating layer is poor, the insulating layer is easily damaged during processing, and the insulating film may be cracked or pinholes may occur, resulting in poor electrical characteristics.

特に最外層にポリイミド皮膜を有する絶縁電線で耐加工性が低下することが知られている。そのためポリイミドを絶縁層として用いる場合、最外層にはポリイミド以外の樹脂からなる層を設けることが多い。特許文献1ではポリイミド皮膜層上にポリベンズイミダゾール樹脂からなる皮膜層を設けて耐熱性と耐摩耗性を両立している。また特許文献2では、耐摩擦性に優れるポリアミドイミドをポリイミド皮膜の外側に設けている。このように、耐加工性が必要な用途では、最外層にポリイミド皮膜を設けた絶縁電線は使用されていなかった。   In particular, it is known that the workability is lowered in an insulated wire having a polyimide film as the outermost layer. Therefore, when using polyimide as an insulating layer, a layer made of a resin other than polyimide is often provided as the outermost layer. In Patent Document 1, a film layer made of polybenzimidazole resin is provided on a polyimide film layer to achieve both heat resistance and wear resistance. Moreover, in patent document 2, the polyamide imide which is excellent in friction resistance is provided in the outer side of the polyimide membrane | film | coat. Thus, the insulated wire which provided the polyimide membrane | film | coat in the outermost layer was not used in the use where work resistance is required.

一方、車載用のモータ等の用途に使用される絶縁電線には高い耐熱性が求められている。特にコイルの占積率を上げるために絶縁電線を大きく変形させる加工を行った後高温雰囲気下で使用されることから、このような条件でも絶縁皮膜の劣化が生じないことが求められている。   On the other hand, high heat resistance is required for insulated wires used for applications such as in-vehicle motors. In particular, in order to increase the space factor of the coil, it is used in a high-temperature atmosphere after being subjected to processing that greatly deforms the insulated wire, so that it is required that the insulating film does not deteriorate even under such conditions.

本発明は上記の問題に鑑みてなされたものであり、耐熱性及び耐加工性に優れ、特に加工後の耐熱性に優れる絶縁電線、及びそれを用いた電機コイル、モータを提供することを課題とする。   The present invention has been made in view of the above problems, and it is an object to provide an insulated wire excellent in heat resistance and workability, particularly excellent in heat resistance after processing, and an electric coil and a motor using the insulated wire. And

本発明は、導体及び該導体を被覆する2層以上の絶縁層を有する絶縁電線であって、前記絶縁層の最外層はポリイミド前駆体を主成分とするポリイミド樹脂ワニスを1回塗布、焼き付けして形成された単層のポリイミド層である絶縁電線である(請求項1)。   The present invention relates to an insulated wire having a conductor and two or more insulating layers covering the conductor, and the outermost layer of the insulating layer is coated and baked once with a polyimide resin varnish mainly composed of a polyimide precursor. The insulated wire is a single-layer polyimide layer formed as described above (claim 1).

ポリイミドの耐摩耗性が低下する一つの要因は、ポリイミド皮膜の溶剤への溶解性が悪いことである。ポリイミド皮膜はポリイミド前駆体樹脂を溶剤に溶解したワニス(ポリイミド樹脂ワニス)を導体上に塗布、焼付けして形成する。焼付け時の熱によってポリイミド前駆体であるポリアミック酸がイミド化してポリイミドとなる。一度の塗布、焼付け工程では数μm程度の薄い皮膜しか形成できないため、通常塗布、焼付け工程を複数回繰り返して所定の厚み(数10μm程度)のポリイミド皮膜を形成する。そのため2回目以降の工程では前回の工程で形成されたポリイミド層の上にポリイミド樹脂ワニスを塗布することとなる。この時、ポリイミドワニスに含まれる溶剤が下層(前回の工程で形成されたポリイミド層)を若干溶解することで層間のなじみが良くなり層間の密着力が得られる。しかし焼付けてイミド化したポリイミドはポリアミドイミド等の他の樹脂と比べると溶剤への溶解性が低く、ワニスを塗布した際に下層がほとんど溶解しない。従って層間の密着力(接着力)が低下し、皮膜に大きな変形を起こすような加工を行うと層間の剥離に起因して皮膜が破壊される。   One factor that lowers the wear resistance of polyimide is that the solubility of the polyimide film in the solvent is poor. The polyimide film is formed by applying and baking a varnish (polyimide resin varnish) obtained by dissolving a polyimide precursor resin in a solvent on a conductor. The polyamic acid, which is a polyimide precursor, is imidized by heat during baking to become polyimide. Since only a thin film of about several μm can be formed by a single coating and baking process, a normal coating and baking process is repeated a plurality of times to form a polyimide film having a predetermined thickness (several tens of μm). Therefore, in the second and subsequent steps, a polyimide resin varnish is applied on the polyimide layer formed in the previous step. At this time, the solvent contained in the polyimide varnish dissolves the lower layer (polyimide layer formed in the previous step) slightly, so that the compatibility between the layers is improved and the adhesion between the layers is obtained. However, polyimides baked and imidized have lower solubility in solvents than other resins such as polyamideimide, and the lower layer hardly dissolves when varnish is applied. Accordingly, the adhesion force (adhesive force) between the layers is reduced, and if the processing causes a large deformation in the film, the film is destroyed due to the peeling between the layers.

塗布、焼付け工程を1回のみとして形成した単層のポリイミド層ではこのような層間の剥離に起因する問題は生じない。またポリイミド層の下層にはポリイミド以外の樹脂からなる絶縁層を形成する。ポリイミド以外の樹脂はポリイミドと比較すると溶剤への溶解性が優れているため、ポリイミド層とポリイミド層の下層である絶縁層との間の密着力、該下層中の層間密着力も良好である。   In a single-layer polyimide layer formed by applying and baking processes only once, such a problem due to delamination does not occur. An insulating layer made of a resin other than polyimide is formed below the polyimide layer. Since resins other than polyimide have better solubility in solvents than polyimide, the adhesion between the polyimide layer and the insulating layer, which is the lower layer of the polyimide layer, and the interlayer adhesion in the lower layer are also good.

さらに、最外層にポリイミド層を設けることで耐熱性及び加工後の耐熱性が良好となる。ポリイミドは絶縁電線の絶縁層として汎用されている樹脂の中では最も耐熱性が高く、また引張破断伸び、引張破断強度が高く靱性に優れている。絶縁電線を大きく変形させる加工を行う場合、絶縁皮膜は外側になるほど大きく変形されるので、最外層に靱性の高いポリイミド層を設けることで絶縁層全体の耐加工性(耐変形性)が良好となる。   Furthermore, heat resistance and heat resistance after processing become good by providing a polyimide layer as the outermost layer. Polyimide has the highest heat resistance among resins widely used as insulating layers for insulated wires, and has high tensile elongation at break and tensile strength at break and excellent toughness. When processing to greatly deform an insulated wire, the insulation film is greatly deformed as it goes to the outside. Therefore, by providing a polyimide layer with high toughness as the outermost layer, the workability (deformation resistance) of the entire insulating layer is good. Become.

最外層以外の絶縁層を構成する樹脂は、ポリアミドイミド、ポリエステルイミド、ポリエーテルイミド及びH種ポリエステルからなる群から選択される1種以上とすることが好ましい(請求項2)。これらの樹脂はポリイミドに次いで耐熱性及び靱性に優れているため、絶縁電線全体の耐熱性を向上できる。要求される絶縁電線の耐熱性に応じてこれらの樹脂を選択する。これらの樹脂は単独で用いても良いし、複数の種類を用いても良い。またそれぞれの樹脂から成る絶縁層は1回の塗布、焼付け工程で形成した単層としても良いし塗布、焼付け工程を複数回繰り返して形成した複数層としても良い。ポリアミドイミドはこれらの中でも特に耐熱性に優れているため、高い耐熱性が求められる用途では最外層以外の絶縁層を全てポリアミドイミドとすることが好ましい(請求項3)。ポリイミドは他の樹脂に比べて価格が高いため、このような構成の絶縁電線は絶縁層全体をポリイミドとした絶縁電線に比べて低コストとなる利点もある。   The resin constituting the insulating layer other than the outermost layer is preferably at least one selected from the group consisting of polyamideimide, polyesterimide, polyetherimide and H-type polyester. Since these resins are excellent in heat resistance and toughness after polyimide, the heat resistance of the entire insulated wire can be improved. These resins are selected according to the required heat resistance of the insulated wire. These resins may be used alone or in a plurality of types. The insulating layer made of each resin may be a single layer formed by one coating and baking process, or may be a plurality of layers formed by repeating the coating and baking processes a plurality of times. Of these, polyamide imide is particularly excellent in heat resistance, and therefore it is preferable to use polyamide imide for all insulating layers other than the outermost layer in applications where high heat resistance is required. Since polyimide is more expensive than other resins, the insulated wire having such a configuration also has an advantage that the cost is lower than an insulated wire in which the entire insulating layer is made of polyimide.

請求項4に記載の発明は、上記の絶縁電線を捲線してなる電機コイルである。また請求項5に記載の発明は、請求項4に記載の電機コイルを有するモータである。耐加工性及び耐熱性に優れた絶縁電線を使用していることから占積率の高いコイルが得られ、コイル及びモータの小型化が可能となると共に高温雰囲気下での使用が可能となる。   The invention described in claim 4 is an electric coil formed by winding the insulated wire. A fifth aspect of the present invention is a motor having the electric coil according to the fourth aspect. Since an insulated wire excellent in workability and heat resistance is used, a coil with a high space factor can be obtained, and the coil and motor can be miniaturized and used in a high-temperature atmosphere.

本発明によれば耐熱性及び耐加工性に優れ、特に加工後の耐熱性に優れる絶縁電線、及びそれを用いた電機コイル、モータを得ることができる。   According to the present invention, it is possible to obtain an insulated wire excellent in heat resistance and workability, and particularly excellent in heat resistance after processing, and an electric coil and a motor using the insulated wire.

本発明の絶縁電線の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the insulated wire of this invention. 本発明のコイルの一例を示す模式図である。It is a schematic diagram which shows an example of the coil of this invention. 本発明のモータの一例を示す模式図である。It is a schematic diagram which shows an example of the motor of this invention.

本発明の絶縁電線は、導体上に2層以上の絶縁層を有するものであり、該絶縁層の最外層は単層(1回塗り)のポリイミド層である。最外層以外の絶縁層にはポリイミド以外の任意の樹脂を使用することができる。ポリアミドイミド、ポリエステルイミド、ポリエーテルイミドH種ポリエステル、ポリエステルイミド、ポリウレタン等が最外層以外の絶縁層を構成する樹脂として例示される。   The insulated wire of the present invention has two or more insulating layers on a conductor, and the outermost layer of the insulating layer is a single layer (one-time coating) polyimide layer. Any resin other than polyimide can be used for the insulating layer other than the outermost layer. Polyamideimide, polyesterimide, polyetherimide H type polyester, polyesterimide, polyurethane and the like are exemplified as the resin constituting the insulating layer other than the outermost layer.

絶縁層は、上記の樹脂を溶剤に溶解した樹脂ワニスを導体上に直接又は他の層を介して塗布、焼付けして形成する。絶縁層全体の厚みは10μm〜150μm程度である。1回の塗布、焼付け工程では数μm程度の皮膜しか形成できないため、通常樹脂ワニスの塗布、焼付け工程を数回繰り返して絶縁層を形成する。上記のように最外層はポリイミド樹脂ワニスを1回塗布、焼付けした層となるので最外層の厚みは1μm〜5μm程度と薄いため、最外層以外の絶縁層は塗布、焼付け工程を複数回繰り返して形成する。   The insulating layer is formed by applying and baking a resin varnish obtained by dissolving the above resin in a solvent directly on the conductor or through another layer. The total thickness of the insulating layer is about 10 μm to 150 μm. Since only a coating of about several μm can be formed in one application and baking process, the insulating layer is usually formed by repeating the application and baking processes of resin varnish several times. As described above, since the outermost layer is a layer obtained by applying and baking the polyimide resin varnish once, the thickness of the outermost layer is as thin as about 1 μm to 5 μm. Therefore, the insulating layer other than the outermost layer is repeatedly applied and baked multiple times. Form.

塗布、焼付けは通常の絶縁電線の製造と同様に行うことができる。例えば導体又は絶縁層を被覆した導体に樹脂ワニスを塗布した後、設定温度を350〜500℃とした炉内を1パス当たり5〜10秒間通過させて焼付ける作業を数回繰り返して絶縁層を形成する。   Application and baking can be performed in the same manner as in the production of a normal insulated wire. For example, after applying a resin varnish to a conductor coated with a conductor or an insulating layer, the process of baking by passing the inside of a furnace with a set temperature of 350 to 500 ° C. for 5 to 10 seconds per pass is repeated several times. Form.

最外層以外の絶縁層を単独の樹脂とする場合は同じ樹脂ワニスを複数回塗布、焼付けする。また最外層以外の絶縁層を複数の樹脂で形成する場合は、第1の樹脂ワニスを1回又は数回塗布、焼付けして第1の樹脂からなる絶縁層を形成した後、第2の樹脂ワニスを1回又は数回塗布、焼付けして第2の樹脂からなる絶縁層を形成する。この工程を繰り返し、最後にポリイミド樹脂ワニスを1回塗布、焼き付けして最外層を形成する。   When an insulating layer other than the outermost layer is used as a single resin, the same resin varnish is applied and baked several times. When an insulating layer other than the outermost layer is formed of a plurality of resins, the first resin varnish is applied once or several times and baked to form an insulating layer made of the first resin, and then the second resin. A varnish is applied once or several times and baked to form an insulating layer made of the second resin. This process is repeated, and finally the polyimide resin varnish is applied and baked once to form the outermost layer.

導体としては、銅や銅合金、アルミニウム等を使用できる。導体の大きさやその断面形状は特に限定されないが、丸線の場合は導体径が100μm〜5mmのものが、平角線の場合は一辺の長さが500μm〜5mmのものが一般に使用される。   As the conductor, copper, copper alloy, aluminum or the like can be used. The size of the conductor and the cross-sectional shape thereof are not particularly limited, but in the case of a round wire, a conductor diameter of 100 μm to 5 mm is generally used, and in the case of a flat wire, one having a side length of 500 μm to 5 mm is generally used.

最外層を形成するポリイミド樹脂ワニスは、芳香族ジアミンと芳香族テトラカルボン酸二無水物とを反応して得られるポリイミド前駆体(ポリアミック酸)を主成分とする。芳香族ジアミンと芳香族テトラカルボン酸二無水物とを縮合重合反応させてポリイミド前駆体を合成する。   The polyimide resin varnish that forms the outermost layer is mainly composed of a polyimide precursor (polyamic acid) obtained by reacting an aromatic diamine and an aromatic tetracarboxylic dianhydride. A polyimide precursor is synthesized by a condensation polymerization reaction between an aromatic diamine and an aromatic tetracarboxylic dianhydride.

芳香族テトラカルボン酸二無水物としては、ピロメリット酸二無水物(PMDA)、4,4’−オキシジフタル酸二無水物(ODPA)、3,4,3’,4’−ビフェニルテトラカルボン酸二無水物(BPDA)、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物(BTDA)、3,3’,4,4’−ジフェニルスルホンテトラカルボン酸二無水物、ビシクロ(2,2,2)−オクト−7−エン−2,3,5,6−テトラカルボン酸二無水物、1,2,4,5−シクロヘキサンテトラカルボン酸二無水物、2,2−ビス(3,4−ジカルボンキシフェニル)ヘキサフルオロプロパン二無水物、5−(2,5−ジオキソテトラヒドロフリル)−3−メチル−3−シクロヘキセン−1,2−ジカルボン酸二無水物等が例示される。この中でもピロメリット酸二無水物(PMDA)は低分子量で剛直な構造を持つため、ポリイミド樹脂の耐熱性を向上できる点で好ましい。   As aromatic tetracarboxylic dianhydrides, pyromellitic dianhydride (PMDA), 4,4′-oxydiphthalic dianhydride (ODPA), 3,4,3 ′, 4′-biphenyltetracarboxylic dianhydride Anhydride (BPDA), 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride (BTDA), 3,3 ′, 4,4′-diphenylsulfone tetracarboxylic dianhydride, bicyclo (2, 2,2) -Oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 2,2-bis (3 Examples include 4-dicarboxyxyphenyl) hexafluoropropane dianhydride, 5- (2,5-dioxotetrahydrofuryl) -3-methyl-3-cyclohexene-1,2-dicarboxylic dianhydride, and the like. Among these, pyromellitic dianhydride (PMDA) is preferable because it has a low molecular weight and a rigid structure and can improve the heat resistance of the polyimide resin.

芳香族ジアミンとしては、4,4’−ジアミノジフェニルエーテル(ODA)、4,4’−メチレンジアニリン(MDA)、2,2−ビス[4−(アミノフェノキシ)フェニル]プロパン(BAPP)、1,4−ビス(4−アミノフェノキシ)ベンゼン(TPE−Q)、1,3−ビス(4−アミノフェノキシ)ベンゼン(TPE−R)、1,1−ビス[4−(4−アミノフェノキシ)フェニル]シクロヘキサン(4−APBZ)、1,3−ビス(3−アミノフェノキシ)ベンゼン(3−APB)、1,5−ビス(3−アミノフェノキシ)ナフタレン(1,5−BAPN)等が例示される。   Aromatic diamines include 4,4′-diaminodiphenyl ether (ODA), 4,4′-methylenedianiline (MDA), 2,2-bis [4- (aminophenoxy) phenyl] propane (BAPP), 1, 4-bis (4-aminophenoxy) benzene (TPE-Q), 1,3-bis (4-aminophenoxy) benzene (TPE-R), 1,1-bis [4- (4-aminophenoxy) phenyl] Examples include cyclohexane (4-APBZ), 1,3-bis (3-aminophenoxy) benzene (3-APB), 1,5-bis (3-aminophenoxy) naphthalene (1,5-BAPN), and the like.

芳香族ジアミンとしてODA、MDAを選択すると、ポリイミド樹脂の耐熱性を向上できる。また分子量の大きい2,2−ビス[4−(アミノフェノキシ)フェニル]プロパン(BAPP)、1,3−ビス(4−アミノフェノキシ)ベンゼン(TPE−R)、1,4−ビス(4−アミノフェノキシ)ベンゼン(TPE−Q)を選択すると、ポリイミド樹脂の誘電率を下げることができる。分子量の大きい芳香族ジアミンとODA、MDA等の分子量の小さい芳香族ジアミンとを組み合わせて使用すると、特性のバランスが取れたポリイミドが得られる。   When ODA or MDA is selected as the aromatic diamine, the heat resistance of the polyimide resin can be improved. Also, 2,2-bis [4- (aminophenoxy) phenyl] propane (BAPP), 1,3-bis (4-aminophenoxy) benzene (TPE-R), 1,4-bis (4-amino) having a large molecular weight When phenoxy) benzene (TPE-Q) is selected, the dielectric constant of the polyimide resin can be lowered. When an aromatic diamine having a high molecular weight and an aromatic diamine having a low molecular weight such as ODA or MDA are used in combination, a polyimide having a balanced property can be obtained.

上記の芳香族テトラカルボン酸二無水物と芳香族ジアミンを混合して反応させる。芳香族ジアミンの合計量(当量)と、芳香族テトラカルボン酸二無水物の合計量(当量)を約1:1とすると反応が良好に進行して好ましい。それぞれの材料を混合し、有機溶媒中で加熱して反応させてポリイミド前駆体樹脂を得る。   The above aromatic tetracarboxylic dianhydride and aromatic diamine are mixed and reacted. When the total amount (equivalent) of aromatic diamine and the total amount (equivalent) of aromatic tetracarboxylic dianhydride is about 1: 1, the reaction proceeds favorably, which is preferable. Each material is mixed and heated to react in an organic solvent to obtain a polyimide precursor resin.

有機溶媒としては、N−メチル−2−ピロリドン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、ジメチルスルホキシド、γ−ブチロラクトン等の非プロトン性極性有機溶媒が使用できる。これらの有機溶媒は単独で用いても2種以上を組み合わせても良い。   As the organic solvent, an aprotic polar organic solvent such as N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, and γ-butyrolactone can be used. These organic solvents may be used alone or in combination of two or more.

有機溶媒の量は、芳香族テトラカルボン酸二無水物、芳香族ジアミンを均一に分散させることができる量であれば良く特に制限されないが、通常これらの成分の合計量100質量部あたり100質量部〜1000質量部(樹脂濃度で10%〜50%程度となるように)使用する。有機溶媒量を少なくするとできあがったポリイミド樹脂ワニスの固形分量が多くなりコスト低減に有効である。   The amount of the organic solvent is not particularly limited as long as it is an amount capable of uniformly dispersing the aromatic tetracarboxylic dianhydride and the aromatic diamine, but usually 100 parts by mass per 100 parts by mass of the total amount of these components. ˜1000 parts by mass (so that the resin concentration is about 10% to 50%). If the amount of the organic solvent is reduced, the amount of the solid content of the polyimide resin varnish obtained is increased, which is effective for cost reduction.

ポリイミド樹脂ワニスには顔料、染料、無機又は有機のフィラー、潤滑剤、密着向上剤等の各種添加剤や反応性低分子、相溶化剤等を添加しても良い。密着向上剤としてメラミンを添加すると、導体との密着力を向上できる。さらに本発明の趣旨を損ねない範囲で他の樹脂を混合して使用することもできる。   Various additives such as pigments, dyes, inorganic or organic fillers, lubricants, adhesion improvers, reactive low molecules, compatibilizers, and the like may be added to the polyimide resin varnish. When melamine is added as an adhesion improver, adhesion with the conductor can be improved. Furthermore, other resins can be mixed and used within a range not impairing the gist of the present invention.

最外層以外の絶縁層にはポリアミドイミド、ポリエステルイミド、ポリエーテルイミド、H種ポリエステル、ポリエステルイミド、ポリウレタン等を主成分とする樹脂ワニスを使用する。耐熱性を向上するためにはポリアミドイミド、ポリエステルイミド、ポリエーテルイミド、H種ポリエステルが好ましく、特にポリアミドイミドが好ましい。   For the insulating layer other than the outermost layer, a resin varnish mainly composed of polyamideimide, polyesterimide, polyetherimide, H-type polyester, polyesterimide, polyurethane or the like is used. In order to improve heat resistance, polyamideimide, polyesterimide, polyetherimide, and H-type polyester are preferable, and polyamideimide is particularly preferable.

ポリアミドイミドは分子内にアミド結合とイミド結合を有する樹脂であり、芳香族ジイソシアネート成分を含むジイソシアネート成分と、トリメリット酸無水物を含む酸成分とを重合反応させて得られる。ジイソシアネート成分としてはジフェニルメタン−4,4’−ジイソシアネート(MDI)、ジフェニルメタン−3、3’−ジイソシアネート、ジフェニルメタン−3,4’−ジイソシアネート、ジフェニルエーテル−4,4’−ジイソシアネート、ベンゾフェノン−4、4’−ジイソシアネート、ジフェニルスルホン−4,4’−ジイソシアネート等の芳香族ジイソシアネートが使用できる。   Polyamideimide is a resin having an amide bond and an imide bond in the molecule, and is obtained by polymerizing a diisocyanate component containing an aromatic diisocyanate component and an acid component containing trimellitic anhydride. Examples of the diisocyanate component include diphenylmethane-4,4′-diisocyanate (MDI), diphenylmethane-3,3′-diisocyanate, diphenylmethane-3,4′-diisocyanate, diphenylether-4,4′-diisocyanate, benzophenone-4,4′-. Aromatic diisocyanates such as diisocyanate and diphenylsulfone-4,4′-diisocyanate can be used.

酸成分としては、トリメリット酸無水物(TMA)、1,2,5−トリメリット酸(1,2,5−ETM)、ビフェニルテトラカルボン酸二無水物、ベンゾフェノンテトラカルボン酸二無水物、ジフェニルスルホンテトラカルボン酸二無水物、オキシジフタル酸二無水物(OPDA)、ピロメリット酸二無水物(PMDA)、4,4’−(2,2’−ヘキサフルオロイソプロピリデン)ジフタル酸二無水物等が使用できる。イソシアネート成分、酸成分は1種類ずつ用いても良いし複数の種類を組み合わせても良い。   Acid components include trimellitic anhydride (TMA), 1,2,5-trimellitic acid (1,2,5-ETM), biphenyltetracarboxylic dianhydride, benzophenonetetracarboxylic dianhydride, diphenyl Sulfonetetracarboxylic dianhydride, oxydiphthalic dianhydride (OPDA), pyromellitic dianhydride (PMDA), 4,4 ′-(2,2′-hexafluoroisopropylidene) diphthalic dianhydride, etc. Can be used. The isocyanate component and the acid component may be used one by one or a plurality of types may be combined.

酸成分とジイソシアネート成分を略当量ずつ混合し、有機溶媒中で加熱して反応させてポリアミドイミド樹脂ワニスを得る。カプロラクタム化合物を反応系に加えても良い。有機溶媒としては、N−メチル−2−ピロリドン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、ジメチルスルホキシド、テトラメチル尿素、ヘキサエチルリン酸トリアミド、γ−ブチロラクタム等が使用できる。ポリアミドイミド樹脂ワニスには顔料、染料、無機又は有機のフィラー、潤滑剤、密着向上剤等の各種添加剤や反応性低分子、相溶化剤等を添加しても良い。   An acid component and a diisocyanate component are mixed in an approximately equivalent amount, and heated and reacted in an organic solvent to obtain a polyamideimide resin varnish. A caprolactam compound may be added to the reaction system. As the organic solvent, N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, tetramethylurea, hexaethylphosphoric triamide, γ-butyrolactam and the like can be used. Various additives such as pigments, dyes, inorganic or organic fillers, lubricants, adhesion improvers, reactive low molecules, compatibilizers, and the like may be added to the polyamideimide resin varnish.

図1は本発明の絶縁電線の一例を示す断面模式図である。断面が平角形状の導体3の外側に導体3を被覆する第1の絶縁層1、及び第1の絶縁層を被覆する第2の絶縁層2(最外層)がある。第1の絶縁層1はポリアミドイミド等任意の樹脂からなり、第2の絶縁層2はポリイミドからなる。なお本発明の絶縁電線はこの形状に限定されるものではない。   FIG. 1 is a schematic cross-sectional view showing an example of the insulated wire of the present invention. There are a first insulating layer 1 covering the conductor 3 and a second insulating layer 2 (outermost layer) covering the first insulating layer outside the conductor 3 having a rectangular cross section. The first insulating layer 1 is made of an arbitrary resin such as polyamideimide, and the second insulating layer 2 is made of polyimide. The insulated wire of the present invention is not limited to this shape.

図2(a)は本発明の電機コイルの一例を示す模式図であり、図2(b)は図2(a)のA−A’断面図である。磁性材料からなるコア13の外側に絶縁電線11を捲線して電機コイル12が形成される。コアと電機コイルからなる部材は、モータのロータやステータとして使用される。例えば図3に示すように、コア13と電機コイル12とからなる分割ステータ14を複数組み合わせて環状に配置したステータ15を、モータの構成部材として使用する。   FIG. 2A is a schematic view showing an example of the electric coil of the present invention, and FIG. 2B is a cross-sectional view taken along the line A-A ′ of FIG. The electric wire 12 is formed by winding the insulated wire 11 outside the core 13 made of a magnetic material. A member composed of a core and an electric coil is used as a rotor or a stator of a motor. For example, as shown in FIG. 3, a stator 15 in which a plurality of divided stators 14 including a core 13 and an electric coil 12 are combined and arranged in an annular shape is used as a constituent member of a motor.

次に、本発明を実施例に基づいてさらに詳細に説明する。なお本発明の範囲はこの実施例のみに限定されるものではない。   Next, the present invention will be described in more detail based on examples. The scope of the present invention is not limited to this example.

(ポリアミドイミド樹脂ワニスの作製)
温度計、冷却管、塩化カルシウム充填管、攪拌器、窒素吹き込み管を取り付けたフラスコ中に、前記窒素吹き込み管から毎分150mlの窒素ガスを流しながら、TMA(トリメリット酸無水物、三菱瓦斯化学(株)製)108.6g、MDI(メチレンジイソシアネート、三井武田ケミカル(株)製、商品名コスモネートPH)141.5gを投入した。次いでN−メチルピロリドン637gを入れ、攪拌器で攪拌しながら80℃で3時間加熱した。さらに約3時間かけて反応系の温度を140℃まで昇温した後140℃で1時間加熱した。1時間経過した段階で加熱を止め、放冷して不揮発分25%のポリアミドイミド樹脂ワニスとした。
(Preparation of polyamideimide resin varnish)
TMA (trimellitic anhydride, Mitsubishi Gas Chemical Co., Ltd.) was passed through a flask equipped with a thermometer, cooling pipe, calcium chloride filled pipe, stirrer, and nitrogen blowing pipe while flowing 150 ml of nitrogen gas from the nitrogen blowing pipe per minute. 108.6 g of MDI (methylene diisocyanate, manufactured by Mitsui Takeda Chemical Co., Ltd., trade name Cosmonate PH) was added. Next, 637 g of N-methylpyrrolidone was added and heated at 80 ° C. for 3 hours while stirring with a stirrer. Further, the temperature of the reaction system was raised to 140 ° C. over about 3 hours and then heated at 140 ° C. for 1 hour. When one hour had passed, heating was stopped and the product was allowed to cool to obtain a polyamideimide resin varnish having a nonvolatile content of 25%.

(ポリイミド樹脂ワニスの作製)
芳香族ジアミンである4,4’−ジアミノジフェニルエーテル(ODA)94.3gを803gのN−メチルピロリドンに溶解させた後、芳香族テトラカルボン酸二無水物であるピロメリット酸二無水物(PMDA)102.7gを加えて窒素雰囲気下室温で1時間撹拌した。その後60℃で20時間撹拌し反応を終え室温まで冷却し、不揮発分18%のポリイミド樹脂ワニスを得た。
(Preparation of polyimide resin varnish)
After dissolving 94.3 g of 4,4′-diaminodiphenyl ether (ODA), which is an aromatic diamine, in 803 g of N-methylpyrrolidone, pyromellitic dianhydride (PMDA), which is an aromatic tetracarboxylic dianhydride 102.7 g was added and stirred for 1 hour at room temperature under a nitrogen atmosphere. Thereafter, the mixture was stirred at 60 ° C. for 20 hours to finish the reaction and cooled to room temperature to obtain a polyimide resin varnish having a nonvolatile content of 18%.

(絶縁電線の作製)
(実施例1)
厚み1.5mm、幅3.0mmの平角導体(銅線)の表面に、ポリアミドイミド樹脂ワニスを塗布、焼付けする工程を11回繰り返して厚み約33μmのポリアミドイミド絶縁層を形成した後、ポリイミド樹脂ワニスを1回塗布、焼付けして厚み約3μmのポリイミド層を形成した。得られた絶縁電線は最外層がポリイミド単層であり、最外層以外の絶縁層はポリアミドイミドからなる。
(Production of insulated wires)
Example 1
After forming a polyamideimide insulating layer having a thickness of about 33 μm by repeating the process of applying and baking a polyamideimide resin varnish on the surface of a flat conductor (copper wire) having a thickness of 1.5 mm and a width of 3.0 mm, a polyimide resin is formed. The varnish was applied once and baked to form a polyimide layer having a thickness of about 3 μm. In the obtained insulated wire, the outermost layer is a polyimide single layer, and the insulating layers other than the outermost layer are made of polyamideimide.

(比較例1)
厚み1.5mm、幅3.0mmの平角導体(銅線)の表面に、ポリイミド樹脂ワニスを塗布、焼付けする工程を12回繰り返して厚み約36μmのポリイミド絶縁層を形成した。得られた絶縁電線の絶縁層は最外層を含めて全てポリイミドからなる。
(Comparative Example 1)
The process of applying and baking a polyimide resin varnish on the surface of a flat rectangular conductor (copper wire) having a thickness of 1.5 mm and a width of 3.0 mm was repeated 12 times to form a polyimide insulating layer having a thickness of about 36 μm. The insulating layer of the obtained insulated wire is entirely made of polyimide including the outermost layer.

(比較例2)
厚み1.5mm、幅3.0mmの平角導体(銅線)の表面に、ポリアミドイミド樹脂ワニスを塗布、焼付けする工程を12回繰り返して厚み約36μmのポリアミドイミド絶縁層を形成した。得られた絶縁電線の絶縁層は最外層を含めて全てポリアミドイミドからなる。
(Comparative Example 2)
The process of applying and baking a polyamideimide resin varnish on the surface of a flat rectangular conductor (copper wire) having a thickness of 1.5 mm and a width of 3.0 mm was repeated 12 times to form a polyamideimide insulating layer having a thickness of about 36 μm. The insulating layers of the obtained insulated wires are all made of polyamideimide including the outermost layer.

(比較例3)
厚み1.5mm、幅3.0mmの平角導体(銅線)の表面に、ポリアミドイミド樹脂ワニスを塗布、焼付けする工程を10回繰り返して厚み約30μmのポリアミドイミド絶縁層を形成した後、ポリイミド樹脂ワニスを塗布、焼付けする工程を2回繰り返して厚み約6μmのポリイミド層を形成した。得られた絶縁電線は最外層がポリイミド2層であり、最外層以外の絶縁層はポリアミドイミドからなる。
(Comparative Example 3)
After a polyamideimide insulating layer having a thickness of about 30 μm is formed by repeating the process of applying and baking a polyamideimide resin varnish on the surface of a flat conductor (copper wire) having a thickness of 1.5 mm and a width of 3.0 mm, a polyimide resin is formed. The process of applying and baking the varnish was repeated twice to form a polyimide layer having a thickness of about 6 μm. In the obtained insulated wire, the outermost layer is two polyimide layers, and the insulating layers other than the outermost layer are made of polyamideimide.

(長期耐熱性)
得られた絶縁電線を200℃の恒温槽中に500時間放置した後、絶縁層の状態を観察した。皮膜(絶縁層)に割れが発生したものを×、皮膜の割れが発生しなかったものを○とした。
(Long-term heat resistance)
The obtained insulated wire was left in a thermostatic bath at 200 ° C. for 500 hours, and then the state of the insulating layer was observed. The case where cracks occurred in the film (insulating layer) was rated as x, and the case where no film cracks occurred was marked as o.

(加工後の長期耐熱性)
得られた絶縁電線を、内径2mmとなるように180°の角度で折り曲げた状態で200℃の恒温槽中に500時間放置した後、絶縁層の状態を観察した。皮膜(絶縁層)に割れが発生したものを×、皮膜の割れが発生しなかったものを○とした。
(Long-term heat resistance after processing)
The obtained insulated wire was left in a thermostatic bath at 200 ° C. for 500 hours in a state of being bent at an angle of 180 ° so as to have an inner diameter of 2 mm, and then the state of the insulating layer was observed. The case where cracks occurred in the film (insulating layer) was rated as x, and the case where no film cracks occurred was marked as o.

(層間密着力)
得られた絶縁電線の絶縁層に、絶縁層の途中まで0.5mm幅の切れ込みを入れ、180°剥離試験により層間密着力を測定した。
(Interlayer adhesion)
The insulation layer of the obtained insulated wire was cut into a 0.5 mm width partway through the insulation layer, and the interlayer adhesion was measured by a 180 ° peel test.

(耐摩耗性)
JIS C3003 9.耐摩耗性試験に準拠し、耐摩耗性を評価した。直線状の試験片(絶縁電線)に連続的に増加する荷重が針に加わるようにし、その針で線の表面をこすっていく。針と導体間で導通が生じたときの荷重を破壊荷重とする。試験片の長辺が底辺となるように試料を置いた状態から30°回転させて1点目の測定を行う。さらに90°回転させて2点目、さらに90°回転させて3点目、さらに90°回転させて4点目の測定を行う。4点の平均値を算出して一方向摩耗の破壊荷重とした。以上の結果を表1に示す。なお表中ポリイミドはPI、ポリアミドイミドはPAIと記載している。
(Abrasion resistance)
JIS C3003 9. The wear resistance was evaluated according to the wear resistance test. A linear test piece (insulated wire) is subjected to a continuously increasing load on the needle, and the surface of the wire is rubbed with the needle. The load when conduction occurs between the needle and the conductor is the breaking load. The first measurement is performed by rotating 30 ° from the state where the sample is placed so that the long side of the test piece becomes the bottom side. Further, it is rotated 90 ° to measure the second point, further rotated 90 ° to the third point, and further rotated 90 ° to measure the fourth point. The average value of 4 points was calculated and used as a unidirectional wear fracture load. The results are shown in Table 1. In the table, polyimide is described as PI, and polyamideimide is described as PAI.

Figure 2012243614
Figure 2012243614

実施例1の絶縁電線は耐熱性、加工後の耐熱性、層間密着力、耐摩耗性ともに良好であり、耐熱性及び加工性に優れていることがわかる。絶縁層を全てポリイミドとした比較例1の絶縁電線は耐熱性、加工後の耐熱性は良好であるが、層間密着力が低く、耐摩耗性も悪い。絶縁層を全てポリアミドイミドとした比較例2の絶縁電線は層間密着力、耐摩耗性、耐熱性は良好であるが、加工後の耐熱性が悪い。比較例3の絶縁電線は耐熱性、加工後の耐熱性は良好であるが、層間密着力、耐摩耗性が悪い。実施例1と比較例3との違いは最外層のポリイミドの塗布回数のみであるが、特性には顕著な差が現れている。   It can be seen that the insulated wire of Example 1 has good heat resistance, heat resistance after processing, interlayer adhesion, and wear resistance, and is excellent in heat resistance and workability. The insulated wire of Comparative Example 1 in which the insulating layer is all polyimide has good heat resistance and heat resistance after processing, but has low interlayer adhesion and poor wear resistance. The insulated wire of Comparative Example 2 in which the insulating layer is all polyamideimide has good interlayer adhesion, wear resistance, and heat resistance, but has poor heat resistance after processing. The insulated wire of Comparative Example 3 has good heat resistance and heat resistance after processing, but has poor interlayer adhesion and wear resistance. The difference between Example 1 and Comparative Example 3 is only the number of times the outermost polyimide is applied, but a significant difference appears in the characteristics.

1 第1の絶縁層
2 第2の絶縁層(最外層)
3 導体
11 絶縁電線
12 電機コイル
13 コア
14 分割ステータ
15 ステータ
DESCRIPTION OF SYMBOLS 1 1st insulating layer 2 2nd insulating layer (outermost layer)
3 Conductor 11 Insulated Wire 12 Electric Coil 13 Core 14 Split Stator 15 Stator

Claims (5)

導体及び該導体を被覆する2層以上の絶縁層を有する絶縁電線であって、前記絶縁層の最外層は、ポリイミド前駆体を主成分とするポリイミド樹脂ワニスを1回塗布、焼付けして形成された単層のポリイミド層である絶縁電線。   An insulated wire having a conductor and two or more insulating layers covering the conductor, wherein the outermost layer of the insulating layer is formed by applying and baking a polyimide resin varnish mainly composed of a polyimide precursor. An insulated wire that is a single-layer polyimide layer. 前記最外層以外の絶縁層を構成する樹脂がポリアミドイミド、ポリエステルイミド、ポリエーテルイミド及びH種ポリエステルからなる群から選択される1種以上である、請求項2に記載の絶縁電線。   The insulated wire according to claim 2, wherein the resin constituting the insulating layer other than the outermost layer is at least one selected from the group consisting of polyamideimide, polyesterimide, polyetherimide, and H-type polyester. 前記最外層以外の絶縁層を構成する樹脂がポリアミドイミドである、請求項2に記載の絶縁電線。   The insulated wire according to claim 2, wherein the resin constituting the insulating layer other than the outermost layer is polyamideimide. 請求項1〜3のいずれか1項に記載の絶縁電線を捲線してなる電機コイル。   An electric coil formed by winding the insulated wire according to any one of claims 1 to 3. 請求項4に記載の電機コイルを有するモータ。   A motor having the electric coil according to claim 4.
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US20170178765A1 (en) * 2014-09-09 2017-06-22 Furukawa Electric Co., Ltd. Insulated wire, coil, and electrical or electronic equipment, and method of producing the insulated wire
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WO2015137254A1 (en) * 2014-03-12 2015-09-17 古河電気工業株式会社 Flat-type insulated wire, coil, and electric/electronic equipment
CN106062894A (en) * 2014-03-12 2016-10-26 古河电气工业株式会社 Flat insulated wires, coils and electrical and electronic equipment
US20160365164A1 (en) * 2014-03-12 2016-12-15 Furukawa Electric Co., Ltd. Rectangular Insulated Wire, Coil And Electrical And Electronic Device
JPWO2015137254A1 (en) * 2014-03-12 2017-04-06 古河電気工業株式会社 Flat rectangular insulated wires, coils and electrical / electronic equipment
CN106062894B (en) * 2014-03-12 2018-07-17 古河电气工业株式会社 Flat insulated wires, coils and electrical and electronic equipment
US10109389B2 (en) * 2014-03-12 2018-10-23 Furukawa Electric Co., Ltd. Rectangular insulated wire, coil and electrical and electronic device
US20170178765A1 (en) * 2014-09-09 2017-06-22 Furukawa Electric Co., Ltd. Insulated wire, coil, and electrical or electronic equipment, and method of producing the insulated wire
US10037833B2 (en) * 2014-09-09 2018-07-31 Furukawa Electric Co., Ltd. Insulated wire, coil, and electrical or electronic equipment, and method of producing the insulated wire
JP2023126257A (en) * 2018-12-10 2023-09-07 住友ベークライト株式会社 Resin composition for stator core insulation
JP7639854B2 (en) 2018-12-10 2025-03-05 住友ベークライト株式会社 Resin composition for insulating stator core
CN115148415A (en) * 2022-06-24 2022-10-04 索恩格汽车电动系统有限公司 Insulating member and method of making the same

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