JP2012242520A - Production method of original plate for pattern alignment layer for three-dimensional display - Google Patents

Abstract

There is provided an original plate for a three-dimensional display pattern alignment film capable of easily and mass-producing a pattern alignment film capable of forming a high-quality three-dimensional display pattern retardation film.
A first layer forming step of forming a first layer made of a metal material or an inorganic material, and a first uneven structure forming step of forming a minute line-shaped uneven structure on the surface of the first layer in a substantially constant direction. The second layer forming step of forming a second layer made of a metal material or an inorganic material on the surface of the first layer after the first uneven structure forming step, and the first uneven structure forming step on the surface of the second layer are 90. A second concavo-convex structure forming step for forming minute line-like concavo-convex structures in different directions in a substantially constant direction, and resist formation for forming a resist in a strip shape parallel to the surface of the second layer after the second concavo-convex structure forming step The manufacturing method of the original for pattern alignment films for three-dimensional displays which has a process, the 2nd layer peeling process which peels the exposed 2nd layer after a resist formation process, and the resist peeling process which peels a resist.
[Selection] Figure 1

Description

  The present invention relates to a three-dimensional display pattern alignment film master capable of easily and mass-producing a three-dimensional display pattern alignment film capable of forming a high-quality three-dimensional display pattern retardation film. It is.

  Conventionally, as a flat panel display, a two-dimensional display has been mainstream, but in recent years, a flat panel display capable of three-dimensional display has begun to attract attention, and some of them are commercially available. . Further, in future flat panel displays, it is a natural tendency to be capable of three-dimensional display, and flat panel displays capable of three-dimensional display are being studied in a wide range of fields.

  In order to perform three-dimensional display on a flat panel display, it is usually necessary to display a right-eye video and a left-eye video separately to the viewer in some manner. As a method for separately displaying the right-eye video and the left-eye video, for example, a passive method is known. Such a passive three-dimensional display method will be described with reference to the drawings. FIG. 18 is a schematic diagram illustrating an example of a passive three-dimensional display. As shown in FIG. 18, in this method, first, the pixels constituting the flat panel display are divided into a plurality of types of pixels, that is, a right-eye video display pixel and a left-eye video display pixel. The pixel displays a right-eye image, and the other group of pixels displays a left-eye image. In addition, the image for the right eye and the image for the left eye are converted into circularly polarized light by using a linearly polarizing plate and a pattern retardation film in which a patterned retardation layer corresponding to the division pattern of the pixel is formed. In addition, viewers can wear 3D display by wearing right-eye and left-eye circular polarizing glasses so that the right-eye video reaches only the right eye and the left-eye video only reaches the left eye. Things are passive.

  Such a passive method has an advantage that three-dimensional display can be easily performed by using the pattern retardation film and the corresponding circular polarizing glasses.

By the way, in patent document 1, as a manufacturing method of a pattern phase difference film, the roll plate which formed the pattern with the laser was used, and by contacting such a roll plate and the layer for alignment film formation, pattern-like on the surface. A method of forming a shaped pattern alignment film having fine irregularities is disclosed. Patent Document 1 describes a method of forming fine irregularities in a pattern on the same plane by polishing.
However, the pattern retardation film manufactured using the original plate on which the pattern is formed by the laser is a pattern of the retardation layer for the right eye and the left eye, i.e., near the end between the regions in which the alignment directions of the liquid crystal compounds are different, That is, an alignment defect in which the alignment direction of the liquid crystal compound is disturbed easily occurs at the boundary between the first retardation region and the second retardation region, and when used in a liquid crystal display device, the alignment defect is present in the liquid crystal near the end portion. There was a problem of causing it. As a result, there is a problem that light leaks from the vicinity of the end portion and the contrast becomes low. Further, when drawing fine irregularities with a laser, it takes considerable time to form irregularities of several tens nm and several hundreds nm over a large area (liquid crystal TV size) because fine irregularities are drawn one by one. . In addition, there is a problem that a device for controlling with high accuracy with a pitch of unevenness of several tens nm or several hundreds nm is required.
In general, the processing with a laser has a problem that the line width is several hundreds of nanometers at the lower limit and the line width of several tens of nanometers is difficult, and it is difficult to obtain a pattern alignment film having excellent alignment regulation power, There was a problem that the laser processing apparatus was expensive.
Moreover, although patent document 1 has description of the original plate preparation by a grinding | polishing method, when a pattern is formed by grinding | polishing on the same plane in the method of patent document 1, grinding | polishing is performed for every several hundred micrometer pattern area | region, There is a problem that a roll plate needs to be formed by combining region patterns on which fine irregularities are formed, and the process is complicated, requiring considerable time and high-precision work.

JP 2010-152296 A

  The present invention has been made in view of such circumstances, and a three-dimensional display pattern alignment film (hereinafter simply referred to as an alignment film) capable of forming a high-quality three-dimensional display pattern retardation film. The main object of the present invention is to provide a method for producing an original plate for a three-dimensional display pattern alignment film, which can be produced easily and in large quantities.

  In order to solve the above-described problems, the present invention provides a first layer forming step of forming a first layer made of a metal material or an inorganic material, and a fine line-shaped uneven structure on the surface of the first layer in a substantially constant direction. A first concavo-convex structure forming step to be formed; a second layer forming step of forming a second layer made of a metal material or an inorganic material on the surface of the first layer after the first concavo-convex structure forming step; and the second layer. A second concavo-convex structure forming step for forming a minute line-like concavo-convex structure in a substantially different direction on the surface of the first concavo-convex structure forming step, and the second layer after the second concavo-convex structure forming step. A resist forming step for forming a resist in a strip shape parallel to the surface of the substrate, a second layer peeling step for peeling the exposed second layer after the resist forming step, and a resist peeling step for peeling the resist. 3D table characterized by To provide a method of manufacturing a use pattern for alignment film precursor.

  According to the present invention, in the first concavo-convex structure forming step and the second concavo-convex structure forming step, a fine line-shaped concavo-convex structure is formed on the entire surface of the first layer and the second layer, and then only the second layer is etched. By having the second layer peeling step, a fine line-shaped uneven structure can be easily formed, and when forming a fine line-shaped uneven structure on the surface of the second layer, It is possible to prevent adverse effects such as damaging the surface of the first layer having a minute line-shaped uneven structure with different formation directions. Also, in the second layer peeling step, a resist is formed in a strip shape parallel to the surface of the second layer, and only a portion exposed in the second layer is selectively peeled, so that a minute line-shaped uneven structure is formed. The boundary between the formed first layer and the second layer on which the fine line-shaped uneven structure having different directions is formed becomes clear. The three-dimensional display pattern alignment film original plate manufactured in this way has different heights on the surface of the first layer and the surface of the second layer, and is minute on the surface of the first layer and the surface of the second layer. The formation direction of the line-shaped uneven structure is different. Therefore, by using the original plate for a 3D display pattern alignment film, the boundary between the first layer alignment region and the second alignment region is clear and corresponds to the difference in the formation direction of the minute line-shaped uneven structure. A high-quality alignment film capable of forming a pattern retardation film showing a retardation value can be obtained.

  The present invention provides a first layer forming step of forming a first layer made of a metal material or an inorganic material, and a first uneven structure forming step of forming a minute line-shaped uneven structure on the surface of the first layer in a substantially constant direction. A second layer forming step of forming a second layer made of a metal material or an inorganic material on the surface of the first layer after the first uneven structure forming step, and the first uneven structure on the surface of the second layer. A second concavo-convex structure forming step for forming a fine line-like concavo-convex structure in the same direction as the forming step in a substantially constant direction; and a strip in parallel to the surface of the second layer after the second concavo-convex structure forming step. A three-dimensional display comprising: a resist forming step to be formed; a second layer peeling step for peeling the exposed second layer after the resist forming step; and a resist peeling step for peeling the resist Manufacture of master for pattern alignment film The law provides.

  According to the present invention, in the first concavo-convex structure forming step and the second concavo-convex structure forming step, a fine line-shaped concavo-convex structure is formed on the entire surface of the first layer and the second layer, and then only the second layer is etched. By having the second layer peeling step, the fine line-shaped uneven structure can be easily formed, and the surface of the first layer is formed when forming the fine line-shaped uneven structure on the surface of the second layer. It is possible to prevent adverse effects such as damage. By using such an original plate for a three-dimensional display pattern alignment film, the boundary between the first layer alignment region and the second alignment region is clear and an amount corresponding to the difference in thickness between the first layer and the second layer. It is possible to obtain a high-quality alignment film capable of forming a pattern retardation film showing a retardation value of.

  According to the present invention, it is preferable that the original plate for a three-dimensional display pattern alignment film is a roll plate having a roll shape. The original plate for a three-dimensional display pattern alignment film of the present invention is a roll, that is, the original plate for a three-dimensional display pattern alignment film of the present invention is a roll plate. Can be formed into the alignment film forming layer continuously, that is, the pattern alignment film can be formed easily and in large quantities, and the production efficiency can be increased.

  According to the present invention, it is preferable that at least one of the first concavo-convex structure forming step or the second concavo-convex structure forming step is performed by roll pressing. By performing a roll press process to form a minute line-shaped uneven structure, the uneven structure forming step in the present invention can be easily performed. In addition, by roll pressing, it is possible to perform orientation and constant pressure, the thickness of the processed first layer and / or the second layer can be made uniform, and intermittent and continuous production is possible. Become.

  INDUSTRIAL APPLICABILITY The present invention can manufacture a pattern alignment film master for 3D display that can easily and in large quantities produce a pattern alignment film capable of forming a high-quality 3D display pattern retardation film. There is an effect.

It is process drawing which shows an example of the manufacturing method of the original for pattern alignment films for three-dimensional displays of this invention. It is the schematic which shows an example of the original plate for 3D display pattern orientation films of this invention. It is a schematic plan view which shows the surface of the original plate for three-dimensional display pattern alignment films of this invention. FIG. 4 is a sectional view taken along line AA in FIG. 3. It is the schematic which shows an example of the pattern phase difference film using the orientation film obtained by this invention. It is the schematic which shows an example of the roll press process in this invention. It is a schematic perspective view which shows an example of the aspect in which the fine line-shaped uneven structure of the surface of the 1st layer in this invention and a 2nd layer is formed. It is explanatory drawing explaining the minute line-shaped uneven structure in this invention. It is explanatory drawing explaining the minute line-shaped uneven structure in this invention. It is explanatory drawing explaining the minute line-shaped uneven structure in this invention. It is explanatory drawing explaining the minute line-shaped uneven structure in this invention. It is explanatory drawing explaining the pattern phase difference film using the pattern orientation film manufactured using the original plate of this invention. It is a schematic plan view which shows the surface of the original plate for three-dimensional display pattern alignment films of this invention. It is the BB sectional view taken on the line of FIG. It is the schematic which shows the other example of the pattern phase difference film using the orientation film obtained by this invention. It is explanatory drawing explaining the minute line-shaped uneven structure in this invention. It is explanatory drawing explaining the minute line-shaped uneven structure in this invention. It is the schematic which shows the example of the liquid crystal display device which can display a three-dimensional image | video with a passive system.

The present invention relates to a method for producing an original plate for a three-dimensional display pattern alignment film.
Hereinafter, the method for producing an original plate for a three-dimensional display pattern alignment film according to the present invention will be described in two modes, a first mode and a second mode.

A. 1st aspect It is a manufacturing method of the aspect in which the fine line-shaped uneven structure of the surface of a 1st layer and a 2nd layer is formed in a different direction in the original plate for three-dimensional display pattern orientation films of this invention.

  The method for producing an original plate for a three-dimensional display pattern alignment film according to this aspect includes a first layer forming step of forming a first layer made of a metal material or an inorganic material, and a fine line-shaped uneven structure on the surface of the first layer. And a second layer forming step of forming a second layer made of a metal material or an inorganic material on the surface of the first layer after the first uneven structure forming step. A second concavo-convex structure forming step for forming a fine line-shaped concavo-convex structure in a substantially different direction on the surface of the second layer in a direction different from the first concavo-convex structure forming step; and after the second concavo-convex structure forming step A resist forming step for forming a resist in a strip shape parallel to the surface of the second layer, a second layer peeling step for peeling the exposed second layer after the resist forming step, and a resist peeling for peeling the resist Having a process It is an butterfly.

A method for manufacturing the original plate for a three-dimensional display pattern alignment film of this embodiment will be described with reference to the drawings.
FIG. 1 is a process diagram showing an example of a method for producing a three-dimensional display pattern alignment film master according to this embodiment. As illustrated in FIG. 1, in the method for manufacturing a pattern alignment film master for three-dimensional display according to this aspect, first, a metal substrate is prepared and a first layer 1 composed of a single layer or a plurality of layers is formed (see FIG. 1 ( a)).
Next, the entire surface of the first layer 1 is subjected to cutting or roll pressing to form a minute line-shaped uneven structure 11 in a substantially constant direction, and the first layer 1 having the minute line-shaped uneven structure 11 is formed. Form (FIG. 1B).
Thereafter, the entire surface of the first layer 1 is dry-plated to form the second layer 3 made of a metal material or an inorganic material (FIG. 1C).
Next, the fine line-shaped concavo-convex structure 31 having a different direction from the fine line-shaped concavo-convex structure 11 formed in the first concavo-convex structure forming step on the entire surface of the second layer 3 is cut or roll pressed. (Fig. 1 (d)).
In this way, a resist material is applied to the surface of the second layer 3 on which the fine line-shaped concavo-convex structure 31 is formed to form a resist film, and the resist film is exposed in parallel strips by a laser drawing method or the like. Thus, a strip-shaped resist 2 parallel to the surface of the first layer 1 is formed (FIG. 1E).
The surface of the second layer 3 exposed by forming the resist 2 is selectively peeled off using an etching solution to expose the first layer 1 in which the minute line-shaped uneven structure 11 is formed (FIG. 1). (F)).
Finally, the resist 2 is peeled off to obtain a master plate 100 for a three-dimensional display pattern alignment film of the present invention (FIG. 1 (g)).
1A is a first layer forming step, FIG. 1B is a first uneven structure forming step, FIG. 1C is a second layer forming step, FIG. 1D is a second uneven structure forming step, and FIG. The resist forming step, (f) is the second layer peeling step, and (g) is the resist peeling step.

Next, the master plate 100 for a three-dimensional display pattern alignment film obtained by such a manufacturing method will be described with reference to the drawings. FIG. 2 is a schematic view showing an example of a three-dimensional display pattern alignment film master according to the present invention. FIG. 3 is a schematic plan view showing the surface of the original plate 100 for a three-dimensional display pattern alignment film, and FIG. 4 is a cross-sectional view taken along the line AA of FIG.
As illustrated in FIG. 3 and FIG. 4, the pattern alignment film original plate 100 for the three-dimensional display according to this aspect is made of a metal material or an inorganic material on the surface of which fine line-shaped uneven structures 11 are formed in a substantially constant direction. A first layer 1 and a second layer 3 formed of a metal material or an inorganic material formed in a parallel strip shape on the first layer 1 and having a fine line-shaped uneven structure 31 formed on the surface in a substantially constant direction; The formation direction of the minute line-shaped uneven structures 11 and 31 is such that the surface of the first layer 1 and the second layer 3, that is, the exposed first layer 1 and the second layer 3 adjacent to the second layer 3. The surface of the two layers 3 is different.
FIG. 2 shows an example in which the original plate 100 for a three-dimensional display pattern alignment film is a roll plate having a roll shape. When FIG. 3 is the surface of the original plate 100 for a three-dimensional display pattern alignment film shown in FIG. 2, the formation direction of the minute line-shaped concavo-convex structures 11 and 31 on the surfaces of the first layer 1 and the second layer 3 is as follows. They are 135 ° and 45 ° with respect to the rotation direction of the original plate (roll plate) 100 for a three-dimensional display pattern alignment film, and are different by 90 °. Moreover, the arrow in FIG. 3 shows the formation direction of the fine line-shaped uneven structures 11 and 31.

  Next, a three-dimensional display pattern alignment film master manufactured by the method for manufacturing a three-dimensional display pattern alignment film master according to this embodiment (hereinafter simply referred to as a three-dimensional display pattern alignment film master according to this embodiment). The pattern phase difference film constituted by the alignment film manufactured using the above-described method will be described with reference to the drawings. FIGS. 5A and 5B are schematic views showing an example of a patterned retardation film constituted by the alignment film produced according to this embodiment. As illustrated in FIG. 5A, the pattern retardation film 300 includes a transparent film substrate 7, an alignment film 8 formed on the transparent film substrate 7, and a position formed on the alignment film 8. And a phase difference layer 9. Here, in the patterned retardation film 300, the alignment film 8 has a first alignment region 8A in which a minute line-shaped uneven structure is formed so that the rod-shaped compound 10 can be arranged in one direction; A second alignment region 8B on which fine line-shaped uneven structures are formed is arranged in a pattern on the surface so that the rod-shaped compound 10 can be arranged in a direction orthogonal to the arrangement direction in the first alignment region 8A. The first alignment region 8A and the second alignment region 8B are formed corresponding to the first layer and the second layer of the three-dimensional display pattern alignment film original plate according to this aspect. As illustrated in FIG. 5B, in the patterned retardation film 300 (300A), the first retardation region 9A and the second retardation region 9B in which the slow axis directions are orthogonal to each other in the retardation layer 9, The first alignment region 8A and the second alignment region 8B are formed in the same pattern as the pattern formed.

According to this aspect, in the first concavo-convex structure forming step and the second concavo-convex structure forming step, a fine line-shaped concavo-convex structure is formed on the entire surface of the first layer and the second layer, and then only the second layer is etched. By having the second layer peeling step, a fine line-shaped uneven structure can be easily formed, and when forming a fine line-shaped uneven structure on the surface of the second layer, It is possible to prevent adverse effects such as damaging the surface of the first layer having a minute line-shaped uneven structure with different formation directions. Also, in the second layer peeling step, a resist is formed in a strip shape parallel to the surface of the second layer, and only a portion exposed in the second layer is selectively peeled, so that a minute line-shaped uneven structure is formed. The formed first layer and the first layer can be a three-dimensional display pattern alignment film original plate having a second layer formed with a fine line-shaped concavo-convex structure having different formation directions.
In addition, since the formation direction of the minute line-shaped uneven structure formed on the surface of the first layer and the surface of the second layer is different, the formation direction is different on the surface of the first alignment region and the surface of the second alignment region. It is possible to obtain an alignment film in which a simple line-shaped uneven structure is formed. The alignment film constitutes a pattern retardation film and has a function of arranging rod-shaped compounds contained in the retardation layer. In other words, when an alignment film is manufactured using the original plate for a three-dimensional display pattern alignment film of the present invention, it is included in the retardation layer due to the minute line-shaped uneven structure in which the first alignment region and the second alignment region are formed in different directions. It is possible to impart an orientation regulating force to the rod-shaped compound. Accordingly, the first alignment region and the first alignment region are different from each other in the formation direction of the fine line-shaped uneven structure formed on the surface of the first layer and the surface of the second layer of the original plate for a three-dimensional display pattern alignment film of this aspect. An alignment film in which the direction of formation of the fine line-shaped uneven structure in the two alignment regions can be manufactured, and the use of the alignment film differs by an amount corresponding to the difference in the direction of formation of the fine line-shaped uneven structure. A pattern retardation film showing the obtained retardation value can be obtained.
At this time, since the rod-shaped compounds are arranged so that the first alignment region and the second alignment region have different alignments, there is a problem that the alignment is disturbed at the boundary between the first alignment region and the second alignment region. However, the three-dimensional display pattern alignment film master according to this aspect of the present invention is different in that the first layer surface and the second layer surface have different heights, that is, the first layer and the second layer have different thicknesses. An alignment film in which the heights of the first alignment region and the second alignment region are different can be obtained. Therefore, it is possible to clarify the boundary between the first alignment region and the second alignment region, and to suppress alignment defects of the liquid crystal that are likely to occur in the vicinity of the pattern boundary between the adjacent first alignment region and the second alignment region. Thereby, the light leakage from the boundary vicinity can be suppressed, As a result, it can be set as the high quality alignment film which can suppress the fall of the contrast at the time of using for a display.

The manufacturing method of the original plate for a three-dimensional display pattern alignment film according to this aspect includes a first layer forming step, a first concavo-convex structure forming step, a second layer forming step, a second concavo-convex structure forming step, a resist forming step, and a second layer. It has a peeling process and a resist peeling process.
Hereafter, each process of the manufacturing method of the original for pattern orientation films for three-dimensional displays of this aspect is demonstrated in detail.

1. 1st layer formation process The 1st layer formation process in this aspect is a process of forming the 1st layer 1 which consists of a metal material or an inorganic material so that it may illustrate in Drawing 1 (a).
Note that the first layer may be a single layer, or the first layer may be formed on the surface of the base layer. In this embodiment, it is particularly preferable that it is formed on the underlayer. This is because it becomes easy to use the original plate for the three-dimensional display pattern alignment film as a roll plate, and to impart smoothness to the surface of the first layer.
Hereinafter, the description will be divided into the base layer preparation step and the first layer formation step.

(1) Underlayer preparation step The underlayer preparation step in this embodiment is a step of preparing a layer made of a metal material or an inorganic material that becomes the underlayer of the first layer.
The original plate for a three-dimensional display pattern alignment film in this aspect may or may not have a base layer, but it preferably has a base layer. preferable.

The material for the underlayer used in this embodiment is not particularly limited as long as it is made of a metal material or an inorganic material and has adhesion with the first layer formed on the underlayer.
When the underlayer is a metal material, it is preferably chromium, nickel, stainless steel (SUS), copper, aluminum or the like, and among them, aluminum is preferable.
Further, when the base layer is an inorganic material, titanium oxide (TiO ₂ , Ti ₃ O ₅ ), tantalum oxide (Ta ₂ O ₅ ), silicon oxide (SiO, SiO ₂ ), tin oxide (SnO ₂ ), Metal oxides such as aluminum oxide (Al ₂ O ₃ ), chromium oxide (Cr ₂ O ₃ ), barium titanate (BaTiO ₃ ), indium oxide (In ₂ O ₃ ), zinc oxide (ZnO, ZnO ₂ ), Carbides such as TiC, SiC, BC, WC, nitrides such as TiN, SiN, CrN, BN, AIN, CN, ZrN, barium fluoride (BaF ₂ ), magnesium fluoride (MgF ₂ ), magnesium oxide ( MgO), diamond-like carbon (DLC), glassy carbon, ceramic, silicon nitride, carbon nitride, etc. Command like coating, TiC, SiC, BC, carbides such as WC, TiN, SiN, CrN, BN, AIN, CN, be a nitride such as ZrN preferred. Since these inorganic materials have a relatively high hardness, the first concavo-convex structure can be formed with high accuracy.

  Examples of the shape of such an underlayer include a plate shape and a roll shape, and among these, a roll shape is preferable. The pattern alignment film for 3D display according to this aspect is a roll, that is, the pattern alignment film for 3D display according to this aspect can be used as a roll, so that the pattern alignment film for 3D display Since it can be formed into an alignment film forming layer continuously while rotating the original plate, that is, it can be easily formed in a large amount and can be manufactured with high production efficiency. It is.

Further, the roll shape is not particularly limited as long as it can stably form an alignment film. Specifically, the roll shape can be a roll shape, a sleeve shape, etc. It is preferable that
This is because, by using the sleeve shape, it is possible to manufacture the pattern alignment film with high manufacturing efficiency using the original plate for the three-dimensional display pattern alignment film. Further, the sleeve-shaped original plate for pattern alignment film for three-dimensional display is advantageous in that it is lighter and easier to handle than the roll-shaped original.
Here, specifically as a roll shape, a roll with a shaft, a pipe without a shaft, etc. can be mentioned. Here, the shaftless pipe refers to a cylindrical pipe having a thickness of 3000 μm or more.
The sleeve shape represents a seamless belt-like body, which can be easily deformed by air pressure or stress, and specifically refers to a cylindrical shape having a thickness of 1000 μm or less.
In the present embodiment, in the case of a roll shape such as a roll shape or a sleeve shape, it is preferable that the seamless shape is seamless, but a plate-like base layer having a cylindrical seam can also be used.

  When a first layer described later is laminated on the underlayer, the surface of the underlayer is preferably excellent in smoothness. When forming the line-shaped uneven structure on the surface of the first layer, if the underlying layer of the first layer is inferior in surface smoothness, the surface smoothness of the first layer is adversely affected, and the line-shaped uneven structure is accurate. It may be difficult to form well. In particular, when the first layer is a DLC layer, the DLC layer is a relatively thin layer and thus is easily affected by the surface roughness of the underlayer.

  The method for imparting excellent smoothness to the underlayer is not particularly limited as long as the desired smoothness can be obtained, and examples thereof include a cutting method such as supermirror polishing.

The surface roughness of the underlayer is not particularly limited as long as it does not adversely affect the surface of the first layer. For example, Ra = 10000 nm or less is preferable, and Ra = 5000 nm or less is particularly preferable. It is particularly preferable that Ra = 1000 nm or less.
In addition, "surface roughness (Ra)" here is "arithmetic mean surface roughness", and is measured based on JIS-B0601.

(2) First layer forming step The first layer forming step in this aspect is a step of forming a first layer made of a metal material or an inorganic material on the underlayer when having an underlayer, When the base layer is not provided, this is a step of preparing a first layer made of a metal material or an inorganic material.
Hereinafter, the case where the base layer is provided and the case where the base layer is not provided will be described separately.

(A) When it has a base layer When the original for pattern orientation film for three-dimensional displays of this aspect has a base layer, the 1st layer used for this aspect is formed in the surface of the base layer mentioned above.

The method for forming the first layer is not particularly limited as long as it is a method capable of forming the first layer made of a metal material or an inorganic material on the surface of the base layer described above. For example, wet plating treatment, dry plating treatment Etc.
Examples of the wet plating process include an electroplating method, an electroless plating method, a hot dip galvanizing method, a hot dip aluminum plating method, and an insoluble anode method.
As the dry plating treatment, chemical vapor deposition such as vacuum deposition plating method, resistance heating method, sputtering method, ion plating method, etc., physical vapor deposition method (PVD method), atmospheric pressure CVD method, reduced pressure CVD method, plasma CVD method, etc. Method (CVD method) and the like.

  As described above, the material of the first layer formed on the surface of the underlayer is made of a metal material or an inorganic material, has a desired adhesiveness with the above-described underlayer, and further in a second layer peeling step described later. There is no particular limitation as long as it has resistance to the etching solution used for peeling the second layer formed on the first layer. Moreover, in the 1st uneven | corrugated structure formation process mentioned later, if a micro linear uneven | corrugated structure can be formed in the surface of a 1st layer, it will not specifically limit. Specifically, it can be the same as the material of the underlayer described above, but as the material of the first layer in this embodiment, nickel, chromium, copper, stainless steel (SUS), diamond-like carbon (DLC), aluminum Of these, nickel, chromium and DLC are preferable, and DLC is particularly preferable. This is because DLC is hard, so that a fine line-shaped uneven structure can be formed on the surface with high accuracy.

Note that the material of the underlayer and the material of the first layer may be the same material or different materials. When the material of the underlayer and the first layer are different, the combination of the respective materials (underlayer / first layer) is preferably chromium / DLC or nickel / DLC. This is because desired adhesion can be obtained.
Further, when the base layer is aluminum and the first layer is LDC, it is preferable to provide a layer made of chromium or nickel between the base layer and the first layer. This is because the adhesion between the aluminum layer and the DLC layer can be improved.

The surface of the first layer is preferably excellent in smoothness. When forming the fine line-shaped uneven structure on the surface of the first layer, if the first layer is inferior in surface smoothness, the fine line-shaped unevenness is formed on the surface of the first layer in the first uneven structure forming step described later. This is because it may be difficult to accurately form the structure.
The method for imparting excellent smoothness to the surface of the first layer is not particularly limited as long as desired smoothness can be obtained, and examples thereof include a cutting method such as super mirror polishing. .

The surface roughness of the first layer is not particularly limited as long as a fine line-shaped uneven structure can be accurately formed on the surface of the first layer in the first uneven structure forming step described later. For example, Ra = 10000 nm or less is preferable, Ra = 5000 nm or less is particularly preferable, and Ra = 1000 nm or less is particularly preferable.
In addition, "surface roughness (Ra)" here is "arithmetic mean surface roughness", and is measured based on JIS-B0601.

The thickness of the first layer is not particularly limited as long as a line-shaped uneven structure can be formed in the first uneven structure forming step described later, and is, for example, in the range of 1 nm to 5000 μm. Is preferable, and in particular, it is preferably in the range of 10 nm to 1000 μm, and particularly preferably in the range of 50 nm to 5 μm.
In addition, the thickness of the said 1st layer shall point out the total thickness which totaled the thickness of the 1st layer, and the thickness of the base layer.

(B) When the base layer is not provided When the three-dimensional display pattern alignment film master of this aspect does not have the base layer, the first layer forming step in this aspect is the first made of a metal material or an inorganic material. It is a process of preparing a layer.

  The material of the first layer used in this embodiment is made of a metal material or an inorganic material, has the desired adhesion to the above-described underlayer, and is formed on the first layer in the second layer peeling step described later. There is no particular limitation as long as it has resistance to an etching solution or the like used for peeling the second layer. Moreover, in the 1st uneven | corrugated structure formation process mentioned later, if a micro linear uneven | corrugated structure can be formed in the surface of a 1st layer, it will not specifically limit. Specifically, it can be the same as the material of the underlayer described above, but as the material of the first layer in this embodiment, nickel, chromium, copper, stainless steel (SUS), diamond-like carbon (DLC), aluminum Of these, nickel, chromium and DLC are preferable, and DLC is particularly preferable. This is because DLC is hard, so that a fine line-shaped uneven structure can be formed on the surface with high accuracy.

  The shape of the first layer is not particularly limited as long as a fine line-shaped uneven structure can be formed on the surface in a substantially constant direction, and examples thereof include a plate shape and a roll shape. However, a roll shape is preferable. The shape of the first layer can be the same as the contents described in the section “(1) Preparatory layer preparation step”, and thus the description thereof is omitted here.

  The surface of the first layer is preferably excellent in smoothness. When forming the fine line-shaped uneven structure on the surface of the first layer, if the first layer is inferior in surface smoothness, the fine line-shaped unevenness is formed on the surface of the first layer in the first uneven structure forming step described later. This is because it may be difficult to accurately form the structure. The surface smoothness can be the same as the content described in the section “(a) When a base layer is provided”, and thus description thereof is omitted here.

  The thickness of the first layer is not particularly limited as long as it can form a line-shaped uneven structure in the first uneven structure forming step described later and has a self-supporting property.

2. 1st uneven | corrugated structure formation process The 1st uneven | corrugated structure formation process in this aspect forms the 1st layer 1 which consists of a metal material or an inorganic material, as shown in FIG.1 (b), On the surface of the said 1st layer 1 This is a step of forming the minute line-shaped uneven structure 11 in a substantially constant direction.

The method for forming the fine line-shaped concavo-convex structure of this aspect is not particularly limited as long as it is a method that can form a line-shaped concavo-convex structure in a desired size and direction, but for example, on the surface of the first layer On the other hand, there can be exemplified a cutting process for polishing and a roll press process for forming by pressing a mold having an uneven pattern.
Hereinafter, cutting and roll pressing will be described.

(1) Cutting process The cutting process used in this step is a cutting process in which a desired uneven structure is formed by polishing the surface. In this step, a general method can be used, for example, grinding stone polishing, paper polishing, tape polishing, sand blasting method, shot blasting method, grit blasting method, blasting method such as glass bead blasting method, nylon, polypropylene, chloride While supplying synthetic resin hair made of synthetic fibers such as vinyl resin, non-woven fabric, animal hair, brush graining method using brush material such as steel wire, wire graining method by scratching with metal wire, supplying slurry liquid containing abrasive Examples thereof include a brush polishing method (brush graining method), a ball grain method, a buffing method such as a liquid honing method, and a shot peening method. In this step, tape polishing and paper polishing are particularly preferable. This is because the direction of minute line-shaped irregularities can be easily controlled.

(2) Roll press process The roll press process used in this step is a rolling process for forming a desired concavo-convex structure on the surface by pressing a rotating roller having a concavo-convex pattern. Further, in the roll press process, a concavo-convex structure is formed on the surface of the molding object by passing a rotating roller in the roll press machine a plurality of times.

FIG. 6 is a schematic view showing an example of roll press processing. As shown in FIG. 6, the roll press machine 200 is provided with a rotating roller 5 having a concavo-convex pattern so as to contact the workpiece 6. By rotating the rotating roller 5 provided so as to be in contact with the molding object 6, the uneven pattern installed on the rotating roller 5 is pressed against the molding object 6.
In this way, the roll press process is performed by pressurizing with a rotating roller provided in contact with the object to be molded, whereby the uneven pattern installed on the rotating roller becomes a mold, and not by cutting but by deformation by pressing. Can be processed.

  By performing such a roll press process, it is possible to perform a localization / constant pressure press, the thickness of the molded body can be made uniform, and intermittent / continuous production is possible.

  About the cross-sectional shape, height, width, and period of the concavo-convex pattern on the surface of the rotating roller used in the roll press process, since it can be the same as the height, width, and period of the minute line-shaped concavo-convex structure described later, The description here is omitted.

(3) Minute line-like uneven structure As the minute line-like uneven structure in this embodiment, a high-quality pattern retardation film can be formed using the original plate for a three-dimensional display pattern alignment film of this embodiment. There is no particular limitation as long as the pattern alignment film can be produced.
Such a fine line-shaped uneven structure may be formed at random or may be formed in a stripe shape. Moreover, both may be combined. FIG. 7A shows a mode in which minute line-shaped uneven structures are randomly formed in a substantially constant direction, and FIG. 7B shows a minute line-shaped uneven structure formed in a stripe shape in a substantially constant direction. Further, FIG. 7C shows a mode in which both are combined.

  Here, a mode in which minute line-shaped uneven structures are randomly formed in a substantially constant direction is, for example, a line-shaped uneven structure such as a minute scratch formed when the surface is rubbed. Means an aspect formed in a substantially constant direction. On the other hand, the aspect in which the line-shaped uneven structure is formed in a stripe shape means an aspect in which convex portions formed in a wall shape are formed in a stripe shape at regular intervals. The size of the line-shaped concavo-convex structure is relatively larger than the above-described random mode, and for example, the concavo-convex structure such as a minute scratch formed when the surface is rubbed is not included. is there.

  In this aspect, the fine line-shaped uneven structure formed on the surface of the first layer may be the same as or different from the fine line-shaped uneven structure formed on the surface of the second layer described later. An aspect may be sufficient.

  When the fine line-like uneven structure in this embodiment is a stripe shape, the cross-sectional shape thereof has an uneven structure, and when the alignment film is formed using the original plate for a 3D display pattern alignment film of this embodiment There is no particular limitation as long as the liquid crystal compound can be arranged in a predetermined direction by the concavo-convex structure formed in the alignment film, and it can be a substantially rectangular shape, a substantially triangular shape, a substantially trapezoidal shape, or the like. Moreover, it may not be a fixed shape.

In this embodiment, as shown in FIG. 8, the height l, the width m, and the period n of the minute line-shaped concavo-convex structure 11 are the same as that of the alignment film using the pattern alignment film master for three-dimensional display of this embodiment. There is no particular limitation as long as it is within a range in which the liquid crystal compound can be aligned by the uneven structure formed in the alignment film when formed. In this embodiment, when a striped line-shaped uneven structure is formed, the height l of the minute line-shaped uneven structure 11 is preferably in the range of 1 nm to 500 nm, and in particular, in the range of 1 nm to 100 nm. It is more preferable that the thickness is within the range of 1 nm to 50 μm.
Further, when a stripe-shaped line-shaped uneven structure is formed, the width m of the minute line-shaped uneven structure 11 is preferably in the range of 1 nm to 1000 nm, and in particular, in the range of 1 nm to 500 nm. It is more preferable, and it is further more preferable that it is in the range of 1 nm-100 nm especially.
Further, when a striped line-shaped uneven structure is formed, the period n of the minute line-shaped uneven structure 11 is not necessarily constant, but is preferably in the range of approximately 1 nm to 1000 nm. However, it is preferably in the range of 1 nm to 100 nm.
This is because, when the stripe-shaped line-shaped uneven structure is formed, the liquid crystal compound can be stably arranged because the minute line-shaped uneven structure has the above-described size.

  In addition, FIG. 8 is explanatory drawing which shows the case where the cross-sectional shape of the minute line-shaped uneven structure 11 is a rectangular shape.

3. Second Layer Forming Step The second layer forming step in this embodiment is a step of forming the second layer 3 made of a metal material or an inorganic material after the first uneven structure forming step as shown in FIG. .

In this embodiment, the method is not particularly limited as long as it is a method capable of forming the second layer made of a metal material or an inorganic material with high accuracy, and examples thereof include dry plating treatment and wet plating treatment.
When the second layer is made of a metal material, the second layer can be formed by a dry plating process or a wet plating process. In addition, as a dry plating process in case a 2nd layer consists of metal materials, physical vapor deposition methods (PVD method), such as a vacuum evaporation plating method, resistance heating method, sputtering method, ion plating method, etc. are mentioned. Examples of the wet plating process include an electroplating method, an electroless plating method, a hot dip galvanizing method, a hot dip aluminum plating method, an insoluble anode method, and the like. The second layer is formed using the wet plating process. In this case, a material made of a metal material is selected as the first layer.
Further, when the second layer is made of an inorganic material, a dry plating process can be exemplified. As the dry plating treatment, chemical vapor deposition such as vacuum deposition plating method, resistance heating method, sputtering method, ion plating method, etc., physical vapor deposition method (PVD method), atmospheric pressure CVD method, reduced pressure CVD method, plasma CVD method, etc. Method (CVD method) and the like.

The metal material or inorganic material constituting the second layer used in this embodiment is preferably one that can be stably laminated on the first layer. Further, in the second layer peeling step described later, an etching solution is used to selectively peel the second layer exposed by forming the resist. Therefore, it is preferable that the material of the second layer be a material that can be selectively peeled off using an etching solution.
Specific materials for the second layer include nickel, copper, aluminum, tin, chromium, stainless steel (SUS), iron, and other metal materials; SiO ₂ , SiO _x , Al ₂ O ₃ , GeO ₂ , TiO ₂ , Inorganic oxides such as Cr ₂ O ₃ , ZrO ₃ , Ta ₂ O ₅ and Nb ₂ O ₃ ; Inorganic nitrides such as Si ₃ N ₄ , AlN, TiN and TiCN; Inorganic oxynitrides such as SiO _x N _y ; Examples thereof include inorganic carbides such as SiC; diamond-like carbon (DLC) and the like. Among these, metal materials, inorganic oxynitrides, inorganic carbides and the like are preferable, and TiN is particularly preferable. This is because it can be easily formed on the first layer, and it is easy to form a fine line-shaped uneven structure. Furthermore, it is because it is possible to selectively peel off the second layer using an etchant in a second layer peeling step described later.
Note that the material used for the second layer is preferably different from the material used for the first layer. This is because, in the second layer peeling step described later, the second layer formed on the surface of the first layer can be selectively peeled using an etching solution.

As a combination of the material of the second layer and the material of the first layer (second layer / first layer), desired adhesion can be obtained between the first layer and the second layer, and the second layer is peeled off. The first layer is preferably resistant to the etching solution used in the process. For example, DLC / Ti, DLC / TiN, and Cr ₂ O ₃ / TiN are preferable.

The surface of the second layer is preferably excellent in smoothness. When forming the fine line-like uneven structure on the surface of the second layer, if the second layer is inferior in surface smoothness, the fine line-like unevenness is formed on the surface of the second layer in the second uneven structure forming step described later. This is because it may be difficult to accurately form the structure.
The method for imparting excellent smoothness to the surface of the second layer is not particularly limited as long as desired smoothness can be obtained, and examples thereof include a cutting method such as super mirror polishing. .

The surface roughness of the second layer is not particularly limited as long as a fine line-shaped uneven structure can be accurately formed on the surface of the second layer in the second uneven structure forming step described later. For example, Ra = 10000 nm or less is preferable, Ra = 5000 nm or less is particularly preferable, and Ra = 1000 nm or less is particularly preferable.
In addition, "surface roughness (Ra)" here is "arithmetic mean surface roughness", and is measured based on JIS-B0601.

  The thickness of the second layer in this embodiment, that is, the step between the first layer and the second layer is preferably within a range of 10 nm to 5 μm, and more preferably within a range of 50 nm to 1 μm. When the step is within the above-described range, when the alignment film is formed using the three-dimensional display pattern alignment film of this aspect, the alignment film formed corresponding to the first layer and the second layer This is because disorder of alignment in the vicinity of the end portion of the liquid crystal compound arranged by the first alignment region and the second alignment region can be effectively suppressed.

In addition, the thickness of the said 2nd layer shall mean the distance shown by D1 in FIG. Moreover, as shown in FIG. 4, it shall mean the thickness containing the fine line-shaped uneven structure 11 and 31 formed in the surface.
In addition, the thickness of the 2nd layer in which the fine line-shaped uneven structure was formed on the surface shall mean the distance shown by D1 in FIG. For D1, the distance from the surface of the first layer to the convex portion of the fine line-shaped uneven structure formed on the surface of the second layer and the fine line-shaped unevenness formed on the surface of the second layer from the first layer surface The average value with the distance to the concave portion of the structure. Further, it is obtained by calculating an average value of the convex portions and the concave portions of the minute line-shaped concavo-convex structure formed on the surface of the first layer (reference point for measuring the thickness of the second layer).
Moreover, since the reference numerals in FIG. 4 indicate the same members as those in FIG. 1, description thereof is omitted here.

4). 2nd uneven | corrugated structure formation process The 2nd uneven | corrugated structure formation process in this aspect WHEREIN: As shown in FIG.1 (d), the fine line-shaped uneven structure 31 is formed on the surface of the 2nd layer 3 formed on the 1st layer 1. As shown in FIG. It is a process of forming.

The method for forming the fine line-shaped concavo-convex structure of this aspect is not particularly limited as long as it is a method that can form a line-shaped concavo-convex structure in a desired size and direction, but for example, on the surface of the first layer On the other hand, there can be exemplified a cutting process for polishing and a roll press process for forming by pressing a mold having an uneven pattern.
The method for forming a fine line-shaped uneven structure in the second uneven structure forming process can be the same as that described in the section “2. First uneven structure forming process”, and will be described here. Is omitted.

Here, the formation direction of the minute line-shaped unevenness in this aspect is particularly limited as long as it is different between the surface of the first layer and the surface of the second layer in the original pattern alignment film for three-dimensional display of this aspect. Is not to be done.
In this embodiment, as shown in FIG. 5, the first alignment region 8A and the second alignment region 8B of the alignment film 8 manufactured using the three-dimensional display pattern alignment film original plate have the minute lines. It is preferable that the rod-shaped compound 10 contained in the retardation layer 9 can be arranged in accordance with the formation direction of the concavo-convex structure. This is because a pattern retardation film capable of three-dimensional display can be manufactured using the alignment film. FIG. 5 shows a case where the difference in the formation direction of the minute line-shaped uneven structure between the first alignment region 8A and the second alignment region 8B is 90 °. Thus, when the said pattern phase difference film is manufactured, the said pattern phase difference film is a minute line formed on the surface of the 1st layer and the 2nd layer in the original plate for three-dimensional display pattern orientation films of this mode. It is preferable that the phase difference value differs by an amount corresponding to the difference in the formation direction of the concavo-convex shape.
Specifically, the fine line-like concavo-convex structure formed on the second layer surface is 90 ° different from the fine line-like concavo-convex structure on the first layer surface formed in the first concavo-convex structure forming step described above. And a case different by 45 °.
Hereinafter, each case will be described separately.

(1) When 90 degrees are different The fine line-shaped uneven structure of this aspect differs 90 degrees on the surfaces of the first layer and the second layer.
Such a fine line-shaped uneven structure of this embodiment is not particularly limited as long as it differs by 90 ° on the surfaces of the first layer and the second layer. For example, pattern orientation for three-dimensional display When the film original plate is a roll plate, the formation direction (first layer / second layer) of the first layer and the second layer minute line uneven structure with respect to the rotation direction of the roll is 45 °. / 135 ° and 0 ° / 90 ° are preferable.
In the case of the directions orthogonal to each other in this way, an alignment film in which the first alignment region and the second alignment region are formed is formed using the three-dimensional display pattern alignment film master having the fine line-shaped uneven structure of this embodiment. Further, by setting the in-plane retardation of the first retardation region and the second retardation region formed on the first alignment region and the second alignment region to λ / 4, the retardation regions are transmitted. Thus, since the linearly polarized light becomes right circularly polarized light and left circularly polarized light, respectively, it can be suitably used for manufacturing a display device capable of easily performing three-dimensional display.
In FIG. 3, the directions of the minute line-shaped uneven structure 11 formed on the surface of the first layer and the minute line-shaped uneven structure 31 formed on the surface of the second layer are 45 ° and 135 °. Indicates the roll plate surface at 0 ° and 90 °.
Note that the reference numerals in FIG. 9 indicate the same members as those in FIG. 3, and a description thereof will be omitted here.

Here, the in-plane retardation (Re) value is an index indicating the degree of birefringence in the in-plane direction of the refractive index anisotropic body, and the refraction in the slow axis direction having the largest refractive index in the in-plane direction. When the refractive index is Nx, the refractive index in the fast axis direction orthogonal to the slow axis direction is Ny, and the thickness in the direction perpendicular to the in-plane direction of the refractive index anisotropic body is d,
Re [nm] = (Nx−Ny) × d [nm]
It is a value represented by. The in-plane retardation value (Re value) can be measured by, for example, KOBRA-WR manufactured by Oji Scientific Instruments Co., Ltd. by the parallel Nicol rotation method. It is also possible to measure using the Mueller matrix with AxoScan made by. In the present specification, unless otherwise stated, the Re value means a value at a wavelength of 589 nm.

  For detailed contents such as the cross-sectional shape and height, width, period, and forming method of the fine line-shaped uneven structure formed on the surface of the second layer in the first aspect, refer to “2. First uneven structure forming step”. Since it can be the same as that described in FIG.

(2) When 45 ° is different The minute line-shaped uneven structure of this aspect is 45 ° different between the surfaces of the first layer and the second layer.
Such a fine line-shaped uneven structure of this embodiment is not particularly limited as long as it differs by 45 ° on the surfaces of the first layer and the second layer. For example, when the original plate is a roll plate The direction of formation of the fine line-shaped uneven structure of the first layer and the second layer (first layer / second layer) is 0 ° / 45 °, 180 ° / 135 ° with respect to the rotation direction of the roll. Preferably there is.
Thus, when the formation direction of the fine line-shaped uneven structure is a direction different by 45 °, the first alignment region and the first alignment region are formed using the three-dimensional display pattern alignment film master having the fine line-shaped uneven structure according to this aspect. When an alignment film in which two alignment regions are formed is formed, the in-plane retardation values of the first retardation region and the second retardation region correspond to λ / 2, and further, λ / 4 It is because it can be used suitably for manufacturing a 3D display device easily by using it in combination with a plate.
In FIG. 10, the direction of the minute line-like uneven structure 11 formed on the surface of the first layer and the minute line-like uneven structure 31 formed on the surface of the second layer are 0 ° / 45 °, and FIG. The roll plate surface in the case of ° / 135 ° is shown.
10 and 11 indicate the same members as those shown in FIG. 3, and a description thereof will be omitted here. Moreover, the arrow in a figure shows the formation direction of a fine line-shaped uneven structure.

Here, the point that a 3D display device can be easily manufactured by combining a pattern retardation film having such a retardation region and a λ / 4 plate will be described in more detail. FIG. 12 shows an example of a case where a liquid crystal display device capable of three-dimensional display is produced using a combination of a pattern retardation film formed using an original produced by the production method of the present invention and a λ / 4 plate. FIG. As shown in FIG. 12, a liquid crystal display device using a combination of a pattern retardation film formed by using an original plate manufactured by the manufacturing method of the present invention and a λ / 4 plate enables three-dimensional display by a passive method. It will be something. The principle is as follows.
First, the pixel portion of the light-emitting display is divided into a plurality of two types of pixels, a right-eye video display pixel and a left-eye video display pixel, and a right-eye video is displayed on one group of pixels, The left eye image is displayed on the pixels of the group. Next, as the pattern retardation film, the first retardation region of the retardation layer is formed so as to correspond to the arrangement pattern of the left-eye image display pixels, and the second retardation region is the arrangement pattern of the right-eye image display pixels. Prepare one that is formed to correspond to. And such a pattern phase difference film is arrange | positioned at the display surface side of a polarizing plate, Furthermore, (lambda) / 4 board is arrange | positioned at the display surface side of a pattern phase difference film. At this time, the direction of the slow axis of the first retardation region and the direction of the polarization axis of the polarizing plate intersect at 45 °, and further, the slow axis direction of the first retardation region and the λ / 4 plate The slow axis direction should be parallel or orthogonal. By disposing the pattern retardation film and the λ / 4 plate in this manner, images displayed by the right-eye image display pixel and the left-eye image display pixel (hereinafter referred to as “right-eye image” and “left-eye image”, respectively) Is visually recognized by the observer through the following route.
That is, each image displayed by the right-eye image display pixel and the left-eye image display pixel first passes through the polarizing plate, and thus is converted into linearly polarized light. Here, in FIG. 12, since the polarization axis of the polarizing plate is in the 0 ° direction, each image transmitted through the polarizing plate is also linearly polarized light in the 0 ° direction. Next, each image converted into linearly polarized light (0 °) in this way enters the pattern phase difference film, but the image for the left eye passes through the first phase difference region, and the image for the right eye is the first image. Since it passes through the two phase difference regions, the left-eye image is transmitted through the pattern retardation film as linearly polarized light (L1) having a polarization axis of 90 °, but the right-eye image has no change and the polarization axis is 0 °. The pattern retardation film is transmitted through the linearly polarized light (L2). Next, when L1 and L2 are incident on the λ / 4 plate, the left-eye image is converted into right-handed circularly polarized light (C1), and the right-eye image is converted into left-handed circularly polarized light (C2). It will be.
As described above, the right-eye image and the left-eye image that have passed through the pattern retardation film and the λ / 4 plate are converted into circularly polarized light orthogonal to each other. Wearing circularly polarized glasses with circularly polarized lenses that are orthogonal to each other so that the right-eye image passes only through the right-eye lens and the left-eye image passes only through the left-eye lens. Can reach only the right eye, and the left-eye video can reach only the left eye, and three-dimensional display becomes possible.

  For detailed contents such as the cross-sectional shape and height, width, period, and formation method of the fine line-shaped concavo-convex structure formed on the surface of the second layer in this aspect, refer to “2. First concavo-convex structure forming step”. Since it can be the same as that described, description thereof is omitted here.

5. Resist Forming Step The resist forming step in this embodiment is a step of forming a resist 2 in a parallel strip shape on the surface of the first layer 1 after the first concavo-convex structure forming step as shown in FIG.

  First, the resist material used in this step should be resistant to the etching solution used in the second layer peeling step described later, and can be peeled off after the second layer described later is formed. There is no particular limitation, and any of a positive resist material (which dissolves the light-irradiated portion) and a negative resist material (which solidifies the light-irradiated portion) can be used. Examples of the positive resist material include a chemically amplified resist using a novolac resin as a base resin. Examples of the negative resist material include a chemically amplified resist based on a crosslinked resin, specifically, a chemically amplified resist obtained by adding a crosslinking agent to polyvinylphenol and further adding an acid generator.

  As a method of forming a resist film by applying such a resist material, a general coating method can be used, for example, a spin coating method, a casting method, a dipping method, a bar coating method, a blade coating method, A roll coating method, a gravure coating method, a flexographic printing method, a spray coating method, or the like can be used.

Thereafter, as a method of exposing the resist film in parallel strips, an electron beam drawing method or a laser drawing method used for normal photomask drawing can be used. Alternatively, a method of performing ultraviolet irradiation through a mask can be used.
In this step, the laser drawing method is particularly preferable. This is because even if the shape of the metal substrate is a roll shape, the pattern can be accurately exposed.
Moreover, as a developing method of the resist film after exposure, a general developing method can be used.

  In the three-dimensional display pattern alignment film original plate of this aspect, the first layer of the three-dimensional display pattern alignment film original plate 100 manufactured according to this aspect shown in FIG. The width W1 ′ of the minute line-shaped uneven structure 11 formed in 1 and the width W2 ′ of the minute line-shaped uneven structure 31 formed in the second layer 3 are defined.

  The resist forming direction formed in this step, that is, the direction of the parallel strips, is the first when the three-dimensional display pattern alignment film original plate 100 is a roll plate as shown in FIG. It is preferable that the layer 1 and the 2nd layer 3 are the directions along the rotation direction of a roll.

Further, as shown in FIG. 1E, the width W1 of the resist 2 and the width W2 of the gap between the adjacent resists 2 may be different or the same. However, in this embodiment, the width W1 of the resist 2 and the width W2 of the gap between the adjacent resists 2 are preferably the same.
Usually, in a liquid crystal display device or the like capable of three-dimensional display, the right-eye pixel and the left-eye pixel portion are formed with the same width. Therefore, the first three-dimensional display pattern alignment film master of the present invention is used. The width (W1 ′) of the minute line-shaped uneven structure formed in the layer and the width (W2 ′) of the minute line-shaped uneven structure formed in the second layer (that is, in FIG. 1 (e), When the pattern alignment film is manufactured using the master for pattern alignment film for three-dimensional display of the present invention by making the width W1 of the resist 2 and the width W2 of the gap between adjacent resists 2 the same, the first layer This is because the width of the first alignment region and the second alignment region of the pattern alignment film formed corresponding to the minute line-shaped uneven structure of the second layer can be made the same. As a result, the first alignment region and the second alignment region are formed when the pattern alignment film formed from the original plate for a three-dimensional display pattern alignment film of the present invention is used in a liquid crystal display device capable of three-dimensional display. The pattern formed by the master for a three-dimensional display pattern alignment film according to this aspect can be easily associated with the pattern in which the pixel portion is formed in the color filter used in the liquid crystal display device. This is because a 3D liquid crystal display device can be easily manufactured using the alignment film.
Further, since the pixel portion used in the light emitting display device is also formed with the same width, the width of the first alignment region and the second alignment region is set to the same width, so that the three-dimensional display of the present invention is performed. When the pattern alignment film formed from the pattern alignment film master for use is used in a light-emitting display device capable of three-dimensional display, the pattern in which the first alignment region and the second alignment region are formed, and the light-emitting display device It is easy to make the correspondence with the pattern in which the pixel portion used in the present invention is formed, and as a result, it is easy to use the pattern alignment film formed by the three-dimensional display pattern alignment film master of this aspect. This is because a 3D light emitting display device can be manufactured.

  A specific width of the width W1 of the resist 2 and the width W2 of the gap between the adjacent resists 2 shown in FIG. 1 (e) (in FIG. 1 (g), the original 100 for a pattern alignment film for three-dimensional display of the present invention is used. The width W1 ′ of the first layer 1 and the width W2 ′ of the second layer 3) are appropriately determined according to the use of the pattern alignment film formed using the pattern alignment film master for three-dimensional display of this embodiment. Is done. For example, when used for manufacturing a liquid crystal display device capable of three-dimensional display, the width W1 of the resist 2 and the width W2 of the gap between adjacent resists 2 are for the right eye of the liquid crystal display device capable of three-dimensional display. It is determined appropriately so as to correspond to the width in which the pixel portion for the left eye is formed. As described above, the width W1 of the resist 2 and the width W2 of the gap between the adjacent resists 2 are not particularly limited, but are usually preferably in the range of 50 μm to 1000 μm, and in the range of 100 μm to 600 μm. More preferably.

6). Second Layer Stripping Step The second layer stripping step in this embodiment is a step of stripping the exposed second layer 3 after forming the resist 2 in a parallel strip shape as shown in FIG.

  As the second layer peeling method in the second layer peeling step, only the exposed second layer formed on the surface of the first layer can be selectively removed after the resist forming step, and the surface of the first layer can be removed. Although it will not specifically limit if it is a method which does not change the formed fine line-shaped uneven structure, For example, the method of etching using an etching liquid can be mentioned.

  In this step, wet etching may be performed by applying an etching solution to the substrate, or wet etching may be performed by immersing the substrate in the etching solution. In addition, the time for performing wet etching is appropriately adjusted so as to obtain a desired shape with reference to the etching rate at which the substrate is etched.

The etching solution used in this step is not particularly limited as long as it can etch the second layer forming material and does not change the minute line-shaped uneven structure formed on the surface of the first layer. However, it differs depending on the second layer forming material and the first layer forming material on which the second layer is laminated. For example, hydrochloric acid, mixed acid, hydrogen peroxide water, ammonia water, organic alkali, etc. can be mentioned.
When the first layer forming material is a chromium-based material and the second layer forming material is a titanium-based material, hydrofluoric acid or a mixed solution of potassium hydroxide and a peroxide solution can be used. Of these, a mixed solution of potassium hydroxide and hydrogen peroxide can be preferably used.
Further, when the first layer forming material is a titanium-based material and the second layer forming material is a chromium-based material, a mixed solution of cerium nitrate second ammonium and perchloric acid, sulfuric acid and phosphoric acid are used. In particular, a mixed solution of cerium nitrate second ammonium solution and perchloric acid can be preferably used.

7). Resist stripping process
The resist stripping step in this embodiment is a step of stripping the remaining resist 2 on the second layer after stripping the exposed second layer 3 as shown in FIG.

  As a resist stripping method in the resist stripping step, a general resist stripping method can be used. Specifically, a method of ashing by oxygen plasma treatment or cleaning with an organic alkali solution can be exemplified. In this embodiment, it is preferable to remove the resist by applying a release agent such as an organic alkali solution. This is because the operation of stripping the resist is simpler.

8). Other Steps The manufacturing method of the original plate for a three-dimensional display pattern alignment film according to this aspect includes a first layer forming step, a first uneven structure forming step, a resist forming step, a second layer forming step, a resist peeling step, and a protective layer forming. Although it has a process, a 2nd uneven | corrugated structure formation process, and a protective layer peeling process, you may have another process as needed.
As such other processes, for example, polishing performed by cutting the surface of the first layer or the second layer when the first concavo-convex structure forming process and the second concavo-convex structure forming process are performed. Examples include a removal step for removing waste. Examples of the removal method include a suction method, a removal method using a solvent, and the like.
Moreover, the contact bonding layer formation process which provides an contact bonding layer between a 1st layer and a 2nd layer can be mentioned.
Hereinafter, the adhesive layer forming step will be described.

The adhesive layer forming step in this aspect is a step of forming an adhesive layer on the exposed surface of the first layer after the resist forming step.
The method for forming the adhesive layer is not particularly limited as long as the adhesive layer can be formed on the surface of the first layer and the adhesion between the first layer and the second layer can be improved. Moreover, the formation method of an adhesive layer is suitably selected according to the kind etc. of adhesive resin used for the said adhesive layer.

  The material for the adhesive layer is not particularly limited as long as it contains an adhesive resin and can bond the first layer and the second layer with a desired adhesive force. Accordingly, the type of the adhesive resin is appropriately selected depending on the types of the first layer and the second layer. Examples of the adhesive resin used in this embodiment include polyethylene, polypropylene, polyisobutylene, polystyrene, polyolefin such as ethylene-propylene rubber, ethylene-vinyl acetate copolymer, ethylene-acrylic acid copolymer, ethyl cellulose, triacetic acid. Cellulose derivatives such as cellulose, copolymers of poly (meth) acrylic acid and its esters, polyvinyl acetals such as polyvinyl acetate, polyvinyl alcohol, polyvinyl butyral, polyacetals, polyamides, polyimides, nylons, polyester resins, urethane resins, epoxies Examples thereof include resins.

  In addition, the adhesive resin used for this invention may be only 1 type, or 2 or more types may be sufficient as it.

  The thickness of the adhesive layer used in the present invention is not particularly limited as long as it is within a range in which the first layer and the second layer can be bonded with a desired adhesive force depending on the type of the adhesive resin and the like. Absent.

B. 2nd aspect It is a manufacturing method of the aspect in which the fine line-shaped uneven structure of the surface of a 1st layer and a 2nd layer is formed in the same direction in the original for pattern alignment films for three-dimensional displays of this invention.

A method for manufacturing the original plate for a three-dimensional display pattern alignment film of this embodiment will be described with reference to the drawings.
FIG. 1 is a process diagram showing an example of a method for manufacturing a three-dimensional display pattern alignment film master according to the first aspect. The method for manufacturing a three-dimensional display pattern alignment film according to the first aspect includes the first method described above. Since it can be the same as the manufacturing method of an aspect, detailed description here is abbreviate | omitted.
1A is a first layer forming step, FIG. 1B is a first uneven structure forming step, FIG. 1C is a second layer forming step, FIG. 1D is a second uneven structure forming step, and FIG. The resist forming step, (f) is the second layer peeling step, and (g) is the resist peeling step.

Next, the master plate 100 for a three-dimensional display pattern alignment film obtained by such a manufacturing method will be described with reference to the drawings. FIG. 2 is a schematic view showing an example of a three-dimensional display pattern alignment film master according to the present invention. 13 is a schematic plan view showing the surface of the original plate 100 for a three-dimensional display pattern alignment film, and FIG. 14 is a cross-sectional view taken along the line BB of FIG.
As illustrated in FIG. 13 and FIG. 14, the pattern alignment film original plate 100 for the three-dimensional display according to the present embodiment is made of a metal material or an inorganic material on the surface of which a fine line-shaped uneven structure 11 is formed in a substantially constant direction. A first layer 1 and a second layer 3 formed of a metal material or an inorganic material formed in a parallel strip shape on the first layer 1 and having a fine line-shaped uneven structure 31 formed on the surface in a substantially constant direction; The formation direction of the minute line-shaped uneven structures 11 and 31 is such that the surface of the first layer 1 and the second layer 3, that is, the exposed first layer 1 and the second layer 3 adjacent to the second layer 3. It is the same on the surface of the two layers 3.
FIG. 2 shows an example in which the original plate 100 for a three-dimensional display pattern alignment film is a roll plate having a roll shape. When FIG. 13 is the surface of the three-dimensional display pattern alignment film master 100 shown in FIG. 2, the formation direction of the minute line-shaped uneven structures 11 and 31 on the surfaces of the first layer 1 and the second layer 3 is as follows. It is 45 ° with respect to the rotation direction of the original plate (roll plate) 100 for the three-dimensional display pattern alignment film, and is the same. Moreover, the arrow in FIG. 13 shows the formation direction of the minute line-shaped uneven structures 11 and 31.

Next, the thickness to the surface of the 1st layer and the 2nd layer in the surface of the original for pattern orientation film for three-dimensional displays in this mode differs mutually. A pattern retardation film using an alignment film manufactured using such a three-dimensional display pattern alignment film master will be described with reference to the drawings. FIG. 15A is a schematic diagram showing a pattern retardation film using an alignment film manufactured using a pattern alignment film master for three-dimensional display, and FIG. It is the schematic which expanded the area | region enclosed with the dotted line.
The pattern retardation film 300 is formed with a pattern showing a retardation value that is different in the retardation layer 9 by an amount corresponding to the thickness of the second layer. For this reason, the thickness of the second layer in this aspect is appropriately determined depending on how much the difference in the retardation value between the first retardation region 9A and the second retardation region 9B is.
In addition, the pattern retardation film 300 (300A) obtained from the alignment film manufactured using the three-dimensional display pattern alignment film original plate according to the present aspect includes the first layer of the three-dimensional display pattern alignment film original plate and Since the formation direction of the minute line-shaped uneven structure formed on the surface of the second layer is the same direction, formation of the minute line-shaped uneven structure on the surface of the first alignment region 8A and the second alignment region 8B in the alignment film 8 The direction is also the same direction, whereby the rod-shaped compounds 10 included in the first retardation region 9A and the second retardation region 9B of the retardation layer 9 are arranged to face the same direction.
In addition, about the code | symbol in FIG. 15, since it shows the same member as the thing of FIG. 5, description here is abbreviate | omitted.

  The effect of the manufacturing method of the original for pattern alignment film for three-dimensional display of this aspect is the same as the effect of the manufacturing method of the first aspect described above.

In addition to the effects of the method for producing the original plate for a three-dimensional display pattern alignment film described in the first aspect, according to this aspect, the thickness of the first layer and the second layer is a three-dimensional display pattern alignment film original plate. By doing so, alignment films having different thicknesses of the first alignment region and the second alignment can be obtained. The alignment film constitutes a pattern retardation film and has a function of arranging rod-shaped compounds contained in the retardation layer. In this embodiment, it is possible to provide a three-dimensional display pattern alignment film original plate for manufacturing an alignment film having different retardation values corresponding to the difference in thickness between the first alignment region and the second alignment region.
Conventionally, when the rod-shaped compounds are arranged so that the first alignment region and the second alignment region have different alignments, there is a problem that the alignment is disturbed at the boundary between the first alignment region and the second alignment region. However, since the thickness of the first alignment region and the second alignment region is different in the alignment film obtained from the three-dimensional display pattern alignment film master according to this aspect, the boundary between the first alignment region and the second alignment region is clear. In addition, it is possible to suppress alignment defects of the liquid crystal that are likely to occur in the vicinity of the pattern boundary between the adjacent first alignment region and the second alignment region. Thereby, the light leakage from the boundary vicinity can be suppressed, As a result, it can be set as the high quality alignment film which can suppress the fall of the contrast at the time of using for a display.

  The manufacturing method of the original plate for a three-dimensional display pattern alignment film according to this aspect includes a first layer forming step, a first concavo-convex structure forming step, a second layer forming step, a second concavo-convex structure forming step, a resist forming step, and a second layer. It has a peeling process and a resist peeling process.

In the manufacturing method in this aspect, in the first concavo-convex structure forming step and the second concavo-convex structure forming step, a minute line-shaped concavo-convex structure is formed in the same direction, and the second layer is formed to have a predetermined thickness. Since it can be the same as that of what was described in the 1st aspect mentioned above except for this, detailed description of each process is abbreviate | omitted.
In the following, the thickness of the first layer and the second layer and the minute line-shaped concavo-convex structure formed in the same direction on the surface of the original plate for a three-dimensional display pattern alignment film of this embodiment will be described.

  Here, the thickness of the second layer formed according to this aspect is usually a pattern phase difference using an alignment film produced using a three-dimensional display pattern alignment film original plate produced by the production method of this aspect. In the film, it is determined as appropriate depending on how much the difference in the retardation value between the first retardation region and the second retardation region is. Hereinafter, this point will be described.

  Since the original plate for 3D display pattern alignment film manufactured according to this aspect has the second layer on the surface of the first layer, the surface of the original 3D display pattern alignment film has a convex portion and a concave portion. It is what you have. Since the above-mentioned convex portions and concave portions are formed on the surface of the alignment film manufactured using such a three-dimensional display pattern alignment film original plate, the portions having different thicknesses on the surface of the alignment film That is, a thick film region and a thin film region are formed. Further, in a patterned retardation film using such an alignment film, a pattern having a different retardation value corresponding to the difference in thickness between the thick film region and the thin film region is formed in the retardation layer. .

Therefore, the thickness of the second layer in the three-dimensional display pattern alignment film master of this embodiment is the thickness between the thick film region and the thin film region of the alignment film manufactured by the three-dimensional display pattern alignment film master of this embodiment. It corresponds to the difference.
Here, the difference in thickness between the thick film region and the thin film region is appropriately determined depending on how much the difference in the retardation value between the first retardation region and the second retardation region is to be made. Accordingly, the difference in thickness between the thick film region and the thin film region is appropriately determined depending on the use of the pattern retardation film, the type of rod-shaped compound used in the retardation layer described later, and the like, and is particularly limited. It is not a thing. In particular, in the present invention, the difference in thickness between the thick film region and the thin film region is the difference between the in-plane retardation value of the high retardation region in the retardation layer and the in-plane retardation value of the low retardation region in the retardation layer. The difference is preferably a distance corresponding to λ / 2 minutes. Thereby, for example, when forming the retardation layer on the alignment layer, the in-plane retardation of the low retardation region corresponds to λ / 4 minutes, so that the obtained pattern retardation film has a low retardation. The in-plane retardation value of the region corresponds to λ / 4 minutes, and the in-plane retardation value of the high retardation region corresponds to λ / 4 + λ / 2. In such a pattern retardation film, This is because the linearly polarized light passing through the low phase difference region and the high phase difference region becomes circularly polarized light that is orthogonal to each other, so that it can be more suitably used for manufacturing a three-dimensional display device.

  Therefore, the thickness of the second layer is the difference in thickness between the thick film region and the thin film region in the alignment film manufactured using the pattern alignment film master for 3D display manufactured by the manufacturing method of this aspect. It is preferable to adjust and form so that it may become the distance mentioned above.

  The thickness up to the surfaces of the first layer and the second layer is particularly limited as long as the difference in thickness up to the surfaces of the first layer and the second layer is within a predetermined range. is not. For example, as shown in FIG. 14, the thickness D2 of the second layer is preferably about 2.0 μm.

  In addition, as shown in FIG. 14, the thickness to the surface of the said 1st layer and the said 2nd layer shall include the fine line-shaped uneven structure formed in the surface.

The formation direction of the fine line-shaped uneven structure on the surfaces of the first layer and the second layer in the original plate for a three-dimensional display pattern alignment film of this aspect is particularly the same if the first layer and the second layer are in the same direction. For example, as shown in FIG. 16, the fine line-shaped uneven structure 11 formed on the surface of the first layer and the fine line-shaped uneven structure 31 formed on the surface of the second layer are provided. The direction may be 0 °, or, as shown in FIG. 17, the minute line-like uneven structure 11 formed on the surface of the first layer and the minute line-like unevenness formed on the surface of the second layer The direction of the structure 31 may be 90 °.
The detailed contents of the fine line-shaped uneven structure other than those described above can be the same as those described in the first aspect.

C. Other Embodiments As other embodiments, in the original plate for a three-dimensional display pattern alignment film of the present invention, the fine line-shaped uneven structures on the surfaces of the first layer and the second layer are formed in different directions, and the first layer and The thickness of the second layer may be different.

In addition, the effect about the manufacturing method of the pattern alignment film original plate for 3D display of the said aspect is the same as the effect about the manufacturing method of the pattern alignment film original plate for 3D display of the 1st aspect mentioned above and the 2nd aspect. can do.
In addition to the same effects as those of the first and second aspects, the following effects can be obtained in this aspect. In this aspect, the formation direction of the fine line-shaped concavo-convex structure formed on the surface of the first layer and the surface of the second layer of the original plate for three-dimensional display pattern alignment film, and the thicknesses of the first layer and the second layer. The difference is different. Therefore, the fine lines formed on the surface of the first layer and the surface of the second layer by using the alignment film obtained from the original plate for the three-dimensional display pattern alignment film of this aspect for the pattern retardation film. Different retardation values corresponding to the difference in the direction of formation of the concavo-convex structure and the difference in thickness between the first layer and the second layer. Note that the first layer and the second layer in the three-dimensional display pattern alignment film master according to this aspect correspond to the first alignment region and the second alignment region of the alignment film, and the first retardation region of the pattern retardation film. , Respectively corresponding to the second phase difference region.

D. Others The original plate for a three-dimensional display pattern alignment film produced by the production method of the present invention has a concave portion (first layer) and a convex portion (second layer) formed in a strip shape, and has a fine line shape on the surface. The concavo-convex structure is formed in a substantially constant direction.

  The original plate for a three-dimensional display pattern alignment film is used when a three-dimensional display pattern alignment film used for a three-dimensional display pattern retardation film is produced. More specifically, a fine line-shaped uneven structure of the original plate is formed on the alignment film forming layer made of the resin composition, and a first alignment region (convex having a fine line-shaped uneven structure corresponding to this shape is formed. Shape) and a pattern alignment film for three-dimensional display having a second alignment region (concave shape).

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

  Hereinafter, the present invention will be specifically described with reference to examples.

[Example]
(First layer forming step)
Plate making was performed using an aluminum pipe (5000 series aluminum material) having a diameter of 300 mm and a surface length of 1260 mm.
After surface-facing the aluminum surface with a lathe, a base layer was formed by forming a copper layer with a thickness of 200 to 300 μm on the aluminum surface by electrolytic plating as a base layer for forming the first layer. Thereafter, in order to impart smoothness to the surface, a grinding wheel polishing treatment was performed.
Next, the base layer was plated, and a nickel layer was formed with a thickness of about 5 μm. By forming the nickel layer, the scratches at the time of grinding the above-described grindstone were filled. Next, diamond-like carbon (DLC) was formed to a thickness of about 2 μm on the nickel layer using a plasma CVD method to form a first layer.

(First uneven structure forming step)
After the formation of the first layer, a rubbing treatment was performed on the surface of the first layer using a paper grinder so that the polishing angle was 45 °, and a fine line-shaped uneven structure was formed on the entire surface of the first layer.

(Removal process)
After the first concavo-convex structure forming step, the surface of the first layer on which the fine line-shaped concavo-convex structure was formed was washed with a solvent or the like to remove polishing residue and abrasive grains.

(Second layer forming step)
Then, the 2nd layer which consists of Ti was formed with thickness of 0.1 micrometer-1 micrometer using sputtering method.

(Second uneven structure forming step)
After the second layer forming step, a fine line-shaped uneven structure was formed on the entire surface of the second layer. In addition, as a specific method, it is the same as that of the said 1st uneven | corrugated structure formation process.

(Removal process)
After the second concavo-convex structure forming step, the surface of the first layer on which the fine line-shaped concavo-convex structure was formed was washed with a solvent or the like to remove polishing residue and abrasive grains.

(Resist formation process)
After the removing step, a negative resist was coated on the entire surface of the first layer with an appropriate thickness (about 3 to 5 μm) and dried at room temperature. After forming the resist film, pattern drawing and development were performed with a laser head adjusted to the photosensitive wavelength of the resist to form parallel resist strips.

(Second layer peeling step)
Then, etching was performed at room temperature for 20 minutes using a 4: 1 mixed solution of Solfine-SE-TW10 / A (Showa Denko) and hydrogen peroxide (Kanto Chemical Co.), and then water and methyl alcohol in this order. Rinse. A high pressure washer was used to remove the resist residue during the water washing.

(Resist stripping process)
Thereafter, the resist was dissolved and peeled from the surface of the first layer using a mixed solution of methyl ethyl ketone (MEK), isopropyl alcohol (IPA), and methanol.

[Evaluation]
Using the substrate film having no retardation for the three-dimensional display pattern alignment film original plate produced in the above embodiment, the shape of the surface of the three-dimensional display pattern alignment film original plate is formed on an ultraviolet curable resin. A film retardation film was prepared by adjusting the film thickness so that the retardation value was 125 nm by spin coating with Merck UV-curable liquid crystal on the resin side.
As a result of evaluating the pattern retardation film, since there is a resist protective film, only the second layer can be polished without overwriting polishing scratches of the first layer at the time of polishing the second layer, and 45 for each stripe. It was confirmed that the optical axis of the liquid crystal was neatly aligned at 45 degrees / 135 degrees.

DESCRIPTION OF SYMBOLS 1 ... 1st layer 11 ... Minute line-like uneven structure 2 ... Resist 3 ... 2nd layer 31 ... Minute line-like uneven structure 4 ... Protective layer 5 ... Rotating roller 6 ... Molding object 7 ... Transparent film base material 8 ... Alignment film 9 ... Retardation layer 10 ... Bar-shaped compound 100 ... Master plate for pattern alignment film for three-dimensional display 200 ... Roll press machine 300 ... Pattern retardation film

Claims (4)

A first layer forming step of forming a first layer made of a metal material or an inorganic material;
A first concavo-convex structure forming step of forming a minute line-like concavo-convex structure on the surface of the first layer in a substantially constant direction;
A second layer forming step of forming a second layer made of a metal material or an inorganic material on the surface of the first layer after the first uneven structure forming step;
A second concavo-convex structure forming step of forming a minute line-like concavo-convex structure in a direction substantially different from the first concavo-convex structure forming step on the surface of the second layer;
A resist forming step of forming a resist in a strip shape parallel to the surface of the second layer after the second uneven structure forming step;
A second layer peeling step of peeling the exposed second layer after the resist forming step;
A resist stripping process for stripping the resist;
A method for producing an original plate for a pattern alignment film for three-dimensional display, comprising: A first layer forming step of forming a first layer made of a metal material or an inorganic material;
A first concavo-convex structure forming step of forming a minute line-like concavo-convex structure on the surface of the first layer in a substantially constant direction;
A second layer forming step of forming a second layer made of a metal material or an inorganic material on the surface of the first layer after the first uneven structure forming step;
A second concavo-convex structure forming step of forming a minute line-shaped concavo-convex structure in the same direction as the first concavo-convex structure forming step on the surface of the second layer;
A resist forming step of forming a resist in a strip shape parallel to the surface of the second layer after the second uneven structure forming step;
A second layer peeling step of peeling the exposed second layer after the resist forming step;
A resist stripping process for stripping the resist;
A method for producing an original plate for a pattern alignment film for three-dimensional display, comprising:   The method for producing a three-dimensional display pattern alignment film precursor according to claim 1 or 2, wherein the three-dimensional display pattern alignment film original plate is a roll plate having a roll shape.   3. The original plate for three-dimensional display pattern alignment film according to claim 1, wherein at least one of the first concavo-convex structure forming step or the second concavo-convex structure forming step is performed by roll pressing. Manufacturing method.

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