JP2012124369A - Bulk superconductor critical current density control method and undulator use bulk superconductor manufacturing method - Google Patents
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Abstract
【課題】 バルク体全体の臨界電流密度の向上および制御により疑似永久磁石等の性能を大幅に改善でき、また、現存の加速器により実施可能で、しかも、複数のバルク体の臨界電流密度のばらつきを抑制してアンジュレータの性能向上も図れるバルク超伝導体の臨界電流密度制御方法、及びアンジュレータ用バルク超伝導体の製造方法を提供すること。
【解決手段】 バルク状の第二種超伝導体に対し、エネルギーが前記バルク体を透過可能な大きさで、かつ、柱状欠損の生成閾値よりも低い粒子ビームを照射して臨界電流密度の制御を行った。
【選択図】図3PROBLEM TO BE SOLVED: To greatly improve the performance of a pseudo permanent magnet or the like by improving and controlling the critical current density of the whole bulk body, and can be implemented by an existing accelerator, and further, the variation of critical current density of a plurality of bulk bodies can be reduced. To provide a method for controlling the critical current density of a bulk superconductor that can be suppressed to improve the performance of the undulator, and a method for producing a bulk superconductor for an undulator.
The critical current density is controlled by irradiating a bulk type second superconductor with a particle beam having a size that allows energy to pass through the bulk body and lower than a columnar defect generation threshold. Went.
[Selection] Figure 3
Description
本発明は、超伝導体の臨界電流密度制御の改良、詳しくは、バルク(塊)体全体の臨界電流密度の向上及び制御を行うことができ、また、現存の加速器により実施することが可能で、しかも、複数のバルク体において臨界電流密度のばらつきを抑制することもできるバルク超伝導体の臨界電流密度制御方法、及びアンジュレータ用バルク超伝導体の製造方法に関するものである。 The present invention can improve the critical current density control of a superconductor, more specifically, improve and control the critical current density of the entire bulk body, and can be implemented by an existing accelerator. Moreover, the present invention relates to a method for controlling the critical current density of a bulk superconductor capable of suppressing variations in critical current density among a plurality of bulk bodies, and a method for manufacturing a bulk superconductor for an undulator.
周知のとおり、バルク超伝導体は、その特性を活かして幅広い分野(例えば、疑似永久磁石や電流リード等)で実用化が進んでおり、近年では、シンクロトロン放射光の挿入光源として使用されるアンジュレータ(電子蛇行装置)に永久磁石の代わりにバルク超伝導体を利用する研究も進められている。 As is well known, bulk superconductors have been put into practical use in a wide range of fields (for example, pseudo-permanent magnets and current leads) by utilizing their characteristics, and in recent years, they are used as insertion light sources for synchrotron radiation. Research is also underway to use bulk superconductors instead of permanent magnets in undulators (electronic meandering devices).
また、バルク超伝導体に関しては、臨界電流密度(単位断面積当たりの超伝導体中に抵抗ゼロで流すことのできる最大の電流値)が性能を左右する重要な要素となっており、この臨界電流密度は、バルク体の内部にピン止め中心(不純物や空孔等の欠陥)を形成することによって実用化レベルまで高めることができる。 For bulk superconductors, the critical current density (the maximum current value that can flow through the superconductor per unit cross section with zero resistance) is an important factor that affects performance. The current density can be increased to a practical level by forming pinning centers (defects such as impurities and vacancies) inside the bulk body.
ゆえに、バルク超伝導体を製造する際には、REBaCuO系(RE:希土類元素)超伝導体の場合だと超伝導相である123相に常伝導相である211相を分散させたり、希土類元素の一部を非超伝導を示す物質と置換したりしてピン止め中心の導入が行われる(例えば、特許文献1参照)。 Therefore, when manufacturing bulk superconductors, in the case of REBaCuO-based (RE: rare earth element) superconductors, the 211 phase which is the normal conduction phase is dispersed in the 123 phase which is the superconducting phase, or the rare earth element is dispersed. The pinning center is introduced by replacing a part of the material with a material exhibiting non-superconductivity (see, for example, Patent Document 1).
しかしながら、上記の方法だけでは、臨界電流密度の制御が難しいだけでなく、同じ方法で製造した複数の超伝導体間でも臨界電流密度にばらつきが出やすい。そして、この臨界電流密度のばらつきは、そのままアンジュレータ磁場振幅のばらつきとなってアンジュレータの性能低下にも繋がる(非特許文献1参照)。 However, not only is the above method difficult to control the critical current density, but also the critical current density tends to vary among a plurality of superconductors manufactured by the same method. Then, the variation in the critical current density becomes the variation in the undulator magnetic field amplitude as it is and leads to a decrease in the performance of the undulator (see Non-Patent Document 1).
一方、ピン止め中心を形成する方法としては、超伝導薄膜に高エネルギー重イオンを照射して柱状欠陥を導入する方法も知られているが(非特許文献2参照)、数mm以上の厚さを持つバルク材を対象とする場合には、極めて高いエネルギーのビーム照射が必要となるため現実的な方法とはいえない。 On the other hand, as a method of forming the pinning center, a method of introducing a columnar defect by irradiating a superconducting thin film with high-energy heavy ions is known (see Non-Patent Document 2). In the case where a bulk material having a thickness of 2 is intended, it is not a realistic method because it requires irradiation with an extremely high energy beam.
また、従来においては、バルク超伝導体に電子線を照射して臨界電流密度を高める技術も開示されているが(特許文献2参照)、この文献に記載された実施例のエネルギーでは、せいぜい表面から1mm程度の浅い範囲にしか欠陥が生成されないため、体積効果の大きい疑似永久磁石や臨界電流密度×断面積で性能が決まる電流リード等において大幅な性能向上を見込めない。 Conventionally, a technique for increasing the critical current density by irradiating an electron beam to a bulk superconductor has also been disclosed (see Patent Document 2). Since defects are generated only in a shallow range of about 1 mm from 1 mm, a large performance improvement cannot be expected in a pseudo permanent magnet having a large volume effect or a current lead whose performance is determined by critical current density × cross-sectional area.
本発明は、上記の如き問題に鑑みて為されたものであり、その目的とするところは、バルク体全体の臨界電流密度の向上および制御により疑似永久磁石等の性能を大幅に改善でき、また、現存の加速器により実施可能で、しかも、複数のバルク体の臨界電流密度のばらつきを抑制してアンジュレータの性能向上も図れるバルク超伝導体の臨界電流密度制御方法、及びアンジュレータ用バルク超伝導体の製造方法を提供することにある。 The present invention has been made in view of the problems as described above, and the object thereof is to greatly improve the performance of a pseudo permanent magnet and the like by improving and controlling the critical current density of the entire bulk body. The method of controlling the critical current density of a bulk superconductor that can be implemented by an existing accelerator and that can improve the performance of the undulator by suppressing variations in the critical current density of a plurality of bulk bodies, and of the bulk superconductor for an undulator It is to provide a manufacturing method.
本発明者が上記課題を解決するために採用した手段を説明すれば次のとおりである。 Means adopted by the present inventor for solving the above-described problems will be described as follows.
即ち、本発明は、バルク状の第二種超伝導体に対し、エネルギーが前記バルク体を透過可能な大きさで、かつ、柱状欠損の生成閾値よりも低い粒子ビームを照射して臨界電流密度を向上・制御する点に特徴がある。 That is, according to the present invention, a critical current density is obtained by irradiating a bulk type II superconductor with a particle beam having a size that allows energy to pass through the bulk body and lower than a threshold value for generating columnar defects. It is characterized in that it improves and controls.
また、本発明では、上記エネルギーがバルク体を透過可能な大きさで、かつ、柱状欠損の生成閾値よりも低い粒子ビームをバルク体全体に照射した後、若しくは照射する前に、バルク体の一部に、所定エネルギーの粒子ビームを重点的に照射して部分的に臨界電流密度を高めることもできる。 In the present invention, the energy of the bulk body is such that the energy is such that the energy can pass through the bulk body and is lower than the columnar defect generation threshold, or before the irradiation. The critical current density can be partially increased by intensively irradiating the part with a particle beam having a predetermined energy.
一方、本発明においては、アンジュレータに複数並べて設置されるバルク超伝導体の製造方法において、バルク状の第二種超伝導体の全体に、エネルギーが前記バルク体を透過可能な大きさで、かつ、柱状欠損の生成閾値よりも低い粒子ビームを照射して臨界電流密度を向上・制御することにより、各バルク超伝導体の臨界電流密度のばらつきを抑制することもできる。 On the other hand, in the present invention, in the method of manufacturing a bulk superconductor arranged in a plurality on an undulator, the bulk of the second type superconductor has a size that allows energy to pass through the bulk body, and By irradiating a particle beam lower than the generation threshold of columnar defects and improving / controlling the critical current density, variation in the critical current density of each bulk superconductor can be suppressed.
また、本発明では、アンジュレータの性能を向上するために、上記手段においてエネルギーがバルク体を透過可能な大きさで、かつ、柱状欠損の生成閾値よりも低い粒子ビームをバルク体全体に照射した後、若しくは照射する前に、アンジュレータの電子ビーム通路の近くに配置されるバルク体の一部に、所定エネルギーの粒子ビームを重点的に照射して部分的に臨界電流密度を高めることもできる。 Further, in the present invention, in order to improve the performance of the undulator, after irradiating the entire bulk body with a particle beam having such a size that the energy can be transmitted through the bulk body and lower than the columnar defect generation threshold in the above means. Alternatively, prior to irradiation, a part of the bulk body disposed near the electron beam path of the undulator may be focused on a particle beam having a predetermined energy to partially increase the critical current density.
また更に、本発明では、アンジュレータの性能を更に向上するために、上記手段において電子ビーム通路に向けて配置されるバルク体の外周面から深さ2mm程度の部分まで欠陥が生じるように粒子ビームを重点的に照射することができる。 Furthermore, in the present invention, in order to further improve the performance of the undulator, the particle beam is applied so that a defect is generated from the outer peripheral surface of the bulk body arranged toward the electron beam path in the above-mentioned means to a portion having a depth of about 2 mm. Irradiation can be focused.
本発明では、バルク超伝導体の臨界電流密度の制御及び向上に、バルク体を透過可能な粒子ビームを照射する方法を採用したことにより、図3に示すようなモデルでピン止め中心をバルク体全体に形成することができるため、超永久電流が全体に流れて磁場が生成される疑似永久磁石や全体に電流を流す電流リード等の性能を大幅に向上することが可能となる。 In the present invention, by adopting a method of irradiating a particle beam that can be transmitted through the bulk body in the control and improvement of the critical current density of the bulk superconductor, the pinning center is set in the bulk body by a model as shown in FIG. Since it can be formed entirely, it is possible to greatly improve the performance of a pseudo permanent magnet in which a super permanent current flows through the whole and a magnetic field is generated, and a current lead through which a current flows.
また本発明では、上記粒子ビームをバルク超伝導体に部分的または重点的に照射して一部の性能を向上することもでき、それによって、一定の材料強度が求められるバルク体の形状加工を行わずに磁束密度の分布を変化させることができる。 In the present invention, it is also possible to partially or intensively irradiate the bulk superconductor with the above particle beam to improve a part of the performance, and thereby to shape the bulk body where a certain material strength is required. The distribution of the magnetic flux density can be changed without performing it.
しかも、上記のように粒子ビームを照射して臨界電流密度を制御すれば、複数のバルク超伝導体間の臨界電流密度のばらつきも抑制可能となるため、複数の超伝導体を利用するアンジュレータにおいても、周期交代磁場分布を均一化して装置性能を改善することができる。 Moreover, if the critical current density is controlled by irradiating the particle beam as described above, the variation in the critical current density between the plurality of bulk superconductors can be suppressed. Therefore, in an undulator using a plurality of superconductors. However, it is possible to improve the device performance by making the periodic alternating magnetic field distribution uniform.
そしてまた、本発明で使用する粒子ビームは、柱状欠陥が生じる程の大きなエネルギーを必要としないため、多少厚みのあるバルク材を対象とする場合でも現存する加速器で充分に対応することができる。 In addition, since the particle beam used in the present invention does not require such a large amount of energy that a columnar defect is generated, even when a bulk material having a certain thickness is targeted, an existing accelerator can sufficiently cope with it.
したがって、本発明により、バルク超伝導体及びその応用製品の性能を向上することができ、しかも、バルク超伝導体の利用を精密な磁場生成を必要とする応用分野へと広げることのできるバルク超伝導体の臨界電流密度制御方法を提供できることから、本発明の実用的利用価値は頗る高い。 Therefore, according to the present invention, it is possible to improve the performance of the bulk superconductor and its application products, and further, it is possible to expand the use of the bulk superconductor to application fields that require precise magnetic field generation. Since the method for controlling the critical current density of the conductor can be provided, the practical utility value of the present invention is very high.
『実施例1』
まず本発明の実施例1について以下に説明する。この実施例1では、粒子ビームに陽子線を選択し、加速器(シンクロトロン)から厚さ2.5mm、直径25.2mmの半円状のバルク超伝導体(組成:DyBa2Cu3O7-δ)全体に200MeVの陽子線を照射した。また照射時における雰囲気温度は25度(室温)で、照射粒子密度は1.0×1012個/cm2であった。
“Example 1”
First, Example 1 of the present invention will be described below. In Example 1, a proton beam is selected as the particle beam, and a semicircular bulk superconductor (composition: DyBa 2 Cu 3 O 7 -δ) having a thickness of 2.5 mm and a diameter of 25.2 mm from an accelerator (synchrotron). The whole was irradiated with 200 MeV proton beam. The ambient temperature during irradiation was 25 ° C. (room temperature), and the irradiation particle density was 1.0 × 10 12 particles / cm 2 .
なお、上記陽子線のエネルギー(200MeV)については、同組成のバルク体を数センチ透過し、かつ、柱状欠損も生じない大きさであることを確認した上で選択している。 The proton beam energy (200 MeV) is selected after confirming that it has a size that transmits several centimeters of the bulk material having the same composition and does not generate columnar defects.
そして、上記陽子線を照射した後、バルク超伝導体を液体窒素中で冷却し最大捕捉磁場の計測を行った。その結果、図1に示すように最大捕捉磁場が0.11Tから0.19Tにまで向上していることが観測された。この結果は、77Kにおける臨界電流密度に換算して70%以上向上したことを意味する。 And after irradiating the said proton beam, the bulk superconductor was cooled in liquid nitrogen and the maximum capture magnetic field was measured. As a result, it was observed that the maximum trapping magnetic field was improved from 0.11T to 0.19T as shown in FIG. This result means an improvement of 70% or more in terms of the critical current density at 77K.
また上記結果から、粒子ビームの照射によってバルク超伝導体の臨界電流密度の大幅な向上が見込めるだけでなく、粒子ビームのエネルギー、強度、照射量の調節によって臨界電流密度の精密な制御も期待できる。 From the above results, not only can the critical current density of bulk superconductors be significantly improved by particle beam irradiation, but also precise control of the critical current density can be expected by adjusting the energy, intensity, and dose of the particle beam. .
『実施例2』
次に本発明の実施例2について以下に説明する。この実施例2では、実施例1と同様に陽子線をバルク超伝導体全体に照射した後、図2に示すアンジュレータの電子ビーム通路の近くに配置されるバルク体の一部に更に粒子ビームの照射をして臨界電流密度を部分的に向上した。
“Example 2”
Next, Example 2 of the present invention will be described below. In Example 2, after irradiating the entire bulk superconductor with a proton beam as in Example 1, a particle beam is further applied to a part of the bulk body arranged near the electron beam path of the undulator shown in FIG. Irradiation partially improved the critical current density.
また、上記粒子ビームを重点的に照射する際、バルク体の外周面から深さ2mm程度の部分まで欠陥が生成されるようにビーム照射を行った。そしてこれにより、複数のバルク超伝導体の周期磁場を均一化すると共に、個々のバルク超伝導体の捕捉磁場分布を最適化してアンジュレータの性能向上を図った。 Further, when the particle beam was intensively irradiated, beam irradiation was performed so that defects were generated from the outer peripheral surface of the bulk body to a portion having a depth of about 2 mm. As a result, the periodic magnetic fields of a plurality of bulk superconductors were made uniform, and the trapped magnetic field distribution of each bulk superconductor was optimized to improve the performance of the undulator.
本発明は、概ね上記の方法を採用するが、上記実施例に限定されるものではなく、「特許請求の範囲」の記載内において種々の変更が可能であって、例えば、超伝導体に照射する粒子ビームには、陽子線以外の電子線や中性子線、重イオン線等を採用できる。また、バルク超伝導体に関しても、REBaCuO系超伝導体でなくても他の高温超伝導体や低温超伝導体を対象とすることができる。 The present invention generally employs the above-described method, but is not limited to the above-described embodiments, and various modifications can be made within the description of “Claims”. For example, superconductor is irradiated. As the particle beam to be used, an electron beam other than a proton beam, a neutron beam, a heavy ion beam, or the like can be used. In addition, regarding the bulk superconductor, other high-temperature superconductors and low-temperature superconductors can be targeted even if they are not REBaCuO-based superconductors.
一方、粒子ビームのエネルギーについては、粒子ビームの種類やバルク体の密度・組成等の諸条件によって設定できるエネルギー範囲が変わるが、バルク体を透過可能で柱状欠損が生成されない大きさであれば自由に設定できる。 On the other hand, for the energy of the particle beam, the energy range that can be set varies depending on various conditions such as the type of particle beam and the density and composition of the bulk body. However, any energy that can penetrate the bulk body and does not generate columnar defects is acceptable. Can be set.
他方また、粒子ビームの部分照射は、機械加工なしで発生磁場分布を変える場合やバルス着磁方式において任意の場所(性能の低い場所)から磁束を侵入させる場合にも有効であり、また部分照射を全体照射の前に行ってもよく、何れも本発明の技術的範囲に属する。 On the other hand, partial irradiation of a particle beam is also effective when changing the generated magnetic field distribution without machining, or when injecting magnetic flux from an arbitrary place (low performance place) in the pulse magnetization method. May be performed before the whole irradiation, both of which belong to the technical scope of the present invention.
近年、エネルギー問題の視点からも超伝導技術の重要性は高まっており、性能向上に資する技術の開発は実用化に不可欠なものとなっている。また、バルク超伝導体を利用して電子ビームの軌道制御を行うスタガードアレイアンジュレータ(Bulk HTSC Staggered Array Undulator)においても、臨界電流密度の制御は装置性能を向上するための重要な課題である。 In recent years, superconducting technology has become more important from the viewpoint of energy problems, and the development of technology that contributes to performance improvement is indispensable for practical use. In the staggered array undulator (Bulk HTSC Staggered Array Undulator) that controls the trajectory of an electron beam using a bulk superconductor, the control of the critical current density is an important issue for improving the device performance.
そのような中で、本発明のバルク超伝導体の臨界電流密度制御方法、及びアンジュレータ用バルク超伝導体の製造方法は、疑似永久磁石や電流リードの性能を大幅に向上でき、またアンジュレータにおける周期磁場のばらつきの課題も克服できる有用な技術であるため、産業上の利用価値は非常に高い。 Under such circumstances, the method for controlling the critical current density of the bulk superconductor and the method for manufacturing the bulk superconductor for the undulator of the present invention can greatly improve the performance of the pseudo permanent magnet and the current lead, and the period in the undulator. Since it is a useful technology that can overcome the problem of magnetic field variation, the industrial utility value is very high.
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