JP2012121962A - Epoxy resin composition, prepreg, and cured product of the same - Google Patents
Epoxy resin composition, prepreg, and cured product of the same Download PDFInfo
- Publication number
- JP2012121962A JP2012121962A JP2010272630A JP2010272630A JP2012121962A JP 2012121962 A JP2012121962 A JP 2012121962A JP 2010272630 A JP2010272630 A JP 2010272630A JP 2010272630 A JP2010272630 A JP 2010272630A JP 2012121962 A JP2012121962 A JP 2012121962A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- group
- carbon atoms
- branched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 130
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 129
- 239000000203 mixture Substances 0.000 title claims abstract description 65
- 239000005011 phenolic resin Substances 0.000 claims abstract description 27
- 238000006243 chemical reaction Methods 0.000 claims abstract description 26
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 24
- 150000001875 compounds Chemical class 0.000 claims abstract description 23
- 239000011256 inorganic filler Substances 0.000 claims abstract description 19
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 19
- 125000003277 amino group Chemical group 0.000 claims abstract description 14
- -1 glycidoxy group Chemical group 0.000 claims description 45
- 125000004432 carbon atom Chemical group C* 0.000 claims description 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 16
- 125000003118 aryl group Chemical group 0.000 claims description 16
- 229910052799 carbon Inorganic materials 0.000 claims description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 15
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 claims description 13
- 125000003545 alkoxy group Chemical group 0.000 claims description 11
- 125000004122 cyclic group Chemical group 0.000 claims description 11
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 10
- 239000000835 fiber Substances 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 9
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 7
- 150000002367 halogens Chemical class 0.000 claims description 7
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 claims description 4
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 claims description 4
- 238000007789 sealing Methods 0.000 claims description 4
- 229920005989 resin Polymers 0.000 abstract description 15
- 239000011347 resin Substances 0.000 abstract description 15
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical class OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 abstract description 9
- 150000001412 amines Chemical class 0.000 abstract description 7
- 229910052582 BN Inorganic materials 0.000 abstract description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 abstract description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract description 2
- 150000004767 nitrides Chemical class 0.000 abstract 1
- 239000000047 product Substances 0.000 description 30
- 150000002989 phenols Chemical class 0.000 description 18
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 239000002904 solvent Substances 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Natural products OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 9
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 235000010290 biphenyl Nutrition 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 5
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 150000002576 ketones Chemical class 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000002966 varnish Substances 0.000 description 5
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 150000001299 aldehydes Chemical class 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- 238000006735 epoxidation reaction Methods 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical class C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 3
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000005882 aldol condensation reaction Methods 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 125000002243 cyclohexanonyl group Chemical group *C1(*)C(=O)C(*)(*)C(*)(*)C(*)(*)C1(*)* 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical class C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 2
- JECYUBVRTQDVAT-UHFFFAOYSA-N 2-acetylphenol Chemical compound CC(=O)C1=CC=CC=C1O JECYUBVRTQDVAT-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- POSWICCRDBKBMH-UHFFFAOYSA-N 3,3,5-trimethylcyclohexan-1-one Chemical compound CC1CC(=O)CC(C)(C)C1 POSWICCRDBKBMH-UHFFFAOYSA-N 0.000 description 2
- IAVREABSGIHHMO-UHFFFAOYSA-N 3-hydroxybenzaldehyde Chemical compound OC1=CC=CC(C=O)=C1 IAVREABSGIHHMO-UHFFFAOYSA-N 0.000 description 2
- UJBOOUHRTQVGRU-UHFFFAOYSA-N 3-methylcyclohexan-1-one Chemical compound CC1CCCC(=O)C1 UJBOOUHRTQVGRU-UHFFFAOYSA-N 0.000 description 2
- TXFPEBPIARQUIG-UHFFFAOYSA-N 4'-hydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1 TXFPEBPIARQUIG-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical class C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical group OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 2
- 150000004074 biphenyls Chemical class 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000012295 chemical reaction liquid Substances 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- CGZZMOTZOONQIA-UHFFFAOYSA-N cycloheptanone Chemical group O=C1CCCCCC1 CGZZMOTZOONQIA-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- 150000004692 metal hydroxides Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 150000003505 terpenes Chemical class 0.000 description 2
- 235000007586 terpenes Nutrition 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- JIRHAGAOHOYLNO-UHFFFAOYSA-N (3-cyclopentyloxy-4-methoxyphenyl)methanol Chemical compound COC1=CC=C(CO)C=C1OC1CCCC1 JIRHAGAOHOYLNO-UHFFFAOYSA-N 0.000 description 1
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 description 1
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical class O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 1
- XOJWBPXKYGHCLN-UHFFFAOYSA-N 1,1'-biphenyl;methanol Chemical compound OC.OC.C1=CC=CC=C1C1=CC=CC=C1 XOJWBPXKYGHCLN-UHFFFAOYSA-N 0.000 description 1
- FMGGHNGKHRCJLL-UHFFFAOYSA-N 1,2-bis(chloromethyl)benzene Chemical group ClCC1=CC=CC=C1CCl FMGGHNGKHRCJLL-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ZZHIDJWUJRKHGX-UHFFFAOYSA-N 1,4-bis(chloromethyl)benzene Chemical compound ClCC1=CC=C(CCl)C=C1 ZZHIDJWUJRKHGX-UHFFFAOYSA-N 0.000 description 1
- DAJPMKAQEUGECW-UHFFFAOYSA-N 1,4-bis(methoxymethyl)benzene Chemical compound COCC1=CC=C(COC)C=C1 DAJPMKAQEUGECW-UHFFFAOYSA-N 0.000 description 1
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- FCJSHPDYVMKCHI-UHFFFAOYSA-N phenyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OC1=CC=CC=C1 FCJSHPDYVMKCHI-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- ZWLUXSQADUDCSB-UHFFFAOYSA-N phthalaldehyde Chemical class O=CC1=CC=CC=C1C=O ZWLUXSQADUDCSB-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Chemical class COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- HTSABYAWKQAHBT-UHFFFAOYSA-N trans 3-methylcyclohexanol Natural products CC1CCCC(O)C1 HTSABYAWKQAHBT-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical class CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
本発明は、新規なエポキシ樹脂組成物並びに、前記エポキシ樹脂組成物を使用して得られるプリプレグに関する。また、本発明は、前記エポキシ樹脂組成物またはプリプレグを硬化してなる硬化物に関する。 The present invention relates to a novel epoxy resin composition and a prepreg obtained using the epoxy resin composition. Moreover, this invention relates to the hardened | cured material formed by hardening | curing the said epoxy resin composition or prepreg.
エポキシ樹脂組成物は、一般的に機械的性質、耐水性、耐薬品性、耐熱性、電気的性質などに優れた硬化物となり、接着剤、塗料、積層板、成形材料、注型材料などの幅広い分野に利用されている。近年、これらの分野に用いられるエポキシ樹脂の硬化物には、高純度化を始め、難燃性、耐熱性、耐湿性、強靭性、低線膨張率、低誘電率特性など諸特性の一層の向上が求められている。 Epoxy resin compositions are generally cured products with excellent mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, etc., such as adhesives, paints, laminates, molding materials, casting materials, etc. It is used in a wide range of fields. In recent years, cured products of epoxy resins used in these fields have begun to be highly purified and have various properties such as flame retardancy, heat resistance, moisture resistance, toughness, low linear expansion coefficient, and low dielectric constant characteristics. There is a need for improvement.
特に、エポキシ樹脂組成物の代表的な用途である電気・電子産業分野においては、多機能化、高性能化、コンパクト化を目的とした半導体の高密度実装やプリント配線板の高密度配線化が進んでいる。しかしながら、高密度実装化や高密度配線化は、半導体素子やプリント配線板の内部から発生する熱を増加させ、機器類の誤作動を引き起こす原因となりうる。そのため、発生した熱をいかにして効率よく外部に放出させるかということが、エネルギー効率や機器設計の上からも重要な課題となっている。
これら熱対策としては、メタルコア基板を使用したり、設計の段階で放熱しやすい構造を組んだり、使用する高分子材料(エポキシ樹脂)に高熱伝導フィラーを細密充填したりするなど、様々な工夫がなされている。しかしながら、高熱伝導部位を繋げるバインダー役の高分子材料の熱伝導率が低いため、高分子材料の熱伝導スピードが律速となり、効率的な放熱ができていないのが現状である。
In particular, in the electrical and electronic industry, which is a typical application of epoxy resin compositions, high-density mounting of semiconductors and high-density wiring of printed wiring boards have been promoted for the purpose of multi-function, high performance, and compactness. Progressing. However, high-density mounting and high-density wiring increase the heat generated from the inside of the semiconductor element and the printed wiring board, and may cause malfunction of the devices. Therefore, how to efficiently release generated heat to the outside is an important issue from the standpoint of energy efficiency and device design.
These heat countermeasures include various measures such as using a metal core substrate, constructing a structure that easily dissipates heat at the design stage, and densely filling high thermal conductive filler in the polymer material (epoxy resin) to be used. Has been made. However, since the thermal conductivity of the polymer material acting as a binder that connects the high thermal conductivity sites is low, the thermal conduction speed of the polymer material becomes the rate-determining, and efficient heat dissipation is not possible at present.
エポキシ樹脂の高熱伝導化を実現する手段として、特許文献1では、メソゲン基をエポキシ樹脂構造中に導入する手法が報告されている。同文献にはメソゲン基を有するエポキシ樹脂として、ビフェニル骨格を有するエポキシ樹脂などが記載されている。またビフェニル骨格以外のエポキシ樹脂としてはフェニルベンゾエート型のエポキシ樹脂が記載されているが、該エポキシ樹脂は酸化によるエポキシ化反応によって製造する必要があることから、安全性やコストに難があり実用的とは言えない。
また、特許文献2〜4には、ビフェニル骨格を有するエポキシ樹脂を用いた例が記載されており、中でも特許文献3には高熱伝導率を有する無機充填材を併用する手法が記載されている。しかしながら、これら文献に記載の手法により得られる硬化物の熱伝導性は市場の要望を満足するレベルでは無く、比較的安価に入手可能なエポキシ樹脂を用いた、より高い熱伝導率を有する硬化物を与えるエポキシ樹脂組成物が求められている。
As a means for realizing high thermal conductivity of an epoxy resin, Patent Document 1 reports a method of introducing a mesogenic group into an epoxy resin structure. This document describes an epoxy resin having a biphenyl skeleton as an epoxy resin having a mesogenic group. In addition, as an epoxy resin other than the biphenyl skeleton, a phenyl benzoate type epoxy resin is described. However, since the epoxy resin needs to be produced by an epoxidation reaction by oxidation, there are difficulties in safety and cost, and it is practical. It can not be said.
Patent Documents 2 to 4 describe examples using an epoxy resin having a biphenyl skeleton, and Patent Document 3 describes a technique in which an inorganic filler having high thermal conductivity is used in combination. However, the thermal conductivity of the cured product obtained by the methods described in these documents is not at a level that satisfies the market demand, and a cured product having higher thermal conductivity using an epoxy resin that is available at a relatively low cost. There is a need for an epoxy resin composition that provides.
特許文献5、6には、低粘度、低吸湿、密着性を向上させるために特定エポキシ樹脂が記載されているが、エポキシ樹脂と併用する硬化剤によって、熱伝導性、耐熱性の良し悪しは大きく左右されるため、従来技術では十分な高熱伝導性と耐熱性を有するエポキシ樹脂組成物が提案されておらず、当該特性を有するエポキシ樹脂組成物の開発が望まれていた。 Patent Documents 5 and 6 describe specific epoxy resins for improving low viscosity, low moisture absorption, and adhesion, but depending on the curing agent used in combination with the epoxy resin, thermal conductivity and heat resistance are good or bad. Therefore, the prior art has not proposed an epoxy resin composition having sufficiently high thermal conductivity and heat resistance, and development of an epoxy resin composition having such characteristics has been desired.
本発明はこのような問題を解決すべく検討の結果なされたものであり、その硬化物が高い熱伝導性、優れた耐熱性を有するエポキシ樹脂組成物を提供するものである。 The present invention has been made as a result of studies to solve such problems, and provides an epoxy resin composition whose cured product has high thermal conductivity and excellent heat resistance.
本発明者らは前記課題を解決するために鋭意研究した結果、本発明を完成させるに到った。
すなわち本発明は
(1)
下記式(1)
(式(1)中、R1はそれぞれ独立して存在し、水素原子、炭素数1〜10の直鎖、分岐あるいは環状のアルキル基、炭素数1〜10のアリール基、水酸基、又は、炭素数1〜10の直鎖、分岐あるいは環状のアルコキシ基のいずれかを表す。nは炭素数を表し、0、1、2のいずれかの整数を表す。mはR1の数を表し、1≦m≦n+2の関係を満たす。)
で表される化合物とヒドロキシベンズアルデヒド類との反応によって得られるフェノール樹脂とエピハロヒドリンを反応させて得られる全ハロゲン量が、1600ppm以下である下記式(2)で表せられるエポキシ樹脂(A)
(2)
前項(1)記載のエポキシ樹脂(A)が、下記式(3)である前項(1)に記載のエポキシ樹脂組成物、
(3)
アミノ基を少なくとも2つ有するアミン系化合物(B)がジアミノジフェニルメタン、ジアミノジフェニルスルホン、ナフタレンジアミンからなる群から選択される1種以上の化合物である(1)または(2)のいずれか一項に記載のエポキシ樹脂組成物、
(4)
熱伝導率が20W/m・K以上の無機充填材(C)を含有してなる(1)〜(3)のいずれか一項に記載のエポキシ樹脂組成物、
(5)
半導体封止用途に用いられる前項(1)〜(4)のいずれか一項に記載のエポキシ樹脂組成物、
(6)
前項(1)〜(4)のいずれか一項に記載のエポキシ樹脂組成物及びシート状の繊維基材からなるプリプレグ、
(7)
前項(1)〜(4)のいずれか一項に記載のエポキシ樹脂組成物、または前項(6)に記載のプリプレグを硬化してなる硬化物、
As a result of intensive studies to solve the above problems, the present inventors have completed the present invention.
That is, the present invention provides (1)
Following formula (1)
(In Formula (1), each R 1 is independently present and is a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 1 to 10 carbon atoms, a hydroxyl group, or carbon. Represents any of linear, branched or cyclic alkoxy groups of 1 to 10. n represents the number of carbon atoms and represents an integer of 0, 1 or 2. m represents the number of R 1 ; ≦ m ≦ n + 2 is satisfied.)
An epoxy resin (A) represented by the following formula (2) in which the total halogen content obtained by reacting a phenol resin obtained by the reaction of a compound represented by formula (II) with hydroxybenzaldehyde and epihalohydrin is 1600 ppm or less.
(2)
The epoxy resin composition according to item (1), wherein the epoxy resin (A) described in item (1) is represented by the following formula (3):
(3)
The amine compound (B) having at least two amino groups is one or more compounds selected from the group consisting of diaminodiphenylmethane, diaminodiphenylsulfone, and naphthalenediamine (1) or (2) The epoxy resin composition according to the description,
(4)
The epoxy resin composition according to any one of (1) to (3), comprising an inorganic filler (C) having a thermal conductivity of 20 W / m · K or more,
(5)
The epoxy resin composition according to any one of (1) to (4), which is used for semiconductor sealing applications,
(6)
A prepreg comprising the epoxy resin composition according to any one of (1) to (4) and a sheet-like fiber base material,
(7)
A cured product obtained by curing the epoxy resin composition according to any one of (1) to (4) or the prepreg according to (6);
ここで、前記式(1)において、アルキル基としては、メチル基、エチル基、プロピル基等の炭素数1〜10のアルキル基が挙げられ、これらアルキル基は直鎖状であっても分岐鎖状であってもよい。
アリール基としては、フェニル基、トリル基、キシリル基、ナフチル基等の炭素数6〜10のアリール基が挙げられ、これらアリール基は前記アルキル基等の置換基を有していてもよい。
アルコキシ基としては、メトキシ基、エトキシ基、プロポキシ基、ケタール基等の炭素数1〜10のアルコシキ基が挙げられ、直鎖状であっても分岐鎖状であってもよい。
に関する。
Here, in the formula (1), examples of the alkyl group include alkyl groups having 1 to 10 carbon atoms such as a methyl group, an ethyl group, and a propyl group, and these alkyl groups may be linear or branched. It may be a shape.
Examples of the aryl group include aryl groups having 6 to 10 carbon atoms such as a phenyl group, a tolyl group, a xylyl group, and a naphthyl group, and these aryl groups may have a substituent such as the alkyl group.
Examples of the alkoxy group include C1-C10 alkoxy groups such as a methoxy group, an ethoxy group, a propoxy group, and a ketal group, and may be linear or branched.
About.
本発明のエポキシ樹脂組成物は、その硬化物が特に熱伝導に優れ、高い耐熱性を有しているため、半導体封止材料、プリプレグを始めとする各種複合材料、接着剤、塗料等に使用する場合に有用である。 The epoxy resin composition of the present invention is used for semiconductor encapsulating materials, various composite materials including prepregs, adhesives, paints, etc., because the cured product is particularly excellent in heat conduction and has high heat resistance. Useful when you want.
本発明のエポキシ樹脂組成物は、式(2)記載のエポキシ樹脂(A)、アミノ基を少なくとも2つ有するアミン系化合物(B)及び熱伝導率20W/m・K以上の無機充填材(C)を含有してなるエポキシ樹脂組成物である。 The epoxy resin composition of the present invention comprises an epoxy resin (A) described in formula (2), an amine compound (B) having at least two amino groups, and an inorganic filler (C) having a thermal conductivity of 20 W / m · K or more. ) Containing an epoxy resin composition.
本発明のエポキシ樹脂組成物が含有するエポキシ樹脂(A)について説明する。
まず、本発明に用いるメソゲン基を有するフェノール樹脂について説明する。
本発明のエポキシ樹脂は、前記式(1)で表される化合物とヒドロキシベンズアルデヒド類との反応によって得られるフェノール樹脂(以下、メソゲン基を有するフェノール樹脂と称す。)に、さらにエピハロヒドリンを反応させて得られるエポキシ樹脂である。
本発明に使用するエポキシ樹脂(A)を得るためにヒドロキシベンズアルデヒド類との反応に用いられる式(1)で表される化合物の例としては、
(イ)シクロペンタノン、3−フェニルシクロペンタノン、1,3−シクロペンタンジオン等のシクロペンタノン骨格を有する化合物、
(ロ)シクロヘキサノン、3−メチルシクロヘキサノン、4−メチルシクロヘキサノン、4−エチルシクロヘキサノン、4−tert−ブチルシクロヘキサノン、4−ペンチルシクロヘキサノン、3−フェニルシクロヘキサノン、4−フェニルシクロヘキサノン、3,3−ジメチルシクロヘキサノン、3,4−ジメチルシクロヘキサノン、3,5−ジメチルシクロヘキサノン、4,4−ジメチルシクロヘキサノン、3,3,5−トリメチルシクロヘキサノン、4−シクロヘキサノンカルボン酸エチル等のフェニル基、アルキル基またはエステル結合を有するシクロヘキサノン骨格を有する化合物、
(ハ)1,4−シクロヘキサンジオンモノエチレンケタール、ビシクロヘキサン−4,4’ −ジオンモノエチレンケタール、1,4−シクロヘキサンジオンモノ−2,2−ジメチルトリメチレンケタール等のケタール構造及びシクロヘキサノン骨格を有する化合物、
(ニ)1,3−シクロヘキサンジオン、1,4−シクロヘキサンジオン、5−メチル−1,3−シクロヘキサンジオン、ジメドン、1,4−シクロヘキサンジオン−2,5−ジカルボン酸ジメチル等のシクロヘキサンジオン構造を有する化合物、
(ホ)4,4’ −ビシクロヘキサノン、2,2−ビス(4−オキソシクロヘキシル)プロパン等の2つのシクロヘキサノン骨格を有する化合物、
(ヘ)シクロヘプタノン等のシクロヘプタノン骨格を有する化合物、
などが挙げられる。
この場合において、硬化物に高い熱伝導率を付与する観点から、前記式(1)においてR1が水素原子または炭素数1〜2のアルキル基であることが好ましく、水素原子であることが特に好ましい。
The epoxy resin (A) contained in the epoxy resin composition of the present invention will be described.
First, the phenol resin having a mesogenic group used in the present invention will be described.
The epoxy resin according to the present invention is obtained by further reacting an epihalohydrin with a phenol resin (hereinafter referred to as a phenol resin having a mesogenic group) obtained by reacting the compound represented by the formula (1) with hydroxybenzaldehydes. The resulting epoxy resin.
Examples of the compound represented by the formula (1) used in the reaction with hydroxybenzaldehydes to obtain the epoxy resin (A) used in the present invention include:
(A) a compound having a cyclopentanone skeleton such as cyclopentanone, 3-phenylcyclopentanone, 1,3-cyclopentanedione,
(B) Cyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, 4-ethylcyclohexanone, 4-tert-butylcyclohexanone, 4-pentylcyclohexanone, 3-phenylcyclohexanone, 4-phenylcyclohexanone, 3,3-dimethylcyclohexanone, 3 1,4-dimethylcyclohexanone, 3,5-dimethylcyclohexanone, 4,4-dimethylcyclohexanone, 3,3,5-trimethylcyclohexanone, cyclohexanone skeleton having phenyl group, alkyl group or ester bond such as ethyl 4-cyclohexanone carboxylate A compound having,
(C) a ketal structure such as 1,4-cyclohexanedione monoethylene ketal, bicyclohexane-4,4′-dione monoethylene ketal, 1,4-cyclohexanedione mono-2,2-dimethyltrimethylene ketal and a cyclohexanone skeleton; A compound having,
(D) cyclohexanedione structures such as 1,3-cyclohexanedione, 1,4-cyclohexanedione, 5-methyl-1,3-cyclohexanedione, dimedone, dimethyl 1,4-cyclohexanedione-2,5-dicarboxylate, etc. A compound having,
(E) a compound having two cyclohexanone skeletons such as 4,4′-bicyclohexanone and 2,2-bis (4-oxocyclohexyl) propane;
(F) a compound having a cycloheptanone skeleton such as cycloheptanone,
Etc.
In this case, from the viewpoint of imparting high thermal conductivity to the cured product, R 1 in the formula (1) is preferably a hydrogen atom or an alkyl group having 1 to 2 carbon atoms, and particularly preferably a hydrogen atom. preferable.
メソゲン基を有するフェノール樹脂を得るために、式(1)で表される化合物の一種以上との反応に用いられるヒドロキシベンズアルデヒド類としては、例えばo−、m−およびp−ヒドロキシベンズアルデヒドなどが挙げられる。これらは1種のみを使用しても、2種類以上を併用してもよい。これらのうち、エポキシ樹脂組成物の硬化物が特に高い熱伝導性を示すことから、p−ヒドロキシベンズアルデヒドを単独で使用するのが好ましい。 In order to obtain a phenol resin having a mesogenic group, examples of the hydroxybenzaldehyde used in the reaction with one or more compounds represented by the formula (1) include o-, m-, and p-hydroxybenzaldehyde. . These may use only 1 type or may use 2 or more types together. Of these, it is preferable to use p-hydroxybenzaldehyde alone because the cured product of the epoxy resin composition exhibits particularly high thermal conductivity.
メソゲン基を有するフェノール樹脂は、酸性条件下もしくは塩基性条件下、式(1)で表される化合物の一種以上とヒドロキシベンズアルデヒド類とのアルドール縮合反応によって得られる。
ヒドロキシベンズアルデヒド類は、式(1)で表される化合物1モルに対して2.0〜3.15モルを使用することがそれぞれ好ましい。
The phenol resin having a mesogenic group is obtained by an aldol condensation reaction between one or more compounds represented by the formula (1) and hydroxybenzaldehyde under acidic conditions or basic conditions.
The hydroxybenzaldehyde is preferably used in an amount of 2.0 to 3.15 mol per 1 mol of the compound represented by the formula (1).
酸性条件下でアルドール縮合反応を行う場合、用い得る酸性触媒としては、塩酸、硫酸、硝酸のような無機酸、トルエンスルホン酸、キシレンスルホン酸、シュウ酸等の有機酸が挙げられる。これらは単独で使用してもよく、複数の種類を併用してもよい。酸性触媒の使用量は、ヒドロキシベンズアルデヒド類1モルに対して0.01〜1.0モル、好ましくは0.2〜0.5モルである。 When the aldol condensation reaction is performed under acidic conditions, examples of the acidic catalyst that can be used include inorganic acids such as hydrochloric acid, sulfuric acid, and nitric acid, and organic acids such as toluenesulfonic acid, xylenesulfonic acid, and oxalic acid. These may be used alone or in combination of a plurality of types. The usage-amount of an acidic catalyst is 0.01-1.0 mol with respect to 1 mol of hydroxy benzaldehydes, Preferably it is 0.2-0.5 mol.
一方、塩基性条件下でアルドール縮合反応を行う場合、用い得る塩基性触媒としては、水酸化ナトリウム及び水酸化カリウム等の金属水酸化物、炭酸カリウム及び炭酸ナトリウム等の炭酸アルカリ金属塩、ジエチルアミン、トリエチルアミン、トリブチルアミン、ジイソブチルアミン、ピリジン及びピペリジン等のアミン誘導体、並びにジメチルアミノエチルアルコール及びジエチルアミノエチルアルコール等のアミノアルコール誘導体が挙げられる。塩基性条件の場合も、先に挙げた塩基性触媒を単独で使用してもよく、複数の種類を併用してもよい。塩基性触媒の使用量は、ヒドロキシベンズアルデヒド類1モルに対して0.1〜2.5モル、好ましくは0.2〜2.0モルである。 On the other hand, when the aldol condensation reaction is performed under basic conditions, usable basic catalysts include metal hydroxides such as sodium hydroxide and potassium hydroxide, alkali metal carbonates such as potassium carbonate and sodium carbonate, diethylamine, Examples include amine derivatives such as triethylamine, tributylamine, diisobutylamine, pyridine and piperidine, and amino alcohol derivatives such as dimethylaminoethyl alcohol and diethylaminoethyl alcohol. Also in the case of basic conditions, the basic catalysts listed above may be used alone, or a plurality of types may be used in combination. The usage-amount of a basic catalyst is 0.1-2.5 mol with respect to 1 mol of hydroxy benzaldehydes, Preferably it is 0.2-2.0 mol.
メソゲン基を有するフェノール樹脂を得る反応では、必要に応じて溶剤を使用してもよい。用い得る溶剤としては、例えばアセトン、メチルエチルケトン等のケトン類のようにヒドロキシベンズアルデヒド類との反応性を有するものでなければ特に制限はないが、原料のヒドロキシベンズアルデヒド類を容易に溶解させる点ではメタノール、エタノール、イソプロピルアルコール等のアルコール類を溶剤として用いるのが好ましい。 In the reaction for obtaining a phenol resin having a mesogenic group, a solvent may be used as necessary. The solvent that can be used is not particularly limited as long as it is not reactive with hydroxybenzaldehydes, such as ketones such as acetone and methyl ethyl ketone, but in terms of easily dissolving the raw hydroxybenzaldehydes, methanol, It is preferable to use alcohols such as ethanol and isopropyl alcohol as a solvent.
反応温度は通常10〜90℃であり、好ましくは35〜70℃である。反応時間は通常0.5〜13時間であるが、原料化合物の種類によって反応性に差があるため、この限りではない。反応終了後、樹脂として取り出す場合には、反応物を水洗後または水洗無しに、加熱減圧下で反応液から未反応物や溶媒等を除去する。結晶で取り出す場合、大量の水中に反応液を滴下することにより結晶を析出させる。塩基性条件で反応を行った場合は生成したメソゲン基を有するフェノール樹脂が水中に溶け込むこともありうるので、塩酸を加えるなどして中性〜酸性条件にして結晶として析出させる。 The reaction temperature is usually 10 to 90 ° C, preferably 35 to 70 ° C. Although reaction time is 0.5 to 13 hours normally, since there is a difference in reactivity by the kind of raw material compound, it is not this limitation. When taking out as a resin after completion | finish of reaction, an unreacted substance, a solvent, etc. are removed from a reaction liquid under heating and pressure reduction, after washing | cleaning a reaction substance without water washing. When taking out with a crystal | crystallization, a crystal | crystallization is deposited by dripping a reaction liquid in a lot of water. When the reaction is carried out under basic conditions, the generated phenol resin having a mesogenic group may dissolve in water, so that it is precipitated as crystals under neutral to acidic conditions by adding hydrochloric acid or the like.
不純物を除去するため結晶を水洗し、その後乾燥させてメソゲン基を有するフェノール樹脂を得る工程を介入させることが好ましく、当該工程により、より不純物の少ない当該フェノール樹脂を得ることができる。 In order to remove impurities, it is preferable to intervene a step of washing the crystals with water and then drying to obtain a phenol resin having a mesogenic group, and the phenol resin with less impurities can be obtained by this step.
こうして得られるメソゲン基を有するフェノール樹脂は、下記式(4)
で表せられる。
この場合において、エピハロヒドリンと反応させて得るエポキシ樹脂の硬化物の熱伝導性を高める観点から上記式(4)の化合物の中でも、下記式(5)の化合物が好ましい。
It can be expressed as
In this case, the compound of the following formula (5) is preferable among the compounds of the above formula (4) from the viewpoint of enhancing the thermal conductivity of the cured epoxy resin obtained by reacting with epihalohydrin.
次に、本発明に用いるエポキシ樹脂について説明する。
本発明に用いるエポキシ樹脂は、上記手法によって得られたメソゲン基を有するフェノール樹脂とエピハロヒドリンとを反応させ、エポキシ化することにより得られる。また、メソゲン基を有するフェノール樹脂に、当該フェノール樹脂以外のフェノール化合物を併用しても良い。
併用し得るフェノール樹脂以外のフェノール化合物としては、エポキシ樹脂の原料として通常用いられるフェノール化合物であれば特に制限なく用いることができるが、硬化物が高い熱伝導率を有するという本発明の効果が損なわれる恐れがあるので、併用し得るフェノール化合物の使用量は極力少ないことが好ましく、上記のメソゲン基を有するフェノール樹脂のみを用いることが特に好ましい。
本発明が含有するエポキシ樹脂としては、特に高い熱伝導率有する硬化物が得られることから、ヒドロキシベンズアルデヒド類と式(1)で表される化合物との反応により得られたメソゲン基を有するフェノール樹脂を用いて得ることができる。
Next, the epoxy resin used in the present invention will be described.
The epoxy resin used for this invention is obtained by making the phenol resin which has the mesogenic group obtained by the said method, and an epihalohydrin react, and epoxidizing. Moreover, you may use together phenol compounds other than the said phenol resin with the phenol resin which has a mesogenic group.
As the phenolic compound other than the phenolic resin that can be used in combination, any phenolic compound that is usually used as a raw material for epoxy resin can be used without particular limitation, but the effect of the present invention that the cured product has high thermal conductivity is impaired. Therefore, the amount of the phenol compound that can be used in combination is preferably as small as possible, and it is particularly preferable to use only the phenol resin having the mesogenic group.
The epoxy resin contained in the present invention is a phenol resin having a mesogenic group obtained by a reaction between a hydroxybenzaldehyde and a compound represented by the formula (1) because a cured product having a particularly high thermal conductivity is obtained. Can be used.
本発明が含有するエポキシ樹脂を得る反応において、エピハロヒドリンとしてはエピクロルヒドリン、α−メチルエピクロルヒドリン、β−メチルエピクロルヒドリン、エピブロモヒドリン等が使用できるが、工業的に入手が容易なエピクロルヒドリンが好ましい。エピハロヒドリンの使用量は、メソゲン基を有するフェノール樹脂の水酸基1モルに対し通常1〜20モル、好ましくは1.5〜12モルである。 In the reaction for obtaining the epoxy resin contained in the present invention, epichlorohydrin, α-methylepichlorohydrin, β-methylepichlorohydrin, epibromohydrin and the like can be used as the epihalohydrin, and epichlorohydrin which is easily available industrially is preferable. The usage-amount of epihalohydrin is 1-20 mol normally with respect to 1 mol of hydroxyl groups of the phenol resin which has a mesogenic group, Preferably it is 1.5-12 mol.
エポキシ化反応に使用できるアルカリ金属水酸化物としては、水酸化ナトリウム、水酸化カリウム等が挙げられ、これらは固形物をそのまま使用しても、あるいはその水溶液を使用してもよい。水溶液を使用する場合は、該アルカリ金属水酸化物の水溶液を連続的に反応系内に添加すると共に、減圧下または常圧下で連続的に留出させた水及びエピハロヒドリンの混合液から分液により水を除去し、エピハロヒドリンのみを反応系内に連続的に戻す方法でもよい。アルカリ金属水酸化物の使用量は、メソゲン基を有するフェノール樹脂の水酸基1モルに対して通常0.9〜3.0モル、好ましくは1.0〜2.5モル、より好ましくは1.0〜1.1モルである。ここで、アルカリ金属水酸化物を水溶液として使用することは残存ハロゲン量の低減が困難であることから好ましくない。
ここで、固形物のアルカリ金属の添加の方法としては、数回に分割して添加することが反応温度の急激な上昇および、不純物である1,3−ハロヒドリン体やハロメチレン体の生成を防ぐ観点から好ましい。
Examples of the alkali metal hydroxide that can be used for the epoxidation reaction include sodium hydroxide, potassium hydroxide, and the like, and these may be used as they are, or an aqueous solution thereof may be used. When using an aqueous solution, the aqueous solution of the alkali metal hydroxide is continuously added to the reaction system and separated from a mixture of water and epihalohydrin distilled continuously under reduced pressure or normal pressure. Alternatively, water may be removed and only the epihalohydrin is continuously returned to the reaction system. The amount of the alkali metal hydroxide used is usually 0.9 to 3.0 mol, preferably 1.0 to 2.5 mol, more preferably 1.0 to 1 mol of the hydroxyl group of the phenol resin having a mesogenic group. -1.1 mol. Here, it is not preferable to use an alkali metal hydroxide as an aqueous solution because it is difficult to reduce the amount of residual halogen.
Here, as a method for adding the alkali metal as a solid, it is possible to divide it into several times to prevent a sudden increase in reaction temperature and the formation of impurities such as 1,3-halohydrin and halomethylene. To preferred.
エポキシ化反応を促進するために、テトラメチルアンモニウムクロライド、テトラメチルアンモニウムブロマイド、トリメチルベンジルアンモニウムクロライド等の4級アンモニウム塩を触媒として添加することが好ましい。4級アンモニウム塩の使用量としては、メソゲン基を有するフェノール樹脂の水酸基1モルに対し通常0.1〜15gであり、好ましくは0.2〜10gである。 In order to accelerate the epoxidation reaction, it is preferable to add a quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, trimethylbenzylammonium chloride as a catalyst. The amount of the quaternary ammonium salt used is usually 0.1 to 15 g, preferably 0.2 to 10 g, per 1 mol of the hydroxyl group of the phenol resin having a mesogenic group.
また、エポキシ化の際に、メタノール、エタノール、イソプロピルアルコールなどのアルコール類、ジメチルスルホン、ジメチルスルホキシド、テトラヒドロフラン、ジオキサン等の非プロトン性極性溶媒などを添加して反応を行うことが反応進行上好ましい。 In addition, during the epoxidation, it is preferable for the reaction to proceed by adding an aprotic polar solvent such as alcohols such as methanol, ethanol and isopropyl alcohol, dimethyl sulfone, dimethyl sulfoxide, tetrahydrofuran and dioxane.
上記アルコール類を使用する場合、その使用量はエピハロヒドリンの使用量に対し通常2〜50質量%、好ましくは4〜20質量%である。また非プロトン性極性溶媒を用いる場合はエピハロヒドリンの使用量に対し通常5〜100質量%、好ましくは10〜80質量%である。 When using the said alcohol, the usage-amount is 2-50 mass% normally with respect to the usage-amount of an epihalohydrin, Preferably it is 4-20 mass%. Moreover, when using an aprotic polar solvent, it is 5-100 mass% normally with respect to the usage-amount of epihalohydrin, Preferably it is 10-80 mass%.
反応温度は通常30〜90℃であり、好ましくは35〜80℃である。反応時間は通常0.5〜10時間であり、好ましくは1〜8時間である。
反応終了後、反応物を水洗後、または水洗無しに加熱減圧下で反応液からエピハロヒドリンや溶媒等を除去する。また得られたエポキシ樹脂中に含まれる加水分解性ハロゲンの量をさらに低減させるために、回収したエポキシ樹脂をトルエン、メチルイソブチルケトンなどの溶剤に溶解し、水酸化ナトリウム、水酸化カリウムなどのアルカリ金属水酸化物の水溶液を加えて反応を行なっても良い。かかる操作を行なうことで閉環を確実なものにすることができる。この場合、アルカリ金属水酸化物の使用量は、メソゲン基を有するフェノール樹脂の水酸基1モルに対して通常0.01〜0.3モル、好ましくは0.05〜0.2モルである。反応温度は通常50〜120℃、反応時間は通常0.5〜2時間である。
かかる操作により、より効果的にハロゲン量の低減を実現することができる。
The reaction temperature is usually 30 to 90 ° C, preferably 35 to 80 ° C. The reaction time is usually 0.5 to 10 hours, preferably 1 to 8 hours.
After completion of the reaction, the reaction product is washed with water or without washing with water, and the epihalohydrin, the solvent and the like are removed from the reaction solution under heating and reduced pressure. In order to further reduce the amount of hydrolyzable halogen contained in the obtained epoxy resin, the recovered epoxy resin is dissolved in a solvent such as toluene or methyl isobutyl ketone, and an alkali such as sodium hydroxide or potassium hydroxide is dissolved. You may react by adding the aqueous solution of a metal hydroxide. By performing such an operation, the ring closure can be ensured. In this case, the usage-amount of an alkali metal hydroxide is 0.01-0.3 mol normally with respect to 1 mol of hydroxyl groups of the phenol resin which has a mesogenic group, Preferably it is 0.05-0.2 mol. The reaction temperature is usually 50 to 120 ° C., and the reaction time is usually 0.5 to 2 hours.
By such an operation, the amount of halogen can be more effectively reduced.
反応終了後、生成した塩を濾過、水洗などにより除去し、更に加熱減圧下で溶剤を留去することにより本発明のエポキシ樹脂が得られる。また、結晶として析出したエポキシ樹脂を、大量の水に生成した塩を溶解した後に、エポキシ樹脂の結晶を濾取してもよい。
こうして得られる本発明が含有するエポキシ樹脂の残存ハロゲン量は1800ppm以下が通常であり、1600ppm以下であることが好ましい。全ハロゲン量が多すぎるものは硬化物の電気信頼性に悪影響を及ぼすことに加えて、未架橋の末端として残ることから、硬化時の融解状態時の分子同士の配向が進まずに熱伝導性の低下につながる。
After completion of the reaction, the produced salt is removed by filtration, washing with water, and the like, and the solvent is distilled off under heating and reduced pressure to obtain the epoxy resin of the present invention. Alternatively, the epoxy resin crystal may be collected by filtering the epoxy resin deposited as crystals after dissolving a salt generated in a large amount of water.
The residual halogen content of the epoxy resin contained in the present invention thus obtained is usually 1800 ppm or less, and preferably 1600 ppm or less. If the total halogen content is too large, the electrical reliability of the cured product will be adversely affected, and it will remain as an uncrosslinked end, so the orientation of the molecules in the molten state during curing will not proceed and the thermal conductivity Leading to a decline.
また、本発明が含有するエポキシ樹脂の軟化点は通常50〜120℃であり、好ましくは50〜80℃である。 Moreover, the softening point of the epoxy resin which this invention contains is 50-120 degreeC normally, Preferably it is 50-80 degreeC.
上記の方法により得られる本発明が含有するエポキシ樹脂は、通常下記式(2)
で表せられる。
また、本発明のエポキシ樹脂においては、硬化物の熱伝導性が高いエポキシ樹脂を得る観点から、上記エポキシ樹脂において上記式(2)が下記式(3)
で表せられるエポキシ樹脂であることが特に好ましい。
さらに、上記(3)式においてn=1であり、R1が全て水素原子のものが特に好ましい。
The epoxy resin contained in the present invention obtained by the above method is usually represented by the following formula (2)
It can be expressed as
In the epoxy resin of the present invention, from the viewpoint of obtaining an epoxy resin having high thermal conductivity of the cured product, the above formula (2) in the above epoxy resin is represented by the following formula (3).
An epoxy resin represented by the formula is particularly preferred.
Furthermore, it is particularly preferable that n = 1 in the above formula (3) and R 1 is all hydrogen atoms.
次に、アミノ基を少なくとも2つ有するアミン系化合物(B)について説明する。
本発明に用いるアミノ基を少なくとも2つ有するアミン系化合物としては、公知のアミノ基を少なくとも2つ有するアミン系化合物であれば特に限定されないが、具体的にはジアミノジフェニルメタン、ナフタレンジアミン、ジアミノジフェニルスルホン等の芳香環を有するアミン系化合物、ジエチレントリアミン、トリエチレンテトラミン等のアミノ基を3つ以上有するアミン系化合物、イソホロンジアミン等の脂環式構造を有するアミン系化合物が挙げられる。
前記アミン系硬化剤は活性水素基同士が隣接している構造を有すためであり、これによりエポキシ樹脂が良好に配列される。アミンでは熱硬化の際に反応する水素基が窒素原子を介して並列的に並んでいるので、当該場合も並列的に並んだように重合する。
そして、中でもアミノ基を2つ有するアミン系化合物が好ましく、前記芳香環を有するアミン系化合物がより好ましく、高い熱伝導率、耐熱性を有する硬化物を得る観点からジアミノジフェニルメタン、ナフタレンジアミン、ジアミノジフェニルスルホンが特に好ましい。
本発明に使用するアミノ基を少なくとも2つ有するアミン系化合物(B)と共に、他の硬化剤を併用する場合、本発明のエポキシ樹脂組成物中の全硬化剤成分に占めるアミノ基を少なくとも2つ有するアミン系化合物の割合は50質量%以上が好ましく、60重量%以上がより好ましく、80重量%以上が特に好ましい。
本発明のエポキシ樹脂組成物において、アミノ基を少なくとも2つ有するアミン系化合物(B)を含む硬化剤の含有量は全エポキシ樹脂のエポキシ当量に対して0.5〜2.0当量が好ましく、0.8〜1.2当量が特に好ましい。
Next, the amine compound (B) having at least two amino groups will be described.
The amine compound having at least two amino groups used in the present invention is not particularly limited as long as it is an amine compound having at least two known amino groups, and specifically, diaminodiphenylmethane, naphthalenediamine, diaminodiphenylsulfone. An amine compound having an alicyclic structure such as an amine compound having three or more amino groups such as diethylenetriamine and triethylenetetramine, an isophoronediamine, and the like.
This is because the amine-based curing agent has a structure in which active hydrogen groups are adjacent to each other, whereby the epoxy resin is well arranged. In amines, hydrogen groups that react during thermosetting are arranged in parallel via nitrogen atoms, and in this case as well, polymerization is performed so that they are arranged in parallel.
Of these, amine compounds having two amino groups are preferred, amine compounds having an aromatic ring are more preferred, and diaminodiphenylmethane, naphthalenediamine, diaminodiphenyl are preferred from the viewpoint of obtaining a cured product having high thermal conductivity and heat resistance. Sulfone is particularly preferred.
When another curing agent is used in combination with the amine compound (B) having at least two amino groups used in the present invention, at least two amino groups in the total curing agent component in the epoxy resin composition of the present invention are used. The proportion of the amine compound is preferably 50% by weight or more, more preferably 60% by weight or more, and particularly preferably 80% by weight or more.
In the epoxy resin composition of the present invention, the content of the curing agent containing the amine compound (B) having at least two amino groups is preferably 0.5 to 2.0 equivalents relative to the epoxy equivalent of all epoxy resins, 0.8 to 1.2 equivalents are particularly preferred.
また、本発明のエポキシ樹脂組成物が含有する無機充填材(C)は、エポキシ樹脂組成物の硬化物に、より高い熱伝導率を付与する目的で加えられるもので、無機充填材自体の熱伝導率が低すぎる場合には、エポキシ樹脂と硬化剤の組み合わせにより得られた高熱伝導率が損なわれる恐れがある。従って、本発明のエポキシ樹脂組成物が含有する無機充填材としては、熱伝導率が高いものほど好ましく、通常20W/m・K以上、好ましくは30W/m・K以上、より好ましくは50W/m・K以上の熱伝導率を有するものであれば何ら制限はない。尚、ここでいう熱伝導率とは、ASTM E1530に準拠した方法で測定した値である。この様な特性を有する無機充填材の具体例としては、窒化ホウ素、窒化アルミニウム、窒化ケイ素、炭化ケイ素、窒化チタン、酸化亜鉛、炭化タングステン、アルミナ、酸化マグネシウム等の無機粉末充填材、合成繊維、セラミックス繊維等の繊維質充填材、着色剤等が挙げられる。これら無機充填材の形状は、粉末(塊状、球状)、単繊維、長繊維等いずれであってもよいが、特に、平板状のものであれば、無機充填材自身の積層効果によって硬化物の熱伝導性がより高くなり、硬化物の放熱性が更に向上するので好ましい。
本発明のエポキシ樹脂組成物における無機充填材の使用量は、エポキシ樹脂組成物中の樹脂成分100質量部に対して通常2〜1000質量部、好ましくは400〜1000質量部であるが、熱伝導率を出来るだけ高める為には、本発明のエポキシ樹脂組成物の具体的な用途における取り扱い等に支障を来たさない範囲で、可能な限り無機充填材の使用量を増やすことが好ましい。これら無機充填材は1種のみを使用しても、2種類以上を併用してもよい。
The inorganic filler (C) contained in the epoxy resin composition of the present invention is added for the purpose of imparting higher thermal conductivity to the cured product of the epoxy resin composition, and the heat of the inorganic filler itself. If the conductivity is too low, the high thermal conductivity obtained by the combination of the epoxy resin and the curing agent may be impaired. Therefore, as the inorganic filler contained in the epoxy resin composition of the present invention, the one having higher thermal conductivity is preferable, usually 20 W / m · K or more, preferably 30 W / m · K or more, more preferably 50 W / m. -There is no restriction as long as it has a thermal conductivity of K or higher. In addition, heat conductivity here is the value measured by the method based on ASTM E1530. Specific examples of inorganic fillers having such characteristics include inorganic powder fillers such as boron nitride, aluminum nitride, silicon nitride, silicon carbide, titanium nitride, zinc oxide, tungsten carbide, alumina, magnesium oxide, synthetic fibers, Examples thereof include fibrous fillers such as ceramic fibers, and coloring agents. The shape of these inorganic fillers may be any of powder (bulk shape, spherical shape), single fiber, long fiber, etc. However, in particular, if it is a flat plate, the cured product is cured by the lamination effect of the inorganic filler itself. This is preferable because the thermal conductivity becomes higher and the heat dissipation of the cured product is further improved.
Although the usage-amount of the inorganic filler in the epoxy resin composition of this invention is 2-1000 mass parts normally with respect to 100 mass parts of resin components in an epoxy resin composition, Preferably it is 400-1000 mass parts, but is heat conduction. In order to increase the rate as much as possible, it is preferable to increase the amount of the inorganic filler as much as possible within a range that does not hinder the handling of the epoxy resin composition of the present invention in a specific application. These inorganic fillers may be used alone or in combination of two or more.
また、充填材全体としての熱伝導率を20W/m・K以上に維持できる範囲であれば、熱伝導率が20W/m・K以上の無機充填材に熱伝導率が20W/m・K以下の充填材を併用しても構わないが、出来るだけ熱伝導率の高い硬化物を得るという本発明の目的からして、熱伝導率が20W/m・K以下の充填材の使用は最小限に留めるべきである。併用し得る充填材の種類や形状に特に制限はない。 Further, if the thermal conductivity of the entire filler can be maintained at 20 W / m · K or more, the thermal conductivity of the inorganic filler with 20 W / m · K or more is 20 W / m · K or less. However, in order to obtain a cured product having as high a thermal conductivity as possible, the use of a filler having a thermal conductivity of 20 W / m · K or less is minimal. Should be kept on. There is no particular limitation on the type and shape of the filler that can be used in combination.
本発明のエポキシ樹脂組成物を半導体封止用途に用いる場合ならびにプリプレグ用途に用いる場合には、硬化物の耐熱性、耐湿性、力学的性質などの点から、エポキシ樹脂組成物中において60〜93質量%を占める割合で熱伝導率が20W/m・K以上の無機充填材使用するのが好ましい。この場合、残部はエポキシ樹脂成分、硬化剤成分及びその他必要に応じて添加される添加剤であり、添加剤としては併用しうる他の無機充填材や後述する硬化促進剤等である。 When the epoxy resin composition of the present invention is used for semiconductor sealing applications and prepreg applications, it is 60 to 93 in the epoxy resin composition from the viewpoint of heat resistance, moisture resistance, mechanical properties, etc. of the cured product. It is preferable to use an inorganic filler having a thermal conductivity of 20 W / m · K or more in a proportion of mass%. In this case, the balance is an epoxy resin component, a curing agent component, and other additives that are added as necessary. Examples of the additive include other inorganic fillers that can be used in combination and a curing accelerator that will be described later.
本発明のエポキシ樹脂組成物において、エポキシ樹脂(A)は単独でまたは他のエポキシ樹脂(以下、「(a)成分」という)と併用して使用することが出来る。 In the epoxy resin composition of the present invention, the epoxy resin (A) can be used alone or in combination with another epoxy resin (hereinafter referred to as “component (a)”).
(a)成分の具体例としては、ビスフェノール類(ビスフェノールA、ビスフェノールF、ビスフェノールS、ビフェノール、ビスフェノールAD及びビスフェノールI等)やフェノール類(フェノール、アルキル置換フェノール、芳香族置換フェノール、ナフトール、アルキル置換ナフトール、ジヒドロキシベンゼン、アルキル置換ジヒドロキシベンゼン及びジヒドロキシナフタレン等)と各種アルデヒド(ホルムアルデヒド、アセトアルデヒド、アルキルアルデヒド、ベンズアルデヒド、アルキル置換ベンズアルデヒド、ヒドロキシベンズアルデヒド、ナフトアルデヒド、グルタルアルデヒド、フタルアルデヒド、クロトンアルデヒド及びシンナムアルデヒド等)との重縮合物、キシレン等の芳香族化合物とホルムアルデヒドの重縮合物とフェノール類との重縮合物、フェノール類と各種ジエン化合物(ジシクロペンタジエン、テルペン類、ビニルシクロヘキセン、ノルボルナジエン、ビニルノルボルネン、テトラヒドロインデン、ジビニルベンゼン、ジビニルビフェニル、ジイソプロペニルビフェニル、ブタジエン及びイソプレン等)との重縮合物、フェノール類とケトン類(アセトン、メチルエチルケトン、メチルイソブチルケトン、アセトフェノン及びベンゾフェノン等)との重縮合物、フェノール類と芳香族ジメタノール類(ベンゼンジメタノール及びビフェニルジメタノール等)との重縮合物、フェノール類と芳香族ジクロロメチル類(α,α’−ジクロロキシレン及びビスクロロメチルビフェニル等)との重縮合物、フェノール類と芳香族ビスアルコキシメチル類(ビスメトキシメチルベンゼン、ビスメトキシメチルビフェニル及びビスフェノキシメチルビフェニル等)との重縮合物、ビスフェノール類と各種アルデヒドの重縮合物、並びにアルコール類等をグリシジル化したグリシジルエーテル系エポキシ樹脂、脂環式エポキシ樹脂、グリシジルアミン系エポキシ樹脂、グリシジルエステル系エポキシ樹脂等が挙げられるが、通常用いられるエポキシ樹脂であればこれらに限定されるものではない。これらは、1種類のみ使用しても、2種以上を併用してもよい。
(a)成分を併用する場合、本発明のエポキシ樹脂組成物中の全エポキシ樹脂成分に占めるエポキシ樹脂(A)の割合は30質量%以上が好ましく、40質量%以上がより好ましく、70質量%以上が更に好ましく、特に好ましくは100質量%((a)成分を併用しない場合)である。ただし、エポキシ樹脂(A)をエポキシ樹脂組成物の改質剤として使用する場合は、全エポキシ樹脂中で1〜30質量%となる割合で添加する。
Specific examples of the component (a) include bisphenols (bisphenol A, bisphenol F, bisphenol S, biphenol, bisphenol AD, bisphenol I, etc.) and phenols (phenol, alkyl-substituted phenol, aromatic-substituted phenol, naphthol, alkyl-substituted). Naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene and dihydroxynaphthalene) and various aldehydes (formaldehyde, acetaldehyde, alkylaldehyde, benzaldehyde, alkyl-substituted benzaldehyde, hydroxybenzaldehyde, naphthaldehyde, glutaraldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde, etc.) Polycondensates of benzene and aromatic compounds such as xylene and formaldehyde Polycondensates with phenols, phenols and various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, norbornadiene, vinylnorbornene, tetrahydroindene, divinylbenzene, divinylbiphenyl, diisopropenylbiphenyl, butadiene, isoprene, etc.) Polycondensates, polycondensates of phenols and ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, acetophenone, benzophenone, etc.), phenols and aromatic dimethanols (benzene dimethanol, biphenyl dimethanol, etc.) Polycondensates, polycondensates of phenols and aromatic dichloromethyls (such as α, α'-dichloroxylene and bischloromethylbiphenyl), phenols and aromatic bisalkoxymethyls (bi Polycondensates with smethoxymethylbenzene, bismethoxymethylbiphenyl, bisphenoxymethylbiphenyl, etc.), polycondensates of bisphenols and various aldehydes, and glycidyl ether epoxy resins and alicyclic epoxies obtained by glycidylation of alcohols, etc. Resins, glycidylamine epoxy resins, glycidyl ester epoxy resins, and the like can be mentioned, but are not limited thereto as long as they are usually used epoxy resins. These may be used alone or in combination of two or more.
When the component (a) is used in combination, the proportion of the epoxy resin (A) in the total epoxy resin component in the epoxy resin composition of the present invention is preferably 30% by mass or more, more preferably 40% by mass or more, and 70% by mass. The above is more preferable, and particularly preferable is 100% by mass (when the component (a) is not used in combination). However, when using an epoxy resin (A) as a modifier of an epoxy resin composition, it adds in the ratio used as 1-30 mass% in all the epoxy resins.
本発明のエポキシ樹脂組成物において、硬化剤であるアミン系化合物(B)成分は単独でまたは他の硬化剤と併用して使用することができる。
本発明のエポキシ樹脂組成物が含有する他の硬化剤(以下、「(b)成分」という)としては、例えば、酸無水物系化合物、アミド系化合物及びフェノール系化合物等が挙げられる。これら(b)成分の具体例を下記(イ)〜(ニ)に示す。
(イ)酸無水物系化合物
無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、ヘキサヒドロ無水フタル酸及びメチルヘキサヒドロ無水フタル酸等
(ロ)アミド系化合物
ジシアンジアミド、若しくはリノレン酸の2量体とエチレンジアミンより合成されるポリアミド樹脂等、
In the epoxy resin composition of the present invention, the amine compound (B) component which is a curing agent can be used alone or in combination with other curing agents.
Examples of other curing agents (hereinafter referred to as “component (b)”) contained in the epoxy resin composition of the present invention include acid anhydride compounds, amide compounds, phenol compounds, and the like. Specific examples of these components (b) are shown in the following (a) to (d).
(I) Acid anhydride compounds Phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, hexahydrophthalic anhydride and methylhexahydro Phthalic anhydride, etc. (b) Amide compounds Dicyandiamide, or polyamide resin synthesized from dimer of linolenic acid and ethylenediamine,
(ハ)フェノール系化合物
多価フェノール類(ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、テルペンジフェノール、4,4’−ジヒドロキシビフェニル、2,2’−ジヒドロキシビフェニル、3,3’,5,5’−テトラメチル−(1,1’−ビフェニル)−4,4’−ジオール、ハイドロキノン、レゾルシン、ナフタレンジオール、トリス−(4−ヒドロキシフェニル)メタン及び1,1,2,2−テトラキス(4−ヒドロキシフェニル)エタン等);フェノール類(例えば、フェノール、アルキル置換フェノール、ナフトール、アルキル置換ナフトール、ジヒドロキシベンゼン及びジヒドロキシナフタレン等)と、アルデヒド類(ホルムアルデヒド、アセトアルデヒド、ベンズアルデヒド、p−ヒドロキシベンズアルデヒド、o−ヒドロキシベンズアルデヒド及びフルフラール等)、ケトン類(p−ヒドロキシアセトフェノン及びo−ヒドロキシアセトフェノン等)、若しくはジエン類(ジシクロペンタジエン及びトリシクロペンタジエン等)との縮合により得られるフェノール樹脂;前記フェノール類と、置換ビフェニル類(4,4’−ビス(クロルメチル)−1,1’−ビフェニル及び4,4’−ビス(メトキシメチル)−1,1’−ビフェニル等)、若しくは置換フェニル類(1,4−ビス(クロロメチル)ベンゼン、1,4−ビス(メトキシメチル)ベンゼン及び1,4−ビス(ヒドロキシメチル)ベンゼン等)等との重縮合により得られるフェノール樹脂;前記フェノール類及び/又は前記フェノール樹脂の変性物;テトラブロモビスフェノールA及び臭素化フェノール樹脂等のハロゲン化フェノール類
(ニ)その他イミダゾール類、BF3−アミン錯体、グアニジン誘導体
(C) Phenol compounds Polyphenols (bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, terpene diphenol, 4,4'-dihydroxybiphenyl, 2,2'-dihydroxybiphenyl, 3,3 ', 5, 5'-tetramethyl- (1,1'-biphenyl) -4,4'-diol, hydroquinone, resorcin, naphthalenediol, tris- (4-hydroxyphenyl) methane and 1,1,2,2-tetrakis (4 -Hydroxyphenyl) ethane and the like; phenols (eg, phenol, alkyl-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene and dihydroxynaphthalene) and aldehydes (formaldehyde, acetaldehyde, benzaldehyde, p-hydro) Phenolic resins obtained by condensation with xybenzaldehyde, o-hydroxybenzaldehyde, furfural, etc.), ketones (p-hydroxyacetophenone, o-hydroxyacetophenone, etc.), or dienes (dicyclopentadiene, tricyclopentadiene, etc.); Phenols and substituted biphenyls (such as 4,4′-bis (chloromethyl) -1,1′-biphenyl and 4,4′-bis (methoxymethyl) -1,1′-biphenyl), or substituted phenyls ( Phenol resins obtained by polycondensation with 1,4-bis (chloromethyl) benzene, 1,4-bis (methoxymethyl) benzene, 1,4-bis (hydroxymethyl) benzene and the like; Or a modified product of the phenol resin; Lumpur A and halogenated phenols such as brominated phenol resin (D) other imidazoles, BF 3 - amine complex, guanidine derivatives
これら(b)成分の中ではカテコールとアルデヒド類、ケトン類、ジエン類、置換ビフェニル類又は置換フェニル類との縮合物などが好ましい。これらの成分は活性水素基同士が隣接している構造を有すためであり、これによりエポキシ樹脂が良好に配列される。例えば、カテコールとの縮合物の場合、熱硬化により反応する水酸基が互いにオルト位にあるため、並列的に並んだように重合する。
(b)成分は単独で用いてもよく、複数を併用してもよい。
(b)成分を併用する場合、本発明のエポキシ樹脂組成物中の全硬化剤成分に占めるアミン系化合物(B)成分の割合は50質量%以上が好ましく、60質量%以上がより好ましく、80質量%以上が更に好ましい。
本発明のエポキシ樹脂組成物において、(B)成分を含む全硬化剤の使用量は、全エポキシ樹脂のエポキシ基1当量に対して0.5〜2.0当量が好ましく、0.8〜1.2当量が特に好ましい。
本発明のエポキシ樹脂組成物としては、エポキシ樹脂として100質量%使用し、硬化剤として100質量%使用する場合が最も好ましい。
Among these components (b), catechol and aldehydes, ketones, dienes, substituted biphenyls or condensed phenyls are preferable. This is because these components have a structure in which active hydrogen groups are adjacent to each other, whereby the epoxy resin is well arranged. For example, in the case of a condensate with catechol, since the hydroxyl groups that react by thermosetting are in the ortho positions, they are polymerized so as to be arranged in parallel.
Component (b) may be used alone or in combination.
When the component (b) is used in combination, the proportion of the amine compound (B) component in the total curing agent component in the epoxy resin composition of the present invention is preferably 50% by mass or more, more preferably 60% by mass or more, and 80 More preferably, it is more than mass%.
In the epoxy resin composition of the present invention, the amount of the total curing agent containing the component (B) is preferably 0.5 to 2.0 equivalents relative to 1 equivalent of the epoxy groups of all epoxy resins, and 0.8 to 1 .2 equivalents are particularly preferred.
As the epoxy resin composition of the present invention, it is most preferable to use 100% by mass as an epoxy resin and 100% by mass as a curing agent.
本発明のエポキシ樹脂組成物には硬化促進剤を含有させることもできる。使用できる硬化促進剤としては、例えば、2−メチルイミダゾール、2−エチルイミダゾール、2−フェニルイミダゾール及び2−エチル−4−メチルイミダゾール等のイミダゾール類、2−(ジメチルアミノメチル)フェノール、トリエチレンジアミン、トリエタノールアミン及び1,8−ジアザビシクロ(5,4,0)ウンデセン−7等の第3級アミン類、トリフェニルホスフィン、ジフェニルホスフィン及びトリブチルホスフィン等の有機ホスフィン類、オクチル酸スズなどの金属化合物、テトラフェニルホスホニウム・テトラフェニルボレート及びテトラフェニルホスホニウム・エチルトリフェニルボレート等のテトラ置換ホスホニウム・テトラ置換ボレート、2−エチル−4−メチルイミダゾール・テトラフェニルボレート及びN−メチルモルホリン・テトラフェニルボレート等のテトラフェニルボロン塩などが挙げられる。硬化促進剤は、エポキシ樹脂100質量部に対して0.01〜15質量部が必要に応じ用いられる。 The epoxy resin composition of the present invention may contain a curing accelerator. Examples of the curing accelerator that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole, 2-phenylimidazole and 2-ethyl-4-methylimidazole, 2- (dimethylaminomethyl) phenol, triethylenediamine, Tertiary amines such as triethanolamine and 1,8-diazabicyclo (5,4,0) undecene-7, organic phosphines such as triphenylphosphine, diphenylphosphine and tributylphosphine, metal compounds such as tin octylate, Tetrasubstituted phosphonium tetrasubstituted borates such as tetraphenylphosphonium tetraphenylborate and tetraphenylphosphonium ethyltriphenylborate, 2-ethyl-4-methylimidazole tetraphenylborate and N Such as tetraphenyl boron salts such methylmorpholine tetraphenylborate and the like. 0.01-15 mass parts is used for a hardening accelerator as needed with respect to 100 mass parts of epoxy resins.
本発明のエポキシ樹脂組成物には、必要に応じてシランカップリング剤、離型剤及び顔料等種々の配合剤、各種熱硬化性樹脂並びに各種熱可塑性樹脂等を添加することができる。熱硬化性樹脂及び熱可塑性樹脂の具体例としては、ビニルエステル樹脂、不飽和ポリエステル樹脂、マレイミド樹脂、シアナート樹脂、イソシアナート化合物、ベンゾオキサジン化合物、ビニルベンジルエーテル化合物、ポリブタジエンおよびこの変性物、アクリロニトリル共重合体の変性物、インデン樹脂、フッ素樹脂、シリコーン樹脂、ポリエーテルイミド、ポリエーテルスルホン、ポリフェニレンエーテル、ポリアセタール、ポリスチレン、ポリエチレン、ジシクロペンタジエン樹脂等が挙げられる。熱硬化性樹脂、または熱可塑性樹脂は本発明のエポキシ樹脂組成物中において60質量%以下を占める量が用いられる。 If necessary, various compounding agents such as a silane coupling agent, a release agent and a pigment, various thermosetting resins, various thermoplastic resins, and the like can be added to the epoxy resin composition of the present invention. Specific examples of thermosetting resins and thermoplastic resins include vinyl ester resins, unsaturated polyester resins, maleimide resins, cyanate resins, isocyanate compounds, benzoxazine compounds, vinyl benzyl ether compounds, polybutadiene and its modified products, and acrylonitrile. Examples include modified polymers, indene resins, fluororesins, silicone resins, polyetherimides, polyethersulfones, polyphenylene ethers, polyacetals, polystyrenes, polyethylenes, and dicyclopentadiene resins. The thermosetting resin or thermoplastic resin is used in an amount occupying 60% by mass or less in the epoxy resin composition of the present invention.
本発明のエポキシ樹脂組成物は、上記各成分を均一に混合することにより得られ、その好ましい用途としては半導体封止材やプリント配線版等が挙げられる。
本発明のエポキシ樹脂組成物は従来知られているのと同様の方法で容易にその硬化物とすることが出来る。本発明の硬化物の形成は、例えば、エポキシ樹脂、硬化剤及び熱伝導率が20W/m・K以上の無機充填材、並びに必要により硬化促進剤、配合剤、各種熱硬化性樹脂や各種熱可塑性樹脂等を、押出機、ニーダ又はロール等を用いて均一になるまで充分に混合してエポキシ樹脂組成物を得た後、該エポキシ樹脂組成物を溶融注型法、トランスファー成型法、インジェクション成型法あるいは圧縮成型法などによって成型し、次いでその融点以上で2〜10時間加熱することにより行なうことができる。本発明のエポキシ樹脂組成物を半導体封止用途に用いる場合には、上記の方法でリードフレーム等に搭載された半導体素子を封止すればよい。
The epoxy resin composition of the present invention can be obtained by uniformly mixing the above-mentioned components, and preferred applications thereof include semiconductor encapsulants and printed wiring boards.
The epoxy resin composition of the present invention can be easily made into a cured product by the same method as conventionally known. Formation of the cured product of the present invention includes, for example, an epoxy resin, a curing agent, an inorganic filler having a thermal conductivity of 20 W / m · K or more, and if necessary, a curing accelerator, a compounding agent, various thermosetting resins, and various heat After thoroughly mixing a plastic resin or the like with an extruder, kneader, or roll until it becomes uniform to obtain an epoxy resin composition, the epoxy resin composition is melt-cast, transfer molding, injection molding It can be carried out by molding by the method or compression molding method and then heating for 2 to 10 hours above its melting point. When the epoxy resin composition of the present invention is used for semiconductor sealing applications, the semiconductor element mounted on a lead frame or the like may be sealed by the above method.
また、本発明のエポキシ樹脂組成物は溶剤を含むワニスとすることもできる。該ワニスは、例えば、エポキシ樹脂、硬化剤及び熱伝導率が20W/m・K以上の無機充填材、並びに必要に応じてその他の成分を含む混合物を、トルエン、キシレン、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、シクロペンタノン、N,N’−ジメチルホルムアミド、N,N’−ジメチルアセトアミド、ジメチルスルホキシド、N−メチルピロリドン、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールジエチルエーテル、トリエチレングリコールジメチルエーテル、トリエチレングリコールジエチルエーテル等のグリコールエーテル類、酢酸エチル、酢酸ブチル、メチルセロソルブアセテート、エチルセロソルブアセテート、ブチルセロソルブアセテート、カルビトールアセテート、プロピレングリコールモノメチルエーテルアセテート、グルタル酸ジアルキル、コハク酸ジアルキル、アジピン酸ジアルキル等のエステル類、γ−ブチロラクトン等の環状エステル類、石油エーテル、石油ナフサ、水添石油ナフサ及びソルベントナフサ等の石油系溶剤等の有機溶剤と混合することにより得ることが出来る。溶剤の量はワニス全体に対し通常10〜95質量%、好ましくは15〜85質量%である。
上記のようにして得られるワニスをガラス繊維、カーボン繊維、ポリエステル繊維、ポリアミド繊維、アルミナ繊維及び紙などのシート状の繊維基材に含浸させた後に加熱によって溶剤を除去すると共に、該ワニスを半硬化状態とすることにより、本発明のプリプレグを得ることが出来る。尚、ここで言う「半硬化状態」とは、反応性の官能基であるエポキシ基が一部未反応で残っている状態を意味する。該プリプレグを熱プレス成型して硬化物を得ることが出来る。
Moreover, the epoxy resin composition of this invention can also be made into the varnish containing a solvent. The varnish includes, for example, a mixture containing an epoxy resin, a curing agent, an inorganic filler having a thermal conductivity of 20 W / m · K or more, and other components as necessary, toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl. Ketone, cyclohexanone, cyclopentanone, N, N′-dimethylformamide, N, N′-dimethylacetamide, dimethyl sulfoxide, N-methylpyrrolidone, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, dipropylene glycol dimethyl ether, dipropylene glycol diethyl Glycol ethers such as ether, triethylene glycol dimethyl ether, triethylene glycol diethyl ether, ethyl acetate, butyl acetate, methyl cellosolve acetate, ethyl cello Rub acetate, butyl cellosolve acetate, carbitol acetate, propylene glycol monomethyl ether acetate, esters such as dialkyl glutarate, dialkyl succinate, dialkyl adipate, cyclic esters such as γ-butyrolactone, petroleum ether, petroleum naphtha, hydrogenated petroleum It can be obtained by mixing with an organic solvent such as a petroleum solvent such as naphtha and solvent naphtha. The amount of the solvent is usually 10 to 95% by mass, preferably 15 to 85% by mass with respect to the whole varnish.
The varnish obtained as described above is impregnated into a sheet-like fiber base material such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber and paper, and then the solvent is removed by heating, and the varnish is half-finished. By setting it to a cured state, the prepreg of the present invention can be obtained. Here, the “semi-cured state” means a state in which an epoxy group which is a reactive functional group partially remains unreacted. The prepreg can be hot press molded to obtain a cured product.
以下、本発明を実施例で更に詳細に説明するが、本発明はこれら実施例に限定されるものではない。合成例、実施例、比較例において部は質量部を意味する。なお、エポキシ当量、融点、熱伝導率は以下の条件で測定した。
・融点
Seiko Instruments
Inc.製 EXSTAR6000
測定試料 2mg〜5mg 昇温速度 10℃/min.
・溶融粘度
150℃におけるコーンプレート法における溶融粘度
測定機器:コーンプレート(ICI)高温粘度計
・軟化点
JIS K−7234に記載された方法で測定し、単位は℃である。
・全塩素量
試料のブチルカルビトール溶液に1N−KOHプロピレングリコール溶液を添加し、10分間還流することにより遊離する塩素量(モル)を硝酸銀滴定法により測定し、試料の重量で除した値。
・エポキシ当量
JIS K−7236に記載された方法で測定し、単位はg/eq.である。
・熱伝導率
ASTM E1530に準拠した方法で測定。
・ガラス転移温度(DMA)
真空理工株式会社製 TM−7000により昇温速度 2℃/min.の条件で測定。
EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to these Examples. In the synthesis examples, examples, and comparative examples, “part” means “part by mass”. The epoxy equivalent, melting point, and thermal conductivity were measured under the following conditions.
・ Melting point Seiko Instruments
Inc. EXSTAR6000 made
Measurement sample 2 mg to 5 mg Temperature rising rate 10 ° C./min.
Melt viscosity Melt viscosity in cone plate method at 150 ° C. Measuring instrument: cone plate (ICI) high temperature viscometer Softening point Measured by the method described in JIS K-7234, the unit is ° C.
-Total chlorine amount A value obtained by measuring the amount (mol) of chlorine liberated by adding a 1N-KOH propylene glycol solution to a butyl carbitol solution of a sample and refluxing for 10 minutes by a silver nitrate titration method and dividing by the weight of the sample.
-Epoxy equivalent Measured by the method described in JIS K-7236, the unit is g / eq. It is.
-Thermal conductivity It measures by the method based on ASTM E1530.
・ Glass transition temperature (DMA)
Using a TM-7000 manufactured by Vacuum Riko Co., Ltd., the temperature rising rate was 2 ° C / min. Measured under the conditions of
合成実施例1
撹拌機、還流冷却管、撹拌装置を備えたフラスコに、シクロヘキサノン49部、p−ヒドロキシベンズアルデヒド124部およびエタノール250部を仕込み、溶解した。これに37%塩酸25部を添加後60℃まで昇温し、この温度で10時間反応後、反応液を水1000部に注入し、晶析させた。結晶を濾別後、水800部で2回水洗し、その後真空乾燥し、黄色結晶のフェノール化合物1を210部得た。得られた結晶の融点はDSC測定により289℃であった。
Synthesis Example 1
A flask equipped with a stirrer, a reflux condenser, and a stirrer was charged with 49 parts of cyclohexanone, 124 parts of p-hydroxybenzaldehyde and 250 parts of ethanol and dissolved. After adding 25 parts of 37% hydrochloric acid to this, the temperature was raised to 60 ° C., and after reacting at this temperature for 10 hours, the reaction solution was poured into 1000 parts of water for crystallization. The crystals were separated by filtration, washed twice with 800 parts of water, and then vacuum-dried to obtain 210 parts of phenol compound 1 as yellow crystals. The melting point of the obtained crystal was 289 ° C. by DSC measurement.
合成実施例2
撹拌機、還流冷却管、撹拌装置を備えたフラスコに窒素パージを施しながら、合成実施例1で得られたフェノール化合物1を153部、エピクロルヒドリン925部、メタノール139部を加え、撹拌下70℃にまで昇温し、フレーク状の水酸化ナトリウム43部を90分間かけて分割添加した後、70℃のまま90分間反応を行なった。反応終了後、水洗を行ない、生成した塩などを取り除いた後に、ロータリーエバポレーターを用いて160℃で減圧下、過剰のエピクロルヒドリン等の溶剤を留去した。留去後、メチルエチルケトンに75℃で再度溶解させ、30%水酸化ナトリウム水溶液13部を添加し、75℃のまま80分間反応を行なった。反応終了後、水層が中性になるまで十分水洗を行なった後に、180℃で真空乾燥することで本発明のエポキシ樹脂1を199部得た。得られたエポキシ樹脂の軟化点は68℃、溶融粘度は0.06Pa・s(150℃)、全塩素量は1500ppm、エポキシ当量は219g/eq.であった。
Synthesis Example 2
While purging a flask equipped with a stirrer, a reflux condenser, and a stirrer with nitrogen purge, add 153 parts of the phenol compound 1 obtained in Synthesis Example 1, 925 parts of epichlorohydrin, and 139 parts of methanol, and the mixture is stirred at 70 ° C. The temperature was raised to 43 parts, and 43 parts of flaky sodium hydroxide was added in portions over 90 minutes, and then the reaction was carried out for 90 minutes at 70 ° C. After completion of the reaction, washing with water was performed to remove the generated salt and the like, and then excess solvent such as epichlorohydrin was distilled off under reduced pressure at 160 ° C. using a rotary evaporator. After the distillation, it was dissolved again in methyl ethyl ketone at 75 ° C., 13 parts of 30% aqueous sodium hydroxide solution was added, and the reaction was carried out for 80 minutes while maintaining at 75 ° C. After completion of the reaction, the water layer was sufficiently washed until neutral, and then vacuum dried at 180 ° C. to obtain 199 parts of epoxy resin 1 of the present invention. The resulting epoxy resin had a softening point of 68 ° C., a melt viscosity of 0.06 Pa · s (150 ° C.), a total chlorine content of 1500 ppm, and an epoxy equivalent of 219 g / eq. Met.
実施例1〜3および比較例1〜3
各種成分を表1の割合(部)で配合し、ミキシングロールによる混練とそれに続くタブレット化の後、トランスファー成形で樹脂成型体を調製した。次いで、該樹脂成型体を200℃で8時間加熱することにより、本発明のエポキシ樹脂組成物及び比較用樹脂組成物の硬化物を得た。これら硬化物の熱伝導率を測定した結果を表1に示した。
Examples 1-3 and Comparative Examples 1-3
Various components were blended in the proportions (parts) shown in Table 1, and after kneading with a mixing roll and subsequent tableting, a resin molded body was prepared by transfer molding. Next, the resin molding was heated at 200 ° C. for 8 hours to obtain a cured product of the epoxy resin composition of the present invention and the comparative resin composition. The results of measuring the thermal conductivity of these cured products are shown in Table 1.
エポキシ樹脂2:下記式(6)及び(7)で表されるエポキシ樹脂を等モル含有するビフェニル型エポキシ樹脂(商品名:YL−6121H ジャパンエポキシレジン製 エポキシ当量175g/eq.) Epoxy resin 2: Biphenyl type epoxy resin containing an equimolar amount of an epoxy resin represented by the following formulas (6) and (7) (trade name: YL-6121H manufactured by Japan Epoxy Resin, epoxy equivalent of 175 g / eq.)
硬化剤1:1,5−ナフタレンジアミン(東京化成工業製、アミン当量40g/eq.)
硬化剤2:4,4’−ジアミノジフェニルメタン(東京化成工業製、アミン当量50g/eq.)
硬化剤3:4,4’−ジアミノジフェニルスルホン(東京化成工業製、アミン当量62g/eq.)
Curing agent 1: 1,5-naphthalenediamine (manufactured by Tokyo Chemical Industry, amine equivalent 40 g / eq.)
Curing agent 2: 4,4′-diaminodiphenylmethane (manufactured by Tokyo Chemical Industry, amine equivalent 50 g / eq.)
Curing agent 3: 4,4′-diaminodiphenyl sulfone (manufactured by Tokyo Chemical Industry, amine equivalent 62 g / eq.)
以上の結果より、本発明のエポキシ樹脂組成物の硬化物は、優れた熱伝導性を有することが確認できた。したがって本発明のエポキシ樹脂組成物の硬化物は、電気・電子部品用絶縁材料及び積層板(プリント配線板など)等に使用する場合に極めて有用である。 From the above results, it was confirmed that the cured product of the epoxy resin composition of the present invention had excellent thermal conductivity. Therefore, the cured product of the epoxy resin composition of the present invention is extremely useful when used for insulating materials for electric / electronic parts, laminated boards (printed wiring boards, etc.) and the like.
本発明のエポキシ樹脂組成物の硬化物は、従来のエポキシ樹脂の硬化物と比較して優れた熱伝導性、信頼性を有する。従って、封止材、プリプレグ等として電気・電子材料、成型材料、注型材料、積層材料、塗料、接着剤、レジスト、光学材料などの広範囲の用途に極めて有用である。 The cured product of the epoxy resin composition of the present invention has excellent thermal conductivity and reliability as compared with a cured product of a conventional epoxy resin. Therefore, it is extremely useful for a wide range of applications such as an electric / electronic material, a molding material, a casting material, a laminated material, a paint, an adhesive, a resist, and an optical material as a sealing material and a prepreg.
Claims (7)
(式(1)中、R1はそれぞれ独立して存在し、水素原子、炭素数1〜10の直鎖、分岐あるいは環状のアルキル基、炭素数1〜10のアリール基、水酸基、又は、炭素数1〜10の直鎖、分岐あるいは環状のアルコキシ基のいずれかを表す。nは炭素数を表し、0、1、2のいずれかの整数を表す。mはR1の数を表し、1≦m≦n+2の関係を満たす。)
で表される化合物とヒドロキシベンズアルデヒド類との反応によって得られるフェノール樹脂とエピハロヒドリンを反応させて得られる全ハロゲン量が、1600ppm以下である下記式(2)で表せられるエポキシ樹脂(A)
(In Formula (1), each R 1 is independently present and is a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 1 to 10 carbon atoms, a hydroxyl group, or carbon. Represents any of linear, branched or cyclic alkoxy groups of 1 to 10. n represents the number of carbon atoms and represents an integer of 0, 1 or 2. m represents the number of R 1 ; ≦ m ≦ n + 2 is satisfied.)
An epoxy resin (A) represented by the following formula (2) in which the total halogen content obtained by reacting a phenol resin obtained by the reaction of a compound represented by formula (II) with hydroxybenzaldehyde and epihalohydrin is 1600 ppm or less.
The epoxy resin composition according to claim 1, wherein the epoxy resin (A) according to claim 1 is represented by the following formula (3).
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| JP2012121961A (en) * | 2010-12-07 | 2012-06-28 | Nippon Kayaku Co Ltd | Epoxy resin composition, prepreg, and cured product of the same |
| JP2016060870A (en) * | 2014-09-19 | 2016-04-25 | 日立化成株式会社 | THERMOSETTING RESIN COMPOSITION AND PROCESS FOR PRODUCING THE SAME, PREPREG USING THE SAME, LAMINATED PLATE AND PRINTED WIRING BOARD |
| JP2018100397A (en) * | 2013-09-30 | 2018-06-28 | エア プロダクツ アンド ケミカルズ インコーポレイテッドAir Products And Chemicals Incorporated | Epoxy liquid curing agent composition |
| CN113861383A (en) * | 2021-10-19 | 2021-12-31 | 上海华谊树脂有限公司 | Epoxy resin containing naphthalene ring structure and preparation method thereof |
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| JP2008056944A (en) * | 2007-11-19 | 2008-03-13 | Nippon Kayaku Co Ltd | Epoxy resin composition |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2012121961A (en) * | 2010-12-07 | 2012-06-28 | Nippon Kayaku Co Ltd | Epoxy resin composition, prepreg, and cured product of the same |
| JP2018100397A (en) * | 2013-09-30 | 2018-06-28 | エア プロダクツ アンド ケミカルズ インコーポレイテッドAir Products And Chemicals Incorporated | Epoxy liquid curing agent composition |
| JP2016060870A (en) * | 2014-09-19 | 2016-04-25 | 日立化成株式会社 | THERMOSETTING RESIN COMPOSITION AND PROCESS FOR PRODUCING THE SAME, PREPREG USING THE SAME, LAMINATED PLATE AND PRINTED WIRING BOARD |
| CN113861383A (en) * | 2021-10-19 | 2021-12-31 | 上海华谊树脂有限公司 | Epoxy resin containing naphthalene ring structure and preparation method thereof |
| CN113861383B (en) * | 2021-10-19 | 2024-04-19 | 上海华谊树脂有限公司 | Epoxy resin containing naphthalene ring structure and preparation method thereof |
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