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JP2012107968A - Piezoelectric vibrator, vibration gyro sensor and manufacturing method of the same - Google Patents

Piezoelectric vibrator, vibration gyro sensor and manufacturing method of the same Download PDF

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JP2012107968A
JP2012107968A JP2010256542A JP2010256542A JP2012107968A JP 2012107968 A JP2012107968 A JP 2012107968A JP 2010256542 A JP2010256542 A JP 2010256542A JP 2010256542 A JP2010256542 A JP 2010256542A JP 2012107968 A JP2012107968 A JP 2012107968A
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vibration
piezoelectric
insulating substrate
buffer material
arms
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Masaru Mikami
賢 三上
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Seiko Epson Corp
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Abstract

【課題】小型圧電振動子であり落下等の衝撃に強い圧電振動子を得る。
【解決手段】圧電振動子1は、圧電振動素子4と、これを収容するパッケージと、を備えている。圧電振動素子1は、複数の振動腕9a、9b、これらを連接する基部5、各振動腕9a、9bの他方の端部に設けた錘部9a、9bを備えた圧電基板4aと、各振動腕の表裏面に形成され励振電極と、を備えている。パッケージは、素子搭載パッド18、及び実装端子16を備えた絶縁基板11と、気密封止する蓋体35と、絶縁基板11上面には圧電振動素子4の各錘部9a、9b及び基部5の先部と対向する部位に夫々金属、又は高分子からなる緩衝材24が形成されている。
【選択図】図1
To obtain a piezoelectric vibrator which is a small piezoelectric vibrator and is strong against an impact such as dropping.
A piezoelectric vibrator includes a piezoelectric vibration element and a package for housing the piezoelectric vibration element. The piezoelectric vibration element 1 includes a plurality of vibrating arms 9a and 9b, a base portion 5 connecting them, a piezoelectric substrate 4a provided with weight portions 9a and 9b provided at the other ends of the vibrating arms 9a and 9b, and vibrations. And excitation electrodes formed on the front and back surfaces of the arm. The package includes an insulating substrate 11 having an element mounting pad 18 and mounting terminals 16, an airtightly sealed lid 35, and weights 9 a and 9 b and a base portion 5 of the piezoelectric vibration element 4 on the upper surface of the insulating substrate 11. A cushioning material 24 made of a metal or a polymer is formed at a portion facing the tip.
[Selection] Figure 1

Description

本発明は、圧電振動子、振動ジャイロセンサー及びその製造方法に関する。   The present invention relates to a piezoelectric vibrator, a vibration gyro sensor, and a manufacturing method thereof.

圧電振動子の一種としての音叉型水晶振動子は、時計用の基準周波数源や、圧電ジャイロ装置用の角速度センサーなどに用いられ、これらを搭載した電子機器等の小型化が進んでいる。これに伴い、圧電振動子の更なる小型化、低背化が求められている。
特許文献1には、図9に示すように、耐衝撃性を改善した容器体(パッケージ)を用いた圧電デバイス(圧電振動子)が開示されている。図9は、その圧電デバイスの断面図である。圧電振動子100は、圧電振動素子130と、この圧電振動素子130を収容する容器体(パッケージ本体)110と、蓋体140と、を備えている。
A tuning fork type crystal resonator as a kind of piezoelectric resonator is used for a reference frequency source for a watch, an angular velocity sensor for a piezoelectric gyro device, and the like, and electronic devices and the like equipped with these are becoming smaller. Along with this, there is a demand for further downsizing and lowering the height of the piezoelectric vibrator.
Patent Document 1 discloses a piezoelectric device (piezoelectric vibrator) using a container (package) with improved impact resistance, as shown in FIG. FIG. 9 is a cross-sectional view of the piezoelectric device. The piezoelectric vibrator 100 includes a piezoelectric vibration element 130, a container body (package main body) 110 that accommodates the piezoelectric vibration element 130, and a lid body 140.

圧電振動素子(音叉型圧電振動素子)130は、圧電基板と、この圧電基板上に形成された励振電極とから構成されている。圧電基板は、基部132と、基部132の一端縁からほぼ並行に突出された一対の振動腕133と、各振動腕133の先端の各錘部135と、を備えている。振動腕133の夫々の表裏面には、各振動腕133を励振するための励振電極134が形成されている。
容器体(パッケージ本体)110の内底面の一端寄りには第1凹部111が形成され、内底面の他の部位には第2凹部112が形成されている。第1凹部111の底面上には搭載パッド122が形成され、この搭載パッド122上に導電性接着剤124を介して、圧電振動素子130が第2凹部112の底面と並行に接着・固定される。
The piezoelectric vibration element (tuning fork type piezoelectric vibration element) 130 includes a piezoelectric substrate and an excitation electrode formed on the piezoelectric substrate. The piezoelectric substrate includes a base portion 132, a pair of vibrating arms 133 projecting substantially in parallel from one end edge of the base portion 132, and weight portions 135 at the tips of the vibrating arms 133. Excitation electrodes 134 for exciting the vibrating arms 133 are formed on the front and back surfaces of the vibrating arms 133.
A first recess 111 is formed near one end of the inner bottom surface of the container body (package main body) 110, and a second recess 112 is formed at the other part of the inner bottom surface. A mounting pad 122 is formed on the bottom surface of the first recess 111, and the piezoelectric vibration element 130 is bonded and fixed on the mounting pad 122 in parallel with the bottom surface of the second recess 112 via a conductive adhesive 124. .

第2凹部112の底面上に衝撃吸収部120が設けられている。衝撃吸収部120が配設される位置は、圧電振動素子130を搭載パッド122に搭載した際に、圧電振動素子130の錘部135に対応する位置である。
衝撃吸収部120としては、タングステン(W)、クロム(Cr)、ニッケル(Ni)、モリブデン(Mo)、金(Au)の金属を用いる。タングステン(W)はスクリーン印刷に容易に形成することが可能であり、モリブデン(Mo)、クロム(Cr)、ニッケル(Ni)、金(Au)は蒸着法、スパッタ法で形成することが可能である。また、上記金属を二層構造としてもよい。
An impact absorbing portion 120 is provided on the bottom surface of the second recess 112. The position where the shock absorbing portion 120 is disposed is a position corresponding to the weight portion 135 of the piezoelectric vibration element 130 when the piezoelectric vibration element 130 is mounted on the mounting pad 122.
As the shock absorber 120, a metal such as tungsten (W), chromium (Cr), nickel (Ni), molybdenum (Mo), or gold (Au) is used. Tungsten (W) can be easily formed by screen printing, and molybdenum (Mo), chromium (Cr), nickel (Ni), and gold (Au) can be formed by vapor deposition or sputtering. is there. The metal may have a two-layer structure.

容器体(パッケージ本体)110の底面に衝撃吸収部120を設けることにより、落下等により圧電振動素子130の先端部が振動して容器体内底面と衝突するときに衝撃吸収部120が衝撃力を緩和して破損を防ぎ、圧電振動素子130の金属の剥がれを防ぐことができると開示されている。   By providing the shock absorbing portion 120 on the bottom surface of the container body (package main body) 110, the shock absorbing portion 120 reduces the impact force when the tip of the piezoelectric vibration element 130 vibrates and collides with the bottom surface of the container body due to dropping or the like. Thus, it is disclosed that damage can be prevented and peeling of the metal of the piezoelectric vibration element 130 can be prevented.

特開2009−290777公報JP 2009-290777 A

しかしながら、特許文献1に開示の圧電振動子では、容器体(パッケージ本体)110の第2凹部112の底面上の所定の位置に衝撃吸収部120を形成し、その容器体110の搭載パッド122上に圧電振動素子130を搭載するため、各衝撃吸収部120と、圧電振動素子130の各錘部135との位置関係に僅かのズレが生じ、落下等による衝撃力を十分には緩和できない虞があった。
本発明は上記問題を解決するためになされたもので、衝撃を吸収する各緩衝材の位置と、圧電振動素子の各錘部及び支持腕の先部とを正確に対応させて、衝撃力に対して強い圧電振動子提供することにある。また、同様に、振動ジャイロ素子の各検出用振動腕及び各駆動用振動腕の各先端部と対向する部位に正確に緩衝材を形成し、衝撃力に対して強い振動ジャイロセンサーを提供することにある。
However, in the piezoelectric vibrator disclosed in Patent Document 1, the shock absorbing portion 120 is formed at a predetermined position on the bottom surface of the second recess 112 of the container body (package main body) 110, and the mounting pad 122 of the container body 110 is formed. Since the piezoelectric vibration element 130 is mounted on the piezoelectric element, the positional relationship between each shock absorbing part 120 and each weight part 135 of the piezoelectric vibration element 130 is slightly shifted, and there is a possibility that the impact force due to dropping or the like cannot be sufficiently reduced. there were.
The present invention has been made in order to solve the above-described problems. The position of each shock absorbing material that absorbs shock is accurately associated with each weight portion of the piezoelectric vibration element and the tip portion of the support arm, so that the impact force can be reduced. The object is to provide a strong piezoelectric vibrator. Similarly, to provide a vibration gyro sensor that is strong against impact force by accurately forming a cushioning material at a position facing each tip of each vibration arm for detection and each vibration arm for driving of the vibration gyro element. It is in.

本発明は、上記の課題の少なくとも一部を解決するためになされたものであり、以下の形態又は適用例として実現することが可能である。   SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

[適用例1]本発明に係る圧電振動子は、圧電振動素子と、該圧電振動素子を収容するパッケージと、を備えた圧電振動子であって、前記圧電振動素子は、複数の振動腕、各振動腕の一方の端部間を連接すると共に複数の電極パッドを備えた基部、前記各振動腕の他方の端部に夫々形成され該各振動腕よりも幅広の錘部、及び、前記各振動腕の振動中心に沿った表面及び裏面の少なくとも一方の面に形成された溝部、を備えた圧電基板と、前記各溝部内を含めた前記各振動腕の表裏面の少なくとも一方の面に夫々形成され、且つ前記複数の電極パッドとの間を夫々電気的に接続される励振電極と、を有し、前記パッケージは、前記圧電振動素子の前記各電極パッドと夫々電気的機械的に接続される素子搭載パッド、及び実装端子を備えた絶縁基板と、前記素子搭載パッド上に搭載された前記圧電振動素子を含む前記絶縁基板上面を気密封止する蓋体と、を備え、前記絶縁基板面の、少なくとも前記圧電振動素子の各錘部及び基部の先部と対向する部位に夫々緩衝材を配設したことを特徴とする圧電振動子である。   Application Example 1 A piezoelectric vibrator according to the present invention is a piezoelectric vibrator including a piezoelectric vibration element and a package that houses the piezoelectric vibration element, and the piezoelectric vibration element includes a plurality of vibration arms, A base portion connected to one end of each vibrating arm and provided with a plurality of electrode pads, a weight portion formed at the other end of each vibrating arm and wider than each vibrating arm, A piezoelectric substrate having a groove formed on at least one of the front and back surfaces along the vibration center of the vibrating arm, and at least one of the front and back surfaces of each vibrating arm including the inside of each groove. And an excitation electrode electrically connected to each of the plurality of electrode pads, and the package is electrically and mechanically connected to each of the electrode pads of the piezoelectric vibration element. Insulation with device mounting pads and mounting terminals A plate and a lid for hermetically sealing the upper surface of the insulating substrate including the piezoelectric vibration element mounted on the element mounting pad, and at least each weight portion of the piezoelectric vibration element on the insulating substrate surface; Each of the piezoelectric vibrators is characterized in that a buffer material is disposed at a portion facing the tip of the base.

絶縁基板面(パッケージ本体のキャビティー底面)の、前記圧電振動素子の各錘部及び基部(支持腕)の先部と対向する部位に夫々緩衝材を配設した圧電振動子(音叉型圧電振動子)を構成することにより、落下等により絶縁基板面と直交する方向の衝撃力が圧電振動子に加わった際に、圧電振動子の各振動腕の錘部、及び基部の支持腕の先部が緩衝材に衝突するが、緩衝材によりその衝撃力は低減され、錘部に形成した電極が剥がれたり、支持腕先部が破損する事態が大幅に減少し、衝撃力に対して強い圧電振動子が得られるという効果がある。   Piezoelectric vibrator (tuning-fork type piezoelectric vibration) in which a buffer material is disposed on the insulating substrate surface (bottom surface of the cavity of the package body) on each portion of the piezoelectric vibration element facing the weight portion and the front portion of the base portion (support arm). When the impact force in the direction orthogonal to the insulating substrate surface is applied to the piezoelectric vibrator due to dropping or the like, the weight part of each vibrating arm of the piezoelectric vibrator and the tip part of the supporting arm of the base part Impacts the cushioning material, but the impact force is reduced by the cushioning material, and the situation where the electrode formed on the weight part is peeled off or the support arm tip part is damaged is greatly reduced. There is an effect that a child is obtained.

[適用例2]また圧電振動子は、圧電振動素子と、該圧電振動素子を収容するパッケージと、を備えた圧電振動子であって、前記圧電振動素子は、複数の振動腕、各振動腕の一方の端部間を連接すると共に複数の電極パッドを備えた基部、前記各振動腕の他方の端部に夫々形成され該各振動腕よりも幅広の錘部、及び、前記各振動腕の振動中心に沿った表面及び裏面の少なくとも一方の面に形成された溝部、を備えた圧電基板と、前記各溝部内を含めた前記各振動腕の表裏面の少なくとも一方の面に夫々形成され、且つ前記複数の電極パッドとの間を夫々電気的に接続される励振電極と、を有し、前記パッケージは、上面の凹陥部内に前記圧電振動素子の前記各電極パッドと夫々電気的機械的に接続される素子搭載パッドを有すると共に、該凹陥部の外部に実装端子を備えた絶縁基板と、前記素子搭載パッド上に搭載された前記圧電振動素子を含む前記絶縁基板上面を気密封止する蓋体と、を備え、前記絶縁基板の凹陥部内底面には、前記圧電振動素子の各錘部及び基部の先部と対向する部位に夫々緩衝材を配設し、且つ、前記凹陥部の内壁には、前記圧電振動素子の基部の先部と対向する部位に夫々緩衝材を配設したことを特徴とする圧電振動子である。   Application Example 2 The piezoelectric vibrator is a piezoelectric vibrator including a piezoelectric vibration element and a package that accommodates the piezoelectric vibration element. The piezoelectric vibration element includes a plurality of vibration arms and each vibration arm. A base portion provided with a plurality of electrode pads, a weight portion formed on the other end portion of each vibrating arm and wider than each vibrating arm, and each of the vibrating arms. A piezoelectric substrate provided with a groove formed on at least one surface of the front and back surfaces along the vibration center, and formed on at least one surface of the front and back surfaces of each vibrating arm including the inside of each groove, And an excitation electrode electrically connected to each of the plurality of electrode pads, and the package is electrically and mechanically connected to each of the electrode pads of the piezoelectric vibration element in a recessed portion on an upper surface. An element mounting pad to be connected; An insulating substrate having a mounting terminal outside the depressed portion, and a lid for hermetically sealing the upper surface of the insulating substrate including the piezoelectric vibration element mounted on the element mounting pad, and the concave portion of the insulating substrate A buffer material is disposed on the inner bottom surface of the piezoelectric vibration element at portions facing the respective weight parts and the front part of the base part, and the front part of the base part of the piezoelectric vibration element is provided on the inner wall of the recessed part. The piezoelectric vibrator is characterized in that a cushioning material is disposed at each of the parts facing each other.

絶縁基板面(パッケージ本体のキャビティー底面)の、前記圧電振動素子の各錘部及び基部(支持腕)の先部と対向する部位に夫々緩衝材を配設すると共に、前記絶縁基板内側の両側壁面の、前記圧電振動素子の基部の先部と対向する部位に夫々緩衝材を配設した圧電振動子(音叉型圧電振動子)を構成する。このように構成すると、落下等により絶縁基板面と直交する方向の衝撃力が圧電振動子に加わった際に、圧電振動子の各振動腕の錘部、及び基部の支持腕の先部が、底面の緩衝材に衝突するが、緩衝材により衝撃力は低減され、錘部に形成した電極が剥がれたり、支持腕先部が破損する虞が大幅に低減され、圧電振動子の不良が大幅に低減されるという効果がある。また、絶縁基板面と平行な方向の衝撃力が圧電振動子に加わると、圧電振動子の基部の支持腕先部が、側壁面の緩衝材に衝突する虞があるが、緩衝材により衝撃力は低減され、支持腕先部が破損する虞が大幅に低減され、圧電振動子の不良が大幅に低減されるという効果がある。   A cushioning material is disposed on each part of the insulating substrate surface (bottom surface of the cavity of the package body) facing each weight part of the piezoelectric vibration element and the front part of the base part (supporting arm), and both sides inside the insulating substrate. Piezoelectric vibrators (tuning fork-type piezoelectric vibrators) each having a buffer material disposed on a portion of the wall facing the tip of the base of the piezoelectric vibration element are configured. With this configuration, when an impact force in a direction perpendicular to the insulating substrate surface is applied to the piezoelectric vibrator due to dropping or the like, the weight part of each vibrating arm of the piezoelectric vibrator and the tip part of the supporting arm of the base part are Although it impacts the shock absorber on the bottom surface, the shock force is reduced by the shock absorber, and the possibility that the electrode formed on the weight part peels off or the support arm tip part is damaged is greatly reduced. There is an effect that it is reduced. In addition, if an impact force in a direction parallel to the insulating substrate surface is applied to the piezoelectric vibrator, the support arm tip at the base of the piezoelectric vibrator may collide with the shock absorbing material on the side wall surface. There is an effect that the possibility of breakage of the support arm tip portion is greatly reduced, and the defect of the piezoelectric vibrator is greatly reduced.

[適用例3]また、圧電振動子は、前記基部は、基部本体と、該基部本体の前記振動腕とは反対側の他端縁中間部に設けた連結部と、該連結部を介して連接され且つ前記基部本体とは離間して延びる左右一対の支持腕と、を備え、前記各支持腕の先部と対向する前記絶縁基板面に前記緩衝材を配置したことを特徴とする適用例1又は2に記載の圧電振動子である。   Application Example 3 In the piezoelectric vibrator, the base portion includes a base body, a connecting portion provided at a middle portion of the other end edge of the base body opposite to the vibrating arm, and the connecting portion. A pair of left and right support arms that are connected and extend away from the base body, and the cushioning material is disposed on the insulating substrate surface facing the tip of each support arm. The piezoelectric vibrator according to 1 or 2.

圧電振動素子の基部が、基部本体と、連結部と、該連結部を介して連接した左右一対の支持腕と、を備えた構成とすることにより、絶縁基板の素子搭載パッドに導電性接着剤を介して圧電振動素子を接着・固定する際に、接着・固定による歪の影響が基部構造により緩和され、圧電振動素子のCI(クリスタルインピーダンスー)値を小さく、即ちQ値を大きくすることができるという効果がある。また、圧電振動素子に加わる衝撃力が緩和されるという効果もある。   The base of the piezoelectric vibration element includes a base body, a connecting portion, and a pair of left and right support arms connected via the connecting portion, so that a conductive adhesive is applied to the element mounting pad of the insulating substrate. When the piezoelectric vibration element is bonded / fixed through the base, the influence of the distortion due to the bonding / fixing is alleviated by the base structure, and the CI (crystal impedance) value of the piezoelectric vibration element is decreased, that is, the Q value is increased. There is an effect that can be done. In addition, the impact force applied to the piezoelectric vibration element is reduced.

[適用例4]また、圧電振動子は、前記緩衝材が、銀(Ag)、モリブデン(Mo)、タングステン(W)、クロム(Cr)、ニッケル(Ni)の何れか一つの物質から成る緩衝材層、又は複数の物質から成る緩衝材層であることを特徴とする適用例1乃至3の何れかに1つに記載の圧電振動子である。   Application Example 4 In the piezoelectric vibrator, the buffer material is a buffer in which the buffer material is any one of silver (Ag), molybdenum (Mo), tungsten (W), chromium (Cr), and nickel (Ni). The piezoelectric vibrator according to any one of Application Examples 1 to 3, wherein the piezoelectric vibrator is a material layer or a buffer material layer made of a plurality of substances.

緩衝材層にAg、Mo、W、Cr、Niの何れか一つの金属、又は複数の金属を使い、蒸着法又はスパッタ法、フォトリソグラフィ技法とエッチング手法を用いれば、緩衝材が容易に形成でき、衝撃力に対して強い圧電振動子が得られるという効果がある。   If any one of Ag, Mo, W, Cr, Ni or a plurality of metals is used for the buffer material layer, and the evaporation method, sputtering method, photolithography technique and etching method are used, the buffer material can be easily formed. There is an effect that a piezoelectric vibrator strong against impact force can be obtained.

[適用例5]また、圧電振動子は、前記緩衝材が、エポキシ系、ポリイミド系、ビスマレイミド系高分子材の何れか一つを用いた緩衝材であることを特徴とする適用例1乃至3の何れかに1つに記載の圧電振動子である。   Application Example 5 In the piezoelectric vibrator, the buffer material is a buffer material using any one of an epoxy-based, polyimide-based, and bismaleimide-based polymer material. 3. The piezoelectric vibrator according to any one of 3 above.

パッケージ本体(絶縁基板)面の所定の領域にエポキシ系、ポリイミド系、ビスマレイミド系高分子材の何れか一つの高分子材を所定の厚さで塗布し、レーザー装置を用いて圧電振動素子の錘部及び支持腕の先部をマスクとして、不要な高分子材を除去すれば、絶縁基板面に錘部、及び支持腕の先部と正確に対応する高分子材の緩衝材が容易に形成され、落下等による衝撃に対し強い圧電振動子が得られるという効果がある。   A polymer material of any one of an epoxy, polyimide, and bismaleimide polymer material is applied to a predetermined region of the package body (insulating substrate) surface with a predetermined thickness, and a piezoelectric vibration element is formed using a laser device. If unnecessary polymer material is removed using the weight part and the tip of the support arm as a mask, the buffer material of the polymer material corresponding to the weight part and the tip of the support arm can be easily formed on the insulating substrate surface. Thus, there is an effect that a piezoelectric vibrator that is strong against an impact caused by dropping or the like can be obtained.

[適用例6]本発明に係る振動ジャイロセンサーは、振動ジャイロ素子と、該振動ジャイロ素子を収容するパッケージと、を備えた振動ジャイロセンサーであって、前記振動ジャイロ素子は、基部と、該基部の対向する2つの端縁から夫々同一直線上に突設された1対の検出用振動腕と、前記基部の対向する他の2つの端縁から夫々前記検出用振動腕と直交する方向に同一直線上に突設された1対の第1の連結腕と、前記各第1の連結腕からそれと直交する両方向へ夫々突設された各1対の駆動用振動腕と、前記基部の四隅から夫々突設され、一対が一方の前記検出用振動腕の両側方において該検出用振動腕と同方向へ延びており、他方の一対が他方の前記検出用振動腕の両側方において該他方の検出用振動腕と同方向へ延びた二対の支持腕と、少なくとも前記1対の検出用振動腕と、前記各1対の駆動用振動腕とに夫々形成され、且つ前記基部に設けた複数の電極パッドとの間を夫々電気的に接続される励振電極と、を備えており、前記絶縁基板面の、前記圧振動ジャイロ素子の各検出用振動腕及び各駆動用振動腕の先端部と対向する部位に緩衝材を設けたことを特徴とする振動ジャイロセンサーである。   Application Example 6 A vibration gyro sensor according to the present invention is a vibration gyro sensor including a vibration gyro element and a package that accommodates the vibration gyro element. The vibration gyro element includes a base and the base A pair of detection vibrating arms protruding on the same straight line from two opposite edges of the same, and two other opposite edges of the base in the direction perpendicular to the detection vibrating arm. A pair of first connecting arms projecting in a straight line, a pair of driving vibration arms projecting from each first connecting arm in both directions orthogonal thereto, and four corners of the base A pair of protrusions are provided so that a pair extends in the same direction as the detection vibrating arm on both sides of one of the detection vibrating arms, and the other pair detects the other on both sides of the other detection vibrating arm. Two support arms extending in the same direction as the vibrating arm Excitation electrodes formed on at least one of the pair of detection vibrating arms and each of the pair of driving vibrating arms and electrically connected to a plurality of electrode pads provided on the base. And a shock absorbing material provided on a portion of the insulating substrate surface facing a tip of each of the vibration arms for detection and each of the vibration arms for driving of the pressure vibration gyro element. It is a sensor.

絶縁基板面の、圧振動ジャイロ素子の各検出用振動腕及び各駆動用振動腕の先部と対向する部位に緩衝材を設けた振動ジャイロセンサーを構成する。このように構成することにより、落下等により絶縁基板面と直交する方向の衝撃力が圧電振動子に加わった際に、振動ジャイロセンサーの各検出用振動腕及び各駆動用振動腕の先部が緩衝材に衝突するが、緩衝材によりその衝撃力は低減され、各検出用振動腕及び各駆動用振動腕の電極が剥がれたり、破損したりすること低減され、衝撃に対し強い振動ジャイロセンサーが構成できるという効果がある。   A vibration gyro sensor is provided in which a cushioning material is provided on a portion of the insulating substrate surface facing each of the detection vibration arms and the driving vibration arms of the pressure vibration gyro element. With this configuration, when an impact force in a direction perpendicular to the insulating substrate surface is applied to the piezoelectric vibrator due to dropping or the like, the detection vibration arms of the vibration gyro sensor and the tip portions of the drive vibration arms are The impact force of the shock absorber is reduced by the shock absorber, and it is reduced that the electrodes of each detection vibration arm and each drive vibration arm are peeled off or damaged. There is an effect that it can be configured.

[適用例7]また、振動ジャイロセンサーは、前記緩衝材が、銀(Ag)、モリブデン(Mo)、タングステン(W)、クロム(Cr)、ニッケル(Ni)の何れか一つの物質から成る緩衝材層、又は複数の物質から成る緩衝材層であることを特徴とする適用例6に記載の振動ジャイロセンサーである。   Application Example 7 In the vibration gyro sensor, the buffer material is a buffer made of any one of silver (Ag), molybdenum (Mo), tungsten (W), chromium (Cr), and nickel (Ni). The vibration gyro sensor according to Application Example 6, wherein the vibration gyro sensor is a material layer or a buffer material layer made of a plurality of substances.

緩衝材層に銀(Ag)、タングステン(W)、クロム(Cr)、ニッケル(Ni)、モリブデン(Mo)の何れか一つの金属、又は複数の金属を使い、蒸着法又はスパッタ法、フォトリソグラフィ技法とエッチング手法を用いれば、緩衝材24が容易に形成でき、衝撃力に対して強い圧電振動子が得られるという効果がある。   The buffer material layer is made of any one or a plurality of metals of silver (Ag), tungsten (W), chromium (Cr), nickel (Ni), molybdenum (Mo), vapor deposition method, sputtering method, photolithography. If the technique and the etching method are used, the buffer material 24 can be easily formed, and there is an effect that a piezoelectric vibrator strong against an impact force can be obtained.

[適用例8]振動ジャイロセンサーは、前記緩衝材が、エポキシ系、ポリイミド系、ビスマレイミド系高分子材の何れか一つを用いた緩衝材であることを特徴とする適用例6に記載の振動ジャイロセンサーである。   Application Example 8 According to Application Example 6, in the vibration gyro sensor, the buffer material is a buffer material using any one of an epoxy-based material, a polyimide-based material, and a bismaleimide-based polymer material. It is a vibration gyro sensor.

パッケージ本体(絶縁基板)面の所定の領域にエポキシ系、ポリイミド系、ビスマレイミド系高分子材の何れか一つの高分子材を所定の厚さで塗布し、レーザー装置を用いて、振動ジャイロセンサーの各検出用振動腕及び各駆動用振動腕の先部をマスクとして、不要な高分子材を除去すれば、絶縁基板面に各検出用振動腕及び各駆動用振動腕の先部と正確に対応する高分子材の緩衝材が容易に形成され、落下等による衝撃に対し強い振動ジャイロセンサーが得られるという効果がある。   Apply a polymer material of any one of epoxy, polyimide, and bismaleimide to a predetermined area of the package body (insulating substrate) surface, and use a laser device to make a vibration gyro sensor. If the unnecessary polymer material is removed using the detection vibration arms and the drive vibration arm tips as a mask, the detection vibration arms and the drive vibration arm tips are accurately placed on the insulating substrate surface. Corresponding polymer buffer material is easily formed, and there is an effect that a vibration gyro sensor which is strong against an impact caused by dropping or the like can be obtained.

[適用例9]適用例1乃至4の何れか一項に記載の圧電振動子の製造方法であって、前記絶縁基板上に前記圧電振動素子を搭載する前に、前記各錘部と対向する前記絶縁基板面に略全幅に渡って前記金属の緩衝材層を形成する緩衝材層形成工程と、前記緩衝材層の表面にフォトレジスト膜を形成するフォトレジスト膜形成工程と、前記絶縁基板上に前記圧電振動素子を搭載してから、前記各錘部及び前記支持腕先部をマスクとして、前記フォトレジスト膜の露出部位を露光して除去する露光工程と、前記露光工程による前記フォトレジストの除去によって露出した前記緩衝材層の特定部位をエッチングにより除去するエッチング工程と、前記レジスト膜を除去するレジスト膜除去工程と、を含むことを特徴とする圧電振動子の製造方法である。   [Application Example 9] The method for manufacturing a piezoelectric vibrator according to any one of Application Examples 1 to 4, wherein the piezoelectric vibrator faces each of the weights before the piezoelectric vibration element is mounted on the insulating substrate. A buffer material layer forming step for forming the metal buffer material layer over the entire surface of the insulating substrate; a photoresist film forming step for forming a photoresist film on the surface of the buffer material layer; and Mounting the piezoelectric vibration element on the substrate, exposing the exposed portion of the photoresist film using the weight portions and the supporting arm tip portions as a mask, and removing the exposed portion of the photoresist film. A method of manufacturing a piezoelectric vibrator, comprising: an etching step of removing a specific portion of the buffer material layer exposed by removal by etching; and a resist film removing step of removing the resist film.

圧電振動子のパッケージ本体(絶縁基板)面に、蒸着法又はスパッタ法を使用して、銀(Ag)、タングステン(W)、クロム(Cr)、ニッケル(Ni)、モリブデン(Mo)の何れか一つの金属、又は複数の金属を用いて、緩衝材層を形成し、フォトリソグラフィ技法とエッチング手法で緩衝材層を加工すれば、絶縁基板面の圧電振動素子の各錘部及び支持腕の先部と対向する部位に正確に、且つ容易に緩衝材を形成することができ、落下等による衝撃に対し強い圧電振動子が得られるという効果がある。   Either the silver (Ag), tungsten (W), chromium (Cr), nickel (Ni), or molybdenum (Mo) is used on the surface of the package body (insulating substrate) of the piezoelectric vibrator by vapor deposition or sputtering. If a buffer material layer is formed using one metal or a plurality of metals, and the buffer material layer is processed by a photolithography technique and an etching technique, each weight portion of the piezoelectric vibration element on the insulating substrate surface and the tip of the support arm The cushioning material can be formed accurately and easily at the part facing the part, and there is an effect that a piezoelectric vibrator that is strong against impact caused by dropping or the like can be obtained.

[適用例10]適用例6又は7に係る振動ジャイロセンサーの製造方法であって、前記絶縁基板上に前記振動ジャイロ素子を搭載する前に、前記各検出用振動腕及び前記各駆動用振動腕の各先部と対向する前記絶縁基板面に略全幅に渡って緩衝材層を形成する緩衝材層形成工程と、前記緩衝材層の表面にフォトレジスト膜を形成するフォトレジスト膜形成工程と、前記絶縁基板上に前記振動ジャイロ素子を搭載してから、前記各検出用振動腕及び前記各駆動用振動腕の先部をマスクとして、前記フォトレジスト膜の露出部位を露光して除去する露光工程と、前記露光工程による前記フォトレジストの除去によって露出した前記緩衝材層の特定部位をエッチングにより除去するエッチング工程と、前記レジスト膜を除去するレジスト膜除去工程と、を含むことを特徴とする振動ジャイロセンサーの製造方法である。   [Application Example 10] A method of manufacturing a vibration gyro sensor according to Application Example 6 or 7, wherein each of the detection vibration arms and each of the drive vibration arms is mounted before the vibration gyro element is mounted on the insulating substrate. A buffer material layer forming step of forming a buffer material layer over substantially the entire width on the insulating substrate surface facing each of the front portions, a photoresist film forming step of forming a photoresist film on the surface of the buffer material layer, An exposure step of exposing and removing the exposed portion of the photoresist film using the detection vibrating arms and the tip portions of the driving vibrating arms as a mask after mounting the vibrating gyro element on the insulating substrate. And an etching step for removing a specific portion of the buffer material layer exposed by removing the photoresist in the exposure step by etching, and a resist film removing step for removing the resist film A method of manufacturing a vibration gyro sensor, which comprises a.

振動ジャイロセンサーのパッケージ本体(絶縁基板)面に、蒸着法又はスパッタ法を用いて、銀(Ag)、タングステン(W)、クロム(Cr)、ニッケル(Ni)、モリブデン(Mo)の何れか一つの金属、又は複数の金属の緩衝材層を形成し、フォトリソグラフィ技法とエッチング手法用いて緩衝材層を加工すれば、絶縁基板面に各検出用振動腕、及び各駆動用振動腕の先部と対向する部位に正確に、且つ容易に緩衝材を形成することでき、落下等による衝撃に対し強い振動ジャイロセンサーが得られるという効果がある。   Any one of silver (Ag), tungsten (W), chromium (Cr), nickel (Ni), and molybdenum (Mo) is formed on the surface of the package body (insulating substrate) of the vibration gyro sensor using a vapor deposition method or a sputtering method. If a buffer material layer of one metal or a plurality of metals is formed and the buffer material layer is processed by using a photolithography technique and an etching technique, each vibration arm for detection and the tip of each vibration arm for driving are formed on the insulating substrate surface. It is possible to form a shock absorbing material accurately and easily at the part facing the surface, and there is an effect that a vibration gyro sensor that is strong against an impact caused by dropping or the like can be obtained.

[適用例11]形状認識用カメラ、レーザー装置及び情報処理装置を用いた適用例1乃至3、又は5の何れか一項に係る圧電振動子の製造方法であって、前記絶縁基板上に前記圧電振動素子を搭載する前に、前記各錘部と対向する前記絶縁基板面に略全幅に渡って前記高分子材の何れか一つを用いた緩衝材層を塗布する緩衝材層形成工程と、前記絶縁基板上に前記圧電振動素子を搭載してから、前記各錘部及び前記支持腕を前記形状認識用カメラで認識し、該形状認識用カメラの出力情報に基づいて前記各錘部及び前記支持腕を僅かに避けて前記緩衝材層をレーザー装置で蒸散させ除去する蒸散工程と、を含むことを特徴とする圧電振動子の製造方法である。   [Application Example 11] A method for manufacturing a piezoelectric vibrator according to any one of Application Examples 1 to 3, or 5 using a shape recognition camera, a laser device, and an information processing apparatus, wherein the piezoelectric vibrator is formed on the insulating substrate. A buffer material layer forming step of applying a buffer material layer using any one of the polymer materials over substantially the entire width of the insulating substrate surface facing each weight portion before mounting the piezoelectric vibration element; Then, after mounting the piezoelectric vibration element on the insulating substrate, the weight parts and the support arms are recognized by the shape recognition camera, and the weight parts and the weight parts and the support arms are recognized based on output information of the shape recognition camera. And a transpiration step of evaporating and removing the buffer material layer with a laser device while slightly avoiding the support arm.

圧電振動子用絶縁基板面の所定の領域に高分子材を塗布し、形状認識用カメラ、レーザー装置及び情報処理装置を用いて、圧電振動素子の振動腕、支持腕をマスクとして高分子材を加工すれば、絶縁基板面に振動腕、支持腕と正確に対応する高分子材の緩衝材が容易に形成され、落下等による衝撃に対し強い圧電振動子が得られるという効果がある。   A polymer material is applied to a predetermined region of the insulating substrate surface for the piezoelectric vibrator, and the polymer material is applied using the shape recognition camera, the laser device, and the information processing device with the vibrating arm and the support arm of the piezoelectric vibration element as a mask. If processed, a buffer material made of a polymer material that accurately corresponds to the vibrating arm and the supporting arm is easily formed on the surface of the insulating substrate, and there is an effect that a piezoelectric vibrator that is strong against impact caused by dropping or the like can be obtained.

[適用例12]形状認識用カメラ、レーザー装置及び情報処理装置を用いた適用例6又は8に係る振動ジャイロセンサーの製造方法であって、前記絶縁基板上に前記振動ジャイロ素子を搭載する前に、前記各検出用振動腕及び前記各駆動用振動腕の各先部と対向する前記絶縁基板面に略全幅に渡って前記高分子材の何れか一つを用いた緩衝材層を塗布する緩衝材層形成工程と、前記絶縁基板上に前記振動ジャイロ素子を搭載してから、前記各検出用振動腕及び前記各駆動用振動腕の各先部を前記形状認識用カメラで認識し、該形状認識用カメラの出力情報に基づいて前記各検出用振動腕及び前記各駆動用振動腕を僅かに避けて前記緩衝材層をレーザー装置で蒸散させ除去する蒸散工程と、を含むことを特徴とする圧電振動子の製造方法である。   Application Example 12 A method for manufacturing a vibration gyro sensor according to Application Example 6 or 8 using a shape recognition camera, a laser device, and an information processing device, before the vibration gyro element is mounted on the insulating substrate. And a buffer layer in which a buffer material layer using any one of the polymer materials is applied over substantially the entire width of the insulating substrate surface facing each tip of each of the detection vibrating arms and each of the driving vibrating arms. After the material layer forming step and mounting the vibrating gyro element on the insulating substrate, the shape recognizing camera recognizes the tip portions of the detecting vibrating arms and the driving vibrating arms, And a transpiration step of evaporating and removing the buffer material layer with a laser device while slightly avoiding the detection vibration arms and the drive vibration arms based on output information of the recognition camera. A method for manufacturing a piezoelectric vibrator

振動ジャイロセンサーのパッケージ本体(絶縁基板)面の所定の領域に、エポキシ系、ポリイミド系、ビスマレイミド系高分子材の何れか一つの高分子材を塗布し、形状認識用カメラ、レーザー装置及び情報処理装置を用いて、振動ジャイロ素子の各検出用振動腕、及び各駆動用振動腕の先部をマスクとして、不要な高分子材を除去すれば、絶縁基板面に各検出用振動腕、及び各駆動用振動腕と正確に対応する高分子材の緩衝材が容易に形成され、落下等による衝撃に対し強い圧電振動子が得られるという効果がある。   A polymer material of any one of epoxy, polyimide, and bismaleimide is applied to a predetermined area on the surface of the package body (insulating substrate) of the vibration gyro sensor, and a shape recognition camera, laser device, and information Using the processing device, each detection vibrating arm of the vibrating gyro element and the tip of each driving vibrating arm as a mask, if unnecessary polymer material is removed, each vibrating arm for detection on the insulating substrate surface, and A buffer material made of a polymer material corresponding to each driving vibration arm is easily formed, and there is an effect that a piezoelectric vibrator strong against an impact caused by dropping or the like can be obtained.

本発明に係る圧電振動子の構造を示した概略図であり、(a)は平面図、(b)は断面図。It is the schematic which showed the structure of the piezoelectric vibrator which concerns on this invention, (a) is a top view, (b) is sectional drawing. 圧電振動子(音叉型振動子)の電極配置を示す図であり、(a)は平面図、(b)は断面図。It is a figure which shows electrode arrangement | positioning of a piezoelectric vibrator (tuning fork type vibrator), (a) is a top view, (b) is sectional drawing. 本発明に係る圧電振動子の構成を示す断面図。FIG. 3 is a cross-sectional view showing a configuration of a piezoelectric vibrator according to the present invention. 第2の実施例の圧電振動子の構成を示す図であり、(a)は短手方向の断面図、(b)は長手方向の断面図。It is a figure which shows the structure of the piezoelectric vibrator of a 2nd Example, (a) is sectional drawing of a transversal direction, (b) is sectional drawing of a longitudinal direction. 本発明に係る振動ジャイロセンサーの構成を示す図であり、(a)は平面図、(b)は断面図、(c)動作の説明図。It is a figure which shows the structure of the vibration gyro sensor which concerns on this invention, (a) is a top view, (b) is sectional drawing, (c) It is explanatory drawing of operation | movement. (a)〜(e)は金属の緩衝材を形成する工程を示す工程図。(A)-(e) is process drawing which shows the process of forming a metal shock absorbing material. 金属の緩衝材を形成する製造フローチャート。The manufacturing flowchart which forms a metal shock absorbing material. 高分子の緩衝材を形成する製造フローチャート。The manufacturing flowchart which forms a polymeric buffer material. 従来の圧電振動子の構成を示す断面図。Sectional drawing which shows the structure of the conventional piezoelectric vibrator.

以下、本発明の実施の形態を図面に基づいて詳細に説明する。図1は、本発明の一実施形態に係る圧電振動子(音叉型水晶振動子)1の構成を示す概略図であり、同図(a)は蓋体を取り除いた平面図、同図(b)はP−P断面図である。圧電振動子(音叉型水晶振動子)1は、圧電振動素子4と、圧電振動素子4を収容するパッケージと、を概略備えている。
圧電振動素子4は、圧電基板4aと、圧電基板4aの複数の振動腕7a、7bを励振するための励振電極と、絶縁基板11との接続用パッド電極(図示せず)と、を概略備えている。
圧電基板4aは、複数の振動腕7a、7bと、各振動腕7a、7bの一方の端部間を連接する基部5と、各振動腕7a、7bの他方の端部に夫々形成され各振動腕よりも幅広の錘部9a、9bと、各振動腕7a、7bの各振動中心Cに沿った表面及び裏面の少なくとも一方の面に形成された溝部8a、8bと、を備えている。なお、圧電基板4aの外形、及び溝部8a、8bは、フォトリソグラフィ技術を用いたエッチング加工で形成されている。
複数の振動腕7a、7bを励振する励振電極は、蒸着法、又はスパッタ法を用いて、各溝部8a、8b内を含めた各振動腕7a、7bの表裏面、及び側面に夫々形成されている。また、複数の電極パッドと励振電極との間を夫々電気的に接続するリード電極が形成されている。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic view showing a configuration of a piezoelectric vibrator (tuning fork type crystal vibrator) 1 according to an embodiment of the present invention. FIG. 1 (a) is a plan view with a lid removed, FIG. ) Is a cross-sectional view along PP. The piezoelectric vibrator (tuning fork type crystal vibrator) 1 generally includes a piezoelectric vibration element 4 and a package that accommodates the piezoelectric vibration element 4.
The piezoelectric vibration element 4 roughly includes a piezoelectric substrate 4a, excitation electrodes for exciting the plurality of vibrating arms 7a and 7b of the piezoelectric substrate 4a, and pad electrodes (not shown) for connection to the insulating substrate 11. ing.
The piezoelectric substrate 4a is formed on each of a plurality of vibrating arms 7a and 7b, a base portion 5 connecting one end of each vibrating arm 7a and 7b, and the other end of each vibrating arm 7a and 7b. Weight portions 9a and 9b wider than the arms, and groove portions 8a and 8b formed on at least one of the front and back surfaces along the vibration centers C of the vibrating arms 7a and 7b are provided. The outer shape of the piezoelectric substrate 4a and the groove portions 8a and 8b are formed by etching using a photolithography technique.
Excitation electrodes for exciting the plurality of vibrating arms 7a and 7b are formed on the front and back surfaces and the side surfaces of the vibrating arms 7a and 7b including the groove portions 8a and 8b, respectively, by vapor deposition or sputtering. Yes. In addition, lead electrodes are formed to electrically connect the plurality of electrode pads and the excitation electrodes.

パッケージは、圧電振動素子4の各電極パッド(図示せず)と夫々電気的機械的に接続される素子搭載パッド18、及び複数の実装端子16を備えた絶縁基板(パッケージ本体)11と、素子搭載パッド上に搭載された圧電振動素子4を含む絶縁基板(パッケージ本体)11の上面を気密封止する蓋体35と、を備えている。
絶縁基板(パッケージ本体)11の凹陥部(キャビティー)の内底面上の、少なくとも圧電振動素子4の各錘部9a、9b及び基部5(支持腕5d、5e)の先部と対向する部位に夫々金属、又は高分子からなる緩衝材24が配設されている。
緩衝材24を帯状の連続体とせず個々に分離したのは、錘部9a、9bが緩衝材24に衝突する際に錘部9a、9bに形成した電極が金属の緩衝材に接することにより、振動腕7a、7bに形成した励振電極間に絶縁破壊が生じるのを防止するためである。
The package includes an element mounting pad 18 electrically and mechanically connected to each electrode pad (not shown) of the piezoelectric vibration element 4, an insulating substrate (package body) 11 having a plurality of mounting terminals 16, an element A lid 35 for hermetically sealing the upper surface of the insulating substrate (package body) 11 including the piezoelectric vibration element 4 mounted on the mounting pad.
On the inner bottom surface of the recessed portion (cavity) of the insulating substrate (package main body) 11, at least a portion facing each of the weight portions 9 a and 9 b and the base portion 5 (support arms 5 d and 5 e) of the piezoelectric vibration element 4. A cushioning material 24 made of metal or polymer is disposed.
The buffer material 24 is not separated into a band-like continuum, but is separated separately because the electrodes formed on the weight parts 9a and 9b come into contact with the metal buffer material when the weight parts 9a and 9b collide with the buffer material 24. This is to prevent dielectric breakdown from occurring between the excitation electrodes formed on the vibrating arms 7a and 7b.

基部5は、基部本体5aと、基部本体5aの各振動腕7a、7bとは反対側の他端縁中間部に設けた連結部5bと、連結部5bを介して連接され基部本体5aとは離間し各振動腕7a、7bと直交して延びる支持片5cと、支持片5cの両端に連接し各振動腕7a、7bとは離間し並行して延びる左右一対の支持腕5d、5eと、を備えている。
圧電振動素子1の基部5が、基部本体5aと、連結部5bと、連結部5bを介して連接した左右一対の支持腕5d、5eと、を備えた構成とすることにより、絶縁基板11の素子搭載パッド18に導電性接着剤22を介して圧電振動素子を接着・固定する際に接着・固定による歪の影響が基部5の構造により緩和され、圧電振動素子1のCI(クリスタルインピーダンスー)値を小さく、即ちQ値を大きくすることができるという効果がある。また、圧電振動素子1に加わる衝撃力が緩和されるという効果もある。
The base part 5 is connected to the base part body 5a, the connecting part 5b provided at the middle part of the other end of the base part 5a opposite to the vibrating arms 7a and 7b, and the base part body 5a. A support piece 5c that is spaced apart and extends orthogonally to each of the vibrating arms 7a and 7b; a pair of left and right support arms 5d and 5e that are connected to both ends of the support piece 5c and that are spaced apart from and extend in parallel with the vibrating arms 7a and 7b; It has.
The base part 5 of the piezoelectric vibration element 1 includes a base body 5a, a connecting part 5b, and a pair of left and right support arms 5d and 5e connected via the connecting part 5b. When the piezoelectric vibration element is bonded / fixed to the element mounting pad 18 via the conductive adhesive 22, the influence of distortion due to adhesion / fixation is mitigated by the structure of the base 5, and the CI (crystal impedance) of the piezoelectric vibration element 1 is reduced. There is an effect that the value can be reduced, that is, the Q value can be increased. In addition, the impact force applied to the piezoelectric vibration element 1 is also reduced.

図2は圧電振動素子4の電極構成を示す要部拡大図である。図2(a)は、励振電極30、31と、錘部9a、9b上の電極32a、32bと、リード電極33a、33bとを示す平面図であり、同図(b)はP−P断面図である。
図2(b)は、各振動腕7a、7bに夫々形成された励振電極30、31の配置を示す断面図である。
励振電極30、31は、各溝部8a、8bを含めた振動腕7a、7bの表裏面、側面、及び各溝部8a、8bの側面に形成されている。
振動腕7aの表裏面電極の極性は、振動腕7bの表裏面電極の極性に対して、異なる極性となるよう基部5に設けた複数の電極パッドを介して電圧が印加される。同様に、振動腕7aの側面電極の極性と、振動腕7bの側面電極の極性とは、互いに異なる極性となるように電圧が印加される。
つまり、振動腕7aの表裏面に+電圧、両側面に−電圧が印加されるとき、振動腕7bの表裏面に−電圧、両側面に+電圧が印加され、図2(b)の矢印で示すような電界が生じ、圧電振動素子4の重心を通る中心線Dに対し対称な音叉振動が励振される。
溝部8a、8bを形成することにより電界強度が強まり、音叉振動をより効率的に励振することができる。即ち、圧電振動素子のCI(クリスタルインピーダンスー)を小さく(Q値を大きく)することができる。
しかし、振動腕7a、7bの表裏面に必ずしも溝部を形成しなくともよい。
FIG. 2 is an enlarged view of a main part showing the electrode configuration of the piezoelectric vibration element 4. 2A is a plan view showing the excitation electrodes 30 and 31, the electrodes 32a and 32b on the weight portions 9a and 9b, and the lead electrodes 33a and 33b, and FIG. FIG.
FIG. 2B is a cross-sectional view showing the arrangement of the excitation electrodes 30 and 31 formed on the vibrating arms 7a and 7b, respectively.
The excitation electrodes 30 and 31 are formed on the front and back surfaces and side surfaces of the vibrating arms 7a and 7b including the groove portions 8a and 8b, and the side surfaces of the groove portions 8a and 8b.
A voltage is applied via a plurality of electrode pads provided on the base 5 so that the polarity of the front and back electrodes of the vibrating arm 7a is different from the polarity of the front and back electrodes of the vibrating arm 7b. Similarly, a voltage is applied so that the polarity of the side electrode of the vibrating arm 7a and the polarity of the side electrode of the vibrating arm 7b are different from each other.
That is, when + voltage is applied to the front and back surfaces of the vibrating arm 7a and − voltage is applied to both side surfaces, − voltage and + voltage are applied to the front and back surfaces of the vibrating arm 7b, and the arrows in FIG. An electric field as shown is generated, and a tuning fork vibration symmetric with respect to the center line D passing through the center of gravity of the piezoelectric vibration element 4 is excited.
By forming the grooves 8a and 8b, the electric field strength is increased, and tuning fork vibration can be excited more efficiently. That is, the CI (crystal impedance) of the piezoelectric vibration element can be reduced (Q value is increased).
However, the groove portions are not necessarily formed on the front and back surfaces of the vibrating arms 7a and 7b.

図3は、図1のQ−Q断面図である。パッケージは、矩形の箱状に形成されているパッケージ本体(絶縁基板)11と、ガラス等からなる窓部材36を有する蓋体35と、を備えている。蓋体35はパッケージ本体11の上面に形成されたキャビティ(凹陥部)を気密封止する。
パッケージ本体(絶縁基板)11は、図3に示すように、絶縁材料から成る第1の基板12と、第2の基板13と、環状の第3の基板14とを順次積層して形成されている。各基板12、13、14は、絶縁材料としての酸化アルミニウム質のセラミック・グリーンシートから成り、これらを箱状に成形した後で焼結して形成されている。表面実装用の実装端子16は、第1の基板12の外部底面に複数形成されている。
第3の基板14は中央部が除去された環状体であり、第3の基板14の上部周縁に例えばコバール等の金属シールリング15が焼成されている。
第2の基板13の上面と第3の基板14とにより、圧電振動素子4を収容するキャビティー(凹陥部)が形成されている。第2の基板13の上面の所定の位置には、内部導体17により各実装端子35と電気的に導通する複数の素子搭載パッド18が配設されている。また、第2の基板13上面(キャビティー内底面)の一端部寄りで、素子搭載パッド18に圧電振動素子4を搭載した際に錘部9a、9b及び支持腕5d、5eの先部に対応する部位に緩衝材24が形成されている。
3 is a QQ cross-sectional view of FIG. The package includes a package main body (insulating substrate) 11 formed in a rectangular box shape, and a lid 35 having a window member 36 made of glass or the like. The lid 35 hermetically seals a cavity (concave portion) formed on the upper surface of the package body 11.
As shown in FIG. 3, the package body (insulating substrate) 11 is formed by sequentially laminating a first substrate 12 made of an insulating material, a second substrate 13, and an annular third substrate 14. Yes. Each of the substrates 12, 13, and 14 is made of an aluminum oxide ceramic green sheet as an insulating material, and is formed by sintering them after forming them into a box shape. A plurality of mounting terminals 16 for surface mounting are formed on the outer bottom surface of the first substrate 12.
The third substrate 14 is an annular body from which the central portion is removed, and a metal seal ring 15 such as Kovar is fired around the upper periphery of the third substrate 14.
The upper surface of the second substrate 13 and the third substrate 14 form a cavity (concave portion) that accommodates the piezoelectric vibration element 4. At a predetermined position on the upper surface of the second substrate 13, a plurality of element mounting pads 18 that are electrically connected to the mounting terminals 35 by the internal conductors 17 are disposed. Further, near the one end portion of the upper surface (bottom surface of the cavity) of the second substrate 13, when the piezoelectric vibration element 4 is mounted on the element mounting pad 18, it corresponds to the tip portions of the weight portions 9a and 9b and the supporting arms 5d and 5e. A cushioning material 24 is formed at a portion to be performed.

圧電振動子1を製造する場合は、まず、パッケージ本体11の素子搭載パッド18上に導電性接着剤22、例えばエポキシ系接着剤、ポリイミド系接着剤、ビスマレイミド系接着剤等の何れかを適量塗布し、その上に圧電振動素子4の各支持腕5d、5eを載置して荷重をかける。
パッケージ本体11内の素子搭載パッド18と、圧電振動素子4の電極パッドとを導通させるには、導電性接着剤22を硬化させるために所定温度の高温炉内に所定時間入れる。アニール処理を施した後、上方から錘部9a、9bに形成した周波数調整用電極にレーザー光を照射して、金属膜の一部を蒸散させて周波数粗調を行う。ガラス窓部材36を備えた蓋体35をパッケージ本体11の上面に形成したシールリング15にシーム溶接する。
When manufacturing the piezoelectric vibrator 1, first, an appropriate amount of a conductive adhesive 22, for example, an epoxy adhesive, a polyimide adhesive, a bismaleimide adhesive, or the like is applied on the element mounting pad 18 of the package body 11. This is applied, and the supporting arms 5d and 5e of the piezoelectric vibration element 4 are placed thereon and a load is applied.
In order to electrically connect the element mounting pad 18 in the package body 11 and the electrode pad of the piezoelectric vibration element 4, the conductive adhesive 22 is placed in a high temperature furnace at a predetermined temperature for a predetermined time. After performing the annealing treatment, the frequency adjustment electrodes formed on the weight portions 9a and 9b are irradiated with laser light from above to evaporate a part of the metal film and perform frequency rough adjustment. The lid 35 having the glass window member 36 is seam welded to the seal ring 15 formed on the upper surface of the package body 11.

パッケージ本体11の底面の貫通孔19を封止する前に加熱処理を施す。パッケージ本体11の上下を逆にして貫通孔19内の段差部上に金属球の充填材19aを載置する。充填材19aとしては金−ゲルマニウム合金等が好ましい。充填材19aにレーザー光を照射して溶融させ、貫通孔19を封止すると共にパッケージ内部を真空とする。
次に、パッケージの外部から窓部材36を介してレーザー光をパッケージ内に照射し、振動腕に形成した周波数調整用金属膜を蒸散させて周波数微調整を行い、圧電振動子1を完成する。
絶縁基板(パッケージ本体)11のキャビティー内底面の、圧電振動素子4の各錘部9a、9b及び支持腕5d、5eの先部と対向する部位に夫々緩衝材24を配設した圧電振動子(音叉型圧電振動子)1を構成することにより、落下等により絶縁基板11面と直交する方向の衝撃力が圧電振動子1に加わった際に、圧電振動子1の各振動腕の錘部9a、9b、及び基部5の支持腕5d、5eの先部が緩衝材24に衝突するが、緩衝材24によりその衝撃力は低減され、錘部9a、9bに形成した電極が剥れたり、支持腕5d、5eの先部が破損することが大幅に低減され、衝撃力に対して強い圧電振動子が得られるという効果がある。
Heat treatment is performed before sealing the through hole 19 on the bottom surface of the package body 11. A metal ball filler 19 a is placed on the stepped portion in the through hole 19 with the package body 11 upside down. The filler 19a is preferably a gold-germanium alloy or the like. The filler 19a is irradiated with a laser beam and melted to seal the through hole 19 and make the inside of the package vacuum.
Next, laser light is irradiated into the package from the outside of the package through the window member 36, and the frequency adjusting metal film formed on the vibrating arm is evaporated to finely adjust the frequency, whereby the piezoelectric vibrator 1 is completed.
Piezoelectric vibrator in which a buffer material 24 is disposed on a portion of the bottom surface of the cavity of the insulating substrate (package body) 11 facing the respective weight portions 9a and 9b of the piezoelectric vibration element 4 and the tip portions of the support arms 5d and 5e. (Tuning Fork Type Piezoelectric Vibrator) 1 constitutes a weight portion of each vibrating arm of the piezoelectric vibrator 1 when an impact force perpendicular to the surface of the insulating substrate 11 is applied to the piezoelectric vibrator 1 due to dropping or the like. 9a, 9b and the tip of the support arms 5d, 5e of the base 5 collide with the buffer material 24, but the impact force is reduced by the buffer material 24, and the electrodes formed on the weights 9a, 9b peel off, It is greatly reduced that the tip portions of the support arms 5d and 5e are damaged, and a piezoelectric vibrator that is strong against impact force can be obtained.

図4は、第2の実施の形態の圧電振動子2の構成を示す図であり、平面図は図1(a)に示す平面図とほぼ同様であるので省略する。図4(a)は幅方向(図1(a)のP−Pに相当する)の断面図であり、同図(b)は長さ方向(図1(a)のQ−Qに相当する)の断面図である。図1に示す圧電振動子1と異なる点は、パッケージ本体38のキャビティー38a内の両側壁面に長手方向に沿って緩衝材24aを設けたことである。
つまり、パッケージ本体38の素子搭載パッド18上に導電性接着剤22を介して圧電振動素子4を搭載する際に、錘部9a、9b、及び支持腕5d、5eの先部に対応するキャビティー38aの内底面上に夫々金属、又は高分子材の緩衝材24を配設し、支持腕5d、5eの先部に対応するキャビティー38aの側壁面に金属、又は高分子材の緩衝材24aを形成する。
緩衝材24aはパッケージ本体38を形成する段階で形成しておくことが望ましい。
FIG. 4 is a diagram showing a configuration of the piezoelectric vibrator 2 according to the second embodiment, and a plan view thereof is substantially the same as the plan view shown in FIG. 4A is a cross-sectional view in the width direction (corresponding to PP in FIG. 1A), and FIG. 4B corresponds to the length direction (QQ in FIG. 1A). FIG. The difference from the piezoelectric vibrator 1 shown in FIG. 1 is that cushioning materials 24a are provided along the longitudinal direction on both side walls in the cavity 38a of the package body 38.
That is, when the piezoelectric vibration element 4 is mounted on the element mounting pad 18 of the package body 38 via the conductive adhesive 22, the cavity corresponding to the weight portions 9a and 9b and the front portions of the support arms 5d and 5e. Metal or polymer cushioning material 24 is disposed on the inner bottom surface of 38a, and metal or polymer cushioning material 24a is provided on the side wall surface of cavity 38a corresponding to the tip of support arms 5d and 5e. Form.
It is desirable to form the cushioning material 24a at the stage of forming the package body 38.

絶縁基板面(パッケージ本体38のキャビティー内底面)の、圧電振動素子4の各錘部及9a、9b、及び支持腕5d、5eの先部と対向する部位に夫々緩衝材24を配設すると共に、絶縁基板内側の両側壁面の圧電振動素子4の支持腕5d、5e(基部5)の先部と対向する部位に夫々緩衝材24aを配設した圧電振動子(音叉型圧電振動子)を構成する。落下等により絶縁基板38面と直交する方向の衝撃力が圧電振動子2に加わると、圧電振動子2の各振動腕の錘部9a、9b、及び基部の支持腕5d、5eの先部が底面の緩衝材24に衝突するが、緩衝材24により衝撃力は低減され、錘部9a、9bに形成した電極が剥がれたり、支持腕5d、5e先部が破損する虞が大幅に低減され、圧電振動子の不良が大幅に低減されるという効果がある。
また、絶縁基板38面と平行な方向の衝撃力が圧電振動子2に加わると、圧電振動子2の支持腕5d、5eの先部が側壁面と衝突する虞があるが、緩衝材24aにより衝撃力は低減され、支持腕先部が破損する虞が大幅に低減され、圧電振動子の不良が大幅に低減されるという効果がある。
The cushioning material 24 is disposed on the insulating substrate surface (bottom surface of the cavity of the package body 38) at the portions facing the weight portions 9a and 9b of the piezoelectric vibration element 4 and the tip portions of the support arms 5d and 5e. At the same time, piezoelectric vibrators (tuning fork type piezoelectric vibrators) each provided with a buffer material 24a at portions facing the front portions of the supporting arms 5d and 5e (base portion 5) of the piezoelectric vibration element 4 on both side walls inside the insulating substrate. Constitute. When impact force in a direction perpendicular to the surface of the insulating substrate 38 is applied to the piezoelectric vibrator 2 due to dropping or the like, the weight portions 9a and 9b of the vibrating arms of the piezoelectric vibrator 2 and the tip portions of the support arms 5d and 5e of the base portion are moved. Although it collides with the cushioning material 24 on the bottom surface, the impact force is reduced by the cushioning material 24, and the possibility that the electrodes formed on the weight portions 9a and 9b are peeled off or the support arms 5d and 5e are damaged is greatly reduced. There is an effect that the defect of the piezoelectric vibrator is greatly reduced.
Further, when an impact force in a direction parallel to the surface of the insulating substrate 38 is applied to the piezoelectric vibrator 2, the tip portions of the support arms 5d and 5e of the piezoelectric vibrator 2 may collide with the side wall surface. The impact force is reduced, the possibility that the supporting arm tip portion is damaged is greatly reduced, and the defect of the piezoelectric vibrator is greatly reduced.

図5は、第3の実施の形態の振動ジャイロセンサー3の構成を示す図であり、蓋体を取り除いて示している。図5(a)は、振動ジャイロセンサー3の平面図であり、同図(b)はP−P断面図である。
振動ジャイロセンサー3は、振動ジャイロ素子40と、振動ジャイロ素子40を収容するパッケージと、を概略備えている。パッケージは、絶縁基板(パッケージ本体)39と、絶縁基板39を気密封止する図示しない蓋体と、を備えている。
振動ジャイロ素子40は、中央に位置する基部41と、基部41の対向する2つの端縁(上下端縁40a、40b)の中央部から夫々同一直線上に、かつ反対方向へ突設された1対の検出用振動腕45a、45bと、を備えている。更に、振動ジャイロ素子40は、基部41の対向する他の2つの端縁(左右端縁41c、41d)の中央部から夫々検出用振動腕45a、45bと直交する方向に、かつ反対方向へ同一直線上に突設された1対の第1の連結腕42a、42bと、各第1の連結腕42a、42bの先部適所から夫々と直交する両方向へ突設された各1対の駆動用振動腕43a、43b及び44a、44bと、を備えている。
FIG. 5 is a diagram illustrating the configuration of the vibration gyro sensor 3 according to the third embodiment, with the lid removed. FIG. 5A is a plan view of the vibration gyro sensor 3, and FIG. 5B is a cross-sectional view taken along the line PP.
The vibration gyro sensor 3 generally includes a vibration gyro element 40 and a package that accommodates the vibration gyro element 40. The package includes an insulating substrate (package main body) 39 and a lid (not shown) that hermetically seals the insulating substrate 39.
The vibrating gyro element 40 has a base 41 located in the center and a central portion of two opposing edges of the base 41 (upper and lower edges 40a and 40b), respectively, protruding in the same direction and in opposite directions. A pair of detection vibrating arms 45a and 45b. Further, the vibrating gyro element 40 is the same in the direction orthogonal to the detection vibrating arms 45a and 45b and in the opposite direction from the central part of the other two opposite edges (left and right edge edges 41c and 41d) of the base 41. A pair of first connecting arms 42a and 42b projecting in a straight line, and a pair of driving members projecting in both directions orthogonal to each other from appropriate positions at the front portions of the first connecting arms 42a and 42b Vibration arms 43a, 43b and 44a, 44b.

更に、振動ジャイロ素子40は、基部41の四隅(上下端縁40a、40bの各終端部)から夫々L字状に突設された2対の支持腕46a、46b及び47a、47bを備えている。各支持腕46a、47aの先部は、検出用振動腕45aの両側方において検出用振動腕45aと同方向へ延びている。各支持腕46b、47bの先部は、検出用振動腕45bの両側方において検出用振動腕45bと同方向へ延びている。
励振電極は、少なくとも1対の検出用振動腕45a、45bと、各1対の駆動用振動腕43a、43b及び44a、44bと、に夫々形成されている。支持腕46a、46b及び47a、47bには、複数の電極パッド(図示せず)が形成され、この電極パッドと励振電極との間は、夫々電気的に接続されている。
振動ジャイロセンサー3は、絶縁基板39面の、圧振動ジャイロ素子40の各検出用振動腕45a、45b、及び各駆動用振動腕43a、43b及び44a、44bの先部と対向する部位に金属、又は高分子材の緩衝材が設けられている。
Further, the vibrating gyro element 40 includes two pairs of support arms 46a, 46b and 47a, 47b that project from the four corners of the base portion 41 (each terminal portion of the upper and lower end edges 40a, 40b) in an L shape. . The tip of each support arm 46a, 47a extends in the same direction as the detection vibrating arm 45a on both sides of the detection vibrating arm 45a. The front portions of the support arms 46b and 47b extend in the same direction as the detection vibration arm 45b on both sides of the detection vibration arm 45b.
The excitation electrodes are formed on at least one pair of detection vibrating arms 45a and 45b and a pair of driving vibrating arms 43a and 43b and 44a and 44b, respectively. A plurality of electrode pads (not shown) are formed on the support arms 46a and 46b and 47a and 47b, and the electrode pads and the excitation electrodes are electrically connected to each other.
The vibration gyro sensor 3 has a metal on the surface of the insulating substrate 39 facing the detection vibration arms 45a and 45b of the pressure vibration gyro element 40 and the front portions of the drive vibration arms 43a and 43b and 44a and 44b. Alternatively, a buffer material made of a polymer material is provided.

図5(c)は振動ジャイロ素子の動作を説明する模式平面図である。振動ジャイロセンサー3は角速度が加わらない状態では、駆動用振動腕43a、43b、44a、44bが矢印Eで示す方向に屈曲振動を行う。このとき、駆動用振動腕43a、43bと駆動用振動腕44a、44bとが、重心Gを通るY軸方向の直線に関して線対称の振動を行っているため、基部41、連結腕42a、42b、検出用振動腕45a、45bはほとんど振動しない。
振動ジャイロセンサー3にZ軸回りの角速度ωが加わると、駆動用振動腕43a、43b、44a、44b、及び第1の連結腕42a、42bにコリオリ力が働き新たな振動が励起される。この振動は重心Gに対して周方向の振動である。同時に検出用振動腕45a、45bは、この振動に応じて検出振動が励起される。この振動により発生した歪を検出用振動腕45a、45bに形成した検出電極が検出して角速度が求められる。
FIG. 5C is a schematic plan view for explaining the operation of the vibrating gyro element. In the state where the angular velocity is not applied, the vibration gyro sensor 3 causes the vibration arms for driving 43a, 43b, 44a, 44b to bend and vibrate in the direction indicated by the arrow E. At this time, since the driving vibrating arms 43a and 43b and the driving vibrating arms 44a and 44b perform a line-symmetric vibration with respect to a straight line in the Y-axis direction passing through the center of gravity G, the base 41, the connecting arms 42a and 42b, The detection vibrating arms 45a and 45b hardly vibrate.
When an angular velocity ω about the Z axis is applied to the vibration gyro sensor 3, Coriolis force acts on the drive vibration arms 43a, 43b, 44a, 44b and the first connection arms 42a, 42b to excite new vibrations. This vibration is a vibration in the circumferential direction with respect to the center of gravity G. At the same time, the detection vibration arms 45a and 45b are excited in accordance with this vibration. A detection electrode formed on the vibrating arms for detection 45a and 45b detects the distortion generated by this vibration, and the angular velocity is obtained.

絶縁基板(パッケージ本体)39面の、圧振動ジャイロ素子40の各検出用振動腕45a、45b、及び各駆動用振動腕43a、43b、44a、44bの先部と対向する部位に緩衝材24を設けている。このように構成すると、落下等により絶縁基板39面と直交する方向への衝撃力が振動ジャイロセンサー3に加わった際に、振動ジャイロセンサー3の各検出用振動腕45a、45b、及び各駆動用振動腕43a、43b、44a、44bの先部が緩衝材24と接触するが、緩衝材24によりその衝撃力は低減され、各検出用振動腕45a、45b及び各駆動用振動腕43a、43b、44a、44bの電極が剥がれたり破損したりする不具合が低減され、衝撃に対して強い振動ジャイロセンサー3が構成できるという効果がある。   The cushioning material 24 is placed on the surface of the insulating substrate (package body) 39 facing the detection vibration arms 45a and 45b of the pressure vibration gyro element 40 and the front portions of the drive vibration arms 43a, 43b, 44a and 44b. Provided. With this configuration, when an impact force in a direction orthogonal to the surface of the insulating substrate 39 is applied to the vibration gyro sensor 3 due to dropping or the like, the detection vibrating arms 45a and 45b of the vibration gyro sensor 3 and the driving The front ends of the vibrating arms 43a, 43b, 44a, 44b are in contact with the shock absorbing material 24, but the shock force is reduced by the shock absorbing material 24, and the detecting vibrating arms 45a, 45b and the driving vibrating arms 43a, 43b, The problem that the electrodes 44a and 44b are peeled off or damaged is reduced, and there is an effect that the vibration gyro sensor 3 that is strong against impact can be configured.

次に、圧電振動子1のパッケージ本体(絶縁基板)11に緩衝材24を形成する製造方法について説明する。図6、図7は、本発明の特徴である緩衝材24を、例えば銀(Ag)、タングステン(W)、クロム(Cr)、ニッケル(Ni)、モリブデン(Mo)等の金属の一種、又は複数の金属を用いて、絶縁基板(パッケージ本体)11のキャビティー底面11aに形成する製造法を示す工程図と、フローチャート図である。
圧電振動素子4を搭載する前に、図6(a)に示すように絶縁基板(パッケージ本体)11のキャビティー底面11aの各錘部9a、9bと対向する部位に略全幅に渡り、各錘部9a、9bの振動腕方向の長さ程度に、所定厚さの緩衝材層24を、蒸着法、又はスパッタ法を用いて形成する(S10)。次に、緩衝材層24の表面全体にフォトレジスト膜26を形成する(S11)。
Next, a manufacturing method for forming the buffer material 24 on the package body (insulating substrate) 11 of the piezoelectric vibrator 1 will be described. 6 and FIG. 7, the buffer material 24, which is a feature of the present invention, is a kind of metal such as silver (Ag), tungsten (W), chromium (Cr), nickel (Ni), molybdenum (Mo), or the like. It is process drawing which shows the manufacturing method formed in the cavity bottom face 11a of the insulated substrate (package main body) 11 using a some metal, and a flowchart figure.
Before mounting the piezoelectric vibration element 4, as shown in FIG. 6A, each of the weights extends over almost the entire width to a portion facing the weight portions 9 a and 9 b of the cavity bottom surface 11 a of the insulating substrate (package body) 11. A buffer material layer 24 having a predetermined thickness is formed by using a vapor deposition method or a sputtering method to approximately the length of the portions 9a and 9b in the vibrating arm direction (S10). Next, a photoresist film 26 is formed on the entire surface of the buffer material layer 24 (S11).

次に、図6(b)に示すように、緩衝材層24、フォトレジスト膜26が形成された絶縁基板(パッケージ本体)11の素子搭載パッド18に、導電性接着剤22を適量塗布してから圧電振動素子4を所定の位置に搭載し、軽く加重を加えてから接着剤を硬化させることにより搭載を完了する(S12)。次に、圧電振動素子4の各錘部9a、9b及び支持腕5d、5eの先部をフォトマスクとして用い、圧電振動素子4の上方から光を当てて露光する(S13)。図6(c)に示すように感光したフォトレジスト膜26を除去する(S14)。
次に、図6(d)に示すように、フォトレジスト26の除去によって露出した緩衝材層24の特定部位をエッチングにより除去する(S14)。図6(e)に示すように、残ったフォトレジスト26を除去することにより、絶縁基板(パッケージ本体)11のキャビティーの所定の位置、つまり、圧電振動素子4の錘部9a、9b、及び支持腕5d、5eの先部に対応する部位に正確に緩衝材24を形成することができる。
Next, as shown in FIG. 6B, an appropriate amount of conductive adhesive 22 is applied to the element mounting pads 18 of the insulating substrate (package body) 11 on which the buffer material layer 24 and the photoresist film 26 are formed. Then, the piezoelectric vibration element 4 is mounted at a predetermined position, and the mounting is completed by applying a light weight and then curing the adhesive (S12). Next, exposure is performed by applying light from above the piezoelectric vibration element 4 using the weights 9a and 9b of the piezoelectric vibration element 4 and the tips of the support arms 5d and 5e as a photomask (S13). As shown in FIG. 6C, the exposed photoresist film 26 is removed (S14).
Next, as shown in FIG. 6D, the specific portion of the buffer material layer 24 exposed by the removal of the photoresist 26 is removed by etching (S14). As shown in FIG. 6E, by removing the remaining photoresist 26, a predetermined position of the cavity of the insulating substrate (package body) 11, that is, the weight portions 9a, 9b of the piezoelectric vibration element 4, and The cushioning material 24 can be accurately formed at a portion corresponding to the tip of the support arms 5d and 5e.

以上では圧電振動子1のパッケージ本体(絶縁基板)11に緩衝材24を形成する製造方法について説明したが、振動ジャイロセンサー3のパッケージ本体(絶縁基板)39に緩衝材24を形成する製造方法も、図6、図7と同様な製造方法を用いて構成することができるので省略する。
即ち、緩衝材を備えた振動ジャイロセンサーの製造方法は、絶縁基板上に振動ジャイロ素子を搭載する前に、各検出用振動腕及び各駆動用振動腕の各先部と対向する絶縁基板面に略全幅に渡って緩衝材層を形成する緩衝材層形成工程と、緩衝材層の表面にフォトレジスト膜を形成するフォトレジスト膜形成工程と、絶縁基板上に前記振動ジャイロ素子を搭載してから、前記各検出用振動腕及び前記各駆動用振動腕の先部をマスクとして、フォトレジスト膜の露出部位を露光して除去する露光工程と、露光工程によるフォトレジストの除去によって露出した緩衝材層の特定部位をエッチングにより除去するエッチング工程と、レジスト膜を除去するレジスト膜除去工程と、を含むものである。
The manufacturing method for forming the buffer material 24 on the package body (insulating substrate) 11 of the piezoelectric vibrator 1 has been described above. However, the manufacturing method for forming the buffer material 24 on the package body (insulating substrate) 39 of the vibration gyro sensor 3 may also be used. Since it can be configured using the same manufacturing method as in FIGS.
That is, in the method of manufacturing the vibration gyro sensor provided with the buffer material, before mounting the vibration gyro element on the insulating substrate, the surface of the insulating substrate facing each front end of each vibration arm for detection and each vibration arm for driving is provided. A buffer material layer forming step of forming a buffer material layer over substantially the entire width, a photoresist film forming step of forming a photoresist film on the surface of the buffer material layer, and mounting the vibration gyro element on an insulating substrate. , An exposure step of exposing and removing an exposed portion of the photoresist film using the detection vibrating arms and the tip portions of the driving vibrating arms as masks, and a buffer material layer exposed by removing the photoresist in the exposure step These include an etching process for removing the specific part by etching and a resist film removing process for removing the resist film.

ここで注意を要するのは、圧電振動素子4の電極の表面は一般的に金(Au)が用いられているので、緩衝材24としては金(Au)以外の金属を使うことである。これは、緩衝材層24をエッチングする際に、圧電振動素子4の電極がエッチングされないようなエッチング液を選択するためである。また、水晶の硬度は7であるので、緩衝材24の硬度は、硬度7より柔らかい硬度の緩衝材を用いることが望ましい。   Here, it should be noted that since the surface of the electrode of the piezoelectric vibration element 4 is generally made of gold (Au), a metal other than gold (Au) is used as the buffer material 24. This is to select an etching solution that does not etch the electrodes of the piezoelectric vibration element 4 when the buffer material layer 24 is etched. Further, since the hardness of the crystal is 7, it is desirable to use a buffer material having a softer hardness than the hardness 7 as the buffer material 24.

圧電振動子1のパッケージ本体(絶縁基板)11面に、蒸着法又はスパッタ法を使用して、銀(Ag)、タングステン(W)、クロム(Cr)、ニッケル(Ni)、モリブデン(Mo)の何れか一つの金属、又は複数の金属を用いて、緩衝材層24を形成し、フォトリソグラフィ技法とエッチング手法で緩衝材層24を加工すれば、絶縁基板11面に圧電振動素子1の各錘部9a、9b及び支持腕5d、5eの先部と対向する部位に正確に、且つ容易に緩衝材24を形成することができ、落下等による衝撃に対し強い圧電振動子1が得られるという効果がある。   The surface of the package body (insulating substrate) 11 of the piezoelectric vibrator 1 is made of silver (Ag), tungsten (W), chromium (Cr), nickel (Ni), molybdenum (Mo) by using a vapor deposition method or a sputtering method. If any one metal or a plurality of metals is used to form the buffer material layer 24 and the buffer material layer 24 is processed by the photolithography technique and the etching technique, each weight of the piezoelectric vibration element 1 is formed on the surface of the insulating substrate 11. The buffer material 24 can be formed accurately and easily at the portions facing the portions 9a and 9b and the tip portions of the support arms 5d and 5e, and the piezoelectric vibrator 1 that is strong against impact caused by dropping or the like can be obtained. There is.

振動ジャイロセンサー3のパッケージ本体(絶縁基板)39面に、蒸着法又はスパッタ法を用いて、銀(Ag)、タングステン(W)、クロム(Cr)、ニッケル(Ni)、モリブデン(Mo)の何れか一つの金属、又は複数の金属の緩衝材層24を形成し、フォトリソグラフィ技法とエッチング手法を用いて緩衝材層24を加工すれば、絶縁基板39面に各検出用振動腕45a、45b、及び各駆動用振動腕43a、43b、44a、44bの先部と対向する部位に正確に、且つ容易に緩衝材を形成することでき、落下等による衝撃に対し強い振動ジャイロセンサー3が得られるという効果がある。   Any one of silver (Ag), tungsten (W), chromium (Cr), nickel (Ni), and molybdenum (Mo) is formed on the surface of the package main body (insulating substrate) 39 of the vibration gyro sensor 3 by vapor deposition or sputtering. When the buffer material layer 24 of one metal or a plurality of metals is formed and the buffer material layer 24 is processed by using a photolithography technique and an etching technique, each of the detection vibrating arms 45a, 45b, In addition, it is possible to accurately and easily form a cushioning material at a portion facing the front portion of each driving vibration arm 43a, 43b, 44a, 44b, and to obtain a vibration gyro sensor 3 that is strong against an impact caused by dropping or the like. effective.

図8は、緩衝材24に高分子材、例えばエポキシ系、ポリイミド、ビスマレイミド系の高分子材を用いて圧電振動子1を構成する場合の製造フローチャートである。
初めに、絶縁基板(パッケージ本体)11に圧電振動素子4を搭載する前に、絶縁基板(パッケージ本体)11のキャビティー底面11aに、各錘部9a、9bと対向する絶縁基板11面の略全幅に渡り、各錘部9a、9bの振動腕方向の長さ程度で、所定の厚さの緩衝材層24を塗布する(S20)。
次に、緩衝材層24が形成された絶縁基板(パッケージ本体)11の素子搭載パッド18に、導電性接着剤22を適量塗布し、圧電振動素子4を所定の位置に搭載し、軽く加重をかける(S21)。次に、形状認識用カメラと、レーザー装置と、情報処理装置(パーソナルコンピュータPC)とを装備した装置を用い、圧電振動素子4の各錘部9a、9b、及び支持腕5d、5eの先部の形状を撮影し、この情報をPCの格納する(S22)。
次に、PCに格納した情報に基づき、各錘部9a、9b、及び支持腕5d、5eの先部を僅かに避けて緩衝材層24を蒸散して、圧電振動素子4の錘部9a、9b、及び支持腕5d、5eの先部に対応する部位に、正確に緩衝材24を形成することができる。
FIG. 8 is a manufacturing flowchart in the case where the piezoelectric vibrator 1 is configured by using a polymer material such as an epoxy-based, polyimide, or bismaleimide-based polymer material for the buffer material 24.
First, before mounting the piezoelectric vibration element 4 on the insulating substrate (package main body) 11, the cavity bottom surface 11a of the insulating substrate (package main body) 11 is substantially omitted from the surface of the insulating substrate 11 facing the weights 9a and 9b. A buffer material layer 24 having a predetermined thickness is applied over the entire width so as to be about the length of each of the weight portions 9a and 9b in the vibrating arm direction (S20).
Next, an appropriate amount of conductive adhesive 22 is applied to the element mounting pad 18 of the insulating substrate (package body) 11 on which the buffer material layer 24 is formed, and the piezoelectric vibration element 4 is mounted at a predetermined position, and lightly loaded. Call (S21). Next, using a device equipped with a shape recognition camera, a laser device, and an information processing device (personal computer PC), the weight portions 9a and 9b of the piezoelectric vibration element 4 and the tip portions of the support arms 5d and 5e are used. Is captured and this information is stored in the PC (S22).
Next, based on the information stored in the PC, the weight portions 9a, 9b and the tip portions of the support arms 5d, 5e are slightly avoided to evaporate the buffer material layer 24, and the weight portions 9a, 9a, The cushioning material 24 can be accurately formed at the portions corresponding to the front portions of 9b and the support arms 5d and 5e.

図8では、緩衝材24に高分子材、例えばエポキシ系、ポリイミド、ビスマレイミド系の高分子材を用いて圧電振動子1の製造方法について説明したが、振動ジャイロセンサー3についても、同様な製造方法で構成することができる。
圧電振動子1のパッケージ本体(絶縁基板)11面の所定の領域にエポキシ系、ポリイミド系、ビスマレイミド系高分子材の何れか一つの高分子材を塗布し、形状認識用カメラ、レーザー装置及び情報処理装置(PC)を用いて、圧電振動素子の錘部9a、9b及び支持腕5d、5eの先部をマスクとして、不要な高分子材を除去すれば、絶縁基板11面に錘部9a、9b及び支持腕5d、5eの先部と正確に対応する高分子材の緩衝材が容易に形成され、落下等による衝撃力に対し、強い圧電振動子1が得られるという効果がある。
振動ジャイロセンサー3のパッケージ本体(絶縁基板)39面の所定の領域に、エポキシ系、ポリイミド系、ビスマレイミド系高分子材の何れか一つの高分子材を塗布し、形状認識用カメラ、レーザー装置及び情報処理装置(PC)を用いて、振動ジャイロ素子の各検出用振動腕45a、45b、及び各駆動用振動腕43a、43b、44a、44bの先部をマスクとして、不要な高分子材を除去すれば、絶縁基板39面に各検出用振動腕45a、45b、及び各駆動用振動腕43a、43b、44a、44bと正確に対応する高分子材の緩衝材24が容易に形成され、落下等による衝撃力に対し強い振動ジャイロセンサー3が得られるという効果がある。
In FIG. 8, the manufacturing method of the piezoelectric vibrator 1 has been described using a polymer material such as an epoxy-based, polyimide, or bismaleimide-based polymer material for the buffer material 24, but the vibration gyro sensor 3 is manufactured similarly. The method can be configured.
A polymer material of any one of epoxy, polyimide, and bismaleimide is applied to a predetermined region on the surface of the package body (insulating substrate) 11 of the piezoelectric vibrator 1, and a shape recognition camera, laser device, and If an unnecessary polymer material is removed using the weight portions 9a and 9b and the tips of the support arms 5d and 5e of the piezoelectric vibration element as a mask using an information processing apparatus (PC), the weight portion 9a is formed on the surface of the insulating substrate 11. , 9b and the tip of the support arms 5d and 5e are easily formed, and there is an effect that the piezoelectric vibrator 1 that is strong against impact force due to dropping or the like can be obtained.
A predetermined material on the surface of the package main body (insulating substrate) 39 of the vibration gyro sensor 3 is coated with any one of an epoxy, polyimide, and bismaleimide polymer material to form a shape recognition camera and laser device. And an information processing apparatus (PC), an unnecessary polymer material is formed using the detection vibrating arms 45a and 45b of the vibrating gyro element and the tip portions of the driving vibrating arms 43a, 43b, 44a and 44b as masks. If removed, the buffer material 24 of the polymer material corresponding to each of the detection vibrating arms 45a, 45b and the driving vibrating arms 43a, 43b, 44a, 44b accurately is easily formed on the surface of the insulating substrate 39, and dropped. Thus, there is an effect that the vibration gyro sensor 3 strong against the impact force due to the above or the like can be obtained.

1、2…圧電振動子、3…振動ジャイロセンサー、4…圧電振動素子、4a…圧電基板、5、41…基部、5a…基部本体、5b…連結部、5c…支持片、5d、5e…支持腕、7a、7b…振動腕、8a、8b…溝部、9a、9b…錘部、11、38、39…絶縁基板(パッケージ本体)、12…第1の基板、13…第2の基板、14…第3の基板、15…シールリング、16…実装端子、17…導体、18…素子搭載パッド、19…貫通孔19、19a…充填材、22…導電性接着剤、24…緩衝材、30、31…励振電極、32a、32b…錘部電極、33a、33b…リード電極、35…蓋体35、36…窓部材、40…振動ジャイロ、42a、42b…第1の連結腕、43a、43b、44a、44b…駆動用振動腕、45a、45b…検出用振動腕、46a、46b、47a、47b…支持腕、C…振動中心、D…重心 DESCRIPTION OF SYMBOLS 1, 2 ... Piezoelectric vibrator, 3 ... Vibration gyro sensor, 4 ... Piezoelectric vibration element, 4a ... Piezoelectric substrate 5, 41 ... Base part, 5a ... Base part main body, 5b ... Connection part, 5c ... Supporting piece, 5d, 5e ... Support arm, 7a, 7b ... vibrating arm, 8a, 8b ... groove, 9a, 9b ... weight, 11, 38, 39 ... insulating substrate (package body), 12 ... first substrate, 13 ... second substrate, DESCRIPTION OF SYMBOLS 14 ... 3rd board | substrate, 15 ... Seal ring, 16 ... Mounting terminal, 17 ... Conductor, 18 ... Element mounting pad, 19 ... Through-hole 19, 19a ... Filler, 22 ... Conductive adhesive agent, 24 ... Buffer material, 30, 31 ... excitation electrodes, 32a, 32b ... weight electrodes, 33a, 33b ... lead electrodes, 35 ... lid bodies 35, 36 ... window members, 40 ... vibrating gyros, 42a, 42b ... first connecting arms, 43a, 43b, 44a, 44b ... drive vibrating arms, 45a, 4 b ... detection vibration arms, 46a, 46b, 47a, 47b ... support arm, C ... oscillation center, D ... centroids

Claims (12)

圧電振動素子と、該圧電振動素子を収容するパッケージと、を備えた圧電振動子であって、
前記圧電振動素子は、複数の振動腕、各振動腕の一方の端部間を連接すると共に複数の電極パッドを備えた基部、前記各振動腕の他方の端部に夫々形成され該各振動腕よりも幅広の錘部、及び、前記各振動腕の振動中心に沿った表面及び裏面の少なくとも一方の面に形成された溝部、を備えた圧電基板と、前記各溝部内を含めた前記各振動腕の表裏面の少なくとも一方の面に夫々形成され、且つ前記複数の電極パッドとの間を夫々電気的に接続される励振電極と、を有し、
前記パッケージは、前記圧電振動素子の前記各電極パッドと夫々電気的機械的に接続される素子搭載パッド、及び実装端子を備えた絶縁基板と、前記素子搭載パッド上に搭載された前記圧電振動素子を含む前記絶縁基板上面を気密封止する蓋体と、を備え、
前記絶縁基板面の、少なくとも前記圧電振動素子の各錘部と対向する部位に夫々緩衝材を配設したことを特徴とする圧電振動子。
A piezoelectric vibrator comprising a piezoelectric vibration element and a package for housing the piezoelectric vibration element,
The piezoelectric vibration element includes a plurality of vibrating arms, a base portion connected to one end of each vibrating arm and a plurality of electrode pads, and formed on the other end of each vibrating arm. Each of the vibrations including the piezoelectric substrate having a wider weight part and a groove part formed on at least one of the front surface and the back surface along the vibration center of each vibration arm, and each of the vibrations including the inside of each groove part. An excitation electrode formed on at least one of the front and back surfaces of the arm and electrically connected to the plurality of electrode pads,
The package includes an element mounting pad electrically and mechanically connected to each electrode pad of the piezoelectric vibration element, an insulating substrate having a mounting terminal, and the piezoelectric vibration element mounted on the element mounting pad. A lid that hermetically seals the upper surface of the insulating substrate including:
A piezoelectric vibrator characterized in that a buffer material is disposed at least on a portion of the insulating substrate surface facing each weight portion of the piezoelectric vibration element.
圧電振動素子と、該圧電振動素子を収容するパッケージと、を備えた圧電振動子であって、
前記圧電振動素子は、複数の振動腕、各振動腕の一方の端部間を連接すると共に複数の電極パッドを備えた基部、前記各振動腕の他方の端部に夫々形成され該各振動腕よりも幅広の錘部、及び、前記各振動腕の振動中心に沿った表面及び裏面の少なくとも一方の面に形成された溝部、を備えた圧電基板と、前記各溝部内を含めた前記各振動腕の表裏面の少なくとも一方の面に夫々形成され、且つ前記複数の電極パッドとの間を夫々電気的に接続される励振電極と、を有し、
前記パッケージは、上面の凹陥部内に前記圧電振動素子の前記各電極パッドと夫々電気的機械的に接続される素子搭載パッドを有すると共に、該凹陥部の外部に実装端子を備えた絶縁基板と、前記素子搭載パッド上に搭載された前記圧電振動素子を含む前記絶縁基板上面を気密封止する蓋体と、を備え、
前記絶縁基板の凹陥部内底面には、前記圧電振動素子の各錘部及び基部の先部と対向する部位に夫々緩衝材を配設し、且つ、前記凹陥部の内壁には、前記圧電振動素子の基部の先部と対向する部位に夫々緩衝材を配設したことを特徴とする圧電振動子。
A piezoelectric vibrator comprising a piezoelectric vibration element and a package for housing the piezoelectric vibration element,
The piezoelectric vibration element includes a plurality of vibrating arms, a base portion connected to one end of each vibrating arm and a plurality of electrode pads, and formed on the other end of each vibrating arm. Each of the vibrations including the piezoelectric substrate having a wider weight part and a groove part formed on at least one of the front surface and the back surface along the vibration center of each vibration arm, and each of the vibrations including the inside of each groove part. An excitation electrode formed on at least one of the front and back surfaces of the arm and electrically connected to the plurality of electrode pads,
The package has an element mounting pad electrically and mechanically connected to each electrode pad of the piezoelectric vibration element in a concave portion on an upper surface, and an insulating substrate having a mounting terminal outside the concave portion, A lid that hermetically seals the upper surface of the insulating substrate including the piezoelectric vibration element mounted on the element mounting pad;
On the inner bottom surface of the recessed portion of the insulating substrate, a cushioning material is disposed at a portion facing each weight portion and the front portion of the base portion of the piezoelectric vibration element, and on the inner wall of the recessed portion, the piezoelectric vibration element A piezoelectric vibrator characterized in that a cushioning material is disposed at each of the portions facing the front portion of the base portion.
前記基部は、基部本体と、該基部本体の前記振動腕とは反対側の他端縁中間部に設けた連結部と、該連結部を介して連接され且つ前記基部本体とは離間して延びる左右一対の支持腕と、を備え、前記各支持腕の先部と対向する前記絶縁基板面に前記緩衝材を配置したことを特徴とする請求項1又は2に記載の圧電振動子。   The base portion is connected to the base main body, a connecting portion provided at the other end edge intermediate portion on the opposite side of the vibrating arm of the base main body, and is connected via the connecting portion and extends away from the base main body. 3. The piezoelectric vibrator according to claim 1, further comprising: a pair of left and right support arms, wherein the cushioning material is disposed on the insulating substrate surface facing the tip of each of the support arms. 前記緩衝材は、銀(Ag)、モリブデン(Mo)、タングステン(W)、クロム(Cr)、ニッケル(Ni)の何れか一つの物質から成る緩衝材層、又は複数の物質から成る緩衝材層であることを特徴とする請求項1乃至3の何れか一項に記載の圧電振動子。   The buffer material is a buffer material layer made of any one of silver (Ag), molybdenum (Mo), tungsten (W), chromium (Cr), and nickel (Ni), or a buffer material layer made of a plurality of materials. The piezoelectric vibrator according to claim 1, wherein the piezoelectric vibrator is provided. 前記緩衝材は、エポキシ系、ポリイミド系、ビスマレイミド系高分子材の何れか一つを用いた緩衝材であることを特徴とする請求項1乃至3の何れか一項に記載の圧電振動子。   4. The piezoelectric vibrator according to claim 1, wherein the buffer material is a buffer material using any one of an epoxy-based, polyimide-based, and bismaleimide-based polymer material. 5. . 振動ジャイロ素子と、該振動ジャイロ素子を収容するパッケージと、を備えた振動ジャイロセンサーであって、
前記振動ジャイロ素子は、基部と、該基部の対向する2つの端縁から夫々同一直線上に突設された1対の検出用振動腕と、
前記基部の対向する他の2つの端縁から夫々前記検出用振動腕と直交する方向に同一直線上に突設された1対の第1の連結腕と、前記各第1の連結腕からそれと直交する両方向へ夫々突設された各1対の駆動用振動腕と、
前記基部の四隅から夫々突設され、一対が一方の前記検出用振動腕の両側方において該検出用振動腕と同方向へ延びており、他方の一対が他方の前記検出用振動腕の両側方において該他方の検出用振動腕と同方向へ延びた二対の支持腕と、
少なくとも前記1対の検出用振動腕と、前記各1対の駆動用振動腕とに夫々形成され、且つ前記基部に設けた複数の電極パッドとの間を夫々電気的に接続される励振電極と、を備えており、
前記絶縁基板面の、前記圧振動ジャイロ素子の各検出用振動腕及び各駆動用振動腕の先端部と対向する部位に緩衝材を設けたことを特徴とする振動ジャイロセンサー。
A vibration gyro sensor comprising a vibration gyro element and a package for accommodating the vibration gyro element,
The vibrating gyro element includes a base, and a pair of detection vibrating arms protruding on the same straight line from two opposing edges of the base,
A pair of first connecting arms projecting from the other two opposite edges of the base on the same straight line in a direction orthogonal to the vibrating arm for detection, and from each of the first connecting arms A pair of drive vibrating arms each projecting in both orthogonal directions;
Projecting from the four corners of the base, a pair extends in the same direction as the detection vibrating arm on both sides of one of the detection vibrating arms, and the other pair is on both sides of the other detection vibrating arm. Two pairs of support arms extending in the same direction as the other detection vibrating arm in FIG.
Excitation electrodes formed on at least the pair of detection vibrating arms and the pair of driving vibration arms, respectively, and electrically connected to a plurality of electrode pads provided on the base. , And
A vibration gyro sensor characterized in that a buffer material is provided on a portion of the insulating substrate surface opposite to the detection vibration arm and the tip of each drive vibration arm of the pressure vibration gyro element.
前記緩衝材は、銀(Ag)、モリブデン(Mo)、タングステン(W)、クロム(Cr)、ニッケル(Ni)の何れか一つの物質から成る緩衝材層、又は複数の物質から成る緩衝層材であることを特徴とする請求項6に記載の振動ジャイロセンサー。   The buffer material is a buffer layer made of any one of silver (Ag), molybdenum (Mo), tungsten (W), chromium (Cr), and nickel (Ni), or a buffer layer made of a plurality of materials. The vibration gyro sensor according to claim 6, wherein: 前記緩衝材は、エポキシ系、ポリイミド系、ビスマレイミド系高分子材の何れか一つを用いた緩衝材であることを特徴とする請求項6に記載の振動ジャイロセンサー。   The vibration gyro sensor according to claim 6, wherein the buffer material is a buffer material using any one of an epoxy-based, polyimide-based, and bismaleimide-based polymer material. 請求項1乃至4の何れか一項に係る圧電振動子の製造方法であって、
前記絶縁基板上に前記圧電振動素子を搭載する前に、前記各錘部と対向する前記絶縁基板面に略全幅に渡って前記緩衝材層を形成する緩衝材層形成工程と、
前記緩衝材層の表面にフォトレジスト膜を形成するフォトレジスト膜形成工程と、
前記絶縁基板上に前記圧電振動素子を搭載してから、前記各錘部をマスクとして、前記フォトレジスト膜の露出部位を露光して除去する露光工程と、
前記露光工程による前記フォトレジストの除去によって露出した前記緩衝材層の特定部位をエッチングにより除去するエッチング工程と、
前記レジスト膜を除去するレジスト膜除去工程と、
を含むことを特徴とする圧電振動子の製造方法。
A method for manufacturing a piezoelectric vibrator according to any one of claims 1 to 4,
Before mounting the piezoelectric vibration element on the insulating substrate, a buffer material layer forming step of forming the buffer material layer over substantially the entire width on the surface of the insulating substrate facing each weight portion;
A photoresist film forming step of forming a photoresist film on the surface of the buffer material layer;
An exposure step of exposing and removing the exposed portion of the photoresist film using the respective weight portions as a mask after mounting the piezoelectric vibration element on the insulating substrate;
An etching step of removing a specific portion of the buffer material layer exposed by the removal of the photoresist by the exposure step by etching;
A resist film removing step for removing the resist film;
A method for manufacturing a piezoelectric vibrator, comprising:
請求項6又は7に係る振動ジャイロセンサーの製造方法であって、
前記絶縁基板上に前記振動ジャイロ素子を搭載する前に、前記各検出用振動腕及び前記各駆動用振動腕の各先部と対向する前記絶縁基板面に略全幅に渡って緩衝材層を形成する緩衝材層形成工程と、
前記緩衝材層の表面にフォトレジスト膜を形成するフォトレジスト膜形成工程と、
前記絶縁基板上に前記振動ジャイロ素子を搭載してから、前記各検出用振動腕及び前記各駆動用振動腕の先部をマスクとして、前記フォトレジスト膜の露出部位を露光して除去する露光工程と、
前記露光工程による前記フォトレジストの除去によって露出した前記緩衝材層の特定部位をエッチングにより除去するエッチング工程と、
前記レジスト膜を除去するレジスト膜除去工程と、
を含むことを特徴とする振動ジャイロセンサーの製造方法。
A method for manufacturing a vibration gyro sensor according to claim 6 or 7,
Before mounting the vibrating gyro element on the insulating substrate, a buffer material layer is formed over substantially the entire width on the insulating substrate surface facing each of the detection vibrating arms and the tip portions of the driving vibrating arms. A buffer material layer forming step,
A photoresist film forming step of forming a photoresist film on the surface of the buffer material layer;
An exposure step of exposing and removing the exposed portion of the photoresist film using the detection vibrating arms and the tip portions of the driving vibrating arms as a mask after mounting the vibrating gyro element on the insulating substrate. When,
An etching step of removing a specific portion of the buffer material layer exposed by the removal of the photoresist by the exposure step by etching;
A resist film removing step for removing the resist film;
The manufacturing method of the vibration gyro sensor characterized by including.
形状認識用カメラ、レーザー装置及び情報処理装置を用いた請求項1乃至3、又は5の何れか一項に係る圧電振動子の製造方法であって、
前記絶縁基板上に前記圧電振動素子を搭載する前に、前記各錘部と対向する前記絶縁基板面に略全幅に渡って前記高分子材の何れか一つを用いた緩衝材層を塗布する緩衝材層形成工程と、
前記絶縁基板上に前記圧電振動素子を搭載してから、前記各錘部及び前記支持腕を前記形状認識用カメラで認識し、該形状認識用カメラの出力情報に基づいて前記各錘部及び前記支持腕を僅かに避けて前記緩衝材層をレーザー装置で蒸散させ除去する蒸散工程と、
を含むことを特徴とする圧電振動子の製造方法。
A method of manufacturing a piezoelectric vibrator according to any one of claims 1 to 3, or 5 using a shape recognition camera, a laser device, and an information processing device,
Before mounting the piezoelectric vibration element on the insulating substrate, a buffer material layer using any one of the polymer materials is applied over substantially the entire width on the surface of the insulating substrate facing the weights. A buffer material layer forming step;
After mounting the piezoelectric vibration element on the insulating substrate, the weight parts and the supporting arms are recognized by the shape recognition camera, and the weight parts and the weights are determined based on output information of the shape recognition camera. A transpiration process of evacuating and removing the buffer material layer with a laser device while slightly avoiding the support arm;
A method for manufacturing a piezoelectric vibrator, comprising:
形状認識用カメラ、レーザー装置及び情報処理装置を用いた請求項6又は8に係る振動ジャイロセンサーの製造方法であって、
前記絶縁基板上に前記振動ジャイロ素子を搭載する前に、前記各検出用振動腕及び前記各駆動用振動腕の各先部と対向する前記絶縁基板面に略全幅に渡って前記高分子材の何れか一つを用いた緩衝材層を塗布する緩衝材層形成工程と、
前記絶縁基板上に前記振動ジャイロ素子を搭載してから、前記各検出用振動腕及び前記各駆動用振動腕の各先部を前記形状認識用カメラで認識し、該形状認識用カメラの出力情報に基づいて前記各検出用振動腕及び前記各駆動用振動腕を僅かに避けて前記緩衝材層をレーザー装置で蒸散させ除去する蒸散工程と、
を含むことを特徴とする圧電振動子の製造方法。
A method for manufacturing a vibration gyro sensor according to claim 6 or 8, wherein a shape recognition camera, a laser device, and an information processing device are used.
Before mounting the vibrating gyro element on the insulating substrate, the polymeric material is formed over substantially the entire width of the insulating substrate surface facing the tip portions of the detecting vibrating arms and the driving vibrating arms. A buffer material layer forming step of applying a buffer material layer using any one of them;
After mounting the vibration gyro element on the insulating substrate, the shape recognition camera recognizes the detection vibration arms and the tip portions of the drive vibration arms, and output information of the shape recognition camera. A transpiration step of evaporating and removing the buffer material layer with a laser device while slightly avoiding the detection vibration arms and the drive vibration arms based on
A method for manufacturing a piezoelectric vibrator, comprising:
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JP2014093734A (en) * 2012-11-06 2014-05-19 Sii Crystal Technology Inc Electronic device and process of manufacturing the same
JP2017011674A (en) * 2015-06-25 2017-01-12 京セラクリスタルデバイス株式会社 Crystal device
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