JP2012142525A - Film formation pattern forming method and film formation pattern forming device - Google Patents
Film formation pattern forming method and film formation pattern forming device Download PDFInfo
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- JP2012142525A JP2012142525A JP2011001239A JP2011001239A JP2012142525A JP 2012142525 A JP2012142525 A JP 2012142525A JP 2011001239 A JP2011001239 A JP 2011001239A JP 2011001239 A JP2011001239 A JP 2011001239A JP 2012142525 A JP2012142525 A JP 2012142525A
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Abstract
【課題】リードフレームに搭載された多数のLEDチップに対して配線パターン等を液滴吐出法により位置精度良く且つ能率良く形成できるようにする。
【解決手段】多数のLEDチップ15が搭載されたリードフレーム11全体をカメラの視野内に収めて撮像してその撮像画像からリードフレーム11のリードと各LEDチップ15の位置を認識し、その認識結果に基づいて、各LEDチップ15の側面上端からリードに向けて下り傾斜する傾斜面樹脂パターン17を形成する位置を指定する傾斜面樹脂用の描画ファイルと、配線下地パターン20を傾斜面樹脂パターン17上に形成する位置を指定する配線下地用の描画ファイルと、配線パターン19を形成する位置を指定する配線用の描画ファイルを作成し、これらの描画ファイルを用いて、傾斜面樹脂パターン17、配線下地パターン20及び配線パターン19をディスペンサ装置又はインクジェット装置で形成する。
【選択図】図1A wiring pattern or the like can be formed with high positional accuracy and efficiency by a droplet discharge method on a large number of LED chips mounted on a lead frame.
An entire lead frame 11 on which a large number of LED chips 15 are mounted is captured in a field of view of the camera, the lead of the lead frame 11 and the position of each LED chip 15 are recognized from the captured image, and the recognition is performed. Based on the result, the drawing file for the inclined surface resin for designating the position to form the inclined surface resin pattern 17 inclined downward from the upper end of the side surface of each LED chip 15 toward the lead, and the wiring base pattern 20 as the inclined surface resin pattern. 17 creates a drawing file for a wiring base that designates a position to be formed on the wiring pattern 17 and a drawing file for wiring that designates a position for forming the wiring pattern 19, and uses these drawing files to create the inclined surface resin pattern 17, The wiring base pattern 20 and the wiring pattern 19 are formed by a dispenser device or an inkjet device.
[Selection] Figure 1
Description
本発明は、搭載部材に搭載された複数の回路素子と該搭載部材とに跨がってそれぞれ液滴吐出法により成膜パターンを形成する成膜パターン形成方法及び成膜パターン形成装置に関する発明である。 The present invention relates to a film forming pattern forming method and a film forming pattern forming apparatus for forming a film forming pattern by a droplet discharge method across a plurality of circuit elements mounted on a mounting member and the mounting member. is there.
従来より、半導体素子の実装工程では、半導体素子を搭載部材(回路基板、リードフレーム等)にダイボンドした後に、該半導体素子の電極と搭載部材のパッドとの間をワイヤボンディングで配線するのが一般的である。 Conventionally, in a semiconductor element mounting process, after a semiconductor element is die-bonded to a mounting member (circuit board, lead frame, etc.), wiring between the electrode of the semiconductor element and a pad of the mounting member is generally performed by wire bonding. Is.
しかし、特許文献1(特許第3992038号公報)に記載されているように、ワイヤボンディングを行うときの機械的なストレスによって不良が発生する可能性があるため、ワイヤボンディングに代わる接続信頼性の高い実装構造を低コストで実現することを目的として、半導体素子の周囲に流動性の樹脂材料をディスペンサで吐出して、半導体素子の上面と配線基板の表面との間を傾斜面でつなぐ樹脂スロープを形成した後、半導体素子上面の電極と配線基板のパッドとの間を接続する配線パターンを液滴吐出法により樹脂スロープ上に形成する配線技術が提案されている。 However, as described in Patent Document 1 (Japanese Patent No. 3992038), there is a possibility that defects may occur due to mechanical stress when wire bonding is performed. Therefore, connection reliability that replaces wire bonding is high. For the purpose of realizing the mounting structure at low cost, a resin slope is formed by discharging a fluid resin material around the semiconductor element with a dispenser and connecting the upper surface of the semiconductor element and the surface of the wiring board with an inclined surface. A wiring technique has been proposed in which a wiring pattern for connecting between the electrode on the upper surface of the semiconductor element and the pad of the wiring substrate is formed on the resin slope by the droplet discharge method after the formation.
更に、特許文献2(特開2005−50911号公報)では、液滴吐出法により形成する配線パターンの位置精度を向上させることを目的として、リードフレームとこれに搭載した1つの半導体素子をカメラで撮像してその撮像画像から半導体素子上面の電極とリードフレームの位置を認識して、両者を接続する配線パターンの位置を決めて、配線パターンを液滴吐出法により形成することが提案されている。 Further, in Patent Document 2 (Japanese Patent Laid-Open No. 2005-50911), a lead frame and one semiconductor element mounted on the lead frame are mounted on a camera for the purpose of improving the positional accuracy of a wiring pattern formed by a droplet discharge method. It has been proposed to pick up an image, recognize the position of the electrode on the upper surface of the semiconductor element and the position of the lead frame from the picked-up image, determine the position of the wiring pattern that connects them, and form the wiring pattern by the droplet discharge method .
この種の半導体製品は、メーカー側で、1枚の搭載部材(多数個取り基板、リードフレーム等)に多数の半導体素子をダイボンドして配線等を施してからユーザーに出荷し、ユーザー側で、搭載部材を各半導体素子毎に分割して回路基板等に実装する場合が多い。 This type of semiconductor product is shipped to the user after die bonding a number of semiconductor elements on a single mounting member (multiple substrate, lead frame, etc.) to the user, and then shipped to the user. In many cases, the mounting member is divided for each semiconductor element and mounted on a circuit board or the like.
この場合、搭載部材上の各半導体素子の搭載位置は、製造ばらつきにより多少の位置ずれが生じることは避けられないため、液滴吐出法により樹脂スロープや配線パターンを形成する際には、各半導体素子の搭載位置の位置ずれに応じて各半導体素子毎に樹脂スロープや配線パターンを形成する位置を修正して形成することが望ましい。 In this case, since the mounting position of each semiconductor element on the mounting member inevitably causes a slight positional shift due to manufacturing variations, when forming a resin slope or a wiring pattern by the droplet discharge method, each semiconductor element is mounted. It is desirable to modify and form the position at which the resin slope or wiring pattern is formed for each semiconductor element in accordance with the displacement of the element mounting position.
しかし、上記特許文献1,2には、搭載部材に搭載した1つの半導体素子に対して樹脂スロープや配線パターンを形成する方法が記載されているだけであり、搭載部材に搭載した複数の半導体素子に対して一括して樹脂スロープや配線パターンを形成する方法が記載されていない。特許文献2のように、搭載部材に搭載した多数の半導体素子について、半導体素子を1個ずつ撮像して樹脂スロープや配線パターンを形成する位置を指定する処理を各半導体素子毎に行っていたのでは、手間がかかり、生産能率が悪い。 However, Patent Documents 1 and 2 only describe a method of forming a resin slope or a wiring pattern for one semiconductor element mounted on a mounting member, and a plurality of semiconductor elements mounted on the mounting member. However, there is no description of a method for forming a resin slope or a wiring pattern in a lump. As in Patent Document 2, for each of the semiconductor elements mounted on the mounting member, each semiconductor element is subjected to a process of picking up an image of the semiconductor elements one by one and designating a position where a resin slope or wiring pattern is formed. Then, it takes time and production efficiency is bad.
そこで、本発明が解決しようとする課題は、搭載部材に搭載された複数の回路素子と該搭載部材とに跨がる成膜パターン(例えば、樹脂スロープ、配線パターン等)を液滴吐出法により位置精度良く且つ能率良く形成できる成膜パターン形成方法及び成膜パターン形成装置を提供することである。 Therefore, the problem to be solved by the present invention is that a plurality of circuit elements mounted on a mounting member and a film forming pattern (for example, a resin slope, a wiring pattern, etc.) straddling the mounting member are formed by a droplet discharge method. It is an object of the present invention to provide a film formation pattern forming method and a film formation pattern forming apparatus capable of forming with high positional accuracy and efficiency.
上記課題を解決するために、本発明は、搭載部材に搭載された複数の回路素子と該搭載部材とに跨がってそれぞれ液滴吐出法により成膜パターンを形成する成膜パターン形成方法(成膜パターン形成装置)において、前記搭載部材とこれに搭載した前記複数の回路素子とを一括してカメラの視野内に収めて撮像し又はその撮像エリアを2分割以上に分割して撮像し、その撮像画像から前記搭載部材と各回路素子との位置関係を認識する画像認識工程(画像認識手段)と、前記画像認識工程(画像認識手段)で認識した前記搭載部材と各回路素子との位置関係を基準にして前記各回路素子毎に前記成膜パターンを形成する位置を指定する成膜パターン形成位置指定工程(成膜パターン形成位置指定手段)と、前記成膜パターン形成位置指定工程(成膜パターン形成位置指定手段)で前記各回路素子毎に指定された位置にそれぞれ液滴吐出法により前記成膜パターンを形成する液滴吐出工程(液滴吐出手段)を含むことを特徴とするものである。 In order to solve the above-described problems, the present invention provides a film formation pattern forming method for forming a film formation pattern by a droplet discharge method across a plurality of circuit elements mounted on a mounting member and the mounting member ( Film-forming pattern forming apparatus), in which the mounting member and the plurality of circuit elements mounted on the mounting member are collectively stored in the field of view of the camera or imaged by dividing the imaging area into two or more parts, An image recognition step (image recognition means) for recognizing a positional relationship between the mounting member and each circuit element from the captured image, and a position between the mounting member and each circuit element recognized in the image recognition step (image recognition means) A film forming pattern forming position specifying step (film forming pattern forming position specifying means) for specifying a position for forming the film forming pattern for each circuit element on the basis of the relationship, and the film forming pattern forming position specifying step A droplet discharge step (droplet discharge unit) for forming the film formation pattern by a droplet discharge method at a position specified for each circuit element by a film formation pattern formation position specifying unit). Is.
本発明では、搭載部材とこれに搭載した複数の回路素子とを一括してカメラの視野内に収めて撮像し又はその撮像エリアを2分割以上に分割して撮像し、その撮像画像から搭載部材と各回路素子との位置関係を認識し、その位置関係を基準にして各回路素子毎に成膜パターンを形成する位置を指定するため、搭載部材に搭載した回路素子の数よりも少ない撮像回数で、搭載部材に搭載した複数の回路素子の全ての位置を認識して各回路素子毎に成膜パターンを形成する位置を指定することができ、搭載部材に搭載された各回路素子毎に成膜パターンを液滴吐出法により位置精度良く且つ能率良く形成することができる。 In the present invention, the mounting member and a plurality of circuit elements mounted on the mounting member are collectively captured in the field of view of the camera or imaged by dividing the imaging area into two or more parts, and the mounting member is obtained from the captured image. The number of times of imaging is less than the number of circuit elements mounted on the mounting member, because the positional relationship between the circuit element and each circuit element is recognized and the position at which the film formation pattern is formed for each circuit element is specified based on the positional relationship. Thus, it is possible to recognize the positions of all of the plurality of circuit elements mounted on the mounting member and to specify the position at which the film formation pattern is formed for each circuit element, and for each circuit element mounted on the mounting member. The film pattern can be formed with high positional accuracy and efficiency by the droplet discharge method.
本発明は、成膜パターン形成位置指定工程で、成膜材料の異なる複数種類の成膜パターンを形成する位置を指定する描画ファイルを成膜材料毎に作成し、液滴吐出工程で、種類の異なる成膜材料毎に前記描画ファイルを用いて前記成膜パターンを形成するようにしても良い。このようにすれば、複数種類の成膜パターンが上下に重なる場合でも、各回路素子毎に複数種類の成膜パターンを液滴吐出法により位置精度良く且つ能率良く形成することができる。 The present invention creates a drawing file for each film forming material for designating a position for forming a plurality of types of film forming patterns having different film forming materials in the film forming pattern forming position specifying step, and You may make it form the said film-forming pattern using the said drawing file for every different film-forming material. In this way, even when a plurality of types of film formation patterns overlap each other, a plurality of types of film formation patterns can be formed with high positional accuracy and efficiency by the droplet discharge method for each circuit element.
具体的には、成膜パターン形成位置指定工程で、回路部品の側面上端から搭載部材の表面に向けて下り傾斜する傾斜面樹脂の成膜パターンを形成する位置を指定する傾斜面樹脂用の描画ファイルと、前記傾斜面樹脂とは異なる性質の樹脂又は表面処理材料からなる配線下地用の成膜パターンを前記傾斜面樹脂の成膜パターン上に形成する位置を指定する配線下地用の描画ファイルと、配線の成膜パターンを前記配線下地用の成膜パターン上に形成する位置を指定する配線用の描画ファイルとを作成し、液滴吐出工程で、前記傾斜面樹脂用の描画ファイルを用いて前記傾斜面樹脂の成膜パターンを形成した後、前記配線下地用の描画ファイルを用いて前記配線下地用の成膜パターンを前記傾斜面樹脂の成膜パターン上に形成し、その後、前記配線用の描画ファイルを用いて前記配線の成膜パターンを前記配線下地用の成膜パターン上に形成するようにしても良い。このようにすれば、各回路素子毎に傾斜面樹脂の成膜パターンと配線下地用の成膜パターンを下地とする配線の成膜パターン(配線パターン)を液滴吐出法により位置精度良く且つ能率良く形成することができる。 Specifically, in the film formation pattern formation position designation step, the drawing for the inclined surface resin that designates the position at which the film formation pattern of the inclined surface resin that is inclined downward from the upper side surface of the circuit component toward the surface of the mounting member is formed. A wiring base drawing file for designating a position at which a wiring base film forming pattern made of a resin or surface treatment material having a property different from that of the inclined surface resin is formed on the inclined surface resin film forming pattern; A wiring drawing file for designating a position for forming a wiring film forming pattern on the wiring base film forming pattern, and using the drawing file for the inclined surface resin in a droplet discharge process. After forming the inclined surface resin film formation pattern, the wiring base film forming pattern is formed on the inclined surface resin film formation pattern using the wiring base drawing file, and then the distribution pattern is arranged. The deposition pattern of the wiring by using a drawing file of use may be formed on the deposition pattern for the wiring substrate. In this way, for each circuit element, the film forming pattern of the inclined surface resin and the wiring film forming pattern (wiring pattern) based on the film forming pattern for the wiring base are positioned with high accuracy and efficiency by the droplet discharge method. It can be formed well.
この場合、複数の回路素子を搭載する搭載部材は、例えば、1枚の回路基板であっても良いし、リードフレーム又は多数個取り基板であっても良い。 In this case, the mounting member on which the plurality of circuit elements are mounted may be, for example, a single circuit board, a lead frame, or a multi-piece substrate.
以下、本発明を実施するための形態をLED実装方法に適用して具体化した一実施例を説明する。 Hereinafter, an embodiment in which a mode for carrying out the present invention is applied to an LED mounting method and embodied will be described.
まず、図3に基づいてLED実装構造を説明する。
搭載部材であるリードフレーム11は、ダイパッド12とリード13等が形成され、絶縁性の基材14に接合されている。ダイパッド12にはLEDチップ15(回路素子)が接着剤16でダイボンドされ、LEDチップ15の側面上端エッジからリード13に向けて下り傾斜する傾斜面樹脂の成膜パターンである傾斜面樹脂パターン17が液滴吐出法(例えばディスペンサ)により形成され、該傾斜面樹脂パターン17上には、LEDチップ15上面の電極18とリード13とを接続する配線の成膜パターンである配線パターン19が液滴吐出法(例えばインクジェット)により形成されている。図3には、チップ1個分のLED実装構造しか図示されていないが、実際には、図1に示すように、1枚のリードフレーム11に、多数のLEDチップ15が所定ピッチでダイボンドされている。図1では、リードフレーム11のリード13等の図示が省略されている。尚、配線パターン19の形成後に、必要に応じて、LEDチップ15と配線パターン19等を絶縁性樹脂等によりモールド(封止)して、パッケージ化するようにしても良い。
First, the LED mounting structure will be described with reference to FIG.
A
次に、図4を用いて成膜パターン形成装置の構成例を説明する。
成膜パターン形成装置の制御の主体となる制御装置21は、パーソナルコンピュータ等により構成され、カメラ22の撮像動作を制御すると共に、カメラ22の撮像画像等を表示する液晶ディスプレイ等の表示装置25と、キーボード、マウス等からなる入力装置26とが接続されている。カメラ22は、リードフレーム11全体を視野内に収めることができるものが用いられる。制御装置21は、カメラ22で撮像した画像を処理して各LEDチップ15のエッジの位置とリードフレーム11の各リード13の位置を認識する画像処理プログラムがインストールされている。
Next, a configuration example of the film forming pattern forming apparatus will be described with reference to FIG.
A
更に、制御装置21は、2種類の液滴吐出手段であるディスペンサ装置23とインクジェット装置24の吐出動作を制御する。ディスペンサ装置23は、流動性の樹脂材料をLEDチップ15の側面とリード13との間に吐出して、LEDチップ15の側面上端からリード13に向けて下り傾斜する傾斜面樹脂パターン17を形成した後、この傾斜面樹脂パターン17上に、傾斜面樹脂パターン17とは異なる性質の樹脂又は表面処理材料を吐出して配線下地パターン20を形成する。尚、傾斜面樹脂パターン17と配線下地パターン20とを別々のディスペンサ装置で形成しても良い。
Further, the
一方、インクジェット装置24は、導電性インク材料を配線下地パターン20上に吐出して、LEDチップ15上面の電極18とリード13とを接続する配線パターン19を形成する。
On the other hand, the
ここで、傾斜面樹脂パターン17と配線パターン19との間に介在させる配線下地パターン20は、傾斜面樹脂パターン17とは異なる性質の樹脂又は表面処理材料で形成すれば良いが、配線下地パターン20を傾斜面樹脂パターン17とは異なる性質の樹脂で形成する目的は、傾斜面樹脂パターン17の樹脂によっては硬化後であっても硬化しきらない表面の樹脂や後の熱処理によって分解した有機物が配線パターン19に混入しないようにするためであり、効果として、配線パターン19の導電性を確保しつつ傾斜面樹脂パターン17と配線パターン19との密着性を高めることができることが挙げられる。また、配線下地パターン20を表面処理材料で形成する目的は、配線パターン19の微細線化や傾斜面樹脂パターン17との密着性を向上させることであり、効果として、LEDチップ15とリードフレーム11のリード13とを確実に配線パターン19で接続することができ、更に、撥液性と親液性のバランスによって配線パターン19の幅の制御が可能になることが挙げられる。
Here, the
この場合、制御装置21は、図2のパターン形成プログラムを実行することで、リードフレーム11全体をカメラ22の視野内に収めて撮像してその撮像画像からリードフレーム11のリード13と各LEDチップ15との位置関係を認識する画像認識手段として機能すると共に、認識したリードフレーム11のリード13と各LEDチップ15との位置関係を基準にして各LEDチップ15毎に成膜パターン(傾斜面樹脂パターン17、配線下地パターン20及び配線パターン19)を形成する位置を指定する成膜パターン形成位置指定手段として機能し、各LEDチップ15毎に指定された位置に液滴吐出手段(ディスペンサ装置23とインクジェット装置24)でそれぞれ成膜材料(流動性の樹脂材料又は表面処理材料、導電性インク材料)を吐出して成膜パターン(傾斜面樹脂パターン17、配線下地パターン20及び配線パターン19)を形成する。
In this case, the
以上説明した本実施例の傾斜面樹脂パターン17と配線パターン19の形成は、制御装置21によって、図2のパターン形成プログラムに従って実行される。以下、図2のパターン形成プログラムの処理内容を説明する。
The formation of the inclined
図2のパターン形成プログラムが起動されると、まず、ステップ101で、多数のLEDチップ15がダイボンドされたリードフレーム11全体をカメラ22の視野内に収めて撮像する。この後、ステップ102に進み、カメラ22の撮像画像を処理してリードフレーム11上の各LEDチップ15のエッジ(側縁)とリードフレーム11のリード13の位置を認識する。
When the pattern formation program of FIG. 2 is started, first, in
この後、ステップ103に進み、各LEDチップ15の側面上端エッジとリードフレーム11のリード13の位置認識結果に基づいて、各LEDチップ15の側面上端エッジからリード13に向けて下り傾斜する傾斜面樹脂の成膜パターンである傾斜面樹脂パターン17を形成する位置を指定する傾斜面樹脂用の描画ファイル[図1(e)参照]を作成する。この傾斜面樹脂用の描画ファイルには、リードフレーム11上に形成する全ての傾斜面樹脂パターン17の位置データが含まれる。
Thereafter, the process proceeds to step 103, and the inclined surface that inclines downward from the side surface upper edge of each
この後、ステップ104に進み、配線下地パターン20を傾斜面樹脂パターン17上に形成する位置を指定する配線下地用の描画ファイル[図1(f)参照]を作成する。この配線下地用の描画ファイルには、リードフレーム11上に形成する全ての配線下地パターン20の位置データが含まれる。
Thereafter, the process proceeds to step 104, where a wiring base drawing file [see FIG. 1 (f)] for designating a position where the
この後、ステップ105に進み、各LEDチップ15の側面上端エッジとリードフレーム11のリード13の位置認識結果に基づいて、リードフレーム11上の各LEDチップ15上面の電極18とリード13とを接続する配線の成膜パターンである配線パターン19を形成する位置を指定する配線用の描画ファイル[図1(g)参照]を作成する。この際、各LEDチップ15の側面上端エッジの位置から各電極18の位置を算出し、各電極18とそれらに対応する各リード13との間を配線パターン19で結線するように配線用の描画ファイルを作成する。この配線用の描画ファイルには、リードフレーム11上に形成する全ての配線パターン19の位置データが含まれる。尚、LEDチップ15の各電極18の位置をカメラ22の撮像画像から認識可能である場合には、各電極18の位置も、画像処理により認識するようにしても良い。
Thereafter, the process proceeds to step 105, and the
この後、ステップ106に進み、図1(b)に示すように、ディスペンサ装置23を駆動して傾斜面樹脂用の描画ファイルで指定された全ての位置に流動性の樹脂材料を吐出して傾斜面樹脂パターン17を形成する。これにより、各LEDチップ15の側面上端エッジからリード13に向けて下り傾斜する傾斜面樹脂パターン17が形成される。
Thereafter, the process proceeds to step 106, and as shown in FIG. 1 (b), the
傾斜面樹脂パターン17の硬化後、ステップ107に進み、図1(c)に示すように、ディスペンサ装置23を駆動して配線下地用の描画ファイルで指定された全ての位置に、傾斜面樹脂パターン17とは異なる性質の樹脂又は表面処理材料を吐出して、配線下地パターン20を傾斜面樹脂パターン17上に形成する。尚、傾斜面樹脂パターン17と配線下地パターン20とを別々のディスペンサ装置で形成しても良い。
After the inclined
この後、ステップ108に進み、図1(d)に示すように、インクジェット装置24を駆動して配線用の描画ファイルで指定された全ての位置に導電性インク材料を吐出して配線パターン19を配線下地パターン20上に形成する。これにより、LEDチップ15の各電極18と各リード13との間を配線パターン19で結線する。
Thereafter, the process proceeds to step 108, and as shown in FIG. 1 (d), the
以上説明した本実施例では、多数のLEDチップ15がダイボンドされたリードフレーム11全体をカメラ22の視野内に収めて撮像してその撮像画像からリードフレーム11のリード13と各LEDチップ15の位置を認識し、その位置認識結果に基づいて、各LEDチップ15の側面上端エッジからリード13に向けて下り傾斜する傾斜面樹脂パターン17を形成する位置を指定する傾斜面樹脂用の描画ファイルと、配線下地パターン20を傾斜面樹脂パターン17上に形成する位置を指定する配線下地用の描画ファイルと、各LEDチップ15上面の電極18とリード13とを接続する配線パターン19を形成する位置を指定する配線用の描画ファイルを作成した後、傾斜面樹脂用の描画ファイルで指定された全ての位置にディスペンサ装置23で流動性の樹脂材料を吐出して樹脂パターン17を形成した後、配線下地用の描画ファイルで指定された全ての位置に、ディスペンサ装置23で傾斜面樹脂パターン17とは異なる性質の樹脂又は表面処理材料を吐出して、配線下地パターン20を傾斜面樹脂パターン17上に形成し、その後、配線用の描画ファイルで指定された全ての位置にインクジェット装置24で導電性インク材料を吐出して配線パターン19を配線下地パターン20上に形成するようにした。これにより、1回のカメラ22の撮像動作で、リードフレーム11上の全てのLEDチップ15に対して傾斜面樹脂パターン17と配線下地パターン20と配線パターン19を形成する位置を精度良く指定することができ、傾斜面樹脂パターン17と配線下地パターン20と配線パターン19を液滴吐出法により位置精度良く且つ能率良く形成することができる。
In the present embodiment described above, the
尚、上記実施例では、多数のLEDチップ15がダイボンドされたリードフレーム11全体をカメラ22の視野内に収めて撮像するようにしたが、リードフレーム11の撮像エリアを2分割以上に分割して撮像してそれらの分割画像を合成してリードフレーム11全体の合成画像を作成するようにしても良い。この場合でも、1つの分割画像に2個以上のLEDチップ15が含まれるようにすれば、リードフレーム11にダイボンドされたLEDチップ15の総数よりも少ない撮像回数で、リードフレーム11にダイボンドされた多数のLEDチップ15の全ての位置を認識して各LEDチップ15毎に成膜パターンを形成する位置を指定することができ、リードフレーム11にダイボンドされた各LEDチップ15毎に成膜パターンを液滴吐出法により位置精度良く且つ能率良く形成することができる。
In the above embodiment, the
また、上記実施例では、傾斜面樹脂パターン17と配線下地パターン20の両方をディスペンサ装置で形成するようにしたが、傾斜面樹脂パターン17と配線下地パターン20の両方又はいずれか一方をインクジェット装置で形成するようにしても良い。
また、本発明を適用可能な回路素子は、LEDチップ15に限定されず、他の半導体素子であっても良く、その他、抵抗体、コンデンサ等であっても良い。
Moreover, in the said Example, although both the inclined
The circuit element to which the present invention can be applied is not limited to the
また、上記実施例では、傾斜面樹脂パターン17、配線下地パターン20、配線パターン19の3種類の成膜パターンを形成する例について説明したが、本発明は、これら3種類の成膜パターンのうちのいずれか1つ又は2つの成膜パターンを形成する場合にも適用でき、その他、抵抗体パターン、誘電体パターン等の他の成膜パターンを形成する場合にも適用でき、勿論、3種類以上の成膜パターンを形成する場合にも適用できる。
In the above embodiment, an example in which three types of film forming patterns, that is, the inclined
また、上記実施例では、複数のLEDチップ15(回路素子)をリードフレーム11に搭載する例について説明したが、複数のLEDチップ15(回路素子)を搭載する搭載部材は、ユーザー側で分割して使用する多数個取り基板であっても良く、その他、分割されない1枚の回路基板に複数の回路素子を搭載する場合にも本発明を適用できる。
In the above embodiment, the example in which the plurality of LED chips 15 (circuit elements) are mounted on the
また、搭載部材に搭載する複数の回路素子は、同一品種のものに限定されず、複数種類の回路素子を搭載部材に搭載する場合にも本発明を適用できる。 The plurality of circuit elements mounted on the mounting member are not limited to those of the same type, and the present invention can also be applied to a case where a plurality of types of circuit elements are mounted on the mounting member.
11…リードフレーム、12…ダイパッド、13…リード、14…絶縁性の基材、15…LEDチップ(回路素子)、16…接着剤、17…傾斜面樹脂パターン(成膜パターン)、18…電極、19…配線パターン(成膜パターン)、20…配線下地パターン(成膜パターン)、21…制御装置(画像認識手段,成膜パターン形成位置指定手段)、22…カメラ、23…ディスペンサ装置(液滴吐出手段)、24…インクジェット装置(液滴吐出手段)
DESCRIPTION OF
Claims (5)
前記搭載部材とこれに搭載した前記複数の回路素子とを一括してカメラの視野内に収めて撮像し又はその撮像エリアを2分割以上に分割して撮像し、その撮像画像から前記搭載部材と各回路素子との位置関係を認識する画像認識工程と、
前記画像認識工程で認識した前記搭載部材と各回路素子との位置関係を基準にして前記各回路素子毎に前記成膜パターンを形成する位置を指定する成膜パターン形成位置指定工程と、
前記成膜パターン形成位置指定工程で前記各回路素子毎に指定された位置にそれぞれ液滴吐出法により前記成膜パターンを形成する液滴吐出工程と
を含むことを特徴とする成膜パターン形成方法。 In a film forming pattern forming method for forming a film forming pattern by a droplet discharge method across a plurality of circuit elements mounted on a mounting member and the mounting member,
The mounting member and the plurality of circuit elements mounted on the mounting member are collectively captured within the field of view of the camera or imaged by dividing the imaging area into two or more parts. An image recognition process for recognizing a positional relationship with each circuit element;
A film forming pattern forming position specifying step for specifying a position for forming the film forming pattern for each circuit element based on the positional relationship between the mounting member and each circuit element recognized in the image recognition step;
A droplet discharge step of forming the film formation pattern by a droplet discharge method at a position specified for each circuit element in the film formation pattern formation position specifying step. .
前記液滴吐出工程では、種類の異なる成膜材料毎に前記描画ファイルを用いて前記成膜パターンを形成することを特徴とする請求項1に記載の成膜パターン形成方法。 In the film formation pattern formation position designation step, a drawing file for designating positions for forming a plurality of types of film formation patterns with different film formation materials is created for each film formation material,
The film formation pattern forming method according to claim 1, wherein the film formation pattern is formed using the drawing file for each of different types of film formation materials in the droplet discharge step.
前記液滴吐出工程では、前記傾斜面樹脂用の描画ファイルを用いて前記傾斜面樹脂の成膜パターンを形成した後、前記配線下地用の描画ファイルを用いて前記配線下地用の成膜パターンを前記傾斜面樹脂の成膜パターン上に形成し、その後、前記配線用の描画ファイルを用いて前記配線の成膜パターンを前記配線下地用の成膜パターン上に形成することを特徴とする請求項2に記載の成膜パターン形成方法。 In the film formation pattern formation position designation step, an inclined surface resin drawing file for designating a position for forming a film formation pattern of an inclined surface resin that is inclined downward from the upper side surface of the circuit component toward the surface of the mounting member; A wiring base drawing file for specifying a position at which a wiring base film forming pattern made of a resin or surface treatment material having a different property from the inclined surface resin is formed on the inclined surface resin film forming pattern; A drawing file for wiring that designates a position for forming the film forming pattern on the film forming pattern for the wiring base, and
In the liquid droplet ejection step, after forming the inclined surface resin film formation pattern using the inclined surface resin drawing file, the wiring base film forming pattern is formed using the wiring base drawing file. The film formation pattern of the inclined surface resin is formed on the film formation pattern of the inclined surface resin, and then the film formation pattern of the wiring is formed on the film formation pattern for the wiring base using the drawing file for wiring. 3. The film forming pattern forming method according to 2.
前記搭載部材とこれに搭載した前記複数の回路素子とを一括してカメラの視野内に収めて撮像し又はその撮像エリアを2分割以上に分割して撮像し、その撮像画像から前記搭載部材と各回路素子との位置関係を認識する画像認識手段と、
前記画像認識手段で認識した前記搭載部材と各回路素子との位置関係を基準にして前記各回路素子毎に前記成膜パターンを形成する位置を指定する成膜パターン形成位置指定手段と、
前記成膜パターン形成位置指定手段で前記各回路素子毎に指定された位置にそれぞれ成膜材料を吐出して前記成膜パターンを形成する液滴吐出手段と
を含むことを特徴とする成膜パターン形成装置。 In a film forming pattern forming apparatus for forming a film forming pattern across a plurality of circuit elements mounted on the mounting member and the mounting member,
The mounting member and the plurality of circuit elements mounted on the mounting member are collectively captured within the field of view of the camera or imaged by dividing the imaging area into two or more parts. Image recognition means for recognizing the positional relationship with each circuit element;
A film forming pattern forming position specifying means for specifying a position for forming the film forming pattern for each circuit element based on the positional relationship between the mounting member and each circuit element recognized by the image recognition means;
A film forming pattern comprising: a liquid droplet discharging unit configured to discharge the film forming material to a position specified for each circuit element by the film forming pattern forming position specifying unit to form the film forming pattern. Forming equipment.
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| JP2011001239A JP2012142525A (en) | 2011-01-06 | 2011-01-06 | Film formation pattern forming method and film formation pattern forming device |
| PCT/JP2011/078378 WO2012093548A1 (en) | 2011-01-06 | 2011-12-08 | Film making pattern forming method and film making pattern forming device |
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