JP2012009414A5 - 電極 - Google Patents
電極 Download PDFInfo
- Publication number
- JP2012009414A5 JP2012009414A5 JP2011088822A JP2011088822A JP2012009414A5 JP 2012009414 A5 JP2012009414 A5 JP 2012009414A5 JP 2011088822 A JP2011088822 A JP 2011088822A JP 2011088822 A JP2011088822 A JP 2011088822A JP 2012009414 A5 JP2012009414 A5 JP 2012009414A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- crystalline silicon
- current collector
- mixed layer
- mixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910021419 crystalline silicon Inorganic materials 0.000 claims 6
- 229910044991 metal oxide Inorganic materials 0.000 claims 3
- 150000004706 metal oxides Chemical class 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 1
Claims (3)
- 集電体と、
前記集電体上の混合層と、
前記混合層上の結晶性シリコン層と、を有し、
前記混合層は、金属元素及びシリコンを有し、
前記結晶性シリコン層は、ウィスカー状の結晶性シリコン領域を有することを特徴とする電極。 - 集電体と、
前記集電体上の混合層と、
前記混合層上の金属酸化物層と、
前記金属酸化物層上の結晶性シリコン層と、を有し、
前記混合層は、金属元素及びシリコンを有し、
前記結晶性シリコン層は、ウィスカー状の結晶性シリコン領域を有することを特徴とする電極。 - 請求項2において、
前記金属酸化物層は、酸化物半導体を有することを特徴とする電極。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011088822A JP5706747B2 (ja) | 2010-04-28 | 2011-04-13 | 蓄電装置の負極 |
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010104587 | 2010-04-28 | ||
| JP2010104587 | 2010-04-28 | ||
| JP2010122473 | 2010-05-28 | ||
| JP2010122610 | 2010-05-28 | ||
| JP2010122473 | 2010-05-28 | ||
| JP2010122610 | 2010-05-28 | ||
| JP2010122609 | 2010-05-28 | ||
| JP2010122609 | 2010-05-28 | ||
| JP2011088822A JP5706747B2 (ja) | 2010-04-28 | 2011-04-13 | 蓄電装置の負極 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012009414A JP2012009414A (ja) | 2012-01-12 |
| JP2012009414A5 true JP2012009414A5 (ja) | 2014-05-29 |
| JP5706747B2 JP5706747B2 (ja) | 2015-04-22 |
Family
ID=44857589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011088822A Expired - Fee Related JP5706747B2 (ja) | 2010-04-28 | 2011-04-13 | 蓄電装置の負極 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US9685275B2 (ja) |
| JP (1) | JP5706747B2 (ja) |
| TW (1) | TWI527297B (ja) |
| WO (1) | WO2011136028A1 (ja) |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8852294B2 (en) | 2010-05-28 | 2014-10-07 | Semiconductor Energy Laboratory Co., Ltd. | Power storage device and method for manufacturing the same |
| KR101838627B1 (ko) | 2010-05-28 | 2018-03-14 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 축전 장치 및 그 제작 방법 |
| US20110294005A1 (en) * | 2010-05-28 | 2011-12-01 | Semiconductor Energy Laboratory Co., Ltd. | Power storage device, electrode, and electric device |
| DE112011101878T5 (de) * | 2010-06-01 | 2013-03-21 | Semiconductor Energy Laboratory Co., Ltd. | Energiespeichervorrichtung und Herstellungsverfahren hierfür |
| CN102906907B (zh) | 2010-06-02 | 2015-09-02 | 株式会社半导体能源研究所 | 蓄电装置及其制造方法 |
| WO2011155397A1 (en) * | 2010-06-11 | 2011-12-15 | Semiconductor Energy Laboratory Co., Ltd. | Power storage device |
| WO2011158722A1 (en) | 2010-06-18 | 2011-12-22 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and manufacturing method thereof |
| US9076909B2 (en) | 2010-06-18 | 2015-07-07 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method for manufacturing the same |
| WO2012002136A1 (en) | 2010-06-30 | 2012-01-05 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of power storage device |
| US8846530B2 (en) | 2010-06-30 | 2014-09-30 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming semiconductor region and method for manufacturing power storage device |
| JP5841752B2 (ja) | 2010-07-02 | 2016-01-13 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| US9362556B2 (en) | 2010-12-07 | 2016-06-07 | Semiconductor Energy Laboratory Co., Ltd. | Power storage device |
| US9543577B2 (en) * | 2010-12-16 | 2017-01-10 | Semiconductor Energy Laboratory Co., Ltd. | Active material, electrode including the active material and manufacturing method thereof, and secondary battery |
| TWI643814B (zh) | 2011-06-03 | 2018-12-11 | 半導體能源研究所股份有限公司 | 單層和多層石墨烯,彼之製法,含彼之物件,以及含彼之電器裝置 |
| US11296322B2 (en) | 2011-06-03 | 2022-04-05 | Semiconductor Energy Laboratory Co., Ltd. | Single-layer and multilayer graphene, method of manufacturing the same, object including the same, and electric device including the same |
| JP6035054B2 (ja) | 2011-06-24 | 2016-11-30 | 株式会社半導体エネルギー研究所 | 蓄電装置の電極の作製方法 |
| KR20130006301A (ko) | 2011-07-08 | 2013-01-16 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 실리콘막의 제작 방법 및 축전 장치의 제작 방법 |
| US8814956B2 (en) | 2011-07-14 | 2014-08-26 | Semiconductor Energy Laboratory Co., Ltd. | Power storage device, electrode, and manufacturing method thereof |
| WO2013027561A1 (en) | 2011-08-19 | 2013-02-28 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing graphene-coated object, negative electrode of secondary battery including graphene-coated object, and secondary battery including the negative electrode |
| JP6025284B2 (ja) | 2011-08-19 | 2016-11-16 | 株式会社半導体エネルギー研究所 | 蓄電装置用の電極及び蓄電装置 |
| KR20130024769A (ko) | 2011-08-30 | 2013-03-08 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 축전 장치 |
| JP6035013B2 (ja) | 2011-08-30 | 2016-11-30 | 株式会社半導体エネルギー研究所 | 電極の作製方法 |
| JP6000017B2 (ja) | 2011-08-31 | 2016-09-28 | 株式会社半導体エネルギー研究所 | 蓄電装置及びその作製方法 |
| JP2013054878A (ja) | 2011-09-02 | 2013-03-21 | Semiconductor Energy Lab Co Ltd | 電極の作製方法および蓄電装置 |
| JP6034621B2 (ja) | 2011-09-02 | 2016-11-30 | 株式会社半導体エネルギー研究所 | 蓄電装置の電極および蓄電装置 |
| US9401247B2 (en) | 2011-09-21 | 2016-07-26 | Semiconductor Energy Laboratory Co., Ltd. | Negative electrode for power storage device and power storage device |
| JP6218349B2 (ja) | 2011-09-30 | 2017-10-25 | 株式会社半導体エネルギー研究所 | 蓄電装置 |
| JP6050106B2 (ja) | 2011-12-21 | 2016-12-21 | 株式会社半導体エネルギー研究所 | 非水二次電池用シリコン負極の製造方法 |
| US9384904B2 (en) | 2012-04-06 | 2016-07-05 | Semiconductor Energy Laboratory Co., Ltd. | Negative electrode for power storage device, method for forming the same, and power storage device |
| JP6216154B2 (ja) | 2012-06-01 | 2017-10-18 | 株式会社半導体エネルギー研究所 | 蓄電装置用負極及び蓄電装置 |
| US10396365B2 (en) | 2012-07-18 | 2019-08-27 | Printed Energy Pty Ltd | Diatomaceous energy storage devices |
| DE112013005307T5 (de) | 2012-11-07 | 2015-07-23 | Semiconductor Energy Laboratory Co., Ltd. | Elektrode für Energiespeichervorrichtung, Energiespeichervorrichtung und Herstellungsverfahren der Elektrode für Energiespeichervorrichtung |
| US10319535B2 (en) | 2013-09-27 | 2019-06-11 | Intel Corporation | High voltage high power energy storage devices, systems, and associated methods |
| US10147543B1 (en) * | 2015-01-07 | 2018-12-04 | The United States Of America, As Represented By The Secretary Of The Navy | Super dielectric capacitor using scaffold dielectric and electrically and ionically conducting electrodes |
| DE102016208250A1 (de) | 2015-05-19 | 2016-11-24 | Semiconductor Energy Laboratory Co., Ltd. | Elektrode, Energiespeichervorrichtung und elektronische Vorrichtung |
| US10784516B2 (en) | 2015-06-25 | 2020-09-22 | Semiconductor Energy Laboratory Co., Ltd. | Conductor, power storage device, electronic device, and method for forming conductor |
| KR20200101473A (ko) * | 2018-01-16 | 2020-08-27 | 프린티드 에너지 피티와이 리미티드 | 박막-기반 에너지 저장 장치 |
| ES3047383T3 (en) * | 2018-02-26 | 2025-12-03 | Graphenix Dev Inc | Anodes for lithium-based energy storage devices |
| CN109888266A (zh) * | 2019-02-28 | 2019-06-14 | 东莞塔菲尔新能源科技有限公司 | 一种硅基负极片及其制备方法和锂离子电池 |
| US11024842B2 (en) * | 2019-06-27 | 2021-06-01 | Graphenix Development, Inc. | Patterned anodes for lithium-based energy storage devices |
| JP7713442B2 (ja) | 2019-08-13 | 2025-07-25 | グラフェニクス ディベロップメント,インコーポレイテッド | リチウムベースのエネルギー貯蔵装置用のアノード、その製造方法およびリチウムイオン電池の製造方法 |
| WO2021034916A1 (en) | 2019-08-20 | 2021-02-25 | Graphenix Development, Inc. | Structured anodes for lithium-based energy storage devices |
| US11489154B2 (en) | 2019-08-20 | 2022-11-01 | Graphenix Development, Inc. | Multilayer anodes for lithium-based energy storage devices |
| US11495782B2 (en) | 2019-08-26 | 2022-11-08 | Graphenix Development, Inc. | Asymmetric anodes for lithium-based energy storage devices |
| CA3172496A1 (en) | 2020-04-08 | 2021-10-14 | Graphenix Development, Inc. | Anodes for lithium-based energy storage devices |
| US12255315B2 (en) | 2021-01-14 | 2025-03-18 | Graphenix Development, Inc. | Anode structures having a multiple supplemental layers |
| US12388067B2 (en) | 2021-04-26 | 2025-08-12 | Graphenix Development, Inc. | Anodes for lithium-based energy storage devices |
Family Cites Families (58)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1198900A (en) | 1967-10-25 | 1970-07-15 | Hitachi Ltd | Planar Transistor and Method of Making the Same |
| US4155781A (en) | 1976-09-03 | 1979-05-22 | Siemens Aktiengesellschaft | Method of manufacturing solar cells, utilizing single-crystal whisker growth |
| US5338625A (en) * | 1992-07-29 | 1994-08-16 | Martin Marietta Energy Systems, Inc. | Thin film battery and method for making same |
| RU2099808C1 (ru) | 1996-04-01 | 1997-12-20 | Евгений Инвиевич Гиваргизов | Способ выращивания ориентированных систем нитевидных кристаллов и устройство для его осуществления (варианты) |
| JP2002083594A (ja) | 1999-10-22 | 2002-03-22 | Sanyo Electric Co Ltd | リチウム電池用電極並びにこれを用いたリチウム電池及びリチウム二次電池 |
| WO2001031723A1 (en) * | 1999-10-22 | 2001-05-03 | Sanyo Electric Co., Ltd. | Electrode for lithium secondary cell and lithium secondary cell |
| JP3733066B2 (ja) | 1999-10-22 | 2006-01-11 | 三洋電機株式会社 | リチウム二次電池用電極及びリチウム二次電池 |
| EP1246278B1 (en) | 1999-10-22 | 2011-05-18 | Sanyo Electric Co., Ltd. | Electrode for lithium cell and lithium secondary cell |
| WO2001029914A1 (en) | 1999-10-22 | 2001-04-26 | Sanyo Electric Co., Ltd. | Method for producing electrode for lithium secondary cell |
| US6887511B1 (en) | 1999-10-22 | 2005-05-03 | Sanyo Electric Co., Ltd. | Method for preparing electrode material for lithium battery |
| CA2387910C (en) | 1999-10-22 | 2011-06-28 | Sanyo Electric Co., Ltd. | Electrode for lithium battery and rechargeable lithium battery |
| JP2001210315A (ja) | 2000-01-25 | 2001-08-03 | Sanyo Electric Co Ltd | リチウム二次電池用電極及びこれを用いたリチウム二次電池 |
| JP2002164556A (ja) | 2000-11-27 | 2002-06-07 | Kyocera Corp | 裏面電極型太陽電池素子 |
| JP4082922B2 (ja) * | 2001-04-13 | 2008-04-30 | 三洋電機株式会社 | リチウム二次電池用電極及びその製造方法 |
| US6844113B2 (en) | 2001-04-13 | 2005-01-18 | Sanyo Electric Co., Ltd. | Electrode for lithium secondary battery and method for producing the same |
| JP2003246700A (ja) | 2002-02-22 | 2003-09-02 | Japan Science & Technology Corp | シリコンナノニードルの製法 |
| JP3984839B2 (ja) | 2002-02-26 | 2007-10-03 | 株式会社日立グローバルストレージテクノロジーズ | 磁気抵抗効果ヘッド |
| JP2003258285A (ja) | 2002-02-27 | 2003-09-12 | Sharp Corp | 表面凹凸構造の作製方法及び太陽電池 |
| JP4140765B2 (ja) | 2002-09-19 | 2008-08-27 | コバレントマテリアル株式会社 | 針状シリコン結晶およびその製造方法 |
| US7015496B2 (en) | 2002-12-27 | 2006-03-21 | Semiconductor Energy Laboratory Co., Ltd. | Field emission device and manufacturing method thereof |
| JP2004281317A (ja) | 2003-03-18 | 2004-10-07 | Matsushita Electric Ind Co Ltd | 非水電解質二次電池用電極材料とその製造方法、ならびにそれを用いた非水電解質二次電池 |
| JP2005050669A (ja) | 2003-07-28 | 2005-02-24 | Tdk Corp | 電極、及び、それを用いた電気化学素子 |
| TWI249868B (en) | 2003-09-09 | 2006-02-21 | Sony Corp | Anode and battery |
| KR100611940B1 (ko) | 2003-11-21 | 2006-08-11 | 주식회사 엘지화학 | 안전성이 향상된 전기화학 전지 |
| JP4442235B2 (ja) | 2004-01-28 | 2010-03-31 | ソニー株式会社 | 二次電池用負極、二次電池およびそれらの製造方法 |
| US20070292339A1 (en) | 2004-03-23 | 2007-12-20 | Kanazawa R And D Ltd. | Iron Oxide Whisker of High Aspect Ratio, Titanium Oxide Whisker of High Aspect Ratio, Structure Containing These and Process for Producing Them |
| KR100800968B1 (ko) * | 2004-09-11 | 2008-02-05 | 주식회사 엘지화학 | 리튬 이차전지용 실리콘 박막 음극의 성능 개선 방법 |
| JP2006080450A (ja) | 2004-09-13 | 2006-03-23 | Sharp Corp | 太陽電池の製造方法 |
| US7615314B2 (en) * | 2004-12-10 | 2009-11-10 | Canon Kabushiki Kaisha | Electrode structure for lithium secondary battery and secondary battery having such electrode structure |
| US9614214B2 (en) * | 2004-12-16 | 2017-04-04 | Lg Chem, Ltd. | Method for improvement of performance of si thin film anode for lithium rechargeable battery |
| JP4670430B2 (ja) | 2005-03-30 | 2011-04-13 | Tdk株式会社 | 電気化学デバイス |
| US20090050204A1 (en) | 2007-08-03 | 2009-02-26 | Illuminex Corporation. | Photovoltaic device using nanostructured material |
| JP5043338B2 (ja) * | 2006-01-19 | 2012-10-10 | パナソニック株式会社 | リチウム二次電池 |
| KR101049683B1 (ko) * | 2006-02-14 | 2011-07-14 | 파나소닉 주식회사 | 비수전해질 이차전지용 전극과 그 제조 방법 및 비수전해질 이차전지용 전극을 갖춘 비수 전해질 이차전지 |
| KR101530379B1 (ko) | 2006-03-29 | 2015-06-22 | 삼성전자주식회사 | 다공성 글래스 템플릿을 이용한 실리콘 나노 와이어의제조방법 및 이에 의해 형성된 실리콘 나노 와이어를포함하는 소자 |
| KR100723882B1 (ko) | 2006-06-15 | 2007-05-31 | 한국전자통신연구원 | 실리콘 나노점 박막을 이용한 실리콘 나노와이어 제조 방법 |
| US7964307B2 (en) * | 2006-07-24 | 2011-06-21 | Panasonic Corporation | Negative electrode for lithium ion secondary battery, method for producing the same, and lithium ion secondary battery |
| JP5272297B2 (ja) | 2006-10-17 | 2013-08-28 | 日産自動車株式会社 | 電池用電極 |
| CN101356669B (zh) * | 2006-10-19 | 2011-04-06 | 松下电器产业株式会社 | 非水电解质二次电池和非水电解质二次电池用负极的制造方法 |
| US8277967B2 (en) | 2007-01-26 | 2012-10-02 | Panasonic Corporation | Energy device, method for manufacturing the same, and apparatus including the same |
| EP2001073B1 (en) * | 2007-06-06 | 2012-02-22 | Nissan Motor Co., Ltd. | Secondary battery and method of producing the secondary battery |
| US7816031B2 (en) * | 2007-08-10 | 2010-10-19 | The Board Of Trustees Of The Leland Stanford Junior University | Nanowire battery methods and arrangements |
| JP5169156B2 (ja) | 2007-11-09 | 2013-03-27 | パナソニック株式会社 | 電気化学素子用電極 |
| KR100898293B1 (ko) * | 2007-11-27 | 2009-05-18 | 삼성에스디아이 주식회사 | 리튬 이차 전지용 음극 활물질 및 이의 제조 방법 |
| JP2009134917A (ja) | 2007-11-29 | 2009-06-18 | Panasonic Corp | 非水系二次電池用電極板およびこれを用いた非水系二次電池 |
| US20090317726A1 (en) | 2008-04-08 | 2009-12-24 | Sony Corporation | Anode and secondary battery |
| JP5298609B2 (ja) | 2008-04-08 | 2013-09-25 | ソニー株式会社 | 二次電池用負極および二次電池 |
| JP4427629B2 (ja) | 2008-04-11 | 2010-03-10 | パナソニック株式会社 | エネルギー蓄積デバイス、その製造方法及びそれを搭載した装置 |
| US8927156B2 (en) | 2009-02-19 | 2015-01-06 | Semiconductor Energy Laboratory Co., Ltd. | Power storage device |
| JP2010262752A (ja) * | 2009-04-30 | 2010-11-18 | Furukawa Electric Co Ltd:The | リチウムイオン二次電池用の負極、それを用いたリチウムイオン二次電池、リチウムイオン二次電池用の負極の製造方法 |
| US9061902B2 (en) | 2009-12-18 | 2015-06-23 | The Board Of Trustees Of The Leland Stanford Junior University | Crystalline-amorphous nanowires for battery electrodes |
| US20110294005A1 (en) | 2010-05-28 | 2011-12-01 | Semiconductor Energy Laboratory Co., Ltd. | Power storage device, electrode, and electric device |
| DE112011101878T5 (de) | 2010-06-01 | 2013-03-21 | Semiconductor Energy Laboratory Co., Ltd. | Energiespeichervorrichtung und Herstellungsverfahren hierfür |
| CN102906907B (zh) | 2010-06-02 | 2015-09-02 | 株式会社半导体能源研究所 | 蓄电装置及其制造方法 |
| WO2011155397A1 (en) | 2010-06-11 | 2011-12-15 | Semiconductor Energy Laboratory Co., Ltd. | Power storage device |
| US20120003383A1 (en) | 2010-06-30 | 2012-01-05 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of energy storage device |
| US8846530B2 (en) | 2010-06-30 | 2014-09-30 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming semiconductor region and method for manufacturing power storage device |
| JP6035054B2 (ja) | 2011-06-24 | 2016-11-30 | 株式会社半導体エネルギー研究所 | 蓄電装置の電極の作製方法 |
-
2011
- 2011-04-07 WO PCT/JP2011/059219 patent/WO2011136028A1/en not_active Ceased
- 2011-04-13 JP JP2011088822A patent/JP5706747B2/ja not_active Expired - Fee Related
- 2011-04-18 US US13/088,592 patent/US9685275B2/en not_active Expired - Fee Related
- 2011-04-19 TW TW100113546A patent/TWI527297B/zh not_active IP Right Cessation
-
2017
- 2017-06-16 US US15/625,476 patent/US10236502B2/en not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2012009414A5 (ja) | 電極 | |
| JP2012015100A5 (ja) | 蓄電装置 | |
| JP2012015101A5 (ja) | 蓄電装置 | |
| JP2012235098A5 (ja) | 半導体装置 | |
| JP2010212673A5 (ja) | 半導体装置 | |
| JP2014131022A5 (ja) | ||
| JP2010212672A5 (ja) | 半導体装置 | |
| JP2013149982A5 (ja) | ||
| JP2010226097A5 (ja) | 半導体装置 | |
| JP2012147013A5 (ja) | 表示装置 | |
| JP2010087494A5 (ja) | 半導体装置 | |
| JP2013190802A5 (ja) | ||
| JP2011129898A5 (ja) | 半導体装置 | |
| JP2014082512A5 (ja) | 半導体装置の作製方法 | |
| JP2013077836A5 (ja) | ||
| JP2012235107A5 (ja) | 半導体装置 | |
| JP2014183319A5 (ja) | 磁気接合 | |
| JP2014027263A5 (ja) | 半導体装置 | |
| JP2016528044A5 (ja) | ||
| JP2011198756A5 (ja) | 蓄電装置 | |
| JP2011527163A5 (ja) | ||
| JP2011086927A5 (ja) | 半導体装置 | |
| JP2014143409A5 (ja) | 金属酸化物膜 | |
| JP2011192976A5 (ja) | ||
| JP2011233880A5 (ja) | 半導体装置 |