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JP2012054383A - Semiconductor light-emitting device and manufacturing method of the same - Google Patents

Semiconductor light-emitting device and manufacturing method of the same Download PDF

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JP2012054383A
JP2012054383A JP2010195439A JP2010195439A JP2012054383A JP 2012054383 A JP2012054383 A JP 2012054383A JP 2010195439 A JP2010195439 A JP 2010195439A JP 2010195439 A JP2010195439 A JP 2010195439A JP 2012054383 A JP2012054383 A JP 2012054383A
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light emitting
semiconductor light
dam material
reflective
emitting element
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Kazuaki Tanmachi
和昭 反町
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Citizen Holdings Co Ltd
Citizen Electronics Co Ltd
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Citizen Electronics Co Ltd
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Abstract

【課題】ダム材を備えたLED装置において、ダム材により取り囲まれた領域に白色レジストやシリコーン樹脂等の反射部材を配置しようとすると位置精度の高いフォトリソグラフィ法や印刷法を適用しなければならなくなる。
【解決手段】ダム材11が取り囲む領域の底部に反射性シリコーン樹脂21を流動塗布する。ことのき反射性シリコーン樹脂21の上面はLED22の上面より低い。反射性シリコーン樹脂21の厚みは略30〜50μmであると良い。
【選択図】図2
In an LED device provided with a dam material, a photolithography method or a printing method with high positional accuracy must be applied when a reflective member such as a white resist or silicone resin is arranged in a region surrounded by the dam material. Disappear.
A reflective silicone resin is fluidly applied to the bottom of an area surrounded by a dam material. The upper surface of the reflective silicone resin 21 is lower than the upper surface of the LED 22. The thickness of the reflective silicone resin 21 is preferably about 30 to 50 μm.
[Selection] Figure 2

Description

回路基板上に半導体発光素子を実装した半導体発光装置及びその製造方法に関し、詳しくは回路基板上において半導体発光素子をダム材が取り囲み、そのダム材が取り囲んだ領域に樹脂を充填し、その樹脂で半導体発光素子を封止する半導体発光装置及びその製造方法に関する。   BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor light emitting device having a semiconductor light emitting element mounted on a circuit board and a manufacturing method thereof. Specifically, the semiconductor light emitting element is surrounded on the circuit board by a dam material, The present invention relates to a semiconductor light emitting device for sealing a semiconductor light emitting element and a method for manufacturing the same.

半導体発光素子(以後とくに断らない限りLED素子と呼ぶ)を回路基板に実装しパッケージ化した半導体発光装置(以後とくに断らない限りLED装置と呼ぶ)のなかで、発光効率を改善させるため回路基板表面に白色の反射部材を備えたLED装置が知られている。   In a semiconductor light emitting device (hereinafter referred to as an LED device unless otherwise specified) in which a semiconductor light emitting element (hereinafter referred to as an LED element) is mounted on a circuit board and packaged, the surface of the circuit board is improved in order to improve luminous efficiency. An LED device having a white reflecting member is known.

例えば特許文献1の図1には白色レジスト層6(反射部材)を備えた光源装置10(LED装置)が示されている。光源装置10は、基板1(回路基板)上に一対の電極2,3が形成され、これらの電極2,3と接続された発光ダイオードのチップ4(LED素子)が透明樹脂7に封止されている。発光ダイオードのチップ4は、一方の電極2上に配置されて、この電極2と電気的に接続している。また、チップ4と他方の電極3との間は、ワイヤ5によって電気的に接続している。透明樹脂7は上面が球面となったドーム形状となっている。この基板1上に白色レジスト層6(反射部材)が形成されている。白色レジスト層6は、発光ダイオードのチップ4や、ワイヤ5が接続する電極3の端子付近が開口部となっており、開口部以外の部分では電極2,3を覆っている。開口部は矩形状となっており、開口部の壁面6Aは、チップ4や電極3の端子に近い箇所にある。   For example, FIG. 1 of Patent Document 1 shows a light source device 10 (LED device) including a white resist layer 6 (reflecting member). In the light source device 10, a pair of electrodes 2 and 3 are formed on a substrate 1 (circuit board), and a light emitting diode chip 4 (LED element) connected to the electrodes 2 and 3 is sealed with a transparent resin 7. ing. The light emitting diode chip 4 is disposed on one electrode 2 and is electrically connected to the electrode 2. The chip 4 and the other electrode 3 are electrically connected by a wire 5. The transparent resin 7 has a dome shape whose upper surface is a spherical surface. A white resist layer 6 (reflection member) is formed on the substrate 1. The white resist layer 6 has an opening near the terminal of the electrode 3 to which the chip 4 of the light emitting diode 4 and the wire 5 are connected, and covers the electrodes 2 and 3 in the portion other than the opening. The opening has a rectangular shape, and the wall surface 6 </ b> A of the opening is located near the chip 4 and the terminal of the electrode 3.

LED装置は回路基板や封止部材、反射構造などの構成部品の形状によりさまざまな形態をとる。これらのなかで、主に照明装置向けとして回路基板に複数のLED素子を配列させ、そのLED素子を取り囲むダム材を設け、そのダム材が取り囲んだ領域に樹脂を充填しLED素子を封止するLED装置が知られている。例えば特許文献2の図1に示された半導体発光装置100は配線基板1(回路基板)と堰22(ダム材)を備えた4つの発光部2とを有している。堰22は各発光部2に配置された複数の半導体発光素子21を取り囲み、半導体発光素子21は堰22に囲われた領域で封止される。   LED devices take various forms depending on the shape of components such as a circuit board, a sealing member, and a reflective structure. Among these, a plurality of LED elements are arranged on a circuit board mainly for a lighting device, a dam material surrounding the LED elements is provided, and a resin is filled in a region surrounded by the dam material to seal the LED elements. LED devices are known. For example, the semiconductor light emitting device 100 shown in FIG. 1 of Patent Document 2 includes a wiring board 1 (circuit board) and four light emitting units 2 each including a weir 22 (dam material). The weir 22 surrounds a plurality of semiconductor light emitting elements 21 arranged in each light emitting unit 2, and the semiconductor light emitting element 21 is sealed in a region surrounded by the weir 22.

特開2007−201171号公報 (図1)Japanese Patent Laying-Open No. 2007-201171 (FIG. 1) 特開2009−135485号公報 (図1)JP 2009-135485 A (FIG. 1)

特許文献2の図4ではダム材(堰22)の外側に反射部材(白色コーティング層)を備えている。しかしながら発光効率を大幅に改善するにはダム材の内側に反射部材を配置することが望ましい。この場合、先ず硬化前の白色の反射部材を回路基板上の所望の位置に配置する。反射部材が白色レジストである場合には、フォトリソグラフィ法で外郭や開口部を形成する。反射部材が白色塗料(インク)である場合には印刷法を適用する。次に反射部材を硬化しLED素子を実装する。最後にダム材の形成と封止樹脂の充填を行う。ところがLED素子の実装部のような反射部材の開口領域で発光効率を著しく低下させないためには、フォトリソグラフィ法や印刷法において高い位置精度が必要になるという課題が発生する。   In FIG. 4 of Patent Document 2, a reflection member (white coating layer) is provided outside the dam material (weir 22). However, in order to greatly improve the luminous efficiency, it is desirable to arrange a reflecting member inside the dam material. In this case, the white reflecting member before curing is first arranged at a desired position on the circuit board. When the reflecting member is a white resist, the outline and the opening are formed by photolithography. When the reflecting member is a white paint (ink), a printing method is applied. Next, the reflecting member is cured and the LED element is mounted. Finally, the dam material is formed and the sealing resin is filled. However, in order not to significantly reduce the light emission efficiency in the opening region of the reflecting member such as the LED element mounting portion, there arises a problem that high positional accuracy is required in the photolithography method and the printing method.

そこで本発明は、この課題に鑑みてなされたものであり、ダム材により取り囲まれた回路基板領域に反射部材を容易に配置できる半導体発光装置及びその製造方法を提供することを目的とする。   Accordingly, the present invention has been made in view of this problem, and an object of the present invention is to provide a semiconductor light emitting device and a method for manufacturing the same, in which a reflecting member can be easily arranged in a circuit board region surrounded by a dam material.

本発明の半導体発光装置は、半導体発光素子を実装した回路基板上に該半導体発光素子を取り囲むダム材を備え、該ダム材が取り囲んだ領域に封止樹脂を充填し、該封止樹脂で前記半導体発光素子を封止する半導体発光装置において、
前記ダム材が取り囲む領域の底部に流動塗布した反射部材を備え、
該反射部材の上面が前記半導体発光素子の上面より低いことを特徴とする。
The semiconductor light-emitting device of the present invention includes a dam material surrounding the semiconductor light-emitting element on a circuit board on which the semiconductor light-emitting element is mounted, filling a region surrounded by the dam material with the sealing resin, In a semiconductor light emitting device for sealing a semiconductor light emitting element,
A reflective member fluidly applied to the bottom of the region surrounded by the dam material;
The upper surface of the reflecting member is lower than the upper surface of the semiconductor light emitting element.

前記反射部材の厚みが略30〜50μmであることが好ましい。   It is preferable that the thickness of the reflecting member is approximately 30 to 50 μm.

前記反射部材が反射性粒子を混練したシリコーン樹脂であっても良い。   The reflective member may be a silicone resin in which reflective particles are kneaded.

前記反射部材が反射性粒子を混練したセラミックインクであっても良い。   The reflective member may be a ceramic ink in which reflective particles are kneaded.

本発明の半導体発光装置の製造方法は、半導体発光素子を実装した回路基板上に該半導体発光素子を取り囲むダム材を備え、該ダム材が取り囲んだ領域に封止樹脂を充填し、該封止樹脂で前記半導体発光素子を封止する半導体発光装置の製造方法において、
前記回路基板に前記半導体発光素子を実装し前記ダム材を形成する工程と、
前記ダム材の内側の領域であって前記半導体発光素子の占める領域を除いた領域に硬化前の前記反射部材を流し込み、該反射部材を硬化させる工程と、
前記ダム材の内側の領域に硬化前の前記封止樹脂を充填し、該封止樹脂を硬化させる工程とを備えることを特徴とする。
The method for manufacturing a semiconductor light emitting device of the present invention includes a dam material surrounding the semiconductor light emitting element on a circuit board on which the semiconductor light emitting element is mounted, and a sealing resin is filled in a region surrounded by the dam material. In a method for manufacturing a semiconductor light emitting device for sealing the semiconductor light emitting element with a resin,
Mounting the semiconductor light emitting element on the circuit board and forming the dam material;
Pouring the reflective member before curing into a region inside the dam material and excluding the region occupied by the semiconductor light emitting element, and curing the reflective member;
And filling the region inside the dam material with the sealing resin before curing, and curing the sealing resin.

本発明の半導体発光装置は、半導体発光素子を避けながらダム材で囲まれた領域の底部に隙間なく反射部材を敷き詰めている。この反射部材は、この領域に流動性のある反射部材を塗布し、その反射部材を硬化させることで容易に形成できる。以上のように本発明の半導体発光装置は、反射部材がダム材により取り囲まれた領域に容易に配置できる構造を備えている。   In the semiconductor light emitting device of the present invention, the reflection member is spread over the bottom of the region surrounded by the dam material while avoiding the semiconductor light emitting element. The reflecting member can be easily formed by applying a fluid reflecting member to the region and curing the reflecting member. As described above, the semiconductor light emitting device of the present invention has a structure in which the reflecting member can be easily arranged in the region surrounded by the dam material.

同様に本発明の半導体発光装置の製造方法は、ダム材と半導体発光素子の間に流動性のある反射部材を塗布し硬化させることで容易に反射部材を形成できる。   Similarly, in the method for manufacturing a semiconductor light emitting device of the present invention, the reflective member can be easily formed by applying and curing a reflective member having fluidity between the dam material and the semiconductor light emitting element.

本発明の実施形態におけるLED装置の斜視図。The perspective view of the LED device in the embodiment of the present invention. 図1から蛍光体樹脂(封止樹脂)を除いたLED装置の斜視図。FIG. 2 is a perspective view of the LED device excluding the phosphor resin (sealing resin) from FIG. 1. 図2から反射性シリコーン樹脂(反射部材)を除いたLED装置の斜視図。FIG. 3 is a perspective view of an LED device excluding a reflective silicone resin (reflective member) from FIG. 2. 図1に示すLED装置の製造方法の説明図。Explanatory drawing of the manufacturing method of the LED apparatus shown in FIG.

以下、添付図1〜4を参照しながら本発明の好適な実施形態について詳細に説明する。なお図面の説明において、同一または相当要素には同一の符号を付し、重複する説明は省略する。また説明のため部材の縮尺は適宜変更している。   Hereinafter, preferred embodiments of the present invention will be described in detail with reference to FIGS. In the description of the drawings, the same or equivalent elements will be denoted by the same reference numerals, and redundant description will be omitted. For the sake of explanation, the scale of the members is changed as appropriate.

図1により本実施形態のLED装置10の外観を説明する。図1はLED装置10を上面方向から眺めた斜視図である。回路基板13上には+電極14と−電極15、合わせマ
ーク16が形成され、枠状のダム材11が配置されている。ダム材11の内側には蛍光体樹脂12(封止樹脂)が充填されている。
The appearance of the LED device 10 of this embodiment will be described with reference to FIG. FIG. 1 is a perspective view of the LED device 10 as viewed from above. A + electrode 14, a − electrode 15, and an alignment mark 16 are formed on the circuit board 13, and a frame-shaped dam material 11 is disposed. The inside of the dam material 11 is filled with a phosphor resin 12 (sealing resin).

+及び−電極14,15並びに合わせマーク16は銅箔上にニッケルと金をメッキした金属パターンである。ダム材11はシリコーン樹脂中に二酸化チタン等の反射性粒子が分散したもので、蛍光樹脂12の流れ止めとともに側面方向(回路基板と平行な方向)に向かう光を正面方向(回路基板に垂直な方向)に向かわせる反射体としても機能している。蛍光体樹脂12はシリコーン樹脂中にYAG等の蛍光体が分散したもので、LED素子22(図2に示す)の青色発光を白色化する。   The + and-electrodes 14 and 15 and the alignment mark 16 are metal patterns obtained by plating nickel and gold on a copper foil. The dam material 11 is made of a silicone resin in which reflective particles such as titanium dioxide are dispersed, and the light directed to the side surface (direction parallel to the circuit board) together with the flow stop of the fluorescent resin 12 is directed to the front (perpendicular to the circuit board) It also functions as a reflector directed in the direction. The phosphor resin 12 is obtained by dispersing a phosphor such as YAG in a silicone resin and whitens the blue light emitted from the LED element 22 (shown in FIG. 2).

図2により反射部材の配置関係を説明する。図2は図1から蛍光体樹脂12を取り去ったLED装置10の斜視図である。ダム材11の内側には4個のLED素子22が配列している。反射性シリコーン樹脂21(反射部材)はダム材の内側領域のなかでLED素子22が占めていない領域に隙間なく存在する。反射性シリコーン樹脂21は、溶媒とともに反射性粒子として二酸化チタンをシリコーン樹脂に混練し、このシリコーン樹脂をダム材11とLED素子22の隙間に流動塗布し焼結したものである。   The arrangement relationship of the reflecting members will be described with reference to FIG. FIG. 2 is a perspective view of the LED device 10 with the phosphor resin 12 removed from FIG. Four LED elements 22 are arranged inside the dam material 11. The reflective silicone resin 21 (reflective member) is present in the region not occupied by the LED element 22 in the inner region of the dam material without any gap. The reflective silicone resin 21 is obtained by kneading titanium dioxide as a reflective particle together with a solvent into a silicone resin, fluidly applying the silicone resin to the gap between the dam material 11 and the LED element 22 and sintering.

ダム材11の内側の底部に流動塗布した反射性シリコーン樹脂21は、その上面をLED22の上面より低くし、LED22の側面から出射する光を妨害しないようにする。反射性シリコーン樹脂21は厚さを略30〜50μmにする。この厚さが30μmより小さいと反射性シリコーン樹脂21の反射特性が回路基板13の表面の影響をおおきく受ける。厚さが30μm以上になると実用的なレベルになり、50μmあれば略完全に回路基板13の影響を受けなくなる。   The reflective silicone resin 21 fluidly applied to the inner bottom of the dam material 11 has an upper surface lower than the upper surface of the LED 22 so as not to obstruct light emitted from the side surface of the LED 22. The reflective silicone resin 21 has a thickness of approximately 30 to 50 μm. When this thickness is smaller than 30 μm, the reflection characteristics of the reflective silicone resin 21 are greatly affected by the surface of the circuit board 13. When the thickness is 30 μm or more, it becomes a practical level, and when it is 50 μm, it is almost completely unaffected by the circuit board 13.

図3により反射性シリコーン樹脂21の下部を説明する。図3は図2から反射性シリコーン樹脂21を取り去ったLED装置10の斜視図である。反射性シリコーン樹脂21を取り去ると、ダム材11の内側に+電極14及び−電極15に加え接続用の電極31,32、33が現れる。LED素子22はフリップチップ実装され、これらの電極14,15,31,32,33とLED素子22のアノード及びカソードがバンプを介して接続している。これらのLED素子22は直列接続している。   The lower part of the reflective silicone resin 21 will be described with reference to FIG. FIG. 3 is a perspective view of the LED device 10 with the reflective silicone resin 21 removed from FIG. When the reflective silicone resin 21 is removed, the connection electrodes 31, 32, and 33 appear in addition to the + electrode 14 and the − electrode 15 inside the dam material 11. The LED element 22 is flip-chip mounted, and these electrodes 14, 15, 31, 32, 33 and the anode and cathode of the LED element 22 are connected via bumps. These LED elements 22 are connected in series.

電極14,15,31,32,33は反射性シリコーン樹脂21に覆われているので反射電極とする必要がない。つまり電極14,15,31,32,33の表面は、反射率は高いが硫化やマイグレーションへの対策が必要な銀層ではなく、着色し反射率もそれほど高くないが安定な金層を備えている。   Since the electrodes 14, 15, 31, 32, and 33 are covered with the reflective silicone resin 21, it is not necessary to use the reflective electrodes. That is, the surfaces of the electrodes 14, 15, 31, 32, and 33 are not silver layers that have high reflectivity but need countermeasures against sulfidation and migration, but are colored and have a stable gold layer that is not so high in reflectivity. Yes.

図4によりLED装置10の製造方法を説明する。図4はLED装置10の製造方法の説明図である。一般的にLED装置10を製造する場合、複数の回路基板13が連結した集合基板にLED装置10を形成し、最後に集合基板を切断して個片化することが多い。しかしながら本実施形態では、説明を簡単にするため単個の回路基板13で製造工程を説明している。また回路基板13に実装されているLED素子22も1個とした。   A method of manufacturing the LED device 10 will be described with reference to FIG. FIG. 4 is an explanatory diagram of a method for manufacturing the LED device 10. In general, when the LED device 10 is manufactured, the LED device 10 is often formed on a collective substrate in which a plurality of circuit boards 13 are connected, and finally the collective substrate is cut into individual pieces. However, in this embodiment, the manufacturing process is described using a single circuit board 13 for the sake of simplicity. The number of LED elements 22 mounted on the circuit board 13 is also one.

(a)は回路基板13上にLED素子22を実装してからダム材11を形成する工程を示している。先ず回路基板13にLED素子22をフリップチップ実装する。回路基板13の電極とLED素子22の電極は金錫共晶で接合する。この金錫共晶接合は、接合温度が約300℃であり、回路基板13をマザー基板にリフロー(温度は約260℃)するとき接合部が固体のまま維持されているという特徴がある。次にLED素子22を実装したらディスペンサで硬化前のダム材11を配置する。このダム材11は、約150℃で硬化させる。LED装置10の発光色を精度良くコントロールするためには蛍光体樹脂12の厚さも精度良くコントロールされる必要がある。蛍光体樹脂12は塗布量で規定されるた
め、厚さを精度よくするためにはダム材11の形状も高精度である必要がある。
(A) has shown the process of forming the dam material 11 after mounting the LED element 22 on the circuit board 13. First, the LED element 22 is flip-chip mounted on the circuit board 13. The electrode of the circuit board 13 and the electrode of the LED element 22 are joined by gold tin eutectic. This gold-tin eutectic bonding is characterized in that the bonding temperature is about 300 ° C., and when the circuit board 13 is reflowed to the mother substrate (the temperature is about 260 ° C.), the bonding portion remains solid. Next, when the LED element 22 is mounted, the dam material 11 before curing is arranged by a dispenser. The dam material 11 is cured at about 150 ° C. In order to control the emission color of the LED device 10 with high accuracy, the thickness of the phosphor resin 12 also needs to be controlled with high accuracy. Since the phosphor resin 12 is defined by the coating amount, the shape of the dam material 11 needs to be highly accurate in order to increase the thickness.

(b)は反射性シリコーン樹脂21を配置する工程である。ダム材11の内側の領域にLED素子22の上面を超えないように、ディスペンサでダム材11とLED素子22の間の領域に硬化前の反射性シリコーン樹脂21を塗布する。図示していないが、LED素子22同士の隙間にも反射性シリコーン樹脂21をいき亘らせる。焼結温度は約150℃であり、焼結後の反射性シリコーン樹脂21の厚さが50μm程度になると回路基板13表面が完全に見えなくなる。   (B) is a process of disposing the reflective silicone resin 21. The reflective silicone resin 21 before curing is applied to the region between the dam material 11 and the LED element 22 with a dispenser so that the upper surface of the LED element 22 is not exceeded in the region inside the dam material 11. Although not shown, the reflective silicone resin 21 is also passed through the gap between the LED elements 22. The sintering temperature is about 150 ° C., and when the thickness of the reflective silicone resin 21 after sintering becomes about 50 μm, the surface of the circuit board 13 becomes completely invisible.

(c)はダム材11の内側の領域においてLED素子10を蛍光体樹脂12で封止する工程である。ディスペンサにより正確な量の蛍光体樹脂12をダム材11の内側の領域に充填し、150℃で蛍光体樹脂12を硬化させる。   (C) is a step of sealing the LED element 10 with the phosphor resin 12 in the region inside the dam material 11. An accurate amount of the phosphor resin 12 is filled into a region inside the dam material 11 by a dispenser, and the phosphor resin 12 is cured at 150 ° C.

本発明はもともと備えられていたダム材を活用し、塗布により反射部材の正確な配置を簡単に実現したものである。本実施形態ではLED素子10を回路基板に実装した後、反射部材を流動塗布しているので、反射部材はLED素子接合時の高温の影響を受けることがないためシリコーンをはじめとするさまざまな樹脂が使えるようになる。また、反射部材は樹脂に限られず、オルガノポリシロキサン等のバインダー中に、溶媒とともに二酸化チタン粒子等の反射性粒子を混練した反射性セラミックインクでも良い。このセラミックインクはガラス質でありながら触媒により150℃程度の比較的低い温度で焼結できる。また無機質であるためLED素子22の発光で劣化せず長寿命化に寄与できるという特徴もある。   The present invention uses the dam material originally provided, and simply realizes accurate arrangement of the reflecting member by coating. In this embodiment, after the LED element 10 is mounted on the circuit board, the reflective member is fluidly applied. Therefore, the reflective member is not affected by the high temperature when the LED element is joined. Can be used. The reflective member is not limited to a resin, and may be a reflective ceramic ink obtained by kneading reflective particles such as titanium dioxide particles together with a solvent in a binder such as organopolysiloxane. Although this ceramic ink is glassy, it can be sintered at a relatively low temperature of about 150 ° C. with a catalyst. Moreover, since it is inorganic, there is also a feature that it can contribute to a long life without being deteriorated by light emission of the LED element 22.

本実施形態では封止樹脂として蛍光体樹脂12を使っていたが、封止樹脂は必ずしも蛍光体を含有しなくても良く、透明な封止樹脂や散乱材を混練した封止樹脂であっても良い。また蛍光体も封止樹脂中に混練させることに限定する必要はなく、樹脂の上部に蛍光体層を形成したりLED素子22の周辺部だけに蛍光体層を局在化させたりしても良い。   In the present embodiment, the phosphor resin 12 is used as the sealing resin. However, the sealing resin does not necessarily contain a phosphor, and is a sealing resin in which a transparent sealing resin or a scattering material is kneaded. Also good. Further, it is not necessary to limit the phosphor to kneading in the sealing resin. Even if the phosphor layer is formed on the top of the resin or the phosphor layer is localized only on the periphery of the LED element 22 good.

本実施形態ではLED素子22をフリップチップ実装していた。しかしながらLED素子の実装方法はフリップチップ実装に限られず、LED素子の半導体層をLED装置の上面側に向け、ワイヤで給電するフェイスアップ実装法であっても良い。なお本実施形態で採用したフリップチップ実装用のバンプには電解メッキ法等で形成したメッキバンプやスタッドバンプが使える。このときメッキバンプは厚さが20〜30μm程度であり、スタッドバンプは厚さが100μm前後なので、反射部材を流動塗布すると回路基板13とLED素子22の隙間に反射部材21が入り込む。LED素子22の下に反射部材を配置したくない場合は、LED素子22下の領域に予めアンダーフィル材を配置しておくと良い。   In this embodiment, the LED element 22 is flip-chip mounted. However, the LED element mounting method is not limited to flip-chip mounting, and may be a face-up mounting method in which a semiconductor layer of the LED element is directed to the upper surface side of the LED device and power is supplied by a wire. Note that the bumps for flip chip mounting employed in this embodiment can be plated bumps or stud bumps formed by electrolytic plating or the like. At this time, the plating bump has a thickness of about 20 to 30 μm, and the stud bump has a thickness of about 100 μm. Therefore, when the reflection member is fluidly applied, the reflection member 21 enters the gap between the circuit board 13 and the LED element 22. When it is not desired to dispose the reflecting member under the LED element 22, an underfill material may be disposed in advance in a region under the LED element 22.

10…LED装置(半導体発光装置)、
11…ダム材、
12…蛍光体樹脂(封止樹脂)、
13…回路基板、
14…+電極、
15…−電極、
16…合わせマーク、
21…反射性シリコーン樹脂(反射部材)、
22…LED素子(半導体発光素子)、
31,32,33…電極。
10 ... LED device (semiconductor light-emitting device),
11 ... Dam materials,
12 ... phosphor resin (sealing resin),
13 ... Circuit board,
14 ... + electrodes,
15 ...- electrodes,
16 ... Alignment mark,
21 ... Reflective silicone resin (reflective member),
22 ... LED element (semiconductor light emitting element),
31, 32, 33 ... electrodes.

Claims (5)

半導体発光素子を実装した回路基板上に該半導体発光素子を取り囲むダム材を備え、該ダム材が取り囲んだ領域に封止樹脂を充填し、該封止樹脂で前記半導体発光素子を封止する半導体発光装置において、
前記ダム材が取り囲む領域の底部に流動塗布した反射部材を備え、
該反射部材の上面が前記半導体発光素子の上面より低い
ことを特徴とする半導体発光装置。
A semiconductor comprising a dam material surrounding the semiconductor light emitting element on a circuit board on which the semiconductor light emitting element is mounted, filling a region surrounded by the dam material with a sealing resin, and sealing the semiconductor light emitting element with the sealing resin In the light emitting device,
A reflective member fluidly applied to the bottom of the region surrounded by the dam material;
A semiconductor light emitting device, wherein an upper surface of the reflecting member is lower than an upper surface of the semiconductor light emitting element.
前記反射部材の厚みが略30〜50μmであることを特徴とする請求項1に記載の半導体発光装置。   2. The semiconductor light emitting device according to claim 1, wherein the thickness of the reflecting member is approximately 30 to 50 [mu] m. 前記反射部材が反射性粒子を混練したシリコーン樹脂であることを特徴とする請求項1又は2に記載の半導体発光装置。   The semiconductor light emitting device according to claim 1, wherein the reflective member is a silicone resin in which reflective particles are kneaded. 前記反射部材が反射性粒子を混練したセラミックインクであることを特徴とする請求項1又は2に記載の半導体発光装置。   The semiconductor light emitting device according to claim 1, wherein the reflecting member is a ceramic ink kneaded with reflective particles. 本発明の半導体発光装置の製造方法は、半導体発光素子を実装した回路基板上に該半導体発光素子を取り囲むダム材を備え、該ダム材が取り囲んだ領域に封止樹脂を充填し、該封止樹脂で前記半導体発光素子を封止する半導体発光装置の製造方法において、
前記回路基板に前記半導体発光素子を実装し前記ダム材を形成する工程と、
前記ダム材の内側の領域であって前記半導体発光素子の占める領域を除いた領域に硬化前の前記反射部材を流し込み、該反射部材を硬化させる工程と、
前記ダム材の内側の領域に硬化前の前記封止樹脂を充填し、該封止樹脂を硬化させる工程と
を備えることを特徴とする半導体発光装置の製造方法。
The method for manufacturing a semiconductor light emitting device of the present invention includes a dam material surrounding the semiconductor light emitting element on a circuit board on which the semiconductor light emitting element is mounted, and a sealing resin is filled in a region surrounded by the dam material. In a method for manufacturing a semiconductor light emitting device for sealing the semiconductor light emitting element with a resin,
Mounting the semiconductor light emitting element on the circuit board and forming the dam material;
Pouring the reflective member before curing into a region inside the dam material and excluding the region occupied by the semiconductor light emitting element, and curing the reflective member;
Filling a region inside the dam material with the sealing resin before curing, and curing the sealing resin.
JP2010195439A 2010-09-01 2010-09-01 Semiconductor light-emitting device and manufacturing method of the same Pending JP2012054383A (en)

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