JP2012049291A - Method for manufacturing single-crystal organic semiconductor thin film - Google Patents
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本発明は、単結晶性有機半導体薄膜の製造方法に関する。 The present invention relates to a method for producing a monocrystalline organic semiconductor thin film.
高分子系、及び低分子系の有機半導体を用いる有機エレクトロニクスは、フラットパネルディスプレイや電子ペーパーを製造するための主要な次世代技術として注目されている。既に製品化された有機電界発光ダイオードに加えて、アクティブ・マトリックス用スイッチング素子を用途とする有機半導体薄膜電界効果トランジスタの研究開発が、近年大きく進展している。 Organic electronics using high molecular and low molecular organic semiconductors has attracted attention as a major next-generation technology for producing flat panel displays and electronic paper. In recent years, research and development of organic semiconductor thin film field effect transistors that use switching elements for active matrix in addition to organic electroluminescent diodes that have already been commercialized have made great progress.
有機エレクトロニクスの大きな特長のひとつは、真空を要さない溶液プロセス、さらにはこれを高度化した印刷技術によって電子デバイスを作製することが可能な点にある。このため、製品サイズの大面積化に伴い大規模な真空装置や高温装置などに高いコストを要する従来の無機系半導体デバイスと比べ、省エネルギーかつ低コストで大面積のフラットパネルディスプレイや電子ペーパーを製造することが可能になると期待されている。 One of the major features of organic electronics is that electronic devices can be manufactured using solution processes that do not require vacuum, and advanced printing technology. For this reason, large-area flat panel displays and electronic paper can be manufactured at low cost and energy compared to conventional inorganic semiconductor devices that require high costs for large-scale vacuum equipment and high-temperature equipment as the product size increases. It is expected to be possible.
これら有機半導体デバイスにおいて、デバイス動作の核となる有機半導体層には、分子配列に規則性のないアモルファス性薄膜、又は分子が規則正しく配列した数マイクロメートル以下のサイズの微結晶からなる多結晶性薄膜が利用されている。また一方、有機半導体層内のキャリヤ輸送の様子を調べるためのプロトタイプ・デバイスとして、数百マイクロメートル以上のサイズの単結晶を用いた単結晶デバイスの研究も、多数行われるようになっている。単結晶デバイスでは、キャリヤ輸送を阻害する原因の一つとなる結晶粒界が無く、分子配列の規則性が半導体の全領域に及ぶため、優れたキャリヤ輸送特性を示すことが報告されている(非特許文献1参照)。 In these organic semiconductor devices, the organic semiconductor layer that is the core of device operation is an amorphous thin film with no regular arrangement of molecules, or a polycrystalline thin film consisting of microcrystals with a size of several micrometers or less in which molecules are regularly arranged. Is being used. On the other hand, as a prototype device for investigating the state of carrier transport in an organic semiconductor layer, many studies of single crystal devices using single crystals having a size of several hundred micrometers or more have been conducted. Single crystal devices have been reported to show excellent carrier transport properties because there are no grain boundaries that can be a cause of hindering carrier transport, and the regularity of the molecular arrangement extends to the entire region of the semiconductor. Patent Document 1).
さらにまた、優れた特性を示す単結晶デバイスを基板上でプロセス技術を用いて構築し、実用デバイスとして活用しようとする研究も近年行われるようになっている。
例えば、基板上に作製した多数のソース・ドレイン電極配列において、電極間のみ選択的にオクタデシルトリエトキシシラン(OTS)によるシランカップリング剤で表面処理を施し、処理した領域にのみ有機半導体単結晶を気相法によって成長させる方法が非特許文献2において提案されている。
Furthermore, in recent years, research has been conducted to construct a single crystal device exhibiting excellent characteristics on a substrate using a process technology and to utilize it as a practical device.
For example, in a large number of source / drain electrode arrays fabricated on a substrate, surface treatment is performed selectively with a silane coupling agent with octadecyltriethoxysilane (OTS) only between the electrodes, and an organic semiconductor single crystal is formed only on the treated region. Non-Patent Document 2 proposes a method of growing by a vapor phase method.
また溶液法を用いた単結晶有機半導体デバイスの構築については、高い結晶性を示す2,7−ジオクチル[1]ベンゾチエノ[3,2−b][1]ベンゾチオフェン(以下、「C8−BTBT」という。)において、基板上に液滴を支持するためのシリコンウェハー等の端部を接触させ、基板全体を傾斜させることによりC8−BTBT単結晶を徐々に成長させる方法が非特許文献3において提案されている。
しかしながら以上に述べた方法では、単結晶有機半導体薄膜を工業的に量産可能なレベルで制御性よく製造するという観点からは不十分である。また特に有機エレクトロニクスの特長を活かすための印刷技術の適用については、単結晶有機半導体デバイスについて有効な方法が知られていない。
For the construction of a single crystal organic semiconductor device using a solution method, 2,7-dioctyl [1] benzothieno [3,2-b] [1] benzothiophene (hereinafter referred to as “C8-BTBT”) exhibiting high crystallinity. Non-Patent Document 3 proposes a method of gradually growing a C8-BTBT single crystal by bringing the end of a silicon wafer or the like for supporting a droplet onto the substrate into contact with the substrate and tilting the entire substrate. Has been.
However, the method described above is insufficient from the viewpoint of producing a single crystal organic semiconductor thin film with a controllability at a level capable of industrial mass production. In particular, regarding the application of printing technology for utilizing the features of organic electronics, no effective method is known for single crystal organic semiconductor devices.
一方、低分子系の有機半導体薄膜を印刷技術によって構築する手法のひとつに、粘性が比較的低いインクを扱うインクジェット印刷法がある。インクジェット印刷法では、有機半導体を有機溶媒等に高濃度に溶解させた溶液(インク)をインクヘッドから基板上に滴下し、これに続く有機溶媒の蒸発によって有機半導体層を析出し作製する。
先の特許出願に係る特許文献1では、膜厚の均一性が高い有機半導体薄膜を形成する方法として、有機溶媒の種類により溶解性が大きく異なる有機半導体を用いたダブルショット・インクジェット印刷法が提案されている。この方法では、有機半導体を有機溶媒に高濃度に溶解して得たインクと、有機半導体をほとんど溶かさない有機溶媒からなるインクを、各インクヘッドから同時又は交互に吐出させ基板上で混合することにより、有機半導体の析出が有機溶媒の蒸発前に進行し、均質性の高い有機半導体薄膜を得ることが可能なことが示されている。
On the other hand, one of the methods for constructing a low-molecular organic semiconductor thin film by a printing technique is an ink-jet printing method that uses ink having a relatively low viscosity. In the ink jet printing method, a solution (ink) in which an organic semiconductor is dissolved at a high concentration in an organic solvent or the like is dropped from an ink head onto a substrate, and an organic semiconductor layer is deposited by subsequent evaporation of the organic solvent.
In Patent Document 1 related to the previous patent application, as a method of forming an organic semiconductor thin film having a high film thickness uniformity, a double-shot inkjet printing method using an organic semiconductor whose solubility varies greatly depending on the type of organic solvent is proposed. Has been. In this method, an ink obtained by dissolving an organic semiconductor in a high concentration in an organic solvent and an ink composed of an organic solvent that hardly dissolves the organic semiconductor are ejected simultaneously or alternately from each ink head and mixed on the substrate. Thus, it is shown that the precipitation of the organic semiconductor proceeds before the evaporation of the organic solvent, and an organic semiconductor thin film with high homogeneity can be obtained.
しかしながら、上記方法により結晶性の高い有機半導体材料を薄膜化すると、基板上に着滴後、貯留されたインク液滴の各部位、特に溶媒の蒸発速度が速い液滴の外縁部の各箇所においてランダムに種結晶が発生するため、得られる有機半導体薄膜は数個〜数百個の微結晶からなる多結晶性有機半導体薄膜となる。このため、印刷法によって分子配列の規則性が薄膜のほぼ全領域に及ぶ単結晶性有機半導体薄膜を得ることは困難である。 However, when an organic semiconductor material with high crystallinity is thinned by the above method, after landing on the substrate, each part of the stored ink droplets, particularly at each part of the outer edge of the droplets where the evaporation rate of the solvent is high Since seed crystals are randomly generated, the obtained organic semiconductor thin film is a polycrystalline organic semiconductor thin film composed of several to several hundred microcrystals. For this reason, it is difficult to obtain a monocrystalline organic semiconductor thin film in which the regularity of the molecular arrangement covers almost the entire region of the thin film by the printing method.
以上のような状況に鑑み、本発明は、印刷法によって薄膜のほぼ全領域が単一の単結晶からなる単結晶性有機半導体薄膜を作製することを課題とする。 In view of the situation as described above, an object of the present invention is to produce a single crystalline organic semiconductor thin film in which almost the entire region of the thin film is composed of a single single crystal by a printing method.
上記課題は次のような手段により解決される。
(1)有機半導体に親和性の高い有機溶媒に該有機半導体を高濃度に溶解して得た第1のインクと、該有機半導体に親和性の低い有機溶媒からなる第2のインクを用意する工程と、該第1及び第2のインクを基板上で混合し、インクを貯留する領域を形成する工程とを含む単結晶性有機半導体薄膜の製造方法であって、
該インクが貯留する領域の一部に種結晶が高効率に発生する形状を付与し、そこを起点としてインクが貯留する領域のほぼ全領域にわたり単結晶を成長させることを特徴とする単結晶性有機半導体薄膜の製造方法。
(2)有機半導体に親和性の高い有機溶媒に該有機半導体を高濃度に溶解して得た第1のインクと、該有機半導体に親和性の低い有機溶媒からなる第2のインクを用意する工程と、該第1及び第2のインクを基板上で混合し、インクを貯留する領域を形成する工程とを含む単結晶性有機半導体薄膜の製造方法であって、
該インクを貯留する領域は、種結晶が発生する小さな液溜部位、該種結晶から単結晶を成長させる大きな液溜部位及び各液溜部位間の対流の抑制と結晶成長方向選別のためのくびれ部位からなることを特徴とする単結晶性有機半導体薄膜の製造方法。
(3)上記第1及び第2のインクは、基板上に各インクヘッドから同時又は交互に吐出させることを特徴とする(1)又は(2)に記載の単結晶性有機半導体薄膜の製造方法。
(4)上記インクが貯留する領域は、疎水化処理した基板表面の一部を親水化した後、親水化した該基板表面の一部をさらに親油性処理することにより画定されていることを特徴とする(1)ないし(3)のいずれかに記載の単結晶性有機半導体薄膜の製造方法。
The above problem is solved by the following means.
(1) Prepare a first ink obtained by dissolving the organic semiconductor at a high concentration in an organic solvent having a high affinity for the organic semiconductor, and a second ink comprising an organic solvent having a low affinity for the organic semiconductor. A method for producing a single crystalline organic semiconductor thin film comprising: a step; and a step of mixing the first and second inks on a substrate and forming a region for storing the ink,
A single crystal property characterized in that a part of a region where the ink is stored has a shape in which a seed crystal is generated with high efficiency, and the single crystal is grown over almost the entire region where the ink is stored starting from the shape. Manufacturing method of organic semiconductor thin film.
(2) Prepare a first ink obtained by dissolving the organic semiconductor in a high concentration in an organic solvent having a high affinity for the organic semiconductor, and a second ink comprising an organic solvent having a low affinity for the organic semiconductor. A method for producing a single crystalline organic semiconductor thin film comprising: a step; and a step of mixing the first and second inks on a substrate and forming a region for storing the ink,
The area for storing the ink includes a small reservoir for generating seed crystals, a large reservoir for growing a single crystal from the seed crystals, and a constriction for suppressing convection between the reservoirs and selecting the crystal growth direction. A method for producing a monocrystalline organic semiconductor thin film comprising a region.
(3) The method for producing a monocrystalline organic semiconductor thin film according to (1) or (2), wherein the first and second inks are ejected simultaneously or alternately from the respective ink heads onto the substrate. .
(4) The region in which the ink is stored is defined by hydrophilizing a part of the substrate surface that has been hydrophobized and then further hydrophobizing the part of the substrate surface that has been hydrophilized. (1) The manufacturing method of the single-crystal organic-semiconductor thin film in any one of (3).
本発明によれば、基板上に貯留したインク液滴の一部位において種結晶が最初に発生し、ここが核となって液滴の全領域にわたる単結晶薄膜を成長させることができるため、100μm以上×100μm以上の広い面積にわたって単一の単結晶からなる単結晶性有機半導体層の作製が可能になる。これにより、デバイスの特性劣化の原因となる結晶粒界が無く優れたデバイス特性を示す有機半導体装置を印刷法によって構築することが可能になる。また、ロール・トウ・ロールでの安価かつ大量生産に向いた製造工程への利用が可能となる。 According to the present invention, a seed crystal is first generated in one part of the ink droplet stored on the substrate, and this can serve as a nucleus to grow a single crystal thin film over the entire region of the droplet. A single crystalline organic semiconductor layer made of a single single crystal over a wide area of × 100 μm or more can be produced. This makes it possible to build an organic semiconductor device that exhibits excellent device characteristics without crystal grain boundaries that cause device characteristic deterioration by a printing method. In addition, it can be used in a manufacturing process that is suitable for mass production at low cost with rolls, tows and rolls.
本発明の実施の形態について以下図面を参照して詳細に説明する。
有機半導体層を構成する有機材料として、高い結晶性を有するC8−BTBTを用いた。上記の有機半導体を高濃度に溶解させて形成したインクと、これをほとんど溶解しない有機溶媒によるインクを用いて、特許文献1に記載したダブルショット・インクジェット印刷法により有機半導体層を形成した。
Embodiments of the present invention will be described below in detail with reference to the drawings.
C8-BTBT having high crystallinity was used as the organic material constituting the organic semiconductor layer. An organic semiconductor layer was formed by the double shot ink jet printing method described in Patent Document 1 using an ink formed by dissolving the above organic semiconductor at a high concentration and an ink using an organic solvent that hardly dissolves the organic semiconductor.
インクジェット印刷法により基板上に着滴したインクが貯留する領域は基板表面の親水(親油)・疎水の各処理によるパターニングによって画定されるが、単結晶性有機半導体薄膜を形成するため、領域内のある部位で溶媒の蒸発が比較的速やかに進行し種結晶が発生するよう予め設計した形状を有するよう表面処理したものを用いた。 The area where ink deposited on the substrate by inkjet printing is stored is defined by patterning by hydrophilic (lipophilic) and hydrophobic treatments on the surface of the substrate. A surface-treated product having a shape designed in advance so that the evaporation of the solvent proceeds relatively quickly and a seed crystal is generated is used.
以下、実施例に基づいて本発明をより詳細に説明する。
ダブルショット・インクジェット印刷に用いるインクとしては、C8−BTBT10mg(21.5μmol:分子量464.77)をオルトジクロロベンゼン(DCB) 0.8mlに溶解させた濃度26.9mmol/lのインク(Aインク)、及びC8−BTBTをほとんど溶解しないジメチルホルムアミド(DMF)からなるインク(Bインク)を用いた。原料として用いたDCB、及びDMFは、いずれも安価に入手可能である。また得られたインクの粘度はいずれも2〜3mPa・sであり、インクジェット印刷に用いるインクとして好適な性質を示した。
Hereinafter, the present invention will be described in more detail based on examples.
As inks used in double shot ink jet printing, C8-BTBT 10 mg (21.5 μmol: molecular weight 464.77) dissolved in 0.8 ml of orthodichlorobenzene (DCB) at a concentration of 26.9 mmol / l (A ink), and C8-BTBT Ink (B ink) made of dimethylformamide (DMF), which hardly dissolves water was used. Both DCB and DMF used as raw materials are available at low cost. In addition, the viscosity of each of the obtained inks was 2 to 3 mPa · s, and showed suitable properties as an ink used for inkjet printing.
使用したインクジェット式印刷装置は、デジタル制御により2種類のインクそれぞれについて100ピコリットル程度の微細液滴を正確な量、正確な位置に非接触で任意に吐出することが可能なものを用いた。C8−BTBTを含むAインク及び親和性の低い溶媒のみからなるBインクをそれぞれ基板上の同位置に塗布し、溶液の状態で混合した。 The ink jet printing apparatus used was capable of arbitrarily ejecting fine droplets of about 100 picoliters for each of the two types of inks in an accurate amount and in an accurate position without contact by digital control. A ink containing C8-BTBT and B ink consisting only of a low affinity solvent were respectively applied to the same positions on the substrate and mixed in a solution state.
本実施例では、基板として100nmの厚さのシリコン酸化膜で皮膜されたp型シリコンウェハーを用い、この上にソース・ドレイン用の金電極を作製したものを用いた。基板表面の処理法として、絶縁膜表面の疎水化処理はヘキサメチルジシラザン(HMDS)で行い、また金電極表面の疎水化処理はチオール処理により行った。疎水化処理後に親水(親油)領域を形成するため、図1(a)に示す形状を有するマスクパターンにより基板の一部表面のみを露出させてUV/オゾン処理により選択的に親水化した。さらにその後、親水性表面を親油性のフェネチルトリクロロシラン(PTS)で表面処理を行った。これにより、基板上に着滴したインク液滴を、図1(a)に示す形状を有する親油領域内に閉じ込めることが可能な表面処理パターンを得た。 In this example, a p-type silicon wafer coated with a silicon oxide film having a thickness of 100 nm was used as a substrate, and a source / drain gold electrode formed thereon was used. As treatment methods for the substrate surface, the hydrophobic treatment on the insulating film surface was performed with hexamethyldisilazane (HMDS), and the hydrophobic treatment on the gold electrode surface was performed with a thiol treatment. In order to form a hydrophilic (lipophilic) region after the hydrophobization treatment, only a partial surface of the substrate was exposed by a mask pattern having the shape shown in FIG. 1A and selectively hydrophilized by UV / ozone treatment. Thereafter, the hydrophilic surface was surface-treated with lipophilic phenethyltrichlorosilane (PTS). As a result, a surface treatment pattern was obtained in which ink droplets deposited on the substrate could be confined in the lipophilic region having the shape shown in FIG.
インクジェット法によるインクの塗布においては、上記の親油領域上に、まずBインクを充填したヘッドを移動しBインクを40滴吐出し基板上に着弾させた後、Aインクを充填したヘッドを速やかに先ほどのBインクが着弾した位置へ移動しAインクを12滴吐出し、基板上でAインクとBインクが混合した液滴を得た。 In the ink application by the ink jet method, first, the head filled with B ink is moved onto the above-mentioned lipophilic region, 40 drops of B ink are ejected and landed on the substrate, and then the head filled with A ink is quickly moved. First, the ink moved to the position where the B ink landed, and 12 drops of A ink were ejected to obtain droplets in which A ink and B ink were mixed on the substrate.
図1(a)の親油領域の形状は、小さな液溜部位1、大きな液溜部位3、及び1と3の間の対流を抑制するためのくびれとなる部位2から構成されている。接触角による制限のため、単位表面積当りに貯留された液滴の体積は、小さな液溜部位1の方が大きな液溜部位3よりも小さい。1と3の間の対流はある程度制限されているため、表面積/体積の大きな小さな液溜部位1において、単位体積当たりでより高効率に溶媒の蒸発が生じ、種結晶が発生する。液溜部位1において発生した種結晶は、くびれ部位2を通して多結晶のうち成長方向が一致したものが選別され、液溜部位3における結晶成長の核となり、図1(b)に示すように、ここを起点として単結晶が成長する。 The shape of the lipophilic region in FIG. 1A is composed of a small liquid reservoir part 1, a large liquid reservoir part 3, and a part 2 that becomes a constriction for suppressing convection between 1 and 3. Due to the limitation due to the contact angle, the volume of the droplets stored per unit surface area is smaller in the small liquid reservoir part 1 than in the large liquid reservoir part 3. Since the convection between 1 and 3 is limited to some extent, in the small liquid reservoir portion 1 having a large surface area / volume, the solvent is evaporated more efficiently per unit volume and a seed crystal is generated. The seed crystal generated in the liquid reservoir part 1 is selected from the polycrystals having the same growth direction through the constriction part 2 and becomes the nucleus of crystal growth in the liquid reservoir part 3, as shown in FIG. Single crystals grow from this point.
実際、結晶成長の様子を顕微鏡により観測したところ、小さな液溜部位において発生した種結晶が核となって大きな液溜部位において単結晶が1から3の方向へと徐々に成長していく様子が観測された。図1(c)は得られたC8−BTBTの偏光顕微鏡写真である。 Actually, when the state of crystal growth was observed with a microscope, the seed crystal generated at the small liquid reservoir site became a nucleus and the single crystal gradually grew from 1 to 3 at the large liquid reservoir site. Observed. FIG. 1 (c) is a polarizing micrograph of the obtained C8-BTBT.
図2には、得られた薄膜が単結晶薄膜であることを示す実験結果を示している。図2(a)は顕微鏡写真の拡大図であり、縞模様が観測されていることが分かる。図2(b)はこの縞模様について原子間力顕微鏡像で観察した結果、また図2(c)はその高さプロファイルを示した結果である。これより、顕微鏡写真に見られた縞模様が3nmの厚み変化を捉えたものであることが分かる。この厚み変化は、図2(d)に示すC8−BTBTによる分子層の厚みと一致しており、単一の結晶におけるステップ・アンド・テラス構造を観測したものと結論される。 FIG. 2 shows experimental results showing that the obtained thin film is a single crystal thin film. FIG. 2A is an enlarged view of the micrograph, and it can be seen that a striped pattern is observed. FIG. 2B shows the result of observing the striped pattern with an atomic force microscope image, and FIG. 2C shows the result of the height profile. From this, it can be seen that the striped pattern seen in the micrograph captures a thickness change of 3 nm. This change in thickness is consistent with the thickness of the molecular layer by C8-BTBT shown in FIG. 2 (d), and it is concluded that a step-and-terrace structure in a single crystal was observed.
なお、上記の実施例は、あくまでも本発明の理解を容易にするためのものであり、この実施例に限定されるものではない。すなわち、本発明の技術思想に基づく変形、他の態様は、当然本発明に包含されるものである。
例えば有機半導体としては、C8−BTBTに関する結果について例示したが、これ以外の有機半導体で高い結晶性を示す性質を有するものでもよい。またアルキル基、又はそれと同等の置換基によって置換することにより、層状での結晶性を高めた有機分子としてもよい。
In addition, said Example is for making an understanding of this invention easy to the last, and is not limited to this Example. That is, modifications and other aspects based on the technical idea of the present invention are naturally included in the present invention.
For example, as an organic semiconductor, although the result regarding C8-BTBT was illustrated, what has a property which shows high crystallinity with another organic semiconductor may be sufficient. Moreover, it is good also as an organic molecule which improved the crystallinity in the layer form by substituting with an alkyl group or a substituent equivalent to it.
また均質性の高い有機半導体層を形成する方法として二種類の異なる液滴を混合するダブルショット・インクジェット法を用いる方法を例示したが、均質性の高い有機半導体層を形成する方法であればこれ以外の方法でもよい。基板上に着滴した液滴の一部から効率的に種結晶が生成する限りにおいて同様の効果が得られる。
例えば溶液法において基板傾斜により有機溶媒を徐々に蒸発させて単結晶有機半導体を成長させる場合においても、同様の効果が得られる。
In addition, as a method for forming a highly homogenous organic semiconductor layer, a method using a double shot ink jet method in which two kinds of different droplets are mixed is exemplified. However, if a method for forming a highly homogeneous organic semiconductor layer is used, this method is used. Other methods may be used. The same effect can be obtained as long as seed crystals are efficiently generated from some of the droplets deposited on the substrate.
For example, in the case of growing a single crystal organic semiconductor by gradually evaporating an organic solvent by a substrate tilt in a solution method, the same effect can be obtained.
1 小さな液溜部位
2 対流の抑制と結晶成長方向選別のためのくびれ部位
3 大きな液溜部位
1 Small reservoir 2 Constriction site for convection suppression and crystal growth direction selection 3 Large reservoir site
Claims (4)
該インクを貯留する領域の一部に種結晶が高効率に発生する形状を付与し、そこを起点としてインクを貯留する領域のほぼ全領域にわたり単結晶を成長させることを特徴とする単結晶性有機半導体薄膜の製造方法。 Preparing a first ink obtained by dissolving the organic semiconductor in a high concentration in an organic solvent having a high affinity for the organic semiconductor, and a second ink comprising an organic solvent having a low affinity for the organic semiconductor; A step of mixing the first and second inks on a substrate and forming a region for storing the inks,
A single crystal property characterized in that a shape of a seed crystal is generated at a part of a region where the ink is stored with high efficiency, and the single crystal is grown over almost the entire region where the ink is stored starting from the shape. Manufacturing method of organic semiconductor thin film.
該インクを貯留する領域は、種結晶が発生する小さな液溜部位、該種結晶から単結晶を成長させる大きな液溜部位及び各液溜部位間の対流の抑制と結晶成長方向選別のためのくびれ部位からなることを特徴とする単結晶性有機半導体薄膜の製造方法。 Preparing a first ink obtained by dissolving the organic semiconductor in a high concentration in an organic solvent having a high affinity for the organic semiconductor, and a second ink comprising an organic solvent having a low affinity for the organic semiconductor; A step of mixing the first and second inks on a substrate and forming a region for storing the inks,
The area for storing the ink includes a small reservoir for generating seed crystals, a large reservoir for growing a single crystal from the seed crystals, and a constriction for suppressing convection between the reservoirs and selecting the crystal growth direction. A method for producing a monocrystalline organic semiconductor thin film comprising a region.
The region in which the ink is stored is defined by hydrophilizing a part of the surface of the substrate that has been hydrophobized and then further lipophilically treating the part of the surface of the substrate that has been hydrophilized. Item 4. The method for producing a single crystalline organic semiconductor thin film according to any one of Items 1 to 3.
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| PCT/JP2011/068294 WO2012023476A1 (en) | 2010-08-18 | 2011-08-10 | Method of manufacturing organic semiconductor thin film and monocrystalline organic semiconductor thin film |
| EP11818118.9A EP2608251A4 (en) | 2010-08-18 | 2011-08-10 | PROCESS FOR PRODUCING ORGANIC SEMICONDUCTOR THIN FILM THIN FILM AND SINGLE-CRYSTALLINE ORGANIC SEMICONDUCTOR THIN FILM |
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