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JP2011235318A - Method for surface treatment of die-casting die - Google Patents

Method for surface treatment of die-casting die Download PDF

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Publication number
JP2011235318A
JP2011235318A JP2010109299A JP2010109299A JP2011235318A JP 2011235318 A JP2011235318 A JP 2011235318A JP 2010109299 A JP2010109299 A JP 2010109299A JP 2010109299 A JP2010109299 A JP 2010109299A JP 2011235318 A JP2011235318 A JP 2011235318A
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Prior art keywords
nitrogen
compound
nitriding
compound layer
mold
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Inventor
Yasushi Hiraoka
泰 平岡
Yuji Kobayashi
祐次 小林
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Sintokogio Ltd
Daido Steel Co Ltd
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Sintokogio Ltd
Daido Steel Co Ltd
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Priority to JP2010109299A priority Critical patent/JP2011235318A/en
Priority to PCT/JP2011/061462 priority patent/WO2011142479A1/en
Priority to TW100116421A priority patent/TWI532547B/en
Priority to US13/634,679 priority patent/US20130042992A1/en
Priority to CN2011800150041A priority patent/CN102812148A/en
Priority to DE112011101613T priority patent/DE112011101613T5/en
Priority to KR1020127023330A priority patent/KR20130069545A/en
Publication of JP2011235318A publication Critical patent/JP2011235318A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/24Nitriding
    • C23C8/26Nitriding of ferrous surfaces
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    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/24Nitriding
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/28Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in one step
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/28Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in one step
    • C23C8/30Carbo-nitriding
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/28Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in one step
    • C23C8/30Carbo-nitriding
    • C23C8/32Carbo-nitriding of ferrous surfaces
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    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/34Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in more than one step
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C23C8/38Treatment of ferrous surfaces
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    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/80After-treatment

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Molds, Cores, And Manufacturing Methods Thereof (AREA)

Abstract

【課題】 ヒートチェックや摩耗の原因となる窒素化合物層を実質的に与えず、その一方で、金型内部に窒素を多量に導入できて、結果として、耐ヒートチェック性及び耐摩耗性に優れるダイカスト金型を与え得る表面処理方法を提供すること。
【解決手段】 加熱炉内に少なくともアンモニアガスを含むガスを導入して金型意匠面に窒素化合物からなる化合物層を含む窒化層を形成する窒化ステップと、加熱炉内からアンモニアガスを排出するとともに雰囲気ガスを導入して加熱処理し窒素化合物を分解させる化合物分解ステップと、金型意匠面にショットピーニングを行うショットピーニングステップと、を含む。ここで、窒化ステップは2〜7ミクロンの範囲内の厚さの化合物層を少なくとも含む窒化層を形成するステップであることを特徴とする。
【選択図】 なし
PROBLEM TO BE SOLVED: To substantially provide a nitrogen compound layer that causes heat check and wear, and on the other hand, a large amount of nitrogen can be introduced into a mold, and as a result, heat check resistance and wear resistance are excellent. To provide a surface treatment method capable of giving a die casting mold.
A nitriding step of introducing a gas containing at least ammonia gas into a heating furnace to form a nitride layer including a compound layer made of a nitrogen compound on the mold design surface, and discharging the ammonia gas from the heating furnace. It includes a compound decomposition step of introducing an atmospheric gas and heat-treating to decompose the nitrogen compound, and a shot peening step of performing shot peening on the mold design surface. Here, the nitriding step is a step of forming a nitride layer including at least a compound layer having a thickness in the range of 2 to 7 microns.
[Selection figure] None

Description

本発明は、ショットピーニングにより金型意匠面に圧縮残留応力を与えて提供されるダイカスト金型の表面処理方法に関する。   The present invention relates to a surface treatment method for a die casting mold provided by applying compressive residual stress to a mold design surface by shot peening.

金属溶湯の注入、凝固及び成型品の型抜きの成型サイクルを繰り返し行うダイカスト成型では、成型サイクルによって与えられる熱履歴によって金型の意匠面に細かいヒートチェック(熱亀裂)が生じ易く、機械的接触による摩耗も生じ易い。かかるヒートチェックはクラックに発展して金型を損傷させ、摩耗は成型品の寸法精度を低下させてしまう。そこで、耐ヒートチェック性や耐摩耗性を向上させて金型の寿命を延ばし得るよう、金型意匠面の硬さを高める表面窒化処理や、圧縮残留応力を付与するショットピーニングなどの施工が行われ得る。   In die-cast molding, in which molten metal is injected, solidified, and the molding cycle is repeated, fine heat checks (thermal cracks) are likely to occur on the design surface of the mold due to the thermal history given by the molding cycle, and mechanical contact occurs. Wear is also likely to occur. Such a heat check develops into cracks and damages the mold, and wear reduces the dimensional accuracy of the molded product. Therefore, surface nitriding treatment that increases the hardness of the mold design surface and shot peening that applies compressive residual stress are performed to improve the heat check resistance and wear resistance and extend the life of the mold. Can be broken.

金型における表面窒化処理は、主に処理のしやすさ、コスト面からガス窒化により行われることが多い。かかる方法では、アンモニアガスを高温下で分解し、発生した窒素を金型意匠面から金型内部へ拡散させて拡散硬化層を与えている。一方、金型におけるショットピーニングは、主に1mm以下のセラミックや硬質金属からなる小球を投射装置で加速して金型意匠面に噴射する方法で行われている。金型意匠面には、小球の衝突による加工硬化により圧縮残留応力が与えられるのである。   The surface nitriding treatment in the mold is often performed by gas nitriding mainly from the viewpoint of ease of processing and cost. In such a method, ammonia gas is decomposed at a high temperature, and the generated nitrogen is diffused from the mold design surface into the mold to provide a diffusion hardened layer. On the other hand, shot peening in a mold is performed by a method in which small spheres mainly made of ceramic or hard metal of 1 mm or less are accelerated by a projection device and sprayed onto a mold design surface. A compressive residual stress is given to the mold design surface by work hardening by collision of small spheres.

例えば、特許文献1では、金型意匠面に窒化処理を施し窒素拡散硬化層を形成した後に、さらにショットピーニングを行って、その表面に高い圧縮残留応力を与えることが開示されている。かかる窒化処理とショットピーニングとを組み合わせて施工することで金型の寿命を大幅に高め得るのである。   For example, Patent Document 1 discloses that after a nitriding treatment is performed on a mold design surface to form a nitrogen diffusion hardened layer, shot peening is further performed to give a high compressive residual stress to the surface. By applying the nitriding treatment and shot peening in combination, the life of the mold can be greatly increased.

ところで、窒化処理では、窒素拡散硬化層の表面に塑性変形能に乏しい化合物層が形成されることも知られている。かかる化合物層はヒートチェックによるクラックへの成長や、剥離による摩耗の原因となることから、これを形成させないか、若しくは、なるべく薄く形成させるような窒化処理の方法が提案されている。   By the way, it is also known that a compound layer having poor plastic deformability is formed on the surface of the nitrogen diffusion hardened layer in the nitriding treatment. Since such a compound layer grows into cracks due to heat check and causes wear due to peeling, a nitriding method has been proposed in which this compound layer is not formed or is formed as thin as possible.

例えば、特許文献2では、450〜530℃の比較的低い温度範囲においてアンモニアガス窒化を行って、その後、アンモニアの供給を低減又は停止するとともに、550〜590℃の処理温度で窒素を内部拡散させる熱処理を行う2段処理が開示されている。比較的低い温度範囲でのアンモニアガス窒化では、化合物層は薄く形成される。その一方で、窒素拡散層の深さも浅くなってしまう。そこで、熱処理によって窒素拡散層の窒素を金型の深くまで拡散させ、薄いままの化合物層でありながら厚い窒素拡散層を得ている。   For example, in Patent Document 2, ammonia gas nitriding is performed in a relatively low temperature range of 450 to 530 ° C., and thereafter, the supply of ammonia is reduced or stopped, and nitrogen is internally diffused at a processing temperature of 550 to 590 ° C. A two-stage process for heat treatment is disclosed. In ammonia gas nitriding in a relatively low temperature range, the compound layer is formed thin. On the other hand, the depth of the nitrogen diffusion layer is also reduced. Therefore, the nitrogen in the nitrogen diffusion layer is diffused deep into the mold by heat treatment to obtain a thick nitrogen diffusion layer while being a thin compound layer.

同様に、特許文献3では、570℃未満の温度の減圧下でアンモニアガス窒化を行って、その後、アンモニアの供給を低減又は停止するとともに、570℃〜650℃の処理温度で窒素を内部拡散させる熱処理を行う2段処理が開示されている。かかる減圧下でのガス窒化では、窒素化合物層は薄く且つ非ポーラス状態で得られ、また熱処理により窒素拡散層の深さもより深くなると述べている。   Similarly, in Patent Document 3, ammonia gas nitriding is performed under reduced pressure at a temperature of less than 570 ° C., and thereafter, the supply of ammonia is reduced or stopped, and nitrogen is internally diffused at a processing temperature of 570 ° C. to 650 ° C. A two-stage process for heat treatment is disclosed. In gas nitriding under such reduced pressure, it is stated that the nitrogen compound layer is obtained in a thin and non-porous state, and that the depth of the nitrogen diffusion layer is increased by heat treatment.

特開2004−148362号公報JP 2004-148362 A 特開平10−306364号公報Japanese Patent Laid-Open No. 10-306364 特開平11−100655号公報Japanese Patent Laid-Open No. 11-100635

特許文献2及び3に開示されたような窒素化合物層を薄く形成しようとするアンモニアガス窒化では、金型に供給される窒素の絶対量が少なく、熱処理によって窒素拡散層の窒素をさらに深くまで拡散させようとすると、窒素拡散層に十分な硬さを与えることができない。   In the ammonia gas nitriding to form a thin nitrogen compound layer as disclosed in Patent Documents 2 and 3, the absolute amount of nitrogen supplied to the mold is small, and the nitrogen in the nitrogen diffusion layer is diffused deeper by heat treatment. If it is made to do, sufficient hardness cannot be given to a nitrogen diffusion layer.

本発明は、かかる事情に鑑みてなされたものであって、その目的とするところは、ヒートチェックや摩耗の原因となる窒素化合物層を実質的に与えず、その一方で、金型内部に窒素を多量に導入できて、結果として、耐ヒートチェック性及び耐摩耗性に優れるダイカスト金型を与え得る表面処理方法を提供することにある。   The present invention has been made in view of such circumstances, and the object of the present invention is to substantially not provide a nitrogen compound layer that causes heat check and wear, while on the other hand, nitrogen inside the mold It is an object of the present invention to provide a surface treatment method capable of providing a die-casting mold having excellent heat check resistance and wear resistance.

本発明者は、ガス軟窒化、ガス侵硫窒化、プラズマ窒化などの各種窒化処理で形成される最表層の窒素化合物が熱処理で比較的容易に分解出来ることを見い出した。そして、窒素化合物層を実質的に与えない金型の製造方法を検討する中で、かかる分解によって窒素を生じこれを金型の内部に拡散させて金型に供給される窒素量を増やし得ることを想到したのである。   The present inventor has found that the outermost nitrogen compound formed by various nitriding treatments such as gas soft nitriding, gas oxynitriding, and plasma nitriding can be decomposed relatively easily by heat treatment. And, while examining the manufacturing method of the mold that does not substantially give the nitrogen compound layer, it is possible to increase the amount of nitrogen supplied to the mold by generating nitrogen by such decomposition and diffusing this into the mold I thought of it.

そこで本発明によるダイカスト金型の表面処理方法は、金型意匠面に圧縮残留応力を与えて提供されるダイカスト金型の表面処理方法であって、加熱炉内に少なくともアンモニアガスを含むガスを導入して前記金型意匠面に窒素化合物からなる化合物層を含む窒化層を形成する窒化ステップと、前記加熱炉内からアンモニアガスを排出するとともに雰囲気ガスを導入して加熱処理し前記窒素化合物を分解させる化合物分解ステップと、前記金型意匠面にショットピーニングを行うショットピーニングステップと、を含み、前記窒化ステップは2〜7ミクロンの範囲内の厚さの前記化合物層を少なくとも含む前記窒化層を形成するステップであることを特徴とする。   Accordingly, a surface treatment method for a die casting mold according to the present invention is a surface treatment method for a die casting mold provided by applying compressive residual stress to a mold design surface, and a gas containing at least ammonia gas is introduced into a heating furnace. Then, a nitriding step for forming a nitride layer including a compound layer made of a nitrogen compound on the mold design surface, an ammonia gas is discharged from the inside of the heating furnace, and an atmosphere gas is introduced for heat treatment to decompose the nitrogen compound. A compound decomposing step, and a shot peening step of performing shot peening on the mold design surface, wherein the nitriding step forms the nitride layer including at least the compound layer having a thickness in the range of 2 to 7 microns. It is a step to perform.

かかる発明によれば、少なくともアンモニアガスを含むガスを加熱炉内に導入して行う窒化処理によって形成される窒素化合物層を所定の厚さに制御することで、この窒素化合物を化合物分解ステップにおいて分解し、結果として、窒素化合物層を実質的に与えず、これによって生じた窒素により金型に供給される窒素量を増やし、高い硬さを有する窒素拡散層を与えることができる。その上で、実質的に消失する窒素化合物層はボイドを多く含みショットピーニングにおけるショットの衝突エネルギーを吸収・散逸させてしまう。しかしながら、窒化ステップにおいてこの窒素化合物層をやはり所定の厚さに制御することで、ショットピーニングによる圧縮残留応力を付与可能としている。すなわち、高い硬さと高い圧縮残留応力により、耐摩耗性及び耐ヒートチェック性に優れるダイカスト金型を与え得るのである。   According to this invention, the nitrogen compound is formed in the compound decomposition step by controlling the nitrogen compound layer formed by nitriding performed by introducing a gas containing at least ammonia gas into the heating furnace to a predetermined thickness. As a result, the nitrogen compound layer is not substantially provided, and the amount of nitrogen supplied to the mold can be increased by the nitrogen generated thereby, thereby providing a nitrogen diffusion layer having high hardness. In addition, the nitrogen compound layer that substantially disappears contains a lot of voids and absorbs and dissipates the collision energy of the shot in shot peening. However, it is possible to apply compressive residual stress by shot peening by controlling the nitrogen compound layer to a predetermined thickness in the nitriding step. That is, a die-cast mold having excellent wear resistance and heat check resistance can be provided by high hardness and high compressive residual stress.

上記した発明において、前記化合物分解ステップは、前記加熱処理を前記窒化ステップよりも少なくとも高い温度で行うことを特徴としてもよい。かかる発明によれば、より高い硬さと高い圧縮残留応力を与えることが出来て、耐摩耗性及び耐ヒートチェック性により優れるダイカスト金型を与え得るのである。   In the above-described invention, the compound decomposition step may be characterized in that the heat treatment is performed at a temperature at least higher than that of the nitriding step. According to this invention, it is possible to give a higher hardness and higher compressive residual stress, and it is possible to give a die casting mold that is more excellent in wear resistance and heat check resistance.

試験片の斜視図である。It is a perspective view of a test piece. 試験片の鋼種及び表面処理条件を示す図である。It is a figure which shows the steel type and surface treatment conditions of a test piece. 加熱・冷却試験装置を示す図である。It is a figure which shows a heating / cooling test apparatus. 試験片の表面近傍の変化を示す拡大断面図である。It is an expanded sectional view which shows the change of the surface vicinity of a test piece. 試験片の表面近傍の窒素濃度の変化を示す図である。It is a figure which shows the change of the nitrogen concentration of the surface vicinity of a test piece. 化合物層厚さとヒートチェック(HC)数の関係を示すグラフである。It is a graph which shows the relationship between a compound layer thickness and the number of heat checks (HC). 化合物層厚さと残留応力の関係を示すグラフである。It is a graph which shows the relationship between a compound layer thickness and a residual stress. 試験片(実施例11)の断面の写真である。It is a photograph of the section of a test piece (Example 11).

本発明によるダイカスト金型の表面処理方法について、図1乃至図8に示すような実証試験の結果を通じて、その詳細を説明する。実証試験は、ダイカスト金型に対応する円筒状の試験片1(図1を参照)を用意し、各種の表面処理を施した上でこれを評価することで行った。   The details of the surface treatment method of the die casting mold according to the present invention will be described through the results of verification tests as shown in FIGS. The demonstration test was performed by preparing a cylindrical test piece 1 (see FIG. 1) corresponding to a die-casting mold and performing various surface treatments for evaluation.

図1に示すような外径D1=15mm、内径D2=3mm及び長さL=20mmの円筒状の試験片1を用意した。試験片1は、SKD61相当の丸棒材から加工した。なお、SKD61相当材に代えて、実施例9についてはSKD7相当の丸棒材、実施例10についてはSKH51相当の丸棒材から試験片1を加工した。これらについては図2にまとめて示した。   A cylindrical test piece 1 having an outer diameter D1 = 15 mm, an inner diameter D2 = 3 mm, and a length L = 20 mm as shown in FIG. 1 was prepared. Test piece 1 was processed from a round bar material equivalent to SKD61. Instead of the SKD61 equivalent material, the test piece 1 was processed from a round bar material equivalent to SKD7 for Example 9, and from a round bar material equivalent to SKH51 for Example 10. These are summarized in FIG.

次に、試験片1を加熱炉内で加熱しながらアンモニアガスを炉内に導入し、試験片1の外周面をガス軟窒化処理した。図2に示すように、処理温度、窒化時間、ガスの配合比の各条件を与えて、それぞれの化合物層厚さの化合物層2を含む窒化層5(図4参照)を形成させた。なお、ガス軟窒化処理に代えて、実施例6についてはガス浸硫窒化処理、実施例7及び比較例5についてはプラズマ窒化処理した。   Next, ammonia gas was introduced into the furnace while heating the test piece 1 in the heating furnace, and the outer peripheral surface of the test piece 1 was subjected to gas soft nitriding treatment. As shown in FIG. 2, the nitride layer 5 (see FIG. 4) including the compound layer 2 of each compound layer thickness was formed by giving each condition of processing temperature, nitriding time, and gas mixture ratio. Instead of the gas soft nitriding treatment, the gas nitronitriding treatment was carried out for Example 6, and the plasma nitriding treatment was carried out for Example 7 and Comparative Example 5.

次に、加熱炉内からアンモニアガスを排出後、雰囲気ガスとして窒素を導入してそのまま試験片1を同じ加熱炉内で加熱処理して拡散処理し、後述するように窒化処理で生じた化合物層2(図4参照)の窒素化合物を完全に分解させた。この拡散処理の温度及び時間についても図2にまとめて示した。   Next, after exhausting the ammonia gas from the heating furnace, nitrogen is introduced as an atmospheric gas, and the test piece 1 is heat-treated in the same heating furnace as it is to be diffused, and a compound layer produced by nitriding as described later 2 (see FIG. 4) was completely decomposed. The temperature and time of this diffusion treatment are also shown in FIG.

次に、試験片1の外周面に直径0.05mm〜0.2mmのアモルファス製の小球を0.3MPaの投射圧にて投射し、ショットピーニングを行った。   Next, shot peening was performed by projecting amorphous small spheres having a diameter of 0.05 mm to 0.2 mm on the outer peripheral surface of the test piece 1 with a projection pressure of 0.3 MPa.

上記処理を与えた試験片1について、その長手方向中央部近傍の外周面の残留応力を測定した。   About the test piece 1 which gave the said process, the residual stress of the outer peripheral surface of the longitudinal direction center part vicinity was measured.

また、試験片1について、図3に示すような試験装置20で繰り返し加熱・冷却試験を行って耐ヒートチェック性を評価した。詳細には、試験片1の貫通孔1aに試験装置20の支持部22の細径部22aを挿入し、試験片1を上下からホルダ23で挟み固定した。試験片1の外周面を高周波コイル21で4秒間かけて室温から700℃まで加熱し、図示しない放水口から冷却水24を噴射して3秒間で室温まで冷却、これを1秒間エアブローで乾燥させた。かかる加熱、冷却及び乾燥のサイクルを合計1000回繰り返し、試験片1を試験装置20から取り外した。試験装置20から取り外した試験片1は、長手方向の中央部近傍を中心軸に対して垂直な平面で切断し、樹脂埋め後、切断面を鏡面研磨した。切断面を光学顕微鏡(100倍)により観察し、試験片1の外周面に発生したヒートチェック(HC)の数を測定した。   Further, the test piece 1 was repeatedly subjected to a heating / cooling test using a test apparatus 20 as shown in FIG. Specifically, the small-diameter portion 22a of the support portion 22 of the test apparatus 20 was inserted into the through hole 1a of the test piece 1, and the test piece 1 was sandwiched and fixed from above and below by the holder 23. The outer peripheral surface of the test piece 1 is heated from room temperature to 700 ° C. for 4 seconds with the high-frequency coil 21, cooled by cooling water 24 from a water outlet (not shown) to room temperature for 3 seconds, and dried by air blow for 1 second. It was. Such a heating, cooling and drying cycle was repeated 1000 times in total, and the test piece 1 was removed from the test apparatus 20. The test piece 1 removed from the test apparatus 20 was cut in the vicinity of the central portion in the longitudinal direction with a plane perpendicular to the central axis, and after filling with resin, the cut surface was mirror-polished. The cut surface was observed with an optical microscope (100 times), and the number of heat checks (HC) generated on the outer peripheral surface of the test piece 1 was measured.

なお、上記した窒化処理後の試験片1の一部は、炉から取り出して、後述する化合物層2(図4参照)の厚さの測定を行っている。炉から取り出した試験片1をその長手方向中央部近傍で中心軸に対して垂直な平面で切断し、切断面を鏡面研磨して光学顕微鏡で観察し、化合物層2の厚さを測定した。   A part of the test piece 1 after the above nitriding treatment is taken out of the furnace and the thickness of the compound layer 2 (see FIG. 4) described later is measured. The test piece 1 taken out from the furnace was cut in a plane perpendicular to the central axis in the vicinity of the central portion in the longitudinal direction, the cut surface was mirror-polished and observed with an optical microscope, and the thickness of the compound layer 2 was measured.

ところで、窒化処理では、図4(a)及び図5(a)に示すように、気相中の活性化した窒素が試験片1の外周面からその内部(基材)4へと拡散し、外周面近傍に窒化層5を形成する。窒化層5は、最表層の窒素化合物層2及びその内部側の窒素拡散層3からなる。化合物層2は、FeやCrの複合窒化物からなり、非常に脆い層である。なお、ガス窒化に比較して、プラズマ窒化ではその成長速度は非常に遅い。窒素拡散層3は、分散析出した窒化物を含む窒素の固溶層である。   By the way, in the nitriding treatment, as shown in FIGS. 4 (a) and 5 (a), activated nitrogen in the gas phase diffuses from the outer peripheral surface of the test piece 1 to the inside (base material) 4, A nitride layer 5 is formed in the vicinity of the outer peripheral surface. The nitride layer 5 is composed of the outermost nitrogen compound layer 2 and the nitrogen diffusion layer 3 on the inner side. The compound layer 2 is made of a complex nitride of Fe or Cr and is a very brittle layer. Note that the growth rate of plasma nitriding is much slower than that of gas nitriding. The nitrogen diffusion layer 3 is a solid solution layer of nitrogen containing nitride that has been dispersed and precipitated.

上記した窒化処理に続く拡散処理では、図4(b)及び図5(b)に示すように、窒化層5の深さが拡大する。詳細には、気相中から試験片1の外周面を通じて供給される窒素のフラックスが低下し、窒素拡散層3の窒素が主として試験片1の内部4へと拡散していく。ここで、化合物層2の窒素化合物が分解すると、これによって生じる窒素も試験片1の内部へと拡散していくが、化合物中に含まれる窒素濃度(図5(a)の参照符3aを参照)は、窒素拡散層3のような窒素固溶体に含まれる窒素濃度(図5(a)の参照符3bを参照)よりも大幅に高いため、大幅に窒素量の多い窒素拡散層3を得ることができる(図5(b)の参照符31を参照)。なお、窒化処理によって得られた窒素拡散層3だけを拡散処理する場合について、図5(b)の参照符32に示した。   In the diffusion process subsequent to the above nitriding process, the depth of the nitrided layer 5 is increased as shown in FIGS. 4B and 5B. Specifically, the nitrogen flux supplied from the gas phase through the outer peripheral surface of the test piece 1 decreases, and the nitrogen in the nitrogen diffusion layer 3 mainly diffuses into the interior 4 of the test piece 1. Here, when the nitrogen compound in the compound layer 2 is decomposed, the nitrogen generated thereby diffuses into the inside of the test piece 1, but the concentration of nitrogen contained in the compound (see reference numeral 3 a in FIG. 5A). ) Is significantly higher than the concentration of nitrogen contained in a nitrogen solid solution such as the nitrogen diffusion layer 3 (see reference numeral 3b in FIG. 5A), so that the nitrogen diffusion layer 3 having a significantly large amount of nitrogen is obtained. (See reference numeral 31 in FIG. 5B). The case where only the nitrogen diffusion layer 3 obtained by the nitriding treatment is subjected to the diffusion treatment is indicated by reference numeral 32 in FIG.

その一方で、化合物層2の窒素化合物が分解すると、その体積収縮のため、ボイドを多く含む表面層2’となってしまう。かかる表面層2’は、ショットピーニングにおけるショットの衝突エネルギーを吸収・散逸させ、これによる圧縮残留応力の形成を阻害してしまう。詳細については後述する。   On the other hand, when the nitrogen compound in the compound layer 2 is decomposed, the surface layer 2 ′ containing a large amount of voids is formed due to the volume shrinkage. Such a surface layer 2 'absorbs and dissipates shot collision energy in shot peening, thereby inhibiting the formation of compressive residual stress. Details will be described later.

以下に上記した測定の結果について述べる。まず、繰り返し加熱・冷却試験後のヒートチェック(HC)の数と化合物層2の厚さとの関係について図6に示した。   The results of the above measurement will be described below. First, the relationship between the number of heat checks (HC) after repeated heating / cooling tests and the thickness of the compound layer 2 is shown in FIG.

ヒートチェックの数は、化合物層2の厚さを増加させると減少し、耐ヒートチェック性を向上させ得ることが判る。すなわち、化合物層2の厚さを1.5μm及び1.0μmと薄く形成させた比較例1及び5では、ヒートチェック数はそれぞれ597本及び441本であった。これに対して、化合物層2の厚さを2〜7μmとより厚く形成させた実施例1乃至14では、ヒートチェック数は13〜257本と大幅に減少していた。特に、拡散処理を窒化処理の温度よりも低い温度で行った実施例11ではヒートチェック数は大幅に少なくなっていた。   It can be seen that the number of heat checks decreases as the thickness of the compound layer 2 is increased, and the heat check resistance can be improved. That is, in Comparative Examples 1 and 5 in which the thickness of the compound layer 2 was formed as thin as 1.5 μm and 1.0 μm, the number of heat checks was 597 and 441, respectively. On the other hand, in Examples 1 to 14 in which the thickness of the compound layer 2 was increased to 2 to 7 μm, the number of heat checks was greatly reduced to 13 to 257. In particular, in Example 11 where the diffusion treatment was performed at a temperature lower than the temperature of the nitriding treatment, the number of heat checks was significantly reduced.

上記したように、化合物層2の厚さを増加させると、拡散処理によって分解される窒素化合物の量が増加するから、窒素拡散層3の窒素量を高め、拡散処理後の硬さを高めて耐摩耗性を高めるとともに、耐ヒートチェック性を向上させるのである。   As described above, when the thickness of the compound layer 2 is increased, the amount of nitrogen compound decomposed by the diffusion treatment increases, so the amount of nitrogen in the nitrogen diffusion layer 3 is increased and the hardness after the diffusion treatment is increased. This increases the wear resistance and heat check resistance.

その一方で、ヒートチェックの数は、化合物層2の厚さを所定以上に増加させると急激に増加し、耐ヒートチェック性を大幅に低下させ得ることも判る。すなわち、化合物層2の厚さを8.0、9.0及び10.0μmと厚く形成させた比較例2、3及び4では、ヒートチェック数はそれぞれ706、707及び840本であって、実施例1乃至14に比べて急激に増加した。   On the other hand, the number of heat checks increases rapidly when the thickness of the compound layer 2 is increased to a predetermined value or more, and it can be seen that the heat check resistance can be greatly reduced. That is, in Comparative Examples 2, 3, and 4 in which the thickness of the compound layer 2 was formed as thick as 8.0, 9.0, and 10.0 μm, the number of heat checks was 706, 707, and 840, respectively. Compared to Examples 1 to 14, it increased rapidly.

上記に関して、ショットピーニングによって試験片1に与えられる圧縮残留応力と化合物層2の厚さとの関係について図7に示した。なお、図7において、圧縮残留応力は負の値で表わしている。   Regarding the above, the relationship between the compressive residual stress applied to the test piece 1 by shot peening and the thickness of the compound layer 2 is shown in FIG. In FIG. 7, the compressive residual stress is represented by a negative value.

圧縮残留応力は化合物層2の厚さを増加させると、その絶対値を増加させ得ることが判る。すなわち、化合物層2の厚さを1.5μm及び1.0μmと薄く形成させた比較例1及び5では、圧縮残留応力はそれぞれ−965MPa及び−993MPaであった。これに対して、化合物層2の厚さを2〜7μmと厚く形成させた実施例1乃至14では、圧縮残留応力は−1350MPa〜−1755MPaと大幅にその絶対値を大きくしていた。   It can be seen that the compressive residual stress can increase its absolute value when the thickness of the compound layer 2 is increased. That is, in Comparative Examples 1 and 5 in which the thickness of the compound layer 2 was formed as thin as 1.5 μm and 1.0 μm, the compressive residual stress was −965 MPa and −993 MPa, respectively. On the other hand, in Examples 1 to 14 in which the thickness of the compound layer 2 was formed to be as thick as 2 to 7 μm, the compressive residual stress was −1350 MPa to −1755 MPa, and the absolute value thereof was greatly increased.

その一方で、圧縮残留応力は化合物層2の厚さを所定以上に増加させると、その絶対値を急激に低下させ得ることも判る。すなわち、化合物層2の厚さを8.0、9.0及び10.0μmと厚く形成させた比較例2、3及び4では、圧縮残留応力はそれぞれ−1298MPa、−1251MPa、及び−938MPaであって、実施例1乃至14に比べて大幅にその絶対値が低下していた。   On the other hand, it is also found that the absolute value of the compressive residual stress can be drastically lowered when the thickness of the compound layer 2 is increased to a predetermined value or more. That is, in Comparative Examples 2, 3, and 4 in which the thickness of the compound layer 2 was formed as thick as 8.0, 9.0, and 10.0 μm, the compressive residual stresses were −1298 MPa, −1251 MPa, and −938 MPa, respectively. Thus, the absolute value was significantly lower than in Examples 1 to 14.

以上のように、化合物層2の厚さを所定以上に増加させると圧縮残留応力の絶対値を大幅に低下させ、耐ヒートチェック性を大幅に低下させる。これは化合物層2の化合物が分解して形成されるボイドを多く含む表面層2’(図4(b)参照)のためである。すなわち、化合物層2が厚くなることで、拡散処理によって表面層2’も厚く形成され、ショットピーニングによる圧縮残留応力の形成が急激に阻害されて、結果として、耐ヒートチェック性が大幅に低下するのである。   As described above, when the thickness of the compound layer 2 is increased to a predetermined value or more, the absolute value of the compressive residual stress is greatly reduced, and the heat check resistance is greatly reduced. This is because of the surface layer 2 ′ (see FIG. 4B) containing many voids formed by decomposition of the compound of the compound layer 2. That is, by increasing the thickness of the compound layer 2, the surface layer 2 ′ is also thickly formed by the diffusion treatment, and the formation of compressive residual stress by shot peening is rapidly inhibited, and as a result, the heat check resistance is greatly reduced. It is.

ところで、図8(a)は、実施例11における窒化処理後の試験片1の切断面の光学顕微鏡写真である。また、図8(b)は、実施例11における窒化処理に続いて拡散処理を与えた後の試験片1の切断面の光学顕微鏡写真である。前者においては、化合物層2及び窒素拡散層3が観察される。一方、後者においては、窒素拡散層3の厚さの増加が観察されるとともに、化合物が分解して特に窒素拡散層3に近い側に黒くボイドを含む表面層2’が観察される。   Incidentally, FIG. 8A is an optical micrograph of the cut surface of the test piece 1 after nitriding in Example 11. FIG. FIG. 8B is an optical micrograph of the cut surface of the test piece 1 after the diffusion treatment was applied following the nitriding treatment in Example 11. In the former, the compound layer 2 and the nitrogen diffusion layer 3 are observed. On the other hand, in the latter, an increase in the thickness of the nitrogen diffusion layer 3 is observed, and a surface layer 2 ′ containing black voids is observed particularly on the side close to the nitrogen diffusion layer 3 due to decomposition of the compound.

以上のことから、化合物層2の厚さ、つまり化合物が分解された後に残るボイドを含む表面層2’の厚さを一定に制限することで、ショットピーニングによる圧縮残留応力を良好に与え得て、耐ヒートチェック性に優れるダイカスト金型を与え得る。特に、実施例のような一般的なショットピーニングの条件の下では、化合物層2(化合物が分解された後に残る表面層2’)の厚さは、2〜7μmであることが好ましい。   From the above, the compressive residual stress due to shot peening can be given satisfactorily by limiting the thickness of the compound layer 2, that is, the thickness of the surface layer 2 ′ including voids remaining after the compound is decomposed. It is possible to provide a die-casting mold having excellent heat check resistance. In particular, the thickness of the compound layer 2 (surface layer 2 ′ remaining after the compound is decomposed) is preferably 2 to 7 μm under general shot peening conditions as in the examples.

ところで、実施例6及び7のような、ガス軟窒化とガス侵硫窒化及びプラズマ窒化などの窒化処理の差異、及び、実施例9及び実施例10のようなSKD61相当材とSKD7相当材及びSKH51相当材の鋼材の差異について、図6及び図7の化合物層2の厚さとヒートチェック数及び圧縮残留応力との関係は同一のプロット線上に並ぶ。すなわち、窒化処理の差異、及び、一般的な金型材の差異に関係なく、本実施例の方法を適用し得ることが示唆される。   By the way, the difference between nitriding treatments such as gas soft nitriding, gas oxynitriding and plasma nitriding as in Examples 6 and 7, and SKD61 equivalent material, SKD7 equivalent material and SKH51 as in Example 9 and Example 10 are used. Regarding the difference in equivalent steel materials, the relationship between the thickness of the compound layer 2 in FIGS. 6 and 7, the number of heat checks, and the compressive residual stress is aligned on the same plot line. That is, it is suggested that the method of this embodiment can be applied regardless of differences in nitriding treatment and differences in general mold materials.

以上、本実施例によるダイカスト金型の表面処理方法は、加熱炉内に少なくともアンモニアガスを含むガスを導入するガス軟窒化、ガス侵硫窒化、プラズマ窒化などの窒化処理により金型意匠面に窒素化合物からなる化合物層を含む窒化層を形成する窒化ステップと、加熱炉内からアンモニアガスを排出するとともに雰囲気ガスを導入して加熱処理し窒素化合物を分解させる化合物分解ステップと、金型意匠面にショットピーニングを行うショットピーニングステップと、を含む。ここで、窒化ステップは2〜7ミクロンの範囲内の厚さの化合物層を少なくとも含む窒化層を形成するステップである。   As described above, the surface treatment method of the die casting mold according to the present embodiment is such that nitrogen is applied to the mold design surface by nitriding treatment such as gas soft nitriding, gas impregnating nitriding, plasma nitriding which introduces at least ammonia gas into the heating furnace. A nitriding step for forming a nitride layer including a compound layer made of a compound, a compound decomposing step for discharging ammonia gas from the heating furnace and introducing an atmospheric gas to decompose nitrogen compounds, and a mold design surface A shot peening step for performing shot peening. Here, the nitriding step is a step of forming a nitride layer including at least a compound layer having a thickness in the range of 2 to 7 microns.

少なくともアンモニアガスを含むガスを加熱炉内に導入して行う窒化処理によって形成される窒素化合物層を所定の厚さに制御することで、この窒素化合物を化合物分解ステップにおいて分解し、結果として、窒素化合物層を実質的に与えず、これによって生じた窒素により金型に供給される窒素量を増やし、高い硬さを有する窒素拡散層を与えることができる。その上で、実質的に消失する窒素化合物層はボイドを多く含む層となって残存しショットピーニングにおけるショットの衝突エネルギーを吸収・散逸させてしまう。しかしながら、窒化ステップにおいてこの窒素化合物層をやはり所定の厚さに制御することで、ショットピーニングによる圧縮残留応力を窒素拡散層に付与可能としている。すなわち、高い硬さと高い圧縮残留応力により、耐摩耗性及び耐ヒートチェック性に優れるダイカスト金型を与え得るのである。   By controlling the nitrogen compound layer formed by nitriding performed by introducing a gas containing at least ammonia gas into the heating furnace to a predetermined thickness, the nitrogen compound is decomposed in the compound decomposition step. A nitrogen diffusion layer having a high hardness can be provided without substantially providing a compound layer and increasing the amount of nitrogen supplied to the mold by nitrogen generated thereby. In addition, the nitrogen compound layer that substantially disappears remains as a layer containing a large amount of voids, and absorbs and dissipates the shot collision energy in shot peening. However, by controlling the nitrogen compound layer to a predetermined thickness in the nitriding step, compressive residual stress due to shot peening can be applied to the nitrogen diffusion layer. That is, a die-cast mold having excellent wear resistance and heat check resistance can be provided by high hardness and high compressive residual stress.

ここまで本発明による代表的実施例及びこれに基づく変形例について説明したが、本発明は必ずしもこれらに限定されるものではない。すなわち、当業者であれば、添付した特許請求の範囲を逸脱することなく、種々の代替実施例及び改変例を見出すことができるだろう。   Up to this point, the representative embodiments according to the present invention and the modifications based thereon have been described, but the present invention is not necessarily limited thereto. That is, those skilled in the art will be able to find various alternative embodiments and modifications without departing from the scope of the appended claims.

1 試験片
2 化合物層
3 窒素拡散層
5 窒化層
20 試験装置
DESCRIPTION OF SYMBOLS 1 Test piece 2 Compound layer 3 Nitrogen diffusion layer 5 Nitride layer 20 Test apparatus

Claims (2)

金型意匠面に圧縮残留応力を与えて提供されるダイカスト金型の表面処理方法であって、
加熱炉内に少なくともアンモニアガスを含むガスを導入して前記金型意匠面に窒素化合物からなる化合物層を含む窒化層を形成する窒化ステップと、
前記加熱炉内からアンモニアガスを排出するとともに雰囲気ガスを導入して加熱処理し前記窒素化合物を分解させる化合物分解ステップと、
前記金型意匠面にショットピーニングを行うショットピーニングステップと、を含み、
前記窒化ステップは2〜7ミクロンの範囲内の厚さの前記化合物層を少なくとも含む前記窒化層を形成するステップであることを特徴とするダイカスト金型の表面処理方法。
A die casting surface treatment method provided by applying compressive residual stress to the mold design surface,
A nitriding step of introducing a gas containing at least ammonia gas into a heating furnace to form a nitride layer including a compound layer made of a nitrogen compound on the mold design surface;
A compound decomposing step of decomposing the nitrogen compound by discharging ammonia gas from the inside of the heating furnace and introducing an atmosphere gas to heat treatment;
Shot peening step of performing shot peening on the mold design surface,
The surface treatment method of a die casting mold, wherein the nitriding step is a step of forming the nitride layer including at least the compound layer having a thickness in a range of 2 to 7 microns.
前記化合物分解ステップは、前記加熱処理を前記窒化ステップよりも少なくとも低い温度で行うことを特徴とする請求項1記載のダイカスト金型の表面処理方法。
2. The surface treatment method of a die casting mold according to claim 1, wherein in the compound decomposition step, the heat treatment is performed at a temperature lower than that of the nitriding step.
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