JP2011221078A - Array substrate and liquid crystal display device comprising the same - Google Patents

Abstract

In a liquid crystal display device having a color filter on the array substrate side, an array substrate capable of maintaining a uniform cell thickness without increasing manufacturing steps and a liquid crystal display device including the same are provided. .
An array for use in a liquid crystal display element comprising an array substrate, a counter substrate disposed opposite to the array substrate with a predetermined gap, and a liquid crystal layer sandwiched between the two substrates An array substrate comprising, on a transparent substrate, at least a pixel electrode, a thin film transistor for driving the pixel electrode, and a colored pixel composed of a plurality of colored layers provided so as to cover the thin film transistor. At least two or more layers are used to laminate a spacer for holding a predetermined gap via the counter substrate and the liquid crystal material.
[Selection] Figure 6

Description

  The present invention relates to an array substrate for a liquid crystal display device, and more particularly to a liquid crystal display device having a color filter on the array substrate side.

  Color liquid crystal display devices are rapidly spreading mainly in computer terminal display devices and television image display devices. As shown in FIG. 1, the color liquid crystal display device includes an array substrate (2), a counter substrate (1) disposed opposite to the array substrate with a predetermined gap therebetween, and a narrow space between the two substrates. A liquid crystal display element composed of a held liquid crystal layer (4), and one of the array substrate (2) and the counter substrate (1) is usually red (R) for colorization. ), Green (G), and blue (B) are provided with a color filter composed of colored layers of three colors.

  In recent years, this liquid crystal display device has various demands such as high contrast, high viewing angle, low power consumption, etc., and the same requirements have been achieved for color filters indispensable for color display of liquid crystal display devices. There is a need to. Usually, the color filter is provided on the counter substrate, but recently, for example, as disclosed in Patent Documents 1 and 2, a black matrix (hereinafter referred to as “BM”) formed of these colored pixels and resin. Attempts have also been made to form () on the array substrate side.

  Until now, in order to prevent display defects due to misalignment between the array substrate and the counter substrate, the BM provided in the color filter has to be provided wider than the wiring on the array substrate side, and the aperture ratio of the pixel is increased. There was a problem that it could not be improved. On the other hand, such a problem can be solved by forming the color filter on the array substrate side.

  FIG. 2 shows an example of a structure in which a colored layer constituting the color filter is formed on the array substrate side. Cross section of an example of a liquid crystal display device (MVA (Multi-domain Vertical Alignment) -LCD) having a wide viewing angle and controlled so that the alignment directions of liquid crystal molecules in one pixel are a plurality of directions. It is explanatory drawing which showed typically.

  As shown in FIG. 2, this MVA liquid crystal display device has a counter substrate (a common substrate (13) having a slit (14) provided on a glass substrate (11) through a liquid crystal layer (4)). 1) and an array substrate (2) provided with a thin film transistor layer (3), a colored layer (23), a pixel electrode (24), and a protrusion (25) on a glass substrate (21). The protrusion (25) and the slit (14) are provided at alternate positions in one pixel. These protrusions (25) and slits (14) have a function of controlling the alignment of liquid crystal molecules. This liquid crystal display device controls the alignment of liquid crystal molecules by providing protrusions and slits instead of rubbing treatment. The pixel electrode (24) is a transparent conductive film made of ITO (indium tin oxide), zinc oxide, tin oxide, or the like, and is provided on the colored layer (23) by photoetching and separated for each pixel. Yes. The pixel electrode is connected to the thin film transistor layer (3) through the drain electrode (36) through a contact hole formed in the colored layer by using a photolithography method, and the liquid crystal is driven for each pixel by applying a voltage. It is possible. Around the array substrate, there are a gate line driver and a data line driver as a drive circuit, and a controller for controlling them.

FIG. 3 shows an example of a structure in which a colored layer and a BM constituting the color filter are formed on the array substrate side, and the BM (28) is formed on the thin film transistor layer (3). By forming the colored layer and the BM on the array substrate side, not only the aperture ratio of the pixel is improved, but also TN (T
In a liquid crystal display device using a liquid crystal driving method that does not require alignment dividing slits (14) or protrusions (19) on the counter substrate (1) side, such as a twisted nematic (PSA) method or a PSA (Polymer Sustained Alignment) method. In (1), since the common electrode (13) and the solid film of the alignment film (15) may be formed on the glass substrate (11), the counter substrate (1) and the array substrate (2) at the time of manufacturing the liquid crystal panel are used. Since alignment is not required in the bonding process, the tact time can be improved.

  Conventionally, in order to maintain a constant gap between the counter substrate (1) and the array substrate (2), a method of spreading bead spacers on the pixels has been common. However, since this method cannot intentionally arrange the bead spacers, various problems have occurred due to the bead spacers scattered on the pixels. For example, the cell thickness is not uniform due to the aggregation of the bead spacers, the contrast is lowered due to poor alignment of the liquid crystal near the bead spacers, and the bright spot is defective due to the alignment film being lost due to the bead spacers.

  For this reason, as shown in FIG. 4, a liquid crystal display device in which spacers are formed by overlapping colored layers has been proposed (see, for example, Patent Documents 3, 4, 5, and 6).

  As shown in Patent Document 3, if the spacer formed by overlaying the colored layers includes a transparent electrode that does not have a sufficient protective layer, the transparent electrode cracks due to pressure application during liquid crystal panel production, The crack itself and the fragments of the transparent electrode released by the crack cause display defects. For this reason, Patent Documents 4 and 5 propose that an insulating spacer be formed on the transparent electrode from the viewpoint of preventing damage to the transparent electrode and preventing short circuit between the array substrate (2) and the counter substrate (1). However, in any of the proposals, the number of manufacturing steps is increased in the liquid crystal drive method that does not require the alignment dividing slits (14) and the protrusions (19) on the counter substrate (1) side such as the TN method and the PSA method. Therefore, it is not preferable.

Japanese Patent No. 2758410 Japanese Patent Laid-Open No. 2001-154013 Japanese Patent No. 2547523 Japanese Patent No. 3651874 Japanese Patent No. 3255107

  The present invention has been made to solve the above problems, and in a liquid crystal display device having a color filter on the array substrate side, it is possible to maintain a uniform cell thickness without increasing the number of manufacturing steps. It is an object to provide a simple array substrate and a liquid crystal display device including the same.

The first invention according to claim 1 of the present invention is:
A transparent substrate in an array substrate used for a liquid crystal display element comprising an array substrate, a counter substrate disposed opposite to the array substrate with a predetermined gap, and a liquid crystal layer sandwiched between the two substrates And an array substrate comprising at least a pixel electrode, a thin film transistor for driving the pixel electrode, and a colored pixel comprising a colored layer of a plurality of colors provided so as to cover the thin film transistor,
The array substrate is characterized in that a spacer for holding a predetermined gap is laminated on the counter substrate and the liquid crystal material using at least two or more of the colored layers.

Next, a second invention according to claim 2 of the present invention is as follows:
A transparent substrate in an array substrate used for a liquid crystal display element comprising an array substrate, a counter substrate disposed opposite to the array substrate with a predetermined gap, and a liquid crystal layer sandwiched between the two substrates An array substrate comprising at least a pixel electrode, a thin film transistor for driving the pixel electrode, a colored pixel comprising a plurality of colored layers provided to cover the thin film transistor, and a light shielding layer for partitioning the colored pixel. And
The array substrate is characterized in that a spacer for holding a predetermined gap is laminated and formed between the counter substrate and the liquid crystal material using at least two layers of the light shielding layer and the colored layer.

Next, a third invention according to claim 3 of the present invention is
The array substrate according to claim 1, a counter substrate disposed opposite to the array substrate with a predetermined gap, and a liquid crystal layer sandwiched between the two substrates. A liquid crystal display device comprising a liquid crystal display element.

Next, a fourth invention according to claim 4 of the present invention is:
A counter substrate constituting a liquid crystal display element included in the liquid crystal display device according to claim 3 is a transparent substrate, at least a transparent electrode that covers the transparent substrate, and an alignment film that covers the transparent electrode. It is a liquid crystal display device characterized by being formed.

  According to the present invention, it is possible to maintain a uniform cell thickness without increasing the number of manufacturing steps or reducing productivity by providing a color filter and a laminated spacer together on the array substrate side. An array substrate and a liquid crystal display device with good display quality can be manufactured.

It is a partial cross-sectional schematic diagram of an example liquid crystal display element of the normal liquid crystal display device of a MVA system. It is a partial cross-section schematic diagram of an example liquid crystal display element in which colored pixels were formed on the array substrate side. It is a partial cross-sectional schematic diagram of an example liquid crystal display element in which the light shielding layer and the colored pixel were formed in the array substrate side. It is the partial cross-section schematic diagram of an example liquid crystal display element which laminated | stacked the conventional colored layer of the opposing board | substrate, and formed the spacer. It is a schematic diagram of the plane in an example of the array substrate used for a liquid crystal display device. It is the partial cross section schematic diagram of an example liquid crystal display element which laminated | stacked the colored layer on the array substrate side, and formed the spacer based on the liquid crystal display device of this invention. It is the partial cross section schematic diagram of an example of the liquid crystal display element which laminated | stacked the light shielding layer and the colored layer on the array substrate side, and formed the spacer based on the liquid crystal display device of this invention.

  Hereinafter, a liquid crystal display device including an array substrate according to the present invention and a liquid crystal display element formed using the array substrate will be described in detail based on an embodiment thereof. Note that, in the following description, the same reference numerals are used for the components having the same functions in the following description without distinguishing them from conventional ones.

  The liquid crystal display device according to the present invention includes a liquid crystal display element in which a color filter and a laminated spacer are provided on the array substrate side. An example of the embodiment is shown in FIGS. Shown in

  Compared to a conventional structure in which a color filter is formed on the counter substrate side and a multi-layer spacer is formed at the same time, a liquid crystal display element provided with the color filter and the multi-layer spacer is provided on the array substrate side of the present invention. Such a liquid crystal display device can be expected to reduce costs due to a reduction in the number of processes or a reduction in tact time.

  When a conventional color filter substrate is used as a counter substrate, the manufacturing process required before the alignment film coating and the subsequent panel bonding process is performed by using, for example, R, G, B colored pixels and at least two or more of them as laminated spacers. Forming a colored electrode and a common electrode made of a transparent conductive film such as ITO on the colored pixel and the laminated spacer, and an alignment control process such as VA (Vertical Alignment) formation or slit formation. In order to prevent a short circuit between the color filter substrate and the array substrate, an insulating process is performed in which the ITO film in the laminated spacer portion is covered with a VA material or the ITO in the PS portion is removed by etching ITO. Need. The corresponding array substrate at this time consists of a TFT formation step and a pixel electrode formation step by ITO film formation or slit formation. That is, when the liquid crystal driving method is VA and IPS (In Plane Switching), there are at least five steps, and when the liquid crystal driving method is TN and PSA, at least six steps. If there is a laminated spacer on the color filter side of the counter substrate, this process is performed simultaneously with the VA formation and the ITO slit formation. However, in the case of a liquid crystal drive system such as TN or PSA, the process is increased because this process is not originally present.

  On the other hand, when the laminated spacer is formed on the TFT side of the array substrate according to the present invention, the manufacturing process is an ITO transparent electrode film forming process and an orientation control process in the counter substrate, and the corresponding array substrate is formed in TFT. And a pixel electrode forming step by RGB forming step, ITO film forming or slit forming. That is, when the liquid crystal driving method is TN, PSA, or IPS, there are at least four steps, and when the liquid crystal driving method is VA, there are at least five steps. In this case, since the ITO in the laminated spacer portion can be removed by a necessary pixel electrode formation process, the number of processes is not increased by any liquid crystal driving method.

  Furthermore, when the liquid crystal drive method does not require alignment control on the counter substrate side such as TN or PSA, alignment is free when the array substrate and the counter substrate are bonded, and the tact time can be greatly reduced. Become. When a conventional color filter substrate is used as a counter substrate, a laminated spacer is formed on the BM. On the array substrate side of the present invention, a laminated spacer is formed on the gate line and the common wiring.

The liquid crystal display device according to the present invention includes at least a pixel electrode (24), a thin film transistor (3) for driving the pixel electrode, and a plurality of colored pixels (23) provided so as to cover the thin film transistor. (2) and a counter substrate (1) disposed opposite to the array substrate while maintaining a predetermined gap, and the pixels of the plurality of colors are composed of at least a colored layer. A plurality of colors include a combination of red, green, and blue (RGB), and a combination in which yellow, magenta, and cyan are added. The array substrate and the liquid crystal display device of the present invention can be particularly preferably applied to an RGB system. .

  The transparent substrate used in the liquid crystal display device according to the present invention preferably has a certain transmittance with respect to visible light, and preferably has a transmittance of 80% or more. Generally, it may be one used in a liquid crystal display device, and examples thereof include a plastic substrate such as PET and glass, but a glass substrate is usually used.

  As shown in FIGS. 5, 6, and 7, the array substrate includes a gate line (38) and a gate electrode (31) made of a metal such as molybdenum, tungsten, or an alloy thereof on a transparent substrate, and covers them. Thus, a gate insulating film (32) made of silicon oxide, silicon nitride or the like is arranged. Further, a semiconductor layer (34) such as amorphous silicon is disposed on the gate insulating film, and further, a source line (37), a source electrode (35), and a drain electrode (36) made of molybdenum or aluminum are disposed, thereby switching elements. Is forming. A protective layer (33) made of silicon oxide, silicon nitride or the like is disposed on the switching element.

  The colored layer and the light shielding layer can be formed on the array substrate by any known method such as an inkjet method, a printing method, a photolithography method, or an etching method. In consideration of high definition, controllability and reproducibility of spectral characteristics, a colored resin composition in which a pigment is dispersed in a transparent resin together with a photoinitiator and a polymerizable monomer in an appropriate solvent is applied onto the array substrate. A photolithography method is preferred in which a colored film is formed by repeating the process of forming a colored layer of one color by forming a coated film and pattern exposing and developing the coated film for each color.

  When the colored layer and the light-shielding layer constituting the pixel provided on the array substrate side used in the liquid crystal display device according to the present invention are prepared by photolithography by preparing a colored resin composition, for example, the following method is used. A pigment serving as a colorant is dispersed in a suitable solvent together with a photoinitiator and a polymerizable monomer in a transparent resin. There are various methods such as mill base, three rolls, jet mill and the like, and there are no particular limitations.

  A specific example of a color pigment that can be used for a colored resin composition, which is suitable for forming a colored layer constituting a pixel included in the array substrate of the present invention, is indicated by a color index number.

  Examples of red coloring compositions for forming red pixels include C.I. I. Pigment Red 7, 9, 14, 41, 48: 1, 48: 2, 48: 3, 48: 4, 81: 1, 81: 2, 81: 3, 97, 122, 123, 146, 149, 168, 177, 178, 179, 180, 184, 185, 187, 192, 200, 202, 208, 210, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 246, 254, 255, Red pigments such as H.264, 272, and 279 can be used. A yellow pigment and an orange pigment can be used in combination with the red coloring composition.

Examples of yellow pigments include C.I. I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 1
27, 128, 129, 137, 138, 139, 144, 146, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214 and the like. As orange pigments, C.I. I. Pigment Orange 36, 43, 51, 55, 59, 61, 71, 73 and the like.

  Examples of the green coloring composition for forming a green pixel include C.I. I. Pigment Green 7, 10, 36, 37, 58, or other green pigments can be used. The green coloring composition can be used in combination with the same yellow pigment as the red coloring composition.

  Examples of the blue coloring composition for forming a blue pixel include C.I. I. Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 80, etc., preferably C.I. I. Pigment Blue 15: 6 can be used. In addition, C.I. I. Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 42, 50 and the like, preferably C.I. I. Pigment Violet 23 can be used in combination.

  In combination with the organic pigment, an inorganic pigment may be used in combination in order to ensure good coatability, sensitivity, developability and the like while balancing saturation and lightness. Inorganic pigments include yellow lead, zinc yellow, red bean (red iron oxide (III)), cadmium red, ultramarine, bitumen, chromium oxide green, cobalt green and other metal oxide powders, metal sulfide powders, metal powders, etc. Can be mentioned. Furthermore, for color matching, a dye can be contained within a range that does not lower the heat resistance.

As the light-shielding agent used in the light-shielding coloring composition forming the light-shielding layer, a mixture of colored pigments such as red, blue, green, yellow, and purple can be used in addition to carbon black and titanium oxide. As carbon black used as a light-shielding agent, carbon blacks # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 970, # 960, # 950, # 900, # 850 manufactured by Mitsubishi Chemical Corporation, MCF88, # 650, MA600, MA7, MA8, MA11, MA100, MA220, IL30B, IL31B, IL7B, IL11B, IL52B, # 4000, # 4010, # 55, # 52, # 50, # 47, # 45, # 44 , # 40, # 33, # 32, # 30, # 20, # 10, # 5, CF9, # 3050, # 3150, # 3250, # 3750, # 3950, Diamond Black A, Diamond Black N220M, Diamond Black N234 , Diamond black I, diamond black LI, diamond black II, diamond Rack 339, diamond black SH, diamond black SHA, diamond black LH, diamond black H, diamond black HA, diamond black SF, diamond black N550M, diamond black E, diamond black G, diamond black R, diamond black N760M, diamond black LR . Carbon black thermax N990, N991, N907, N908, N990, N991, N908 made by Cancarb. Carbon black Asahi # 80, Asahi # 70, Asahi # 70L, Asahi F-200, Asahi # 66, Asahi # 66HN, Asahi # 60H, Asahi # 60U, Asahi # 60, Asahi # 55, Asahi # 50H, Asahi # 51, Asahi # 50U, Asahi # 50, Asahi # 35, Asahi # 15, Asahi Thermal, Degussa carbon black ColorBlack Fw200, ColorBlack Fw2, ColorBlack Fw2V, ColorBlack Fw1, ColorBlack
Fw18, ColorBlack S170, ColorBlack S160, SpecialBlack6, SpecialBlack5, SpecialBlack4, SpecialBlack4A, PrintexU, PrintexV, Printex1
40U, Printex 140V, etc. are mentioned.

  As the light-shielding agent used for the resin BM formed on the array substrate side, a mixture of carbon black and a coloring pigment is preferable from the relationship between relative permittivity and transmittance. If the relative dielectric constant of the resin BM is high, signal transmission between wirings and between wirings and pixel electrodes is affected, which may cause display defects such as RC delay and crosstalk. The relative dielectric constant of the resin BM is preferably 10 or less, more preferably 6 or less. The addition amount of the light-shielding agent in the coloring composition is preferably 35% by mass to 50% by mass. When the addition amount of the light-shielding agent is 35% by mass or less, sufficient light-shielding property cannot be obtained, and when the addition amount of the light-shielding agent is 50% by mass or more, sufficient patterning property cannot be obtained as BM. The light shielding property is represented by a common logarithm of the reciprocal of the transmittance called an OD (Optical Density) value. In order to maintain a sufficient light-shielding property, an OD value of 3.5 or more is required for the entire resin BM.

  The transparent resin that can be used for the colored resin composition, which is suitable for forming the colored layer and the light shielding layer constituting the pixels included in the array substrate used in the liquid crystal display device of the present invention, has a visible light region of 400 to 700 nm. The resin has a transmittance of preferably 80% or more, more preferably 95% or more in the entire wavelength region. The transparent resin includes a thermoplastic resin, a thermosetting resin, and a photosensitive resin. If necessary, the transparent resin can be used alone or in admixture of two or more monomers or oligomers that are precursors thereof that are cured by irradiation with radiation to produce a transparent resin.

  Examples of such resins include polyester resins, polystyrene, styrene-maleic acid copolymers, polyimide resins, epoxy resins, benzoguanamine resins, melamine resins, urea resins, novolac resins, polyvinylphenol resins, and modified ones thereof. Etc. Among these, a photopolymerizable unsaturated group-containing resin obtained by further reacting a reaction product of an epoxy resin and an unsaturated group-containing carboxylic acid or its anhydride with a polybasic carboxylic acid or its anhydride, or a novolak A resin, a resin having a phenolic hydroxyl group such as a polyvinylphenol resin, or a modified resin thereof is particularly preferable from the viewpoint of developability, patterning characteristics, cost, and the like.

  Examples of the thermoplastic resin include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyurethane resin, and polyester resin. , Acrylic resins, alkyd resins, polystyrene, polyamide resins, rubber resins, cyclized rubber resins, celluloses, polyethylene, polybutadiene, polyimide resins, and the like. Examples of the thermosetting resin include epoxy resins, benzoguanamine resins, rosin-modified maleic acid resins, rosin-modified fumaric acid resins, melamine resins, urea resins, and phenol resins.

  Examples of the photosensitive resin include (meth) acrylic compounds having a reactive substituent such as an isocyanate group, an aldehyde group, and an epoxy group on a linear polymer having a reactive substituent such as a hydroxyl group, a carboxyl group, or an amino group, A resin obtained by reacting an acid and introducing a photocrosslinkable group such as a (meth) acryloyl group or a styryl group into the linear polymer is used. In addition, linear polymers containing acid anhydrides such as styrene-maleic anhydride copolymers and α-olefin-maleic anhydride copolymers can be obtained from (meth) acrylic compounds having hydroxyl groups such as hydroxyalkyl (meth) acrylates. Half-esterified products are also used.

Examples of polyfunctional polymerizable monomers and oligomers that can be used include methyl (meth) acrylate, ethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, cyclohexyl (meth) acrylate, β-carboxyethyl (meth) acrylate, diethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, trimethylolpropane tri (Meth) acrylate, polyethylene glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, 1,6-hexanediol diglycidyl ether di (meth) acrylate Bisphenol A diglycidyl ether di (meth) acrylate, neopentyl glycol diglycidyl ether di (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tricyclodecanyl (meth) acrylate, ester acrylate, melamine (meth) Various acrylic esters and methacrylic esters such as acrylate, (meth) acrylic ester of methylolated melamine, epoxy (meth) acrylate, various acrylic esters such as urethane acrylate and methacrylic ester, (meth) acrylic acid, styrene, Vinyl acetate, hydroxyethyl vinyl ether, ethylene glycol divinyl ether, pentaerythritol trivinyl ether, (meth) acrylamide, N-hydro Shimechiru (meth) acrylamide, N- vinylformamide and acrylonitrile. Moreover, it is preferable to use the polyfunctional urethane acrylate which has the (meth) acryloyl group obtained by making polyfunctional isocyanate react with the (meth) acrylate which has a hydroxyl group. The combination of the (meth) acrylate having a hydroxyl group and the polyfunctional isocyanate is arbitrary and is not particularly limited. Moreover, one type of polyfunctional urethane acrylate may be used alone, or two or more types may be used in combination. These can be used alone or in admixture of two or more.

  When the composition is cured by ultraviolet irradiation, a photopolymerization initiator or the like is added to the colored resin composition. Examples of the photopolymerization initiator include 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- Acetophenone compounds such as hydroxycyclohexyl phenyl ketone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyl Benzoin compounds such as dimethyl ketal, benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4-benzoyl-4 Benzophenone-based compounds such as methyldiphenyl sulfide, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4- Thioxanthone compounds such as diisopropylthioxanthone and 2,4-diethylthioxanthone, 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p- Methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2-piphenyl-4,6-bis ( Trichloromethyl) -s-triazine, 2-piperonyl-4, -Bis (trichloromethyl) -s-triazine, 2,4-bis (trichloromethyl) -6-styryl-s-triazine, 2- (naphth-1-yl) -4,6-bis (trichloromethyl) -s -Triazine, 2- (4-methoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl- (piperonyl) -6-triazine, 2,4- Triazine compounds such as trichloromethyl (4′-methoxystyryl) -6-triazine, 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)], O- (acetyl ) -N- (1-phenyl-2-oxo-2- (4′-methoxy-naphthyl) ethylidene) hydroxylamine and other oxime ester compounds, bis (2,4,6) Phosphine compounds such as trimethylbenzoyl) phenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, quinone compounds such as 9,10-phenanthrenequinone, camphorquinone, ethylanthraquinone, borate compounds, carbazole compounds Compounds, imidazole compounds, titanocene compounds and the like are used. These photopolymerization initiators can be used alone or in combination. The amount of the photopolymerization initiator used is preferably 0.5 to 50% by mass, more preferably 3 to 30% by mass, based on the total solid content of the colored composition.

  Furthermore, as a sensitizer, α-acyloxy ester, acylphosphine oxide, methylphenylglyoxylate, benzyl, 9,10-phenanthrenequinone, camphorquinone, ethylanthraquinone, 4,4′-diethylisophthalo Compounds such as phenone, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoate Ethyl acetate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, N, N-dimethylparatoluidine, 4,4′-bis (dimethylamino) benzophenone, 4 , 4'- Scan (diethylamino) benzophenone, can be used in combination of 4,4'-bis (ethylmethylamino) amine compounds such as benzophenone. These sensitizers can be used alone or in combination. The amount of the sensitizer used is preferably 0.5 to 60% by mass, more preferably 3 to 40% by mass based on the total amount of the photopolymerization initiator and the sensitizer. Moreover, it is preferable to use together a polymerization initiator and a photosensitizer. As a sensitizer, can also be used in combination.

  Surfactants include polyoxyethylene alkyl ether sulfate, sodium dodecylbenzenesulfonate, alkali salt of styrene-acrylic acid copolymer, sodium alkylnaphthalenesulfonate, sodium alkyldiphenyletherdisulfonate, lauryl sulfate monoethanolamine, lauryl Anionic surfactants such as triethanolamine sulfate, ammonium lauryl sulfate, monoethanolamine stearate, sodium stearate, sodium lauryl sulfate, monoethanolamine of styrene-acrylic acid copolymer, polyoxyethylene alkyl ether phosphate; Polyoxyethylene oleyl ether, polyoxyethylene lauryl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene Nonionic surfactants such as alkyl ether phosphates, polyoxyethylene sorbitan monostearate, and polyethylene glycol monolaurate; chaotic surfactants such as alkyl quaternary ammonium salts and their ethylene oxide adducts; alkyldimethylamino Examples include amphoteric surfactants such as alkylbetaines such as betaine acetate and alkylimidazolines, and these can be used alone or in admixture of two or more.

  Furthermore, the colored resin composition can contain a polyfunctional thiol that functions as a chain transfer agent. The polyfunctional thiol may be a compound having two or more thiol groups. For example, hexanedithiol, decanedithiol, 1,4-butanediol bisthiopropionate, 1,4-butanediol bisthioglycolate, ethylene Glycol bisthioglycolate, ethylene glycol bisthiopropionate, trimethylolpropane tristhioglycolate, trimethylolpropane tristhiopropionate, trimethylolpropane tris (3-mercaptobutyrate), pentaerythritol tetrakisthioglycolate, Pentaerythritol tetrakisthiopropionate, trimercaptopropionic acid tris (2-hydroxyethyl) isocyanurate, 1,4-dimethylmercaptobenzene, 2,4,6-trimercap -s- triazine, 2- (N, N- dibutylamino) -4,6-dimercapto -s- triazine. These polyfunctional thiols can be used alone or in combination. The amount of the polyfunctional thiol used is preferably 0.1 to 30% by mass, more preferably 1 to 20% by mass, based on the total solid content of the colored composition. If it is less than 0.1% by mass, the effect of adding a polyfunctional thiol is insufficient, and if it exceeds 30% by mass, the sensitivity is too high and the resolution is lowered.

  The colored resin composition can contain a storage stabilizer in order to stabilize the viscosity with time of the composition. Examples of the storage stabilizer include quaternary ammonium chlorides such as benzyltrimethyl chloride and diethylhydroxyamine, organic acids such as lactic acid and oxalic acid, and organic acids such as methyl ether, t-butylpyrocatechol, triethylphosphine, and triphenylphosphine. Examples thereof include phosphine and phosphite. The storage stabilizer can be contained in an amount of 0.1 to 10 parts by mass with respect to 100 parts by mass of the pigment in the colored composition.

  The colored resin composition can also contain an adhesion improver such as a silane coupling agent in order to enhance the adhesion to the substrate. Examples of the silane coupling agent include vinyl silanes such as vinyltris (β-methoxyethoxy) silane, vinylethoxysilane, and vinyltrimethoxysilane, (meth) acrylsilanes such as γ-methacryloxypropyltrimethoxysilane, β- (3 , 4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) methyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, β- (3,4-epoxycyclohexyl) ) Epoxysilanes such as methyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxysilane, N-β ( Aminoethyl) γ-aminopro Lutriethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldiethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltrimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, N Examples include aminosilanes such as -phenyl-γ-aminopropyltriethoxysilane, thiosilanes such as γ-mercaptopropyltrimethoxysilane, and γ-mercaptopropyltriethoxysilane. The silane coupling agent can be contained in an amount of 0.01 to 100 parts by mass with respect to 100 parts by mass of the pigment in the coloring composition.

  The colored resin composition can contain an organic solvent as necessary. Examples of the organic solvent include cyclohexanone, ethyl cellosolve acetate, butyl cellosolve acetate, 1-methoxy-2-propyl acetate, diethylene glycol dimethyl ether, ethylbenzene, ethylene glycol diethyl ether, xylene, ethyl cellosolve, methyl-n amyl ketone, propylene glycol monomethyl ether, toluene , Methyl ethyl ketone, ethyl acetate, methanol, ethanol, isopropyl alcohol, butanol, isobutyl ketone, petroleum solvent, and the like. These may be used alone or in combination. The solvent can be used in an amount of 800 to 4000 parts by mass, preferably 1000 to 2500 parts by mass with respect to 100 parts by mass of the pigment in the coloring composition.

  As a method for forming the light shielding layer and the colored layer on the array substrate, first, the above-mentioned photosensitive colored composition is applied and prebaked. As a means for applying, spin coating, dip coating, die coating, etc. are usually used, but it is not limited to these as long as it can be applied on the substrate with a uniform film thickness. Prebaking is preferably performed at 50 to 120 ° C. for about 1 to 20 minutes. The substrate on which the photosensitive coloring composition is applied to form a colored layer is exposed through a pattern mask. A normal high-pressure mercury lamp or the like may be used as the light source.

  Subsequently, development is performed. An alkaline aqueous solution is used as the developer. As an example of the alkaline aqueous solution, a tetramethylammonium hydroxide aqueous solution or a potassium hydroxide aqueous solution is preferably used, but a sodium carbonate aqueous solution, a sodium hydrogen carbonate aqueous solution, a mixed aqueous solution thereof, or a surfactant suitable for them. You may use what added. After development, it is washed with water and dried to obtain a pixel of any one color.

  By repeating the above-described series of steps by changing the color composition and pattern as many times as necessary, a light-shielding pattern and a colored pattern, ie, a plurality of colors, in which the required number of colored layers partitioned by the light-shielding pattern are combined. Can be obtained. At the same time, spacer projections are formed on the array substrate side using at least two or more of the colored layers.

  The thickness of the colored pixels formed on the array substrate side is generally about 2.0 to 3.5 μm. If the film thickness is thinner than this, there is a concern about display defects such as RC delay and crosstalk due to the distance between the pixel electrode formed on the colored pixel and the wiring being short, so that a sufficient opening of the pixel electrode cannot be obtained. . On the other hand, when the film thickness is thicker than this, it is difficult to open a contact hole formed on the colored pixel.

  The resin BM formed on the array substrate side has a thickness of about 1.0 to 3.0 μm. If the film thickness is thinner than this, sufficient light shielding properties cannot be obtained, or the concentration of the light shielding agent becomes high, and the relative dielectric constant becomes high. Further, if the film thickness is thicker than this, sufficient patterning properties such as poor linearity cannot be obtained. As shown in FIG. 6, the resin BM may be formed either before the colored pixels are formed or after the colored pixels are formed.

  The alignment films (15, 27) applied to the array substrate (2) and the counter substrate (1) have the property of aligning the liquid crystal in a predetermined direction director, so select the alignment film according to the predetermined liquid crystal mode. There is a need to. As the material for the alignment film, photosensitive or non-photosensitive materials such as polyimide resins, polyamide resins, and polyvinyl alcohol resins are preferably used, but are not limited thereto. However, a polyimide resin is preferable from the viewpoint of heat resistance and reliability of the alignment film.

  The polyimide resin is obtained by forming a soluble polyimide type alignment film solution or a polyamic acid type alignment film solution on a substrate for a liquid crystal display device, and then drying, baking or light irradiation as necessary. The alignment film material is formed on the substrate for a liquid crystal display device by flexographic printing, spin coating, roll coating, slit die coating, silk printing, ink jet printing, or the like. The polyimide resin preferably used as the alignment film is not particularly limited, but a polyamic acid obtained by imidation with heating or an appropriate catalyst is preferably used.

In order to implement the configuration of the liquid crystal display device of the present invention, a commercially available alignment film may be used. For example, AL1000, AL1068, AL1072, AL1077, AL1F00, AL3000, AL4000, AL5000, AL6000, AL7000, AL8000, AL1H659, AL60101, AL60601, JALS-146, JALS-212, JALS-406, manufactured by JSR JALS-445, JALS-469, JALS-550, JALS-552, JALS-553, JALS-555, JALS-556, JALS-566, JALS-725, JALS-1082, JALS-1085, JALS-1216, Chisso PIA-5140, PIA-5150, PIA-5310, PIA-X322, PIA-2024, PIA-2700, PIA-2800, P A-2900, SE-130, SE-150, SE-2110, SE-410, SE-610, SE-1180, SE-2170, SE-1211, SE-1410, SE-3140, SE manufactured by Nissan Chemical Co., Ltd. -3210, SE-3310, SE-3510, SE-5291, SE-5300, SE-6210, SE-7492, SE-7992, SE-7511L, SE-8192L, RN-1322, RN-1332, RN-1349 , RN-1358, RN-1386, RN-1417, RN-1436, RN-1450, RN-1477, RN-1486, etc. may be used alone,
Two or more of these may be mixed and used, other polymer components may be added as appropriate, and the resin components contained in these products may be appropriately selected and used.

  Solvents used for the alignment film solution include water, ethanol, methanol, isobutanol, alcohols such as 3-methyl-3-methoxybutanol, ketones such as methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone, diethyl ether, isopropyl Ethers such as ether, tetrahydrofuran, dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol diethyl ether, ethyl acetate, n-butyl acetate, 3-methoxy-3-methylbutyl acetate, ethylene glycol monomethyl ether acetate, ethylene glycol mono Ethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monomethyl ether acetate Esters, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, esters such as γ-butyrolactone, amides such as N, N-dimethylformamide, N, N-dimethylacetamide, 2- Pyrrolidones such as pyrrolidone and N-methylpyrrolidone, butyl cellosolve and the like can be used.

  The process of uniformly aligning the liquid crystal direction (director) at the liquid crystal interface is used in a liquid crystal display mode such as TN or IPS in which the liquid crystal director is aligned near the horizontal of the liquid crystal display device substrate. For example, a rubbing process in which the alignment film is rubbed with a cloth such as cotton or a photo alignment process in which light with controlled polarization is irradiated is used.

  The liquid crystal material used for the liquid crystal display device can be appropriately selected according to the display mode and the driving method. For example, a nematic liquid crystal or a smectic liquid crystal is used to obtain a good display. Smectic liquid crystals include ferroelectric liquid crystals and antiferroelectric liquid crystals. As the nematic liquid crystal, positive or negative dielectric anisotropy can be appropriately used depending on the display method.

  In order to implement the configuration of the liquid crystal display device of the present invention, a commercially available liquid crystal may be used. For example, in the case of the TN system, a chiral agent is added to Merck MLC-6222, MLC-6625, MLC-6628, MLC-6880, MLC-6888, MLC-7081, ZLI-4792, ZLI-5091, etc. Can be used. Further, in the case of the MVA system, MLC-6601, MLC-6614, MLC-6686, MLC-6682, MLC-6608, MLC-6609, MLC-6610, MLC-6222, MLC-6252, MLC-6256 manufactured by Merck & Co., Inc. , MLC-6625, MLC-6628, and the like can be used. In the case of the IPS system, MLC-2041, MLC-6601, MLC-6614, MLC-6686, MLC-6692 and the like can be used.

  Hereinafter, the present invention will be specifically described by way of examples. However, the present invention is not limited thereto without departing from the spirit of the present invention. In the following, all parts are parts by mass.

[Synthesis of Resin Solution (A-1)]
The reaction vessel was charged with 800 parts of cyclohexanone, heated while injecting nitrogen gas into the vessel, and a mixture of the following monomer and thermal polymerization initiator was added dropwise to carry out a polymerization reaction.

Styrene 60 parts Methacrylic acid 60 parts Methyl methacrylate 65 parts Butyl methacrylate 65 parts Thermal polymerization initiator 10 parts Chain transfer agent 3 parts After dripping and heating sufficiently, 2.0 parts of thermal polymerization initiator was dissolved in 50 parts of cyclohexanone. Then, the reaction was continued and an acrylic resin solution was obtained. Cyclohexanone was added to the resin solution so that the solid content was 20% by mass to prepare an acrylic resin solution, which was designated as resin solution (A-1). The mass average molecular weight of the acrylic resin was about 10,000.

[Synthesis of Resin Solution (A-2)]
The reaction vessel was charged with 800 parts of cyclohexanone, heated while injecting nitrogen gas into the vessel, and a mixture of the following monomer and thermal polymerization initiator was added dropwise to carry out a polymerization reaction.

Styrene 55 parts Methacrylic acid 65 parts Methyl methacrylate 65 parts Benzyl methacrylate 60 parts Thermal polymerization initiator 15 parts Chain transfer agent 3 parts After dripping and heating sufficiently, 2.0 parts of thermal polymerization initiator was dissolved in 50 parts of cyclohexanone. Then, the reaction was continued and an acrylic resin solution was obtained. Cyclohexanone was added to this resin solution so that the solid content was 30% by mass to prepare an acrylic resin solution, which was designated as resin solution (A-2). The mass average molecular weight of the acrylic resin was about 20000.

[Preparation of colored resin composition]
The red, blue and green colored resin compositions and the light-shielding resin composition for the resin BM were prepared in the following manner.

<Red colored resin composition>
A mixture having the following composition was uniformly stirred and mixed, then dispersed in a sand mill for 5 hours using glass beads having a diameter of 1 mm, and then filtered through a 5 μm filter to prepare a red pigment dispersion.

Red pigment: C.I. I. 18 parts of Pigment Red 254 (“Ilgar Forred B-CF” manufactured by Ciba Specialty Chemicals)
Red pigment: C.I. I. Pigment Red 177 2 parts (“Chromophthal Red A2B” manufactured by Ciba Specialty Chemicals)
Dispersant (“Ajisper PB821” manufactured by Ajinomoto Fine Techno Co., Ltd.) 2 parts 108 parts of resin solution (A-1) After that, the mixture having the following composition was stirred and mixed to be uniform, and then filtered through a 5 μm filter and colored red. A resin composition was obtained.

Dispersion of the above red pigment 130 parts Resin solution (A-1) 100 parts Polyfunctional polymerizable monomer 25 parts ("Aronix M-520" manufactured by Toa Gosei)
Photoinitiator (“Irgacure 369” manufactured by Ciba Specialty Micals Co., Ltd.) 15 parts Sensitizer (“EAB-F” manufactured by Hodogaya Chemical Co., Ltd.) 5 parts Cyclohexanone 325 parts In the adjusted red colored resin composition The amount of the carboxyl group-containing monomer was 21.1% by mass in the solid content.

<Green colored resin composition>
A mixture having the following composition was uniformly stirred and mixed, then dispersed in a sand mill for 5 hours using glass beads having a diameter of 1 mm, and then filtered through a 5 μm filter to prepare a green pigment dispersion.

Green pigment: C.I. I. 20 parts of Pigment Green 36 (“Rionol Green 6YK” manufactured by Toyo Ink Manufacturing Co., Ltd.)
Yellow pigment: C.I. I. Pigment Yellow 150 8 parts ("Funchon First Yellow Y-5688" manufactured by Bayer)
Dispersant ("Disperbyk-103" manufactured by Big Chemie) 2 parts Resin solution (A-1) 102 parts Thereafter, 132 parts of the above-mentioned green pigment dispersion was used, and a mixture having the following composition was further stirred and mixed so as to be uniform. Thereafter, the mixture was filtered through a 5 μm filter to obtain a green colored resin composition.

Resin solution (A-1) 116 parts Polyfunctional polymerizable monomer 32 parts (Osaka Organic Chemical Co., Ltd. "Biscoat # 2500")
Photoinitiator (“Irgacure OXE-02” manufactured by Ciba Geigy) 7 parts Sensitizer (“EAB-F” manufactured by Hodogaya Chemical Co., Ltd.) 2 parts Cyclohexanone 313 parts Carboxyl group in the prepared green colored resin composition The amount of monomer contained was 24.2% by mass in the solid content.

<Blue colored resin composition>
A mixture having the following composition was uniformly stirred and mixed, then dispersed in a sand mill for 5 hours using glass beads having a diameter of 1 mm, and then filtered through a 5 μm filter to prepare a blue pigment dispersion.

Blue pigment: C.I. I. 20 parts of Pigment Blue 15 (“Rionol Blue ES” manufactured by Toyo Ink Manufacturing Co., Ltd.)
Purple pigment: C.I. I. 2 parts of Pigment Violet 23 ("Pariogen Violet 5890" manufactured by BASF)
Dispersant (“Sols Birds 20000” manufactured by Zeneca) 5 parts Resin solution (A-1) 125 parts Thereafter, a mixture of the following composition is stirred and mixed to be uniform and then filtered through a 5 μm filter to give a blue colored resin composition I got a thing.

Dispersion of the blue pigment 152 parts Resin solution (A-1) 100 parts Polyfunctional polymerizable monomer 31 parts (Osaka Organic Chemical Co., Ltd. "Biscoat # 2500")
Photoinitiator ("Irgacure 907" manufactured by Ciba Geigy) 14 parts Sensitizer ("EAB-F" manufactured by Hodogaya Chemical Co., Ltd.) 3 parts Cyclohexanone 300 parts Carboxyl group-containing monomer in a blue colored resin composition The amount was 23.8% by mass in the solid content.

<Light-shielding resin composition>
A mixture having the following composition was spread and mixed uniformly, then dispersed with a sand mill for 5 hours using glass beads having a diameter of 1 mm, and then filtered with a 5 μm filter to obtain a dispersion of a light shielding agent.

Red pigment: C.I. I. Pigment Red 254 14 parts ("Ilgar For Red B-CF" manufactured by Ciba Specialty Chemicals)
Blue pigment: C.I. I. Pigment Blue 15 14 parts ("Rionol Blue ES" manufactured by Toyo Ink Manufacturing Co., Ltd.)
Dispersant ("Ajisper PB821" manufactured by Ajinomoto Fine Techno Co., Ltd.) 2 parts 120 parts of resin solution (A-2) After that, the mixture having the following composition was stirred and mixed to be uniform, and then filtered through a 5 μm filter to block light. A resin composition was obtained.

Dispersion of the above light-shielding agent 150 parts Resin solution (A-2) 100 parts Carbon black dispersant (TPBK-234C manufactured by Mikuni Dye Co., Ltd.) 37 parts Polyfunctional polymerizable monomer ("Aronix M-400" manufactured by Toa Gosei) 30 parts Photoinitiator ("Irgacure 369" manufactured by Ciba Geigy) 14 parts Sensitizer ("EAB-F" manufactured by Hodogaya Chemical Co., Ltd.) 3 parts Cyclohexanone 100 parts Propylene glycol monomethyl ether acetate 200 parts [Formation of thin film transistor layer]
A positive resist NPR-9000 (manufactured by Nagase ChemteX) was applied on an alkali-free glass substrate OA-10 (manufactured by Nippon Electric Glass Co., Ltd.) on which a Mo thin film was formed by sputtering. After exposure through a photomask with an ultraviolet light exposure machine, development was performed with a 2.4 mass% tetramethylammonium hydroxide aqueous solution. After patterning the Mo thin film by this substrate wet etching, the gate line (38) and the gate electrode (31) were formed by a photolithography process in which the positive resist was removed with Unlast TN-1 (manufactured by Mikawaka Pharmaceutical). Next, a gate insulating film (32) and a semiconductor layer (34) made of silicon nitride were formed on the substrate by plasma CVD. Furthermore, a data line (37), a source electrode (35), and a drain electrode (36) were formed on the substrate by a photolithography process using a Ti / Al alloy. Finally, a protective layer (33) made of silicon nitride was formed on this substrate to obtain an array substrate on which a thin film transistor layer (3) was formed.

<Example 1>
[Formation of colored layer and spacer]
The red colored resin composition was applied onto the thin film transistor layer on the array substrate by spin coating so that the finished film thickness was 3.0 μm. After drying at 90 ° C for 60 seconds on a hot plate, pattern exposure is performed through a photomask with an ultraviolet exposure machine, unexposed portions are removed with an alkali developer, and then heat-cured at 230 ° C for 20 minutes in an oven. Then, red pixels, which are striped colored layers, were formed on the array substrate on the pixels surrounded by the gate lines and the data lines. At this time, the thin film transistor portion was covered with a red pixel in order to form a spacer, and a 25 μm through hole was formed on the drain electrode in order to form a contact hole.
The alkaline developer has the following composition.

Sodium carbonate 1.5% by mass
Sodium bicarbonate 0.5% by mass
Anionic surfactant (“Perirex NBL” manufactured by Kao Corporation) 8.0% by mass
90.0% by mass of water
Next, the green coloring composition is similarly applied by spin coating so that the final film thickness is 3 μm, and after drying, the striped colored layer is exposed to a position shifted from the red pixel by an exposure machine. Then, a green pixel adjacent to the red pixel was formed by development. At this time, a circular dot pattern with a diameter of 30 μm was formed with a green coloring composition on a red pixel formed so as to cover the thin film transistor, and a 25 μm through hole was also formed on the drain electrode.

  Further, in the same manner as for red and green, the blue resin coloring composition was formed with blue pixels adjacent to the red and green pixels with a finished film thickness of 3 μm. At this time, a circular dot pattern with a diameter of 20 μm is formed with a blue resin coloring composition on a circular dot pattern formed with a green coloring composition, and a 25 μm through hole is formed on the drain electrode together to form a colored pixel. The spacer which laminated | stacked was formed.

[Formation of pixel electrode]
Next, a conductive film having a thickness of 0.1 μm was formed on the colored pixels by sputtering using ITO as a target. A positive resist LC-100 (manufactured by Rohm and Haas) was applied on the conductive film. After exposure and development through a photomask with an ultraviolet exposure machine, etching of the conductive film on the data line (37) and gate line (38) and on the spacer portion is performed using ITO-CF60 (Mitsubishi Gas Chemical Co., Ltd.). It was. After removing the positive resist with Unlast TN-1, a thermosetting was performed in an oven at 230 ° C. for 40 minutes to form a pixel electrode connected to the drain electrode through the contact hole (29) on the colored pixel. Thus, an array substrate (2) having spacers formed by stacking red, green and blue colored pixels on the thin film transistor layer (3) as shown in FIG. 6 was produced.

[Formation of counter substrate]
As the counter substrate (1) to be bonded to the array substrate (2), a conductive film having a thickness of 0.1 μm was formed on the alkali-free glass OA-10 by sputtering using ITO as a target. A positive resist LC-100 was applied on the conductive film. After exposure and development through a photomask with an ultraviolet exposure machine, an alignment slit was formed by etching using ITO-CF60. After removing the positive resist with Unlast TN-1, a counter substrate was prepared by thermosetting in an oven at 230 ° C. for 20 minutes.
[Production of liquid crystal display device]
On the prepared counter substrate (1) and array substrate (2), a polyimide alignment film AL60601 (manufactured by JSR) is applied with a thickness of 0.1 μm by a flexographic printing machine and dried at 90 ° C. for 60 seconds on a hot plate. Later, thermosetting was performed in an oven at 230 ° C. for 60 minutes. Photorec S (manufactured by Sekisui Chemical Co., Ltd.), which is a sealant, is applied to the outer periphery of the display portion using a seal dispenser, and then MLC6610 (manufactured by Merck) is added dropwise using a liquid crystal dispenser, followed by vacuum dropping. A display element (liquid crystal panel) was produced. An MVA liquid crystal display device was obtained by mounting a polarizing plate, an IC driver / drive circuit, and a backlight on the liquid crystal panel. The obtained liquid crystal display device had display characteristics in which the cell thickness of the entire panel was kept uniform and no unevenness occurred.

<Example 2>
(Formation of light shielding layer)
On the thin film transistor layer, the light-shielding resin composition 1 was applied as a light-shielding layer by spin coating so that the finished film thickness was 3.0 μm. After drying at 90 ° C for 60 seconds on a hot plate, pattern exposure is performed through a photomask with an ultraviolet exposure machine, and after unexposed portions are removed with an alkali developer, heat curing is performed at 230 ° C for 40 minutes in an oven. It was. At this time, the light shielding layer was patterned to cover the thin film transistor layer, the gate line, and the data line. The light shielding layer had an OD value of 4.5.

[Formation of colored layer and spacer]
On the thin film transistor layer, the red colored resin composition was applied by spin coating so that the finished film thickness was 3.0 μm. After drying at 90 ° C for 60 seconds on a hot plate, pattern exposure is performed through a photomask with an ultraviolet exposure machine, unexposed portions are removed with an alkali developer, and then heat-cured at 230 ° C for 20 minutes in an oven. A red pixel, which is a striped colored layer, was formed on the array substrate on the pixel surrounded by the gate line and the data line. At this time, a through hole of 25 μm was formed on the drain electrode in order to form a contact hole.

  Next, the green colored resin composition is similarly applied by spin coating so that the finished film thickness is 3 μm, dried, and then exposed to a place where the striped colored layer is shifted from the above-mentioned red pixel by an exposure machine. Then, a green pixel adjacent to the red pixel was formed by development. At this time, a circular dot pattern having a diameter of 30 μm was formed on the light shielding layer formed so as to cover the thin film transistor, and a 25 μm through hole was also formed on the drain electrode.

  Further, in the same manner as in red and green, the blue colored resin composition was also formed with blue pixels adjacent to the red and green pixels with a finished film thickness of 3 μm. At this time, by forming a circular dot pattern with a diameter of 20 μm with a blue colored resin composition on a circular dot pattern formed with a green colored resin composition, and forming a 25 μm through hole on the drain electrode together A spacer in which colored pixels were stacked was formed.

[Formation of pixel electrode]
Next, in the same manner as in Example 1, a conductive film having a thickness of 0.1 μm was formed on the colored pixels by sputtering using ITO as a target. A positive resist LC-100 (manufactured by Rohm and Haas) was applied on the conductive film. After exposure and development through a photomask with an ultraviolet exposure machine, etching of the conductive film on the data line (37) and gate line (38) and on the spacer portion is performed using ITO-CF60 (Mitsubishi Gas Chemical Co., Ltd.). It was. After removing the positive resist with Unlast TN-1, a thermosetting was performed in an oven at 230 ° C. for 40 minutes to form a pixel electrode connected to the drain electrode through the contact hole (29) on the colored pixel. Thus, an array substrate (2) having spacers formed by laminating resin BM and green and blue colored pixels on the thin film transistor layer (3) as shown in FIG. 7 was formed.

[Formation of counter substrate]
As a counter substrate (1) to be bonded to the array substrate, a conductive film having a thickness of 0.1 μm was formed on a non-alkali glass OA-10 by sputtering using ITO as a target, and then in an oven at 230 ° C. for 20 minutes. A counter substrate was formed by thermosetting.

Production of liquid crystal display device]
On the counter substrate (1) and the array substrate (2), a polyimide alignment film SANEVER 7492 (Nissan Chemical Co., Ltd.) is applied with a thickness of 0.1 μm by a flexographic printing machine, and dried at 90 ° C. for 60 seconds on a hot plate. Then, heat curing was performed in an oven at 230 ° C. for 60 minutes. After performing the rubbing treatment on the pair of substrates and cleaning, Photorec S (manufactured by Sekisui Chemical Co., Ltd.), which is a sealing agent, is applied to the outer periphery of the display portion with a seal dispenser, and subsequently, with a liquid crystal dispenser, A liquid crystal display element (liquid crystal panel) was prepared by a vacuum dropping method after adding a chiral agent added to MLC2068 (manufactured by Merck). A TN liquid crystal display device was obtained by mounting a polarizing plate, an IC driver / drive circuit, and a backlight on the liquid crystal panel. The obtained liquid crystal display device had display characteristics in which the cell thickness of the entire panel was kept uniform and no unevenness occurred. In addition, the TN system does not require alignment control slits (14) and protrusions (19) on the counter substrate, and therefore does not require detailed alignment of the liquid crystal panel, so that a highly productive liquid crystal display device can be manufactured. Met.

DESCRIPTION OF SYMBOLS 1 ... Opposite substrate 11 ... Glass substrate 12 ... Polarizing plate
13 ... Common electrode 14 ... Slit 15 ... Alignment film
16 ... Black matrix 17 ... Flattening layer
18 ... Colored layer (R, G, B) 19 ... Projection 1A ... Insulating dot pattern

2 ... Array substrate 21 ... Glass substrate 22 ... Polarizing plate
23 ... Colored layer (R, G, B) 24 ... Pixel electrode 25 ... Projection
26 ... Slit 27 ... Alignment film 28 ... Black matrix 29 ... Contact hole 3 ... Thin film transistor layer 31 ... Gate electrode

32 ... Gate insulating film 33 ... Protective layer 34 ... Semiconductor layer
35 ... Source electrode 36 ... Drain electrode 37 ... Data line
38 ... Gate line 4 ... Liquid crystal layer

Claims (4)

A transparent substrate in an array substrate used for a liquid crystal display element comprising an array substrate, a counter substrate disposed opposite to the array substrate with a predetermined gap, and a liquid crystal layer sandwiched between the two substrates And an array substrate comprising at least a pixel electrode, a thin film transistor for driving the pixel electrode, and a colored pixel comprising a colored layer of a plurality of colors provided so as to cover the thin film transistor,
An array substrate, wherein at least two or more of the colored layers are used, and a spacer for holding a predetermined gap is laminated between the counter substrate and a liquid crystal material. A transparent substrate in an array substrate used for a liquid crystal display element comprising an array substrate, a counter substrate disposed opposite to the array substrate with a predetermined gap, and a liquid crystal layer sandwiched between the two substrates In addition, the array substrate includes at least a pixel electrode, a thin film transistor that drives the pixel electrode, a colored pixel that includes a plurality of colored layers provided to cover the thin film transistor, and a light shielding layer that partitions the colored pixel. And
An array substrate, wherein a spacer for holding a predetermined gap is formed by laminating a counter substrate and a liquid crystal material using at least two of the light shielding layer and the colored layer.   The array substrate according to claim 1, a counter substrate disposed opposite to the array substrate with a predetermined gap, and a liquid crystal layer sandwiched between the two substrates. A liquid crystal display device comprising a liquid crystal display element.   A counter substrate constituting a liquid crystal display element included in the liquid crystal display device according to claim 3 is a transparent substrate, at least a transparent electrode that covers the transparent substrate, and an alignment film that covers the transparent electrode. A liquid crystal display device characterized in that the liquid crystal display device is formed.

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