JP2011201753A - Method for producing carbon film - Google Patents
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- JP2011201753A JP2011201753A JP2010073058A JP2010073058A JP2011201753A JP 2011201753 A JP2011201753 A JP 2011201753A JP 2010073058 A JP2010073058 A JP 2010073058A JP 2010073058 A JP2010073058 A JP 2010073058A JP 2011201753 A JP2011201753 A JP 2011201753A
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 57
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 239000005011 phenolic resin Substances 0.000 claims abstract description 48
- 239000000725 suspension Substances 0.000 claims abstract description 36
- 239000002243 precursor Substances 0.000 claims abstract description 32
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- 239000002245 particle Substances 0.000 claims description 27
- 239000011148 porous material Substances 0.000 claims description 15
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
- 238000003763 carbonization Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 abstract description 11
- 238000007598 dipping method Methods 0.000 abstract description 4
- 238000001035 drying Methods 0.000 abstract description 4
- 239000012528 membrane Substances 0.000 description 33
- 238000000926 separation method Methods 0.000 description 23
- 238000000034 method Methods 0.000 description 16
- 239000000243 solution Substances 0.000 description 15
- 239000002994 raw material Substances 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 238000005755 formation reaction Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000002131 composite material Substances 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 230000004907 flux Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 239000012466 permeate Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229920001342 Bakelite® Polymers 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- PQLVXDKIJBQVDF-UHFFFAOYSA-N acetic acid;hydrate Chemical compound O.CC(O)=O PQLVXDKIJBQVDF-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000001612 separation test Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000004637 bakelite Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 238000005373 pervaporation Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
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- Silicates, Zeolites, And Molecular Sieves (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
本発明は炭素膜の製造方法に関する。更に詳しくは、混合成分から特定の成分を選択的に分離する際に使用される炭素膜の製造方法に関する。 The present invention relates to a method for producing a carbon film. More specifically, the present invention relates to a method for producing a carbon film used for selectively separating a specific component from a mixed component.
近年、環境保護や基材の有効利用といった観点から、混合成分から特定の成分を分離するためにゼオライト膜や炭素膜が利用されている。特に、炭素膜はゼオライト膜に比べて耐酸性に優れており、有機酸を含む混合成分の分離にも使用可能である。このような炭素膜として、セラミック多孔質体の表面に、液状熱硬化性樹脂を塗布して高分子膜を形成した後、非酸化性雰囲気下で550〜1100℃で熱処理して、炭素含有率が80%以上で、細孔直径が1nm以下の細孔が多数存在する分子ふるい炭素膜が開示されている(特許文献1参照)。 In recent years, zeolite membranes and carbon membranes have been used to separate specific components from mixed components from the viewpoint of environmental protection and effective utilization of base materials. In particular, the carbon membrane has better acid resistance than the zeolite membrane, and can be used for separation of mixed components containing organic acids. As such a carbon film, a liquid thermosetting resin is applied to the surface of the ceramic porous body to form a polymer film, and then heat-treated at 550 to 1100 ° C. in a non-oxidizing atmosphere to obtain a carbon content. Has disclosed a molecular sieving carbon membrane in which a large number of pores having a pore diameter of 1 nm or less are present (see Patent Document 1).
また、フラックス(透過流速)及び選択性を向上させることを目的とした分離膜多孔質体複合体が開示されている(特許文献2参照)。この分離膜多孔質体複合体は、多孔質体と炭素膜を有し、多孔質体と炭素膜の界面に、厚さが1nm以下の複合層が形成されており、少なくとも複合層の一部は分離膜と同じ材料で形成されたものである。この分離膜多孔質体複合体を製造する方法として、特許文献2には、加圧ガスを多孔質体の細孔内に供給しつつ、分離膜を形成するための溶液を多孔質体の表面に接触させる工程を含む方法が開示されている。
Moreover, the separation membrane porous body composite aiming at improving a flux (permeation | transmission flow rate) and selectivity is disclosed (refer patent document 2). This separation membrane porous body composite has a porous body and a carbon membrane, and a composite layer having a thickness of 1 nm or less is formed at the interface between the porous body and the carbon membrane, and at least a part of the composite layer Is made of the same material as the separation membrane. As a method for producing this separation membrane porous body composite,
更に、モノリス基材の貫通孔内の表面に成膜された分離膜の前駆体溶液からなる膜を膜全体に渡って均一に乾燥やイミド化させることが可能で、かつ、乾燥機内へのモノリス基材の設置のような煩雑な工程を要しない生産性に優れた分離膜の製造方法が開示されている(特許文献3参照)。 Furthermore, it is possible to uniformly dry or imidize a membrane made of the precursor solution of the separation membrane formed on the surface in the through hole of the monolith substrate, and to monolith into the dryer. A method of manufacturing a separation membrane that is excellent in productivity and does not require a complicated process such as installation of a substrate has been disclosed (see Patent Document 3).
多孔質支持体に分離膜の前駆体溶液を塗布する際に、ポリイミド等の粘性の高い前駆体溶液では、特許文献2,3に開示された方法で均一に塗布することができる。しかしながら、フェノール樹脂等の粘性の低い前駆体溶液を塗布する場合、均一に塗布することが困難であり、成膜回数が多くなる場合がある。
When the precursor solution of the separation membrane is applied to the porous support, a highly viscous precursor solution such as polyimide can be applied uniformly by the methods disclosed in
ポリイミドを前駆体とする炭素膜は、酸性の溶液を分離する際に条件によって分離性能が低下する場合がある。そのため、炭素膜の前駆体としてフェノール樹脂を使用する必要があるが、上述の問題から、改善が望まれていた。 The separation performance of a carbon membrane using polyimide as a precursor may be lowered depending on conditions when an acidic solution is separated. Therefore, although it is necessary to use a phenol resin as a precursor of a carbon film, the improvement was desired from the above-mentioned problem.
本発明は、このような従来技術の有する問題点に鑑みてなされたものであり、その課題とするところは、成膜回数を減らし、工程数を削減することができ、均一な炭素膜を成膜することができる炭素膜の製造方法を提供することにある。 The present invention has been made in view of such problems of the prior art, and the problem is that the number of film formation can be reduced, the number of processes can be reduced, and a uniform carbon film can be formed. An object of the present invention is to provide a carbon film manufacturing method capable of forming a film.
本発明者らは上記課題を達成すべく鋭意検討した結果、多孔質支持体の表面に分離膜の前駆体を塗布する際に、多孔質支持体を、分離膜の前駆体懸濁液に浸漬することによって、上記課題を達成することが可能であることを見出し、本発明を完成するに至った。 As a result of intensive studies to achieve the above-described problems, the present inventors have immersed the porous support in the precursor suspension of the separation membrane when applying the separation membrane precursor to the surface of the porous support. As a result, the present inventors have found that the above-described problems can be achieved, and have completed the present invention.
即ち、本発明によれば、以下に示す炭素膜の製造方法が提供される。 That is, according to the present invention, the following carbon film manufacturing method is provided.
[1]多孔質支持体を、フェノール樹脂の懸濁液又はフェノール樹脂の前駆体の懸濁液に浸漬し、乾燥させて前記フェノール樹脂又は前記フェノール樹脂の前駆体からなる膜を成膜した後、熱処理して炭化させることにより、炭素膜を得る炭素膜の製造方法。 [1] After immersing the porous support in a suspension of a phenol resin or a suspension of a precursor of a phenol resin and drying to form a film made of the phenol resin or the precursor of the phenol resin A carbon film manufacturing method for obtaining a carbon film by heat treatment and carbonization.
[2]前記フェノール樹脂又は前記フェノール樹脂の前駆体が粉末状物質である前記[1]に記載の炭素膜の製造方法。 [2] The method for producing a carbon film according to [1], wherein the phenol resin or the precursor of the phenol resin is a powdery substance.
[3]前記懸濁液の濁度が、1〜1000度である前記[1]又は[2]に記載の炭素膜の製造方法。 [3] The method for producing a carbon film according to [1] or [2], wherein the turbidity of the suspension is 1 to 1000 degrees.
[4]前記懸濁液の濁度が、100〜1000度である前記[1]〜[3]のいずれかに記載の炭素膜の製造方法。 [4] The method for producing a carbon film according to any one of [1] to [3], wherein the turbidity of the suspension is 100 to 1000 degrees.
[5]前記懸濁液の溶媒が、N−メチル−2−ピロリジノンである前記[1]〜[4]のいずれかに記載の炭素膜の製造方法。 [5] The method for producing a carbon film according to any one of [1] to [4], wherein the solvent of the suspension is N-methyl-2-pyrrolidinone.
[6]前記多孔質支持体が、一方の端面から他方の端面まで連通する複数のセルが形成された多孔質基材を備える前記[1]〜[5]のいずれかに記載の炭素膜の製造方法。 [6] The carbon membrane according to any one of [1] to [5], wherein the porous support includes a porous base material on which a plurality of cells communicating from one end face to the other end face are formed. Production method.
[7]前記多孔質支持体が、前記多孔質基材を構成する粒子より平均粒子径の小さい粒子から構成される層を更に備え、前記多孔質支持体の最表層の平均細孔径が0.01〜1μmである前記[6]に記載の炭素膜の製造方法。 [7] The porous support further includes a layer composed of particles having an average particle diameter smaller than the particles constituting the porous substrate, and the average pore diameter of the outermost layer of the porous support is 0. The method for producing a carbon film according to [6], which is 01 to 1 μm.
本発明の炭素膜の製造方法によれば、成膜回数を減らし、工程数を削減することができるという効果を奏する。 According to the carbon film manufacturing method of the present invention, it is possible to reduce the number of times of film formation and reduce the number of steps.
以下、本発明の実施の形態について説明するが、本発明は以下の実施の形態に限定されるものではない。本発明の趣旨を逸脱しない範囲で、当業者の通常の知識に基づいて、以下の実施の形態に対し適宜変更、改良等が加えられたものも本発明の範囲に含まれることが理解されるべきである。 Embodiments of the present invention will be described below, but the present invention is not limited to the following embodiments. It is understood that the scope of the present invention includes modifications, improvements, and the like as appropriate to the following embodiments based on ordinary knowledge of those skilled in the art without departing from the spirit of the present invention. Should.
本発明の炭素膜の製造方法は、多孔質支持体を、フェノール樹脂の懸濁液又はフェノール樹脂の前駆体の懸濁液に浸漬し、乾燥させてフェノール樹脂又はフェノール樹脂の前駆体からなる膜を成膜した後、熱処理して炭化させることにより、炭素膜を得る方法である。この製造方法は、いわゆるディップコートと呼ばれる手法を用いているが、多孔質支持体を浸漬する際に、フェノール樹脂の懸濁液又はフェノール樹脂の前駆体の懸濁液を用いている点が異なる。 In the method for producing a carbon membrane of the present invention, a porous support is immersed in a suspension of a phenol resin or a suspension of a precursor of a phenol resin and dried to form a membrane made of a phenol resin or a precursor of a phenol resin. Is a method of obtaining a carbon film by heat treatment and carbonization. This manufacturing method uses a so-called dip coating method, but differs in that a suspension of a phenol resin or a precursor of a phenol resin is used when the porous support is immersed. .
ディップコートでは、通常、多孔質支持体の表面に均一に塗布する必要があるので、浸漬する際に原料を均一に溶解した溶液を使用している。しかしながら、原料にフェノール樹脂又はフェノール樹脂の前駆体を用いた溶液を用いる場合、溶液の粘度が低くなるので均一に塗布することが困難であり、成膜回数が多くなる(即ち、工程数が増加する)という問題がある。しかしながら、本発明の炭素膜の製造方法では、原料を完全に溶解させることなく懸濁させた懸濁液を用いているので、懸濁液の粘度が低くてもフェノール樹脂又はフェノール樹脂の前駆体を多孔質支持体の表面に堆積させて染み込みを防止することができ、均一に成膜することができる。そのため、成膜回数を減らすことができ、工程数を削減することが可能である。 In dip coating, since it is usually necessary to apply uniformly to the surface of a porous support, a solution in which raw materials are uniformly dissolved is used when immersed. However, when a solution using a phenol resin or a precursor of a phenol resin as a raw material is used, it is difficult to apply uniformly because the viscosity of the solution is low, and the number of film formation increases (that is, the number of processes increases). Problem). However, in the carbon film manufacturing method of the present invention, a suspension in which the raw material is suspended without being completely dissolved is used. Therefore, even if the viscosity of the suspension is low, the phenol resin or the precursor of the phenol resin is used. Can be deposited on the surface of the porous support to prevent permeation, and a uniform film can be formed. Therefore, the number of film formations can be reduced, and the number of processes can be reduced.
(多孔質支持体)
多孔質支持体の形状は特に限定されず、使用目的に応じて適宜選択することができる。例えば、図1に示すような、一方の端面5から他方の端面6まで連通する複数のセル3が形成された多孔質基材2を備えるレンコン状の柱状体(以下、「モノリス形状」という)がある。また、ハニカム形状、円板状、多角形板状、円筒、角筒等の筒状、円柱、角柱等の柱状等もある。容積、重量に対する膜面積比率が大きいことから、モノリス形状やハニカム形状であることが好ましく、モノリス形状であることが更に好ましい。
(Porous support)
The shape of the porous support is not particularly limited and can be appropriately selected according to the purpose of use. For example, as shown in FIG. 1, a lotus-like columnar body (hereinafter referred to as “monolith shape”) including a
多孔質支持体の大きさは特に限定されず、支持体として必要な強度を満たすとともに、分離対象成分の透過性を損なわない範囲で、目的に合わせて適宜選択することができる。また、多孔質支持体の平均細孔径は0.01〜50μmであることが好ましい。更に、多孔質支持体の気孔率は、多孔質支持体自体の強度と透過性の観点から、25〜55%とすることが好ましい。 The size of the porous support is not particularly limited, and can be appropriately selected according to the purpose as long as the strength required for the support is satisfied and the permeability of the component to be separated is not impaired. Moreover, it is preferable that the average pore diameter of a porous support body is 0.01-50 micrometers. Furthermore, the porosity of the porous support is preferably 25 to 55% from the viewpoint of the strength and permeability of the porous support itself.
また、図2に示すように、多孔質支持体1は、多孔質基材2と、多孔質基材2を構成する粒子12より平均粒子径の小さい粒子17,18から構成される複数の層7,8を有することが好ましい。図2においては、多孔質支持体1は、中間層7、最表層8を有するが、必要に応じて更に層を有してもよい。このような層7,8を有することで、多孔質支持体1の分離膜10を配設する表面が滑らかになり、均一な膜を成膜することができる。
As shown in FIG. 2, the porous support 1 includes a
多孔質支持体を構成する粒子としては、強度や化学的安定性の観点から、アルミナ、シリカ、コージェライト、ムライト、チタニア、ジルコニア、炭化珪素等のセラミック材料等が好ましい。なお、多孔質支持体を構成する粒子の平均粒径は0.03〜200μmであることが好ましい。 The particles constituting the porous support are preferably ceramic materials such as alumina, silica, cordierite, mullite, titania, zirconia, and silicon carbide from the viewpoint of strength and chemical stability. In addition, it is preferable that the average particle diameter of the particle | grains which comprise a porous support body is 0.03-200 micrometers.
この多孔質支持体は、従来公知の方法で調製することができる。例えば、多孔質支持体を構成する粒子を使用して押出成形法によって多孔質基材を成形し、焼成する方法がある。なお、多孔質支持体が複数の層を有する場合には、多孔質支持体を構成する粒子より平均粒子径の小さい粒子を多孔質基材の表面に濾過成膜法により堆積し、焼成することで複数の層を形成することができる。粒子の種類としては、多孔質支持体を構成する粒子と同じ種類の粒子を用いることができる。 This porous support can be prepared by a conventionally known method. For example, there is a method in which a porous base material is formed by extrusion molding using particles constituting the porous support and fired. In the case where the porous support has a plurality of layers, particles having an average particle diameter smaller than the particles constituting the porous support are deposited on the surface of the porous substrate by a filtration film forming method and fired. A plurality of layers can be formed. As a kind of particle | grains, the same kind of particle | grains as the particle | grains which comprise a porous support body can be used.
(フェノール樹脂又はフェノール樹脂の前駆体)
フェノール樹脂としては特に限定されるものではなく、従来公知のものを使用することができる。例えば、商品名「ベルパールS899」、同S890、同S870(以上、エア・ウォーター社製)、商品名「スミライトレジンPR53056」(住友ベークライト社製)、商品名「レヂトップPSK2320」、商品名「マリリンHF」(以上、群栄化学社製)等がある。これらの中でも、粉末状物質であるベルパールS899、同S890、同S870を用いることが好ましい。
(Phenolic resin or phenolic resin precursor)
It does not specifically limit as a phenol resin, A conventionally well-known thing can be used. For example, the product names “Bellepearl S899”, S890, S870 (above, manufactured by Air Water), the product name “Sumilite Resin PR53056” (manufactured by Sumitomo Bakelite), the product name “Resitop PSK2320”, the product name “Marilyn” HF "(manufactured by Gunei Chemical Co., Ltd.). Among these, it is preferable to use Belpearl S899, S890, and S870 which are powdery substances.
フェノール樹脂の重量平均分子量は3000〜10000であることが好ましく、4000〜10000であることが更に好ましい。重量平均分子量がこのような範囲にあることで、選択性の高い膜が得られる。重量平均分子量が10000超であると、熱処理時や炭化時の膜の収縮によって欠陥が生じ易く、選択性が低下する場合がある。 The weight average molecular weight of the phenol resin is preferably 3000 to 10,000, and more preferably 4000 to 10,000. When the weight average molecular weight is in such a range, a highly selective membrane can be obtained. If the weight average molecular weight exceeds 10,000, defects are likely to occur due to shrinkage of the film during heat treatment or carbonization, and the selectivity may be lowered.
また、フェノール樹脂の前駆体も特に限定されるものではなく、従来公知のものを使用することができる。例えば、レゾール樹脂がある。これらの中でも粉末状物質であるベルパールSシリーズを用いることが好ましい。 Moreover, the precursor of a phenol resin is not specifically limited, A conventionally well-known thing can be used. For example, there is a resole resin. Among these, it is preferable to use Belpearl S series which is a powdery substance.
(懸濁液)
浸漬する際に用いるフェノール樹脂の懸濁液又はフェノール樹脂の前駆体の懸濁液としては特に限定されるものではない。懸濁液の濁度は1〜1000度であることが好ましく、100〜1000度であることが更に好ましく、300〜1000度であることが特に好ましい。なお、懸濁液の濁度は、透過散乱光測定方式の笠原理化工業社製の商品名「TR−55」を用いて測定することができる。
(Suspension)
The suspension of the phenol resin or the precursor of the phenol resin used for the immersion is not particularly limited. The turbidity of the suspension is preferably 1 to 1000 degrees, more preferably 100 to 1000 degrees, and particularly preferably 300 to 1000 degrees. The turbidity of the suspension can be measured using a trade name “TR-55” manufactured by Kasahara Kagaku Kogyo Co., Ltd. using a transmission scattered light measurement method.
フェノール樹脂の懸濁液又はフェノール樹脂の前駆体の懸濁液を調製する際の溶媒としては、特に限定されるものではない。具体的には、N−メチル−2−ピロリジノン、エタノール等を挙げることができる。 The solvent for preparing the suspension of the phenol resin or the precursor of the phenol resin is not particularly limited. Specific examples include N-methyl-2-pyrrolidinone and ethanol.
フェノール樹脂の懸濁液又はフェノール樹脂の前駆体の懸濁液の調製方法としては特に限定されるものではなく、原料と溶媒を混合攪拌し、所定の濾紙を用いて濾過する又は所定の目開きの篩を通して過大な平均粒子径の原料粒子を除去して調製することができる。 The method for preparing the suspension of the phenol resin or the precursor of the phenol resin is not particularly limited, and the raw material and the solvent are mixed and stirred and filtered using a predetermined filter paper or a predetermined opening. It is possible to prepare by removing raw material particles having an excessive average particle diameter through a sieve.
本発明の炭素膜の製造方法は、前記の多孔質支持体を、前記の懸濁液に浸漬し、乾燥させてフェノール樹脂又はフェノール樹脂の前駆体からなる膜を成膜した後、熱処理して炭化させることにより、炭素膜を得る方法である。浸漬する方法としては、従来公知のディップ法により行うことができる。なお、多孔質支持体の細孔内に圧力を掛けながら浸漬するいわゆる加圧ディップ法で行うことが好ましい。この場合、圧力は1〜1000kPaであることが好ましく、10〜500kPaであることが更に好ましく、50〜100kPaであることが特に好ましい。 In the method for producing a carbon film of the present invention, the porous support is immersed in the suspension and dried to form a film made of a phenol resin or a phenol resin precursor, and then heat-treated. In this method, a carbon film is obtained by carbonization. As a dipping method, a conventionally known dipping method can be used. In addition, it is preferable to carry out by what is called a pressure dip method of immersing while applying pressure in the pores of the porous support. In this case, the pressure is preferably 1 to 1000 kPa, more preferably 10 to 500 kPa, and particularly preferably 50 to 100 kPa.
乾燥処理は特に限定されなく、従来公知の方法で行うことができる。より具体的には、90〜300℃、0.5〜60時間の条件で熱処理して乾燥させることができる。 A drying process is not specifically limited, It can carry out by a conventionally well-known method. More specifically, it can be heat-treated and dried at 90 to 300 ° C. for 0.5 to 60 hours.
また、熱処理して炭化させる条件としても特に限定されるものではないが、非酸化性雰囲気下で熱処理を行うことが好ましい。非酸化性雰囲気とは、フェノール樹脂又はフェノール樹脂の前駆体からなる膜が熱処理時の温度範囲で加熱されても酸化されない雰囲気をいい、具体的には、窒素、アルゴン等の不活性ガス中や真空中等の雰囲気をいう。 The conditions for carbonization by heat treatment are not particularly limited, but it is preferable to perform the heat treatment in a non-oxidizing atmosphere. The non-oxidizing atmosphere refers to an atmosphere in which a film made of a phenol resin or a precursor of a phenol resin is not oxidized even when heated in a temperature range during heat treatment. Specifically, in an inert gas such as nitrogen or argon, An atmosphere such as a vacuum.
熱処理条件として、具体的には、400〜1200℃であることが好ましく、600〜900℃であることが更に好ましい。400℃より低いと、炭化が不十分で細孔が形成されず、分離性能が発現しない場合がある。一方、1200℃より高いと、強度が低下したり、膜が緻密化し過ぎて分離性能が低下したりする場合がある。 Specifically, the heat treatment condition is preferably 400 to 1200 ° C, and more preferably 600 to 900 ° C. When it is lower than 400 ° C., carbonization is insufficient, pores are not formed, and separation performance may not be exhibited. On the other hand, when the temperature is higher than 1200 ° C., the strength may be decreased, or the membrane may be excessively densified, resulting in a decrease in separation performance.
なお、炭素膜の平均細孔径は、0.2〜1.0nmであることが好ましい。平均細孔径が0.2nm未満であると、担持成分が細孔を閉塞して分離対象成分の透過量が低下する場合がある。一方、1.0nm超であると、選択性向上の効果が低下する場合がある。 In addition, it is preferable that the average pore diameter of a carbon film is 0.2-1.0 nm. When the average pore diameter is less than 0.2 nm, the supported component may block the pores and the permeation amount of the component to be separated may decrease. On the other hand, if it exceeds 1.0 nm, the effect of improving selectivity may be reduced.
また、炭素膜の厚さは、0.01〜10μmであることが好ましく、0.01〜0.5μmであることが更に好ましい。厚さが0.01μmより薄いと、選択性が低下したり、強度が低下したりする場合がある。一方、10μmより厚いと、分離対象成分の透過性が低下する場合がある。 The thickness of the carbon film is preferably 0.01 to 10 μm, and more preferably 0.01 to 0.5 μm. If the thickness is less than 0.01 μm, the selectivity may be lowered or the strength may be lowered. On the other hand, if it is thicker than 10 μm, the permeability of the component to be separated may decrease.
以下、本発明を実施例に基づいて具体的に説明するが、本発明はこれらの実施例に限定されるものではない。なお、実施例、比較例中の「部」及び「%」は、特に断らない限り質量基準である。また、各種物性値の測定方法、及び諸特性の評価方法を以下に示す。 EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to these Examples. In the examples and comparative examples, “parts” and “%” are based on mass unless otherwise specified. Moreover, the measuring method of various physical-property values and the evaluation method of various characteristics are shown below.
[濁度(度)]:透過散乱光測定方式の笠原理化工業社製の商品名「TR−55」を用いて測定した。 [Turbidity (degree)]: Measured using a trade name “TR-55” manufactured by Kasahara Kagaku Kogyo Co., Ltd. using a transmission scattered light measurement method.
[分離係数α]:分離係数は、下記式に各濃度を代入することで算出した。
分離係数α=((透過液のエタノール濃度)/(透過液の水濃度))/((供給液のエタノール濃度)/(供給液の水濃度))
[Separation coefficient α]: The separation coefficient was calculated by substituting each concentration into the following equation.
Separation factor α = ((ethanol concentration in permeate) / (water concentration in permeate)) / ((ethanol concentration in feed) / (water concentration in feed))
[透過流速(Flux)(kg/m2h)]:水−酢酸浸透気化分離試験において多孔質支持体側面からの透過液を液体窒素トラップで捕集し、捕集した透過液量の質量をサンプリング時間と膜面積で割ることで透過係数を算出した。 [Permeation flow rate (Flux) (kg / m 2 h)]: In the water-acetic acid permeation vaporization separation test, the permeate from the side of the porous support was collected with a liquid nitrogen trap, and the mass of the collected permeate was measured The permeability coefficient was calculated by dividing by the sampling time and membrane area.
(実施例1)
原料のフェノール樹脂の粉末(商品名「ベルパールS899」、エア・ウォーター社製)を、N−メチル−2−ピロリドンと質量比で10:90となるように混合し、25℃で24時間攪拌した。なお、27kgのN−メチル−2−ピロリドンをプロペラ攪拌機で攪拌しながら、3kgのフェノール樹脂の粉末を10g/minの投入速度でゆっくりと加えた。得られた懸濁液の一部をアドバンテック製の濾紙No.5A(孔径7μm)に通して溶け残りを除去した。
Example 1
The raw material phenol resin powder (trade name “Bellpearl S899”, manufactured by Air Water) was mixed with N-methyl-2-pyrrolidone at a mass ratio of 10:90 and stirred at 25 ° C. for 24 hours. . While 27 kg of N-methyl-2-pyrrolidone was stirred with a propeller stirrer, 3 kg of phenol resin powder was slowly added at a charging rate of 10 g / min. A part of the obtained suspension was filtered with a filter paper No. 1 manufactured by Advantech. The undissolved residue was removed by passing through 5A (pore
直径3cm、長さ16cmで、平均粒径50μm、平均細孔径12μmのモノリス形状のアルミナ製の多孔質支持体上に、平均粒径3μmのアルミナ粒子をろ過製膜法により堆積した後、焼成して、厚み200μm、平均細孔径0.6μmの中間層を形成した。この中間層の上に、更に平均粒径0.3μmのチタニア粒子をろ過製膜法により堆積した後、焼成して、厚み30μm、平均細孔径0.1μmの最表層を形成した。この多孔質支持体上に、上述したフェノール樹脂の前駆体の懸濁液を加圧ディップ法により成膜し、乾燥した。乾燥した膜を更に大気雰囲気下にて200〜350℃で熱処理し、熱硬化により多孔質支持体上に膜を成膜した。熱硬化後の膜の気密性をガス透過量で評価し、所定の気密性を超えるまで成膜を繰り返した。その後、真空中にて、700℃で炭化し、多孔質支持体の表面に炭素膜を形成した。得られた炭素膜を水とエタノールの50/50%溶液を用いて50℃で浸透気化を行った後、80℃で100時間加熱処理した。 Alumina particles having an average particle size of 3 μm are deposited on a monolithic alumina porous support having a diameter of 3 cm, a length of 16 cm, an average particle size of 50 μm, and an average pore size of 12 μm, and then fired. Thus, an intermediate layer having a thickness of 200 μm and an average pore diameter of 0.6 μm was formed. On this intermediate layer, titania particles having an average particle size of 0.3 μm were further deposited by a filtration film forming method, followed by firing to form an outermost layer having a thickness of 30 μm and an average pore size of 0.1 μm. On this porous support, a suspension of the above-mentioned precursor of the phenol resin was formed into a film by a pressure dipping method and dried. The dried film was further heat-treated at 200 to 350 ° C. in an air atmosphere, and a film was formed on the porous support by thermal curing. The airtightness of the film after thermosetting was evaluated by the amount of gas permeation, and the film formation was repeated until a predetermined airtightness was exceeded. Then, it carbonized at 700 degreeC in the vacuum, and formed the carbon film on the surface of the porous support body. The obtained carbon film was pervaporated at 50 ° C. using a 50/50% solution of water and ethanol, and then heat-treated at 80 ° C. for 100 hours.
得られた炭素膜の分離性能を水−酢酸浸透気化分離試験(試験条件:水/酢酸=30/70%、供給液温度70℃、透過側圧力6.7kPa)により評価した。結果を表1に示す。 The separation performance of the obtained carbon membrane was evaluated by a water-acetic acid pervaporation separation test (test conditions: water / acetic acid = 30/70%, supply liquid temperature 70 ° C., permeation side pressure 6.7 kPa). The results are shown in Table 1.
(実施例2〜10及び比較例)
原料として表1に記載の原料、溶媒、濾過方法を行って懸濁液又は溶液を調製した。調製した懸濁液又は溶液を使用して、表1に記載の成膜回数、乾燥条件、担持条件で多孔質支持体上に炭素膜を形成した。懸濁液又は溶液の濁度、及び得られた炭素膜の分離性能の評価結果を表1に併せて記す。
(Examples 2 to 10 and comparative examples)
The raw materials, solvents, and filtration methods described in Table 1 were used as raw materials to prepare suspensions or solutions. Using the prepared suspension or solution, a carbon film was formed on the porous support with the number of film formation, the drying conditions, and the supporting conditions shown in Table 1. The turbidity of the suspension or solution and the evaluation results of the separation performance of the obtained carbon membrane are also shown in Table 1.
なお、表1に記載した、原料の種類、濾過方法の詳細を以下に記す。 In addition, the kind of raw material described in Table 1 and the detail of the filtration method are described below.
(原料)
ベルパールS890(商品名「ベルパールS890」、エア・ウォーター社製)
PR53056(商品名「スミライトレジンPR53056」、住友ベークライト社製、液状)
U−ワニスA(商品名「U−ワニスA」、宇部興産社製、ポリアミック酸溶液)
(material)
Bell Pearl S890 (trade name “Bell Pearl S890”, manufactured by Air Water)
PR53056 (trade name “Sumilite Resin PR53056”, manufactured by Sumitomo Bakelite Co., Ltd., liquid)
U-Varnish A (trade name “U-Varnish A”, manufactured by Ube Industries, polyamic acid solution)
(濾過方法)
25μm篩:目開き25μmの篩を通した。
100μm篩:目開き100μmの篩を通した。
(Filtration method)
25 μm sieve: A sieve having an opening of 25 μm was passed.
100 μm sieve: A sieve having an opening of 100 μm was passed.
なお、原料として、PR53056を用いた場合には、濃度が10%となるように懸濁液を調整した。 When PR53056 was used as a raw material, the suspension was adjusted so that the concentration was 10%.
表1からわかるように、濾過方法で濾紙を使用し、濁度が1.5度だった懸濁液を用いて形成した炭素膜(実施例1、5)は、篩を使用して濾過した懸濁液を用いて形成した炭素膜(実施例2,3,6,7)に比べて、分離係数αが低く、成膜回数も多かった。一方、濁度が1000度を超え測定不能だった懸濁液を用いて形成した炭素膜(実施例8)では、分離係数αが低かった。また、溶媒にエタノールを使用した懸濁液を用いて形成した炭素膜(実施例9)では、成膜回数が多くなり、透過流速(Flux)が少し低かった。更に、原料に液状のフェノール樹脂を用いた懸濁液を用いて形成した炭素膜(実施例10)は、成膜回数が多くなり、透過流速(Flux)が低かった。また、原料としてU−ワニスAを用いた溶液を用いて形成したポリイミド樹脂を前駆体とした炭素膜(比較例)は、フェノール樹脂を前駆体とした炭素膜(実施例1〜10)に比べて、分離係数αが7と大幅に低く、透過流速(Flux)も低かった。 As can be seen from Table 1, the carbon membranes (Examples 1 and 5) formed using the suspension having a turbidity of 1.5 degrees were filtered using a sieve. Compared to the carbon membranes formed using the suspension (Examples 2, 3, 6, and 7), the separation factor α was low and the number of film formations was large. On the other hand, in the carbon membrane (Example 8) formed using the suspension whose turbidity exceeded 1000 degrees and could not be measured, the separation coefficient α was low. Moreover, in the carbon film (Example 9) formed using a suspension using ethanol as a solvent, the number of film formations was increased, and the permeation flow rate (Flux) was slightly low. Furthermore, the carbon film (Example 10) formed using a suspension using a liquid phenol resin as a raw material had a large number of film formation and a low permeation flow rate (Flux). Moreover, the carbon film (comparative example) which made the precursor the polyimide resin formed using the solution which used U-varnish A as a raw material compared with the carbon film (Examples 1-10) which made the phenol resin the precursor. The separation factor α was as low as 7, and the permeation flow rate (Flux) was also low.
本発明の炭素膜の製造方法で製造された炭素膜は、酸を含む混合成分から特定の成分を選択的に分離するフィルタに利用可能である。 The carbon film manufactured by the carbon film manufacturing method of the present invention can be used for a filter that selectively separates a specific component from a mixed component containing an acid.
1:多孔質支持体、2::多孔質基材、3:セル、5:一方の端面、6:他方の端面、7:中間層、8:最表層、10:炭素膜、11:多孔質基材、12,17,18:粒子。 1: porous support, 2 :: porous substrate, 3: cell, 5: one end face, 6: the other end face, 7: intermediate layer, 8: outermost layer, 10: carbon film, 11: porous Base material, 12, 17, 18: particles.
Claims (7)
前記多孔質支持体の最表層の平均細孔径が0.01〜1μmである請求項6に記載の炭素膜の製造方法。 The porous support further comprises a layer composed of particles having an average particle size smaller than the particles constituting the porous substrate;
The method for producing a carbon film according to claim 6, wherein an average pore diameter of an outermost layer of the porous support is 0.01 to 1 μm.
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| EP2759519A4 (en) * | 2011-09-22 | 2015-05-06 | Ngk Insulators Ltd | Method for producing carbon film |
| DE112022003613T5 (en) | 2021-09-10 | 2024-05-16 | Ngk Insulators, Ltd. | Processing method of a separation membrane complex and processing device for a separation membrane complex |
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| DE112022003613T5 (en) | 2021-09-10 | 2024-05-16 | Ngk Insulators, Ltd. | Processing method of a separation membrane complex and processing device for a separation membrane complex |
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