JP2011148955A - Method for producing polyimide film, and the resultant polyimide film - Google Patents
Method for producing polyimide film, and the resultant polyimide film Download PDFInfo
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- JP2011148955A JP2011148955A JP2010013443A JP2010013443A JP2011148955A JP 2011148955 A JP2011148955 A JP 2011148955A JP 2010013443 A JP2010013443 A JP 2010013443A JP 2010013443 A JP2010013443 A JP 2010013443A JP 2011148955 A JP2011148955 A JP 2011148955A
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- Prior art keywords
- polyimide film
- bis
- polyimide
- film
- producing
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- 229920001721 polyimide Polymers 0.000 title claims abstract description 86
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 21
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 18
- 239000003054 catalyst Substances 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 15
- 238000009835 boiling Methods 0.000 claims abstract description 12
- 238000002156 mixing Methods 0.000 claims abstract description 6
- 239000004642 Polyimide Substances 0.000 claims description 33
- 230000018044 dehydration Effects 0.000 claims description 16
- 238000006297 dehydration reaction Methods 0.000 claims description 16
- 125000000962 organic group Chemical group 0.000 claims description 14
- 229910052736 halogen Inorganic materials 0.000 claims description 10
- 150000002367 halogens Chemical class 0.000 claims description 10
- 150000001350 alkyl halides Chemical class 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 150000002431 hydrogen Chemical class 0.000 claims description 5
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 5
- 150000008065 acid anhydrides Chemical group 0.000 claims description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 abstract description 32
- 150000004985 diamines Chemical class 0.000 abstract description 14
- 239000000203 mixture Substances 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 7
- 229910010272 inorganic material Inorganic materials 0.000 abstract description 3
- 239000011147 inorganic material Substances 0.000 abstract description 3
- 238000002845 discoloration Methods 0.000 abstract 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 abstract 1
- 239000010408 film Substances 0.000 description 52
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 42
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 17
- 239000002253 acid Substances 0.000 description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 16
- -1 4-aminophenoxy Chemical group 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 10
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 7
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 235000010290 biphenyl Nutrition 0.000 description 5
- 239000004305 biphenyl Substances 0.000 description 5
- 125000006159 dianhydride group Chemical group 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 239000009719 polyimide resin Substances 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N dimethylmethane Natural products CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000001294 propane Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000004566 building material Substances 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 150000001718 carbodiimides Chemical class 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 150000003949 imides Chemical group 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- QAEDZJGFFMLHHQ-UHFFFAOYSA-N trifluoroacetic anhydride Chemical compound FC(F)(F)C(=O)OC(=O)C(F)(F)F QAEDZJGFFMLHHQ-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- HFBHOAHFRNLZGN-LURJTMIESA-N (2s)-2-formamido-4-methylpentanoic acid Chemical compound CC(C)C[C@@H](C(O)=O)NC=O HFBHOAHFRNLZGN-LURJTMIESA-N 0.000 description 1
- STIUJDCDGZSXGO-UHFFFAOYSA-N (3-amino-4-phenoxyphenyl)-(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C(OC=3C=CC=CC=3)=CC=2)=C1 STIUJDCDGZSXGO-UHFFFAOYSA-N 0.000 description 1
- YKNMIGJJXKBHJE-UHFFFAOYSA-N (3-aminophenyl)-(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=CC(N)=C1 YKNMIGJJXKBHJE-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- PVXRBSHBFJXTNM-UHFFFAOYSA-N 2,6-bis(3-aminophenoxy)benzonitrile Chemical compound NC1=CC=CC(OC=2C(=C(OC=3C=C(N)C=CC=3)C=CC=2)C#N)=C1 PVXRBSHBFJXTNM-UHFFFAOYSA-N 0.000 description 1
- GXVUZYLYWKWJIM-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanamine Chemical compound NCCOCCN GXVUZYLYWKWJIM-UHFFFAOYSA-N 0.000 description 1
- DYGPKZRYPCCCLU-UHFFFAOYSA-N 2-(aminomethoxy)ethoxymethanamine Chemical compound NCOCCOCN DYGPKZRYPCCCLU-UHFFFAOYSA-N 0.000 description 1
- LJVGYWLSCKCZQK-UHFFFAOYSA-N 2-[2-(2-aminoethyl)cyclohexyl]ethanamine Chemical compound NCCC1CCCCC1CCN LJVGYWLSCKCZQK-UHFFFAOYSA-N 0.000 description 1
- NIQFAJBKEHPUAM-UHFFFAOYSA-N 2-[2-[2-(2-aminoethoxy)ethoxy]ethoxy]ethanamine Chemical compound NCCOCCOCCOCCN NIQFAJBKEHPUAM-UHFFFAOYSA-N 0.000 description 1
- HKJUXXFTANXMGQ-UHFFFAOYSA-N 2-[2-[2-(aminomethoxy)ethoxy]ethoxy]ethoxymethanamine Chemical compound NCOCCOCCOCCOCN HKJUXXFTANXMGQ-UHFFFAOYSA-N 0.000 description 1
- IFZOPNLVYZYSMQ-UHFFFAOYSA-N 2-[2-[2-[2-(2-aminoethoxy)ethoxy]ethoxy]ethoxy]ethanamine Chemical compound NCCOCCOCCOCCOCCN IFZOPNLVYZYSMQ-UHFFFAOYSA-N 0.000 description 1
- STMZGJLCKJFMLQ-UHFFFAOYSA-N 2-[3-(2-aminoethyl)cyclohexyl]ethanamine Chemical compound NCCC1CCCC(CCN)C1 STMZGJLCKJFMLQ-UHFFFAOYSA-N 0.000 description 1
- XUXZELZSNNYLRE-UHFFFAOYSA-N 2-[4-(2-aminoethyl)cyclohexyl]ethanamine Chemical compound NCCC1CCC(CCN)CC1 XUXZELZSNNYLRE-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- SAVPSRHNNQVBLW-UHFFFAOYSA-N 3,5-diethylpyridine Chemical compound CCC1=CN=CC(CC)=C1 SAVPSRHNNQVBLW-UHFFFAOYSA-N 0.000 description 1
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 1
- OLQWMCSSZKNOLQ-UHFFFAOYSA-N 3-(2,5-dioxooxolan-3-yl)oxolane-2,5-dione Chemical compound O=C1OC(=O)CC1C1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- ZMPZWXKBGSQATE-UHFFFAOYSA-N 3-(4-aminophenyl)sulfonylaniline Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=CC(N)=C1 ZMPZWXKBGSQATE-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- FGWQCROGAHMWSU-UHFFFAOYSA-N 3-[(4-aminophenyl)methyl]aniline Chemical compound C1=CC(N)=CC=C1CC1=CC=CC(N)=C1 FGWQCROGAHMWSU-UHFFFAOYSA-N 0.000 description 1
- UCFMKTNJZCYBBJ-UHFFFAOYSA-N 3-[1-(2,3-dicarboxyphenyl)ethyl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)C1=CC=CC(C(O)=O)=C1C(O)=O UCFMKTNJZCYBBJ-UHFFFAOYSA-N 0.000 description 1
- DTSHAMICSDYNNJ-UHFFFAOYSA-N 3-[1-(3-aminophenyl)-1-phenylethyl]aniline Chemical compound C=1C=CC(N)=CC=1C(C=1C=C(N)C=CC=1)(C)C1=CC=CC=C1 DTSHAMICSDYNNJ-UHFFFAOYSA-N 0.000 description 1
- FTIIWFAHAYJAGW-UHFFFAOYSA-N 3-[1-(4-aminophenyl)-1-phenylethyl]aniline;4-[1-(4-aminophenyl)-1-phenylethyl]aniline Chemical compound C=1C=C(N)C=CC=1C(C=1C=CC(N)=CC=1)(C)C1=CC=CC=C1.C=1C=C(N)C=CC=1C(C=1C=C(N)C=CC=1)(C)C1=CC=CC=C1 FTIIWFAHAYJAGW-UHFFFAOYSA-N 0.000 description 1
- DFSUKONUQMHUKQ-UHFFFAOYSA-N 3-[2-(2,3-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phthalic acid Chemical compound OC(=O)C1=CC=CC(C(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)(C(F)(F)F)C(F)(F)F)=C1C(O)=O DFSUKONUQMHUKQ-UHFFFAOYSA-N 0.000 description 1
- PAHZZOIHRHCHTH-UHFFFAOYSA-N 3-[2-(2,3-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)(C)C1=CC=CC(C(O)=O)=C1C(O)=O PAHZZOIHRHCHTH-UHFFFAOYSA-N 0.000 description 1
- UVUCUHVQYAPMEU-UHFFFAOYSA-N 3-[2-(3-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound NC1=CC=CC(C(C=2C=C(N)C=CC=2)(C(F)(F)F)C(F)(F)F)=C1 UVUCUHVQYAPMEU-UHFFFAOYSA-N 0.000 description 1
- DVXYMCJCMDTSQA-UHFFFAOYSA-N 3-[2-(3-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=CC(N)=CC=1C(C)(C)C1=CC=CC(N)=C1 DVXYMCJCMDTSQA-UHFFFAOYSA-N 0.000 description 1
- DOAYUKLNEKRLCQ-UHFFFAOYSA-N 3-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=CC(N)=C1 DOAYUKLNEKRLCQ-UHFFFAOYSA-N 0.000 description 1
- HIYRIYOUSQLJHP-UHFFFAOYSA-N 3-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=CC(N)=CC=1C(C)(C)C1=CC=C(N)C=C1 HIYRIYOUSQLJHP-UHFFFAOYSA-N 0.000 description 1
- JCEZOHLWDIONSP-UHFFFAOYSA-N 3-[2-[2-(3-aminopropoxy)ethoxy]ethoxy]propan-1-amine Chemical compound NCCCOCCOCCOCCCN JCEZOHLWDIONSP-UHFFFAOYSA-N 0.000 description 1
- FVUIAOHMTFHVTE-UHFFFAOYSA-N 3-[2-[2-[2-(3-aminopropoxy)ethoxy]ethoxy]ethoxy]propan-1-amine Chemical compound NCCCOCCOCCOCCOCCCN FVUIAOHMTFHVTE-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- GBUNNYTXPDCASY-UHFFFAOYSA-N 3-[3-[2-[3-(3-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(C=CC=2)C(C=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)(C(F)(F)F)C(F)(F)F)=C1 GBUNNYTXPDCASY-UHFFFAOYSA-N 0.000 description 1
- NYRFBMFAUFUULG-UHFFFAOYSA-N 3-[4-[2-[4-(3-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=C(N)C=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=CC(N)=C1 NYRFBMFAUFUULG-UHFFFAOYSA-N 0.000 description 1
- XWQGVRJTNLTVBP-UHFFFAOYSA-N 3-[4-[2-[4-[2-[4-(3-aminophenoxy)phenyl]propan-2-yl]phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=CC(N)=C1 XWQGVRJTNLTVBP-UHFFFAOYSA-N 0.000 description 1
- UCQABCHSIIXVOY-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]phenoxy]aniline Chemical group NC1=CC=CC(OC=2C=CC(=CC=2)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 UCQABCHSIIXVOY-UHFFFAOYSA-N 0.000 description 1
- JERFEOKUSPGKGV-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfanylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(SC=3C=CC(OC=4C=C(N)C=CC=4)=CC=3)=CC=2)=C1 JERFEOKUSPGKGV-UHFFFAOYSA-N 0.000 description 1
- YJRWUTMEGNLLNV-UHFFFAOYSA-N 3-[6-(3-aminophenoxy)pyridin-2-yl]oxyaniline Chemical compound NC1=CC=CC(OC=2N=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 YJRWUTMEGNLLNV-UHFFFAOYSA-N 0.000 description 1
- GPXCORHXFPYJEH-UHFFFAOYSA-N 3-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)CCCN GPXCORHXFPYJEH-UHFFFAOYSA-N 0.000 description 1
- OQASAQLBBINTDT-UHFFFAOYSA-N 3-[[5'-(3-aminophenoxy)-1,1,1',1'-tetramethyl-3,3'-spirobi[2h-indene]-5-yl]oxy]aniline Chemical compound C12=CC(OC=3C=C(N)C=CC=3)=CC=C2C(C)(C)CC1(C1=C2)CC(C)(C)C1=CC=C2OC1=CC=CC(N)=C1 OQASAQLBBINTDT-UHFFFAOYSA-N 0.000 description 1
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- IWXCYYWDGDDPAC-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)methyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C(C(O)=O)=C1 IWXCYYWDGDDPAC-UHFFFAOYSA-N 0.000 description 1
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- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 1
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Landscapes
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Abstract
Description
本発明は、低着色かつ寸法安定性に優れる高分子化合物に関する。好適には、耐熱性優れるポリイミドに関し、特に、耐熱性と共に低着色かつ寸法安定性に対する要求が高い製品又は部材を形成するための材料(例えば、表示装置ガラス代替など)として好適に利用できるポリイミドフィルムの製造方法、当該ポリイミドフィルムの製造方法により得られたポリイミドフィルムに関するものである。 The present invention relates to a polymer compound that is low in color and excellent in dimensional stability. Preferably, it relates to polyimide having excellent heat resistance, and in particular, a polyimide film that can be suitably used as a material (for example, a substitute for display device glass) for forming a product or member that is highly colored with heat resistance and requires high dimensional stability. The manufacturing method of this and the polyimide film obtained by the manufacturing method of the said polyimide film are related.
近年、液晶や有機EL、電子ペーパー等のディスプレイや、太陽電池、タッチパネル等のエレクトロニクスの急速な進歩に伴い、デバイスの薄型化や軽量化、更には、フレキシブル化が要求されるようになってきた。これらのデバイスにはガラス板上に様々な電子素子、例えば、薄型トランジスタや透明電極等が形成されているが、このガラス材料をフィルム材料に変えることにより、パネル自体のフレキシブル化、薄型化や軽量化が図れる。しかしながら電子素子の形成プロセスの高い温度に耐えられるフィルム材料がこれまで存在しなかった。 In recent years, with the rapid progress of displays such as liquid crystal, organic EL, and electronic paper, and electronics such as solar cells and touch panels, devices have been required to be thinner and lighter, and more flexible. . In these devices, various electronic elements such as thin transistors and transparent electrodes are formed on a glass plate. By changing this glass material to a film material, the panel itself becomes flexible, thin and lightweight. Can be achieved. However, there has been no film material that can withstand the high temperature of the formation process of electronic devices.
また無機材料からなる電子素子をフィルム上に形成した場合、無機材料とフィルムの線膨張係数が大きく違うこともあり、無機素子を形成したフィルムが曲がったり、更には、無機素子がフィルムから剥がれてしまう場合があった。このため、透明性と耐熱性を有しながら、これらの問題がないフィルム材料が望まれていた。 In addition, when an electronic element made of an inorganic material is formed on a film, the linear expansion coefficient of the inorganic material and the film may be greatly different, the film on which the inorganic element is formed may be bent, and further, the inorganic element may be peeled off from the film. There was a case. For this reason, a film material that has transparency and heat resistance and does not have these problems has been desired.
ポリイミドは耐熱性と共に高い絶縁性能を有することから、半導体や電子部品への応用がなされてきた。電子部品では、単結晶シリコンや銅などの金属と積層される場合が多く、ポリイミドの線熱膨張係数を単結晶シリコンや金属並に小さくする試みは従来から行われてきた。 Since polyimide has high insulation performance as well as heat resistance, it has been applied to semiconductors and electronic components. Electronic parts are often laminated with a metal such as single crystal silicon or copper, and attempts have been made to reduce the linear thermal expansion coefficient of polyimide to the same level as single crystal silicon or metal.
ポリイミドの線熱膨張係数に大きく影響を与える因子として、その化学構造が挙げられる。一般に、ポリイミドの高分子鎖が剛直で直線性が高いほど膨張率は下がるといわれており、膨張率を下げる為、ポリイミドの原料である酸二無水物、ジアミン双方で種々の構造が提案されてきた。 The chemical structure is a factor that greatly affects the linear thermal expansion coefficient of polyimide. Generally, it is said that the higher the rigidity and linearity of the polyimide polymer chain, the lower the expansion coefficient. In order to reduce the expansion coefficient, various structures have been proposed for both acid dianhydrides and diamines, which are polyimide raw materials. It was.
例えば、特許文献1では、3,3',4,4'-ビフェニルテトラカルボン酸二無水物と2,2'-ビス(トリフルオロメチル)ベンジジンから得られるポリアミド酸溶液をキャストして得られたフィルムを、脱水触媒及びイミド化剤溶液の中に浸漬することにより、ポリイミドフィルムを得ている。浸漬して作成することにより、フィルムの線膨張係数が改善されたと記載されている。 For example, Patent Document 1 is obtained by casting a polyamic acid solution obtained from 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride and 2,2′-bis (trifluoromethyl) benzidine. A polyimide film is obtained by immersing the film in a dehydration catalyst and imidizing agent solution. It is described that the linear expansion coefficient of the film was improved by dipping.
また、特許文献2には、3,3',4,4'-ビフェニルテトラカルボン酸二無水物と2,2'-ビス(トリフルオロメチル)ベンジジンをm−クレゾール中で反応させて得られたポリアミド酸を、300℃まで徐々に加熱することでポリイミドを得たことが記載されているが、線膨張係数や、耐熱性(Tg)の面で満足するものではなかった。 Patent Document 2 was obtained by reacting 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride and 2,2′-bis (trifluoromethyl) benzidine in m-cresol. Although it is described that the polyimide was obtained by gradually heating the polyamic acid to 300 ° C., it was not satisfactory in terms of linear expansion coefficient and heat resistance (Tg).
以上のように、ポリイミドの耐熱性を維持しつつ、透明でさらなる線膨張係数の小さいポリイミドフィルムの開発が求められていた。 As described above, there has been a demand for the development of a polyimide film that is transparent and has a smaller linear expansion coefficient while maintaining the heat resistance of the polyimide.
本発明は、上記実情を鑑みて成し遂げられたものであり、耐熱性、更には線膨張係数等が優れるポリイミドフィルムを得ることを目的としているが。あわせて、着色が大幅に低減されたポリイミドフィルムを得ることを目的とする。 The present invention has been accomplished in view of the above circumstances, and an object of the present invention is to obtain a polyimide film having excellent heat resistance, linear expansion coefficient, and the like. In addition, an object is to obtain a polyimide film in which coloring is greatly reduced.
本願発明の構成は以下のものである。 The configuration of the present invention is as follows.
1). 下記式(1)で表される繰り返し単位を含むポリイミドの製造方法であり、ポリアミック酸溶液に脱水触媒及び180℃以下の沸点を有するイミド化剤を含む溶液を混合した溶液を支持体上に流延することにより作成することを特徴とする、ポリイミドフィルムの製造方法。 1). This is a method for producing a polyimide containing a repeating unit represented by the following formula (1), and a solution obtained by mixing a polyamic acid solution with a solution containing a dehydration catalyst and an imidizing agent having a boiling point of 180 ° C. or lower is flowed on a support. It produces by extending, The manufacturing method of the polyimide film characterized by the above-mentioned.
式中R1は下記一般式(2)から選択される4価の有機基を、また、R2は下記一般式(3)から選択される2価の有機基を示し、 In the formula, R 1 represents a tetravalent organic group selected from the following general formula (2), R 2 represents a divalent organic group selected from the following general formula (3),
式中R3は、水素、ハロゲン、ハロゲン化アルキル、C1〜C16のアルキル基を示す。 In the formula, R 3 represents hydrogen, halogen, alkyl halide, or a C1-C16 alkyl group.
2). R2が下記一般式(4)から選択される2価の有機基であることを特徴とする1)に記載のポリイミドフィルムの製造方法。 2). R 2 is a divalent organic group selected from the following general formula (4): 1) The method for producing a polyimide film according to 1).
式中R3は、水素、ハロゲン、ハロゲン化アルキル、C1〜C16のアルキル基を示す。 In the formula, R 3 represents hydrogen, halogen, alkyl halide, or a C1-C16 alkyl group.
3). R3がハロゲン、もしくは、ハロゲン化アルキルであることを特徴とする1)又は2)に記載のポリイミドフィルムの製造方法。 3). The method for producing a polyimide film according to 1) or 2), wherein R 3 is halogen or alkyl halide.
4). R3がトリフルオロメチル基であることを特徴とする1)乃至3)のいずれかに記載のポリイミドフィルムの製造方法。 4). The process for producing a polyimide film as described in any of 1) to 3) wherein R 3 is a trifluoromethyl group.
5). 前記式(1)で表される繰り返し単位として、前記R1の構造が下記一般式(5)から選択される4価の有機基であることを特徴とする1)乃至4)のいずれかに記載のポリイミドフィルムの製造方法。 5). As one of the repeating units represented by the formula (1), the structure of R 1 is a tetravalent organic group selected from the following general formula (5): The manufacturing method of the polyimide film of description.
6). 脱水触媒が酸無水物から選ばれることを特徴とする、請求項1乃至5のいずれかに記載のポリイミドフィルムの製造方法。 6). The method for producing a polyimide film according to any one of claims 1 to 5, wherein the dehydration catalyst is selected from acid anhydrides.
7). イミド化剤の添加量が、ポリアミド酸のカルボン酸に対して0.01モル倍当量以上2.0モル倍当量以下を用いることを特徴とする、1)乃至6)のいずれかに記載のポリイミドフィルムの製造方法。 7). The polyimide according to any one of 1) to 6), wherein the amount of the imidizing agent used is 0.01 mole equivalent or more and 2.0 mole equivalent or less with respect to the carboxylic acid of the polyamic acid. A method for producing a film.
8). フィルムのYIが20以下であることを特徴とする1)乃至7)のいずれかに記載の方法で製造されたポリイミドフィルム。 8). The polyimide film manufactured by the method according to any one of 1) to 7), wherein the YI of the film is 20 or less.
9). 重量平均分子量が3,000以上であるポリアミド酸をイミド化して得られる8)に記載のポリイミドフィルム。 9). The polyimide film as described in 8) obtained by imidizing the polyamic acid whose weight average molecular weight is 3,000 or more.
上記本発明に係る方法により得られるポリイミドフィルムは、透明性、耐熱性、低線膨張性に加えて、着色性が大幅に改良されており、耐熱性、低膨張性(寸法安定性)が必要とされる部材用のフィルムとして好適である。具体的には例えば、印刷物、カラーフィルター、フレキシブルディスプレー、半導体部品、層間絶縁膜、配線被覆膜、光回路、光回路部品、反射防止膜、ホログラム、光学部材又は建築材料や構造物としての利用が期待される。 In addition to transparency, heat resistance, and low linear expansion, the polyimide film obtained by the method according to the present invention has greatly improved colorability and requires heat resistance and low expansion (dimensional stability). It is suitable as a film for members. Specifically, for example, printed materials, color filters, flexible displays, semiconductor parts, interlayer insulating films, wiring coating films, optical circuits, optical circuit parts, antireflection films, holograms, optical members, or use as building materials or structures There is expected.
以下において本発明を詳しく説明する。
本発明で製造されるポリイミドは、式(1)で表される繰り返し単位を含むポリイミドである。式(1)中のR1は式(2)にあげられている特定構造を有する4価の有機基である。
The present invention is described in detail below.
The polyimide manufactured by this invention is a polyimide containing the repeating unit represented by Formula (1). R 1 in the formula (1) is a tetravalent organic group having a specific structure listed in the formula (2).
その具体例としては、後述する各酸二無水物成分に対応する4価の有機基、すなわち、酸二無水物成分からポリイミド鎖の形成に関与する酸無水物基を取り除いた構造が挙げられる。式(2)にあげる4価の有機基を有する酸二無水物は2種以上を併用して用いることができる。式(2)にあげる4価の有機基のうち、特に式(5)に示すベンゼンもしくはビフェニルがこのましい。 Specific examples thereof include a structure in which a tetravalent organic group corresponding to each acid dianhydride component described later, that is, an acid anhydride group involved in the formation of a polyimide chain is removed from the acid dianhydride component. Two or more kinds of acid dianhydrides having a tetravalent organic group listed in formula (2) can be used in combination. Of the tetravalent organic groups listed in formula (2), benzene or biphenyl represented by formula (5) is particularly preferable.
ベンゼンもしくはビフェニルを有する具体的化合物としてはそれぞれ、ピロメリット酸二無水物、および、3,3',4,4'-ビフェニルテトラカルボン酸二無水物をあげることができるが、中でも3,3',4,4'-ビフェニルテトラカルボン酸二無水物が好ましい。 Specific compounds having benzene or biphenyl may include pyromellitic dianhydride and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, respectively. Among them, 3,3 ′ 4,4′-biphenyltetracarboxylic dianhydride is preferred.
本願発明のポリイミドフィルムは酸成分の全部が式(2)の構造を有する酸二無水物を用いて製造されるのが好ましいが、上記式(2)の構造のみならず、1種以上の式(2)の構造を有さない酸二無水物を併用して用いることができる。(2)の構造を有さない併用可能な他の酸二無水物は酸二無水物全体の70モル%、好ましくは50モル%、さらには25モル%を超えない範囲で用いても良い。酸二無水物を2種以上用いる場合、それらは、規則的に配列されていてもよいし、ランダムにポリイミド中に存在していてもよい。 The polyimide film of the present invention is preferably produced using an acid dianhydride in which all of the acid components have the structure of the formula (2), but not only the structure of the above formula (2) but also one or more formulas An acid dianhydride having no structure of (2) can be used in combination. Other acid dianhydrides that can be used in combination without having the structure of (2) may be used within a range not exceeding 70 mol%, preferably 50 mol%, and further not exceeding 25 mol% of the entire acid dianhydride. When using 2 or more types of acid dianhydrides, they may be regularly arranged or may be present in the polyimide randomly.
併用可能な他の酸二無水物としては、例えば、エチレンテトラカルボン酸二無水物、ブタンテトラカルボン酸二無水物、シクロブタンテトラカルボン酸二無水物、シクロペンタンテトラカルボン酸二無水物、3,3',4,4'−ベンゾフェノンテトラカルボン酸二無水物、2,2',3,3'−ベンゾフェノンテトラカルボン酸二無水物、2,2',3,3'−ビフェニルテトラカルボン酸二無水物、2,2−ビス(3,4−ジカルボキシフェニル)プロパン二無水物、2,2−ビス(2,3−ジカルボキシフェニル)プロパン二無水物、ビス(3,4−ジカルボキシフェニル)エーテル二無水物、ビス(3,4−ジカルボキシフェニル)スルホン二無水物、1,1−ビス(2,3−ジカルボキシフェニル)エタン二無水物、ビス(2,3−ジカルボキシフェニル)メタン二無水物、ビス(3,4−ジカルボキシフェニル)メタン二無水物、2,2−ビス(3,4−ジカルボキシフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン二無水物、2,2−ビス(2,3−ジカルボキシフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン二無水物、1,3−ビス[(3,4−ジカルボキシ)ベンゾイル]ベンゼン二無水物、1,4−ビス[(3,4−ジカルボキシ)ベンゾイル]ベンゼン二無水物、2,2−ビス{4−[4−(1,2−ジカルボキシ)フェノキシ]フェニル}プロパン二無水物、2,2−ビス{4−[3−(1,2−ジカルボキシ)フェノキシ]フェニル}プロパン二無水物、ビス{4−[4−(1,2−ジカルボキシ)フェノキシ]フェニル}ケトン二無水物、ビス{4−[3−(1,2−ジカルボキシ)フェノキシ]フェニル}ケトン二無水物、4,4'−ビス[4−(1,2−ジカルボキシ)フェノキシ]ビフェニル二無水物、4,4'−ビス[3−(1,2−ジカルボキシ)フェノキシ]ビフェニル二無水物、ビス{4−[4−(1,2−ジカルボキシ)フェノキシ]フェニル}ケトン二無水物、ビス{4−[3−(1,2−ジカルボキシ)フェノキシ]フェニル}ケトン二無水物、ビス{4−[4−(1,2−ジカルボキシ)フェノキシ]フェニル}スルホン二無水物、ビス{4−[3−(1,2−ジカルボキシ)フェノキシ]フェニル}スルホン二無水物、ビス{4−[4−(1,2−ジカルボキシ)フェノキシ]フェニル}スルフィド二無水物、ビス{4−[3−(1,2−ジカルボキシ)フェノキシ]フェニル}スルフィド二無水物、2,2−ビス{4−[4−(1,2−ジカルボキシ)フェノキシ]フェニル}−1,1,1,3,3,3−ヘキサフルプロパン二無水物、2,2−ビス{4−[3−(1,2−ジカルボキシ)フェノキシ]フェニル}−1,1,1,3,3,3−プロパン二無水物、2,3,6,7−ナフタレンテトラカルボン酸二無水物、1,4,5,8−ナフタレンテトラカルボン酸二無水物、1,2,5,6−ナフタレンテトラカルボン酸二無水物、1,2,3,4−ベンゼンテトラカルボン酸二無水物、3,4,9,10−ペリレンテトラカルボン酸二無水物、2,3,6,7−アントラセンテトラカルボン酸二無水物、1,2,7,8−フェナントレンテトラカルボン酸二無水物等が挙げられる。 Other acid dianhydrides that can be used in combination include, for example, ethylenetetracarboxylic dianhydride, butanetetracarboxylic dianhydride, cyclobutanetetracarboxylic dianhydride, cyclopentanetetracarboxylic dianhydride, 3, 3 ', 4,4'-benzophenonetetracarboxylic dianhydride, 2,2', 3,3'-benzophenonetetracarboxylic dianhydride, 2,2 ', 3,3'-biphenyltetracarboxylic dianhydride 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxyphenyl) propane dianhydride, bis (3,4-dicarboxyphenyl) ether Dianhydride, bis (3,4-dicarboxyphenyl) sulfone dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, bis (2,3-dicar Xylphenyl) methane dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, 2,2-bis (3,4-dicarboxyphenyl) -1,1,1,3,3,3-hexa Fluoropropane dianhydride, 2,2-bis (2,3-dicarboxyphenyl) -1,1,1,3,3,3-hexafluoropropane dianhydride, 1,3-bis [(3,4 -Dicarboxy) benzoyl] benzene dianhydride, 1,4-bis [(3,4-dicarboxy) benzoyl] benzene dianhydride, 2,2-bis {4- [4- (1,2-dicarboxy) ) Phenoxy] phenyl} propane dianhydride, 2,2-bis {4- [3- (1,2-dicarboxy) phenoxy] phenyl} propane dianhydride, bis {4- [4- (1,2- Dicarboxy) phenoxy] phenyl} keto Dianhydride, bis {4- [3- (1,2-dicarboxy) phenoxy] phenyl} ketone dianhydride, 4,4′-bis [4- (1,2-dicarboxy) phenoxy] biphenyl dianhydride 4,4′-bis [3- (1,2-dicarboxy) phenoxy] biphenyl dianhydride, bis {4- [4- (1,2-dicarboxy) phenoxy] phenyl} ketone dianhydride, Bis {4- [3- (1,2-dicarboxy) phenoxy] phenyl} ketone dianhydride, bis {4- [4- (1,2-dicarboxy) phenoxy] phenyl} sulfone dianhydride, bis { 4- [3- (1,2-dicarboxy) phenoxy] phenyl} sulfone dianhydride, bis {4- [4- (1,2-dicarboxy) phenoxy] phenyl} sulfide dianhydride, bis {4- [3- (1,2-Zika Boxy) phenoxy] phenyl} sulfide dianhydride, 2,2-bis {4- [4- (1,2-dicarboxy) phenoxy] phenyl} -1,1,1,3,3,3-hexafulpropane Dianhydride, 2,2-bis {4- [3- (1,2-dicarboxy) phenoxy] phenyl} -1,1,1,3,3,3-propane dianhydride, 2,3,6 , 7-Naphthalenetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 1,2,3,4 Benzenetetracarboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, 2,3,6,7-anthracenetetracarboxylic dianhydride, 1,2,7,8-phenanthrene And tetracarboxylic dianhydride That.
一方、式(1)中のR2は2価の有機基で式(3)で示す構造を有するものである。具体的には式(3)の構造を有するジアミンを用いて式(1)の構造を有するポリイミドを得ることが出来る。これらジアミンは2種以上を併用して用いることができる。式(3)のうち、好ましくは、式(4)に示すベンゼンもしくはビフェニルである。 On the other hand, R 2 in the formula (1) is a divalent organic group having a structure represented by the formula (3). Specifically, the polyimide which has a structure of Formula (1) can be obtained using the diamine which has a structure of Formula (3). These diamines can be used in combination of two or more. Of the formula (3), benzene or biphenyl represented by the formula (4) is preferable.
式(3)、(4)中のR3は、水素、ハロゲン、ハロゲン化アルキル、C1〜C16のアルキル基を示す一価の有機基である。得られるポリイミドの透明性、耐熱性、及び寸法安定性から、ハロゲンやハロゲン化アルキルなどの電子吸引基が好ましく、ハロゲンやハロゲン化アルキルのハロゲンとしてはフッ素が好ましく、中でもフッ素原子もしくはトリフルオロメチル基、特にはトリフルオロメチル基が好ましい。R2として最も好ましくは、2,2'-ビス(トリフルオロメチル)ベンジジン残基が挙げられる。 R 3 in the formulas (3) and (4) is a monovalent organic group representing hydrogen, halogen, alkyl halide, or a C1-C16 alkyl group. From the transparency, heat resistance, and dimensional stability of the resulting polyimide, electron withdrawing groups such as halogen and alkyl halides are preferred. As halogens of halogen and halogenated alkyls, fluorine is preferred, among which fluorine atoms or trifluoromethyl groups. In particular, a trifluoromethyl group is preferred. R 2 is most preferably a 2,2′-bis (trifluoromethyl) benzidine residue.
本願発明のポリイミドフィルムにはジアミン成分として全部が式(3)の構造を有するジアミンを用いるのが好ましいが、式(3)で示される構造を有するジアミンと他のジアミンを1種以上併用して用いることができる。併用可能な他のジアミンとしては、ポリイミドの透明性を確保できる範囲内で目的の物性に応じて、ジアミン全体の70モル%、好ましくは50モル%、さらには25モル%を超えない範囲で用いてもかまわない。また、2種以上のジアミンを用いる場合それらは、規則的に配列されていてもよいし、ランダムにポリイミド中に存在していてもよい。 It is preferable to use a diamine having the structure of the formula (3) as the diamine component for the polyimide film of the present invention. However, the diamine having the structure represented by the formula (3) and one or more other diamines are used in combination. Can be used. As other diamines that can be used in combination, 70 mol%, preferably 50 mol%, more preferably 25 mol% of the whole diamine is used within the range in which the transparency of the polyimide can be ensured. It doesn't matter. Moreover, when using 2 or more types of diamine, they may be arranged regularly and may exist in a polyimide at random.
式(3)で示される構造を有するジアミンと併用可能な他のジアミンとして、例えば、3,3'−ジアミノジフェニルエーテル、3,4'−ジアミノジフェニルエーテル、4,4'−ジアミノジフェニルエーテル、3,3'−ジアミノジフェニルスルフィド、3,4'−ジアミノジフェニルスルフィド、4,4'−ジアミノジフェニルスルフィド、3,3'−ジアミノジフェニルスルホン、3,4'−ジアミノジフェニルスルホン、4,4'−ジアミノジフェニルスルホン、3,3'−ジアミノベンゾフェノン、4,4'−ジアミノベンゾフェノン、3,4'−ジアミノベンゾフェノン、3,3'−ジアミノジフェニルメタン、4,4'−ジアミノジフェニルメタン、3,4'−ジアミノジフェニルメタン、2,2−ジ(3−アミノフェニル)プロパン、2,2−ジ(4−アミノフェニル)プロパン、2−(3−アミノフェニル)−2−(4−アミノフェニル)プロパン、2,2−ジ(3−アミノフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン、2,2−ジ(4−アミノフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン、2−(3−アミノフェニル)−2−(4−アミノフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン、1,1−ジ(3−アミノフェニル)−1−フェニルエタン、1,1−ジ(4−アミノフェニル)−1−フェニルエタン、1−(3−アミノフェニル)−1−(4−アミノフェニル)−1−フェニルエタン、1,3−ビス(3−アミノフェノキシ)ベンゼン、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,4−ビス(3−アミノフェノキシ)ベンゼン、1,4−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノベンゾイル)ベンゼン、1,3−ビス(4−アミノベンゾイル)ベンゼン、1,4−ビス(3−アミノベンゾイル)ベンゼン、1,4−ビス(4−アミノベンゾイル)ベンゼン、1,3−ビス(3−アミノ−α,α−ジメチルベンジル)ベンゼン、1,3−ビス(4−アミノ−α,α−ジメチルベンジル)ベンゼン、1,4−ビス(3−アミノ−α,α−ジメチルベンジル)ベンゼン、1,4−ビス(4−アミノ−α,α−ジメチルベンジル)ベンゼン、1,3−ビス(3−アミノ−α,α−ジトリフルオロメチルベンジル)ベンゼン、1,3−ビス(4−アミノ−α,α−ジトリフルオロメチルベンジル)ベンゼン、1,4−ビス(3−アミノ−α,α−ジトリフルオロメチルベンジル)ベンゼン、1,4−ビス(4−アミノ−α,α−ジトリフルオロメチルベンジル)ベンゼン、2,6−ビス(3−アミノフェノキシ)ベンゾニトリル、2,6−ビス(3−アミノフェノキシ)ピリジン、4,4'−ビス(3−アミノフェノキシ)ビフェニル、4,4'−ビス(4−アミノフェノキシ)ビフェニル、ビス[4−(3−アミノフェノキシ)フェニル]ケトン、ビス[4−(4−アミノフェノキシ)フェニル]ケトン、ビス[4−(3−アミノフェノキシ)フェニル]スルフィド、ビス[4−(4−アミノフェノキシ)フェニル]スルフィド、ビス[4−(3−アミノフェノキシ)フェニル]スルホン、ビス[4−(4−アミノフェノキシ)フェニル]スルホン、ビス[4−(3−アミノフェノキシ)フェニル]エーテル、ビス[4−(4−アミノフェノキシ)フェニル]エーテル、2,2−ビス[4−(3−アミノフェノキシ)フェニル]プロパン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]プロパン、2,2−ビス[3−(3−アミノフェノキシ)フェニル]−1,1,1,3,3,3−ヘキサフルオロプロパン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]−1,1,1,3,3,3−ヘキサフルオロプロパン、1,3−ビス[4−(3−アミノフェノキシ)ベンゾイル]ベンゼン、1,3−ビス[4−(4−アミノフェノキシ)ベンゾイル]ベンゼン、1,4−ビス[4−(3−アミノフェノキシ)ベンゾイル]ベンゼン、1,4−ビス[4−(4−アミノフェノキシ)ベンゾイル]ベンゼン、1,3−ビス[4−(3−アミノフェノキシ)−α,α−ジメチルベンジル]ベンゼン、1,3−ビス[4−(4−アミノフェノキシ)−α,α−ジメチルベンジル]ベンゼン、1,4−ビス[4−(3−アミノフェノキシ)−α,α−ジメチルベンジル]ベンゼン、1,4−ビス[4−(4−アミノフェノキシ)−α,α−ジメチルベンジル]ベンゼン、4,4'−ビス[4−(4−アミノフェノキシ)ベンゾイル]ジフェニルエーテル、4,4'−ビス[4−(4−アミノ−α,α−ジメチルベンジル)フェノキシ]ベンゾフェノン、4,4'−ビス[4−(4−アミノ−α,α−ジメチルベンジル)フェノキシ]ジフェニルスルホン、4,4'−ビス[4−(4−アミノフェノキシ)フェノキシ]ジフェニルスルホン、3,3'−ジアミノ−4,4'−ジフェノキシベンゾフェノン、3,3'−ジアミノ−4,4'−ジビフェノキシベンゾフェノン、3,3'−ジアミノ−4−フェノキシベンゾフェノン、3,3'−ジアミノ−4−ビフェノキシベンゾフェノン、6,6'−ビス(3−アミノフェノキシ)−3,3,3',3'−テトラメチル−1,1'−スピロビインダン、6,6'−ビス(4−アミノフェノキシ)−3,3,3',3'−テトラメチル−1,1'−スピロビインダン、1,3−ビス(3−アミノプロピル)テトラメチルジシロキサン、1,3−ビス(4−アミノブチル)テトラメチルジシロキサン、α,ω−ビス(3−アミノプロピル)ポリジメチルシロキサン、α,ω−ビス(3−アミノブチル)ポリジメチルシロキサン、ビス(アミノメチル)エーテル、ビス(2−アミノエチル)エーテル、ビス(3−アミノプロピル)エーテル、ビス(2−アミノメトキシ)エチル]エーテル、ビス[2−(2−アミノエトキシ)エチル]エーテル、ビス[2−(3−アミノプロトキシ)エチル]エーテル、1,2−ビス(アミノメトキシ)エタン、1,2−ビス(2−アミノエトキシ)エタン、1,2−ビス[2−(アミノメトキシ)エトキシ]エタン、1,2−ビス[2−(2−アミノエトキシ)エトキシ]エタン、エチレングリコールビス(3−アミノプロピル)エーテル、ジエチレングリコールビス(3−アミノプロピル)エーテル、トリエチレングリコールビス(3−アミノプロピル)エーテル、エチレンジアミン、1,3−ジアミノプロパン、1,4−ジアミノブタン、1,5−ジアミノペンタン、1,6−ジアミノヘキサン、1,7−ジアミノヘプタン、1,8−ジアミノオクタン、1,9−ジアミノノナン、1,10−ジアミノデカン、1,11−ジアミノウンデカン、1,12−ジアミノドデカン、1,2−ジアミノシクロヘキサン、1,3−ジアミノシクロヘキサン、1,4−ジアミノシクロヘキサン、1,2−ジ(2−アミノエチル)シクロヘキサン、1,3−ジ(2−アミノエチル)シクロヘキサン、1,4−ジ(2−アミノエチル)シクロヘキサン、ビス(4−アミノシクロへキシル)メタン、2,6−ビス(アミノメチル)ビシクロ[2.2.1]ヘプタン、2,5−ビス(アミノメチル)ビシクロ[2.2.1]ヘプタンが挙げられる。 Examples of other diamines that can be used in combination with the diamine having the structure represented by formula (3) include 3,3′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenyl ether, and 3,3 ′. -Diaminodiphenyl sulfide, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 3,3′-diaminobenzophenone, 4,4′-diaminobenzophenone, 3,4′-diaminobenzophenone, 3,3′-diaminodiphenylmethane, 4,4′-diaminodiphenylmethane, 3,4′-diaminodiphenylmethane, 2, 2-di (3-aminophenyl) propane, 2,2- (4-aminophenyl) propane, 2- (3-aminophenyl) -2- (4-aminophenyl) propane, 2,2-di (3-aminophenyl) -1,1,1,3,3,3 -Hexafluoropropane, 2,2-di (4-aminophenyl) -1,1,1,3,3,3-hexafluoropropane, 2- (3-aminophenyl) -2- (4-aminophenyl) -1,1,1,3,3,3-hexafluoropropane, 1,1-di (3-aminophenyl) -1-phenylethane, 1,1-di (4-aminophenyl) -1-phenylethane 1- (3-aminophenyl) -1- (4-aminophenyl) -1-phenylethane, 1,3-bis (3-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,4-bis (3-amino Enoxy) benzene, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminobenzoyl) benzene, 1,3-bis (4-aminobenzoyl) benzene, 1,4-bis (3 -Aminobenzoyl) benzene, 1,4-bis (4-aminobenzoyl) benzene, 1,3-bis (3-amino-α, α-dimethylbenzyl) benzene, 1,3-bis (4-amino-α, α-dimethylbenzyl) benzene, 1,4-bis (3-amino-α, α-dimethylbenzyl) benzene, 1,4-bis (4-amino-α, α-dimethylbenzyl) benzene, 1,3-bis (3-amino-α, α-ditrifluoromethylbenzyl) benzene, 1,3-bis (4-amino-α, α-ditrifluoromethylbenzyl) benzene, 1,4-bis (3-amino-α α-ditrifluoromethylbenzyl) benzene, 1,4-bis (4-amino-α, α-ditrifluoromethylbenzyl) benzene, 2,6-bis (3-aminophenoxy) benzonitrile, 2,6-bis ( 3-aminophenoxy) pyridine, 4,4′-bis (3-aminophenoxy) biphenyl, 4,4′-bis (4-aminophenoxy) biphenyl, bis [4- (3-aminophenoxy) phenyl] ketone, bis [4- (4-aminophenoxy) phenyl] ketone, bis [4- (3-aminophenoxy) phenyl] sulfide, bis [4- (4-aminophenoxy) phenyl] sulfide, bis [4- (3-aminophenoxy) ) Phenyl] sulfone, bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) Cis) phenyl] ether, bis [4- (4-aminophenoxy) phenyl] ether, 2,2-bis [4- (3-aminophenoxy) phenyl] propane, 2,2-bis [4- (4-amino) Phenoxy) phenyl] propane, 2,2-bis [3- (3-aminophenoxy) phenyl] -1,1,1,3,3,3-hexafluoropropane, 2,2-bis [4- (4- Aminophenoxy) phenyl] -1,1,1,3,3,3-hexafluoropropane, 1,3-bis [4- (3-aminophenoxy) benzoyl] benzene, 1,3-bis [4- (4 -Aminophenoxy) benzoyl] benzene, 1,4-bis [4- (3-aminophenoxy) benzoyl] benzene, 1,4-bis [4- (4-aminophenoxy) benzoyl] benzene, 1, -Bis [4- (3-aminophenoxy) -α, α-dimethylbenzyl] benzene, 1,3-bis [4- (4-aminophenoxy) -α, α-dimethylbenzyl] benzene, 1,4-bis [4- (3-Aminophenoxy) -α, α-dimethylbenzyl] benzene, 1,4-bis [4- (4-aminophenoxy) -α, α-dimethylbenzyl] benzene, 4,4′-bis [ 4- (4-aminophenoxy) benzoyl] diphenyl ether, 4,4′-bis [4- (4-amino-α, α-dimethylbenzyl) phenoxy] benzophenone, 4,4′-bis [4- (4-amino -Α, α-dimethylbenzyl) phenoxy] diphenylsulfone, 4,4'-bis [4- (4-aminophenoxy) phenoxy] diphenylsulfone, 3,3'-diamino-4,4'-diph Noxybenzophenone, 3,3′-diamino-4,4′-dibiphenoxybenzophenone, 3,3′-diamino-4-phenoxybenzophenone, 3,3′-diamino-4-biphenoxybenzophenone, 6,6′- Bis (3-aminophenoxy) -3,3,3 ′, 3′-tetramethyl-1,1′-spirobiindane, 6,6′-bis (4-aminophenoxy) -3,3,3 ′, 3 ′ -Tetramethyl-1,1'-spirobiindane, 1,3-bis (3-aminopropyl) tetramethyldisiloxane, 1,3-bis (4-aminobutyl) tetramethyldisiloxane, α, ω-bis (3 -Aminopropyl) polydimethylsiloxane, α, ω-bis (3-aminobutyl) polydimethylsiloxane, bis (aminomethyl) ether, bis (2-aminoethyl) ether, (3-aminopropyl) ether, bis (2-aminomethoxy) ethyl] ether, bis [2- (2-aminoethoxy) ethyl] ether, bis [2- (3-aminoprotoxy) ethyl] ether, 1 , 2-bis (aminomethoxy) ethane, 1,2-bis (2-aminoethoxy) ethane, 1,2-bis [2- (aminomethoxy) ethoxy] ethane, 1,2-bis [2- (2- Aminoethoxy) ethoxy] ethane, ethylene glycol bis (3-aminopropyl) ether, diethylene glycol bis (3-aminopropyl) ether, triethylene glycol bis (3-aminopropyl) ether, ethylenediamine, 1,3-diaminopropane, 1 , 4-diaminobutane, 1,5-diaminopentane, 1,6-diaminohexane, 1, -Diaminoheptane, 1,8-diaminooctane, 1,9-diaminononane, 1,10-diaminodecane, 1,11-diaminoundecane, 1,12-diaminododecane, 1,2-diaminocyclohexane, 1,3-diamino Cyclohexane, 1,4-diaminocyclohexane, 1,2-di (2-aminoethyl) cyclohexane, 1,3-di (2-aminoethyl) cyclohexane, 1,4-di (2-aminoethyl) cyclohexane, bis ( 4-aminocyclohexyl) methane, 2,6-bis (aminomethyl) bicyclo [2.2.1] heptane, 2,5-bis (aminomethyl) bicyclo [2.2.1] heptane.
本発明におけるポリイミドフィルムは式(1)で示す構造を有することが特徴であるが、ポリイミドフィルム全体が実質的に上記式で示す構造であることが好ましい。アミン成分としては、ハロゲン化アルキル鎖特にはトリフルオロメチル基を有するものが好ましい。 The polyimide film in the present invention is characterized by having a structure represented by the formula (1), but it is preferable that the entire polyimide film has a structure substantially represented by the above formula. As the amine component, those having an alkyl halide chain, particularly a trifluoromethyl group are preferred.
具体的に特に好ましく用いられるアミン成分としては、2,2'-ビス(トリフルオロメチル)ベンジジンが好ましい。また、テトラカルボン酸二無水物としては、ピロメリット酸二無水物、3,3',4,4'−ビフェニルテトラカルボン酸二無水物、が挙げられ、中でも3,3',4,4'−ビフェニルテトラカルボン酸二無水物が好ましい。 Specifically, as the amine component particularly preferably used, 2,2′-bis (trifluoromethyl) benzidine is preferable. Examples of tetracarboxylic dianhydride include pyromellitic dianhydride and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, among which 3,3 ′, 4,4 ′. -Biphenyltetracarboxylic dianhydride is preferred.
本発明のポリイミドを製造する方法としては、酸二無水物とジアミンから前駆体であるポリアミド酸を合成し、これに脱水触媒やイミド化剤を添加してポリイミドフィルムを得る手法である。ポリアミド酸の状態で成形し、その後、脱水触媒やイミド化剤を用いずに加熱によりイミド化を行う手法では、得られるフィルムの線膨張やヒステリシスが悪く、目的には適さない。 As a method for producing the polyimide of the present invention, a polyamic acid which is a precursor is synthesized from an acid dianhydride and a diamine, and a polyimide film is obtained by adding a dehydration catalyst or an imidizing agent thereto. In the method of molding in the state of polyamic acid and then imidizing by heating without using a dehydration catalyst or imidizing agent, the resulting film has poor linear expansion and hysteresis, and is not suitable for the purpose.
用いるイミド化剤としては、沸点が40℃以上180℃以下であるイミド化剤であればよく、沸点が180℃以下の、アミン化合物を挙げることができる。沸点が180℃を超えるイミド化剤を用いると高温での乾燥時にフィルムが着色し、フィルムの外観が損なわれやすい、特に沸点が180℃を越えるアミン化合物は高温での乾燥時にフィルムが着色し、フィルムの外観が損なわれやすい。また、沸点が40℃未満であると十分にイミド化が進行する前に揮発する可能性がある。好適に用いられるアミン化合物としては、ピリジンあるいはピコリンが挙げられる。 The imidizing agent used may be an imidizing agent having a boiling point of 40 ° C. or higher and 180 ° C. or lower, and examples thereof include amine compounds having a boiling point of 180 ° C. or lower. When an imidizing agent having a boiling point exceeding 180 ° C is used, the film is colored when dried at a high temperature, and the appearance of the film is liable to be damaged. Particularly, an amine compound having a boiling point exceeding 180 ° C is colored when dried at a high temperature, The appearance of the film is easily damaged. Further, if the boiling point is less than 40 ° C., there is a possibility of volatilization before imidization proceeds sufficiently. Preferable amine compounds include pyridine and picoline.
脱水触媒としては酸無水物、カルボジイミドが用いられる。酸無水物としては無水酢酸、プロピオン酸無水物、n−酪酸無水物、安息香酸無水物、トリフルオロ酢酸無水物が挙げられる。カルボジイミドとしてはジシクロヘキシルカルボジイミドを挙げることができる。 An acid anhydride and carbodiimide are used as the dehydration catalyst. Examples of the acid anhydride include acetic anhydride, propionic anhydride, n-butyric anhydride, benzoic anhydride, and trifluoroacetic anhydride. An example of carbodiimide is dicyclohexylcarbodiimide.
イミド化剤の添加量としては、ポリアミド酸のカルボン酸基に対して、0.01から2.0倍モル当量が好ましく、0.05から2.0倍モル当量であることが特に好ましい。2.0倍モル当量を越えるイミド化剤を使用すると、高温で乾燥後にイミド化剤が残存しフィルムの着色が大きく、使用量が0.01倍モル当量未満の場合には化学イミド化の効果が出ず、線膨張係数などのフィルムの物性が低下する傾向がある。 The addition amount of the imidizing agent is preferably 0.01 to 2.0 times molar equivalent, and particularly preferably 0.05 to 2.0 times molar equivalent, relative to the carboxylic acid group of the polyamic acid. When an imidizing agent exceeding 2.0 times molar equivalent is used, the imidizing agent remains after drying at a high temperature and the film is highly colored. When the amount used is less than 0.01 times molar equivalent, the effect of chemical imidization Does not appear, and the physical properties of the film such as the coefficient of linear expansion tend to decrease.
脱水触媒の添加量としては、ポリアミド酸のカルボン酸基に対して、0.05から15.0倍モル当量が好ましく、2.0から10倍モル当量であることが特に好ましい。脱水触媒を用いる方法で、例えば、特許文献2には、得られたポリアミド酸のフィルムを脱水触媒とイミド化剤中に浸漬し、ポリイミドフィルムを得る方法が開示されている。この方法では、得られるポリイミドフィルムの線膨張係数や加熱前後の寸法安定性が十分ではなく、得られる無機積層フィルムが曲がる等の現象が生じてフィルム上に形成した無機膜が破壊されるという課題を解決することが困難である。 The addition amount of the dehydration catalyst is preferably 0.05 to 15.0 times molar equivalent, and particularly preferably 2.0 to 10 times molar equivalent, relative to the carboxylic acid group of the polyamic acid. In a method using a dehydration catalyst, for example, Patent Document 2 discloses a method of obtaining a polyimide film by immersing the obtained polyamic acid film in a dehydration catalyst and an imidizing agent. In this method, the linear expansion coefficient of the resulting polyimide film and the dimensional stability before and after heating are not sufficient, and the resulting inorganic laminated film is bent and the inorganic film formed on the film is destroyed. Is difficult to solve.
また、イミド化剤と脱水触媒の使用比率としては、イミド化剤1モルあたり脱水触媒2モル〜10モルの割合、さらには3〜7倍モルの割合で用いることが好ましい。 Moreover, as a use ratio of the imidizing agent and the dehydration catalyst, it is preferable to use the dehydration catalyst in a ratio of 2 to 10 mol, more preferably 3 to 7 times mol per mol of the imidizing agent.
次に、本発明に係るポリイミドを合成する手法をこれより具体的に例示するが、本発明はこれに限定されるものではない。酸成分として3,3',4,4'-ビフェニルテトラカルボン酸二無水物、アミン成分として2,2'-ビス(トリフルオロメチル)ベンジジンを用いてポリイミドを合成する例を述べる。 Next, the method for synthesizing the polyimide according to the present invention will be illustrated more specifically, but the present invention is not limited thereto. An example will be described in which polyimide is synthesized using 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride as an acid component and 2,2′-bis (trifluoromethyl) benzidine as an amine component.
先ず、2、2'-ビス(トリフルオロメチル)ベンジジンを溶解させたジメチルアセトアミドを攪拌しつつ、略等モルの3,3',4,4'-ビフェニルテトラカルボン酸二無水物を徐々に加えてポリアミド酸を得ることができる。混合する際の温度は発熱に注意すれば室温でも良いが、10℃以下、さらには5℃以下で行うことができる。また攪拌時間としては10時間以上、さらには20時間以上で行うことができる。得られたポリアミド酸を0℃以下の低温にした後、沸点が180℃以下のイミド化剤、脱水触媒を加えてジメチルアセトアミド溶液を激しく攪拌することで得ることができる。 First, substantially equimolar 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride was gradually added while stirring dimethylacetamide in which 2,2′-bis (trifluoromethyl) benzidine was dissolved. Thus, polyamic acid can be obtained. The temperature at the time of mixing may be room temperature as long as attention is paid to heat generation, but it can be carried out at 10 ° C. or lower, further 5 ° C. or lower. The stirring time can be 10 hours or longer, and further 20 hours or longer. After the obtained polyamic acid is brought to a low temperature of 0 ° C. or lower, an imidizing agent having a boiling point of 180 ° C. or lower and a dehydration catalyst are added, and the dimethylacetamide solution can be obtained by vigorously stirring.
真空下もしくは遠心沈殿機等を用いて脱泡した後、ガラス、フィルム、ベルトなどの基板上に塗布、乾燥し、塗膜を成形させ、それを例えば300℃以上に加熱することでフィルム状のポリイミドが得ることができる。 After defoaming under vacuum or using a centrifugal precipitator, etc., it is applied onto a substrate such as glass, film or belt, dried, and a coating film is formed. A polyimide can be obtained.
このようにして合成される本発明のポリイミドは、芳香族基を有する成分を用いているため良好な耐熱性及び寸法安定性を有している。具体的には、イミド構造の繰り返し単位を構成する酸成分に占める芳香族基を有する酸成分の割合が50モル%以上、特に70モル%以上であることが好ましく、イミド構造の繰り返し単位を構成するアミン成分に占める芳香族基を有するアミン成分の割合が40モル%以上、特に60モル%以上であることが好ましく、中でも酸、アミン成分共に全成分が芳香族基を有する成分とすることが特に好ましい。 The polyimide of the present invention synthesized as described above has good heat resistance and dimensional stability because it uses a component having an aromatic group. Specifically, the proportion of the acid component having an aromatic group in the acid component constituting the repeating unit of the imide structure is preferably 50 mol% or more, particularly preferably 70 mol% or more, and the repeating unit of the imide structure is constituted. The proportion of the amine component having an aromatic group in the amine component is preferably 40 mol% or more, particularly preferably 60 mol% or more, and in particular, both the acid and amine components may be components having an aromatic group. Particularly preferred.
ここでいう寸法安定性とはフィルムを加熱冷却した前後でのフィルムの寸法変化率のことをいう。この寸法変化率が大きいとフィルムの平滑性が失われたり、フィルム上に無機薄膜を形成した場合、無機薄膜が破損する場合がある。具体的には寸法変化率が±0.03%以内、さらには±0.01%以内、特には±0.004以内であることが好ましい。 The dimensional stability here means the dimensional change rate of the film before and after the film is heated and cooled. When this rate of dimensional change is large, the smoothness of the film may be lost, or when an inorganic thin film is formed on the film, the inorganic thin film may be damaged. Specifically, the dimensional change rate is preferably within ± 0.03%, more preferably within ± 0.01%, and particularly preferably within ± 0.004.
このようにして合成される本発明のポリイミドフィルムは、低着色性(従来のポリイミドに比べて薄い色調)、透明性を有することも特徴であり、例えば50μm厚のフィルムのYI(イエローインデックス)が20以下さらには18以下のポリイミドフィルムを得ることができる。また、得られるポリイミドフィルムの全光線透過率は80%以上、さらには83%以上、特には84%以上、ヘイズが2.5%以下さらには2.3%以下のフィルムを得ることが可能である。 The polyimide film of the present invention synthesized in this way is also characterized by low colorability (lighter color tone than conventional polyimide) and transparency. For example, the YI (yellow index) of a 50 μm-thick film is A polyimide film of 20 or less, or 18 or less can be obtained. In addition, it is possible to obtain a film having a total light transmittance of 80% or more, more preferably 83% or more, particularly 84% or more, and a haze of 2.5% or less, further 2.3% or less. is there.
本発明のポリアミド酸の重量平均分子量は、その用途にもよるが、3,000〜1,000,000の範囲であることが好ましく、5,000〜500,000の範囲であることがさらに好ましく、10,000〜500,000の範囲であることがさらに好ましい。重量平均分子量が3,000以下であると、塗膜又はフィルムとした場合に十分な強度が得られにくい。また、10,000未満であると着色の原因になるポリマー末端の数が相対的に多くなることから着色する場合がある。一方、1,000,000を超えると粘度が上昇し、溶解性も落ちてくるため、表面が平滑で膜厚が均一な塗膜又はフィルムが得られにくい。ここで用いている分子量とは、ゲルパーミレーションクロマトグラフィー(GPC)によるポリスチレン換算の値のことをいう。 The weight average molecular weight of the polyamic acid of the present invention is preferably in the range of 3,000 to 1,000,000, more preferably in the range of 5,000 to 500,000, although it depends on its use. More preferably, it is in the range of 10,000 to 500,000. When the weight average molecular weight is 3,000 or less, it is difficult to obtain sufficient strength when a coating film or film is used. Further, if it is less than 10,000, coloring may occur because the number of polymer ends that cause coloring becomes relatively large. On the other hand, when it exceeds 1,000,000, the viscosity increases and the solubility also decreases, so that it is difficult to obtain a coating film or film having a smooth surface and a uniform film thickness. The molecular weight used here refers to a value in terms of polystyrene by gel permeation chromatography (GPC).
本発明のポリイミドは、特に優れた低着色性や寸法安定性を有することを特徴とするが、耐熱性、絶縁性等その他の特性についても良好である。例えば、ガラス転移温度は、耐熱性の観点からは高ければ高いほど良いが、示差走査熱量測定装置において、昇温速度10℃/minの条件で測定したときのガラス転移温度が、200℃以上、更には300℃以上のポリイミドを得ることが可能である。 The polyimide of the present invention is characterized by particularly excellent low colorability and dimensional stability, but is also excellent in other properties such as heat resistance and insulation. For example, the glass transition temperature is preferably as high as possible from the viewpoint of heat resistance, but in the differential scanning calorimeter, the glass transition temperature when measured at a temperature rising rate of 10 ° C./min is 200 ° C. or higher, Furthermore, it is possible to obtain polyimide at 300 ° C. or higher.
本発明に係るポリイミドは、そのまま製品や部材を作製するためのコーティングや成形プロセスに供してもよいが、該ポリイミドを必要に応じて溶剤に溶解又は分散させ、さらに、光又は熱硬化性成分、本発明に係るポリイミド以外の非重合性バインダー樹脂、その他の成分を配合して、ポリイミド樹脂組成物を調製してもよい。 The polyimide according to the present invention may be subjected to a coating or molding process for producing a product or member as it is, but the polyimide is dissolved or dispersed in a solvent as necessary, and further, a light or thermosetting component, A polyimide resin composition may be prepared by blending a non-polymerizable binder resin other than polyimide according to the present invention and other components.
本発明に係る樹脂組成物に加工特性や各種機能性を付与するために、その他に様々な有機又は無機の低分子又は高分子化合物を配合してもよい。例えば、染料、界面活性剤、レベリング剤、可塑剤、微粒子、増感剤等を用いることができる。微粒子には、ポリスチレン、ポリテトラフルオロエチレン等の有機微粒子、コロイダルシリカ、カーボン、層状珪酸塩等の無機微粒子等が含まれ、それらは多孔質や中空構造であってもよい。また、その機能又は形態としては顔料、フィラー、繊維等がある。 In order to impart processing characteristics and various functionalities to the resin composition according to the present invention, various organic or inorganic low-molecular or high-molecular compounds may be blended. For example, dyes, surfactants, leveling agents, plasticizers, fine particles, sensitizers, and the like can be used. The fine particles include organic fine particles such as polystyrene and polytetrafluoroethylene, inorganic fine particles such as colloidal silica, carbon, and layered silicate, and these may have a porous or hollow structure. The function or form includes pigments, fillers, fibers, and the like.
本発明に係るポリイミド樹脂組成物は、式(1)で表される構造を有するポリイミドを、樹脂組成物の固形分全体に対し、通常、40〜99.9重量%の範囲内で含有させて成すことが可能である。また、その他の任意成分の配合割合は、ポリイミド樹脂組成物の固形分全体に対し、0.1重量%〜60重量%の範囲が好ましい。0.1重量%未満だと、添加物を添加した効果が発揮されにくく、60重量%を越えると、樹脂組成物の特性が最終生成物に反映されにくい。なお、ポリイミド樹脂組成物の固形分とは溶剤以外の全成分である。 In the polyimide resin composition according to the present invention, the polyimide having the structure represented by the formula (1) is usually contained within a range of 40 to 99.9% by weight with respect to the entire solid content of the resin composition. Can be made. In addition, the blending ratio of other optional components is preferably in the range of 0.1% by weight to 60% by weight with respect to the entire solid content of the polyimide resin composition. When the amount is less than 0.1% by weight, the effect of adding the additive is hardly exhibited, and when the amount exceeds 60% by weight, the characteristics of the resin composition are hardly reflected in the final product. In addition, solid content of a polyimide resin composition is all components other than a solvent.
本発明に係るポリイミドフィルムは、その表面に金属酸化物や透明電極等の各種無機薄膜を形成して用いることも可能である。これら無機薄膜の製膜方法は特に限定されるものではなく、例えばCVD法、スパッタリング法や真空蒸着法、イオンプレーティング法等のPVD法であっても良い。 The polyimide film according to the present invention can be used by forming various inorganic thin films such as metal oxides and transparent electrodes on the surface thereof. The method for forming these inorganic thin films is not particularly limited, and may be, for example, a PVD method such as a CVD method, a sputtering method, a vacuum deposition method, or an ion plating method.
本発明に係るポリイミド樹脂組成物は、耐熱性、絶縁性等のポリイミド本来の特性に加えて、高い寸法安定性を有することから、これらの特性が有効とされる分野・製品、例えば、印刷物、カラーフィルター、フレキシブルディスプレー、半導体部品、層間絶縁膜、配線被覆膜、光回路、光回路部品、反射防止膜、ホログラム、光学部材又は建築材料を形成するのに適している。具体的には、本発明のポリイミドフィルムをいわゆる光学フィルムとして用い、偏向子と組み合わせて偏光板として用いることができる。 Since the polyimide resin composition according to the present invention has high dimensional stability in addition to the original characteristics of polyimide such as heat resistance and insulation, fields and products in which these characteristics are effective, for example, printed matter, Suitable for forming color filters, flexible displays, semiconductor parts, interlayer insulating films, wiring coating films, optical circuits, optical circuit parts, antireflection films, holograms, optical members or building materials. Specifically, the polyimide film of the present invention can be used as a so-called optical film and used as a polarizing plate in combination with a deflector.
また、液晶セルの少なくとも一方の表面に本発明のポリイミドフィルムあるいは本発明のポリイミドフィルムを用いた偏光板からなる光学部材を設け、液晶パネルとしても用いることができる。さらには、当該液晶パネルを用いた液晶表示装置としても用いることができる。 Moreover, the optical member which consists of a polarizing plate using the polyimide film of this invention or the polyimide film of this invention is provided in the at least one surface of a liquid crystal cell, and it can use also as a liquid crystal panel. Furthermore, it can also be used as a liquid crystal display device using the liquid crystal panel.
(前駆体溶液の合成)
2,2'-ビス(トリフルオロメチル)ベンジジン 21.8g(68mmol)を300mlの3つ口フラスコに投入し、167gの脱水されたジメチルアセトアミド(DMAc)に溶解させ窒素気流下、氷浴で冷却しながら撹拌した。そこへ、上記3,3',4,4'-ビフェニルテトラカルボン酸二無水物20g(68mmol)を添加し、添加終了後、40時間撹拌し、粘稠液体(前駆体溶液)を得た。また、この前駆体溶液の分子量を測定した結果、重量平均分子量は94000であった。
(Synthesis of precursor solution)
2,2'-bis (trifluoromethyl) benzidine (21.8 g, 68 mmol) was charged into a 300 ml three-necked flask, dissolved in 167 g of dehydrated dimethylacetamide (DMAc), and cooled in an ice bath under a nitrogen stream. While stirring. Thereto was added 20 g (68 mmol) of the above 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, and after completion of the addition, the mixture was stirred for 40 hours to obtain a viscous liquid (precursor solution). Moreover, as a result of measuring the molecular weight of this precursor solution, the weight average molecular weight was 94000.
(実施例)
合成した上記前駆体溶液(20g)を0℃付近に冷却した後、イミド化剤としてβ‐ピコリン(沸点144℃)0.91g(9.7mmol)、脱水触媒として無水酢酸4.98g(48.8mmol)及びDMAc1.11gの混合液を添加し激しく攪拌した。その後、遠心沈殿機により脱泡したのち、アルミ箔上に流し、スリット間隔を0.77mmに設定したコンマコーターでアルミ箔上に塗布した。その後、100℃から350℃まで20分間かけて昇温し、350℃で8分間加熱することにより、厚み50μm、YIが15.6の透明なポリイミドフィルムを得た。
(Example)
The synthesized precursor solution (20 g) was cooled to around 0 ° C., then 0.91 g (9.7 mmol) of β-picoline (boiling point 144 ° C.) as an imidizing agent, and 4.98 g (48. 48 g) of acetic anhydride as a dehydration catalyst. 8 mmol) and 1.11 g of DMAc were added and stirred vigorously. Then, after defoaming with a centrifugal settling machine, it flowed on aluminum foil, and it apply | coated on aluminum foil with the comma coater which set the slit space | interval to 0.77 mm. Thereafter, the temperature was raised from 100 ° C. to 350 ° C. over 20 minutes and heated at 350 ° C. for 8 minutes to obtain a transparent polyimide film having a thickness of 50 μm and YI of 15.6.
[線熱膨張係数及び加熱前後の寸法変化率の評価]
熱機械的分析装置(セイコーインスツルメント社製、商品名:TMA120C)により窒素気流下、昇温速度10℃/分、降温速度10℃/分、フィルムサイズ10mmx3mm、フィルムの長手方向の片端に引っ張り荷重6gをかけて測定を行った。その結果、100℃〜200℃における線熱膨張係数は1.7ppm/Kであった。50℃から210℃に加熱し再び50℃に戻した場合のフィルムの寸法変化率は+0.001%であった。なお、寸法変化率は元の寸法から収縮していれば−(マイナス)、膨張していれば+(プラス)と表記した。
[Evaluation of linear thermal expansion coefficient and dimensional change rate before and after heating]
Using a thermomechanical analyzer (trade name: TMA120C, manufactured by Seiko Instruments Inc.), pulling at one end in the longitudinal direction of the film under a nitrogen stream, temperature increase rate 10 ° C / min, temperature decrease rate 10 ° C / min, film size 10 mm x 3 mm Measurement was performed with a load of 6 g. As a result, the linear thermal expansion coefficient at 100 ° C. to 200 ° C. was 1.7 ppm / K. When the film was heated from 50 ° C. to 210 ° C. and returned to 50 ° C., the dimensional change rate of the film was + 0.001%. In addition, the dimensional change rate was described as − (minus) when contracted from the original dimension, and + (plus) when expanded.
[YIの評価]
得られたフィルムのYIを日本電色工業株式会社製HANDY COLORIMETER NR−3000を用い測定した。
[Evaluation of YI]
YI of the obtained film was measured using HANDY COLORIMTER NR-3000 manufactured by Nippon Denshoku Industries Co., Ltd.
[ガラス転移温度の評価]
島津製作所製DSC−50(島津熱流束示差走査熱量計)により、昇温速度10℃/minで測定してポリマーのTg(ガラス転位温度)を求めた。その結果、400℃までに明確なTgは観測されなかった。
[Evaluation of glass transition temperature]
The Tg (glass transition temperature) of the polymer was determined by DSC-50 (Shimadzu heat flux differential scanning calorimeter) measured at a rate of temperature increase of 10 ° C./min. As a result, no clear Tg was observed up to 400 ° C.
[ヘイズおよび全光線透過率の評価]
日本電色工業株式会社製ヘイズメーター1001DPを用いて実施した。測定は三回行い平均値をフィルムの測定値とした。その結果、ヘイズは2.0%、全光線透過率は86%であった。
[Evaluation of haze and total light transmittance]
This was carried out using a haze meter 1001DP manufactured by Nippon Denshoku Industries Co., Ltd. The measurement was performed three times, and the average value was taken as the measured value of the film. As a result, haze was 2.0% and total light transmittance was 86%.
(比較例)
脱水触媒を、3,5−ジエチルピリジン(沸点203℃)0.44g(3.3mmol)、無水酢酸4.89g(22.2mmol)及びDMAc1.58gとした以外は実施例1に準じて厚み50μmのポリイミドフィルムを作成した。なお得られたポリイミドフィルムは、線膨張係数が−2.1ppm/K、寸法変化率+0.005%、ヘイズは2.9%、全光線透過率は85%、YIが25.7の黄みが強いポリイミドフィルムであった。また、Tgを測定した結果、400℃までに明確なTgは観測されなかった。
(Comparative example)
50 μm thickness according to Example 1 except that the dehydration catalyst was 0.45 g (3.3 mmol) of 3,5-diethylpyridine (boiling point 203 ° C.), 4.89 g (22.2 mmol) of acetic anhydride and 1.58 g of DMAc. A polyimide film was prepared. The obtained polyimide film had a linear expansion coefficient of -2.1 ppm / K, a dimensional change rate of + 0.005%, a haze of 2.9%, a total light transmittance of 85%, and a yellow color index of 25.7. Was a strong polyimide film. As a result of measuring Tg, no clear Tg was observed up to 400 ° C.
これらの結果より、ポリアミド酸に低沸点イミド化剤を添加して作成した本発明のポリイミドフィルムは、耐熱性・寸法安定性が良好で、且つ低着色なフィルムを作製することが可能である為、これらの特性が有効とされる分野・製品、例えば、塗料、印刷インキ、カラーフィルター、フレキシブルディスプレー用フィルム、半導体装置、電子部品、層間絶縁膜、配線被覆膜、光回路、光回路部品、反射防止膜、ホログラム、その他の光学部材又は建築材料を形成するのに適している。 From these results, the polyimide film of the present invention prepared by adding a low boiling point imidizing agent to polyamic acid has good heat resistance and dimensional stability, and can produce a low color film. Fields and products in which these characteristics are effective, such as paints, printing inks, color filters, films for flexible displays, semiconductor devices, electronic parts, interlayer insulation films, wiring coating films, optical circuits, optical circuit parts, Suitable for forming antireflection films, holograms, other optical members or building materials.
Claims (9)
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| JP2010013443A JP2011148955A (en) | 2010-01-25 | 2010-01-25 | Method for producing polyimide film, and the resultant polyimide film |
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| JP2010013443A JP2011148955A (en) | 2010-01-25 | 2010-01-25 | Method for producing polyimide film, and the resultant polyimide film |
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| WO2013105814A3 (en) * | 2012-01-13 | 2013-09-19 | 주식회사 엘지화학 | Insulation material for electronic device |
| WO2014051050A1 (en) | 2012-09-27 | 2014-04-03 | 三菱瓦斯化学株式会社 | Polyimide resin composition |
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| WO2013105813A3 (en) * | 2012-01-13 | 2013-09-19 | 주식회사 엘지화학 | Insulation material for electronic device 전자소자용 절연재 |
| WO2013105814A3 (en) * | 2012-01-13 | 2013-09-19 | 주식회사 엘지화학 | Insulation material for electronic device |
| WO2014051050A1 (en) | 2012-09-27 | 2014-04-03 | 三菱瓦斯化学株式会社 | Polyimide resin composition |
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| KR20190076170A (en) * | 2017-12-22 | 2019-07-02 | 주식회사 두산 | Polyamic acid solution and transparent polyimide film using the same |
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| CN109957109A (en) * | 2017-12-22 | 2019-07-02 | 株式会社斗山 | Polyamic acid solution, transparent polyimide resin film and transparent substrate using the same |
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