JP2011011155A - Method for removing copper ion from arsenic acid solution by using copper sulfide and single sulfur - Google Patents
Method for removing copper ion from arsenic acid solution by using copper sulfide and single sulfur Download PDFInfo
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Abstract
【課題】砒酸(5価As)とCuイオンとを含有する溶液から、当該砒酸(5価As)の亜砒酸(3価As)への還元を極力抑えつつ、Cuイオンを除去する方法を提供する。
【解決手段】Cuイオンを含有する砒酸溶液《1》に、単体硫黄(S0)《4》と硫化銅《5》を添加し、液温60℃以上として、SO2ガス《3》、または、SO2ガスと空気との混合ガス《3*》を吹き込み、前記Cuイオンを、硫化銅を含む回収殿物《8》として除去する、砒酸溶液からのCuイオンの除去方法を提供する。
【選択図】図4Provided is a method for removing Cu ions from a solution containing arsenic acid (pentavalent As) and Cu ions while suppressing the reduction of the arsenic acid (pentavalent As) to arsenous acid (trivalent As) as much as possible. .
SOLUTION SOLUTIONS << 3 >> or SO 2 gas << 3 >> or a solution temperature of 60 ° C. or higher by adding simple sulfur (S 0 ) << 4 >> and copper sulfide << 5 >> to an arsenic acid solution << 1 >> containing Cu ions The present invention provides a method for removing Cu ions from an arsenic acid solution, in which a mixed gas << 3 * >> of SO 2 gas and air is blown to remove the Cu ions as a recovered residue << 8 >> containing copper sulfide.
[Selection] Figure 4
Description
砒酸(5価As)とCuイオンとを含有する溶液から、前記砒酸(5価As)の亜砒酸(3価As)への還元を抑制しながら、前記Cuイオンを除去する方法に関する。 The present invention relates to a method for removing Cu ions from a solution containing arsenic acid (pentavalent As) and Cu ions while suppressing reduction of the arsenic acid (pentavalent As) to arsenous acid (trivalent As).
銅製錬での砒素含有中間産物には、硫酸工場排水や工程水を硫化処理して回収される硫化砒素殿物や、銅電解工場における電解液の浄液工程で発生する脱銅電解スライム等がある。
これらの砒素中間産物には、砒素の他にCuも相当量含まれる。従って、これら砒素含有中間産物から調製された砒酸溶液には相当量のCuイオンが溶存している。
Arsenic-containing intermediate products in copper smelting include arsenic sulfide recovered from sulfidation of sulfuric acid factory effluent and process water, and copper removal electrolytic slime generated in the electrolytic solution cleaning process at copper electrolysis factory. is there.
These arsenic intermediate products contain a considerable amount of Cu in addition to arsenic. Therefore, a considerable amount of Cu ions are dissolved in the arsenic acid solution prepared from these arsenic-containing intermediate products.
濃厚な砒酸溶液は、当該砒素をスコロダイト(FeAsO4・2H2O)として安定化保管する場合の、スコロダイト生成用の元液として用いられる。
ここで、スコロダイトを製造する方法のひとつに、砒酸溶液に2価鉄塩(Fe2+塩)を添加し、高温下酸化反応にて製造する方法がある。
しかしながら、当該砒酸溶液にCu、Zn、Naが共存した場合、これらの金属元素が、スコロダイト結晶成長へ与える影響について示されている。特にCu共存の場合ではスコロダイト粒子の結晶格子中にCuが取り込まれ、粒子形態の変化や格子定数の変化、砒素溶出量の増加などの影響が表れるので注意が必要であるとされている(非特許文献1参照)。
The concentrated arsenic acid solution is used as an original solution for producing scorodite when the arsenic is stabilized and stored as scorodite (FeAsO 4 .2H 2 O).
Here, as one method for producing scorodite, there is a method in which a divalent iron salt (Fe 2+ salt) is added to an arsenic acid solution and produced by an oxidation reaction at a high temperature.
However, when Cu, Zn, and Na coexist in the arsenic acid solution, the influence of these metal elements on scorodite crystal growth is shown. In particular, in the case of coexistence with Cu, Cu is taken into the crystal lattice of the scorodite particles, and it is said that caution is required because effects such as changes in particle morphology, changes in lattice constant, and increase in arsenic elution amount appear. Patent Document 1).
本発明者等の検討によっても、スコロダイト生成時に当該砒酸溶液中に共存するCuイオンは、酸化触媒として作用し、且つ、スコロダイトの核発生を助長することで、スコロダイト結晶の粒子成長のコントロールを難しくしてしまうことを知見した。
従って、当該砒酸濃厚溶液をスコロダイト製造の元液として用いる場合、スコロダイト結晶の粒子成長のコントロールの観点からは、当該砒酸濃厚溶液が含有するCuイオン量が少ない程好ましい。
さらに、当該砒酸濃厚溶液から効率よくスコロダイトを製造するためには、溶液中の砒素が砒酸(5価As)である必要がある。これは、亜砒酸(3価As)では反応せずに液中に残存してしまう為である、従って、当該砒酸濃厚溶液中の砒素は、出来るだけ砒酸(5価As)にすることが求められる。
According to the study by the present inventors, Cu ions coexisting in the arsenic acid solution at the time of scorodite production act as an oxidation catalyst, and by promoting nucleation of scorodite, it is difficult to control the particle growth of scorodite crystals. I found out that
Therefore, when the concentrated arsenic acid solution is used as the original solution for scorodite production, it is preferable that the concentrated arsenic acid solution contains a smaller amount of Cu ions from the viewpoint of controlling particle growth of scorodite crystals.
Furthermore, in order to efficiently produce scorodite from the concentrated arsenic acid solution, the arsenic in the solution needs to be arsenic acid (pentavalent As). This is because arsenous acid (trivalent As) does not react and remains in the liquid. Therefore, the arsenic in the concentrated arsenic acid solution is required to be arsenic acid (pentavalent As) as much as possible. .
本発明は、このような状況下で成されたものであって、その解決しようとする課題は、砒酸(5価As)とCuイオンとを含有する溶液から、当該砒酸(5価As)の亜砒酸(3価As)への還元を抑制しながら、Cuイオンを除去する方法を提供することである。 The present invention has been made under such circumstances, and the problem to be solved is that a solution containing arsenic acid (pentavalent As) and arsenic acid (pentavalent As) from a solution containing arsenic acid (pentavalent As) and Cu ions. To provide a method for removing Cu ions while suppressing reduction to arsenous acid (trivalent As).
本発明者等は、砒酸(5価As)の亜砒酸(3価As)への還元を抑制しながら、溶存するCuイオンの除去を可能にする方法を鋭意研究した。
そして、Cuイオンを含有する砒酸溶液(5価As溶液)に、単体硫黄(S0)と、硫
化銅とを添加し、液温60℃以上で、SO2ガスまたはSO2ガスと空気との混合ガスを吹き込むことで、砒酸(5価As)の亜砒酸(3価As)への還元を抑制しながら、溶存するCuイオンを硫化銅として除去出来るという画期的な知見を得た。
The present inventors have intensively studied a method that enables removal of dissolved Cu ions while suppressing reduction of arsenic acid (pentavalent As) to arsenous acid (trivalent As).
Then, elemental sulfur (S 0 ) and copper sulfide are added to an arsenic acid solution (pentavalent As solution) containing Cu ions, and at a liquid temperature of 60 ° C. or higher, SO 2 gas or SO 2 gas and air are added. By blowing the mixed gas, an innovative finding was obtained that dissolved Cu ions can be removed as copper sulfide while suppressing reduction of arsenic acid (pentavalent As) to arsenous acid (trivalent As).
即ち、上述の改題を解決する第1の発明は、
Cuイオンを含有する砒酸溶液に、単体硫黄(S0)と、硫化銅とを添加し、液温60℃以上として、SO2ガス、または、SO2ガスと空気との混合ガスを吹き込み、前記Cuイオンを、硫化銅を含む殿物として除去することを特徴とする砒酸溶液からのCuイオンの除去方法である。
That is, the first invention for solving the above-mentioned revision is
To the arsenic acid solution containing Cu ions, elemental sulfur (S 0 ) and copper sulfide are added, and the liquid temperature is set to 60 ° C. or higher, and SO 2 gas or a mixed gas of SO 2 gas and air is blown into the arsenic acid solution. A method for removing Cu ions from an arsenic acid solution, wherein Cu ions are removed as a deposit containing copper sulfide.
第2の発明は、
前記Cuイオンを、硫化銅を含む殿物として除去する反応を、前記Cuイオン濃度が1g/L以下となった時点で終了することを特徴とする第1の発明に記載の砒酸溶液からのCuイオンの除去方法である。
The second invention is
The reaction for removing the Cu ions as a precipitate containing copper sulfide is terminated when the Cu ion concentration becomes 1 g / L or less. Cu from the arsenic acid solution according to the first invention This is a method for removing ions.
第3の発明は、
前記SO2ガスの吹き込み総量を、前記砒酸溶液中に溶存するCuイオンの総モル量の等モル量以下とすることを特徴とする第1または第2の発明に記載の砒酸溶液からのCuイオンの除去方法である。
The third invention is
Cu ions from the arsenic acid solution according to the first or second invention, wherein the total amount of SO 2 gas blown is equal to or less than an equimolar amount of the total molar amount of Cu ions dissolved in the arsenic acid solution. This is a removal method.
第4の発明は、
前記硫化銅を、前記砒酸溶液へ10g/L以上添加することを特徴とする第1〜第3のいずれかの発明に記載の砒酸溶液からのCuイオンの除去方法である。
The fourth invention is:
The method for removing Cu ions from an arsenic acid solution according to any one of the first to third inventions, wherein the copper sulfide is added to the arsenic acid solution in an amount of 10 g / L or more.
第5の発明は、
前記除去された硫化銅を含む殿物を、次回以降の砒酸溶液からのCuイオンの除去方法において、硫化銅および単体硫黄(S0)として添加することを特徴とする第1〜第4の発明のいずれかに記載の砒酸溶液からのCuイオンの除去方法である。
The fifth invention is:
The first to fourth inventions are characterized in that the above-described removed copper sulfide-containing material is added as copper sulfide and elemental sulfur (S 0 ) in the next and subsequent methods of removing Cu ions from the arsenic acid solution. Or a method for removing Cu ions from the arsenic acid solution.
Cuイオンを溶存する砒酸溶液に対して、単体硫黄(S0)と、硫化銅とを添加し、所定の液温として、SO2ガスまたはSO2ガスと空気との混合ガスを吹き込むことで、当該砒酸が3価As(亜砒酸)へ還元することを抑制しながら、当該溶存Cuイオンをスコロダイト製造に適したレベルにまで除去することが出来た。 By adding elemental sulfur (S 0 ) and copper sulfide to an arsenic acid solution in which Cu ions are dissolved, and blowing a mixed gas of SO 2 gas or SO 2 gas and air at a predetermined liquid temperature, While suppressing the reduction of the arsenic acid to trivalent As (arsenous acid), the dissolved Cu ions could be removed to a level suitable for scorodite production.
本発明を実施するための形態について実施例および図4を参照しながら説明する。図4は、本発明に係るCuイオンの除去方法の工程フロー図である。
尚、砒酸溶液中に添加する硫化銅およびSO2ガスについては詳細に説明し、併せて、当該実施により生成する単体硫黄(S0)と硫化銅とを含む殿物の循環的再利用についても説明する。
The form for implementing this invention is demonstrated referring an Example and FIG. FIG. 4 is a process flow diagram of the Cu ion removal method according to the present invention.
The copper sulfide and SO 2 gas to be added to the arsenic acid solution will be described in detail, and the recycling of the sediment containing simple sulfur (S 0 ) and copper sulfide generated by the implementation will be described. explain.
(1)Cuイオンを含有している砒酸溶液中に単体硫黄(S0)と、硫化銅とを存在させ、ここへSO2ガスを吹き込み硫化反応を行う実施の形態
〈1〉Cuイオンを含有している砒酸溶液試料の調製
試薬60%砒酸溶液99.45g、試薬硫酸銅5水和物(純度99.5%以上)16.8gを秤量した。尚、当該60%砒酸溶液99.45gは、約63ccの容積である。
そこで当該60%砒酸溶液63ccと、後述するwet硫化銅の付着水分と、溶媒である水(純水)との合計が、試料当たり700ccになるように調整した溶媒である水中へ、前記秤量した60%砒酸溶液と試薬硫酸銅5水和物とを投入し、Cuイオンを含有している砒酸溶液《1》試料700ccを調製した。尚、上記調合によれば、得られる5価As溶液の濃度としては、約45g/Lとなる。
(1) Embodiment in which elemental sulfur (S 0 ) and copper sulfide are present in an arsenic acid solution containing Cu ions, and SO 2 gas is blown into the arsenic acid solution to perform a sulfurization reaction. <1> Contains Cu ions Preparation of arsenic acid solution sample 99.45 g of
Therefore, the 60% arsenic acid solution 63 cc, the wet water of wet copper sulfide described later, and the water (pure water) as the solvent were weighed into water as the solvent adjusted to 700 cc per sample. A 60% arsenic acid solution and reagent copper sulfate pentahydrate were added to prepare 700 cc of an arsenic acid solution << 1 >> sample containing Cu ions. In addition, according to the said preparation, it becomes about 45 g / L as a density | concentration of the pentavalent As solution obtained.
〈2〉本実施の形態に用いる硫化銅
本実施の形態に用いる硫化銅《5》は、結晶性の低い硫化銅であることが好ましい。当該結晶性の低い硫化銅は、水溶液中のCuイオンに硫化剤を加えて硫化銅を生成させる湿式工程により容易に製造できる。さらに、当該湿式工程で製造された硫化銅は、wet状態(湿潤状態)の濾過殿物として回収される。反応に用いる硫化銅は、当該wet状態が好ましい。なぜならば、被処理液へのリパルプ混合を容易にせしめるからであり、特に乾燥させる必要はない。
尚、本発明において、例えば、前記湿式工程で製造された、結晶性の低い硫化銅を「wet硫化銅」と記載する場合がある。
<2> Copper sulfide used in the present embodiment The copper sulfide << 5 >> used in the present embodiment is preferably copper sulfide having low crystallinity. The low-crystallinity copper sulfide can be easily produced by a wet process in which a sulfide is added to Cu ions in an aqueous solution to produce copper sulfide. Furthermore, the copper sulfide produced in the wet process is recovered as a wet filter residue. The wet state is preferable for the copper sulfide used for the reaction. This is because repulp mixing into the liquid to be treated is facilitated, and there is no need for drying.
In the present invention, for example, copper sulfide having low crystallinity produced by the wet process may be referred to as “wet copper sulfide”.
〈3〉wet硫化銅製造のための湿式工程
以下、wet硫化銅《5》を製造するための湿式工程について、試薬硫酸銅溶液へ、硫化剤として試薬水硫化ソーダ(NaSH)を添加するという湿式工程を例として説明する。
反応装置として、10リットルビーカー、4枚邪魔板付き2段タービン羽を準備した。
まず、銅溶液と水硫化ソーダ溶液とを作製した。
1)銅溶液の作製
試薬硫酸銅5水和物を900g秤量し、これを4,000ccの純水にて、温度60℃
にて溶解し銅溶液を作成した。
2)水硫化ソーダ溶液の作製
試薬70%水硫化ソーダ(フレーク状)を260g秤量し、これを純水にて溶解し、最終液量を900ccとし、水硫化ソーダ溶液を作製した。
<3> Wet process for producing wet copper sulfide Hereinafter, a wet process for producing wet copper sulfide << 5 >>, a wet process of adding reagent sodium hydrosulfide (NaSH) as a sulfiding agent to a reagent copper sulfate solution. The process will be described as an example.
As a reaction apparatus, a 10-liter beaker and four two-stage turbine blades with baffles were prepared.
First, a copper solution and a sodium hydrosulfide solution were prepared.
1) Preparation of copper solution 900 g of the reagent copper sulfate pentahydrate was weighed, and this was added to 4,000 cc of pure water at a temperature of 60 ° C.
To prepare a copper solution.
2) Preparation of sodium hydrosulfide solution 260 g of
試験に供ずるwet硫化銅は、上述の反応装置を用い、液温60℃を維持しながらの攪拌下において、上記1)の銅溶液へ、上記2)の水硫化ソーダ溶液を添加することにより作製した。具体的には、まず銅溶液に95%硫酸を添加し、pHを1.5に調整した後、水硫化ソーダ溶液の添加を開始した。当該水硫化ソーダの添加は15分間をかけて行い、添加後さらに15分間攪拌維持し反応を終了した(反応終了時のpHは1.1であった)。
生成した硫化銅のパルプを濾過に供じ、硫化銅殿物を回収した。回収された硫化銅殿物には、未反応のCuイオンが付着しているので、5,000ccの純水でリパルプ洗浄し
、再度濾過へ供じ、リパルプ洗浄後のwet硫化銅《5》を回収した。
当該リパルプ洗浄を2回実施し、最終的に回収したリパルプ洗浄後のwet硫化銅は915wet・gであった。当該wet硫化銅《5》の品位を、表1に示す。尚、本発明に係る表において「Total−S」とは、全硫黄分のことである。
Wet copper sulfide to be used for the test was prepared by adding the sodium hydrosulfide solution of 2) to the copper solution of 1) above while stirring while maintaining the liquid temperature at 60 ° C. using the above-described reaction apparatus. Produced. Specifically, first, 95% sulfuric acid was added to the copper solution to adjust the pH to 1.5, and then the addition of the sodium hydrosulfide solution was started. The addition of sodium hydrosulfide was carried out over 15 minutes, and stirring was continued for 15 minutes after the addition to complete the reaction (pH at the end of the reaction was 1.1).
The produced copper sulfide pulp was subjected to filtration to recover the copper sulfide deposit. Since the unreacted Cu ions are attached to the recovered copper sulfide deposit, it is repulped with 5,000 cc of pure water, subjected to filtration again, and wet copper sulfide << 5 >> after the repulp washing is used. It was collected.
The repulp washing was carried out twice, and the finally recovered wet copper sulfide after repulp washing was 915 wet · g. Table 1 shows the quality of the wet copper sulfide << 5 >>. In the table according to the present invention, “Total-S” is the total sulfur content.
〈4〉wet硫化銅の添加量の検討
砒酸溶液《1》中に添加するwet硫化銅《5》の添加効果を確認し、さらに、好ましい添加量の検討を行った。
具体的には、添加するwet硫化銅《5》のパルプ濃度を、dry量換算(乾量換算)し、それぞれ0dry・g/L(試験A)、2dry・g/L(試験B)、10dry・g/L(試験C)、70dry・g/L(試験D)とした4水準の試験を行った。
尚、試験A〜Dにおいて、単体硫黄(S0)《4》である試薬硫黄粉末の添加量は8.6gに統一した。当該硫黄粉末添加量8.6gは、下式(1)に示す反応のCuイオン総モル量の4倍当量(4倍モル量)である。
Cu2++S0→ CuS・・・(1)
即ち、硫酸銅・5水和物16.8g中のCu量は4.255gであり、0.06696モルである。従って、単体硫黄(S0)の添加量8.6gとは、下式(2)により、Cuイオン総モル量の4倍当量であることが理解できる。
8.6g÷32.06(Sの原子量)÷0.06696(Cuイオンモル量)=4倍当量・・・(2)
試験A〜Dに係る試料調合組成を表2に示す。
<4> Examination of Addition Amount of Wet Copper Sulfide The effect of addition of wet copper sulfide << 5 >> added to the arsenic acid solution << 1 >> was confirmed, and a preferred addition amount was further examined.
Specifically, the pulp concentration of the wet copper sulfide << 5 >> to be added is converted into a dry amount (converted into a dry amount), and 0 dry · g / L (test A), 2 dry · g / L (test B), 10 dry, respectively. -Four-level tests were conducted with g / L (Test C) and 70 dry. G / L (Test D).
In addition, in tests A to D, the addition amount of reagent sulfur powder, which is elemental sulfur (S 0 ) << 4 >>, was unified to 8.6 g. The sulfur powder addition amount 8.6 g is 4 times equivalent (4 times mole amount) of the total Cu ion mole amount of the reaction shown in the following formula (1).
Cu 2+ + S 0 → CuS (1)
That is, the amount of Cu in 16.8 g of copper sulfate pentahydrate is 4.255 g, which is 0.06696 mol. Therefore, it can be understood that the added amount of 8.6 g of elemental sulfur (S 0 ) is 4 times equivalent to the total molar amount of Cu ions by the following formula (2).
8.6 g ÷ 32.06 (atomic weight of S) ÷ 0.06696 (molar amount of Cu ion) = 4 times equivalent (2)
Table 2 shows sample preparation compositions according to tests A to D.
〈SO2ガスの吹き込み量について〉
試験A〜Dの各試料において、SO2ガス《3》吹込み量は全て、100cc/分にて実施した。当該SO2ガス《3》の、経過時間毎に吹き込まれたSO2ガス《3》の総量の目安として、吹き込まれたSO2ガス《3》の総量のモル量が、各試料に溶存しているCuイオン総モル量の何倍量にあたるかを表3に示した。
<SO 2 gas blowing amount>
In each sample of Tests A to D, SO 2 gas << 3 >> was blown at a rate of 100 cc / min. Of the SO 2 gas "3", as a measure of the total amount of SO 2 gas was blown into each elapsed time "3", the molar amount of the total amount of blown the SO 2 gas "3", then dissolved in each sample Table 3 shows how many times the total molar amount of Cu ions is.
試験A〜Dの各試料において、試料溶液に添加した硫酸銅の量は16.8gであるので、Cu量は4.255gであり、0.06696モルである。
従って、当該Cuイオンモル量と等モル量のSO2ガス《3》量は(0.06696(モル)×22.4(L/モル)×1000(cc/L)=1500ccである。この結果、表3より、SO2ガス《3》の15分間吹き込み時点にて、試料溶液中のCuイオンモル量と等モル量となることが理解できる。
In each sample of Tests A to D, since the amount of copper sulfate added to the sample solution is 16.8 g, the Cu amount is 4.255 g, which is 0.06696 mol.
Therefore, the amount of SO 2 gas << 3 >> which is equimolar to the Cu ion molar amount is (0.06696 (mol) × 22.4 (L / mol) × 1000 (cc / L) = 1500 cc. From Table 3, it can be understood that when the SO 2 gas << 3 >> is blown for 15 minutes, the molar amount is equal to the molar amount of Cu ions in the sample solution.
ここで試験装置は、1リットルビーカーに邪魔板を4枚設け、500rpm攪拌する2段タービン羽を設けたものを準備した。ガス吹き込みは、ガラス管を通しビーカー底部より行うこととした。 Here, a test apparatus was prepared in which four baffle plates were provided in a 1 liter beaker and two-stage turbine blades that were stirred at 500 rpm were provided. The gas was blown from the bottom of the beaker through a glass tube.
各試験試料を室温にて充分攪拌混合してから昇温開始し、液温が試験設定温度(75℃)に到達した時点にて、10ccサンプリングし各試験試料液の組成分析を行った。
次に、各試料へ、SO2ガス(純度99.9%)《3》の吹き込みを開始し、当該吹き込み開始時をもって反応開始時とした。SO2ガス《3》の吹き込み量は100cc/分とし、液温75℃を維持しながら反応を継続した。そして、SO2ガス《3》吹き込み開始15分経過時点にて、10ccサンプリングし各試験試料液の組成分析を行った。
この間も、引き続きSO2ガス《3》の吹き込み、液温75℃を維持しつつ反応継続した。そして、SO2ガス《3》吹き込み開始時から30分間経過時点にて反応終了とし、10ccサンプリングし各試験試料液の組成分析を行った。
After each test sample was sufficiently stirred and mixed at room temperature, the temperature was started to rise, and when the liquid temperature reached the test set temperature (75 ° C.), 10 cc was sampled and the composition analysis of each test sample liquid was performed.
Next, blowing of SO 2 gas (purity 99.9%) << 3 >> into each sample was started, and the start of the blowing was defined as the start of reaction. The amount of SO 2 gas << 3 >> blown was 100 cc / min, and the reaction was continued while maintaining a liquid temperature of 75 ° C. And 10 cc was sampled at the time of 15 minutes from the start of blowing SO 2 gas << 3 >>, and the composition analysis of each test sample solution was performed.
During this time, the reaction was continued while the SO 2 gas << 3 >> was continuously blown and the liquid temperature was maintained at 75 ° C. Then, the reaction was terminated when 30 minutes had elapsed from the start of blowing the SO 2 gas << 3 >>, 10 cc was sampled, and the composition analysis of each test sample solution was performed.
試験A〜Dの試料に対してSO2ガス《3》を30分間吹き込み、0分、15分、30分時点での、各試料のpH値、総砒素濃度、3価砒素濃度、5価砒素濃度、5価砒素比率、Cuイオン濃度、Cuイオン除去率を測定した。測定結果を表4から7に示す。また、縦軸にCuイオン除去率、横軸に経過時間をとったグラフを作成し、試験Aを−◆−、試験Bを−■−、試験Cを−▲−、試験Dを−●−でプロットし図1とした。 The sample of Tests A to D was blown with SO 2 gas << 3 >> for 30 minutes, and the pH value, total arsenic concentration, trivalent arsenic concentration, and pentavalent arsenic at 0, 15, and 30 minutes. The concentration, pentavalent arsenic ratio, Cu ion concentration, and Cu ion removal rate were measured. The measurement results are shown in Tables 4 to 7. In addition, a graph was prepared with the Cu ion removal rate on the vertical axis and the elapsed time on the horizontal axis. Test A is-◆-, Test B is-■-, Test C is-▲-, and Test D is-●- And plotted in FIG.
〈結論〉
表4〜7および図1から、以下のことが判明した。
Cuイオンを含有している砒酸溶液《1》試料中へ、反応開始期に硫化銅《5》を共存させた場合(試験B〜D)、反応開始時からCuイオンの除去が進行する。且つ、当該硫化銅《5》の共存により、反応性が飛躍的に向上し、さらには、砒酸(5価As)の亜砒酸(3価As)への還元を抑制する効果も見出すことが出来た。
これに対し、Cuイオンを含有している砒酸溶液《1》試料中へ、反応開始期に硫化銅《5》を存在させない場合(試験A)、Cuイオンの除去は殆ど進行しなかった。且つ、砒酸(5価As)の亜砒酸(3価As)への還元が進んでしまい、当初の目的を達成する
ことが出来なかった。この現象に関して、本発明者等は、反応始期に硫化銅《5》を液中に存在させることで、SO2ガス《3》が、砒酸(5価As)の還元に優先消費されるのを抑制し、且つ、CuイオンとS0との反応を促進させて、Cuイオンの除去を進行させているものと推定している。
<Conclusion>
From Tables 4 to 7 and FIG.
When copper sulfide << 5 >> coexists in the arsenic acid solution << 1 >> sample containing Cu ions at the start of the reaction (tests B to D), the removal of Cu ions proceeds from the start of the reaction. In addition, the coexistence of the copper sulfide << 5 >> has dramatically improved the reactivity, and furthermore, the effect of suppressing the reduction of arsenic acid (pentavalent As) to arsenous acid (trivalent As) could be found. .
On the other hand, when copper sulfide << 5 >> was not present in the arsenic acid solution << 1 >> sample containing Cu ions at the start of the reaction (test A), the removal of Cu ions hardly proceeded. In addition, reduction of arsenic acid (pentavalent As) to arsenous acid (trivalent As) has progressed, and the original purpose could not be achieved. With regard to this phenomenon, the present inventors made it possible for SO 2 gas << 3 >> to be preferentially consumed for reduction of arsenic acid (pentavalent As) by making copper sulfide << 5 >> exist in the liquid at the beginning of the reaction. suppressing, and, by promoting the reaction between Cu ion and S 0, are presumed to be allowed to proceed removal of Cu ions.
硫化銅《5》の存在効果は、濃度2dry・g/L(試験B)でも確認出来た。そして、硫化銅《5》の存在効果は、硫化銅《5》の濃度と伴に増加したが、濃度70dry・g/L(試験D)でも、10dry・g/L(試験C)と近いものであった。
そして、硫化銅《5》の濃度が10dry・g/L以上あれば、溶存Cuイオンの総モル量と等モル量のSO2ガス《3》を吹き込んだ時点(15分間時点)で、当初溶存していたCuイオンの90%以上が除去され、しかも、砒酸(5価As)比率は85%を確保出来た。
The existence effect of copper sulfide << 5 >> could be confirmed even at a concentration of 2 dry · g / L (Test B). The presence effect of copper sulfide << 5 >> increased with the concentration of copper sulfide << 5 >>, but the concentration was 70 dry · g / L (test D), which was close to 10 dry · g / L (test C). Met.
Then, if the concentration of copper sulfide "5" 10dry · g / L or more, at the time point (
(2)吹き込むSO2ガスを、SO2ガスと空気との混合ガスに代替する効果
試験方法は、上述した、「(1)Cuイオンを含有している砒酸溶液《1》中に単体硫黄(S0)《4》と、硫化銅《5》とを存在させ、ここへSO2ガス《3》を吹き込む実施の形態」と同様だが、硫化銅濃度を70dry・g/Lとし、サンプリング間隔は5分間隔とし、終了30分間時点まで行った。
(2) blowing SO 2 gas, effect test methods to replace the mixed gas of SO 2 gas and air, described above, "(1) Cu elemental sulfur in the arsenic acid solution" 1 "containing the ions ( S 0 ) << 4 >> and copper sulfide << 5 >> and SO 2 gas << 3 >> is blown into this embodiment, but the copper sulfide concentration is 70 dry · g / L and the sampling interval is The interval was 5 minutes and the process was completed until the end of 30 minutes.
〈吹き込みガスの混合組成〉
99.9%SO2ガス単味(上述した(1)と同様である。)《3》100cc/分(試験E)
99.9%SO2ガスと空気の混合(SO2:空気=1:1)ガス《3*》 、SO2
100cc/分+空気100cc/分(試験F)
99.9%SO2ガスと空気の混合(SO2:空気=1:5)ガス《3*》、SO2100cc/分+空気500cc/分(試験G)
尚、SO2ガスおよび空気は、それぞれの圧縮ボンベから所定量切り出し混合してから吹き込みガラス管から吹き込んだ。
<Mixed composition of blowing gas>
99.9% SO 2 gas simple (same as (1) described above) << 3 >> 100 cc / min (Test E)
99.9% SO 2 gas and air mixed (SO 2 : air = 1: 1) gas << 3 * >>, SO 2
100cc / min + air 100cc / min (Test F)
Mixing of 99.9% SO 2 gas and air (SO 2 : air = 1: 5) gas << 3 * >>, SO 2 100 cc / min + air 500 cc / min (test G)
In addition, SO 2 gas and air were blown out from the blown glass tube after cutting out and mixing predetermined amounts from the respective compression cylinders.
当該試験E〜Gのサンプリング時間毎におけるpH値、砒酸(5価As)比率の推移を表8に、溶存Cuイオン濃度、溶存Cuイオン除去率の推移を表9に示す。また、縦軸に砒酸(5価As)比率、横軸に経過時間をとったグラフを作成し、試験Eを−◆−、試験
Fを−■−、試験Gを−▲−でプロットし図2とし、縦軸に溶存Cuイオン濃度、横軸に経過時間をとったグラフを作成し、試験Eを−◆−、試験Fを−■−、試験Gを−▲−でプロットし図3とした。
Table 8 shows changes in pH value and arsenic acid (pentavalent As) ratio for each sampling time of tests E to G, and Table 9 shows changes in dissolved Cu ion concentration and dissolved Cu ion removal rate. In addition, a graph with the vertical axis representing the arsenic acid (pentavalent As) ratio and the horizontal axis representing the elapsed time is plotted, with test E plotted as-◆-, test F as-■-, and test G as-▲-. 2 and plotting the dissolved Cu ion concentration on the vertical axis and the elapsed time on the horizontal axis, and plotting Test E with-◆-, Test F with-■-, and Test G with-▲- did.
〈結論〉
表8、9および図2、3から、以下のことが判明した。
Cuイオンを含有している砒酸溶液《1》試料へ、純SO2ガス《3》を吹き込んだ場合も、SO2ガスおよび空気の混合ガス《3*》を吹き込んだ場合も、溶存Cuイオンの除去能力には殆ど差は認められないが、SO2ガスおよび空気の混合ガス《3*》を吹き込んだ場合は、砒酸(5価As)比率を高く維持できることが判明した。つまり、SO2ガスおよび空気の混合ガス《3*》を吹き込むことにより、純SO2ガス《3》を吹き込んだ場合に比べ、砒酸(5価As)の亜砒酸(3価As)への還元を抑制しつつCuイオンを除去することが出来る。
<Conclusion>
From Tables 8 and 9 and FIGS.
Whether pure SO 2 gas << 3 >> was blown into the arsenic acid solution << 1 >> sample containing Cu ions or a mixed gas << 3 * >> of SO 2 gas and air was blown, the dissolved Cu ions Although there is almost no difference in removal capability, it has been found that the arsenic acid (pentavalent As) ratio can be maintained high when a mixed gas <3 * > of SO 2 gas and air is blown. That is, by blowing a mixed gas of SO 2 gas and air << 3 * >>, arsenic acid (pentavalent As) is reduced to arsenous acid (trivalent As) compared to the case where pure SO 2 gas << 3 >> is blown. Cu ions can be removed while being suppressed.
SO2ガスおよび空気の混合ガス《3*》において、今回検討範囲内では、SO2ガスと空気との混合量の違いによる反応性に差は認められなかった。尤も、吹き込むガス量が
多いと熱量的に不利(熱を外部へ奪い去ることとなる。)なので、(SO2+空気)は(1+1)が好ましい。
以上のことから、SO2ガスと空気との混合ガス《3*》を用いることで、脱Cuイオン能力は維持しつつ、5価As比率を高く保持出来ることが判明した。
SO 2 in the gas and air mixture gas "3 *", and in the time considered range, the difference in reactivity by mixing amount of the difference between the SO 2 gas and air was observed. However, if the amount of gas to be blown is large, it is disadvantageous in terms of calorie (heat is taken away to the outside), and (SO 2 + air) is preferably (1 + 1).
From the above, it was found that by using a mixed gas << 3 * >> of SO 2 gas and air, the pentavalent As ratio can be kept high while maintaining the Cu removal ion ability.
一方、本発明者等は、実際の操業において砒酸濃厚溶液である濾液《7》からスコロダイト《10》を製造する場合に、当該砒酸濃厚溶液中に共存するCuイオン濃度が、1g/L以下であれば、生成するスコロダイト《10》結晶の粒子成長のコントロールが定常化出来、当該スコロダイト《10》製造を安定的に行うことが可能となるとの知見を得た。
そして、溶存Cuイオンを0.5〜1g/L程度残った段階で脱Cuイオン反応を終了することにより、5価As比率は90%以上確保出来ることが判明した。
当該反応の管理は、吹き込むSO2ガス《3》、または、SO2ガスと空気との混合ガス《3*》の量で容易に制御が出来る。
On the other hand, when manufacturing scorodite << 10 >> from filtrate << 7 >> which is an arsenic acid concentrated solution in actual operation, the present inventors have a Cu ion concentration coexisting in the arsenic acid concentrated solution at 1 g / L or less. If it exists, the control of the particle growth of the scorodite << 10 >> crystal | crystallization to produce | generate could be made steady, and the knowledge that the said scorodite << 10 >> manufacture could be performed stably was acquired.
Then, it was found that the pentavalent As ratio can be secured at 90% or more by terminating the de-Cu ion reaction at a stage where about 0.5 to 1 g / L of dissolved Cu ions remain.
Administration of the reaction is blown SO 2 gas "3", or, easily controlled can be in an amount of mixed gas "3 *" of the SO 2 gas and air.
(3)生成する、硫化銅を含むwet回収殿物の循環的再利用
Cuイオンを含有している砒酸《1》溶液に硫化銅《5》を存在させ、SO2ガス《3》《3*》を吹き込む形態の反応が終了すると、硫化銅を主としたwet回収殿物《8》が回収される。当該wet回収殿物《8》は、銅製錬原料《11》となる。さらに、当該回収殿物《8》には未反応の単体硫黄(S0)《4》も含まれる。
そこで、以降の回の反応において、当該回収殿物《8》を、硫化銅源およびS0源として繰り返し《9》て用い、循環的再利用することを検討した。
(3) Cyclic reuse of the wet recovery deposit containing copper sulfide produced Copper sulfide << 5 >> is present in the arsenic acid << 1 >> solution containing Cu ions, and SO 2 gas << 3 >><< 3 * When the reaction in the form of blowing is completed, the wet collection residue << 8 >> mainly composed of copper sulfide is recovered. This wet collection thing << 8 >> becomes a copper smelting raw material << 11 >>. Further, the recovered residue << 8 >> includes unreacted elemental sulfur (S 0 ) << 4 >>.
Therefore, in the subsequent round of the reaction, the recovered gluteal product "8", using Te repeated "9" as the copper sulfide source and S 0 source and consider cyclical reuse.
〈初回反応・殿物試料の調製〉
上記(1)で説明した、Cuイオンを含有している砒酸溶液《1》中に単体硫黄(S0)《4》と、硫化銅《5》とを存在させ、ここへSO2ガス《3》を吹き込む実施の形態を、wet硫化銅《5》70dry・g/L添加、Cuイオンの総モル量の4倍モル量の単体硫黄(S0)《4》を添加の条件で行った。反応条件も同様に、液温75℃、SO2ガス《3》吹き込み量100cc/min、反応15分間で終了とした。
当該初回反応の調合組成を表10に示す。
<First reaction, preparation of temple samples>
Elementary sulfur (S 0 ) << 4 >> and copper sulfide << 5 >> are present in the arsenic acid solution << 1 >> containing Cu ions described in (1) above, and SO 2 gas << 3 >> In the embodiment, wet copper sulfide << 5 >> was added at 70 dry · g / L, and the elemental sulfur (S 0 ) << 4 >> having a
The composition of the initial reaction is shown in Table 10.
初回反応終了後、生成物を濾過《6》し、濾液《7》と回収殿物《8》とを得た。濾液《7》は組成分析へ供じた。一方、回収殿物《8》には反応後液が付着しており、当該付着した反応後液は、次工程への混入となる。ここで、当該次工程における反応を正確に把握する観点から、約40℃に加温した純水600ccを用いて、回収殿物《8》のリパルプ洗浄を施すこととし、再度濾過へ供じ、175wet・gのwet回収殿物《8》を回収した。当該回収殿物《8》から5wet・gを採取し水分測定を行った所、水分は65質量%であった。当該濾液《7》の組成分析結果を表13に示す。 After completion of the first reaction, the product was filtered << 6 >> to obtain a filtrate << 7 >> and a recovered residue << 8 >>. The filtrate << 7 >> was subjected to composition analysis. On the other hand, the post-reaction liquid is attached to the recovered residue << 8 >>, and the attached post-reaction liquid is mixed into the next step. Here, from the viewpoint of accurately grasping the reaction in the next step, using 600 cc of pure water heated to about 40 ° C., the recovered pulp << 8 >> is repulped and subjected to filtration again. A 175 wet · g wet collection << 8 >> was recovered. When 5 wet · g was collected from the collected residue << 8 >> and the moisture was measured, the moisture was 65% by mass. Table 13 shows the composition analysis result of the filtrate << 7 >>.
〈繰り返し1回目反応〉
上記(1)で説明した、Cuイオンを含有している砒酸溶液《1》中へ、の初回反応で回収された洗浄済みのwet回収殿物《8》の全量と、さらにCuイオン総モル量と等モル量のS0《4》を加え、同様に、液温75℃、SO2ガス《3》吹き込み量100cc/minにて15分間反応させ終了とした。
尚、当該繰り返し1回目反応の調合を表11に示す。
<Repeated first reaction>
The total amount of the washed wet recovered product << 8 >> recovered in the first reaction in the arsenic acid solution << 1 >> containing Cu ions described in (1) above, and the total molar amount of Cu ions An equimolar amount of S 0 << 4 >> was added, and similarly, the reaction was terminated for 15 minutes at a liquid temperature of 75 ° C. and a SO 2 gas << 3 >> blowing rate of 100 cc / min.
In addition, Table 11 shows the composition of the first repeated reaction.
繰り返し1回目反応終了後、生成物を濾過《6》し、濾液《7》と回収殿物《8》を得た。濾液《7》は組成分析へ供し、他方、回収殿物《8》は、初回反応と同様にリパルプ洗浄を施し、再度濾過へ供じた。こうして167wet・gのwet回収殿物《8》を回収した。当該wet回収殿物《8》から5wet・gを採取し水分測定を行った所、水分は61質量%であった。
当該濾液《7》の組成分析結果を表13に示す。
After completion of the first reaction repeatedly, the product was filtered << 6 >> to obtain a filtrate << 7 >> and a recovered residue << 8 >>. The filtrate << 7 >> was subjected to composition analysis, while the recovered residue << 8 >> was subjected to repulp washing in the same manner as the first reaction and again subjected to filtration. In this way, 167 wet · g wet collection << 8 >> was recovered. When 5 wet · g was collected from the wet collection residue << 8 >> and the water content was measured, the water content was 61% by mass.
Table 13 shows the composition analysis result of the filtrate << 7 >>.
〈繰り返し2回目反応〉
上記(1)で説明した、Cuイオンを含有している砒酸溶液《1》中へ、上記繰り返し1回目反応で回収された水洗済みのwet回収殿物《8》の全量と、さらにCuイオン総モル量と等モル量のS0《4》を加え、同様に、液温75℃、SO2ガス《3》吹き込み量100cc/minにて15分間反応させ終了とした。
尚、当該繰り返し2回目反応の調合を表12に示す。
<Repeated second reaction>
In the arsenic acid solution << 1 >> containing Cu ions described in (1) above, the total amount of the wet-recovered wet collection << 8 >> recovered by the first reaction described above, and the total Cu ions A molar amount and an equimolar amount of S 0 << 4 >> were added, and similarly, the reaction was terminated at a liquid temperature of 75 ° C. and an SO 2 gas << 3 >> blowing rate of 100 cc / min for 15 minutes.
In addition, Table 12 shows the composition of the repeated second reaction.
繰り返し2回目反応終了後、生成物を濾過《6》し、さらにwet回収殿物《8》は上記同様のリパルプ洗浄し、164wet・gのwet回収殿物《8》を回収した。当該wet回収殿物《8》から5wet・gを採取し水分測定を行った所、水分は58質量%であった。併せて、濾液《6》の組成分析も行った。当該濾液《6》の組成分析結果を表13に示す。 After the second reaction was repeated, the product was filtered << 6 >>, and the wet collection residue << 8 >> was washed with the same repulp as described above to recover a 164 wet · g wet collection residue << 8 >>. When 5 wet · g was collected from the wet collection residue << 8 >> and the moisture was measured, the moisture was 58% by mass. In addition, the composition of the filtrate << 6 >> was also analyzed. Table 13 shows the composition analysis result of the filtrate << 6 >>.
〈結論〉
表13の結果より、新規に製造したwet硫化銅《5》と、wet回収殿物《8》とにおいて、Cuイオンの除去性能、砒酸(5価As)比率を比較しても差異は認められない。従って、wet回収殿物《8》として生成する硫化銅およびS0の循環的再利用は、可能且つ有効であると考えられる。
具体的には、初回反応において、新規製造のwet硫化銅《5》と、Cuイオン総モル量の4倍モル量の単体硫黄(S0)《4》とを、Cuイオンを含有している砒酸溶液《1》中に添加する。そして当該初回反応終了後のwet回収殿物《8》を、次回以降の反応において硫化銅として循環的再利用する。当該循環的再利用により、新たな硫化銅《5》の添加をすることなく、且つ、単体硫黄(S0)《4》はCuイオン総モル量と等モル量となる添加のみで、反応の継続が可能となる。この結果、薬剤コストと、生成物の処理コストとを大幅に削減出来る。
<Conclusion>
From the results shown in Table 13, there is a difference between the newly produced wet copper sulfide << 5 >> and the wet recovered residue << 8 >> even when the Cu ion removal performance and the arsenic acid (pentavalent As) ratio are compared. Absent. Thus, cyclical reuse of copper sulfide and S 0 is generated as wet recovered gluteal product "8" is believed to be and effective.
Specifically, in the initial reaction, the newly produced wet copper sulfide << 5 >> and the elemental sulfur (S 0 ) << 4 >> having a
《1》砒酸溶液
《2》硫化反応
《3》SO2ガス
《3*》SO2ガスと空気との混合ガス
《4》単体硫黄(S0)
《5》硫化銅
《6》濾過
《7》濾液
《8》回収殿物
《9》繰り返し
《10》スコロダイト
《11》銅製錬原料
<< 1 >> Arsenic acid solution << 2 >> Sulfurization reaction << 3 >> SO 2 gas << 3 * >> Mixed gas of SO 2 gas and air << 4 >> Single element sulfur (S 0 )
"5" Copper sulfide "6" Filtration "7" Filtrate "8" Recovery residue "9" Repeated "10" Scorodite "11" Copper smelting raw material
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011161386A (en) * | 2010-02-10 | 2011-08-25 | Akita Univ | Method for treating thioarsenite |
| CN102351360A (en) * | 2011-07-04 | 2012-02-15 | 锡矿山闪星锑业有限责任公司 | Method for comprehensive recovery of arsenic-containing alkaline liquid and waste gas of sulfur dioxide |
| JP2012067361A (en) * | 2010-09-24 | 2012-04-05 | Dowa Metals & Mining Co Ltd | Method of separating copper and arsenic from nonferrous smelting intermediary product containing copper and arsenic |
| CN102983340A (en) * | 2012-11-21 | 2013-03-20 | 中国科学院金属研究所 | Method for removing copper ions from copper-containing vanadium liquid |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5974245A (en) * | 1982-10-20 | 1984-04-26 | Nippon Mining Co Ltd | Separation of copper and arsenic |
| JPS60131827A (en) * | 1983-12-21 | 1985-07-13 | Nippon Mining Co Ltd | Method for producing arsenic solution with high arsenic concentration |
| JP2008150659A (en) * | 2006-12-15 | 2008-07-03 | Dowa Metals & Mining Co Ltd | Preparation of arsenic liquid from copper arsenic compound |
| JP2008169449A (en) * | 2007-01-15 | 2008-07-24 | Dowa Metals & Mining Co Ltd | Arsenic solution purification method |
-
2009
- 2009-07-02 JP JP2009158155A patent/JP5305454B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5974245A (en) * | 1982-10-20 | 1984-04-26 | Nippon Mining Co Ltd | Separation of copper and arsenic |
| JPS60131827A (en) * | 1983-12-21 | 1985-07-13 | Nippon Mining Co Ltd | Method for producing arsenic solution with high arsenic concentration |
| JP2008150659A (en) * | 2006-12-15 | 2008-07-03 | Dowa Metals & Mining Co Ltd | Preparation of arsenic liquid from copper arsenic compound |
| JP2008169449A (en) * | 2007-01-15 | 2008-07-24 | Dowa Metals & Mining Co Ltd | Arsenic solution purification method |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011161386A (en) * | 2010-02-10 | 2011-08-25 | Akita Univ | Method for treating thioarsenite |
| JP2012067361A (en) * | 2010-09-24 | 2012-04-05 | Dowa Metals & Mining Co Ltd | Method of separating copper and arsenic from nonferrous smelting intermediary product containing copper and arsenic |
| CN102351360A (en) * | 2011-07-04 | 2012-02-15 | 锡矿山闪星锑业有限责任公司 | Method for comprehensive recovery of arsenic-containing alkaline liquid and waste gas of sulfur dioxide |
| CN102983340A (en) * | 2012-11-21 | 2013-03-20 | 中国科学院金属研究所 | Method for removing copper ions from copper-containing vanadium liquid |
| CN102983340B (en) * | 2012-11-21 | 2015-04-29 | 中国科学院金属研究所 | Method for removing copper ions from copper-containing vanadium liquid |
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