JP2011046970A - Copper alloy material and method for producing the same - Google Patents
Copper alloy material and method for producing the same Download PDFInfo
- Publication number
- JP2011046970A JP2011046970A JP2009182794A JP2009182794A JP2011046970A JP 2011046970 A JP2011046970 A JP 2011046970A JP 2009182794 A JP2009182794 A JP 2009182794A JP 2009182794 A JP2009182794 A JP 2009182794A JP 2011046970 A JP2011046970 A JP 2011046970A
- Authority
- JP
- Japan
- Prior art keywords
- copper alloy
- alloy material
- heat treatment
- mass
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Conductive Materials (AREA)
- Manufacturing Of Electrical Connectors (AREA)
Abstract
【課題】Cu−Co−Si系銅合金において、コネクタ用端子など電子部品に要求される強度と導電性を維持しつつ打ち抜き加工性に優れる銅合金材を提供する。
【解決手段】Coを0.5〜2.5mass%、Siを0.1〜1mass%含有し、CoとSiの含有量の比Co/Siが2.5〜4.5の間にあり、さらにCr、Fe、Ni、Al、Nb、Ti、V及びZrからなる群から選ばれる少なくとも1種の添加元素を0.01〜0.2mass%含み、残部がCuおよび不可避不純物からなる銅合金材であって、直径が0.05〜5μmで、密度が103〜105個/mm2の、前記添加元素及びCoからなる群から選ばれる少なくとも1種の元素とSiからなる化合物を有する銅合金材。
【選択図】なしTo provide a copper alloy material excellent in punching workability while maintaining strength and conductivity required for electronic parts such as connector terminals in a Cu-Co-Si based copper alloy.
Co containing 0.5 to 2.5 mass%, Si containing 0.1 to 1 mass%, and the ratio of Co and Si content Co / Si is between 2.5 and 4.5, Furthermore, a copper alloy material containing 0.01 to 0.2 mass% of at least one additive element selected from the group consisting of Cr, Fe, Ni, Al, Nb, Ti, V and Zr, with the balance being Cu and inevitable impurities A copper having a diameter of 0.05 to 5 μm and a density of 10 3 to 10 5 pieces / mm 2 and a compound of Si and at least one element selected from the group consisting of the additive element and Co Alloy material.
[Selection figure] None
Description
本発明は端子・コネクタなどの電子部品用に好適な、強度、導電率、および打ち抜き加工性に優れた電子機器用の銅合金材とその製造方法に関する。 The present invention relates to a copper alloy material for electronic equipment, which is suitable for electronic parts such as terminals and connectors, and is excellent in strength, electrical conductivity, and punchability, and a method for producing the same.
近年、大電流を通電する電子機器の小型軽量化が進展し、電子部品材料は導電率が高くかつ強度に優れることが強く求められている。CoとSiを主添加元素とした銅合金は優れた機械的強度、導電率を有しているため、上記電子部品に適しているとされる。これら電子部品は金型を用いた高速プレスによる打ち抜き加工を行って製造されるものが主であり、製造時、材料は金型のパンチによりせん断変形、破断変形を生じて所定の形状に打ち抜かれる。しかし、プレスショット数が増すにつれて金型のパンチの刃先の磨耗が進み、破断形状が乱れて製品形状を保てなくなる。金型メンテナンスのコスト削減の手段として、金型磨耗を軽減する、もしくは初期の金型形状から磨耗が進んだ時点においてもプレス形状を維持できる、打ち抜き加工性に優れる銅合金が求められている(特許文献1〜6参照)。 In recent years, electronic devices that carry a large current have been reduced in size and weight, and electronic component materials are strongly required to have high conductivity and excellent strength. A copper alloy containing Co and Si as main additive elements is considered to be suitable for the electronic component because it has excellent mechanical strength and electrical conductivity. These electronic components are mainly manufactured by punching with a high-speed press using a mold, and at the time of manufacturing, the material is punched into a predetermined shape by causing shear deformation or fracture deformation by the punch of the mold. . However, as the number of press shots increases, the cutting edge of the die punch advances and the fracture shape is disturbed, making it impossible to maintain the product shape. As a means of reducing the cost of mold maintenance, there is a need for a copper alloy with excellent punchability that can reduce mold wear or maintain the press shape even when the wear progresses from the initial mold shape ( Patent References 1 to 6).
しかしながら、特許文献1〜6で提案されているCo、Siを主添加元素とした銅合金は、いずれも高強度、高導電性や熱間加工性などに着目したもので、プレス打ち抜き性についての記載はない。これらの文献に記載された銅合金の製造方法においては、プレス打ち抜き加工性向上に必要な化合物制御がなされていないことが伺える。
そこで、本発明は、Cu−Co−Si系合金において、コネクタ用端子など電子部品に要求される強度と導電性を維持しつつ打ち抜き加工性に優れる銅合金材を提供することを課題とする。
However, the copper alloys with Co and Si as the main additive elements proposed in Patent Documents 1 to 6 are all focused on high strength, high conductivity, hot workability, etc. There is no description. In the copper alloy manufacturing methods described in these documents, it can be seen that the compound control necessary for improving the press punching processability is not performed.
Then, this invention makes it a subject to provide the copper alloy material which is excellent in stamping workability, maintaining the intensity | strength and electroconductivity which are requested | required of electronic components, such as a terminal for connectors, in a Cu-Co-Si type alloy.
本発明者等は、Cu−Co−Si系合金において打ち抜き加工性を向上させる化合物を制御することにより、上記の課題を解決できることを見出した。すなわち、合金組成と鋳造・熱処理条件を規定して合金中の化合物サイズ、密度を特定の範囲内にコントロールすることによって、従来の銅合金の強度、導電率特性を維持しつつ、打ち抜き加工性を改善しうることを見出し、この知見に基づき本発明をなすに至った。 The present inventors have found that the above problem can be solved by controlling a compound that improves the punching workability in a Cu—Co—Si based alloy. That is, by controlling the compound size and density in the alloy within a specific range by defining the alloy composition and casting / heat treatment conditions, the punching workability can be improved while maintaining the strength and conductivity characteristics of conventional copper alloys. Based on this finding, the inventors have found that the present invention can be improved.
上記課題は以下の発明により解決される。
(1)Coを0.5〜2.5mass%含有し、CoとSiの含有量の比Co/Siが2.5〜4.5の間にあり、さらにCr、Fe、Ni、Al、Nb、Ti、V及びZrからなる群から選ばれる少なくとも1種の添加元素を0.01〜0.2mass%含み、残部がCuおよび不可避不純物からなる銅合金材であって、直径が0.05〜5μmで、密度が103〜105個/mm2の、前記添加元素及びCoからなる群から選ばれる少なくとも1種の元素とSiからなる化合物を有する銅合金材。
(2)Coを1.4mass%以上2.5mass%以下含有し、CoとSiの含有量の比Co/Siが3.0〜5.0の間にあり、残部がCuおよび不可避不純物からなる銅合金材であって、直径が0.05〜5μmで、密度が103〜105個/mm2のCo及びSiで構成される化合物を有する銅合金材。
(3)Coを0.5mass%以上1.4mass%未満含有し、CoとSiの含有量の比Co/Siが3.0〜5.0の間にあり、残部がCuおよび不可避不純物からなる銅合金材であって、直径が0.05〜5μmで、密度が103〜105個/mm2のCo及びSiで構成される化合物を有する銅合金材。
(4)(1)〜(3)のいずれか1項に記載の銅合金材の銅合金組成に、さらにSn、Zn及びMgからなる群から選ばれる少なくとも1種を0.01〜1mass%含有する銅合金材であって、直径が0.05〜5μmで、密度が103〜105個/mm2の、前記添加元素及びCoからなる群から選ばれる少なくとも1種の元素とSiからなる化合物を有する銅合金材。
(5)(1)〜(4)のいずれか1項に記載の銅合金材を製造する方法であって、鋳造時の冷却速度が1〜30℃/秒の条件下で作製された鋳塊を均質処理後、冷間圧延と中間焼鈍を繰り返した後、仕上げ圧延、歪取り焼鈍を施すことを特徴とする銅合金材の製造方法。
(6)前記鋳造時の冷却速度が1〜30℃/秒の条件下で作製された鋳塊を均質処理し、熱間圧延後、冷間圧延と中間焼鈍を繰り返す工程を有し、条件として(A)熱間圧延終了後の冷却時、600℃までの降温速度を1℃/秒以上30℃/秒以下とし、溶体化熱処理及び/又は再結晶熱処理(以下、両者をあわせて溶体化熱処理という)する際、600℃以上での昇温速度および600℃までの降温速度を30℃/秒以上とするか、または(B)熱間圧延終了後の冷却時、600℃までの降温速度を30℃/秒以上とし、溶体化熱処理する際、600℃以上での昇温速度および600℃までの降温速度を1℃/秒以上30℃/秒以下とするかの処理を施し、更にその後時効熱処理、仕上げ圧延、歪取り焼鈍を施すことを特徴とする、(5)に記載の銅合金材の製造方法。
(7)前記鋳造時の冷却速度が1〜30℃/秒の条件下で作製された鋳塊を均質処理し、熱間圧延後、冷間圧延と中間焼鈍を繰り返す工程を有し、条件として(C)熱間圧延工程と冷間圧延工程との間に、熱処理工程を新たに設け、600〜750℃にて50〜600秒間保持を行い、その後急冷するか、(D)冷間圧延工程で材料を0.05〜0.5mmの厚さにした後、溶体化熱処理工程の前に、熱処理工程を新たに設け、600〜750℃にて50〜600秒間保持を行い、その後急冷するか、(E)溶体化熱処理工程と時効熱処理工程との間に、熱処理工程を新たに設け、600〜750℃にて50〜600秒間保持を行い、その後急冷するか、のいずれかの熱処理を施し、更にその後時効熱処理、仕上げ圧延、歪取り焼鈍を施すことを特徴とする、(5)または(6)に記載の銅合金材の製造方法。
なお、本発明における「化合物」は上記2種以上の元素からなる金属間化合物であり、晶出物(液体から固体に変態する際あらわれる金属間化合物)と析出物(固体から固体に変態する際、例えば固溶状態から、あらわれる金属間化合物)の両方を含む。
The above problems are solved by the following invention.
(1) Co is contained at 0.5 to 2.5 mass%, Co / Si content ratio Co / Si is between 2.5 and 4.5, and Cr, Fe, Ni, Al, Nb , A copper alloy material containing 0.01 to 0.2 mass% of at least one additive element selected from the group consisting of Ti, V and Zr, with the balance being Cu and inevitable impurities, the diameter of which is 0.05 to A copper alloy material having a compound of Si and at least one element selected from the group consisting of the additive element and Co, having a density of 10 to 105 / mm 2 at 5 μm.
(2) Co is contained in an amount of 1.4 mass% to 2.5 mass%, the Co / Si content ratio Co / Si is between 3.0 and 5.0, and the balance is made of Cu and inevitable impurities. A copper alloy material having a compound composed of Co and Si having a diameter of 0.05 to 5 μm and a density of 103 to 105 pieces / mm 2, which is a copper alloy material.
(3) Co is contained in an amount of 0.5 mass% to less than 1.4 mass%, the Co / Si content ratio Co / Si is between 3.0 and 5.0, and the balance is made of Cu and inevitable impurities. A copper alloy material having a compound composed of Co and Si having a diameter of 0.05 to 5 μm and a density of 103 to 105 pieces / mm 2, which is a copper alloy material.
(4) The copper alloy composition of the copper alloy material according to any one of (1) to (3) further contains 0.01 to 1 mass% of at least one selected from the group consisting of Sn, Zn and Mg. A copper alloy material having a diameter of 0.05 to 5 μm and a density of 103 to 105 / mm 2, at least one element selected from the group consisting of the additive element and Co, and a compound consisting of Si Copper alloy material.
(5) A method for producing the copper alloy material according to any one of (1) to (4), wherein the ingot is produced under a condition where the cooling rate during casting is 1 to 30 ° C / second. A method for producing a copper alloy material, characterized by performing cold rolling and intermediate annealing, homogenizing, repeating finish rolling and strain relief annealing.
(6) The ingot produced under the condition that the cooling rate during casting is 1 to 30 ° C./second is homogenized, and after hot rolling, a process of repeating cold rolling and intermediate annealing is performed, and the conditions are as follows: (A) At the time of cooling after completion of hot rolling, the temperature decreasing rate up to 600 ° C. is set to 1 ° C./second or more and 30 ° C./second or less, solution heat treatment and / or recrystallization heat treatment (hereinafter, both are solution heat treatment) When the temperature rise rate at 600 ° C. or higher and the temperature decrease rate to 600 ° C. is set to 30 ° C./second or higher, or (B) the temperature decrease rate to 600 ° C. at the time of cooling after completion of hot rolling. When the solution heat treatment is performed at 30 ° C / second or higher, the temperature is increased at 600 ° C or higher and the temperature decrease rate to 600 ° C is set at 1 ° C / second or higher and 30 ° C / second or lower, and then aging is performed. (5) characterized by performing heat treatment, finish rolling and strain relief annealing Method for producing a copper alloy material according.
(7) The ingot produced under the condition that the cooling rate during casting is 1 to 30 ° C./second is homogenized, and after hot rolling, a process of repeating cold rolling and intermediate annealing is performed. (C) A heat treatment step is newly provided between the hot rolling step and the cold rolling step, and held at 600 to 750 ° C. for 50 to 600 seconds and then rapidly cooled, or (D) the cold rolling step. After the material is made 0.05 to 0.5 mm thick, before the solution heat treatment step, a heat treatment step is newly provided, held at 600 to 750 ° C. for 50 to 600 seconds, and then rapidly cooled. (E) A heat treatment step is newly provided between the solution heat treatment step and the aging heat treatment step, held at 600 to 750 ° C. for 50 to 600 seconds, and then rapidly cooled. Furthermore, after that, perform aging heat treatment, finish rolling, strain relief annealing Characterized method of the copper alloy material according to (5) or (6).
The “compound” in the present invention is an intermetallic compound composed of two or more elements described above, and a crystallized product (intermetallic compound that appears when transforming from liquid to solid) and a precipitate (when transforming from solid to solid). For example, an intermetallic compound appearing from a solid solution state).
本発明の銅合金材は、強度、導電率を損なわずに打ち抜き加工性を向上させたものである。よって、電子機器用の部品、例えば端子・コネクタ等としたときに銅合金材に要求される高レベルの特性を有し、かつ、打ち抜き加工における金型長寿命化によってコストパフォーマンスの改善が行われる。 The copper alloy material of the present invention is improved in punching workability without impairing strength and electrical conductivity. Therefore, it has high-level characteristics required for copper alloy materials when used as parts for electronic equipment such as terminals and connectors, etc., and cost performance is improved by extending the die life in stamping. .
以下に、本発明の好ましい実施の形態を述べる。なお、本発明において銅合金材とは、圧延工程によって、例えば板材、条材、箔などの特定の形状に加工された銅合金を意味する。
本発明の銅合金材の第一の実施形態における組成は、Co、Siとその他の添加元素(Cr、Fe、Ni、Al、Nb、Ti、V及びZrからなる群から選ばれる少なくとも1種)とを含有し、残部がCuおよび不可避的不純物を含むものである。
The preferred embodiments of the present invention will be described below. In the present invention, the copper alloy material means a copper alloy processed into a specific shape such as a plate material, a strip material, or a foil by a rolling process.
The composition of the first embodiment of the copper alloy material of the present invention is Co, Si and other additive elements (at least one selected from the group consisting of Cr, Fe, Ni, Al, Nb, Ti, V, and Zr). And the balance contains Cu and inevitable impurities.
本実施形態の銅合金材において、Coの含有量は0.5〜2.5mass%とする。この理由は、製品として十分な強度を確保するためである。0.5mass%未満ではSiとの析出によって得られる強度が不十分となる。また、2.5mass%を超えると固溶しきれなくなり、合金の強化に寄与しなくなるほか、地金コストの高いコバルトの添加量増加によって、価格面で競争力に劣る合金となってしまう。好ましくは0.6〜2.2mass%であり、より好ましくは0.7〜2.0mass%である。 In the copper alloy material of the present embodiment, the Co content is 0.5 to 2.5 mass%. The reason for this is to ensure sufficient strength as a product. If it is less than 0.5 mass%, the strength obtained by precipitation with Si becomes insufficient. On the other hand, if it exceeds 2.5 mass%, it will not be able to be completely dissolved and will not contribute to strengthening of the alloy, and it will become an alloy which is inferior in competitiveness in terms of price due to the increase in the amount of cobalt with high metal cost. Preferably it is 0.6-2.2 mass%, More preferably, it is 0.7-2.0 mass%.
Siの含有量は、少なくとも0.1〜1mass%の範囲を満足するようにすることが好ましい。この理由も、製品として十分な強度を確保するためである。少なすぎるとCoとの析出によって得られる強度が不十分となる場合がある。また、多すぎると固溶によって導電率が低下する場合がある。本実施形態では、CoとSiの質量比、Co/Siが2〜4.5となるようにする。 It is preferable that the Si content satisfies a range of at least 0.1 to 1 mass%. This is also for ensuring sufficient strength as a product. If the amount is too small, the strength obtained by precipitation with Co may be insufficient. Moreover, when there is too much, electrical conductivity may fall by solid solution. In the present embodiment, the mass ratio of Co and Si and Co / Si are set to 2 to 4.5.
本実施形態では、Co、Siの他に、Cr、Fe、Ni、Al、Nb、Ti、V及びZrからなる群から選ばれる少なくとも1種の添加元素を有する。
Cr、Fe、Ni、Al、Nb、Ti、V、Zrは、Co、Siと共に化合物として晶出し、打ち抜き加工性の向上に有効である。前記元素の合計の含有量は0.01〜0.2mass%とする。0.01mass%未満では打ち抜き加工性向上の効果が十分得られない。また、0.2mass%を超えると、Co、Siの多くが強度に寄与しない化合物となることで、材料強度が要求強度よりも低下してしまう。
In this embodiment, in addition to Co and Si, at least one additive element selected from the group consisting of Cr, Fe, Ni, Al, Nb, Ti, V, and Zr is included.
Cr, Fe, Ni, Al, Nb, Ti, V, and Zr crystallize as a compound together with Co and Si, and are effective in improving the punching workability. The total content of the elements is 0.01 to 0.2 mass%. If it is less than 0.01 mass%, the effect of improving the punching workability cannot be obtained sufficiently. On the other hand, if it exceeds 0.2 mass%, most of Co and Si become compounds that do not contribute to the strength, so that the material strength is lower than the required strength.
本実施形態では、銅合金中に、Co及び他の添加元素(Cr、Fe、Ni、Al、Nb、Ti、V、Zr)から選ばれる少なくとも1種の元素とSiからなる、直径0.05〜5μmサイズの化合物を103〜105個/mm2有する。この化合物とは、具体的には、Co2Siの他にCo2−xCrxSi、Co2−xFexSi(xは1または2)などである。
なお、化合物の直径と密度は、圧延平行方向の断面を走査型電子顕微鏡で写真撮影して、その写真上で化合物の粒径と密度を測定したものである。
CoとSiの添加量については、Co(mass%)とSi(mass%)の比、Co/Siを2〜4.5とする。このような比率とする理由は、時効熱処理時に、同系にて強化、導電率の回復に最も寄与するCo2Si化合物の析出を促進しやすいためである。Co、Si以外の元素を含む本実施形態では、Co、Siとその他の元素にて上記化合物を形成し、ややSi量を多く含んだ化合物となるために、Co2Si析出を促すCo/Si比の固溶状態が維持できるよう、後述する他の元素を含まない形態に比べ、ややSi量が多くなるような比になっている。上記比を満たすことによって目的の合金材を得ることができる。この実施形態におけるCo/Siは好ましくは2.5〜4であり、より好ましくは3〜3.5である。
In the present embodiment, the copper alloy contains at least one element selected from Co and other additive elements (Cr, Fe, Ni, Al, Nb, Ti, V, Zr) and Si, and has a diameter of 0.05. It has 10 3 to 10 5 compounds / mm 2 of ˜5 μm size. And the compound, specifically, (the x 1 or 2) in addition to Co 2-x Cr x Si, Co 2-x Fe x Si of Co 2 Si and the like.
The diameter and density of the compound are obtained by taking a photograph of a cross section in the rolling parallel direction with a scanning electron microscope and measuring the particle size and density of the compound on the photograph.
Regarding the addition amount of Co and Si, the ratio of Co (mass%) to Si (mass%), Co / Si is set to 2 to 4.5. The reason for this ratio is that during the aging heat treatment, it is easy to promote the precipitation of the Co 2 Si compound that contributes most to strengthening and electrical conductivity recovery in the same system. In the present embodiment including elements other than Co and Si, the above compound is formed with Co, Si and other elements, and becomes a compound containing a slightly large amount of Si, so that Co / Si promotes Co 2 Si precipitation. In order to maintain the solid solution state of the ratio, the ratio is such that the amount of Si is slightly increased as compared with a form not including other elements described later. An objective alloy material can be obtained by satisfying the above ratio. Co / Si in this embodiment is preferably 2.5-4, more preferably 3-3.5.
化合物の直径を0.05〜5μmとする理由は、この直径の化合物粒子が打ち抜き加工性を向上させるからである。直径が0.05μm未満の粒子では、打ち抜き加工性を向上させることができず、直径が5μmを超える粒子は化合物による材料強化、プレス性向上の双方への寄与が非常に小さい。好ましくは0.1〜1μmである。 The reason why the diameter of the compound is 0.05 to 5 μm is that the compound particles having this diameter improve the punching processability. Particles having a diameter of less than 0.05 μm cannot improve punching processability, and particles having a diameter of more than 5 μm contribute very little to both material strengthening and pressability improvement by the compound. Preferably it is 0.1-1 micrometer.
化合物の密度を103〜105個/mm2に規定したのは、打ち抜き加工性の向上と材料強度を両立させるからである。103個/mm2未満であると、打ち抜き加工する時の破断のクラックの起点が少ないため、打ち抜き加工性を向上させることができない。105個/mm2を超えると、直径0.05μm未満の化合物と比べ比較的強度に対する寄与の小さい0.05〜5μmの化合物が全体の大きな割合を占め、材料の強度化が出来ず、製品に求められる特性が得られない。好ましくは5×103〜5×104個/mm2である。 The reason why the density of the compound is defined as 10 3 to 10 5 pieces / mm 2 is that the improvement of the punching workability and the material strength are compatible. If it is less than 10 3 pieces / mm 2, the number of cracks at the start of the punching process is small, and therefore the punching processability cannot be improved. If it exceeds 10 5 pieces / mm 2 , the compound of 0.05 to 5 μm, which has a relatively small contribution to the strength compared to the compound of less than 0.05 μm in diameter, occupies a large proportion of the whole, and the material cannot be strengthened, and the product The required characteristics cannot be obtained. Preferably it is 5 * 10 < 3 > -5 * 10 < 4 > piece / mm < 2 >.
本発明の銅合金材の第二の実施形態における組成は、Coを1.4mass%以上2.5mass%以下含有し、CoとSiの含有量の比Co/Siが3.0〜5.0の間にあり、残部がCuおよび不可避的不純物を含むものである。 The composition of the second embodiment of the copper alloy material of the present invention is that Co is contained in an amount of 1.4 mass% to 2.5 mass%, and the Co / Si content ratio Co / Si is 3.0 to 5.0. And the balance contains Cu and inevitable impurities.
この実施形態の銅合金材において、Coの含有量を1.4mass%以上2.5mass%以下とする理由は、打ち抜き加工性を良好にする化合物、強度を良好にする化合物の析出量を双方において適量にするためであり、特に高強度材の要求に応えるためである。Coの含有量を上記範囲内とし、合金材の製造方法における熱処理条件等を制御することで、化合物の晶出、析出を、打ち抜き性が良好で、かつ、高強度材とすることができるような量にすることができる。Coの含有量は好ましくは1.4mass%以上2.0mass%以下である。 In the copper alloy material of this embodiment, the reason why the Co content is 1.4 mass% or more and 2.5 mass% or less is that the precipitation amount of the compound that improves the punching workability and the compound that improves the strength is both This is to make the amount suitable, and particularly to meet the demand for high-strength materials. By making the Co content within the above range and controlling the heat treatment conditions and the like in the manufacturing method of the alloy material, the crystallization and precipitation of the compound can be made into a high-strength material with good punchability. The amount can be made. The content of Co is preferably 1.4 mass% or more and 2.0 mass% or less.
Siの含有量は、少なくとも0.3〜1.0mass%の範囲を満足するようにすることが好ましい。この理由は、Coの添加量と同様に、打ち抜き加工性を良好にする化合物、強度を良好にする化合物の析出量を双方において適量にするためであり、特に高強度材の要求に応えるためである。少なすぎると打ち抜き性、強度双方を良好にするための析出総量を満たせなくなってしまい、どちらか一方の特性が劣化してしまう場合がある。また、多すぎると有効に寄与する化合物の晶出、析出量が飽和してしまうことがある。本実施形態では、CoとSiの質量比、Co/Siが3.0〜5.0となるようにする。 It is preferable that the Si content satisfies at least a range of 0.3 to 1.0 mass%. The reason for this is to make the amount of precipitation of the compound that improves the punching workability and the compound that improves the strength appropriate for both, as well as the amount of Co added, especially to meet the demand for high strength materials. is there. If the amount is too small, the total amount of precipitation for improving both punchability and strength may not be satisfied, and either one of the properties may be deteriorated. On the other hand, if the amount is too large, the amount of crystallization and precipitation of the compound that contributes effectively may be saturated. In the present embodiment, the mass ratio of Co and Si and Co / Si are set to 3.0 to 5.0.
本実施形態では、銅合金中にCo及びSiの化合物を有する。この化合物とは、具体的にはCo2Siである。化合物の直径及び密度は上記他の添加元素を含有する実施形態と同様であり、その好ましい範囲も同様である。
Co/Siは3.0〜5.0とする。このような添加比とする理由は、時効熱処理時に、同系にて強化、導電率の回復に最も寄与するCo2Si化合物の析出を促進しやすいためである。この実施形態におけるCo/Siは好ましくは3.2〜4.5であり、より好ましくは3.5〜4.2である。
In this embodiment, the copper alloy has Co and Si compounds. Specifically, this compound is Co 2 Si. The diameter and density of the compound are the same as those in the embodiment containing the other additive elements, and the preferred ranges thereof are also the same.
Co / Si is set to 3.0 to 5.0. The reason for setting such an addition ratio is that during the aging heat treatment, it is easy to promote precipitation of the Co 2 Si compound that contributes most to strengthening and restoring electrical conductivity in the same system. Co / Si in this embodiment is preferably 3.2 to 4.5, more preferably 3.5 to 4.2.
本発明の銅合金材の第三の実施形態における組成は、Coを0.5mass%以上1.4mass%未満含有し、CoとSiの含有量の比Co/Siが3.0〜5.0の間にあり、残部がCuおよび不可避的不純物を含むものである。 The composition of the third embodiment of the copper alloy material of the present invention contains 0.5 mass% or more and less than 1.4 mass% of Co, and the Co / Si content ratio of Co / Si is 3.0 to 5.0. And the balance contains Cu and inevitable impurities.
この実施形態の銅合金材において、Coの含有量を0.5mass%以上1.4mass%未満とする理由は、打ち抜き加工性を良好にする化合物、強度を良好にする化合物の析出量を双方において適量にするためであり、特に高導電材の要求に応えるためである。Coの含有量を上記範囲内とし、合金材の製造方法における熱処理条件等を制御することで、化合物の晶出、析出を、打ち抜き性が良好で、かつ、高導電材とすることができるような量にすることができる。 In the copper alloy material of this embodiment, the reason why the Co content is 0.5 mass% or more and less than 1.4 mass% is that the precipitation amount of the compound that improves the punching processability and the compound that improves the strength is both This is to make the amount appropriate, and particularly to meet the demand for highly conductive materials. By making the Co content within the above range and controlling the heat treatment conditions and the like in the manufacturing method of the alloy material, the crystallization and precipitation of the compound can be made into a highly conductive material with good punchability. The amount can be made.
Siの含有量は、少なくとも0.1〜0.5mass%の範囲を満足するようにすることが好ましい。この理由は、打ち抜き加工性を良好にする化合物、強度を良好にする化合物の析出量を双方において適量にするためであり、特に高導電材の要求に応えるためである。少なすぎると打ち抜き性、強度双方を良好にするための析出総量を満たせなくなってしまい、どちらか一方の特性が劣化してしまう場合がある。また、多すぎると高導電を維持できない場合がある。 It is preferable that the Si content satisfies at least a range of 0.1 to 0.5 mass%. The reason for this is to make the amount of precipitation of the compound that improves the punching processability and the compound that improves the strength appropriate in both cases, and in particular, to meet the demand for a highly conductive material. If the amount is too small, the total amount of precipitation for improving both punchability and strength may not be satisfied, and either one of the properties may be deteriorated. Moreover, when there is too much, high conductivity may not be able to be maintained.
本実施形態においても、銅合金中にCo及びSiの化合物を有する。この化合物の種類、直径及び密度は上記実施形態と同様であり、その好ましい範囲も同様である。
Co/Siは上記実施態様と同様に3.0〜5.0とする。好ましい範囲も同様である。
Also in this embodiment, the copper alloy has Co and Si compounds. The type, diameter, and density of this compound are the same as those in the above embodiment, and the preferred range is also the same.
Co / Si is set to 3.0 to 5.0 as in the above embodiment. The preferable range is also the same.
本発明の銅合金材は、上記のCo、Si及び他の添加元素のほかに、さらにSn、Zn及びMgからなる群から選ばれる少なくとも1種を含有する組成であってもよい。これらの元素の添加量は合計で0.01〜1mass%、好ましくは0.05〜0.7mass%であり、より好ましくは0.1〜0.5mass%である。これらの元素を添加することにより、母材の固溶強化と圧延時の加工硬化量の増大の効果が得られる。
この銅合金材においても、銅合金中にCo及び他の添加元素(Cr、Fe、Ni、Al、Nb、Ti、V、Zr)から選ばれる少なくとも1種の元素とSiからなる化合物を有する。この化合物の種類、直径及び密度は上記実施形態と同様であり、その好ましい範囲も同様である。
The copper alloy material of the present invention may have a composition containing at least one selected from the group consisting of Sn, Zn and Mg in addition to the above Co, Si and other additive elements. The total amount of these elements added is 0.01 to 1 mass%, preferably 0.05 to 0.7 mass%, more preferably 0.1 to 0.5 mass%. By adding these elements, effects of solid solution strengthening of the base material and an increase in work hardening amount during rolling can be obtained.
Also in this copper alloy material, the copper alloy has a compound made of Si and at least one element selected from Co and other additive elements (Cr, Fe, Ni, Al, Nb, Ti, V, Zr). The type, diameter, and density of this compound are the same as those in the above embodiment, and the preferred range is also the same.
本発明の銅合金材は、鋳造時の冷却速度が1〜30℃/秒、好ましくは3〜25℃/秒の条件下で作製された鋳塊を均質処理後、冷間圧延と中間焼鈍を繰り返した後、仕上げ圧延、歪取り焼鈍を施すことにより製造することができる。
本発明の銅合金材の製造方法の好ましい実施形態の一例を挙げると、CoとSiと、実施形態によってはその他の添加元素と、残部がCuからなる合金を高周波溶解炉等により溶解して鋳造の冷却速度を1〜30℃/秒の条件で鋳造し、鋳塊を得る。この条件により直径0.05〜5μmサイズの上記化合物を103〜105個/mm2含有する組織制御をすることができる。その後、例えば、熱間圧延によって厚さ8〜15mmになるまで加工後、速やかに水冷却(急速冷却)にて焼入れを施し、表面上の酸化皮膜除去のため、圧延された表面を片側0.5〜2mm面削して4〜13mmにした後、冷間圧延にて厚さ約0.1〜0.3mmとなるように加工する。さらに溶体化熱処理(好ましくは温度800〜1025℃、1〜100秒間)を加え、水冷後、材料に300〜600℃で1〜10時間の時効熱処理を行う。この熱処理後0〜30%の圧延を加え、さらに200〜450℃で0.5〜5時間の低温熱処理を行うことにより目的の銅合金材を得ることができる。
The copper alloy material of the present invention is subjected to cold rolling and intermediate annealing after homogenizing an ingot produced at a casting rate of 1 to 30 ° C./second, preferably 3 to 25 ° C./second. After repeating, it can manufacture by performing finish rolling and strain relief annealing.
An example of a preferred embodiment of the method for producing a copper alloy material of the present invention is as follows. Co and Si, in some embodiments, other additive elements, and an alloy composed of Cu as the balance are melted and cast using a high-frequency melting furnace or the like. Is cast at a cooling rate of 1 to 30 ° C./second to obtain an ingot. Under these conditions, it is possible to control the tissue containing 10 3 to 10 5 / mm 2 of the above compound having a diameter of 0.05 to 5 μm. Then, for example, after processing to a thickness of 8 to 15 mm by hot rolling, quenching is quickly performed by water cooling (rapid cooling), and the rolled surface is removed on one side to remove the oxide film on the surface. After 5-5 mm chamfering to 4-13 mm, it is processed by cold rolling to a thickness of about 0.1-0.3 mm. Further, a solution heat treatment (preferably at a temperature of 800 to 1025 ° C. for 1 to 100 seconds) is added, and after water cooling, the material is subjected to an aging heat treatment at 300 to 600 ° C. for 1 to 10 hours. The target copper alloy material can be obtained by adding 0-30% rolling after this heat treatment and further performing low-temperature heat treatment at 200-450 ° C. for 0.5-5 hours.
上記第三の実施形態の組成に該当する場合は、上記の製造方法とは別に、鋳造鋳塊を均質処理、熱間圧延後、冷間圧延と中間焼鈍を繰り返す工程を有し、以下の(A)または(B)の条件を有する熱処理を加え、更にその後時効熱処理、仕上げ圧延、歪取り焼鈍を施す製造方法も好ましい。
(A)熱間圧延終了後の冷却時、600℃までの降温速度を1℃/秒以上30℃/秒以下とし、溶体化熱処理する際、600℃以上での昇温速度および600℃までの降温速度を30℃/秒以上とする。
(B)熱間圧延終了後の冷却時、600℃までの降温速度を30℃/秒以上とし、溶体化熱処理する際、600℃以上での昇温速度および600℃までの降温速度を1℃/秒以上30℃/秒以下とする。
なお、熱間圧延終了後の冷却時、600℃までの降温速度を30℃/秒とし、溶体化熱処理する際、600℃以上での昇温速度および600℃までの降温速度を30℃/秒とする工程は、(A)および(B)の両方の条件を満足するが、これも(A)または(B)の条件を有する熱処理を加えているものとして取り扱う。
また、上記(A)または(B)の工程のほか、以下の(C)〜(E)のいずれかの条件を有する熱処理を施し、更にその後時効熱処理、仕上げ圧延、歪取り焼鈍を施す製造方法も好ましい。
(C)熱間圧延工程と冷間圧延工程との間に、熱処理工程を新たに設け、600〜750℃にて50〜600秒間保持を行い、その後急冷する。
(D)冷間圧延工程で材料を0.05〜0.5mmにした後、溶体化熱処理工程の前に、熱処理工程を新たに設け、600〜750℃にて50〜600秒間保持を行い、その後急冷する。
(E)溶体化熱処理工程と時効熱処理工程との間に、熱処理工程を新たに設け、600〜750℃にて50〜600秒間保持を行い、その後急冷する。
なお、上記(C)〜(E)の処理における「急冷」は好ましくは50℃/秒以上で行う。また、処理(A)及び(B)における溶体化熱処理は温度800〜1025℃の温度範囲で1〜100秒間保持して行うのが好ましい。溶体化は析出、晶出物(化合物)を固溶状態にする処理であるが、前記温度で溶体化を行うと、同じ熱処理工程で再結晶熱処理(結晶粒径を制御する処理)も行える。
ここで、上記(A)〜(E)の処理条件において、(A)、(B)での熱間圧延終了後の冷却時の600℃までの降温速度、溶体化熱処理する際の600℃以上での昇温速度および600℃までの降温速度を1(℃/秒)未満に変えた処理、あるいは、(C)〜(E)の保持時間を600秒より長くした処理を行った場合、他の工程にて熱処理条件を満たしても強度が不十分となる場合があり、目的の銅合金材は得られない。
一方、上記(A)〜(E)の処理条件において、(C)〜(E)の保持時間に関しては50秒未満に変えた処理を行った場合は、仮にこの熱処理を一度施しても、上記(A)〜(E)の他の熱処理条件を一つ、上記(A)〜(E)の処理条件の範囲内で施せば目的の銅合金材が得られる。
すなわち、上記各熱処理の工程において、上記(A)〜(E)の所定範囲より冷却速度が遅いか、または保持時間が長い熱処理を行った場合、その他の工程で上記(A)〜(E)に記載の条件を満たしてもリカバリーできず目的の銅合金材が得られないが、所定範囲より冷却速度が速いか、または保持時間が短い熱処理を行った場合には、他の工程を所定範囲の条件で施すことによって、結晶粒径が適切な範囲となり、目的の銅合金材が得られる。
When it corresponds to the composition of the third embodiment, separately from the above manufacturing method, the casting ingot is subjected to a homogenization treatment, a hot rolling, and then a step of repeating cold rolling and intermediate annealing, and the following ( A production method in which a heat treatment having the conditions of A) or (B) is added, followed by aging heat treatment, finish rolling, and strain relief annealing is also preferable.
(A) When cooling after completion of hot rolling, the rate of temperature decrease to 600 ° C. is set to 1 ° C./second or more and 30 ° C./second or less, and when performing solution heat treatment, the temperature increase rate at 600 ° C. or more and up to 600 ° C. The cooling rate is set to 30 ° C./second or more.
(B) When cooling after the end of hot rolling, the rate of temperature decrease to 600 ° C. is set to 30 ° C./second or more, and the temperature increasing rate at 600 ° C. or higher and the temperature decreasing rate to 600 ° C. are set to 1 ° C. / Second to 30 ° C./second.
In cooling after the end of hot rolling, the rate of temperature decrease to 600 ° C. is set to 30 ° C./second, and when the solution heat treatment is performed, the temperature increase rate at 600 ° C. or higher and the temperature decrease rate to 600 ° C. are set to 30 ° C./second. The process to satisfy the conditions of both (A) and (B), but this is also treated as a heat treatment having the conditions of (A) or (B).
In addition to the step (A) or (B) described above, a production method in which a heat treatment having any one of the following conditions (C) to (E) is performed, followed by aging heat treatment, finish rolling, and strain relief annealing Is also preferable.
(C) A heat treatment step is newly provided between the hot rolling step and the cold rolling step, held at 600 to 750 ° C. for 50 to 600 seconds, and then rapidly cooled.
(D) After making the material 0.05 to 0.5 mm in the cold rolling process, before the solution heat treatment process, a new heat treatment process is provided and held at 600 to 750 ° C. for 50 to 600 seconds, Then cool quickly.
(E) A heat treatment step is newly provided between the solution heat treatment step and the aging heat treatment step, held at 600 to 750 ° C. for 50 to 600 seconds, and then rapidly cooled.
The “rapid cooling” in the above processes (C) to (E) is preferably performed at 50 ° C./second or more. In addition, the solution heat treatment in the treatments (A) and (B) is preferably carried out by holding for 1 to 100 seconds in a temperature range of 800 to 1025 ° C. The solution treatment is a treatment for precipitating and crystallizing (compound) into a solid solution state. When solution treatment is performed at the above temperature, recrystallization heat treatment (treatment for controlling the crystal grain size) can be performed in the same heat treatment step.
Here, in the above processing conditions (A) to (E), the cooling rate after cooling at the end of hot rolling in (A) and (B) to 600 ° C., 600 ° C. or higher during solution heat treatment When the processing in which the temperature rising rate at 600 ° C. and the temperature decreasing rate to 600 ° C. are changed to less than 1 (° C./second) or the processing in which the holding time of (C) to (E) is longer than 600 seconds is performed, etc. Even if the heat treatment conditions are satisfied in this step, the strength may be insufficient, and the target copper alloy material cannot be obtained.
On the other hand, in the processing conditions of (A) to (E) above, when the processing changed to less than 50 seconds for the holding time of (C) to (E), even if this heat treatment is performed once, If one of the other heat treatment conditions (A) to (E) is applied within the range of the above treatment conditions (A) to (E), the intended copper alloy material can be obtained.
That is, in each of the heat treatment steps, when a heat treatment having a cooling rate slower than the predetermined range of (A) to (E) or a longer holding time is performed, the other steps (A) to (E) are performed. Although the target copper alloy material cannot be recovered even if the conditions described in (2) are satisfied, the heat treatment is performed at a faster cooling rate or shorter holding time than the predetermined range. By applying under the conditions, the crystal grain size is in an appropriate range, and the target copper alloy material is obtained.
本発明の銅合金材は、特に限定されるものではないが、例えば、コネクタ、端子、リレー、スイッチ、さらにはリードフレームなどの電子電気機器部品に好適に用いることができる。 Although the copper alloy material of this invention is not specifically limited, For example, it can use suitably for electronic electrical equipment components, such as a connector, a terminal, a relay, a switch, and also a lead frame.
以下に、本発明を実施例に基づきさらに詳細に説明するが、本発明はそれらに限定されるものではない。 Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited thereto.
下記表1、表2、表3−1、表3−2に示す銅合金材を以下のように作製した。表1は本発明の効果を確認するための参考例での評価結果を示すものであり、この参考例で良好な特性を示すサンプルの組成について、表2および表3−1、表3−2に示す各種評価を行っている。表2は第一の実施態様および第二の実施態様に関する評価結果であり、表3−1、表3−2は第三の実施態様に関する評価結果である。 The copper alloy materials shown in Table 1, Table 2, Table 3-1, and Table 3-2 were prepared as follows. Table 1 shows the evaluation results in a reference example for confirming the effect of the present invention. The compositions of samples showing good characteristics in this reference example are shown in Table 2, Table 3-1, Table 3-2. Various evaluations are performed. Table 2 shows the evaluation results regarding the first embodiment and the second embodiment, and Tables 3-1 and 3-2 show the evaluation results regarding the third embodiment.
(合金材の製造条件)
各表に記載する量のCoとSiとその他の添加元素と残部がCuからなる合金を高周波溶解炉により溶解し、これを鋳造して、厚さ30mm、幅100mm、長さ150mmの鋳塊を得た。鋳造時の冷却速度については、表1の各サンプルについては5℃/秒とし、表2〜表3−1、表3−2の各サンプルについては表2および表3−1、表3−2に示した。各サンプルにおいては、冷却速度の速いサンプルは厚さ5mmにて、遅いサンプルにおいては厚さ100mmにし、モールドに断熱材を使用するなどして、冷却速度を変えた。
(Production conditions for alloy materials)
An alloy consisting of Co, Si, other additive elements and the balance Cu in the amounts shown in each table is melted in a high-frequency melting furnace, and this is cast to form an ingot having a thickness of 30 mm, a width of 100 mm, and a length of 150 mm. Obtained. About the cooling rate at the time of casting, it was set as 5 degree-C / sec about each sample of Table 1, and about each sample of Table 2-Table 3-1, Table 3-2, Table 2, Table 3-1, Table 3-2 It was shown to. In each sample, the sample having a fast cooling rate was 5 mm in thickness, the sample having a slow cooling rate was 100 mm, and the cooling rate was changed by using a heat insulating material for the mold.
次にこの鋳塊に950℃で1時間加熱する均質化処理を施した直後に熱間圧延を行い(600℃までの降温速度は30℃/秒)、両面をそれぞれ1mm面削して酸化皮膜を除去した。次いで冷間圧延にて板厚を0.1〜0.3mmにした後、不活性化ガス雰囲気中で溶体化熱処理(1000℃到達、昇温、降温速度とも50℃/秒)を行った。 Next, this ingot was hot-rolled immediately after being subjected to a homogenization treatment at 950 ° C. for 1 hour (the temperature decreasing rate up to 600 ° C. was 30 ° C./second), and both sides were each 1 mm chamfered to form an oxide film. Was removed. Next, the plate thickness was reduced to 0.1 to 0.3 mm by cold rolling, and then solution heat treatment (reaching 1000 ° C., both heating and cooling rates were 50 ° C./second) was performed in an inert gas atmosphere.
水冷後、材料に時効熱処理(475〜575℃、2時間で最も強度の高い温度を選定)を行った。この熱処理後0〜30%の圧延を加え、さらに200〜450℃で0.5〜5時間の低温熱処理(歪取り焼鈍)を行った。 After water cooling, the material was subjected to an aging heat treatment (select the temperature having the highest strength in 2 hours at 475 to 575 ° C). 0-30% rolling was added after this heat treatment, and further low-temperature heat treatment (strain relief annealing) was performed at 200-450 ° C. for 0.5-5 hours.
表3−1、表3−2に示される第三の実施態様中の実施例、比較例においてはさらに以下の条件を課して合金材を製造した。(表3−1、表3−2において「−」で示される欄については、該当する熱処理を行っていないことを示す。)
条件(1) 上記熱間圧延後の600℃以上での昇温速度及び600℃までの降温速度を表に示した速度とした。
条件(2) 上記熱間圧延後に表に示した温度、保持時間の熱処理を行って急冷(降温速度100℃/秒)した。
条件(3) 上記冷間圧延後に表に示した温度、保持時間の熱処理を行って急冷(降温速度100℃/秒)した。
条件(4) 上記溶体化熱処理する際の600℃以上での昇温速度及び600℃までの降温速度を表に示した速度とした。
条件(5) 上記溶体化熱処理と時効熱処理の間に表に示した温度、保持時間の熱処理を行って急冷(降温速度100℃/秒)した。
In the examples and comparative examples in the third embodiment shown in Tables 3-1 and 3-2, the following conditions were further imposed to produce alloy materials. (In Tables 3-1 and 3-2, the column indicated by “-” indicates that the corresponding heat treatment is not performed.)
Condition (1) The temperature increase rate at 600 ° C. or higher after the hot rolling and the temperature decrease rate to 600 ° C. are shown in the table.
Condition (2) After the hot rolling, a heat treatment was performed at the temperature and holding time shown in the table to rapidly cool (temperature decrease rate: 100 ° C./second).
Condition (3) After the cold rolling, a heat treatment was performed at the temperature and holding time shown in the table to rapidly cool (temperature decrease rate: 100 ° C./second).
Condition (4) The heating rate at 600 ° C. or higher and the cooling rate to 600 ° C. during the solution heat treatment were set as shown in the table.
Condition (5) The solution was heat-treated at the temperature and holding time shown in the table between the solution heat treatment and the aging heat treatment and rapidly cooled (temperature decrease rate: 100 ° C./second).
このようにして得られた各々の板材を供試材として下記の特性調査を行った。各評価項目の測定方法は以下の通りである。
a.引張強度(TS、YS):
試験片の圧延平行方向から切り出したJIS Z2201−13B号の試験片をJIS Z2241に準じて3本測定しその平均値を表1に示した。また、評価として表1に示される特性に対し、表2、表3−1、表3−2における同じ組成の合金の強度(引張強度(TS)、0.2%耐力(YS)共に)の低下が30MPa未満なら製品に求められる強度を満たすとして○、30MPa以上なら満たさないとして×と評価し、表2、表3−1、表3−2に示した。なお、表1において、引張強度(TS)が550MPa以上、0.2%耐力(YS)が400MPa以上である組成について、表2、表3−1、表3−2に記載の条件で合金材を製造し、評価対象とすることとした。
b.導電率(EC)測定:
四端子法を用いて、20℃(±1℃)に管理された恒温槽中で、各試験片の2本について導電率(EC)を測定し、その平均値(%IACS)を表1に示した。このとき端子間距離は100mmとした。なお、評価基準として、導電率(EC)が57%IACS以上であるものを、導電性がすぐれているものとした。
c.プレス打ち抜き加工性
金型を研磨した後に、各サンプルで連続プレス加工を実施し、10万回おきにサンプルプレス破面のバリ測定をした。材料のプレス破面に5μmを越えるバリが発生した段階を限界ショット数として、ショット数200万回を満たすものを打ち抜き性が特に優れているとして◎、100万回以上200万回未満のものを打ち抜き性が良好であるとして○、100万回未満のものを打ち抜き性が劣っているとして×として表2、表3−1、表3−2中に記載した。
The following characteristic investigation was performed by using each plate material thus obtained as a test material. The measurement method for each evaluation item is as follows.
a. Tensile strength (TS, YS):
Three test pieces of JIS Z2201-13B cut out from the rolling parallel direction of the test pieces were measured according to JIS Z2241, and the average values are shown in Table 1. Moreover, with respect to the characteristics shown in Table 1 as evaluation, the strengths of the alloys having the same composition in Table 2, Table 3-1, and Table 3-2 (both tensile strength (TS) and 0.2% proof stress (YS)) When the decrease was less than 30 MPa, the strength required for the product was satisfied, and when it was 30 MPa or more, it was evaluated as ×, and the results were shown in Table 2, Table 3-1, and Table 3-2. In Table 1, for the compositions having a tensile strength (TS) of 550 MPa or more and a 0.2% proof stress (YS) of 400 MPa or more, alloy materials under the conditions described in Table 2, Table 3-1, and Table 3-2. Were manufactured and evaluated.
b. Conductivity (EC) measurement:
Using a four-terminal method, conductivity (EC) was measured for two of each test piece in a thermostat controlled at 20 ° C. (± 1 ° C.), and the average value (% IACS) is shown in Table 1. Indicated. At this time, the distance between terminals was set to 100 mm. Note that, as an evaluation standard, one having an electrical conductivity (EC) of 57% IACS or more is considered to have excellent conductivity.
c. Press punching process After polishing the mold, each sample was subjected to continuous pressing, and the burr on the fracture surface of the sample press was measured every 100,000 times. A stage where a burr exceeding 5 μm is generated on the press fracture surface of the material is considered to be particularly excellent in punching performance that satisfies the number of shots of 2 million shots, ◎, those of 1 million times to less than 2 million times The results are shown in Table 2, Table 3-1, and Table 3-2 as ○ when the punching property is good, and as × when the punching property is inferior when the punching property is less than 1 million times.
なお、晶出、析出物(化合物)の比は、直径0.05〜5μmの晶出、析出物をSEM付属のEDXにて10個測定し構成元素を判断し、定量測定にて平均値をとった(化合物種類が複数あれば、全て列記した)。
直径0.05〜5μmの化合物の1mm2あたりの個数は、400μm2の面積内に存在するサイズ該当化合物を、測定場所を10回変えてカウントし、その平均値を2500倍した結果を示した。
The ratio of crystallization and precipitates (compounds) was determined by measuring 10 crystallization and precipitates having a diameter of 0.05 to 5 μm with the EDX attached to the SEM, determining the constituent elements, and calculating the average value by quantitative measurement. (If there are multiple types of compounds, all are listed).
The number per 1 mm 2 of the compound having a diameter of 0.05 to 5 μm is the result of counting the size corresponding compound existing in the area of 400 μm 2 by changing the measurement place 10 times and multiplying the average value by 2500 times. .
参考例
表1に示す組成の銅合金材(第一の実施態様の組成:試験No.101〜108、第二の実施態様の組成:試験No.109〜113、第三の実施態様の組成:試験No.114〜115、比較組成:試験No.151〜168)を上記のようにして作製し、引張強度(TS、YS)及び導電性(EC)を測定した。結果を表1に併せて示す。比較組成の銅合金材は、強度、導電率のいずれかもしくは両方が試験No.101〜115に対し低下している。詳しくは以下の通りである。
比較組成の試験No.151〜162は、CoとSiの添加比が本発明で規定する範囲に入っていない。試験No.101〜115に対し強度、または導電率のいずれかもしくは両方が劣っている。また、試験No.163〜168はその他の添加元素の添加量が多すぎるため、試験No.101〜115に対し強度、または導電率のいずれかもしくは両方が劣っている。
これに対し、試験No.101〜115はいずれも、強度、導電率ともに良好であった。
なお、晶出物、析出物(化合物)が与える影響については、添加元素についてCoまたはSiと化合物をつくると、強度に寄与するCo2Si化合物の全体量が減ってしまう。また、添加元素とCo−Siの組成比がCo2Siと異なるため、CoやSiの添加量を調整して強度に寄与するCo2Si化合物の全体量を確保しなければ特性値が劣化してしまう傾向がある。
Reference Example Copper alloy material having the composition shown in Table 1 (Composition of the first embodiment: Test No. 101 to 108, Composition of the second embodiment: Test No. 109 to 113, Composition of the third embodiment: Test Nos. 114 to 115 and comparative compositions: Test Nos. 151 to 168) were produced as described above, and tensile strength (TS, YS) and conductivity (EC) were measured. The results are also shown in Table 1. The copper alloy material of the comparative composition has a test number of either or both of strength and conductivity. It has fallen with respect to 101-115. Details are as follows.
Comparative composition test no. In 151 to 162, the addition ratio of Co and Si is not within the range defined by the present invention. Test No. Either 101 or 115 is inferior in strength, conductivity, or both. In addition, Test No. Since Nos. 163 to 168 have too much addition amount of other additive elements, Test No. Either 101 or 115 is inferior in strength, conductivity, or both.
In contrast, test no. 101 to 115 were all good in strength and conductivity.
Regarding the influence of crystallized substances and precipitates (compounds), if a compound of Co or Si is made for the additive element, the total amount of Co 2 Si compound that contributes to the strength is reduced. Further, since the composition ratio of the additive element and Co—Si is different from that of Co 2 Si, the characteristic value deteriorates unless the total amount of the Co 2 Si compound contributing to the strength is secured by adjusting the addition amount of Co or Si. There is a tendency to end up.
実施例1
表2に示す組成で、上記のようにして得た合金材サンプルについて、プレス性と強度を評価した。結果を表2に示す。表2は第一の実施態様および第二の実施態様に関する評価結果であり、鋳造速度が1〜30℃/秒の範囲内であれば、Co−Si系化合物の直径と密度がコントロールされ、プレス打ち抜き加工性と強度のバランスの取れた合金材が得られている。鋳造速度が遅すぎる場合は所望のサイズのCo−Si系化合物が多くなりすぎ、強度低下している。また、鋳造速度が速すぎる場合は所望のサイズのCo−Si系化合物が少なすぎ、プレス打ち抜き加工性が低下している。なお、選択元素(Cr、Fe、Ni、Al、Nb、Ti、V、Zr)を含まない場合で、化合物が適正に生成していない場合は、プレス打ち抜き加工性が低下している。
Example 1
With the compositions shown in Table 2, the pressability and strength of the alloy material samples obtained as described above were evaluated. The results are shown in Table 2. Table 2 shows the evaluation results regarding the first embodiment and the second embodiment. When the casting speed is in the range of 1 to 30 ° C./second, the diameter and density of the Co—Si based compound are controlled, and the press Alloy materials with a balance of punching workability and strength have been obtained. When the casting speed is too slow, the desired size of the Co—Si-based compound is too much and the strength is reduced. In addition, when the casting speed is too high, there are too few Co-Si compounds of a desired size, and the press punching processability is lowered. In the case where the selective element (Cr, Fe, Ni, Al, Nb, Ti, V, Zr) is not included and the compound is not properly generated, the press punching processability is lowered.
実施例2及び比較例
表3−1、表3−2に示す組成の合金について、上記のようにして得た合金材サンプルについて、プレス性と強度を評価した。
表3−2に示す比較例の合金材は、強度及び打ち抜き性の両方または一方が×の評価であるのに対し、表3−1に示す本発明例の合金材はいずれも強度と打ち抜き性を両立している。
表3−2に示す比較例については、本発明の合金材の製造方法における(A)〜(E)の要件をいずれも満たしていないため、目的とする合金材が得られていない。
冷却速度が遅い、熱処理時間が長い、あるいは熱処理温度が高いほうに外れたサンプルについては強度に寄与する化合物が粗大化し、プレス性は良好であるが強度に乏しい特性となっている。加熱が更に過ぎると、プレス性に有効な範囲以上のサイズの化合物数が増えすぎ、強度、プレス性双方の特性に乏しくなる。
また、逆に冷却速度が速い、熱処理時間が短い、あるいは熱処理温度が低い方に外れたサンプルについては加熱が少なく、規定の化合物密度、サイズまで化合物が成長せず、強度には寄与するがプレス性には寄与しない化合物が増え、強度は良好であるが、プレス性に乏しい特性となっている。
Example 2 and Comparative Example For the alloys having the compositions shown in Tables 3-1 and 3-2, the pressability and strength of the alloy material samples obtained as described above were evaluated.
The alloy material of the comparative example shown in Table 3-2 has an evaluation of x for both strength and punchability, whereas the alloy material of the present invention example shown in Table 3-1 has both strength and punchability. Are compatible.
About the comparative example shown to Table 3-2, since none of the requirements of (A)-(E) in the manufacturing method of the alloy material of this invention is satisfy | filled, the target alloy material is not obtained.
For samples with a slow cooling rate, a long heat treatment time, or a higher heat treatment temperature, the compound contributing to the strength becomes coarser, and the pressability is good but the strength is poor. If the heating is further excessive, the number of compounds having a size larger than the range effective for pressability will increase, resulting in poor strength and pressability characteristics.
Conversely, for samples with a fast cooling rate, a short heat treatment time, or a heat treatment temperature deviating to a lower temperature, there is little heating, the compound does not grow to the specified compound density and size, and it contributes to the strength, but the press The number of compounds that do not contribute to the properties increases, and the strength is good, but the press properties are poor.
Claims (7)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009182794A JP5748945B2 (en) | 2009-07-30 | 2009-08-05 | Copper alloy material manufacturing method and copper alloy material obtained thereby |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009178477 | 2009-07-30 | ||
| JP2009178477 | 2009-07-30 | ||
| JP2009182794A JP5748945B2 (en) | 2009-07-30 | 2009-08-05 | Copper alloy material manufacturing method and copper alloy material obtained thereby |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011046970A true JP2011046970A (en) | 2011-03-10 |
| JP5748945B2 JP5748945B2 (en) | 2015-07-15 |
Family
ID=43833592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009182794A Active JP5748945B2 (en) | 2009-07-30 | 2009-08-05 | Copper alloy material manufacturing method and copper alloy material obtained thereby |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5748945B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012224898A (en) * | 2011-04-18 | 2012-11-15 | Jx Nippon Mining & Metals Corp | Cu-Ni-Si BASED ALLOY AND Cu-Co-Si BASED ALLOY FOR ELECTRONIC MATERIAL, AND METHOD OF MANUFACTURING THE SAME |
| CN110205515A (en) * | 2019-04-15 | 2019-09-06 | 深圳万佳互动科技有限公司 | A kind of preparation method of corrosion-resistant Cu-Ni alloy |
| JP2019178393A (en) * | 2018-03-30 | 2019-10-17 | Jx金属株式会社 | Copper alloy material, electronic component, electronic device, and manufacturing method of copper alloy material |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008056977A (en) * | 2006-08-30 | 2008-03-13 | Mitsubishi Electric Corp | Copper alloy and manufacturing method thereof |
| JP2008266787A (en) * | 2007-03-28 | 2008-11-06 | Furukawa Electric Co Ltd:The | Copper alloy material and method for producing the same |
| WO2009057697A1 (en) * | 2007-11-01 | 2009-05-07 | The Furukawa Electric Co., Ltd. | Conductor material for electronic device and electric wire for wiring using the same |
-
2009
- 2009-08-05 JP JP2009182794A patent/JP5748945B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008056977A (en) * | 2006-08-30 | 2008-03-13 | Mitsubishi Electric Corp | Copper alloy and manufacturing method thereof |
| JP2008266787A (en) * | 2007-03-28 | 2008-11-06 | Furukawa Electric Co Ltd:The | Copper alloy material and method for producing the same |
| WO2009057697A1 (en) * | 2007-11-01 | 2009-05-07 | The Furukawa Electric Co., Ltd. | Conductor material for electronic device and electric wire for wiring using the same |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012224898A (en) * | 2011-04-18 | 2012-11-15 | Jx Nippon Mining & Metals Corp | Cu-Ni-Si BASED ALLOY AND Cu-Co-Si BASED ALLOY FOR ELECTRONIC MATERIAL, AND METHOD OF MANUFACTURING THE SAME |
| JP2019178393A (en) * | 2018-03-30 | 2019-10-17 | Jx金属株式会社 | Copper alloy material, electronic component, electronic device, and manufacturing method of copper alloy material |
| CN110205515A (en) * | 2019-04-15 | 2019-09-06 | 深圳万佳互动科技有限公司 | A kind of preparation method of corrosion-resistant Cu-Ni alloy |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5748945B2 (en) | 2015-07-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5647703B2 (en) | High-strength Cu-Ni-Co-Si-based copper alloy sheet, its manufacturing method, and current-carrying parts | |
| KR101161597B1 (en) | Cu-ni-si-co-base copper alloy for electronic material and process for producing the copper alloy | |
| CN100510131C (en) | Copper alloy plate for electric and electronic parts having bending workability | |
| JP6385382B2 (en) | Copper alloy sheet and method for producing copper alloy sheet | |
| JP2002180165A (en) | Copper base alloy excellent in press punching property and method for producing the same | |
| JP2004225093A (en) | Copper-based alloy and method for producing the same | |
| TWI429768B (en) | Cu-Co-Si based copper alloy for electronic materials and method for producing the same | |
| JP2009242926A (en) | Copper-nickel-silicon based alloy for electronic material | |
| WO2015022837A1 (en) | Copper alloy for electronic/electrical devices, copper alloy thin plate for electronic/electrical devices, component for electronic/electrical devices, terminal and bus bar | |
| TWI429764B (en) | Cu-Co-Si alloy for electronic materials | |
| JP2012162776A (en) | Copper alloy plate and method for manufacturing the same | |
| JP2010059543A (en) | Copper alloy material | |
| JP4620173B1 (en) | Cu-Co-Si alloy material | |
| JP6355672B2 (en) | Cu-Ni-Si based copper alloy and method for producing the same | |
| JP3962751B2 (en) | Copper alloy sheet for electric and electronic parts with bending workability | |
| JP5560475B2 (en) | Copper alloys for electronic and electrical equipment, electronic and electrical equipment parts and terminals | |
| JP2021088738A (en) | Copper alloy for electronic material, electronic component and manufacturing method for copper alloy for electronic material | |
| JP6730784B2 (en) | Cu-Ni-Co-Si alloy for electronic parts | |
| JP5261691B2 (en) | Copper-base alloy with excellent press punchability and method for producing the same | |
| JP5555154B2 (en) | Copper alloy for electrical and electronic parts and method for producing the same | |
| JPH10195562A (en) | Copper alloy for electrical and electronic equipment excellent in punching workability and method for producing the same | |
| JP2006161148A (en) | Copper alloy | |
| JP5748945B2 (en) | Copper alloy material manufacturing method and copper alloy material obtained thereby | |
| JP5017719B2 (en) | Copper-based alloy plate excellent in press workability and method for producing the same | |
| JP2012229467A (en) | Cu-Ni-Si BASED COPPER ALLOY FOR ELECTRONIC MATERIAL |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120601 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131029 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131126 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140127 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140130 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20140916 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20141119 Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20141119 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20141127 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150127 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150327 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20150421 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150513 |
|
| R151 | Written notification of patent or utility model registration |
Ref document number: 5748945 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |