JP2010215785A - Heat-resistant polyamideimide resin and seamless tubular body, coating film, coating film plate, and heat-resistant coating material using the same - Google Patents
Heat-resistant polyamideimide resin and seamless tubular body, coating film, coating film plate, and heat-resistant coating material using the same Download PDFInfo
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- JP2010215785A JP2010215785A JP2009064227A JP2009064227A JP2010215785A JP 2010215785 A JP2010215785 A JP 2010215785A JP 2009064227 A JP2009064227 A JP 2009064227A JP 2009064227 A JP2009064227 A JP 2009064227A JP 2010215785 A JP2010215785 A JP 2010215785A
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- Prior art keywords
- heat
- resistant
- coating film
- component
- imide
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- 239000011347 resin Substances 0.000 title claims abstract description 59
- 229920005989 resin Polymers 0.000 title claims abstract description 59
- 238000000576 coating method Methods 0.000 title claims abstract description 50
- 239000004962 Polyamide-imide Substances 0.000 title claims abstract description 48
- 229920002312 polyamide-imide Polymers 0.000 title claims abstract description 48
- 239000011248 coating agent Substances 0.000 title claims abstract description 45
- 239000000463 material Substances 0.000 title abstract description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims abstract description 13
- 125000003118 aryl group Chemical group 0.000 claims abstract description 11
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 11
- 239000005056 polyisocyanate Substances 0.000 claims abstract description 11
- 229920001228 polyisocyanate Polymers 0.000 claims abstract description 11
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 9
- 125000004018 acid anhydride group Chemical group 0.000 claims abstract description 5
- 239000002798 polar solvent Substances 0.000 claims abstract description 4
- 239000003973 paint Substances 0.000 claims description 10
- 150000003949 imides Chemical class 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 6
- 239000004952 Polyamide Substances 0.000 claims 1
- 150000008064 anhydrides Chemical class 0.000 claims 1
- 230000037237 body shape Effects 0.000 claims 1
- 229920002647 polyamide Polymers 0.000 claims 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 38
- 239000002253 acid Substances 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 16
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 11
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- QGMGHALXLXKCBD-UHFFFAOYSA-N 4-amino-n-(2-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1C(=O)NC1=CC=CC=C1N QGMGHALXLXKCBD-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000001569 carbon dioxide Substances 0.000 description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 239000009719 polyimide resin Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- -1 aromatic tricarboxylic acid Chemical class 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- HFPZCAJZSCWRBC-UHFFFAOYSA-N p-cymene Chemical compound CC(C)C1=CC=C(C)C=C1 HFPZCAJZSCWRBC-UHFFFAOYSA-N 0.000 description 4
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 4
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005187 foaming Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000009864 tensile test Methods 0.000 description 3
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- 239000003759 ester based solvent Substances 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 239000005453 ketone based solvent Substances 0.000 description 2
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- GGAUUQHSCNMCAU-ZXZARUISSA-N (2s,3r)-butane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C[C@H](C(O)=O)[C@H](C(O)=O)CC(O)=O GGAUUQHSCNMCAU-ZXZARUISSA-N 0.000 description 1
- OHLKMGYGBHFODF-UHFFFAOYSA-N 1,4-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=C(CN=C=O)C=C1 OHLKMGYGBHFODF-UHFFFAOYSA-N 0.000 description 1
- CDMDQYCEEKCBGR-UHFFFAOYSA-N 1,4-diisocyanatocyclohexane Chemical compound O=C=NC1CCC(N=C=O)CC1 CDMDQYCEEKCBGR-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- ATOUXIOKEJWULN-UHFFFAOYSA-N 1,6-diisocyanato-2,2,4-trimethylhexane Chemical compound O=C=NCCC(C)CC(C)(C)CN=C=O ATOUXIOKEJWULN-UHFFFAOYSA-N 0.000 description 1
- LFSYUSUFCBOHGU-UHFFFAOYSA-N 1-isocyanato-2-[(4-isocyanatophenyl)methyl]benzene Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=CC=C1N=C=O LFSYUSUFCBOHGU-UHFFFAOYSA-N 0.000 description 1
- ICLCCFKUSALICQ-UHFFFAOYSA-N 1-isocyanato-4-(4-isocyanato-3-methylphenyl)-2-methylbenzene Chemical compound C1=C(N=C=O)C(C)=CC(C=2C=C(C)C(N=C=O)=CC=2)=C1 ICLCCFKUSALICQ-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- QFGCFKJIPBRJGM-UHFFFAOYSA-N 12-[(2-methylpropan-2-yl)oxy]-12-oxododecanoic acid Chemical compound CC(C)(C)OC(=O)CCCCCCCCCCC(O)=O QFGCFKJIPBRJGM-UHFFFAOYSA-N 0.000 description 1
- UOFDVLCOMURSTA-UHFFFAOYSA-N 2-(2-carboxyphenoxy)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1OC1=CC=CC=C1C(O)=O UOFDVLCOMURSTA-UHFFFAOYSA-N 0.000 description 1
- WPAJQCZZXQFHBB-UHFFFAOYSA-N 2-[2-(2,5-dicarboxyphenyl)propan-2-yl]terephthalic acid Chemical compound C=1C(C(O)=O)=CC=C(C(O)=O)C=1C(C)(C)C1=CC(C(O)=O)=CC=C1C(O)=O WPAJQCZZXQFHBB-UHFFFAOYSA-N 0.000 description 1
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 1
- FYYYKXFEKMGYLZ-UHFFFAOYSA-N 4-(1,3-dioxo-2-benzofuran-5-yl)-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1C1=CC=CC2=C1C(=O)OC2=O FYYYKXFEKMGYLZ-UHFFFAOYSA-N 0.000 description 1
- QNLCDRXVEPWSBQ-UHFFFAOYSA-N 4-(4,5-dicarboxy-5-phenylcyclohexa-1,3-dien-1-yl)phthalic acid Chemical compound OC(=O)C1=CC=C(C=2C=C(C(C(O)=O)=CC=2)C(O)=O)CC1(C(O)=O)C1=CC=CC=C1 QNLCDRXVEPWSBQ-UHFFFAOYSA-N 0.000 description 1
- XZOQPRNOAGCWNT-UHFFFAOYSA-N 4-[[(3,4-dicarboxyphenyl)-dimethylsilyl]oxy-dimethylsilyl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1[Si](C)(C)O[Si](C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 XZOQPRNOAGCWNT-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 1
- ZHBXLZQQVCDGPA-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)sulfonyl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(S(=O)(=O)C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 ZHBXLZQQVCDGPA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000011231 conductive filler Substances 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- AYLRODJJLADBOB-QMMMGPOBSA-N methyl (2s)-2,6-diisocyanatohexanoate Chemical compound COC(=O)[C@@H](N=C=O)CCCCN=C=O AYLRODJJLADBOB-QMMMGPOBSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 150000008039 phosphoramides Chemical class 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- JRDBISOHUUQXHE-UHFFFAOYSA-N pyridine-2,3,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)N=C1C(O)=O JRDBISOHUUQXHE-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Landscapes
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polyurethanes Or Polyureas (AREA)
- Paints Or Removers (AREA)
Abstract
Description
本発明は、ポリアミドイミド共重合体である耐熱性ポリアミドイミド系樹脂に関する。
また、それを用いた電気/電子機器、電子複写機など各種精密機器において回転運動伝達の目的で用いるのに適したシームレス管状体、塗膜、塗膜板、耐熱性塗料に関する。
The present invention relates to a heat-resistant polyamide-imide resin that is a polyamide-imide copolymer.
The present invention also relates to a seamless tubular body, a coating film, a coating plate, and a heat-resistant coating material suitable for use in the transmission of rotational motion in various precision devices such as electric / electronic devices and electronic copying machines using the same.
電気/電子機器、電子複写機など各種精密機器内の回転運動の伝達を目的とするシームレス管状体に用いられるポリイミド樹脂として、例えば、ピロメリット酸二無水物と4,4′‐ジアミノジフェニルエ-テルより得られるポリイミド樹脂、3,3′-4,4´-ビフェニルテトラカルボン酸ニ無水物とp-フェニレンシアミンより得られるポリイミド樹脂が挙げられ、特に、優れた機械特性(引裂強度・弾性率・伸び率)を有していることから主流として適用されている。しかしながら、近年、コストダウンのニーズが一層高まりつつあり、低コスト、同じイミド系樹脂である面からポリアミドイミド樹脂が着目されてきている。 For example, pyromellitic dianhydride and 4,4'-diaminodiphenyl ether are used as a polyimide resin for seamless tubular bodies for the purpose of transmitting rotational motion in various precision equipment such as electrical / electronic equipment and electronic copying machines. Polyimide resin obtained from Tell, polyimide resin obtained from 3,3'-4,4'-biphenyltetracarboxylic dianhydride and p-phenylene cyamine, especially excellent mechanical properties (tear strength / elasticity) Rate / elongation rate), it is applied as the mainstream. However, in recent years, needs for cost reduction are increasing, and polyamide imide resin has been attracting attention from the viewpoint of low cost and the same imide resin.
一般にポリアミドイミド樹脂は、耐熱性、耐薬品性及び耐溶剤性に優れているため、各種エナメル線用ワニス塗料の塗膜成分として、また、各種基板に保護塗膜を形成するために、特に耐熱保護塗膜を形成するために広く用いられてきた。従来のポリアミドイミド樹脂としては、例えば、ジフェニルメタン−4,4'−ジイソシアネートと無水トリメリット酸との反応により得られるポリアミドイミド樹脂(例えば、特許文献1、特許文献2を参照)が知られている。 In general, polyamideimide resin is excellent in heat resistance, chemical resistance, and solvent resistance. Therefore, it is especially heat resistant as a coating film component of various varnish coatings for enameled wires and for forming protective coating films on various substrates. It has been widely used to form protective coatings. As a conventional polyamideimide resin, for example, a polyamideimide resin obtained by reaction of diphenylmethane-4,4′-diisocyanate and trimellitic anhydride (see, for example, Patent Document 1 and Patent Document 2) is known. .
しかしながら、従来のポリアミドイミド樹脂は、ポリイミド樹脂と比較して、特に上記シームレス管状体の寿命に大きく影響を及ぼす塗膜の伸び率が著しく劣っているため、適用が困難であり、実用化には至っていない。 However, the conventional polyamide-imide resin is difficult to apply because the elongation rate of the coating film, which greatly affects the life of the seamless tubular body, is significantly inferior to that of the polyimide resin. Not reached.
本発明は、上記の鑑み、伸び率に優れた塗膜及びシームレス管状体を形成しうる耐熱性ポリアミドイミド系樹脂を提供するものである。また、本発明は、この耐熱性ポリアミドイミド系樹脂を用いて成形されるシームレス管状体、塗膜、塗膜板及び耐熱性塗料を提供するものである。 In view of the above, the present invention provides a heat-resistant polyamide-imide resin that can form a coating film and a seamless tubular body excellent in elongation. In addition, the present invention provides a seamless tubular body, a coating film, a coating film plate, and a heat-resistant paint that are molded using this heat-resistant polyamideimide resin.
本発明は、次のものに関する。
本発明は、[1](a)酸無水物基及びカルボキシル基を有する3価以上のポリカルボン酸無水物、(b)式(I)で示される4,4′-(m-フェニレンジイソプロピリデン)イミドジカルボン酸及び(c)芳香族ポリイソシアネ-トを塩基性極性溶媒中で反応させて得られる耐熱性ポリアミドイミド系樹脂に関する。
The present invention relates to the following.
The present invention relates to [1] (a) a trivalent or higher polycarboxylic acid anhydride having an acid anhydride group and a carboxyl group, and (b) 4,4 ′-(m-phenylenediisopropylate represented by the formula (I). The present invention relates to a heat-resistant polyamide-imide resin obtained by reacting (redene) imidodicarboxylic acid and (c) an aromatic polyisocyanate in a basic polar solvent.
また、本発明は、[3](c)芳香族ポリイソシアネートと、(a)ポリカルボン酸無水物及び(b)式(I)で示される4,4′-(m-フェニレンジイソプロピリデン)イミドジカルボン酸とのイソシアネート基とカルボキシル基との配合量が、当量比で全イソシアネート基/全カルボキシル基=0.8〜1.4で、数平均分子量が10000〜50000である上記[1]又は[2]に記載の耐熱性ポリアミドイミド系樹脂に関する。
また、本発明は、[4]耐熱性ポリアミドイミド系樹脂により形成された塗膜の伸び率が、90%以上、引張強度が、100MPa以上(25℃)である上記[1]ないし[3]のいずれかに記載の耐熱性ポリアミドイミド系樹脂に関する。
The present invention also provides [3] (c) aromatic polyisocyanate, (a) polycarboxylic acid anhydride, and (b) 4,4 ′-(m-phenylenediisopropylidene) represented by the formula (I). [1] or [1] above, wherein the amount of the isocyanate group and carboxyl group in the imidodicarboxylic acid is equal to the total isocyanate group / total carboxyl group = 0.8 to 1.4 in an equivalent ratio, and the number average molecular weight is 10,000 to 50,000. The heat-resistant polyamide-imide resin according to [2].
The present invention also provides [4] the above [1] to [3], wherein the coating film formed of the heat-resistant polyamide-imide resin has an elongation percentage of 90% or more and a tensile strength of 100 MPa or more (25 ° C.). The heat-resistant polyamide-imide resin according to any one of the above.
また、本発明は、[5]上記[1]ないし[4]のいずれかに記載の耐熱性ポリアミドイミド系樹脂を用いて成形されたシームレス管状体に関する。
また、本発明は、[6]上記[1]ないし[4]のいずれかに記載の耐熱性ポリアミドイミド系樹脂を塗布及び加熱して成形された塗膜に関する。
また、本発明は、[7]上記[1]ないし[4]のいずれかに記載の耐熱性ポリアミドイミド系樹脂を表面に塗布及び加熱して成形された塗膜を有する塗膜板に関する。
また、本発明は、[8]上記[1]ないし[4]のいずれかに記載の耐熱性ポリアミドイミド系樹脂及び有機溶媒を含有する耐熱性塗料に関する。
The present invention also relates to [5] a seamless tubular body formed using the heat-resistant polyamideimide resin according to any one of [1] to [4].
The present invention also relates to [6] a coating film formed by applying and heating the heat-resistant polyamideimide resin according to any one of [1] to [4].
The present invention also relates to [7] a coated plate having a coated film formed by applying and heating the heat-resistant polyamideimide resin according to any one of [1] to [4] on the surface.
The present invention also relates to [8] a heat resistant paint containing the heat resistant polyamide-imide resin according to any one of [1] to [4] and an organic solvent.
本発明の耐熱性ポリアミドイミド系樹脂によれば、引張強度及び伸び率(破断伸度)に優れた塗膜の作製が可能となり、電気/電子機器、電子複写機などの精密機器内の回転運動伝達用のシームレス管状体にとどまらず、塗膜、塗膜板、耐熱性塗料など各種耐熱コーティング塗膜の高機能化が可能となり、信頼性向上に有用である。 According to the heat-resistant polyamide-imide resin of the present invention, it becomes possible to produce a coating film having excellent tensile strength and elongation (breaking elongation), and rotational motion in precision equipment such as electrical / electronic equipment and electronic copying machines. Not only the seamless tubular body for transmission, but also high functionality of various heat-resistant coatings such as coatings, coatings, and heat-resistant coatings is possible, which is useful for improving reliability.
本発明における耐熱性ポリアミドイミド系樹脂の製造に用いられるポリカルボン酸成分(a)は、1分子中に、[イソシアネート基と反応してイミド結合を形成する酸無水物基]及び/又は「イソシアネ-ト基と反応してアミド結合を形成するカルボキシル基]を合計で2個以上有する化合物、又は、その混合物であり、酸無水物を必須成分とするものであればよく、特に制限はない。酸無水物基及びカルボキシル基を有する3価以上のポリカルボン酸無水物としては、例えば一般式(II)及び(III)で示す芳香族トリカルボン酸無水物を挙げることができる。
耐熱性、コスト面等を考慮すれば、トリメリット酸無水物が特に好ましい。
The polycarboxylic acid component (a) used in the production of the heat-resistant polyamideimide resin in the present invention contains, in one molecule, [an acid anhydride group that reacts with an isocyanate group to form an imide bond] and / or “isocyanate”. There is no particular limitation as long as it is a compound having a total of two or more carboxyl groups that react with a -to group to form an amide bond], or a mixture thereof, and an acid anhydride as an essential component. Examples of the trivalent or higher polycarboxylic acid anhydride having an acid anhydride group and a carboxyl group include aromatic tricarboxylic acid anhydrides represented by the general formulas (II) and (III).
In view of heat resistance, cost, etc., trimellitic anhydride is particularly preferable.
(但し、一般式(II)、(III)中、R1は、水素、炭素数1〜10のアルキル基又はフェニル基を示し、Yは−CH2−、−CO−、−SO2−、又は−O−を示す。)
また、(a)成分のポリカルボン酸成分としては、これらの他に必要に応じて、テトラカルボン酸二無水物、脂肪族ジカルボン酸、芳香族ジカルボン酸等を併用することができる。
テトラカルボン酸二無水物として、ピロメリット酸二無水物、3,3',4,4'−ベンゾフェノンテトラカルボン酸二無水物、3,3′,4,4′-ビフェニルテトラカルボン酸二無水物、2,2′,3,3′-ビフェニルテトラカルボン酸二無水物、2,3,3′,4′-ビフェニルテトラカルボン酸二無水物3,3′,4,4′-ジフェニルスルホンテトラカルボン酸二無水物、エチレングリコールビスアンドヒドロトリメリテ-ト、2,2-ビス(2、5-ジカルボキシフェニル)プロパンニ無水物、1,1-ビス(2,3-ジカルボキシフェニル)エタン酸二無水物、1,1-ビス(3,4-ジカルボキシフェニル)スルホンニ無水物、1,2,5,6-ナフタレンテトラカルボン酸二無水物、2,3,5,6-ピリジンテトラカルボン酸二無水物、1,4,5,8-ナフタレンテトラカルボン酸二無水物、3,4,9,10-ペリレンテトラカルボン酸二無水物、4,4'-スルホニルジフタル酸二無水物、m-ターフェニル-3,3',4,4'-テトラカルボン酸二無水物、4,4'-オキシジフタル酸二無水物、1,1,1,3,3,3-ヘキサフルオロ-2,2-ビス(2,3-又は3,4-ジカルボキシフェニル)プロパン二無水物、1,3-ビス(3,4-ジカルボキシルフェニル)-1,1,3,3-テトラメチルジシロキサン二無水物、ブタンテトラカルボン酸二無水物、ビシクロ-[2,2,2]-オクト-7-エン-2:3:5:6-テトラカルボン酸二無水物等が例示される。
脂肪族ジカルボン酸として、コハク酸、グルタル酸、アジピン酸、アゼライン酸、スベリン酸、セバシン酸、デカン二酸、ドデカン二酸、ダイマー酸等が挙げられる。
芳香族ジカルボン酸として、イソフタル酸、テレフタル酸、フタル酸、ナフタレンジカルボン酸、オキシジ安息香酸等が挙げられ、これらは併用することができる。また、これらポリカルボン酸成分の誘導体も使用することができる。
これらの酸や酸無水物の使用量は、全酸成分の50当量%以下とすることが好ましい。
(In the general formulas (II) and (III), R 1 represents hydrogen, an alkyl group having 1 to 10 carbon atoms, or a phenyl group, and Y represents —CH 2 —, —CO—, —SO 2 —, Or -O- is shown.)
Moreover, as a polycarboxylic acid component of (a) component, tetracarboxylic dianhydride, aliphatic dicarboxylic acid, aromatic dicarboxylic acid, etc. can be used together as needed besides these.
As tetracarboxylic dianhydride, pyromellitic dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride 2,2 ', 3,3'-biphenyltetracarboxylic dianhydride, 2,3,3', 4'-biphenyltetracarboxylic dianhydride 3,3 ', 4,4'-diphenylsulfonetetracarboxylic Acid dianhydride, ethylene glycol bisandhydrotrimellitate, 2,2-bis (2,5-dicarboxyphenyl) propane dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane acid Anhydride, 1,1-bis (3,4-dicarboxyphenyl) sulfone dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 2,3,5,6-pyridinetetracarboxylic acid Anhydride, 1 4,5,8-naphthalenetetracarboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, 4,4′-sulfonyldiphthalic dianhydride, m-terphenyl-3, 3 ', 4,4'-tetracarboxylic dianhydride, 4,4'-oxydiphthalic dianhydride, 1,1,1,3,3,3-hexafluoro-2,2-bis (2,3 -Or 3,4-dicarboxyphenyl) propane dianhydride, 1,3-bis (3,4-dicarboxylphenyl) -1,1,3,3-tetramethyldisiloxane dianhydride, butanetetracarboxylic acid Examples of the dianhydride include bicyclo- [2,2,2] -oct-7-ene-2: 3: 5: 6-tetracarboxylic dianhydride.
Examples of the aliphatic dicarboxylic acid include succinic acid, glutaric acid, adipic acid, azelaic acid, suberic acid, sebacic acid, decanedioic acid, dodecanedioic acid, and dimer acid.
Examples of the aromatic dicarboxylic acid include isophthalic acid, terephthalic acid, phthalic acid, naphthalenedicarboxylic acid, and oxydibenzoic acid, and these can be used in combination. In addition, derivatives of these polycarboxylic acid components can also be used.
The amount of these acids and acid anhydrides used is preferably 50 equivalent% or less of the total acid component.
本発明において使用する(b)成分として、前記式(I)で示されるジカルボン酸成分である4,4′-(m-フェニレンジイソプロピリデン)イミドジカルボン酸は、下記の式(IV)で示される4,4′-(m-フェニレンジイソプロピリデン)ジアニリンと前記ポリカルボン酸成分と無溶剤あるいは有機溶剤中で反応させることにより得られる。 As the component (b) used in the present invention, 4,4 ′-(m-phenylenediisopropylidene) imide dicarboxylic acid, which is the dicarboxylic acid component represented by the formula (I), is represented by the following formula (IV). 4,4 '-(m-phenylenediisopropylidene) dianiline and the polycarboxylic acid component are reacted in a solvent-free or organic solvent.
一般式(II)、(III)で表されるカルボン酸成分と、式(IV)で表される4,4′-(m-フェニレンジイソプロピリデン)ジアニリン成分の配合割合は当量比で酸無水物基(酸基)/アミン基=1.01以上になるようにすることが好ましく、1.5〜2.5となるようにすることがより好ましく、1.9〜2.1になるようにすることが更に好ましい。 The mixing ratio of the carboxylic acid component represented by the general formulas (II) and (III) and the 4,4 ′-(m-phenylenediisopropylidene) dianiline component represented by the formula (IV) is an acid anhydride in an equivalent ratio. It is preferable that the physical group (acid group) / amine group is 1.01 or more, more preferably 1.5 to 2.5, and 1.9 to 2.1. More preferably.
反応は、無溶媒あるいは有機溶媒の存在下で容易に行うことができる。反応温度は、60〜100℃とすることが好ましく、反応時間は、バッチの規模、採用される反応条件などにより適宜選択することができる。
使用できる有機溶媒としては、例えば、ケトン系溶媒(メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等)、エステル系溶媒(酢酸エチル、酢酸ブチル、γ−ブチロラクトン等)、エーテル系溶媒(ジエチレングリコールジメチルエーテル、トリエチレングリコールジメチルエーテル等)、セロソルブ系溶媒(ブチルセロソルブアセテート、エチルセロソルブアセテート、メチルセロソルブアセテート等)、芳香族炭化水素系溶媒(トルエン、キシレン、p−シメン等)、テトラヒドロフラン、ジオキサン、N−メチル−2−ピロリドン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、ジメチルスルホキシドなどが挙げられる。
The reaction can be easily performed without solvent or in the presence of an organic solvent. The reaction temperature is preferably 60 to 100 ° C., and the reaction time can be appropriately selected depending on the scale of the batch, the reaction conditions employed, and the like.
Examples of organic solvents that can be used include ketone solvents (methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.), ester solvents (ethyl acetate, butyl acetate, γ-butyrolactone, etc.), ether solvents (diethylene glycol dimethyl ether, triethylene glycol dimethyl ether). Etc.), cellosolve solvents (butyl cellosolve acetate, ethyl cellosolve acetate, methyl cellosolve acetate, etc.), aromatic hydrocarbon solvents (toluene, xylene, p-cymene, etc.), tetrahydrofuran, dioxane, N-methyl-2-pyrrolidone, N , N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide and the like.
本発明における(c)成分の芳香族ポリイソシアネ-ト化合物としては、特に制限はなく、下記一般式(V)で表されるものを使用できる。 There is no restriction | limiting in particular as an aromatic polyisocyanate compound of (c) component in this invention, What is represented by the following general formula (V) can be used.
上記一般式(V)で表されるジイソシアネート類としては、例えば、ジフェニルメタン-2,4'-ジイソシアネート、3,2'-又は3,3'-又は4,2'-又は4,3'-又は5,2'-又は5,3'-又は6,2'-又は6,3'-ジメチルジフェニルメタン-2,4'-ジイソシアネート、3,2'-又は3,3'-又は4,2'-又は4,3'-又は5,2'-又は5,3'-又は6,2'-又は6,3'-ジエチルジフェニルメタン-2,4'-ジイソシアネート、3,2'-又は3,3'-又は4,2'-又は4,3'-又は5,2'-又は5,3'-又は6,2'-又は6,3'-ジメトキシジフェニルメタン-2,4'-ジイソシアネート、ジフェニルメタン-4,4'-ジイソシアネート、ベンゾフェノン-4,4'-ジイソシアネート、ジフェニルスルホン-4,4'-ジイソシアネート、ジフェニルスルホン-4,4'-ジイソシアネート、トリレン-2,4-ジイソシアネート、トリレン-2,6-ジイソシアネート、m-キシリレンジイソシアネート、p-キシリレンジイソシアネート、ナフタレン-2,6-ジイソシアネート、4,4'-{2,2-ビス(4-フェノキシフェニル)プロパン}ジイソシアネートなど従来公知の種々のジイソシアネ-ト化合物が挙げられる。これらは単独で、あるいは2種以上混合して使用してもよい。上記各ポリイソシアネート化合物中でも、塗膜の耐熱性及び機械特性の面からジフェニルメタン-4,4'-ジイソシアネートが、本発明に最も好適に使用される。 Examples of the diisocyanates represented by the general formula (V) include diphenylmethane-2,4′-diisocyanate, 3,2′- or 3,3′- or 4,2′- or 4,3′- or 5,2'- or 5,3'- or 6,2'- or 6,3'-dimethyldiphenylmethane-2,4'-diisocyanate, 3,2'- or 3,3'- or 4,2'- Or 4,3'- or 5,2'- or 5,3'- or 6,2'- or 6,3'-diethyldiphenylmethane-2,4'-diisocyanate, 3,2'- or 3,3 ' -Or 4,2'- or 4,3'- or 5,2'- or 5,3'- or 6,2'- or 6,3'-dimethoxydiphenylmethane-2,4'-diisocyanate, diphenylmethane-4 , 4'-diisocyanate, benzophenone-4,4'-diisocyanate, diphenylsulfone-4,4'-diisocyanate, diphenylsulfone-4,4 '-Diisocyanate, tolylene-2,4-diisocyanate, tolylene-2,6-diisocyanate, m-xylylene diisocyanate, p-xylylene diisocyanate, naphthalene-2,6-diisocyanate, 4,4'-{2,2- Various conventionally known diisocyanate compounds such as bis (4-phenoxyphenyl) propane} diisocyanate can be mentioned. These may be used alone or in admixture of two or more. Among the above polyisocyanate compounds, diphenylmethane-4,4′-diisocyanate is most preferably used in the present invention in terms of heat resistance and mechanical properties of the coating film.
また、(c)芳香族ポリイソシアネート以外に、ヘキサメチレンジイソシアネート、2,2,4-トリメチルヘキサメチレンジイソシアネート、イソホロンジイソシアネート、4,4'-ジシクロヘキシルメタンジイソシアネート、トランスシクロヘキサン-1,4-ジイソシアネート、水添m-キシリレンジイソシアネート、リジンジイソシアネート等の脂肪族又は脂環式イソシアネート及び3官能以上のポリイソシアネートを用いても良く、経日変化を避けるために必要なブロック剤で安定化したものを使用してもよい。 In addition to (c) aromatic polyisocyanate, hexamethylene diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, isophorone diisocyanate, 4,4′-dicyclohexylmethane diisocyanate, transcyclohexane-1,4-diisocyanate, hydrogenated Aliphatic or cycloaliphatic isocyanates such as m-xylylene diisocyanate and lysine diisocyanate, and tri- or higher functional polyisocyanates may be used, and those stabilized with blocking agents necessary to avoid changes over time are used. Also good.
本発明における(b)成分の式(I)で表されるカルボン酸成分と(a)成分のポリカルボン酸成分の配合割合は、当量比で(b)成分/(a)成分=0.01/0.99〜0.60/0.40とすることが好ましく、0.1/0.9〜0.5/0.5とすることがより好ましく、0.2/0.8〜0.8/0.2とすることが特に好ましい。
この当量比が0.01/0.99未満では、得られる耐熱性ポリアミドイミド系樹脂の伸び率を高くすることが困難となり、0.60/0.40を超えると、塗膜の耐熱性が著しく低下してしまう。
The blending ratio of the carboxylic acid component represented by formula (I) of the component (b) and the polycarboxylic acid component of the component (a) in the present invention is an equivalent ratio of (b) component / (a) component = 0.01. /0.99-0.60/0.40, more preferably 0.1 / 0.9-0.5 / 0.5, and 0.2 / 0.8-0. A ratio of 8 / 0.2 is particularly preferable.
If the equivalent ratio is less than 0.01 / 0.99, it is difficult to increase the elongation rate of the resulting heat-resistant polyamideimide resin, and if it exceeds 0.60 / 0.40, the heat resistance of the coating film is reduced. It will drop significantly.
なお、(c)芳香族ポリイソシアネートと、(a)ポリカルボン酸無水物及び(b)式(I)で示される4,4′-(m-フェニレンジイソプロピリデン)イミドジカルボン酸とのイソシアネート基とカルボキシル基との配合量が、当量比で全イソシアネート基/全カルボキシル基=0.8〜1.4とすることが好ましく、0.9〜1.3となるようにすることがより好ましく、0.9〜1.2となるようにすることが特に好ましい。
この比が0.8未満では、ポリアミドイミド樹脂の高分子量化が困難であり、また、1.4を超えると、破断伸度が著しく低下してしまう。
In addition, the isocyanate group of (c) aromatic polyisocyanate, (a) polycarboxylic acid anhydride, and (4) 4,4 '-(m-phenylenediisopropylidene) imide dicarboxylic acid represented by the formula (I) And the amount of the carboxyl group is preferably set to an equivalent ratio of all isocyanate groups / total carboxyl groups = 0.8 to 1.4, more preferably 0.9 to 1.3, It is particularly preferable that the ratio is 0.9 to 1.2.
If this ratio is less than 0.8, it is difficult to increase the molecular weight of the polyamideimide resin, and if it exceeds 1.4, the elongation at break is significantly reduced.
本発明の耐熱性ポリアミドイミド系樹脂の合成は、塩基性極性溶媒中で行われ、極性溶媒として、N-メチル-2-ピロリドン、N、N-ジメチルアセトアミド、N、N-ジエチルアセトアミド、N、N-ジメチルホルムアミド、N、N-ジエチルホルムアミド、ジメチルスルホキシド、ヘキサメチルホスホルアミド、テトラメチレンスルホン等が挙げられ、経済性および重合しやすさの面から、N-メチル-2-ピロリドンまたはN、N-ジメチルアセトアミドを用いることが好ましい。また、使用量に特に制限はないが、前記(a)ポリカルボン酸と(b)4,4′-(m-フェニレンジイソプロピリデン)イミドジカルボン酸、(c)芳香族ポリイソシアネートの総量100質量部に対して、100〜900質量部とするのが好ましく、125〜600質量部とすることがより好ましく、150〜400質量部とすることが特に好ましい。 The heat-resistant polyamideimide resin of the present invention is synthesized in a basic polar solvent, and N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-diethylacetamide, N, N-dimethylformamide, N, N-diethylformamide, dimethyl sulfoxide, hexamethylphosphoramide, tetramethylene sulfone and the like. From the viewpoint of economy and ease of polymerization, N-methyl-2-pyrrolidone or N, N-dimethylacetamide is preferably used. The amount used is not particularly limited, but the total amount of (a) polycarboxylic acid, (b) 4,4 ′-(m-phenylenediisopropylidene) imide dicarboxylic acid, and (c) aromatic polyisocyanate is 100 mass. The amount is preferably 100 to 900 parts by mass, more preferably 125 to 600 parts by mass, and particularly preferably 150 to 400 parts by mass.
このようにして得られた耐熱性ポリアミドイミド系樹脂の数平均分子量は、10,000〜50,000であることが好ましく、15,000〜40,000であることがより好ましく、20,000〜35,000であることが特に好ましい。
数平均分子量が、10,000未満であると、塗膜としたときの塗膜の耐熱性や機械的特性等の諸特性が低下する傾向があり、50,000を超えると、塗料として適性な濃度になるよう溶媒に溶解させたときに粘度が高くなり、塗装時の作業性が劣る傾向がある。
The number average molecular weight of the heat-resistant polyamideimide resin thus obtained is preferably 10,000 to 50,000, more preferably 15,000 to 40,000, and 20,000 to 35,000 is particularly preferred.
When the number average molecular weight is less than 10,000, various properties such as the heat resistance and mechanical properties of the coating film tend to be reduced. When the number average molecular weight exceeds 50,000, the coating composition is suitable as a coating material. When dissolved in a solvent so as to have a concentration, the viscosity increases, and the workability during coating tends to be inferior.
なお、耐熱性ポリアミドイミド系樹脂の数平均分子量は、合成時に反応液をサンプリングし、ゲルパーミエーションクロマトグラフ(GPC)により、標準ポリスチレンの検量線を用いて測定し、目的の数平均分子量になるまで合成を継続することにより、所望の範囲に調整することができる。 The number average molecular weight of the heat-resistant polyamide-imide resin is measured by sampling a reaction solution during synthesis and using a standard polystyrene calibration curve by gel permeation chromatography (GPC) to obtain the target number average molecular weight. By continuing the synthesis until the desired range can be adjusted.
本発明の耐熱性ポリアミドイミド系樹脂には、塗布、加熱することにより引裂強度、伸び率、耐熱性、耐薬品性及び耐溶剤性に優れる塗膜を形成することができるため、長期耐久性を必要とする電気/電子機器、電子複写機などの各種精密機器内の回転運動の伝達目的であるシームレス管状体や、電気電子部品、機械部品などのフィルム、繊維、その他の原料として用いることができる。例えば、本発明の耐熱性ポリアミドイミド系樹脂を塗布、加熱することにより、伸び率(25℃)が90%以上であって、かつ、引張強度(25℃)が100MPa以上である塗膜を形成することができ、特にシームレス管状体の形成に好適に用いられる。 The heat-resistant polyamide-imide resin of the present invention can form a coating film having excellent tear strength, elongation rate, heat resistance, chemical resistance and solvent resistance by coating and heating. It can be used as a seamless tubular body for the purpose of transmitting rotational motion in various precision equipment such as electrical / electronic equipment and electronic copying machines, films, fibers, and other raw materials for electrical and electronic parts and mechanical parts. . For example, by applying and heating the heat-resistant polyamide-imide resin of the present invention, a coating film having an elongation (25 ° C.) of 90% or more and a tensile strength (25 ° C.) of 100 MPa or more is formed. In particular, it is preferably used for forming a seamless tubular body.
塗膜を形成する場合、通常、本発明の耐熱性ポリアミドイミド系樹脂の固形分として、10〜50質量%、好ましくは20〜40質量%含有する耐熱性塗料として用いられる。耐熱性塗料に使用できる有機溶媒としては、例えば、ケトン系溶媒(メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等)、エステル系溶媒(酢酸エチル、酢酸ブチル、γ−ブチロラクトン等)、エーテル系溶媒(ジエチレングリコールジメチルエーテル、トリエチレングリコールジメチルエーテル等)、セロソルブ系溶媒(ブチルセロソルブアセテート、エチルセロソルブアセテート、メチルセロソルブアセテート等)、芳香族炭化水素系溶媒(トルエン、キシレン、p−シメン等)、テトラヒドロフラン、ジオキサン、N−メチル−2−ピロリドン、N,N−ジメチルホルムアミド、N,N−ジエチルホルムアミド、N,N−ジメチルアセトアミド、N,N−ジエチルアセトアミド、ジメチルスルホキシド、ヘキサメチルホスホルアミド、テトラメチレンスルホンなどが挙げられる。 When forming a coating film, it is normally used as a heat resistant coating containing 10 to 50% by mass, preferably 20 to 40% by mass, as the solid content of the heat resistant polyamide-imide resin of the present invention. Examples of the organic solvent that can be used in the heat resistant coating include ketone solvents (methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.), ester solvents (ethyl acetate, butyl acetate, γ-butyrolactone, etc.), ether solvents (diethylene glycol dimethyl ether, Triethylene glycol dimethyl ether, etc.), cellosolve solvents (butyl cellosolve acetate, ethyl cellosolve acetate, methyl cellosolve acetate, etc.), aromatic hydrocarbon solvents (toluene, xylene, p-cymene, etc.), tetrahydrofuran, dioxane, N-methyl-2 -Pyrrolidone, N, N-dimethylformamide, N, N-diethylformamide, N, N-dimethylacetamide, N, N-diethylacetamide, dimethyl sulfoxide, hexamethyl Phosphoramides, such as tetramethylene sulfone.
塗膜を形成する基材としては、例えば、ガラス板等の板状基材が挙げられる。例えば、市販のガラス板等の板状の表面に、本発明の耐熱性ポリアミドイミド系樹脂を上記の耐熱性塗料などとして塗布し、加熱することにより、引張強度、破断伸度、耐熱性、耐薬品性及び耐溶剤性に優れる塗膜を表面に有する塗膜板を得ることができる。シームレス管状体を形成する場合には、本発明の耐熱性ポリアミドイミド系樹脂又はその溶液をステンレススチール製円筒金型に注入し、円筒内面または円筒外面に樹脂膜を形成させるため150〜300℃の熱風で30〜120分間乾燥させた後、脱型することによりシームレス管状体を得ることができる。この時、耐熱性ポリアミドイミド系樹脂に、更にカーボンなどの導電性フィラー等の充填材を混練して用いても良い。 As a base material which forms a coating film, plate-shaped base materials, such as a glass plate, are mentioned, for example. For example, the heat-resistant polyamide-imide resin of the present invention is applied as a heat-resistant paint as described above to a plate-like surface such as a commercially available glass plate, and heated to obtain tensile strength, elongation at break, heat resistance, resistance to heat. It is possible to obtain a coated plate having a coated film excellent in chemical properties and solvent resistance on the surface. In the case of forming a seamless tubular body, the heat-resistant polyamideimide resin of the present invention or a solution thereof is poured into a stainless steel cylindrical mold, and a resin film is formed at 150 to 300 ° C. to form a resin film on the cylindrical inner surface or outer cylindrical surface. After drying with hot air for 30 to 120 minutes, a seamless tubular body can be obtained by demolding. At this time, a filler such as a conductive filler such as carbon may be further kneaded and used in the heat-resistant polyamide-imide resin.
塗膜を形成する際の加熱は、通常、150〜300℃で、30〜120分間行なわれ、この加熱により、耐熱性ポリアミドイミド系樹脂を硬化させる。塗膜の厚みは、塗膜の用途によって異なり、特に制限はないが、通常、20〜120μm、好ましくは50〜80μmである。 The heating for forming the coating film is usually performed at 150 to 300 ° C. for 30 to 120 minutes, and the heat resistant polyamide-imide resin is cured by this heating. Although the thickness of a coating film changes with uses of a coating film and there is no restriction | limiting in particular, Usually, it is 20-120 micrometers, Preferably it is 50-80 micrometers.
次に本発明の実施例について説明するが、本発明はこれらの実施例に制限されるものではなく、発明の主旨に基づいたこれら以外の多くの実施態様を含むことは言うまでもない。 Next, examples of the present invention will be described. However, the present invention is not limited to these examples, and it is needless to say that the present invention includes many other embodiments based on the gist of the invention.
(実施例1)
(b)成分の合成として、4,4′-(m-フェニレンジイソプロピリデン)ジアニリン[商品名:Bisaniline M](三井化学株式会社製)34.5g(0.1モル)及び無水トリメリット酸38.4g(0.2モル)とN-メチル-2-ピロリドン109.4gを温度計、攪拌機、冷却管を備えたフラスコに仕込み、この混合物を乾燥させた窒素気流中で、約1時間かけて徐々に80℃まで昇温し、80℃にて1時間保温し、(b)成分の4,4′-(m-フェニレンジイソプロピリデン)イミドジカルボン酸(0.1モル)を得た。
さらに、この反応液に(a)成分として無水トリメリット酸172.9g(0.90)及び(c)成分としてジフェニルメタン−4,4'−ジイソシアネート254.0g(1.015モル)と塩基性極性溶媒としてN-メチル-2-ピロリドン640.3gを仕込み、反応により生ずる炭酸ガスの急激な発泡に注意しながら約4時間かけて除々に昇温して140℃まで昇温した後、7時間反応させて、数平均分子量が27,300の耐熱性ポリアミドイミド系樹脂の溶液を得た。
この反応に用いた(a)成分、(b)成分、(c)成分の配合割合は、当量比で次のとおりである。
(b)/(a) =0.10/0.90
(c)/{(b)+(a)}=1.015
得られた溶液をN-メチル-2-ピロリドンで希釈し、耐熱性塗料(樹脂分濃度:30質量%)を得た。
Example 1
As the synthesis of component (b), 34.5 g (0.1 mol) of 4,4 ′-(m-phenylenediisopropylidene) dianiline [trade name: Bisanline M] (manufactured by Mitsui Chemicals) and trimellitic anhydride 38.4 g (0.2 mol) and 109.4 g of N-methyl-2-pyrrolidone were charged into a flask equipped with a thermometer, stirrer and condenser, and the mixture was dried in a nitrogen stream for about 1 hour. The temperature was gradually raised to 80 ° C. and kept at 80 ° C. for 1 hour to obtain 4,4 ′-(m-phenylenediisopropylidene) imide dicarboxylic acid (0.1 mol) as component (b).
Further, in this reaction solution, 172.9 g (0.90) of trimellitic anhydride as component (a) and 254.0 g (1.015 mol) of diphenylmethane-4,4′-diisocyanate as component (c) and basic polarity N-methyl-2-pyrrolidone (640.3 g) was added as a solvent, and the temperature was raised gradually to 140 ° C. over about 4 hours, paying attention to the sudden bubbling of carbon dioxide gas generated by the reaction, followed by reaction for 7 hours. Thus, a solution of a heat-resistant polyamideimide resin having a number average molecular weight of 27,300 was obtained.
The blending ratios of component (a), component (b), and component (c) used in this reaction are as follows in terms of equivalent ratio.
(B) / (a) = 0.10 / 0.90
(C) / {(b) + (a)} = 1.015
The obtained solution was diluted with N-methyl-2-pyrrolidone to obtain a heat-resistant paint (resin concentration: 30% by mass).
(実施例2)
(b)成分の合成として、4,4′-(m-フェニレンジイソプロピリデン)ジアニリン[商品名:Bisaniline M(三井化学株式会社製)]103.4g(0.3モル)及び無水トリメリット酸115.3g(0.6モル)とN-メチル-2-ピロリドン328.1gを温度計、攪拌機、冷却管を備えたフラスコに仕込み、この混合物を乾燥させた窒素気流中で、約1時間かけて徐々に90℃まで昇温し、90℃にて2時間保温し、(b)成分のイミドジカルボン酸(0.3モル)を得た。
さらに、この反応液に(a)成分として無水トリメリット酸134.5g(0.7モル)及び(c)成分としてジフェニルメタン−4,4'−ジイソシアネート256.5g(1.025モル)とN-メチル-2-ピロリドン804.2gを仕込み、反応により生ずる炭酸ガスの急激な発泡に注意しながら約2時間かけて除々に昇温して145℃まで昇温した後、9時間反応させて、数平均分子量が32,000の耐熱性ポリアミドイミド系樹脂の溶液を得た。
この反応に用いた(a)成分、(b)成分、(c)成分の配合割合は、当量比で次のとおりである。
(b)/(a) =0.30/0.70
(c)/{(b)+(a)}=1.025
得られた溶液をN-メチル-2-ピロリドンで希釈し、耐熱性塗料(樹脂分濃度:25質量%)を得た。
(Example 2)
As the synthesis of the component (b), 4,4 ′-(m-phenylenediisopropylidene) dianiline [trade name: Bisanline M (manufactured by Mitsui Chemicals)] 103.4 g (0.3 mol) and trimellitic anhydride 115.3 g (0.6 mol) and 328.1 g of N-methyl-2-pyrrolidone were charged into a flask equipped with a thermometer, stirrer and condenser, and the mixture was dried in a nitrogen stream for about 1 hour. The temperature was gradually raised to 90 ° C. and kept at 90 ° C. for 2 hours to obtain imidodicarboxylic acid (0.3 mol) as component (b).
Further, 134.5 g (0.7 mol) of trimellitic anhydride as component (a) and 256.5 g (1.025 mol) of diphenylmethane-4,4′-diisocyanate as component (c) and N − Methyl-2-pyrrolidone (804.2 g) was charged, and the temperature was raised gradually to 145 ° C. over about 2 hours, paying attention to the sudden foaming of carbon dioxide gas generated by the reaction. A solution of heat-resistant polyamideimide resin having an average molecular weight of 32,000 was obtained.
The blending ratios of component (a), component (b), and component (c) used in this reaction are as follows in terms of equivalent ratio.
(B) / (a) = 0.30 / 0.70
(C) / {(b) + (a)} = 1.025
The obtained solution was diluted with N-methyl-2-pyrrolidone to obtain a heat-resistant paint (resin concentration: 25% by mass).
(実施例3)
(b)成分の合成として4,4′-(m-フェニレンジイソプロピリデン)ジアニリン[商品名:Bisaniline M(三井化学株式会社製)]68.9g(0.2モル)及び無水トリメリット酸76.9g(0.4モル)とN-メチル-2-ピロリドン218.7gを温度計、攪拌機、冷却管を備えたフラスコに仕込み、この混合物を乾燥させた窒素気流中で、約1時間かけて徐々に90℃まで昇温し、90℃にて2時間保温し、(b)成分のイミドジカルボン酸(0.2モル)を得た。
さらに、この反応液に(a)成分として無水トリメリット酸153.7g(0.8モル)及び(c)成分としてジフェニルメタン−4,4'−ジイソシアネート202.2g(0.808モル)、さらに3,3′-ジメチルビフェニル-4,4′-ジイソシアネート[商品名:TODI(日本曹達株式会社製)]53.4g(0.4モル)とN-メチル-2-ピロリドン812.2gを仕込み、反応により生ずる炭酸ガスの急激な発泡に注意しながら約2時間かけて除々に昇温して145℃まで昇温した後、13時間反応させて数平均分子量が33,100の耐熱性ポリアミドイミド系樹脂の溶液を得た。
この反応に用いた(a)成分、(b)成分、(c)成分の配合割合は、当量比で次のとおりである。
(b)/(a) =0.20/0.80
(c)/{(b)+(a)}=1.21
得られた溶液をN-メチル-2-ピロリドンで希釈し、耐熱性塗料(樹脂分濃度:20質量%)を得た。
Example 3
As a synthesis of the component (b), 4,4 ′-(m-phenylenediisopropylidene) dianiline [trade name: Bisanline M (manufactured by Mitsui Chemicals)] 68.9 g (0.2 mol) and trimellitic anhydride 76 .9 g (0.4 mol) and 218.7 g of N-methyl-2-pyrrolidone were charged into a flask equipped with a thermometer, a stirrer and a condenser, and the mixture was dried in a nitrogen stream for about 1 hour. The temperature was gradually raised to 90 ° C. and kept at 90 ° C. for 2 hours to obtain an imidodicarboxylic acid (0.2 mol) as component (b).
Furthermore, 153.7 g (0.8 mol) of trimellitic anhydride as component (a) and 202.2 g (0.808 mol) of diphenylmethane-4,4′-diisocyanate as component (c) were added to this reaction solution. , 3′-Dimethylbiphenyl-4,4′-diisocyanate [trade name: TODI (manufactured by Nippon Soda Co., Ltd.)] 53.4 g (0.4 mol) and N-methyl-2-pyrrolidone 812.2 g were charged and reacted. Heat-resistant polyamide-imide resin having a number average molecular weight of 33,100 by reacting for 13 hours after gradually raising the temperature to about 145 ° C. over a period of about 2 hours, paying attention to the sudden foaming of carbon dioxide gas generated by Solution was obtained.
The blending ratios of component (a), component (b), and component (c) used in this reaction are as follows in terms of equivalent ratio.
(B) / (a) = 0.20 / 0.80
(C) / {(b) + (a)} = 1.21
The obtained solution was diluted with N-methyl-2-pyrrolidone to obtain a heat-resistant paint (resin concentration: 20% by mass).
(比較例1)
無水トリメリット酸192.1g(1.0モル)、4,4′−ジフェニルメタンジイソシアネート262.8g(1.05モル)、N−メチル−2−ピロリドン682.4gを温度計、攪拌機、冷却管を備えたフラスコに入れ、この混合物を乾燥させた窒素気流中で、反応により生ずる炭酸ガスの急激な発泡に注意しながら約5時間かけて徐々に昇温して140℃まで昇温した。該混合物を140℃にて8時間保温し、数平均分子量が27,000のポリアミドイミド樹脂の溶液を得た。
この溶液をN-メチル-2-ピロリドンで希釈し、塗料(樹脂分濃度:31質量%)を得た。
(Comparative Example 1)
Add 192.1 g (1.0 mol) of trimellitic anhydride, 262.8 g (1.05 mol) of 4,4'-diphenylmethane diisocyanate, and 682.4 g of N-methyl-2-pyrrolidone to a thermometer, stirrer, and condenser. The mixture was placed in a equipped flask, and the mixture was gradually heated to 140 ° C. over about 5 hours in a dry nitrogen stream while paying attention to sudden foaming of carbon dioxide gas generated by the reaction. The mixture was kept at 140 ° C. for 8 hours to obtain a polyamideimide resin solution having a number average molecular weight of 27,000.
This solution was diluted with N-methyl-2-pyrrolidone to obtain a paint (resin concentration: 31% by mass).
(比較例2)
4,4′-ジアミノジフェニルエーテル60.1g(0.3モル)及び無水トリメリット酸115.3g(0.6モル)とN-メチル-2-ピロリドン263.1gを温度計、攪拌機、冷却管を備えたフラスコに仕込み、この混合物を乾燥させた窒素気流中で、約1時間かけて徐々に80℃まで昇温し、80℃にて1時間保温し、イミドジカルボン酸(0.3モル)を得た。
さらに、この反応液に(a)成分として無水トリメリット酸134.5g(0.70モル)及び(c)成分としてジフェニルメタン−4,4'−ジイソシアネート255.3g(1.02モル)とN-メチル-2-ピロリドン584.7gを仕込み、反応により生ずる炭酸ガスの急激な発泡に注意しながら約7時間かけて除々に昇温して140℃まで昇温した後、7時間反応させて数平均分子量が27,300のポリアミドイミド樹脂の溶液を得た。
得られた溶液をN-メチル-2-ピロリドンで希釈し、耐熱性塗料(樹脂分濃度:30質量%)を得た。
(Comparative Example 2)
60.1 g (0.3 mol) of 4,4'-diaminodiphenyl ether, 115.3 g (0.6 mol) of trimellitic anhydride and 263.1 g of N-methyl-2-pyrrolidone were added to a thermometer, stirrer and condenser. The prepared flask was charged, and the mixture was gradually heated to 80 ° C. over about 1 hour in a dried nitrogen stream, and kept at 80 ° C. for 1 hour, and imidodicarboxylic acid (0.3 mol) was added. Obtained.
Further, in this reaction solution, 134.5 g (0.70 mol) of trimellitic anhydride as component (a) and 255.3 g (1.02 mol) of diphenylmethane-4,4′-diisocyanate as component (c) and N − Methyl-2-pyrrolidone (584.7 g) was charged, gradually increased in temperature over about 7 hours, paying attention to the sudden bubbling of carbon dioxide gas generated by the reaction, heated up to 140 ° C., and reacted for 7 hours. A solution of polyamideimide resin having a molecular weight of 27,300 was obtained.
The obtained solution was diluted with N-methyl-2-pyrrolidone to obtain a heat-resistant paint (resin concentration: 30% by mass).
(比較例3)
4,4′−ジアミノジフェニルエーテル200.24g(1.0モル)、および反応溶媒としてN−メチル-2-ピロリドン1673.4gを温度計、攪拌機、冷却管を備えたフラスコに仕込み、この混合物を乾燥させた窒素気流中、室温(25℃)で攪拌溶解し、ピロメリット酸二無水物[商標名:PMDA-M、三菱瓦斯化学工業株式会社製]酸二無水物218.12g(1.0モル)を加え、30℃以下で5時間反応させ、数平均分子量22,700のポリアミド酸の溶液(固形分濃度:20質量%)を得た。これを塗料として用いた。
(Comparative Example 3)
200.24 g (1.0 mol) of 4,4′-diaminodiphenyl ether and 1673.4 g of N-methyl-2-pyrrolidone as a reaction solvent were charged into a flask equipped with a thermometer, a stirrer and a condenser, and the mixture was dried. In a nitrogen stream, the solution was stirred and dissolved at room temperature (25 ° C.) and pyromellitic dianhydride [trade name: PMDA-M, manufactured by Mitsubishi Gas Chemical Industries, Ltd.] Acid dianhydride 218.12 g (1.0 mol) ) And reacted at 30 ° C. or lower for 5 hours to obtain a polyamic acid solution (solid content concentration: 20 mass%) having a number average molecular weight of 22,700. This was used as a paint.
[塗膜作製条件]
上記で得られた実施例1〜3及び比較例1〜3で得られた樹脂溶液をガラス板に塗布、乾燥し塗膜を得た。塗膜の作製条件を表1に示した。
[Coating film preparation conditions]
The resin solutions obtained in Examples 1 to 3 and Comparative Examples 1 to 3 obtained above were applied to a glass plate and dried to obtain a coating film. The conditions for producing the coating film are shown in Table 1.
[測定条件]
上記で得られた塗膜を表2に示す測定条件で、引張試験を行い、破断伸度(破断伸び)、引張強度を測定し、その結果を纏めて表3に示した。
[Measurement condition]
The coating film obtained above was subjected to a tensile test under the measurement conditions shown in Table 2, and the breaking elongation (breaking elongation) and tensile strength were measured. The results are summarized in Table 3.
表3から、実施例1〜3の式(I)で示される4,4′-(m-フェニレンジイソプロピリデン)イミドジカルボン酸を用いた耐熱性ポリアミドイミド系樹脂から得られた塗膜は、比較例1、2の従来ポリアミドイミド樹脂より得られた塗膜と比較して、伸び率が著しく優れており、また比較例3のポリイミド樹脂より得られた塗膜と比較してほぼ同等の伸び率と引張強度の特性バランスを有していることがわかる。 From Table 3, the coating film obtained from the heat-resistant polyamide-imide resin using 4,4 ′-(m-phenylenediisopropylidene) imide dicarboxylic acid represented by the formula (I) of Examples 1 to 3, Compared with the coating film obtained from the conventional polyamideimide resin of Comparative Examples 1 and 2, the elongation is remarkably excellent, and the elongation is almost equivalent as compared with the coating film obtained from the polyimide resin of Comparative Example 3. It can be seen that there is a balance between properties of tensile strength and tensile strength.
Claims (8)
(b)式(I)で示される4,4′-(m-フェニレンジイソプロピリデン)イミドジカルボン酸及び
(B) 4,4 ′-(m-phenylenediisopropylidene) imide dicarboxylic acid represented by the formula (I) and
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| JP2012171979A (en) * | 2011-02-17 | 2012-09-10 | Hitachi Chemical Co Ltd | Resin composition for electric insulation, and enamel wire |
| JP2020186208A (en) * | 2019-05-15 | 2020-11-19 | ユニチカ株式会社 | Diimide dicarboxylic acid and epoxy resin cured product based on the same |
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| JP2012171979A (en) * | 2011-02-17 | 2012-09-10 | Hitachi Chemical Co Ltd | Resin composition for electric insulation, and enamel wire |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2012171979A (en) * | 2011-02-17 | 2012-09-10 | Hitachi Chemical Co Ltd | Resin composition for electric insulation, and enamel wire |
| JP2020186208A (en) * | 2019-05-15 | 2020-11-19 | ユニチカ株式会社 | Diimide dicarboxylic acid and epoxy resin cured product based on the same |
| JP7229527B2 (en) | 2019-05-15 | 2023-02-28 | ユニチカ株式会社 | Diimidodicarboxylic acid and cured epoxy resin using the same |
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