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JP2010203944A - Substrate inspecting apparatus - Google Patents

Substrate inspecting apparatus Download PDF

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JP2010203944A
JP2010203944A JP2009050420A JP2009050420A JP2010203944A JP 2010203944 A JP2010203944 A JP 2010203944A JP 2009050420 A JP2009050420 A JP 2009050420A JP 2009050420 A JP2009050420 A JP 2009050420A JP 2010203944 A JP2010203944 A JP 2010203944A
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substrate
inspection apparatus
levitation
mechanisms
defect inspection
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Kenji Nose
健二 野瀬
Masaki Kono
正樹 河野
Yasuo Toda
保男 戸田
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

【課題】基板をエア浮上搬送する際に基板浮上機構間の乗り移りで発生する基板のばたつきを抑え、超高分解能カメラの被写体深度から外れない基板浮上機構を備えた基板検査装置を提供する。
【解決手段】基板を搬送する基板搬送部と搬送された基板の欠陥を検査する欠陥検査部とを具備する基板検査装置において、基板搬送部に設置された基板を浮上させる複数の基板浮上機構を有し、基板浮上機構が欠陥検査部において搬送方向に対して互い違いに配置されており、互い違いに配置された基板浮上機構間で基板の表面を撮像して欠陥を検出する欠陥検査装置を具備することを特徴とする基板検査装置。
【選択図】図5
Provided is a substrate inspection apparatus provided with a substrate floating mechanism that suppresses fluttering of the substrate that occurs due to transfer between substrate floating mechanisms when the substrate is floated and conveyed by air, and does not deviate from the subject depth of an ultra-high resolution camera.
In a substrate inspection apparatus comprising a substrate transport unit for transporting a substrate and a defect inspection unit for inspecting a defect of the transported substrate, a plurality of substrate levitation mechanisms for levitating a substrate installed in the substrate transport unit are provided. And a substrate floating mechanism is alternately arranged in the defect inspection section with respect to the transport direction, and a defect inspection apparatus for detecting defects by imaging the surface of the substrate between the alternately arranged substrate floating mechanisms is provided. A substrate inspection apparatus.
[Selection] Figure 5

Description

本発明は、例えば液晶ディスプレイパネルやプラズマディスプレイパネル等に用いられるガラス基板やカラーフィルタなどを検査する基板検査装置に関するものである。   The present invention relates to a substrate inspection apparatus for inspecting a glass substrate, a color filter, and the like used in, for example, a liquid crystal display panel and a plasma display panel.

近年の液晶ディスプレイパネルやプラズマディスプレイパネル等のフラットパネルディスプレイの大型化、薄型化に伴い、製造工程における基板の搬送方法として、従来は図9に示すように基板2を円柱状の回転シャフト40に設けられた多数の回転ローラ41上を搬送する方法が主に用いられてきたが、例えば、搬送中の基板の重さによる撓みや、搬送時の上下変動等により、基板がローラに衝突してしまうことや、アライメント時による擦傷といった様々な問題が顕在化してきた。   With the recent increase in size and thickness of flat panel displays such as liquid crystal display panels and plasma display panels, as a method for transporting a substrate in a manufacturing process, a substrate 2 is conventionally converted to a cylindrical rotating shaft 40 as shown in FIG. A method of transporting a plurality of rotating rollers 41 provided has been mainly used. For example, the substrate collides with the rollers due to bending due to the weight of the substrate being transported, vertical fluctuation during transport, or the like. And various problems such as scratches caused by alignment have become apparent.

この様な、基板の損傷を回避するために、基板の重さによる撓みや搬送中の上下振動が大きい大型基板に関してはローラを用いたコンベア搬送に替えて、基板全面をエアによって浮上させ非接触に搬送する技術が開発されている(特許文献1)。   In order to avoid such damage to the substrate, the large substrate with large deflection due to the weight of the substrate and large vertical vibration during transportation is replaced with conveyor transportation using rollers, and the entire surface of the substrate is floated by air and contactless. A technique for transporting the sheet to the surface has been developed (Patent Document 1).

また、例えばフラットパネルディスプレイに用いられるカラーフィルター等では、製造工程において欠陥等の検査が行われている。近年では、画面の高精細化が進み、これに伴って検査機自体も高性能なものが求められている。例えば、5μm以下の欠陥を検査するような場合、分解能が3μm以下の超高分解能カメラを用いた検査機が品質保証の点から必須となってきている。   In addition, for example, color filters used for flat panel displays are inspected for defects in the manufacturing process. In recent years, screens have become higher definition, and accordingly, inspection machines themselves are required to have high performance. For example, when inspecting defects of 5 μm or less, an inspection machine using an ultra-high resolution camera with a resolution of 3 μm or less has become essential from the viewpoint of quality assurance.

そこで、前記のように搬送面とは接触しない、エア浮上による搬送が行われるようになった。しかしながら、当初の非接触エア浮上搬送技術は基板をエアの吹き出しにより基板を浮上させるだけであったので、基板の浮上精度むらが大きく、搬送中の浮上むらから基板の上下変動が起きてしまい、検査面が検査用カメラの被写体深度から外れてしまう問題があった。そこで基板の浮上に関するこのような問題の解決策として、特許文献2に記載されるような、エアの吹き出しと同時に吸い込みを行うことで、浮上量の変動をエアの吸引力によって抑える基板浮上機構が開発された。   Therefore, as described above, conveyance by air levitation that does not come into contact with the conveyance surface has been performed. However, since the original non-contact air levitation transfer technology only lifted the substrate by blowing out air, the substrate floating accuracy variation is large, and the substrate fluctuates up and down due to the levitation variation during transfer, There has been a problem that the inspection surface deviates from the subject depth of the inspection camera. Therefore, as a solution to such a problem related to the floating of the substrate, there is a substrate floating mechanism that suppresses fluctuations in the floating amount by the air suction force, as described in Patent Document 2, by performing suction simultaneously with air blowing. It has been developed.

上記の技術において、エア搬送による浮上むらは解消され、安定した浮上精度にて基板を浮上させることが可能になった。しかし、基板の欠陥検査において、例えば透過照明を用いた検査カメラで撮像する際に、前記基板浮上機構を並べて設置し基板浮上機構間で撮像しなければならない。また反射照明を用いる際でも、例えば基板浮上機構の映し込みによる擬似欠陥といった誤検出を防ぐために透過照明を使用する場合と同様に基板浮上機構間の隙間を利用して撮像しなければならない。従って、欠陥検査装置においては基板浮上機構を切り離して基板浮上機構と基板浮上機構間の隙間を有する構造とする必要がある。   In the above technique, the flying unevenness due to the air conveyance is eliminated, and the substrate can be floated with stable floating accuracy. However, in substrate defect inspection, for example, when imaging is performed with an inspection camera using transmitted illumination, the substrate floating mechanisms must be installed side by side and imaged between the substrate floating mechanisms. Further, even when using reflected illumination, for example, in order to prevent false detection such as a pseudo defect due to reflection of the substrate floating mechanism, it is necessary to take an image using a gap between the substrate floating mechanisms as in the case of using transmitted illumination. Therefore, in the defect inspection apparatus, it is necessary to separate the substrate floating mechanism to have a structure having a gap between the substrate floating mechanism and the substrate floating mechanism.

前記基板浮上機構を用いた場合、基板全面が基板浮上機構上にある場合は浮上変動が抑えられ安定した浮上が可能となるが、基板を基板浮上機構間上を搬送させた場合、エアの吹き出しとエアの吸引や基板自体の撓みによって基板の搬送方向先端部及び後端部の浮上量にばたつきが起きてしまい超高分解カメラにおいては被写体深度から外れてしまうおそれがある。また、基板浮上機構上で基板を搬送させた場合においても、基板浮上機構表面全面のエア吹き出し部とエア吸引部はスポット的に配列されているために、基板がエア吹き出し部とエア吸引部を交互に乗り越える度に基板の搬送方向先端部及び後端部では基板の浮上量にばたつきが発生してしまう。   When the substrate levitation mechanism is used, if the entire surface of the substrate is on the substrate levitation mechanism, levitation fluctuation is suppressed and stable levitation is possible. However, when the substrate is transported between the substrate levitation mechanisms, air is blown out. As a result, the flying height of the front and rear ends of the substrate in the transport direction may fluctuate due to the suction of air and the deflection of the substrate itself, and the ultra-high resolution camera may deviate from the subject depth. In addition, even when the substrate is transported on the substrate floating mechanism, the air blowing portion and the air suction portion on the entire surface of the substrate floating mechanism are spot-arranged. Every time the substrate is alternately climbed, the flying height of the substrate fluctuates at the front end portion and the rear end portion in the transport direction of the substrate.

基板が前記基板浮上機構間を通過する際の浮上量のばたつきを抑えるために特許文献3記載によれば、基板浮上機構間にローラが取り付けてあり、基板の通過後下方に移動するという方法が挙げられる。   In order to suppress the variation of the floating amount when the substrate passes between the substrate levitation mechanisms, according to Patent Document 3, a roller is attached between the substrate levitation mechanisms, and the method moves downward after the substrate passes. Can be mentioned.

特開2004−279335号公報JP 2004-279335 A 特開2008−7319号公報JP 2008-7319 A 特開2006−258727号公報JP 2006-258727 A

しかしながら、基板の欠陥検査用に例えばラインセンサー型の高分解能カメラを使用し基板全面の検査を行う場合、基板浮上機構間に前記ローラを使用すると、照明の設置が難しく、また、ローラ上の基板面に関しては欠陥検査が行えないという問題が出てくる。   However, when the entire surface of the substrate is inspected using, for example, a line sensor type high resolution camera for substrate defect inspection, if the roller is used between the substrate floating mechanisms, it is difficult to install illumination, and the substrate on the roller There is a problem that defect inspection cannot be performed on the surface.

本発明は、基板をエア浮上搬送する際に基板浮上機構間の乗り移りで発生する基板のばたつきを抑え、超高分解能カメラの被写体深度から外れない基板浮上機構を備えた基板検査装置を提供することを目的とする。   The present invention provides a substrate inspection apparatus provided with a substrate floating mechanism that suppresses fluttering of the substrate that occurs due to transfer between the substrate floating mechanisms when the substrate is floated and conveyed by air, and does not deviate from the subject depth of the ultra-high resolution camera. With the goal.

本発明の請求項1の発明は、基板を搬送する基板搬送部と搬送された基板の欠陥を検査する欠陥検査部とを具備する基板検査装置において、基板搬送部に設置された基板を浮上させる複数の基板浮上機構を有し、基板浮上機構が欠陥検査部において搬送方向に対して互い違いに配置されており、互い違いに配置された基板浮上機構間で基板の表面を撮像して欠陥を検出する欠陥検査装置を具備することを特徴とする基板検査装置。   According to a first aspect of the present invention, there is provided a substrate inspection apparatus including a substrate transport unit that transports a substrate and a defect inspection unit that inspects a defect of the transported substrate. It has a plurality of substrate levitation mechanisms, and the substrate levitation mechanisms are arranged alternately in the transport direction in the defect inspection unit, and detect defects by imaging the surface of the substrate between the alternately arranged substrate levitation mechanisms. A substrate inspection apparatus comprising a defect inspection apparatus.

本発明の請求項2の発明は、基板浮上機構の基板と対向する面は多孔質体で構成された通気孔を有し、基板浮上機構内部は複数のエア吹き出し空間と複数のエア吸引空間を有し、複数のエア吹き出し空間と複数のエア吸引空間のそれぞれの空間は繋がれていることを特徴とする請求項1記載の基板検査装置である。   According to a second aspect of the present invention, the surface of the substrate floating mechanism facing the substrate has a vent hole made of a porous body, and the substrate floating mechanism includes a plurality of air blowing spaces and a plurality of air suction spaces. The substrate inspection apparatus according to claim 1, wherein the plurality of air blowing spaces and the plurality of air suction spaces are connected to each other.

本発明の請求項3の発明は、エア吹き出し空間とエア吸引空間は基板搬送方向に沿ってストライプ状に互い違いに設置されていることを特徴とする請求項1または2に記載の基板検査装置である。   According to a third aspect of the present invention, in the substrate inspection apparatus according to the first or second aspect, the air blowing space and the air suction space are alternately arranged in a stripe shape along the substrate conveyance direction. is there.

請求項1に係わる発明によれば、基板を浮上させて基板を搬送する複数の基板浮上機構を有し、基板浮上機構が欠陥検査部において搬送方向に対して互い違いに配置されていることにより、基板が基板浮上機構間を乗り移る際には、前記基板浮上機構間の隣り合った左右の基板浮上機構上にあるため、基板の浮上量のばたつきと基板の撓みを抑制し、安定した基板浮上搬送を可能とする。   According to the invention according to claim 1, the plurality of substrate levitation mechanisms that float the substrate and transport the substrate, and the substrate levitation mechanisms are alternately arranged in the defect inspection portion with respect to the transport direction, When the substrate moves between the substrate levitation mechanisms, it is on the left and right substrate levitation mechanisms that are adjacent to each other between the substrate levitation mechanisms. Is possible.

請求項2に係わる発明によれば、複数のエア吹き出し空間と複数の吸引空間が、それぞれ繋がれていることで、それぞれの空間の内圧が均一となり、基板浮上機構の基板と対向する面はエア吹き出し及び吸引を全面で均一に行うことができ安定した基板搬送を可能とする。   According to the invention according to claim 2, since the plurality of air blowing spaces and the plurality of suction spaces are connected to each other, the internal pressure of each space becomes uniform, and the surface of the substrate levitation mechanism facing the substrate is air. Blowout and suction can be performed uniformly over the entire surface, enabling stable substrate transfer.

請求項3に係わる発明によれば、基板浮上機構内部はエア吹き出し空間とエア吸引空間を有し、基板搬送方向に沿ってストライプ状にエア吹き出し空間とエア吸引空間を互い違い
に構成することで、基板搬送方向に対しエア吹き出し部とエア吸引部を交互に基板が搬送される構造ではないので、基板のばたつきを発生させることなく安定した基板搬送が可能となる。
According to the invention according to claim 3, the substrate floating mechanism has an air blowing space and an air suction space, and the air blowing space and the air suction space are alternately configured in a stripe shape along the substrate transport direction. Since the substrate is not transported alternately between the air blowing portion and the air suction portion with respect to the substrate transport direction, stable substrate transport is possible without causing the substrate to flutter.

本発明の基板浮上機構を使用した基板検査装置の構成図。The block diagram of the board | substrate inspection apparatus which uses the board | substrate floating mechanism of this invention. 本発明の基板検査装置の基板浮上機構と欠陥検査装置の配置を説明するための平面図。The top view for demonstrating arrangement | positioning of the board | substrate floating mechanism and defect inspection apparatus of the board | substrate inspection apparatus of this invention. 本発明の基板検査装置の基板浮上機構と欠陥検査装置の配置を説明するための側面図。The side view for demonstrating arrangement | positioning of the board | substrate floating mechanism and defect inspection apparatus of the board | substrate inspection apparatus of this invention. 本発明の基板浮上機構と欠陥検査装置の別の配置を示す平面図。The top view which shows another arrangement | positioning of the board | substrate floating mechanism and defect inspection apparatus of this invention. 本発明の基板検査装置の欠陥検査装置を下側から見た斜視図。The perspective view which looked at the defect inspection apparatus of the board | substrate inspection apparatus of this invention from the lower side. 本発明の基板検査装置の基板浮上機構の断面斜視図。The cross-sectional perspective view of the board | substrate floating mechanism of the board | substrate inspection apparatus of this invention. 図6のFの断面を示す図。The figure which shows the cross section of F of FIG. 図6のGの断面を示す図。The figure which shows the cross section of G of FIG. 従来のローラを用いた搬送方法を示す図。The figure which shows the conveying method using the conventional roller.

以下、本発明の実施形態である基板検査装置における基板浮上機構について図面に基づいて説明する。   Hereinafter, a substrate floating mechanism in a substrate inspection apparatus according to an embodiment of the present invention will be described with reference to the drawings.

図1は基板浮上機構を適用した基板検査装置の構成図である。   FIG. 1 is a configuration diagram of a substrate inspection apparatus to which a substrate floating mechanism is applied.

本発明に係わる基板検査装置1は、エアの吹き出し及び吸引によって基板2を一定の高さに浮上維持する複数の基板浮上機構3A−1、3B−1、3C−1を有する基板浮上機構と、基板2の一辺を固定把持する基板把持機構4と、前記基板浮上機構の一側面に隣接して設けられ前記基板把持機構4を介して前記基板2を搬送方向Xに沿った方向に搬送する基板搬送機構5と、前記基板浮上機構へのエア供給を行うエア供給部Bとエア吸引を行うエア吸引部Cとを備えた浮上制御部Aと、基板を照明する透過照明光源(図示せず)と、照明された基板を撮像する撮像カメラ15−1及び撮像カメラ15−3を備えた欠陥検査装置15と、架台36とを備えている。   The substrate inspection apparatus 1 according to the present invention includes a substrate levitation mechanism having a plurality of substrate levitation mechanisms 3A-1, 3B-1, and 3C-1 that maintain the substrate 2 at a certain height by blowing and sucking air. A substrate gripping mechanism 4 that fixedly grips one side of the substrate 2 and a substrate that is provided adjacent to one side surface of the substrate floating mechanism and transports the substrate 2 in a direction along the transport direction X via the substrate gripping mechanism 4 A floating control unit A including a transport mechanism 5, an air supply unit B that supplies air to the substrate floating mechanism, and an air suction unit C that performs air suction, and a transmission illumination light source (not shown) that illuminates the substrate A defect inspection apparatus 15 including an imaging camera 15-1 and an imaging camera 15-3 for imaging the illuminated substrate, and a gantry 36.

図2及び図3は前記基板浮上機構と前記欠陥検査装置15の配置を説明するための図で、図2は平面図、図3は側面図である。基板浮上機構は基板を搬送するローダ側には複数の基板浮上機構3A−1を備えた基板浮上機構3Aが配置され、欠陥検査装置15が設置されている欠陥検査部には複数の基板浮上機構3B−1と複数の基板浮上機構3B−2とを備えた基板浮上機構3Bと、撮像カメラ15−1と撮像カメラ15−3と透過照明光源15−2と透過照明光源15−4を備えた欠陥検査装置15が配置され、アンローダ側には複数の基板浮上機構3C−1を備えた基板浮上機構3Cが配置される。更に欠陥検査装置15が設置される欠陥検査部では、基板浮上機構は搬送方向に対して互い違いに配置されている。   2 and 3 are views for explaining the arrangement of the substrate floating mechanism and the defect inspection apparatus 15, FIG. 2 is a plan view, and FIG. 3 is a side view. In the substrate floating mechanism, a substrate floating mechanism 3A including a plurality of substrate floating mechanisms 3A-1 is arranged on the loader side that transports the substrate, and a plurality of substrate floating mechanisms are provided in a defect inspection unit in which the defect inspection apparatus 15 is installed. A substrate floating mechanism 3B including 3B-1 and a plurality of substrate floating mechanisms 3B-2, an imaging camera 15-1, an imaging camera 15-3, a transmitted illumination light source 15-2, and a transmitted illumination light source 15-4 are provided. A defect inspection apparatus 15 is disposed, and a substrate floating mechanism 3C including a plurality of substrate floating mechanisms 3C-1 is disposed on the unloader side. Further, in the defect inspection section where the defect inspection apparatus 15 is installed, the substrate floating mechanisms are alternately arranged in the transport direction.

前記基板浮上機構と前記欠陥検査装置15の配置は図2に示された例に限定されず、例えば図4は前記基板浮上機構と前記欠陥検査装置の別の配置を示すもので、ローダ側の基板浮上機構3Aと欠陥検査装置15が配置される欠陥検査部の基板浮上機構Bとの間、及び欠陥検査装置15が配置される欠陥検査部の基板浮上機構3Bとアンローダ側の基板浮上機構3Cの間をそれぞれ無くした配置としたものである。この配置によって欠陥検査装置15が配置される欠陥検査部の基板浮上機構3Bとローダ側の基板浮上機構3Aの間、及び欠陥検査装置15が配置される欠陥検査部の基板浮上機構3Bとアンローダ側の基板浮上機構3Cの間における基板のばたつきは一層抑制される。   The arrangement of the substrate floating mechanism and the defect inspection apparatus 15 is not limited to the example shown in FIG. 2. For example, FIG. 4 shows another arrangement of the substrate floating mechanism and the defect inspection apparatus. Between the substrate floating mechanism 3A and the substrate floating mechanism B of the defect inspection part where the defect inspection apparatus 15 is arranged, and between the substrate floating mechanism 3B of the defect inspection part where the defect inspection apparatus 15 is arranged and the substrate floating mechanism 3C on the unloader side. The arrangement is such that there is no gap between them. With this arrangement, the substrate floating mechanism 3B of the defect inspection unit where the defect inspection apparatus 15 is arranged and the substrate floating mechanism 3A on the loader side, and the substrate floating mechanism 3B of the defect inspection unit where the defect inspection apparatus 15 is arranged and the unloader side are arranged. Fluttering of the substrate between the substrate floating mechanisms 3C is further suppressed.

欠陥検査装置15は撮像カメラ15−1と透過用照明光源15−2、及び撮像カメラ15−3と透過用照明光源15−4を有し、撮像カメラ15−1と透過用照明光源15−2、及び撮像カメラ15−3と透過用照明光源15−4は、それぞれ基板浮上機構間D及び基板浮上機構間Eに設けられる。透過用照明光源15−2と透過用照明光源15−4によって照明された基板の表面を撮像カメラ15−1と撮像カメラ15−3で撮像し、撮像した画像を画像処理装置(図示せず)によって画像処理し、欠陥を検出する。   The defect inspection apparatus 15 includes an imaging camera 15-1 and a transmission illumination light source 15-2, and an imaging camera 15-3 and a transmission illumination light source 15-4. The imaging camera 15-1 and the transmission illumination light source 15-2 are provided. The imaging camera 15-3 and the transmission illumination light source 15-4 are provided between the substrate floating mechanism D and the substrate floating mechanism E, respectively. The surface of the substrate illuminated by the transmissive illumination light source 15-2 and the transmissive illumination light source 15-4 is imaged by the imaging camera 15-1 and the imaging camera 15-3, and the captured image is an image processing device (not shown). To process the image and detect defects.

図5は図1の基板検査装置1の欠陥検査装置15を装置下側から見た斜視図であり、基板2の厚みや浮上量を誇張している。   FIG. 5 is a perspective view of the defect inspection apparatus 15 of the substrate inspection apparatus 1 of FIG. 1 as viewed from the lower side of the apparatus, and exaggerates the thickness and flying height of the substrate 2.

本発明の欠陥検査装置15が設置される欠陥検査部の基板浮上機構は、図5では、基板浮上機構20、21、22、23,24,25、26であって、それらは互い違いに配置されており、前記基板浮上機構間の下方には透過用照明光源15−2及び透過用照明光源15−4が配置され、上方にはガントリー17に撮像カメラ15−1、撮像カメラ15−3が取り付けられている。基板2は搬送方向Xに搬送され基板浮上機構間上を基板が通過する際に、前記撮像カメラ15−1、撮像カメラ15−3により基板2の被検査面が撮像され、欠陥検出が行われる。撮像カメラ15−1、撮像カメラ15−3としては、例えば複数のラインセンサカメラを用いて基板の幅方向の全ての領域を撮像して、更に基板をX方向に搬送することによって基板の全面が検査される。   In FIG. 5, the substrate floating mechanisms of the defect inspection unit in which the defect inspection apparatus 15 of the present invention is installed are the substrate floating mechanisms 20, 21, 22, 23, 24, 25, and 26, which are alternately arranged. A transmission illumination light source 15-2 and a transmission illumination light source 15-4 are arranged below the substrate floating mechanism, and an imaging camera 15-1 and an imaging camera 15-3 are attached to the gantry 17 above. It has been. When the substrate 2 is transported in the transport direction X and the substrate passes between the substrate floating mechanisms, the surface to be inspected of the substrate 2 is imaged by the imaging camera 15-1 and the imaging camera 15-3, and defect detection is performed. . As the imaging camera 15-1 and the imaging camera 15-3, for example, a plurality of line sensor cameras are used to image all the regions in the width direction of the substrate, and the substrate is transported in the X direction so that the entire surface of the substrate is covered. Inspected.

基板2を照明する光源は、前記透過用照明光源に限定されず、例えば反射用光源を基板2に対して撮像カメラと同じ側に設けてもよい。照明光源は、検出したい欠陥のコントラストが透過あるいは反射のどちらが高いかによって適宜選択すればよい。   The light source that illuminates the substrate 2 is not limited to the transmissive illumination light source. For example, a reflection light source may be provided on the same side as the imaging camera with respect to the substrate 2. The illumination light source may be appropriately selected depending on whether the contrast of the defect to be detected is higher in transmission or reflection.

基板を浮上搬送させる場合、基板浮上機構間では基板自体の重みで撓みが発生してしまうが、上記の基板浮上機構を互い違いに配置することで、例えば、基板浮上機構20及び基板浮上機構21の間16を基板2が乗り移る際には、前記基板浮上機構20及び前記基板浮上機構21の隣り合った左右に配置されている基板浮上機構22及び基板浮上機構23からのエアの吹き出しと吸引により基板2自体の重みを支持し、安定した高精度の浮上搬送が可能となる。   When the substrate is floated and conveyed, the substrate floating mechanism may be bent due to the weight of the substrate itself. However, by alternately arranging the substrate floating mechanisms described above, for example, the substrate floating mechanism 20 and the substrate floating mechanism 21 When the substrate 2 is transferred between the substrate 16 and the substrate levitation mechanism 20 and the substrate levitation mechanism 21, the substrate levitation mechanism 22 and the substrate levitation mechanism 22 disposed on the left and right sides of the substrate levitation mechanism 23 are blown and sucked by air. 2 supports the weight of itself and enables stable and highly accurate floating transportation.

欠陥検査部の基板浮上機構3Bの基板浮上機構は上記構造とするが、ローダ側の基板浮上機構3Aと、アンローダ側の基板浮上機構3Cは基板を搬送する機能を満足させればよく、基板浮上機構を上記のように互い違いに配置しなくてもよい。   The substrate levitation mechanism of the substrate levitation mechanism 3B of the defect inspection unit has the above structure, but the substrate levitation mechanism 3A on the loader side and the substrate levitation mechanism 3C on the unloader side only need to satisfy the function of transporting the substrate. The mechanisms do not have to be staggered as described above.

次に、前記基板浮上機構について図6、図7、図8を用いて説明する。なお図6は基板浮上機構の断面斜視図、図7は図6のFの断面を示す図、図8は図6のGの断面を示す図であり、理解を容易にするために基板2の厚み及び浮上量を誇張している。   Next, the substrate floating mechanism will be described with reference to FIGS. 6 is a cross-sectional perspective view of the substrate floating mechanism, FIG. 7 is a cross-sectional view of FIG. 6F, and FIG. 8 is a cross-sectional view of FIG. 6G. The thickness and flying height are exaggerated.

本発明の基板検査機1における基板浮上機構は矩形状の中空構造体であり、基板2と対向する面3aは無数の微細な孔の開いた板状の多孔質体(例えば、多孔質カーボンや金属焼結体等)で形成されている。この面3aは中空空間6に接続されている。中空空間6は配管9を通じて圧縮エアを加えることによって、面3aの全域に均一な上向きの空気流10を形成することができる。この上向きの空気流10によって基板2を僅かに浮上させることが可能となる。配管9は図1に示される圧空経路31、マニホールド32、圧力調整弁35を介して、エアフィルタを有した圧力ポンプ(図示せず)に連結されている。   The substrate floating mechanism in the substrate inspection machine 1 of the present invention is a rectangular hollow structure, and the surface 3a facing the substrate 2 has a plate-like porous body with numerous fine holes (for example, porous carbon or Metal sintered body). This surface 3 a is connected to the hollow space 6. The hollow space 6 can form a uniform upward air flow 10 over the entire surface 3 a by applying compressed air through the pipe 9. The upward air flow 10 makes it possible to slightly lift the substrate 2. The pipe 9 is connected to a pressure pump (not shown) having an air filter via the pressure air path 31, the manifold 32, and the pressure regulating valve 35 shown in FIG.

また、基板浮上機構において面3aは中空空間7に接続されている。中空空間7は前記中空空間6とは導通しておらず開口部11と通じてチャンバー8と接続されている。前記
チャンバー8は配管12に接続され、配管12と通じてエアの吸引を行うことにより、中空空間7の内圧を下げることで、前記基板2の浮上量を高精度で維持することが可能となる。配管12は吸引経路30とボールバルブ33を介してブロアーポンプ34に連結されている。
Further, the surface 3 a is connected to the hollow space 7 in the substrate floating mechanism. The hollow space 7 is not electrically connected to the hollow space 6 and is connected to the chamber 8 through the opening 11. The chamber 8 is connected to the pipe 12, and by sucking air through the pipe 12, the internal pressure of the hollow space 7 is lowered, so that the flying height of the substrate 2 can be maintained with high accuracy. . The pipe 12 is connected to a blower pump 34 via a suction path 30 and a ball valve 33.

基板浮上機構の内部は複数の中空空間6と複数の中空空間7とが互い違いにストライプ状に配置されている。中空空間6はバイパス13aを通じて基板浮上機構内全ての中空空間と導通している。複数の中空空間6のうち少なくとも一つは配管9に接続するためにバイパス13bが配置されている。   In the substrate floating mechanism, a plurality of hollow spaces 6 and a plurality of hollow spaces 7 are alternately arranged in a stripe shape. The hollow space 6 is electrically connected to all the hollow spaces in the substrate floating mechanism through the bypass 13a. At least one of the plurality of hollow spaces 6 is provided with a bypass 13 b for connection to the pipe 9.

基板浮上機構の内部の中空空間6と中空空間7が基板2の搬送方向に沿う形でストライプ状に構成されることで、基板浮上機構上を通過する基板2は常にエアが吹き出される領域とエアが吸引される領域が搬送方向に対し一定となり、基板端部でのばたつきが発生せず、安定した高精度の基板搬送が可能となる。   Since the hollow space 6 and the hollow space 7 inside the substrate floating mechanism are configured in a stripe shape along the transport direction of the substrate 2, the substrate 2 passing over the substrate floating mechanism is always a region where air is blown out. The area where air is sucked is constant in the transport direction, and no fluttering occurs at the substrate edge, enabling stable and highly accurate substrate transport.

基板浮上機構は欠陥検査装置3Bでは上記構造とするが、ローダ側の部分の基板浮上機構3Aと、アンローダ側の部分の基板浮上機構3Cでは基板を搬送する機能を満足させればよく、上記基板浮上機構の構造でなくても良い。言い換えれば、中空空間6と前記中空空間7が必ずしも基板の搬送方向に沿う形でストライプ状でなくても良い。   The substrate floating mechanism has the above structure in the defect inspection apparatus 3B. However, the substrate floating mechanism 3A on the loader side and the substrate floating mechanism 3C on the unloader side may satisfy the function of transporting the substrate. The structure of the levitation mechanism is not necessary. In other words, the hollow space 6 and the hollow space 7 do not necessarily have a stripe shape along the substrate transport direction.

このように、発明の基板浮上機構を有した基板検査装置によれば、基板の浮上変動を抑制し安定した搬送が可能であり、基板浮上機構間で検査をすることによって基板のばたつきによる欠陥の誤検出を防ぎ高精度な欠陥検査行うことが可能となる。   As described above, according to the substrate inspection apparatus having the substrate floating mechanism of the invention, it is possible to suppress the floating variation of the substrate and stably convey the defect, and the defect caused by the flapping of the substrate can be obtained by performing the inspection between the substrate floating mechanisms. It is possible to prevent erroneous detection and perform highly accurate defect inspection.

1・・・基板検査装置
2・・・基板
4・・・基板把持機構
5・・・基板搬送機構
6・・・中空空間
7・・・中空空間
8・・・チャンバー
9・・・配管
10・・・均一な上向きの空気流
11・・・開口部
12・・・配管
15・・・欠陥検査装置
15−1・・・撮像カメラ
15−2・・・透過用照明光源
15−3・・・撮像カメラ
15−4・・・透過用照明光源
16・・・基板浮上機構の間
17・・・ガントリー
20・・・基板浮上機構
21・・・基板浮上機構
22・・・基板浮上機構
23・・・基板浮上機構
24・・・基板浮上機構
25・・・基板浮上機構
26・・・基板浮上機構
30・・・吸引経路
31・・・圧空経路
32・・・マニホールド
33・・・ボールバルブ
34・・・ブロアーポンプ
35・・・圧力調整弁
36・・・架台
A・・・浮上制御部
B・・・エア供給部
C・・・エア吸引部
D・・・基板浮上機構間
E・・・基板浮上機構間
3A・・・ローダ側に配置された複数の基板浮上機構
3B・・・欠陥検査部に配置された複数の基板浮上機構
3C・・・アンローダ側配置された複数の基板浮上機構
3A−1・・・ローダ側に配置された基板浮上機構
3B−1・・・欠陥検査部に配置された基板浮上機構
3B−2・・・欠陥検査部に配置された基板浮上機構
3C−1・・・アンローダ側配置された基板浮上機構
3a・・・基板と対向する面
13a・・・バイパス
13b・・・バイパス
X・・・搬送方向
40・・・円柱状の回転シャフト
41・・・多数の回転ローラ
DESCRIPTION OF SYMBOLS 1 ... Board | substrate inspection apparatus 2 ... Board | substrate 4 ... Board | substrate holding | grip mechanism 5 ... Substrate conveyance mechanism 6 ... Hollow space 7 ... Hollow space 8 ... Chamber 9 ... Piping 10 .... Uniform upward air flow 11 ... opening 12 ... pipe 15 ... defect inspection device 15-1 ... imaging camera 15-2 ... transmission illumination light source 15-3 ... Imaging camera 15-4... Illumination light source for transmission 16... Between substrate floating mechanism 17... Gantry 20 .. substrate floating mechanism 21 .. substrate floating mechanism 22. -Substrate levitation mechanism 24-Substrate levitation mechanism 25-Substrate levitation mechanism 26-Substrate levitation mechanism 30-Suction path 31-Pressure air path 32-Manifold 33-Ball valve 34 .... Blower pump 35 ... Pressure adjustment valve 36 ... Base A ... Upper control unit B ... Air supply unit C ... Air suction unit D ... Between substrate levitation mechanisms E ... Between substrate levitation mechanisms 3A ... Multiple substrate levitation mechanisms 3B arranged on the loader side ..Multiple substrate levitation mechanisms 3C arranged in the defect inspection unit, multiple substrate levitation mechanisms 3A-1 arranged on the unloader side, and substrate levitation mechanisms 3B-1 arranged on the loader side Substrate levitation mechanism 3B-2 arranged in the inspection unit ... Substrate levitation mechanism 3C-1 arranged in the defect inspection unit ... Substrate levitation mechanism 3a arranged on the unloader side ... Surface 13a facing the substrate .... Bypass 13b ... Bypass X ... Conveying direction 40 ... Cylindrical rotating shaft 41 ... Many rotating rollers

Claims (3)

基板を搬送する基板搬送部と搬送された基板の欠陥を検査する欠陥検査部とを具備する基板検査装置において、基板搬送部に設置された基板を浮上させる複数の基板浮上機構を有し、基板浮上機構が欠陥検査部において搬送方向に対して互い違いに配置されており、互い違いに配置された基板浮上機構間で基板の表面を撮像して欠陥を検出する欠陥検査装置を具備することを特徴とする基板検査装置。   In a substrate inspection apparatus comprising a substrate transfer unit for transferring a substrate and a defect inspection unit for inspecting a defect of the transferred substrate, the substrate inspection apparatus has a plurality of substrate floating mechanisms for floating the substrate installed in the substrate transfer unit, The levitation mechanism is alternately arranged in the defect inspection section with respect to the transport direction, and includes a defect inspection apparatus that detects defects by imaging the surface of the substrate between the alternately arranged substrate levitation mechanisms. Substrate inspection device. 基板浮上機構の基板と対向する面は多孔質体で構成された通気孔を有し、基板浮上機構内部は複数のエア吹き出し空間と複数のエア吸引空間を有し、複数のエア吹き出し空間と複数のエア吸引空間のそれぞれの空間は繋がれていることを特徴とする請求項1記載の基板検査装置。   The surface of the substrate levitation mechanism that faces the substrate has a ventilation hole made of a porous body, the substrate levitation mechanism has a plurality of air blowing spaces and a plurality of air suction spaces, and a plurality of air blowing spaces and a plurality of air blowing spaces. The board inspection apparatus according to claim 1, wherein each of the air suction spaces is connected. エア吹き出し空間とエア吸引空間は基板搬送方向に沿ってストライプ状に互い違いに設置されていることを特徴とする請求項1または2に記載の基板検査装置。   3. The substrate inspection apparatus according to claim 1, wherein the air blowing space and the air suction space are alternately arranged in a stripe shape along the substrate conveyance direction.
JP2009050420A 2009-03-04 2009-03-04 Substrate inspecting apparatus Pending JP2010203944A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109643649A (en) * 2016-08-29 2019-04-16 株式会社日本制钢所 Laser irradiation apparatus, laser irradiation method, and semiconductor device manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109643649A (en) * 2016-08-29 2019-04-16 株式会社日本制钢所 Laser irradiation apparatus, laser irradiation method, and semiconductor device manufacturing method
CN109643649B (en) * 2016-08-29 2023-07-14 Jsw阿克迪纳系统有限公司 Laser irradiation device, laser irradiation method, and semiconductor device manufacturing method

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