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JP2010100878A - Substantially hydrogen-free low chromium-containing dlc film and sliding component - Google Patents

Substantially hydrogen-free low chromium-containing dlc film and sliding component Download PDF

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JP2010100878A
JP2010100878A JP2008271677A JP2008271677A JP2010100878A JP 2010100878 A JP2010100878 A JP 2010100878A JP 2008271677 A JP2008271677 A JP 2008271677A JP 2008271677 A JP2008271677 A JP 2008271677A JP 2010100878 A JP2010100878 A JP 2010100878A
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dlc film
film
hydrogen
chromium
sliding
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JP5200849B2 (en
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Junichi Noshiro
淳一 野城
Kenichi Sukai
賢一 須貝
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Nachi Fujikoshi Corp
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Abstract

【課題】高速摺動下においても高負荷に耐え得る実質的に水素を含有しない低クロム含有DLC(ダイヤモンド状炭素)膜および実質的に水素を含有しない低クロム含有DLC膜を成膜した摺動部品を提供する。
【解決手段】DLC膜中のCr含有量をX(at%)、DLC膜の表面硬さをビッカース硬さでY(Hv)とした場合、式0.5≦X≦0.7、300≦Y<500およびY<−869X+1043の各式を満足する領域の範囲内にある実質的に水素を含有しない低クロム含有DLC膜とする。また、DLC膜と母材との間に、Crのみから成る第1の層およびCrとCとから成る第2の層を成膜した摺動部品とする。
【選択図】図3
Sliding with a low chromium-containing DLC (diamond-like carbon) film substantially free of hydrogen and a low chromium-containing DLC film substantially free of hydrogen that can withstand a high load even under high-speed sliding Provide parts.
When the Cr content in the DLC film is X (at%) and the surface hardness of the DLC film is Y (Hv) in terms of Vickers hardness, the formulas 0.5 ≦ X ≦ 0.7, 300 ≦ A low-chromium-containing DLC film that does not substantially contain hydrogen and is in the range of the region satisfying the equations of Y <500 and Y <−869X + 1043. Also, a sliding component is formed in which a first layer made of only Cr and a second layer made of Cr and C are formed between the DLC film and the base material.
[Selection] Figure 3

Description

本発明は、実質的に水素を含有せず少量のクロムを含有するDLC(ダイヤモンド状炭素)膜および該DLC膜を成膜した摺動部品に関する。   The present invention relates to a DLC (diamond-like carbon) film containing substantially no hydrogen and containing a small amount of chromium, and a sliding component on which the DLC film is formed.

地球環境保護の流れの中で、自動車や電車などの輸送機器、あるいは家電や産業機械の省エネルギー化が重要になってきている。そのため、エネルギー機関の効率を上げる開発とともに、エンジンや駆動システムなどの中にある摺動部での摩擦損失を下げる開発も重要な課題として取り組まれている。摩擦損失を低減する方策としては摺動面の低摩擦化と耐久性改善が行われており、例えばダイヤモンド状炭素(以下、DLCとする)膜の成膜が検討されており、自動車部品などの一部の産業分野では既に使用されている。   In the trend of protecting the global environment, it is important to save energy in transportation equipment such as automobiles and trains, home appliances and industrial machinery. For this reason, development that raises the efficiency of energy engines and development that reduces friction loss at sliding parts in engines and drive systems are being addressed as important issues. As a measure to reduce friction loss, the friction of the sliding surface has been reduced and the durability has been improved. For example, the formation of a diamond-like carbon (hereinafter referred to as DLC) film has been studied. It is already used in some industrial fields.

DLC膜の具体的用途としては、例えば特許文献1ではCr(クロム)を100ppm〜1%含有させたDLC膜は高硬度で耐摩耗性に優れるため、磁気ディスクの記録媒体上に発生するキズ等から保護するための保護膜として適用できる旨が開示されている。   As a specific use of the DLC film, for example, in Patent Document 1, a DLC film containing 100 ppm to 1% of Cr (chromium) has high hardness and excellent wear resistance, so that scratches generated on the recording medium of the magnetic disk, etc. It is disclosed that the present invention can be applied as a protective film for protecting from the above.

また、特許文献2では、母材上に表面硬さがビッカース硬さで500〜2000Hvの水素を含まない軟質炭素膜と、表面硬さが2000〜4000Hvの水素を含まない硬質炭素膜とを交互に4層以上成膜した上に、最上層として表面硬さが500〜2000Hvの水素を含むDLC膜を成膜することにより低摩擦で割れの発生を防止できるので、産業機械などの摺動部品や金型などの耐摩耗用工具としてDLC膜が適用できる旨が開示されている。   In Patent Document 2, a soft carbon film having a surface hardness of Vickers hardness of 500 to 2000 Hv and not containing hydrogen and a hard carbon film having a surface hardness of 2000 to 4000 Hv and not containing hydrogen are alternately formed on the base material. In addition, it is possible to prevent cracking with low friction by forming a DLC film containing hydrogen with a surface hardness of 500 to 2000 Hv as the uppermost layer on top of four or more layers. It is disclosed that a DLC film can be applied as a wear-resistant tool such as a metal mold.

特公平4−9870号公報Japanese Examined Patent Publication No. 4-9870 特開2008−1951号公報JP 2008-1951 A

しかしながら、特許文献1に開示されているDLC膜は、高硬度であるがゆえに割れやすく、高負荷環境下での使用については問題があった。   However, the DLC film disclosed in Patent Document 1 has a high hardness, so it is easily broken and has a problem in use under a high load environment.

また、特許文献2に開示されているDLC膜は、高負荷環境下においても割れの発生を防止できる旨が記載されているが、例えば自動車エンジン中の高速回転部品のような高速摺動下での高負荷にも耐え得るか否かについては何ら示唆も開示もされていない。ここで、「高速摺動」とは90m/min(1500mm/s)以上の速度で摺動する状態をいい、「高負荷」とは8.0kN(816kgf)以上の力を負荷する状態をいうものとする。   In addition, the DLC film disclosed in Patent Document 2 describes that cracking can be prevented even under a high load environment. For example, the DLC film can be used under high-speed sliding such as a high-speed rotating part in an automobile engine. There is no suggestion or disclosure as to whether or not it can withstand high loads. Here, “high-speed sliding” means a state of sliding at a speed of 90 m / min (1500 mm / s) or more, and “high load” means a state of applying a force of 8.0 kN (816 kgf) or more. Shall.

そこで、本発明の課題は前述した問題点に鑑みて、高速摺動下でも高負荷に耐え得るDLC膜および該DLC膜を成膜した摺動部品を提供することである。   In view of the above-described problems, an object of the present invention is to provide a DLC film that can withstand a high load even under high-speed sliding, and a sliding component on which the DLC film is formed.

前述した課題を解決するため、本出願人はDLC膜中のCr含有量を0〜2.0at%の範囲内で種々の成膜条件にてDLC膜を成膜して、DLC膜中のCr含有量の変化による表面硬さおよび焼付き性との関係を調査した。   In order to solve the above-described problem, the present applicant forms a DLC film under various film formation conditions within a range of Cr content in the DLC film of 0 to 2.0 at%, and then forms Cr in the DLC film. The relationship between the surface hardness and seizure property due to the change in the content was investigated.

その結果、後述する図3に示すようにDLC膜中のCr含有量が増加するほどその表面硬さが低下する、特にDLC膜中のCr含有量が原子%で0.5〜0.7at%の範囲(後述の式(1))では、その表面硬さが500Hvを境界としてDLC膜の焼付き性が大きく変化することを知得した。   As a result, as shown in FIG. 3 to be described later, the surface hardness decreases as the Cr content in the DLC film increases. In particular, the Cr content in the DLC film is 0.5 to 0.7 at% in atomic%. In the above range (formula (1) described later), it has been found that the seizure property of the DLC film greatly changes with the surface hardness being 500 Hv as a boundary.

具体的には、DLC膜の表面硬さが300Hv以上500Hv未満の範囲(後述の式(2))にあるDLC膜の焼付き性は、表面硬さが300Hv未満のDLC膜や500Hv以上のDLC膜に比べて優れていることがわかった。   Specifically, the seizure of a DLC film having a surface hardness of the DLC film in the range of 300 Hv or more and less than 500 Hv (formula (2) described later) It was found to be superior to the membrane.

また、本発明に係るDLC膜のCr含有量と表面硬さの範囲を厳密に規定するため、後述するファレックス試験結果に基いて、焼付き開始荷重が8.5kN(867kgf)未満であった試験結果の領域を除外することで後述する式(3)を導いた。   Further, in order to strictly define the range of the Cr content and the surface hardness of the DLC film according to the present invention, the seizure start load was less than 8.5 kN (867 kgf) based on the Falex test result described later. By excluding the region of the test result, the following formula (3) was derived.

そこで、本発明は、DLC膜中のCr含有量をX(at%)、その表面硬さをビッカース硬さでY(Hv)とした場合、式
0.5≦X≦0.7・・・・・(1)
300≦Y<500・・・・・(2)
Y<−869X+1043・・・(3)
の各式を満足する領域の範囲内にあり、実質的に水素を含有しない低クロム含有DLC膜とすることで、上述の問題を解決した。
Therefore, in the present invention, when the Cr content in the DLC film is X (at%) and the surface hardness is Y (Hv) in terms of Vickers hardness, the formula 0.5 ≦ X ≦ 0.7. (1)
300 ≦ Y <500 (2)
Y <−869X + 1043 (3)
The above-mentioned problem was solved by using a low-chromium-containing DLC film that is in the range of a region that satisfies the above formulas and that does not substantially contain hydrogen.

すなわち、本発明に係る低クロム含有DLC膜は、表面硬さを低減して、摺動時の凝着性を抑制しながら、高速摺動下においても高負荷に耐え得る靭性を確保できるDLC膜となった。ここで、凝着性とは摺動する相手材の表面原子との結合力によって固体同士が接着する性質をいう。そのため、摺動時の凝着性が強くなると、摺動する相手材にDLC膜が強く接着するため、結果としてDLC膜の剥離を引き起こす原因となる。   That is, the low chromium-containing DLC film according to the present invention is a DLC film that can secure toughness that can withstand a high load even under high-speed sliding while reducing surface hardness and suppressing adhesion during sliding. It became. Here, the adhesion property refers to the property that solids adhere to each other by the bonding force with the surface atoms of the mating material. For this reason, if the adhesiveness at the time of sliding becomes strong, the DLC film adheres strongly to the sliding counterpart material, and as a result, it causes peeling of the DLC film.

DLC膜中のCr含有量については上述の式(1)の範囲、すなわちその含有量を0.5〜0.7at%の範囲に限定することで、DLC膜の表面硬さを低減し、摺動時の凝着性を低減する。DLC膜中のCr含有量を限定した理由は、図3に示すように後述するファレックス試験結果によるものであるが、0.5at%未満のCr量では、DLC膜の高硬度化や内部応力の増加に起因したDLC膜の靭性低下により、高負荷環境下でDLC膜の破壊が発生し、使用に耐え難くなると考えられる。また、0.7at%を超えるCr量では、DLC膜特有の非晶質(アモルファス)構造の破壊を招く恐れがあり、摺動時の凝着性が強くなると考えられる。   Regarding the Cr content in the DLC film, the surface hardness of the DLC film is reduced by limiting the range of the above-described formula (1), that is, the content to a range of 0.5 to 0.7 at%. Reduces adhesion during movement. The reason for limiting the Cr content in the DLC film is the result of the Falex test, which will be described later, as shown in FIG. 3. However, when the Cr content is less than 0.5 at%, the hardness of the DLC film and the internal stress are increased. It is considered that the DLC film breakage occurs under a high load environment due to the decrease in the toughness of the DLC film due to the increase in the thickness, making it difficult to withstand use. On the other hand, when the Cr content exceeds 0.7 at%, the amorphous structure unique to the DLC film may be destroyed, and the adhesion during sliding is considered to be strong.

また、DLC膜の表面硬さについては上述の式(2)の範囲、すなわちその硬さをビッカース硬さで300Hv以上500Hv未満の範囲に限定することで、DLC膜に靭性を持たせることができる。DLC膜の表面硬さを限定した理由も、図3に示すように後述するファレックス試験結果によるものであるが、300Hv未満の場合、低硬度による耐摩耗性が不足すると考えられる。また、500Hv以上の場合には、DLC膜が脆性破壊する危険性が高くなると考えられる。   Moreover, about the surface hardness of a DLC film, the DLC film can be made tough by limiting the hardness to the range of the above formula (2), that is, the Vickers hardness within a range of 300 Hv or more and less than 500 Hv. . The reason for limiting the surface hardness of the DLC film is also based on the Falex test result described later as shown in FIG. 3, but it is considered that the wear resistance due to low hardness is insufficient when it is less than 300 Hv. Moreover, when it is 500 Hv or more, it is considered that the risk that the DLC film is brittlely broken increases.

請求項2に係る発明においては、鉄基合金製の母材上にCrのみから成る第1の層、CrとCとから成る第2の層および請求項1の発明に係る実質的に水素を含有しない低クロム含有DLC膜の順に成膜する摺動部品とした。そのことにより、母材と第1および第2の層と実質的に水素を含有しない低クロム含有DLC膜の間の密着性が向上する。   In the invention according to claim 2, the first layer made of only Cr, the second layer made of Cr and C on the base material made of an iron-base alloy, and substantially hydrogen according to the invention of claim 1 are used. The sliding component was formed in the order of the low-chromium-containing DLC film not containing. This improves the adhesion between the base material, the first and second layers, and the low chromium-containing DLC film that does not substantially contain hydrogen.

なお、本発明に係る低クロム含有DLC膜は、「実質的に水素を含有しない」DLC膜とした。「実質的に水素を含有しない」とは、積極的に外部から導入されたガス中の水素含有量を除外するという意味であり、ターゲットや成膜する母材等に付着しており成膜雰囲気下において当初より存在していた3at%以下の水素は「実質的に水素を含有しない」ものとする。「実質的に水素を含有しない」DLC膜は、炭化水素系等のガスを用いて成膜を行う「実質的に水素を含有する」DLC膜に比べて、その詳細なメカニズムは不明であるが、優れた耐熱性を有すると言われている。   Note that the low chromium-containing DLC film according to the present invention was a DLC film substantially free of hydrogen. “Substantially no hydrogen” means that the hydrogen content in the gas introduced from the outside is positively excluded, and it is attached to the target and the base material for film formation, etc. Below, 3 atomic% or less of hydrogen present from the beginning is assumed to be “substantially free of hydrogen”. The “substantially hydrogen-free” DLC film has a detailed mechanism unknown compared to the “substantially hydrogen-containing” DLC film formed using a hydrocarbon-based gas. It is said to have excellent heat resistance.

また、本発明に係る「鉄基合金」とは、鉄を主成分とする合金をいう。具体的には、炭素鋼(JIS G4052)や、マンガン鋼、マンガンクロム鋼、クロム鋼、ニッケルクロム鋼、ニッケルクロムモリブデン鋼、クロムモリブデン鋼などの合金鋼(JIS G4053)をいう。また、炭素工具鋼(JIS G4401)や高速度工具鋼(JIS G4403)などの工具鋼や、ステンレス鋼、および鋳鉄や鋳鋼などの鋳造材も本発明に係る「鉄基合金」に含まれる。   The “iron-based alloy” according to the present invention refers to an alloy containing iron as a main component. Specifically, carbon steel (JIS G4052) and alloy steels (JIS G4053) such as manganese steel, manganese chrome steel, chrome steel, nickel chrome steel, nickel chrome molybdenum steel, and chrome molybdenum steel. Further, tool steels such as carbon tool steel (JIS G4401) and high speed tool steel (JIS G4403), and cast materials such as stainless steel and cast iron and cast steel are also included in the “iron-based alloy” according to the present invention.

以上のべたように、本発明においては、DLC膜中のCr含有量をX(at%)、DLC膜の表面硬さをビッカース硬さでY(Hv)とした場合、式
0.5≦X≦0.7・・・・・(1)
300≦Y<500・・・・・(2)
Y<−869X+1043・・・(3)
の各式を満足する領域の範囲内にある実質的に水素を含有しない低クロム含有DLC膜とすることにより、該DLC膜の表面硬さを低下し、摺動時の凝着性を抑制しながら、高速摺動下でも高負荷に耐え得る靭性を確保できる。それによってDLC膜の耐焼付き性が向上し、長期使用に耐え得る摺動部品のコーティング(薄膜)として適用できる。
As described above, in the present invention, when the Cr content in the DLC film is X (at%) and the surface hardness of the DLC film is Vickers hardness as Y (Hv), the formula 0.5 ≦ X ≦ 0.7 (1)
300 ≦ Y <500 (2)
Y <−869X + 1043 (3)
By using a low-chromium-containing DLC film that does not substantially contain hydrogen within a range that satisfies the above formulas, the surface hardness of the DLC film is reduced and adhesion during sliding is suppressed. However, it is possible to ensure toughness that can withstand high loads even under high-speed sliding. As a result, the seizure resistance of the DLC film is improved, and it can be applied as a coating (thin film) of a sliding part that can withstand long-term use.

また、鉄基合金製の母材上にCrのみから成る第1の層、CrとCとから成る第2の層の順に成膜した後、実質的に水素を含有しない低クロム含有DLC膜を最表層として成膜した摺動部品とすることにより、母材と第1および第2の層と該DLC膜間の密着性が向上する。それによって優れた耐剥離性を有する摺動部品も提供できる。   In addition, a low-chromium-containing DLC film that does not substantially contain hydrogen is formed on a base material made of an iron-based alloy in the order of a first layer made of only Cr and a second layer made of Cr and C. Adhesion between the base material, the first and second layers, and the DLC film is improved by using the sliding component formed as the outermost layer. Thereby, a sliding component having excellent peeling resistance can also be provided.

本発明の実施の形態の一例を、図面に基づいて説明する。図1は、本発明に係る第1の層、第2の層およびDLC膜を成膜するために用いるマグネトロンスパッタリング装置の縦断面図を示す。このマグネトロンスパッタリング装置は、図示しない真空排気ポンプにつながる排気口3を介して真空に排気される真空容器1と、この真空容器1内の中央部に設けられた、被処理物(以下、ワークとする)を保持する装着冶具9と、装着冶具9の下方に取り付けられた回転治具8と、を有している。また、真空容器1内の側面部には、装着冶具9に保持されたワークの一端に向かってスパッタ粒子7を発生させるターゲット6、6´が設けられている。さらに、真空容器1の外部にはターゲット6、6´に接続されたスパッタリング電源11と、装着冶具9に保持されたワークに負のバイアス電圧を印加するワークバイアス電源10と、が設けられている。その他として、2は反応ガス導入口、4はマグネット、5はブースターコイルである。   An example of an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a longitudinal sectional view of a magnetron sputtering apparatus used for forming a first layer, a second layer, and a DLC film according to the present invention. This magnetron sputtering apparatus includes a vacuum vessel 1 that is evacuated through an exhaust port 3 connected to a vacuum exhaust pump (not shown), and a workpiece (hereinafter referred to as a workpiece) provided in the center of the vacuum vessel 1. And a rotating jig 8 attached to the lower side of the mounting jig 9. In addition, targets 6 and 6 ′ for generating sputtered particles 7 toward one end of the work held by the mounting jig 9 are provided on the side surface in the vacuum vessel 1. Further, a sputtering power supply 11 connected to the targets 6 and 6 ′ and a work bias power supply 10 for applying a negative bias voltage to the work held by the mounting jig 9 are provided outside the vacuum vessel 1. . In addition, 2 is a reactive gas inlet, 4 is a magnet, and 5 is a booster coil.

第1の層、第2の層およびDLC膜の生成過程は、イオンボンバード工程と成膜工程に分けられる。まず、イオンボンバード工程について説明する。図1に示した反応ガス導入口2から真空容器1内に充填された不活性ガスであるアルゴンは、スパッタリング電源11に負電圧を印加することによって生じたグロー放電により生成されたプラズマ中で正の電荷に帯電したアルゴンイオンとなる。それらのアルゴンイオンは、負電圧に印加されたワークに電気的に引き寄せられて、その表面に衝突してエッチング作用により表面層が物理的に除去される。その結果、以下に説明する成膜工程において、ワークと第1の層との密着性を向上させる。   The generation process of the first layer, the second layer, and the DLC film is divided into an ion bombardment process and a film formation process. First, the ion bombardment process will be described. Argon which is an inert gas filled in the vacuum vessel 1 from the reaction gas inlet 2 shown in FIG. 1 is positive in the plasma generated by glow discharge generated by applying a negative voltage to the sputtering power source 11. It becomes an argon ion charged to the electric charge. These argon ions are electrically attracted to the workpiece applied with a negative voltage, collide with the surface, and the surface layer is physically removed by the etching action. As a result, the adhesion between the workpiece and the first layer is improved in the film forming step described below.

次に成膜工程について説明する。真空容器1内にスパッタリング用のガスとして反応ガス導入口2よりアルゴンを導入した後、複数のターゲット6、6´に個々に取り付けられたスパッタリング電源11によって、各ターゲット6、6´を負電荷に印加することにより、プラズマが生成されアルゴンがイオン化される。その結果、プラズマ中にはアルゴンイオンが存在し、スパッタリング現象を利用して、そのアルゴンイオンを負の電位に印加された各ターゲット6、6´に衝突させることにより、各ターゲット6、6´材料を飛散させる。その飛散したターゲット構成粒子をマグネット4およびブースターコイル5によって、プラズマ中でさらに活性化させる。最終的には、ワークにワークバイアス電源10を用いて負のバイアス電圧を印加し、プラズマ中のイオン化した構成粒子を積極的に取り込むことでワーク表面に成膜を行う。   Next, the film forming process will be described. After introducing argon as a sputtering gas into the vacuum vessel 1 from the reaction gas inlet 2, each target 6, 6 ′ is negatively charged by a sputtering power source 11 individually attached to the plurality of targets 6, 6 ′. By applying, plasma is generated and argon is ionized. As a result, argon ions are present in the plasma, and each target 6, 6 ′ material is made to collide with each target 6, 6 ′ applied with a negative potential by utilizing the sputtering phenomenon. Scatter. The scattered target constituent particles are further activated in the plasma by the magnet 4 and the booster coil 5. Finally, a negative bias voltage is applied to the work using a work bias power source 10 to positively take in the ionized constituent particles in the plasma to form a film on the work surface.

本発明では、ワーク表面を前述したイオンボンバード工程によりクリーニングした後、Crから成るターゲット6を使用して、Cr層を0.1μmの膜厚で第1の層として成膜する。次に、Cから成るターゲット6´も同時に動作させ、Cr量を連続的に減少させると共にC量を連続的に増加させて、0.20μmの膜厚として第2の層を成膜する。第2の層の表面層におけるCr含有量は、後述するDLC膜のCr含有量と同一量とする。   In the present invention, after the work surface is cleaned by the above-described ion bombardment process, a Cr layer is formed to a thickness of 0.1 μm as a first layer using a Cr target 6. Next, the target 6 'made of C is simultaneously operated to continuously reduce the Cr amount and continuously increase the C amount to form the second layer having a thickness of 0.20 μm. The Cr content in the surface layer of the second layer is the same as the Cr content in the DLC film described later.

最後に、Cから成るターゲット6´の電源出力を7.0kWで固定しながら、Crから成るターゲット6の電源出力を0.2〜0.3kW の範囲で変化させることでDLC膜中のCr含有量を0.5〜0.7at%(原子%)の一定範囲に制御する。また、ワークへのバイアス電圧および電流で構成されるワークバイアス電力を1500W、プラズマ状態に寄与する磁界を制御するブースターコイル電流を50〜100Aの範囲に設定する。その状態でDLC膜の表面硬さをビッカース硬さで300Hv以上500Hv未満の一定範囲に制御する。   Finally, while the power output of the target 6 ′ made of C is fixed at 7.0 kW, the power output of the target 6 made of Cr is changed in the range of 0.2 to 0.3 kW, so that Cr is contained in the DLC film. The amount is controlled within a certain range of 0.5 to 0.7 at% (atomic%). Moreover, the work bias electric power comprised by the bias voltage and electric current to a workpiece | work is set to 1500W, and the booster coil electric current which controls the magnetic field which contributes to a plasma state is set to the range of 50-100A. In this state, the surface hardness of the DLC film is controlled within a certain range of 300 Vv or more and less than 500 Hv in terms of Vickers hardness.

成膜したDLC膜のCr含有量は、例えばEPMA(電子線マイクロアナリシス)やオージェ電子分光分析装置などの測定装置を用いて測定できる。また、表面硬さはマイクロビッカース硬度計などを用いて測定できる。   The Cr content of the formed DLC film can be measured using a measuring device such as an EPMA (electron beam microanalysis) or an Auger electron spectroscopic analyzer. The surface hardness can be measured using a micro Vickers hardness meter or the like.

図1の装置を用いて棒状試験片(ワーク)の表面に前述した条件にて第1の層および第2の層を成膜した後、以下の条件にてDLC膜を成膜した。
・ワークバイアス電力:1500W
・ブースターコイル電流:20〜160A
・Cから成るターゲット6´の電源出力:7.0kW
・Crから成るターゲット6の電源出力:0〜1.0kW
After the first layer and the second layer were formed on the surface of the rod-shaped test piece (work) using the apparatus shown in FIG. 1 under the conditions described above, a DLC film was formed under the following conditions.
・ Work bias power: 1500W
-Booster coil current: 20-160A
-Power output of target 6 'consisting of C: 7.0 kW
-Power output of the target 6 made of Cr: 0 to 1.0 kW

上述の条件にて成膜後、DLC膜の表面硬さが200Hv未満である棒状試験片については、低硬度による耐摩耗性不足のため実用上問題があるので、後述するファレックス試験による焼付き性評価を行わないこととした。すなわち、本実施例では表面硬さが200Hv以上のDLC膜のみを対象として、その焼付き性を評価するために以下の条件にてファレックス試験を行ったので、その結果について図2および3を用いて説明する。
・試験雰囲気:油中
・使用油種:自動車用オートマフルード油(新日本石油社製:ENEOS AT フルード )
・試験片回転速度:1750rpm(98.91m/min)
・試験片材質(母材):SCr420H材(浸炭窒化処理品)
・押圧治具材質:SNCM220材
・押圧治具表面処理:浸炭窒化処理
・試験時間(押圧時間):1分間
After the film formation under the above-mentioned conditions, there is a practical problem with a rod-shaped test piece having a surface hardness of the DLC film of less than 200 Hv due to insufficient wear resistance due to low hardness. It was decided not to perform sex evaluation. That is, in this example, only a DLC film having a surface hardness of 200 Hv or higher was subjected to a Falex test under the following conditions in order to evaluate the seizure property. It explains using.
・ Test atmosphere: in oil ・ Oil type used: Automale fluid for automobiles (manufactured by Nippon Oil Corporation: ENEOS AT fluid)
Test piece rotation speed: 1750 rpm (98.91 m / min)
-Specimen material (base material): SCr420H material (carbonitrided product)
・ Pressing jig material: SNCM220 material ・ Pressing jig surface treatment: carbonitriding process ・ Test time (pressing time): 1 minute

図2は、ファレックス試験装置の回転部分を示す拡大図である。ここでファレックス試験とは、図2に示すように回転する棒状試験片に対してV字型の押圧治具を両側から押し付けることにより、棒状試験片の焼付きが開始する荷重(焼付き開始荷重)を測定することで膜の耐焼付き性の評価を行う試験である。   FIG. 2 is an enlarged view showing a rotating portion of the Falex test apparatus. Here, the Falex test is a load that starts sticking of a bar-shaped test piece by pressing a V-shaped pressing jig from both sides against a rotating bar-shaped test piece as shown in FIG. This is a test for evaluating the seizure resistance of the film by measuring (load).

図3は、前述の棒状試験片におけるDLC膜中のCr含有量(at%)と表面硬さ(HV)の関係を、焼付き開始荷重が(1)8.5kN(867kgf)未満、(2)8.5kN(867kgf)以上10.0kN(1020kgf)未満、(3)10.0kN(1020kgf)以上の3つの場合に分けて、そのバラツキを表した図である。   FIG. 3 shows the relationship between the Cr content (at%) in the DLC film and the surface hardness (HV) in the above-described rod-shaped test piece, the seizure start load is (1) less than 8.5 kN (867 kgf), (2 ) It is a diagram showing the variation in three cases of 8.5 kN (867 kgf) or more and less than 10.0 kN (1020 kgf) and (3) 10.0 kN (1020 kgf) or more.

図3に示すように、棒状試験片の焼付き開始荷重に関わらずDLC膜中のCr含有量が増加するほどその表面硬さが低下した。また、DLC膜中のCr含有量とその表面硬さの間には相関があった。   As shown in FIG. 3, the surface hardness decreased as the Cr content in the DLC film increased regardless of the seizure start load of the bar-shaped test piece. Further, there was a correlation between the Cr content in the DLC film and its surface hardness.

その中でも、Cr含有量が0.5〜0.7at%の範囲においては、表面硬さが500Hvを境界としてファレックス試験の焼付き開始荷重の結果が大きく分かれた。すなわち、表面硬さが300Hv以上500Hv未満の範囲では焼付き開始荷重が(2)8.5kN以上10.0kN未満、および(3)10.0kN以上の結果が集中し、500Hv以上の範囲では焼付き開始荷重が(1)8.5kN未満の結果のみであった。   Among them, when the Cr content was in the range of 0.5 to 0.7 at%, the results of seizure start load of the Falex test were largely divided with the surface hardness being 500 Hv as a boundary. That is, when the surface hardness is in the range of 300 Hv to less than 500 Hv, the seizure start load is concentrated in the range of (2) 8.5 kN or more and less than 10.0 kN, and (3) 10.0 kN or more. The attached starting load was only (1) less than 8.5 kN.

以上より、本発明では、DLC膜中のCr含有量をX(at%)、DLC膜の表面硬さをビッカース硬さでY(Hv)とした場合、式
0.5≦X≦0.7・・・・・(1)
300≦Y<500・・・・・(2)
Y<−869X+1043・・・(3)
の各式を満足する領域の範囲内にある実質的に水素を含有しない低クロム含有DLC膜とすることにより、高速摺動下においても高負荷に耐え得るDLC膜を提供することができた。
From the above, in the present invention, when the Cr content in the DLC film is X (at%) and the surface hardness of the DLC film is Y (Hv) in terms of Vickers hardness, the formula 0.5 ≦ X ≦ 0.7 (1)
300 ≦ Y <500 (2)
Y <−869X + 1043 (3)
By using a low-chromium-containing DLC film that does not substantially contain hydrogen within a range that satisfies the above formulas, a DLC film that can withstand a high load even under high-speed sliding could be provided.

なお、本実施例では8.0kN、8.5kNおよび10.0kNで負荷をかけた場合、棒状試験片にかかる面圧(圧縮応力)は、ヘルツの最大接触応力式を用いると、それぞれ1731MPa、1785MPaおよび1936MPaとなる。   In this example, when a load is applied at 8.0 kN, 8.5 kN, and 10.0 kN, the surface pressure (compressive stress) applied to the rod-shaped test piece is 1731 MPa, respectively, using Hertz's maximum contact stress equation. 1785 MPa and 1936 MPa.

本発明に係る第1の層、第2の層およびDLC膜を成膜するために用いるマグネトロンスパッタリング装置の縦断面図である。It is a longitudinal cross-sectional view of the magnetron sputtering apparatus used in order to form the 1st layer, 2nd layer, and DLC film which concern on this invention. 本発明に係る実施例で用いた棒状試験片の焼付き開始荷重を測定するためのファレックス試験装置の回転部分を示す拡大図である。It is an enlarged view which shows the rotation part of the Falex testing apparatus for measuring the seizure start load of the rod-shaped test piece used in the Example which concerns on this invention. 本発明に係る実施例で用いた棒状試験片におけるDLC膜中のCr含有量(at%)と表面硬さ(Hv)の関係を、焼付き開始荷重が(1)8.5kN(867kgf)未満、(2)8.5kN(867kgf)以上10.0kN(1020kgf)未満、(3)10.0kN(1020kgf)以上の3つの場合に分けて、そのバラツキを表した図である。The relationship between the Cr content (at%) in the DLC film and the surface hardness (Hv) in the rod-shaped test pieces used in the examples according to the present invention is as follows. The seizure start load is less than (1) 8.5 kN (867 kgf). (2) It is a figure showing the variation divided into three cases of 8.5 kN (867 kgf) or more and less than 10.0 kN (1020 kgf) and (3) 10.0 kN (1020 kgf) or more.

Claims (2)

DLC(ダイヤモンド状炭素)膜中のCr(クロム)含有量をX(at%)、DLC膜の表面硬さをビッカース硬さでY(Hv)とした場合、下記の式(1)ないし(3)の各式を満足する領域の範囲内にあることを特徴とする実質的に水素を含有しない低クロム含有DLC膜。
0.5≦X≦0.7・・・・・(1)
300≦Y<500・・・・・(2)
Y<−869X+1043・・・(3)
When the Cr (chromium) content in the DLC (diamond-like carbon) film is X (at%) and the surface hardness of the DLC film is Vickers hardness, Y (Hv), the following formulas (1) to (3 A low-chromium-containing DLC film that does not substantially contain hydrogen, and is in a range of a region that satisfies each of the following formulas:
0.5 ≦ X ≦ 0.7 (1)
300 ≦ Y <500 (2)
Y <−869X + 1043 (3)
鉄基合金製の母材上にCrのみから成る第1の層、CrとCとから成る第2の層の順に成膜させた後、請求項1に記載の実質的に水素を含有しない低クロム含有DLC膜を最表層として成膜させたことを特徴とする摺動部品。
2. The low hydrogen-free material according to claim 1, wherein a first layer made only of Cr and a second layer made of Cr and C are formed in this order on a base material made of an iron-based alloy, A sliding component characterized in that a chromium-containing DLC film is formed as an outermost layer.
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