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JP2010199354A - Substrate storing container - Google Patents

Substrate storing container Download PDF

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Publication number
JP2010199354A
JP2010199354A JP2009043416A JP2009043416A JP2010199354A JP 2010199354 A JP2010199354 A JP 2010199354A JP 2009043416 A JP2009043416 A JP 2009043416A JP 2009043416 A JP2009043416 A JP 2009043416A JP 2010199354 A JP2010199354 A JP 2010199354A
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holding
substrate
semiconductor wafer
holding piece
holding groove
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Inventor
Toshitsugu Yajima
敏嗣 矢嶋
Satoshi Odajima
智 小田嶋
Kazumasa Onuki
和正 大貫
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Priority to JP2009043416A priority Critical patent/JP2010199354A/en
Publication of JP2010199354A publication Critical patent/JP2010199354A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate storing container which suppresses the rotation of holding pieces and holding grooves due to vibration and shock and can eliminate the possibility that a substrate is removed from the holding groove, it is worn out, becomes dirty and is damaged. <P>SOLUTION: The container is provided with a container body where a plurality of semiconductor wafers 1 are arranged and stored and a lid which opens and closes an opened front part of the container body so that it can freely be attached/detached. A substrate holding tool 30 holding the plurality of semiconductor wafers 1 is installed on a confronted inner face opposite to the semiconductor wafer 1 in the lid. The substrate holding tool 30 is provided with first and second holding pieces 34A and 34B which come close to the semiconductor wafer 1 from the confronted inner face direction opposite to the semiconductor wafer 1 in the lid and the holding grooves 36 which are formed in the first and second holding pieces 34A and 34B and hold the front part of the peripheral part 2 of the semiconductor wafer 1. A contact part 39 with the front part of the peripheral part 2 of the semiconductor wafer 1 in each holding groove 36 is positioned in a range of the thickness T of each of the first and second holding pieces 34A and 34B. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、半導体ウェーハ等からなる基板の収納、搬送、輸送に使用される基板収納容器に関するものである。   The present invention relates to a substrate storage container used for storing, transporting, and transporting a substrate made of a semiconductor wafer or the like.

従来の基板収納容器は、図示しないが、複数枚の半導体ウェーハを整列収納する容器本体と、この容器本体の開口した正面部をガスケットを介して着脱自在に開閉する蓋体とを備えて構成され、半導体ウェーハの収納、保管、搬送、輸送に使用されている(特許文献1、2参照)。   Although not shown, a conventional substrate storage container is configured to include a container main body for aligning and storing a plurality of semiconductor wafers, and a lid body that opens and closes the front portion of the container main body through a gasket. It is used for storing, storing, transporting and transporting semiconductor wafers (see Patent Documents 1 and 2).

容器本体は、所定の成形材料を使用してフロントオープンボックスタイプに成形され、両側壁の一部がそれぞれ内方向に向けて傾斜形成されており、この傾斜した各側壁の内面に半導体ウェーハの周縁部側方が接触する。この容器本体の両側壁内面には、半導体ウェーハの周縁部側方を水平に支持するティースがそれぞれ対設され、この左右一対のティースが容器本体の上下方向に所定のピッチで配列されている。   The container body is molded into a front open box type using a predetermined molding material, and a part of both side walls are inclined inwardly, and the periphery of the semiconductor wafer is formed on the inner surface of each inclined side wall. The side of the part touches. Teeth that horizontally support the side edges of the semiconductor wafer are provided on the inner surfaces of both side walls of the container main body, and the pair of left and right teeth are arranged at a predetermined pitch in the vertical direction of the container main body.

蓋体は、所定の成形材料を使用して容器本体の開口した正面部に嵌合可能な形に成形され、半導体ウェーハに対向する対向内面に、半導体ウェーハを保持する基板保持具が装着されている。   The lid is molded into a shape that can be fitted into the open front portion of the container body using a predetermined molding material, and a substrate holder for holding the semiconductor wafer is mounted on the inner surface facing the semiconductor wafer. Yes.

基板保持具は、図9に部分的に示すように、蓋体方向から半導体ウェーハ1方向に伸びる弾性の保持片34Dと、この保持片34Dに形成されて半導体ウェーハ1の周縁部2前方を保持する保持溝36Aとから形成されている。保持溝36Aは、保持片34Dの肉厚の中心部から半導体ウェーハ1の周縁部2前方に対向する表面側に偏位して断面V字形に切り欠かれ、保持片34Dの肉厚の中心部から離れた箇所で半導体ウェーハ1の周縁部2前方を水平に保持する。   As shown in part in FIG. 9, the substrate holder includes an elastic holding piece 34 </ b> D extending from the lid direction toward the semiconductor wafer 1, and is formed on the holding piece 34 </ b> D to hold the front of the peripheral portion 2 of the semiconductor wafer 1. The holding groove 36A is formed. The holding groove 36A is deviated from the central portion of the holding piece 34D to the front side facing the front of the peripheral portion 2 of the semiconductor wafer 1, and is cut into a V-shaped cross section. The front side of the peripheral edge 2 of the semiconductor wafer 1 is held horizontally at a location away from the center.

係る基板収納容器の容器本体に半導体ウェーハ1を整列収納して蓋体を嵌合し、容器本体を閉鎖すると、半導体ウェーハ1の周縁部2前方に基板保持具の保持溝36Aが前方から嵌合して保持する。そして、嵌合した蓋体が容器本体方向に圧入されると、一対のティース上から半導体ウェーハ1が容器本体の傾斜した側壁内面にガイドされつつ浮き上がり、半導体ウェーハ1が容器本体の傾斜した側壁内面と基板保持具の保持溝36Aとに支持される。   When the semiconductor wafer 1 is aligned and stored in the container main body of the substrate storage container, the lid is fitted, and the container main body is closed, the holding groove 36A of the substrate holder is fitted in front of the peripheral edge 2 of the semiconductor wafer 1 from the front. And hold. When the fitted lid is press-fitted in the direction of the container body, the semiconductor wafer 1 is lifted from the pair of teeth while being guided by the inclined side wall inner surface of the container main body, and the semiconductor wafer 1 is tilted to the inner side wall of the container main body. And a holding groove 36A of the substrate holder.

以上のように半導体ウェーハ1は、一対のティースから浮いた状態で基板収納容器により輸送され、ティースとの接触に伴い擦れて磨耗したり、損傷して破損するおそれが未然に防止される。   As described above, the semiconductor wafer 1 is transported by the substrate storage container in a state of being lifted from the pair of teeth, and it is possible to prevent the possibility that the semiconductor wafer 1 is rubbed and worn due to contact with the teeth or is damaged and broken.

特開2002−353301号公報JP 2002-353301 A 特開2005−320028号公報JP 2005-320028 A

従来における基板収納容器は、以上のように構成され、保持片34Dの肉厚の中心部から離れた箇所で半導体ウェーハ1の周縁部2前方を保持溝36Aが保持するので、輸送時の振動や衝撃の作用する力点が保持片34Dの肉厚の中心部から離れた箇所に存在することとなる。したがって、輸送時の振動や衝撃で保持片34Dが捩れて回転する(図10参照)と、保持溝36Aも同方向に回転するので、この保持溝36Aから半導体ウェーハ1が外れてティースと接触し、その結果、半導体ウェーハ1が擦れて磨耗したり、汚染を招いたり、あるいは破損するおそれがある。   The conventional substrate storage container is configured as described above, and the holding groove 36A holds the front of the peripheral edge 2 of the semiconductor wafer 1 at a position away from the center of the thickness of the holding piece 34D. The force point at which the impact acts exists at a location away from the center of the thickness of the holding piece 34D. Accordingly, when the holding piece 34D is twisted and rotated by vibration or impact during transportation (see FIG. 10), the holding groove 36A also rotates in the same direction, so that the semiconductor wafer 1 comes off from the holding groove 36A and comes into contact with the teeth. As a result, the semiconductor wafer 1 may be rubbed and worn, contaminated, or damaged.

本発明は上記に鑑みなされたもので、振動や衝撃で保持片や保持溝が回転するのを抑制し、保持溝から基板が外れて磨耗、汚染、破損するおそれを排除することのできる基板収納容器を提供することを目的としている。   SUMMARY OF THE INVENTION The present invention has been made in view of the above, and it is possible to suppress the rotation of the holding piece or the holding groove due to vibration or impact, and to eliminate the possibility that the substrate is detached from the holding groove to be worn, contaminated or damaged. The purpose is to provide a container.

本発明においては上記課題を解決するため、基板を収納する容器本体と、この容器本体の開口部を開閉する蓋体とを備え、この蓋体の基板に対向する対向面には、基板を保持する基板保持具を設けたものであって、
基板保持具は、基板に接近する保持片と、この保持片に形成されて基板の周縁部を保持する保持溝とを含み、この保持溝の基板の周縁部との接触部を保持片の肉厚の範囲内に位置させるようにしたことを特徴としている。
In order to solve the above-described problems, the present invention includes a container body that stores a substrate and a lid body that opens and closes the opening of the container body, and the substrate is held on a facing surface of the lid body that faces the substrate. Provided with a substrate holder,
The substrate holder includes a holding piece that approaches the substrate and a holding groove that is formed on the holding piece and holds the peripheral portion of the substrate, and the contact portion of the holding groove with the peripheral portion of the substrate is the meat of the holding piece. It is characterized by being positioned within the thickness range.

なお、基板保持具は、筐体の対向内面に設けられ、容器本体に収納された基板の周縁部に保持片を接近させる一対の保持ブロックと、各保持ブロックに設けられて基板の周縁部に接近する保持片とを含み、これら複数の保持片に、基板の周縁部を保持する保持溝をそれぞれ形成することができる。
また、基板保持具は、筐体の対向内面に設けられる支持枠体を含み、この支持枠体の相対向する両側部間に、基板の周縁部に接近する保持片を架設し、この保持片に保持溝を形成することができる。
In addition, the substrate holder is provided on the opposing inner surface of the casing, and a pair of holding blocks for bringing the holding piece closer to the peripheral portion of the substrate housed in the container body, and provided on each holding block on the peripheral portion of the substrate. A holding groove for holding the peripheral edge of the substrate can be formed in each of the plurality of holding pieces.
Further, the substrate holder includes a support frame provided on the opposing inner surface of the housing, and a holding piece that approaches the peripheral edge of the substrate is installed between opposite sides of the support frame. A holding groove can be formed on the substrate.

また、保持片の基板の周縁部に対向する表面とその反対側の裏面とにそれぞれ突出部を形成し、この複数の突出部に保持溝を形成してその最深の谷部を保持片の裏面を越えた箇所に位置させることが可能である。
さらに、保持溝と基板の周縁部との接触部を保持片の肉厚の略中心線上に位置させることも可能である。
Further, a protrusion is formed on each of the front surface of the holding piece facing the peripheral edge of the substrate and the back surface on the opposite side, and a holding groove is formed in each of the plurality of protruding portions so that the deepest trough is formed on the back surface of the holding piece. It is possible to position it at a location beyond
Furthermore, the contact portion between the holding groove and the peripheral edge portion of the substrate can be positioned on the approximate center line of the thickness of the holding piece.

ここで、特許請求の範囲における基板には、少なくともφ200、φ300、φ450mmの半導体ウェーハ、ガラス基板、マスクガラス等が含まれる。この基板は、撓み量や単数複数の数を特に問うものではない。また、容器本体と蓋体とは、透明、不透明、半透明のいずれでも良い。   Here, the substrate in the claims includes at least φ200, φ300, φ450 mm semiconductor wafer, glass substrate, mask glass, and the like. This board | substrate does not ask | require especially the amount of bending, or the number of one or more. Further, the container body and the lid may be transparent, opaque, or translucent.

容器本体は、フロントオープンボックスタイプ、上部の開口したトップオープンボックスタイプ、底部の開口したボトムオープンボックスタイプでも良い。この容器本体の上部、後部、側部には、基板観察用の透視窓や物流管理用のICタグ等を取り付けることができる。また、基板保持具の保持片は、単数複数を特に問うものではない。保持溝は、断面略U字形、略V字形、略Y字形等に適宜形成することができる。   The container body may be a front open box type, a top open box type with an open top, or a bottom open box type with an open bottom. A transparent window for substrate observation, an IC tag for physical distribution management, and the like can be attached to the upper, rear, and side portions of the container body. Moreover, the holding | maintenance piece of a board | substrate holder does not ask | require especially plural. The holding groove can be appropriately formed in a substantially U-shaped cross section, a substantially V-shaped cross section, a substantially Y-shaped cross section, or the like.

本発明によれば、保持溝と基板との接触部が保持片の肉厚の範囲内に位置するので、振動や衝撃の作用する力点が保持片の肉厚の中心部から離れた箇所に存在するのを防ぐことができる。
すなわち、振動や衝撃が基板収納容器に作用し、基板が移動しようとしても、力点が保持片の肉厚の範囲内にあるので、保持片が捩れて変形するのを抑制することができ、保持溝から基板が外れて磨耗したり、汚染を招いたり、あるいは破損するおそれを排除することができる。
According to the present invention, since the contact portion between the holding groove and the substrate is located within the thickness range of the holding piece, the force point at which vibration or impact acts exists at a location away from the central portion of the holding piece thickness. Can be prevented.
That is, even if vibration or impact acts on the substrate storage container and the substrate tries to move, the force point is within the thickness range of the holding piece, so that the holding piece can be prevented from being twisted and deformed, It is possible to eliminate the possibility that the substrate comes off from the groove and is worn, contaminated, or damaged.

本発明によれば、振動や衝撃で保持片や保持溝が回転するのを抑制し、保持溝から基板が外れて磨耗、汚染、破損するおそれを排除することができるという効果がある。
また、保持溝と基板の周縁部との接触部を保持片の肉厚の略中心線上に位置させれば、保持片が捩れて回転変形し、保持溝から基板が外れるのを抑制することができる。
According to the present invention, it is possible to suppress the rotation of the holding piece or the holding groove due to vibration or impact, and to eliminate the possibility that the substrate is detached from the holding groove to be worn, contaminated or damaged.
Further, if the contact portion between the holding groove and the peripheral edge portion of the substrate is positioned on the substantially center line of the thickness of the holding piece, the holding piece is twisted and rotationally deformed, and the substrate is prevented from being detached from the holding groove. it can.

本発明に係る基板収納容器の実施形態を模式的に示す全体斜視説明図である。It is a whole perspective explanatory view showing typically an embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の実施形態における容器本体と蓋体とを模式的に示す分解斜視説明図である。It is a disassembled perspective explanatory drawing which shows typically the container main body and cover body in embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態を模式的に示す断面説明図である。It is a section explanatory view showing typically an embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の実施形態における保持片、保持溝、及び半導体ウェーハの関係を模式的に示す説明図である。It is explanatory drawing which shows typically the relationship between the holding piece, holding groove, and semiconductor wafer in embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態における保持片の保持溝に半導体ウェーハの周縁部前方が適切に保持された状態を模式的に示す説明図である。It is explanatory drawing which shows typically the state by which the peripheral part front of the semiconductor wafer was appropriately hold | maintained at the holding groove of the holding piece in embodiment of the substrate storage container which concerns on this invention. 図5の保持片に振動や衝撃等が作用する状態を模式的に示す説明図である。It is explanatory drawing which shows typically the state in which a vibration, an impact, etc. act on the holding piece of FIG. 本発明に係る基板収納容器の実施形態における保持片、保持溝、及び半導体ウェーハとの関係を模式的に示す説明図である。It is explanatory drawing which shows typically the relationship between the holding piece in the embodiment of the substrate storage container which concerns on this invention, a holding groove, and a semiconductor wafer. 本発明に係る基板収納容器の第2の実施形態における蓋体を模式的に示す説明図である。It is explanatory drawing which shows typically the cover body in 2nd Embodiment of the substrate storage container which concerns on this invention. 従来の保持片、保持溝、及び半導体ウェーハの関係を模式的に示す説明図である。It is explanatory drawing which shows typically the relationship between the conventional holding piece, a holding groove, and a semiconductor wafer. 従来の保持片の保持溝から半導体ウェーハが外れる状態を模式的に示す説明図である。It is explanatory drawing which shows typically the state which a semiconductor wafer remove | deviates from the holding groove of the conventional holding piece.

以下、図面を参照して本発明に係る基板収納容器の好ましい実施形態を説明すると、本実施形態における基板収納容器は、図1ないし図7に示すように、複数枚の半導体ウェーハ1を収納する容器本体10と、この容器本体10の開口した正面部を開閉する着脱自在の蓋体20と、この蓋体20に装着されて複数枚の半導体ウェーハ1を弾発的に保持する基板保持具30とを備え、この基板保持具30の保持溝36と半導体ウェーハ1との接触部39を第一、第二の保持片34A・34Bの肉厚Tの範囲内に位置させるようにしている。   Hereinafter, a preferred embodiment of a substrate storage container according to the present invention will be described with reference to the drawings. The substrate storage container in this embodiment stores a plurality of semiconductor wafers 1 as shown in FIGS. A container body 10, a detachable lid 20 that opens and closes an open front portion of the container body 10, and a substrate holder 30 that is attached to the lid 20 and elastically holds a plurality of semiconductor wafers 1. The contact groove 39 between the holding groove 36 of the substrate holder 30 and the semiconductor wafer 1 is positioned within the range of the thickness T of the first and second holding pieces 34A and 34B.

半導体ウェーハ1は、図2や図3に示すように、例えばφ300mmの薄く脆いシリコンウェーハからなり、周縁部2に図示しない位置合わせや識別用のノッチが平面半円形に切り欠かれており、容器本体10に25枚あるいは26枚の枚数で整列して収納される。   As shown in FIGS. 2 and 3, the semiconductor wafer 1 is made of, for example, a thin and brittle silicon wafer having a diameter of 300 mm, and a notch for alignment and identification (not shown) is notched in a planar semicircular shape at the peripheral edge 2. The main body 10 is stored in an order of 25 or 26 sheets.

容器本体10と蓋体20とは、所定の樹脂を含有する成形材料によりそれぞれ射出成形される。この成形材料の所定の樹脂としては、例えば力学的性質や耐熱性等に優れるポリカーボネート、ポリエーテルイミド、ポリエーテルエーテルケトン、あるいは環状オレフィン樹脂、これらのアロイ樹脂等があげられる。この樹脂には、カーボン、カーボン繊維、金属繊維、カーボンナノチューブ、導電性ポリマー、帯電防止剤、又は難燃剤等が必要に応じて適宜添加される。   The container body 10 and the lid 20 are each injection-molded with a molding material containing a predetermined resin. Examples of the predetermined resin of the molding material include polycarbonate, polyetherimide, polyetheretherketone, cyclic olefin resin, and alloy resins thereof having excellent mechanical properties and heat resistance. Carbon, carbon fiber, metal fiber, carbon nanotube, conductive polymer, antistatic agent, flame retardant and the like are appropriately added to this resin as necessary.

容器本体10は、図1ないし図3に示すように、正面部が横長に開口した透明のフロントオープンボックスに形成され、正面部を水平横方向に向けた状態で図示しない半導体加工装置や気体置換装置上に位置決めして搭載されたり、輸送される。この容器本体10は、両側壁の一部がそれぞれ内方向に向けて傾斜形成され、この傾斜した各側壁の内面に半導体ウェーハ1の周縁部2側方が接触して位置決めされる。   As shown in FIGS. 1 to 3, the container body 10 is formed in a transparent front open box whose front portion opens horizontally, and a semiconductor processing device or gas replacement not shown in the state where the front portion is directed horizontally and horizontally. Positioned and mounted on the device or transported. The container body 10 is formed such that a part of both side walls are inclined toward the inward direction, and the side of the peripheral edge 2 of the semiconductor wafer 1 is in contact with the inner surface of each inclined side wall.

容器本体10の両側壁内面には、半導体ウェーハ1の周縁部2側方を水平に支持するティース11がそれぞれ対設され、この左右一対のティース11が容器本体10の上下方向に所定のピッチで配列される。各ティース11は、特に限定されるものではないが、例えば半導体ウェーハ1の周縁部2側方に沿うよう平面略半円弧形の平板に湾曲形成され、蓋体20の嵌合圧入時には、従来例と同様に接触していた半導体ウェーハ1と非接触の関係になる。   Teeth 11 that horizontally support the sides of the peripheral edge 2 of the semiconductor wafer 1 are provided on the inner surfaces of both side walls of the container body 10, and the pair of left and right teeth 11 are arranged at a predetermined pitch in the vertical direction of the container body 10. Arranged. Each tooth 11 is not particularly limited. For example, each tooth 11 is curved and formed into a flat semi-circular flat plate along the peripheral edge 2 side of the semiconductor wafer 1. Similar to the example, it is in a non-contact relationship with the semiconductor wafer 1 that has been in contact.

容器本体10の底板の前部両側と後部中央とには、基板収納容器を位置決めする位置決め具がそれぞれ螺着され、容器本体10の天板の中央部には、工場の天井搬送機構に把持される搬送用のトップフランジが螺着される。また、容器本体10の正面部の周縁には、外方向に張り出すリムフランジ12が膨出形成され、このリムフランジ12内に蓋体20が図示しない蓋体開閉装置により自動的に嵌合される。   Positioning tools for positioning the substrate storage container are respectively screwed to both the front side and the rear center of the bottom plate of the container body 10, and the center part of the top plate of the container body 10 is gripped by the ceiling transport mechanism of the factory. A top flange for conveyance is screwed. Further, a rim flange 12 projecting outward is formed at the peripheral edge of the front portion of the container body 10, and the lid 20 is automatically fitted into the rim flange 12 by a lid opening / closing device (not shown). The

容器本体10の正面部両側には、蓋体20係止用の係止突部13がそれぞれ外方向に向けて突出形成される。また、容器本体10の背面壁の内面には、複数枚の半導体ウェーハ1の周縁部2後方をそれぞれ水平に遊嵌支持するリヤリテーナ14が上下に並べて形成される。   Locking projections 13 for locking the lid 20 are formed on both sides of the front portion of the container body 10 so as to protrude outward. In addition, rear retainers 14 are formed on the inner surface of the back wall of the container body 10 so as to be arranged in the vertical direction so that the rear portions of the peripheral edge portions 2 of the plurality of semiconductor wafers 1 are horizontally fitted and supported.

蓋体20は、図1ないし図3に示すように、容器本体10の開口した正面部のリムフランジ12内に着脱自在に嵌合される横長の筐体21により構成される。この筐体21は、基本的には浅底の断面略皿形に形成され、中央部には、表面側に位置する左右一対の補強用リブ22が間隔をおいて対設されており、この一対の補強用リブ22の間が半導体ウェーハ1の周縁部2前方に沿うよう半円弧形に湾曲形成される。各補強用リブ22は、上下方向に細長い棒形に形成される。   As shown in FIGS. 1 to 3, the lid 20 is constituted by a horizontally long casing 21 that is detachably fitted into the rim flange 12 of the front portion of the container body 10 that is open. The casing 21 is basically formed in a shallow dish having a substantially dish-shaped cross section, and a pair of left and right reinforcing ribs 22 located on the surface side are provided at a distance from each other at the center. The space between the pair of reinforcing ribs 22 is curved in a semicircular arc shape along the front of the peripheral edge 2 of the semiconductor wafer 1. Each reinforcing rib 22 is formed in a bar shape elongated in the vertical direction.

筐体21の半導体ウェーハ1に対向する対向内面23である裏面の周縁部には、枠形のシールガスケット24が嵌合され、このシールガスケット24が容器本体10のリムフランジ12内に圧接変形することにより、基板収納容器のシール性が確保される。また、筐体21の両側部には、横長の係止片25がそれぞれ前後方向に回転可能に軸支され、この一対の係止片25の係止孔が容器本体10の係止突部13にそれぞれ嵌合係止することにより、容器本体10に嵌合した蓋体20が取り外し不能に固定される。   A frame-shaped seal gasket 24 is fitted to the peripheral edge of the back surface, which is the opposed inner surface 23 facing the semiconductor wafer 1 of the housing 21, and the seal gasket 24 is deformed by pressure into the rim flange 12 of the container body 10. Thereby, the sealing property of the substrate storage container is secured. In addition, horizontally long locking pieces 25 are pivotally supported on both sides of the casing 21 so as to be rotatable in the front-rear direction, and the locking holes of the pair of locking pieces 25 are locking protrusions 13 of the container body 10. The lid body 20 fitted to the container body 10 is fixed in a non-removable manner by being fitted and locked respectively.

基板保持具30は、図2ないし図7に示すように、筐体21の対向内面23の両側部にそれぞれ配設され、容器本体10に収納された半導体ウェーハ1の周縁部2前方を第一の保持片34Aの保持溝36に挟んで保持させる左右一対の保持ブロック31と、各保持ブロック31に設けられる複数の第二の保持片34Bと、各第二の保持片34Bに形成されて半導体ウェーハ1の周縁部2前方を挟んで保持する保持溝36とを備えて成形される。   As shown in FIGS. 2 to 7, the substrate holder 30 is disposed on both sides of the opposing inner surface 23 of the housing 21, and the front of the peripheral edge 2 of the semiconductor wafer 1 housed in the container body 10 is first. A pair of left and right holding blocks 31 held between the holding grooves 36 of the holding pieces 34A, a plurality of second holding pieces 34B provided in each holding block 31, and a semiconductor formed on each second holding piece 34B The wafer 1 is formed with a holding groove 36 that holds the front edge of the peripheral edge 2 of the wafer 1.

基板保持具30の成形材料としては、例えばポリエーテルエーテルケトン、環状オレフィン樹脂、ポリブチレンテレフタレート等の合成樹脂、これらのアロイ樹脂、ポリエステル系、ポリオレフィン系、ポリスチレン系の各種熱可塑性エラストマー等が該当する。係る樹脂には、カーボン、カーボン繊維、金属繊維、カーボンナノチューブ、導電性ポリマー、帯電防止剤、又は難燃剤等が必要に応じて添加される。   Examples of the molding material for the substrate holder 30 include synthetic resins such as polyether ether ketone, cyclic olefin resin, polybutylene terephthalate, and the like, alloy resins thereof, polyester-based, polyolefin-based, and polystyrene-based thermoplastic elastomers. . Carbon, carbon fiber, metal fiber, carbon nanotube, conductive polymer, antistatic agent, flame retardant, or the like is added to the resin as necessary.

基板保持具30の各保持ブロック31は、筐体21の外側に位置して半導体ウェーハ1の周縁部2前方に接近する長片32と、筐体21の内側に位置して半導体ウェーハ1の周縁部2前方に接近する短片33とを備え、これら長片32と短片33との端部間に、保持片34である第一の保持片34Aが半導体ウェーハ1の周縁部2前方に沿うよう屈曲して複数架設されており、各第一の保持片34Aに保持溝36が一体形成される。   Each holding block 31 of the substrate holder 30 is located on the outer side of the housing 21 and approaches a front side of the peripheral portion 2 of the semiconductor wafer 1, and on the inner side of the housing 21, the peripheral edge of the semiconductor wafer 1. The first holding piece 34 </ b> A, which is the holding piece 34, is bent along the front of the peripheral edge 2 of the semiconductor wafer 1 between the ends of the long piece 32 and the short piece 33. Thus, a plurality of suspension grooves 36 are provided, and a holding groove 36 is formed integrally with each first holding piece 34A.

第一の保持片34Aは、図4に示すように、弾性を有する細長い板形に形成され、半導体ウェーハ1の周縁部2前方に対向する表面とその反対側の裏面とにそれぞれ鋭利な突出部35が形成されており、この複数の突出部35に保持溝36が断面略V字形に切り欠かれるとともに、この保持溝36の最深の谷部37が裏面を越えて筐体21の対向内面23方向に指向する。   As shown in FIG. 4, the first holding piece 34 </ b> A is formed in an elongated plate shape having elasticity, and has sharp protrusions on the front surface facing the front of the peripheral edge 2 of the semiconductor wafer 1 and on the back surface on the opposite side. 35 is formed, and a holding groove 36 is cut out in a substantially V-shaped cross section in the plurality of protruding portions 35, and the deepest trough portion 37 of the holding groove 36 extends beyond the back surface to face the inner surface 23 of the housing 21. Oriented in the direction.

保持溝36の傾斜角度と谷部37の位置は、保持溝36の傾斜面38と半導体ウェーハ1の周縁部2前方との接触部39が第一の保持片34Aの肉厚Tの範囲内、好ましくは第一の保持片34Aの肉厚Tの中心線上に位置するよう調整される。保持溝36の傾斜角度は、例えば水平面に対して片側20°〜60°の範囲で定められる。   The inclination angle of the holding groove 36 and the position of the valley portion 37 are such that the contact portion 39 between the inclined surface 38 of the holding groove 36 and the front of the peripheral edge 2 of the semiconductor wafer 1 is within the range of the thickness T of the first holding piece 34A. Preferably, the first holding piece 34A is adjusted to be positioned on the center line of the thickness T. The inclination angle of the holding groove 36 is determined within a range of 20 ° to 60 ° on one side with respect to the horizontal plane, for example.

第二の保持片34Bは、図4に示すように、第一の保持片34A同様、弾性を有する細長い板形に形成され、保持ブロック31の短片33から半導体ウェーハ1の周縁部2前方に屈曲して伸長されており、膨出した先端部に保持溝36が一体形成される。この第二の保持片34Bの半導体ウェーハ1の周縁部2前方に対向する表面とその反対側の裏面とにはそれぞれ鋭利な突出部35が形成され、この複数の突出部35に保持溝36が断面略V字形に切り欠かれており、この保持溝36の最深の谷部37が第二の保持片34Bの裏面を越えて筐体21の対向内面23方向に指向する。   As shown in FIG. 4, the second holding piece 34 </ b> B is formed in an elongated plate shape having elasticity like the first holding piece 34 </ b> A, and bends forward from the short piece 33 of the holding block 31 to the front side of the peripheral edge 2 of the semiconductor wafer 1. The holding groove 36 is integrally formed at the bulging tip. Sharp protrusions 35 are respectively formed on the front surface of the second holding piece 34B facing the front edge of the peripheral edge 2 of the semiconductor wafer 1 and the back surface on the opposite side, and holding grooves 36 are formed in the plurality of protrusions 35. The cross section is cut out in a substantially V shape, and the deepest trough portion 37 of the holding groove 36 is directed toward the opposed inner surface 23 of the housing 21 beyond the back surface of the second holding piece 34B.

保持溝36の傾斜角度と谷部37の位置は、保持溝36の傾斜面38と半導体ウェーハ1の周縁部2前方との接触部39が第二の保持片34Bの肉厚Tの範囲内、好ましくは第二の保持片34Bの肉厚Tの中心線上に位置するよう調整される。保持溝36の傾斜角度は、例えば水平面に対して片側20°〜60°の範囲で定められる。   The inclination angle of the holding groove 36 and the position of the valley portion 37 are such that the contact portion 39 between the inclined surface 38 of the holding groove 36 and the front edge of the peripheral edge 2 of the semiconductor wafer 1 is within the range of the thickness T of the second holding piece 34B. Preferably, the second holding piece 34B is adjusted so as to be positioned on the center line of the thickness T. The inclination angle of the holding groove 36 is determined within a range of 20 ° to 60 ° on one side with respect to the horizontal plane, for example.

上記構成によれば、第一、第二の保持片34A・34Bの表面側に保持溝36が位置するのではなく、第一、第二の保持片34A・34Bの肉厚Tの範囲内に保持溝36の傾斜面38と半導体ウェーハ1の周縁部2前方との接触部39が位置する(図5参照)ので、輸送時の振動や衝撃の作用する力点が第一、第二の保持片34A・34Bの肉厚Tの中心部から離れた箇所に存在するのを有効に防止することができる。   According to the above configuration, the holding groove 36 is not positioned on the surface side of the first and second holding pieces 34A and 34B, but within the range of the thickness T of the first and second holding pieces 34A and 34B. Since the contact portion 39 between the inclined surface 38 of the holding groove 36 and the front of the peripheral edge portion 2 of the semiconductor wafer 1 is positioned (see FIG. 5), the force points to which vibrations and impacts during transportation act are the first and second holding pieces. It is possible to effectively prevent the 34A and 34B from being present at a location away from the center of the thickness T.

すなわち、輸送時の振動や衝撃が基板収納容器に作用(図6参照)し、半導体ウェーハ1が上下方向に移動しようとしても、力点が第一、第二の保持片34A・34Bの肉厚Tの範囲内にあるので、保持片34が捩れて変形するのを有効に抑制(図7参照)することができ、保持溝36から半導体ウェーハ1が外れて下方のティース11に接触することがない。   That is, even if the vibration or impact during transportation acts on the substrate storage container (see FIG. 6) and the semiconductor wafer 1 tries to move in the vertical direction, the force point is the wall thickness T of the first and second holding pieces 34A and 34B. Therefore, the holding piece 34 can be effectively prevented from being twisted and deformed (see FIG. 7), and the semiconductor wafer 1 is not detached from the holding groove 36 and does not contact the lower teeth 11. .

したがって、基板収納容器の輸送時等に半導体ウェーハ1が擦れて磨耗したり、汚染を招いたり、あるいは破損するおそれを有効に排除することができる。特に、保持溝36の傾斜面38と半導体ウェーハ1の周縁部2前方との接触部39が第一、第二の保持片34A・34Bの肉厚Tの中心線上に位置する場合には、第一、第二の保持片34A・34Bが捩れて回転変形するのをきわめて有効に抑制することが可能になる。   Accordingly, it is possible to effectively eliminate the possibility that the semiconductor wafer 1 is rubbed and worn, transported, or damaged when the substrate storage container is transported. In particular, when the contact portion 39 between the inclined surface 38 of the holding groove 36 and the front of the peripheral edge portion 2 of the semiconductor wafer 1 is located on the center line of the thickness T of the first and second holding pieces 34A and 34B, It becomes possible to very effectively suppress the first and second holding pieces 34A and 34B from being twisted and rotationally deformed.

次に、図8は本発明の第2の実施形態を示すもので、この場合には、蓋体20を、容器本体10のリムフランジ12内に着脱自在に嵌合される筐体21と、この筐体21の開口した表面(正面)を被覆する表面プレートとから構成し、これら筐体21と表面プレートとの間には、蓋体20用の施錠機構50を内蔵しており、筐体21の対向内面23の中央部に基板保持具30を装着するようにしている。   Next, FIG. 8 shows a second embodiment of the present invention. In this case, the lid 20 is detachably fitted into the rim flange 12 of the container body 10; The housing 21 includes a surface plate that covers the opened surface (front surface), and a locking mechanism 50 for the lid 20 is built in between the housing 21 and the surface plate. The substrate holder 30 is attached to the central portion of the opposed inner surface 23 of 21.

施錠機構50は、特に限定されるものではないが、例えば筐体21の内部両側に軸支されて外部から回転操作される左右一対の回転プレート51と、各回転プレート51の周縁部上下に連結され、回転プレート51の回転に伴い蓋体20の内外方向に直線的にスライドする複数のスライド板52と、筐体21の周縁部と各スライド板52の先端部とにそれぞれ揺動可能に軸支され、スライド板52の突出により容器本体10のリムフランジ12内周面の係止孔に干渉する出没可能な係止爪53とを備えて構成される。   The locking mechanism 50 is not particularly limited. For example, a pair of left and right rotating plates 51 that are pivotally supported on both inner sides of the casing 21 and rotated from the outside are connected to the upper and lower edges of each rotating plate 51. A plurality of slide plates 52 that linearly slide in the inner and outer directions of the lid body 20 as the rotary plate 51 rotates, and a peripheral pivot portion of the housing 21 and a distal end portion of each slide plate 52 are pivotable. A locking claw 53 that can be protruded and retracted and interferes with a locking hole on the inner peripheral surface of the rim flange 12 of the container body 10 by the protrusion of the slide plate 52 is configured.

基板保持具30は、筐体21の対向内面23の中央部に装着される縦長の支持枠体40を備え、この支持枠体40の両側部間に、半導体ウェーハ1の周縁部2前方に接近する弾性の保持片34Cが上下に並んだ状態で複数架設されており、各保持片34Cの両側部に保持溝36が間隔をおいてそれぞれ一体形成される。   The substrate holder 30 includes a vertically long support frame 40 that is attached to the central portion of the opposing inner surface 23 of the housing 21, and approaches the front of the peripheral edge 2 of the semiconductor wafer 1 between both sides of the support frame 40. A plurality of elastic holding pieces 34 </ b> C are arranged in a vertically aligned manner, and holding grooves 36 are integrally formed on both sides of each holding piece 34 </ b> C at intervals.

保持片34Cは、弾性を有する細長い板形に形成され、半導体ウェーハ1の周縁部2前方に対向する表面とその反対側の裏面とにそれぞれ鋭利な突出部35が形成されるとともに、この複数の突出部35に保持溝36が断面略V字形に形成されており、この保持溝36の最深の谷部37が裏面を越えて筐体21の対向内面23方向に位置する。その他の部分については、上記実施形態と略同様であるので説明を省略する。   The holding piece 34C is formed in an elongated plate shape having elasticity, and a sharp protrusion 35 is formed on each of the front surface of the semiconductor wafer 1 facing the front edge of the peripheral edge 2 and the back surface on the opposite side thereof. A holding groove 36 is formed in the protruding portion 35 with a substantially V-shaped cross section, and the deepest trough portion 37 of the holding groove 36 is located in the direction of the opposed inner surface 23 of the housing 21 beyond the back surface. The other parts are substantially the same as those in the above embodiment, and thus description thereof is omitted.

本実施形態においても上記実施形態と同様の作用効果が期待でき、施錠機構50と基板保持具30とが相互に干渉するのを防止し、しかも、基板保持具30の構成の多様化を図ることができるのは明らかである。   In the present embodiment, the same effect as the above-described embodiment can be expected, the locking mechanism 50 and the substrate holder 30 can be prevented from interfering with each other, and the configuration of the substrate holder 30 can be diversified. Obviously you can.

なお、上記実施形態の容器本体10の正面部に嵌合した蓋体20を磁石等により固定しても良い。また、上記実施形態では容器本体10を単に示したが、容器本体10の底板に、複数の位置決め具をそれぞれ露出させるボトムプレートを水平に螺着しても良い。このボトムプレートには、搬送用のコンベヤレールを形成したり、複数の識別孔を穿孔し、この複数の識別孔に着脱自在の情報識別パッドを選択的に挿入しても良い。   In addition, you may fix the cover body 20 fitted to the front part of the container main body 10 of the said embodiment with a magnet. Moreover, although the container main body 10 was only shown in the said embodiment, you may screw the bottom plate which exposes a some positioning tool to the bottom plate of the container main body 10 horizontally. A conveyor rail for conveyance may be formed on the bottom plate, or a plurality of identification holes may be perforated, and detachable information identification pads may be selectively inserted into the plurality of identification holes.

また、第一の保持片34Aに複数の保持溝36を形成することもできる。また、蓋体20の対向内面23から半導体ウェーハ1の周縁部2前方に第二の保持片34Bを伸長形成することもできる。さらに、保持溝36の傾斜角度は、一様な角度に限定されるものではない。例えば、保持溝36の開口側の角度を谷部37側の角度よりも大きくして半導体ウェーハ1の位置合わせ範囲を拡大し、谷部37側の角度を小さくして半導体ウェーハ1の保持を安定させることもできる。   A plurality of holding grooves 36 can also be formed in the first holding piece 34A. In addition, the second holding piece 34 </ b> B can be extended from the opposed inner surface 23 of the lid 20 in front of the peripheral edge 2 of the semiconductor wafer 1. Furthermore, the inclination angle of the holding groove 36 is not limited to a uniform angle. For example, the angle of the holding groove 36 on the opening side is made larger than the angle on the trough 37 side to expand the alignment range of the semiconductor wafer 1, and the angle on the trough 37 side is reduced to stabilize the holding of the semiconductor wafer 1. It can also be made.

1 半導体ウェーハ(基板)
2 周縁部
10 容器本体
11 ティース
12 リムフランジ
20 蓋体
21 筐体
23 対向内面
30 基板保持具
31 保持ブロック
34 保持片
34A 第一の保持片
34B 第二の保持片
34C 保持片
34D 保持片
35 突出部
36 保持溝
37 谷部
38 傾斜面
39 接触部
40 支持枠体
50 施錠機構
T 肉厚
1 Semiconductor wafer (substrate)
2 Peripheral part 10 Container body 11 Teeth 12 Rim flange 20 Lid 21 Housing 23 Opposing inner surface 30 Substrate holder 31 Holding block 34 Holding piece 34A First holding piece 34B Second holding piece 34C Holding piece 34D Holding piece 35 Projection Part 36 holding groove 37 valley 38 inclined surface 39 contact part 40 support frame 50 locking mechanism T thickness

Claims (3)

基板を収納する容器本体と、この容器本体の開口部を開閉する蓋体とを備え、この蓋体の基板に対向する対向面には、基板を保持する基板保持具を設けた基板収納容器であって、
基板保持具は、基板に接近する保持片と、この保持片に形成されて基板の周縁部を保持する保持溝とを含み、この保持溝の基板の周縁部との接触部を保持片の肉厚の範囲内に位置させるようにしたことを特徴とする基板収納容器。
A substrate storage container having a container body for storing a substrate and a lid body for opening and closing the opening of the container body, and having a substrate holder for holding the substrate on a surface facing the substrate of the lid body. There,
The substrate holder includes a holding piece that approaches the substrate and a holding groove that is formed on the holding piece and holds the peripheral portion of the substrate, and the contact portion of the holding groove with the peripheral portion of the substrate is the meat of the holding piece. A substrate storage container characterized by being positioned within a thickness range.
保持片の基板の周縁部に対向する表面とその反対側の裏面とにそれぞれ突出部を形成し、この複数の突出部に保持溝を形成してその最深の谷部を保持片の裏面を越えた箇所に位置させるようにした請求項1記載の基板収納容器。   Protrusions are formed on the surface of the holding piece facing the peripheral edge of the substrate and on the opposite back side, and holding grooves are formed in the plurality of protruding parts so that the deepest troughs extend beyond the back side of the holding piece. The substrate storage container according to claim 1, wherein the substrate storage container is positioned at a different location. 保持溝と基板の周縁部との接触部を保持片の肉厚の略中心線上に位置させた請求項1又は2記載の基板収納容器。   The substrate storage container according to claim 1 or 2, wherein a contact portion between the holding groove and the peripheral edge portion of the substrate is positioned on a substantially center line of a thickness of the holding piece.
JP2009043416A 2009-02-26 2009-02-26 Substrate storing container Pending JP2010199354A (en)

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WO2012054627A3 (en) * 2010-10-19 2012-06-21 Entegris, Inc. Front opening wafer container with wafer cushion
JP2013011723A (en) * 2011-06-29 2013-01-17 Arakawa Jushi:Kk Mask locking tool of mask case
CN103258775A (en) * 2013-01-10 2013-08-21 苏州工业园区高登威科技有限公司 Stationary fixture
WO2013183138A1 (en) * 2012-06-07 2013-12-12 ミライアル株式会社 Substrate housing container provided with impact absorbing function
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* Cited by examiner, † Cited by third party
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CN103283010A (en) * 2010-10-19 2013-09-04 诚实公司 Front opening wafer container with wafer cushion
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JP2013011723A (en) * 2011-06-29 2013-01-17 Arakawa Jushi:Kk Mask locking tool of mask case
WO2013183138A1 (en) * 2012-06-07 2013-12-12 ミライアル株式会社 Substrate housing container provided with impact absorbing function
JPWO2013183138A1 (en) * 2012-06-07 2016-01-21 ミライアル株式会社 Substrate storage container with shock absorption function
CN103258775A (en) * 2013-01-10 2013-08-21 苏州工业园区高登威科技有限公司 Stationary fixture
JP2015135881A (en) * 2014-01-17 2015-07-27 信越ポリマー株式会社 Substrate storage container
JP2016018961A (en) * 2014-07-10 2016-02-01 ミライアル株式会社 Substrate housing container and retainer
WO2016006412A1 (en) * 2014-07-10 2016-01-14 ミライアル株式会社 Substrate housing container and retainer
CN110574152A (en) * 2017-04-05 2019-12-13 未来儿股份有限公司 Substrate storage container
CN110574152B (en) * 2017-04-05 2023-10-27 未来儿股份有限公司 Substrate storage container
WO2020184353A1 (en) * 2019-03-08 2020-09-17 秀洋 益子 Substrate storage container
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CN113544836B (en) * 2019-03-08 2023-02-28 芜湖鑫跃微半导体有限公司 Substrate storage container

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