JP2010168243A - Method for producing glass pipe - Google Patents
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- JP2010168243A JP2010168243A JP2009012014A JP2009012014A JP2010168243A JP 2010168243 A JP2010168243 A JP 2010168243A JP 2009012014 A JP2009012014 A JP 2009012014A JP 2009012014 A JP2009012014 A JP 2009012014A JP 2010168243 A JP2010168243 A JP 2010168243A
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- 239000011521 glass Substances 0.000 title claims abstract description 118
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 23
- 238000002834 transmittance Methods 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 27
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 26
- 239000001301 oxygen Substances 0.000 claims description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 23
- 239000007789 gas Substances 0.000 claims description 22
- 239000011261 inert gas Substances 0.000 claims description 19
- 230000008569 process Effects 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 17
- 230000007547 defect Effects 0.000 claims description 14
- 238000010521 absorption reaction Methods 0.000 claims description 11
- 229910008045 Si-Si Inorganic materials 0.000 claims description 7
- 229910006411 Si—Si Inorganic materials 0.000 claims description 7
- 230000002950 deficient Effects 0.000 claims description 5
- 230000007423 decrease Effects 0.000 abstract description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 239000000463 material Substances 0.000 description 14
- 229910004298 SiO 2 Inorganic materials 0.000 description 10
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 239000011737 fluorine Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 206010021143 Hypoxia Diseases 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000011276 addition treatment Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000004334 fluoridation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001603 reducing effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- 238000011282 treatment Methods 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
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Abstract
【課題】 ガラス管の延伸加工において、高い製造効率を維持しつつ、紫外光透過率の低下を抑制することができる新規な方法を提供する。
【解決手段】 ガラス管1,2の内側3の圧力を外側4の圧力より高く保ち、その状態でガラス管1を加熱し軟化させて延伸し、所望の外径、内径、厚さをもったガラス管2に形成する。ガラス管1,2の内側3と外側4の少なくとも一方の雰囲気を、ガラス管1,2が加熱軟化する温度において化学的に不活性なガス7を主成分とする雰囲気とする。
【選択図】 図1PROBLEM TO BE SOLVED: To provide a novel method capable of suppressing a decrease in ultraviolet light transmittance while maintaining high production efficiency in glass tube stretching.
SOLUTION: The pressure on the inner side 3 of the glass tubes 1 and 2 is kept higher than the pressure on the outer side 4, and in this state, the glass tube 1 is heated and softened and stretched to have a desired outer diameter, inner diameter and thickness. The glass tube 2 is formed. At least one atmosphere of the inner side 3 and the outer side 4 of the glass tubes 1 and 2 is an atmosphere mainly composed of a gas 7 that is chemically inert at a temperature at which the glass tubes 1 and 2 are heated and softened.
[Selection] Figure 1
Description
本発明は、ガラス管の製造方法に関する。詳しくは、例えば、紫外光透過材料として用いるガラス管を製造する際の、延伸加工工程の改良に関する。 The present invention relates to a method for manufacturing a glass tube. Specifically, for example, the present invention relates to an improvement in a drawing process when manufacturing a glass tube used as an ultraviolet light transmitting material.
紫外光透過材料として用いるガラス管を所望形状に形成するための延伸加工工程においては、通常、ガラス管の内側の圧力を外側の圧力より高く保ちながら加熱軟化させ、この状態で延伸して、所望の外径、内径、厚さをもった管状体に形成している。
近年では、紫外光透過材料として、高純度石英ガラスを用いる傾向にある。
In a drawing process for forming a glass tube used as an ultraviolet light transmitting material into a desired shape, the glass tube is usually heated and softened while keeping the inner pressure of the glass tube higher than the outer pressure, and the glass tube is stretched in this state. Are formed in a tubular body having an outer diameter, an inner diameter, and a thickness.
In recent years, high-purity quartz glass tends to be used as an ultraviolet light transmitting material.
光洗浄、光エッチング等において、波長200nm以下の真空紫外光を放出する放電ランプが従来から用いられている。放電ランプとしては、合成石英ガラスからなるガラス管内に水銀や希ガスが封入され、波長185nmの真空紫外光を放出する水銀ランプが知られている。
この種の水銀ランプは、ユーザからの要望に応じ高出力化が進められてきたが、ランプの高温化に伴う熱対策という問題が生じている。さらに、地球環境の問題等から水銀の使用制限が求められており、結果的に、水銀ランプに代わる紫外光源として、エキシマランプが注目されている。
Conventionally, discharge lamps that emit vacuum ultraviolet light having a wavelength of 200 nm or less have been used in photocleaning, photoetching, and the like. As a discharge lamp, a mercury lamp in which mercury or a rare gas is sealed in a glass tube made of synthetic quartz glass and emits vacuum ultraviolet light having a wavelength of 185 nm is known.
This type of mercury lamp has been promoted to increase the output in response to a request from a user, but there is a problem of countermeasures against heat accompanying the high temperature of the lamp. Furthermore, restrictions on the use of mercury have been demanded due to global environmental problems, and as a result, excimer lamps have attracted attention as ultraviolet light sources that can replace mercury lamps.
また、半導体素子の微細化が高まるに従い、解像度の関係からもエキシマ光源が注目され、KrFエキシマ光(発光中心波長248nm)、ArFエキシマ光(同193nm)、ArClエキシマ光(同175nm)、F2エキシマ光(同157nm)といった、発光中心波長260nm以下の高出力紫外光源の開発が進められている。
これら光源に対応して使用する光学材料において、この使用波長領域に吸収が存在すると、光源からの光の一部が光学材料に吸収され、その吸収した光のエネルギーにより光学材料にダメージが発生し、例えば光透過率の急激な低下等を引き起こす虞れがある。
このような事情から、高出力真空紫外線であるエキシマ光源への耐性がある紫外光透過材料として、高純度石英ガラスが多用されつつある(例えば、特許文献1:特開2005−306650号公報、特許文献2:特開2001−114529号公報、など参照)。
Further, as the miniaturization of semiconductor elements increases, excimer light sources are attracting attention from the viewpoint of resolution. KrF excimer light (emission center wavelength 248 nm), ArF excimer light (193 nm), ArCl excimer light (175 nm), F 2 Development of a high-power ultraviolet light source having an emission center wavelength of 260 nm or less, such as excimer light (157 nm), is in progress.
In the optical material used for these light sources, if there is absorption in this wavelength range, a part of the light from the light source is absorbed by the optical material, and the optical material is damaged by the energy of the absorbed light. For example, there is a risk of causing a rapid decrease in light transmittance.
Under such circumstances, high-purity quartz glass is being widely used as an ultraviolet light transmitting material that is resistant to an excimer light source that is high-power vacuum ultraviolet light (for example, Patent Document 1: Japanese Patent Application Laid-Open No. 2005-306650, Patent Document 2: JP 2001-114529 A).
一方、ガラス管を所望の外径、内径、厚さをもった管状体に効率よく製造するには、ガラスの粘性を適当な値に下げる必要があり、そのためには加熱温度を適当に高くする必要がある。
石英ガラス管の延伸加工においても同様であり、特許文献1に開示されている1700℃以下に対し、1700℃以上、具体的には、1750〜2100℃程度の加熱温度にすることでガラスの粘性が低下し、加工速度を速めることが可能になる。
On the other hand, in order to efficiently manufacture a glass tube into a tubular body having a desired outer diameter, inner diameter, and thickness, it is necessary to lower the viscosity of the glass to an appropriate value. For this purpose, the heating temperature is appropriately increased. There is a need.
The same applies to the drawing processing of the quartz glass tube, and the viscosity of the glass can be increased by setting the heating temperature to 1700 ° C. or higher, specifically about 1750 to 2100 ° C., compared to 1700 ° C. or lower disclosed in Patent Document 1. Decreases, and the processing speed can be increased.
また、ガラス管の延伸加工工程では、通常、ガラス管の内側を加圧することで、ガラス管の外径と内径との比率を小さく(薄肉化)しつつ、延伸を行う。ガラス管内を加圧するための加圧ガスには、従来、安価な窒素(N2)ガスや空気が用いられている(例えば、特許文献3:特開昭62−162632号公報、特許文献4:特開平02−296740号公報、特許文献5:特開平7−109136号公報、など参照) Further, in the glass tube stretching process, stretching is usually performed by pressurizing the inside of the glass tube to reduce the ratio between the outer diameter and the inner diameter of the glass tube (thinning). Conventionally, inexpensive nitrogen (N 2 ) gas or air is used as the pressurized gas for pressurizing the inside of the glass tube (for example, Patent Document 3: Japanese Patent Laid-Open No. 62-162632, Patent Document 4: (See JP-A-02-296740, Patent Document 5: JP-A-7-109136, etc.)
しかし、ガラスが高温環境下にある場合、窒素ガスがガラスに対し還元性を示し、ガラス中のSiO2ネットワークから酸素(O2)を引き抜く反応が進行する。このため、延伸加工後において、ガラス管の表面付近に、波長163nmに吸収ピークを示す酸素欠乏欠陥が形成され、紫外光透過率が低下するという問題が生じる。加圧ガスに空気を用いた場合も、空気中の窒素が同様の反応を起こし、酸素欠乏欠陥が形成される。 However, when the glass is in a high temperature environment, nitrogen gas exhibits a reducing property with respect to the glass, and a reaction for extracting oxygen (O 2 ) from the SiO 2 network in the glass proceeds. For this reason, after the drawing process, an oxygen deficiency defect having an absorption peak at a wavelength of 163 nm is formed near the surface of the glass tube, resulting in a problem that the ultraviolet light transmittance is lowered. When air is used as the pressurized gas, nitrogen in the air causes a similar reaction, and oxygen deficiency defects are formed.
酸素欠乏欠陥の発生を抑えるために、延伸加工工程において加熱温度を低く(例えば、1700℃以下)することも考えられる。しかし、その場合、ガラスの粘度が高い状態で延伸するため、加工速度が遅くなり、製造効率が低下するという新たな問題が生じる。 In order to suppress the occurrence of oxygen-deficient defects, it may be possible to lower the heating temperature (for example, 1700 ° C. or lower) in the stretching process. However, in that case, since the glass is stretched with a high viscosity, a new problem arises that the processing speed is slowed and the production efficiency is lowered.
本発明はこのような従来事情に鑑みて成されたもので、その目的とする処は、ガラス管の延伸加工工程において、高い製造効率を維持しつつ、紫外光透過率の低下を抑制することができる、新規な方法を提供することにある。 The present invention has been made in view of such conventional circumstances, and the object of the process is to suppress a decrease in ultraviolet light transmittance while maintaining high manufacturing efficiency in the glass tube drawing process. It is to provide a novel method capable of
以上の目的を達成するために本発明者らは鋭意研究を続け、従来の延伸加工工程における雰囲気に含まれていた窒素ガスがガラス表面のSiO2から酸素原子を引き抜く反応には、大きな活性化エネルギーが存在することに着目した。そして、活性化エネルギーの障壁を超えるためのエネルギーは熱エネルギーとして供給されるため、加熱温度が上昇するほど酸素過剰欠陥の生成が顕著になるとの結論に達した。
つまり、紫外光透過材料としてのガラス管の延伸加工を、従来のように、窒素を含む雰囲気で行う限り、加熱温度を高めて、効率よく製造を行うことは困難である。そして、ガラス管の内側と外側の少なくとも一方の雰囲気を、ガラス管が加熱軟化する温度において化学的に不活性な雰囲気とすることが、本発明の課題の解決に有用であることを見出し、本発明を完成するに至った。
In order to achieve the above object, the present inventors have continued intensive research, and the reaction in which nitrogen gas contained in the atmosphere in the conventional drawing process extracts oxygen atoms from SiO 2 on the glass surface is greatly activated. Focused on the existence of energy. And since the energy for exceeding the barrier of activation energy is supplied as thermal energy, it came to the conclusion that generation | occurrence | production of an oxygen excess defect becomes remarkable, so that heating temperature rises.
In other words, as long as the glass tube as the ultraviolet light transmitting material is stretched in an atmosphere containing nitrogen as in the prior art, it is difficult to increase the heating temperature and efficiently manufacture. Then, it has been found that it is useful for solving the problems of the present invention that the atmosphere of at least one of the inside and outside of the glass tube is a chemically inert atmosphere at a temperature at which the glass tube is heated and softened. The invention has been completed.
すなわち、本発明に係るガラス管の製造方法は、ガラス管の内側の圧力を外側の圧力より高く保ち、その状態で前記ガラス管を加熱し軟化させて延伸し、所望形状の管状体に形成する延伸加工工程において、
前記ガラス管の内側と外側の少なくとも一方の雰囲気を、前記ガラス管が加熱軟化する温度において化学的に不活性なガスを主成分とする雰囲気としたことを特徴とする。
ここで、前記「ガラス管が加熱軟化する温度において化学的に不活性なガス」には、窒素を含まない。
That is, in the method for producing a glass tube according to the present invention, the inner pressure of the glass tube is kept higher than the outer pressure, and in this state, the glass tube is heated and softened and stretched to form a tubular body having a desired shape. In the stretching process,
At least one of the inside and outside of the glass tube is characterized in that it is an atmosphere mainly composed of a chemically inert gas at a temperature at which the glass tube is heated and softened.
Here, the “chemically inert gas at the temperature at which the glass tube is heated and softened” does not contain nitrogen.
前記不活性なガスとして、例えば、He、Ne、Arのうちのいずれか一種の不活性ガス、または、それらのうちの二種以上の不活性ガス、またはそれらのうちの一種又は二種以上の不活性ガス及び酸素(O2)を混合した混合ガスをあげることができる。 As the inert gas, for example, any one of He, Ne, and Ar, or two or more of them, or one or more of them Examples thereof include a mixed gas in which an inert gas and oxygen (O 2 ) are mixed.
従来の延伸加工工程では、ガラス管の内側を窒素ガス又は空気にて加圧し、ガラス管の外側は窒素ガスとする場合が多かった。しかし、前述したように、石英ガラス等に加熱加工を施す際、高温雰囲気下とすると、窒素はSiO2に対し還元性を示し、SiO2から酸素原子を引き抜き、窒素酸化物を生成する化学反応が進行しやすい。このような化学反応が進行すると、ガラスの表面には、波長163nmに吸収ピークを示すSi−Si型酸素欠乏欠陥が形成する。
これに対し本発明のように、前記ガラス管が加熱軟化する温度において化学的に不活性なガスを主成分とする雰囲気、例えば、He、Ne、Arのうちのいずれか一種の不活性ガス、または、それらのうちの二種以上の不活性ガスを雰囲気とした場合、前記した化学反応は抑制され、Si−Si型酸素欠乏欠陥の形成を抑えることができる。
In the conventional drawing process, the inside of the glass tube is often pressurized with nitrogen gas or air, and the outside of the glass tube is often nitrogen gas. However, as mentioned above, when subjected to a heat process to a quartz glass or the like, when a high temperature atmosphere, the nitrogen is a reduced resistance to SiO 2, pull the oxygen atoms from SiO 2, a chemical reaction that produces the nitrogen oxides Is easy to progress. When such a chemical reaction proceeds, a Si—Si type oxygen deficiency defect having an absorption peak at a wavelength of 163 nm is formed on the surface of the glass.
On the other hand, as in the present invention, an atmosphere mainly containing a chemically inert gas at a temperature at which the glass tube is heated and softened, for example, any one of inert gases of He, Ne, and Ar, Alternatively, when two or more of these inert gases are used as the atmosphere, the above-described chemical reaction is suppressed, and formation of Si—Si type oxygen deficiency defects can be suppressed.
さらに、前記不活性なガスとして、He、Ne、Arのうちのいずれか一種と酸素(O2)との混合ガスを用いた場合、特に前記酸素の混合割合が、モル比率で0.01mol%以上であると、同比率が0.01mol%未満である場合に比べ、好ましい結果を得ることができる。
また、前記酸素(O2)の混合割合が、モル比率で10mol%を超えても、10mol%以下である場合に比べ、効果に大差がない。
よって、前記不活性なガスとして、He、Ne、Arのうちのいずれか一種と酸素(O2)との混合ガスを用いた場合、前記酸素の好ましい混合割合は、モル比率で0.01〜10mol%の範囲である。
Further, when a mixed gas of any one of He, Ne, and Ar and oxygen (O 2 ) is used as the inert gas, the mixing ratio of the oxygen is 0.01 mol% in terms of a molar ratio. When it is above, a preferable result can be obtained as compared with the case where the ratio is less than 0.01 mol%.
Moreover, even if the mixing ratio of the oxygen (O 2 ) exceeds 10 mol% in terms of molar ratio, there is no significant difference in effect compared to the case where the mixing ratio is 10 mol% or less.
Therefore, when a mixed gas of any one of He, Ne, and Ar and oxygen (O 2 ) is used as the inert gas, a preferable mixing ratio of the oxygen is 0.01 to It is in the range of 10 mol%.
本発明は、紫外光透過材料としての石英ガラス管の製造に好ましく用いることができる。紫外光透過波長範囲の広い石英ガラス管とするためには、フッ素添加石英ガラスを用いると、より好ましい。 The present invention can be preferably used for producing a quartz glass tube as an ultraviolet light transmitting material. In order to obtain a quartz glass tube having a wide ultraviolet light transmission wavelength range, it is more preferable to use fluorine-added quartz glass.
紫外光透過材料の石英ガラス管に適用する場合、前記延伸後におけるガラス管の波長170nmから400nmにわたる光透過率が60%以上であることが好ましい。特に波長163nmにおける光透過率が75%以上、さらに望ましくは80%以上、特に望ましくは波長163nmにおいて吸収ピークが実質的に存在しないことが好ましい。さらに、前記延伸後におけるガラス管の波長163nmに吸収ピークを示すSi−Si型の酸素欠乏欠陥の肉厚方向の平均濃度が1×1016cm-3以下であることが好ましい。 When applied to a quartz glass tube of ultraviolet light transmitting material, it is preferable that the light transmittance of the glass tube after stretching is from 60% or more to a wavelength of 170 nm to 400 nm. In particular, it is preferable that the light transmittance at a wavelength of 163 nm is 75% or more, more desirably 80% or more, and particularly desirably that there is substantially no absorption peak at a wavelength of 163 nm. Furthermore, it is preferable that the average concentration in the thickness direction of the Si—Si type oxygen-deficient defect having an absorption peak at a wavelength of 163 nm of the glass tube after the stretching is 1 × 10 16 cm −3 or less.
波長163nm吸収の吸収断面積は、σ=6.0×10-17cm2 (文献 K.Awazu , et al., J. Appl. Phys., 69(1991)4183 参照)であり、これより、前記濃度を算出することが出来る。 The absorption cross section of absorption at a wavelength of 163 nm is σ = 6.0 × 10 −17 cm 2 (refer to the literature K. Awazu, et al., J. Appl. Phys., 69 (1991) 4183). The concentration can be calculated.
ガラス管が加熱軟化する温度において化学的に不活性な雰囲気を形成する事により、加熱温度を1700℃以上とすることが可能になる。よって、ガラスの粘性が低下して加工速度を高めることが可能となる。
つまり、前記延伸加工工程における加熱温度が1700℃以上であると、高い製造効率が維持されるため好ましい。さらには、加熱温度を1750℃以上とするとよく、より好ましくは、1800℃以上とすると、製造効率の向上が顕著になる。但し、加熱温度を2200℃以上とすると、ガラスの自重で延伸が進行してしまうため、内部加圧状態での延伸加工が困難になる。このため、加熱温度は、2100℃以下とすることが好ましい。
By forming a chemically inert atmosphere at the temperature at which the glass tube is heated and softened, the heating temperature can be set to 1700 ° C. or higher. Therefore, the viscosity of the glass is lowered and the processing speed can be increased.
That is, it is preferable that the heating temperature in the stretching step is 1700 ° C. or higher because high production efficiency is maintained. Furthermore, the heating temperature is preferably 1750 ° C. or higher, more preferably 1800 ° C. or higher. However, if the heating temperature is 2200 ° C. or higher, stretching proceeds due to the weight of the glass, making it difficult to perform stretching in an internally pressurized state. For this reason, it is preferable that heating temperature shall be 2100 degrees C or less.
前記延伸前におけるガラス管の断面積が30cm2以上であると良い。ここで、断面積とは、ガラス管を、軸方向に対し垂直に切断した際(輪切りにした際)の断面積である。
延伸前の出発材料としてのガラス管の断面積が大きい程、ガラスにかかる温度は高くなるため、環境雰囲気の影響を受けやすい。ガラス管を延伸する際のガラス断面積、ガラス粘度(ガラス温度)、張力の関係は、粘性体一軸粘性変形式で示される。よって、ガラス管の断面積が大きくなるほど、加熱温度を高く設定することができる。
したがって、ガラス管の断面積が大きいほど、ガラス管の内側と外側の少なくとも一方の雰囲気を、ガラス管が加熱軟化する温度において化学的に不活性な雰囲気とする効果が顕著となる。
The cross-sectional area of the glass tube before stretching is preferably 30 cm 2 or more. Here, the cross-sectional area is a cross-sectional area when the glass tube is cut perpendicularly to the axial direction (when cut into a circle).
The larger the cross-sectional area of the glass tube as a starting material before stretching, the higher the temperature applied to the glass, and therefore it is more susceptible to the influence of the environmental atmosphere. The relationship between the glass cross-sectional area, glass viscosity (glass temperature), and tension when the glass tube is stretched is expressed by a viscous body uniaxial viscous deformation formula. Therefore, the heating temperature can be set higher as the cross-sectional area of the glass tube increases.
Therefore, the larger the cross-sectional area of the glass tube, the more remarkable the effect that at least one of the atmosphere inside and outside the glass tube is chemically inert at the temperature at which the glass tube is heated and softened.
前記延伸前におけるガラス管の断面積が30cm2未満であると、前記した利点が得られないため好ましくない。 If the cross-sectional area of the glass tube before stretching is less than 30 cm 2 , the above-described advantages cannot be obtained, which is not preferable.
以上説明したように本発明は、ガラス管が加熱軟化する温度において化学的に不活性なガスを主成分とする雰囲気をもって、ガラス管の延伸加工を行うこととしたので、紫外光透過率に優れたガラス管を、効率よく製造することができる。
特に、石英ガラスからなるガラス管の製造に用いた場合、優れた紫外光透過材料を低コストで製造することが可能となる。
さらに、フッ素添加石英ガラスは、フッ素添加されていない石英ガラスと比較して紫外吸収端が短波長シフトしているので、紫外光透過波長範囲の広い石英ガラス管を提供できるなど、多くの効果を有する。
As described above, the present invention is excellent in ultraviolet light transmittance because the glass tube is stretched in an atmosphere mainly composed of a chemically inert gas at a temperature at which the glass tube is heated and softened. A glass tube can be manufactured efficiently.
In particular, when used for manufacturing a glass tube made of quartz glass, an excellent ultraviolet light transmitting material can be manufactured at low cost.
Furthermore, since the ultraviolet absorption edge of fluorinated quartz glass has a shorter wavelength shift compared to quartz glass without fluorine addition, it can provide many effects such as providing a quartz glass tube with a wide ultraviolet light transmission wavelength range. Have.
以下、実施形態例を説明する。
図1に、本発明に係るガラス管の製造方法における、延伸加工工程の概略を示す。
図中の1は延伸加工前のガラス管(延伸前の出発材料)、2は、所望の外径、内径、厚さをもった管状体に形成された延伸加工後のガラス管である。これらガラス管1および2は、内側3の圧力を、外側4の圧力より高く保ちながら、ヒータなどの加熱手段5、5により加熱軟化され、この状態で、延伸ロール6,6により延伸される。
Hereinafter, exemplary embodiments will be described.
In FIG. 1, the outline of the extending | stretching process in the manufacturing method of the glass tube which concerns on this invention is shown.
In the figure, 1 is a glass tube before stretching (starting material before stretching), and 2 is a glass tube after stretching formed in a tubular body having a desired outer diameter, inner diameter, and thickness. These glass tubes 1 and 2 are heated and softened by heating means 5 and 5 such as heaters while keeping the pressure of the inner side 3 higher than the pressure of the outer side 4, and are stretched by the stretching rolls 6 and 6 in this state.
延伸前の出発材料となるガラス管1には、紫外光用に一般的に用いられる石英ガラスからなるものを用いる。この石英ガラス管1は、この種の分野で通常用いられる方法で製造する。
例えば、まず、SiCl4を火炎中で加水分解するスート法を用いてガラス微粒子堆積体を製造する。原料としてはシロキサン等を使用することも可能である。次に、ガラス微粒子堆積体を焼結炉に挿入し、透明化することにより石英ガラス母材を得る。紫外光透過性に優れたフッ素添加石英ガラスを得る場合には、SiF4、CF4等のフッ素添加剤含有雰囲気下でフッ素添加処理、透明ガラス化処理を行うことで、フッ素添加石英ガラス母材を得る。SiF4、CF4等のフッ素添加剤の添加濃度、加熱条件等は、所望のフッ素添加量が得られるように適宜調整する。このような製法を用いることで、Al,Ca,Fe,Cu,Ni,Cr,Mg,Mn,Co,Ti,Na,K,LiおよびZnのそれぞれの濃度が5wtppb以下の高純度の石英ガラスを得ることが可能である。
このようにして得られた石英ガラス母材、フッ素添加石英ガラス母材を用いて、出発材料となるガラス管1を成形し、このガラス管1を、前記した延伸加工工程に供する。
As the glass tube 1 serving as a starting material before stretching, a glass tube made of quartz glass generally used for ultraviolet light is used. The quartz glass tube 1 is manufactured by a method usually used in this kind of field.
For example, first, a glass fine particle deposit is manufactured using a soot method in which SiCl 4 is hydrolyzed in a flame. It is also possible to use siloxane or the like as a raw material. Next, the quartz glass base material is obtained by inserting the glass particulate deposit into a sintering furnace and making it transparent. When obtaining fluorine-added quartz glass with excellent ultraviolet light transmission, fluorine addition treatment and transparent vitrification treatment are performed in a fluorine additive-containing atmosphere such as SiF 4 , CF 4, etc. Get. The addition concentration of fluorine additives such as SiF 4 and CF 4 , heating conditions, and the like are appropriately adjusted so as to obtain a desired fluorine addition amount. By using such a manufacturing method, a high-purity quartz glass in which each concentration of Al, Ca, Fe, Cu, Ni, Cr, Mg, Mn, Co, Ti, Na, K, Li, and Zn is 5 wtppb or less is obtained. It is possible to obtain.
Using the quartz glass base material and the fluorine-added quartz glass base material thus obtained, a glass tube 1 as a starting material is formed, and this glass tube 1 is subjected to the above-described stretching process.
延伸加工工程においては、延伸加工前後のガラス管1および2の、内側3の圧力を外側4の圧力より高く保つために、両ガラス管1,2の内側3に、ガラス管1が加熱軟化する温度において化学的に不活性なガス7を強制的に送り込む。また、延伸加工前後のガラス管1および2の、内側3と外側4の雰囲気を、不活性なガス7の雰囲気とする。
In the stretching process, the glass tube 1 is heated and softened on the inner side 3 of both glass tubes 1 and 2 in order to keep the pressure of the inner side 3 of the glass tubes 1 and 2 before and after the stretching process higher than the pressure of the outer side 4. A
不活性なガス7としては、少なくとも、前記ガラス管1,2が加熱軟化する温度において化学的に不活性なガスを主成分としたものを用いる。例えば、He、Ne、Arのうちのいずれか一種の不活性ガス、または、それらのうちの二種以上を混合した混合ガス、または、それらのうちの一種以上と酸素(O2)を混合した混合ガスなどを用いることができる。
As the
酸素との混合ガスとする場合は、前述のように、酸素(O2)の混合割合が、モル比率で0.01mol%以上、10mol%以下とすることが好ましい。 When a mixed gas with oxygen is used, as described above, the mixing ratio of oxygen (O 2 ) is preferably 0.01 mol% or more and 10 mol% or less in terms of a molar ratio.
以下、より具体的な実施例と比較例について説明する(表1参照)。 Hereinafter, more specific examples and comparative examples will be described (see Table 1).
(実施例1〜6)
図1に示すような、この種の分野で一般的に用いられる縦型のガラス管延伸機を用いて、ガラス管の延伸加工工程を行う。
延伸前の出発材料となるガラス管は、外径110mm、内径75mmのものとする。またそのガラス組成は、フッ素添加のSiO2ガラスであって、フッ素含有量が1wt%、OH含有量が1wtppm以下、Cl含有量が1wtppm以下のフッ素添加SiO2ガラスとする。
(Examples 1-6)
A glass tube stretching process is performed using a vertical glass tube stretching machine generally used in this type of field as shown in FIG.
The glass tube used as the starting material before stretching is assumed to have an outer diameter of 110 mm and an inner diameter of 75 mm. Also the glass composition is a SiO 2 glass fluoridation, 1 wt% fluorine content, OH content 1 wtppm or less, Cl content is less for fluorine-containing SiO 2 glass 1 wtppm.
延伸後のガラス管の目標形状は、外径40mm、内径38mm、厚さ1mmとする。
延伸のための引き出し速度は、500mm/分とする。
The target shape of the glass tube after stretching is an outer diameter of 40 mm, an inner diameter of 38 mm, and a thickness of 1 mm.
The drawing speed for stretching is 500 mm / min.
(実施例1〜6)
ガラス管の内側と外側の雰囲気は、Arを主成分とする不活性なガスの雰囲気とする。具体的には、モル比率で、Ar;100〜80mol%、O2:0〜20mol%の範囲のものを用いる。
ガラス管の外側の圧力は大気圧とし、ガラス管の内側の圧力は、延伸後ガラス管の外径が目標外径となるように適宜調整するが、概ね、大気圧+200〜800Paの範囲で調整する。加熱温度は、1800℃で調整する。
(Examples 1-6)
The atmosphere inside and outside the glass tube is an inert gas atmosphere mainly composed of Ar. Specifically, the molar ratio is Ar: 100 to 80 mol%, O 2 : 0 to 20 mol%.
The pressure on the outside of the glass tube is atmospheric pressure, and the pressure on the inside of the glass tube is adjusted as appropriate so that the outer diameter of the glass tube becomes the target outer diameter after stretching, but is generally adjusted in the range of atmospheric pressure +200 to 800 Pa. To do. The heating temperature is adjusted at 1800 ° C.
(比較例)
ガラス管の内側と外側の雰囲気を、窒素を主成分とするガス雰囲気とする。具体的には、モル比率で、N2;100mol%のものを用いる。
(Comparative example)
The atmosphere inside and outside the glass tube is a gas atmosphere mainly composed of nitrogen. Specifically, a molar ratio of N 2 ; 100 mol% is used.
以上の条件で延伸加工を行う。得られたガラス管(実施例1〜6、および比較例)について、
測定値A:波長163nm光透過率[%]
測定値B:1mmガラス厚中の平均欠陥濃度(Si−Si型酸素欠乏欠陥濃度)[個/cm3]
を測定し、紫外光透過率に関する評価を行う。結果を表1中に記す。
Stretching is performed under the above conditions. About the obtained glass tube (Examples 1-6 and comparative example),
Measurement value A: wavelength 163 nm light transmittance [%]
Measured value B: average defect concentration in 1 mm glass thickness (Si-Si type oxygen deficiency defect concentration) [pieces / cm 3 ]
To evaluate the ultraviolet light transmittance. The results are shown in Table 1.
測定値Aは、数値が大きい程好ましく、75%以上であれば良好、80%以上であれば更に良好といえる。
この測定値Aが大きいほど、SiO2が安定しており、ガラス管の表面におけるSiO2からの酸素原子の引き抜きが抑えられ、波長163nmに吸収ピークを示すSi−Si型酸素欠乏欠陥の生成が抑制されているといえる。
The measured value A is preferably as large as possible. It can be said that it is good when it is 75% or more, and it is even better when it is 80% or more.
The higher the measured value A is greater, SiO 2 is stable, extraction of oxygen atoms from SiO 2 is suppressed at the surface of the glass tube, the generation of Si-Si type oxygen deficient defect indicating an absorption peak in a wavelength 163nm It can be said that it is suppressed.
また、測定値Bは、数値が小さい程好ましく、特に1.0×1016以下であれば良好といえる。
この測定値Bが小さいほど、SiO2が安定しており、ガラス管の表面におけるSiO2からの酸素原子の引き抜きが抑えられ、波長163nmに吸収ピークを示すSi−Si型酸素欠乏欠陥の生成が抑制されているといえる。
Further, the measured value B is preferably as small as possible, and is particularly favorable if it is 1.0 × 10 16 or less.
The smaller this measured value B is, the more stable the SiO 2 is, and the pulling out of oxygen atoms from the SiO 2 on the surface of the glass tube is suppressed, and the generation of Si—Si type oxygen-deficient defects showing an absorption peak at a wavelength of 163 nm. It can be said that it is suppressed.
表1に示す結果から、Arガス雰囲気とした実施例1は、窒素ガス雰囲気とした比較例に比べ、波長163nm光透過率、および1mmガラス厚中の平均欠陥濃度の双方において、優れた効果が確認される。
更に、Arガスに微量の酸素(0.01mol%)を加えた実施例2では、波長163nm光透過率、および1mmガラス厚中の平均欠陥濃度の双方において、より優れた効果が確認される。
また、実施例2〜6の結果より、波長163nm光透過率は、Arガスに対する酸素のモル比率を増加するにしたがって向上し、Arガスに対する酸素のモル比率を10mol%とした場合(実施例5)に概ね最大限に改善されるといえる。
すなわち、実施例1と実施例2以降との比較から、酸素の混合割合が、モル比率で0.01mol%以上であると、同比率が0.01mol%未満である場合に比べ、好ましい結果が確認される。
また、実施例5と実施例6との比較から、酸素の混合割合が、モル比率で10mol%を超えても、10mol%以下である場合に比べ、波長163nm透過率の改善効果に大差がないことが確認される。
このように、本発明に係る製造方法の優位性が確認される。
From the results shown in Table 1, Example 1 in which the Ar gas atmosphere was used had excellent effects in both the wavelength 163 nm light transmittance and the average defect concentration in the 1 mm glass thickness, compared with the comparative example in which the nitrogen gas atmosphere was used. It is confirmed.
Furthermore, in Example 2 in which a small amount of oxygen (0.01 mol%) was added to Ar gas, a more excellent effect was confirmed in both the wavelength 163 nm light transmittance and the average defect concentration in 1 mm glass thickness.
From the results of Examples 2 to 6, the light transmittance at a wavelength of 163 nm was improved as the molar ratio of oxygen to Ar gas was increased, and the molar ratio of oxygen to Ar gas was 10 mol% (Example 5). ) Can be said to be maximally improved.
That is, from the comparison between Example 1 and Example 2 and later, when the mixing ratio of oxygen is 0.01 mol% or more in terms of molar ratio, a preferable result is obtained as compared with the case where the ratio is less than 0.01 mol%. It is confirmed.
Further, from the comparison between Example 5 and Example 6, even if the mixing ratio of oxygen exceeds 10 mol% in molar ratio, there is not much difference in the effect of improving the transmittance of wavelength 163 nm compared to the case where it is 10 mol% or less. That is confirmed.
Thus, the superiority of the manufacturing method according to the present invention is confirmed.
以上、本発明の実施形態例を説明したが、本発明はこれらの例に限定されるものではなく、特許請求の範囲に記載された技術的思想の範疇において各種の変更が可能であることは言うまでもない。 Although the embodiments of the present invention have been described above, the present invention is not limited to these examples, and various modifications are possible within the scope of the technical idea described in the claims. Needless to say.
また、本実施の形態によれば、ガラス管1が加熱軟化する温度において化学的に不活性なガスの具体例として、Arのみを用いた具体例(実施例1)と、Arおよび酸素の混合ガスを用いた具体例(実施例2〜6)を示したが、ArをHeまたはNeに置換した構成においても、Arの場合と略同様の効果を得ることが可能である。 In addition, according to the present embodiment, as a specific example of a gas that is chemically inert at the temperature at which the glass tube 1 is heated and softened, a specific example using only Ar (Example 1), and a mixture of Ar and oxygen Although specific examples using gas (Examples 2 to 6) have been shown, even in a configuration in which Ar is replaced with He or Ne, substantially the same effects as in the case of Ar can be obtained.
1:延伸前のガラス管
2:延伸後のガラス管
3:ガラス管の内側
4:ガラス管の外側
5:加熱手段
6:延伸ロール
7:不活性なガス
1: glass tube before drawing 2: glass tube after drawing 3: inside of glass tube 4: outside of glass tube 5: heating means 6: drawing roll 7: inert gas
Claims (9)
前記ガラス管の内側と外側の少なくとも一方の雰囲気を、前記ガラス管が加熱軟化する温度において化学的に不活性なガスを主成分とする雰囲気としたことを特徴とするガラス管の製造方法。 In the drawing process of keeping the inner pressure of the glass tube higher than the outer pressure, heating and softening the glass tube in that state, and drawing it into a tubular body of a desired shape,
A method for producing a glass tube, characterized in that an atmosphere of at least one of the inside and the outside of the glass tube is an atmosphere mainly composed of a chemically inert gas at a temperature at which the glass tube is heated and softened.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9212082B2 (en) | 2012-12-26 | 2015-12-15 | Heraeus Quarzglas Gmbh & Co. Kg | System and method for fabricating optical fiber preform and optical fiber |
| CN116444137A (en) * | 2023-04-28 | 2023-07-18 | 久智光电子材料科技有限公司 | Forming device and forming method of flat glass tube |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004026637A (en) * | 2002-06-26 | 2004-01-29 | Heraeus Tenevo Ag | Method for manufacturing glass tubes |
| JP2006294440A (en) * | 2005-04-12 | 2006-10-26 | Shinetsu Quartz Prod Co Ltd | Modified synthetic quartz glass tube for excimer UV lamp and method for producing the same |
| JP2006335577A (en) * | 2005-05-31 | 2006-12-14 | Shinetsu Quartz Prod Co Ltd | Synthetic quartz glass tube for highly transmissive excimer UV lamp and manufacturing method thereof |
| JP2008195590A (en) * | 2007-02-15 | 2008-08-28 | Sumitomo Electric Ind Ltd | Method for producing quartz glass molded article and quartz glass molded article |
| JP2008266060A (en) * | 2007-04-18 | 2008-11-06 | Ferrotec Ceramics Corp | Manufacturing method of quartz glass tube |
-
2009
- 2009-01-22 JP JP2009012014A patent/JP2010168243A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004026637A (en) * | 2002-06-26 | 2004-01-29 | Heraeus Tenevo Ag | Method for manufacturing glass tubes |
| JP2006294440A (en) * | 2005-04-12 | 2006-10-26 | Shinetsu Quartz Prod Co Ltd | Modified synthetic quartz glass tube for excimer UV lamp and method for producing the same |
| JP2006335577A (en) * | 2005-05-31 | 2006-12-14 | Shinetsu Quartz Prod Co Ltd | Synthetic quartz glass tube for highly transmissive excimer UV lamp and manufacturing method thereof |
| JP2008195590A (en) * | 2007-02-15 | 2008-08-28 | Sumitomo Electric Ind Ltd | Method for producing quartz glass molded article and quartz glass molded article |
| JP2008266060A (en) * | 2007-04-18 | 2008-11-06 | Ferrotec Ceramics Corp | Manufacturing method of quartz glass tube |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9212082B2 (en) | 2012-12-26 | 2015-12-15 | Heraeus Quarzglas Gmbh & Co. Kg | System and method for fabricating optical fiber preform and optical fiber |
| CN116444137A (en) * | 2023-04-28 | 2023-07-18 | 久智光电子材料科技有限公司 | Forming device and forming method of flat glass tube |
| CN116444137B (en) * | 2023-04-28 | 2024-05-03 | 久智光电子材料科技有限公司 | Method for forming flat glass tube |
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