JP2010145770A - Screen and method of manufacturing the same - Google Patents

Abstract

To provide a screen capable of obtaining a high contrast and obtaining a uniform image with good viewing angle characteristics, and a method of manufacturing the same.
A base sheet and a wavelength provided on the base sheet and having wavelength selectivity that reflects light in a specific wavelength region and transmits light in a wavelength region other than the specific wavelength region. The wavelength selection layer 2 is configured by dispersing minute pieces 11 having wavelength selectivity, and specific wavelength regions are at least two wavelength regions different from each other.
[Selection] Figure 1

Description

  The present invention relates to a screen and a method of manufacturing the same, and more particularly to a screen technology for displaying an image by reflecting light according to an image signal.

  A so-called front projection type projector is used in combination with a reflection type screen that reflects projection light. In an environment where there is external light such as illumination light from room lighting, the contrast of the image may be reduced by reflecting the external light together with the projection light on the screen. To solve this problem, for example, a screen technology using a multilayer film or an interference film that selectively reflects light having a specific wavelength corresponding to projection light has been proposed (see, for example, Patent Documents 1 to 3). .

JP 2003-270725 A JP 2005-189724 A JP 2007-256479 A

  When a filter made of an inorganic material is formed over the entire irradiated surface, the filter is damaged by bending, and it is difficult to wind the screen. For this reason, troubles arise in storing and carrying the screen. In addition, when a filter made of an organic material is formed on the entire irradiated surface, the filter can be bent. On the other hand, the larger the irradiated surface, the more difficult it is to maintain the film forming accuracy. For this reason, the wavelength selectivity is likely to vary. Furthermore, when the projection light is scattered by the screen in order to obtain good viewing angle characteristics, a certain degree of angular distribution occurs in the light incident on the filter. Since the wavelength selectivity of the filter depends on the incident angle of light, the wavelength and intensity of the light reflected by the filter change as the angle distribution of light increases. For this reason, as the projection light is scattered, it becomes more difficult to obtain a uniform image with less unevenness in color and brightness. The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a screen capable of obtaining high contrast and obtaining a uniform image with good viewing angle characteristics, and a method for manufacturing the same. And

  In order to solve the above-described problems and achieve the object, a screen according to the present invention is provided on a base sheet and the base sheet, reflects light in a specific wavelength region, and other than the specific wavelength region. And a wavelength selection layer having wavelength selectivity that transmits light in the wavelength region, and the wavelength selection layer is configured by dispersing minute pieces having wavelength selectivity.

  By giving wavelength selectivity to the wavelength region of the light used by the projection light, it is possible to reflect the projection light and to suppress reflection of external light, and to obtain a high contrast. Dispersion of the micro-pieces having wavelength selectivity can reduce variation in wavelength selectivity compared to the case where a filter is formed on the entire irradiated surface. Moreover, the light reflected by the minute pieces is scattered by changing the direction to some extent to disperse the minute pieces. Thereby, high contrast can be obtained, and a uniform image can be obtained with good viewing angle characteristics.

  As a preferred embodiment of the present invention, it is desirable that the specific wavelength region is at least two wavelength regions different from each other. Thereby, wavelength selectivity can be given to a plurality of color lights.

  Moreover, as a preferable aspect of the present invention, it is desirable that the minute piece has a layer structure that reflects light in at least two wavelength regions. Thereby, the micro piece which selects and reflects at least two color lights can be obtained.

  As a preferred embodiment of the present invention, the layer structure is formed by laminating at least a first layer that reflects light in the first wavelength region and a second layer that reflects light in the second wavelength region. Desirably configured. Thereby, a layer structure that reflects light in at least two wavelength regions can be easily obtained.

  In a preferred aspect of the present invention, the micro piece includes at least a first color light micro piece that reflects light in the first wavelength region and a second color light micro piece that reflects light in the second wavelength region. It is desirable to have. Thereby, the wavelength selection layer which selects and reflects the light of at least the first wavelength region and the light of the second wavelength region can be easily obtained.

  Moreover, as a preferable aspect of the present invention, it is desirable that the base sheet is configured using a light-absorbing member that absorbs light. Thereby, reflection of the light which permeate | transmitted the wavelength selection layer and transmission of the light irradiated to the base material sheet side among screens can be reduced, and still higher contrast can be obtained.

  Moreover, as a preferable aspect of the present invention, it is desirable to have a light scattering layer that scatters light incident on the wavelength selection layer and light reflected by the wavelength selection layer. Thereby, a favorable viewing angle characteristic can be obtained.

  Moreover, as a preferable aspect of the present invention, it is desirable that the minute piece is configured using a dielectric multilayer film. Thereby, the micro piece which has a highly accurate wavelength selectivity can be obtained easily.

  Furthermore, the method for manufacturing a screen according to the present invention is a method for manufacturing a screen having a wavelength selection layer having a wavelength selectivity that reflects light in a specific wavelength region and transmits light in a wavelength region other than the specific wavelength region. A method comprising a step of forming a wavelength selection layer in which fine pieces having wavelength selectivity are dispersed on a substrate sheet. Thereby, a high contrast can be obtained, and a screen capable of obtaining a uniform image with good viewing angle characteristics can be manufactured.

  Moreover, as a preferable aspect of the present invention, it is desirable to include a step of forming a light scattering layer for scattering light on the wavelength selection layer. Thereby, the screen which can obtain a favorable viewing angle characteristic can be manufactured.

  Furthermore, the method for manufacturing a screen according to the present invention is a method for manufacturing a screen having a wavelength selection layer having a wavelength selectivity that reflects light in a specific wavelength region and transmits light in a wavelength region other than the specific wavelength region. A method of forming a wavelength selective layer in which fine pieces having wavelength selectivity are dispersed on a light scattering layer that scatters light, and forming a base sheet on the wavelength selective layer And a step of performing. Thereby, a high contrast can be obtained, and a screen capable of obtaining a uniform image with good viewing angle characteristics can be manufactured.

  Moreover, as a preferable aspect of the present invention, it is desirable that the step of forming the wavelength selection layer includes a step of applying a curable material mixed with minute pieces. This makes it possible to form a wavelength selection layer in which minute pieces are dispersed. In addition, using gravity, it is possible to align the direction of the minute pieces to the direction of the surface on which the wavelength selection layer is formed, and to provide high wavelength selectivity for the projection light incident on the irradiated surface of the screen Can be.

  As a preferred embodiment of the present invention, it is desirable that the step of forming the wavelength selection layer includes a step of aligning the direction of the minute piece in the direction of the surface where the minute piece is scattered. By aligning the direction of the minute pieces to some extent, it is possible to provide a configuration with high wavelength selectivity for the projection light incident on the irradiated surface of the screen.

  Moreover, as a preferable aspect of the present invention, it is desirable to include a step of forming minute pieces. Thereby, the micro piece disperse | distributed to a wavelength selection layer can be obtained.

  Moreover, as a preferable aspect of the present invention, the step of forming the minute pieces includes the step of forming a filter having wavelength selectivity on the surface of the filter forming substrate, the step of peeling the filter from the filter forming substrate, and the peeling. And crushing the formed filter. Thereby, a minute piece can be formed easily.

  Embodiments of the present invention will be described below in detail with reference to the drawings.

  FIG. 1 is a schematic cross-sectional view of a screen according to Embodiment 1 of the present invention. The screen according to this example includes a base sheet 1, a wavelength selection layer 2, and a light scattering layer 3. The base sheet 1 is a parallel plate configured using a light absorbing member that absorbs light. As the light absorbing member, for example, a black resin member is used. The wavelength selection layer 2 is provided on the surface of the base sheet 1 on which the projection light is incident. The wavelength selection layer 2 has wavelength selectivity that reflects light in a specific wavelength region and transmits light in a wavelength region other than the specific wavelength region. The wavelength selection layer 2 is configured by dispersing minute pieces 11 having wavelength selectivity in a transparent member.

  The light scattering layer 3 is provided on the surface of the wavelength selection layer 2 on the side on which the projection light is incident. The light scattering layer 3 scatters light incident on the wavelength selection layer 2 and light reflected by the wavelength selection layer 2. The light scattering layer 3 is configured by dispersing a light scattering material 12 in a transparent member. For example, a transparent resin member is used as the transparent member. As the light scattering material 12, for example, glass beads are used. The light scattering material 12 has a diameter of about several tens to several hundreds of μm, for example. The light scattering layer 3 scatters the light incident on the light scattering material 12 at an angle depending on the incident position by making the refractive index different between the transparent member and the light scattering material 12.

  FIG. 2 is a schematic cross-sectional view of the minute piece 11. The small piece 11 is preferably smaller than the pixels on the irradiated surface of the screen, and is formed to have a size of about several hundred μm, for example. The minute piece 11 is configured using a dielectric multilayer film. The dielectric multilayer film has a layer structure in which high refractive index member layers and low refractive index member layers are alternately laminated. The thickness of the layer to be laminated is set according to the desired wavelength selectivity. The dielectric multilayer film constituting the minute piece 11 reflects light in specific three wavelength regions and transmits light in other wavelength regions.

  FIG. 3 is a diagram illustrating an example of the reflection characteristics of the dielectric multilayer film constituting the minute piece 11. The wavelength selectivity of the dielectric multilayer film is set according to the wavelength region of the projection light. For example, the dielectric multilayer film is formed so that the reflectance reaches a peak in the vicinity of 460 nm (blue, B), 530 nm (green, G), and 620 nm (red, R). Between the reflectance peaks, the reflectance decreases near 490 nm (blue-green) and 580 nm (yellow). In the dielectric multilayer film, light having a wavelength with a lower reflectance is transmitted with a higher transmittance.

  FIG. 4 is a diagram for explaining scattering of projected light on the screen. It is assumed that the refractive index difference between the transparent member filling the light scattering layer 3 and the light scattering material 12 is set so that the scattering angle is about ± 20 degrees in terms of air. Further, for example, the minute piece 11 has a wavelength shift amount of transmission and reflection characteristics within ± 25 nm with respect to incident light having an incident angle of ± 30 degrees. In this case, the light emitted from the screen at a viewing angle of ± 60 degrees does not cause a large shift in wavelength, and the color change of reflected light can be reduced. The direction of the minute piece 11 is aligned to some extent so that the surface direction of each layer of the minute piece 11 and the surface on the base sheet 1 are within ± 10 degrees, for example. In this case, the light reflected by the minute piece 11 travels with a variation of about ± 20 degrees with respect to the incident light.

  The projection light incident on the screen from the projector is scattered within a range of ± 20 degrees in the light scattering layer 3 and enters the wavelength selection layer 2. The light scattered in the range of ± 20 degrees is scattered in the range of ± 40 degrees by reflection from the minute piece 11 and is incident on the light scattering layer 3 again. The light scattered in the range of ± 40 degrees is scattered in the range of ± 60 degrees by passing through the light scattering layer 3 and is emitted from the screen. In this way, it is possible to secure a viewing angle of about 120 degrees for the projection light reflected by the screen.

  The light transmitted through the minute piece 11 is absorbed by the base sheet 1. By reflecting only light in a specific wavelength region in the micro-piece 11 and absorbing light in other wavelength regions to the base sheet 1, projection light is reflected with high efficiency and reflection of external light is suppressed. Moreover, when there exists light irradiated to the base material sheet 1 side among screens, it also becomes possible to reduce permeation | transmission of the light to the light-scattering layer 3 side by absorption by the base material sheet 1. FIG. It is possible to obtain a high contrast by efficiently projecting the projection light toward the observer side and suppressing the progression of the external light toward the observer side. By dispersing the minute pieces 11 having wavelength selectivity, it is possible to reduce variation in wavelength selectivity as compared with the case where a filter is formed on the entire irradiated surface. As described above, it is possible to obtain a high contrast and to obtain a uniform image with a good viewing angle characteristic. The screen according to the present embodiment is particularly suitable when combined with a projector that uses a light source that emits light in a relatively narrow wavelength region, such as a laser or an LED.

  The wavelength selectivity of the minute piece 11 may be set based on the wavelength region of the projection light from a general projector. When a projector to be used in combination with a screen is determined, the projection light from the projector It is desirable to set according to the wavelength region. The minute piece 11 is not limited to the case of having a wavelength characteristic that reflects RGB three-color light, and may be any one that reflects light in at least two different wavelength regions. The minute piece 11 may be, for example, one that reflects color light other than RGB, or one that reflects four or more color lights.

  The minute piece is not limited to a dielectric multilayer film having a layer structure in which a layer thickness is set so as to reflect a plurality of color lights. For example, like the micro piece 20 whose cross-sectional schematic diagram is shown in FIG. 5, a first layer 21 that reflects R light, a second layer 22 that reflects G light, and a third layer 23 that reflects B light are superimposed. It is also good. For example, the first layer 21 is formed to have a peak reflectance at 620 nm, the second layer 22 at 530 nm, and the third layer 23 at 460 nm. By superposing the first layer 21, the second layer 22, and the third layer 23, the minute piece 20 having the same wavelength selectivity as that of the minute piece 11 described with reference to FIG. 3 can be formed. In addition, by forming a layer with one reflectance peak in advance, the number of layers can be reduced compared with the case where the layer thickness is set so that there are three reflectance peaks. Formation becomes easy.

  The minute piece 20 is not limited to superimposing three layers of RGB three-color light, but at least a first layer that reflects light in the first wavelength region and a second layer that reflects light in the second wavelength region. What is necessary is just to superimpose a layer. The micro piece 20 may have, for example, a layer that reflects color light other than RGB, or a stack of four or more layers of four or more color lights.

  FIG. 6 is a schematic cross-sectional view of a screen according to the first modification of the present embodiment. This modification is characterized in that the R light minute pieces 31, the G light minute pieces 32, and the B light minute pieces 33 are dispersed. For example, the R light micropiece 31 has a reflection characteristic such that the reflectance reaches a peak at 620 nm. The G light piece 32 has a reflection characteristic such that the reflectance reaches a peak at 530 nm. The B light micro-piece 33 has a reflection characteristic such that the reflectance reaches a peak at 460 nm. The wavelength having the same wavelength selectivity as that of the above-described minute piece 11 described with reference to FIG. 3 by mixing and dispersing the minute piece 31 for R light, the minute piece 32 for G light, and the minute piece 33 for B light. The selective layer 2 can be formed. In the case of this modification as well, it is easy to form a dielectric multilayer film.

  The fine pieces dispersed in the wavelength selection layer 2 are not limited to those formed for RGB three-color light. It is only necessary to disperse at least the first color light microscopic pieces that reflect the light in the first wavelength region and the second color light microscopic pieces that reflect the light in the second wavelength region, and reflects color light other than RGB. You may use the micropiece to make. Further, four or more kinds of fine pieces may be dispersed. Furthermore, you may mix the micro piece which reflects the light of two or more wavelength ranges.

  FIG. 7 is a schematic cross-sectional view of a screen according to Modification 2 of the present embodiment. This modification is characterized by having a wavelength selective scattering layer 40 having a function of a wavelength selective layer and a function of a light scattering layer. The wavelength selective scattering layer 40 is provided on the incident side of the base sheet 1. The wavelength selective scattering layer 40 is configured by dispersing the minute pieces 11 and the light scattering material 12 in a transparent member. The light scattering material 12 is distributed on the light incident side of the wavelength selective scattering layer 40. The minute pieces 11 are distributed on the base material sheet 1 side in the wavelength selective scattering layer 40. Thereby, the function of the wavelength selective layer 2 and the function of the light scattering layer 3 can be realized by the wavelength selective scattering layer 40.

  The dielectric multilayer film is suitable for use as a fine piece in terms of wavelength selection accuracy and manufacturability. The minute piece is not limited to the dielectric multilayer film as long as it has wavelength selectivity, and for example, a resin filter or the like may be used. The light scattering layer 3 is not limited to the one in which the light scattering material 12 is dispersed. The light scattering layer 3 only needs to be capable of dispersing light. For example, the light scattering layer 3 may have a configuration having a scattering surface that scatters light or a configuration having a microlens array that diffuses light by refraction.

  FIG. 8 is a schematic cross-sectional view illustrating the procedure of the screen manufacturing method according to the second embodiment of the present invention. In step a, a filter forming substrate 50 is prepared. The filter forming substrate 50 is a plate-like member configured using, for example, polyimide. In step b, a dielectric multilayer filter 51 is formed on the surface of the filter forming substrate 50 by vapor deposition. The dielectric multilayer filter 51 is formed with a thickness of about 10 μm, for example. In step c, the dielectric multilayer filter 51 is peeled from the filter forming substrate 50.

  The filter forming substrate 50 is not limited to one made of polyimide. It is desirable that the filter forming substrate 50 has an adhesiveness with the material constituting the dielectric multilayer filter 51 so that it does not peel in the vapor deposition in the step b and is as easy as possible to peel in the step c. As the filter forming substrate 50, a metal member such as aluminum or stainless steel or a resin member may be used in addition to polyimide. The filter forming substrate 50 may be subjected to a surface treatment in order to adjust the adhesion with the dielectric multilayer filter 51.

  In step c, heat is applied to the filter forming substrate 50 and mechanical stress is applied to the filter forming substrate 50 to peel the dielectric multilayer filter 51 from the filter forming substrate 50. The dielectric multilayer filter 51 may be broken at the time of peeling. The dielectric multilayer filter 51 may be peeled off by applying vibration. Alternatively, the filter forming substrate 50 may be formed of a resin member that is soluble in a solvent, and the filter forming substrate 50 may be dissolved by being immersed in a solvent.

  In step d, the dielectric multilayer filter 51 is pulverized by using a pulverizer or the like to form the minute pieces 11. The minute piece 11 is pulverized to a size of about 100 μm to 500 μm, for example. After the dielectric multilayer filter 51 is pulverized, a step of separating the small pieces 11 formed in a desired size from those pulverized finer than a desired size or larger ones may be included. This makes it possible to form the wavelength selection layer 2 having good reflection characteristics.

  In step e, the fine pieces 11 are mixed in the transparent paint and applied onto the base material sheet 1. The transparent paint is a curable material that is cured by volatilization of the solvent. The wavelength selection layer 2 in which the fine pieces 11 are dispersed is formed by curing the transparent paint. Here, when a low-viscosity transparent paint is used before the solvent is volatilized, the minute piece 11 falls down due to the influence of gravity before the solvent volatilizes, and the direction of the minute piece 11 is aligned along the surface of the base sheet 1. . Furthermore, as the thickness of the transparent paint is reduced due to the volatilization of the solvent, the direction of the minute pieces 11 can be further aligned along the surface of the base sheet 1.

  In step f, the light scattering material 12 is mixed into the transparent resin and applied onto the wavelength selection layer 2. As the transparent resin, for example, a photocurable resin is used. The light scattering layer 3 in which the light scattering material 12 is dispersed is formed by curing the transparent resin by light irradiation. The light scattering layer 3 may be formed in advance and may be bonded to the wavelength selection layer 2 using an adhesive. Through the above procedure, the screen described in the first embodiment is manufactured.

  FIG. 9 is a schematic cross-sectional view illustrating the procedure of the screen manufacturing method according to the first modification of the present embodiment. This modification is characterized by laminating the light scattering layer 3, the wavelength selection layer 2, and the base sheet 1 in this order. Steps a to d are the same as the procedure described with reference to FIG. In step e, a transparent paint mixed with the fine pieces 11 is applied on the light scattering layer 3 in which the light scattering material 12 is dispersed. The wavelength selection layer 2 in which the fine pieces 11 are dispersed is formed by curing the transparent paint. In the process f, the base material sheet 1 is formed by apply | coating a light absorptive member on the wavelength selection layer 2, and making it harden | cure. The base sheet 1 may be formed in advance, and may be bonded to the wavelength selection layer 2 using an adhesive. In this way, the screen described in Example 1 is manufactured.

  FIG. 10 is a schematic cross-sectional view illustrating the procedure of the screen manufacturing method according to the second modification of the present embodiment. This modification is characterized in that it includes a step for aligning the directions of the minute pieces 11. In step a, a substrate sheet 1 is prepared. In step b, an adhesive 52 is applied on the base sheet 1. For the adhesive 52, for example, a photocurable material is used. Moreover, the adhesive agent 52 before hardening has adhesiveness.

  In step c, the fine pieces 11 are sprayed on the adhesive 52 before curing. Here, the minute piece 11 is attached to the adhesive 52 by spraying the minute piece 11 on the adhesive 52. In step d, the surface of the adhesive 52 on which the fine pieces 11 are dispersed is rubbed with a flexible member, for example, a cloth 53. By rubbing with the cloth 53, the minute piece 11 stuck vertically to the surface of the base sheet 1 is laid down or removed. In this step, the direction of the minute pieces 11 is aligned with the direction of the surface of the base sheet 1 where the minute pieces 11 are scattered. In addition, this process is good also as repeating several times as needed.

  In step e, the adhesive 52 is cured by irradiating light. By curing the adhesive 52, the wavelength selection layer 2 in which the fine pieces are dispersed is formed. In step f, the light scattering layer 3 in which the light scattering material 12 is dispersed is formed on the wavelength selection layer 2. In this way, the screen described in Example 1 is manufactured. Note that the adhesive 52 is not limited to a photocurable material, and may be a curable material that is cured by volatilization of a solvent.

  As described above, the screen according to the present invention is suitable for displaying an image using projection light from a front projection type projector.

The cross-sectional schematic diagram of the screen which concerns on Example 1 of this invention. The cross-sectional schematic diagram of a micro piece. The figure which shows the example of the reflective characteristic of a dielectric multilayer. The figure explaining scattering of the projection light in a screen. The cross-sectional schematic diagram of the micro piece which overlap | superposed the 1st layer, the 2nd layer, and the 3rd layer. FIG. 6 is a schematic cross-sectional view of a screen according to Modification 1 of Example 1. FIG. 6 is a schematic cross-sectional view of a screen according to a second modification of the first embodiment. Sectional schematic diagram explaining the procedure of the manufacturing method which concerns on Example 2 of this invention. FIG. 9 is a schematic cross-sectional view illustrating the procedure of the manufacturing method according to Modification 1 of Example 2. FIG. 10 is a schematic cross-sectional view illustrating the procedure of the manufacturing method according to Modification 2 of Example 2.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 Base sheet, 2 Wavelength selection layer, 3 Light scattering layer, 11 Minute piece, 12 Light scattering material, 20 Minute piece, 21 1st layer, 22 2nd layer, 23 3rd layer, 31 R light piece, 32 G light piece, 33 B light piece, 40 wavelength selective scattering layer, 50 filter forming substrate, 51 dielectric multilayer filter, 52 adhesive, 53 cloth

Claims (15)

A base sheet;
A wavelength selection layer provided on the substrate sheet, having a wavelength selectivity that reflects light in a specific wavelength region and transmits light in a wavelength region other than the specific wavelength region; and
The screen, wherein the wavelength selection layer is configured by dispersing minute pieces having the wavelength selectivity.   The screen according to claim 1, wherein the specific wavelength region is at least two wavelength regions different from each other.   The screen according to claim 2, wherein the minute piece has a layer structure that reflects light in the at least two wavelength regions.   The layer structure is formed by superposing at least a first layer that reflects light in a first wavelength region and a second layer that reflects light in a second wavelength region. Item 4. The screen according to item 3.   The minute piece includes at least a first color light minute piece that reflects light in the first wavelength region and a second color light minute piece that reflects light in the second wavelength region. The screen according to claim 2.   The said base material sheet is comprised using the light absorptive member which absorbs light, The screen as described in any one of Claims 1-5 characterized by the above-mentioned.   The screen according to claim 1, further comprising a light scattering layer that scatters light incident on the wavelength selection layer and light reflected by the wavelength selection layer.   The screen according to claim 1, wherein the minute piece is configured using a dielectric multilayer film. A method for producing a screen having a wavelength selective layer having a wavelength selectivity that reflects light in a specific wavelength region and transmits light in a wavelength region other than the specific wavelength region,
A method for producing a screen, comprising a step of forming the wavelength selective layer in which fine pieces having the wavelength selectivity are dispersed on a base material sheet.   The method for manufacturing a screen according to claim 9, comprising a step of forming a light scattering layer that scatters light on the wavelength selection layer. A method for producing a screen having a wavelength selective layer having a wavelength selectivity that reflects light in a specific wavelength region and transmits light in a wavelength region other than the specific wavelength region,
Forming the wavelength-selective layer in which fine pieces having the wavelength selectivity are dispersed on a light-scattering layer that scatters light;
Forming a base material sheet on the wavelength selection layer.   The method of manufacturing a screen according to claim 9, wherein the step of forming the wavelength selection layer includes a step of applying a curable material mixed with the minute pieces.   12. The step of forming the wavelength selection layer includes a step of aligning the direction of the minute piece in the direction of the surface where the minute piece is scattered. The manufacturing method of the screen as described.   The method for manufacturing a screen according to any one of claims 9 to 13, further comprising a step of forming the minute piece. The step of forming the minute piece includes:
Forming a filter having the wavelength selectivity on the surface of the filter forming substrate;
Peeling the filter from the filter forming substrate;
The method for manufacturing a screen according to claim 14, further comprising a step of pulverizing the peeled filter.

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