JP2010144093A - Excimer lamp apparatus - Google Patents

Abstract

Even if the object to be processed is conveyed at high speed, there is no air trapped in the apparatus, and the surface of the moving object to be processed can be replaced with an inert gas so that it can be efficiently irradiated with vacuum ultraviolet light. To provide an excimer lamp device.
In an excimer lamp device (100), which includes a lamp house (10), an excimer lamp (30) accommodated in the lamp house (10), and a transport mechanism (40) that emits excimer light while transporting a workpiece (W). A front chamber 20 into which the workpiece W is carried is connected and installed upstream of the lamp house 10 in the transport direction, and the front chamber 20 is replaced with an inert gas in the front chamber 20. Inert gas inlet 22 and gas jetting means 25 for jetting an inert gas along the transport direction to the workpiece W are installed. The workpiece W is made of polyvinyl alcohol, cellulose triacetate, It is a film-like resin material of either polyethylene terephthalate or polyethylene.
[Selection] Figure 2

Description

  The present invention relates to an excimer lamp device. In particular, the present invention relates to an excimer lamp device used for surface modification of a resin material used in a manufacturing process of a liquid crystal panel and a liquid crystal display device.

  In a liquid crystal display device, polarizing plates are arranged on both sides of a glass substrate that constitutes a liquid crystal panel. The polarizing plate is produced by attaching a polarizer protective film to a polarizer. Generally, a transparent protective film (polarizer protective film) using cellulose triacetate (TAC) or the like on both surfaces of a polarizer made of a resin material such as a polyvinyl alcohol (PVA) film is polyvinyl alcohol (PVA) based. Those bonded with an adhesive are used. In order to satisfactorily bond these resin materials with a water-based adhesive, it is preferable that the surface has high hydrophilicity.

Recently, as a method for modifying the surface of these resin materials, a method of irradiating with vacuum ultraviolet light has attracted attention. According to Japanese Patent Application Laid-Open No. 2008-122921, the excimer lamp is used to irradiate vacuum ultraviolet light having a wavelength of 200 nm or less, whereby the chemical bond at the surface portion of the polarizer is broken, and at the same time, the surface of the polarizer is hydrophilic. It is described that a functional group is formed.
According to said method, the surface modification process of resin materials, such as TAC and PVA, can be performed in a short time. Thereby, since application | coating of an adhesive agent can be performed favorably, when sticking a polarizer and a protective film, there is no mixing of air. Further, since there is no contamination due to the treatment, a cleaning step after the treatment is not necessary.
JP 2008-122921

Means for performing the above method are listed in Patent Document 1 as an example, and there is an excimer lamp device that performs an irradiation process using an excimer lamp as a light source.
FIG. 8 shows an excimer lamp device (Reference Example 1) configured to perform the above method.
An excimer lamp 70 is disposed inside the lamp house 50. The interior of the lamp house 50 is filled with an inert gas introduced from the gas inlet 51. The workpiece W is transported by the transport mechanism 40 such as a roller conveyor and is carried into the lamp house 50. The workpiece W is irradiated with vacuum ultraviolet light from the excimer lamp 70 and sent to the next step.

When the surface modification process described in Patent Document 1 is performed using the apparatus shown in FIG. 8, the process can be easily performed without generation of contamination even for a short time of irradiation. Therefore, in order to take advantage of this method, it is preferable to shorten the irradiation time by conveying the workpiece as fast as possible.
However, if the conveyance speed of the object to be processed is increased, the amount of air that enters the lamp house together with the object to be processed increases, and the vacuum ultraviolet light attenuates due to oxygen contained in the air. There was a problem that the desired processing could not be performed due to the decrease.

As a means for preventing such air from entering the apparatus, a method of spraying an inert gas on the surface of the object to be processed can be considered.
FIG. 9 shows an excimer lamp device (Reference Example 2) in which an inert gas ejection means is added to the excimer lamp device of FIG. Since the configuration other than the inert gas ejection means is the same as that in FIG.
The apparatus shown in FIG. 9 tries to prevent the intrusion of air into the lamp house by blowing an inert gas in the transport direction on the workpiece just before being carried into the interior on the upstream side of the lamp house. To do.
However, even with the apparatus shown in FIG. 9, the gas flow ejected by the inert gas ejection means entrains the surrounding air, and the gas flow containing air is blown onto the object to be processed, so that it enters the lamp house. The intrusion of air could not be prevented.
Thus, if the conveyance speed of a to-be-processed object is made high, the quantity of the air which penetrate | invades in a lamp house will increase, and a desired process cannot be performed. That is, there is a problem that even if a method of irradiating an excimer lamp is used for surface modification of the resin material, the advantage cannot be utilized.

  From the above, in the present invention, even if the object to be processed is transported at a high speed, there is no air entrainment in the apparatus, and the surface of the moving object to be processed is replaced with an inert gas so that the vacuum ultraviolet light is efficiently emitted. An object is to provide an excimer lamp device that can be irradiated.

  In order to solve the above-described problem, an excimer lamp device of the present invention includes a lamp house, an excimer lamp accommodated in the lamp house, and a transport mechanism, and excimer lamp that irradiates excimer light while transporting an object to be processed. In the apparatus, a front chamber into which an object to be processed is transported is connected and installed upstream of the lamp house in the transport direction, and the front chamber has a non-replacement for replacing the front chamber with an inert gas. An active gas inlet and a gas jetting means for jetting an inert gas along the transport direction to the object to be processed are installed, and the object to be processed is made of polyvinyl alcohol, cellulose triacetate, polyethylene terephthalate, or polyethylene. It is any film-like resin material.

  Further, the present invention is characterized in that the gas ejection means is installed above and below the object to be processed, and the inert gas is ejected from above and below the object to be processed.

  According to the present invention, the front chamber into which the object to be processed is carried is connected and installed upstream of the lamp house in the transport direction, and the front chamber is provided with an inert gas for replacing the front chamber with the inert gas. An active gas inlet and a gas jetting means for jetting an inert gas along the conveying direction to the object to be processed are installed, and the object to be processed is one of polyvinyl alcohol, cellulose triacetate, polyethylene terephthalate, or polyethylene. Because of the film-like resin material, air is not entrained in the lamp house even when the object to be processed is carried at a high speed. Therefore, the ultraviolet irradiation process can be efficiently performed without the ultraviolet rays irradiated from the excimer lamp being attenuated by oxygen.

  Further, according to the present invention, the gas ejection means is installed above and below the workpiece, and the inert gas is ejected from above and below the workpiece to fill the upper and lower surfaces of the workpiece with the inert gas. Therefore, it is possible to more reliably prevent air from entering the lamp house.

FIG. 1 shows an example of an excimer lamp used in the excimer lamp device of the present invention. (A) is a schematic block diagram cut | disconnected along the pipe axis, (b) is a schematic block diagram in an AA 'cross section.
The discharge vessel of the excimer lamp 30 is made of synthetic quartz glass having a high ultraviolet transmittance, and a double tube that forms a discharge space between a large-diameter cylindrical outer tube 32 and a small-diameter cylindrical inner tube 37 inside thereof. It has a structure in which two tubes are connected at their longitudinal ends. Electrodes 55 and 56 are provided on the outer walls of the outer tube 32 and the inner tube 37, respectively, and the electrode 34 provided on the outer tube 37 takes a form such as a mesh shape or a lattice shape to emit light to the outside of the lamp. An emission part 39 is provided.
As an example of the dimensions of the excimer lamp 30, the outer diameter of the outer tube 32 is about 40 mm, the outer diameter of the inner tube 37 is 25 mm, the total length in the tube axis direction is 1600 mm, and the light emission length is 1400 mm. The light emission length is determined by the arrangement of the electrodes.
The shape of the discharge vessel of the excimer lamp is not limited to this, and for example, it may be a single tube having a circular or rectangular cross section and sealed at both ends.

  A discharge gas is enclosed in the discharge vessel of the excimer lamp 30 at a pressure of 10 to 80 kPa, for example. The central wavelength of the excimer emission emitted varies depending on the type of discharge gas. For example, excimer emission with a central wavelength of 172 nm occurs in an excimer lamp enclosing xenon (Xe), and excimer with a central wavelength of 175 nm in an excimer lamp enclosing a mixed gas of argon (Ar) and chlorine (Cl). In the excimer lamp in which a mixed gas of krypton (Kr) and iodine (I) is enclosed, excimer emission having a central wavelength of 191 nm is generated, and a mixed gas of argon (Ar) and fluorine (F) is enclosed. The excimer lamp emits excimer light having a wavelength of 193 nm as a center wavelength.

FIG. 2 is a schematic configuration diagram of the excimer lamp device according to the first embodiment of the present invention cut in the workpiece conveyance direction.
The excimer lamp device 100 includes an excimer lamp 30 that is an irradiation light source, a lamp house 10 that is a housing made of metal such as stainless steel, a front chamber 20, and a roller conveyor for transporting an object to be processed. A transport mechanism 40 is provided.
An inert gas such as nitrogen or argon is introduced into the lamp house from the gas inlet 11 and discharged from the gas outlet 12. Thereby, the internal atmosphere of the lamp house 10 is replaced with an inert gas.

The excimer lamp 30 is held by a lamp holder (not shown), for example, at a distance of 10 mm with respect to the object to be processed in the space inside the lamp house, and the tube axis direction (longitudinal direction) is perpendicular to the transport direction. It is arranged from the front side of the paper toward the back side.
Below the excimer lamp 30, the workpiece W is transported by the transport mechanism 40 in the direction of the arrow. On the upstream side in the conveyance direction indicated by the arrow of the lamp house 10, a carry-in port 13 for carrying in the workpiece is opened, and a carry-out port 14 is opened on the downstream side.
An example of the dimensions of the lamp house 10 is a box shape having an inner dimension of 400 mm in the conveyance direction, a height of 200 mm, and a width of 1800 mm. The openings of the carry-in port 13 and the carry-out port 14 have a width of 10 mm, for example, in the height direction.
The amount of inert gas introduced into the lamp house 10 is appropriately set according to the internal volume of the lamp house 11. For example, an inert gas having an internal volume of 2 to 20 times per minute is introduced through the gas inlet 11 and exhausted from the gas outlet 12. In the case of the above dimensions, the internal volume is 144 liters, the inert gas introduction amount is 500 (liters / minute), and the exhaust amount is 500 (liters / minute). In this way, the inert gas is continuously introduced and exhausted, and the object to be processed is continuously conveyed, so that the interior of the lamp house 11 is inert even if there are openings such as the carry-in port 13 and the carry-out port 14. It can be kept in a state of being replaced with gas.

A front chamber 20 is provided adjacent to the lamp house 10 on the upstream side in the transport direction. An example of the dimensions of the front chamber 20 is a box shape having a length of 100 mm, a height of 50 mm, and a width of 1500 mm in the transport direction. The carry-out port 27 of the front chamber 20 and the carry-in port 13 of the lamp house 10 are connected to prevent gas leakage and inflow from the gap.
A gas inlet 22 for introducing an inert gas into the front chamber 20 is provided in the upper portion of the front chamber 20. Below the gas inlet 22 is provided a diffusion plate 21 for uniformly replacing the internal atmosphere of the front chamber 20 with an inert gas.
The diffusion plate 21 is a plate made of stainless steel having a thickness of 1 mm, for example, in which φ2 mm holes penetrating the plate are formed in two vertical and horizontal directions so that the centers of the holes have a pitch of 10 mm. With this structure, the inert gas introduced from the gas inlet 22 is once dammed upstream of the diffusion plate 21, and is jetted below the diffusion plate 21 through a large number of holes in a uniform and gentle flow. The inert gas introduced into the front chamber 20 from the gas inlet 22 is 2 to 20 times the internal volume per minute. The flow rate of the gas ejected from each of the holes formed in the diffusion plate 21 can be appropriately set depending on the diameter and number of the holes, and is, for example, about 0.2 (m / sec). Thus, the atmosphere in the front chamber 20 is replaced by the uniform downward flow of the inert gas ejected from the diffusion plate 21. However, since the inert gas ejected from the diffusion plate 21 has a low flow rate, it is not sufficient to remove or dilute the air on the surface of the workpiece W.

Below the diffusion plate 21, gas ejection means 25 for spraying an inert gas onto the workpiece W is disposed. In order to prevent the gas flow velocity from decreasing near the surface of the workpiece W, the gas ejection means 25 is provided as close as possible to the extent that it does not come into contact with the workpiece W.
The workpiece W is a continuous sheet-like film made of a resin material, which will be described later, and is carried into the front chamber 20 by a transport mechanism 40 from a roll film (not shown) on the upstream side of the process. And is carried out from the outlet 27 of the front chamber 20 and into the lamp house 10. After the irradiation process is performed in the lamp house 10, it is unloaded and sent to the next step.

FIG. 3 is a schematic configuration diagram of the anterior chamber 20 in a cross section perpendicular to the conveying direction.
The gas inlet 23 is an inlet for supplying an inert gas to the gas ejection means 25 and is connected to a gas supply source (not shown). As shown in the figure, the gas ejection means 25 is, for example, a tubular body having a circular cross section, and the longitudinal direction is arranged in the left-right direction on the paper as in the excimer lamp 30. The gas ejection means 25 is formed with a large number of ejection ports 25a provided so that gas is ejected in the radial direction along the longitudinal direction.
As an example of the gas jetting means 25, 280 jet nozzles opened in a circular shape of φ0.5 mm along the longitudinal direction were formed in a tubular body having a circular cross section, an outer diameter of 20 mm, and a length of 1500 mm at a pitch of 5 mm. It is an ejection pipe. The shape is not limited to this, and the ejection port may be in the form of a protruding nozzle or may be in the form of an air knife.
An inert gas is ejected from the ejection port 25a toward the surface of the workpiece W. The direction of the jet outlet 25a is inclined horizontally or slightly below it, and the inert gas is blown from obliquely above the workpiece W. The length in the left-right direction of the workpiece W shown in the figure is the width, and the gas ejection means 25 is provided with a jet outlet 25a so that an inert gas can be blown over the entire width of the workpiece W.
According to such a gas ejection means, the inert gas can be sprayed uniformly in the transport direction over the width direction of the workpiece W.

  Further, the flow rate per hour of the inert gas ejected from the gas ejection means can be adjusted by a control device (not shown). Therefore, the ejection speed of the inert gas can be calculated from the area of the gas ejection port. For example, in the case of the gas ejection means 25 having the above dimensions, when the amount of gas to be supplied is 20 liters / minute, the gas ejection speed is 12 (m / sec).

Examples of the object to be treated by ultraviolet irradiation in this excimer lamp device include PVA (polyvinyl alcohol), TAC (cellulose triacetate), PET (polyethylene terephthalate (polyesters)), PE (polyethylene (polyolefins)), and the like. It is.
These TACs used for polarizers and polarizer protectors for liquid crystal panels are thin film-like resin materials that are flexible and are wound in a belt-like state by a transport mechanism such as a roller conveyor. It can be transported at high speed.
The conveyance speed of a to-be-processed object is 10-40 (m / min), for example along a conveyance direction, for example, is 20 (m / min). Since the workpiece W is transported at such a high speed, the workpiece W is carried into the front chamber 20 while surrounding air is involved.

Entrained air adheres to the surface of the workpiece W conveyed at high speed to form an air layer. With respect to this air layer, the gas jetting means 25 jets an inert gas and sprays it on the surface of the workpiece W, dilutes the air, and lowers the oxygen concentration.
When the gas flow is started to be ejected from the ejection port 25a toward the workpiece W, the gas in the vicinity of the gas ejection port is also drawn into the gas flow due to viscosity, and the entire gas flow is gradually diffused and the flow velocity is also reduced. However, since it is ejected at a sufficiently high initial speed with respect to the conveyance speed of the workpiece, it can reach the surface of the workpiece W, the relative speed with respect to the workpiece W becomes 0, and the surface air Can be mixed with.
Further, as described above, since the surrounding is replaced by the inert gas introduced by the gas inlet 22 of the front chamber 20, the inert gas in which the gas ejection means 25 entrains air is supplied to the workpiece W. No eruption. As a result, the air adhering to the surface is removed from the surface of the object to be processed in the space in the front chamber 20, and the object W to be processed is carried into the lamp house 10 in a state suitable for the ultraviolet irradiation process.
The air removed from the surface of the object to be processed is diluted with the inert gas in the front chamber 20 and is directly discharged from the gas outlet 29 of the front chamber 20.

In FIG. 4, the experimental result of the excimer lamp apparatus of this invention is shown.
Using the excimer lamp device of the present invention and two reference examples, the wettability of the workpiece W after the ultraviolet irradiation treatment was evaluated. Nitrogen was used as the inert gas, and TAC was used as the workpiece W.
The excimer lamp apparatus shown in FIG. 2 is used in the present invention, the reference example 1 is the excimer lamp shown in FIG. 8, and the reference example 2 is the excimer lamp apparatus shown in FIG.
As the structure of the apparatus, the excimer lamp apparatus shown in FIG. 9 is obtained by adding the inert gas means to the excimer lamp apparatus shown in FIG. 8, and the periphery of the inert gas means of the excimer lamp apparatus shown in FIG. What added the front chamber etc. which replace | exchange with an inert gas is the relationship of this invention.
As an evaluation of wettability, a contact angle measurement by a water drop dropping test was performed.
In FIG. 4, the horizontal axis represents the conveyance speed (m / min) of the workpiece W. The vertical axis represents the contact angle (°) after treatment, and the smaller the contact angle, the higher the effect of improving wettability. The contact angle of the workpiece before processing is about 80 °.
In the plot in FIG. 4, “x” is the one processed using the excimer lamp apparatus without the anterior chamber and the inert gas gas ejection means shown in FIG. 8 (Reference Example 1), and Δ is in FIG. It is what was processed using the excimer lamp apparatus without an anterior chamber shown (reference example 2), and (circle) is processed using the excimer lamp apparatus of this invention shown in FIG. Further, the ejection speed of the inert gas from the gas ejection means of Δ (Reference Example 2) and ○ (Invention) was 10 (m / sec).

As shown in FIG. 4, it can be seen that when the transport speed is 5 (m / min) or less, the contact angle is small and the wettability is improved in any excimer lamp apparatus.
However, in the processing of Reference Example 1 (x), when the conveyance speed reached 10 (m / min), the amount of air entrained in the lamp house increased, and the processing effect decreased. Furthermore, when the conveyance speed reached 15 (m / min), the effect of the treatment was hardly observed.
Further, in the processing of Reference Example 2 (Δ), when the conveyance speed reached 15 (m / min), the processing effect decreased. Further, when the conveyance speed reached 20 (m / min), the effect of the treatment was hardly observed. That is, although there is some improvement due to the inert gas blown from the gas blowing means even if air is involved, it can be said that the effect is not sufficient when the conveyance speed is increased.
In the processing of the present invention (◯), even when the conveying speed was 20 (m / min) or higher, the processing effect was not lowered, and the processing effect was high even at 40 (m / min). That is, it can be seen that by providing an anterior chamber and replacing the periphery of the inert gas gas ejection means with the inert gas, the entrainment of air is eliminated and the ultraviolet irradiation treatment can be made suitable.

FIG. 5 shows a gas ejection in the wettability evaluation test similar to that described above shown in FIG. 4 with respect to the present invention (◯) and Reference Example 2 (Δ), assuming that the conveyance speed of the workpiece is 20 (m / min). It is the experimental result which changed the ejection speed of the inert gas from a means.
In FIG. 5, the horizontal axis represents the ejection speed (m / sec), and the vertical axis represents the contact angle (°) after the treatment.
In the treatment of Reference Example 2 (Δ), there was no change in the treatment effect even when the ejection speed was increased, and there was almost no treatment effect. On the other hand, in the treatment of the present invention (◯), the treatment effect was improved as the ejection speed increased, and the ejection speed became almost constant at 10 (m / sec) or more.
That is, even if the gas ejection speed from the gas ejection means is increased, unless the surrounding area is replaced with an inert gas, a gas containing air is blown, and the oxygen concentration on the surface of the workpiece W does not decrease. It turns out that the processing effect cannot be expected.

  Further, as described above, immediately after the object to be processed is carried into the front chamber, air adheres to the surface thereof. This air flows at the same speed as the object to be processed and follows as it is. In order to replace the air with an inert gas, when the inert gas reaches the surface of the workpiece, the relative speed with the workpiece in the transport direction needs to be 0 (m / sec) or more. . Since the speed of the gas flow ejected from the gas ejection means gradually decreases immediately after being ejected, the initial ejection speed needs to be at least equal to or higher than the conveying speed of the workpiece. That is, it is considered that the effect of substitution increases as the ejection speed increases.

  Therefore, if the initial ejection speed is at least equal to or higher than the conveyance speed and the inert gas is an ejection speed that can replace the treatment surface, the effect can be obtained even at a low ejection speed. May lower the initial ejection speed. According to the experimental results shown in FIG. 5, the treatment effect is improved as the initial ejection speed is higher. However, the treatment effect tends to be saturated even if it is too high, and the inert gas is wasted. It can be set as appropriate according to.

  According to the excimer lamp device having the above-described configuration, air is not entrained in the lamp house 10 even if the object to be processed is carried in at a high speed. Therefore, the ultraviolet irradiation process can be performed efficiently without the ultraviolet rays irradiated from the excimer lamp 30 being attenuated by oxygen.

Fig.6 (a) is a schematic sectional drawing which shows another example about the gas ejection means of the excimer lamp apparatus of this invention. 6 (a) is different from the excimer lamp device shown in FIG. 2 only in the shape of the gas ejection means 25, and the other configurations are the same as those shown in FIG. FIG. 6B shows an enlarged cross-sectional view in which the gas ejection means 25 is extracted from FIG. 6A and enlarged.
In FIG. 6, the gas ejection means 25 is a long tube in the width direction of the workpiece W (from the front side to the back side of the paper), and a slit 25 b for ejecting an inert gas is formed. The slit 25b may be integrally formed continuously in the width direction, or may be formed with a partition so as to be intermittent. By such a slit, the gas ejection means 25 can supply a laminar ejection flow. In addition, by forming the slit with a very small width, a high-speed jet flow can be supplied even if the total flow rate is the same.
A curved surface 25c that is curved so as to be the same as the transport direction as the surface of the tube goes downstream is formed on the downstream side of the transport direction from the slit 25b of the tube constituting the gas ejection means 25. When the inert gas is ejected from the slit 25b, the gas flow flows along the surface of the curved surface 25c due to the Coanda effect.
According to the gas ejection means 25 described above, a high-speed gas can be ejected with a small amount of gas, so that the flow rate of the inert gas can be saved.

FIG. 7 is a schematic cross-sectional view of the excimer lamp device according to the second embodiment of the present invention cut along the transport direction. FIG. 7 is different from the excimer lamp device shown in FIG. 2 only in the configuration of the front chamber 20, and the other configurations are the same as those of the excimer lamp device shown in FIG. To do.
The front chamber 20 includes gas ejection means 25 and 28 positioned above and below the object to be processed, and gas inlets 25a and 28a.

In a state where the workpiece W is carried into the excimer lamp device 100, the space in the front chamber 20 is divided into two parts, the upper side and the lower side, by the workpiece W. Further, the intrusion of air due to entrainment inside the apparatus occurs above and below the workpiece W.
When only the gas ejection means 25 is installed, the upper surface of the workpiece W can be replaced with an inert gas, but the lower surface is carried into the lamp house with air attached to the surface. This is not preferable.

Therefore, it is preferable to provide not only the gas jetting means 25 on the upper side of the workpiece W but also the gas jetting means 28 on the lower side so that air does not enter the lamp house 10.
Further, not only a gas introduction port 22 for replacing the periphery of the upper gas ejection means 25 with an inert gas, but also a gas introduction port 24 for replacing the periphery of the lower gas ejection means 28 with an inert gas is provided.
Thereby, the space below the workpiece W in the front chamber 20 can be filled with the inert gas.

  According to the above configuration, the upper and lower surfaces of the object to be processed can be filled with the inert gas by arranging the gas ejection means and the gas introduction port above and below the object to be processed. Intrusion can be prevented more reliably.

It is a figure which shows the excimer lamp concerning this invention, (a) is sectional drawing along a pipe axis, (b) is A-A 'sectional drawing. It is a schematic block diagram in the cross section along the conveyance direction of the excimer lamp apparatus concerning the 1st Embodiment of this invention. It is a schematic block diagram in the cross section perpendicular | vertical to the conveyance direction of the excimer lamp apparatus of this invention. It is an experimental result of the excimer lamp apparatus of this invention. It is an experimental result of the excimer lamp apparatus of this invention. (A) is a schematic block diagram which shows an example of the gas ejection means of the excimer lamp apparatus of this invention, (b) is an enlarged view which extracted only the gas ejection means. It is a schematic block diagram in the cross section along the conveyance direction of the excimer lamp apparatus concerning the 2nd Embodiment of this invention. It is a schematic block diagram which shows the excimer lamp apparatus of a reference example. It is a schematic block diagram which shows the excimer lamp apparatus of a reference example.

Explanation of symbols

DESCRIPTION OF SYMBOLS 100 Excimer lamp apparatus 10 Lamp house 11 Gas inlet 12 Gas outlet 13 Carry-in inlet 14 Carry-out outlet 20 Front chamber 21 Diffusion plate 22 Gas inlet 23 Gas inlet 24 Gas inlet 25 Gas jetting means 25a Jet outlet 26 Carry-in 27 Carry-out port 28 Gas ejection means 29 Gas discharge port 30 Excimer lamp 32 Outer tube 33 Electrode 34 Electrode 37 Inner tube 38 Ultraviolet reflective film 39 Light emitting part 40 Transport mechanism 50 Lamp house 51 Gas inlet 52 Gas outlet 53 Carry-in port 54 Outlet 65 Gas ejection means 70 Excimer lamp W

Claims (2)

In an excimer lamp device that includes a lamp house, an excimer lamp accommodated in the lamp house, and a transport mechanism, and irradiates excimer light while transporting an object to be processed.
A front chamber into which the object to be processed is carried is connected and installed on the upstream side in the transport direction from the lamp house,
In the front chamber, an inert gas inlet for replacing the front chamber with an inert gas,
Gas ejection means for ejecting an inert gas along the transport direction is installed on the object to be processed,
The excimer lamp device is characterized in that the object to be processed is a film-like resin material of polyvinyl alcohol, cellulose triacetate, polyethylene terephthalate, or polyethylene.   The excimer lamp device according to claim 1, wherein the gas ejection means is installed above and below the object to be processed.

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