JP2010032853A - Filter for display - Google Patents

Abstract

[PROBLEMS] To improve curl while maintaining high hard coat properties in a low-cost display filter having only one base material and having electromagnetic shielding properties and hard coat properties.
A display filter having a conductive layer containing a conductive mesh on a base material and a hard coat layer on the conductive layer, wherein the display filter has only one base material. A display filter, wherein the hard coat layer contains a compound derived from a compound having a radical polymerizable functional group and a compound derived from a compound having a cationic polymerizable functional group.
[Selection figure] None

Description

  The present invention relates to a low-cost display filter having electromagnetic wave shielding properties and hard coat properties and comprising only one substrate.

  A display such as a liquid crystal display (hereinafter referred to as LCD) or a plasma display (hereinafter referred to as PDP) is a display device capable of clear full color display. The display is usually provided with a front filter (display filter) on the viewing side of the display for the purpose of preventing reflection of external light and glare, shielding electromagnetic waves generated from the display, and protecting the display. In particular, PDP generates strong electromagnetic waves due to its structure and operating principle, so there are concerns about the effects on the human body and other devices. For display with an electromagnetic wave shielding function, antireflection function or antiglare function. A filter is usually used.

  A general display filter is formed by laminating an optical functional film having an antireflection function, an antiglare function, etc., and a plastic film (electromagnetic wave shielding film) provided with a conductive layer (electromagnetic wave shielding layer) via an adhesive layer. Is formed. Further, in the optical functional film, a hard coat layer is provided between the base film and the antireflection layer or the antiglare layer in order to increase the scratch resistance of the surface.

  In recent years, with the price reduction of displays, the price of display filters has been reduced, and one substrate (for example, a plastic film) is used for the display filter consisting of the above two films. It has been proposed to reduce the price by using only the above.

  As a configuration of a display filter consisting of only one substrate, functions such as a hard coat layer, an antireflection layer, an antiglare layer, etc. directly on the conductive layer including the conductive mesh formed on the substrate. The aspect which coat-forms a layer is proposed (patent documents 1-3). In recent years, a conductive layer including a conductive mesh is generally used as a conductive layer of a display filter because of its low electrical resistance and low cost.

In addition, Patent Documents 1 to 3 describe that a hard coat layer is directly formed on a conductive layer containing a conductive mesh in order to improve the scratch resistance of the display filter surface. .
JP 2007-140282 A JP 2007-243158 A WO2008 / 029709

  As described above, when the hard coat layer is directly formed on the conductive layer including the conductive mesh, in order to ensure the coatability and smoothness of the hard coat layer applied on the conductive mesh. The coating amount or thickness of the hard coat layer is preferably set to a coating amount or thickness that can sufficiently fill the unevenness of the conductive mesh. When a hard coat layer is provided on a conventional plastic film substrate It is necessary to increase the coating amount and thickness as compared with the above.

  However, there is a problem that when the coating amount or thickness of the hard coat layer is increased, the display filter tends to be curled. Furthermore, the display filter composed of only one substrate has a problem that the curl resistance is smaller than that of a display filter composed of two or more substrates, and is easily affected by thick coating of the hard coat layer.

  Conventionally generally known hard coat films are provided with a hard coat layer directly on a plastic film, and a thickness of about 5 μm is sufficient for the hard coat layer. It was.

  Accordingly, an object of the present invention is to improve curl while maintaining high hard coat properties in a low-cost display filter having only one base material and having electromagnetic shielding properties and hard coat properties. is there.

The above object of the present invention has been basically achieved by the following invention.
1) A display filter having a conductive layer containing a conductive mesh on a substrate and a hard coat layer on the conductive layer,
The display filter has a configuration with only one substrate,
The display filter, wherein the hard coat layer contains a compound derived from a compound having a radical polymerizable functional group and a compound derived from a compound having a cationic polymerizable functional group.
2) The display filter according to 1), wherein the hard coat layer has a thickness of 6 to 25 μm.
3) The hard coat layer is formed by reacting a composition containing a compound having a radical polymerizable functional group and a compound having a cationic polymerizable functional group,
For the display according to 1) or 2), in the composition, the content of the compound having the cationic polymerizable functional group is 10 to 100 parts by mass with respect to 100 parts by mass of the compound having the radical polymerizable functional group. filter.
4) The display filter according to any one of 1) to 3), wherein the conductive mesh has a thickness of 0.5 to 8 μm.
5) The display filter according to any one of 1) to 4), wherein the substrate is a plastic film having a thickness of 80 to 200 μm.

  According to the present invention, it is possible to provide a low-cost display filter that has electromagnetic wave shielding properties, high hard coat properties, and improved curl.

  The display filter of the present invention has a configuration in which the substrate has only one sheet, has a conductive layer containing a conductive mesh on the substrate, has a hard coat layer on the conductive layer, and The hard coat layer contains a compound derived from a compound having a radical polymerizable functional group and a compound derived from a compound having a cationic polymerizable functional group. In other words, one of the features of the display filter of the present invention is that the substrate has a single structure. It is important that the hard coat layer formed on the conductive layer is laminated so as to cover the conductive mesh portion of the conductive layer. In addition, since the hard coat layer is formed on the conductive layer including the conductive mesh, the hard coat layer also exists in the opening portion of the conductive mesh, and the opening portion of the conductive mesh is hard on the base material. The coating layer is laminated.

  The present invention forms a hard coat layer by reacting a composition containing a compound having a radical polymerizable functional group and a compound having a cationic polymerizable functional group, whereby the resulting hard coat layer is radical polymerized. And a compound derived from a compound having a cationic functional group and a compound derived from a compound having a cationic polymerizable functional group, and the curling was suppressed while maintaining high hard coatability.

  In the present invention, when the hard coat layer contains a compound derived from a compound having a radical polymerizable functional group and a compound derived from a compound having a cationic polymerizable functional group, the hard coat layer has a radical polymerizable functional group. An embodiment containing a compound derived from the above and a compound derived from a compound having a cationic polymerizable functional group, and a compound derived from a compound in which the hard coat layer has both a radical polymerizable functional group and a cationic polymerizable functional group in one molecule It means both of the contained aspects. That is, in the present invention, a hard coat layer is formed by reacting a compound having a radical polymerizable functional group and a compound having a cationic polymerizable functional group to form a hard polymerizable layer and a cationic polymerizable functional group. An embodiment in which a hard coat layer is formed by reacting a composition containing a compound having a functional group, and a hard coat by reacting a composition containing a compound having both a radical polymerizable functional group and a cationic polymerizable functional group in one molecule. Both aspects of forming a layer are meant.

  The compound having the radical polymerizable functional group is a compound having an unsaturated polymerizable functional group such as a (meth) acryloyl group, a vinyl group, a styryl group, or an allyl group as the radical polymerizable functional group. The number of the above radical polymerizable functional groups is preferably 3 or more per molecule, more preferably 4 or more. The upper limit is preferably 10 or less.

  The compound having a radical polymerizable functional group according to the present invention is preferably a radical polymerizable monomer or a radical polymerizable oligomer.

  Examples of radical polymerizable monomers include pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth). Acrylate, dipentaerythritol hexa (meth) acrylate, trimethylolpropane tri (meth) acrylate, trimethylolethane tri (meth) acrylate, 1,2,4-cyclohexanetetra (meth) acrylate, pentaglycerol triacrylate, tripentaerythritol Examples include triacrylate and tripentaerythritol hexatriacrylate.

  As the radical polymerizable oligomer, a urethane acrylate oligomer can be preferably used.

  A urethane acrylate oligomer is obtained by, for example, reacting an acrylate compound with an isocyanate group of a urethane oligomer obtained by a reaction between a polyol compound and a polyisocyanate compound.

  Specific examples of the polyol compound include ethylene glycol, propylene glycol, neopentyl glycol, tricyclodecane dimethylol, cyclohexane dimethylol, trimethylolpropane, glycerin, 1,3-propanediol, 1,4-butanediol, 1, 3-butanediol, 2,3-butanediol, 1,5-pentanediol, 2,4-pentanediol, 1,2-hexanediol, 1,6-hexanediol, diethylene glycol, tripropylene glycol, 1, 9- Nonanediol, triethylene glycol, polyethylene glycol, polypropylene glycol, polytetramethylene glycol, bisphenol A polyethoxyglycol, polycarbonate polyol, pentaerythritol, sorbitol , Sucrose, quadroleol polybutadiene polyol, hydrogenated polybutadiene polyol, hydrogenated dimer diol pentaerythritol, etc .; trimethylolpropane, glycerin, pentaerythritol, sorbitol, sucrose, quadrole and other compounds containing a trivalent or higher hydroxyl group, Polyether polyol obtained by modifying with cyclic ether compounds such as ethylene oxide (EO), propylene oxide (PO), butylene oxide, tetrahydrofuran, etc .; polycaprolactone polyol obtained by modifying with caprolactone; consisting of dibasic acid and diol Mention may be made of polyester polyols obtained by modification with polyester; and mixtures of two or more thereof.

  More specifically, EO-modified trimethylolpropane, PO-modified trimethylolpropane, tetrahydrofuran-modified trimethylolpropane, caprolactone-modified trimethylolpropane, EO-modified glycerin, PO-modified glycerol, tetrahydrofuran-modified glycerin, caprolactone-modified glycerol, EO-modified pentaerythritol. , PO-modified pentaerythritol, tetrahydrofuran-modified pentaerythritol, caprolactone-modified pentaerythritol, EO-modified sorbitol, PO-modified sorbitol, caprolactone-modified sorbitol, EO-modified sucrose, PO-modified sucrose, EO-modified sucrose, EO-modified quadrole, etc. Can be mentioned.

  Specific examples of the polyisocyanate compound include 2, 4-tolylene diisocyanate, 2, 6-tolylene diisocyanate, 4, 4-diphenylmethane diisocyanate, m-xylylene diisocyanate, p-xylylene diisocyanate, tetramethylxylylene diisocyanate, Biphenylene diisocyanate, 1,5-naphthylene diisocyanate, o-tolidine diisocyanate, hexamethylene diisocyanate, 4,4'-methylenebiscyclohexyl isocyanate, isophorone diisocyanate, trimethylhexamethylene diisocyanate, 1,3- (isocyanatomethyl) cyclohexane, and Examples thereof include polycondensates such as burettes and isocyanurates, and mixtures of two or more thereof. Particularly preferred are xylylene diisocyanate, hexamethylene diisocyanate, and isocyanurate of isophorone diisocyanate.

  As an acrylate compound used for acrylate modification of an isocyanate group of a urethane oligomer, a compound having an acrylate group or a methacrylate group and a functional group capable of reacting with an isocyanate group such as a hydroxyl group, a carboxyl group, an amino group, or an amide group Is mentioned. For example, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, butanediol mono (meth) acrylate, 2-hydroxyethyl (meth) acrylate modified with caprolactone, glycidol di (meth) acrylate, pentaerythritol Carboxyl groups such as hydroxyl group-containing (meth) acrylates such as tri (meth) acrylate, (meth) acrylic acid, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate, 2- (meth) acryloyloxyethyl succinic acid Containing (meth) acrylate, amino group-containing (meth) acrylate such as N, N-diethylaminoethyl (meth) acrylate, (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N-butyl Meth) acrylamide, N- methylol (meth) acrylamide, N- methylol amide group-containing such as trimethylolpropane (meth) acrylamide (meth) acrylate.

  A commercially available product can be used as the urethane acrylate oligomer. For example, U-4HA, U-6HA, U-6LPA, U-15HA, UA-32P, U-324A manufactured by Shin-Nakamura Chemical Co., Ltd., Ebecryl-1290K, Ebecryl-1290K, Ebecryl-5129 manufactured by Daicel UCB And the like, such as UN-9000H, UN-3320HA, UN-3320HB, UN-3320HC, UN-3320HS, UN-901T manufactured by Negami Kogyo Co., Ltd., CN929, CN968, CN989, CN9010, CN975 manufactured by Sartomer .

  Examples of the compound having a cationic polymerizable functional group according to the present invention include a functional group polymerizable by cationic polymerization, such as a cyclic ether group (epoxy group, oxetanyl group, oxacyclopentyl group, 3,4-epoxycyclohexyl group, oxolane group). Etc.), a compound having three or more vinyl ether groups, vinyl groups, thiirane groups, thietane groups, bicycloorthoester groups, spiroorthocarbonate groups, etc., or lactones, cyclic acetal structures, cyclic carbonate structures, and cyclic iminoether structures. The monomer or oligomer which has these cation polymerizable functional groups is used preferably.

  Among the above cationic polymerizable functional groups, from the viewpoint of curing speed and mechanical properties of the cured product, any functional group of an epoxy group, oxetanyl group, and vinyl ether group is preferable, and a monomer or oligomer having these functional groups Is preferred.

  Examples of the compound having an epoxy group include aromatic epoxy compounds, alicyclic epoxy compounds, and aliphatic epoxy compounds.

  Examples of the aromatic epoxy compound include a monofunctional epoxy compound such as phenyl glycidyl ether, a polyhydric phenol having at least one aromatic, or an alkylene oxide adduct thereof. For example, glycidyl produced by the reaction of bisphenol compounds such as bisphenol A, tetrabromobisphenol A, bisphenol F, bisphenol S, or adducts of alkylene oxides (eg, ethylene oxide, propylene oxide, butylene oxide) of bisphenol compounds with epichlorohydrin. Examples include ethers, novolak-type epoxy resins (for example, phenol / novolak-type epoxy resins, cresol / novolak-type epoxy resins, brominated phenol / novolak-type epoxy resins), trisphenol methane triglycidyl ether, and the like. Specifically, Epicoat 828, 806, 1001 manufactured by Japan Epoxy Resin, Denacol EX-201 manufactured by Nagase Chemtech, or the like can be used.

Typical examples of the alicyclic epoxy compound include compounds having a cyclohexene oxide group, a tricyclodecene oxide group, a cyclopentene oxide group, and the like. For example, 4-vinylcyclohexene monoepoxide, norbornene monoepoxide, limonene monoepoxide, limonene diester. Oxide, vinylcyclohexene diepoxide, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 2,2-bis [4- (2,3-epoxypropoxy) cyclohexyl] hexafluoropropane, Ethylene glycol di (3,4-epoxycyclohexylmethyl) ether, bis (2,3-epoxycyclopentyl) ether, 2- (3,4-epoxycyclohexyl 5,5-spiro-3,4-epoxy) Hexane-m-dioxane, bis (3,4-epoxycyclohexyl) adipate, bis (3,4-epoxycyclohexylmethylene) adipate 3,4-epoxycyclohexanemethanol ε-caprolactone adduct and polyhydric alcohol (GR, TMP, PE, DPE, hexapentaerythritol) and the like. Specifically, BHPE-3150 manufactured by Daicel Chemical Industries, Celoxide 2021, 2080, 3000, Epolide GT300, GT400 UVR-6110, 6105, 6128, ERLX-4360, etc. manufactured by Dow Chemical Co. can be used.

  Examples of the aliphatic epoxy compound include 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, ethylene glycol diglycidyl ether, ethylene glycol monoglycidyl ether, propylene glycol diglycidyl ether, propylene glycol monoglycidyl. Ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, neopentyl glycol monoglycidyl ether, glycerol diglycidyl ether, glycerol triglycidyl ether, trimethylolpropane diglycidyl ether, tri Methylolpropane monoglycidyl ether, trimethylolpropane triglycidyl Ether, diglycerol triglycidyl ether, sorbitol tetraglycidyl ether, allyl glycidyl ether, 2-ethylhexyl glycidyl ether, and the like. Specifically, as the alicyclic epoxy compound, for example, Denacol EX-611, Denacol EX-512, Denacol EX-411, Denacol EX-313, Denacol EX-321, Denacol EX-911 manufactured by Nagase Chemtech Co., Ltd. Etc. can be used.

  Examples of the compound having an oxetanyl group include 3-ethyl-3- (hydroxymethyl) oxetane, 3-ethyl-3-[(phenoxy) methyl] oxetane, 3-ethyl-3- (cyclohexyloxy) cymethyloxetane, 3- Ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3- (phenoxymethyl) oxetane, 3-ethyl-3-{[(3-ethyloxetane-3-yl) methoxy] methyl} oxetane, 1,3-bis [(3-ethyloxetane-3-yl) methoxy] benzene and 1,4-bis {[(3-ethyloxetane-3-yl) methoxymethyl] benzene, EO-modified bisphenol A bis (3- Ethyl-3-oxetanylmethyl) ether, PO-modified bisphenol A bis (3-ethyl-3-oxetani) Methyl) ether, EO-modified hydrogenated bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, PO-modified hydrogenated bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, EO-modified bisphenol F bis (3- Ethyl-3-oxetanylmethyl) ether, trimethylolpropane tris (3-ethyl-3-oxetanylmethyl) ether, pentaerythritol tris (3-ethyl-3-oxetanylmethyl) ether, pentaerythritol tetrakis (3-ethyl-3- Oxetanylmethyl) ether, dipentaerythritol hexakis (3-ethyl-3-oxetanylmethyl) ether, dipentaerythritol pentakis (3-ethyl-3-oxetanylmethyl) ether, dipentaerythritol Examples include trakis (3-ethyl-3-oxetanylmethyl) ether, caprolactone-modified dipentaerythritol hexakis (3-ethyl-3-oxetanylmethyl) ether, ditrimethylolpropane tetrakis (3-ethyl-3-oxetanylmethyl) ether, and the like. It is done. Specifically, Aron Oxetane OXT-101, OXT-121, OXT-221, OXT-212, etc. manufactured by Toagosei Co., Ltd. can be used.

  Examples of the compound having a vinyl ether group include n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, 2-ethylhexyl vinyl ether, octadecyl vinyl ether, cyclohexyl vinyl ether, allyl vinyl ether, hydroxyethyl vinyl ether, hydroxybutyl vinyl ether, 9-hydroxynonyl. Vinyl ether, 4-hydroxycyclohexyl vinyl ether, cyclohexane dimethanol monovinyl ether, ethylene glycol divinyl ether, ethylene glycol monovinyl ether, triethylene glycol divinyl ether, tetraethylene glycol divinyl ether, propylene glycol divinyl ether, propylene glycol No vinyl ether, neopentyl glycol divinyl glycol, neopentyl glycol monovinyl glycol, glycerol divinyl ether, glycerol trivinyl ether, diglycerol trivinyl ether, sorbitol tetravinyl ether, 1,4-butanediol divinyl ether, nonanediol divinyl ether, cyclohexanediol divinyl ether , Cyclohexanedimethanol divinyl ether, trimethylolpropane trivinyl ether, pentaerythritol tetravinyl ether, bisphenol A divinyl ether, tetrabromobisphenol A divinyl ether, bisphenol F divinyl ether, 1,4-benzenedimethanol divinyl ether, Nm-chlorophenyl Gietano Rua Min-ji vinyl ether, and m- phenylene bis (ethylene glycol) divinyl ether.

  In the composition (composition containing the compound (A) having a radical polymerizable functional group and the compound (B) having a cationic polymerizable functional group) to be reacted to form a hard coat layer according to the present invention, radical polymerization The content of the compound (B) having a cationic polymerizable functional group with respect to 100 parts by mass of the compound (A) having a functional functional group is preferably in the range of 10 to 100 parts by mass, and more preferably in the range of 15 to 80 parts by mass. The above content ratio is suitable for improving the curling property while maintaining a high hard coat property.

  As described above, the present invention includes an embodiment in which the hard coat layer contains a compound derived from a compound having both a radical polymerizable functional group and a cationic polymerizable functional group in one molecule. As the compound having both a radical polymerizable functional group and a cationic polymerizable functional group in one molecule, a monomer or oligomer having both a radical polymerizable functional group and a cationic polymerizable functional group can be used. Examples of such monomers or oligomers include VEEA and VEEM manufactured by Nippon Shokubai Co., Ltd., Denacol EX-111 manufactured by Nagase Chemtech, Bremer G manufactured by NOF Corporation, Light ester G manufactured by Kyoeisha Chemical Co., Ltd., light ester THF, and light acrylate. THF-A etc. are mentioned.

  In addition, the hard coat layer according to the present invention is a compound having a radical polymerizable functional group or a compound having a cationic polymerizable functional group in combination with a compound having both a radical polymerizable functional group and a cationic polymerizable functional group in one molecule. It can be formed by reacting a composition containing. In particular, when a compound having both a radical polymerizable functional group and a cationic polymerizable functional group in one molecule is used as a composition to be reacted to form a hard coat layer, it is combined with a compound having a radical polymerizable functional group. It is preferable to use it. In this case, a composition to be reacted to form a hard coat layer (a compound (A) having a radical polymerizable functional group and a compound (C) having both a radical polymerizable functional group and a cationic polymerizable functional group in one molecule). Content of the compound (C) having both a radically polymerizable functional group and a cationically polymerizable functional group in one molecule with respect to 100 parts by mass of the compound having a radically polymerizable functional group (A) The range of 200 parts by mass is preferable, and the range of 40 to 160 parts by mass is preferable.

  The composition that is reacted to form the hard coat layer of the present invention preferably further contains a radical polymerization initiator. Specific examples of the radical polymerization initiator include acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, benzophenone, 2-chlorobenzophenone, 4,4′-dichlorobenzophenone, 4,4′-bisdiethylaminobenzophenone, Michler's ketone, benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, methyl benzoylformate, p-isopropyl-α-hydroxyisobutylphenone, α-hydroxyisobutylphenone, 2, Carbonyl compounds such as 2-dimethoxy-2-phenylacetophenone and 1-hydroxycyclohexyl phenyl ketone, tetramethylthiuram monosulfide, tetra Sulfur compounds such as methyl thiuram disulfide, thioxanthone, 2-chlorothioxanthone, and 2-methylthioxanthone can be used.

  The composition that is reacted to form the hard coat layer of the present invention preferably further contains a cationic polymerization initiator. Examples of the cationic polymerization initiator include onium salts such as aryldiazonium salts, aryliodonium salts, arylhalonium salts, and arylsulfonium salts, organometallic complexes such as iron-allene complexes, titanocene complexes, and arylsilanol-aluminum complexes. Is mentioned.

  In the composition to be reacted for forming the hard coat layer of the present invention, a peroxide compound such as benzoyl peroxide or di-t-butyl peroxide can be further used as a thermal polymerization initiator.

  The content of the radical polymerization initiator in the composition to be reacted to form the hard coat layer is suitably in the range of 0.01 to 10 parts by mass with respect to 100 parts by mass of the compound having a radical polymerizable functional group. is there. Similarly, the content of the cationic polymerization initiator is suitably in the range of 0.01 to 10 parts by mass with respect to 100 parts by mass of the compound having a cationic polymerizable functional group. The content of the thermal polymerizable initiator is suitably in the range of 0.01 to 10 parts by mass with respect to 100 parts by mass of the total amount of the compound having a radical polymerizable functional group and the compound having a cationic polymerizable functional group. is there.

  When the composition to be reacted to form the hard coat layer contains a compound having both a radical polymerizable functional group and a cationic polymerizable functional group in one molecule, the total content of the radical polymerization initiator and the cationic polymerization initiator is contained. The amount is suitably in the range of 0.01 to 10 parts by mass with respect to 100 parts by mass of the compound having both radical polymerizable functional groups and cationic polymerizable functional groups in one molecule.

  In the present invention, in the hard coat layer (that is, the composition to be reacted to form the hard coat layer), various additives may be further blended as necessary within the range where the effects of the present invention are not impaired. Can do. For example, stabilizers such as antioxidants, light stabilizers, ultraviolet absorbers, surfactants, leveling agents, antistatic agents, and the like can be used. Moreover, metal oxide fine particles or organic fine particles may be added for imparting antistatic properties, imparting antiglare properties, and adjusting the refractive index.

  In the present invention, in order to react the composition used for forming the hard coat layer and form the hard coat layer, the composition may be cured by reacting. For example, the method of irradiating active energy rays, such as an ultraviolet-ray and an electron beam, and the thermosetting method can be used.

  As a method for irradiating active energy rays, ultraviolet rays are practically preferable because they are simple. As the ultraviolet ray source, an ultraviolet fluorescent lamp, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a xenon lamp, a carbon arc lamp, or the like can be used. Moreover, when irradiating an active energy ray, if it irradiates under low oxygen concentration, it can harden | cure efficiently. Furthermore, the electron beam system is expensive and requires operation under an inert gas, but it is not necessary to include a polymerization initiator or a photosensitizer in the hard coat layer. Is advantageous.

  As a heat curing method, steam or an electric heater, an infrared heater, a far infrared heater or the like is used as a heat source, air or an inert gas heated to at least 140 ° C. or more, a slit nozzle, a substrate, The method of heating by spraying on a hard-coat layer coating film is mentioned. Among them, it is preferable to use air heated to 200 ° C. or higher, and more preferable to use nitrogen heated to 200 ° C. or higher from the viewpoint of increasing the curing rate.

  In the present invention, as a method for forming the hard coat layer by reacting (curing) the composition for forming the hard coat layer, the method of curing by irradiating with ultraviolet rays is a relatively simple apparatus with high productivity. Is preferable.

  In the present invention, the hard coat layer is formed on the conductive layer. More specifically, the hard coat layer is arranged so as to cover the conductive mesh portion of the conductive layer including the conductive mesh. As a method, it is preferable to directly apply a hard coat layer (that is, a composition for forming a hard coat layer) on the conductive layer.

  As a coating method (coating method) used for coating the composition to be reacted to form a hard coat layer, dip coating method, spin coating method, slit die coating method, gravure coating method, reversal coating method, rod coating Known wet coating methods such as a method, a bar coating method, a spray method, and a roll coating method can be used.

  The coating liquid used for coating the hard coat layer (composition for forming the hard coat layer) dissolves the polymerizable compound and various additives added as necessary, or the coating liquid. In order to adjust the viscosity, it is preferable to contain an organic solvent. The organic solvent mentioned here does not include a liquid polymerizable monomer that will constitute the hard coat layer.

  The amount of the organic solvent contained in the composition (coating liquid) to be reacted for forming the hard coat layer is preferably in the range of 5 to 70% by mass, and 10 to 60% by mass with respect to 100% by mass of the coating liquid. The range of is preferable. This makes it possible to sufficiently dissolve components such as a polymerizable compound constituting the hard coat layer, and to adjust the viscosity to be suitable for coating.

  As said organic solvent, it is preferable to mix and use the organic solvent whose boiling point is 100-180 degreeC under atmospheric pressure, and the organic solvent whose boiling point is less than 100 degreeC under atmospheric pressure. By including an organic solvent having a boiling point of 100 to 180 ° C. under atmospheric pressure, the compatibility of the polymerizable compound is increased, and the transparency of the cured coating film is improved. Moreover, the coating property of the coating liquid is improved, and a coating film having a flat surface can be obtained. Furthermore, by including an organic solvent having a boiling point of less than 100 ° C. under atmospheric pressure, the organic solvent is effectively volatilized at the time of film formation, and a film having high hardness can be obtained. That is, a film having a flat surface and high hardness can be obtained.

  Specific examples of the organic solvent having a boiling point of 100 to 180 ° C. under atmospheric pressure include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol mono Ethers such as butyl ether, propylene glycol mono-t-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propyl acetate, butyl acetate, isobutyl acetate, 3-methoxybutyl acetate, 3-methyl- -Acetates such as methoxybutyl acetate, methyl lactate, ethyl lactate, butyl lactate, etc., ketones such as acetylacetone, methyl propyl ketone, methyl butyl ketone, methyl isobutyl ketone, cyclopentanone, 2-heptanone, butanol, isobutyl alcohol, pentano -L, 4-methyl-2-pentanol, 3-methyl-2-butanol, 3-methyl-3-methoxy-1-butanol, alcohols such as diacetone alcohol, and aromatic hydrocarbons such as toluene and xylene Is mentioned. These may be used alone or in combination. Among these, examples of particularly preferable organic solvents are propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, diacetone alcohol and the like.

  Examples of the organic solvent having a boiling point of less than 100 ° C. under atmospheric pressure include methanol, ethanol, isopropanol, t-butanol, methyl ethyl ketone, and the like. These may be used alone or in combination.

  In the present invention, the thickness of the hard coat layer laminated so as to cover the conductive layer including the conductive mesh is preferably larger than the thickness of the conductive layer including the conductive mesh described later, and the thickness of the conductive layer is 100%. On the other hand, the thickness of the hard coat layer is preferably 130% or more, and more preferably 150% or more. The upper limit is about 400%. By increasing the thickness of the hard coat layer relative to the thickness of the conductive layer, good coatability of the hard coat layer can be ensured, and a smooth hard coat layer can be formed by filling the unevenness of the conductive mesh. Obtainable. Here, the thickness of the hard coat layer is the thickness after coating, drying and curing.

  Specifically, the thickness of the hard coat layer is preferably 6 μm or more, more preferably 8 μm or more, and particularly preferably 10 μm or more. The upper limit of the thickness of the hard coat layer is preferably 25 μm or less, more preferably 20 μm or less, and preferably 18 μm or less.

  As described above, the smoothness of the surface of the hard coat layer is improved by making the thickness of the hard coat layer sufficiently larger than the thickness of the conductive layer and filling the unevenness of the conductive mesh. The smoothness of the hard coat layer surface can be represented by a center line average roughness Ra value, and the center line average roughness Ra value of the hard coat layer surface is preferably 300 nm or less, and more preferably 200 nm or less. By making the Ra value on the surface of the hard coat layer 300 nm or less, the transparency becomes higher, and good coating properties when an ultra-thin film low refractive index layer described later is formed on the hard coat layer. Can be secured. Therefore, the center line average roughness Ra value of the surface of the low refractive index layer coated and formed on the hard coat layer is also preferably 300 nm or less. The lower limit of the Ra value on the hard coat layer surface and the low refractive index layer surface is about 10 nm. Here, the center line average roughness Ra value can be measured in accordance with the provisions of JIS B0601 (1982).

  As described above, when the thickness of the hard coat layer is 6 μm or more, curling is likely to occur in the display filter, but the occurrence of curling can be suppressed by using the hard coat layer of the present invention described above. .

  The thickness of the conductive mesh and the hard coat layer can be determined from an enlarged cross-sectional photograph of a display filter using a scanning electron microscope.

  The display filter of the present invention can be provided with an antireflection layer on the hard coat layer. The antireflection layer is usually formed by laminating a high refractive index layer and a low refractive index layer in order on the hard coat layer, but for the purpose of improving productivity, the low refractive index layer is directly on the hard coat layer. It is also possible to laminate them.

  The refractive index of the high refractive index layer is preferably 1.55 or more, more preferably 1.6 or more, and the upper limit of the refractive index is about 2.0.

  As the high refractive index layer, a curable resin composition containing metal oxide fine particles or a high refractive index compound is preferable. Examples of the metal oxide fine particles include titanium oxide, zirconium oxide, zinc oxide, tin oxide, antimony oxide, cerium oxide, iron oxide, zinc antimonate, tin oxide-doped indium oxide (ITO), and antimony-doped tin oxide (ATO). ), Aluminum-doped zinc oxide, gallium-doped zinc oxide, fluorine-doped tin oxide and the like, and these metal oxide fine particles may be used alone or in combination. Further, the refractive index of the metal oxide fine particles is preferably 1.6 or more, and more preferably 1.7 or more. The upper limit of the refractive index is preferably 3 or less, and more preferably 2.8 or less.

  The average primary particle diameter of the metal oxide fine particles is preferably less than 150 nm, and more preferably the average primary particle diameter is 3 to 100 nm. In addition, the average primary particle diameter of this invention shows the particle diameter when a metal oxide fine particle exists independently, and means what shows the most frequent particle diameter. The average primary particle diameter of the metal oxide fine particles can be measured using a dynamic light scattering method. Specifically, it can be measured using “Nanotrack” manufactured by Nikkiso Co., Ltd.

  Examples of the high refractive index compound include resins containing halogen atoms other than fluorine (for example, resins containing bromine atoms, resins containing chlorine atoms, resins containing iodine atoms), resins containing sulfur atoms, resins containing nitrogen atoms, phosphorus Examples thereof include a resin containing an atom and a resin containing an aromatic ring (for example, a resin containing a fluorene skeleton, a resin containing a phenyl group, etc.). These resins are only required to be transparent, and publicly known or commercially available resins can be used, and they can be used in combination with other resins.

  Examples of resins containing halogen atoms other than fluorine, such as bromine atoms and chlorine atoms, include brominated acrylic resins, brominated urethane resins, brominated polyester resins, brominated polyether resins, brominated epoxy resins, brominated spiroacetal resins, Brominated polybutadiene resins, brominated polythiol polyene resins, chlorinated acrylic resins, chlorinated urethane resins, chlorinated polyester resins, chlorinated polyether resins, chlorinated epoxy resins, and the like can be used. As a raw material component of a resin containing a bromine atom, for example, a compound obtained by brominating the ortho-para position of the phenyl group of acrylate can be used. For example, BR-42 manufactured by Daiichi Kogyo Seiyaku Co., Ltd. can be used as a commercial product. Other commercially available products include BR-42M, BR-30M, BR-31 manufactured by Daiichi Kogyo Seiyaku Co., Ltd., and RDX51027 manufactured by Daicel-Cytec. Moreover, as resin containing a chlorine atom, the benzyl chloride salt of N, N- dimethylaminoethyl methacrylate, etc. can be used, You may use these in mixture of 2 or more types.

Examples of the resin containing a sulfur atom include S, S′-ethylenebis (thio (meth) acrylate), S, S ′-(thiodiethylene) bis (thio (meth) acrylate), S, S ′-[thiobis ( Diethylene sulfide)] bis (thio (meth) acrylate), S, S ′-(oxydiethylene) bis (thio (meth) acrylate) and the like can be used. Here, thio (meth) acrylate refers to thiomethacrylate and thioacrylate.
Among these, S, S′-ethylenebis (thiomethacrylate) and S, S ′-(thiodiethylene) bis (thiomethacrylate) are preferably used. S, S′-ethylenebis (thiomethacrylate) is obtained by reacting 1,2-ethanedithiol and an alkali metal salt of methacryloyl chloride obtained by reacting 1,2-ethanedithiol with an alkali metal compound in a nonpolar organic solvent. It can manufacture by the method of making it react with. As S, S ′-(thiodiethylene) bis (thiomethacrylate), those commercially available as trade name S2EG manufactured by Nippon Shokubai Co., Ltd. can be used.

  Examples of the resin containing a sulfur atom and an aromatic ring include S, S ′-(thiodi-p-phenylene) bis (thio (meth) acrylate), S, S ′-[4,4′-thiobis (3- Chlorobenzene)] bis (thio (meth) acrylate), S, S ′-[4,4′-thiobis (3,5-dichlorobenzene)] (thio (meth) acrylate), S, S ′-[4,4 '-Thiobis (3-bromobenzene)] (thio (meth) acrylate), S, S'-[4,4'-thiobis (3,5-dibromobenzene)] (thio (meth) acrylate), S, S '-[4,4'-thiobis (3-methylbenzene)] bis (thio (meth) acrylate), S, S'-[4,4'-thiobis (3,5-dimethylbenzene)] (thio (meta ) Acrylate), S, S ′-[4,4′-thiobis ( - can be used such as methyl benzene)] bis (thio (meth) acrylate). Of these, S, S ′-(thiodi-p-phenylene) bis (thiomethacrylate) (MPSMA manufactured by Sumitomo Seika Co., Ltd.) is preferably used, which is 4,4′-thiodibenzenethiol and an alkali metal compound. Can be produced by a method of reacting an alkali metal salt of 4,4′-thiodibenzenethiol obtained by reacting with methacryloyl chloride in a nonpolar organic solvent.

  As the resin containing an aromatic ring, an acrylic resin having a 9,9-bisphenoxyfluorene skeleton, an acrylic resin having a biphenyl group, an epoxy resin, or the like can be used. For example, 9,9-bis [4- (2-acryloyloxyethoxy) phenyl] fluorene (NK ester A-BPEF), o-phenylphenol glycidyl ether acrylate (NK ester 401P), hydroxyethylated o-, manufactured by Shin-Nakamura Chemical Co., Ltd. Phenylphenol acrylate (NK ester A-LEN-10), 9,9-bis (3-methyl-4-hydroxyphenyl) fluorene (BCF), 9,9-bis [4- (2-hydroxyethoxy) manufactured by JFE Chemical Co., Ltd. ) Phenyl] fluorene (BPEF), bisphenol fluorenediglycidyl ether (BPFG), bisphenoxyethanol fluorenediglycidyl ether (BPFG), bisphenoxyethanol fluorenic acrylate (BPEF-A) manufactured by Osaka Gas Chemical Co., Ltd. Ogsol PG series, Ogsol EG series, Ogsol EA series, Ogsol EA-F series, Nagase Sangyo Co., Ltd. Oncoat EX series, Kyoeisha Chemical Co., Ltd. HIC-G series, ADEKA company RF (X) series, etc. can be used. .

  The high refractive index compound is more preferably a polymerizable monomer or polymerizable oligomer containing a polymerizable functional group such as an acrylic group or an epoxy group.

  The thickness of the high refractive index layer is preferably in the range of 0.02 to 2 μm, more preferably in the range of 0.05 to 1 μm, and particularly preferably in the range of 0.07 to 0.5 μm.

  The refractive index of the low refractive index layer is preferably 1.45 or less, more preferably 1.40 or less, and particularly preferably 1.38 or less. The lower limit of the refractive index of the low refractive index layer is about 1.2.

Such low refractive index layers include fluorine-containing polymers, organic materials such as (meth) acrylic acid partial or fully fluorinated alkyl esters, fluorine-containing silicones, or inorganic materials such as MgF ₂ , CaF ₂ , and SiO _2. Can be configured. Hereinafter, preferred embodiments of the low refractive index layer will be exemplified.

As a preferred embodiment of the low refractive index layer, a method of forming a thin film such as MgF ₂ or SiO ₂ by a vapor deposition method such as vacuum deposition, sputtering, or plasma CVD, or a sol solution containing SiO ₂ sol from SiO ₂ Examples thereof include a method for forming a gel film.

  As another preferred embodiment of the low refractive index layer, a constitution mainly composed of a siloxane polymer bonded to silica-based fine particles can be employed. The term “bond” as used herein means a state in which the silica component of the silica-based fine particles and the siloxane polymer in the matrix are reacted and homogenized. A siloxane polymer formed by combining with silica-based fine particles once forms a silanol compound by a known hydrolysis reaction with a polyfunctional silane compound in a solvent and an acid catalyst in the presence of the silica-based fine particles. It can be obtained by utilizing the reaction.

  The polyfunctional silane compound preferably includes a polyfunctional fluorine-containing silane compound from the viewpoint of low refractive index and antifouling properties, and includes trifluoromethylmethoxysilane, trifluoromethylethoxysilane, and trifluoropropyltrimethoxy. Trifunctional fluorine-containing silane compounds such as silane, trifluoropropyltriethoxysilane, heptadecafluorodecyltrimethoxysilane, tridecafluorooctyltrimethoxysilane, heptadecafluorodecyltriethoxysilane, tridecafluorooctyltriethoxysilane, Examples include bifunctional fluorine-containing silane compounds such as heptadecafluorodecylmethyldimethoxysilane, all of which are preferably used. From the viewpoint of surface hardness, trifluoromethylmethoxysilane, trifluoro Chill silane, trifluoropropyl trimethoxy silane, trifluoropropyl triethoxy silane, more preferably.

  Examples of such polyfunctional fluorine-free silane compounds include vinyltrimethoxysilane, vinyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, methyltrimethoxysilane, and methyltriethoxy. Silane, hexyltrimethoxysilane, octadecyltrimethoxysilane, octadecyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, 3-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxy Trifunctional silanes such as silane, 3-chloropropyltrimethoxysilane, 3- (N, N-diglycidyl) aminopropyltrimethoxysilane, 3-glycidoxysipropyltrimethoxysilane Compound, dimethyldimethoxysilane, dimethyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, methylphenyldimethoxysilane, methylvinyldimethoxysilane, methylvinyldiethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-amino Propylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropylmethyldiethoxysilane, cyclohexylmethyldimethoxysilane, 3-methacryloxypropyldimethoxy Bifunctional silane compounds such as silane and octadecylmethyldimethoxysilane, tetrafunctional silane compounds such as tetramethoxysilane and tetraethoxysilane, etc. All of these are preferably used. From the viewpoint of surface hardness, vinyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, phenyltrimethoxysilane, and phenyltriethoxysilane are preferable. More preferable.

  The silica-based fine particles are preferably silica-based fine particles having an average particle size of 1 nm to 200 nm, and particularly preferably an average particle size of 1 nm to 70 nm. When the average particle diameter is less than 1 nm, the bond with the matrix material becomes insufficient and the hardness may be lowered. On the other hand, if the average particle diameter exceeds 200 nm, the generation of voids between particles caused by introducing a large amount of particles is reduced, and the effect of lowering the refractive index may not be sufficiently exhibited. Further, among these silica-based fine particles, those having a structure having a cavity inside are particularly preferably used in order to lower the refractive index.

  Examples of such silica-based fine particles having cavities therein include silica-based fine particles having a hollow portion surrounded by an outer shell, porous silica-based fine particles having a large number of hollow portions, and the like. As such an example, for example, it can be produced by the method disclosed in Japanese Patent No. 3272111, and the volume occupied by the cavities inside the fine particles, that is, the porosity of the fine particles is preferably 5% or more, more preferably 30% or more. preferable. The porosity can be measured using, for example, a mercury porosimeter (trade name: Bore Sizer 9320-PC2, manufactured by Shimadzu Corporation). Further, the refractive index of the fine particles themselves is preferably 1.20 to 1.40, more preferably 1.20 to 1.35. Examples of such silica-based fine particles include those disclosed in Japanese Patent Application Laid-Open No. 2001-233611, and those commercially available such as Japanese Patent No. 3272111.

  The thickness of the low refractive index layer is preferably in the range of 0.01 to 0.4 μm, and more preferably in the range of 0.02 to 0.2 μm.

  In the present invention, it is preferable to increase the refractive index of the hard coat layer in order to increase the antireflection function by laminating the low refractive index layer on the hard coat layer. In this case, the refractive index of the hard coat layer is preferably 1.55 or more, and more preferably 1.6 or more. The upper limit of the refractive index of the hard coat layer is about 2.

  In order to increase the refractive index of the hard coat layer, it is preferable to contain the metal oxide fine particles and the high refractive index compound used in the above-described high refractive index layer in the hard coat layer.

  In the present invention, an antiglare function can be imparted to the hard coat layer. In this case, the hard coat layer can be provided with organic particles or inorganic particles having an average particle diameter of about 1 to 10 μm to impart an antiglare function.

  In the display filter of the present invention, the outermost surface on the side having the hard coat layer with respect to the substrate preferably has high scratch resistance. The hard coat layer of the present invention has a feature of improving curl while maintaining high scratch resistance. Said abrasion resistance can be represented by the pencil hardness defined by JIS K5600-5-4 (1999).

  In the display filter of the invention, the pencil hardness of the outermost surface on the side having the hard coat layer with respect to the substrate is preferably H or higher, and more preferably 2H or higher. The upper limit is about 9H.

  The conductive layer in the present invention is a layer for shielding electromagnetic waves generated from the display, and includes a conductive mesh. The surface resistance value of the conductive layer is preferably low, preferably 3Ω / □ or less, more preferably 1Ω / □ or less, and particularly preferably 0.5Ω / □ or less. The lower limit value of the surface resistance is not particularly limited, but is about 0.01Ω / □. The surface resistance value of the conductive layer can be measured by a four-terminal method. Note that the conductive layer including the conductive mesh may be composed of only the conductive mesh, or a part of the conductive layer may be a conductive mesh and the other part may be a conductive layer other than the conductive mesh. It does not matter. A part of the conductive layer is a conductive mesh, and the other part is a conductive layer other than the conductive mesh. For example, in a display filter cut into a rectangular shape, a central portion (two diagonal lines in the plane direction of the conductive layer). Most of the area including the intersection point of the conductive mesh is a conductive mesh, and a metal layer in which only four sides are not meshed can be exemplified.

  The thickness of the conductive mesh is preferably 8 μm or less, preferably 6 μm or less, and particularly preferably 4 μm or less from the viewpoint of coating and forming a hard coat layer (composition for forming a hard coat layer). The lower limit of the thickness of the conductive mesh is preferably 0.5 μm or more, and preferably 1 μm or more from the viewpoint of ensuring high electromagnetic shielding performance.

  As a method for forming the conductive layer including the conductive mesh, a known method can be used. For example, 1) A method of printing a conductive ink in a pattern on a transparent substrate. 2) A method of applying metal plating to a catalyst ink layer printed in a pattern on a substrate, 3) A method of using conductive fibers, 4) A metal foil is bonded on the substrate with an adhesive, and then patterned. Method 5) Method of patterning by etching after forming a metal thin film on a substrate by vapor deposition method or plating method, 6) Method of using photosensitive silver salt, 7) Method of laser ablating metal thin film, etc. However, it is not limited to these.

  The manufacturing method of said electroconductive mesh is demonstrated in detail.

  1) The method of printing the conductive ink in a pattern on the substrate is a method of printing the conductive ink in a pattern on the substrate by a known printing method such as screen printing or gravure printing.

  2) A method of applying metal plating to a catalyst ink layer printed in a pattern on a substrate is, for example, printed in a pattern using a catalyst ink made of a palladium colloid-containing paste, and this is electroless copper plating solution In this method, electroless copper plating is performed by immersing the substrate in the inside, followed by electrolytic copper plating, and further by electrolytic plating of a Ni—Sn alloy to form a conductive mesh pattern.

  3) A method using conductive fibers is a method in which a knitted fabric made of conductive fibers is bonded through an adhesive or an adhesive.

  4) The method of patterning after laminating a metal foil on a base material with an adhesive is performed by laminating a metal foil (copper, aluminum, nickel, etc.) on the base material via an adhesive or an adhesive, This metal foil is a method of etching a metal foil after producing a resist pattern using a photolithography method or a screen printing method. As a method for forming the above resist pattern, a photolithography method is preferable, and the photolithography method is a method of applying a photosensitive resist on a metal foil or laminating a photosensitive resist film, adhering a pattern mask, and exposing, This is a method of forming an etching resist pattern by developing with a developing solution, and further eluting metals other than the pattern portion with an appropriate etching solution to form a desired conductive mesh.

  5) A method of patterning by etching after forming a metal thin film on a substrate by vapor deposition or plating is performed by using a metal thin film (copper, aluminum, silver, gold, palladium, indium, tin, or A metal made of an alloy of silver and other metals) is formed by vapor deposition such as vapor deposition, sputtering, ion plating, or plating, and this metal thin film is formed by photolithography or screen printing. This is a method of etching a metal thin film after producing a resist pattern using it. As a method of forming the above resist pattern, a photolithography method is preferable, and the photolithography method is a method of applying a photosensitive resist on a metal thin film or laminating a photosensitive resist film, adhering a pattern mask, and exposing, This is a method of forming an etching resist pattern by developing with a developing solution, and further eluting metals other than the pattern portion with an appropriate etching solution to form a desired conductive mesh. In this method, it is preferable to form a metal thin film on a substrate without using an adhesive or a pressure-sensitive adhesive.

  6) A method using a photosensitive silver salt is a method in which a silver salt emulsion layer such as silver halide is coated on a transparent substrate, and after photomask exposure or laser exposure, development processing is performed to form a silver mesh. is there. The formed silver mesh is preferably further plated with a metal such as copper or nickel. This method is described in WO 2004/7810, JP-A 2004-221564, JP-A 2006-12935, and the like, and can be referred to.

  7) The method of laser ablating a metal thin film is a method of producing a metal thin film mesh pattern by laser ablation of a metal thin film formed on a substrate in the same manner as in 5) above.

  Laser ablation means that when a solid surface that absorbs laser light is irradiated with laser light with a high energy density, the bonds between the irradiated parts are broken and evaporated, causing the solid surface of the irradiated part to break. It is a phenomenon that is cut away. By utilizing this phenomenon, the solid surface can be processed. Since laser light is highly straight and condensing, it is possible to selectively process a fine area about 3 times the wavelength of the laser light used for ablation, and high processing accuracy is obtained by the laser ablation method. I can do it.

  The laser used for such ablation can be any laser having a wavelength that is absorbed by the metal. For example, a gas laser, a semiconductor laser, an excimer laser, or a solid laser using a semiconductor laser as an excitation light source can be used. A second harmonic light source (SHG), a third harmonic light source (THG), or a fourth harmonic light source (FHG) obtained by combining these solid-state lasers and a nonlinear optical crystal can be used.

  Among such solid-state lasers, an ultraviolet laser having a wavelength of 254 nm to 533 nm is preferably used from the viewpoint of not processing a plastic film. Among them, it is preferable to use a solid laser SHG (wavelength 533 nm) such as Nd: YAG (neodymium: yttrium, aluminum, garnet), and more preferably a solid laser THG (wavelength 355 nm) ultraviolet laser such as Nd: YAG. .

  As a laser oscillation method, any type of laser can be used. From the viewpoint of processing accuracy, a pulse laser is preferably used, and a Q-switch type pulse laser having a pulse width of ns or less is more preferable.

  It is also preferable to laser ablate the metal thin film and the metal oxide layer after further forming a 0.01 to 0.1 μm metal oxide layer on the metal thin film (viewing side). As the metal oxide, metal oxides such as copper, aluminum, nickel, iron, gold, silver, stainless steel, chromium, titanium, and tin can be used. From the viewpoint of price and film stability, copper oxide is used. preferable. As a method for forming the metal oxide, a vacuum deposition method, a sputtering method, an ion plate method, a chemical vapor deposition method, an electroless method, an electrolytic plating method, or the like can be used.

  Among the above-described methods for producing a conductive mesh, a conductive mesh having a relatively small thickness (for example, a conductive mesh having a thickness of 8 μm or less) can be easily produced, and high electromagnetic shielding properties can be secured. The production methods 2), 5), 6) and 7) above are preferably used.

  Moreover, from the viewpoint of the coatability of the hard coat layer and the adhesion between the hard coat layer and the conductive layer, the conductive mesh produced by the production methods of 2), 5) and 7) above is preferably used. . In particular, the production method 5) is particularly preferably used because the coating property of the hard coat layer is good and the production cost of the conductive mesh is low.

  The production method 5) will be described in more detail.

  As a method for forming a metal thin film on a substrate, a vapor deposition method is preferred. Examples of the vapor deposition method include sputtering, ion plating, electron beam vapor deposition, vacuum vapor deposition, and chemical vapor deposition. Among these, sputtering and vacuum vapor deposition are preferable. As a metal for forming a metal thin film, an alloy or a multilayer of one or more of metals such as copper, aluminum, nickel, iron, gold, silver, stainless steel, chromium and titanium is used. can do. Among these, copper is preferably used from the viewpoints of obtaining good electromagnetic shielding properties, easy mesh pattern processing, and low cost.

  Moreover, when using copper as a metal of a metal thin film, it is preferable to use a nickel thin film with a thickness of 5-100 nm between a base material and a copper thin film. This improves the adhesion between the substrate and the copper thin film.

  As a method for forming a resist pattern on the metal thin film, photolithography is preferably used. In such a photolithography method, a photosensitive resist layer is laminated on a metal thin film, the resist layer is exposed to a mesh pattern, developed to form a resist pattern, and then the metal thin film is etched to form a mesh pattern. In this method, the resist layer on the mesh is peeled and removed.

  As the photosensitive resist layer, a negative resist in which the exposed portion is cured or a positive resist in which the exposed portion is dissolved by development can be used. The photosensitive resist layer may be coated and laminated directly on the metal thin film, or a film made of a photoresist may be bonded. As a method for exposing the photoresist layer, there can be used a method of exposing with an ultraviolet ray or the like through a photomask, or a method of directly scanning and exposing using a laser.

  Etching methods include chemical etching methods. Chemical etching is a method in which a metal other than a metal portion protected by a resist pattern is dissolved and removed with an etching solution. Examples of the etching solution include a ferric chloride aqueous solution, a cupric chloride aqueous solution, and an alkaline etching solution.

  The haze value of the conductive mesh film in which only the conductive mesh is provided on the substrate is preferably 6% or less, and particularly preferably 5% or less. The haze value of the conductive mesh film varies somewhat depending on the line width and line pitch of the conductive mesh, but greatly depends on the method of manufacturing the conductive mesh. The conductive mesh film produced by the conductive mesh production method of 2), 5), 6) and 7) described above can achieve a haze value of 6% or less, and further 5% or less. The lower limit of the haze value of the conductive mesh film is not particularly limited and is preferably as low as possible, but the practical lower limit is about 1%. Here, the haze value can be measured according to JIS K 7136 (2000).

  By using the conductive mesh having a low haze value, the haze value after the hard coat layer is formed on the conductive mesh can be kept low, and high transparency can be ensured. The haze value after coating and forming a hard coat layer on the conductive mesh or after coating and forming a further antireflection layer on the hard coat layer is preferably 5% or less, more preferably 4% or less. The lower limit of the haze value after coating and forming the hard coat layer and the low refractive index layer on the conductive mesh is not particularly limited and is preferably as low as possible, but the practical lower limit is about 0.5%.

  In the present invention, the conductive mesh is preferably blackened. The blackening treatment can be performed by oxidation treatment or black printing. For example, the methods described in JP-A-10-41682, JP-A-2000-9484, 2005-317703 and the like can be used. The blackening treatment is preferably performed on the surface and both side surfaces of the conductive mesh on the visual recognition side, and it is further preferable to blacken both surfaces and both side surfaces of the conductive mesh.

  In order to reduce the brightness of the conductive mesh itself, the blackening treatment uses oxidation, black printing, blackening plating, etc. to reduce the brightness of the conductive mesh itself for the purpose of high contrast when the display filter is actually attached to the display. , To reduce the reflection luminance.

  In the present invention, in order to efficiently produce a display filter on a continuous production line, the conductive mesh is preferably a continuous mesh. The continuous mesh refers to a state in which, for example, when the conductive mesh is formed on a long roll-shaped base material, the conductive mesh is continuously formed in the long direction of the base material. Such a continuous mesh is suitable for applying a hard coat layer.

  Examples of the mesh pattern of the conductive mesh include a lattice mesh pattern made up of squares, rectangles, rhombuses, etc., a mesh pattern made up of triangles, pentagons or more polygons, a mesh pattern made up of circles, ellipses, and the above composite shapes And a random mesh pattern. Among these, a grid mesh pattern is preferable from the viewpoint of productivity and ease of product management, and a grid mesh pattern made of a square is particularly preferable.

  The conductive mesh according to the present invention preferably has a line width of 3 to 30 μm, and preferably 4 to 20 μm. The line pitch of the conductive mesh is suitably in the range of 50 to 500 μm, and preferably in the range of 80 to 300 μm. Here, the line pitch of the conductive mesh is defined as the distance between the center of gravity of one opening surrounded by the thin line constituting the conductive mesh and the opening that shares at least one side (thin line) with this opening. Distance. When the mesh pattern of the conductive mesh is a square lattice pattern, the line pitch is the distance between adjacent thin lines.

  As a base material used for the display filter of the present invention, a plastic film is preferable. Examples of the resin constituting the plastic film include polyester resins such as polyethylene terephthalate and polyethylene naphthalate, cellulose resins such as triacetyl cellulose, polyolefin resins such as polyethylene, polypropylene, and polybutylene, acrylic resins, polycarbonate resins, arton resins, and epoxy resins. , Polyimide resin, polyetherimide resin, polyamide resin, polysulfone resin, polyphenylene sulfide resin, polyether sulfone resin, and the like. Among these, a polyester resin, a polyolefin resin, and a cellulose resin are preferable, and a polyester resin is particularly preferably used. Moreover, as a plastic film, the laminated | multilayer film which laminated | stacked the several layer can also be used.

  The thickness of the plastic film is preferably in the range of 80 to 200 μm, particularly preferably in the range of 90 to 180 μm, from the viewpoint of ensuring cost, processability, and rigidity of the display filter. The display filter according to the present invention is preferably composed of only one base material, and the plastic film is preferably used as only one base material.

  The plastic film used in the present invention is provided with a primer layer (undercoat layer, easy adhesion layer) for enhancing adhesion (adhesion strength) with the conductive layer described above or a near infrared shielding layer described later. Is preferred.

  As such a primer layer, those using a water-soluble resin or a water-dispersible resin are generally known, and are preferably used in the present invention. As the water-soluble resin or water-dispersible resin, polyurethane resin, polyester resin, acrylic resin, polyvinyl alcohol resin, or the like is used. The primer layer preferably further contains a crosslinking agent. Examples of the crosslinking agent include isocyanate compounds, epoxy compounds, oxazoline compounds, and melamine compounds. The thickness of the primer layer is generally in the range of 10 to 500 nm, preferably in the range of 20 to 300 nm. The primer layer may be formed after the plastic film is manufactured, or may be formed in-line when the plastic film is manufactured.

  Furthermore, in the present invention, when a plastic film is used as a substrate, a plastic film having an ultraviolet shielding function is used in order to prevent photodegradation of dyes and pigments contained in a near infrared shielding layer and a color tone adjustment layer described later. It is preferable to use it. In general, since the ultraviolet shielding function is provided on the viewer side from the layer containing a dye or pigment, it is most preferable to use a plastic film containing an ultraviolet absorber. The ultraviolet absorber is preferably kneaded into the thermoplastic resin in the melting step before film formation. Examples of the ultraviolet absorber include salicylic acid compounds, benzophenone compounds, benzotriazole compounds, cyanoacrylate compounds, benzoxazinone compounds, cyclic imino ester compounds, and the like, and particularly preferably ultraviolet rays at 380 nm to 390 nm. A benzoxazinone-based compound is preferably used in terms of shielding properties, color tone, and the like. These compounds may be used alone or in combination of two or more. Moreover, combined use of stabilizers, such as HALS (hindered amine light stabilizer) and antioxidant, is more preferable. The content of the ultraviolet absorber is preferably 0.1 to 5% by mass and more preferably 0.2 to 3% by mass in all components of the plastic film. As for the ultraviolet shielding property, it is preferable that the transmittance at a wavelength of 380 nm or less is 3% or less, so that a dye or a pigment can be protected from ultraviolet rays.

  The display filter of the present invention is preferably provided with a light absorbing layer having functions such as a near-infrared shielding function, a color tone adjusting function, or a visible light transmittance adjusting function.

  The near-infrared shielding layer having a near-infrared shielding function is preferably adjusted so that the maximum light transmittance in the wavelength range of 800 to 1100 nm is 20% or less. The near-infrared shielding function may be imparted by kneading and dispersing a near-infrared absorber in a base material (plastic film), a hard coat layer, or an adhesive layer described later, or a near-infrared shielding layer is newly provided. May be. The near-infrared shielding function can be imparted by using a near-infrared absorber. In the present invention, a near-infrared shielding layer formed by applying and drying a paint in which a near-infrared absorber is dispersed or dissolved in a resin binder is used, or the above-mentioned near-infrared absorber is contained in a hard coat layer or an adhesive layer. Embodiments are preferably used. Near-infrared absorbers include organic near-infrared absorbers such as phthalocyanine compounds, anthraquinone compounds, dithiol compounds, diimonium compounds, or titanium oxide, zinc oxide, indium oxide, tin oxide, zinc sulfide, cesium-containing oxides An inorganic near infrared absorber such as tungsten can be used.

  The display filter of the present invention when the above-described near-infrared shielding layer is newly provided may be provided by coating on the surface opposite to the conductive layer between the base material and the conductive layer or on the base material. it can.

  In the case where the near infrared shielding function is imparted to the viewer side from the base material, it is preferable to use an inorganic near infrared absorber having excellent light resistance.

  The color tone adjustment layer having a color tone adjustment function is a function for improving color purity and whiteness by absorbing light of a specific wavelength emitted from the display. In particular, it is preferable to shield orange light that reduces the color purity of red light emission, and it is preferable to include a dye having an absorption maximum in a wavelength range of 580 to 620 nm. Furthermore, it is preferable to contain a dye having an absorption maximum at a wavelength of 480 to 500 nm in order to improve whiteness. For the color tone adjustment function, a layer containing a dye that absorbs light having the above-described wavelength may be newly provided, or a dye may be contained in the above-described near-infrared shielding layer, hard coat layer, or adhesive layer.

  The visible light transmittance adjusting function is a function for adjusting the visible light transmittance, and can be adjusted by containing a dye or a pigment. The visible light transmittance adjusting function may be imparted to a base material (plastic film), a near infrared shielding layer, a hard coat layer, or an adhesive layer, or a transmittance adjusting layer may be newly provided.

  When the above-described layer having a color tone adjusting function and a layer having a visible light transmittance adjusting function are newly provided in the display filter of the present invention, these layers are provided between the base material and the conductive layer or to the base material. It can be provided on the surface opposite to the conductive layer.

  The display filter of the present invention can be attached to the display directly or via a known high-rigidity substrate such as a glass plate, an acrylic plate, or a polycarbonate plate. The display filter is preferably provided with an adhesive layer for adhering to a display or a highly rigid substrate. The high-rigidity substrate is usually a substrate having a thickness of 0.5 to 5 mm, and the high-rigidity substrate is not included in only one base material constituting the display filter of the present invention.

  As described above, the adhesive layer can be provided with a near-infrared shielding function, a color tone adjusting function, or a visible light transmittance adjusting function. Moreover, it is a preferable aspect to provide the adhesive layer with an impact relaxation function for protecting the display from impact. In order to impart an impact relaxation function to the adhesive layer, the thickness of the adhesive layer is preferably 100 μm or more, and more preferably 300 μm or more. The upper limit thickness is preferably 3000 μm or less in consideration of the coating suitability of the adhesive layer.

  A well-known adhesive material or an adhesive material can be used for an adhesive layer. Examples of the adhesive material include acrylic, silicone, urethane, polyvinyl butyral, and ethylene-vinyl acetate. Adhesives include bisphenol A type epoxy resins, tetrahydroxyphenylmethane type epoxy resins, novolac type epoxy resins, resorcin type epoxy resins, polyolefin type epoxy resins and other epoxy resins, natural rubber, polyisoprene, poly-1, 2- (Di) enes such as butadiene, polyisobutene, polybutene, poly-2-heptyl-1,3-butadiene, poly-1,3-butadiene, polyoxyethylene, polyoxypropylene, polyvinyl ethyl ether, polyvinyl hexyl ether, etc. Polyesters such as polyethers, polyvinyl acetate, polyvinyl propionate, polyurethane, ethyl cellulose, polyvinyl chloride, polyacrylonitrile, polymethacrylonitrile, polysulfone, phenoxy resin Etc.

  In addition, the display filter of the present invention has a configuration with only one substrate. Here, the configuration of the display filter is a configuration having only one substrate, for example, adhesive layer / base material / conductive layer / antiglare hard coat layer, adhesive layer / near-infrared shielding layer / base material / conductive. Layer / antiglare hard coat layer, adhesive layer / near infrared shielding layer / base material / conductive layer / hard coat layer / antireflection layer, and the like. A configuration using a coat layer (for example, adhesive layer / base material / conductive layer / hard coat layer with base material / antireflection layer, etc.) is not intended. By configuring the display filter to have only one substrate, raw material costs and production costs can be reduced.

EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited by these Examples.
<Evaluation>
1) Curling property: Five test pieces obtained by cutting a sample in which a hard coat layer, a high refractive index layer, and a low refractive index layer were laminated on a conductive layer into a size of 15 × 15 cm were prepared. Next, five test pieces were placed on a horizontal surface with the low refractive index layer side facing up (with the conductive layer side down) with respect to the hard coat layer, and the conditions were 23 ° C. and 50% (RH). After leaving for 10 minutes, the distance from the horizontal surface of the portion that floated most from the horizontal surface was measured for each test piece. The average of the obtained data was taken as the curl value and evaluated according to the following criteria.

○: Curl value is less than 5 mm Δ: Curl value is 5 mm or more and less than 10 mm ×: Curl value is 10 mm or more 2) Pencil hardness; Sample in which a hard coat layer, a high refractive index layer and a low refractive index layer are laminated on a conductive layer Five test pieces obtained by cutting to a size of 10 × 10 cm were prepared. Five test pieces are placed on a horizontal surface with the low refractive index layer side facing up (with the conductive layer side down) with respect to the hard coat layer, and left for 1 hour at 23 ° C. and 50% (RH). Thereafter, for each test piece, the pencil hardness (pencil hardness defined by JIS K5600-5-4 (1999)) was measured from the surface of the low refractive index layer and averaged. The obtained pencil hardness was evaluated according to the following criteria.

○: 2H or more Δ; H or more and less than 2H ×; less than H (Example 1)
The display filter of the present invention was produced in the following manner.
<Preparation of a conductive layer having a conductive mesh>
A palladium colloid-containing paste is gravure-printed on a PET film with a thickness of 100 μm (Lumirror (registered trademark) manufactured by Toray Industries, Inc.) in a grid-like mesh pattern with a line width of 20 μm and a line pitch of 300 μm. Then, electroless copper plating was performed, followed by electrolytic copper plating, and further by electrolytic plating of a Ni—Sn alloy to form a conductive layer having a conductive mesh with a thickness of 7 μm.
<Coating of hard coat layer>
A composition (coating liquid) for forming the following hard coat layer was applied on the conductive layer with a micro gravure coater, dried at 80 ° C., and then irradiated with ultraviolet rays of 1.0 J / cm ^2. A hard coat layer having a thickness of 10 μm was provided by curing.

<Hardcoat layer forming composition>
Radical polymerizable monomer 20 parts by mass (Pentaerythritol triacrylate Kyoeisha Chemical Co., Ltd. PE-3A)
20 parts by mass of radically polymerizable oligomer (urethane acrylate oligomer UN-3320HA manufactured by Negami Kogyo Co., Ltd.)
10 parts by mass of cationic polymerizable monomer (Pentaerythritol polyglycidyl ether, Denacol EX-411 manufactured by Nagase ChemteX Corporation)
2 parts by mass of radical polymerization initiator (Irgacure 184 manufactured by 1-hydroxycyclohexyl phenyl ketone Ciba Specialty Chemicals)
Cationic polymerization initiator 1 part by mass (arylsulfonium salt derivative ADEKA SP-150)
1 part by mass of surface modifier (fluorine-based surfactant, MegaFuck MCF-350, manufactured by Dainippon Ink & Chemicals, Inc.)
Methyl isobutyl ketone 40 parts by mass Isopropyl alcohol 6 parts by mass <Coating of antireflection layer>
The following high refractive index layer and low refractive index layer were sequentially coated on the hard coat layer.
<High refractive index layer>
A mixture of 6 parts by mass of tin-containing indium oxide particles (ITO), 2 parts by mass of polyfunctional acrylate, 18 parts by mass of methanol, 54 parts by mass of polypropylene glycol monoethyl ether, and 20 parts by mass of isopropyl alcohol was stirred to give a coating film refractive index of 1. A 67 high refractive index paint was prepared. This paint is applied onto the hard coat layer using a micro gravure coater, dried at 80 ° C., and then irradiated with ultraviolet light 1.0 J / cm ² to cure the applied layer, and has a thickness of about 0.1 μm. A high refractive index layer was formed.
<Low refractive index layer>
A silica slurry comprising 144 parts by mass of hollow silica particles having an outer shell with a primary particle diameter of 50 nm (porosity 40%) and 560 parts by mass of isopropyl alcohol was prepared, 219 parts by mass of methyltrimethoxysilane, 3,3,3-tri 158 parts by mass of fluoropropyltrimethoxysilane, 704 parts by mass of the above silica slurry, and 713 parts by mass of polypropylene glycol monoethyl ether are mixed with stirring, 1 part by mass of phosphoric acid and 130 parts by mass of water are mixed, and the mixture is stirred at 30 ° C. ± 10 ° C. Then, the mixture was hydrolyzed for 60 minutes, and the temperature was raised to 80 ° C. ± 5 ° C., followed by polymerization while stirring for 60 minutes to obtain a silica particle-containing polymer.

  Next, 1200 parts by mass of this silica particle-containing polymer and 5244 parts by mass of isopropyl alcohol were stirred and mixed, then 15 parts by mass of acetoxyaluminum as a curing catalyst was added and stirred again to prepare a paint having a refractive index of 1.35. .

This paint was applied onto the high refractive index layer with a small-diameter gravure coater, dried and cured at 130 ° C. to form a low refractive index layer having a thickness of about 0.1 μm.
(Example 2)
Except for changing the composition (coating liquid) for forming the hard coat layer of Example 1 to the composition (coating liquid) for forming the following hard coat layer, the same procedure as in Example 1 was performed. Produced.

<Hardcoat layer forming composition>
Radical polymerizable monomer 30 parts by mass (dipentaerythritol hexaacrylate, Kyoeisha Chemical Co., Ltd. DPE-6A)
Cationic polymerizable monomer 20 parts by mass (3-ethyl 3-{[(3-ethyloxetane-3-yl) methoxy] methyl} oxetane manufactured by Toagosei Co., Ltd. OXT-221)
2 parts by mass of radical polymerization initiator (Irgacure 184 manufactured by 1-hydroxycyclohexyl phenyl ketone Ciba Specialty Chemicals)
Cationic polymerization initiator 1 part by mass (arylsulfonium salt derivative ADEKA SP-150)
1 part by mass of surface modifier (fluorine-based surfactant, MegaFuck MCF-350, manufactured by Dainippon Ink & Chemicals, Inc.)
Methyl isobutyl ketone 40 parts by mass Isopropyl alcohol 6 parts by mass (Comparative Example 1)
Except for changing the composition (coating liquid) for forming the hard coat layer of Example 1 to the composition (coating liquid) for forming the following hard coat layer, the same procedure as in Example 1 was performed. Produced.

<Hardcoat layer forming composition>
25 parts by mass of radical polymerizable monomer (pentaerythritol triacrylate PE-3A manufactured by Kyoeisha Chemical Co., Ltd.)
25 parts by mass of radical polymerizable oligomer (urethane acrylate oligomer UN-3320HA manufactured by Negami Kogyo Co., Ltd.)
2 parts by mass of radical polymerization initiator (Irgacure 184 manufactured by 1-hydroxycyclohexyl phenyl ketone Ciba Specialty Chemicals)
1 part by mass of surface modifier (fluorine-based surfactant, MegaFuck MCF-350, manufactured by Dainippon Ink & Chemicals, Inc.)
Methyl isobutyl ketone 40 parts by mass Isopropyl alcohol 6 parts by mass (Comparative Example 2)
Except for changing the composition (coating liquid) for forming the hard coat layer of Example 1 to the composition (coating liquid) for forming the following hard coat layer, the same procedure as in Example 1 was performed. Produced.

<Hardcoat layer forming composition>
Cationic polymerizable monomer 50 parts by mass (Pentaerythritol polyglycidyl ether Denasel EX-411 manufactured by Nagase ChemteX Corporation)
Cationic polymerization initiator 1 part by mass (arylsulfonium salt derivative ADEKA SP-150)
1 part by mass of surface modifier (fluorine-based surfactant, MegaFuck MCF-350, manufactured by Dainippon Ink & Chemicals, Inc.)
Methyl isobutyl ketone 40 parts by mass Isopropyl alcohol 6 parts by mass (Example 3)
The display filter of the present invention was produced in the following manner.
<Preparation of a conductive layer having a conductive mesh>
A nickel layer (thickness 0.02 μm) is formed by sputtering on one surface of a 100 μm thick PET film (Lumirror (registered trademark) manufactured by Toray Industries, Inc.), and a copper layer 3 μm thick is further formed thereon. It formed by the vacuum evaporation method. Next, an alkali development type high-sensitivity positive resist film was laminated on the surface of this copper layer, exposed using a semiconductor laser having a wavelength of 405 nm, and developed using a developer containing 1% by mass of sodium carbonate. Next, after etching with a ferric chloride solution, the resist layer is peeled off by treatment with a 3% by mass aqueous sodium hydroxide solution to form a continuous mesh pattern having a line width of 10 μm, a line pitch of 250 μm, and a thickness of 3 μm. A conductive mesh was formed. Subsequently, the conductive mesh was blackened using an oxidation treatment agent (adjusted at a ratio of Enplate MB-438A / B / pure water = 8/13/79 manufactured by Meltex Co., Ltd.).
<Coating of hard coat layer>
A composition (coating solution) for forming the same hard coat layer as in Example 1 was coated on the conductive layer with a microgravure coater, dried at 80 ° C., and then irradiated with ultraviolet rays of 1.0 J / cm ² . Irradiated and cured to provide a hard coat layer having a thickness of 7 μm.
<Coating of antireflection layer>
A high refractive index layer and a low refractive index layer were sequentially coated on the hard coat layer in the same manner as in Example 1.
Example 4
Example 3 is the same as Example 3 except that the composition (coating liquid) for forming the hard coat layer of Example 3 is changed to the composition (coating liquid) for forming the hard coat layer of Example 2. It produced similarly.
(Comparative Example 3)
Example 3 and Example 3 except that the composition (coating liquid) for forming the hard coat layer of Example 3 is changed to the composition (coating liquid) for forming the hard coat layer of Comparative Example 1 It produced similarly.
(Comparative Example 4)
Example 3 and Example 3 except that the composition (coating liquid) for forming the hard coat layer of Example 3 is changed to the composition (coating liquid) for forming the hard coat layer of Comparative Example 2 It produced similarly.
<Evaluation>
The samples obtained as described above were evaluated for curling properties and pencil hardness. The results are shown in Table 1.

  From the results in Table 1, it can be seen that all the examples of the present invention have improved curl properties while maintaining a high pencil height.

  On the other hand, Comparative Example 1 and Comparative Example 3 have a high pencil height, but have deteriorated curl properties. In Comparative Examples 2 and 4, the curl property is good, but the pencil height is lowered.

Claims (5)

A display filter having a conductive layer containing a conductive mesh on a substrate, and having a hard coat layer on the conductive layer,
The display filter has a configuration with only one substrate,
The display filter, wherein the hard coat layer contains a compound derived from a compound having a radical polymerizable functional group and a compound derived from a compound having a cationic polymerizable functional group.   The display filter according to claim 1, wherein the hard coat layer has a thickness of 6 to 25 μm. The hard coat layer is formed by reacting a composition containing a compound having a radical polymerizable functional group and a compound having a cationic polymerizable functional group,
The display filter according to claim 1 or 2, wherein in the composition, the content of the compound having the cationic polymerizable functional group is 10 to 100 parts by mass with respect to 100 parts by mass of the compound having the radical polymerizable functional group. .   The display filter according to claim 1, wherein the conductive mesh has a thickness of 0.5 to 8 μm.   The display filter according to claim 1, wherein the base material is a plastic film having a thickness of 80 to 200 μm.