JP2010077117A - Amide compound and application thereof for plant disease control - Google Patents
Amide compound and application thereof for plant disease control Download PDFInfo
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- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
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Abstract
Description
本発明は、アミド化合物およびその植物病害防除用途に関する。 The present invention relates to an amide compound and its use for controlling plant diseases.
植物病害を防除するための薬剤の開発が行われ、植物病害防除効果を有する化合物が数多く見出されているが、その効果は十分でない場合があり、新たな化合物群の探索が鋭意行われている。 Drugs for controlling plant diseases have been developed, and many compounds having a plant disease control effect have been found, but the effect may not be sufficient, and a search for new compound groups has been conducted eagerly. Yes.
本発明は、植物病害に対して優れた防除効力を有する化合物を提供することを課題とする。 An object of the present invention is to provide a compound having an excellent control effect against plant diseases.
本発明者は、植物病害に対して優れた防除効力を有する化合物を見出すべく検討した結果、下記式(I)で表されるアミド化合物が植物病害に対して優れた防除効力を有することを見出し、本発明に到った。
すなわち本発明は、以下の〔1〕〜〔13〕の通りである。
〔1〕 式(I)
〔式中、R1は水素原子又はフッ素原子を表し、R2はC1−C6直鎖アルキル基又は直鎖式の(C1−C2アルコキシ)C2−C5アルキル基を表す。〕
で示されるアミド化合物(以下、本発明化合物と記す場合もある。)。
〔2〕 R1がフッ素原子であり、R2がC1−C6直鎖アルキル基である〔1〕記載のアミド化合物。
〔3〕 R1がフッ素原子であり、R2がメチル基又はエチル基である〔1〕記載のアミド化合物。
〔4〕 R1が水素原子であり、R2がC1−C6直鎖アルキル基である〔1〕記載のアミド化合物。
〔5〕 R1が水素原子であり、R2がメチル基、エチル基又はブチル基である〔1〕記載のアミド化合物。
〔6〕 R2が直鎖式の(C1−C2アルコキシ)C2−C5アルキル基である〔1〕記載のアミド化合物。
〔7〕 R1が水素原子である〔6〕記載のアミド化合物。
〔8〕 R1がフッ素原子である〔6〕記載のアミド化合物。
〔9〕 R2が直鎖式の(C1−C2アルコキシ)C3−C4アルキル基である〔6〕〜〔8〕いずれか一項記載のアミド化合物。
〔10〕 〔1〕〜〔9〕いずれか一項記載のアミド化合物を有効成分として含有する植物病害防除剤(以下、本発明防除剤と記す場合もある。)。
〔11〕 〔1〕〜〔9〕いずれか一項記載のアミド化合物の有効量を植物又は土壌に処理する工程を有してなる植物病害の防除方法(以下、本発明防除方法と記す場合もある。)。
〔12〕 植物又は土壌に処理することにより、植物病害を防除するための〔1〕〜〔9〕いずれか一項記載のアミド化合物の使用。
〔13〕 式(II)
〔式中、R1は水素原子又はフッ素原子を表す。〕
で示されるアミド化合物(以下、本アミド化合物と記す場合もある。)。
As a result of studying to find a compound having an excellent control effect against plant diseases, the present inventor has found that the amide compound represented by the following formula (I) has an excellent control effect against plant diseases. The present invention has been reached.
That is, the present invention is as follows [1] to [13].
[1] Formula (I)
[Wherein, R 1 represents a hydrogen atom or a fluorine atom, and R 2 represents a C1-C6 linear alkyl group or a linear (C1-C2 alkoxy) C2-C5 alkyl group. ]
An amide compound represented by the formula (hereinafter sometimes referred to as the present compound).
[2] The amide compound according to [1], wherein R 1 is a fluorine atom and R 2 is a C1-C6 straight chain alkyl group.
[3] The amide compound according to [1], wherein R 1 is a fluorine atom and R 2 is a methyl group or an ethyl group.
[4] The amide compound according to [1], wherein R 1 is a hydrogen atom, and R 2 is a C1-C6 linear alkyl group.
[5] The amide compound according to [1], wherein R 1 is a hydrogen atom and R 2 is a methyl group, an ethyl group or a butyl group.
[6] The amide compound according to [1], wherein R 2 is a linear (C1-C2 alkoxy) C2-C5 alkyl group.
[7] The amide compound according to [6], wherein R 1 is a hydrogen atom.
[8] The amide compound according to [6], wherein R 1 is a fluorine atom.
[9] The amide compound according to any one of [6] to [8], wherein R 2 is a linear (C1-C2 alkoxy) C3-C4 alkyl group.
[10] A plant disease control agent comprising the amide compound according to any one of [1] to [9] as an active ingredient (hereinafter sometimes referred to as the present invention control agent).
[11] A method for controlling plant diseases comprising a step of treating the plant or soil with an effective amount of the amide compound according to any one of [1] to [9] (hereinafter also referred to as the present invention control method). is there.).
[12] Use of the amide compound according to any one of [1] to [9] for controlling plant diseases by treating the plant or soil.
[13] Formula (II)
[Wherein, R 1 represents a hydrogen atom or a fluorine atom. ]
An amide compound represented by (hereinafter sometimes referred to as the present amide compound).
本発明化合物は植物病害に対して優れた防除効力を有することから、植物病害防除剤の有効成分として有用である。 Since the compound of the present invention has an excellent control effect against plant diseases, it is useful as an active ingredient of a plant disease control agent.
本発明における、R2で示される”直鎖(C1−C2アルコキシ)C2−C5アルキル基”とは、炭素鎖に枝分かれがない(C1−C2アルコキシ)C2−C5アルキル基を表す。 In the present invention, the “straight chain (C1-C2 alkoxy) C2-C5 alkyl group” represented by R 2 represents a (C1-C2 alkoxy) C2-C5 alkyl group in which the carbon chain is not branched.
本発明において、R2で示される
C1−C6直鎖アルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基及びヘキシル基が挙げられ、
(C1−C2アルコキシ)C2−C5アルキル基としては、2−メトキシエチル基、2−エトキシエチル基、3−メトキシプロピル基、3−エトキシプロピル基、4−メトキシブチル基、4−エトキシブチル基、5−メトキシペンチル基及び5−エトキシペンチル基が挙げられる。
In the present invention, examples of the C1-C6 linear alkyl group represented by R 2 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, and a hexyl group.
(C1-C2 alkoxy) As C2-C5 alkyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 3-methoxypropyl group, 3-ethoxypropyl group, 4-methoxybutyl group, 4-ethoxybutyl group, Examples include 5-methoxypentyl group and 5-ethoxypentyl group.
本発明化合物の態様としては、例えば以下のものが挙げられる。
式(I)において、R1が水素原子であるアミド化合物;
式(I)において、R1がフッ素原子であるアミド化合物;
式(I)において、R2がC1−C6直鎖アルキル基であるアミド化合物;
式(I)において、R2がメチル基、エチル基又はブチル基であるアミド化合物;
式(I)において、R2がメチル基又はエチル基であるアミド化合物;
式(I)において、R2が直鎖(C1−C2アルコキシ)C2−C5アルキル基であるアミド化合物;
式(I)において、R2が直鎖メトキシC2−C5アルキル基であるアミド化合物;
式(I)において、R2が直鎖エトキシC2−C5アルキル基であるアミド化合物;
式(I)において、R1が水素原子であり、R2がC1−C6直鎖アルキル基であるアミド化合物;
式(I)において、R1がフッ素原子であり、R2がC1−C6直鎖アルキル基であるアミド化合物;
式(I)において、R1が水素原子であり、R2がメチル基、エチル基又はブチル基であるアミド化合物;
式(I)において、R1がフッ素原子であり、R2がメチル基又はエチル基であるアミド化合物;
式(I)において、R1が水素原子であり、R2が直鎖(C1−C2アルコキシ)C2〜C5アルキル基であるアミド化合物;
式(I)において、R1がフッ素原子であり、R2が直鎖(C1−C2アルコキシ)C2〜C5アルキル基であるアミド化合物;
式(I)において、R1が水素原子であり、R2が直鎖メトキシC2−C3アルキル基であるアミド化合物;
式(I)において、R1がフッ素原子であり、R2が直鎖メトキシC2−C3アルキル基であるアミド化合物;
式(I)において、R1が水素原子であり、R2が直鎖エトキシC2−C3アルキル基であるアミド化合物;
式(I)において、R1がフッ素原子であり、R2が直鎖エトキシC2−C3アルキル基であるアミド化合物。
As an aspect of this invention compound, the following are mentioned, for example.
An amide compound in which R 1 is a hydrogen atom in formula (I);
An amide compound in which R 1 is a fluorine atom in formula (I);
An amide compound represented by formula (I), wherein R 2 is a C1-C6 linear alkyl group;
An amide compound in which R 2 is a methyl group, an ethyl group or a butyl group in formula (I);
An amide compound in which R 2 is a methyl group or an ethyl group in formula (I);
An amide compound in which R 2 is a straight-chain (C1-C2 alkoxy) C2-C5 alkyl group in formula (I);
An amide compound represented by formula (I), wherein R 2 is a linear methoxy C2-C5 alkyl group;
An amide compound represented by formula (I), wherein R 2 is a linear ethoxy C2-C5 alkyl group;
An amide compound represented by formula (I), wherein R 1 is a hydrogen atom and R 2 is a C1-C6 linear alkyl group;
An amide compound represented by formula (I), wherein R 1 is a fluorine atom and R 2 is a C1-C6 linear alkyl group;
An amide compound in which R 1 is a hydrogen atom and R 2 is a methyl group, an ethyl group or a butyl group in formula (I);
An amide compound in which R 1 is a fluorine atom and R 2 is a methyl group or an ethyl group in formula (I);
An amide compound represented by formula (I), wherein R 1 is a hydrogen atom, and R 2 is a linear (C1-C2 alkoxy) C2-C5 alkyl group;
An amide compound in which R 1 is a fluorine atom and R 2 is a linear (C1-C2 alkoxy) C2-C5 alkyl group in formula (I);
An amide compound in which R 1 is a hydrogen atom and R 2 is a linear methoxy C2-C3 alkyl group in formula (I);
An amide compound represented by formula (I), wherein R 1 is a fluorine atom and R 2 is a linear methoxy C2-C3 alkyl group;
An amide compound represented by formula (I), wherein R 1 is a hydrogen atom and R 2 is a linear ethoxy C2-C3 alkyl group;
An amide compound represented by the formula (I), wherein R 1 is a fluorine atom and R 2 is a linear ethoxy C2-C3 alkyl group.
本発明化合物の製造法について説明する。
本発明化合物は、例えば以下の(製造法1)〜(製造法3)により製造することができる。
The manufacturing method of this invention compound is demonstrated.
The compound of the present invention can be produced, for example, by the following (Production Method 1) to (Production Method 3).
(製造法1)
本発明化合物は、化合物(III)又はその塩(例えば、塩酸塩及び臭化水素酸塩が挙げられる。)と化合物(IV)とを、脱水縮合剤の存在下に反応させることにより製造することができる。
〔式中、R1及びR2は前記と同じ意味を表す。〕
該反応は、通常溶媒の存在下で行われる。
該反応に用いられる溶媒としては、例えばテトラヒドロフラン(以下、THFと記す。)、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル(以下、MTBEと記す。)等のエーテル類、ヘキサン、へプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸ブチル、酢酸エチル等のエステル類、アセトニトリル等のニトリル類、N,N−ジメチルホルムアミド(以下、DMFと記す。)等の酸アミド類、ジメチルスルホキシド(以下、DMSOと記す。)等のスルホキシド類、ピリジン等の含窒素芳香族化合物類等及びこれらの混合物が挙げられる。
該反応に用いられる脱水縮合剤としては、例えば1−エチル−3−(3−ジメチルアミノプロピル)カルボジイミド塩酸塩(以下、WSCと記す。)、1,3−ジシクロヘキシルカルボジイミド等のカルボジイミド類、及び(ベンゾトリアゾール−1−イルオキシ)トリス(ジメチルアミノ)ホスホニウムヘキサフルオロホスフェート(以下、BOP試薬と記す。)が挙げられる。
該反応では化合物(III)1モルに対して化合物(IV)が通常0.5〜3モルの割合、化合物(III)1モルに対して脱水縮合剤が通常1〜5モルの割合で用いられる。
該反応の反応温度は、通常−20℃〜140℃の範囲である。該反応の反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物に水を加えた際、固体が析出した場合は、濾過することにより本発明化合物を単離することができる。反応混合物に水を加えた際に固体が析出しない場合は、反応混合物と水との混合物を有機溶媒で抽出し、有機層を乾燥、濃縮することにより、本発明化合物を単離することができる。単離された本発明化合物は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production method 1)
The compound of the present invention is produced by reacting compound (III) or a salt thereof (for example, hydrochloride and hydrobromide) with compound (IV) in the presence of a dehydration condensing agent. Can do.
[Wherein, R 1 and R 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as tetrahydrofuran (hereinafter referred to as THF), ethylene glycol dimethyl ether, tert-butyl methyl ether (hereinafter referred to as MTBE), hexane, heptane, octane and the like. Aliphatic hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as chlorobenzene, esters such as butyl acetate and ethyl acetate, nitriles such as acetonitrile, N, N-dimethylformamide (hereinafter, And acid amides such as dimethyl sulfoxide (hereinafter referred to as DMSO), nitrogen-containing aromatic compounds such as pyridine, and the like, and mixtures thereof.
Examples of the dehydrating condensing agent used in the reaction include carbodiimides such as 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride (hereinafter referred to as WSC), 1,3-dicyclohexylcarbodiimide, and ( Benzotriazol-1-yloxy) tris (dimethylamino) phosphonium hexafluorophosphate (hereinafter referred to as BOP reagent).
In this reaction, compound (IV) is usually used in a proportion of 0.5 to 3 mol per 1 mol of compound (III), and a dehydrating condensing agent is usually used in a proportion of 1 to 5 mol per 1 mol of compound (III). .
The reaction temperature of the reaction is usually in the range of -20 ° C to 140 ° C. The reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, when water is added to the reaction mixture, if a solid is precipitated, the compound of the present invention can be isolated by filtration. When solid does not precipitate when water is added to the reaction mixture, the compound of the present invention can be isolated by extracting the mixture of the reaction mixture and water with an organic solvent, and drying and concentrating the organic layer. . The isolated compound of the present invention can be further purified by chromatography, recrystallization and the like.
(製造法2)
本発明化合物は、化合物(III)又はその塩(例えば、塩酸塩及び臭化水素酸塩が挙げられる。)と化合物(V)とを、塩基の存在下に反応させることにより製造することができる。
〔式中、R1及びR2は前記と同じ意味を表す。〕
該反応は、通常溶媒の存在下で行われる。
該反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、MTBE等のエーテル類、ヘキサン、へプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸ブチル、酢酸エチル等のエステル類、アセトニトリル等のニトリル類及びこれらの混合物が挙げられる。
該反応に用いられる塩基としては、例えば炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩類、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類及びピリジン、4−ジメチルアミノピリジン等の含窒素芳香族化合物類が挙げられる。
該反応では化合物(V)1モルに対して化合物(III)が通常0.5〜3モルの割合、化合物(V)1モルに対して塩基が通常1〜5モルの割合で用いられる。
該反応の反応温度は通常−20〜100℃の範囲である。該反応の反応時間は通常0.1〜24時間の範囲である。
反応終了後は、反応混合物に水を加えた際に固体が析出した場合は、濾過することにより本発明化合物を単離することができる。反応混合物に固体が析出しない場合は、反応混合物と水との混合物を有機溶媒で抽出し、有機層を乾燥、濃縮することにより、本発明化合物を単離することができる。単離された本発明化合物を、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production method 2)
The compound of the present invention can be produced by reacting compound (III) or a salt thereof (for example, hydrochloride and hydrobromide) with compound (V) in the presence of a base. .
[Wherein, R 1 and R 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, and MTBE, aliphatic hydrocarbons such as hexane, heptane, and octane, aromatic hydrocarbons such as toluene and xylene, and chlorobenzene. Examples thereof include halogenated hydrocarbons, esters such as butyl acetate and ethyl acetate, nitriles such as acetonitrile, and mixtures thereof.
Examples of the base used in the reaction include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine. Can be mentioned.
In the reaction, compound (III) is usually used in a proportion of 0.5 to 3 mol per mol of compound (V), and base is usually used in a proportion of 1 to 5 mol per mol of compound (V).
The reaction temperature is usually in the range of -20 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, when a solid is precipitated when water is added to the reaction mixture, the compound of the present invention can be isolated by filtration. When a solid does not precipitate in the reaction mixture, the compound of the present invention can be isolated by extracting the mixture of the reaction mixture and water with an organic solvent, drying and concentrating the organic layer. The isolated compound of the present invention can be further purified by chromatography, recrystallization and the like.
(製造法3)
本発明化合物は、本アミド化合物と化合物(VI)とを塩基の存在下に反応させることにより製造することができる。
〔式中、R1及びR2は前記と同じ意味を表し、Lは塩素原子、臭素原子、ヨウ素原子、メタンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基又はp−トルエンスルホニルオキシ基を表す。〕
該反応は、通常溶媒の存在下で行われる。
該反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、MTBE等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、DMF等の酸アミド類、DMSO等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、水及びこれらの混合物が挙げられる。
該反応に用いられる塩基としては、例えば炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩類、水酸化ナトリウム等のアルカリ金属水酸化物類及び水素化ナトリウム等のアルカリ金属水素化物類が挙げられる。
該反応では化合物(II)1モルに対して化合物(VI)が通常1〜10モルの割合、化合物(II)1モルに対して塩基が通常1〜5モルの割合で用いられる。
該反応の反応温度は通常−20〜100℃の範囲である。該反応の反応時間は通常0.1〜24時間の範囲である。
反応終了後は、反応混合物に水を加えた際に、固体が析出した場合は、濾過することにより本発明化合物を単離することができる。反応混合物に水を加えた際に固体が析出しない場合は、反応混合物と水との混合物を有機溶媒で抽出し、有機層を乾燥、濃縮することにより、本発明化合物を単離することができる。単離された本発明化合物を、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production method 3)
The compound of the present invention can be produced by reacting the present amide compound and compound (VI) in the presence of a base.
[Wherein R 1 and R 2 represent the same meaning as described above, and L represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group, or a p-toluenesulfonyloxy group. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, and MTBE, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as chlorobenzene, nitriles such as acetonitrile, DMF, and the like. Acid amides, sulfoxides such as DMSO, ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone, water, and mixtures thereof.
Examples of the base used in the reaction include alkali metal carbonates such as sodium carbonate, potassium carbonate and cesium carbonate, alkali metal hydroxides such as sodium hydroxide, and alkali metal hydrides such as sodium hydride. .
In the reaction, compound (VI) is usually used in a proportion of 1 to 10 mol per mol of compound (II), and base is usually used in a proportion of 1 to 5 mol per mol of compound (II).
The reaction temperature is usually in the range of -20 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, when a solid is precipitated when water is added to the reaction mixture, the compound of the present invention can be isolated by filtration. When solid does not precipitate when water is added to the reaction mixture, the compound of the present invention can be isolated by extracting the mixture of the reaction mixture and water with an organic solvent, and drying and concentrating the organic layer. . The isolated compound of the present invention can be further purified by chromatography, recrystallization and the like.
次に本アミド化合物の製造について合成例に示す。 Next, the production of the present amide compound is shown in the synthesis examples.
(合成例)
本アミド化合物は化合物(VII)の保護基を脱保護することにより製造することができる。
〔式中、R1は前記と同じ意味を表し、Zはtert−ブチルジメチルシリル基、メチル基、メトキシメチル基、ベンジル基、アセチル基等の保護基を表す。〕
Zがtert−ブチルジメチルシリル基の場合、該反応は、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、MTBE等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、DMF等の酸アミド類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、水及びこれらの混合物が挙げられる。
脱保護反応に用いられる塩基やフッ化物としては、水酸化リチウム、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物類、フッ化ナトリウム、フッ化テトラブチルアンモニウム、フッ化水素酸等のフッ素化合物が挙げられる。
化合物(VII)1モルに対して、塩基やフッ化物が通常1〜10モルの割合で用いられる。
該反応の反応温度は通常−20〜100℃の範囲であり、反応時間は通常0.1〜24時間の範囲である。
反応終了後は、反応混合物に水を加え、これをMTBE、ヘキサン等の有機溶媒で洗浄することにより得られる水層に、塩酸、酢酸等の酸を加えて酸性とした後、有機溶媒抽出、濃縮等の後処理を行うことにより、本アミド化合物を単離することができる。単離された本アミド化合物はクロマトグラフィー、再結晶等によりさらに精製することもできる。
(Synthesis example)
This amide compound can be manufactured by deprotecting the protecting group of compound (VII).
[Wherein, R 1 represents the same meaning as described above, and Z represents a protecting group such as a tert-butyldimethylsilyl group, a methyl group, a methoxymethyl group, a benzyl group, or an acetyl group. ]
When Z is a tert-butyldimethylsilyl group, the reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, and MTBE, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as chlorobenzene, nitriles such as acetonitrile, and DMF. Examples thereof include acid amides, sulfoxides such as dimethyl sulfoxide, ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone, water, and mixtures thereof.
Examples of bases and fluorides used in the deprotection reaction include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide and potassium hydroxide, fluorine such as sodium fluoride, tetrabutylammonium fluoride and hydrofluoric acid. Compounds.
The base or fluoride is usually used at a ratio of 1 to 10 moles with respect to 1 mole of the compound (VII).
The reaction temperature of the reaction is usually in the range of -20 to 100 ° C, and the reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, water is added to the reaction mixture, and the resulting aqueous layer is washed with an organic solvent such as MTBE and hexane, acidified with an acid such as hydrochloric acid and acetic acid, extracted with an organic solvent, The amide compound can be isolated by post-treatment such as concentration. The isolated present amide compound can be further purified by chromatography, recrystallization and the like.
本発明化合物としては、具体的には、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−メトキシフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−エトキシ−2−フルオロフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−プロポキシフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−ブトキシ−2−フルオロフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ペンチルオキシフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヘキシルオキシフェニル)アセトアミド、
N−ベンゾチアゾール−6−イル−2−(3−メトキシフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−エトキシフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−プロポキシフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−ブトキシフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−ペンチルオキシフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−ヘキシルオキシフェニル)アセトアミド、
N−ベンゾチアゾール−6−イル−2−(3−(2−メトキシエトキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(2−エトキシエトキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(3−メトキシプロポキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(3−エトキシプロポキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(4−メトキシブトキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(4−エトキシブトキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(5−メトキシペンチルオキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(5−エトキシペンチルオキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(2−メトキシエトキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(2−エトキシエトキシ)−2−フルオロフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(3−メトキシプロポキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(3−エトキシプロポキシ)−2−フルオロフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(4−メトキシブトキシ)フェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(3−(4−エトキシブトキシ)−2−フルオロフェニル)アセトアミド、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(5−メトキシペンチルオキシ)フェニル)アセトアミド及びN−ベンゾチアゾール−6−イル−2−(3−(5−エトキシペンチルオキシ)−2−フルオロフェニル)アセトアミドが挙げられる。
Specific examples of the compound of the present invention include N-benzothiazol-6-yl-2- (2-fluoro-3-methoxyphenyl) acetamide, N-benzothiazol-6-yl-2- (3-ethoxy- 2-Fluorophenyl) acetamide, N-benzothiazol-6-yl-2- (2-fluoro-3-propoxyphenyl) acetamide, N-benzothiazol-6-yl-2- (3-butoxy-2-fluorophenyl) ) Acetamide, N-benzothiazol-6-yl-2- (2-fluoro-3-pentyloxyphenyl) acetamide, N-benzothiazol-6-yl-2- (2-fluoro-3-hexyloxyphenyl) acetamide ,
N-benzothiazol-6-yl-2- (3-methoxyphenyl) acetamide, N-benzothiazol-6-yl-2- (3-ethoxyphenyl) acetamide, N-benzothiazol-6-yl-2- ( 3-propoxyphenyl) acetamide, N-benzothiazol-6-yl-2- (3-butoxyphenyl) acetamide, N-benzothiazol-6-yl-2- (3-pentyloxyphenyl) acetamide, N-benzothiazole -6-yl-2- (3-hexyloxyphenyl) acetamide,
N-benzothiazol-6-yl-2- (3- (2-methoxyethoxy) phenyl) acetamide, N-benzothiazol-6-yl-2- (3- (2-ethoxyethoxy) phenyl) acetamide, N- Benzothiazol-6-yl-2- (3- (3-methoxypropoxy) phenyl) acetamide, N-benzothiazol-6-yl-2- (3- (3-ethoxypropoxy) phenyl) acetamide, N-benzothiazole -6-yl-2- (3- (4-methoxybutoxy) phenyl) acetamide, N-benzothiazol-6-yl-2- (3- (4-ethoxybutoxy) phenyl) acetamide, N-benzothiazole-6 -Yl-2- (3- (5-methoxypentyloxy) phenyl) acetamide, N-benzothiazole-6- Ru-2- (3- (5-ethoxypentyloxy) phenyl) acetamide, N-benzothiazol-6-yl-2- (2-fluoro-3- (2-methoxyethoxy) phenyl) acetamide, N-benzothiazole -6-yl-2- (3- (2-ethoxyethoxy) -2-fluorophenyl) acetamide, N-benzothiazol-6-yl-2- (2-fluoro-3- (3-methoxypropoxy) phenyl) Acetamide, N-benzothiazol-6-yl-2- (3- (3-ethoxypropoxy) -2-fluorophenyl) acetamide, N-benzothiazol-6-yl-2- (2-fluoro-3- (4 -Methoxybutoxy) phenyl) acetamide, N-benzothiazol-6-yl-2- (3- (4-ethoxybutoxy) -2- Fluorophenyl) acetamide, N-benzothiazol-6-yl-2- (2-fluoro-3- (5-methoxypentyloxy) phenyl) acetamide and N-benzothiazol-6-yl-2- (3- (5- And ethoxypentyloxy) -2-fluorophenyl) acetamide.
本発明防除剤は、本発明化合物と不活性担体とを含有する。不活性担体としては、固体担体、液体担体及びガス担体が挙げられる。本発明防除剤は、通常さらに界面活性剤、固着剤、分散剤、安定剤等の製剤用補助剤が加えられ、水和剤、顆粒水和剤、フロアブル剤、粒剤、ドライフロアブル剤、乳剤、水性液剤、油剤、くん煙剤、エアゾール剤、マイクロカプセル剤等に製剤化されている。本発明防除剤には本発明化合物が重量比で通常0.1〜99%、好ましくは0.2〜90%含有される。 The control agent of the present invention contains the compound of the present invention and an inert carrier. Examples of the inert carrier include a solid carrier, a liquid carrier, and a gas carrier. The control agent of the present invention is usually further added with auxiliary agents for formulation such as surfactant, fixing agent, dispersant, stabilizer, etc., and wettable powder, wettable powder, flowable powder, granule, dry flowable powder, emulsion. It is formulated into aqueous liquids, oils, smokes, aerosols, microcapsules and the like. The present control agent contains the present compound in a weight ratio of usually 0.1 to 99%, preferably 0.2 to 90%.
固体担体としては、例えば、粘土類(例えば、カオリン、珪藻土、合成含水酸化珪素、フバサミクレー、ベントナイト、酸性白土)、タルク類、その他の無機鉱物(例えば、セリサイト、石英粉末、硫黄粉末、活性炭、炭酸カルシウム、水和シリカ)等の微粉末あるいは粒状物が挙げられ、液体担体としては、例えば、水、アルコール類(例えば、メタノール、エタノール)、ケトン類(例えば、アセトン、メチルエチルケトン)、芳香族炭化水素類(例えば、ベンゼン、トルエン、キシレン、エチルベンゼン、メチルナフタレン)、脂肪族炭化水素類(例えば、n−ヘキサン、シクロヘキサン、灯油)、エステル類(例えば、酢酸エチル、酢酸ブチル)、ニトリル類(例えば、アセトニトリル、イソブチルニトリル)、エーテル類(例えば、ジオキサン、ジイソプロピルエーテル)、酸アミド類(例えば、DMF、ジメチルアセトアミド)、ハロゲン化炭化水素類(例えば、ジクロロエタン、トリクロロエチレン、四塩化炭素)等が挙げられる。 Examples of the solid carrier include clays (for example, kaolin, diatomaceous earth, synthetic hydrous silicon oxide, fusami clay, bentonite, acidic clay), talc, and other inorganic minerals (for example, sericite, quartz powder, sulfur powder, activated carbon, Examples of the liquid carrier include water, alcohols (for example, methanol, ethanol), ketones (for example, acetone, methyl ethyl ketone), aromatic carbonization, and the like. Hydrogens (eg, benzene, toluene, xylene, ethylbenzene, methylnaphthalene), aliphatic hydrocarbons (eg, n-hexane, cyclohexane, kerosene), esters (eg, ethyl acetate, butyl acetate), nitriles (eg, , Acetonitrile, isobutylnitrile), ethers (eg Dioxane, diisopropyl ether), acid amides (e.g., DMF, dimethylacetamide), halogenated hydrocarbons (e.g., dichloroethane, trichlorethylene, and carbon tetrachloride), and the like.
界面活性剤としては、例えばアルキル硫酸エステル類、アルキルスルホン酸塩、アルキルアリールスルホン酸塩、アルキルアリールエーテル類及びそのポリオキシエチレン化物、ポリオキシエチレングリコールエーテル類、多価アルコールエステル類、糖アルコール誘導体等が挙げられる。 Examples of the surfactant include alkyl sulfates, alkyl sulfonates, alkyl aryl sulfonates, alkyl aryl ethers and polyoxyethylene compounds thereof, polyoxyethylene glycol ethers, polyhydric alcohol esters, sugar alcohol derivatives. Etc.
その他の製剤用補助剤としては、例えば固着剤や分散剤、具体的にはカゼイン、ゼラチン、多糖類(例えば、デンプン、アラビヤガム、セルロース誘導体、アルギン酸)、リグニン誘導体、ベントナイト、糖類、合成水溶性高分子(例えば、ポリビニルアルコール、ポリビニルピロリドン、ポリアクリル酸類)、PAP(酸性りん酸イソプロピル)、BHT(2,6−ジ−tert−ブチル−4−メチルフェノール)、BHA(2−tert−ブチル−4−メトキシフェノールと3−tert−ブチル−4−メトキシフェノールとの混合物)、植物油、鉱物油、脂肪酸又はそのエステル等が挙げられる。 Other formulation adjuvants include, for example, fixing agents and dispersants, specifically casein, gelatin, polysaccharides (eg starch, arabic gum, cellulose derivatives, alginic acid), lignin derivatives, bentonite, saccharides, synthetic water-soluble high Molecules (for example, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylic acids), PAP (isopropyl acid phosphate), BHT (2,6-di-tert-butyl-4-methylphenol), BHA (2-tert-butyl-4) -Mixtures of methoxyphenol and 3-tert-butyl-4-methoxyphenol), vegetable oils, mineral oils, fatty acids or esters thereof.
植物病害を防除するための本発明防除剤の使用方法としては、例えば茎葉散布等の植物体への処理、土壌処理等の植物の栽培地への処理及び種子消毒等の種子への処理が挙げられる。 Examples of the method of using the control agent of the present invention for controlling plant diseases include treatment of plant bodies such as foliage spraying, treatment of plant cultivation sites such as soil treatment, and treatment of seeds such as seed disinfection. It is done.
また、本発明防除剤を他の殺菌剤、殺虫剤、殺ダニ剤、殺線虫剤、除草剤、植物生長調節剤、肥料または土壌改良剤と混合して、または混合せずに同時に用いることもできる。
かかる他の殺菌剤としては、例えば、プロピコナゾール(propiconazole)、プロチオコナゾール(prothioconazole)、トリアジメノール(triadimenol)、プロクロラズ(prochloraz)、ペンコナゾール(penconazole)、テブコナゾール(tebuconazole)、フルシラゾール(flusilazole)、ジニコナゾール(diniconazole)、ブロムコナゾール(bromuconazole)、エポキシコナゾール(epoxiconazole)、ジフェノコナゾール(difenoconazole)、シプロコナゾール(cyproconazole)、メトコナゾール(metconazole)、トリフルミゾール(triflumizole)、テトラコナゾール(tetraconazole)、マイクロブタニル(microbutanil)、フェンブコナゾール(fenbuconazole)、ヘキサコナゾール(hexaconazole)、フルキンコナゾール(fluquinconazole)、トリティコナゾール(triticonazole)、ビテルタノール(bitertanol)、イマザリル(imazalil)、フルトリアホール(flutriafol)、シメコナゾール(simeconazole)、イプコナゾール(ipconazole)等のアゾール系殺菌化合物;フェンプロピモルフ(fenpropimorph)、トリデモルフ(tridemorph)、フェンプロピジン(fenpropidin)等の環状アミン系殺菌化合物;カルベンダジム(carbendazim)、ベノミル(benomyl)、チアベンダゾール(thiabendazole)、チオファネートメチル(thiophanate-methyl)等のベンズイミダゾール系殺菌化合物;プロシミドン(procymidone);シプロディニル(cyprodinil);ピリメタニル(pyrimethanil);ジエトフェンカルブ(diethofencarb);チウラム(thiuram);フルアジナム(fluazinam);マンコゼブ(mancozeb);イプロジオン(mancozeb);ビンクロゾリン(vinclozolin);クロロタロニル(chlorothalonil);キャプタン(captan);メパニピリム(mepanipyrim);フェンピクロニル(fenpiclonil);フルジオキソニル(fludioxonil);ジクロフルアニド(dichlofluanid);フォルペット(folpet);クレソキシムメチル(kresoxim-methyl);アゾキシストロビン(azoxystrobin);トリフロキシストロビン(trifloxystrobin);フルオキサストロビン(fluoxastrobin);ピコキシストロビン(picoxystrobin);ピラクロストロビン(pyraclostrobin);ジモキシストロビン(dimoxystrobin);ピリベンカルブ(pyribencarb);メトミノストロビン(metominostrobin);エネストロビン(enestroburin);スピロキサミン(spiroxamine);キノキシフェン(quinoxyfen);フェンヘキサミド(fenhexamid);ファモキサドン(famoxadone);フェナミドン(fenamidone);ゾキサミド(zoxamide);エタボキサム(etaboxam);アミスルブロム(amisulbrom);イプロヴァリカルブ(iprovalicarb);ベンチアバリカルブ(benthiavalicarb);シアゾファミド(cyazofamid);マンジプロパミド(mandipropamid);ボスカリド(boscalid);ペンチオピラド(penthiopyrad);メトラフェノン(metrafenone);フルオピラン(fluopyram);ビキサフェン(bixafen);シフルフェナミド(cyflufenamid);プロキナジド(proquinazid);オリザストロビン(orysastrobin);フラメトピル(furametpyr);チフルザミド(thifluzamide);メプロニル(mepronil);フルトラニル(flutolanil);フルスルファミド(flusulfamide);フルオピコリド(fluopicolide);メタラキシルM(metalaxyl M);キララキシル(kiralaxyl);フォセチル(fosetyl);シモキサニル(cymoxanil);ペンシクロン(pencycuron);トルクロホスメチル(tolclofos-methyl);カルプロパミド(carpropamid);ジクロシメット(diclocymet);フェノキサニル(fenoxanil);トリシクラゾール(tricyclazole);ピロキロン(pyroquilon);プロベナゾール(probenazole);イソチアニル(isotianil);チアジニル(tiadinil);テブフロキン(tebufroquin);ジクロメジン(diclomezine);カスガマイシン(kasugamycin);フェリムゾン(ferimzone);フサライド(fthalide);バリダマイシン(validamycin);ヒドロキシイソキサゾール(hydroxyisoxazole);イミノクタジン酢酸塩(iminoctadin-acetate);イソプロチオラン(isoprothiolane);オキソリニック酸(oxolinic acid);オキシテトラサイクリン(oxytetracycline);ストレプトマイシン(streptomycin)、セザキサン(sedaxane);イソピラザム(isopyrazam); BYF-14182; フルチアニル(flutianil);塩基性塩化銅(basic copper chloride);水酸化第二銅(cupric hydroxide);塩基性硫酸銅(basic copper sulfate);有機銅(organic copper);硫黄(sulfur)などが挙げられる。
In addition, the present control agent may be used simultaneously with or without mixing with other fungicides, insecticides, acaricides, nematicides, herbicides, plant growth regulators, fertilizers or soil conditioners. You can also.
Such other fungicides include, for example, propiconazole, prothioconazole, triadimenol, prochloraz, penconazole, tebuconazole, flusilazole , Diniconazole, bromuconazole, epoxiconazole, difenoconazole, cyproconazole, metconazole, triflumizole, tetraconazole , Microbutanil, fenbuconazole, hexaconazole, fluquinconazole, triticonazole, bitertanol, i Azole fungicides such as imazalil, flutriafol, simeconazole, ipconazole; cyclic amines such as fenpropimorph, tridemorph, fenpropidin Bactericidal compounds; benzimidazole bactericidal compounds such as carbendazim, benomyl, thiabendazole, thiophanate-methyl; procymidone; cyprodinil; pyrimethanil; dietofencarb (Diethofencarb); thiuram; fluazinam; mancozeb; iprodione (mancozeb); vinclozolin; chlorothalonil; captan; mepa Nipipromim; fenpiclonil; fludioxonil; diclofluranid; folpet; kresoxim-methyl; azoxystrobin; trifloxystrobin Fluoxastrobin; picoxystrobin; pyraclostrobin; dimoxystrobin; pyribencarb; metminostrobin; enestroburin; spiroxamine (Spiroxamine); quinoxyfen; fenhexamid; famoxadone; fenamidone; zoxamide; etaboxam; amisulbrom; Benproviacarb; Benthiavalicarb; Cyazofamid; Mandipropamid; Boscalid; Penthiopyrad; Metrafenone; fluopyram; fluopyramix; Cyflufenamid (cyflufenamid); proquinazid (proquinazid); oryzastrobin (orysastrobin); furametpyr; furametpyr; thifluzamide; mepronil; flutolanil; flusulfamide (flusulfamide); metalaxyl M); kiralaxyl; fosetyl; cymoxanil; pencycuron; tolclofos-methyl; carpropamid Dicoxymet; phenoxanil; tricyclazole; pyroquilon; probenazole; isotianil; tiadinil; tebufroquin; tebufroquin; Ferimzone; fthalide; validamycin; hydroxyisoxazole; iminoctadin-acetate; isoprothiolane; oxolinic acid; oxytetracycline; Streptomycin, sedaxane; isopyrazam; BYF-14182; flutianil; basic copper chloride; cupric hydroxide (c upric hydroxide); basic copper sulfate; organic copper; sulfur.
かかる他の殺虫剤としては、例えば
(1)有機リン系化合物
アセフェート(acephate)、りん化アルミニウム(Aluminium phosphide)、ブタチオホス(butathiofos)、キャドサホス(cadusafos)、クロルエトキシホス(chlorethoxyfos)、クロルフェンビンホス(ch1orfenvinphos)、クロルピリホス(chlorpyrifos)、クロルピリホスメチル(chlorpyrifos-methyl)、シアノホス(cyanophos:CYAP)、ダイアジノン(diazinon)、DCIP(dichlorodiisopropyl ether)、ジクロフェンチオン(dichlofenthion:ECP)、ジクロルボス(dichlorvos:DDVP)、ジメトエート(dimethoate)、ジメチルビンホス(dimethylvinphos)、ジスルホトン(disulfoton)、EPN、エチオン(ethion)、エトプロホス(ethoprophos)、エトリムホス(etrimfos)、フェンチオン(fenthion:MPP)、フエニトロチオン(fenitrothion:MEP)、ホスチアゼート(fosthiazate)、ホルモチオン(formothion)、りん化水素(Hydrogen phosphide)、イソフェンホス(isofenphos)、イソキサチオン(isoxathion)、マラチオン(malathion)、メスルフェンホス(mesulfenfos)、メチダチオン(methidathion:DMTP)、モノクロトホス(monocrotophos)、ナレッド(naled:BRP)、オキシデプロホス(oxydeprofos:ESP)、パラチオン(parathion)、ホサロン(phosalone)、ホスメット(phosmet:PMP)、ピリミホスメチル(pirimiphos-methy1)、ピリダフェンチオン(pyridafenthion)、キナルホス(quinalphos)、フェントエート(phenthoate:PAP)、プロフェノホス(profenofos)、プロパホス(propaphos)、プロチオホス(prothiofos)、ピラクロホス(pyraclorfos)、サリチオン(salithion)、スルプロホス(sulprofos)、テブピリムホス(tebupirimfos)、テメホス(temephos)、テトラクロルビンホス(tetrach1orvinphos)、テルブホス(terbufos)、チオメトン(thiometon)、トリクロルホン(trichlorphon:DEP)、バミドチオン(vamidothion)、フォレート(phorate)、カズサホス(cadusafos)等;
(2)カーバメート系化合物
アラニカルブ(alanycarb)、ベンダイオカルブ(bendiocarb)、ベンフラカルブ(benfuracarb)、BPMC、カルバリル(carbary1)、カルボフラン(carbofuran)、カルボスルファン(carbosulfan)、クロエトカルブ(cloethocarb)、エチオフェンカルブ(ethiofencarb)、フェノブカルブ(fenobucarb)、フェノチオカルブ(fenothiocarb)、フェノキシカルブ(fenoxycarb)、フラチオカルブ(furathiocarb)、イソプロカルブ(isoprocarb:MIPC)、メトルカルブ(metolcarb)、 メソミル(methomyl)、メチオカルブ(methiocarb)、NAC、オキサミル(oxamyl)、ピリミカーブ(pirimicarb)、プロポキスル(propoxur:PHC)、XMC、チオジカルブ(thiodicarb)、 キシリルカルブ(xylylcarb)、アルジカルブ(aldicarb)等;
(3)合成ピレスロイド系化合物
アクリナトリン(acrinathrin)、アレスリン(allethrin)、ベンフルスリン(benfluthrin)、ベータ−シフルトリン(beta-cyfluthrin)、ビフェントリン(bifenthrin)、シクロプロトリン(cycloprothrin)、シフルトリン(cyfluthrin)、シハロトリン(cyhalothrin)、シペルメトリン(cypermethrin)、デルタメトリン(deltamethrin)、エスフェンバレレート(esfenvalerate)、エトフェンプロックス(ethofenprox) 、フェンプロパトリン(fenpropathrin)、フェンバレレート(fenvalerate)、フルシトリネート(flucythrinate)、フルフェンプロックス(flufenoprox)、フルメスリン(flumethrin)、フルバリネート(fluvalinate)、ハルフェンプロックス(halfenprox)、イミプロトリン(imiprothrin)、ペルメトリン(permethrin)、プラレトリン(prallethrin)、ピレトリン(pyrethrins)、レスメトリン(resmethrin)、シグマ−サイパーメスリン(sigma-cypermethrin)、シラフルオフェン(silafluofen)、テフルトリン(tefluthrin)、トラロメトリン(tralomethrin)、トランスフルトリン(transfluthrin)、テトラメトリン(tetramethrin)、フェノトリン(phenothrin)、シフェノトリン(cyphenothrin)、アルファシペルメトリン(alpha-cypermethrin)、ゼータシペルメトリン(zeta-cypermethrin)、ラムダシハロトリン(lambda-cyhalothrin)、フラメトリン(furamethrin)、タウフルバリネート(tau-fluvalinate)、2,3,5,6−テトラフルオロ−4−(メトキシメチル)ベンジル (EZ)−(1RS,3RS;1RS,3SR)−2,2−ジメチル−3−プロプ−1−エニルシクロプロパンカルボキシレート、2,3,5,6−テトラフルオロ−4−メチルベンジル (EZ)−(1RS,3RS;1RS,3SR)−2,2−ジメチル−3−プロプ−1−エニルシクロプロパンカルボキシレート、2,3,5,6−テトラフルオロ−4−(メトキシメチル)ベンジル (1RS,3RS;1RS,3SR)−2,2−ジメチル−3−(2−メチル−1−プロペニル)シクロプロパンカルボキシレート等;
(4)ネライストキシン系化合物
カルタップ(cartap)、ベンスルタップ(bensu1tap)、チオシクラム(thiocyclam)、モノスルタップ(monosultap)、ビスルタップ(bisultap)等;
(5)ネオニコチノイド系化合物
イミダクロプリド(imidac1oprid)、ニテンピラム(nitenpyram)、アセタミプリド(acetamiprid)、チアメトキサム(thiamethoxam)、チアクロプリド(thiacloprid)、ジノテフラン(dinotefuran)、クロチアニジン(clothianidin)等;
(6)ベンゾイル尿素系化合物
クロルフルアズロン(chlorfluazuron)、ビストリフルロン(bistrifluron)、ジアフェンチウロン(diafenthiuron)、ジフルベンズロン(diflubenzuron)、フルアズロン(fluazuron)、フルシクロクスロン(flucycloxuron)、フルフェノクスロン(flufenoxuron)、ヘキサフルムロン(hexaflumuron)、ルフェヌロン(lufenuron)、ノバルロン(novaluron)、ノビフルムロン(noviflumuron)、テフルベンズロン(teflubenzuron)、トリフルムロン(triflumuron)、トリアズロン等;
(7)フェニルピラゾール系化合物
アセトプロール(acetoprole)、エチプロール(ethiprole)、フィプロニル(fiproni1)、バニリプロール(vaniliprole)、ピリプロール(pyriprole)、ピラフルプロール(pyrafluprole)等;
(8)Btトキシン系殺虫剤
バチルス・チューリンゲンシス菌由来の生芽胞および産生結晶毒素、並びにそれらの混合物;
(9)ヒドラジン系化合物
クロマフェノジド(chromafenozide)、ハロフェノジド(halofenozide)、メトキシフェノジド(methoxyfenozide)、テブフェノジド(tebufenozide)等;
(10)有機塩素系化合物
アルドリン(aldrin)、ディルドリン(dieldrin)、ジエノクロル(dienochlor)、エンドスルファン(endosulfan)、メトキシクロル(methoxychlor)等;
(11)天然系殺虫剤
マシン油(machine oil)、硫酸ニコチン(nicotine-sulfate);
(12)その他の殺虫剤
アベルメクチン(avermectin-B)、ブロモプロピレート(bromopropylate)、ブプロフェジン(buprofezin)、クロルフェナピル(chlorphenapyr)、シロマジン(cyromazine)、D−D(1,3-Dichloropropene)、エマメクチンベンゾエート(emamectin-benzoate)、フェナザキン(fenazaquin)、フルピラゾホス(flupyrazofos)、ハイドロプレン(hydroprene)、メトプレン(methoprene)、インドキサカルブ(indoxacarb)、メトキサジアゾン(metoxadiazone)、ミルベマイシンA(milbemycin-A)、ピメトロジン(pymetrozine)、ピリダリル(pyridalyl)、ピリプロキシフェン(pyriproxyfen)、スピノサッド(spinosad)、スルフラミド(sulfluramid)、トルフェンピラド(tolfenpyrad)、トリアゼメイト(triazamate)、フルベンジアミド(flubendiamide)、レピメクチン(lepimectin)、亜ひ酸(Arsenic acid)、ベンクロチアズ(benclothiaz)、石灰窒素(Calcium cyanamide)、石灰硫黄合剤(Calcium polysulfide)、クロルデン(chlordane)、DDT、DSP、フルフェネリウム(flufenerim)、フロニカミド(flonicamid)、フルリムフェン(flurimfen)、ホルメタネート(formetanate)、メタム・アンモニウム(metam-ammonium)、メタム・ナトリウム(metam-sodium)、臭化メチル(Methyl bromide)、ニディノテフラン(nidinotefuran)、オレイン酸カリウム(Potassium oleate)、プロトリフェンビュート(protrifenbute)、スピロメシフェン(spiromesifen)、硫黄(Sulfur)、メタフルミゾン(metaflumizone)、スピロテトラマット(spirotetramat)、ピリフルキナゾン(pyrifluquinazone)、スピネトラム(spinetoram)、クロラントラニリプロール(chlorantraniliprole)、シアントラニリプロール(cyantraniliprole)
で示される化合物等が挙げられる。
かかる他の殺ダニ剤(殺ダニ活性成分)としては、例えばアセキノシル(acequinocyl)、アミトラズ(amitraz)、ベンゾキシメート(benzoximate)、ビフェナゼート(bifenaate)、フェニソブロモレート(bromopropylate)、キノメチオネート(chinomethionat)、クロルベンジレート(chlorobenzilate)、CPCBS(chlorfenson)、クロフェンテジン(clofentezine)、シフルメトフェン(cyflumetofen)、ケルセン(ジコホル:dicofol)、エトキサゾール(etoxazole)、酸化フェンブタスズ(fenbutatin oxide)、フェノチオカルブ(fenothiocarb)、フェンピロキシメート(fenpyroximate)、フルアクリピリム(fluacrypyrim)、フルプロキシフェン(fluproxyfen)、ヘキシチアゾクス(hexythiazox)、プロパルギット(propargite:BPPS)、ポリナクチン複合体(polynactins)、ピリダベン(pyridaben)、ピリミジフェン(Pyrimidifen)、テブフェンピラド(tebufenpyrad)、テトラジホン(tetradifon)、スピロディクロフェン(spirodiclofen)、スピロメシフェン(spiromesifen)、スピロテトラマット(spirotetramat)、アミドフルメット(amidoflumet)、シエノピラフェン(cyenopyrafen)等が挙げられる。
かかる他の殺線虫剤(殺線虫活性成分)としては、例えば、DCIP、フォスチアゼート(fosthiazate)、塩酸レバミゾール(levamisol)、メチルイソチオシアネート(methyisothiocyanate)、酒石酸モランテル(morantel tartarate)、イミシアホス(imicyafos)等が挙げられる。
Examples of such other insecticides include (1) organophosphorus compounds such as acephate, aluminum phosphide, butathiofos, cadusafos, chlorethoxyfos, chlorfenvinphos. (Ch1orfenvinphos), chlorpyrifos (chlorpyrifos), chlorpyrifos-methyl, cyanophos (CYAP), diazinon (diazinon), DCIP (dichlorodiisopropyl ether), dichlorfenthion (ECP), dichlorvos (DDVP), dimethophos (Dimethoate), dimethylvinphos, disulfoton, EPN, ethion, ethoprophos, etrimfos, fenthion (MPP), fenitrothion (MEP), phosti Azate (fosthiazate), formothion, hydrogen phosphide, isofenphos, isoxathion, malathion, mesulfenfos, methidathion (DMTP), monocrotophos (monocrotophos) , Naled (BRP), oxydeprofos (ESP), parathion, parathion, phosalone, phosmet (PMP), pyrimiphos-methy1, pyridafenthion, quinalphos , Phenthoate (PAP), profenofos, propaphos, prothiofos, pyraclorfos, salithion, sulprofos, tebupirimfos, temepho s), tetrach1orvinphos, terbufos, thiometon, trichlorphon (DEP), bamidomion, phorate, cadusafos, etc .;
(2) Carbamate compounds alaniccarb, bendiocarb, benfuracarb, BPMC, carbaryl, carbfuran, carbosulfan, cloethocarb, ethiofencarb ), Fenobucarb, fenothiocarb, fenoxycarb, furathiocarb, isoprocarb (MIPC), metolcarb, metomyl, methiocarb, NAC, oxamyl (amyl) ), Pirimicarb, propoxur (PHC), XMC, thiodicarb, xylylcarb, aldicarb, etc .;
(3) Synthetic pyrethroid compounds acrinathrin, allethrin, benfluthrin, beta-cyfluthrin, bifenthrin, cycloprothrin, cyfluthrin, cyhalothrin (cyfluthrin) cyhalothrin), cypermethrin, deltamethrin, esfenvalerate, ethofenprox, fenpropathrin, fenvalerate, flucythrinate, flufenthrinate Prox (flufenoprox), flumethrin, fluvalinate, halfenprox (halfenprox), imiprothrin, permethrin, praretrin (pi) Threin (pyrethrins), resmethrin, sigma-cypermethrin, silafluofen, tefluthrin, tralomethrin, transfluthrin, tetramethrin, othrin , Cyphenothrin, alpha-cypermethrin, zeta-cypermethrin, lambda-cyhalothrin, furamethrin, tau-fluvalinate, 2 , 3,5,6-tetrafluoro-4- (methoxymethyl) benzyl (EZ)-(1RS, 3RS; 1RS, 3SR) -2,2-dimethyl-3-prop-1-enylcyclopropanecarboxylate, 2 , 3,5,6-tetrafluoro-4- Tylbenzyl (EZ)-(1RS, 3RS; 1RS, 3SR) -2,2-dimethyl-3-prop-1-enylcyclopropanecarboxylate, 2,3,5,6-tetrafluoro-4- (methoxymethyl) Benzyl (1RS, 3RS; 1RS, 3SR) -2,2-dimethyl-3- (2-methyl-1-propenyl) cyclopropanecarboxylate and the like;
(4) Nereistoxin compounds Cartap, bensult (bensu1tap), thiocyclam, monosultap, bisultap, etc .;
(5) Neonicotinoid compounds imidacloprid (imidac1oprid), nitenpyram (nitenpyram), acetamiprid (acetamiprid), thiamethoxam (thiamethoxam), thiacloprid, dinotefuran, clothianidin, etc .;
(6) Benzoylurea compounds Chlorfluazuron, bistrifluron, diafenthiuron, diflubenzuron, fluazuron, flucycloxuron, flufenoc Flufenoxuron, hexaflumuron, lufenuron, novaluron, noviflumuron, teflubenzuron, triflumuron, triazuron, etc .;
(7) Phenylpyrazole compounds Acetoprole, ethiprole, fipronil, vaniliprole, pyriprole, pyrafluprole, etc .;
(8) Bt toxin insecticide, live spores and produced crystal toxins derived from Bacillus thuringiensis, and mixtures thereof;
(9) Hydrazine compounds Chromafenozide, halofenozide, methoxyfenozide, tebufenozide and the like;
(10) Organochlorine compounds Aldrin, dieldrin, dienochlor, endosulfan, methoxychlor, etc .;
(11) Natural insecticide machine oil, nicotine-sulfate;
(12) Other insecticides avermectin-B, bromopropylate, buprofezin, chlorphenapyr, cyromazine, DD (1,3-Dichloropropene), emamectin benzoate ( emamectin-benzoate, fenazaquin, flupyrazofos, hydroprene, metoprene, indoxacarb, metoxadiazone, milbemycin-A, pymetrozine , Pyridalyl, pyriproxyfen, spinosad, sulfluramid, tolfenpyrad, triazamate, flubendiamide, lepimectin, subpimectin Arsenic acid, Benclothiaz, Calcium cyanamide, Calcium polysulfide, chlordane, DDT, DSP, flufenerim, flonicamid, flonicamid (Flurimfen), formetanate, metam-ammonium, metam-sodium, methyl bromide, nidinotefuran, potassium oleate, prototri Fenbute, spiromesifen, sulfur, metaflumizone, spirotetramat, pyrifluquinazone, spinetram, chlorantraniliprole, cyan Traniliprol cyantraniliprole)
And the like.
Examples of such other acaricides (acaricidal active ingredients) include, for example, acequinocyl, amitraz, benzoximate, bifenaate, phenisobromolate, quinomethionat , Chlorobenzilate, CPCBS (chlorfenson), clofentezine, cyflumetofen, kelofol, etoxazole, fenbutatin oxide, fenothiocarb, fenpyroxycarb (Fenpyroximate), fluacrypyrim, fluproxyfen, hexythiazox, propargite (BPPS), polynactins, polynactins, pyridaben, Pyrimidifen, tebufenpyrad, tetradifon, spirodiclofen, spiromesifen, spirotetramat, amidoflumet, cyenopyrafen, etc. It is done.
Examples of such other nematicides (nematicidal active ingredients) include, for example, DCIP, fosthiazate, levamisol hydrochloride, methamiisothiocyanate, morantel tartarate, imicyafos Etc.
本発明防除方法は、本発明化合物の有効量を植物又は土壌に処理する工程を有する。本発明防除方法は、通常本発明防除剤を植物又は土壌に処理することで行われる。
本発明防除剤を本発明防除方法に使用する際の量は、気象条件、製剤形態、施用時期、施用方法、施用場所、対象病害、対象作物等によっても異なるが、本発明防除剤中の本発明化合物量で1000m2あたり、通常1〜500g、好ましくは2〜200gである。乳剤、水和剤、懸濁剤等は通常水で希釈して施用されるが、その場合の希釈後の本発明化合物濃度は、通常0.0005〜2重量%、好ましくは0.005〜1重量%であり、粉剤、粒剤等は通常希釈することなくそのまま施用される。種子への処理においては、本発明防除剤中の本発明化合物量で、種子1Kgに対して通常0.001〜100g、好ましくは0.01〜50gの範囲で施用される。
The control method of the present invention includes a step of treating an effective amount of the compound of the present invention with a plant or soil. This invention control method is normally performed by processing this invention control agent to a plant or soil.
The amount of the present control agent used in the present control method varies depending on weather conditions, formulation form, application time, application method, application location, target disease, target crop, etc. The amount of the invention compound is usually 1 to 500 g, preferably 2 to 200 g per 1000 m 2 . Emulsions, wettable powders, suspensions and the like are usually diluted with water and applied. In this case, the concentration of the compound of the present invention after dilution is usually 0.0005 to 2% by weight, preferably 0.005 to 1. The powder, granules and the like are usually applied as they are without dilution. In the treatment of seeds, the amount of the compound of the present invention in the control agent of the present invention is usually 0.001 to 100 g, preferably 0.01 to 50 g, per 1 kg of seed.
本発明防除剤は、畑、水田、芝生、果樹園等の農耕地における植物病害の防除剤として使用することができる。本発明防除剤は、以下に挙げられる「作物」等を栽培する農耕地等において、当該農耕地の病害を防除することができる。 The control agent of the present invention can be used as a plant disease control agent in agricultural land such as fields, paddy fields, lawns, orchards. The control agent of the present invention can control diseases of the farmland in the farmland where the following “crop” and the like are cultivated.
農作物;トウモロコシ、イネ、コムギ、オオムギ、ライムギ、エンバク、ソルガム、ワタ、ダイズ、ピーナッツ、ソバ、テンサイ、ナタネ、ヒマワリ、サトウキビ、タバコ等、野菜;ナス科野菜(ナス、トマト、ピーマン、トウガラシ、ジャガイモ等)、ウリ科野菜(キュウリ、カボチャ、ズッキーニ、スイカ、メロン等)、アブラナ科野菜(ダイコン、カブ、セイヨウワサビ、コールラビ、ハクサイ、キャベツ、カラシナ、ブロッコリー、カリフラワー等)、キク科野菜(ゴボウ、シュンギク、アーティチョーク、レタス等)、ユリ科野菜(ネギ、タマネギ、ニンニク、アスパラガス)、セリ科野菜(ニンジン、パセリ、セロリ、アメリカボウフウ等)、アカザ科野菜(ホウレンソウ、フダンソウ等)、シソ科野菜(シソ、ミント、バジル等)、イチゴ、サツマイモ、ヤマノイモ、サトイモ等、
花卉、
観葉植物、
果樹;仁果類(リンゴ、セイヨウナシ、ニホンナシ、カリン、マルメロ等)、核果類(モモ、スモモ、ネクタリン、ウメ、オウトウ、アンズ、プルーン等)、カンキツ類(ウンシュウミカン、オレンジ、レモン、ライム、グレープフルーツ等)、堅果類(クリ、クルミ、ハシバミ、アーモンド、ピスタチオ、カシューナッツ、マカダミアナッツ等)、液果類(ブルーベリー、クランベリー、ブラックベリー、ラズベリー等)、ブドウ、カキ、オリーブ、ビワ、バナナ、コーヒー、ナツメヤシ、ココヤシ等、
果樹以外の樹;チャ、クワ、花木、街路樹(トネリコ、カバノキ、ハナミズキ、ユーカリ、イチョウ、ライラック、カエデ、カシ、ポプラ、ハナズオウ、フウ、プラタナス、ケヤキ、クロベ、モミノキ、ツガ、ネズ、マツ、トウヒ、イチイ)等。
Agricultural crops: corn, rice, wheat, barley, rye, oats, sorghum, cotton, soybeans, peanuts, buckwheat, sugar beet, rapeseed, sunflower, sugarcane, tobacco, vegetables, solanaceous vegetables (eggplant, tomato, pepper, pepper, potato Cucumber, pumpkin, zucchini, watermelon, melon, etc., cruciferous vegetables (radish, turnip, horseradish, kohlrabi, cabbage, cabbage, mustard, broccoli, cauliflower, etc.), asteraceae (burdock, Shungiku, artichokes, lettuce, etc.), liliaceae vegetables (leek, onion, garlic, asparagus), celeryaceae vegetables (carrot, parsley, celery, red pepper, etc.), red crustacean vegetables (spinach, chard, etc.) (Perilla, mint, basil ), Strawberry, sweet potato, yam, taro, etc.,
Bridegroom,
Foliage plant,
Fruit trees; pears (apples, pears, Japanese pears, quince, quince, etc.), nuclear fruits (peaches, plums, nectarines, umes, sweet cherry, apricots, prunes, etc.), citrus (satsuma mandarin, orange, lemon, lime, grapefruit) ), Nuts (chestnut, walnut, hazel, almond, pistachio, cashew nut, macadamia nut, etc.), berries (blueberry, cranberry, blackberry, raspberry, etc.), grape, oyster, olive, loquat, banana, coffee, Date palm, coconut palm, etc.
Trees other than fruit trees: Cha, mulberry, flowering trees, street trees (ash, birch, dogwood, eucalyptus, ginkgo, lilac, maple, oak, poplar, redwood, fu, sycamore, zelkova, black bean, peach tree, Tsuga, rat, pine, Spruce, yew) etc.
上記「作物」とは、イソキサフルトール等のHPPD阻害剤、イマゼタピル、チフェンスルフロンメチル等のALS阻害剤、EPSP合成酵素阻害剤、グルタミン合成酵素阻害剤、ブロモキシニル等の除草剤に対する耐性が、古典的な育種法、もしくは遺伝子組換え技術により付与された作物も含まれる。 The above `` crop '' is resistant to HPPD inhibitors such as isoxaflutol, ALS inhibitors such as imazetapyr and thifensulfuron methyl, EPSP synthase inhibitors, glutamine synthase inhibitors, herbicides such as bromoxynil, This includes crops granted by classical breeding methods or genetic engineering techniques.
古典的な育種法により耐性が付与された「作物」の例として、イマゼタピル等のイミダゾリノン系除草剤耐性のClearfield(登録商標)カノーラ、チフェンスルフロンメチル等のスルホニルウレア系ALS阻害型除草剤耐性のSTSダイズ等がある。また、遺伝子組換え技術により耐性が付与された「作物」の例として、グリホサートやグルホシネート耐性のトウモロコシ品種があり、RoundupReady(登録商標)及びLibertyLink(登録商標)等の商品名ですでに販売されている。 As an example of a “crop” to which resistance has been imparted by a classic breeding method, imidazolinone herbicide-resistant Clearfield (registered trademark) canola, such as imazetapil, and sulfonylurea-based ALS-inhibiting herbicide resistance such as thifensulfuron methyl There are STS soybeans. In addition, examples of “crop” to which tolerance has been imparted by genetic engineering techniques include glyphosate and glufosinate-resistant corn varieties that have already been sold under trade names such as RoundupReady (registered trademark) and LibertyLink (registered trademark). Yes.
上記「作物」とは、遺伝子組換え技術を用いて、例えば、バチルス属で知られている選択的毒素等を合成する事が可能となった作物も含まれる。
この様な遺伝子組換え植物で発現される毒素として、バチルス・セレウスやバチルス・ポピリエ由来の殺虫性タンパク;バチルス・チューリンゲンシス由来のCry1Ab、Cry1Ac、Cry1F、Cry1Fa2、Cry2Ab、Cry3A、Cry3Bb1またはCry9C等のδ−エンドトキシン、VIP1、VIP2、VIP3またはVIP3A等の殺虫タンパク;線虫由来の殺虫タンパク;さそり毒素、クモ毒素、ハチ毒素または昆虫特異的神経毒素等動物によって産生される毒素;糸状菌類毒素;植物レクチン;アグルチニン;トリプシン阻害剤、セリンプロテアーゼ阻害剤、パタチン、シスタチン、パパイン阻害剤等のプロテアーゼ阻害剤;リシン、トウモロコシ−RIP、アブリン、ルフィン、サポリン、ブリオジン等のリボゾーム不活性化タンパク(RIP);3−ヒドロキシステロイドオキシダーゼ、エクジステロイド−UDP−グルコシルトランスフェラーゼ、コレステロールオキシダーゼ等のステロイド代謝酵素;エクダイソン阻害剤;HMG-COAリダクターゼ;ナトリウムチャネル、カルシウムチャネル阻害剤等のイオンチャネル阻害剤;幼若ホルモンエステラーゼ;利尿ホルモン受容体;スチルベンシンターゼ;ビベンジルシンターゼ;キチナーゼ;グルカナーゼ等が挙げられる。
The “crop” includes, for example, a crop that can synthesize selective toxins known in the genus Bacillus by using genetic recombination technology.
Toxins expressed in such genetically modified plants include insecticidal proteins from Bacillus cereus and Bacillus popilie; Cry1Ab, Cry1Ac, Cry1F, Cry1Fa2, Cry2Ab, Cry3A, Cry3Bb1 or Cry9C from Bacillus thuringiensis Insecticidal proteins such as δ-endotoxin, VIP1, VIP2, VIP3 or VIP3A; nematicidal insecticidal proteins; toxins produced by animals such as scorpion toxin, spider toxin, bee toxin or insect-specific neurotoxin; filamentous fungal toxins; plants Lectin; Agglutinin; Protease inhibitor such as trypsin inhibitor, serine protease inhibitor, patatin, cystatin, papain inhibitor; Ribosome inactivating protein (RIP) such as lysine, corn-RIP, abrin, ruffin, saporin, bryodin; 3-hydroxysteroid oxidase, ecdysteroid Steroid metabolic enzymes such as UDP-glucosyltransferase and cholesterol oxidase; ecdysone inhibitor; HMG-COA reductase; ion channel inhibitor such as sodium channel and calcium channel inhibitor; juvenile hormone esterase; diuretic hormone receptor; stilbene synthase; Benzyl synthase; chitinase; glucanase and the like.
またこの様な遺伝子組換え作物で発現される毒素として、Cry1Ab、Cry1Ac、Cry1F、Cry1Fa2、Cry2Ab、Cry3A、Cry3Bb1又はCry9C等のδ−エンドトキシンタンパク、VIP1、VIP2、VIP3またはVIP3A等の殺虫タンパクのハイブリッド毒素、一部を欠損した毒素、修飾された毒素も含まれる。ハイブリッド毒素は組換え技術を用いて、これらタンパクの異なるドメインの新しい組み合わせによって作り出される。一部を欠損した毒素としては、アミノ酸配列の一部を欠損したCry1Abが知られている。修飾された毒素としては、天然型の毒素のアミノ酸の1つ又は複数が置換されている。
これら毒素の例及びこれら毒素を合成する事ができる組換え植物は、EP-A-0 374 753、WO 93/07278、WO 95/34656、EP-A-0 427 529、EP-A-451 878、WO 03/052073等に記載されている。
これらの組換え植物に含まれる毒素は、特に、甲虫目害虫、双翅目害虫、鱗翅目害虫への耐性を植物へ付与する。
Moreover, as toxins expressed in such genetically modified crops, Cry1Ab, Cry1Ac, Cry1F, Cry1Fa2, Cry2Ab, Cry3A, δ-endotoxin proteins such as Cry3Bb1 or Cry9C, and insecticidal protein hybrids such as VIP1, VIP2, VIP3 or VIP3A Toxins, partially defective toxins, modified toxins are also included. Hybrid toxins are produced by new combinations of different domains of these proteins using recombinant technology. As a toxin lacking a part, Cry1Ab lacking a part of the amino acid sequence is known. In the modified toxin, one or more amino acids of the natural toxin are substituted.
Examples of these toxins and recombinant plants capable of synthesizing these toxins are EP-A-0 374 753, WO 93/07278, WO 95/34656, EP-A-0 427 529, EP-A-451 878. , WO 03/052073 and the like.
The toxins contained in these recombinant plants particularly confer resistance to Coleoptera pests, Diptera pests, and Lepidoptera pests.
また、1つ若しくは複数の殺虫性の害虫抵抗性遺伝子を含み、1つ又は複数の毒素を発現する遺伝子組換え植物は既に知られており、いくつかのものは市販されている。これら遺伝子組換え植物の例として、YieldGard(登録商標)(Cry1Ab毒素を発現するトウモロコシ品種)、YieldGard Rootworm(登録商標)(Cry3Bb1毒素を発現するトウモロコシ品種)、YieldGard Plus(登録商標)(Cry1AbとCry3Bb1毒素を発現するトウモロコシ品種)、Herculex I(登録商標)(Cry1Fa2毒素とグルホシネートへの耐性を付与する為にホスフィノトリシン N−アサチルトランスフェラーゼ(PAT)を発現するトウモロコシ品種)、NuCOTN33B(Cry1Ac毒素を発現するワタ品種)、Bollgard I(登録商標)(Cry1Ac毒素を発現するワタ品種)、Bollgard II(登録商標)(Cry1AcとCry2Ab毒素とを発現するワタ品種)、VIPCOT(登録商標)(VIP毒素を発現するワタ品種)、NewLeaf(登録商標)(Cry3A毒素を発現するジャガイモ品種)、NatureGard(登録商標)Agrisure(登録商標)GT Advantage(GA21 グリホサート耐性形質)、Agrisure(登録商標) CB Advantage(Bt11コーンボーラー(CB)形質)、Protecta(登録商標)等が挙げられる。 Also, genetically modified plants that contain one or more insecticidal pest resistance genes and express one or more toxins are already known, and some are commercially available. Examples of these transgenic plants include YieldGard® (a corn variety expressing Cry1Ab toxin), YieldGard Rootworm® (a corn variety expressing Cry3Bb1 toxin), YieldGard Plus® (Cry1Ab and Cry3Bb1 Corn varieties that express toxins), Herculex I® (corn varieties that express phosphinotricin N-astilyltransferase (PAT) to confer resistance to Cry1Fa2 toxin and glufosinate), NuCOTN33B (Cry1Ac toxin) Cotton varieties expressing), Bollgard I (registered trademark) (cotton varieties expressing Cry1Ac toxin), Bollgard II (registered trademark) (cotton varieties expressing Cry1Ac and Cry2Ab toxin), VIPCOT (registered trademark) (VIP toxin) Cotton varieties), NewLeaf (registered trademark) (potato varieties expressing Cry3A toxin), NatureGard (registered trademark) Agrisure (registered trademark) GT Advant Examples include age (GA21 glyphosate resistance trait), Agrisure (registered trademark) CB Advantage (Bt11 corn borer (CB) trait), Protecta (registered trademark), and the like.
上記「作物」とは、遺伝子組換え技術を用いて、選択的な作用を有する抗病原性物質を産生する能力を付与されたものも含まれる。
抗病原性物質の例として、PRタンパク等が知られている(PRPs、EP-A-0 392 225)。このような抗病原性物質とそれを産生する遺伝子組換え植物は、EP-A-0 392 225、WO 95/33818、EP-A-0 353 191等に記載されている。
こうした遺伝子組換え植物で発現される抗病原性物質の例として、例えば、ナトリウムチャネル阻害剤、カルシウムチャネル阻害剤(ウイルスが産生するKP1、KP4、KP6毒素等が知られている。)等のイオンチャネル阻害剤;スチルベンシンターゼ;ビベンジルシンターゼ;キチナーゼ;グルカナーゼ;PRタンパク;ペプチド抗生物質、ヘテロ環を有する抗生物質、植物病害抵抗性に関与するタンパク因子(植物病害抵抗性遺伝子と呼ばれ、WO 03/000906に記載されている。)等の微生物が産生する抗病原性物質等が挙げられる。
The above “crop” includes those given the ability to produce an anti-pathogenic substance having a selective action using genetic recombination technology.
PR proteins and the like are known as examples of anti-pathogenic substances (PRPs, EP-A-0 392 225). Such anti-pathogenic substances and genetically modified plants that produce them are described in EP-A-0 392 225, WO 95/33818, EP-A-0 353 191 and the like.
Examples of anti-pathogenic substances expressed in such genetically modified plants include, for example, sodium channel inhibitors and calcium channel inhibitors (KP1, KP4, KP6 toxins produced by viruses, etc.) are known. Ion channel inhibitors; stilbene synthase; bibenzyl synthase; chitinase; glucanase; PR protein; peptide antibiotics, heterocyclic antibiotics, protein factors involved in plant disease resistance (called plant disease resistance genes, WO No. 03/000906)) and other anti-pathogenic substances produced by microorganisms.
本発明により防除することができる植物病害としては、例えば糸状菌等が挙げられ、より詳しくは以下の病害を挙げることができるが、これらに限定されるものではない。
通常、本発明防除方法は、本発明防除剤を前記した本発明防除剤を施用する方法で用いることにより行われる。
Examples of plant diseases that can be controlled by the present invention include filamentous fungi and the like, and more specifically, the following diseases can be mentioned, but are not limited thereto.
Usually, this invention control method is performed by using this invention control agent by the method of applying this invention control agent mentioned above.
イネのいもち病(Magnaporthe grisea)、ごま葉枯病(Cochliobolus miyabeanus)、紋枯病(Rhizoctonia solani)、馬鹿苗病(Gibberella fujikuroi)、黄化萎縮病(Sclerophthora macrospora);ムギ類のうどんこ病(Erysiphe graminis)、赤かび病(Fusarium graminearum, F. avenacerum, F. culmorum, Microdochium nivale)、さび病(Puccinia striiformis, P. graminis, P. recondita, P. hordei)、雪腐病(Typhula sp.,Micronectriella nivalis)、裸黒穂病(Ustilago tritici, U. nuda)、なまぐさ黒穂病(Tilletia caries)、眼紋病(Pseudocercosporella herpotrichoides)、雲形病(Rhynchosporium secalis)、葉枯病(Septoria tritici)、ふ枯病(Leptosphaeria nodorum)、網斑病(Pyrenophora teres Drechsler)、立枯病(Gaeumannomyces graminis)、黄斑病(Pyrenophora tritici-repentis);カンキツ類の黒点病(Diaporthe citri)、そうか病(Elsinoe fawcetti)、果実腐敗病(Penicillium digitatum, P. italicum);リンゴのモニリア病(Monilinia mali)、腐らん病(Valsa ceratosperma)、うどんこ病(Podosphaera leucotricha)、斑点落葉病(Alternaria alternata apple pathotype)、黒星病(Venturia inaequalis)、炭そ病(Glomerella cingulata);ナシの黒星病(Venturia nashicola, V. pirina)、黒斑病(Alternaria alternata Japanese pear pathotype)、赤星病(Gymnosporangium haraeanum);モモの灰星病(Monilinia fructicola)、黒星病(Cladosporium carpophilum)、フォモプシス腐敗病(Phomopsis sp.);ブドウの黒とう病(Elsinoe ampelina)、晩腐病(Glomerella cingulata)、うどんこ病(Uncinula necator)、さび病(Phakopsora ampelopsidis)、ブラックロット病(Guignardia bidwellii)、べと病(Plasmopara viticola);カキの炭そ病(Gloeosporium kaki)、落葉病(Cercospora kaki, Mycosphaerella nawae);ウリ類の炭そ病(Colletotrichum lagenarium)、うどんこ病(Sphaerotheca fuliginea)、つる枯病(Mycosphaerella melonis)、つる割病(Fusarium oxysporum)、べと病(Pseudoperonospora cubensis)、疫病(Phytophthora sp.)、苗立枯病(Pythium sp.);トマトの輪紋病(Alternaria solani)、葉かび病(Cladosporium fulvum)、疫病(Phytophthora infestans);ナスの褐紋病(Phomopsis vexans)、うどんこ病(Erysiphe cichoracearum);アブラナ科野菜の黒斑病(Alternaria japonica)、白斑病(Cercosporella brassicae)、根こぶ病(Plasmodiophora parasitica)、べと病(Peronospora parasitica);ネギのさび病(Puccinia allii)、ダイズの紫斑病(Cercospora kikuchii)、黒とう病(Elsinoe glycines)、黒点病(Diaporthe phaseolorum var. sojae)、さび病( Phakopsora pachyrhizi)、インゲンの炭そ病(Colletotrichum lindemthianum)ラッカセイの黒渋病(Cercospora personata)、褐斑病(Cercospora arachidicola)、白絹病(Sclerotium rolfsii);エンドウのうどんこ病(Erysiphe pisi);ジャガイモの夏疫病(Alternaria solani)、疫病(Phytophthora infestans)、半身萎凋病(Verticillium albo-atrum, V. dahliae, V. nigrescens);イチゴのうどんこ病(Sphaerotheca humuli);チャの網もち病(Exobasidium reticulatum);白星病(Elsinoe leucospila)、輪斑病(Pestalotiopsis sp.)、炭そ病(Colletotrichum theae-sinensis)タバコの赤星病(Alternaria longipes)、うどんこ病(Erysiphe cichoracearum)、炭そ病(Colletotrichum tabacum)、べと病(Peronospora tabacina)、疫病(Phytophthora nicotianae);テンサイの褐斑病(Cercospora beticola)、葉腐病(Thanatephorus cucumeris)、根腐病(Thanatephorus cucumeris)、黒根病(Aphanomyces sochlioides);バラの黒星病(Diplocarpon rosae)、うどんこ病(Sphaerotheca pannosa);キクの褐斑病(Septoria chrysanthemi−indici)、白さび病(Puccinia horiana);タマネギの白斑葉枯病(Botrytis cinerea, B. byssoidea, B. squamosa)、灰色腐敗病(Botrytis alli);小菌核性腐敗病(Botrytis squamosa)種々の作物の灰色かび病(Botrytis cinerea)、菌核病(Sclerotinia sclerotiorum);ダイコン黒斑病((Alternaria brassicicola);シバのダラースポット病(Sclerotinia homeocarpa)、シバのブラウンパッチ病およびラージパッチ病(Rhizoctonia solani);並びにバナナのシガトカ病(Mycosphaerella fijiensis、Mycosphaerella musicola)。 Rice blast (Magnaporthe grisea), sesame leaf blight (Cochliobolus miyabeanus), blight (Rhizoctonia solani), idiot seedling (Gibberella fujikuroi), yellow dwarf (Sclerophthora macrospora); wheat powdery mildew ( Erysiphe graminis), red mold (Fusarium graminearum, F. avenacerum, F. culmorum, Microdochium nivale), rust (Puccinia striiformis, P. graminis, P. recondita, P. hordei), snow rot (Typhula sp., Micronectriella nivalis), Bare Scab (Ustilago tritici, U. nuda), Tilletia caries, Eye spot disease (Pseudocercosporella herpotrichoides), Cloud disease (Rhynchosporium secalis), Leaf blight (Septoria tritici), Blight (Leptosphaeria nodorum), net blotch (Pyrenophora teres Drechsler), blight (Gaeumannomyces graminis), maculopathy (Pyrenophora tritici-repentis); citrus black spot (Diaporthe citri), scab (Elsinoe fawcetti), fruit rot Disease (Penicillium digitatum, P. italicum); apple Monilinia mali, rot (Valsa ceratosperma), powdery mildew (Podosphaera leucotricha), spotted leaf (Alternaria alternata apple pathotype), black star (Venturia inaequalis), anthrax Disease (Glomerella cingulata); pear black spot disease (Venturia nashicola, V. pirina), black spot disease (Alternaria alternata Japanese pear pathotype), red star disease (Gymnosporangium haraeanum); peach blight (Monilinia fructicola), black star disease ( Cladosporium carpophilum), Phomopsis sp .; Grapes black rot (Elsinoe ampelina), late rot (Glomerella cingulata), powdery mildew (Uncinula necator), rust (Phakopsora ampelopsidis), black lot disease ( Guignardia bidwellii), downy mildew (Plasmopara viticola); oyster anthracnose (Gloeosporium kaki), defoliation (Cercospora kaki, Mycosphaerella nawae); cucurbit anthracnose (Colletotrichum lagen) arium), powdery mildew (Sphaerotheca fuliginea), vine blight (Mycosphaerella melonis), vine split disease (Fusarium oxysporum), downy mildew (Pseudoperonospora cubensis), plague (Phytophthora sp.), seedling blight (Pythium sp. ); Tomato ring-rot (Alternaria solani), leaf mold (Cladosporium fulvum), plague (Phytophthora infestans); eggplant brown rot (Phomopsis vexans), powdery mildew (Erysiphe cichoracearum); Disease (Alternaria japonica), white spot disease (Cercosporella brassicae), root-knot disease (Plasmodiophora parasitica), downy mildew (Peronospora parasitica); leek rust (Puccinia allii), soybean purpura (Cercospora kikuchii), black scab (Elsinoe glycines), black spot (Diaporthe phaseolorum var. Sojae), rust (Phakopsora pachyrhizi), bean anthracnose (Colletotrichum lindemthianum) groundnut black rot (Cercospora personata), brown spot (Cercospora ara) chidicola), white silkworm (Sclerotium rolfsii); pea powdery mildew (Erysiphe pisi); potato summer plague (Alternaria solani), plague (Phytophthora infestans), half body wilt (Verticillium albo-atrum, V. dahliae, V nigrescens); Strawberry powdery mildew (Sphaerotheca humuli); Cha net wilt (Exobasidium reticulatum); White spot disease (Elsinoe leucospila), Ring spot disease (Pestalotiopsis sp.), Anthracnose (Colletotrichum theae-sinensis) tobacco Red Star Disease (Alternaria longipes), powdery mildew (Erysiphe cichoracearum), anthracnose (Colletotrichum tabacum), downy mildew (Peronospora tabacina), plague (Phytophthora nicotianae); brown spot of sugar beet (Cercospora beticola), leaf rot Disease (Thanatephorus cucumeris), root rot (Thanatephorus cucumeris), black root disease (Aphanomyces sochlioides); rose black spot disease (Diplocarpon rosae), powdery mildew (Sphaerotheca pannosa); chrysanthemum leaf spot (Septoria chrys) anthemi-indici), white rust (Puccinia horiana); onion white spot blight (Botrytis cinerea, B. byssoidea, B. squamosa), gray rot (Botrytis alli); bacterium rot (Botrytis squamosa) Various crops of gray mold disease (Botrytis cinerea), sclerotia disease (Sclerotinia sclerotiorum); radish black spot disease (Alternaria brassicicola); buckwheat dollar spot disease (Sclerotinia homeocarpa), buckwheat brown patch disease and large patch disease ( Rhizoctonia solani); and banana Sigatoka disease (Mycosphaerella fijiensis, Mycosphaerella musicola).
以下、本発明を製造例、製剤例及び試験例等によりさらに詳しく説明するが、本発明はこれらの例のみに限定されるものではない。
まず、本発明化合物の製造例を示す。
Hereinafter, although this invention is demonstrated in more detail by a manufacture example, a formulation example, a test example, etc., this invention is not limited only to these examples.
First, the manufacture example of this invention compound is shown.
製造例1
6−アミノベンゾチアゾール0.18g、2−フルオロ−3−メトキシフェニル酢酸0.20g、1−ヒドロキシベンゾトリアゾール0.20g、WSC0.30g及びピリジン0.30gをDMF2mlに加え、140℃で5分間、室温で8時間攪拌した。反応混合物に水を加え、酢酸エチルで抽出した。得られた有機層を水及び飽和食塩水で順次洗浄した後、無水硫酸マグネシウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付してN−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−メトキシフェニル)アセトアミド(以下、本発明化合物(1)と記す。)0.27gを得た。
本発明化合物(1)
1H-NMR (CDCl3) δ: 3.80 (2H, d, J = 1.4 Hz), 3.91 (3H, s), 6.93-6.98 (2H, m), 7.09-7.14 (1H, m), 7.23-7.27 (1H, m), 7.47 (1H, br s), 8.00 (1H, d, J = 8.7 Hz), 8.50 (1H, d, J = 2.2 Hz), 8.91 (1H, s).
Production Example 1
0.18 g of 6-aminobenzothiazole, 0.20 g of 2-fluoro-3-methoxyphenylacetic acid, 0.20 g of 1-hydroxybenzotriazole, 0.30 g of WSC and 0.30 g of pyridine were added to 2 ml of DMF, and 140 ° C. for 5 minutes. Stir at room temperature for 8 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give N-benzothiazol-6-yl-2- (2-fluoro-3-methoxyphenyl) acetamide (hereinafter referred to as the present compound (1)). 27 g was obtained.
Compound (1) of the present invention
1 H-NMR (CDCl 3 ) δ: 3.80 (2H, d, J = 1.4 Hz), 3.91 (3H, s), 6.93-6.98 (2H, m), 7.09-7.14 (1H, m), 7.23-7.27 (1H, m), 7.47 (1H, br s), 8.00 (1H, d, J = 8.7 Hz), 8.50 (1H, d, J = 2.2 Hz), 8.91 (1H, s).
製造例2
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド0.20g、ヨードエタン0.18g及びDMF7mlの混合物に、炭酸セシウム0.34gを加え、室温で4時間攪拌した。反応混合物に氷水を加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮して、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−エトキシフェニル)アセトアミド(以下、本発明化合物(2)と記す。)0.16gを得た。
本発明化合物(2)
1H-NMR (DMSO-D6)δ: 1.34 (3H, t, J = 7.0 Hz), 3.76 (2H, s), 4.09 (2H, q, J = 7.0 Hz), 6.91-6.95 (1H, m), 7.05-7.07 (2H, m), 7.61 (1H, dd, J = 8.9, 2.1 Hz), 8.02 (1H, d, J = 8.8 Hz), 8.52 (1H, d, J = 2.0 Hz), 9.26 (1H, s), 10.49 (1H, s).
Production Example 2
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide, 0.18 g of iodoethane and 7 ml of DMF, 0.34 g of cesium carbonate was added and stirred at room temperature for 4 hours. . Ice water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate and concentrated under reduced pressure to give N-benzothiazol-6-yl-2- (2-fluoro-3-ethoxyphenyl) acetamide (hereinafter referred to as the present compound ( 2). 0.16 g was obtained.
Compound (2) of the present invention
1 H-NMR (DMSO-D 6 ) δ: 1.34 (3H, t, J = 7.0 Hz), 3.76 (2H, s), 4.09 (2H, q, J = 7.0 Hz), 6.91-6.95 (1H, m ), 7.05-7.07 (2H, m), 7.61 (1H, dd, J = 8.9, 2.1 Hz), 8.02 (1H, d, J = 8.8 Hz), 8.52 (1H, d, J = 2.0 Hz), 9.26 (1H, s), 10.49 (1H, s).
製造例3
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド0.20g、ヨードプロパン0.15g及びDMF5mlの混合物に、炭酸セシウム0.26gを加え、室温で4時間攪拌した。反応混合物に氷水を加え、析出した固体を濾集し、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−プロポキシフェニル)アセトアミド(以下、本発明化合物(3)と記す。)0.18gを得た。
本発明化合物(3)
1H-NMR (DMSO-D6) δ: 0.98 (3H, t, J = 7.4 Hz), 1.70-1.79 (2H, m), 3.76 (2H, s), 3.99 (2H, t, J = 6.5 Hz), 6.90-6.96 (1H, m), 7.04-7.09 (2H, m), 7.60 (1H, dd, J = 8.8, 2.0 Hz), 8.02 (1H, d, J = 8.8 Hz), 8.52 (1H, d, J = 2.2 Hz), 9.26 (1H, s), 10.49 (1H, s).
Production Example 3
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide, 0.15 g of iodopropane and 5 ml of DMF, 0.26 g of cesium carbonate was added and stirred at room temperature for 4 hours. did. Ice water was added to the reaction mixture, and the precipitated solid was collected by filtration, and N-benzothiazol-6-yl-2- (2-fluoro-3-propoxyphenyl) acetamide (hereinafter referred to as the present compound (3)). 0.18 g was obtained.
Compound (3) of the present invention
1 H-NMR (DMSO-D 6 ) δ: 0.98 (3H, t, J = 7.4 Hz), 1.70-1.79 (2H, m), 3.76 (2H, s), 3.99 (2H, t, J = 6.5 Hz ), 6.90-6.96 (1H, m), 7.04-7.09 (2H, m), 7.60 (1H, dd, J = 8.8, 2.0 Hz), 8.02 (1H, d, J = 8.8 Hz), 8.52 (1H, d, J = 2.2 Hz), 9.26 (1H, s), 10.49 (1H, s).
製造例4
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド0.20g、ヨードブタン0.22g及びDMF7mlの混合物に、炭酸セシウム0.37gを加え、室温で4時間攪拌した。反応混合物に氷水を加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をへキサンで洗浄し、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ブトキシフェニル)アセトアミド(以下、本発明化合物(4)と記す。)0.15gを得た。
本発明化合物(4)
1H-NMR (DMSO-D6) δ: 0.93 (3H, t, J = 7.5 Hz), 1.39-1.49 (2H, m), 1.67-1.74 (2H, m), 3.76 (2H, s), 4.03 (2H, t, J = 6.3 Hz), 6.90-6.95 (1H, m), 7.03-7.09 (2H, m), 7.60 (1H, dd, J = 9.2, 1.7 Hz), 8.02 (1H, d, J = 8.7 Hz), 8.52 (1H, d, J = 1.7 Hz), 9.26 (1H, s), 10.48 (1H, s).
Production Example 4
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide, 0.22 g of iodobutane and 7 ml of DMF, 0.37 g of cesium carbonate was added and stirred at room temperature for 4 hours. . Ice water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was washed with hexane, and 0.15 g of N-benzothiazol-6-yl-2- (2-fluoro-3-butoxyphenyl) acetamide (hereinafter referred to as the present compound (4)) was obtained. Obtained.
The present compound (4)
1 H-NMR (DMSO-D 6 ) δ: 0.93 (3H, t, J = 7.5 Hz), 1.39-1.49 (2H, m), 1.67-1.74 (2H, m), 3.76 (2H, s), 4.03 (2H, t, J = 6.3 Hz), 6.90-6.95 (1H, m), 7.03-7.09 (2H, m), 7.60 (1H, dd, J = 9.2, 1.7 Hz), 8.02 (1H, d, J = 8.7 Hz), 8.52 (1H, d, J = 1.7 Hz), 9.26 (1H, s), 10.48 (1H, s).
製造例5
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド0.20g、ヨードペンタン0.17g及びDMF5mlの混合物に、炭酸セシウム0.26gを加え、室温で4時間攪拌した。反応混合物に氷水を加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をへキサンで洗浄し、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ペンチルオキシフェニル)アセトアミド(以下、本発明化合物(5)と記す。)0.15gを得た。
本発明化合物(5)
1H-NMR (DMSO-D6) δ: 0.89 (3H, t, J = 6.8 Hz), 1.30-1.45 (4H, m), 1.69-1.77 (2H, m), 3.76 (2H, s), 4.03 (2H, t, J = 6.4 Hz), 6.90-6.97 (1H, m), 7.04-7.10 (2H, m), 7.61 (1H, d, J = 8.7 Hz), 8.02 (1H, d, J = 8.9 Hz), 8.53 (1H, s), 9.26 (1H, s), 10.48 (1H, s).
Production Example 5
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide, 0.17 g of iodopentane and 5 ml of DMF, 0.26 g of cesium carbonate was added and stirred at room temperature for 4 hours. did. Ice water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was washed with hexane, and 0.15 g of N-benzothiazol-6-yl-2- (2-fluoro-3-pentyloxyphenyl) acetamide (hereinafter referred to as the present compound (5)). Got.
Compound (5) of the present invention
1 H-NMR (DMSO-D 6 ) δ: 0.89 (3H, t, J = 6.8 Hz), 1.30-1.45 (4H, m), 1.69-1.77 (2H, m), 3.76 (2H, s), 4.03 (2H, t, J = 6.4 Hz), 6.90-6.97 (1H, m), 7.04-7.10 (2H, m), 7.61 (1H, d, J = 8.7 Hz), 8.02 (1H, d, J = 8.9 Hz), 8.53 (1H, s), 9.26 (1H, s), 10.48 (1H, s).
製造例6
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド0.20g、1−ブロモヘキサン0.22g及びDMF5mlの混合物に、炭酸セシウム0.43gを加え、室温で4時間攪拌した。反応混合物に氷水を加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をへキサンで洗浄し、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヘキシルオキシフェニル)アセトアミド(以下、本発明化合物(6)と記す。)0.14gを得た。
本発明化合物(6)
1H-NMR (DMSO-D6)δ: 0.87 (3H, t, J = 7.0 Hz), 1.26-1.34 (4H, m), 1.37-1.46 (2H, m), 1.67-1.76 (2H, m), 3.76 (2H, s), 4.02 (2H, t, J = 6.5 Hz), 6.89-6.96 (1H, m), 7.03-7.09 (2H, m), 7.60 (1H, dd, J = 8.8, 2.1 Hz), 8.02 (1H, d, J = 8.7 Hz), 8.52 (1H, d, J = 2.2 Hz), 9.26 (1H, s), 10.48 (1H, s).
Production Example 6
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide, 0.22 g of 1-bromohexane and 5 ml of DMF, 0.43 g of cesium carbonate was added, and 4 Stir for hours. Ice water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was washed with hexane, and 0.14 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hexyloxyphenyl) acetamide (hereinafter referred to as the present compound (6)). Got.
The present compound (6)
1 H-NMR (DMSO-D 6 ) δ: 0.87 (3H, t, J = 7.0 Hz), 1.26-1.34 (4H, m), 1.37-1.46 (2H, m), 1.67-1.76 (2H, m) , 3.76 (2H, s), 4.02 (2H, t, J = 6.5 Hz), 6.89-6.96 (1H, m), 7.03-7.09 (2H, m), 7.60 (1H, dd, J = 8.8, 2.1 Hz ), 8.02 (1H, d, J = 8.7 Hz), 8.52 (1H, d, J = 2.2 Hz), 9.26 (1H, s), 10.48 (1H, s).
製造例7
6−アミノベンゾチアゾール0.15g、3−メトキシフェニル酢酸0.20g、1−ヒドロキシベンゾトリアゾール0.15g、WSC0.25g及びピリジン0.35gをDMF2mlに加え、140℃で5分間、室温で8時間攪拌した。反応混合物に水を加え、生成した固体を濾集した。得られた固体を水、炭酸水素ナトリウム水溶液、MTBE及びヘキサンで順次洗浄してN−(ベンゾチアゾール−6−イル)−2−(3−メトキシフェニル)アセトアミド(以下、本発明化合物(7)と記す。)0.25gを得た。
本発明化合物(7)
1H-NMR (CDCl3) δ: 3.77 (2H, s), 3.84 (3H, s), 6.88-6.96 (3H, m), 7.19 (1H, dd, J = 8.9, 2.1 Hz), 7.27-7.38 (2H, m), 7.99 (1H, d, J = 8.9 Hz), 8.49 (1H, d, J = 2.1 Hz), 8.90 (1H, s).
Production Example 7
0.15 g of 6-aminobenzothiazole, 0.20 g of 3-methoxyphenylacetic acid, 0.15 g of 1-hydroxybenzotriazole, 0.25 g of WSC and 0.35 g of pyridine are added to 2 ml of DMF, and the mixture is at 140 ° C. for 5 minutes and at room temperature for 8 hours. Stir. Water was added to the reaction mixture, and the resulting solid was collected by filtration. The obtained solid was washed successively with water, aqueous sodium hydrogen carbonate solution, MTBE and hexane to give N- (benzothiazol-6-yl) -2- (3-methoxyphenyl) acetamide (hereinafter referred to as the present compound (7)). 0.25 g was obtained.
Compound (7) of the present invention
1 H-NMR (CDCl 3 ) δ: 3.77 (2H, s), 3.84 (3H, s), 6.88-6.96 (3H, m), 7.19 (1H, dd, J = 8.9, 2.1 Hz), 7.27-7.38 (2H, m), 7.99 (1H, d, J = 8.9 Hz), 8.49 (1H, d, J = 2.1 Hz), 8.90 (1H, s).
製造例8
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、1−ヨードエタン0.14g及びDMF5mlの混合物に、炭酸セシウム0.28gを加え、室温で2時間半攪拌した。反応混合物に水を加え、析出した固体を濾集し、水酸化ナトリウム水溶液、水及びヘキサンで順次洗浄し、N−ベンゾチアゾール−6−イル−2−(3−エトキシフェニル)−アセトアミド(以下、本発明化合物(8)と記す。)0.17gを得た。
本発明化合物(8)
1H-NMR (CDCl3) δ: 1.43 (3H, t, J = 7.0 Hz), 3.75 (2H, s), 4.05 (2H, q, J = 7.0 Hz), 6.88-6.93 (3H, m), 7.18 (1H, dd, J = 8.8, 2.1 Hz), 7.23 (1H, s), 7.33 (1H, dd, J = 8.9, 7.5 Hz), 7.98 (1H, d, J = 8.7 Hz), 8.50 (1H, d, J = 2.2 Hz), 8.90 (1H, s).
Production Example 8
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.14 g of 1-iodoethane and 5 ml of DMF, 0.28 g of cesium carbonate was added and stirred at room temperature for 2.5 hours. Water was added to the reaction mixture, and the precipitated solid was collected by filtration, washed in turn with an aqueous sodium hydroxide solution, water and hexane, and then washed with N-benzothiazol-6-yl-2- (3-ethoxyphenyl) -acetamide (hereinafter referred to as the following). This is referred to as the present compound (8).) 0.17 g was obtained.
Compound (8) of the present invention
1 H-NMR (CDCl 3 ) δ: 1.43 (3H, t, J = 7.0 Hz), 3.75 (2H, s), 4.05 (2H, q, J = 7.0 Hz), 6.88-6.93 (3H, m), 7.18 (1H, dd, J = 8.8, 2.1 Hz), 7.23 (1H, s), 7.33 (1H, dd, J = 8.9, 7.5 Hz), 7.98 (1H, d, J = 8.7 Hz), 8.50 (1H , d, J = 2.2 Hz), 8.90 (1H, s).
製造例9
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、1−ブロモプロパン0.11g及びDMF5mlの混合物に、炭酸セシウム0.28gを加え、室温で4時間攪拌した。反応混合物に水を加え、析出した固体を濾集し、水酸化ナトリウム水溶液、水及びヘキサンで順次洗浄し、N−ベンゾチアゾール−6−イル−2−(3−プロポキシフェニル)−アセトアミド(以下、本発明化合物(9)と記す。)0.13gを得た。
本発明化合物(9)
1H-NMR (CDCl3) δ: 1.05 (3H, t, J = 7.5 Hz), 1.78-1.87 (2H, m), 3.76 (2H, s), 3.94 (2H, t, J = 6.5 Hz), 6.89-6.93 (3H, m), 7.18 (1H, dd, J = 8.8, 2.1 Hz), 7.28 (1H, s), 7.31-7.35 (1H, m), 7.99 (1H, d, J = 8.9 Hz), 8.49 (1H, d, J = 2.2 Hz), 8.90 (1H, s).
Production Example 9
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.11 g of 1-bromopropane and 5 ml of DMF, 0.28 g of cesium carbonate was added and stirred at room temperature for 4 hours. Water was added to the reaction mixture, and the precipitated solid was collected by filtration, washed successively with an aqueous sodium hydroxide solution, water and hexane, and then washed with N-benzothiazol-6-yl-2- (3-propoxyphenyl) -acetamide (hereinafter referred to as the following). This is referred to as the present compound (9).) 0.13 g was obtained.
Compound (9) of the present invention
1 H-NMR (CDCl 3 ) δ: 1.05 (3H, t, J = 7.5 Hz), 1.78-1.87 (2H, m), 3.76 (2H, s), 3.94 (2H, t, J = 6.5 Hz), 6.89-6.93 (3H, m), 7.18 (1H, dd, J = 8.8, 2.1 Hz), 7.28 (1H, s), 7.31-7.35 (1H, m), 7.99 (1H, d, J = 8.9 Hz) , 8.49 (1H, d, J = 2.2 Hz), 8.90 (1H, s).
製造例10
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、1−ブロモブタン0.13g及びDMF5mlの混合物に、炭酸セシウム0.28gを加え、室温で5時間攪拌した。反応混合物に水を加え、析出した固体を濾集し、水酸化ナトリウム水溶液、水及びヘキサンで順次洗浄し、N−ベンゾチアゾール−6−イル−2−(3−ブトキシフェニル)−アセトアミド(以下、本発明化合物(10)と記す。)0.15gを得た。
本発明化合物(10)
1H-NMR (CDCl3) δ: 0.98 (3H, t, J = 7.3 Hz), 1.45-1.55 (2H, m), 1.74-1.81 (2H, m), 3.76 (2H, s), 3.98 (2H, t, J = 6.5 Hz), 6.88-6.93 (3H, m), 7.18 (1H, dd, J = 8.8, 2.2 Hz), 7.23 (1H, s), 7.33 (1H, dd, J = 9.0, 7.6 Hz), 7.99 (1H, d, J = 8.8 Hz), 8.50 (1H, d, J = 2.0 Hz), 8.90 (1H, s).
Production Example 10
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.13 g of 1-bromobutane and 5 ml of DMF, 0.28 g of cesium carbonate was added and stirred at room temperature for 5 hours. Water was added to the reaction mixture, and the precipitated solid was collected by filtration, washed successively with an aqueous sodium hydroxide solution, water and hexane, and then washed with N-benzothiazol-6-yl-2- (3-butoxyphenyl) -acetamide (hereinafter referred to as the following). This is referred to as the present compound (10).) 0.15 g was obtained.
Compound (10) of the present invention
1 H-NMR (CDCl 3 ) δ: 0.98 (3H, t, J = 7.3 Hz), 1.45-1.55 (2H, m), 1.74-1.81 (2H, m), 3.76 (2H, s), 3.98 (2H , t, J = 6.5 Hz), 6.88-6.93 (3H, m), 7.18 (1H, dd, J = 8.8, 2.2 Hz), 7.23 (1H, s), 7.33 (1H, dd, J = 9.0, 7.6 Hz), 7.99 (1H, d, J = 8.8 Hz), 8.50 (1H, d, J = 2.0 Hz), 8.90 (1H, s).
製造例11
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、1−ヨードペンタン0.18g及びDMF5mlの混合物に、炭酸セシウム0.28gを加え、室温で4時間攪拌した。反応混合物に水を加え、析出した固体を濾集し、水酸化ナトリウム水溶液、水及びヘキサンで順次洗浄し、N−ベンゾチアゾール−6−イル−2−(3−ペンチルオキシフェニル)−アセトアミド(以下、本発明化合物(11)と記す。)0.18gを得た。
本発明化合物(11)
1H-NMR (CDCl3) δ: 0.93 (3H, t, J = 7.0 Hz), 1.34-1.48 (4H, m), 1.76-1.83 (2H, m), 3.75 (2H, s), 3.97 (2H, t, J = 6.6 Hz), 6.88-6.92 (3H, m), 7.17-7.20 (1H, m), 7.23 (1H, s), 7.31-7.35 (1H, m), 7.98 (1H, d, J = 8.7 Hz), 8.50 (1H, s), 8.90 (1H, s).
Production Example 11
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.18 g of 1-iodopentane and 5 ml of DMF, 0.28 g of cesium carbonate was added and stirred at room temperature for 4 hours. Water was added to the reaction mixture, and the precipitated solid was collected by filtration, washed in turn with an aqueous sodium hydroxide solution, water and hexane, and then washed with N-benzothiazol-6-yl-2- (3-pentyloxyphenyl) -acetamide (hereinafter referred to as “the acetamide”). This is referred to as the present compound (11).) 0.18 g was obtained.
Compound (11) of the present invention
1 H-NMR (CDCl 3 ) δ: 0.93 (3H, t, J = 7.0 Hz), 1.34-1.48 (4H, m), 1.76-1.83 (2H, m), 3.75 (2H, s), 3.97 (2H , t, J = 6.6 Hz), 6.88-6.92 (3H, m), 7.17-7.20 (1H, m), 7.23 (1H, s), 7.31-7.35 (1H, m), 7.98 (1H, d, J = 8.7 Hz), 8.50 (1H, s), 8.90 (1H, s).
製造例12
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、1−ブロモヘキサン0.15g及びDMF5mlの混合物に、炭酸セシウム0.28gを加え、室温で4時間攪拌した。反応混合物に水を加え、析出した固体を濾集し、水酸化ナトリウム水溶液、水及びヘキサンで順次洗浄し、N−ベンゾチアゾール−6−イル−2−(3−ヘキシルオキシフェニル)−アセトアミド(以下、本発明化合物(12)と記す。)0.17gを得た。
本発明化合物(12)
1H-NMR (CDCl3) δ: 0.89-0.92 (3H, m), 1.32-1.36 (4H, m), 1.43-1.50 (2H, m), 1.75-1.82 (2H, m), 3.76 (2H, s), 3.97 (2H, t, J = 6.6 Hz), 6.88-6.93 (3H, m), 7.18 (1H, dd, J = 8.8, 2.1 Hz), 7.29 (1H, s), 7.33 (1H, dd, J = 8.9, 7.5 Hz), 7.99 (1H, d, J = 8.7 Hz), 8.49 (1H, d, J = 1.9 Hz), 8.90 (1H, s).
Production Example 12
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.15 g of 1-bromohexane and 5 ml of DMF, 0.28 g of cesium carbonate was added and stirred at room temperature for 4 hours. Water was added to the reaction mixture, and the precipitated solid was collected by filtration, washed in turn with an aqueous sodium hydroxide solution, water and hexane, and then washed with N-benzothiazol-6-yl-2- (3-hexyloxyphenyl) -acetamide (hereinafter referred to as “the reaction mixture”). This is referred to as the present compound (12).) 0.17 g was obtained.
The present compound (12)
1 H-NMR (CDCl 3 ) δ: 0.89-0.92 (3H, m), 1.32-1.36 (4H, m), 1.43-1.50 (2H, m), 1.75-1.82 (2H, m), 3.76 (2H, s), 3.97 (2H, t, J = 6.6 Hz), 6.88-6.93 (3H, m), 7.18 (1H, dd, J = 8.8, 2.1 Hz), 7.29 (1H, s), 7.33 (1H, dd , J = 8.9, 7.5 Hz), 7.99 (1H, d, J = 8.7 Hz), 8.49 (1H, d, J = 1.9 Hz), 8.90 (1H, s).
製造例13
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、1−ブロモ−3−メトキシプロパン0.14g及びDMF5mlの混合物に、炭酸セシウム0.28gを加え、室温で5時間半攪拌した。反応混合物に水を加え、析出した固体を濾集し、水酸化ナトリウム水溶液、水及びヘキサンで順次洗浄し、N−ベンゾチアゾール−6−イル−2−(3−(3−メトキシプロポキシ)フェニル)アセトアミド(以下、本発明化合物(13)と記す。)0.17gを得た。
本発明化合物(13)
1H-NMR (CDCl3) δ: 2.03-2.09 (2H, m), 3.35 (3H, s), 3.56 (2H, t, J = 6.1 Hz), 3.75 (2H, s), 4.08 (2H, t, J = 6.3 Hz), 6.89-6.94 (3H, m), 7.19 (1H, dd, J = 8.8, 2.2 Hz), 7.29 (1H, s), 7.33 (1H, dd, J = 9.0, 7.6 Hz), 7.99 (1H, d, J = 8.5 Hz), 8.49 (1H, d, J = 2.0 Hz), 8.90 (1H, s).
Production Example 13
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.14 g of 1-bromo-3-methoxypropane and 5 ml of DMF, 0.28 g of cesium carbonate was added, and the mixture was stirred at room temperature. Stir for half an hour. Water was added to the reaction mixture, and the precipitated solid was collected by filtration, washed successively with aqueous sodium hydroxide solution, water and hexane to give N-benzothiazol-6-yl-2- (3- (3-methoxypropoxy) phenyl). 0.17 g of acetamide (hereinafter referred to as the present compound (13)) was obtained.
Compound (13) of the present invention
1 H-NMR (CDCl 3 ) δ: 2.03-2.09 (2H, m), 3.35 (3H, s), 3.56 (2H, t, J = 6.1 Hz), 3.75 (2H, s), 4.08 (2H, t , J = 6.3 Hz), 6.89-6.94 (3H, m), 7.19 (1H, dd, J = 8.8, 2.2 Hz), 7.29 (1H, s), 7.33 (1H, dd, J = 9.0, 7.6 Hz) , 7.99 (1H, d, J = 8.5 Hz), 8.49 (1H, d, J = 2.0 Hz), 8.90 (1H, s).
製造例14
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、4−メトキシブチルメタンスルホネート0.17g及びDMF5mlの混合物に、炭酸セシウム0.28gを加え、室温で7時間半攪拌した。反応混合物に水を加え、析出した固体を濾集し、水酸化ナトリウム水溶液、水及びヘキサンで順次洗浄し、N−ベンゾチアゾール−6−イル−2−(3−(4−メトキシブトキシ)フェニル)アセトアミド(以下、本発明化合物(14)と記す。)0.091gを得た。
本発明化合物(14)
1H-NMR (CDCl3) δ: 1.73-1.79 (2H, m), 1.84-1.91 (2H, m), 3.35 (3H, s), 3.45 (2H, t, J = 6.3 Hz), 3.75 (2H, s), 4.01 (2H, t, J = 6.2 Hz), 6.88-6.93 (3H, m), 7.19 (1H, dd, J = 8.8, 2.0 Hz), 7.28 (1H, s), 7.31-7.35 (1H, m), 7.99 (1H, d, J = 8.8 Hz), 8.49 (1H, d, J = 1.5 Hz), 8.90 (1H, s).
Production Example 14
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.17 g of 4-methoxybutylmethanesulfonate and 5 ml of DMF, 0.28 g of cesium carbonate was added, and the mixture was stirred at room temperature for 7 hours and a half. Stir. Water was added to the reaction mixture, and the precipitated solid was collected by filtration, washed successively with aqueous sodium hydroxide solution, water and hexane to give N-benzothiazol-6-yl-2- (3- (4-methoxybutoxy) phenyl). 0.091 g of acetamide (hereinafter referred to as the present compound (14)) was obtained.
The present compound (14)
1 H-NMR (CDCl 3 ) δ: 1.73-1.79 (2H, m), 1.84-1.91 (2H, m), 3.35 (3H, s), 3.45 (2H, t, J = 6.3 Hz), 3.75 (2H , s), 4.01 (2H, t, J = 6.2 Hz), 6.88-6.93 (3H, m), 7.19 (1H, dd, J = 8.8, 2.0 Hz), 7.28 (1H, s), 7.31-7.35 ( 1H, m), 7.99 (1H, d, J = 8.8 Hz), 8.49 (1H, d, J = 1.5 Hz), 8.90 (1H, s).
製造例15
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、3−エトキシプロパンメタンスルホネート0.17g及びDMF5mlの混合物に、炭酸セシウム0.28gを加え、室温で7時間半攪拌した。反応混合物に水を加え、析出した固体を濾集し、水酸化ナトリウム水溶液、水及びヘキサンで順次洗浄し、N−ベンゾチアゾール−6−イル−2−(3−(3−エトキシプロポキシ)フェニル)アセトアミド(以下、本発明化合物(15)と記す。)0.087gを得た。
本発明化合物(15)
1H-NMR (CDCl3) δ: 1.20 (3H, t, J = 7.0 Hz), 2.03-2.09 (2H, m), 3.50 (2H, q, J = 7.0 Hz), 3.60 (2H, t, J = 6.1 Hz), 3.75 (2H, s), 4.09 (2H, t, J = 6.2 Hz), 6.90-6.93 (3H, m), 7.18 (1H, d, J = 9.0 Hz), 7.27 (1H, s), 7.33 (1H, t, J = 8.0 Hz), 7.99 (1H, d, J = 8.5 Hz), 8.49 (1H, s), 8.90 (1H, s).
Production Example 15
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.17 g of 3-ethoxypropanemethanesulfonate and 5 ml of DMF, 0.28 g of cesium carbonate was added, and the mixture was stirred at room temperature for 7 and a half hours. Stir. Water was added to the reaction mixture, and the precipitated solid was collected by filtration, washed successively with aqueous sodium hydroxide solution, water and hexane to give N-benzothiazol-6-yl-2- (3- (3-ethoxypropoxy) phenyl). 0.087 g of acetamide (hereinafter referred to as the present compound (15)) was obtained.
The present compound (15)
1 H-NMR (CDCl 3 ) δ: 1.20 (3H, t, J = 7.0 Hz), 2.03-2.09 (2H, m), 3.50 (2H, q, J = 7.0 Hz), 3.60 (2H, t, J = 6.1 Hz), 3.75 (2H, s), 4.09 (2H, t, J = 6.2 Hz), 6.90-6.93 (3H, m), 7.18 (1H, d, J = 9.0 Hz), 7.27 (1H, s ), 7.33 (1H, t, J = 8.0 Hz), 7.99 (1H, d, J = 8.5 Hz), 8.49 (1H, s), 8.90 (1H, s).
製造例16
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、4−エトキシブチルパラトルエンスルホネート0.25g及びDMF5mlの混合物に、炭酸セシウム0.28gを加え、室温で4時間攪拌した。反応混合物に水を加え、析出した固体を濾集し、水酸化ナトリウム水溶液、水及びヘキサンで順次洗浄し、N−ベンゾチアゾール−6−イル−2−(3−(4−エトキシブトキシ)フェニル)アセトアミド(以下、本発明化合物(16)と記す。)0.080gを得た。
本発明化合物(16)
1H-NMR (CDCl3) δ: 1.20 (3H, t, J = 7.0 Hz), 1.73-1.80 (2H, m), 1.85-1.91 (2H, m), 3.46-3.51 (4H, m), 3.76 (2H, s), 4.01 (2H, t, J = 6.4 Hz), 6.88-6.93 (3H, m), 7.18 (1H, dd, J = 8.9, 2.2 Hz), 7.27 (1H, s), 7.33 (1H, dd, J = 9.1, 7.6 Hz), 7.99 (1H, d, J = 8.9 Hz), 8.49 (1H, d, J = 1.9 Hz), 8.90 (1H, s).
Production Example 16
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.25 g of 4-ethoxybutyl paratoluenesulfonate and 5 ml of DMF, 0.28 g of cesium carbonate was added, and the mixture was stirred at room temperature for 4 hours. Stir. Water was added to the reaction mixture, and the precipitated solid was collected by filtration, washed successively with aqueous sodium hydroxide solution, water and hexane to give N-benzothiazol-6-yl-2- (3- (4-ethoxybutoxy) phenyl). 0.080 g of acetamide (hereinafter referred to as the present compound (16)) was obtained.
Compound (16) of the present invention
1 H-NMR (CDCl 3 ) δ: 1.20 (3H, t, J = 7.0 Hz), 1.73-1.80 (2H, m), 1.85-1.91 (2H, m), 3.46-3.51 (4H, m), 3.76 (2H, s), 4.01 (2H, t, J = 6.4 Hz), 6.88-6.93 (3H, m), 7.18 (1H, dd, J = 8.9, 2.2 Hz), 7.27 (1H, s), 7.33 ( 1H, dd, J = 9.1, 7.6 Hz), 7.99 (1H, d, J = 8.9 Hz), 8.49 (1H, d, J = 1.9 Hz), 8.90 (1H, s).
製造例17
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド0.20g、1−ブロモ−3−メトキシプロパン0.20g及びDMF5mlの混合物に、炭酸セシウム0.43gを加え、室温で4時間攪拌した。反応混合物に氷水を加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付して、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(3−メトキシプロポキシ)フェニル)アセトアミド(以下、本発明化合物(17)と記す。)0.10gを得た。
本発明化合物(17)
1H-NMR (DMSO-D6) δ: 1.92-1.99 (2H, m), 3.25 (3H, s), 3.47 (2H, t, J = 6.3 Hz), 3.76 (2H, s), 4.08 (2H, t, J = 6.3 Hz), 6.91-6.97 (1H, m), 7.04-7.10 (2H, m), 7.61 (1H, dd, J = 8.8, 2.1 Hz), 8.02 (1H, d, J = 8.9 Hz), 8.53 (1H, d, J = 1.9 Hz), 9.26 (1H, s), 10.49 (1H, s).
Production Example 17
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide, 0.20 g of 1-bromo-3-methoxypropane and 5 ml of DMF, 0.43 g of cesium carbonate was added. And stirred at room temperature for 4 hours. Ice water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give N-benzothiazol-6-yl-2- (2-fluoro-3- (3-methoxypropoxy) phenyl) acetamide (hereinafter referred to as the present compound (17)). 0.10 g was obtained.
The present compound (17)
1 H-NMR (DMSO-D 6 ) δ: 1.92-1.99 (2H, m), 3.25 (3H, s), 3.47 (2H, t, J = 6.3 Hz), 3.76 (2H, s), 4.08 (2H , t, J = 6.3 Hz), 6.91-6.97 (1H, m), 7.04-7.10 (2H, m), 7.61 (1H, dd, J = 8.8, 2.1 Hz), 8.02 (1H, d, J = 8.9 Hz), 8.53 (1H, d, J = 1.9 Hz), 9.26 (1H, s), 10.49 (1H, s).
製造例18
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド0.20g、3−エトキシプロパンメタンスルホネート0.22g及びDMF7mlの混合物に、炭酸セシウム0.37gを加え、室温で4時間攪拌した。反応混合物に氷水を加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、濃縮して得られた残渣をMTBEで洗浄し、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(3−エトキシプロポキシ)フェニル)アセトアミド(以下、本発明化合物(18)と記す。)0.09gを得た。
本発明化合物(18)
1H-NMR (DMSO-D6) δ: 1.10 (3H, t, J = 6.5 Hz), 1.91-1.99 (2H, m), 3.42 (2H, q, J = 7.0 Hz), 3.51 (2H, t, J = 6.3 Hz), 3.76 (2H, s), 4.09 (2H, t, J = 6.2 Hz), 6.91-6.96 (1H, m), 7.04-7.10 (2H, m), 7.60 (1H, d, J = 8.9 Hz), 8.02 (1H, d, J = 8.7 Hz), 8.53 (1H, s), 9.26 (1H, s), 10.48 (1H, s).
Production Example 18
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide, 0.22 g of 3-ethoxypropanemethanesulfonate and 7 ml of DMF, 0.37 g of cesium carbonate was added, and For 4 hours. Ice water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography and concentrated. The obtained residue was washed with MTBE, and N-benzothiazol-6-yl-2- (2-fluoro-3- (3-ethoxypropoxy) 0.09 g of phenyl) acetamide (hereinafter referred to as the present compound (18)) was obtained.
Compound (18) of the present invention
1 H-NMR (DMSO-D 6 ) δ: 1.10 (3H, t, J = 6.5 Hz), 1.91-1.99 (2H, m), 3.42 (2H, q, J = 7.0 Hz), 3.51 (2H, t , J = 6.3 Hz), 3.76 (2H, s), 4.09 (2H, t, J = 6.2 Hz), 6.91-6.96 (1H, m), 7.04-7.10 (2H, m), 7.60 (1H, d, J = 8.9 Hz), 8.02 (1H, d, J = 8.7 Hz), 8.53 (1H, s), 9.26 (1H, s), 10.48 (1H, s).
製造例19
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド0.20g、4−メトキシブチルメタンスルホネート0.22g及びDMF7mlの混合物に、炭酸セシウム0.37gを加え、室温で4時間攪拌した。反応混合物に氷水を加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をヘキサンで洗浄し、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(4−メトキシブトキシ)フェニル)アセトアミド(以下、本発明化合物(19)と記す。)0.16gを得た。
本発明化合物(19)
1H-NMR (DMSO-D6) δ: 1.60-1.70 (2H, m), 1.72-1.80 (2H, m), 3.23 (3H, s), 3.37 (2H, t, J = 6.3 Hz), 3.76 (2H, s), 4.04 (2H, t, J = 6.3 Hz), 6.90-6.97 (1H, m), 7.04-7.10 (2H, m), 7.60 (1H, dd, J = 8.7, 1.9 Hz), 8.02 (1H, d, J = 8.9 Hz), 8.53 (1H, s), 9.26 (1H, s), 10.47 (1H, s).
Production Example 19
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide, 0.22 g of 4-methoxybutylmethanesulfonate and 7 ml of DMF, 0.37 g of cesium carbonate was added, and For 4 hours. Ice water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was washed with hexane, and N-benzothiazol-6-yl-2- (2-fluoro-3- (4-methoxybutoxy) phenyl) acetamide (hereinafter referred to as the present compound (19)). 0.16 g was obtained.
Compound (19) of the present invention
1H-NMR (DMSO-D 6 ) δ: 1.60-1.70 (2H, m), 1.72-1.80 (2H, m), 3.23 (3H, s), 3.37 (2H, t, J = 6.3 Hz), 3.76 ( 2H, s), 4.04 (2H, t, J = 6.3 Hz), 6.90-6.97 (1H, m), 7.04-7.10 (2H, m), 7.60 (1H, dd, J = 8.7, 1.9 Hz), 8.02 (1H, d, J = 8.9 Hz), 8.53 (1H, s), 9.26 (1H, s), 10.47 (1H, s).
製造例20
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド0.20g、1−ブロモ−2−エトキシエタン0.25g及びDMF5mlの混合物に、炭酸セシウム0.52gを加え、60℃で2時間攪拌した。反応混合物を室温付近まで放冷した後、氷水を加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、N−ベンゾチアゾール−6−イル−2−(2−エトキシエトキシフェニル)アセトアミド(以下、本発明化合物(20)と記す。)0.12gを得た。
本発明化合物(20)
1H-NMR (CDCl3) δ: 1.23 (3H, t, J = 6.9 Hz), 3.60 (2H, q, J = 7.0 Hz), 3.71 (2H, s), 3.79 (2H, t, J = 4.8 Hz), 4.11 (2H, t, J = 4.8 Hz), 6.86-6.92 (3H, m), 7.23 (1H, dd, J = 8.7, 1.9 Hz), 7.26-7.31 (1H, m), 7.73 (1H, s), 7.96 (1H, d, J = 8.7 Hz), 8.47 (1H, d, J = 2.2 Hz), 8.88 (1H, s).
Production Example 20
To a mixture of 0.20 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide, 0.25 g of 1-bromo-2-ethoxyethane and 5 ml of DMF, 0.52 g of cesium carbonate was added, and the mixture was heated at 60 ° C. Stir for 2 hours. The reaction mixture was allowed to cool to near room temperature, ice water was added, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 0.12 g of N-benzothiazol-6-yl-2- (2-ethoxyethoxyphenyl) acetamide (hereinafter referred to as the present compound (20)). It was.
Compound (20) of the present invention
1H-NMR (CDCl3) δ: 1.23 (3H, t, J = 6.9 Hz), 3.60 (2H, q, J = 7.0 Hz), 3.71 (2H, s), 3.79 (2H, t, J = 4.8 Hz) , 4.11 (2H, t, J = 4.8 Hz), 6.86-6.92 (3H, m), 7.23 (1H, dd, J = 8.7, 1.9 Hz), 7.26-7.31 (1H, m), 7.73 (1H, s ), 7.96 (1H, d, J = 8.7 Hz), 8.47 (1H, d, J = 2.2 Hz), 8.88 (1H, s).
次に本アミド化合物の製造について合成例に示す。 Next, the production of the present amide compound is shown in the synthesis examples.
合成例1
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(tert−ブチルジメチルシリルオキシ)フェニル)アセトアミド5.8g、水酸化リチウム一水和物1.8g及びDMF60mlの混合物を室温で5時間攪拌した。反応混合物に氷水を加え、MTBEで洗浄した。水層に2N塩酸を加えてpH=2付近に調整し、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をヘキサンで洗浄し、N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド3.4gを得た。
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−ヒドロキシフェニル)アセトアミド
1H-NMR (DMSO-D6) δ: 3.73 (2H, s), 6.75-6.95 (3H, m), 7.61 (1H, dd, J = 8.8, 1.6 Hz), 8.02 (1H, d, J = 8.7 Hz), 8.53 (1H, d, J = 1.9 Hz), 9.26 (1H, s), 9.75 (1H, s), 10.46 (1H, s).
Synthesis example 1
A mixture of 5.8 g of N-benzothiazol-6-yl-2- (2-fluoro-3- (tert-butyldimethylsilyloxy) phenyl) acetamide, 1.8 g of lithium hydroxide monohydrate and 60 ml of DMF at room temperature. Stir for 5 hours. Ice water was added to the reaction mixture and washed with MTBE. 2N hydrochloric acid was added to the aqueous layer to adjust the pH to around 2, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was washed with hexane to obtain 3.4 g of N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide.
N-benzothiazol-6-yl-2- (2-fluoro-3-hydroxyphenyl) acetamide
1 H-NMR (DMSO-D 6 ) δ: 3.73 (2H, s), 6.75-6.95 (3H, m), 7.61 (1H, dd, J = 8.8, 1.6 Hz), 8.02 (1H, d, J = 8.7 Hz), 8.53 (1H, d, J = 1.9 Hz), 9.26 (1H, s), 9.75 (1H, s), 10.46 (1H, s).
合成例2
3−tert−ブチルジメチルシリルオキシフェニル酢酸7.8g、6−アミノベンゾチアゾール4.0g、トリエチルアミン7.4ml、BOP試薬14g及びDMF150mlの混合物を、室温で3時間攪拌した。反応混合物に3%塩酸を加え、酢酸エチルで抽出した。得られた有機層を3%塩酸、水、飽和炭酸水素ナトリウム水溶液及び飽和食塩水で洗浄した後、無水硫酸マグネシウムで乾燥し、減圧下濃縮した。ついで得られた残渣、水酸化リチウム一水和物3.4g及びDMF100mlの混合物を室温で5時間攪拌した。反応混合物に水を加え、MTBEで洗浄した。水層に2N塩酸を加えてpH=2に調整し、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をヘキサンで洗浄し、N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド6.8gを得た。
N−ベンゾチアゾール−6−イル−2−(3−ヒドロキシフェニル)アセトアミド
1H-NMR (DMSO-D6) δ: 3.58 (2H, s), 6.63-6.65 (1H, m), 6.75-6.77 (2H, m), 7.11 (1H, t, J = 7.9 Hz), 7.59-7.61 (1H, m), 8.01 (1H, d, J = 8.8 Hz), 8.54 (1H, s), 9.25 (1H, s), 9.34 (1H, s), 10.41 (1H, s).
Synthesis example 2
A mixture of 7.8 g of 3-tert-butyldimethylsilyloxyphenylacetic acid, 4.0 g of 6-aminobenzothiazole, 7.4 ml of triethylamine, 14 g of BOP reagent and 150 ml of DMF was stirred at room temperature for 3 hours. 3% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed with 3% hydrochloric acid, water, saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. Subsequently, a mixture of the obtained residue, 3.4 g of lithium hydroxide monohydrate and 100 ml of DMF was stirred at room temperature for 5 hours. Water was added to the reaction mixture and washed with MTBE. The aqueous layer was adjusted to pH = 2 by adding 2N hydrochloric acid, and extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was washed with hexane to obtain 6.8 g of N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide.
N-benzothiazol-6-yl-2- (3-hydroxyphenyl) acetamide
1 H-NMR (DMSO-D 6 ) δ: 3.58 (2H, s), 6.63-6.65 (1H, m), 6.75-6.77 (2H, m), 7.11 (1H, t, J = 7.9 Hz), 7.59 -7.61 (1H, m), 8.01 (1H, d, J = 8.8 Hz), 8.54 (1H, s), 9.25 (1H, s), 9.34 (1H, s), 10.41 (1H, s).
次に、本発明化合物の製造中間体の製造について参考製造例を示す。 Next, reference production examples are shown for the production of the production intermediate of the compound of the present invention.
参考製造例1
2−フルオロ−3−メトキシベンズアルデヒド20g、水素化ホウ素ナトリウム2.4g及びメタノール200mlの混合物を室温で30分間撹拌した。反応混合物に水及び5%塩酸を順次加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し、減圧下濃縮して(2−フルオロ−3−メトキシフェニル)メタノール20gを得た。
(2−フルオロ−3−メトキシフェニル)メタノール
1H-NMR (CDCl3) δ: 3.89 (3H, s), 4.76 (2H, s), 6.92 (1H, td, J = 8.1, 1.6 Hz), 6.97-7.01 (1H, m), 7.08 (1H, td, J = 7.9, 1.4 Hz).
Reference production example 1
A mixture of 20 g of 2-fluoro-3-methoxybenzaldehyde, 2.4 g of sodium borohydride and 200 ml of methanol was stirred at room temperature for 30 minutes. Water and 5% hydrochloric acid were sequentially added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure to give 20 g of (2-fluoro-3-methoxyphenyl) methanol.
(2-Fluoro-3-methoxyphenyl) methanol
1 H-NMR (CDCl 3 ) δ: 3.89 (3H, s), 4.76 (2H, s), 6.92 (1H, td, J = 8.1, 1.6 Hz), 6.97-7.01 (1H, m), 7.08 (1H , td, J = 7.9, 1.4 Hz).
参考製造例2
(2−フルオロ−3−メトキシフェニル)メタノール20g、メタンスルホニルクロライド16g及びTHF200mlの混合物に0℃でトリエチルアミン22mlを混合し、0℃で30分間撹拌した。反応混合物に水及び5%塩酸を順次加え、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し、減圧下濃縮した。得られた残渣とDMF200ml、水50ml及びシアン化ナトリウム8.3gを混合し、8時間加熱還流した。室温付近まで放冷した反応混合物に水を加えて酢酸エチルで抽出した。有機層を水で2回、5%塩酸及び飽和食塩水で順次洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付して(2−フルオロ−3−メトキシフェニル)アセトニトリル12gを得た。
(2−フルオロ−3−メトキシフェニル)アセトニトリル
1H-NMR (CDCl3) δ: 3.77 (2H, s), 3.90 (3H, s), 6.94-7.03 (2H, m), 7.11 (1H, td, J = 8.0, 1.5 Hz).
Reference production example 2
A mixture of 20 g of (2-fluoro-3-methoxyphenyl) methanol, 16 g of methanesulfonyl chloride and 200 ml of THF was mixed with 22 ml of triethylamine at 0 ° C. and stirred at 0 ° C. for 30 minutes. Water and 5% hydrochloric acid were sequentially added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was mixed with 200 ml of DMF, 50 ml of water and 8.3 g of sodium cyanide, and heated to reflux for 8 hours. Water was added to the reaction mixture allowed to cool to around room temperature, and the mixture was extracted with ethyl acetate. The organic layer was washed twice with water, successively with 5% hydrochloric acid and saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 12 g of (2-fluoro-3-methoxyphenyl) acetonitrile.
(2-Fluoro-3-methoxyphenyl) acetonitrile
1 H-NMR (CDCl 3 ) δ: 3.77 (2H, s), 3.90 (3H, s), 6.94-7.03 (2H, m), 7.11 (1H, td, J = 8.0, 1.5 Hz).
参考製造例3
(2−フルオロ−3−メトキシフェニル)アセトニトリル10gに48%臭化水素酸100mlを加え、4時間加熱還流した。ついで反応混合物に48%臭化水素酸20mlを加え4時間加熱還流した。室温付近まで放冷した反応混合物を減圧下濃縮し、酢酸エチル及びヘキサンを加え、混合液を濾過した。濾液を減圧下濃縮して2−フルオロ−3−ヒドロキシフェニル酢酸9.3gを得た。
2−フルオロ−3−ヒドロキシフェニル酢酸
1H-NMR (DMSO-D6) δ: 3.56 (2H, s), 6.68-6.72 (1H, m), 6.82-6.92 (2H, m), 9.73 (1H, s), 12.40 (1H, s).
Reference production example 3
100% of 48% hydrobromic acid was added to 10 g of (2-fluoro-3-methoxyphenyl) acetonitrile, and the mixture was heated to reflux for 4 hours. Next, 20 ml of 48% hydrobromic acid was added to the reaction mixture, and the mixture was heated to reflux for 4 hours. The reaction mixture allowed to cool to near room temperature was concentrated under reduced pressure, ethyl acetate and hexane were added, and the mixture was filtered. The filtrate was concentrated under reduced pressure to obtain 9.3 g of 2-fluoro-3-hydroxyphenylacetic acid.
2-Fluoro-3-hydroxyphenylacetic acid
1 H-NMR (DMSO-D 6 ) δ: 3.56 (2H, s), 6.68-6.72 (1H, m), 6.82-6.92 (2H, m), 9.73 (1H, s), 12.40 (1H, s) .
参考製造例4
2−フルオロ−3−ヒドロキシフェニル酢酸9.2g、tert−ブチルジメチルシリルクロリド19g、イミダゾール11g及びDMF150mlを混合し、室温で8時間撹拌した。反応混合物に水を加え、酢酸エチルで抽出した。得られた有機層を飽和塩化アンモニウム水溶液、飽和炭酸水素ナトリウム水溶液及び飽和食塩水で洗浄した後、無水硫酸マグネシウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付した。次いで、得られた残渣8.8g、6−アミノベンゾチアゾール6.0g、トリエチルアミン13ml、BOP試薬18g及びDMF100mlを混合し、室温で8時間攪拌した。反応混合物に水を加え、酢酸エチルで抽出した。得られた有機層を水及び飽和食塩水で順次洗浄した後、無水硫酸マグネシウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付してN−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(tert−ブチルジメチルシリルオキシ)フェニル)アセトアミド5.8gを得た。
N−ベンゾチアゾール−6−イル−2−(2−フルオロ−3−(tert−ブチルジメチルシリルオキシ)フェニル)アセトアミド
1H-NMR (CDCl3) δ: 0.21 (6H, s), 1.01 (9H, s), 3.78 (2H, d, J = 1.5 Hz), 6.89-6.97 (2H, m), 7.01-7.05 (1H, m), 7.22 (1H, dd, J = 8.8, 2.2 Hz), 7.42 (1H, s), 8.00 (1H, d, J = 8.8 Hz), 8.51 (1H, d, J = 2.0 Hz), 8.90 (1H, s).
Reference production example 4
9.2 g of 2-fluoro-3-hydroxyphenylacetic acid, 19 g of tert-butyldimethylsilyl chloride, 11 g of imidazole and 150 ml of DMF were mixed and stirred at room temperature for 8 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed with saturated aqueous ammonium chloride solution, saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography. Next, 8.8 g of the obtained residue, 6.0 g of 6-aminobenzothiazole, 13 ml of triethylamine, 18 g of BOP reagent and 100 ml of DMF were mixed and stirred at room temperature for 8 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The resulting residue was subjected to silica gel column chromatography to obtain 5.8 g of N-benzothiazol-6-yl-2- (2-fluoro-3- (tert-butyldimethylsilyloxy) phenyl) acetamide.
N-benzothiazol-6-yl-2- (2-fluoro-3- (tert-butyldimethylsilyloxy) phenyl) acetamide
1 H-NMR (CDCl 3 ) δ: 0.21 (6H, s), 1.01 (9H, s), 3.78 (2H, d, J = 1.5 Hz), 6.89-6.97 (2H, m), 7.01-7.05 (1H , m), 7.22 (1H, dd, J = 8.8, 2.2 Hz), 7.42 (1H, s), 8.00 (1H, d, J = 8.8 Hz), 8.51 (1H, d, J = 2.0 Hz), 8.90 (1H, s).
参考製造例5
2−フルオロ−3−メトキシベンズアルデヒド3.0g及びクロロホルム150mlの混合物に、四臭化炭素9.7g及びトリフェニルホスフィン−クロロホルム溶液(トリフェニルホスフィン15.3g及びクロロホルム150mlからなる溶液)を0℃で順次滴下した、室温で1日間攪拌した。反応混合物をセライト(登録商標)で濾過し、ろ液を減圧下で濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付して、メチル(2−フルオロ−3−(2,2−ジブロモエテニル)フェニル)エーテル6.1gを得た。
メチル(2−フルオロ−3−(2,2−ジブロモエテニル)フェニル)エーテル
1H-NMR (CDCl3) δ: 3.89 (3H, s), 6.93-6.99 (1H, m), 7.04-7.10 (1H, m), 7.26-7.31 (1H, m), 7.53-7.55 (1H, m).
Reference production example 5
To a mixture of 3.0 g of 2-fluoro-3-methoxybenzaldehyde and 150 ml of chloroform was added 9.7 g of carbon tetrabromide and a triphenylphosphine-chloroform solution (a solution comprising 15.3 g of triphenylphosphine and 150 ml of chloroform) at 0 ° C. The solution was added dropwise successively and stirred at room temperature for 1 day. The reaction mixture was filtered through Celite (registered trademark), and the filtrate was concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 6.1 g of methyl (2-fluoro-3- (2,2-dibromoethenyl) phenyl) ether.
Methyl (2-fluoro-3- (2,2-dibromoethenyl) phenyl) ether
1 H-NMR (CDCl 3 ) δ: 3.89 (3H, s), 6.93-6.99 (1H, m), 7.04-7.10 (1H, m), 7.26-7.31 (1H, m), 7.53-7.55 (1H, m).
参考製造例6
メチル(2−フルオロ−3−(2,2−ジブロモエテニル)フェニル)エーテル6.1g及び水4mlをピロリジン40mlに加え、室温で1日間攪拌した。反応混合物を減圧下で濃縮し、残渣に希塩酸を加え酢酸エチルで抽出した。有機層を水及び飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥後、減圧下で濃縮してN−(2−(2−フルオロ−3−メトキシフェニル)アセチル)ピロリジン4.5gを得た。
N−(2−(2−フルオロ−3−メトキシフェニル)アセチル)ピロリジン
1H-NMR (CDCl3) δ: 1.41-1.62 (2H, m), 1.81-1.98 (2H, m), 3.37-3.59 (4H, m), 3.65-3.74 (2H, m), 3.88 (3H, s), 6.84-6.95 (2H, m), 6.99-7.05 (1H, m).
Reference production example 6
Methyl (2-fluoro-3- (2,2-dibromoethenyl) phenyl) ether (6.1 g) and water (4 ml) were added to pyrrolidine (40 ml), and the mixture was stirred at room temperature for 1 day. The reaction mixture was concentrated under reduced pressure, diluted hydrochloric acid was added to the residue, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure to give 4.5 g of N- (2- (2-fluoro-3-methoxyphenyl) acetyl) pyrrolidine. .
N- (2- (2-fluoro-3-methoxyphenyl) acetyl) pyrrolidine
1 H-NMR (CDCl 3 ) δ: 1.41-1.62 (2H, m), 1.81-1.98 (2H, m), 3.37-3.59 (4H, m), 3.65-3.74 (2H, m), 3.88 (3H, s), 6.84-6.95 (2H, m), 6.99-7.05 (1H, m).
参考製造例7
N−(2−(2−フルオロ−3−メトキシフェニル)アセチル)ピロリジン4.5g、10N塩酸3.0g及び水12gを1,4−ジオキサン15mlに加え、18時間加熱還流した。室温付近まで放冷した反応混合物を酢酸エチルで抽出し、有機層を水酸化ナトリウム水溶液で抽出した。得られた水層に塩酸を加え酸性にし、クロロホルムで抽出した。得られた有機層を無水硫酸マグネシウムで乾燥し、減圧下で濃縮し、得られた残渣をヘキサンで洗浄して、2−フルオロ−3−メトキシフェニル酢酸1.8gを得た。
2−フルオロ−3−メトキシフェニル酢酸
1H-NMR (CDCl3) δ: 3.71 (2H, d, J = 1.7 Hz), 3.88 (3H, s), 6.81-6.85 (1H, m), 6.88-6.93 (1H, m), 7.01-7.06 (1H, m).
Reference production example 7
4.5 g of N- (2- (2-fluoro-3-methoxyphenyl) acetyl) pyrrolidine, 3.0 g of 10N hydrochloric acid and 12 g of water were added to 15 ml of 1,4-dioxane, and the mixture was heated to reflux for 18 hours. The reaction mixture was allowed to cool to near room temperature and extracted with ethyl acetate, and the organic layer was extracted with aqueous sodium hydroxide. The resulting aqueous layer was acidified with hydrochloric acid and extracted with chloroform. The obtained organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure, and the resulting residue was washed with hexane to obtain 1.8 g of 2-fluoro-3-methoxyphenylacetic acid.
2-Fluoro-3-methoxyphenylacetic acid
1 H-NMR (CDCl 3 ) δ: 3.71 (2H, d, J = 1.7 Hz), 3.88 (3H, s), 6.81-6.85 (1H, m), 6.88-6.93 (1H, m), 7.01-7.06 (1H, m).
参考製造例8
3−ヒドロキシフェニル酢酸10g、tert−ブチルジメチルシリルクロリド、26g、炭酸カリウム27g及びDMF200mlの混合物を、室温で2時間、ついで80℃で4時間撹拌した。室温付近まで放冷した反応混合物に水を加え、MTBEで洗浄した。ついで水層に5%塩酸を加えてpH=3に調整し、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで乾燥し減圧下濃縮した。得られた残渣をヘキサンで洗浄し3−tert−ブチルジメチルシリルオキシフェニル酢酸15gを得た。
3−tert−ブチルジメチルシリルオキシフェニル酢酸
1H-NMR (CDCl3) δ: 0.19 (6H, s), 0.98 (9H, s), 3.57 (2H, s), 6.72-6.75 (1H, m), 6.79-6.80 (1H, m), 6.88 (1H, d, J = 7.6 Hz), 7.17 (1H, t, J = 7.9 Hz).
Reference production example 8
A mixture of 10 g of 3-hydroxyphenylacetic acid, tert-butyldimethylsilyl chloride, 26 g, 27 g of potassium carbonate and 200 ml of DMF was stirred at room temperature for 2 hours and then at 80 ° C. for 4 hours. Water was added to the reaction mixture allowed to cool to around room temperature, and the mixture was washed with MTBE. Subsequently, 5% hydrochloric acid was added to the aqueous layer to adjust to pH = 3, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was washed with hexane to obtain 15 g of 3-tert-butyldimethylsilyloxyphenylacetic acid.
3-tert-butyldimethylsilyloxyphenylacetic acid
1 H-NMR (CDCl 3 ) δ: 0.19 (6H, s), 0.98 (9H, s), 3.57 (2H, s), 6.72-6.75 (1H, m), 6.79-6.80 (1H, m), 6.88 (1H, d, J = 7.6 Hz), 7.17 (1H, t, J = 7.9 Hz).
次に製剤例を示す。なお、部は重量部を表す。 Next, formulation examples are shown. In addition, a part represents a weight part.
製剤例1
本発明化合物(1)〜(20)50部、リグニンスルホン酸カルシウム 3部、ラウリル硫酸マグネシウム 2部及び合成含水酸化珪素 45部をよく粉砕混合することにより、水和剤を得る。
Formulation Example 1
The wettable powder is obtained by thoroughly pulverizing and mixing 50 parts of the present compounds (1) to (20), 3 parts of calcium lignin sulfonate, 2 parts of magnesium lauryl sulfate and 45 parts of synthetic hydrous silicon oxide.
製剤例2
本発明化合物(1)〜(20)20部とソルビタントリオレエ−ト 1.5部とを、ポリビニルアルコ−ル 2部を含む水溶液 28.5部と混合し、湿式粉砕法で微粉砕した後、この中に、キサンタンガム 0.05部及びアルミニウムマグネシウムシリケ−ト 0.1部を含む水溶液 40部を加え、さらにプロピレングリコ−ル 10部を加えて攪拌混合し、フロアブル製剤を得る。
Formulation Example 2
After 20 parts of the present compounds (1) to (20) and 1.5 parts of sorbitan trioleate are mixed with 28.5 parts of an aqueous solution containing 2 parts of polyvinyl alcohol and pulverized by a wet pulverization method. Into this, 40 parts of an aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added, and further 10 parts of propylene glycol is added and mixed by stirring to obtain a flowable preparation.
製剤例3
本発明化合物(1)〜(20)2部、カオリンクレー 88部及びタルク 10部をよく粉砕混合することにより、粉剤を得る。
Formulation Example 3
By thoroughly pulverizing and mixing 2 parts of the compounds (1) to (20) of the present invention, 88 parts of kaolin clay and 10 parts of talc, a powder is obtained.
製剤例4
本発明化合物(1)〜(20)5部、ポリオキシエチレンスチリルフェニルエ−テル 14部、ドデシルベンゼンスルホン酸カルシウム 6部及びキシレン 75部をよく混合することにより、乳剤を得る。
Formulation Example 4
By thoroughly mixing 5 parts of the compounds (1) to (20) of the present invention, 14 parts of polyoxyethylene styryl phenyl ether, 6 parts of calcium dodecylbenzenesulfonate and 75 parts of xylene, an emulsion is obtained.
製剤例5
本発明化合物(1)〜(20)2部、合成含水酸化珪素 1部、リグニンスルホン酸カルシウム 2部、ベントナイト 30部及びカオリンクレー 65部をよく粉砕混合した後、水を加えてよく練り合せ、造粒乾燥することにより、粒剤を得る。
Formulation Example 5
2 parts of the present compounds (1) to (20), 1 part of synthetic hydrous silicon oxide, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65 parts of kaolin clay, and then kneaded well with water, Granules are obtained by granulating and drying.
製剤例6
本発明化合物(1)〜(20)10部、ポリオキシエチレンアルキルエーテルサルフェートアンモニウム塩 50部を含むホワイトカーボン 35部及び水 55部を混合し、湿式粉砕法で微粉砕することにより、製剤を得る。
Formulation Example 6
This invention compound (1)-(20) 10 parts, polyoxyethylene alkyl ether sulfate ammonium salt 50 parts of white carbon 35 parts and water 55 parts are mixed, and a formulation is obtained by pulverizing by a wet grinding method. .
次に、本発明化合物が植物病害の防除に有用であることを試験例で示す。
なお防除効果は、調査時の供試植物上の病斑の面積を目視観察し、本発明化合物を処理
した植物の病斑の面積と、無処理の植物の病斑の面積を比較することにより評価した。
Next, test examples show that the compounds of the present invention are useful for controlling plant diseases.
The control effect is obtained by visually observing the area of the lesion on the test plant at the time of the survey, and comparing the area of the lesion on the plant treated with the compound of the present invention and the area of the lesion on the untreated plant. evaluated.
試験例1
プラスチックポットに砂壌土を詰め、キュウリ(品種;相模半白)を播種し、温室内で
12日間生育させた。本発明化合物(1)〜(5),(7)〜(13),(17),(18)及び(19)を製剤例6に準じて製剤とした後、水で有効成分の濃度が500ppmになるように希釈した。上記キュウリ葉面に充分付着するように茎葉散布した。散布後植物を風乾し、キュウリ菌核病菌(Sclerotinia sclerotiorum)の菌糸含有PDA培地をキュウリ葉面上に置いた。接種後18℃、多湿下に4日間置いた後、病斑面積を調査した。その結果、本発明化合物(1)〜(5),(7)〜(13),(17),(18)及び(19)を処理した植物における病斑面積は、無処理の植物における病斑面積の10%以下であった。
Test example 1
A plastic pot was filled with sandy loam, cucumber (variety: Sagamihanjiro) was sown and grown in a greenhouse for 12 days. The compounds (1) to (5), (7) to (13), (17), (18) and (19) of the present invention were formulated according to Formulation Example 6, and the concentration of the active ingredient was 500 ppm with water. Diluted to The foliage was sprayed so as to adhere well to the cucumber leaf surface. After spraying, the plants were air-dried, and a mycelia-containing PDA medium of cucumber sclerotia bacterium was placed on the cucumber leaf surface. After the inoculation, the lesion area was examined after being placed at 18 ° C. under high humidity for 4 days. As a result, the lesion area in the plant treated with the compounds (1) to (5), (7) to (13), (17), (18) and (19) of the present invention is the lesion spot in the untreated plant. It was 10% or less of the area.
試験例2
プラスチックポットに砂壌土を詰め、キュウリ(品種;相模半白)を播種し、温室内で
12日間生育させた。本発明化合物(14),(15)及び(16)を製剤例6に準じて製剤とした後、水で有効成分の濃度が200ppmになるように希釈した。上記キュウリ葉面に充分付着するように茎葉散布した。散布後植物を風乾し、キュウリ菌核病菌(Sclerotinia sclerotiorum)の菌糸含有PDA培地をキュウリ葉面上に置いた。接種後18℃、多湿下に4日間置いた後、病斑面積を調査した。その結果、本発明化合物(14),(15)及び(16)を処理した植物における病斑面積は、無処理の植物における病斑面積の10%以下であった。
Test example 2
A plastic pot was filled with sandy loam, cucumber (variety: Sagamihanjiro) was sown and grown in a greenhouse for 12 days. The compounds (14), (15) and (16) of the present invention were formulated according to Formulation Example 6 and then diluted with water so that the concentration of the active ingredient was 200 ppm. The foliage was sprayed so as to adhere well to the cucumber leaf surface. After spraying, the plants were air-dried, and a mycelia-containing PDA medium of cucumber sclerotia bacterium was placed on the cucumber leaf surface. After the inoculation, the lesion area was examined after being placed at 18 ° C. under high humidity for 4 days. As a result, the lesion area in the plant treated with the compounds (14), (15) and (16) of the present invention was 10% or less of the lesion area in the untreated plant.
試験例3
プラスチックポットに砂壌土を詰め、キュウリ(品種;相模半白)を播種し、温室内で12日間生育させた。本発明化合物(1),(7),(10),(11)及び(12)を製剤例6に準じて製剤とした後、水で有効成分濃度が500ppmになるように希釈した。この希釈液を上記キュウリ葉面に充分付着するように茎葉散布した。散布後植物を風乾し、キュウリ灰色かび病菌(Botrytis cinerea)の胞子含有PDA培地をキュウリ葉面上に置いた。接種後12℃、多湿下に5日間置いた後、病斑面積を調査した。その結果、本発明化合物(1),(7),(10),(11)及び(12)を処理した植物における病斑面積は、無処理の植物における病斑面積の10%以下であった。
Test example 3
A plastic pot was filled with sandy loam, cucumber (variety: Sagamihanjiro) was sown and grown in a greenhouse for 12 days. The compounds (1), (7), (10), (11) and (12) of the present invention were formulated according to Formulation Example 6 and then diluted with water so that the active ingredient concentration was 500 ppm. This diluted solution was sprayed on the foliage so as to adhere well to the cucumber leaf surface. After spraying, the plants were air-dried, and a spore-containing PDA medium of Botrytis cinerea was placed on the cucumber leaf surface. After inoculation, the lesion area was examined after 5 days in a humid environment at 12 ° C. As a result, the lesion area in the plant treated with the compounds (1), (7), (10), (11) and (12) of the present invention was 10% or less of the lesion area in the untreated plant. .
試験例4
プラスチックポットに砂壌土を詰め、キュウリ(品種;相模半白)を播種し、温室内で12日間生育させた。本発明化合物(15)及び(16)を製剤例6に準じて製剤とした後、水で有効成分濃度が200ppmになるように希釈した。この希釈液を上記キュウリ葉面に充分付着するように茎葉散布した。散布後植物を風乾し、キュウリ灰色かび病菌(Botrytis cinerea)の胞子含有PDA培地をキュウリ葉面上に置いた。接種後12℃、多湿下に5日間置いた後、病斑面積を調査した。その結果、本発明化合物(15)及び(16)を処理した植物における病斑面積は、無処理の植物における病斑面積の30%以下であった。
Test example 4
A plastic pot was filled with sandy loam, cucumber (variety: Sagamihanjiro) was sown and grown in a greenhouse for 12 days. The compounds (15) and (16) of the present invention were formulated according to Formulation Example 6 and then diluted with water so that the active ingredient concentration was 200 ppm. This diluted solution was sprayed on the foliage so as to adhere well to the cucumber leaf surface. After spraying, the plants were air-dried, and a spore-containing PDA medium of Botrytis cinerea was placed on the cucumber leaf surface. After inoculation, the lesion area was investigated after 5 days in a humid environment at 12 ° C. As a result, the lesion area in the plant treated with the compounds (15) and (16) of the present invention was 30% or less of the lesion area in the untreated plant.
試験例5
プラスチックポットに床土を詰め、イネ(品種;日本晴)を播種し、温室内で12日間育成させた。本発明化合物(2)及び(7)を製剤例6に準じて製剤とした後、水で有効成分濃度が500ppmになるように希釈した。この希釈液を上記イネの葉面に充分付着するように茎葉散布した。散布後植物を風乾し、散布した植物の周囲にイネいもち病(Magnaporthe grisea)罹病葉を有するポットを静置した。全てのイネは夜間のみ多湿下におき、接種5日後、病斑面積を調査した。その結果、本発明化合物(2)及び(7)を処理した植物における病斑面積は、無処理の植物における病斑面積の10%以下であった。
Test Example 5
A plastic pot was filled with floor soil, rice (variety: Nipponbare) was sown, and grown in a greenhouse for 12 days. The compounds (2) and (7) of the present invention were formulated according to Formulation Example 6 and then diluted with water so that the active ingredient concentration was 500 ppm. This diluted solution was sprayed on the foliage so as to adhere sufficiently to the leaf surface of the rice. After spraying, the plants were air-dried, and a pot having rice blast (Magnaporthe grisea) diseased leaves was left around the sprayed plants. All the rice plants were placed under high humidity only at night, and the lesion area was examined 5 days after the inoculation. As a result, the lesion area in the plant treated with the compounds (2) and (7) of the present invention was 10% or less of the lesion area in the untreated plant.
Claims (13)
〔式中、R1は水素原子又はフッ素原子を表し、R2はC1−C6直鎖アルキル基又は直鎖式の(C1−C2アルコキシ)C2−C5アルキル基を表す。〕
で示されるアミド化合物。 Formula (I)
[Wherein, R 1 represents a hydrogen atom or a fluorine atom, and R 2 represents a C1-C6 linear alkyl group or a linear (C1-C2 alkoxy) C2-C5 alkyl group. ]
An amide compound represented by
〔式中、R1は水素原子又はフッ素原子を表す。〕
で示されるアミド化合物。 Formula (II)
[Wherein, R 1 represents a hydrogen atom or a fluorine atom. ]
An amide compound represented by
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009192909A JP2010077117A (en) | 2008-08-26 | 2009-08-24 | Amide compound and application thereof for plant disease control |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008216360 | 2008-08-26 | ||
| JP2008216361 | 2008-08-26 | ||
| JP2008216359 | 2008-08-26 | ||
| JP2009192909A JP2010077117A (en) | 2008-08-26 | 2009-08-24 | Amide compound and application thereof for plant disease control |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2010077117A true JP2010077117A (en) | 2010-04-08 |
Family
ID=41385361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009192909A Pending JP2010077117A (en) | 2008-08-26 | 2009-08-24 | Amide compound and application thereof for plant disease control |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2010077117A (en) |
| AR (1) | AR073201A1 (en) |
| WO (1) | WO2010024365A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011246460A (en) * | 2010-04-28 | 2011-12-08 | Sumitomo Chemical Co Ltd | Pesticidal composition and use thereof |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2603614T3 (en) | 2010-04-27 | 2017-02-28 | Sumitomo Chemical Company, Limited | Pesticide composition and its use |
| WO2011135827A1 (en) | 2010-04-27 | 2011-11-03 | Sumitomo Chemical Company, Limited | Pesticidal composition and its use |
| JP5712504B2 (en) | 2010-04-27 | 2015-05-07 | 住友化学株式会社 | Pest control composition and use thereof |
| JP5782678B2 (en) | 2010-04-27 | 2015-09-24 | 住友化学株式会社 | Pest control composition and use thereof |
| WO2011135835A1 (en) | 2010-04-28 | 2011-11-03 | Sumitomo Chemical Company, Limited | Plant disease control composition and its use |
| JP5724211B2 (en) | 2010-04-28 | 2015-05-27 | 住友化学株式会社 | Plant disease control composition and use thereof |
| JP5724210B2 (en) | 2010-04-28 | 2015-05-27 | 住友化学株式会社 | Plant disease control composition and use thereof |
| CN102858172A (en) | 2010-04-28 | 2013-01-02 | 住友化学株式会社 | Plant disease control composition and its use |
| JP5724212B2 (en) | 2010-04-28 | 2015-05-27 | 住友化学株式会社 | Plant disease control composition and use thereof |
| JP5789918B2 (en) | 2010-04-28 | 2015-10-07 | 住友化学株式会社 | Plant disease control composition and use thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1669348A4 (en) * | 2003-09-30 | 2009-03-11 | Eisai R&D Man Co Ltd | Novel antifungal agent comprising heterocyclic compound |
| ES2325523B1 (en) * | 2007-03-22 | 2010-06-24 | Sumitomo Chemical Company, Limited | AGRICULTURAL COMPOSITION TO CONTROL OR PREVENT DISEASES OF PLANTS CAUSED BY PATHOGRAPHIC MICROBIES OF PLANTS. |
-
2009
- 2009-08-21 WO PCT/JP2009/065022 patent/WO2010024365A1/en not_active Ceased
- 2009-08-24 JP JP2009192909A patent/JP2010077117A/en active Pending
- 2009-08-24 AR ARP090103247 patent/AR073201A1/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011246460A (en) * | 2010-04-28 | 2011-12-08 | Sumitomo Chemical Co Ltd | Pesticidal composition and use thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| AR073201A1 (en) | 2010-10-20 |
| WO2010024365A1 (en) | 2010-03-04 |
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