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JP2010059242A - Epoxy resin curable composition, resin varnish, prepreg, metal-clad laminate, and cured product - Google Patents

Epoxy resin curable composition, resin varnish, prepreg, metal-clad laminate, and cured product Download PDF

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JP2010059242A
JP2010059242A JP2008223674A JP2008223674A JP2010059242A JP 2010059242 A JP2010059242 A JP 2010059242A JP 2008223674 A JP2008223674 A JP 2008223674A JP 2008223674 A JP2008223674 A JP 2008223674A JP 2010059242 A JP2010059242 A JP 2010059242A
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JP5243151B2 (en
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Toshiyuki Otake
敏之 大竹
Minoru Sato
実 佐藤
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Asahi Kasei Corp
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Asahi Kasei E Materials Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an epoxy resin curable composition with both of low linear expansion and solder temperature resistance, and suitable for a print wiring board, etc., and to provide a resin varnish, a prepreg, a metal-clad laminate and a cured product using the composition. <P>SOLUTION: This epoxy resin curable composition includes a compound of a specific structure having a quinoxaline structure, and a phenolic hydroxyl group or an epoxy group. The resin varnish, the prepreg, the metal-clad laminate and the cured product using the composition are also disclosed. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、キノキサリン構造を有する特定構造の化合物を含有するエポキシ樹脂硬化性組成物、これを用いた樹脂ワニス、プリプレグ、金属張積層板及び硬化物に関する。   The present invention relates to an epoxy resin curable composition containing a compound having a specific structure having a quinoxaline structure, a resin varnish, a prepreg, a metal-clad laminate and a cured product using the same.

電気電子製品などに用いられるプリント配線板には、その特性からエポキシ樹脂が広く用いられている。近年、プリント配線板の薄層化に伴う、プリント配線板の反りが問題となっている。反り低減の方策として、エポキシ樹脂の低線膨張化が挙げられる。また、近年、はんだの鉛フリー化が推し進められており、はんだ加工温度が比較的高い非鉛含有はんだの利用が増加しつつある。そこで、はんだ加工時の熱による品質劣化を防止するために、はんだ耐熱性に優れたプリント配線板が求められている。   Epoxy resins are widely used for printed wiring boards used for electrical and electronic products because of their characteristics. In recent years, warpage of a printed wiring board has become a problem as the printed wiring board becomes thinner. As a measure for reducing the warpage, there is a low linear expansion of the epoxy resin. In recent years, lead-free solder has been promoted, and the use of lead-free solder having a relatively high soldering temperature is increasing. Therefore, in order to prevent quality deterioration due to heat during soldering, a printed wiring board having excellent solder heat resistance is required.

エポキシ樹脂としてはビスフェノールAのジグリシジルエーテル等が汎用品として広く一般的に知られており、硬化剤としてはフェノールノボラック等のポリフェノール化合物やジシアンジアミドが汎用品として広く一般的に知られている。   As an epoxy resin, diglycidyl ether of bisphenol A is widely known as a general-purpose product, and as a curing agent, a polyphenol compound such as phenol novolak or dicyandiamide is widely known as a general-purpose product.

非特許文献1には、種々のエポキシ樹脂硬化性組成物が記載されている。特許文献1、2には、種々のエポキシ樹脂を含有する低線膨張性エポキシ樹脂硬化性組成物が記載されている。しかしながら、これら従来のエポキシ樹脂硬化性組成物においては、加工性や引張強度等の物性を悪化させる無機フィラーが必要である等、その物性において充分な性能を得ることはできなかった。   Non-Patent Document 1 describes various epoxy resin curable compositions. Patent Documents 1 and 2 describe low linear expansion epoxy resin curable compositions containing various epoxy resins. However, in these conventional epoxy resin curable compositions, an inorganic filler that deteriorates physical properties such as workability and tensile strength is required, and thus sufficient performance in physical properties cannot be obtained.

特許文献3,4には、種々のエポキシ樹脂を含有する高耐熱性エポキシ樹脂硬化性組成物が記載されている。しかしながら、これら従来のエポキシ樹脂硬化性組成物においては、線膨張係数等、その物性において充分な性能を得ることはできなかった。   Patent Documents 3 and 4 describe highly heat-resistant epoxy resin curable compositions containing various epoxy resins. However, in these conventional epoxy resin curable compositions, sufficient performance in physical properties such as a coefficient of linear expansion could not be obtained.

特開2004−335661号公報JP 2004-335661 A 特開2004−359853号公報JP 2004-359853 A 特開2001−233945号公報JP 2001-233945 A 特開2001−278946号公報JP 2001-278946 A 「総説エポキシ樹脂」第1巻p.58、61、62、148〜150 エポキシ樹脂技術協会編“Review Epoxy Resin” Volume 1 p. 58, 61, 62, 148-150 Epoxy Resin Technology Association

本発明は、低線膨張性、高はんだ耐熱性等の優れた物性を有し、例えばプリント配線板用として好適な、エポキシ樹脂硬化性組成物、並びにそれを用いた樹脂ワニス、プリプレグ、金属張積層板及び硬化物の提供を課題とする。   The present invention has excellent physical properties such as low linear expansion and high solder heat resistance, and is suitable for use as, for example, a printed wiring board, as well as a resin varnish, prepreg, and metal-clad using the same. It is an object to provide a laminate and a cured product.

本発明者等は、前記課題を解決するために鋭意検討を行った結果、キノキサリン構造を有するフェノール化合物をエポキシ樹脂の硬化剤として用いるか、キノキサリン構造を有するエポキシ樹脂を用いることにより、線膨張係数、耐熱性等の物性に優れるエポキシ樹脂硬化性組成物を得られることを見出し、本発明を完成するに至った。   As a result of intensive studies to solve the above problems, the present inventors have used a phenol compound having a quinoxaline structure as a curing agent for an epoxy resin, or by using an epoxy resin having a quinoxaline structure. The present inventors have found that an epoxy resin curable composition having excellent physical properties such as heat resistance can be obtained and completed the present invention.

すなわち本発明は、下記一般式(1)で表される化合物を含有することを特徴としたエポキシ樹脂硬化性組成物を提供する。   That is, this invention provides the epoxy resin curable composition characterized by containing the compound represented by following General formula (1).

Figure 2010059242
Figure 2010059242

(式中、X1及びX2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜12の炭化水素基、置換基を有してもよい炭素原子数1〜12のアルコキシ基、置換基を有してもよい炭素原子数1〜12のアミノ基、置換基を有してもよい炭素原子数1〜12のアミド基又は水素原子を表し、X1及びX2のいずれか一方又は両方は、フェノール性水酸基又はエポキシ基を有する。X1及びX2は互いに架橋していてもよく、その場合、X1及びX2が互いに架橋した構造は、飽和又は不飽和の炭素原子数3〜8の環構造であり、かつフェノール性水酸基又はエポキシ基を有する。Y1及びY2は、それぞれ独立し、フェノール性水酸基若しくはエポキシ基を有する置換基で置換された炭素原子数1〜12の炭化水素基、炭素原子数1〜12のアルコキシ基、炭素原子数1〜12のアミノ基、炭素原子数1〜12のアミド基、水酸基又は水素原子を表す。Y1及びY2は互いに架橋していてもよく、その場合、Y1及びY2が互いに架橋した構造は、飽和又は不飽和の炭素原子数3〜15の環構造であり、かつフェノール性水酸基又はエポキシ基を有する。Z1及びZ2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子を表す。mは0〜3の整数を表し、mが2〜3の場合、複数のZ1は同一でも異なっていてもよい。nは0〜2の整数を表す。) (Wherein, X 1 and X 2 are each independently an optionally substituted hydrocarbon group having 1 to 12 carbon atoms, substituent a good carbon atoms of 1 to 12 alkoxy which may have Represents a group, an amino group having 1 to 12 carbon atoms which may have a substituent, an amide group having 1 to 12 carbon atoms which may have a substituent, or a hydrogen atom, and any one of X 1 and X 2 Either or both have a phenolic hydroxyl group or an epoxy group, and X 1 and X 2 may be cross-linked with each other, in which case the structure in which X 1 and X 2 are cross-linked with each other is a saturated or unsaturated carbon. It is a ring structure having 3 to 8 atoms and has a phenolic hydroxyl group or an epoxy group, and Y 1 and Y 2 are each independently 1 carbon atom substituted with a substituent having a phenolic hydroxyl group or an epoxy group. -12 hydrocarbon group, C 1-12 a Kokishi group, an amino group having 1 to 12 carbon atoms, an amide group having 1 to 12 carbon atoms, .Y 1 and Y 2 represents a hydroxyl group or a hydrogen atom may be crosslinked each other, in which case, Y 1 and The structure in which Y 2 is cross-linked with each other is a saturated or unsaturated ring structure having 3 to 15 carbon atoms and has a phenolic hydroxyl group or an epoxy group, and Z 1 and Z 2 are each independently a substituent. An optionally substituted hydrocarbon group having 1 to 8 carbon atoms or an optionally substituted alkoxy group having 1 to 8 carbon atoms or a hydrogen atom, m represents an integer of 0 to 3; Is 2 or 3, the plurality of Z 1 may be the same or different, and n represents an integer of 0 to 2.)

また本発明は、下記一般式(2)で表される化合物を含有する上記エポキシ樹脂硬化性組成物を提供する。   Moreover, this invention provides the said epoxy resin curable composition containing the compound represented by following General formula (2).

Figure 2010059242
Figure 2010059242

(式中、R1及びR2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜12の炭化水素基、置換基を有してもよい炭素原子数1〜12のアルコキシ基、置換基を有してもよい炭素原子数1〜12のアミノ基、置換基を有してもよい炭素原子数1〜12のアミド基又は水素原子を表し、R1及びR2のいずれか一方又は両方は、フェノール性水酸基又はエポキシ基を有する。Y1及びY2は、それぞれ独立し、フェノール性水酸基若しくはエポキシ基を有する置換基で置換された炭素原子数1〜12の炭化水素基、炭素原子数1〜12のアルコキシ基、炭素原子数1〜12のアミノ基、炭素原子数1〜12のアミド基、水酸基又は水素原子を表す。Y1及びY2は互いに架橋していてもよく、その場合、Y1及びY2が互いに架橋した構造は、飽和又は不飽和の炭素原子数3〜15の環構造であり、かつフェノール性水酸基又はエポキシ基を有する。Z1及びZ2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子を表す。mは0〜3の整数を表し、mが2〜3の場合、複数のZ1は同一でも異なっていてもよい。nは0〜2の整数を表す。) Wherein R 1 and R 2 are each independently a hydrocarbon group having 1 to 12 carbon atoms which may have a substituent, or an alkoxy having 1 to 12 carbon atoms which may have a substituent. Represents a group, an amino group having 1 to 12 carbon atoms which may have a substituent, an amide group having 1 to 12 carbon atoms which may have a substituent, or a hydrogen atom, and any one of R 1 and R 2 Either or both have a phenolic hydroxyl group or an epoxy group, and Y 1 and Y 2 are each independently a hydrocarbon group having 1 to 12 carbon atoms substituted with a substituent having a phenolic hydroxyl group or an epoxy group. Represents an alkoxy group having 1 to 12 carbon atoms, an amino group having 1 to 12 carbon atoms, an amide group having 1 to 12 carbon atoms, a hydroxyl group, or a hydrogen atom, and Y 1 and Y 2 may be cross-linked to each other. good, in which case, Y 1 and Y 2 are crosslinked with one another structure A saturated or unsaturated ring structure of 3 to 15 carbon atoms, and .Z 1 and Z 2 having a phenolic hydroxyl group or epoxy group, each independently, optionally carbon atoms which may have a substituent 1 to 8 hydrocarbon group or an optionally substituted alkoxy group having 1 to 8 carbon atoms or a hydrogen atom, m represents an integer of 0 to 3, and when m is 2 to 3, Z 1 may be the same or different, and n represents an integer of 0 to 2.)

また本発明は、下記一般式(3)で表される化合物を含有する上記エポキシ樹脂硬化性組成物を提供する。   Moreover, this invention provides the said epoxy resin curable composition containing the compound represented by following General formula (3).

Figure 2010059242
Figure 2010059242

(式中、X1及びX2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜12の炭化水素基、置換基を有してもよい炭素原子数1〜12のアルコキシ基、置換基を有してもよい炭素原子数1〜12のアミノ基、置換基を有してもよい炭素原子数1〜12のアミド基又は水素原子を表し、X1及びX2のいずれか一方又は両方は、フェノール性水酸基又はエポキシ基を有する。nは、0〜2の整数を表す。Z1及びZ2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子を表す。W1及びW2のいずれか一方はグリシジルオキシ基又はフェノール性水酸基を有する基を表し、もう一方は水素原子を有する基を表し、nが0の場合、W1及びW2のいずれか一方は炭素原子数0〜7のフェノール性水酸基又はエポキシ基を有する置換基を表してもよい。) (Wherein, X 1 and X 2 are each independently an optionally substituted hydrocarbon group having 1 to 12 carbon atoms, substituent a good carbon atoms of 1 to 12 alkoxy which may have group, an amino group which may 1 to 12 carbon atoms which may have a substituent, an amide group or a hydrogen atom may 1 to 12 carbon atoms which may have a substituent, any of X 1 and X 2 Either or both have a phenolic hydroxyl group or an epoxy group, n represents an integer of 0 to 2. Z 1 and Z 2 are each independently 1 to 1 carbon atoms which may have a substituent. 8 represents an alkoxy group having 1 to 8 carbon atoms or a hydrogen atom which may have a hydrocarbon group or a substituent, and one of W 1 and W 2 represents a group having a glycidyloxy group or a phenolic hydroxyl group. represents and the other represents a group having a hydrogen atom, when n is 0, W 1 and W 2 One may represent a substituent having a phenolic hydroxyl group or epoxy group having a carbon number of 0-7.)

また本発明は、下記一般式(4)で表される化合物を含有する上記エポキシ樹脂硬化性組成物を提供する。   Moreover, this invention provides the said epoxy resin curable composition containing the compound represented by following General formula (4).

Figure 2010059242
Figure 2010059242

(式中、Bは、水素原子又はグリシジル基を表す。) (In the formula, B represents a hydrogen atom or a glycidyl group.)

また本発明は、下記一般式(5)で表される化合物を含有する上記エポキシ樹脂硬化性組成物を提供する。   Moreover, this invention provides the said epoxy resin curable composition containing the compound represented by following General formula (5).

Figure 2010059242
Figure 2010059242

(式中、Bは、水素原子又はグリシジル基を表す。) (In the formula, B represents a hydrogen atom or a glycidyl group.)

また本発明は、下記一般式(6)で表される化合物を含有する上記エポキシ樹脂硬化性組成物を提供する。   Moreover, this invention provides the said epoxy resin curable composition containing the compound represented by following General formula (6).

Figure 2010059242
Figure 2010059242

(式中、Bは、水素原子又はグリシジル基を表す。) (In the formula, B represents a hydrogen atom or a glycidyl group.)

また本発明は、下記一般式(7)で表される化合物を含有する上記エポキシ樹脂硬化性組成物を提供する。   Moreover, this invention provides the said epoxy resin curable composition containing the compound represented by following General formula (7).

Figure 2010059242
Figure 2010059242

(式中、Bは、水素原子又はグリシジル基を表す。) (In the formula, B represents a hydrogen atom or a glycidyl group.)

また本発明は、上記エポキシ樹脂硬化性組成物と、有機溶剤とを含有する樹脂ワニスを提供する。   Moreover, this invention provides the resin varnish containing the said epoxy resin curable composition and the organic solvent.

また本発明は、上記樹脂ワニスをガラス織布又はガラス不織布又は有機繊維織布に含浸した後に加熱して得られるプリプレグを提供する。   Moreover, this invention provides the prepreg obtained by heating, after impregnating the said resin varnish in a glass woven fabric, a glass nonwoven fabric, or an organic fiber woven fabric.

また本発明は、上記プリプレグと金属箔とが積層されてなる金属張積層板を提供する。   The present invention also provides a metal-clad laminate in which the prepreg and metal foil are laminated.

また本発明は、上記エポキシ樹脂硬化性組成物又は上記樹脂ワニスを硬化させてなる硬化物を提供する。   Moreover, this invention provides the hardened | cured material formed by hardening | curing the said epoxy resin curable composition or the said resin varnish.

本発明によれば、低い線膨張係数及び高いはんだ耐熱性等の優れた物性を有するエポキシ樹脂硬化性組成物、並びにこれを用いた樹脂ワニス、プリプレグ、金属張積層板及び硬化物を提供することができる。   According to the present invention, an epoxy resin curable composition having excellent physical properties such as a low coefficient of linear expansion and high solder heat resistance, and a resin varnish, prepreg, metal-clad laminate and cured product using the same are provided. Can do.

以下、本発明について具体的に説明する。   Hereinafter, the present invention will be specifically described.

本発明のエポキシ樹脂硬化性組成物は、下記一般式(1)で表される化合物を含有する。   The epoxy resin curable composition of this invention contains the compound represented by following General formula (1).

Figure 2010059242
Figure 2010059242

(式中、X1及びX2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜12の炭化水素基、置換基を有してもよい炭素原子数1〜12のアルコキシ基、置換基を有してもよい炭素原子数1〜12のアミノ基、置換基を有してもよい炭素原子数1〜12のアミド基又は水素原子を表し、X1及びX2のいずれか一方又は両方は、フェノール性水酸基又はエポキシ基を有する。X1及びX2は互いに架橋していてもよく、その場合、X1及びX2が互いに架橋した構造は、飽和又は不飽和の炭素原子数3〜8の環構造であり、かつフェノール性水酸基又はエポキシ基を有する。Y1及びY2は、それぞれ独立し、フェノール性水酸基若しくはエポキシ基を有する置換基で置換された炭素原子数1〜12の炭化水素基、炭素原子数1〜12のアルコキシ基、炭素原子数1〜12のアミノ基、炭素原子数1〜12のアミド基、水酸基又は水素原子を表す。Y1及びY2は互いに架橋していてもよく、その場合、Y1及びY2が互いに架橋した構造は、飽和又は不飽和の炭素原子数3〜15の環構造であり、かつフェノール性水酸基又はエポキシ基を有する。Z1及びZ2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子を表す。mは0〜3の整数を表し、mが2〜3の場合、複数のZ1は同一でも異なっていてもよい。nは0〜2の整数を表す。) (Wherein, X 1 and X 2 are each independently an optionally substituted hydrocarbon group having 1 to 12 carbon atoms, substituent a good carbon atoms of 1 to 12 alkoxy which may have Represents a group, an amino group having 1 to 12 carbon atoms which may have a substituent, an amide group having 1 to 12 carbon atoms which may have a substituent, or a hydrogen atom, and any one of X 1 and X 2 Either or both have a phenolic hydroxyl group or an epoxy group, and X 1 and X 2 may be cross-linked with each other, in which case the structure in which X 1 and X 2 are cross-linked with each other is a saturated or unsaturated carbon. It is a ring structure having 3 to 8 atoms and has a phenolic hydroxyl group or an epoxy group, and Y 1 and Y 2 are each independently 1 carbon atom substituted with a substituent having a phenolic hydroxyl group or an epoxy group. -12 hydrocarbon group, C 1-12 a Kokishi group, an amino group having 1 to 12 carbon atoms, an amide group having 1 to 12 carbon atoms, .Y 1 and Y 2 represents a hydroxyl group or a hydrogen atom may be crosslinked each other, in which case, Y 1 and The structure in which Y 2 is cross-linked with each other is a saturated or unsaturated ring structure having 3 to 15 carbon atoms and has a phenolic hydroxyl group or an epoxy group, and Z 1 and Z 2 are each independently a substituent. An optionally substituted hydrocarbon group having 1 to 8 carbon atoms or an optionally substituted alkoxy group having 1 to 8 carbon atoms or a hydrogen atom, m represents an integer of 0 to 3; Is 2 or 3, the plurality of Z 1 may be the same or different, and n represents an integer of 0 to 2.)

上記一般式(1)中、X1及びX2のいずれか一方又は両方が有する、フェノール性水酸基を有する基としては、水酸基又はo−ヒドロキシフェニル基又はm−ヒドロキシフェニル基又はp−ヒドロキシフェニル基が好ましい。 In the general formula (1), either one or both of X 1 and X 2 has a phenolic hydroxyl group, such as a hydroxyl group, an o-hydroxyphenyl group, an m-hydroxyphenyl group, or a p-hydroxyphenyl group. Is preferred.

上記一般式(1)中、X1及びX2のいずれか一方又は両方が有する、エポキシ基を有する基としては、例えば、エポキシ基、グリシジル基、脂環式エポキシ基、グリシジルオキシ基、及びこれらを置換基として有するアルコキシ基、アミノ基、アミド基等が挙げられ、グリシジルオキシ基又はo−グリシジルオキシフェニル基又はm−グリシジルオキシフェニル基又はp−グリシジルオキシフェニル基が好ましい。 In the general formula (1), examples of the group having an epoxy group which one or both of X 1 and X 2 have include an epoxy group, a glycidyl group, an alicyclic epoxy group, a glycidyloxy group, and these. An alkoxy group, an amino group, an amide group, and the like having a substituent as glycidyloxy group, o-glycidyloxyphenyl group, m-glycidyloxyphenyl group, or p-glycidyloxyphenyl group are preferable.

上記一般式(1)中、X1又はX2のうちエポキシ基及びフェノール性水酸基を有さない基としては、例えば、置換基を有してもよい炭素原子数1〜12の炭化水素基又は置換基を有してもよい炭素原子数1〜12のアルコキシ基又は置換基を有してもよい炭素原子数1〜12のアミノ基又は置換基を有してもよい炭素原子数1〜12のアミド基又はフェニル基又は水素原子が挙げられ、はんだ耐熱性、溶解性等の物性の点から、フェニル基又は水素原子が好ましい。 In said general formula (1), as a group which does not have an epoxy group and a phenolic hydroxyl group among X < 1 > or X < 2 >, for example, a C1-C12 hydrocarbon group which may have a substituent or C1-C12 alkoxy group which may have a substituent or C1-C12 amino group which may have a substituent or C1-C12 which may have a substituent In view of physical properties such as solder heat resistance and solubility, a phenyl group or a hydrogen atom is preferable.

上記一般式(1)中、Y1及びY2としては、はんだ耐熱性、溶解性等の物性の点から、水酸基、グリシジルオキシ基が好ましい。 In the general formula (1), the Y 1 and Y 2, solder heat resistance, from the viewpoint of physical properties such as solubility, hydroxyl, glycidyl oxy group.

上記一般式(1)中、Z1及びZ2は、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子であればよいが、はんだ耐熱性、溶解性等の物性の点から、フェニル基、水素原子、メチル基、エチル基が好ましい。 In the general formula (1), Z 1 and Z 2 are each a hydrocarbon group having 1 to 8 carbon atoms which may have a substituent or an alkoxy having 1 to 8 carbon atoms which may have a substituent. Although it may be a group or a hydrogen atom, a phenyl group, a hydrogen atom, a methyl group, or an ethyl group is preferable from the viewpoint of physical properties such as solder heat resistance and solubility.

上記一般式(1)中、mは0〜3の整数であり、はんだ耐熱性、溶解性等の点から、mは0であることが好ましい。   In the general formula (1), m is an integer of 0 to 3, and m is preferably 0 from the viewpoints of solder heat resistance, solubility and the like.

上記一般式(1)中、nは0〜2の整数であり、はんだ耐熱性、溶解性等の点から、nは0であることが好ましい。   In said general formula (1), n is an integer of 0-2, and it is preferable that n is 0 from points, such as solder heat resistance and solubility.

さらに、一般式(1)で表される化合物のうち、製造コストと物性の点から好ましい、キノキサリン構造を有する化合物としては、Z1及びZ2が互いに架橋した、下記一般式(2)で表される化合物が挙げられる。 Furthermore, Table Among the compounds represented by the general formula (1), from the viewpoint of production cost and physical properties, the compound having a quinoxaline structure, crosslinked Z 1 and Z 2 each other, the following general formula (2) The compound which is made is mentioned.

Figure 2010059242
Figure 2010059242

(式中、R1及びR2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜12の炭化水素基、置換基を有してもよい炭素原子数1〜12のアルコキシ基、置換基を有してもよい炭素原子数1〜12のアミノ基、置換基を有してもよい炭素原子数1〜12のアミド基又は水素原子を表し、R1及びR2のいずれか一方又は両方は、フェノール性水酸基又はエポキシ基を有する。Y1及びY2は、それぞれ独立し、フェノール性水酸基若しくはエポキシ基を有する置換基で置換された炭素原子数1〜12の炭化水素基、炭素原子数1〜12のアルコキシ基、炭素原子数1〜12のアミノ基、炭素原子数1〜12のアミド基、水酸基又は水素原子を表す。Y1及びY2は互いに架橋していてもよく、その場合、Y1及びY2が互いに架橋した構造は、飽和又は不飽和の炭素原子数3〜15の環構造であり、かつフェノール性水酸基又はエポキシ基を有する。Z1及びZ2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子を表す。mは0〜3の整数を表し、mが2〜3の場合、複数のZ1は同一でも異なっていてもよい。nは0〜2の整数を表す。) Wherein R 1 and R 2 are each independently a hydrocarbon group having 1 to 12 carbon atoms which may have a substituent, or an alkoxy having 1 to 12 carbon atoms which may have a substituent. Represents a group, an amino group having 1 to 12 carbon atoms which may have a substituent, an amide group having 1 to 12 carbon atoms which may have a substituent, or a hydrogen atom, and any one of R 1 and R 2 Either or both have a phenolic hydroxyl group or an epoxy group, and Y 1 and Y 2 are each independently a hydrocarbon group having 1 to 12 carbon atoms substituted with a substituent having a phenolic hydroxyl group or an epoxy group. Represents an alkoxy group having 1 to 12 carbon atoms, an amino group having 1 to 12 carbon atoms, an amide group having 1 to 12 carbon atoms, a hydroxyl group, or a hydrogen atom, and Y 1 and Y 2 may be cross-linked to each other. good, in which case, Y 1 and Y 2 are crosslinked with one another structure A saturated or unsaturated ring structure of 3 to 15 carbon atoms, and .Z 1 and Z 2 having a phenolic hydroxyl group or epoxy group, each independently, optionally carbon atoms which may have a substituent 1 to 8 hydrocarbon group or an optionally substituted alkoxy group having 1 to 8 carbon atoms or a hydrogen atom, m represents an integer of 0 to 3, and when m is 2 to 3, Z 1 may be the same or different, and n represents an integer of 0 to 2.)

上記一般式(2)中、R1及びR2のいずれか一方又は両方が有する、フェノール性水酸基を有する基としては、水酸基又はo−ヒドロキシフェニル基又はm−ヒドロキシフェニル基又はp−ヒドロキシフェニル基が好ましい。 In the above general formula (2), either one or both of R 1 and R 2 has a phenolic hydroxyl group, such as a hydroxyl group, an o-hydroxyphenyl group, an m-hydroxyphenyl group, or a p-hydroxyphenyl group. Is preferred.

上記一般式(2)中、R1及びR2のいずれか一方又は両方が有する、エポキシ基を有する基としては、例えば、エポキシ基、グリシジル基、脂環式エポキシ基、グリシジルオキシ基、及びこれらを置換基として有するアルコキシ基、アミノ基、アミド基等が挙げられ、グリシジルオキシ基又はo−グリシジルオキシフェニル基又はm−グリシジルオキシフェニル基又はp−グリシジルオキシフェニル基が好ましい。 In the general formula (2), examples of the group having an epoxy group which one or both of R 1 and R 2 have include an epoxy group, a glycidyl group, an alicyclic epoxy group, a glycidyloxy group, and these. An alkoxy group, an amino group, an amide group, and the like having a substituent as glycidyloxy group, o-glycidyloxyphenyl group, m-glycidyloxyphenyl group, or p-glycidyloxyphenyl group are preferable.

上記一般式(2)中、R1又はR2のうちエポキシ基及びフェノール性水酸基を有さない基としては、例えば、置換基を有してもよい炭素原子数1〜12の炭化水素基又は置換基を有してもよい炭素原子数1〜12のアルコキシ基又は置換基を有してもよい炭素原子数1〜12のアミノ基又は置換基を有してもよい炭素原子数1〜12のアミド基又はフェニル基又は水素原子が挙げられ、はんだ耐熱性、溶解性等の物性の点から、フェニル基又は水素原子が好ましい。 In the general formula (2), examples of the group having no epoxy group and phenolic hydroxyl group in R 1 or R 2 include a hydrocarbon group having 1 to 12 carbon atoms which may have a substituent, or C1-C12 alkoxy group which may have a substituent or C1-C12 amino group which may have a substituent or C1-C12 which may have a substituent In view of physical properties such as solder heat resistance and solubility, a phenyl group or a hydrogen atom is preferable.

さらに、一般式(1)で表される、キノキサリン骨格を有する化合物のうち、はんだ耐熱性、溶解性等の物性の点から好ましい化合物としては、下記一般式(3)で表される化合物が挙げられる。   Furthermore, among the compounds having a quinoxaline skeleton represented by the general formula (1), preferable compounds from the viewpoint of physical properties such as solder heat resistance and solubility include compounds represented by the following general formula (3). It is done.

Figure 2010059242
Figure 2010059242

(式中、X1及びX2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜12の炭化水素基、置換基を有してもよい炭素原子数1〜12のアルコキシ基、置換基を有してもよい炭素原子数1〜12のアミノ基、置換基を有してもよい炭素原子数1〜12のアミド基又は水素原子を表し、X1及びX2のいずれか一方又は両方は、フェノール性水酸基又はエポキシ基を有する。nは、0〜2の整数を表す。Z1及びZ2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子を表す。W1及びW2のいずれか一方はグリシジルオキシ基又はフェノール性水酸基を有する基を表し、もう一方は水素原子を有する基を表し、nが0の場合、W1及びW2のいずれか一方は炭素原子数0〜7のフェノール性水酸基又はエポキシ基を有する置換基を表してもよい。) (Wherein, X 1 and X 2 are each independently an optionally substituted hydrocarbon group having 1 to 12 carbon atoms, substituent a good carbon atoms of 1 to 12 alkoxy which may have Represents a group, an amino group having 1 to 12 carbon atoms which may have a substituent, an amide group having 1 to 12 carbon atoms which may have a substituent, or a hydrogen atom, and any one of X 1 and X 2 Either or both have a phenolic hydroxyl group or an epoxy group, n represents an integer of 0 to 2. Z 1 and Z 2 are each independently 1 to 1 carbon atoms which may have a substituent. 8 represents an alkoxy group having 1 to 8 carbon atoms or a hydrogen atom which may have a hydrocarbon group or a substituent, and one of W 1 and W 2 represents a group having a glycidyloxy group or a phenolic hydroxyl group. represents and the other represents a group having a hydrogen atom, when n is 0, W 1 and W 2 One may represent a substituent having a phenolic hydroxyl group or epoxy group having a carbon number of 0-7.)

上記一般式(3)中、X1及びX2のいずれか一方又は両方が有する、フェノール性水酸基を有する基としては、水酸基又はo−ヒドロキシフェニル基又はm−ヒドロキシフェニル基又はp−ヒドロキシフェニル基であることが好ましい。 In the general formula (3), either one or both of X 1 and X 2 has a phenolic hydroxyl group, such as a hydroxyl group, an o-hydroxyphenyl group, an m-hydroxyphenyl group, or a p-hydroxyphenyl group. It is preferable that

上記一般式(3)中、X1及びX2のいずれか一方又は両方が有する、エポキシ基を有する基としては、例えば、エポキシ基、グリシジル基、脂環式エポキシ基、グリシジルオキシ基、及びこれらを置換基として有するアルコキシ基、アミノ基、アミド基等が挙げられ、グリシジルオキシ基又はo−グリシジルオキシフェニル基又はm−グリシジルオキシフェニル基又はp−グリシジルオキシフェニル基が好ましい。 In the general formula (3), examples of the group having an epoxy group which one or both of X 1 and X 2 have include an epoxy group, a glycidyl group, an alicyclic epoxy group, a glycidyloxy group, and these. An alkoxy group, an amino group, an amide group, and the like having a substituent as glycidyloxy group, o-glycidyloxyphenyl group, m-glycidyloxyphenyl group, or p-glycidyloxyphenyl group are preferable.

上記一般式(3)中、X1又はX2のうちエポキシ基及びフェノール性水酸基を有さない基としては、例えば、置換基を有してもよい炭素原子数1〜12の炭化水素基又は置換基を有してもよい炭素原子数1〜12のアルコキシ基又は置換基を有してもよい炭素原子数1〜12のアミノ基又は置換基を有してもよい炭素原子数1〜12のアミド基又はフェニル基又は水素原子が挙げられ、はんだ耐熱性、溶解性等の物性の点から、フェニル基又は水素原子が好ましい。 In the general formula (3), the group having no epoxy group and a phenolic hydroxyl group of X 1 or X 2, for example, good 1 to 12 carbon atoms which may have a substituent a hydrocarbon group or C1-C12 alkoxy group which may have a substituent or C1-C12 amino group which may have a substituent or C1-C12 which may have a substituent In view of physical properties such as solder heat resistance and solubility, a phenyl group or a hydrogen atom is preferable.

上記一般式(3)中、Z1及びZ2は、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子であればよいが、はんだ耐熱性、溶解性等の物性の点から、フェニル基、水素原子、メチル基、エチル基が好ましい。 In the general formula (3), Z 1 and Z 2 are each a hydrocarbon group having 1 to 8 carbon atoms which may have a substituent or an alkoxy having 1 to 8 carbon atoms which may have a substituent. Although it may be a group or a hydrogen atom, a phenyl group, a hydrogen atom, a methyl group, or an ethyl group is preferable from the viewpoint of physical properties such as solder heat resistance and solubility.

上記一般式(3)中、nは0〜2の整数であり、製造コストの点から、nは0であることが好ましい。   In said general formula (3), n is an integer of 0-2, and it is preferable that n is 0 from the point of manufacturing cost.

上記一般式(3)中、W1及びW2のいずれか一方はグリシジルオキシ基又はフェノール性水酸基を有する基を表し、もう一方は水素原子を有する基を表し、nが0の場合、W1及びW2のいずれか一方は炭素原子数0〜7のフェノール性水酸基又はエポキシ基を有する置換基を表してもよい。はんだ耐熱性、溶解性等の物性の点から、W1及びW2のいずれか一方が、o−ヒドロキシフェニル基又はm−ヒドロキシフェニル基又はp−ヒドロキシフェニル基又はグリシジルオキシ基又はo−グリシジルオキシフェニル基又はm−グリシジルオキシフェニル基又はp−グリシジルオキシフェニル基であり、もう一方が水素原子又はメチル基であることが好ましい。 In the general formula (3), either W 1 or W 2 represents a group having a glycidyloxy group or a phenolic hydroxyl group, the other represents a group having a hydrogen atom, and when n is 0, W 1 And W 2 may represent a substituent having a phenolic hydroxyl group or an epoxy group having 0 to 7 carbon atoms. From the viewpoint of physical properties such as solder heat resistance and solubility, either W 1 or W 2 is o-hydroxyphenyl group, m-hydroxyphenyl group, p-hydroxyphenyl group, glycidyloxy group or o-glycidyloxy. It is preferably a phenyl group, m-glycidyloxyphenyl group or p-glycidyloxyphenyl group, and the other is preferably a hydrogen atom or a methyl group.

上記一般式(1)〜(3)で表される、キノキサリン構造を有する化合物は、複数の構造異性体の混合物であってもよい。このような混合物がフェノール性水酸基を有する場合について、以下でより具体的に説明する。   The compound having a quinoxaline structure represented by the general formulas (1) to (3) may be a mixture of a plurality of structural isomers. The case where such a mixture has a phenolic hydroxyl group will be described more specifically below.

一般式(1)で表される化合物がフェノール性水酸基を有する場合の、複数の構造異性体の混合物の例としては、下記混合物1及び2が挙げられる。また、一般式(2)で表される化合物がフェノール性水酸基を有する場合の、複数の構造異性体の混合物の例としては、下記混合物3が挙げられる。また、一般式(3)で表される化合物がフェノール性水酸基を有する場合の、複数の構造異性体の混合物の例としては、下記混合物4が挙げられる。ただし、本発明は、下記の構造によりいかなる制限を受けるものでもない。   Examples of a mixture of a plurality of structural isomers when the compound represented by the general formula (1) has a phenolic hydroxyl group include the following mixtures 1 and 2. Moreover, the following mixture 3 is mentioned as an example of the mixture of a some structural isomer when the compound represented by General formula (2) has a phenolic hydroxyl group. Moreover, the following mixture 4 is mentioned as an example of the mixture of a some structural isomer when the compound represented by General formula (3) has a phenolic hydroxyl group. However, the present invention is not limited in any way by the following structure.

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

一般式(1)で表される化合物がフェノール性水酸基を有する場合の、複数の構造異性体の混合物の合成方法としては、ジアミノベンゼン誘導体とグリオキサール誘導体からキノキサリン環を合成することによって、化合物中にキノキサリン構造を含有させる方法が挙げられる。上記混合物1を例に挙げて詳しく説明すると、下記反応式Aのように、キノキサリン環合成を行う。すなわち、3,4−ジアミノフェノールとp−ヒドロキシフェニルグリオキサールとを、溶媒中で、キノキサリン化反応させ、上記混合物1を得ることができる。酢酸やトリフルオロ酢酸等の酸触媒を用いると、反応が促進されるので好ましい。   As a method for synthesizing a mixture of a plurality of structural isomers when the compound represented by the general formula (1) has a phenolic hydroxyl group, by synthesizing a quinoxaline ring from a diaminobenzene derivative and a glyoxal derivative, The method of containing a quinoxaline structure is mentioned. The mixture 1 will be described in detail by taking the above example as an example, and quinoxaline ring synthesis is performed as shown in the following reaction formula A. That is, the mixture 1 can be obtained by reacting 3,4-diaminophenol and p-hydroxyphenylglyoxal in a solvent to quinoxalination reaction. It is preferable to use an acid catalyst such as acetic acid or trifluoroacetic acid because the reaction is accelerated.

Figure 2010059242
Figure 2010059242

次に、一般式(1)〜(3)で表される、キノキサリン構造を有する化合物の複数の構造異性体の混合物がエポキシ基を有する場合について、より具体的に説明する。   Next, the case where the mixture of a plurality of structural isomers of the compound having a quinoxaline structure represented by the general formulas (1) to (3) has an epoxy group will be described more specifically.

一般式(1)で表される化合物がエポキシ基を有する場合の、複数の構造異性体の混合物の例としては、下記混合物5及び6が挙げられる。また一般式(2)で表される化合物がエポキシ基を有する場合の、複数の構造異性体の混合物の例としては、下記混合物7が挙げられる。また一般式(3)で表される化合物がエポキシ基を有する場合の、複数の構造異性体の混合物の例としては、下記混合物8が挙げられる。ただし、本発明は、下記の構造によりいかなる制限を受けるものでもない。   Examples of the mixture of a plurality of structural isomers when the compound represented by the general formula (1) has an epoxy group include the following mixtures 5 and 6. Moreover, the following mixture 7 is mentioned as an example of the mixture of several structural isomers in case the compound represented by General formula (2) has an epoxy group. Moreover, the following mixture 8 is mentioned as an example of the mixture of a some structural isomer in case the compound represented by General formula (3) has an epoxy group. However, the present invention is not limited in any way by the following structure.

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

一般式(1)で表される化合物がエポキシ基を有する場合の、複数の構造異性体の混合物の合成方法としては、上記混合物5を例に挙げて詳しく説明すると、下記反応式Bのように、上記混合物1とエピクロロヒドリンとを、溶媒中、塩基存在下で反応させることによって得る方法が挙げられる。   When the compound represented by the general formula (1) has an epoxy group, the method for synthesizing a mixture of a plurality of structural isomers will be described in detail by taking the above mixture 5 as an example. And a method obtained by reacting the mixture 1 with epichlorohydrin in a solvent in the presence of a base.

Figure 2010059242
Figure 2010059242

本発明のエポキシ樹脂硬化性組成物は、一般式(1)〜(3)で表される化合物をエポキシ樹脂の硬化剤として含有してもよいし、エポキシ樹脂として含有してもよい。該化合物を硬化剤として使用する態様としては、例えば、一般式(1)〜(3)で表される化合物がフェノール性水酸基を有する場合の複数の構造異性体の混合物、すなわち、一般式(1)で表される化合物がフェノール性水酸基を有する場合(例えば混合物1及び2)、一般式(2)で表される化合物がフェノール性水酸基を有する場合(例えば混合物3)、一般式(3)で表される化合物がフェノール性水酸基を有する場合(例えば混合物4)の混合物の使用を例示できる。また、一般式(1)〜(3)で表される化合物をエポキシ樹脂として使用する態様としては、例えば、該化合物がエポキシ基を有する場合の複数の構造異性体の混合物、すなわち、一般式(1)で表される化合物がエポキシ基を有する場合(例えば混合物5及び6)、一般式(2)で表される化合物がエポキシ基を有する場合(例えば混合物7)、一般式(3)で表される化合物がエポキシ基を有する場合(例えば混合物8)の混合物の使用を例示できる。上記いずれの態様においても、本発明のエポキシ樹脂硬化性組成物には、硬化剤として公知の他の硬化剤、及びエポキシ樹脂として公知の他のエポキシ樹脂を単独又は2種以上で含有させることができる。   The epoxy resin curable composition of this invention may contain the compound represented by General formula (1)-(3) as a hardening | curing agent of an epoxy resin, and may contain it as an epoxy resin. As an aspect which uses this compound as a hardening | curing agent, for example, when the compounds represented by the general formulas (1) to (3) have a phenolic hydroxyl group, a mixture of a plurality of structural isomers, that is, the general formula (1 ) Have a phenolic hydroxyl group (for example, mixtures 1 and 2), when the compound represented by general formula (2) has a phenolic hydroxyl group (for example, mixture 3), The use of a mixture when the represented compound has a phenolic hydroxyl group (for example, mixture 4) can be exemplified. Moreover, as an aspect which uses the compound represented by General Formula (1)-(3) as an epoxy resin, for example, when this compound has an epoxy group, it is a mixture of a plurality of structural isomers, that is, the general formula ( When the compound represented by 1) has an epoxy group (for example, mixtures 5 and 6), when the compound represented by the general formula (2) has an epoxy group (for example, mixture 7), it is represented by the general formula (3). The use of a mixture when the compound to be produced has an epoxy group (for example, mixture 8) can be exemplified. In any of the above embodiments, the epoxy resin curable composition of the present invention may contain other curing agents known as curing agents and other epoxy resins known as epoxy resins, alone or in combination of two or more. it can.

上記他の硬化剤としては、一般的なエポキシ樹脂の硬化剤として通常用いられるものであれば、特に制約はなく、アミン類、フェノール類、酸無水物等が挙げられる。アミン類としては、キシリレンジアミン、1−シアノグアニジン、ジアミノジフェニルメタン、ジアミノジフェニルスルフォン、メチレンジアニリン、メタフェニレンジアミン等が挙げられる。フェノール類としては、ビフェノール、ビスフェノールA、ビスフェノールF、フェノールノボラック、クレゾールノボラック、ビスフェノールAノボラック、及びこれらのアルキル基置換体等が挙げられる。酸無水物としては、無水ヘキサヒドロフタル酸、無水テトラヒドロフタル酸、無水ピロメリット酸、無水クロレンド酸、無水ナディック酸、無水メチルナディック酸、無水ドデシルニルコハク酸、無水フタル酸、メチルヘキサヒドロ無水フタル酸、無水マレイン酸などが挙げられる。これらは単独又は2種以上で用いることができる。   As said other hardening | curing agent, if normally used as a hardening | curing agent of a general epoxy resin, there will be no restriction | limiting in particular, Amines, phenols, an acid anhydride, etc. are mentioned. Examples of amines include xylylenediamine, 1-cyanoguanidine, diaminodiphenylmethane, diaminodiphenylsulfone, methylenedianiline, metaphenylenediamine, and the like. Examples of the phenols include biphenol, bisphenol A, bisphenol F, phenol novolak, cresol novolak, bisphenol A novolak, and alkyl group-substituted products thereof. Acid anhydrides include hexahydrophthalic anhydride, tetrahydrophthalic anhydride, pyromellitic anhydride, chlorendic anhydride, nadic acid anhydride, methyl nadic anhydride, dodecylnyl succinic anhydride, phthalic anhydride, methyl hexahydro anhydride Examples include phthalic acid and maleic anhydride. These can be used alone or in combination of two or more.

上記他のエポキシ樹脂は、特に制限されない。例えば、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、ビフェニル型2官能エポキシ樹脂、ビフェニル変性ノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ナフトール―クレゾール共縮合ノボラック型エポキシ樹脂、ナフトール―フェノール共縮合ノボラック型エポキシ樹脂、ジシクロペンタジエン―フェノール付加反応型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、テトラフェニルエタン型エポキシ樹脂、ナフトールノボラック型エポキシ樹脂が挙げられる。これらは単独又は2種以上で用いることができる。   The other epoxy resin is not particularly limited. For example, bisphenol A novolac type epoxy resin, bisphenol F novolac type epoxy resin, biphenyl type bifunctional epoxy resin, biphenyl modified novolac type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, naphthol-cresol co-condensed novolak type epoxy Resin, naphthol-phenol co-condensation novolak epoxy resin, dicyclopentadiene-phenol addition reaction epoxy resin, triphenylmethane epoxy resin, phenol novolac epoxy resin, cresol novolac epoxy resin, tetraphenylethane epoxy resin, naphthol A novolak-type epoxy resin is mentioned. These can be used alone or in combination of two or more.

本発明のエポキシ樹脂硬化性組成物における硬化剤の使用量は、特に限定されず、硬化剤の反応性官能基の数(α)とエポキシ樹脂のエポキシ基の数(β)との比が、α/β=0.8〜1.2/1.0となるように配合するのが好ましい。α/β=0.9〜1.0/1.0であることがより好ましい。   The amount of the curing agent used in the epoxy resin curable composition of the present invention is not particularly limited, and the ratio between the number of reactive functional groups of the curing agent (α) and the number of epoxy groups of the epoxy resin (β) is It is preferable to blend so that α / β = 0.8 to 1.2 / 1.0. It is more preferable that α / β = 0.9 to 1.0 / 1.0.

本発明のエポキシ樹脂硬化性組成物におけるエポキシ樹脂の一部又は全ては、エポキシ当量が100〜1000g/eqであることが好ましい。   It is preferable that an epoxy equivalent is 100-1000 g / eq for a part or all of the epoxy resin in the epoxy resin curable composition of the present invention.

本発明のエポキシ樹脂硬化性組成物には、無機充填剤を含有させることができる。無機充填剤としては、一般的なエポキシ樹脂硬化性組成物に通常用いられるものであれば、特に制約はないが、例えば、水酸化アルミニウム、水酸化マグネシウム、Eガラス粉末、アルミナ、酸化マグネシウム、二酸化チタン、チタン酸カリウム、ケイ酸カルシウム、炭酸カルシウム、クレイ、タルク等が挙げられ、これらは単独又は2種以上混合して用いることができる。また、無機充填剤はシランカップリング剤等で表面処理することもできる。   The epoxy resin curable composition of the present invention may contain an inorganic filler. The inorganic filler is not particularly limited as long as it is usually used in a general epoxy resin curable composition. For example, aluminum hydroxide, magnesium hydroxide, E glass powder, alumina, magnesium oxide, dioxide dioxide Titanium, potassium titanate, calcium silicate, calcium carbonate, clay, talc and the like can be mentioned, and these can be used alone or in combination. The inorganic filler can also be surface treated with a silane coupling agent or the like.

無機充填剤の使用量としては、エポキシ樹脂硬化性組成物に用いた全てのエポキシ樹脂の質量と、用いた全ての硬化剤の質量との和(γ)と、無機充填剤の質量(δ)との比が、γ/δ=1.0〜95.0/1.0であることが好ましい。   The amount of the inorganic filler used is the sum (γ) of the mass of all the epoxy resins used in the epoxy resin curable composition and the mass of all the curing agents used, and the mass of the inorganic filler (δ). The ratio is preferably γ / δ = 1.0 to 95.0 / 1.0.

本発明のエポキシ樹脂硬化性組成物には、エポキシ樹脂と硬化剤との反応を促進する硬化促進剤を添加してもよい。硬化促進剤としては、イミダゾール化合物、アミン類、3ふっ化ほう素類、有機ホスフィン類が挙げられる。イミダゾール化合物としては、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、2−ウンデシルイミダゾール、2−ヘプタデシルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール、1−ベンジル−2−メチルイミダゾール、2−エチルイミダゾール、2−イソプロピルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾール、1−シアノエチル−2−イソプロピルイミダゾール、1−シアノエチル−2−フェニルイミダゾリウムトリメリテート、1−シアノエチル−2−エチル−4−メチルイミダゾールトリメリテート、1−シアノエチル−2−ウンデシルイミダゾールトリメリテート、1−シアノエチル−2−フェニルイミダゾールトリメリテート、1−シアノエチル−2−フェニル−4,5−ジ(シアノエトキシメチル)イミダゾール等が挙げられる。アミン類としては、ジメチルアミノメチルフェノール−2,4,6−トリ(ジメチルアミノメチル)フェノール、トリ(ジメチルアミノメチル)フェノールのトリ−2−エチルヘキサン塩等が挙げられる。3ふっ化ほう素類としては、3ふっ化ほう素・モノエチルアミン錯化合物、3ふっ化ほう素・トリエチルアミン錯化合物、3ふっ化ほう素・ピペリジン錯化合物、3ふっ化ほう素・n−ブチルエーテル錯化合物、3ふっ化ほう素・アミン錯化合物等が挙げられる。有機ホスフィン類としては、トリフェニルホスフィン、ジフェニルホスフィン、トリブチルホスフィン等が挙げられる。   You may add the hardening accelerator which accelerates | stimulates reaction with an epoxy resin and a hardening | curing agent to the epoxy resin curable composition of this invention. Examples of the curing accelerator include imidazole compounds, amines, boron trifluorides, and organic phosphines. Examples of imidazole compounds include 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, and 1-benzyl-2. -Methylimidazole, 2-ethylimidazole, 2-isopropylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-isopropylimidazole, 1-cyanoethyl-2-phenylimidazo Trimium nitrate, 1-cyanoethyl-2-ethyl-4-methylimidazole trimellitate, 1-cyanoethyl-2-undecylimidazole trimellitate, 1-cyanoethyl-2-phenylimidazo Rutorimeriteto, 1-cyanoethyl-2-phenyl-4,5-di (cyano ethoxymethyl) imidazole, and the like. Examples of amines include dimethylaminomethylphenol-2,4,6-tri (dimethylaminomethyl) phenol, tri-2-ethylhexane salt of tri (dimethylaminomethyl) phenol, and the like. Examples of boron trifluoride include boron trifluoride / monoethylamine complex, boron trifluoride / triethylamine complex, boron trifluoride / piperidine complex, boron trifluoride / n-butyl ether complex Compounds, boron trifluoride / amine complex compounds, and the like. Examples of organic phosphines include triphenylphosphine, diphenylphosphine, and tributylphosphine.

硬化促進剤は、エポキシ樹脂及び硬化剤の合計100質量部に対して0.1〜5質量部配合することが好ましい。プリプレグの保存安定性の観点から、0.1質量部以上が好ましく、加工時間を短縮する観点から、5質量部以下が好ましい。より好ましくは、0.15〜2質量部である。   The curing accelerator is preferably blended in an amount of 0.1 to 5 parts by mass with respect to a total of 100 parts by mass of the epoxy resin and the curing agent. From the viewpoint of the storage stability of the prepreg, 0.1 part by mass or more is preferable, and from the viewpoint of shortening the processing time, 5 parts by mass or less is preferable. More preferably, it is 0.15 to 2 parts by mass.

さらに、本発明のエポキシ樹脂硬化性組成物は、シランカップリング剤を含有することも可能である。   Furthermore, the epoxy resin curable composition of the present invention can also contain a silane coupling agent.

本発明は、上述のエポキシ樹脂硬化性組成物と有機溶剤とを含有する樹脂ワニスも提供する。典型的には、エポキシ樹脂硬化性組成物は有機溶剤中に溶解又は分散している。有機溶剤としては、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶剤、トルエン、キシレン等の芳香族系溶剤、2−メトキシエタノール、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルモノアセテート、プロピレングリコールモノブチルエーテル等のエーテル系溶剤、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N,N−ジメチルイミダゾリジノン、N−メチルピロリドン、γ−ブチロラクトン等の非プロトン含窒素系溶剤が例示される。これらは単独であっても、2種以上の混合溶剤であってもよい。樹脂ワニス中の有機溶剤の含有量は、例えば後述のプリプレグを作製する際の織布又は不織布への樹脂ワニスの含浸性を考慮して、25質量%〜75質量%であることが好ましい。   The present invention also provides a resin varnish containing the above-described epoxy resin curable composition and an organic solvent. Typically, the epoxy resin curable composition is dissolved or dispersed in an organic solvent. Examples of the organic solvent include ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone, aromatic solvents such as toluene and xylene, 2-methoxyethanol, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether monoacetate, Ether solvents such as propylene glycol monobutyl ether, aprotic nitrogen-containing solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, N, N-dimethylimidazolidinone, N-methylpyrrolidone, and γ-butyrolactone Illustrated. These may be used alone or in combination of two or more. The content of the organic solvent in the resin varnish is preferably 25% by mass to 75% by mass in consideration of, for example, the impregnation property of the resin varnish into a woven fabric or a nonwoven fabric when a prepreg described below is produced.

本発明は、上述の樹脂ワニスを用いたプリプレグも提供する。プリプレグは、上述した本発明の樹脂ワニスを、織布又は不織布からなる基布、典型的にはガラス織布又はガラス不織布又は有機繊維織布に含浸し、加熱することにより得ることができる。より典型的には、例えば、本発明のエポキシ樹脂硬化性組成物を有機溶剤に溶解又は分散させて得た樹脂ワニスを、ガラス織布又はガラス不織布又は有機繊維織布に含浸させた後、加熱により樹脂ワニス中の溶剤を乾燥し、該エポキシ樹脂硬化性組成物を一部硬化させることで形成できる。以下、基布としてガラスクロスを用いる場合についてより具体的に説明する。   The present invention also provides a prepreg using the above-described resin varnish. The prepreg can be obtained by impregnating the resin varnish of the present invention described above into a base fabric made of a woven fabric or a nonwoven fabric, typically a glass woven fabric, a glass nonwoven fabric or an organic fiber woven fabric, and heating. More typically, for example, a glass woven fabric, a glass nonwoven fabric or an organic fiber woven fabric is impregnated with a resin varnish obtained by dissolving or dispersing the epoxy resin curable composition of the present invention in an organic solvent, and then heated. Can be formed by drying the solvent in the resin varnish and partially curing the epoxy resin curable composition. Hereinafter, the case where a glass cloth is used as the base fabric will be described more specifically.

ガラスクロスに樹脂ワニスを含浸させる方法としては、(ア)樹脂ワニスをバスに溜め、ガラスクロスを浸漬させながら通過させた後、ガラスクロスに樹脂ワニスが所定量含浸されるようにスリット、又はマングルで余剰樹脂ワニスを掻き落とす方法、(イ)ロールコーター、ダイコーター、グラビアコーター等でガラスクロスに直接所定量の樹脂ワニスを塗工することで含浸させる方法等が好ましい。   The glass cloth is impregnated with the resin varnish as follows: (A) The resin varnish is accumulated in a bath, passed through the glass cloth while being immersed, and then slits or mangles so that the glass cloth is impregnated with a predetermined amount. And (i) a method of impregnating by applying a predetermined amount of resin varnish directly on a glass cloth with a roll coater, a die coater, a gravure coater or the like.

また、ガラスクロスに上記樹脂ワニスを含浸させた後、溶剤を加熱乾燥させ、及び樹脂を一部硬化させる方法としては、熱風、電磁波等公知の方法が可能である。加熱乾燥時の温度は、110℃以上が好ましく、エポキシ樹脂硬化性組成物の蒸発、揮発、熱分解及び熱劣化を抑制するため、200℃以下が好ましい。また、加熱乾燥時間は20秒以上20分未満が好ましく、より好ましくは30秒以上15分未満である。また、一連の工程で作ったプリプレグの流動性を調整するために、プリプレグをバッチ式オーブンなどで加熱することや、再度連続加熱装置で連続的に加熱することも可能である。また、樹脂ワニスをガラスクロスに含浸させる前に有機溶剤をガラスクロスにあらかじめ含浸する方法等の前処理を行うことも可能である。   Moreover, after impregnating the said resin varnish to a glass cloth, the method of heating and drying a solvent and partially hardening resin can use well-known methods, such as a hot air and electromagnetic waves. The temperature at the time of heat drying is preferably 110 ° C. or higher, and preferably 200 ° C. or lower in order to suppress evaporation, volatilization, thermal decomposition and thermal degradation of the epoxy resin curable composition. Further, the heat drying time is preferably 20 seconds or more and less than 20 minutes, more preferably 30 seconds or more and less than 15 minutes. Moreover, in order to adjust the fluidity of the prepreg produced in a series of steps, it is possible to heat the prepreg with a batch type oven or the like, or to continuously heat it again with a continuous heating device. It is also possible to perform pretreatment such as a method of impregnating the glass cloth with an organic solvent in advance before impregnating the glass cloth with the resin varnish.

プリプレグの状態での、プリプレグ中のガラスクロスの質量含有量(以下、「ガラスコンテント」という)は80質量%以下が好ましく、より好ましくは75質量%以下である。ガラスコンテントの下限は、本発明で得られる金属張積層板の寸法安定性が損なわれない値であることができるが、通常は20質量%以上がよい。プリプレグのガラスコンテントが80質量%を越えるとガラス繊維織物の糸束部分にしか樹脂が存在しないプリプレグとなり積層板にし難くなる傾向がある。   The mass content of the glass cloth in the prepreg in the prepreg state (hereinafter referred to as “glass content”) is preferably 80% by mass or less, more preferably 75% by mass or less. The lower limit of the glass content can be a value that does not impair the dimensional stability of the metal-clad laminate obtained in the present invention, but is usually 20% by mass or more. When the glass content of the prepreg exceeds 80% by mass, a prepreg in which the resin is present only in the yarn bundle portion of the glass fiber fabric tends to be difficult to form a laminated sheet.

本発明のプリプレグに使用するガラスクロスは、Eガラス、Cガラス、Dガラス、Sガラス等のいずれのガラスクロスでも良い。また、ガラスクロスにおいて、織り密度は好ましくは10〜200本/25mm、より好ましくは15〜100本/25mmであり、質量は好ましくは5〜400g/m2、より好ましくは8〜300g/m2であり、織り方は平織り、朱子織り、綾織り、ななこ織り等が使用できる。また、たて糸とよこ糸の双方又は一方がテクスチャード加工を施されたガラス糸で製織されたガラスクロスであってもよい。また、製織に必要な集束剤が付着している段階のガラスクロスや集束剤を除去した段階のガラスクロス、あるいは公知の表面処理法でシランカップリング剤などが既に処理されている段階のガラスクロスのいずれでもよい。また、柱状流、高周波振動法による水流で開繊、扁平化等の物理加工を施したガラスクロスであってもよい。 The glass cloth used for the prepreg of the present invention may be any glass cloth such as E glass, C glass, D glass, and S glass. In the glass cloth, the weave density is preferably 10 to 200/25 mm, more preferably 15 to 100/25 mm, and the mass is preferably 5 to 400 g / m 2 , more preferably 8 to 300 g / m 2. Plain weave, satin weave, twill weave, Nanako weave, etc. can be used. Moreover, the glass cloth woven by the glass yarn in which both or one of the warp and the weft was textured may be used. Also, a glass cloth at a stage where a sizing agent necessary for weaving is attached, a glass cloth at a stage where the sizing agent is removed, or a glass cloth at a stage where a silane coupling agent or the like is already treated by a known surface treatment method Either of these may be used. Further, it may be a glass cloth that has been subjected to physical processing such as fiber opening or flattening with a columnar flow or a water flow by a high frequency vibration method.

本発明は、上述のプリプレグと金属箔とが積層されてなる金属張積層板も提供する。金属張積層板は例えば電気電子製品のプリント配線板材料等として用いることができる。典型的には、1枚の又は複数枚重ねられたプリプレグを金属箔で挟んで加熱加圧して一体成形することにより、プリプレグと金属箔とを積層した金属張積層板が得られる。金属箔は特に限定されないが、用途に応じて例えば銅箔等を使用できる。   The present invention also provides a metal-clad laminate in which the above prepreg and metal foil are laminated. The metal-clad laminate can be used, for example, as a printed wiring board material for electric and electronic products. Typically, a metal-clad laminate in which a prepreg and a metal foil are laminated is obtained by sandwiching one or a plurality of prepregs sandwiched between metal foils and heating and pressing to form a single piece. Although metal foil is not specifically limited, For example, copper foil etc. can be used according to a use.

本発明は、上述したエポキシ樹脂硬化性組成物又は上述した樹脂ワニスを硬化させた硬化物も提供する。本発明のエポキシ樹脂硬化性組成物は、例えば上述のプリプレグ中に存在した状態等で硬化させて各種用途に適用できる。硬化条件はエポキシ樹脂硬化性組成物又は樹脂ワニスの組成に応じて適宜選択できる。例えば平均1〜20℃/分で室温から150〜230℃まで昇温し、150〜230℃の範囲で0.5〜10時間保持後、平均1〜100℃/分で室温まで冷却するが、昇温から冷却までの間、必要に応じてプレス圧をかけてもよく減圧下であってもよい。   This invention also provides the hardened | cured material which hardened the epoxy resin curable composition mentioned above or the resin varnish mentioned above. The epoxy resin curable composition of the present invention can be applied to various applications by being cured, for example, in the state of being present in the above-described prepreg. Curing conditions can be appropriately selected according to the composition of the epoxy resin curable composition or the resin varnish. For example, the temperature is raised from room temperature to 150 to 230 ° C. at an average of 1 to 20 ° C./min, and after being held for 0.5 to 10 hours in the range of 150 to 230 ° C., it is cooled to room temperature at an average of 1 to 100 ° C./min A press pressure may be applied as necessary from the temperature rise to the cooling, or the pressure may be reduced.

次に、実施例及び比較例により本発明を説明する。   Next, the present invention will be described with reference to examples and comparative examples.

実施例により、本発明を詳細に説明する。実施例1〜4はエポキシ基又はフェノール性水酸基を有する化合物の複数の構造異性体の混合物の例である。表1に記載の配合により、エポキシ基を有する化合物の複数の構造異性体の混合物を用いて樹脂ワニスを調製した。また、比較例1〜3では、表1に記載の配合により、比較エポキシ樹脂を用いて樹脂ワニスを調製した。表1中の質量部は、溶剤を除いた固形分比率である。   The examples illustrate the invention in detail. Examples 1-4 are examples of a mixture of a plurality of structural isomers of a compound having an epoxy group or a phenolic hydroxyl group. According to the formulation shown in Table 1, a resin varnish was prepared using a mixture of a plurality of structural isomers of a compound having an epoxy group. Moreover, in Comparative Examples 1-3, the resin varnish was prepared using the comparison epoxy resin by the mixing | blending of Table 1. The mass part in Table 1 is the solid content ratio excluding the solvent.

得られた樹脂ワニスを用いて、下記作製方法により試験片を作製し、下記試験方法により、はんだ耐熱性、線膨張係数について試験した。結果を表1に示す。   Using the obtained resin varnish, a test piece was prepared by the following preparation method, and the solder heat resistance and the linear expansion coefficient were tested by the following test method. The results are shown in Table 1.

[実施例1(混合物1及び混合物5の合成例)]   [Example 1 (Synthesis example of mixture 1 and mixture 5)]

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

(混合物1の合成例)
窒素気流下、200mL3口フラスコに、Organic&Biomolecular Chemistry 2003年 1巻 p.4347に記載の方法で合成した3,4−ジアミノフェノール1.24g(10mmol)、p−ヒドロキシフェニルグリオキサール1.50g(10mmol)、酢酸50mL、トルエン5mLを仕込み、10時間還流させながら、反応液を共沸させ、揮発する蒸気を冷却して得られた凝縮液を油/水分離し、水分を除いた油分を反応系に戻す方法により反応を行った。反応終了後、減圧下でトルエンを除き、1mol/Lの塩酸10mLを加え、水100mLを加えた後、沈殿物を濾取した。蒸留水で水洗した後、減圧下で酢酸、水を除くことで、混合物1を得た。
(Synthesis example of mixture 1)
In a 200 mL three-necked flask under a nitrogen stream, Organic & Biomolecular Chemistry 2003 Volume 1 p. The reaction mixture was charged with 1.24 g (10 mmol) of 3,4-diaminophenol synthesized by the method described in 4347, 1.50 g (10 mmol) of p-hydroxyphenylglyoxal, 50 mL of acetic acid, and 5 mL of toluene while refluxing for 10 hours. The condensate obtained by azeotropically cooling and evaporating vapor was separated by oil / water, and the reaction was carried out by returning the oil from which water was removed to the reaction system. After completion of the reaction, toluene was removed under reduced pressure, 10 mL of 1 mol / L hydrochloric acid was added, 100 mL of water was added, and the precipitate was collected by filtration. After washing with distilled water, mixture 1 was obtained by removing acetic acid and water under reduced pressure.

(混合物5の合成例)
窒素気流下、200mL3口フラスコに混合物1を1.26g(5mmol)、エピクロロヒドリン9.25g(100mmol)、N,N−ジメチルスルホキシド30mLを仕込み、系内温度を60℃に昇温して均一に溶解した後、40.0質量部の水酸化ナトリウム水溶液1.00g(水酸化ナトリウム10mmol)を1時間かけて滴下した。その間に徐々に昇温し、滴下終了時には系内温度が80℃となるようにした。その後、80℃に30分間保持して反応を進行させた。系内温度を室温まで冷却した後、蒸留水100mLを加えて、沈殿物を濾取した。蒸留水で水洗して副生成塩を除いた後、減圧下でエピクロロヒドリン、水、N,Nジメチルスルホキシドを除くことで、混合物5を得た。得られた混合物5のエポキシ当量は、185g/eqであった。
(Synthesis example of mixture 5)
Under a nitrogen stream, 1.26 g (5 mmol) of Mixture 1, 9.25 g (100 mmol) of epichlorohydrin, and 30 mL of N, N-dimethylsulfoxide were charged into a 200 mL three-necked flask, and the system temperature was raised to 60 ° C. After uniformly dissolving, 40.0 parts by mass of sodium hydroxide aqueous solution 1.00 g (sodium hydroxide 10 mmol) was added dropwise over 1 hour. During this time, the temperature was gradually raised, and the temperature inside the system was 80 ° C. at the end of the dropping. Thereafter, the reaction was allowed to proceed at 80 ° C. for 30 minutes. After cooling the system temperature to room temperature, 100 mL of distilled water was added, and the precipitate was collected by filtration. After washing with distilled water to remove by-product salts, epichlorohydrin, water, and N, N dimethyl sulfoxide were removed under reduced pressure to obtain a mixture 5. The epoxy equivalent of the obtained mixture 5 was 185 g / eq.

[実施例2(混合物2及び混合物6の合成例)]   [Example 2 (Synthesis example of mixture 2 and mixture 6)]

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

(混合物2の合成例)
窒素気流下、1L3口フラスコに二塩酸1,2,4−トリアミノベンゼン10.0g(50mmol)、N−メチル−2−ピロリドン40mLを仕込み、均一に溶解した。反応系中を室温に保ちながら40.0質量部の水酸化ナトリウム水溶液10.0g(水酸化ナトリウム100mmol)を15分間かけて滴下し、室温のまま1時間攪拌した。p−ヒドロキシフェニルグリオキサール7.50g(50mmol)、酢酸250mL、トルエン25mLを系中に加え、10時間還流させながら、反応液を共沸させ揮発する蒸気を冷却して得られた凝縮液を油/水分離し、水分を除いた油分を反応系に戻す方法により反応を行った。反応終了後、減圧下でトルエンを除き、水500mLを加えた後、沈殿物を濾取した。蒸留水で水洗した。エタノールを用いて再結晶を行い、沈殿物を濾取した後、減圧下でエタノールを除くことで、6−アミノ−2−p−ヒドロキシフェニルキノキサリンと7−アミノ−2−p−ヒドロキシフェニルキノキサリンとの混合物を得た。
(Synthesis example of mixture 2)
Under a nitrogen stream, 10.0 g (50 mmol) of 1,2,4-triaminobenzene dihydrochloride and 40 mL of N-methyl-2-pyrrolidone were charged into a 1 L 3-neck flask and dissolved uniformly. While maintaining the reaction system at room temperature, 40.0 parts by mass of sodium hydroxide aqueous solution 10.0 g (sodium hydroxide 100 mmol) was added dropwise over 15 minutes, and the mixture was stirred at room temperature for 1 hour. 7.50 g (50 mmol) of p-hydroxyphenylglyoxal, 250 mL of acetic acid, and 25 mL of toluene were added to the system, and the reaction mixture was refluxed for 10 hours. The reaction was carried out by separating the water and returning the oil from which water was removed to the reaction system. After completion of the reaction, toluene was removed under reduced pressure, 500 mL of water was added, and the precipitate was collected by filtration. Washed with distilled water. After recrystallization using ethanol, the precipitate was collected by filtration, and ethanol was removed under reduced pressure to obtain 6-amino-2-p-hydroxyphenylquinoxaline and 7-amino-2-p-hydroxyphenylquinoxaline. A mixture of was obtained.

窒素気流下、500mL3口フラスコに上記のようにして得られた6−アミノ−p−ヒドロキシフェニルキノキサリンと7−アミノ−p−ヒドロキシフェニルキノキサリンとの混合物10.0g(40mmol)、N,N−ジメチルアセトアミド100mLを仕込み、均一に溶解させた。氷浴により、反応系中の温度を0℃に保ちながら、p−ヒドロキシ安息香酸クロリド5.52g(40mmol)をN,N−ジメチルアセトアミド50mLに溶解させた溶液を15分間かけて滴下した。滴下終了後、反応系中の温度を60℃に昇温し、60℃を保ちながら5時間攪拌した。反応系中を室温に冷却した後、蒸留水300mLを加え、沈殿物を濾取した。蒸留水で水洗して副生成塩を除いた後、減圧下で水、N,N−ジメチルアセトアミドを除くことで、混合物2を得た。   Under a nitrogen stream, 10.0 g (40 mmol) of a mixture of 6-amino-p-hydroxyphenylquinoxaline and 7-amino-p-hydroxyphenylquinoxaline obtained as described above in a 500 mL three-necked flask, N, N-dimethyl 100 mL of acetamide was charged and dissolved uniformly. A solution prepared by dissolving 5.52 g (40 mmol) of p-hydroxybenzoic acid chloride in 50 mL of N, N-dimethylacetamide was dropped over 15 minutes while maintaining the temperature in the reaction system at 0 ° C. with an ice bath. After completion of the dropwise addition, the temperature in the reaction system was raised to 60 ° C. and stirred for 5 hours while maintaining 60 ° C. After cooling the reaction system to room temperature, 300 mL of distilled water was added, and the precipitate was collected by filtration. After washing with distilled water to remove by-product salts, water 2 and N, N-dimethylacetamide were removed under reduced pressure to obtain a mixture 2.

(混合物6の合成例)
混合物6を、実施例1記載の混合物1から混合物5を調製する方法と同様の方法で、上記混合物2から得た。得られた混合物6のエポキシ当量は、246g/eqであった。
(Synthesis example of mixture 6)
Mixture 6 was obtained from Mixture 2 in a manner similar to the method of preparing Mixture 5 from Mixture 1 described in Example 1. The epoxy equivalent of the obtained mixture 6 was 246 g / eq.

[実施例3(混合物3及び混合物7の合成例)]   [Example 3 (Synthesis example of mixture 3 and mixture 7)]

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

(混合物3の合成例)
窒素気流下、500L3口フラスコに四塩酸1,2,4,5−テトラアミノベンゼン5.68g(20mmol)、N−メチル−2−ピロリドン10mLを仕込み、均一に溶解した。反応系中を室温に保ちながら40.0質量部の水酸化ナトリウム水溶液8.00g(水酸化ナトリウム80mmol)を15分間かけて滴下し、室温のまま1時間攪拌した。p−ヒドロキシフェニルグリオキサール6.00g(40mmol)、酢酸100mL、トルエン10mLを系中に加え、10時間還流させながら、反応液を共沸させ揮発する蒸気を冷却して得られた凝縮液を油/水分離し、水分を除いた油分を反応系に戻す方法により反応を行った。反応終了後、減圧下でトルエンを除き、1mol/Lの塩酸20mLを加え、水300mLを加えた後、沈殿物を濾取した。蒸留水で水洗して副生成塩を除いた後、減圧下で酢酸、水を除くことで、混合物3を得た。
(Synthesis example of mixture 3)
Under a nitrogen stream, 5.68 g (20 mmol) of tetrahydrochloric acid 1,2,4,5-tetraaminobenzene and 10 mL of N-methyl-2-pyrrolidone were charged into a 500 L three-necked flask and dissolved uniformly. While maintaining the reaction system at room temperature, 40.0 parts by mass of sodium hydroxide aqueous solution 8.00 g (sodium hydroxide 80 mmol) was added dropwise over 15 minutes, and the mixture was stirred at room temperature for 1 hour. To the system, 6.00 g (40 mmol) of p-hydroxyphenylglyoxal, 100 mL of acetic acid, and 10 mL of toluene were added to the system and refluxed for 10 hours. The reaction was carried out by separating the water and returning the oil from which water was removed to the reaction system. After completion of the reaction, toluene was removed under reduced pressure, 20 mL of 1 mol / L hydrochloric acid was added, 300 mL of water was added, and the precipitate was collected by filtration. After washing with distilled water to remove by-product salts, acetic acid and water were removed under reduced pressure to obtain a mixture 3.

(混合物7の合成例)
混合物7を、実施例1記載の混合物1から混合物5を調製する方法と同様の方法で、上記混合物3から得た。得られた混合物7のエポキシ当量は、249g/eqであった。
(Synthesis example of mixture 7)
Mixture 7 was obtained from Mixture 3 in a manner similar to the method of preparing Mixture 5 from Mixture 1 described in Example 1. The epoxy equivalent of the obtained mixture 7 was 249 g / eq.

[実施例4(混合物4及び混合物8の合成例)]   [Example 4 (Synthesis example of mixture 4 and mixture 8)]

Figure 2010059242
Figure 2010059242

Figure 2010059242
Figure 2010059242

(混合物4の合成例)
混合物4は、四塩酸1,2,4,5−テトラアミノベンゼンに代えて四塩酸3,3’,4,4’−ビフェニルテトラアミンを用いた他は実施例3記載の混合物3の調製と同様の方法で得た。
(Synthesis example of mixture 4)
Mixture 4 was prepared by preparing Mixture 3 as described in Example 3, except that tetrahydrochloric acid 3,3 ′, 4,4′-biphenyltetraamine was used instead of tetrahydrochloric acid 1,2,4,5-tetraaminobenzene. Obtained in a similar manner.

(混合物8の合成例)
混合物8を、実施例1記載の混合物1から混合物5を調製する方法と同様の方法で、上記混合物4から得た。得られた混合物8のエポキシ当量は、295g/eqであった。
(Synthesis example of mixture 8)
Mixture 8 was obtained from mixture 4 in a manner similar to the method of preparing mixture 5 from mixture 1 described in Example 1. The epoxy equivalent of the obtained mixture 8 was 295 g / eq.

[比較例1〜3]
以下に、比較例で用いた比較エポキシ樹脂を示す。
[Comparative Examples 1-3]
Below, the comparative epoxy resin used by the comparative example is shown.

Figure 2010059242
Figure 2010059242

比較エポキシ樹脂1のエポキシ当量は、136g/eqであった。   The epoxy equivalent of the comparative epoxy resin 1 was 136 g / eq.

Figure 2010059242
Figure 2010059242

比較エポキシ樹脂2のエポキシ当量は、169g/eqであった。   The epoxy equivalent of the comparative epoxy resin 2 was 169 g / eq.

比較エポキシ樹脂3として、ジャパンエポキシレジン株式会社製JER604を用いた。エポキシ樹脂3のエポキシ当量は、180g/eqであった。   As comparative epoxy resin 3, JER604 manufactured by Japan Epoxy Resin Co., Ltd. was used. The epoxy equivalent of the epoxy resin 3 was 180 g / eq.

硬化剤1として、明和化成株式会社製MEH−7851−4Hを用いた。硬化剤1のOH当量は、241g/eqであった。   As the curing agent 1, MEH-7851-4H manufactured by Meiwa Kasei Co., Ltd. was used. The OH equivalent of the curing agent 1 was 241 g / eq.

[試験方法]
(1)線膨張係数
表面を粗化処理した金属板上に、樹脂ワニスを厚さ160μmに塗布し、オーブン中で130℃、10分間乾燥することで一部硬化させた。続けて、オーブン中で190℃、3時間加熱した。室温まで冷却した後、カッターナイフで3mm×18.5mmの大きさに加工し、線膨張係数測定用の試験片を作製した。この試験片を用いて、株式会社島津製作所製TMA−50で加熱膨張曲線を測定した。40℃〜100℃の範囲の伸び率から、線膨張係数を算出した。
[Test method]
(1) Linear expansion coefficient A resin varnish was applied to a thickness of 160 μm on a metal plate whose surface was roughened, and partially cured by drying in an oven at 130 ° C. for 10 minutes. Subsequently, it was heated in an oven at 190 ° C. for 3 hours. After cooling to room temperature, it was processed into a size of 3 mm × 18.5 mm with a cutter knife to prepare a test piece for measuring the linear expansion coefficient. Using this test piece, a heating expansion curve was measured with TMA-50 manufactured by Shimadzu Corporation. The linear expansion coefficient was calculated from the elongation in the range of 40 ° C to 100 ° C.

(2)はんだ耐熱性試験
樹脂ワニスを、厚さ100μmのガラス織布に塗布して含浸させ、130℃の温度で加熱し、プリプレグを作製した。得られたプリプレグを4枚重ね合わせ、その上下面に厚さ12μmの銅箔を重ねて、200℃、20kg/cm2の条件で3時間加熱加圧することで銅張積層板を作製した。銅張積層板の表面の銅箔をエッチング処理にて除去し、水洗した後、カッターナイフで40mm×40mmの大きさに加工し、はんだ耐熱性試験用の試験片を作製した。この試験片を120℃のオーブン中で乾燥し、121℃の飽和プレッシャークッカー中に3時間静置した後、試験片が乾燥しないように素早く冷水中に入れて冷却した。試験片表面の水分を拭き取った後、試験片を288℃に調整したはんだ浴中に30秒間浸し、表面に膨れなどの異常がないかを目視にて検査した。表1中、○は膨れなどの異常が無かったことを表し、×は膨れなどの異常があったことを表す。
(2) Solder heat resistance test A resin varnish was applied and impregnated on a glass woven fabric having a thickness of 100 μm, and heated at a temperature of 130 ° C. to prepare a prepreg. Four obtained prepregs were superposed, a copper foil having a thickness of 12 μm was superposed on the upper and lower surfaces thereof, and a copper clad laminate was produced by heating and pressing at 200 ° C. and 20 kg / cm 2 for 3 hours. The copper foil on the surface of the copper clad laminate was removed by etching treatment, washed with water, and then processed into a size of 40 mm × 40 mm with a cutter knife to prepare a test piece for a solder heat resistance test. The test piece was dried in an oven at 120 ° C. and left in a saturated pressure cooker at 121 ° C. for 3 hours, and then quickly cooled in cold water so that the test piece did not dry. After wiping off the moisture on the surface of the test piece, the test piece was immersed in a solder bath adjusted to 288 ° C. for 30 seconds, and visually inspected for abnormalities such as swelling on the surface. In Table 1, ◯ represents that there was no abnormality such as swelling, and X represents that there was abnormality such as swelling.

Figure 2010059242
Figure 2010059242

上記実施例、比較例から明らかなように、本発明は、一般式(1)で表される、キノキサリン骨格を有する化合物を用いることにより、低線膨張性とはんだ耐熱性とを併せ持つプリント配線板等に好適なエポキシ樹脂硬化性組成物等を得ることができる。   As is clear from the above Examples and Comparative Examples, the present invention provides a printed wiring board having both low linear expansion and solder heat resistance by using a compound having a quinoxaline skeleton represented by the general formula (1). An epoxy resin curable composition suitable for the above can be obtained.

本発明のエポキシ樹脂硬化性組成物、樹脂ワニス、プリプレグ、金属張積層板及び硬化物は、例えば電気電子製品に用いられるプリント配線板等の分野で有用である。   The epoxy resin curable composition, resin varnish, prepreg, metal-clad laminate and cured product of the present invention are useful in the field of printed wiring boards used for electric and electronic products, for example.

Claims (11)

下記一般式(1):
Figure 2010059242
(式中、X1及びX2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜12の炭化水素基、置換基を有してもよい炭素原子数1〜12のアルコキシ基、置換基を有してもよい炭素原子数1〜12のアミノ基、置換基を有してもよい炭素原子数1〜12のアミド基又は水素原子を表し、X1及びX2のいずれか一方又は両方は、フェノール性水酸基又はエポキシ基を有する。X1及びX2は互いに架橋していてもよく、その場合、X1及びX2が互いに架橋した構造は、飽和又は不飽和の炭素原子数3〜8の環構造であり、かつフェノール性水酸基又はエポキシ基を有する。Y1及びY2は、それぞれ独立し、フェノール性水酸基若しくはエポキシ基を有する置換基で置換された炭素原子数1〜12の炭化水素基、炭素原子数1〜12のアルコキシ基、炭素原子数1〜12のアミノ基、炭素原子数1〜12のアミド基、水酸基又は水素原子を表す。Y1及びY2は互いに架橋していてもよく、その場合、Y1及びY2が互いに架橋した構造は、飽和又は不飽和の炭素原子数3〜15の環構造であり、かつフェノール性水酸基又はエポキシ基を有する。Z1及びZ2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子を表す。mは0〜3の整数を表し、mが2〜3の場合、複数のZ1は同一でも異なっていてもよい。nは0〜2の整数を表す。)
で表される化合物を含有することを特徴とするエポキシ樹脂硬化性組成物。
The following general formula (1):
Figure 2010059242
(Wherein, X 1 and X 2 are each independently an optionally substituted hydrocarbon group having 1 to 12 carbon atoms, substituent a good carbon atoms of 1 to 12 alkoxy which may have Represents a group, an amino group having 1 to 12 carbon atoms which may have a substituent, an amide group having 1 to 12 carbon atoms which may have a substituent, or a hydrogen atom, and any one of X 1 and X 2 Either or both have a phenolic hydroxyl group or an epoxy group, and X 1 and X 2 may be cross-linked with each other, in which case the structure in which X 1 and X 2 are cross-linked with each other is a saturated or unsaturated carbon. It is a ring structure having 3 to 8 atoms and has a phenolic hydroxyl group or an epoxy group, and Y 1 and Y 2 are each independently 1 carbon atom substituted with a substituent having a phenolic hydroxyl group or an epoxy group. -12 hydrocarbon group, C 1-12 a Kokishi group, an amino group having 1 to 12 carbon atoms, an amide group having 1 to 12 carbon atoms, .Y 1 and Y 2 represents a hydroxyl group or a hydrogen atom may be crosslinked each other, in which case, Y 1 and The structure in which Y 2 is cross-linked with each other is a saturated or unsaturated ring structure having 3 to 15 carbon atoms and has a phenolic hydroxyl group or an epoxy group, and Z 1 and Z 2 are each independently a substituent. An optionally substituted hydrocarbon group having 1 to 8 carbon atoms or an optionally substituted alkoxy group having 1 to 8 carbon atoms or a hydrogen atom, m represents an integer of 0 to 3; Is 2 or 3, the plurality of Z 1 may be the same or different, and n represents an integer of 0 to 2.)
The epoxy resin curable composition characterized by containing the compound represented by these.
下記一般式(2):
Figure 2010059242
(式中、R1及びR2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜12の炭化水素基、置換基を有してもよい炭素原子数1〜12のアルコキシ基、置換基を有してもよい炭素原子数1〜12のアミノ基、置換基を有してもよい炭素原子数1〜12のアミド基又は水素原子を表し、R1及びR2のいずれか一方又は両方は、フェノール性水酸基又はエポキシ基を有する。Y1及びY2は、それぞれ独立し、フェノール性水酸基若しくはエポキシ基を有する置換基で置換された炭素原子数1〜12の炭化水素基、炭素原子数1〜12のアルコキシ基、炭素原子数1〜12のアミノ基、炭素原子数1〜12のアミド基、水酸基又は水素原子を表す。Y1及びY2は互いに架橋していてもよく、その場合、Y1及びY2が互いに架橋した構造は、飽和又は不飽和の炭素原子数3〜15の環構造であり、かつフェノール性水酸基又はエポキシ基を有する。Z1及びZ2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子を表す。mは0〜3の整数を表し、mが2〜3の場合、複数のZ1は同一でも異なっていてもよい。nは0〜2の整数を表す。)
で表される化合物を含有する、請求項1に記載のエポキシ樹脂硬化性組成物。
The following general formula (2):
Figure 2010059242
Wherein R 1 and R 2 are each independently a hydrocarbon group having 1 to 12 carbon atoms which may have a substituent, or an alkoxy having 1 to 12 carbon atoms which may have a substituent. Represents a group, an amino group having 1 to 12 carbon atoms which may have a substituent, an amide group having 1 to 12 carbon atoms which may have a substituent, or a hydrogen atom, and any one of R 1 and R 2 Either or both have a phenolic hydroxyl group or an epoxy group, and Y 1 and Y 2 are each independently a hydrocarbon group having 1 to 12 carbon atoms substituted with a substituent having a phenolic hydroxyl group or an epoxy group. Represents an alkoxy group having 1 to 12 carbon atoms, an amino group having 1 to 12 carbon atoms, an amide group having 1 to 12 carbon atoms, a hydroxyl group, or a hydrogen atom, and Y 1 and Y 2 may be cross-linked to each other. good, in which case, Y 1 and Y 2 are crosslinked with one another structure A saturated or unsaturated ring structure of 3 to 15 carbon atoms, and .Z 1 and Z 2 having a phenolic hydroxyl group or epoxy group, each independently, optionally carbon atoms which may have a substituent 1 to 8 hydrocarbon group or an optionally substituted alkoxy group having 1 to 8 carbon atoms or a hydrogen atom, m represents an integer of 0 to 3, and when m is 2 to 3, Z 1 may be the same or different, and n represents an integer of 0 to 2.)
The epoxy resin curable composition of Claim 1 containing the compound represented by these.
下記一般式(3):
Figure 2010059242
(式中、X1及びX2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜12の炭化水素基、置換基を有してもよい炭素原子数1〜12のアルコキシ基、置換基を有してもよい炭素原子数1〜12のアミノ基、置換基を有してもよい炭素原子数1〜12のアミド基又は水素原子を表し、X1及びX2のいずれか一方又は両方は、フェノール性水酸基又はエポキシ基を有する。nは、0〜2の整数を表す。Z1及びZ2は、それぞれ独立し、置換基を有してもよい炭素原子数1〜8の炭化水素基又は置換基を有してもよい炭素原子数1〜8のアルコキシ基又は水素原子を表す。W1及びW2のいずれか一方はグリシジルオキシ基又はフェノール性水酸基を有する基を表し、もう一方は水素原子を有する基を表し、nが0の場合、W1及びW2のいずれか一方は炭素原子数0〜7のフェノール性水酸基又はエポキシ基を有する置換基を表してもよい。)
で表される化合物を含有する、請求項1又は2に記載のエポキシ樹脂硬化性組成物。
The following general formula (3):
Figure 2010059242
(Wherein, X 1 and X 2 are each independently an optionally substituted hydrocarbon group having 1 to 12 carbon atoms, substituent a good carbon atoms of 1 to 12 alkoxy which may have Represents a group, an amino group having 1 to 12 carbon atoms which may have a substituent, an amide group having 1 to 12 carbon atoms which may have a substituent, or a hydrogen atom, and any one of X 1 and X 2 Either or both have a phenolic hydroxyl group or an epoxy group, n represents an integer of 0 to 2. Z 1 and Z 2 are each independently 1 to 1 carbon atoms which may have a substituent. 8 represents an alkoxy group having 1 to 8 carbon atoms or a hydrogen atom which may have a hydrocarbon group or a substituent, and one of W 1 and W 2 represents a group having a glycidyloxy group or a phenolic hydroxyl group. represents and the other represents a group having a hydrogen atom, when n is 0, W 1 and W 2 One may represent a substituent having a phenolic hydroxyl group or epoxy group having a carbon number of 0-7.)
The epoxy resin curable composition of Claim 1 or 2 containing the compound represented by these.
下記一般式(4):
Figure 2010059242
(式中、Bは、水素原子又はグリシジル基を表す。)
で表される化合物を含有する、請求項1又は2に記載のエポキシ樹脂硬化性組成物。
The following general formula (4):
Figure 2010059242
(In the formula, B represents a hydrogen atom or a glycidyl group.)
The epoxy resin curable composition of Claim 1 or 2 containing the compound represented by these.
下記一般式(5):
Figure 2010059242
(式中、Bは、水素原子又はグリシジル基を表す。)
で表される化合物を含有する、請求項1に記載のエポキシ樹脂硬化性組成物。
The following general formula (5):
Figure 2010059242
(In the formula, B represents a hydrogen atom or a glycidyl group.)
The epoxy resin curable composition of Claim 1 containing the compound represented by these.
下記一般式(6):
Figure 2010059242
(式中、Bは、水素原子又はグリシジル基を表す。)
で表される化合物を含有する、請求項1又は2に記載のエポキシ樹脂硬化性組成物。
The following general formula (6):
Figure 2010059242
(In the formula, B represents a hydrogen atom or a glycidyl group.)
The epoxy resin curable composition of Claim 1 or 2 containing the compound represented by these.
下記一般式(7):
Figure 2010059242
(式中、Bは、水素原子又はグリシジル基を表す。)
で表される化合物を含有する、請求項1又は3に記載のエポキシ樹脂硬化性組成物。
The following general formula (7):
Figure 2010059242
(In the formula, B represents a hydrogen atom or a glycidyl group.)
The epoxy resin curable composition of Claim 1 or 3 containing the compound represented by these.
請求項1〜7のいずれかに記載のエポキシ樹脂硬化性組成物と、有機溶剤とを含有する樹脂ワニス。   A resin varnish containing the epoxy resin curable composition according to claim 1 and an organic solvent. 請求項8に記載の樹脂ワニスをガラス織布又はガラス不織布又は有機繊維織布に含浸した後に加熱して得られるプリプレグ。   A prepreg obtained by heating after impregnating the resin varnish according to claim 8 into a glass woven fabric, a glass nonwoven fabric or an organic fiber woven fabric. 請求項9に記載のプリプレグと金属箔とが積層されてなる金属張積層板。   A metal-clad laminate obtained by laminating the prepreg according to claim 9 and a metal foil. 請求項1〜7のいずれかに記載のエポキシ樹脂硬化性組成物又は請求項8に記載の樹脂ワニスを硬化させてなる硬化物。   Hardened | cured material formed by hardening | curing the epoxy resin curable composition in any one of Claims 1-7, or the resin varnish of Claim 8.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017125009A (en) * 2015-12-21 2017-07-20 Jnc株式会社 Polymerizable liquid crystal compound, polymerizable liquid crystal composition, liquid crystal polymer thereof and method for producing liquid crystal polymer
WO2019176972A1 (en) * 2018-03-14 2019-09-19 富士フイルム株式会社 Cured product, optical member, lens and compound

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61277681A (en) * 1985-06-01 1986-12-08 Agency Of Ind Science & Technol Addition curing type quinoxaline resin oligomer and intermediate material for fiber-reinforced composite material using said oligomer
JPS6375033A (en) * 1986-09-18 1988-04-05 Agency Of Ind Science & Technol Addition-curing polyquinoxaline resin composition and carbon fiber reinforced composite material containing said composition as matrix
JPS63130632A (en) * 1986-11-21 1988-06-02 Agency Of Ind Science & Technol Addition-curable polyquinoxaline resin composition and intermediate material for carbon fiber-reinforced composite material, having said composition as matrix
JP2005298788A (en) * 2004-04-15 2005-10-27 Chiba Univ Heat resistant and high strength epoxy resin
JP2005314624A (en) * 2004-04-28 2005-11-10 Chiba Univ High strength epoxy resin

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61277681A (en) * 1985-06-01 1986-12-08 Agency Of Ind Science & Technol Addition curing type quinoxaline resin oligomer and intermediate material for fiber-reinforced composite material using said oligomer
JPS6375033A (en) * 1986-09-18 1988-04-05 Agency Of Ind Science & Technol Addition-curing polyquinoxaline resin composition and carbon fiber reinforced composite material containing said composition as matrix
JPS63130632A (en) * 1986-11-21 1988-06-02 Agency Of Ind Science & Technol Addition-curable polyquinoxaline resin composition and intermediate material for carbon fiber-reinforced composite material, having said composition as matrix
JP2005298788A (en) * 2004-04-15 2005-10-27 Chiba Univ Heat resistant and high strength epoxy resin
JP2005314624A (en) * 2004-04-28 2005-11-10 Chiba Univ High strength epoxy resin

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017125009A (en) * 2015-12-21 2017-07-20 Jnc株式会社 Polymerizable liquid crystal compound, polymerizable liquid crystal composition, liquid crystal polymer thereof and method for producing liquid crystal polymer
WO2019176972A1 (en) * 2018-03-14 2019-09-19 富士フイルム株式会社 Cured product, optical member, lens and compound
JPWO2019176972A1 (en) * 2018-03-14 2021-02-12 富士フイルム株式会社 Cures, optics, lenses, and compounds
US11396613B2 (en) 2018-03-14 2022-07-26 Fujifilm Corporation Cured product, optical member, lens, and compound

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