JP2010059098A - Method for producing 9,9-biscresol fluorene - Google Patents
Method for producing 9,9-biscresol fluorene Download PDFInfo
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- JP2010059098A JP2010059098A JP2008226603A JP2008226603A JP2010059098A JP 2010059098 A JP2010059098 A JP 2010059098A JP 2008226603 A JP2008226603 A JP 2008226603A JP 2008226603 A JP2008226603 A JP 2008226603A JP 2010059098 A JP2010059098 A JP 2010059098A
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- Prior art keywords
- cresol
- reaction
- fluorene
- fluorenone
- producing
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000006243 chemical reaction Methods 0.000 claims abstract description 34
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000011964 heteropoly acid Substances 0.000 claims abstract description 20
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229930003836 cresol Natural products 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 12
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 claims description 34
- DQNZMWYGEHZJMH-UHFFFAOYSA-N C1=CC=CC=2C3=CC=CC=C3CC12.CC=1C=C(C=CC1O)O Chemical compound C1=CC=CC=2C3=CC=CC=C3CC12.CC=1C=C(C=CC1O)O DQNZMWYGEHZJMH-UHFFFAOYSA-N 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052717 sulfur Inorganic materials 0.000 abstract description 12
- 239000011593 sulfur Substances 0.000 abstract description 12
- 239000003054 catalyst Substances 0.000 abstract description 11
- 238000011403 purification operation Methods 0.000 abstract description 3
- 230000008030 elimination Effects 0.000 abstract 1
- 238000003379 elimination reaction Methods 0.000 abstract 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
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- 239000002904 solvent Substances 0.000 description 14
- NUDSREQIJYWLRA-UHFFFAOYSA-N 4-[9-(4-hydroxy-3-methylphenyl)fluoren-9-yl]-2-methylphenol Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3C3=CC=CC=C32)C=2C=C(C)C(O)=CC=2)=C1 NUDSREQIJYWLRA-UHFFFAOYSA-N 0.000 description 12
- 239000012044 organic layer Substances 0.000 description 12
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
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- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
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- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
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- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
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- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 208000005156 Dehydration Diseases 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
本発明は、ポリエステル、ポリウレタン、ポリカーボネート、エポキシ樹脂、変性アクリル樹脂等の原料として有用な9,9−ビスクレゾールフルオレンの製造法に関する。 The present invention relates to a method for producing 9,9-biscresol fluorene useful as a raw material for polyester, polyurethane, polycarbonate, epoxy resin, modified acrylic resin and the like.
9,9−ビスクレゾールフルオレンの製造方法としては、硫酸とチオールを触媒としてフルオレノンとクレゾールを脱水縮合させる方法が開示されている(特許文献1)。 しかし、この方法では製品中に触媒由来のイオウ分が混入することにより、製品の着色や安定性の低下などの問題が生じる。更に光学樹脂原料など、高純度の製品を得るにはイオウ分を除くために精製を繰り返す必要があり、工業的に有利な方法とは言えない。
硫酸または塩化水素ガスを使用しない方法として、我々は、先にヘテロポリ酸触媒下、フルオレノン類とフェノール類からフルオレン誘導体を製造する方法を提案した。(特許文献2)。しかし、この方法において、フェノール類にクレゾールを用いた場合、9,9−ビスクレゾールフルオレンが着色したり、異性体や多量体などの副生成物が生成し、純度や収率が低下する場合があった。
As a method for producing 9,9-biscresol fluorene, a method of dehydrating and condensing fluorenone and cresol using sulfuric acid and thiol as a catalyst is disclosed (Patent Document 1). However, in this method, problems such as coloring of the product and a decrease in stability occur due to the sulfur component derived from the catalyst mixed in the product. Further, in order to obtain a high-purity product such as an optical resin raw material, it is necessary to repeat purification in order to remove the sulfur content, which is not an industrially advantageous method.
As a method not using sulfuric acid or hydrogen chloride gas, we previously proposed a method for producing a fluorene derivative from a fluorenone and a phenol under a heteropolyacid catalyst. (Patent Document 2). However, in this method, when cresol is used for phenols, 9,9-biscresol fluorene may be colored or by-products such as isomers and multimers may be produced, resulting in a decrease in purity and yield. there were.
本発明はフルオレノンとクレゾールの反応による9,9−ビスクレゾールフルオレンの製造において、煩雑な触媒除去操作や精製操作を行なわなくとも、イオウ分を含まず、高純度でかつ着色の防止された高品質な製品を工業的有利に製造する方法を提供することを目的とする。 In the production of 9,9-biscresol fluorene by the reaction of fluorenone and cresol, the present invention does not contain a complicated catalyst removal operation or purification operation, and does not contain sulfur, has a high purity and is prevented from being colored. It is an object of the present invention to provide a method for industrially manufacturing such a product.
本発明者らは、前記の課題を解決すべく反応条件に着目し、鋭意研究を重ねた結果、フルオレノンとクレゾールをヘテロポリ酸触媒存在下、30〜95℃の温度範囲で200mmHg以下の減圧下に反応させることにより、高収率で着色の防止された高品質な9,9−ビスクレゾールフルオレンを製造できることを見出し、本発明を完成するに至った。 The inventors of the present invention focused on the reaction conditions in order to solve the above-mentioned problems, and as a result of extensive research, fluorenone and cresol were subjected to a reduced pressure of 200 mmHg or less in the temperature range of 30 to 95 ° C. in the presence of a heteropolyacid catalyst. By carrying out the reaction, it was found that high-quality 9,9-biscresol fluorene, which was prevented from being colored in a high yield, could be produced, and the present invention was completed.
即ち、本発明は、下記(1)〜(3)を提供するものである。
(1)ヘテロポリ酸存在下、フルオレノンとクレゾールを反応させ、9,9−ビスクレゾールフルオレンを製造する方法において、30×103Pa以下の減圧下、30〜95℃の温度範囲で反応させることを特徴とする9,9−ビスクレゾールフルオレンの製造法。
(2)フルオレノンに対し11〜20モル倍のクレゾールを使用し反応することを特徴とする請求項1記載の製造法。
(3)クレゾールがo−クレゾールである請求項1〜2記載の9,9−ビス(4−ヒドロキシ−3−メチルフェノール)フルオレンの製造法。
That is, the present invention provides the following (1) to (3).
(1) In a method for producing 9,9-biscresol fluorene by reacting fluorenone and cresol in the presence of a heteropolyacid, the reaction is carried out in a temperature range of 30 to 95 ° C. under a reduced pressure of 30 × 10 3 Pa or less. A method for producing 9,9-biscresol fluorene, which is characterized.
(2) The process according to claim 1, wherein the reaction is carried out using 11 to 20 moles of cresol with respect to fluorenone.
(3) The method for producing 9,9-bis (4-hydroxy-3-methylphenol) fluorene according to claim 1 or 2, wherein the cresol is o-cresol.
本発明によれば、フルオレノンとクレゾールの反応による9,9−ビスクレゾールフルオレンの製造において、煩雑な触媒除去操作や精製操作を行なわなくとも、イオウ分を含まず、高純度でかつ着色の防止された高品質な製品を工業的有利に製造する方法を提供することができる。 According to the present invention, in the production of 9,9-biscresol fluorene by the reaction of fluorenone and cresol, sulfur is not contained and high purity and coloration can be prevented without performing complicated catalyst removal operation and purification operation. In addition, it is possible to provide a method for producing a high-quality product in an industrially advantageous manner.
以下、本発明をその実施の形態とともに記載する。 Hereinafter, the present invention will be described together with embodiments thereof.
本発明において好ましく用いられるヘテロポリ酸とは、一般的には異なる2種以上の無機酸素酸が縮合して生成した化合物の総称であり、中心の酸素酸とその周りで縮合する別種の酸素酸の組み合わせにより種々のヘテロポリ酸が可能である。中心の酸素酸を形成する数の少ない元素をヘテロ元素といい、その周りで縮合する酸素酸を形成する元素をポリ元素という、ポリ元素は単一種類の元素であってもよいし、複数種類の元素であってもよい。 The heteropolyacid preferably used in the present invention is a general term for compounds formed by condensation of two or more different inorganic oxygen acids, and is a generic name of a central oxygen acid and another oxygen acid condensed around it. Various heteropolyacids are possible depending on the combination. A small number of elements that form a central oxygen acid are called heteroelements, and an element that forms oxygen acid that condenses around them is called a polyelement. A polyelement may be a single type or multiple types May be used.
ヘテロポリ酸を構成する酸素酸のヘテロ元素は特に限定されるものではないが、例えば、銅、ベリリウム、ホウ素、アルミニウム、炭素、ケイ素、ゲルマニウム、スズ、チタン、ジルコニウム、セリウム、トリウム、窒素、リン、ヒ素、アンチモン、バナジウム、ニオブ、タンタル、クロム、モリブデン、タングステン、ウラン、セレン、テルル、マンガン、ヨウ素、鉄、コバルト、ニッケル、ロジウム、オスミウム、イルジウム、白金が挙げられる。好ましくはリンまたはケイ素である。また、ヘテロポリ酸を構成する酸素酸のポリ元素は特に限定されるものではないが、例えば、バナジウム、モリブデン、タングステン、ニオブ、タンタルが挙げられる。好ましくはバナジウム、モリブデン、タングステンである。 The hetero element of the oxygen acid constituting the heteropolyacid is not particularly limited, for example, copper, beryllium, boron, aluminum, carbon, silicon, germanium, tin, titanium, zirconium, cerium, thorium, nitrogen, phosphorus, Examples include arsenic, antimony, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, uranium, selenium, tellurium, manganese, iodine, iron, cobalt, nickel, rhodium, osmium, irdium, and platinum. Preferably it is phosphorus or silicon. Moreover, the poly element of the oxygen acid which comprises heteropoly acid is not specifically limited, For example, vanadium, molybdenum, tungsten, niobium, and tantalum are mentioned. Vanadium, molybdenum and tungsten are preferred.
ヘテロポリ酸骨格を構成するヘテロポリ酸アニオンとしては種々の組成のものを使用できる。例えば、XM12O40、XM12O42、XM18O62、XM6O24などが挙げられる。好ましいヘテロポリ酸アニオンの組成は、XM12O40である。各式中、Xはヘテロ元素であり、Mはポリ元素である。これらの組成を有するヘテロポリ酸として、具体的には、リンモリブデン酸、リンタングステン酸、ケイモリブデン酸、ケイタングステン酸、リンバナドモリブデン酸などが例示される。 As the heteropolyacid anion constituting the heteropolyacid skeleton, those having various compositions can be used. For example, such XM 12 O 40, XM 12 O 42, XM 18 O 62, XM 6 O 24 and the like. A preferred heteropolyacid anion composition is XM 12 O 40 . In each formula, X is a hetero element, and M is a poly element. Specific examples of heteropolyacids having these compositions include phosphomolybdic acid, phosphotungstic acid, silicomolybdic acid, silicotungstic acid, and phosphovanadomolybdic acid.
ヘテロポリ酸は、遊離のヘテロポリ酸であってもよく、プロトンの一部もしくはすべてを他のカチオンで置き換えて、ヘテロポリ酸の塩として使用することもできる。従って、本発明で言うヘテロポリ酸とはこれらのヘテロポリ酸の塩も含まれる。プロトンと置換可能なカチオンとしては、例えば、アンモニウム、アルカリ金属、アルカリ土類金属などが挙げられる。 The heteropolyacid may be a free heteropolyacid, and may be used as a salt of a heteropolyacid by replacing some or all of the protons with other cations. Accordingly, the heteropolyacid referred to in the present invention includes salts of these heteropolyacids. Examples of cations that can be substituted with protons include ammonium, alkali metals, alkaline earth metals, and the like.
ヘテロポリ酸は無水物であってもよく、結晶水含有物であってもよいが、無水物の方がより反応が早く、また副生成物の生成が抑制され好ましい。結晶水含有物の場合、予め減圧乾燥や溶媒との共沸脱水等の脱水処理を行うことにより無水物と同様の効果を得ることができる。ヘテロポリ酸は活性炭、アルミナ、シリカ−アルミナ、ケイソウ土などの担体に担持した形態で用いてもよい。これらのヘテロポリ酸は単独で使用してもよく、2種以上を組み合わせて使用することもできる。また、必要に応じて、本発明の目的を損なわない範囲でヘテロポリ酸以外の他の触媒を併用してもよい。 The heteropolyacid may be an anhydride or a crystal water-containing product, but the anhydride is preferred because the reaction is faster and the formation of by-products is suppressed. In the case of a crystal water-containing material, the same effect as that of the anhydride can be obtained by performing dehydration treatment such as drying under reduced pressure or azeotropic dehydration with a solvent in advance. The heteropolyacid may be used in a form supported on a support such as activated carbon, alumina, silica-alumina, or diatomaceous earth. These heteropolyacids may be used alone or in combination of two or more. Moreover, you may use together other catalysts other than heteropoly acid in the range which does not impair the objective of this invention as needed.
ヘテロポリ酸の使用量は特に限定されるものではないが、充分な反応速度を得るには、フルオレノンに対して、0.0001重量倍以上、好ましくは0.001〜30重量倍、更に好ましくは0.01〜5重量倍である。 The amount of the heteropolyacid used is not particularly limited, but in order to obtain a sufficient reaction rate, it is 0.0001 times by weight or more, preferably 0.001 to 30 times by weight, more preferably 0 to fluorenone. 0.01 to 5 times by weight.
本発明におけるクレゾールとしては、o−クレゾール,m−クレゾール,p−クレゾールが挙げられ、これらは、単独でも2種以上の混合物でもよいが、o−クレゾールが好ましい。その使用量は、特に限定されるものではないが、作業性及び経済性の点から、通常、フルオレノン1モルに対して、11〜25モルであり、好ましくは11〜20モルである。クレゾールの使用量が11モル倍より少ない場合は反応中結晶(生成物)が析出し作業性が悪化する場合がある。また、クレゾールの使用量が25モル倍より多いと経済的に不利になる。 Examples of the cresol in the present invention include o-cresol, m-cresol, and p-cresol, and these may be used alone or as a mixture of two or more thereof, but o-cresol is preferable. Although the usage-amount is not specifically limited, From the point of workability | operativity and economical efficiency, it is 11-25 mol normally with respect to 1 mol of fluorenones, Preferably it is 11-20 mol. When the amount of cresol used is less than 11 mol times, crystals (product) may be precipitated during the reaction, and workability may deteriorate. Further, if the amount of cresol used is more than 25 mol times, it is economically disadvantageous.
フルオレノンとフェノール類とを反応する方法は、例えば、フルオレノンとフェノール類とヘテロポリ酸を反応装置に仕込み、加熱攪拌することにより行うことができる。この際、触媒含有水や反応生成水などの反応系内の水分を除去する脱水条件下で反応を行うことにより、反応系内の水分を除去しない場合よりは反応が早く進行し、副生成物の生成が抑制される。 The method of reacting fluorenone and phenols can be carried out, for example, by charging fluorenone, phenols and heteropolyacid into a reaction apparatus and stirring them with heating. At this time, by carrying out the reaction under dehydrating conditions for removing water in the reaction system such as catalyst-containing water and reaction product water, the reaction proceeds faster than when water in the reaction system is not removed, and by-products Generation is suppressed.
本発明における反応温度は溶媒の種類、減圧度により異なるが、30〜95℃であり、好ましくは40〜80℃、更に好ましくは55〜80℃である。反応温度が95℃より高いと副生成物の増加により純度、収率が低下する。また、製品の着色が生じ好ましくない。反応温度が30℃より低いと反応が進行しないかまたは反応が完結するのに長時間を要するため好ましくない。 Although the reaction temperature in this invention changes with the kind of solvent, and a pressure reduction degree, it is 30-95 degreeC, Preferably it is 40-80 degreeC, More preferably, it is 55-80 degreeC. When the reaction temperature is higher than 95 ° C., the purity and yield are reduced due to the increase of by-products. Moreover, coloring of a product arises and it is not preferable. A reaction temperature lower than 30 ° C. is not preferable because the reaction does not proceed or it takes a long time to complete the reaction.
本発明における減圧度は、30×103Pa以下であり、好ましくは7×103Pa以下、更に好ましくは0.5×103Pa〜3×103Paである。反応温度が30〜95℃である場合において、減圧度が30×103Paを超えた場合には、得られる9,9−ビスクレゾールフルオレンが着色し、工業的に使用できない。 Vacuum degree in the present invention is 30 × 10 3 Pa or less, preferably 7 × 10 3 Pa or less, more preferably 0.5 × 10 3 Pa~3 × 10 3 Pa. When the reaction temperature is 30 to 95 ° C. and the degree of vacuum exceeds 30 × 10 3 Pa, the 9,9-biscresol fluorene obtained is colored and cannot be used industrially.
本発明において、必要に応じて本発明の目的を損なわない範囲で共沸脱水溶媒を用いて減圧反応することもできる。反応に用いられる共沸脱水溶媒としては、特に限定されるものではないが、トルエン、キシレンなどの芳香族炭化水素溶媒、クロロベンゼン、ジクロロベンゼンなどのハロゲン化芳香族炭化水素溶媒、ペンタン、ヘキサン、ヘプタンなどの脂肪族炭化水素溶媒、ジクロロメタン、1,2−ジクロロエタンなどのハロゲン化脂肪族炭化水素溶媒、ジエチルエーテル、ジ−iso−プロピルエーテル、メチル−t−ブチルエーテル、ジフェニルエーテル、テトラヒドロフラン、ジオキサンなどの脂肪族および環状エーテル溶媒、酢酸エチル、酢酸ブチルなどのエステル溶媒、アセトニトリル、プロピオニトリル、ブチロニトリル、ベンゾニトリルなどのニトリル溶媒、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、1−メチル−2−ピロリジノンなどのアミド溶媒、などが挙げられる。好ましくは芳香族炭化水素溶媒、ハロゲン化芳香族炭化水素溶媒であり、さらに好ましくはトルエン、キシレン、クロロベンゼン、ジクロロベンゼンである。その使用量は特に限定されるものではないが、通常、フルオレノンに対し10重量部以下、好ましくは5重量部以下、更に好ましくは2重量部以下である。適量の溶媒は反応を促進するが、使用量が多いと反応が遅くなる場合がある。 In the present invention, if necessary, the reaction can be carried out under reduced pressure using an azeotropic dehydration solvent as long as the object of the present invention is not impaired. The azeotropic dehydration solvent used in the reaction is not particularly limited, but is an aromatic hydrocarbon solvent such as toluene or xylene, a halogenated aromatic hydrocarbon solvent such as chlorobenzene or dichlorobenzene, pentane, hexane or heptane. Aliphatic hydrocarbon solvents such as dichloromethane, halogenated aliphatic hydrocarbon solvents such as dichloromethane and 1,2-dichloroethane, aliphatic ethers such as diethyl ether, di-iso-propyl ether, methyl-t-butyl ether, diphenyl ether, tetrahydrofuran and dioxane And cyclic ether solvents, ester solvents such as ethyl acetate and butyl acetate, nitrile solvents such as acetonitrile, propionitrile, butyronitrile, and benzonitrile, N, N-dimethylformamide, N, N-dimethylacetamide, 1-methyl Amide solvents such as 2-pyrrolidinone, and the like. Preferred are aromatic hydrocarbon solvents and halogenated aromatic hydrocarbon solvents, and more preferred are toluene, xylene, chlorobenzene and dichlorobenzene. The amount used is not particularly limited, but is usually 10 parts by weight or less, preferably 5 parts by weight or less, more preferably 2 parts by weight or less based on fluorenone. An appropriate amount of solvent accelerates the reaction, but if the amount used is large, the reaction may be slow.
反応後、反応液に溶媒を加え、冷却晶析することにより結晶として9,9−ビスクレゾールフルオレンを得ることができ、析出した結晶は濾過等により回収される。また必要に応じて洗浄、吸着、水蒸気蒸留、再結晶などの精製を行うことができる。 After the reaction, 9,9-biscresol fluorene can be obtained as a crystal by adding a solvent to the reaction solution and crystallization by cooling, and the precipitated crystal is recovered by filtration or the like. If necessary, purification such as washing, adsorption, steam distillation, recrystallization and the like can be performed.
(実施例)
以下に本発明の実施例を示すが、本発明はこれらに限定されるものではない。
例中、特にことわらないかぎり%はHPLCにおける面積百分率値であり、部は重量基準である。
HPLC測定条件:
装置 :島津 LC−2010A
カラム:L−Column ODS(5μm、4.6mmφ×150mm)
移動相:A液: 水/メタノール=70/30(v/v)、B液:メタノール
B液濃度:30%→100%(25分)→100%(35分)
流量:1.0ml/min、カラム温度:40℃、検出波長:UV 254nm
イオウ分測定方法および測定条件
試験法: 酸水素炎燃焼−イオンクロマト法
装置 : 酸水素炎燃焼装置:N-LS(東京科学精機)
イオンクロマトグラフ:DX−120(DIONEX製)
カラム;DIONEX IonPac AS14
検出器;DS4 DETECTION STABILIZER
MODEL DS4−1
(Example)
Examples of the present invention are shown below, but the present invention is not limited thereto.
In the examples, unless otherwise specified,% is an area percentage value in HPLC, and parts are based on weight.
HPLC measurement conditions:
Equipment: Shimadzu LC-2010A
Column: L-Column ODS (5 μm, 4.6 mmφ × 150 mm)
Mobile phase: Liquid A: water / methanol = 70/30 (v / v), liquid B: methanol liquid B concentration: 30% → 100% (25 minutes) → 100% (35 minutes)
Flow rate: 1.0 ml / min, column temperature: 40 ° C., detection wavelength: UV 254 nm
Sulfur content measurement method and measurement condition test method: Oxyhydrogen flame combustion-ion chromatography apparatus: Oxyhydrogen flame combustion apparatus: N-LS (Tokyo Kagaku Seiki)
Ion chromatograph: DX-120 (manufactured by DIONEX)
Column; DIONEX IonPac AS14
Detector; DS4 DETECTION STABILIZER
MODEL DS4-1
攪拌機、窒素吹込管、温度計およびT字管を付けたガラス製反応器に、フルオレノン23g(0.128モル)、o-クレゾール184g(1.70モル)および触媒としてリンタングステン酸[(H3PW12O40)・nH2O]0.58gを加え、温度70℃、1.3×103Paの減圧下で生成する水を系外に除去しながら4時間反応した。
得られた反応混合物にトルエン130gと水酸化ナトリウム水溶液を加え、70℃で中和後水洗した。 有機層を分液し得られた有機層を減圧濃縮することにより、トルエンおよび過剰のo-クレゾールを除去した。得られた濃縮物にトルエン161gを加え、115℃で9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンを溶解させた後、得られた溶液をそのまま10℃まで冷却した。析出した結晶を濾過により取り出し、乾燥させることにより、9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンの白色結晶41.0g(収率84.9%、HPLC純度99.4%)を得た。得られた結晶中のイオウ分は検出限界(10ppm)未満であった。
A glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer, and a T-tube was charged with 23 g (0.128 mol) of fluorenone, 184 g (1.70 mol) of o-cresol and phosphotungstic acid [(H 3 PW 12 O 40 ) · nH 2 O] was added, and the reaction was carried out for 4 hours while removing the water produced at a temperature of 70 ° C. under reduced pressure of 1.3 × 10 3 Pa from the system.
To the resulting reaction mixture, 130 g of toluene and an aqueous sodium hydroxide solution were added, neutralized at 70 ° C., and washed with water. The organic layer obtained by separating the organic layer was concentrated under reduced pressure to remove toluene and excess o-cresol. 161 g of toluene was added to the resulting concentrate, and 9,9-bis (4-hydroxy-3-methylphenyl) fluorene was dissolved at 115 ° C., and the resulting solution was then cooled to 10 ° C. as it was. The precipitated crystals were removed by filtration and dried to give 41.0 g of 9,9-bis (4-hydroxy-3-methylphenyl) fluorene white crystals (yield 84.9%, HPLC purity 99.4%). Got. The sulfur content in the obtained crystals was less than the detection limit (10 ppm).
攪拌機、窒素吹込管、温度計およびT字管を付けたガラス製反応器に、フルオレノン23g(0.128モル)、o-クレゾール184g(1.70モル)、トルエン10gおよび触媒としてリンタングステン酸[(H3PW12O40)・nH2O]0.58gを加え、温度70℃、1.3×103Paの減圧下で生成する水を系外に除去しながら3時間反応した。 得られた反応混合物にトルエン130gと水酸化ナトリウム水溶液を加え、70℃で中和後水洗した。 有機層を分液し得られた有機層を減圧濃縮することにより、トルエンおよび過剰のo-クレゾールを除去した。得られた濃縮物にトルエン161gを加え、115℃で9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンを溶解させた後、得られた溶液をそのまま10℃まで冷却した。析出した結晶を濾過により取り出し、乾燥させることにより、9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンの白色結晶37.7g(収率78.0%、HPLC純度99.4%)を得た。得られた結晶中のイオウ分は検出限界(10ppm)未満であった。 A glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a T-tube was charged with 23 g (0.128 mol) of fluorenone, 184 g (1.70 mol) of o-cresol, 10 g of toluene and phosphotungstic acid as a catalyst [ (H 3 PW 12 O 40 ) · nH 2 O] was added in an amount of 0.58 g, and the mixture was reacted for 3 hours while removing water generated at a temperature of 70 ° C. under a reduced pressure of 1.3 × 10 3 Pa from the system. To the resulting reaction mixture, 130 g of toluene and an aqueous sodium hydroxide solution were added, neutralized at 70 ° C., and washed with water. The organic layer obtained by separating the organic layer was concentrated under reduced pressure to remove toluene and excess o-cresol. 161 g of toluene was added to the resulting concentrate, and 9,9-bis (4-hydroxy-3-methylphenyl) fluorene was dissolved at 115 ° C., and the resulting solution was then cooled to 10 ° C. as it was. The precipitated crystals were removed by filtration and dried to give 37.7 g of white crystals of 9,9-bis (4-hydroxy-3-methylphenyl) fluorene (yield 78.0%, HPLC purity 99.4%). Got. The sulfur content in the obtained crystals was less than the detection limit (10 ppm).
攪拌機、窒素吹込管、温度計およびT字管を付けたガラス製反応器に、フルオレノン23g(0.128モル)、o-クレゾール184g(1.70モル)および触媒としてリンタングステン酸[(H3PW12O40)・nH2O]0.58gを加え、温度90℃、6.5×103Paの減圧下で生成する水を系外に除去しながら2時間反応した。
得られた反応混合物にトルエン130gと水酸化ナトリウム水溶液を加え、70℃で中和後水洗した。 有機層を分液し得られた有機層を減圧濃縮することにより、トルエンおよび過剰のo-クレゾールを除去した。得られた濃縮物にトルエン161gを加え、115℃で9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンを溶解させた後、得られた溶液をそのまま10℃まで冷却した。析出した結晶を濾過により取り出し、乾燥させることにより、9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンの白色結晶35.1g(収率72.7%、HPLC純度99.0%)を得た。得られた結晶中のイオウ分は検出限界(10ppm)未満であった。
A glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a T-tube was charged with 23 g (0.128 mol) of fluorenone, 184 g (1.70 mol) of o-cresol and phosphotungstic acid [(H 3 0.58 g of PW 12 O 40 ) · nH 2 O] was added, and the reaction was carried out for 2 hours while removing the water produced at a temperature of 90 ° C. under reduced pressure of 6.5 × 10 3 Pa from the system.
To the obtained reaction mixture, 130 g of toluene and an aqueous sodium hydroxide solution were added, neutralized at 70 ° C., and washed with water. The organic layer obtained by separating the organic layer was concentrated under reduced pressure to remove toluene and excess o-cresol. 161 g of toluene was added to the resulting concentrate, and 9,9-bis (4-hydroxy-3-methylphenyl) fluorene was dissolved at 115 ° C., and the resulting solution was then cooled to 10 ° C. as it was. The precipitated crystals were taken out by filtration and dried to give 35.1 g of white crystals of 9,9-bis (4-hydroxy-3-methylphenyl) fluorene (yield 72.7%, HPLC purity 99.0%). Got. The sulfur content in the obtained crystals was less than the detection limit (10 ppm).
(比較例1)
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン10.0g(0.056モル)、o−クレゾール36.7g(0.339モル)および触媒としてリンタングステン酸[(H3PW12O40)・nH2O]2.0gを加え、常圧下、温度を160℃に保ちながら、窒素雰囲気下で約5時間反応した。得られた反応混合物にトルエン65gと水酸化ナトリウム水溶液を加え、70℃で中和後水洗した。 有機層を分液し得られた有機層を減圧濃縮することにより、トルエンおよび過剰のo-クレゾールを除去した。得られた濃縮物にトルエン80gを加え、115℃で9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンを溶解させた後、得られた溶液をそのまま10℃まで冷却した。析出した結晶を濾過により取り出し、乾燥させることにより、9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンの褐色結晶9.15g(収率43.6%、HPLC純度95.3%)を得た。得られた結晶中のイオウ分は検出限界(10ppm)未満であった。
(Comparative Example 1)
In a glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube, 10.0 g (0.056 mol) of fluorenone, 36.7 g (0.339 mol) of o-cresol and phosphotungstic acid [( H 3 PW 12 O 40 ) · nH 2 O] was added and reacted under a nitrogen atmosphere for about 5 hours while maintaining the temperature at 160 ° C. under normal pressure. To the obtained reaction mixture, 65 g of toluene and an aqueous sodium hydroxide solution were added, neutralized at 70 ° C., and washed with water. The organic layer obtained by separating the organic layer was concentrated under reduced pressure to remove toluene and excess o-cresol. After adding 80 g of toluene to the obtained concentrate and dissolving 9,9-bis (4-hydroxy-3-methylphenyl) fluorene at 115 ° C., the resulting solution was cooled to 10 ° C. as it was. The precipitated crystals were removed by filtration and dried to give 9.15 g of 9,9-bis (4-hydroxy-3-methylphenyl) fluorene brown crystals (yield 43.6%, HPLC purity 95.3%). Got. The sulfur content in the obtained crystals was less than the detection limit (10 ppm).
(比較例2)
攪拌機、窒素吹込管、温度計およびT字管を付けたガラス製反応器に、フルオレノン23g(0.128モル)、o-クレゾール184g(1.70モル)および触媒としてリンタングステン酸[(H3PW12O40)・nH2O]0.58gを加え、温度100℃、13×103Paの減圧下で生成する水を系外に除去しながら4時間反応した。 得られた反応混合物にトルエン130gと水酸化ナトリウム水溶液を加え、70℃で中和後水洗した。 有機層を分液し得られた有機層を減圧濃縮することにより、トルエンおよび過剰のo-クレゾールを除去した。得られた濃縮物にトルエン161gを加え、115℃で9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンを溶解させた後、得られた溶液をそのまま10℃まで冷却した。析出した結晶を濾過により取り出し、乾燥させることにより、9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンの淡黄色結晶28.5g(収率59.0%、HPLC純度96.8%)を得た。得られた結晶中のイオウ分は検出限界(10ppm)未満であった。
(Comparative Example 2)
A glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer, and a T-tube was charged with 23 g (0.128 mol) of fluorenone, 184 g (1.70 mol) of o-cresol and phosphotungstic acid [(H 3 0.58 g of PW 12 O 40 ) · nH 2 O] was added, and the reaction was performed for 4 hours while removing the water produced at a temperature of 100 ° C. under a reduced pressure of 13 × 10 3 Pa from the system. To the resulting reaction mixture, 130 g of toluene and an aqueous sodium hydroxide solution were added, neutralized at 70 ° C., and washed with water. The organic layer obtained by separating the organic layer was concentrated under reduced pressure to remove toluene and excess o-cresol. 161 g of toluene was added to the resulting concentrate, and 9,9-bis (4-hydroxy-3-methylphenyl) fluorene was dissolved at 115 ° C., and the resulting solution was then cooled to 10 ° C. as it was. The precipitated crystals were removed by filtration and dried to give 28.5 g of 9,9-bis (4-hydroxy-3-methylphenyl) fluorene pale yellow crystals (yield 59.0%, HPLC purity 96.8%). ) The sulfur content in the obtained crystals was less than the detection limit (10 ppm).
(比較例3)
攪拌機、窒素吹込管、温度計およびT字管を付けたガラス製反応器に、フルオレノン23g(0.128モル)、o-クレゾール184g(1.70モル)および触媒としてリンタングステン酸[(H3PW12O40)・nH2O]0.58gを加え、温度70℃、40×103Paの減圧下で生成する水を系外に除去しながら25時間反応した。 得られた反応混合物にトルエン130gと水酸化ナトリウム水溶液を加え、70℃で中和後水洗した。 有機層を分液し得られた有機層を減圧濃縮することにより、トルエンおよび過剰のo-クレゾールを除去した。得られた濃縮物にトルエン161gを加え、115℃で9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンを溶解させた後、得られた溶液をそのまま10℃まで冷却した。析出した結晶を濾過により取り出し、乾燥させることにより、9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンの淡黄色結晶28.5g(収率59.0%、HPLC純度96.8%)を得た。得られた結晶中のイオウ分は検出限界(10ppm)未満であった。
(Comparative Example 3)
A glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer, and a T-tube was charged with 23 g (0.128 mol) of fluorenone, 184 g (1.70 mol) of o-cresol and phosphotungstic acid [(H 3 0.58 g of PW 12 O 40 ) · nH 2 O] was added, and the reaction was carried out for 25 hours while removing water generated outside the system at a temperature of 70 ° C. and a reduced pressure of 40 × 10 3 Pa. To the resulting reaction mixture, 130 g of toluene and an aqueous sodium hydroxide solution were added, neutralized at 70 ° C., and washed with water. The organic layer obtained by separating the organic layer was concentrated under reduced pressure to remove toluene and excess o-cresol. 161 g of toluene was added to the resulting concentrate, and 9,9-bis (4-hydroxy-3-methylphenyl) fluorene was dissolved at 115 ° C., and the resulting solution was then cooled to 10 ° C. as it was. The precipitated crystals were removed by filtration and dried to give 28.5 g of 9,9-bis (4-hydroxy-3-methylphenyl) fluorene pale yellow crystals (yield 59.0%, HPLC purity 96.8%). ) The sulfur content in the obtained crystals was less than the detection limit (10 ppm).
(比較例4)
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン10.0g(0.056モル)、o−クレゾール36.7g(0.339モル)および触媒としてリンタングステン酸[(H3PW12O40)・nH2O]2.0gを加え、温度70℃、1.3×103Paの減圧下で生成する水を系外に除去しながら4時間反応したところ、9,9−ビス(4−ヒドロキ−3−メチルフェニル)フルオレンの結晶が析出し、攪拌が困難になった。
(Comparative Example 4)
In a glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube, 10.0 g (0.056 mol) of fluorenone, 36.7 g (0.339 mol) of o-cresol and phosphotungstic acid [( H 3 PW 12 O 40 ) · nH 2 O] was added, and the reaction was conducted for 4 hours while removing the water produced at a temperature of 70 ° C. under reduced pressure of 1.3 × 10 3 Pa from the system. , 9-bis (4-hydroxy-3-methylphenyl) fluorene crystals were precipitated, making stirring difficult.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8841491B2 (en) | 2009-04-13 | 2014-09-23 | Taoka Chemical Co., Ltd. | Method for producing fluorene derivative |
| CN105001027A (en) * | 2015-07-24 | 2015-10-28 | 上虞日月星科技化学有限公司 | Fluorne compound preparing method |
| JP2023009342A (en) * | 2021-07-07 | 2023-01-20 | 東レ・ファインケミカル株式会社 | Method for producing 9,9-bis(4-amino-3-halogenophenyl)fluorene compound |
-
2008
- 2008-09-04 JP JP2008226603A patent/JP2010059098A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8841491B2 (en) | 2009-04-13 | 2014-09-23 | Taoka Chemical Co., Ltd. | Method for producing fluorene derivative |
| CN105001027A (en) * | 2015-07-24 | 2015-10-28 | 上虞日月星科技化学有限公司 | Fluorne compound preparing method |
| JP2023009342A (en) * | 2021-07-07 | 2023-01-20 | 東レ・ファインケミカル株式会社 | Method for producing 9,9-bis(4-amino-3-halogenophenyl)fluorene compound |
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