JP2010053353A - Microcapsule type latent curing agent for epoxy resin and method for producing the same, one-part epoxy resin composition, cured product of epoxy resin, adhesive, film for bonding, conductive material, and anisotropically conductive material - Google Patents
Microcapsule type latent curing agent for epoxy resin and method for producing the same, one-part epoxy resin composition, cured product of epoxy resin, adhesive, film for bonding, conductive material, and anisotropically conductive material Download PDFInfo
- Publication number
- JP2010053353A JP2010053353A JP2009175368A JP2009175368A JP2010053353A JP 2010053353 A JP2010053353 A JP 2010053353A JP 2009175368 A JP2009175368 A JP 2009175368A JP 2009175368 A JP2009175368 A JP 2009175368A JP 2010053353 A JP2010053353 A JP 2010053353A
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- Japan
- Prior art keywords
- epoxy resin
- compound
- curing agent
- latent curing
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 250
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 247
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 108
- 239000000203 mixture Substances 0.000 title claims abstract description 91
- 239000003094 microcapsule Substances 0.000 title claims abstract description 40
- 239000000853 adhesive Substances 0.000 title claims abstract description 27
- 239000004020 conductor Substances 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 239000010408 film Substances 0.000 title abstract description 34
- 230000001070 adhesive effect Effects 0.000 title abstract description 26
- 150000001875 compounds Chemical class 0.000 claims abstract description 96
- -1 isocyanate compound Chemical class 0.000 claims abstract description 62
- 239000002775 capsule Substances 0.000 claims abstract description 38
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 25
- 239000012948 isocyanate Substances 0.000 claims abstract description 22
- 125000000524 functional group Chemical group 0.000 claims abstract description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 35
- 150000001412 amines Chemical class 0.000 claims description 30
- 239000002612 dispersion medium Substances 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 150000002989 phenols Chemical class 0.000 claims description 12
- 125000003700 epoxy group Chemical group 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000009835 boiling Methods 0.000 claims description 7
- 150000008065 acid anhydrides Chemical class 0.000 claims description 5
- 150000002357 guanidines Chemical class 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 5
- 230000008018 melting Effects 0.000 claims description 5
- 229940042795 hydrazides for tuberculosis treatment Drugs 0.000 claims description 4
- 239000004849 latent hardener Substances 0.000 claims 1
- 238000003860 storage Methods 0.000 abstract description 42
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 43
- 239000002245 particle Substances 0.000 description 43
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 33
- 239000011162 core material Substances 0.000 description 33
- 239000004593 Epoxy Substances 0.000 description 27
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 24
- 229920003986 novolac Polymers 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 20
- 239000000047 product Substances 0.000 description 19
- 239000002904 solvent Substances 0.000 description 17
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- 229930185605 Bisphenol Natural products 0.000 description 14
- 239000000843 powder Substances 0.000 description 13
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 239000000460 chlorine Substances 0.000 description 12
- 229910052801 chlorine Inorganic materials 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 239000005056 polyisocyanate Substances 0.000 description 11
- 229920001228 polyisocyanate Polymers 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 125000001302 tertiary amino group Chemical group 0.000 description 8
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 7
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 7
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 239000011810 insulating material Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000002313 adhesive film Substances 0.000 description 5
- 239000003085 diluting agent Substances 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000003973 paint Substances 0.000 description 5
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000002966 varnish Substances 0.000 description 5
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 4
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005538 encapsulation Methods 0.000 description 4
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000002923 metal particle Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 4
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 4
- 150000005846 sugar alcohols Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000012776 electronic material Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- CMQUQOHNANGDOR-UHFFFAOYSA-N 2,3-dibromo-4-(2,4-dibromo-5-hydroxyphenyl)phenol Chemical compound BrC1=C(Br)C(O)=CC=C1C1=CC(O)=C(Br)C=C1Br CMQUQOHNANGDOR-UHFFFAOYSA-N 0.000 description 2
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- AGXAFZNONAXBOS-UHFFFAOYSA-N 2-[[3-(oxiran-2-ylmethyl)phenyl]methyl]oxirane Chemical compound C=1C=CC(CC2OC2)=CC=1CC1CO1 AGXAFZNONAXBOS-UHFFFAOYSA-N 0.000 description 2
- ALKYHXVLJMQRLQ-UHFFFAOYSA-N 3-Hydroxy-2-naphthoate Chemical compound C1=CC=C2C=C(O)C(C(=O)O)=CC2=C1 ALKYHXVLJMQRLQ-UHFFFAOYSA-N 0.000 description 2
- 229940018563 3-aminophenol Drugs 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- ODJUOZPKKHIEOZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3,5-dimethylphenyl)propan-2-yl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C(C)(C)C=2C=C(C)C(O)=C(C)C=2)=C1 ODJUOZPKKHIEOZ-UHFFFAOYSA-N 0.000 description 2
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 2
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 2
- YWFPGFJLYRKYJZ-UHFFFAOYSA-N 9,9-bis(4-hydroxyphenyl)fluorene Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 YWFPGFJLYRKYJZ-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- 206010068516 Encapsulation reaction Diseases 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- FFDGPVCHZBVARC-UHFFFAOYSA-N N,N-dimethylglycine Chemical compound CN(C)CC(O)=O FFDGPVCHZBVARC-UHFFFAOYSA-N 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000002174 Styrene-butadiene Substances 0.000 description 2
- KYPYTERUKNKOLP-UHFFFAOYSA-N Tetrachlorobisphenol A Chemical compound C=1C(Cl)=C(O)C(Cl)=CC=1C(C)(C)C1=CC(Cl)=C(O)C(Cl)=C1 KYPYTERUKNKOLP-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000010425 asbestos Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- PFURGBBHAOXLIO-UHFFFAOYSA-N cyclohexane-1,2-diol Chemical compound OC1CCCCC1O PFURGBBHAOXLIO-UHFFFAOYSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- TWBYWOBDOCUKOW-UHFFFAOYSA-N isonicotinic acid Chemical compound OC(=O)C1=CC=NC=C1 TWBYWOBDOCUKOW-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- CHJJGSNFBQVOTG-UHFFFAOYSA-N methylguanidine Chemical compound CNC(N)=N CHJJGSNFBQVOTG-UHFFFAOYSA-N 0.000 description 2
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 239000013034 phenoxy resin Substances 0.000 description 2
- 229920006287 phenoxy resin Polymers 0.000 description 2
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 150000008442 polyphenolic compounds Chemical class 0.000 description 2
- 235000013824 polyphenols Nutrition 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 229910052895 riebeckite Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000011115 styrene butadiene Substances 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- OTJFQRMIRKXXRS-UHFFFAOYSA-N (hydroxymethylamino)methanol Chemical compound OCNCO OTJFQRMIRKXXRS-UHFFFAOYSA-N 0.000 description 1
- SNVRDQORMVVQBI-UPHRSURJSA-N (z)-but-2-enedihydrazide Chemical compound NNC(=O)\C=C/C(=O)NN SNVRDQORMVVQBI-UPHRSURJSA-N 0.000 description 1
- NQOFYFRKWDXGJP-UHFFFAOYSA-N 1,1,2-trimethylguanidine Chemical compound CN=C(N)N(C)C NQOFYFRKWDXGJP-UHFFFAOYSA-N 0.000 description 1
- ZTNJGMFHJYGMDR-UHFFFAOYSA-N 1,2-diisocyanatoethane Chemical compound O=C=NCCN=C=O ZTNJGMFHJYGMDR-UHFFFAOYSA-N 0.000 description 1
- ZGDSDWSIFQBAJS-UHFFFAOYSA-N 1,2-diisocyanatopropane Chemical compound O=C=NC(C)CN=C=O ZGDSDWSIFQBAJS-UHFFFAOYSA-N 0.000 description 1
- LINDOXZENKYESA-UHFFFAOYSA-N 1,2-dimethylguanidine Chemical compound CNC(N)=NC LINDOXZENKYESA-UHFFFAOYSA-N 0.000 description 1
- XSCLFFBWRKTMTE-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)cyclohexane Chemical compound O=C=NCC1CCCC(CN=C=O)C1 XSCLFFBWRKTMTE-UHFFFAOYSA-N 0.000 description 1
- OWRCNXZUPFZXOS-UHFFFAOYSA-N 1,3-diphenylguanidine Chemical compound C=1C=CC=CC=1NC(=N)NC1=CC=CC=C1 OWRCNXZUPFZXOS-UHFFFAOYSA-N 0.000 description 1
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 description 1
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 description 1
- ASWPBPHMBJLXOE-UHFFFAOYSA-N 1-(2-ethyl-4-methylimidazol-1-yl)-3-phenoxypropan-2-ol Chemical compound CCC1=NC(C)=CN1CC(O)COC1=CC=CC=C1 ASWPBPHMBJLXOE-UHFFFAOYSA-N 0.000 description 1
- RHTXCFRIEYHAHM-UHFFFAOYSA-N 1-(2-methylimidazol-1-yl)-3-phenoxypropan-2-ol Chemical compound CC1=NC=CN1CC(O)COC1=CC=CC=C1 RHTXCFRIEYHAHM-UHFFFAOYSA-N 0.000 description 1
- IMJCKVKBXYZZGJ-UHFFFAOYSA-N 1-(dimethylamino)-3-phenoxypropan-2-ol Chemical compound CN(C)CC(O)COC1=CC=CC=C1 IMJCKVKBXYZZGJ-UHFFFAOYSA-N 0.000 description 1
- NCXUNZWLEYGQAH-UHFFFAOYSA-N 1-(dimethylamino)propan-2-ol Chemical compound CC(O)CN(C)C NCXUNZWLEYGQAH-UHFFFAOYSA-N 0.000 description 1
- PVOAHINGSUIXLS-UHFFFAOYSA-N 1-Methylpiperazine Chemical compound CN1CCNCC1 PVOAHINGSUIXLS-UHFFFAOYSA-N 0.000 description 1
- DPVAXLIXQRRYKZ-UHFFFAOYSA-N 1-[2-(4,5-dihydroimidazol-1-yl)phenyl]-4,5-dihydroimidazole Chemical compound C1=NCCN1C1=CC=CC=C1N1C=NCC1 DPVAXLIXQRRYKZ-UHFFFAOYSA-N 0.000 description 1
- AHTPZXAPHHTTFU-UHFFFAOYSA-N 1-[3-(4,5-dihydroimidazol-1-yl)phenyl]-4,5-dihydroimidazole Chemical compound C1=NCCN1C1=CC=CC(N2C=NCC2)=C1 AHTPZXAPHHTTFU-UHFFFAOYSA-N 0.000 description 1
- FVUYJAGLGSXVEI-UHFFFAOYSA-N 1-[4-(4,5-dihydroimidazol-1-yl)butyl]-4,5-dihydroimidazole Chemical compound C1CN=CN1CCCCN1CCN=C1 FVUYJAGLGSXVEI-UHFFFAOYSA-N 0.000 description 1
- LOCJFVVULRDEEL-UHFFFAOYSA-N 1-[4-(4,5-dihydroimidazol-1-yl)phenyl]-4,5-dihydroimidazole Chemical compound C1=NCCN1C1=CC=C(N2C=NCC2)C=C1 LOCJFVVULRDEEL-UHFFFAOYSA-N 0.000 description 1
- IFLCSHCQLDMGJB-UHFFFAOYSA-N 1-butoxy-3-(2-ethyl-4-methylimidazol-1-yl)propan-2-ol Chemical compound CCCCOCC(O)CN1C=C(C)N=C1CC IFLCSHCQLDMGJB-UHFFFAOYSA-N 0.000 description 1
- NWHBCDGVHNXUPQ-UHFFFAOYSA-N 1-butoxy-3-(2-methyl-4,5-dihydroimidazol-1-yl)propan-2-ol Chemical compound CCCCOCC(O)CN1CCN=C1C NWHBCDGVHNXUPQ-UHFFFAOYSA-N 0.000 description 1
- SDWZQKKODUFTEY-UHFFFAOYSA-N 1-butoxy-3-(dimethylamino)propan-2-ol Chemical compound CCCCOCC(O)CN(C)C SDWZQKKODUFTEY-UHFFFAOYSA-N 0.000 description 1
- LYUVLUOMAJAVPI-UHFFFAOYSA-N 1-phenoxy-3-(2-phenyl-4,5-dihydroimidazol-1-yl)propan-2-ol Chemical compound C1CN=C(C=2C=CC=CC=2)N1CC(O)COC1=CC=CC=C1 LYUVLUOMAJAVPI-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- FHTDDANQIMVWKZ-UHFFFAOYSA-N 1h-pyridine-4-thione Chemical compound SC1=CC=NC=C1 FHTDDANQIMVWKZ-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- ZNWOXGIEIAGCQA-UHFFFAOYSA-N 2-(2-methylphenyl)-4,5-dihydro-1h-imidazole Chemical compound CC1=CC=CC=C1C1=NCCN1 ZNWOXGIEIAGCQA-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- DALNXMAZDJRTPB-UHFFFAOYSA-N 2-(dimethylamino)acetohydrazide Chemical compound CN(C)CC(=O)NN DALNXMAZDJRTPB-UHFFFAOYSA-N 0.000 description 1
- DVVXXHVHGGWWPE-UHFFFAOYSA-N 2-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=CC=C1C(O)=O DVVXXHVHGGWWPE-UHFFFAOYSA-N 0.000 description 1
- DENMGZODXQRYAR-UHFFFAOYSA-N 2-(dimethylamino)ethanethiol Chemical compound CN(C)CCS DENMGZODXQRYAR-UHFFFAOYSA-N 0.000 description 1
- JPEGUDKOYOIOOP-UHFFFAOYSA-N 2-(hexoxymethyl)oxirane Chemical compound CCCCCCOCC1CO1 JPEGUDKOYOIOOP-UHFFFAOYSA-N 0.000 description 1
- KKFDCBRMNNSAAW-UHFFFAOYSA-N 2-(morpholin-4-yl)ethanol Chemical compound OCCN1CCOCC1 KKFDCBRMNNSAAW-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- NKVZFNUCUPOCQJ-UHFFFAOYSA-N 2-anilinopropanehydrazide Chemical compound NNC(=O)C(C)NC1=CC=CC=C1 NKVZFNUCUPOCQJ-UHFFFAOYSA-N 0.000 description 1
- CGWBIHLHAGNJCX-UHFFFAOYSA-N 2-butylguanidine Chemical compound CCCCNC(N)=N CGWBIHLHAGNJCX-UHFFFAOYSA-N 0.000 description 1
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 description 1
- 229940013085 2-diethylaminoethanol Drugs 0.000 description 1
- QUPKCFBHJFNUEW-UHFFFAOYSA-N 2-ethyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCCN1 QUPKCFBHJFNUEW-UHFFFAOYSA-N 0.000 description 1
- SHYARJUKNREDGB-UHFFFAOYSA-N 2-ethyl-5-methyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCC(C)N1 SHYARJUKNREDGB-UHFFFAOYSA-N 0.000 description 1
- KEWLVUBYGUZFKX-UHFFFAOYSA-N 2-ethylguanidine Chemical compound CCNC(N)=N KEWLVUBYGUZFKX-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- XSXYESVZDBAKKT-UHFFFAOYSA-N 2-hydroxybenzohydrazide Chemical compound NNC(=O)C1=CC=CC=C1O XSXYESVZDBAKKT-UHFFFAOYSA-N 0.000 description 1
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- QRJZGVVKGFIGLI-UHFFFAOYSA-N 2-phenylguanidine Chemical compound NC(=N)NC1=CC=CC=C1 QRJZGVVKGFIGLI-UHFFFAOYSA-N 0.000 description 1
- BWMDMTSNSXYYSP-UHFFFAOYSA-N 2-propylguanidine Chemical compound CCCNC(N)=N BWMDMTSNSXYYSP-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- CXURGFRDGROIKG-UHFFFAOYSA-N 3,3-bis(chloromethyl)oxetane Chemical compound ClCC1(CCl)COC1 CXURGFRDGROIKG-UHFFFAOYSA-N 0.000 description 1
- HXFIRQHMXJBTRV-UHFFFAOYSA-N 3,4-dimethyloxolane-2,5-dione Chemical compound CC1C(C)C(=O)OC1=O HXFIRQHMXJBTRV-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- YAXXOCZAXKLLCV-UHFFFAOYSA-N 3-dodecyloxolane-2,5-dione Chemical compound CCCCCCCCCCCCC1CC(=O)OC1=O YAXXOCZAXKLLCV-UHFFFAOYSA-N 0.000 description 1
- DFATXMYLKPCSCX-UHFFFAOYSA-N 3-methylsuccinic anhydride Chemical compound CC1CC(=O)OC1=O DFATXMYLKPCSCX-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XXYIZONVSNZSMM-UHFFFAOYSA-N C(C1=CC=C(C(=O)O)C=C1)(=O)O.C(C1=CC(C(=O)NN)=CC=C1)(=O)NN Chemical compound C(C1=CC=C(C(=O)O)C=C1)(=O)O.C(C1=CC(C(=O)NN)=CC=C1)(=O)NN XXYIZONVSNZSMM-UHFFFAOYSA-N 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- 239000004594 Masterbatch (MB) Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- BPMXTZMSTWCLIP-UHFFFAOYSA-N N=C=O.N=C=O.N=C=O.C(CC1)CCC1C(C1CCCCC1)C1CCCCC1 Chemical compound N=C=O.N=C=O.N=C=O.C(CC1)CCC1C(C1CCCCC1)C1CCCCC1 BPMXTZMSTWCLIP-UHFFFAOYSA-N 0.000 description 1
- QORUGOXNWQUALA-UHFFFAOYSA-N N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 Chemical compound N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 QORUGOXNWQUALA-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- BHHGXPLMPWCGHP-UHFFFAOYSA-N Phenethylamine Chemical compound NCCC1=CC=CC=C1 BHHGXPLMPWCGHP-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- IBVAQQYNSHJXBV-UHFFFAOYSA-N adipic acid dihydrazide Chemical compound NNC(=O)CCCCC(=O)NN IBVAQQYNSHJXBV-UHFFFAOYSA-N 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- 229910052601 baryte Inorganic materials 0.000 description 1
- 239000010428 baryte Substances 0.000 description 1
- IKWQWOFXRCUIFT-UHFFFAOYSA-N benzene-1,2-dicarbohydrazide Chemical compound NNC(=O)C1=CC=CC=C1C(=O)NN IKWQWOFXRCUIFT-UHFFFAOYSA-N 0.000 description 1
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 1
- JGCWKVKYRNXTMD-UHFFFAOYSA-N bicyclo[2.2.1]heptane;isocyanic acid Chemical compound N=C=O.N=C=O.C1CC2CCC1C2 JGCWKVKYRNXTMD-UHFFFAOYSA-N 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- HCOMFAYPHBFMKU-UHFFFAOYSA-N butanedihydrazide Chemical compound NNC(=O)CCC(=O)NN HCOMFAYPHBFMKU-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- PMMYEEVYMWASQN-IMJSIDKUSA-N cis-4-Hydroxy-L-proline Chemical compound O[C@@H]1CN[C@H](C(O)=O)C1 PMMYEEVYMWASQN-IMJSIDKUSA-N 0.000 description 1
- 239000011280 coal tar Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- ARUKYTASOALXFG-UHFFFAOYSA-N cycloheptylcycloheptane Chemical compound C1CCCCCC1C1CCCCCC1 ARUKYTASOALXFG-UHFFFAOYSA-N 0.000 description 1
- RLMGYIOTPQVQJR-UHFFFAOYSA-N cyclohexane-1,3-diol Chemical compound OC1CCCC(O)C1 RLMGYIOTPQVQJR-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- UOCIZHQMWNPGEN-UHFFFAOYSA-N dialuminum;oxygen(2-);trihydrate Chemical compound O.O.O.[O-2].[O-2].[O-2].[Al+3].[Al+3] UOCIZHQMWNPGEN-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 description 1
- 108700003601 dimethylglycine Proteins 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- FGXWKSZFVQUSTL-UHFFFAOYSA-N domperidone Chemical compound C12=CC=CC=C2NC(=O)N1CCCN(CC1)CCC1N1C2=CC=C(Cl)C=C2NC1=O FGXWKSZFVQUSTL-UHFFFAOYSA-N 0.000 description 1
- 229960001253 domperidone Drugs 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- BTIJJDXEELBZFS-QDUVMHSLSA-K hemin Chemical compound CC1=C(CCC(O)=O)C(C=C2C(CCC(O)=O)=C(C)\C(N2[Fe](Cl)N23)=C\4)=N\C1=C/C2=C(C)C(C=C)=C3\C=C/1C(C)=C(C=C)C/4=N\1 BTIJJDXEELBZFS-QDUVMHSLSA-K 0.000 description 1
- 229940025294 hemin Drugs 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- QRXWMOHMRWLFEY-UHFFFAOYSA-N isoniazide Chemical compound NNC(=O)C1=CC=NC=C1 QRXWMOHMRWLFEY-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical class [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- UDGSVBYJWHOHNN-UHFFFAOYSA-N n',n'-diethylethane-1,2-diamine Chemical compound CCN(CC)CCN UDGSVBYJWHOHNN-UHFFFAOYSA-N 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 description 1
- DMDXQHYISPCTGF-UHFFFAOYSA-N n',n'-dipropylethane-1,2-diamine Chemical compound CCCN(CCC)CCN DMDXQHYISPCTGF-UHFFFAOYSA-N 0.000 description 1
- GZUCMODGDIGMBI-UHFFFAOYSA-N n',n'-dipropylpropane-1,3-diamine Chemical compound CCCN(CCC)CCCN GZUCMODGDIGMBI-UHFFFAOYSA-N 0.000 description 1
- PVYBFVZRZWESQN-UHFFFAOYSA-N n,n-diethyl-2-piperazin-1-ylethanamine Chemical compound CCN(CC)CCN1CCNCC1 PVYBFVZRZWESQN-UHFFFAOYSA-N 0.000 description 1
- 229940078490 n,n-dimethylglycine Drugs 0.000 description 1
- PXSXRABJBXYMFT-UHFFFAOYSA-N n-hexylhexan-1-amine Chemical compound CCCCCCNCCCCCC PXSXRABJBXYMFT-UHFFFAOYSA-N 0.000 description 1
- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 1
- JKXONPYJVWEAEL-UHFFFAOYSA-N oxiran-2-ylmethyl acetate Chemical compound CC(=O)OCC1CO1 JKXONPYJVWEAEL-UHFFFAOYSA-N 0.000 description 1
- XRQKARZTFMEBBY-UHFFFAOYSA-N oxiran-2-ylmethyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OCC1CO1 XRQKARZTFMEBBY-UHFFFAOYSA-N 0.000 description 1
- YLNSNVGRSIOCEU-UHFFFAOYSA-N oxiran-2-ylmethyl butanoate Chemical compound CCCC(=O)OCC1CO1 YLNSNVGRSIOCEU-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229940081066 picolinic acid Drugs 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- WHMDPDGBKYUEMW-UHFFFAOYSA-N pyridine-2-thiol Chemical compound SC1=CC=CC=N1 WHMDPDGBKYUEMW-UHFFFAOYSA-N 0.000 description 1
- KFUSANSHCADHNJ-UHFFFAOYSA-N pyridine-3-carbohydrazide Chemical compound NNC(=O)C1=CC=CN=C1 KFUSANSHCADHNJ-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 210000003660 reticulum Anatomy 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000010454 slate Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- RYYWUUFWQRZTIU-UHFFFAOYSA-K thiophosphate Chemical compound [O-]P([O-])([O-])=S RYYWUUFWQRZTIU-UHFFFAOYSA-K 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- JIVZKJJQOZQXQB-UHFFFAOYSA-N tolazoline Chemical compound C=1C=CC=CC=1CC1=NCCN1 JIVZKJJQOZQXQB-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- AVWRKZWQTYIKIY-UHFFFAOYSA-N urea-1-carboxylic acid Chemical compound NC(=O)NC(O)=O AVWRKZWQTYIKIY-UHFFFAOYSA-N 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Adhesive Tapes (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Manufacturing Of Micro-Capsules (AREA)
Abstract
Description
本発明は、エポキシ樹脂用マイクロカプセル型潜在性硬化剤及びその製造方法、一液性エポキシ樹脂組成物、エポキシ樹脂硬化物、接着剤、接合用フィルム、導電性材料並びに異方導電性材料に関する。 The present invention relates to a microcapsule type latent curing agent for epoxy resin and a production method thereof, a one-part epoxy resin composition, an epoxy resin cured product, an adhesive, a bonding film, a conductive material, and an anisotropic conductive material.
エポキシ樹脂は、その硬化物が、機械的特性、電気的特性、熱的特性、耐薬品性、接着性等の点で優れた性能を有することから、塗料、電気電子用絶縁材料、接着剤等の幅広い用途に利用されている。現在一般に使用されているエポキシ樹脂組成物は、使用時にエポキシ樹脂及び硬化剤の二液を混合する、いわゆる二液性のものである。 Epoxy resin has excellent performance in terms of mechanical properties, electrical properties, thermal properties, chemical resistance, adhesiveness, etc., and it can be used for paints, insulating materials for electrical and electronic materials, adhesives, etc. It is used for a wide range of applications. The epoxy resin composition generally used at present is a so-called two-component type in which two components of an epoxy resin and a curing agent are mixed at the time of use.
二液性エポキシ樹脂組成物は室温で硬化しうる反面、エポキシ樹脂と硬化剤とを別々に保管し、必要に応じて両者を計量・混合した後で使用する必要があるため、保管や取り扱いが煩雑である。その上、可使用時間が限られているため、予め大量に混合しておくことができず、使用の度に混合作業を行う必要がある。そのため、作業頻度が多くなり、作業能率の低下を免れない。 The two-part epoxy resin composition can be cured at room temperature, but the epoxy resin and the curing agent must be stored separately, and must be used after metering and mixing as required. It is complicated. In addition, since the usable time is limited, it is not possible to mix in large quantities in advance, and it is necessary to perform mixing work each time it is used. For this reason, the frequency of work increases, and a reduction in work efficiency is inevitable.
こうした二液性エポキシ樹脂組成物の問題を解決する目的で、これまでいくつかの一液性エポキシ樹脂組成物が提案されている。一液性エポキシ樹脂組成物としては、例えば、ジシアンジアミド、BF3−アミン錯体、アミン塩、変性イミダゾール化合物等の潜在性硬化剤をエポキシ樹脂に配合したものがある。 In order to solve the problem of such a two-part epoxy resin composition, several one-part epoxy resin compositions have been proposed so far. Examples of the one-component epoxy resin composition include those obtained by blending an epoxy resin with a latent curing agent such as dicyandiamide, BF 3 -amine complex, amine salt, and modified imidazole compound.
また、粉末状アミン化合物の表面をイソシアネートと反応させ、アミン化合物の表面を不活性化して硬化剤に潜在性を付与する検討が行われている(特許文献1〜5)。更に、粉末状アミン化合物をエポキシ樹脂中でイソシアネートと反応させることによりカプセル化し一液化したマイクロカプセル型硬化剤も提案されている(特許文献6〜8)。 In addition, studies have been made to impart latency to the curing agent by reacting the surface of the powdery amine compound with isocyanate to inactivate the surface of the amine compound (Patent Documents 1 to 5). Furthermore, a microcapsule type curing agent in which a powdered amine compound is encapsulated by reacting with an isocyanate in an epoxy resin to form a single solution has also been proposed (Patent Documents 6 to 8).
しかし、従来の潜在性硬化剤の場合、貯蔵安定性に優れているものは硬化性が低く、硬化に高温又は長時間が必要である一方、硬化性が高いものは貯蔵安定性が低く、例えば−20℃のような低温で貯蔵する必要がある。例えば、ジシアンジアミドを配合した一液性エポキシ樹脂組成物は、常温保存の場合に6ヵ月以上の貯蔵安定性を有するものの、170℃以上の硬化温度を必要とする。この硬化温度を低下させるために硬化促進剤を併用すると、例えば130℃での硬化が可能であるが、その場合は室温での貯蔵安定性が不十分であるため、低温での貯蔵を余儀なくされる。 However, in the case of conventional latent curing agents, those having excellent storage stability have low curability and high temperature or long time is required for curing, while those having high curability have low storage stability, for example, It needs to be stored at a low temperature such as -20 ° C. For example, a one-part epoxy resin composition containing dicyandiamide has a storage stability of 6 months or more when stored at room temperature, but requires a curing temperature of 170 ° C. or more. When a curing accelerator is used in combination with this curing temperature, curing at, for example, 130 ° C. is possible. In that case, storage stability at room temperature is insufficient, and storage at a low temperature is unavoidable. The
また、フィルム状成形品や、基材にエポキシ樹脂組成物を含浸した製品を製造する際に用いられるエポキシ樹脂組成物は、溶剤や反応性希釈剤等を含む配合品が用いられる場合が多いが、係る配合品において従来の潜在性硬化剤を用いると貯蔵安定性が極端に低下する。そのため、配合品を実質的に二液性とする必要があり、その改善が求められている。 In addition, the epoxy resin composition used when producing a film-shaped molded article or a product in which the base material is impregnated with the epoxy resin composition is often used in combination with a solvent or a reactive diluent. In such a compounded product, when a conventional latent curing agent is used, the storage stability is extremely lowered. Therefore, it is necessary to make the blended product substantially two-component, and the improvement is required.
特許文献1〜5の硬化剤も、エポキシ樹脂中に均一分散させる際に、ロール等の装置によりせん断力を受けて表面層が破壊されるため、貯蔵安定性が損なわれるという問題を有している。 The curing agents of Patent Documents 1 to 5 also have a problem that the storage stability is impaired because the surface layer is destroyed by receiving a shearing force by an apparatus such as a roll when uniformly dispersed in the epoxy resin. Yes.
また、特許文献6〜8の硬化剤では、例えば低温硬化性を向上させるため、マイクロカプセル型潜在性硬化剤の量を増やすことがあるが、エポキシ樹脂中に多量の粉末状アミン化合物を添加する必要がある。しかし、粉末状アミン化合物の量が多くなると、粘度が高くなるため均一なカプセル化反応を行うことが困難となる場合がある。この場合、ロット間の特性のばらつきが大きくなって、製品の不良率が高くなる場合や、カプセル形成の程度が不足して十分な貯蔵安定性が得られなくなる場合がある。一方、低温硬化性を高めるため、エポキシ樹脂との反応性が高い成分をコアの材料として用いると、エポキシ樹脂中で硬化反応が進行して、充分な特性を有する潜在性硬化剤が合成できない場合がある。 Moreover, in the hardening | curing agent of patent documents 6-8, in order to improve low-temperature curability, for example, although the quantity of a microcapsule type | mold latent hardening | curing agent may be increased, a lot of powdery amine compounds are added in an epoxy resin. There is a need. However, when the amount of the powdery amine compound is increased, the viscosity increases, and it may be difficult to perform a uniform encapsulation reaction. In this case, variation in characteristics between lots may increase, resulting in a high product defect rate, or a lack of sufficient capsule stability due to insufficient capsule formation. On the other hand, if a component with high reactivity with the epoxy resin is used as the core material in order to enhance low-temperature curability, the curing reaction proceeds in the epoxy resin, and a latent curing agent having sufficient characteristics cannot be synthesized. There is.
以上のように、高い硬化性と優れた貯蔵安定性を両立し得る一液性エポキシ樹脂組成物が強く求められている。特に近年、電子材料用途での生産性向上のために、一液性樹脂組成物に対して、硬化性及び貯蔵安定性の更なる向上が求められている。 As described above, there is a strong demand for a one-component epoxy resin composition that can achieve both high curability and excellent storage stability. Particularly in recent years, further improvements in curability and storage stability have been demanded for one-part resin compositions in order to improve productivity in electronic material applications.
そこで、本発明は、低温硬化性と貯蔵安定性とを高度に両立することが可能なエポキシ樹脂用マイクロカプセル型潜在性硬化剤及びその製造方法、一液性エポキシ樹脂組成物、エポキシ樹脂硬化物、接着剤、接合用フィルム、導電性材料並びに異方導電性材料を提供することを目的とする。 Therefore, the present invention provides a microcapsule type latent curing agent for epoxy resin capable of achieving both high-temperature curability and storage stability, a method for producing the same, a one-part epoxy resin composition, and an epoxy resin cured product. An object is to provide an adhesive, a bonding film, a conductive material, and an anisotropic conductive material.
本発明は、活性水素基を有する化合物(A)を主成分として含むコア(B)と、当該コア(B)を覆うように設けられており、化合物(A)と反応する官能基を有する化合物(L)、及び、イソシアネート化合物(C)を含むカプセルと、を有する、エポキシ樹脂用マイクロカプセル型潜在性硬化剤を提供する。 The present invention includes a core (B) containing a compound (A) having an active hydrogen group as a main component, and a compound having a functional group that is provided so as to cover the core (B) and reacts with the compound (A) (L) and a capsule containing an isocyanate compound (C), and a microcapsule type latent curing agent for epoxy resin.
本発明では、コア(B)が活性水素基を有する化合物(A)を含み、カプセルがイソシアネート化合物(C)に加えて、化合物(A)と反応する官能基を有する化合物(L)を含むため、低温硬化性と貯蔵安定性とを高度に両立することができる。 In the present invention, the core (B) contains the compound (A) having an active hydrogen group, and the capsule contains the compound (L) having a functional group that reacts with the compound (A) in addition to the isocyanate compound (C). In addition, low-temperature curability and storage stability can be highly compatible.
カプセルは、活性水素基を有する化合物及び水の少なくとも一方を更に含むことが好ましい。この場合、貯蔵安定性を更に向上させることができる。 The capsule preferably further contains at least one of a compound having an active hydrogen group and water. In this case, the storage stability can be further improved.
化合物(A)は、アミンアダクト(A1)であることが好ましい。この場合、低温硬化性と貯蔵安定性とを更に高度に両立することができる。 The compound (A) is preferably an amine adduct (A1). In this case, both low-temperature curability and storage stability can be achieved at a higher level.
化合物(L)は、エポキシ基を有する化合物(L1)であることが好ましい。 The compound (L) is preferably a compound (L1) having an epoxy group.
コア(B)における化合物(A)以外の成分(G)の含有量は0〜50質量%であることが好ましい。この場合、低温硬化性及び貯蔵安定性を更に高度に両立することができる。 The content of the component (G) other than the compound (A) in the core (B) is preferably 0 to 50% by mass. In this case, both low-temperature curability and storage stability can be achieved at a higher level.
また、本発明は、上記エポキシ樹脂用マイクロカプセル型潜在性硬化剤の製造方法であって、1気圧での沸点が150℃以下であり、かつ粘度が25℃で1000mPa・s以下である分散媒(H)中で、コア(B)中の化合物(A)と、イソシアネート化合物(C)と、化合物(L)とを反応させることにより、コア(B)を被覆するカプセルを形成する工程と、カプセルを形成した後に分散媒(H)を除去する工程と、を含む、エポキシ樹脂用マイクロカプセル型潜在性硬化剤の製造方法を提供する。 The present invention is also a method for producing the above-mentioned microcapsule type latent curing agent for epoxy resin, wherein the boiling point at 1 atm is 150 ° C. or lower and the viscosity is 25 m ° C. or lower and 1000 mPa · s or lower. In (H), reacting the compound (A) in the core (B), the isocyanate compound (C), and the compound (L) to form a capsule covering the core (B); And a step of removing the dispersion medium (H) after forming the capsule, and a method for producing a microcapsule type latent curing agent for epoxy resin.
かかる製造方法によれば、上記エポキシ樹脂用マイクロカプセル型潜在性硬化剤を特性のばらつきを抑制しながら得ることができる。 According to this production method, the above-mentioned microcapsule-type latent curing agent for epoxy resin can be obtained while suppressing variation in characteristics.
上記エポキシ樹脂用マイクロカプセル型潜在性硬化剤の製造方法では、分散媒(H)と化合物(L)とを、質量比100:0.001〜100:100で含有することが好ましい。 In the manufacturing method of the said microcapsule-type latent hardening | curing agent for epoxy resins, it is preferable to contain a dispersion medium (H) and a compound (L) by mass ratio 100: 0.001-100: 100.
また、本発明は、上記エポキシ樹脂用マイクロカプセル型潜在性硬化剤とエポキシ樹脂(I)とを、質量比100:10〜100:50000で含有する、一液性エポキシ樹脂組成物を提供する。本発明では、低温硬化性及び貯蔵安定性を高度に両立することができる。 Moreover, this invention provides the one-pack epoxy resin composition which contains the said microcapsule-type latent hardening | curing agent for epoxy resins, and epoxy resin (I) by mass ratio 100: 10-100: 50,000. In the present invention, low-temperature curability and storage stability can be highly compatible.
また、本発明は、上記エポキシ樹脂用マイクロカプセル型潜在性硬化剤と、エポキシ樹脂(I)と、酸無水物類、フェノール類、ヒドラジド類及びグアニジン類からなる群より選ばれる少なくとも1種の硬化剤(M)とを含有し、エポキシ樹脂(I)100質量部に対する硬化剤(M)の含有量が1〜200質量部であり、エポキシ樹脂(I)100質量部に対する上記エポキシ樹脂用マイクロカプセル型潜在性硬化剤の含有量が0.1〜200質量部である、一液性エポキシ樹脂組成物を提供する。この場合、低温硬化性と貯蔵安定性とに優れた一液性エポキシ樹脂組成物や、耐熱性、耐水性に優れた硬化物を得ることができる。 In addition, the present invention provides at least one curing selected from the group consisting of the above-mentioned microcapsule type latent curing agent for epoxy resin, epoxy resin (I), acid anhydrides, phenols, hydrazides and guanidines. Containing the agent (M), the content of the curing agent (M) with respect to 100 parts by mass of the epoxy resin (I) is 1 to 200 parts by mass, and the above microcapsules for epoxy resin with respect to 100 parts by mass of the epoxy resin (I) Provided is a one-part epoxy resin composition having a mold latent curing agent content of 0.1 to 200 parts by mass. In this case, a one-part epoxy resin composition excellent in low-temperature curability and storage stability and a cured product excellent in heat resistance and water resistance can be obtained.
上記一液性エポキシ樹脂組成物は、上記エポキシ樹脂用マイクロカプセル型潜在性硬化剤と、エポキシ樹脂(I)とを混合した後、化合物(A)の融点又は軟化点以下で加温処理してなることが好ましい。この場合、貯蔵安定性を更に向上させることができる。また、上記一液性エポキシ樹脂組成物は、ペースト状又はフィルム状であってもよい。 The one-component epoxy resin composition is prepared by mixing the epoxy resin microcapsule-type latent curing agent and the epoxy resin (I) and then heating the compound (A) at a melting point or a softening point or lower. It is preferable to become. In this case, the storage stability can be further improved. The one-component epoxy resin composition may be in the form of a paste or a film.
また、本発明は、上記一液性エポキシ樹脂組成物を加熱により硬化してなる、エポキシ樹脂硬化物を提供する。この場合、低温硬化性と貯蔵安定性とを高度に両立したエポキシ樹脂硬化物を得ることができる。 Moreover, this invention provides the epoxy resin hardened | cured material formed by hardening | curing the said one-component epoxy resin composition by heating. In this case, it is possible to obtain an epoxy resin cured product that is highly compatible with low-temperature curability and storage stability.
また、本発明は、上記一液性エポキシ樹脂組成物を含有する、接着剤、接合用フィルム、導電性材料及び異方導電性材料を提供する。更に、異方導電性材料は、フィルム状であってもよい。 The present invention also provides an adhesive, a bonding film, a conductive material, and an anisotropic conductive material containing the one-component epoxy resin composition. Furthermore, the anisotropic conductive material may be in the form of a film.
本発明によれば、低温硬化性と貯蔵安定性とを高度に両立することが可能なエポキシ樹脂用マイクロカプセル型潜在性硬化剤及びその製造方法、一液性エポキシ樹脂組成物、エポキシ樹脂硬化物、接着剤、接合用フィルム、導電性材料並びに異方導電性材料を提供することができる。 According to the present invention, a microcapsule type latent curing agent for epoxy resin capable of achieving both high-temperature curability and storage stability, a method for producing the same, a one-part epoxy resin composition, and an epoxy resin cured product An adhesive, a bonding film, a conductive material, and an anisotropic conductive material can be provided.
本発明のエポキシ樹脂用マイクロカプセル型潜在性硬化剤及びその製造方法によれば、以下の優れた特性を与える効果が得られる。
(1)エポキシ樹脂用マイクロカプセル型潜在性硬化剤を粉末状とすると、目的にあわせたエポキシ樹脂中にエポキシ樹脂用マイクロカプセル型潜在性硬化剤を容易に均一に分散させることができる。
(2)カプセルの含有成分を容易に制御できるため、目的にあわせて良好な低温硬化性や貯蔵安定性を有するエポキシ樹脂用マイクロカプセル型潜在性硬化剤を容易に製造できる。
(3)一液性エポキシ樹脂組成物を容易に製造することができるため、一液性エポキシ樹脂組成物を使用する際の作業性が向上すると共に、一液性エポキシ樹脂組成物により得られる製品の信頼性を向上させることができる。
According to the microcapsule type latent curing agent for epoxy resin of the present invention and the method for producing the same, the following effects can be obtained.
(1) When the microcapsule-type latent curing agent for epoxy resin is powdered, the microcapsule-type latent curing agent for epoxy resin can be easily and uniformly dispersed in an epoxy resin suitable for the purpose.
(2) Since the components contained in the capsule can be easily controlled, a microcapsule type latent curing agent for epoxy resin having good low-temperature curability and storage stability can be easily produced according to the purpose.
(3) Since the one-part epoxy resin composition can be easily produced, the workability when using the one-part epoxy resin composition is improved and the product obtained from the one-part epoxy resin composition Reliability can be improved.
本発明のエポキシ樹脂用マイクロカプセル型潜在性硬化剤、一液性エポキシ樹脂組成物及びエポキシ樹脂硬化物は、上記の効果を生かして広い用途・分野に利用できる。例えば、接着剤用途としては、自動車分野ではヘッドライト、ガソリンタンクの接着、ボンネット等のヘミングランジ部の接着、ボデー及びルーフ部の鋼板の継合わせが挙げられ、電気分野ではスピーカーマグネットの接着、モーターコイルの含浸及び接着、テープヘッド、バッテリーケースの接着、蛍光灯安定器の接着が挙げられ、電子分野ではダイボンディング用接着剤、ICチップ封止剤、チップコート材、チップマウント材、プリント基材の接着剤、フィルム接着剤、異方導電性フィルム、異方導電性ペースト等が挙げられる。塗料用途としては、粉体塗料、及び、特殊な分野としてソルダーレジストインキ、導電性塗料等が挙げられる。また、本発明のエポキシ樹脂用マイクロカプセル型潜在性硬化剤、一液性エポキシ樹脂組成物及びエポキシ樹脂硬化物は、電気絶縁材料、積層構造体等にも利用できる。エポキシ樹脂用マイクロカプセル型潜在性硬化剤は、低温硬化性と貯蔵安定性とを両立できるため、電子材料用途等において生産性を向上させることができる。 The microcapsule-type latent curing agent for epoxy resins, the one-component epoxy resin composition, and the epoxy resin cured product of the present invention can be used in a wide range of applications and fields by taking advantage of the above effects. For example, adhesive applications include headlights, gasoline tanks, hemin grunge parts such as bonnets, and joints of steel plates for bodies and roofs in the automotive field. Examples include coil impregnation and adhesion, tape head, battery case adhesion, and fluorescent lamp ballast adhesion. In the electronic field, die bonding adhesives, IC chip sealants, chip coating materials, chip mounting materials, printing substrates Adhesives, film adhesives, anisotropic conductive films, anisotropic conductive pastes, and the like. Examples of paint applications include powder paints, and special fields such as solder resist inks and conductive paints. Moreover, the microcapsule-type latent curing agent for epoxy resins, the one-component epoxy resin composition, and the epoxy resin cured product of the present invention can be used for electrical insulating materials, laminated structures, and the like. Since the microcapsule type latent curing agent for epoxy resin can achieve both low-temperature curability and storage stability, productivity can be improved in applications such as electronic materials.
以下、本発明の好適な実施形態について詳細に説明する。 Hereinafter, preferred embodiments of the present invention will be described in detail.
(エポキシ樹脂用マイクロカプセル型潜在性硬化剤)
本実施形態のエポキシ樹脂用マイクロカプセル型潜在性硬化剤(F)(以下、場合により、単に「潜在性硬化剤(F)」と表記する。)は、コア(B)と、コア(B)を覆うように設けられたカプセル(シェル)(E)とを有する。
(Microcapsule type latent curing agent for epoxy resin)
The microcapsule type latent curing agent (F) for epoxy resin of the present embodiment (hereinafter, simply referred to as “latent curing agent (F)” in some cases) includes a core (B) and a core (B). And a capsule (shell) (E) provided so as to cover.
(コア(B))
コア(B)は、活性水素基を有する化合物(A)を主成分として含む。「主成分」とは、通常、含有量が質量比で60〜100%であるものを意味する。コア(B)中の活性水素基を有する化合物(A)の質量比が60%未満では、低温硬化性及び貯蔵安定性のいずれかが低下する傾向がある。
(Core (B))
The core (B) contains a compound (A) having an active hydrogen group as a main component. The “main component” usually means that the content is 60 to 100% by mass ratio. If the mass ratio of the compound (A) having an active hydrogen group in the core (B) is less than 60%, either low-temperature curability or storage stability tends to be lowered.
化合物(A)としては、反応可能な水酸基、アミノ基、カルボキシル基、アミド基及び活性メチレン基を少なくとも一つ有する化合物等が挙げられ、アミン化合物、アミンアダクト(A1)が好ましく、アミンアダクト(A1)がより好ましい。 Examples of the compound (A) include compounds having at least one reactive hydroxyl group, amino group, carboxyl group, amide group and active methylene group, and amine compounds and amine adducts (A1) are preferred, and amine adducts (A1). ) Is more preferable.
通常、アミンアダクト(A1)は、エポキシ樹脂(A2)とアミン化合物(A3)とを反応して得られるアミノ基を有する化合物である。エポキシ樹脂(A2)としては、モノエポキシ化合物、多価エポキシ化合物のいずれか又はそれらの混合物が用いられる。 Usually, the amine adduct (A1) is a compound having an amino group obtained by reacting the epoxy resin (A2) and the amine compound (A3). As the epoxy resin (A2), either a monoepoxy compound, a polyvalent epoxy compound, or a mixture thereof is used.
モノエポキシ化合物としては、ブチルグリシジルエーテル、ヘキシルグリシジルエーテル、フェニルグリシジルエーテル、アリルグリシジルエーテル、パラ−tert−ブチルフェニルグリシジルエーテル、エチレンオキシド、プロピレンオキシド、パラキシリルグリシジルエーテル、グリシジルアセテート、グリシジルブチレート、グリシジルヘキソエート、グリシジルベンゾエート等が挙げられる。 Monoepoxy compounds include butyl glycidyl ether, hexyl glycidyl ether, phenyl glycidyl ether, allyl glycidyl ether, para-tert-butylphenyl glycidyl ether, ethylene oxide, propylene oxide, paraxyl glycidyl ether, glycidyl acetate, glycidyl butyrate, glycidyl Examples include hexoate and glycidyl benzoate.
多価エポキシ化合物としては、多価フェノール類をグリシジル化したエポキシ樹脂、多価アルコールをグリシジル化した脂肪族エーテル型エポキシ樹脂、ヒドロキシカルボン酸をグリシジル化したエーテルエステル型エポキシ樹脂、ポリカルボン酸をグリシジル化したエステル型エポキシ樹脂、アミン型エポキシ樹脂等のグリシジル型エポキシ樹脂、及び、脂環族エポキサイドが挙げられる。 Examples of the polyvalent epoxy compound include an epoxy resin obtained by glycidylation of polyhydric phenols, an aliphatic ether type epoxy resin obtained by glycidylation of polyhydric alcohol, an ether ester type epoxy resin obtained by glycidylation of hydroxycarboxylic acid, and a polycarboxylic acid obtained by glycidyl Examples include esterified epoxy resins, glycidyl type epoxy resins such as amine type epoxy resins, and alicyclic epoxides.
多価フェノール類をグリシジル化したエポキシ樹脂としては、ビスフェノール類をグリシジル化したビスフェノール型エポキシ樹脂、2価フェノール類をグリシジル化したエポキシ樹脂、トリスフェノール類をグリシジル化したエポキシ樹脂、テトラキスフェノール類をグリシジル化したエポキシ樹脂、及び、ノボラック類をグリシジル化したノボラック型エポキシ樹脂が挙げられる。ビスフェノール類をグリシジル化したビスフェノール型エポキシ樹脂としては、例えば、ビスフェノールA、ビスフェノールF、ビスフェノールAD、ビスフェノールS、テトラメチルビスフェノールA、テトラメチルビスフェノールF、テトラメチルビスフェノールAD、テトラメチルビスフェノールS、テトラブロモビスフェノールA、テトラクロロビスフェノールA、テトラフルオロビスフェノールAが挙げられる。2価フェノール類をグリシジル化したエポキシ樹脂としては、例えば、ビフェノール、ジヒドキシナフタレン、9,9−ビス(4−ヒドロキシフェニル)フルオレンが挙げられる。トリスフェノール類をグリシジル化したエポキシ樹脂としては、例えば、1,1,1−トリス(4−ヒドロキシフェニル)メタン、4,4−(1−(4−(1−(4−ヒドロキシフェニル)−1−メチルエチル)フェニル)エチリデン)ビスフェノールが挙げられる。テトラキスフェノール類をグリシジル化したエポキシ樹脂としては、例えば、1,2,2,−テトラキス(4−ヒドロキシフェニル)エタンが挙げられる。ノボラック類をグリシジル化したノボラック型エポキシ樹脂としては、例えば、フェノールノボラック、クレゾールノボラック、ビスフェノールAノボラック、臭素化フェノールノボラック、臭素化ビスフェノールAノボラックが挙げられる。 Examples of epoxy resins obtained by glycidylation of polyphenols include bisphenol-type epoxy resins obtained by glycidylation of bisphenols, epoxy resins obtained by glycidylation of divalent phenols, epoxy resins obtained by glycidylation of trisphenols, and tetrakisphenols by glycidyl. And a novolac type epoxy resin obtained by glycidylating novolacs. Examples of bisphenol type epoxy resins obtained by glycidylating bisphenols include bisphenol A, bisphenol F, bisphenol AD, bisphenol S, tetramethylbisphenol A, tetramethylbisphenol F, tetramethylbisphenol AD, tetramethylbisphenol S, tetrabromobisphenol. A, tetrachlorobisphenol A, and tetrafluorobisphenol A. Examples of the epoxy resin obtained by glycidylation of dihydric phenols include biphenol, dihydroxynaphthalene, and 9,9-bis (4-hydroxyphenyl) fluorene. Examples of epoxy resins obtained by glycidylating trisphenols include 1,1,1-tris (4-hydroxyphenyl) methane, 4,4- (1- (4- (1- (4-hydroxyphenyl) -1 -Methylethyl) phenyl) ethylidene) bisphenol. Examples of the epoxy resin obtained by glycidylating tetrakisphenols include 1,2,2, -tetrakis (4-hydroxyphenyl) ethane. Examples of the novolak type epoxy resin obtained by glycidylating novolaks include phenol novolak, cresol novolak, bisphenol A novolak, brominated phenol novolak, and brominated bisphenol A novolak.
多価アルコールをグリシジル化した脂肪族エーテル型エポキシ樹脂としては、例えば、グリセリン、ポリエチレングリコールが挙げられる。ヒドロキシカルボン酸をグリシジル化したエーテルエステル型エポキシ樹脂としては、例えば、p−オキシ安息香酸、β−オキシナフトエ酸が挙げられる。ポリカルボン酸をグリシジル化したエステル型エポキシ樹脂としては、例えば、フタル酸、テレフタル酸が挙げられる。アミン型エポキシ樹脂等のグリシジル型エポキシ樹脂としては、例えば、4,4−ジアミノジフェニルメタン、m−アミノフェノール等のアミン化合物のグリシジル化物やトリグリシジルイソシアヌレートが挙げられる。脂環族エポキサイドとしては、例えば、3,4−エポキシシクロヘキシルメチル−3’,4’−エポキシシクロヘキサンカルボキシレートが挙げられる。 Examples of the aliphatic ether type epoxy resin obtained by glycidylation of a polyhydric alcohol include glycerin and polyethylene glycol. Examples of the ether ester type epoxy resin obtained by glycidylating hydroxycarboxylic acid include p-oxybenzoic acid and β-oxynaphthoic acid. Examples of the ester type epoxy resin obtained by glycidylation of polycarboxylic acid include phthalic acid and terephthalic acid. Examples of the glycidyl type epoxy resin such as an amine type epoxy resin include glycidylated products of triamined isocyanurates and amine compounds such as 4,4-diaminodiphenylmethane and m-aminophenol. Examples of the alicyclic epoxide include 3,4-epoxycyclohexylmethyl-3 ', 4'-epoxycyclohexanecarboxylate.
エポキシ樹脂(A2)としては、一液性エポキシ樹脂組成物(J)の貯蔵安定性を高めることができるため、多価エポキシ化合物が好ましい。多価エポキシ化合物としては、アミンアダクト(A1)の生産性が圧倒的に高いため、グリシジル型エポキシ樹脂が好ましく、硬化物の接着性や耐熱性が優れるため、多価フェノール類をグリシジル化したエポキシ樹脂がより好ましく、ビスフェノール型エポキシ樹脂が更に好ましい。ビスフェノール型エポキシ樹脂としては、ビスフェノールAをグリシジル化したエポキシ樹脂、ビスフェノールFをグリシジル化したエポキシ樹脂が好ましく、ビスフェノールAをグリシジル化したエポキシ樹脂がより好ましい。これらのエポキシ樹脂(A2)は、1種を単独で又は2種以上を併用してもよい。 As an epoxy resin (A2), since the storage stability of a one-component epoxy resin composition (J) can be improved, a polyvalent epoxy compound is preferable. As the polyvalent epoxy compound, glycidyl type epoxy resin is preferable because the productivity of the amine adduct (A1) is overwhelmingly high, and the epoxy resin obtained by glycidylating polyhydric phenols is excellent in the adhesiveness and heat resistance of the cured product. A resin is more preferable, and a bisphenol type epoxy resin is still more preferable. As the bisphenol type epoxy resin, an epoxy resin obtained by glycidylating bisphenol A and an epoxy resin obtained by glycidylating bisphenol F are preferable, and an epoxy resin obtained by glycidylating bisphenol A is more preferable. These epoxy resins (A2) may be used alone or in combination of two or more.
アミン化合物(A3)としては、少なくとも1個の一級アミノ基及び/又は二級アミノ基を有するが三級アミノ基を有さない化合物と、少なくとも1個の三級アミノ基及び少なくとも1個の活性水素基を有する化合物とが挙げられる。 The amine compound (A3) includes at least one primary amino group and / or secondary amino group but no tertiary amino group, at least one tertiary amino group and at least one activity. And a compound having a hydrogen group.
少なくとも1個の一級アミノ基及び/又は二級アミノ基を有するが三級アミノ基を有さない化合物としては、例えば、メチルアミン、エチルアミン、プロピルアミン、ブチルアミン、エチレンジアミン、プロピレンジアミン、ヘキサメチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン、エタノールアミン、プロパノールアミン、シクロヘキシルアミン、イソホロンジアミン、アニリン、トルイジン、ジアミノジフェニルメタン、ジアミノジフェニルスルホン等の三級アミノ基を有さない第一アミン類;ジメチルアミン、ジエチルアミン、ジプロピルアミン、ジブチルアミン、ジペンチルアミン、ジヘキシルアミン、ジメタノールアミン、ジエタノールアミン、ジプロパノールアミン、ジシクロヘキシルアミン、ピペリジン、ピペリドン、ジフェニルアミン、フェニルメチルアミン、フェニルエチルアミン等の三級アミノ基を有さない第二アミン類が挙げられる。 Examples of the compound having at least one primary amino group and / or secondary amino group but not having a tertiary amino group include methylamine, ethylamine, propylamine, butylamine, ethylenediamine, propylenediamine, hexamethylenediamine, Primary amines having no tertiary amino group such as diethylenetriamine, triethylenetetramine, ethanolamine, propanolamine, cyclohexylamine, isophoronediamine, aniline, toluidine, diaminodiphenylmethane, diaminodiphenylsulfone; dimethylamine, diethylamine, dipropyl Amine, dibutylamine, dipentylamine, dihexylamine, dimethanolamine, diethanolamine, dipropanolamine, dicyclohexylamine, piperidine, Peridon, diphenylamine, phenyl methylamine, secondary amines having no tertiary amino group such as a phenyl ethyl amine.
少なくとも1個の三級アミノ基及び少なくとも1個の活性水素基を有する化合物における活性水素基としては、一級アミノ基、二級アミノ基、水酸基、チオール基、カルボン酸、ヒドラジド基が挙げられる。 Examples of the active hydrogen group in the compound having at least one tertiary amino group and at least one active hydrogen group include a primary amino group, a secondary amino group, a hydroxyl group, a thiol group, a carboxylic acid, and a hydrazide group.
少なくとも1個の三級アミノ基及び少なくとも1個の活性水素基を有する化合物としては、例えば、2−ジメチルアミノエタノール、1−メチル−2−ジメチルアミノエタノール、1−フェノキシメチル−2−ジメチルアミノエタノール、2−ジエチルアミノエタノール、1−ブトキシメチル−2−ジメチルアミノエタノール、メチルジエタノールアミン、トリエタノールアミン、N−β−ヒドロキシエチルモルホリン等のアミノアルコール類;2−(ジメチルアミノメチル)フェノール、2,4,6−トリス(ジメチルアミノメチル)フェノール等のアミノフェノール類;2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、2−ウンデシルイミダゾール、2−ヘプタデシルイミダゾール、2−フェニルイミダゾール、1−アミノエチル−2−メチルイミダゾール、1−(2−ヒドロキシ−3−フェノキシプロピル)−2−メチルイミダゾール、1−(2−ヒドロキシ−3−フェノキシプロピル)−2−エチル−4−メチルイミダゾール、1−(2−ヒドロキシ−3−ブトキシプロピル)−2−メチルイミダゾール、1−(2−ヒドロキシ−3−ブトキシプロピル)−2−エチル−4−メチルイミダゾール等のイミダゾール類;1−(2−ヒドロキシ−3−フェノキシプロピル)−2−フェニルイミダゾリン、1−(2−ヒドロキシ−3−ブトキシプロピル)−2−メチルイミダゾリン、2−メチルイミダゾリン、2,4−ジメチルイミダゾリン、2−エチルイミダゾリン、2−エチル−4−メチルイミダゾリン、2−ベンジルイミダゾリン、2−フェニルイミダゾリン、2−(o−トリル)−イミダゾリン、テトラメチレン−ビス−イミダゾリン、1,1,3−トリメチル−1,4−テトラメチレン−ビス−イミダゾリン、1,3,3−トリメチル−1,4−テトラメチレン−ビス−イミダゾリン、1,1,3−トリメチル−1,4−テトラメチレン−ビス−4−メチルイミダゾリン、1,3,3−トリメチル−1,4−テトラメチレン−ビス−4−メチルイミダゾリン、1,2−フェニレン−ビス−イミダゾリン、1,3−フェニレン−ビス−イミダゾリン、1,4−フェニレン−ビス−イミダゾリン、1,4−フェニレン−ビス−4−メチルイミダゾリン等のイミダゾリン類;ジメチルアミノプロピルアミン、ジエチルアミノプロピルアミン、ジプロピルアミノプロピルアミン、ジブチルアミノプロピルアミン、ジメチルアミノエチルアミン、ジエチルアミノエチルアミン、ジプロピルアミノエチルアミン、ジブチルアミノエチルアミン、N−メチルピペラジン、N−アミノエチルピペラジン、ジエチルアミノエチルピペラジン等の三級アミノアミン類;2−ジメチルアミノエタンチオール、2−メルカプトベンゾイミダゾール、2−メルカプトベンゾチアゾール、2−メルカプトピリジン、4−メルカプトピリジン等のアミノメルカプタン類;N,N−ジメチルアミノ安息香酸、N,N−ジメチルグリシン、ニコチン酸、イソニコチン酸、ピコリン酸等のアミノカルボン酸類;N,N−ジメチルグリシンヒドラジド、ニコチン酸ヒドラジド、イソニコチン酸ヒドラジド等のアミノヒドラジド類が挙げられる。 Examples of the compound having at least one tertiary amino group and at least one active hydrogen group include 2-dimethylaminoethanol, 1-methyl-2-dimethylaminoethanol, 1-phenoxymethyl-2-dimethylaminoethanol. Amino alcohols such as 2-diethylaminoethanol, 1-butoxymethyl-2-dimethylaminoethanol, methyldiethanolamine, triethanolamine, N-β-hydroxyethylmorpholine; 2- (dimethylaminomethyl) phenol, 2,4, Aminophenols such as 6-tris (dimethylaminomethyl) phenol; 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 1-amine Noethyl-2-methylimidazole, 1- (2-hydroxy-3-phenoxypropyl) -2-methylimidazole, 1- (2-hydroxy-3-phenoxypropyl) -2-ethyl-4-methylimidazole, 1- ( Imidazoles such as 2-hydroxy-3-butoxypropyl) -2-methylimidazole and 1- (2-hydroxy-3-butoxypropyl) -2-ethyl-4-methylimidazole; 1- (2-hydroxy-3- Phenoxypropyl) -2-phenylimidazoline, 1- (2-hydroxy-3-butoxypropyl) -2-methylimidazoline, 2-methylimidazoline, 2,4-dimethylimidazoline, 2-ethylimidazoline, 2-ethyl-4- Methylimidazoline, 2-benzylimidazoline, 2-phenylimidazoli , 2- (o-tolyl) -imidazoline, tetramethylene-bis-imidazoline, 1,1,3-trimethyl-1,4-tetramethylene-bis-imidazoline, 1,3,3-trimethyl-1,4- Tetramethylene-bis-imidazoline, 1,1,3-trimethyl-1,4-tetramethylene-bis-4-methylimidazoline, 1,3,3-trimethyl-1,4-tetramethylene-bis-4-methylimidazoline Imidazolines such as 1,2-phenylene-bis-imidazoline, 1,3-phenylene-bis-imidazoline, 1,4-phenylene-bis-imidazoline, 1,4-phenylene-bis-4-methylimidazoline; Propylamine, diethylaminopropylamine, dipropylaminopropylamine, dibutylaminopropyl Tertiary aminoamines such as amine, dimethylaminoethylamine, diethylaminoethylamine, dipropylaminoethylamine, dibutylaminoethylamine, N-methylpiperazine, N-aminoethylpiperazine, diethylaminoethylpiperazine; 2-dimethylaminoethanethiol, 2-mercapto Aminomercaptans such as benzimidazole, 2-mercaptobenzothiazole, 2-mercaptopyridine, 4-mercaptopyridine; N, N-dimethylaminobenzoic acid, N, N-dimethylglycine, nicotinic acid, isonicotinic acid, picolinic acid, etc. And amino hydrazides such as N, N-dimethylglycine hydrazide, nicotinic acid hydrazide and isonicotinic acid hydrazide.
アミン化合物(A3)としては、貯蔵安定性と低温硬化性とのバランスが優れているため、少なくとも1個の三級アミノ基及び少なくとも1個の活性水素基を有する化合物が好ましく、イミダゾール類がより好ましく、2−メチルイミダゾール、2−エチル−4−メチルイミダゾールが更に好ましい。 As the amine compound (A3), a compound having at least one tertiary amino group and at least one active hydrogen group is preferable because the balance between storage stability and low-temperature curability is excellent, and imidazoles are more preferable. 2-Methylimidazole and 2-ethyl-4-methylimidazole are more preferable.
コア(B)は、化合物(A)以外の成分(G)を任意成分として含んでいてもよい。成分(G)の含有量は、低温硬化性及び貯蔵安定性を更に高度に両立できるため、コア(B)全体を基準として、0〜50質量%が好ましく、0〜40質量%がより好ましい。 The core (B) may contain a component (G) other than the compound (A) as an optional component. The content of the component (G) is preferably 0 to 50% by mass, more preferably 0 to 40% by mass, based on the entire core (B), since both low-temperature curability and storage stability can be achieved to a higher degree.
成分(G)を加えることにより、一液性エポキシ樹脂組成物(J)に所望の特性を付与することができる。成分(G)としては、所望の特性を付与できる化合物であれば特に制限はなく、例えば、硬化温度の低下や硬化時間の短縮が可能である観点では、エポキシ樹脂との反応性が高い化合物や硬化促進剤が挙げられる。また、エポキシ樹脂硬化物(K)に必要となる添加剤を予め成分(G)として、コア(B)中に添加しておいてもよい。成分(G)は、1種を単独で又は2種類以上を併用してもよい。 By adding the component (G), desired properties can be imparted to the one-component epoxy resin composition (J). The component (G) is not particularly limited as long as it is a compound capable of imparting desired characteristics. For example, from the viewpoint that the curing temperature can be lowered and the curing time can be shortened, a compound having high reactivity with an epoxy resin, A hardening accelerator is mentioned. Further, an additive necessary for the cured epoxy resin (K) may be previously added to the core (B) as the component (G). Component (G) may be used alone or in combination of two or more.
また、別の観点から、成分(G)は、常温(25℃)で固体状の化合物が好ましく、40℃で固体状の化合物がより好ましく、60℃で固体状の化合物が更に好ましい。成分(G)が常温で液体の場合、カプセル化が困難であることや、カプセル化が可能であったとしても一液性エポキシ樹脂組成物(J)とした際の貯蔵安定性が低下する可能性がある。 From another viewpoint, the component (G) is preferably a solid compound at normal temperature (25 ° C.), more preferably a solid compound at 40 ° C., and still more preferably a solid compound at 60 ° C. When component (G) is a liquid at room temperature, it may be difficult to encapsulate, or even if it can be encapsulated, the storage stability of the one-component epoxy resin composition (J) may be reduced. There is sex.
コア(B)の形態は、粉末状であることが好ましい。コア(B)の平均粒径は、0.1〜50μmが好ましく、0.5〜10μmがより好ましく、0.5〜5μmが更に好ましい。平均粒径が0.1μm未満では、低温硬化性及び貯蔵安定性のいずれかが低下する傾向がある。平均粒径を0.1〜50μmの範囲にすることで、均質な硬化物を得ることができる。なお、本明細書における「平均粒径」は、メディアン径を指すものである。平均粒径は、レーザー回折式粒度分布測定装置により測定することができる。 The form of the core (B) is preferably powdery. The average particle size of the core (B) is preferably from 0.1 to 50 μm, more preferably from 0.5 to 10 μm, still more preferably from 0.5 to 5 μm. If the average particle size is less than 0.1 μm, either low-temperature curability or storage stability tends to decrease. By setting the average particle size in the range of 0.1 to 50 μm, a homogeneous cured product can be obtained. In the present specification, “average particle diameter” refers to the median diameter. The average particle diameter can be measured with a laser diffraction particle size distribution measuring apparatus.
また、コア(B)の形状は特に制限はなく、球状、不定形のいずれでもよく、一液性エポキシ樹脂組成物(J)の低粘度化のためには、球状が好ましい。ここで「球状」とは、真球は勿論の事、不定形の角が丸みを帯びた形状をも包含する。 Further, the shape of the core (B) is not particularly limited, and may be either spherical or indeterminate. A spherical shape is preferable for reducing the viscosity of the one-component epoxy resin composition (J). Here, “spherical” includes not only true spheres but also shapes with rounded irregular corners.
コア(B)の製造方法は特に限定されないが、コア(B)中にアミンアダクト(A1)と成分(G)とが均一に存在していることが好ましい。このような分布を実現する方法として、アミンアダクト(A1)と成分(G)とを共に加熱融解して十分混合した後、常温まで冷却し粉砕する方法や、アミンアダクト(A1)又は成分(G)の一方を加熱融解し、それに他方を分散させて均一分散物を形成し、常温まで冷却し粉砕する方法が挙げられる。 Although the manufacturing method of a core (B) is not specifically limited, It is preferable that an amine adduct (A1) and a component (G) exist uniformly in a core (B). As a method for realizing such a distribution, the amine adduct (A1) and the component (G) are heated and melted together and mixed sufficiently, and then cooled to room temperature and pulverized, or the amine adduct (A1) or the component (G ) Is heated and melted, the other is dispersed therein to form a uniform dispersion, cooled to room temperature, and pulverized.
(カプセル(E))
化合物(A)や成分(G)を含むコア(B)をカプセル化してカプセル(E)とすることで、潜在性硬化剤(F)は貯蔵安定性及び硬化特性を両立することができる。カプセル(E)は、化合物(A)と反応する官能基を有する化合物(L)、及び、イソシアネート化合物(C)を含む。また、カプセル(E)は、貯蔵安定性を更に向上させる観点から、活性水素基を有する化合物及び水の少なくとも一方(以下、「成分(D)」と表記する。)を含むことが好ましい。
(Capsule (E))
By encapsulating the core (B) containing the compound (A) and the component (G) to form a capsule (E), the latent curing agent (F) can achieve both storage stability and curing characteristics. The capsule (E) contains a compound (L) having a functional group that reacts with the compound (A) and an isocyanate compound (C). The capsule (E) preferably contains at least one of a compound having an active hydrogen group and water (hereinafter referred to as “component (D)”) from the viewpoint of further improving storage stability.
化合物(L)における化合物(A)と反応する官能基は、エポキシ基、カルボキシル基、スルホ基、ウレア基、イソシアネート基等が挙げられる。化合物(L)としては、カプセルの安定性の観点から、エポキシ基を有する化合物(L1)が好ましい。エポキシ基を有する化合物(L1)としては、例えば、モノエポキシ化合物、多価エポキシ化合物が挙げられ、好ましくはエポキシ樹脂(L2)である。このようなエポキシ樹脂(L2)としては、例えばビスフェノール類をグリシジル化したビスフェノール型エポキシ樹脂などが挙げられる。なお、エポキシ基を有する化合物(L1)としては、上述したエポキシ樹脂(A2)と同様のものを用いることができる。 Examples of the functional group that reacts with the compound (A) in the compound (L) include an epoxy group, a carboxyl group, a sulfo group, a urea group, and an isocyanate group. The compound (L) is preferably a compound (L1) having an epoxy group from the viewpoint of capsule stability. As a compound (L1) which has an epoxy group, a monoepoxy compound and a polyhydric epoxy compound are mentioned, for example, Preferably it is an epoxy resin (L2). Examples of such an epoxy resin (L2) include a bisphenol type epoxy resin obtained by glycidylating bisphenols. In addition, as a compound (L1) which has an epoxy group, the thing similar to the epoxy resin (A2) mentioned above can be used.
イソシアネート化合物(C)としては、1分子中に1個以上のイソシアネート基を有する化合物であればよく、1分子中に2個以上のイソシアネート基を有する化合物が好ましい。イソシアネート化合物(C)としては、脂肪族ジイソシアネート、脂環式ジイソシアネート、芳香族ジイソシアネート、低分子トリイソシアネート、ポリイソシアネート等がより好ましい。 The isocyanate compound (C) may be a compound having one or more isocyanate groups in one molecule, and a compound having two or more isocyanate groups in one molecule is preferable. As the isocyanate compound (C), aliphatic diisocyanate, alicyclic diisocyanate, aromatic diisocyanate, low-molecular triisocyanate, polyisocyanate and the like are more preferable.
脂肪族ジイソシアネートの例としては、エチレンジイソシアネート、プロピレンジイソシアネート、ブチレンジイソシアネート、ヘキサメチレンジイソシアネート、トリメチルヘキサメチレンジイソシアネート等が挙げられる。 Examples of the aliphatic diisocyanate include ethylene diisocyanate, propylene diisocyanate, butylene diisocyanate, hexamethylene diisocyanate, and trimethylhexamethylene diisocyanate.
脂環式ジイソシアネートの例としては、イソホロンジイソシアネート、4,4’−ジシクロヘキシルメタンジイソシアネート、ノルボルナンジイソシアネート、1,4−イソシアナトシクロヘキサン、1,3−ビス(イソシアナトメチル)−シクロヘキサン、1,3−ビス(2−イソシアナトプロピル−2イル)−シクロヘキサン等が挙げられる。 Examples of alicyclic diisocyanates include isophorone diisocyanate, 4,4′-dicyclohexylmethane diisocyanate, norbornane diisocyanate, 1,4-isocyanatocyclohexane, 1,3-bis (isocyanatomethyl) -cyclohexane, 1,3-bis. (2-isocyanatopropyl-2-yl) -cyclohexane and the like.
芳香族ジイソシアネートの例としては、トリレンジイソシアネート、4,4’−ジフェニルメタンジイソシアネート、キシレンジイソシアネート、1,5−ナフタレンジイソシアネート等が挙げられる。 Examples of aromatic diisocyanates include tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate, xylene diisocyanate, 1,5-naphthalene diisocyanate, and the like.
低分子トリイソシアネートの例としては、1,6,11−ウンデカントリイソシアネート、1,8−ジイソシアネート−4−イソシアネートメチルオクタン、1,3,6−ヘキサメチレントリイソシアネート、2,6−ジイソシアナトヘキサン酸−2−イソシアナトエチル、2,6−ジイソシアナトヘキサン酸−1−メチル−2−イソシアネートエチル等の脂肪族トリイソシアネート化合物、トリシクロヘキシルメタントリイソシアネート、ビシクロヘプタントリイソシアネート等の脂環式トリイソシアネート化合物、トリフェニルメタントリイソシアネート、トリス(イソシアネートフェニル)チオホスフェート等の芳香族トリイソシアネート化合物等が挙げられる。 Examples of low molecular weight triisocyanates include 1,6,11-undecane triisocyanate, 1,8-diisocyanate-4-isocyanate methyloctane, 1,3,6-hexamethylene triisocyanate, 2,6-diisocyanatohexane Aliphatic triisocyanate compounds such as acid-2-isocyanatoethyl and 2,6-diisocyanatohexanoic acid-1-methyl-2-isocyanatoethyl, alicyclic triisocyanates such as tricyclohexylmethane triisocyanate and bicycloheptane triisocyanate Examples thereof include aromatic triisocyanate compounds such as isocyanate compounds, triphenylmethane triisocyanate, and tris (isocyanatephenyl) thiophosphate.
ポリイソシアネートの例としては、ポリメチレンポリフェニルポリイソシアネートや上記ジイソシアネート、低分子トリイソシアネートより誘導されるポリイソシアネートが挙げられる。上記ジイソシアネート、低分子トリイソシアネートより誘導されるポリイソシアネートとしては、イソシアヌレート型ポリイソシアネート、ビュレット型ポリイソシアネート、ウレタン型ポリイソシアネート、アロハネート型ポリイソシアネート、カルボジイミド型ポリイソシアネート等が挙げられる。 Examples of the polyisocyanate include polymethylene polyphenyl polyisocyanate, the above-mentioned diisocyanates, and polyisocyanates derived from low molecular triisocyanates. Examples of the polyisocyanate derived from the above diisocyanate and low molecular triisocyanate include isocyanurate type polyisocyanate, burette type polyisocyanate, urethane type polyisocyanate, allophanate type polyisocyanate, carbodiimide type polyisocyanate and the like.
これらイソシアネート化合物(C)は、1種を単独で又は2種以上を併用してもよい。 These isocyanate compounds (C) may be used alone or in combination of two or more.
イソシアネート化合物(C)の含有量は、化合物(L)100質量部に対して、0.01〜10000質量部が好ましく、1〜100質量部がより好ましい。 0.01-10000 mass parts is preferable with respect to 100 mass parts of compounds (L), and, as for content of an isocyanate compound (C), 1-100 mass parts is more preferable.
コア(B)中の活性水素基を有する化合物(A)と、イソシアネート化合物(C)との反応では、化合物(A)に含まれる活性水素基と、イソシアネート化合物(C)に含まれるイソシアネート基との反応により、コア(B)表面にカプセル(E)の被膜が形成される。そして、このカプセル形成反応を行う際に、化合物(L)が存在することで、カプセル(E)の含有成分内に化合物(L)が取り込まれ、低温硬化性及び貯蔵安定性に優れたカプセル(E)が形成される。更に、この反応中に、成分(D)を存在させることにより、表面被膜が成長し、貯蔵安定性に更に優れたカプセル(E)を有する潜在性硬化剤(F)を製造することができる。 In the reaction between the compound (A) having an active hydrogen group in the core (B) and the isocyanate compound (C), an active hydrogen group contained in the compound (A), an isocyanate group contained in the isocyanate compound (C), and By this reaction, a capsule (E) film is formed on the surface of the core (B). And when performing this capsule formation reaction, a compound (L) is taken in in the containing component of a capsule (E) because compound (L) exists, and the capsule (excellent in low temperature curability and storage stability ( E) is formed. Furthermore, the presence of component (D) during this reaction makes it possible to produce a latent curing agent (F) having a capsule (E) with a surface coating growing and further excellent storage stability.
成分(D)である活性水素基を有する化合物の活性水素基としては、一級アミノ基、二級アミノ基、水酸基、チオール基、カルボン酸、ヒドラジド基が挙げられる。活性水素基を有する化合物は、1分子中に1個以上の活性水素基を有する化合物であればよく、1分子中に2個以上の活性水素基を有する化合物が好ましく、この場合コア(B)の表面被膜が好適に成長し、更に優れた貯蔵安定性を有する潜在性硬化剤(F)を製造することができる。活性水素基を有する化合物としては、例えばアルコールやアミン化合物、チオール化合物、水などが挙げられる。活性水素基を有する化合物は、1種を単独で又は2種類以上を併用してもよい。 Examples of the active hydrogen group of the component (D) -containing compound having an active hydrogen group include a primary amino group, a secondary amino group, a hydroxyl group, a thiol group, a carboxylic acid, and a hydrazide group. The compound having an active hydrogen group may be a compound having one or more active hydrogen groups in one molecule, and is preferably a compound having two or more active hydrogen groups in one molecule. In this case, the core (B) Thus, a latent curing agent (F) having an excellent surface stability can be produced. Examples of the compound having an active hydrogen group include alcohols, amine compounds, thiol compounds, and water. The compounds having an active hydrogen group may be used alone or in combination of two or more.
また、成分(D)として水を用いることが可能である。水を用いた場合も、活性水素基を有する化合物と同様に、コア(B)の表面被膜が好適に成長し、更に優れた貯蔵安定性を有する潜在性硬化剤(F)を製造することができる。 Moreover, it is possible to use water as a component (D). Even when water is used, the surface coating of the core (B) is preferably grown similarly to the compound having an active hydrogen group, and the latent curing agent (F) having further excellent storage stability can be produced. it can.
成分(D)の含有量は、化合物(L)100質量部に対して、0.001〜100質量部が好ましく、0.1〜50質量部がより好ましい。 0.001-100 mass parts is preferable with respect to 100 mass parts of compounds (L), and, as for content of a component (D), 0.1-50 mass parts is more preferable.
(潜在性硬化剤(F)の製造方法)
次に、コア(B)をカプセル(E)によりカプセル化し、潜在性硬化剤(F)を製造する方法について説明する。本実施形態の潜在性硬化剤(F)の製造方法は、コア(B)を被覆するカプセル(E)を形成するカプセル形成工程と、カプセル形成後に分散媒(H)を除去する溶媒除去工程とを含むことが好ましい。
(Method for producing latent curing agent (F))
Next, a method for producing the latent curing agent (F) by encapsulating the core (B) with the capsule (E) will be described. The manufacturing method of the latent curing agent (F) of this embodiment includes a capsule forming step for forming a capsule (E) that covers the core (B), and a solvent removing step for removing the dispersion medium (H) after the capsule is formed. It is preferable to contain.
カプセル形成工程では、コア(B)、イソシアネート化合物(C)、及び、化合物(L)を反応させることにより、コア(B)を被覆するカプセル(E)が反応性生物として形成される。この場合、成分(D)を更に用いて反応生成物を得ることが好ましい。 In the capsule forming step, the core (B), the isocyanate compound (C), and the compound (L) are reacted to form a capsule (E) that covers the core (B) as a reactive organism. In this case, it is preferable to further use the component (D) to obtain a reaction product.
カプセル形成反応は、分散媒(H)中でコア(B)を分散させた反応液中で行うことが好ましい。分散媒(H)を用いずにエポキシ樹脂中でカプセル形成反応を行うと、未反応のイソシアネート化合物(C)、化合物(D)、副生成物が残存し、貯蔵安定性が低下する傾向がある。カプセル形成反応は、化合物(A)(好ましくはアミンアダクト(A1))の融点又は軟化点以下の温度で行うことが好ましい。 The capsule forming reaction is preferably performed in a reaction solution in which the core (B) is dispersed in the dispersion medium (H). When a capsule forming reaction is performed in an epoxy resin without using a dispersion medium (H), unreacted isocyanate compound (C), compound (D), and by-products remain, and storage stability tends to decrease. . The capsule forming reaction is preferably performed at a temperature below the melting point or softening point of the compound (A) (preferably the amine adduct (A1)).
分散媒(H)の1気圧での沸点は、150℃以下が好ましく、50〜120℃がより好ましい。分散媒の沸点が150℃を超えると、反応液から分散媒(H)を除去することが困難になる傾向がある。また、分散媒(H)の粘度は、25℃で1000mPa・s以下が好ましく、0.2〜10mPa・sがより好ましい。分散媒(H)の粘度が1000mPa・sを超えると、カプセル化時の粘度が高くなり、均一に反応させることが困難になる傾向がある。更に、分散媒(H)としては、1気圧での沸点が150℃以下であり、かつ、粘度が25℃で1000mPa・s以下である分散媒が好ましい。 The boiling point at 1 atm of the dispersion medium (H) is preferably 150 ° C. or less, and more preferably 50 to 120 ° C. When the boiling point of the dispersion medium exceeds 150 ° C., it tends to be difficult to remove the dispersion medium (H) from the reaction solution. Moreover, 1000 mPa * s or less is preferable at 25 degreeC, and, as for the viscosity of a dispersion medium (H), 0.2-10 mPa * s is more preferable. When the viscosity of the dispersion medium (H) exceeds 1000 mPa · s, the viscosity at the time of encapsulation tends to be high, and it tends to be difficult to react uniformly. Further, as the dispersion medium (H), a dispersion medium having a boiling point at 1 atm of 150 ° C. or less and a viscosity of 1000 mPa · s or less at 25 ° C. is preferable.
分散媒(H)としては、コア(B)が溶解しなければ特に限定されないが、活性水素基や、アミンアダクト(A1)と反応するエポキシ基等の置換基を有しない化合物が好ましい。これらの置換基は、カプセル形成反応を阻害する可能性がある。好適な分散媒(H)の具体例としては、シクロヘキサン(沸点80.7℃、粘度0.898mPa・s:25℃)及びヘキサン(沸点69℃、粘度0.299mPa・s:25℃)が挙げられる。 The dispersion medium (H) is not particularly limited as long as the core (B) is not dissolved, but a compound having no substituent such as an active hydrogen group or an epoxy group that reacts with the amine adduct (A1) is preferable. These substituents may inhibit the capsule forming reaction. Specific examples of suitable dispersion medium (H) include cyclohexane (boiling point 80.7 ° C., viscosity 0.898 mPa · s: 25 ° C.) and hexane (boiling point 69 ° C., viscosity 0.299 mPa · s: 25 ° C.). It is done.
分散媒(H)と化合物(L)との含有量の質量比(分散媒(H):化合物(L))は、100:0.001〜100:100が好ましく、100:0.01〜100:50がより好ましい。質量比が100:100を超えると、反応液の粘度が高くなり均一なカプセル化反応を行うことが困難になる傾向がある。 The mass ratio of the content of the dispersion medium (H) to the compound (L) (dispersion medium (H): compound (L)) is preferably 100: 0.001 to 100: 100, and 100: 0.01 to 100. : 50 is more preferable. When the mass ratio exceeds 100: 100, the viscosity of the reaction solution tends to be high and it becomes difficult to perform a uniform encapsulation reaction.
カプセル形成工程では、化合物(L)としてエポキシ基を有する化合物(L1)を用いる場合、一液性エポキシ樹脂組成物(J)とするために混合するエポキシ樹脂(I)と同じエポキシ樹脂を選択することが好ましい。この場合、潜在性硬化剤(F)とエポキシ樹脂(I)とを混合するときの分散性が向上し、均一に分散させることができるようになる利点がある。 In the capsule forming step, when the compound (L1) having an epoxy group is used as the compound (L), the same epoxy resin as the epoxy resin (I) to be mixed is selected in order to obtain a one-component epoxy resin composition (J). It is preferable. In this case, there is an advantage that the dispersibility when the latent curing agent (F) and the epoxy resin (I) are mixed is improved and can be uniformly dispersed.
カプセル化処理は、必要であれば2回以上行ってもよい。このとき、少なくとも1回は、コア(B)中の化合物(A)と、イソシアネート化合物(C)と、化合物(L)との反応を行えばよく、これ以外に、化合物(A)と、イソシアネート化合物(C)又は化合物(L)のいずれかとの反応を行ってもよい。これらの反応では、化合物(D)を更に反応させることが好ましい。カプセル化の回数は、製造コストを抑える観点から、5回以下が好ましく、3回以下がより好ましい。 The encapsulation process may be performed twice or more if necessary. At this time, the compound (A) in the core (B), the isocyanate compound (C), and the compound (L) may be reacted at least once. You may perform reaction with either a compound (C) or a compound (L). In these reactions, it is preferable to further react the compound (D). The number of times of encapsulation is preferably 5 times or less, and more preferably 3 times or less from the viewpoint of suppressing the manufacturing cost.
カプセル形成工程後の分散媒(H)には、未反応のイソシアネート化合物(C)及び成分(D)、副生成物が残存する場合がある。これらの残存物が残存することで、貯蔵安定性が低下するため、カプセル形成工程後に分散媒(H)を除去することが好ましい。 In the dispersion medium (H) after the capsule forming step, unreacted isocyanate compound (C), component (D), and by-products may remain. Since these residues remain, storage stability is lowered. Therefore, it is preferable to remove the dispersion medium (H) after the capsule forming step.
分散媒(H)の除去の方法は、特に制限はないが、分散媒(H)と共に未反応のイソシアネート化合物(C)及び成分(D)、副生成物等の残存物を分散媒(H)と共に除去することが好ましい。このような方法として、ろ過により分散媒(H)を除去する方法が挙げられる。 The method for removing the dispersion medium (H) is not particularly limited, but the dispersion medium (H) and the unreacted isocyanate compound (C), the component (D), and residual products such as by-products are dispersed in the dispersion medium (H). It is preferable to remove together. An example of such a method is a method of removing the dispersion medium (H) by filtration.
また、分散媒(H)を除去した後、潜在性硬化剤(F)を洗浄することが好ましい。潜在性硬化剤(F)の洗浄により、潜在性硬化剤(F)表面に付着している、未反応の化合物を除去できる。洗浄の方法は特に限定されないが、上記ろ過による残留物の際に、分散媒(H)又は潜在性硬化剤(F)を溶解しない溶媒を用いて洗浄することができる。 Moreover, it is preferable to wash the latent curing agent (F) after removing the dispersion medium (H). By washing the latent curing agent (F), unreacted compounds adhering to the surface of the latent curing agent (F) can be removed. Although the washing method is not particularly limited, the residue obtained by filtration can be washed using a solvent that does not dissolve the dispersion medium (H) or the latent curing agent (F).
ろ過や洗浄を行った後に潜在性硬化剤(F)を乾燥することで、潜在性硬化剤(F)を粉末状の形態で得ることができる。乾燥の方法は特に限定されないが、コア(B)の融点又は軟化点以下の温度で乾燥することが好ましく、例えば減圧乾燥が挙げられる。潜在性硬化剤(F)を粉末状にすることで、一液性エポキシ樹脂組成物(J)において、幅広い種類の配合のために容易に適用することができる。 The latent curing agent (F) can be obtained in a powder form by drying the latent curing agent (F) after filtration and washing. Although the drying method is not particularly limited, it is preferable to dry at a temperature not higher than the melting point or softening point of the core (B), for example, drying under reduced pressure. By making the latent curing agent (F) into a powder form, the one-component epoxy resin composition (J) can be easily applied for a wide variety of formulations.
(一液性エポキシ樹脂組成物(J))
次に、一液性エポキシ樹脂組成物(マスターバッチ型エポキシ樹脂用硬化剤組成物)(J)について説明する。一液性エポキシ樹脂組成物(J)は、潜在性硬化剤(F)及びエポキシ樹脂(I)を含有する。
(One-part epoxy resin composition (J))
Next, the one-component epoxy resin composition (masterbatch type epoxy resin curing agent composition) (J) will be described. The one-pack epoxy resin composition (J) contains a latent curing agent (F) and an epoxy resin (I).
潜在性硬化剤(F)とエポキシ樹脂(I)との含有量の質量比(潜在性硬化剤(F):エポキシ樹脂(I))は、100:10〜100:50000が好ましく、100:10〜100:25000がより好ましく、100:50〜100:10000が更に好ましい。 The mass ratio of the content of the latent curing agent (F) and the epoxy resin (I) (latent curing agent (F): epoxy resin (I)) is preferably 100: 10 to 100: 50000, 100: 10 ~ 100: 25000 is more preferable, and 100: 50 to 100: 10000 is still more preferable.
一液性エポキシ樹脂組成物(J)に用いられるエポキシ樹脂(I)は、1分子中に平均2個以上のエポキシ基を有するものが好ましい。エポキシ樹脂(I)としては、例えば、多価フェノール類をグリシジル化したエポキシ樹脂、多価アルコールをグリシジル化した脂肪族エーテル型エポキシ樹脂、ヒドロキシカルボン酸をグリシジル化したエーテルエステル型エポキシ樹脂、ポリカルボン酸をグリシジル化したエステル型エポキシ樹脂、アミン型エポキシ樹脂等のグリシジル型エポキシ樹脂、及び、脂環族エポキサイドが挙げられる。 The epoxy resin (I) used in the one-component epoxy resin composition (J) preferably has an average of two or more epoxy groups in one molecule. Examples of the epoxy resin (I) include an epoxy resin obtained by glycidylation of a polyhydric phenol, an aliphatic ether type epoxy resin obtained by glycidylation of a polyhydric alcohol, an ether ester type epoxy resin obtained by glycidylation of a hydroxycarboxylic acid, and a polycarboxylic acid. Examples thereof include glycidyl-type epoxy resins such as ester-type epoxy resins obtained by glycidylation of acids and amine-type epoxy resins, and alicyclic epoxides.
多価フェノール類をグリシジル化したエポキシ樹脂としては、ビスフェノール類をグリシジル化したビスフェノール型エポキシ樹脂、2価フェノール類をグリシジル化したエポキシ樹脂、トリスフェノール類をグリシジル化したエポキシ樹脂、テトラキスフェノール類をグリシジル化したエポキシ樹脂、及び、ノボラック類をグリシジル化したノボラック型エポキシ樹脂が挙げられる。ビスフェノール類をグリシジル化したビスフェノール型エポキシ樹脂としては、例えば、ビスフェノールA、ビスフェノールF、ビスフェノールAD、ビスフェノールS、テトラメチルビスフェノールA、テトラメチルビスフェノールF、テトラメチルビスフェノールAD、テトラメチルビスフェノールS、テトラブロモビスフェノールA、テトラクロロビスフェノールA、テトラフルオロビスフェノールAが挙げられる。2価フェノール類をグリシジル化したエポキシ樹脂としては、例えば、ビフェノール、ジヒドキシナフタレン、9,9−ビス(4−ヒドロキシフェニル)フルオレンが挙げられる。トリスフェノール類をグリシジル化したエポキシ樹脂としては、例えば、1,1,1−トリス(4−ヒドロキシフェニル)メタン、4,4−(1−(4−(1−(4−ヒドロキシフェニル)−1−メチルエチル)フェニル)エチリデン)ビスフェノールが挙げられる。テトラキスフェノール類をグリシジル化したエポキシ樹脂としては、例えば、1,2,2,−テトラキス(4−ヒドロキシフェニル)エタンが挙げられる。ノボラック類をグリシジル化したノボラック型エポキシ樹脂としては、例えば、フェノールノボラック、クレゾールノボラック、ビスフェノールAノボラック、臭素化フェノールノボラック、臭素化ビスフェノールAノボラックが挙げられる。 Examples of epoxy resins obtained by glycidylation of polyphenols include bisphenol-type epoxy resins obtained by glycidylation of bisphenols, epoxy resins obtained by glycidylation of divalent phenols, epoxy resins obtained by glycidylation of trisphenols, and tetrakisphenols by glycidyl. And a novolac type epoxy resin obtained by glycidylating novolacs. Examples of bisphenol type epoxy resins obtained by glycidylating bisphenols include bisphenol A, bisphenol F, bisphenol AD, bisphenol S, tetramethylbisphenol A, tetramethylbisphenol F, tetramethylbisphenol AD, tetramethylbisphenol S, tetrabromobisphenol. A, tetrachlorobisphenol A, and tetrafluorobisphenol A. Examples of the epoxy resin obtained by glycidylation of dihydric phenols include biphenol, dihydroxynaphthalene, and 9,9-bis (4-hydroxyphenyl) fluorene. Examples of epoxy resins obtained by glycidylating trisphenols include 1,1,1-tris (4-hydroxyphenyl) methane, 4,4- (1- (4- (1- (4-hydroxyphenyl) -1 -Methylethyl) phenyl) ethylidene) bisphenol. Examples of the epoxy resin obtained by glycidylating tetrakisphenols include 1,2,2, -tetrakis (4-hydroxyphenyl) ethane. Examples of the novolak type epoxy resin obtained by glycidylating novolaks include phenol novolak, cresol novolak, bisphenol A novolak, brominated phenol novolak, and brominated bisphenol A novolak.
多価アルコールをグリシジル化した脂肪族エーテル型エポキシ樹脂としては、例えば、グリセリン、ポリエチレングリコールが挙げられる。ヒドロキシカルボン酸をグリシジル化したエーテルエステル型エポキシ樹脂としては、例えば、p−オキシ安息香酸、β−オキシナフトエ酸が挙げられる。ポリカルボン酸をグリシジル化したエステル型エポキシ樹脂としては、例えば、フタル酸、テレフタル酸が挙げられる。アミン型エポキシ樹脂等のグリシジル型エポキシ樹脂としては、例えば、4,4−ジアミノジフェニルメタン、m−アミノフェノール等のアミン化合物のグリシジル化物やトリグリシジルイソシアヌレートが挙げられる。脂環族エポキサイドとしては、例えば、3,4−エポキシシクロヘキシルメチル−3’,4’−エポキシシクロヘキサンカルボキシレートが挙げられる。 Examples of the aliphatic ether type epoxy resin obtained by glycidylation of a polyhydric alcohol include glycerin and polyethylene glycol. Examples of the ether ester type epoxy resin obtained by glycidylating hydroxycarboxylic acid include p-oxybenzoic acid and β-oxynaphthoic acid. Examples of the ester type epoxy resin obtained by glycidylation of polycarboxylic acid include phthalic acid and terephthalic acid. Examples of the glycidyl type epoxy resin such as an amine type epoxy resin include glycidylated products of triamined isocyanurates and amine compounds such as 4,4-diaminodiphenylmethane and m-aminophenol. Examples of the alicyclic epoxide include 3,4-epoxycyclohexylmethyl-3 ', 4'-epoxycyclohexanecarboxylate.
一液性エポキシ樹脂組成物(J)には、潜在型硬化剤(F)に加えて、酸無水物類、フェノール類、ヒドラジド類及びグアニジン類からなる群より選ばれる少なくとも1種の硬化剤(M)を併用することができる。 In the one-pack epoxy resin composition (J), in addition to the latent curing agent (F), at least one curing agent selected from the group consisting of acid anhydrides, phenols, hydrazides and guanidines ( M) can be used in combination.
酸無水物類としては、例えば、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水ヘキサヒドロフタル酸、無水テトラヒドロフタル酸、無水メチルテトラヒドロフタル酸、無水−3−クロロフタル酸、無水−4−クロロフタル酸、無水ベンゾフェノンテトラカルボン酸、無水コハク酸、無水メチルコハク酸、無水ジメチルコハク酸、無水ジクロールコハク酸、無水メチルナジック酸、無水ドテシルコハク酸、無水クロレンデックク酸、無水マレイン酸等;フェノール類としては、例えば、フェノールノボラック、クレゾールノボラック、ビスフェノールAノボラック等;ヒドラジン類としては、例えば、コハク酸ジヒドラジド、アジピン酸ジヒドラジド、フタル酸ジヒドラジド、イソフタル酸ジヒドラジドテレフタル酸ジヒドラジド、p−オキシ安息香酸ヒドラジド、サリチル酸ヒドラジド、フェニルアミノプロピオン酸ヒドラジド、マレイン酸ジヒドラジド等;グアニジン類としては、例えば、ジシアンジアミド、メチルグアニジン、エチルグアニジン、プロピルグアニジン、ブチルグアニジン、ジメチルグアニジン、トリメチルグアニジン、フェニルグアニジン、ジフェニルグアニジン、トルイルグアニジン等が挙げられる。 Examples of acid anhydrides include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, hexahydrophthalic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, -3-chlorophthalic anhydride, and -4 -Chlorophthalic acid, benzophenone tetracarboxylic anhydride, succinic anhydride, methyl succinic anhydride, dimethyl succinic anhydride, dichlor succinic anhydride, methyl nadic anhydride, dodecyl succinic anhydride, chlorendec anhydride, maleic anhydride, etc .; as phenols Is, for example, phenol novolak, cresol novolak, bisphenol A novolak, etc .; hydrazines are, for example, succinic acid dihydrazide, adipic acid dihydrazide, phthalic acid dihydrazide, isophthalic acid dihydrazide terephthalic acid dihydra , P-oxybenzoic acid hydrazide, salicylic acid hydrazide, phenylaminopropionic hydrazide, maleic acid dihydrazide and the like; Examples of guanidines include dicyandiamide, methylguanidine, ethylguanidine, propylguanidine, butylguanidine, dimethylguanidine, trimethylguanidine, Examples thereof include phenylguanidine, diphenylguanidine, toluylguanidine and the like.
これらの中でも、硬化剤(M)としてはグアニジン類及び酸無水物類が好ましく、ジシアンジアミド、無水ヘキサヒドロフタル酸、無水メチルテトラヒドロフタル酸、無水メチルナジック酸がより好ましい。 Among these, guanidines and acid anhydrides are preferable as the curing agent (M), and dicyandiamide, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, and methylnadic acid anhydride are more preferable.
硬化剤(M)を使用する場合、エポキシ樹脂(I)100質量部に対して、硬化剤(M)の含有量は1〜200質量部が好ましく、潜在性硬化剤(F)の含有量は0.1〜200質量部が好ましい。このような含有量とすることにより、低温硬化性及び貯蔵安定性に優れた一液性エポキシ樹脂組成物(J)が得られ、耐熱性、耐水性に優れたエポキシ樹脂硬化物(K)を得ることができる。 When the curing agent (M) is used, the content of the curing agent (M) is preferably 1 to 200 parts by mass with respect to 100 parts by mass of the epoxy resin (I), and the content of the latent curing agent (F) is 0.1-200 mass parts is preferable. By setting it as such content, the one-component epoxy resin composition (J) excellent in low temperature curability and storage stability is obtained, and the epoxy resin cured product (K) excellent in heat resistance and water resistance is obtained. Obtainable.
また、一液性エポキシ樹脂組成物(J)には、所望によって、増量剤、補強材、充填材、導電微粒子、顔料、有機溶剤、反応性希釈剤、非反応性希釈剤、樹脂類、結晶性アルコール、カップリング剤等を添加することができる。 In addition, the one-part epoxy resin composition (J) includes, if desired, an extender, a reinforcing material, a filler, conductive fine particles, a pigment, an organic solvent, a reactive diluent, a non-reactive diluent, resins, crystals. A basic alcohol, a coupling agent, etc. can be added.
充填材としては、例えば、コールタール、ガラス繊維、アスベスト繊維、ほう素繊維、炭素繊維、セルロース、ポリエチレン粉、ポリプロピレン粉、石英紛、鉱物性ケイ酸塩、雲母、アスベスト粉、スレート粉、カオリン、酸化アルミニウム三水和物、水酸化アルミニウム、チョーク粉、石こう、炭酸カルシウム、三酸化アンチモン、ペントン、シリカ、エアロゾル、リトポン、バライト、二酸化チタン、カーボンブラック、グラファイト、カーボンナノチューブ、フラーレン、酸化鉄、金、銀、アルミニウム粉、鉄粉、ナノサイズの金属結晶、金属間化合物等を挙げることができ、これらはいずれもその用途に応じて有効に用いられる。 Examples of the filler include coal tar, glass fiber, asbestos fiber, boron fiber, carbon fiber, cellulose, polyethylene powder, polypropylene powder, quartz powder, mineral silicate, mica, asbestos powder, slate powder, kaolin, Aluminum oxide trihydrate, aluminum hydroxide, chalk powder, gypsum, calcium carbonate, antimony trioxide, penton, silica, aerosol, lithopone, barite, titanium dioxide, carbon black, graphite, carbon nanotube, fullerene, iron oxide, gold , Silver, aluminum powder, iron powder, nano-sized metal crystals, intermetallic compounds, etc., all of which can be used effectively depending on the application.
導電微粒子としては、例えば、半田粒子、ニッケル粒子、ナノサイズの金属結晶、金属の表面を他の金属で被覆した粒子、銅と銀の傾斜粒子等の金属粒子や、例えば、スチレン樹脂、ウレタン樹脂、メラミン樹脂、エポキシ樹脂、アクリル樹脂、フェノール樹脂、スチレン−ブタジエン樹脂等の樹脂粒子を金、ニッケル、銀、銅、半田等の導電性薄膜で被覆した粒子等が挙げられる。 Examples of the conductive fine particles include solder particles, nickel particles, nano-sized metal crystals, metal particles coated with other metals, metal particles such as copper and silver inclined particles, and styrene resins and urethane resins, for example. And particles obtained by coating resin particles such as melamine resin, epoxy resin, acrylic resin, phenol resin, and styrene-butadiene resin with a conductive thin film such as gold, nickel, silver, copper, and solder.
有機溶剤としては、例えば、トルエン、キシレン、メチルエチルケトン、メチルイソブチルケトン、酢酸エチル、酢酸ブチル等が挙げられる。 Examples of the organic solvent include toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetate, butyl acetate and the like.
反応性希釈剤としては、例えば、ブチルグリシジルエーテル、N,N’−グリシジル−o−トルイジン、フェニルグリシジルエーテル、スチレンオキサイド、エチレングリコールジグリシジルエーテル、プロピレングリコールジグリシジルエーテル、1,6−ヘキサンジオールジグリシジルエーテル等が挙げられる。 Examples of the reactive diluent include butyl glycidyl ether, N, N′-glycidyl-o-toluidine, phenyl glycidyl ether, styrene oxide, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, and 1,6-hexanediol diester. A glycidyl ether etc. are mentioned.
非反応性希釈剤としては、例えば、ジオクチルフタレート、ジブチルフタレート、ジオクチルアジベート、石油系溶剤等が挙げられる。 Examples of non-reactive diluents include dioctyl phthalate, dibutyl phthalate, dioctyl adipate, and petroleum solvents.
樹脂類としては、例えば、ポリエステル樹脂、ポリウレタン樹脂、アクリル樹脂、ポリエーテル樹脂、メラミン樹脂、フェノキシ樹脂やウレタン変性エポキシ樹脂、ゴム変性エポキシ樹脂、アルキッド変性エポキシ樹脂等の変性エポキシ樹脂が挙げられる。 Examples of resins include polyester resins, polyurethane resins, acrylic resins, polyether resins, melamine resins, phenoxy resins, urethane-modified epoxy resins, rubber-modified epoxy resins, alkyd-modified epoxy resins, and other modified epoxy resins.
結晶性アルコールとしては、例えば、1,2−シクロヘキサンジオール、1,3−シクロヘキサンジオール、1,4−シクロヘキサンジオール、ペンタエリスリトール、ソルビトール、ショ糖、トリメチロールプロパンが挙げられる。 Examples of the crystalline alcohol include 1,2-cyclohexanediol, 1,3-cyclohexanediol, 1,4-cyclohexanediol, pentaerythritol, sorbitol, sucrose, and trimethylolpropane.
一液性エポキシ樹脂組成物(J)は、潜在性硬化剤(F)とエポキシ樹脂(I)とを混合した混合物中で潜在性硬化剤(F)を分散させる工程と、分散した潜在性硬化剤(F)を加熱処理する工程とを備える製造方法により得ることができる。潜在性硬化剤(F)とエポキシ樹脂(I)との混合物をミキサーやロール等を用いて攪拌することにより、潜在性硬化剤(F)をエポキシ樹脂(I)中に分散させることができる。 The one-part epoxy resin composition (J) includes a step of dispersing the latent curing agent (F) in a mixture of the latent curing agent (F) and the epoxy resin (I), and the dispersed latent curing. It can obtain by a manufacturing method provided with the process of heat-processing an agent (F). The latent curing agent (F) can be dispersed in the epoxy resin (I) by stirring the mixture of the latent curing agent (F) and the epoxy resin (I) using a mixer or a roll.
潜在性硬化剤(F)とエポキシ樹脂(I)とを混合した後に加温処理することが好ましい。これにより、エポキシ樹脂硬化物(K)が得られる。本実施形態では、カプセル(E)にエポキシ樹脂(I)が取り込まれ、貯蔵安定性が向上する。加温処理の温度(エポキシ処理温度)は、常温(25℃)より高く、化合物(A)(好ましくはアミンアダクト(A1))の融点又は軟化点以下が好ましい。加温処理の温度が常温以下では、貯蔵安定性の向上効果が小さくなる傾向があり、コア(B)の含有成分の融点又は軟化点より高い温度では、エポキシ樹脂(I)との反応により潜在性硬化剤(F)の特性が低下しやすい傾向がある。処理時間は、生産性が向上する観点から、5分〜120時間が好ましく、2〜72時間がより好ましい。 The latent curing agent (F) and the epoxy resin (I) are preferably mixed and then heated. Thereby, an epoxy resin hardened material (K) is obtained. In this embodiment, the epoxy resin (I) is taken into the capsule (E), and the storage stability is improved. The temperature of the heating treatment (epoxy treatment temperature) is higher than room temperature (25 ° C.) and is preferably below the melting point or softening point of the compound (A) (preferably amine adduct (A1)). When the temperature of the heating treatment is not more than room temperature, the effect of improving the storage stability tends to be small. There exists a tendency for the characteristic of an adhesive hardening agent (F) to fall easily. From the viewpoint of improving productivity, the treatment time is preferably 5 minutes to 120 hours, more preferably 2 to 72 hours.
本実施形態の一液性エポキシ樹脂組成物(J)の形態としては、フィルム状(フィルム状組成物)及びペースト状(ペースト状組成物)が挙げられる。一液性エポキシ樹脂組成物(J)は、接着剤及び/又は接合用ペースト、接合用フィルムの他に、導電性材料、異方導電性材料、絶縁材料、封止材、コーティング材、塗料組成物、熱伝導性材料等として有用である。 Examples of the form of the one-component epoxy resin composition (J) of the present embodiment include a film form (film composition) and a paste form (paste composition). The one-component epoxy resin composition (J) is composed of a conductive material, an anisotropic conductive material, an insulating material, a sealing material, a coating material, a paint composition, in addition to an adhesive and / or a bonding paste and a bonding film. It is useful as a material, a heat conductive material, etc.
接着剤及び/又は接合用ペースト、接合用フィルムは、液状接着剤やフィルム状接着剤、ダイボンディング材等の接合材料として有用である。 Adhesives and / or bonding pastes and bonding films are useful as bonding materials such as liquid adhesives, film adhesives, and die bonding materials.
接合用フィルムの製造方法としては、例えば、特開昭62−141083号公報や、特開平05−295329号公報に記載された方法がある。具体的には、まず、固形エポキシ樹脂、液状エポキシ樹脂及び固形のウレタン樹脂が50質量%になるようにトルエンに溶解・混合・分散させた溶液を作製する。これに本実施形態の一液性エポキシ樹脂組成物(F)を溶液に対して30質量%添加・分散させてワニスを調製する。 As a method for producing a bonding film, for example, there are methods described in JP-A-62-141083 and JP-A-05-295329. Specifically, first, a solution in which solid epoxy resin, liquid epoxy resin, and solid urethane resin are dissolved, mixed, and dispersed in toluene so as to be 50% by mass is prepared. A varnish is prepared by adding and dispersing 30% by mass of the one-component epoxy resin composition (F) of the present embodiment to the solution.
次に、このワニスを例えば厚さ50μmの剥離用ポリエチレンテレフタレート基材に、トルエンの乾燥後に厚さ30μmとなるように塗布する。トルエンを乾燥させることにより、常温では不活性であるものの、加熱することにより潜在性硬化剤の作用により接着性を発揮する接合用フィルムを得ることができる。 Next, this varnish is applied to, for example, a peeling polyethylene terephthalate substrate having a thickness of 50 μm so that the thickness becomes 30 μm after drying of toluene. By drying toluene, a bonding film that is inactive at room temperature but exhibits adhesiveness by the action of the latent curing agent can be obtained by heating.
導電性材料の形態としては、フィルム状(導電性フィルム)及びペースト状(導電性ペースト)が挙げられ、異方導電性材料の形態としては、フィルム状(異方導電性フィルム)及びペースト状(異方導電性ペースト)が挙げられる。 Examples of the conductive material include a film (conductive film) and a paste (conductive paste), and the anisotropic conductive material includes a film (anisotropic conductive film) and a paste ( Anisotropic conductive paste).
導電性材料や異方導電性材料の製造方法としては、例えば、特開平01−113480号公報に記載された方法がある。具体的には、前述の接合用フィルムの製造において、ワニスの調製時に導電性材料や異方導電性材料を混合・分散して、剥離用の基材に塗布後、乾燥することにより製造することができる。 As a method for producing a conductive material or an anisotropic conductive material, for example, there is a method described in JP-A-01-113480. Specifically, in the production of the above-mentioned bonding film, the conductive material and the anisotropic conductive material are mixed and dispersed at the time of preparing the varnish, applied to the substrate for peeling, and then manufactured by drying. Can do.
導電粒子としては、半田粒子、ニッケル粒子、ナノサイズの金属結晶、金属の表面を他の金属で被覆した粒子、銅と銀の傾斜粒子等の金属粒子や、例えば、スチレン樹脂、ウレタン樹脂、メラミン樹脂、エポキシ樹脂、アクリル樹脂、フェノール樹脂、スチレン−ブタジエン樹脂等の樹脂粒子に金、ニッケル、銀、銅、半田等の導電性薄膜で被覆を施した粒子等が使用される。 Examples of the conductive particles include solder particles, nickel particles, nano-sized metal crystals, metal particles coated with other metals, metal particles such as copper and silver inclined particles, styrene resin, urethane resin, melamine, and the like. Particles obtained by coating resin particles such as resin, epoxy resin, acrylic resin, phenol resin, and styrene-butadiene resin with a conductive thin film such as gold, nickel, silver, copper, and solder are used.
一般に導電粒子は、平均粒径1〜20μm程度の球形の微粒子である。フィルムにする場合の基材としては、例えば、ポリエステル、ポリエチレン、ポリイミド、ポリテトラフルオロエチレン等の基材に塗布後、溶剤を乾燥させる方法等がある。 In general, the conductive particles are spherical fine particles having an average particle diameter of about 1 to 20 μm. As a base material in the case of forming a film, for example, there is a method of drying a solvent after coating on a base material such as polyester, polyethylene, polyimide, polytetrafluoroethylene and the like.
絶縁材料としては、絶縁接着フィルム、絶縁接着ペーストがある。前述の接合用フィルムを用いることで、絶縁材料である絶縁接着フィルムを得ることができる。また、封止材料を用いる他、前述の充填剤のうち、絶縁性の充填剤を配合することで、絶縁接着ペーストを得ることができる。 Examples of the insulating material include an insulating adhesive film and an insulating adhesive paste. By using the bonding film described above, an insulating adhesive film that is an insulating material can be obtained. In addition to using a sealing material, an insulating adhesive paste can be obtained by blending an insulating filler among the aforementioned fillers.
本発明を以下に示す実施例により説明するが、本発明はこれらの実施例に限定されるものではない。 The present invention will be described with reference to the following examples, but the present invention is not limited to these examples.
(アミンアダクト粒子(1)の合成)
冷却管、等圧滴下ロート、かくはん装置を備えた3000mlの3口セパラブルフラスコに1−ブタノール及びトルエンを1/1(質量比)で混合した溶液824.2gに2−メチルイミダゾール288gを加え、撹拌しながらオイルバスで80℃に加熱して2−メチルイミダゾールを溶解させた。
(Synthesis of amine adduct particles (1))
Add 288 g of 2-methylimidazole to 824.2 g of 1-butanol and toluene mixed at a 1/1 (mass ratio) in a 3000 ml three-necked separable flask equipped with a condenser, isostatic dropping funnel and stirring device, While stirring, the mixture was heated to 80 ° C. in an oil bath to dissolve 2-methylimidazole.
次いで、1−ブタノール及びトルエン1/1(質量比)溶液300gにビスフェノールA型エポキシ樹脂(エポキシ当量173g/eq、加水分解塩素量0.01質量%)946g溶解させた溶液を等圧滴下ロートを用いて90分間で滴下した。滴下終了後、80℃で5時間加熱した。 Next, a solution prepared by dissolving 946 g of bisphenol A type epoxy resin (epoxy equivalent 173 g / eq, hydrolyzed chlorine content 0.01 mass%) in 300 g of 1-butanol and toluene 1/1 (mass ratio) solution was added with an isobaric dropping funnel. Used and dropped in 90 minutes. After completion of dropping, the mixture was heated at 80 ° C. for 5 hours.
その後、180℃まで昇温し溶媒を留去した。温度を180℃に保ち、装置内を最終的に圧力が10mmHg以下になるまで減圧し、溶媒を留去した。圧力が10mmHg以下になってから、更に2時間減圧下で加熱溶媒留去を行い暗赤褐色の粘調液体を得た。この粘調液体を室温(25℃)まで冷却して暗赤褐色の固体状アミンアダクト(1)を得た。このアミンアダクト(1)をジェットミルで粉砕し、平均粒子径1.96μmのアミンアダクト粒子(1)を得た。 Then, it heated up to 180 degreeC and distilled the solvent off. The temperature was kept at 180 ° C., the inside of the apparatus was depressurized until the pressure finally reached 10 mmHg or less, and the solvent was distilled off. After the pressure became 10 mmHg or less, the heated solvent was distilled off under reduced pressure for 2 hours to obtain a dark red-brown viscous liquid. The viscous liquid was cooled to room temperature (25 ° C.) to obtain a dark reddish brown solid amine adduct (1). The amine adduct (1) was pulverized with a jet mill to obtain amine adduct particles (1) having an average particle size of 1.96 μm.
(アミンアダクト粒子(2)の合成)
ビスフェノールA型エポキシ樹脂をビスフェノールF型エポキシ樹脂(エポキシ当量160g/eq、加水分解塩素量0.007質量%)874gに変更した以外は、上記アミンアダクト粒子(1)の合成と同様の方法で合成を行い、平均粒子径1.88μmのアミンアダクト粒子(2)を得た。
(Synthesis of amine adduct particles (2))
Synthesized in the same manner as the synthesis of amine adduct particle (1) except that bisphenol A type epoxy resin was changed to 874 g of bisphenol F type epoxy resin (epoxy equivalent 160 g / eq, hydrolyzed chlorine amount 0.007% by mass). To obtain amine adduct particles (2) having an average particle size of 1.88 μm.
なお、アミンアダクト粒子(1),(2)の平均粒径は、Malvern社製のレーザー回折式粒度分布測定装置(マスターサイザー2000:乾式測定ユニットScirocco2000)を用いて3回測定を行い、50%径(メディアン径)の平均値を平均粒径とした。 The average particle size of the amine adduct particles (1) and (2) was measured three times using a laser diffraction particle size distribution analyzer (Mastersizer 2000: dry measurement unit Scirocco 2000) manufactured by Malvern, and was 50% The average value of the diameter (median diameter) was defined as the average particle diameter.
(実施例1)(マイクロカプセル型潜在性硬化剤(F1))
冷却管、熱電対、撹拌装置を備えた3口セパラブルフラスコにアミンアダクト粒子(1)45.0gとヘキサン170.0gとを加え、40℃に加熱した後、水1.2gを加えた。10分間かくはんした後、4,4’−ジフェニルメタンジイソシアネート3.0g、YL−980(ジャパンエポキシレジン(株)社製;ビスフェノールA型エポキシ樹脂;エポキシ当量185g/eq)12.0gを加えて40℃で2時間反応させた。
Example 1 (Microcapsule type latent curing agent (F1))
45.0 g of amine adduct particles (1) and 170.0 g of hexane were added to a three-neck separable flask equipped with a condenser, a thermocouple, and a stirrer, heated to 40 ° C., and then 1.2 g of water was added. After stirring for 10 minutes, 3.0 g of 4,4′-diphenylmethane diisocyanate and YL-980 (manufactured by Japan Epoxy Resin Co., Ltd .; bisphenol A type epoxy resin; epoxy equivalent 185 g / eq) 12.0 g were added and 40 ° C. For 2 hours.
次いで、50℃に昇温して8時間反応させた。反応終了後、分散液をろ過、シクロヘキサンで洗浄した。得られた粉末を10mmHg以下の圧力で24時間減圧乾燥し、溶媒を除去しマイクロカプセル型潜在性硬化剤(F1)を得た。 Subsequently, it heated up at 50 degreeC and made it react for 8 hours. After completion of the reaction, the dispersion was filtered and washed with cyclohexane. The obtained powder was dried under reduced pressure for 24 hours at a pressure of 10 mmHg or less, and the solvent was removed to obtain a microcapsule-type latent curing agent (F1).
(実施例2)(マイクロカプセル型潜在性硬化剤(F2))
冷却管、熱電対、かくはん装置を備えた500mlの3口セパラブルフラスコにアミンアダクト粒子(2)45.0gとシクロヘキサン120.0gとを加え、40℃に加熱した後、水0.2gを加えた。次いで、MR−200(日本ポリウレタン工業(株)社製;ポリメチレンポリフェニレンポリイソシアネート)3.0gと、YL−983U(ジャパンエポキシレジン(株)社製;ビスフェノールF型エポキシ樹脂;エポキシ当量170g/eq)18.0gとを加えて40℃で4時間反応させた。
Example 2 (Microcapsule type latent curing agent (F2))
Add 45.0 g of amine adduct particles (2) and 120.0 g of cyclohexane to a 500 ml three-necked separable flask equipped with a condenser, thermocouple, and stirrer, heat to 40 ° C, and then add 0.2 g of water. It was. Next, 3.0 g of MR-200 (manufactured by Nippon Polyurethane Industry Co., Ltd .; polymethylene polyphenylene polyisocyanate) and YL-983U (manufactured by Japan Epoxy Resin Co., Ltd .; bisphenol F type epoxy resin; epoxy equivalent 170 g / eq) 18.0 g was added and reacted at 40 ° C. for 4 hours.
更に50℃に昇温して8時間反応させた。反応終了後、分散液をろ過し、50℃に加熱したシクロヘキサンで洗浄した。得られた粉末を10mmHg以下の圧力で24時間減圧乾燥し、溶媒を除去しマイクロカプセル型潜在性硬化剤(F2)を得た。 Further, the temperature was raised to 50 ° C. and reacted for 8 hours. After completion of the reaction, the dispersion was filtered and washed with cyclohexane heated to 50 ° C. The obtained powder was dried under reduced pressure for 24 hours at a pressure of 10 mmHg or less, and the solvent was removed to obtain a microcapsule-type latent curing agent (F2).
(実施例3)(マイクロカプセル型潜在性硬化剤(F3))
冷却管、熱電対、かくはん装置を備えた500mlの3口セパラブルフラスコにアミンアダクト粒子(1)45.0gとシクロヘキサン170.0gとを加え、40℃に加熱した。次いで、4,4’−ジフェニルメタンジイソシアネート2.0gと、YDF−8170C(東都化成(株)社製;ビスフェノールF型エポキシ樹脂、エポキシ当量160g/eq)8.5gとを加え40℃で2時間加熱した。
Example 3 (Microcapsule type latent curing agent (F3))
45.0 g of amine adduct particles (1) and 170.0 g of cyclohexane were added to a 500 ml three-necked separable flask equipped with a condenser, a thermocouple, and a stirring device, and heated to 40 ° C. Next, 2.0 g of 4,4′-diphenylmethane diisocyanate and 8.5 g of YDF-8170C (manufactured by Toto Kasei Co., Ltd .; bisphenol F type epoxy resin, epoxy equivalent 160 g / eq) were added and heated at 40 ° C. for 2 hours. did.
更に50℃に昇温して6時間反応させた。反応終了後、分散液をろ過、50℃に加熱したトルエンで洗浄した。得られた粉末を10mmHg以下の圧力で48時間減圧乾燥し、溶媒を除去しマイクロカプセル型潜在性硬化剤(F3)を得た。 Further, the temperature was raised to 50 ° C. and reacted for 6 hours. After completion of the reaction, the dispersion was filtered and washed with toluene heated to 50 ° C. The obtained powder was dried under reduced pressure for 48 hours at a pressure of 10 mmHg or less, and the solvent was removed to obtain a microcapsule-type latent curing agent (F3).
(実施例4)(マイクロカプセル型潜在性硬化剤(F4):マイクロカプセル型潜在性硬化剤(F1)の再カプセル化)
冷却管、熱電対、かくはん装置を備えた500mlの3口セパラブルフラスコにトルエン146.3gと4,4’−ジフェニルメタンジイソシアネート2.5gとを加え、オイルバスで50℃に加熱した。
(Example 4) (Microcapsule type latent curing agent (F4): Re-encapsulation of microcapsule type latent curing agent (F1))
To a 500 ml three-necked separable flask equipped with a condenser, a thermocouple, and a stirrer, 146.3 g of toluene and 2.5 g of 4,4′-diphenylmethane diisocyanate were added and heated to 50 ° C. in an oil bath.
次いで、マイクロカプセル型潜在性硬化剤(F1)を15.0g加え、50℃で3時間反応させた。反応終了後、分散液をろ過、50℃に加熱したトルエンで洗浄した。得られた粉末を10mmHg以下の圧力で24時間減圧乾燥し、溶媒を除去しマイクロカプセル型潜在性硬化剤(F4)を得た。 Next, 15.0 g of a microcapsule type latent curing agent (F1) was added and reacted at 50 ° C. for 3 hours. After completion of the reaction, the dispersion was filtered and washed with toluene heated to 50 ° C. The obtained powder was dried under reduced pressure for 24 hours at a pressure of 10 mmHg or less, and the solvent was removed to obtain a microcapsule-type latent curing agent (F4).
(比較例1)(マイクロカプセル型潜在性硬化剤(F5)
冷却管、熱電対、撹拌装置を備えた3口セパラブルフラスコにアミンアダクト粒子(1)45.0gとシクロヘキサン171.0gとを加え、40℃に加熱した。その後4,4’−ジフェニルメタンジイソシアネート3.0gを加えて40℃で2時間反応させた。次いで、50℃に昇温して6時間反応させた。反応終了後、分散液をろ過、50℃に加熱したシクロヘキサンで洗浄した。得られた粉末を10mmHg以下の圧力で24時間減圧乾燥し、溶媒を除去しマイクロカプセル型潜在性硬化剤(F5)を得た。
(Comparative Example 1) (Microcapsule type latent curing agent (F5)
45.0 g of amine adduct particles (1) and 171.0 g of cyclohexane were added to a three-necked separable flask equipped with a condenser, a thermocouple, and a stirrer, and heated to 40 ° C. Thereafter, 3.0 g of 4,4′-diphenylmethane diisocyanate was added and reacted at 40 ° C. for 2 hours. Subsequently, it heated up at 50 degreeC and made it react for 6 hours. After completion of the reaction, the dispersion was filtered and washed with cyclohexane heated to 50 ° C. The obtained powder was dried under reduced pressure for 24 hours at a pressure of 10 mmHg or less, and the solvent was removed to obtain a microcapsule-type latent curing agent (F5).
(実施例5〜7)(一液性エポキシ樹脂組成物(N1)〜(N3))
実施例1〜3で合成したマイクロカプセル型潜在性硬化剤(F1)〜(F3)33gに、ビスフェノールF型エポキシ樹脂(東都化成株式会社製、商品名:エポトートYDF−8170C、エポキシ当量160g/eq、加水分解塩素量0.007質量%)67gを配合し、一液性エポキシ樹脂組成物(N1)〜(N3)を得た。
(Examples 5 to 7) (One-part epoxy resin compositions (N1) to (N3))
To 33 g of the microcapsule type latent curing agents (F1) to (F3) synthesized in Examples 1 to 3, bisphenol F type epoxy resin (manufactured by Toto Kasei Co., Ltd., trade name: Epototo YDF-8170C, epoxy equivalent 160 g / eq) The amount of hydrolyzed chlorine (0.007% by mass) was mixed with 67 g to obtain one-pack epoxy resin compositions (N1) to (N3).
(実施例8)(一液性エポキシ樹脂組成物(N4))
実施例4で合成したマイクロカプセル型潜在性硬化剤(F4)33gに、ビスフェノールA型エポキシ樹脂(東都化成株式会社製、商品名:エポトートYD−8125、エポキシ当量173g/eq、加水分解塩素量0.01質量%)67gを配合し、一液性エポキシ樹脂組成物(N4)を得た。
(Example 8) (One-part epoxy resin composition (N4))
To 33 g of the microcapsule type latent curing agent (F4) synthesized in Example 4, bisphenol A type epoxy resin (manufactured by Toto Kasei Co., Ltd., trade name: Epototo YD-8125, epoxy equivalent 173 g / eq, amount of hydrolyzed chlorine 0 0.01 mass%) 67 g was blended to obtain a one-part epoxy resin composition (N4).
(実施例9)(一液性エポキシ樹脂組成物(N5))
マイクロカプセル型潜在性硬化剤(F3)45gに、ビスフェノールF型エポキシ樹脂(エポキシ当量160g/eq、加水分解塩素量0.007質量%)55gを配合し、一液性エポキシ樹脂組成物(N5)を得た。
(Example 9) (One-part epoxy resin composition (N5))
One-part epoxy resin composition (N5) containing 45 g of bisphenol F-type epoxy resin (epoxy equivalent 160 g / eq, amount of hydrolyzed chlorine 0.007% by mass) in 45 g of microcapsule type latent curing agent (F3) Got.
(実施例10)(一液性エポキシ樹脂組成物(N6))
マイクロカプセル型潜在性硬化剤(F3)35gに、ビスフェノールF型エポキシ樹脂(エポキシ当量160g/eq、加水分解塩素量0.007質量%)25g、レゾルシンジグリシジルエーテル(エポキシ当量117g/eq、加水分解塩素量0.7質量%)を40g配合し、一液性エポキシ樹脂組成物(N6)を得た。
(Example 10) (One-part epoxy resin composition (N6))
35 g of microcapsule type latent curing agent (F3), 25 g of bisphenol F type epoxy resin (epoxy equivalent 160 g / eq, hydrolyzed chlorine amount 0.007% by mass), resorcin diglycidyl ether (epoxy equivalent 117 g / eq, hydrolyzed) 40 g of chlorine amount 0.7 mass%) was blended to obtain a one-part epoxy resin composition (N6).
(実施例11)(一液性エポキシ樹脂組成物(N7))
冷却管、熱電対、かくはん装置を備えた3口セパラブルフラスコに実施例1で作製したマイクロカプセル型潜在性硬化剤(F1)を33g加え、ビスフェノールF型エポキシ樹脂(エポキシ当量160g/eq、加水分解塩素量0.007質量%)を67g加え、50℃で24時間撹拌し、一液性エポキシ樹脂組成物(N7)を得た。
(Example 11) (One-part epoxy resin composition (N7))
33 g of the microcapsule type latent curing agent (F1) prepared in Example 1 was added to a three-necked separable flask equipped with a condenser, a thermocouple, and a stirring device, and bisphenol F type epoxy resin (epoxy equivalent 160 g / eq, water added) 67 g of decomposed chlorine (0.007% by mass) was added and stirred at 50 ° C. for 24 hours to obtain a one-part epoxy resin composition (N7).
(実施例12)(一液性エポキシ樹脂組成物(N8))
マイクロカプセル型潜在性硬化剤(F1)の代わりに、マイクロカプセル型潜在性硬化剤(F2)を用いた以外は、実施例11と同様の方法で、一液性エポキシ樹脂組成物(N8)を得た。
(Example 12) (One-part epoxy resin composition (N8))
A one-part epoxy resin composition (N8) was prepared in the same manner as in Example 11 except that the microcapsule type latent curing agent (F2) was used instead of the microcapsule type latent curing agent (F1). Obtained.
(比較例2)(一液性エポキシ樹脂組成物(N9))
比較例1で合成したマイクロカプセル型潜在性硬化剤(F5)33gに、ビスフェノールF型エポキシ樹脂(エポキシ当量160g/eq、加水分解塩素量0.007質量%)67gを配合し、一液性エポキシ樹脂組成物(N9)を得た。
(Comparative Example 2) (One-part epoxy resin composition (N9))
A bisphenol F-type epoxy resin (epoxy equivalent 160 g / eq, hydrolyzed chlorine content 0.007 mass%) 67 g is blended with 33 g of the microcapsule-type latent curing agent (F5) synthesized in Comparative Example 1 to produce a one-part epoxy. A resin composition (N9) was obtained.
(比較例3)
冷却管、熱電対、撹拌装置を備えた3口セパラブルフラスコにアミンアダクト粒子(1)33gとビスフェノールF型エポキシ樹脂(油化シェルエポキシ株式会社製、商品名:YL−983U、エポキシ当量170g/eq)67gとを加え、40℃に加熱した後、水0.5gを加えた。10分間かくはんした後、4,4’−ジフェニルメタンジイソシアネート4.0gを加えて40℃で2時間加熱した。次いで50℃に昇温して6時間加熱したところ、フラスコ中で硬化反応が進行し、一液性エポキシ樹脂組成物(N10)が得られなかった。
(Comparative Example 3)
A three-neck separable flask equipped with a condenser, thermocouple, and stirrer was charged with 33 g of amine adduct particles (1) and bisphenol F type epoxy resin (manufactured by Yuka Shell Epoxy Co., Ltd., trade name: YL-983U, epoxy equivalent 170 g / eq) 67 g was added and heated to 40 ° C., and then 0.5 g of water was added. After stirring for 10 minutes, 4.0 g of 4,4′-diphenylmethane diisocyanate was added and heated at 40 ° C. for 2 hours. Subsequently, when heated up to 50 degreeC and heated for 6 hours, hardening reaction advanced in the flask and the one-pack epoxy resin composition (N10) was not obtained.
(比較例4)
冷却管、熱電対、撹拌装置を備えた3口セパラブルフラスコにアミンアダクト粒子(1)45gとビスフェノールA型エポキシ樹脂(油化シェルエポキシ株式会社製、商品名:YL−980、エポキシ当量185g/eq)55gとを加え、40℃に加熱した後、水0.5gを加えた。10分間かくはんした後、4,4’−ジフェニルメタンジイソシアネート4.0gを加えて40℃で2時間加熱した。次いで50℃に昇温して6時間加熱したところ、フラスコ中で硬化反応が進行し、一液性エポキシ樹脂組成物(N11)が得られなかった。
(Comparative Example 4)
A three-necked separable flask equipped with a condenser, a thermocouple, and a stirrer was charged with 45 g of amine adduct particles (1) and bisphenol A type epoxy resin (manufactured by Yuka Shell Epoxy Co., Ltd., trade name: YL-980, epoxy equivalent of 185 g / eq) 55 g was added and heated to 40 ° C., and then 0.5 g of water was added. After stirring for 10 minutes, 4.0 g of 4,4′-diphenylmethane diisocyanate was added and heated at 40 ° C. for 2 hours. Next, when the temperature was raised to 50 ° C. and heated for 6 hours, the curing reaction proceeded in the flask, and the one-part epoxy resin composition (N11) could not be obtained.
(エポキシ樹脂用潜在性硬化剤硬化剤としての特性評価)
実施例5〜12及び比較例2において作製した、一液性エポキシ樹脂組成物(N1)〜(N9)の硬化特性、貯蔵安定性及び耐溶剤性を以下に示す方法で評価した。評価結果を表1,2にまとめた。
(Characteristic evaluation as a latent curing agent curing agent for epoxy resin)
The curing characteristics, storage stability and solvent resistance of the one-component epoxy resin compositions (N1) to (N9) prepared in Examples 5 to 12 and Comparative Example 2 were evaluated by the methods shown below. The evaluation results are summarized in Tables 1 and 2.
(硬化特性)
一液性エポキシ樹脂組成物について、Perkin−Elmer社製DSC7示差熱量計を用い、昇温速度10℃/min、測定温度範囲30℃〜300℃、窒素雰囲気で硬化特性を測定した。硬化発熱に由来するピークの極大点の温度が110℃未満ならば「AA」、110℃以上125℃未満ならば「A」、125℃以上135℃未満ならば「B」、135℃以上ならば「C」とした。
(Curing properties)
The curing characteristics of the one-component epoxy resin composition were measured using a DSC7 differential calorimeter manufactured by Perkin-Elmer Co., Ltd., at a heating rate of 10 ° C./min, a measurement temperature range of 30 ° C. to 300 ° C., and a nitrogen atmosphere. “AA” if the temperature at the peak maximum point derived from the heat generated by curing is less than 110 ° C., “A” if it is 110 ° C. or more and less than 125 ° C., “B” if it is 125 ° C. or more and less than 135 ° C., and if it is 135 ° C. or more. “C”.
(貯蔵安定性)
一液性エポキシ樹脂組成物を40℃恒温槽中で保管し、初期及び10日後における一液性エポキシ樹脂組成物の25℃での粘度をE型粘度計を用いて測定した。10日後の初期からの粘度増加率により貯蔵安定性を判断した。粘度測定は、3°(角度)のコーンを用い、粘度が3〜40Pa・sのときは10rpm、粘度が40〜200Pa・sのときは2.5rpm、200〜1000Pa・sのときは0.5rpmの回転数で行った。10日後の粘度増加率が25%以下であれば「AA」、25%超50%以下であれば「A」、50%超100%未満であれば「B」、100%以上であれば「C」とした。
(Storage stability)
The one-part epoxy resin composition was stored in a constant temperature bath at 40 ° C., and the viscosity at 25 ° C. of the one-part epoxy resin composition at the initial stage and after 10 days was measured using an E-type viscometer. Storage stability was judged by the rate of increase in viscosity from the beginning after 10 days. Viscosity is measured using a 3 ° (angle) cone, 10 rpm when the viscosity is 3 to 40 Pa · s, 2.5 rpm when the viscosity is 40 to 200 Pa · s, and 0. The rotation was performed at 5 rpm. “AA” when the rate of increase in viscosity after 10 days is 25% or less, “A” if it is more than 25% and 50% or less, “B” if it is more than 50% and less than 100%, and “A” if it is 100% or more. C ”.
(耐溶媒性)
溶媒としてトルエン/酢酸エチル=1/1(質量比)を用い、一液性エポキシ樹脂組成物/溶媒=15g/3.5gの混合物を40℃の水浴中で保持し、そのときの混合物の粘度変化を観察した。流動性が無くなった時間が3時間未満であれば「C」、3時間以上6時間未満であれば「B」、6時間以上10時間未満であれば「A」、10時間以上であれば「AA」とした。
(Solvent resistance)
Using toluene / ethyl acetate = 1/1 (mass ratio) as a solvent, a one-component epoxy resin composition / solvent = 15 g / 3.5 g mixture was kept in a 40 ° C. water bath, and the viscosity of the mixture at that time Changes were observed. “C” if the fluidity is lost for less than 3 hours, “B” if it is 3 hours or more and less than 6 hours, “A” if it is 6 hours or more and less than 10 hours, “A” if it is 10 hours or more, AA ".
なお、表1,2中の「BisA1」、「BisA2」、「BisF1」、「BisF2」及び「Res」は下記の物質を示す。
BisA1:ビスフェノールA型エポキシ樹脂(エポキシ当量173g/eq、加水分解塩素量0.01質量%)
BisA2:ビスフェノールA型エポキシ樹脂(エポキシ当量185g/eq)
BisF1:ビスフェノールF型エポキシ樹脂(エポキシ当量160g/eq、加水分解塩素量0.007質量%)
BisF2:ビスフェノールF型エポキシ樹脂(エポキシ当量170g/eq)
Res:レゾルシンジグリシジルエーテル(エポキシ当量117g/eq、加水分解塩素量0.7質量%)
In Tables 1 and 2, “BisA1”, “BisA2”, “BisF1”, “BisF2”, and “Res” indicate the following substances.
BisA1: bisphenol A type epoxy resin (epoxy equivalent 173 g / eq, hydrolyzed chlorine content 0.01% by mass)
BisA2: bisphenol A type epoxy resin (epoxy equivalent 185 g / eq)
BisF1: Bisphenol F type epoxy resin (epoxy equivalent 160 g / eq, amount of hydrolyzed chlorine 0.007% by mass)
BisF2: Bisphenol F type epoxy resin (epoxy equivalent 170 g / eq)
Res: Resorcin diglycidyl ether (epoxy equivalent 117 g / eq, amount of hydrolyzed chlorine 0.7 mass%)
(実施例13)(導電性ペーストの作製・評価)
100質量部のエポキシ樹脂(大日本インキ株式会社製、商品名:N−730S)に、実施例5で得られた一液性エポキシ樹脂組成物(N1)を30質量部と、平均粒子径が2.1μmの銀粉(三井金属鉱業株式会社製、商品名:SPN10JF)200質量部とを添加し、均一になるまで撹拌後、三本ロールで均一に分散して導電ペーストとした。
(Example 13) (Production and evaluation of conductive paste)
100 parts by mass of epoxy resin (Dainippon Ink Co., Ltd., trade name: N-730S), 30 parts by mass of the one-component epoxy resin composition (N1) obtained in Example 5 and an average particle size. 200 parts by mass of 2.1 μm silver powder (manufactured by Mitsui Kinzoku Mining Co., Ltd., trade name: SPN10JF) was added, stirred until uniform, and then uniformly dispersed with three rolls to obtain a conductive paste.
得られた導電ペーストを、厚さ1.4mmのポリイミドフィルム基板上にスクリーン印刷した後、200℃で1時間、加熱硬化させた。得られた配線板の導電性を測定した結果、導電性ペーストとして有用なものであった。 The obtained conductive paste was screen-printed on a polyimide film substrate having a thickness of 1.4 mm, and then heat-cured at 200 ° C. for 1 hour. As a result of measuring the conductivity of the obtained wiring board, it was useful as a conductive paste.
(実施例14)(導電性フィルムの作製・評価)
ポリマーとして、フェノキシ樹脂(東都化成製、商品名:YP−50)/トルエン/酢酸エチルの質量比が40/30/30である溶液100質量部と、エポキシ樹脂(大日本インキ株式会社製、商品名:HP−4032)20質量部と、一液性エポキシ樹脂組成物(N2)を40質量部と、導電性粒子としてNi/Auめっきポリスチレン粒子(平均粒径4μm)10質量部と、その他にシランカップリング剤(商品名:SZ6030、東レ・ダウコーニング・シリコーン株式会社製)10質量部とを混合し導電性接着剤組成物を調製した。
(Example 14) (Production and evaluation of conductive film)
As a polymer, 100 parts by mass of a solution having a mass ratio of phenoxy resin (manufactured by Toto Kasei, trade name: YP-50) / toluene / ethyl acetate of 40/30/30, and epoxy resin (produced by Dainippon Ink Co., Ltd. Name: HP-4032) 20 parts by mass, 40 parts by mass of one-part epoxy resin composition (N2), 10 parts by mass of Ni / Au plated polystyrene particles (average particle size 4 μm) as conductive particles, and A conductive adhesive composition was prepared by mixing 10 parts by mass of a silane coupling agent (trade name: SZ6030, manufactured by Toray Dow Corning Silicone Co., Ltd.).
得られた導電性接着剤組成物を用いて、厚さ40μmのポリプロピレンフィルム上にキャストして、80℃で60分間、乾燥半硬化させ厚さ35μmの導電性接着剤層を有する導電性フィルムを得た。この導電性フィルムを用い、80℃のヒートブロック上でシリコンウェハー裏面に導電性フィルムの導電性接着剤層を転写させた。 A conductive film having a conductive adhesive layer having a thickness of 35 μm, cast on a polypropylene film having a thickness of 40 μm using the obtained conductive adhesive composition, dried and semi-cured for 60 minutes at 80 ° C. Obtained. Using this conductive film, the conductive adhesive layer of the conductive film was transferred to the back surface of the silicon wafer on a heat block at 80 ° C.
更にシリコンウェハーをフルダイシングし、ヒートブロック上で200℃、2分間の条件で導電性接着剤付半導体チップをリードフレームに接着硬化させたところ、チップの導電性の問題がなかった。 Further, when the silicon wafer was fully diced and the semiconductor chip with a conductive adhesive was bonded and cured on the lead frame under the conditions of 200 ° C. and 2 minutes on the heat block, there was no problem of chip conductivity.
(実施例15)(異方導電性フィルムの作製・評価)
エポキシ樹脂としてEP1009(ジャパンエポキシレジン社製、商品名)20質量部、一液性エポキシ樹脂組成物(N2)50質量部、平均粒径8μmの導電粒子(金メッキを施した架橋ポリスチレン)5質量部に酢酸エチル(和光純薬製、試薬特級)30質量部を加えて溶かし、接着剤ワニスを得た。
Example 15 (Production / Evaluation of Anisotropic Conductive Film)
As an epoxy resin, 20 parts by mass of EP1009 (trade name, manufactured by Japan Epoxy Resin Co., Ltd.), 50 parts by mass of a one-part epoxy resin composition (N2), 5 parts by mass of conductive particles (cross-linked polystyrene plated with gold) having an average particle size of 8 μm 30 parts by mass of ethyl acetate (manufactured by Wako Pure Chemicals, reagent grade) was added and dissolved to obtain an adhesive varnish.
この接着剤ワニスを、離型処理した50μmの二軸延伸ポリエチレンテレフタレート樹脂フィルム製のセパレータ上に流延し、次いで酢酸エチルを除去するために乾燥して、平均厚さ20μmの生乾きの異方導電性接着フィルムを得た。 This adhesive varnish is cast on a separator made of a 50 μm biaxially stretched polyethylene terephthalate resin film which has been subjected to a mold release treatment, and then dried to remove ethyl acetate, so that it has an average thickness of 20 μm. Adhesive film was obtained.
ITO(Indium Tin Oxide)ガラス基板に、上記異方導電性接着フィルムを100℃、2kg/cm2で5秒間の加熱加圧により貼り付けた。セパレータを剥がした後、50μm×90μmの金バンプを有するベアチップを位置合わせして、200℃、30kg/cm2で20秒間加熱加圧して回路接続したところ、電極間が接合して良好に導通しており、異方導電性材料として有用であった。 The anisotropic conductive adhesive film was attached to an ITO (Indium Tin Oxide) glass substrate by heating and pressing at 100 ° C. and 2 kg / cm 2 for 5 seconds. After peeling off the separator, a bare chip having 50 μm × 90 μm gold bumps was aligned and heated and pressed at 200 ° C. and 30 kg / cm 2 for 20 seconds to connect the circuits. It was useful as an anisotropic conductive material.
(実施例16)(異方導電性ペーストの作製・評価)
ビスフェノールA型エポキシ樹脂(旭化成ケミカルズ製、商品名:AER6091、エポキシ当量480g/eq)50質量部と、ビスフェノールA型エポキシ樹脂(旭化成ケミカルズ製、商品名:AER2603)50質量部と、導電粒子としてのミクロパールAu−205(積水化学製、比重2.67)5質量部とを混合後、実施例2で得られたマイクロカプセル型潜在性硬化剤(F2)を30質量部加えて、更に均一に混合させて、異方導電性ペーストを得た。
Example 16 (Production and Evaluation of Anisotropic Conductive Paste)
50 parts by mass of a bisphenol A type epoxy resin (manufactured by Asahi Kasei Chemicals, trade name: AER6091, epoxy equivalent 480 g / eq), 50 parts by mass of a bisphenol A type epoxy resin (manufactured by Asahi Kasei Chemicals, trade name: AER2603), and conductive particles After mixing with 5 parts by mass of Micropearl Au-205 (manufactured by Sekisui Chemical Co., Ltd., 2.67 specific gravity), 30 parts by mass of the microcapsule-type latent curing agent (F2) obtained in Example 2 was added to make it even more uniform. An anisotropic conductive paste was obtained by mixing.
得られた異方導電性ペーストを、ITO電極を有する低アルカリガラス上に塗布した。230℃のセラミックツールで、30秒間、2MPaの圧力にて試験用TAB(Tape Automated Bonding)フィルムと圧着し貼り合わせを行った。隣接するITO電極間の抵抗値を測定したところ、良好な抵抗値が得られ異方導電性ペーストとして有用であった。 The obtained anisotropic conductive paste was applied on a low alkali glass having an ITO electrode. A ceramic tool at 230 ° C. was pressed and bonded to a test TAB (Tape Automated Bonding) film at a pressure of 2 MPa for 30 seconds. When the resistance value between adjacent ITO electrodes was measured, a good resistance value was obtained, which was useful as an anisotropic conductive paste.
本発明によれば、低温硬化性と極めて高い貯蔵安定性とを両立し、更に電気特性、機械的強度、耐熱性、耐湿性等の性能もバランス良く有する硬化物を与えるエポキシ樹脂組成物が得られる。本発明のマイクロカプセル型潜在性硬化剤を用いたエポキシ樹脂組成物は、接着剤、封止材、充填材、絶縁材料、導電材料、プリプレグ、フィルム状接着剤、異方導電性フィルム、異方導電性ペースト、絶縁接着フィルム、絶縁接着ペースト、アンダーフィル材、ポッティング材、ダイボンディング材、導電ペースト、ソルダーレジスト等として優れた性能を発揮する。 According to the present invention, an epoxy resin composition is obtained that provides a cured product that has both low-temperature curability and extremely high storage stability, and also has well-balanced properties such as electrical properties, mechanical strength, heat resistance, and moisture resistance. It is done. The epoxy resin composition using the microcapsule-type latent curing agent of the present invention includes an adhesive, a sealing material, a filler, an insulating material, a conductive material, a prepreg, a film-like adhesive, an anisotropic conductive film, and an anisotropic Excellent performance as conductive paste, insulating adhesive film, insulating adhesive paste, underfill material, potting material, die bonding material, conductive paste, solder resist, etc.
Claims (17)
当該コア(B)を覆うように設けられており、前記化合物(A)と反応する官能基を有する化合物(L)、及び、イソシアネート化合物(C)を含むカプセルと、
を有する、エポキシ樹脂用マイクロカプセル型潜在性硬化剤。 A core (B) containing a compound (A) having an active hydrogen group as a main component;
A capsule containing a compound (L) having a functional group that reacts with the compound (A) and an isocyanate compound (C), which is provided so as to cover the core (B);
A microcapsule-type latent curing agent for epoxy resin, comprising:
1気圧での沸点が150℃以下であり、かつ粘度が25℃で1000mPa・s以下である分散媒(H)中で、前記コア(B)中の化合物(A)と、前記イソシアネート化合物(C)と、前記化合物(L)とを反応させることにより、前記コア(B)を被覆する前記カプセルを形成する工程と、
前記カプセルを形成した後に前記分散媒(H)を除去する工程と、を含む、エポキシ樹脂用マイクロカプセル型潜在性硬化剤の製造方法。 It is a manufacturing method of the microcapsule type latent hardening agent for epoxy resins according to any one of claims 1 to 5,
In a dispersion medium (H) having a boiling point at 1 atm of 150 ° C. or less and a viscosity of 1000 mPa · s or less at 25 ° C., the compound (A) in the core (B) and the isocyanate compound (C And the compound (L) to form the capsule covering the core (B),
And a step of removing the dispersion medium (H) after forming the capsule. The method for producing a microcapsule type latent curing agent for epoxy resin.
前記エポキシ樹脂(I)100質量部に対する前記硬化剤(M)の含有量が1〜200質量部であり、
前記エポキシ樹脂(I)100質量部に対する前記エポキシ樹脂用マイクロカプセル型潜在性硬化剤の含有量が0.1〜200質量部である、一液性エポキシ樹脂組成物。 The microcapsule type latent curing agent for epoxy resin according to any one of claims 1 to 5, selected from the group consisting of epoxy resin (I), acid anhydrides, phenols, hydrazides and guanidines. Containing at least one curing agent (M),
Content of the said hardening | curing agent (M) with respect to 100 mass parts of said epoxy resins (I) is 1-200 mass parts,
The one-pack type epoxy resin composition whose content of the said microcapsule-type latent hardening | curing agent for epoxy resins with respect to 100 mass parts of said epoxy resins (I) is 0.1-200 mass parts.
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| JP2011178840A (en) * | 2010-02-26 | 2011-09-15 | Hitachi Chem Co Ltd | Adhesive composition, adhesive sheet for connection of circuit member and method for manufacturing semiconductor device |
| JP2011195767A (en) * | 2010-03-23 | 2011-10-06 | Asahi Kasei E-Materials Corp | Masterbatch type curing agent for epoxy resin |
| JP2011231143A (en) * | 2010-04-23 | 2011-11-17 | Asahi Kasei E-Materials Corp | Anisotropically electroconductive adhesive film and connection method |
| WO2012067270A1 (en) | 2010-11-19 | 2012-05-24 | Henkel Japan Ltd. | One component epoxy resin composition |
| KR20130138251A (en) * | 2010-11-05 | 2013-12-18 | 헨켈 아일랜드 리미티드 | Epoxy-thiol compositions with improved stability |
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| JP2011178840A (en) * | 2010-02-26 | 2011-09-15 | Hitachi Chem Co Ltd | Adhesive composition, adhesive sheet for connection of circuit member and method for manufacturing semiconductor device |
| JP2011195767A (en) * | 2010-03-23 | 2011-10-06 | Asahi Kasei E-Materials Corp | Masterbatch type curing agent for epoxy resin |
| JP2011231143A (en) * | 2010-04-23 | 2011-11-17 | Asahi Kasei E-Materials Corp | Anisotropically electroconductive adhesive film and connection method |
| JP2014500895A (en) * | 2010-11-05 | 2014-01-16 | ヘンケル アイルランド リミテッド | Epoxy-thiol composition with improved stability |
| KR20130138251A (en) * | 2010-11-05 | 2013-12-18 | 헨켈 아일랜드 리미티드 | Epoxy-thiol compositions with improved stability |
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| WO2012067270A1 (en) | 2010-11-19 | 2012-05-24 | Henkel Japan Ltd. | One component epoxy resin composition |
| US9303192B2 (en) | 2012-07-05 | 2016-04-05 | Three Bond Fine Chemical Co., Ltd. | Sheet-like adhesive and organic EL panel using the same |
| JPWO2014007219A1 (en) * | 2012-07-05 | 2016-06-02 | スリーボンドファインケミカル株式会社 | Sheet adhesive and organic EL panel using the same |
| WO2014007219A1 (en) * | 2012-07-05 | 2014-01-09 | 株式会社スリーボンド | Sheet adhesive and organic el panel using same |
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