JP2010045147A - モード同期レーザ装置、パルスレーザ光源装置、及び顕微鏡装置 - Google Patents
モード同期レーザ装置、パルスレーザ光源装置、及び顕微鏡装置 Download PDFInfo
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Abstract
【解決手段】モード同期レーザ装置10は、励起光学系12、SESAM14、固体レーザ媒質16、ダイクロイックミラー18、共振器ミラー20、ペルチェ素子22、及びペルチェ駆動部24を含んで構成されている。SESAM14、固体レーザ媒質16、共振器ミラー20、及びダイクロイックミラー18が取り付けられたダイクロイックミラーホルダー32は、同一の共振器ホルダー34により固定されている。共振器ホルダー34は、ペルチェ駆動部24により駆動されるペルチェ素子22によって温度調整され、これにより共振器長が変化し、共振器から出射されるパルス光の繰り返し周波数が変化する。
【選択図】図1
Description
12、12A 励起光学系
16、16A 固体レーザ媒質
18、18A ダイクロイックミラー
20、20A 共振器ミラー
22 ペルチェ素子
24 ペルチェ駆動部
26、26A 半導体レーザ
28、28A セルフォックレンズ
30 励起光学系ホルダー
32 ダイクロイックミラーホルダー
34、34A、34B 共振器ホルダー
50 固体レーザ媒質
52 リトロプリズム
54 共振器ホルダー
60、70 パルスレーザ光源装置
80 顕微鏡装置
Claims (8)
- 一対の共振器ミラーを有する共振器と、
前記共振器内に配置され、励起光が入射されることにより発振光を出力する固体レーザ媒質と、
前記励起光を前記固体レーザ媒質に入射させる励起手段と、
前記共振器内に配置され、モード同期を誘起するためのモード同期素子と、
前記共振器から所定周波数の発振光が出射されるように、前記一対の共振器ミラーの温度を調整する温度調整手段と、
を備えたモード同期レーザ装置。 - 前記一対の共振器ミラーは、同一の保持部材に保持され、前記温度調整手段は、前記保持部材の温度を調整する
請求項1記載のモード同期レーザ装置。 - 前記モード同期素子が、前記一対の共振器ミラーの一方の共振器ミラーと兼用された半導体可飽和吸収ミラーデバイスである
請求項1又は請求項2記載のモード同期レーザ装置。 - 前記共振器内に、前記共振器内の群速度分散を制御する群速度分散補償手段を備え、前記共振器は、ソリトンモード同期を誘起する
請求項1〜3の何れか1項に記載のモード同期レーザ装置。 - 前記モード同期素子が、前記固体レーザ媒質と兼用された光カー効果を誘起する媒質から成り、前記共振器は、カーレンズモード同期を誘起する
請求項1記載のモード同期レーザ装置。 - 前記共振器から出射されたパルス光の繰り返し周波数を検出する繰り返し周波数検出手段をさらに備え、
前記温度調整手段は、前記検出手段により検出された繰り返し周波数と、前記所定周波数との差が最小となるように、前記一対の共振器ミラーの温度を調整する
モード同期レーザ装置。 - 前記請求項1〜6の何れか1項に記載の複数のモード同期レーザ装置と、
前記複数のモード同期レーザ装置から出射されたパルス光を各々検出する複数の検出手段と、を備え、
前記複数のモード同期レーザ装置のうち少なくとも一つのモード同期レーザ装置の前記温度調整手段が、前記複数の検出手段で検出された複数のパルス光のパルス間隔の差が最小となるように、前記一対の共振器ミラーの温度を調整する
パルスレーザ光源装置。 - 前記請求項7記載のパルスレーザ光源装置と、
前記パルスレーザ光源装置から出射された複数のパルス光を同期させて試料に照射させる光学系と、
前記試料からの蛍光を検出する蛍光検出手段と、
を備えた顕微鏡装置。
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008207582A JP2010045147A (ja) | 2008-08-12 | 2008-08-12 | モード同期レーザ装置、パルスレーザ光源装置、及び顕微鏡装置 |
| US12/507,490 US8097863B2 (en) | 2008-08-12 | 2009-07-22 | Mode-locked laser device, pulsed laser light source device, microscope device |
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| JP2008207582A JP2010045147A (ja) | 2008-08-12 | 2008-08-12 | モード同期レーザ装置、パルスレーザ光源装置、及び顕微鏡装置 |
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| JP2010045147A true JP2010045147A (ja) | 2010-02-25 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011181691A (ja) * | 2010-03-01 | 2011-09-15 | Advantest Corp | パルスレーザ、光周波数安定化レーザ、測定装置および測定方法 |
| WO2013153899A1 (ja) * | 2012-04-10 | 2013-10-17 | 浜松ホトニクス株式会社 | レーザ装置 |
| JP2014139969A (ja) * | 2013-01-21 | 2014-07-31 | Mitsubishi Electric Corp | 固体レーザ増幅装置および多段レーザ増幅装置 |
| CN117415340A (zh) * | 2023-09-25 | 2024-01-19 | 上海汉邦联航激光科技有限公司 | 一种振镜抖动检测方法、装置及设备 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011238792A (ja) * | 2010-05-11 | 2011-11-24 | Fujifilm Corp | 固体レーザ装置 |
| JP4870237B1 (ja) * | 2011-06-27 | 2012-02-08 | パナソニック株式会社 | レーザ光源装置 |
| US9478931B2 (en) * | 2013-02-04 | 2016-10-25 | Nlight Photonics Corporation | Method for actively controlling the optical output of a seed laser |
| US9263855B2 (en) | 2013-03-15 | 2016-02-16 | Nlight Photonics Corporation | Injection locking of gain switched diodes for spectral narrowing and jitter stabilization |
| US10096965B2 (en) | 2014-03-13 | 2018-10-09 | Nlight, Inc. | Algorithms for rapid gating of seed suspendable pulsed fiber laser amplifiers |
| US9806488B2 (en) | 2015-06-30 | 2017-10-31 | Nlight, Inc. | Adaptive boost control for gating picosecond pulsed fiber lasers |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1187828A (ja) * | 1997-09-10 | 1999-03-30 | Nippon Telegr & Teleph Corp <Ntt> | 繰り返し周波数の安定化された光パルス源 |
| JP2007250762A (ja) * | 2006-03-15 | 2007-09-27 | Olympus Corp | 位相補償システムとそれを用いたレーザ走査型顕微鏡システム |
| JP2008028379A (ja) * | 2006-06-22 | 2008-02-07 | Fujifilm Corp | モードロックレーザ装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5163059A (en) * | 1991-05-09 | 1992-11-10 | Coherent, Inc. | Mode-locked laser using non-linear self-focusing element |
| JP3450073B2 (ja) | 1994-12-28 | 2003-09-22 | 富士写真フイルム株式会社 | レーザーダイオード励起固体レーザーおよびその製造方法 |
| JP3378103B2 (ja) | 1994-12-28 | 2003-02-17 | 富士写真フイルム株式会社 | レーザーダイオード励起固体レーザー |
| JP3734560B2 (ja) * | 1996-03-25 | 2006-01-11 | 浜松ホトニクス株式会社 | 超短パルスレーザ装置 |
| JP3858563B2 (ja) * | 2000-04-05 | 2006-12-13 | 株式会社日立製作所 | カーレンズモード同期可能な固体レーザー |
| DE10120425C2 (de) * | 2001-04-26 | 2003-12-18 | Leica Microsystems | Scanmikroskop |
-
2008
- 2008-08-12 JP JP2008207582A patent/JP2010045147A/ja active Pending
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2009
- 2009-07-22 US US12/507,490 patent/US8097863B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1187828A (ja) * | 1997-09-10 | 1999-03-30 | Nippon Telegr & Teleph Corp <Ntt> | 繰り返し周波数の安定化された光パルス源 |
| JP2007250762A (ja) * | 2006-03-15 | 2007-09-27 | Olympus Corp | 位相補償システムとそれを用いたレーザ走査型顕微鏡システム |
| JP2008028379A (ja) * | 2006-06-22 | 2008-02-07 | Fujifilm Corp | モードロックレーザ装置 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011181691A (ja) * | 2010-03-01 | 2011-09-15 | Advantest Corp | パルスレーザ、光周波数安定化レーザ、測定装置および測定方法 |
| WO2013153899A1 (ja) * | 2012-04-10 | 2013-10-17 | 浜松ホトニクス株式会社 | レーザ装置 |
| JP2014139969A (ja) * | 2013-01-21 | 2014-07-31 | Mitsubishi Electric Corp | 固体レーザ増幅装置および多段レーザ増幅装置 |
| CN117415340A (zh) * | 2023-09-25 | 2024-01-19 | 上海汉邦联航激光科技有限公司 | 一种振镜抖动检测方法、装置及设备 |
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| US20100038558A1 (en) | 2010-02-18 |
| US8097863B2 (en) | 2012-01-17 |
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