JP2009501280A - Apparatus and method for continuously depositing a material pattern on a substrate - Google Patents

Abstract

  A material pattern is continuously deposited on the substrate. The substrate and mask are moved continuously over the part of the drum where the deposition source releases the material. The mask includes openings that form the pattern, and the deposition material of the deposition source passes through the pattern of the mask and collects on the substrate to form the material pattern. The stretch and lateral position of the substrate and mask may be controlled. The substrate and mask pattern elements may be detected to adjust the stretch and / or lateral position of the substrate and / or mask in order to maintain accurate alignment. In addition, the aperture may have a minimum dimension of about 100 μm or less to create a shape with a minimum dimension of about 100 μm or less.

Description

  The present invention relates to the deposition of a material pattern on a substrate. More specifically, the present invention relates to the deposition of a material pattern by continuous movement of a substrate and a mask that defines the pattern through the deposition area.

  The material pattern may be formed on the substrate by releasing the material from the deposition source toward the substrate. The material is deposited on the substrate as a specific pattern by interposing a mask between the deposition source and the substrate. The mask includes openings that define the pattern, and only the deposited material that passes through the openings reaches the substrate. As a result, the material adheres in a pattern.

  Such a pattern may be attached to the substrate for a wide variety of purposes. As an example, a circuit may be formed on a substrate by depositing materials in various patterns. For example, conductive traces such as metallized patterns can be formed on a flexible dielectric. This can be used for a variety of applications, such as encoding information for flexible tab circuits incorporated into thermal inkjet heads.

  Conventional pattern deposition, in which material is deposited on a substrate through a mask, is performed in a step-and-repeat manner. The substrate moves forward by a predefined amount and stops at a known position where the mask is fixed relative to the substrate. Next, material is released from the deposition source through the mask to form a pattern. Thereafter, the substrate moves forward again by a predefined amount, and the attaching process is performed again. This is repeated to form a plurality of predetermined material patterns on one roll of the base material. For each material pattern formed on the substrate, another downstream mask and deposition source may be used to form another layer of pattern material.

  The step-and-repeat method is effective when a plurality of patterns having a relatively fine shape are formed. However, this has the disadvantage of being quite inefficient. The time spent on the movement of the substrate and the precise alignment of the mask and the substrate is significantly longer than the time required for the deposition of the layers, and no material deposition takes place during this time. Therefore, the preferred production rate is not achieved with the step-and-repeat method.

  Embodiments of the present invention address these and other problems by providing an apparatus and method for continuously depositing material on a substrate. It does not follow the step-and-repeat procedure. Since the material is continuously adhered during the movement of the base material, the time spent for the movement of the base material is not wasted.

  One embodiment is an apparatus for continuously depositing a material pattern on a substrate. The apparatus includes a substrate supply roller that supplies a substrate and a first substrate receiving roller. On this 1st base material receiving roller, a base material is supported so that it may spread toward a base material receiving roller from a base material supply roller. Moreover, a base material moves continuously toward a base material receiving roller from a base material supply roller. The apparatus further includes a first mask comprising openings defining a first pattern, wherein the one or more openings have a minimum size of 100 μm or less. The apparatus further includes a first mask supply roller for supplying a first mask and a first mask receiving roller. On the first mask receiving roller, the first mask is supported so as to spread from the mask supply roller toward the mask receiving roller. In addition, the first mask moves continuously from the first mask supply roller toward the first mask receiving roller. A first drum is included, and in a part of the periphery of the first drum, the substrate and the first mask are supplied by the substrate supply roller and the mask supply roller, and then the substrate receiving roller and the mask receiving roller Contact until supported. Also, the first drum rotates continuously. The first deposition source includes a first deposition material such that at least a portion of the first deposition material passes through the opening of the first mask and the first pattern of the first material is continuously deposited on the substrate. One deposition material is arranged to be continuously guided to the portion of the first mask that covers the peripheral portion of the first drum.

  Another embodiment is an apparatus for continuously depositing a material pattern on a substrate, comprising a substrate supply roller for supplying the substrate and a first substrate receiving roller. On this 1st base material receiving roller, a base material is supported so that it may spread toward a base material receiving roller from a base material supply roller. The base material continuously moves from the base material supply roller toward the base material receiving roller. The apparatus further includes a first mask including an opening defining a first pattern, a first mask supply roller for supplying the first mask, and a first mask receiving roller. On the first mask receiving roller, the first mask is supported so as to spread from the mask supply roller toward the mask receiving roller. The first mask moves continuously from the first mask supply roller toward the first mask receiving roller. The apparatus further includes a first drum. In a part of the periphery of the first drum, a period from when the substrate and the first polymer mask are supplied by the substrate supply roller and the mask supply roller until they are supported by the substrate receiving roller and the mask receiving roller. To touch. The first drum rotates continuously. Further, the apparatus includes a first pattern such that at least a portion of the first deposition material passes through the opening of the first mask and the first pattern of the first material is deposited on the substrate continuously. A first deposition source arranged to continuously guide the deposition material to a portion of the first mask covering a peripheral portion of the first drum. The first substrate elongation control system is configured to determine the substrate in a direction in which the substrate is supplied from the substrate supply roller to the first drum when the substrate contacts a part of the periphery of the first drum. Maintain the growth. In addition, the first mask elongation control system is configured so that when the first mask comes in contact with a part of the periphery of the first drum, the first mask elongation control system is supplied in the direction of being supplied from the first mask supply roller to the first drum. Maintain the predetermined elongation of one mask. The first substrate lateral position control system includes a web guide that adjusts the lateral position of the substrate to match a predetermined lateral position on the first drum, the first mask lateral position control The system includes a web guide that adjusts the lateral position of the first mask to match a predetermined lateral position on the first drum.

  Yet another embodiment is a method of continuously depositing materials, comprising continuously supporting a substrate with a substrate receiving roller while continuously supplying the substrate from a substrate supply roller. Here, the substrate passes through a part around the first drum when it is between the substrate supply roller and the substrate receiving roller. The method further supports the first mask by the first mask receiving roller while continuously supplying the first mask from the first mask supply roller while continuously supplying and supporting the substrate. In doing so, the first mask passes through a portion around the first drum when it is between the first mask supply roller and the first mask receiving roller, and the first mask is the first pattern. Including a plurality of openings forming at least part of the openings having a size of 100 μm or less. Furthermore, this method is configured to apply the first adhesion material to the first material so that the first pattern of the first material adheres to the substrate while continuously supplying and supporting the substrate and the first mask. Directing from the deposition source to a portion of the first mask located on the peripheral portion of the first drum.

  Embodiments of the present invention are for continuously depositing material on a substrate in a pattern defined by a mask. Continuous deposition is achieved by continuously moving the substrate and mask through the deposition area defined by the deposition source and drum.

  FIG. 1 shows one embodiment illustrating an apparatus that establishes a stage for continuously depositing a material pattern on a substrate and the method provided by the apparatus. In this particular embodiment, this first stage is used to attach a pattern element, known as the origin, to the substrate 100. Here, these origin points may be used in subsequent stages to correctly overlay the substrate with the subsequent stage mask. The accuracy of such superposition is in units of μm (this will be described below with reference to FIG. 4). These base points are applied by depositing material through a mask 101 that includes openings to provide the base point pattern. If the material applied for the base point and the first layer of the circuit are the same material, the first layer of the circuit may be applied in addition to the base point.

  The starting point of the substrate 100 is located on a roll attached to the substrate rewind reel 102. This roll serves as a supply roller for the substrate 100 with respect to other parts of the apparatus in this first deposition stage. The substrate 100 is continuously pulled from the reel 102 via the dancer 104 by the precision driving roller 108 through the pulling load cell 106. The substrate 100 is pulled tightly over a portion of the periphery of the rotating drum 124 and onto another receiving roller 110 for the substrate 100. After exiting the receiving roller 110, the substrate 100 is drawn into a subsequent adhesion state described later in relation to FIG. 6 or is rewound onto the substrate rewind reel.

  The dancer 104 and the tension load cell 106 are used to realize a predetermined and controlled elongation (elongation) of the substrate 100 that is directed to the supply direction to the drum 124 at a predetermined speed of the substrate 100. The speed of the substrate 100 is determined by the speed of the precision drive roller 108, which is closely synchronized with the speed of the drum 124. The drum 124 itself has a precision drive mechanism. The selected speed is determined at the design stage based on whether a predetermined elongation and an appropriate thickness of adhesion can be achieved.

  As is known in the art, the dancer 104 controls the speed of the rewind reel 102 by providing feedback using a rotation sensor when tension is applied to the substrate 100 by the actuating device of the dancer 104. . The pull load cell 106 provides a resistance reading. This resistance reading can be used to adjust the resistance applied by the dancer 104 actuator. The control system applies logic based on the tensile load cell 106 reading and the drum 124 speed to slightly change the speed of the drive roller 108 to control the elongation of the substrate 100 as required.

  The starting point of the mask 101 is located on a roll attached to the mask base material rewind reel 112. This roll serves as a supply roller for the mask 101 with respect to other parts of the apparatus in the first deposition stage. The mask 101 is continuously pulled from the reel 112 through the dancer 114 by the precision driving roller 118 through the pull load cell 116. The mask 101 is pulled tightly over the peripheral portion of the rotating drum 124 and further pulled onto the receiving roller 120 of the mask 101. At this time, the base material is also pulled in the peripheral portion of the rotating drum 124 in order to bring the mask 101 into contact with the base material 100. When the mask 101 exits the receiving roller 120, it is rewound onto the substrate rewind reel 122.

  As in the case of the base material 100, the dancer 114 and the pulling load cell 116 realize predetermined and controlled elongation (extension) with respect to the mask 101 in the supply direction to the drum 124 at a predetermined speed of the mask 101. Used for The speed of the mask 101 is determined by the speed of the precision drive roller 118, and the precision drive roller 108 is also closely synchronized with the speed of the drum 124. As described with respect to substrate 100, the selected speed is determined during the design phase based on whether a predetermined stretch and an appropriate thickness of adhesion can be achieved.

  Similar to dancer 104, dancer 114 provides feedback to mask rewind reel 112 using a rotation sensor when tension is applied to mask 101 by the actuator of dancer 114. The pull load cell 116 provides a resistance reading. This resistance reading can be used to adjust the resistance applied by the actuating device of the dancer 114. The control system applies logic based on the pull load cell 116 reading and the drum 124 speed to slightly change the speed of the drive roller 118 to control the stretch of the mask 101 as required.

  This particular embodiment includes a deposition source 126 that is installed inside the drum 124. Therefore, it is necessary to bring the mask 101 into direct contact with the drum 124 while the substrate 100 is in direct contact with the mask 101 and separated from the drum 124 by the mask 101. The drum 124 has a large opening 130 designed in the roll to match the material flow to the mask with little restriction. Further, the openings 130 are arranged around the roll at intervals. Therefore, the attachment material 128 released from the attachment source 126 can reach the mask 101 through the drum 124. At this time, the adhesive material 128 can reach the base material 100 through the opening provided in the mask, and a pattern can be formed on the base material 100.

  The deposition source 126 may be any of a variety of types depending on the type of deposition and the type of deposition material required. For example, a sputtering cathode or a magnetron sputtering cathode may be used as the deposition source 126 in order to deposit a metal material or a conductive metal oxide material. As another example, an evaporation source may be used as the deposition source 126 to deposit a metal material or a conductive metal oxide material.

  The drum 124, the deposition source 126, the mask 101, and the substrate 100 may be configured such that the mask 101 and the substrate 100 pass through the bottom of the drum in a state where the deposition material is radiated downward from the deposition source 126. However, as another method, the mask 101 and the substrate 100 may be disposed so as to pass over the drum 124 and the deposition material is discharged upward from the deposition source 126. This method is particularly effective when a vapor deposition source is used.

  In addition, any of various types of materials may be used for the base material 100 and the mask 101. Examples include polymer materials (polyester (both PET and PEN), polyimide, polycarbonate, polystyrene, etc.), metal foil materials (stainless steel, other steels, aluminum, copper, etc.), paper materials, woven materials, non-woven materials. Etc. Further, all of these materials may be either coated or uncoated. However, when a material having high elasticity such as a polymer material is used as the base material and the mask, accurate elongation control and accurate alignment can be performed as described below in connection with FIG. As a result, the shape can be extremely reduced. The minimum dimension of the opening provided in the polymer mask may be approximately microns (range of 10 μm to 100 μm). Thus, the shape deposited on the substrate may also have a minimum dimension of approximately microns (again in the range of 10-100 μm). Therefore, the circuit density can be made extremely high. For example, high-resolution and space-saving conductive traces can be manufactured at high speed by this continuous deposition process. If the trace aspect ratio is large, the trace must be deposited by moving the web through two or more deposition stations and performing two or more sequential depositions through an offset shadow mask. There is. This is because the aspect ratio of the opening of the mask is limited in the length of the opening before affecting the dimensional stability of the opening provided in the polymer mask. Further details of the fabrication of the polymeric aperture mask for this embodiment are described in detail in US Pat. No. 6,897,164 (Baude et al.).

  FIG. 2 shows an embodiment similar to FIG. However, it differs from FIG. 1 in that the mask is not a roll-to-roll configuration but a continuous loop. Here, the substrate 200 is unwound from the reel 202, passes through the dancer 204, passes over the load cell 206, and is pulled by the driving roller 208. The substrate 200 passes through the peripheral portion of the drum 224 and is pulled over the receiving roller 210, and then proceeds to the next attachment stage or is rewound on the rewind reel. Thus, the elongation and speed of the substrate 200 are controlled in the same manner as in FIG. Further, as in the case of FIG. 1, the deposition source 226 releases the material 228 through the opening 240 of the drum 224, and the released material reaches the mask 201 and passes through the opening provided in the mask 201. Reach material 200.

  However, the mask 201 is a continuous loop that passes through a pulling load cell 234 that is a roller of the web guide 232, and is pulled by the driving roller 218 when passing the sensor 238. The mask 201 passes through the peripheral portion of the drum and is pulled away over the receiving roller 220. The mask 201 then reaches another receiving roller 222. This receiving roller is a roller of the tensioner 223 and sends the mask 201 back to the roller 236 of the web guide 232. In this configuration, the elongation and speed of the mask 201 continue to be controlled by adjusting the resistance applied by the actuator of the tensioner 223 and the speed of the drive roller 218 based on the reading of the tension load cell 234. Further, the horizontal position adjustment of the mask 201 is also controlled by the web guide 232. Such a web guide will be described in detail below in connection with FIG. On the other hand, the mask 201 loops continuously to be reused. However, finally, it is necessary to replace the mask 201. This is because the adhering material 228 accumulates on the mask.

  The configuration shown in FIG. 2 is similar to the configuration shown in FIG. 1 except that there is a mask 201 that loops continuously. However, the continuously looping mask 201 shown in FIG. 2 can be similarly applied to other configurations described below with respect to FIGS.

  The embodiment shown in FIG. 3 is similar to FIG. 1 except that the deposition source 326 is located outside the drum 324. Here, the substrate 300 is unwound from the reel 302, passes through the dancer 304, and is pulled by the driving roller 308 through the load cell 306. The substrate 300 passes through the peripheral portion of the drum 324 and is guided further past the receiving roller 310, and then proceeds to the next attachment stage or is rewound on the rewind reel. Thus, the elongation and speed of the substrate 300 are controlled in the same manner as in FIG. Further, as in FIG. 1, the mask 301 is returned from the reel 312, passes through the dancer 314, and is pulled by the driving roller 318 through the load cell 316. The mask 301 passes through the peripheral portion of the drum 324, is guided further past the receiving roller 320, and is then rewound onto the rewind reel 322. Thus, the elongation and speed of the mask 301 are also controlled as in the case of FIG.

  However, the deposition source 326 is installed outside the drum 324 so that the deposition material 328 does not have to pass through the drum 324 before reaching the mask 301 and the substrate 300. Thus, the drum 324 need not necessarily include an opening. Further, the substrate 300 is in direct contact with the drum 324. On the other hand, the mask 301 is in direct contact with the substrate 300 with the substrate 300 positioned between the mask 301 and the drum 324.

  The configuration shown in FIG. 3 is similar to that of FIG. 1 except that the attachment source 326 is installed outside the drum 324. Installation of the attachment source 326 outside as shown in FIG. 3 can be similarly applied to other configurations including those shown in FIGS. 2 and 4 to 6.

  The configuration shown in FIG. 4 is similar to that of FIG. 1, but differs in that the substrate 400 already has pattern elements attached or otherwise formed. Since the pattern elements are already prepared, accurate alignment as described later is maintained between the substrate 400 and the mask 401. Also, during this stage, the shape of the circuit may be attached without further attaching the base point of the same material at the same time.

  The pattern element may be preformed on the substrate using any of a wide variety of methods. The method used here is also suitable for attaching such pattern elements to the mask described in any of the embodiments of FIGS. Examples of methods for pre-forming the pattern elements on the substrate and mask include sputtering, vapor deposition, laser ablation, laser marking, chemical milling, chemical etching, embossing, scratching, transfer and the like.

  In the embodiment of FIG. 4, the substrate 400 is unwound from the reel 402, passes through the dancer 404, and is pulled by the drive roller 408 over the load cell 406. The substrate 400 passes through the peripheral portion of the drum 424 and is guided further past the receiving roller 410, and then proceeds to the next attachment stage or is rewound on the rewind reel. Thus, the elongation and speed of the base material 400 are controlled in the same manner as in FIG. Further, as in the case of FIG. 1, the mask 401 is unwound from the reel 412, passes through the dancer 414, and is pulled by the driving roller 418 through the load cell 416. The mask 401 passes through the peripheral portion of the drum 424, is guided further past the receiving roller 420, and is then rewound onto the rewind reel 422. Thus, the elongation and speed of the mask 401 are also controlled in the same manner as in FIG.

  However, the elongation and speed are further controlled based on the result of detecting the base points of both the substrate 400 and the mask 401. Thereby, the alignment of the base material 400 and the mask 401 in the supply direction to the drum 424 is in an appropriate state within a tolerance range of 1/2 of the minimum dimension (less than 100 μm, less than 50 μm, and even less than 25 μm). Maintained. The sensor 438 detects the base point of the substrate 400, and the sensor 448 detects the base point of the mask 401. The relative speed between the substrate 400 and the mask 401 may be adjusted using drive rollers 408 and 418, respectively, to correct for excessive advance or delay of the mask 401 by the substrate 400.

  Further, between the load cell 406 for the substrate 400 and the drive roller 408, a precision web guide 430 supports the substrate 400 and is based on a sensor 438 that detects a base point for determining the lateral position. Control the lateral position of the material. The moving web tends to shift laterally on the roller. In most cases, however, the lateral position needs to be kept strictly within drum 424 within an acceptable range of at least 1/2 of the smallest feature size (less than 100 μm, less than 50 μm, or even less than 25 μm). Therefore, the web guide 430 adjusts the lateral position of the substrate 400. The web guide 430 includes a first roller 432, a frame 434, and a second roller 436. The frame 434 guides the substrate 400 and changes the lateral position of the substrate 400 in the drive roller 408 and thus in the drum 424, so that the frame 434 passes through the pivot point of the edge of the first roller 432 as shown in the figure. You may swivel inward and outward. A precision web guide suitable for this purpose is described in more detail in US Patent Application Publication No. 2005/0109811 (Swanson et al.).

  Similar to the case of the mask 401, between the load cell 416 and the driving roller 418, a precision web guide 440 supports the mask 401 and based on a sensor 448 that detects a base point for determining a lateral position. The horizontal position of 401 is controlled. The lateral position of the mask 401 also needs to remain within tight tolerances on the drum 424. Therefore, the horizontal position of the mask 401 is adjusted by the web guide 440. The web guide 440 includes a first roller 442, a frame 444, and a second roller 446. The frame 444 guides the mask 401 and changes the lateral position of the mask 401 on the driving roller 418 and hence the drum 424, so that the inner side of the page is at the pivot point of the edge of the first roller 442 as shown in the figure. You may turn to the outside and outward.

  The lateral position control system can be combined with the stretch control system or used alone. Similarly, the stretch control system can be combined with the lateral position control system or used alone.

  As in FIG. 1, the deposition source 426 inside the drum 424 releases the deposition material 428 through the opening 450 in the drum 424 to reach the mask 401 and the substrate 400 that cover the peripheral portion of the drum 424. FIG. 4 is related to FIG. 1 in that such a configuration is used as the first deposition stage. However, the configuration of FIG. 4 is also used as a subsequent stage when the substrate 400 is not fed directly from the preceding deposition stage, but is rewound in the previous stage and introduced by the rewind reel 402 in the subsequent stage. May be.

  The embodiment shown in FIG. 5 is similar to that of FIG. 3, but differs in that the substrate 500 is provided with pattern elements and base points using a base point attachment process 540. The base attachment process 540 attaches the base point to the substrate 500 at a point where the substrate 500 is in contact with the periphery of the drum 524 and before the mask 501 reaches the drum. Since the pattern elements are already prepared on the drum 524, accurate alignment as described below is maintained between the substrate 500 and the mask 501. Also, during this stage, the shape of the circuit may be attached without further attaching the base point of the same material at the same time. Examples of methods for pre-forming a pattern element on a substrate by a base point deposition process 540 include sputtering, vapor deposition, laser ablation, laser marking, chemical milling, chemical etching, embossing, scratching, transfer, and the like.

  In the embodiment of FIG. 5, the substrate 500 is unwound from the reel 502, passes through the dancer 504, and is pulled by the drive roller 508 over the load cell 506. Substrate 500 passes through the peripheral portion of drum 524, including the pointed portion of origin process 540, and is guided further past receiving roller 510 before proceeding to the next deposition stage, or Rewinded on the rewind reel. Thus, the elongation and speed of the substrate 500 are controlled in the same manner as in FIG. Further, as in FIG. 3, the mask 501 is returned from the reel 512, passes through the dancer 514, and is pulled by the driving roller 518 through the load cell 516. The mask 501 passes through the peripheral portion of the drum 524, is guided further forward through the receiving roller 520, and is then rewound on the rewind reel 522. Thus, the elongation and speed of the mask 501 are also controlled in the same manner as in FIG.

  However, here, in order to keep the alignment of the mask 501 in an appropriate state in the direction to be supplied to the drum 524 provided with the base point patterning process 540, the sensor 538 is used to detect the base point of the mask 501 based on the result of detection. And the speed is further controlled. The relative speed of the mask 501 may be adjusted using the drive roller 518 to correct for excessive advance or delay of the base point patterning process 540 by the mask 501.

  Further, the lateral position of the mask 501 is controlled within a strictly allowable range by the precision web guide 530 between the load cell 516 and the driving roller 518. This control is performed based on a sensor 538 that detects a base point on the mask 501 in order to determine a lateral position. The web guide 530 includes a first roller 532, a frame 534, and a second roller 536. The frame 534 guides the mask 501 to change the lateral position of the mask 401 on the drive roller 518 and thus the drum 524, so that the inner side of the page is at the pivot point of the edge of the first roller 532 as shown in the figure. You may turn to the outside and outward.

  Similar to the case of FIG. 3, the deposition source 526 installed outside the drum 524 releases the deposition material 528 so as to reach the mask 501 and the substrate 500 covering the peripheral portion of the drum 524.

  The embodiment shown in FIG. 6 is similar to that of FIG. 4 except that the substrate 600 is supplied directly from the previous stage rather than being supplied by a rewind reel. As in the case of FIG. 4, since the pattern elements are already prepared, accurate alignment is maintained between the substrate 600 and the mask 601. Also, during this stage, the shape of the circuit may be attached without further attaching the base point of the same material at the same time.

  In the embodiment of FIG. 6, the substrate 600 is directly supported by the previous step in the pull load cell 602 and pulled by the drive roller 608. The substrate 600 passes through the peripheral portion of the drum 624 and is guided further past the receiving roller 610, and then proceeds to the next attachment stage or is rewound on the rewinding reel. At this stage, there is no dancer for the substrate 600. Therefore, the elongation and speed of the base material 600 are controlled by detecting the tension of the base material 600 in the load cell 602 and slightly changing the speeds of the driving roller 608 and the drum 624. By adjusting the relative speeds of the drive roller 608 and the drum 624, the elongation of the substrate 600 can be further finely adjusted. Further, as in FIG. 4, the mask 601 is unwound from the reel 612, passes through the dancer 614, and is pulled by the driving roller 618 through the load cell 616. The mask 601 passes through the peripheral portion of the drum 624, is guided further forward through the receiving roller 620, and then rewound on the rewind reel 622. Thus, the elongation and speed of the mask 601 are also controlled in the same manner as in FIG.

  Further, in order to keep the alignment of the base material 600 and the mask 601 in an appropriate state in the direction of supply to the drum 624, the elongation and speed are controlled based on the result of detecting the base points of the base material 600 and the mask 601. The Sensor 638 detects the base point of substrate 600, and sensor 648 detects the base point of mask 601. The relative speed between the substrate 600 and the mask 601 may be adjusted using drive rollers 608 and 618, respectively, to correct for excessive advance or delay of the mask 601 by the substrate 600.

  Further, between the load cell 602 for the substrate 600 and the drive roller 608, a precision web guide 630 supports the substrate 600 and is based on a sensor 638 that detects a base point for determining the lateral position. Control the lateral position of the material. The web guide 630 includes a first roller 632, a frame 634, and a second roller 636. The frame 634 guides the substrate 600 to change the lateral position of the substrate 600 in the drive roller 608 and thus in the drum 624 so that the page at the pivot point of the edge of the first roller 632 as shown in the figure. You may turn inward and outward.

  As with mask 601, between load cell 616 and drive roller 618, a precision web guide 640 supports mask 601 and is based on a sensor 648 that detects a base point for determining the lateral position. The horizontal position of 601 is controlled. The web guide 640 includes a first roller 642, a frame 644, and a second roller 646. The frame 644 guides the mask 601 to change the lateral position of the mask 601 in the drive roller 618 and thus in the drum 624, so that the inner part of the page is at the pivot point of the edge of the first roller 642 as shown in the figure. You may turn to the outside and outward.

  As in FIG. 4, the deposition source 626 inside the drum 624 releases the deposition material 628 through the opening 650 in the drum 624 to reach the mask 601 and the substrate 600 covering the peripheral portion of the drum 624.

  FIG. 7 is a diagram illustrating a position and speed control system 700 of the rotary motor. Here, any of the systems 700 may be used to control position, speed, torque on each of the drive rollers and drums. The control system 700 receives a position command 701 as an input. This command is output from the trajectory generator as understood by those skilled in the motion control field. This command is supplied to a position feedforward operation 702 where a position feedforward signal is then output and sent to a feedforward gain control operation 712.

  The position command 701 is also combined with another signal based on the load position feedback signal 703 that is provided to the low pass filter operation 704. The load position feedback signal 703 is received based on a high precision rotation sensor mounted directly on the drive roller or drum. Low pass filter operation 704 provides an output to observer 706. Observer 706 uses other internal signals to generate an output, and the generated output is applied to feedback filter operation 708 to provide a signal that is negatively combined with position command 701. This signal is then sent to the position controller 710. The signal output from the position controller 710 is combined with two other signals.

  The feedforward gain signal output from the feedforward gain control operation 712 is combined with the output signal of the position controller 710 and the motor position feedforward feedback signal. The motor position feedforward feedback signal is output from the position feedforward differentiation operation 714 and passed through the low pass filter 715, and is based on the received motor position feedback signal 705. This signal 705 is supplied from a high precision rotation sensor mounted on the armature of the motor that drives the driving roller or drum. The output of the synthesis result is then sent to the low-pass filter 720, and the output from this is supplied to the speed controller 722.

  The feedforward gain signal output from the feedforward gain operation 712 is supplied to the speed feedforward operation 716. This velocity feedforward operation 716 provides an output to a feedforward gain operation 718 to generate a second feedforward gain signal. The second feedforward gain signal is provided to current feedforward operation 724, and the output from current feedforward operation 724 is sent to feedforward gain operation 726. Further, the second feedforward gain signal is combined with the output of the speed controller 722 and the web command speed feedforward signal 707 output from the trajectory generator. The trajectory generator generates a position reference for each roller control system. This includes the exact unit position and velocity. The result of combining the speed feedforward signal 707 and the output of the speed controller 722 is passed through a notch and other filter 728 and the feedforward gain signal output by the feedforward gain operation 726 and the actual motor current measurement. 709. Thereby, one input is supplied to the current controller 730. Next, the current output from the current controller 730 is supplied to the motor, and the driving roller and the drum are driven by the motor.

  FIG. 8 is a diagram for explaining the position and speed control system 800 of the guide motor. Here, any one of the systems 800 may be used to control the lateral position of the substrate, and the other may be used to control the lateral position of the mask. The control system 800 receives a position command 801 as input. This command is output from a detection system that detects a base point indicating the lateral position of the web. This command is supplied to position feedforward operation 802, where a position feedforward signal is then output and sent to feedforward gain control operation 810.

  The position command 801 is also combined with another signal based on the load position feedback signal 803 provided to the low pass filter operation 804. The load position feedback signal 803 is received based on a high precision linear sensor mounted directly on the web guide frame. A feed forward operation 804 provides output to an observer 806. Observer 806 uses other internal signals to generate an output, and the generated output is applied to feedback filter operation 808 to provide a signal that is negatively combined with position command 801. This signal is then sent to the position controller 710. The signal output from the position controller 710 is combined with two other signals.

  The feedforward gain signal output from the feedforward gain control operation 810 is combined with the position controller output signal 812 and the motor position feedforward feedback signal. The motor position feedforward feedback signal is output from the position feedforward differentiation operation 809 and passed through the low-pass filter 811 and is based on the received motor position feedback signal 805. This signal 805 is received based on a high precision rotation sensor mounted directly on the armature of the motor that moves the web guide frame. The output of the synthesis result is then sent to the low pass filter 818, and the output from this is supplied to the speed controller 820.

  The feedforward gain signal output from the feedforward gain control operation 810 is supplied to the speed feedforward operation 814. This velocity feedforward operation 814 provides an output to a feedforward gain operation 816 to generate a second feedforward gain signal. The second feedforward gain signal is provided to current feedforward operation 822, and the output from this current feedforward operation 822 is sent to feedforward gain operation 824. Further, the second feedforward gain signal is combined with the output of the speed controller 820. The result passes through a notch and other filter 826 and is combined with the output of the feedforward gain operation 824 and the actual motor current measurement 807. This provides one input to the current controller 828. Next, the current output from the current controller 828 is supplied to the motor, and the web guide frame is driven by the motor.

  FIG. 9 is a diagram showing a web base point generation control system 900. The web origin generation control system 900 maintains accurate alignment between the mask origin and the substrate origin at each stage of the deposition process where the origin is already present on both webs (see FIG. 6). The control system 900 receives a web position command 901 as an input. This command is generated by the trajectory generator. This command is supplied to a position feedforward operation 902 where a position feedforward signal is then output and sent to a feedforward gain control operation 908.

  The position command 901 is also combined with another signal based on the web position feedback signal 903. Web position feedback signal 903 is received based on the longitudinal web position. This signal represents the position of the substrate or mask, or the difference between them. The web position feedback signal 903 is supplied to the observer 904. Observer 904 augments the position signal generated by the sensor and its output is applied to feedback filter operation 905 to provide a signal that is combined with position command 901. The signal resulting from this synthesis is then supplied to the position controller 910. The signal output from the position controller 910 is combined with two other signals as will be described later.

  The feedforward gain signal output from the feedforward gain control operation 908 is combined with the signal output from the position controller 910 and the web feedforward open loop position correction signal 912 supplied by the trajectory generator. The output of the synthesis result is a guide position command, which is then supplied to the web position controller (see FIG. 7). The motor position and speed are obtained from the motor 916 and a corresponding feedback signal 918 is provided to the motor position speed controller 914. Motor position speed controller 914 includes sensor position offset correction with line speed control.

  FIG. 10 shows part of an illustrative embodiment. In this embodiment, the alignment of the base point is maintained between the mask and the substrate in consideration of the required shape (100 μm or less) and alignment tolerance (dimensions less than 100 μm, less than 50 μm, and even less than 25 μm). Is done. The substrate 1000 passes through the web guide 1040 after passing through the supply roller 1002. In the web guide 1040, rollers 1042 and 1046 are attached to the frame 1044. The substrate then passes through sensor 1048. This sensor 1048 detects the web position in the longitudinal and / or lateral direction. The driving roller 1018 performs final adjustment of elongation and speed of the base material 1000 when the base material 1000 moves to the peripheral portion of the drum 1024. Thereafter, the base material 1000 is guided to the next destination by the exit roller 1020.

  Mask 1001 enters web guide 1030. In this web guide 1030, rollers 1032 and 1036 are attached to a frame 1034. The mask 1001 passes through a sensor 1038 that detects the longitudinal and / or lateral web position. Then, when the mask 1001 moves to the peripheral portion of the drum 1024, the driving roller 1008 makes final adjustments regarding the elongation and speed of the mask 1001. On the other hand, the exit roller 1010 guides the mask 1001 in the direction away from the drum 1024.

  During operation, a web position feedback signal is output from the substrate sensor 1048 and the mask sensor 1038 and supplied to the strain controller 1052. The strain controller then provides the output signal to the virtual tension observer 1054. The virtual tension observer 1054 is a control system technique that estimates the value of a certain variable based on the known values of other variables. The observer improves the performance of the control system by reducing variable measurement delays, improving accuracy, or providing variable values that are difficult or impossible to measure directly. The virtual tension observer 1054 then calculates the web tension based on the position feedback supplied to the strain controller 1052 and the substrate and mask material parameters. In addition to the appropriate pull set point for the upstream controller, an additional modified position command offset is also generated. Note that the additional correction position command offset may be added to any drive roller. The virtual tension observer can also estimate changing parameters in real time. The virtual tension observer of this embodiment is described in more detail in commonly owned US Patent Application Publication No. 2005 / 0137,738A1. Next, the virtual tension observer 1054 supplies a drive signal to the motor of the drive roller 1008.

FIG. 11 shows the control loop used by the pull controller 1052 in connection with the virtual pull observer 1054. The position of the substrate is indicated by the sensor output in position operation 1102. On the other hand, the position of the mask is indicated by the sensor output of position operation 1112. In calculation operation 1104, the target length of the substrate when not stretched is calculated, and in calculation operation 1114, the target length of the mask when not stretched is calculated. In calculation operation 1106, the target time of the substrate is calculated for the substrate, and in calculation operation 1116, the target time of the mask is calculated. Based on the target time, a new value ε ₁ is calculated at calculation operation 1108. This value represents the desired strain of the web. Based on the new value ε ₁ , T _sp is calculated in a calculation operation 1110. Note that this value represents the tension required to achieve that level of strain.

  FIG. 12 shows an example of a base mark or pattern element. Such origin marks or pattern elements may be placed on the substrate and mask for the purpose of controlling lateral and longitudinal position and maintaining proper alignment between the two webs. As described above, such a base mark may be applied in advance as a pattern, or may be added to the web in the first stage of the adhesion process.

  As shown in this example, the origin of the lateral direction or cross web may be a line 1202 located at a certain distance from the adhesion pattern placed on the substrate or mask 1200. The edge 1201 of the web 1200 should not be disposed at the same position as the cross web base line 1202 or any adhesion pattern on the web 1200. Based on the result of detecting the position of the line 1202 in the lateral direction, whether or not the web 1200 is in an appropriate position, or whether or not the web guide needs to be adjusted to readjust the web in the lateral direction. Judgment can be made.

  Further, as shown in this embodiment, the base point in the longitudinal direction or the flow direction may be a series of marks 1204 arranged at a certain distance from each other in the flow direction. From the result of detecting the position of one mark 1204 in the series, it is possible to determine whether the web 1200 is at an appropriate longitudinal position with respect to the adhesion pattern on the web 1200 at a predetermined time.

  FIG. 13 shows an embodiment for explaining a web detection system. In this embodiment, one sensor is used for both the lateral and longitudinal directions. The web 1302 has a base point mark 1304 in the longitudinal direction and a base point mark 1306 in the horizontal direction. As the web 1302 passes between the roller 1308 and the roller 1310, the sensor 1312 detects both the longitudinal origin mark 1304 and the lateral origin mark 1306. The sensor 1312 may be a line scan camera or an area camera.

  The output of sensor 1312 is sent to real-time image data acquisition process 1314. In addition to the sensor output, the real-time image data acquisition process 1314 of this embodiment also receives a position reference 1311 sent from the detected web longitudinal control system. This is performed simultaneously with the acquisition of the position of the base mark image. The real-time image data acquisition process sends the digital image output to the digital image processing system 1316. The digital image processing system 1316 analyzes the image to determine how far the lateral and longitudinal marks are from the intended location. A longitudinal or flow position error 1318 is output towards the longitudinal control system of the web to be detected. In contrast, the lateral or cross web position error 1320 is output to the web guide control system.

  FIG. 14 shows an embodiment for explaining a web detection system. In this embodiment, different sensors are used in the lateral direction and the longitudinal direction, respectively. The web 1402 has a base point mark 1404 in the longitudinal direction and a base point mark 1406 in the horizontal direction. As the web 1402 passes between the rollers 1408 and 1410, one sensor 1412 detects the longitudinal origin mark 1404 and the other sensor 1414 detects the lateral origin mark 1406. The sensor 1412 used for longitudinal detection may be a standard light emitting diode (LED) / photodiode with a photo detector circuit with a short response time. The sensor 1414 used for lateral detection may be a camera such as an LS-7500 series CCD camera manufactured by Keyence, which incorporates a high-speed processing device.

  The output of the sensor 1412 is supplied to the photoelectric conversion element circuit 1416. In the photoelectric conversion element circuit 1416, monitoring of the base point or determination of how far the actual position of the base point mark in the longitudinal direction is away from the planned position may be performed. The longitudinal or flow position error 1418 is output towards the longitudinal control system of the web to be detected.

  The output of the sensor 1414 is supplied to the image processing 1420 of the camera. In this image processing 1420, it may be determined how far the actual position of the base mark in the horizontal direction is away from the planned position. A lateral or cross web position error 1422 is output towards the web guide control system.

  In another aspect, the above-described apparatus is used to implement a continuous material deposition method. The method includes continuously supporting the supplied substrate with a first substrate receiving roller while continuously supplying the substrate from the substrate supply roller. Here, the substrate passes through a part of the periphery of the first drum when it is between the substrate supply roller and the first substrate receiving roller. The method further supports the first mask by the first mask receiving roller while continuously supplying the first mask from the first mask supply roller while continuously supplying and supporting the substrate. In doing so, the first mask passes through a portion around the first drum when it is between the first mask supply roller and the first mask receiving roller, and the first mask is the first pattern. Including a plurality of openings forming at least part of the openings having a size of 100 μm or less. Furthermore, this method is configured to apply the first adhesion material to the first material so that the first pattern of the first material adheres to the substrate while continuously supplying and supporting the substrate and the first mask. Directing from the deposition source to a portion of the first mask located on the peripheral portion of the first drum.

  The method further includes continuously supporting the substrate with the second substrate receiving roller while continuously supplying the substrate from the first substrate receiving roller. Here, the substrate passes through a portion around the second drum when it is between the first substrate receiving roller and the second substrate receiving roller. The method further includes continuously supporting the supplied second mask with the second mask receiving roller while continuously supplying the second mask from the second mask supply roller. Here, the second mask passes through a part of the periphery of the second drum when it is between the second mask supply roller and the second mask receiving roller. Further, the second mask has a plurality of openings for forming the second pattern. In addition, the method applies the second adhesive material to the second adhesion material so that the second pattern of the second adhesion material adheres to the substrate while continuously supplying and supporting the substrate and the second mask. Continuously leading from a second deposition source to a portion of a second mask located on a peripheral portion of the second drum.

  Although the invention has been shown and described in connection with various embodiments thereof, those skilled in the art will recognize that various other changes in form and detail may be made without departing from the spirit and scope of the invention. It will be understood that this can be done in the field.

An embodiment of an apparatus comprising a deposition source inside a drum, providing a first stage of the deposition process using a roll-to-roll mask without using a pre-patterned root element. An embodiment of an apparatus comprising a deposition source inside a drum, providing a first stage of the deposition process using a continuous loop mask without the use of a pre-patterned root element. An embodiment of an apparatus comprising a deposition source external to a drum, providing a first stage of the deposition process using a roll-to-roll mask without the use of a pre-patterned root element. An embodiment of an apparatus comprising a deposition source inside a drum, using a pre-patterned root element and providing a first stage of a deposition process using a roll-to-roll mask. First stage of the deposition process using a roll-to-roll mask with a deposition source external to the drum, which does not use a pre-patterned root element but has a pre-patterning prior to deposition outside the drum Embodiments of devices that provide An embodiment of an apparatus comprising a deposition source inside a drum and providing a second stage of the deposition process using a roll-to-roll mask. FIG. 6 illustrates a schematic of a rotary motor and speed / position control system for controlling longitudinal web position in various embodiments. The figure explaining the outline of the guide motor control system for controlling the web position of a transverse direction in various embodiments. FIG. 6 illustrates an overview of a web origin alignment control system for maintaining accurate alignment of two webs in various embodiments. FIG. 4 illustrates an interface of a control system used in an embodiment of an apparatus that provides a second stage of the deposition process. FIG. 11 is a control loop used for the illustrative control system interface of FIG. The figure explaining the basic | foundation element pattern utilized for a mask and / or a base material in order to detect the relative position of both a horizontal direction and a longitudinal direction, respectively. 1 is an overview diagram illustrating a detection system for detecting both lateral and longitudinal web positions. FIG. 1 is an overview diagram illustrating a detection system for detecting both lateral and longitudinal web positions. FIG.

Claims (24)

An apparatus for continuously depositing a material pattern on a substrate,
A substrate supply roller for supplying the substrate;
A first base material receiving roller, wherein the base material extends from the base material supply roller to the base material receiving roller, and the base material continuously from the base material supply roller to the base material receiving roller. A first substrate receiving roller that supports the substrate to move;
A first mask including an opening defining a first pattern, wherein the one or more openings have a minimum dimension of 100 μm or less;
A first mask supply roller for supplying the first mask;
A first mask receiving roller, wherein the mask extends from the mask supply roller to the mask receiving roller, and the first mask is continuous from the first mask supply roller to the first mask receiving roller. A first mask receiving roller that supports the first mask to move to
The first drum is a first drum, and is supplied from the substrate and the mask supply roller until it is supported by the substrate and the mask receiving roller, and the substrate and the first mask are the first drum. A first drum that is in contact with a part of the periphery of the drum and rotates continuously;
A first deposition source, at least a portion of the first deposition material passes through the opening provided in the first mask, and the first pattern of the first material is continuous on the substrate. A first deposition source arranged to continuously guide the first deposition material toward a portion of the first mask located in a peripheral portion of the first drum so as to adhere And a device comprising:   The apparatus of claim 1, wherein the first mask is a polymer mask.   The apparatus of claim 1, wherein the one or more openings of the first mask have a minimum dimension of 10 μm or less. In the first base material elongation control system, when the base material comes into contact with a part of the periphery of the first drum, the base material is supplied from the base material supply roller to the first drum. A first substrate elongation control system that maintains a predetermined elongation of the substrate;
A first mask elongation control system, which is supplied from the first mask supply roller to the first drum when the first mask contacts a part of the periphery of the first drum. A first mask stretch control system that maintains a predetermined stretch of the first mask in a direction;
The apparatus of claim 1 further comprising: A first substrate lateral position control system, comprising a web guide including a web guide that adjusts the lateral position of the substrate to match a predetermined lateral position on the first drum. A directional position control system;
A first mask lateral position control system, comprising: a web guide including a web guide that adjusts a lateral position of the first mask to a predetermined lateral position on the first drum. A directional position control system;
The apparatus of claim 1 further comprising: A first substrate lateral position control system, comprising a web guide including a web guide that adjusts the lateral position of the substrate to match a predetermined lateral position on the first drum. A directional position control system;
A first mask lateral position control system, comprising: a web guide including a web guide that adjusts a lateral position of the first mask to a predetermined lateral position on the first drum. A directional position control system,
The first mask further includes a pattern element;
The apparatus further includes at least one mask sensor, the at least one mask sensor generating a signal based on a detection result of a pattern element of the first mask, the at least one mask sensor being the first mask sensor. The apparatus of claim 4, wherein the apparatus is utilized by an elongation control system and the first mask lateral position control system.   The substrate includes a pattern element, and the apparatus further includes at least one substrate sensor, the at least one substrate sensor generating a signal based on a detection result of the pattern element on the substrate, and the at least one substrate sensor. The apparatus of claim 6, wherein one substrate sensor is utilized by the substrate stretch control system and the substrate lateral position control system.   The substrate is in direct contact with the first drum at a peripheral portion of the first drum, and the first mask is in direct contact with the substrate at a peripheral portion of the first drum, The apparatus of claim 1, wherein the deposition source is disposed outside the first drum such that the first mask is located between the substrate and the first deposition source.   The first drum includes an opening disposed in the vicinity of the periphery, and the first mask is in direct contact with the first drum and spans the opening at a peripheral portion of the first drum. The substrate is in direct contact with the first mask at the peripheral portion of the first drum, and the first deposition source is configured such that the first mask includes the substrate and the first deposition source. The apparatus according to claim 1, wherein the apparatus is disposed inside the first drum so as to be positioned between the two. A second mask comprising an opening defining a second pattern wherein the one or more openings have a minimum dimension of 100 μm or less;
A second mask supply roller for supplying the second mask;
A second mask receiving roller, wherein the second polymer mask spreads from the mask supply roller to the mask receiving roller, and the second mask is transferred from the second mask supply roller to the second mask receiver. A second mask receiving roller that supports the second mask for continuous movement to a roller;
A second base material receiving roller, the second base material supporting the base material so that the base material continuously moves from the first base material supply roller to the second base material receiving roller. A substrate receiving roller;
A second drum, wherein the base material and the second mask are in contact with each other at a part of the periphery of the second drum, and the second drum is the base material supply roller and the second base. The second drum that supports the base material with a material receiving roller and continuously rotates;
A second deposition source, wherein at least a portion of the second deposition material passes through the opening provided in the second mask, and the second pattern of the second material is deposited on the substrate. A second deposition source arranged to continuously guide the second deposition material toward a portion of the second mask located in a peripheral portion of the second drum;
The apparatus of claim 1 further comprising: A second base material elongation control system, wherein the base material comes into contact with the second drum from the base material supply roller when the base material comes into contact with a part of the periphery of the second drum. A second substrate elongation control system that maintains a predetermined elongation of the substrate;
A second mask elongation control system, which is supplied from the second mask supply roller to the second drum when the second mask contacts a part of the periphery of the second drum. A second mask stretch control system that maintains a predetermined stretch of the second mask in a direction;
The apparatus of claim 10 further comprising: A second substrate lateral position control system, comprising a web guide that includes a web guide that adjusts the lateral position of the substrate to a predetermined lateral position on the second drum. A directional position control system;
A second mask lateral position control system, comprising a web guide that includes a web guide that adjusts the lateral position of the second mask to a predetermined lateral position on the second drum. A directional position control system;
The apparatus of claim 10 further comprising:   The second mask includes a pattern element, and the first mask generates the material from the first deposition source such that an opening in the first mask is deposited on the substrate to form a pattern element. The second mask elongation control system includes a sensor that generates a signal by detecting the pattern element of the substrate, and the signal is generated between the second mask supply roller and the second drum. In order to maintain proper alignment of the pattern elements of the second mask and the pattern elements of the substrate in the direction in which the second mask is supplied, a predetermined elongation of the second mask is 12. The apparatus of claim 11, wherein the apparatus is utilized in the second mask stretch control system to adjust.   The base material is in direct contact with the second drum, the second mask is in direct contact with the base material, and the second deposition source is such that the second mask is in contact with the base material and the second mask. The apparatus according to claim 10, wherein the apparatus is disposed outside the second drum so as to be positioned between the deposition source.   The second drum includes an opening arranged in the vicinity of the periphery, and the second mask is in direct contact with the second drum and spans the opening of the second drum, and the base The material is in direct contact with the second mask, and the second deposition source is located on the second drum such that the second mask is located between the substrate and the second deposition source. The apparatus of claim 10, disposed inside.   The apparatus of claim 10, wherein the second mask is a polymer.   The apparatus of claim 10, wherein the one or more openings of the second mask have a minimum dimension of 10 μm or less.   5. The first substrate stretch control system and the first mask stretch control system function to maintain an alignment tolerance between the substrate and the mask below 50 μm. Equipment. An apparatus for continuously depositing a material pattern on a substrate,
A substrate supply roller for supplying the substrate;
A first substrate receiving roller, the substrate spreading from the substrate supply roller to the substrate receiving roller, and the substrate continuously moving from the substrate supply roller to the substrate receiving roller A first substrate receiving roller that supports the substrate;
A first mask including an opening defining a first pattern;
A first mask supply roller for supplying the first mask;
A first mask receiving roller, wherein the mask extends from the mask supply roller to the mask receiving roller, and the first mask is continuous from the first mask supply roller to the first mask receiving roller. A first mask receiving roller for supporting the first mask so as to move to
A first drum, wherein the base material and the first polymer mask are supplied from the base material and the mask supply roller until being supported by the base material and the mask receiving roller. A first drum that is in contact with a part of the periphery of one drum and rotates continuously;
A first deposition source, wherein at least a portion of the first deposition material passes through the opening of the first mask and continuously deposits the first pattern from the first material on the substrate; A first deposition source arranged to continuously guide the first deposition material toward a portion of the first mask in a peripheral portion of the first drum,
Maintaining a predetermined elongation of the base material in a supply direction from the base material supply roller to the first drum when the base material contacts a part of the periphery of the first drum; A substrate elongation control system of
In the first mask extension control system, when the first mask comes into contact with a part of the periphery of the first drum, the supply direction from the first mask supply roller to the first drum is increased. A first mask stretch control system that maintains a predetermined stretch of the first mask;
A first substrate lateral position control system, comprising a web guide including a web guide that adjusts the lateral position of the substrate to match a predetermined lateral position on the first drum. A directional position control system;
A first mask lateral position control system, comprising: a web guide including a web guide that adjusts a lateral position of the first mask to a predetermined lateral position on the first drum. A directional position control system;
Including the device.   The apparatus of claim 19, wherein the first mask is a polymer.   The apparatus of claim 19, wherein the one or more openings have a minimum dimension of 100 μm or less.   22. The first substrate stretch control system and the first mask stretch control system function to maintain an alignment tolerance between the substrate and the mask below 50 μm. Equipment.   The first substrate lateral position control system and the first mask lateral position control system function to maintain an alignment tolerance between the substrate and the mask below 50 μm; The apparatus of claim 21. A method of continuously depositing materials,
When the substrate is supported by the substrate receiving roller while continuously supplying the substrate from the substrate supply roller, the substrate is between the substrate supply roller and the substrate receiving roller. Pass through a part of the periphery of the first drum,
In supporting the first mask with the first mask receiving roller while continuously supplying the first mask from the first mask supply roller while continuously supplying and supporting the base material, The first mask passes through a part of the periphery of the first drum when the first mask is between the first mask supply roller and the first mask receiving roller, and the first mask is the first mask. A plurality of openings for forming a pattern, wherein at least a part of the openings has a minimum dimension of 100 μm or less,
While continuously supplying and supporting the base material and the first mask, the first adhering material is applied so that the first pattern of the first material adheres to the base material. Continuously guiding from one deposition source towards a portion of the first mask on a peripheral portion of the first drum;
Including methods.

Images