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JP2009211751A - Surface evaluation method of optical disk and surface evaluating device - Google Patents

Surface evaluation method of optical disk and surface evaluating device Download PDF

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JP2009211751A
JP2009211751A JP2008052527A JP2008052527A JP2009211751A JP 2009211751 A JP2009211751 A JP 2009211751A JP 2008052527 A JP2008052527 A JP 2008052527A JP 2008052527 A JP2008052527 A JP 2008052527A JP 2009211751 A JP2009211751 A JP 2009211751A
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substrate
light
interferometer
diffracted light
measurement light
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Masato Ikeda
正人 池田
Masahiko Hirano
昌彦 平野
Tomoshi Ishikawa
知史 石川
Katsuhiro Koyama
勝弘 小山
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Taiyo Yuden Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a surface evaluation method of an optical disk, which is not influenced by light reflected from a rear face of a substrate, and to provide a surface evaluating device which materializes the surface evaluation method. <P>SOLUTION: An interferometer 100 is set up in such a way that an optical axis of measure light is tilted at a tilt angle of Φ<SB>0</SB>toward a surface of an optical disk substrate 150 which is an object to be measured. Whereas, diffracted light DF is emitted at an angle of Φ<SB>1</SB>with respect to the virtual normal VL extending from the surface of the substrate 150. When the tilt angle of the interferometer 100 is set so as to satisfy equation Φ<SB>0</SB>=Φ<SB>1</SB>, the diffracted light DF is made incident on the interferometer 100. Projections and depressions of the surface is evaluated by observing interference fringes produced by the interference of diffracted light DF and reference light RF. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、光ディスクの表面の欠陥を光学的に検出して評価を行う方法と、その方法によって光ディスクの表面の欠陥を光学的に検出する評価装置に関するものである。   The present invention relates to a method for optically detecting and evaluating defects on the surface of an optical disk, and an evaluation apparatus for optically detecting defects on the surface of an optical disk by the method.

追記型CD(CD−R)、追記型DVD(DVD±R)または追記型ブルーレイディスク(BD−R)等の光ディスクは、ディスク状基板の一方の面上に、記録層、反射層、及び必要に応じて保護層を形成した構造を有している。また、前記基板の一方の面にはグルーブと呼ばれる螺旋状または同心円状の案内溝が形成され、隣り合うグルーブの間はランドと呼ばれる凸部となっている。このような光ディスクは、記録用レーザ光をグルーブ上の記録層に照射してピットを形成することにより記録が行われ、このピットの長さ、ピットとピットの間の部分(スペース)の長さ及びこれらの配列を、再生用レーザ光を照射して反射光を光電変換して再生信号として読み取ることによって再生が行われる。   An optical disc such as a recordable CD (CD-R), a recordable DVD (DVD ± R) or a write-once Blu-ray disc (BD-R) has a recording layer, a reflective layer, and a necessary layer on one surface of a disc-shaped substrate. Accordingly, a protective layer is formed. In addition, a spiral or concentric guide groove called a groove is formed on one surface of the substrate, and a convex part called a land is formed between adjacent grooves. In such an optical disc, recording is performed by irradiating a recording laser beam on the recording layer on the groove to form pits. The length of the pits and the length of the portion (space) between the pits These arrays are reproduced by irradiating a reproduction laser beam, photoelectrically converting the reflected light and reading it as a reproduction signal.

このような光ディスクは、記録容量が高くなるにつれて基板に形成されるグルーブの間隔すなわちトラックピッチが狭くなる。例えば片面一層で4.7GBの記録容量を有するDVD−Rの場合はトラックピッチが0.74μmであるが、片面一層で25GBの記録容量を有するBD−Rの場合はトラックピッチが0.32μmである。また、このような光ディスクでは、高速記録の要求が高く、例えば16倍速等に対応することが要求されてきている。そのため、基板の製造には、グルーブを形成する場合の精度の高さが要求される。 In such an optical disc, the interval between grooves formed on the substrate, that is, the track pitch becomes narrower as the recording capacity increases. For example, a DVD-R having a recording capacity of 4.7 GB on one side has a track pitch of 0.74 μm, whereas a BD-R having a recording capacity of 25 GB on one side has a track pitch of 0.32 μm. is there. Further, such an optical disc has a high demand for high-speed recording, and has been demanded to cope with, for example, 16 times speed. For this reason, in manufacturing the substrate, high accuracy is required when the groove is formed.

このような光ディスクは、生産時におけるバラツキ等の原因により、基板のグルーブが形成された表面に凹凸が形成される場合がある。なお、ここでは以後、特に断りが無い場合は基板のグルーブが形成されている側の面を表面ということにする。表面に凹凸が形成された基板を用いた光ディスクに記録用レーザ光及び再生用レーザ光を照射した場合、凹凸による厚みバラツキによってレーザ光の焦点位置に目標とする位置からのズレが生じる。このズレによって球面収差やデフォーカス等のフォーカスエラーや、トラッキングエラーが発生する。フォーカスエラーやトラッキングエラーは、データ復号エラー等のような、光ディスクへの書き込み及び光ディスクからのデータの読み出しが正常に行われないような影響を与える。特に近年は上記のように光ディスクの記録再生速度の高速化が進んでおり、その影響はさらに大きくなってきている。そこでこれらのエラーを防止するため、光ディスクの基板の表面の評価が必要になってきている。 In such an optical disc, unevenness may be formed on the surface on which the groove of the substrate is formed due to variations in production. Hereinafter, unless otherwise specified, the surface of the substrate on which the groove is formed is referred to as the surface. When an optical disk using a substrate having an uneven surface is irradiated with a recording laser beam and a reproducing laser beam, a deviation from the target position occurs in the focal position of the laser beam due to thickness variation due to the unevenness. This deviation causes a focus error such as spherical aberration and defocus, and a tracking error. The focus error and the tracking error have an influence such that data writing to the optical disk and data reading from the optical disk are not normally performed, such as a data decoding error. In particular, in recent years, as described above, the recording / reproducing speed of the optical disk has been increased, and the influence has been further increased. Therefore, in order to prevent these errors, it is necessary to evaluate the surface of the substrate of the optical disk.

このような光ディスクの基板の表面の凹凸を評価する方法としては、特開2005−114630号公報に開示されているように、基板の表面にレーザ光を照射して、その反射光または回折光を検出することにより欠陥を検出する方法が提案されている。また、このような欠陥の検出には、例えばマイケルソン干渉計やフィゾー干渉計等の干渉計が用いられる。 As a method for evaluating the unevenness of the surface of the substrate of such an optical disc, as disclosed in Japanese Patent Application Laid-Open No. 2005-114630, the surface of the substrate is irradiated with laser light, and the reflected light or diffracted light is emitted. There has been proposed a method for detecting defects by detecting them. For detecting such a defect, an interferometer such as a Michelson interferometer or a Fizeau interferometer is used.

特開2005−114630号公報JP 2005-114630 A

しかし、これらの方法で光透過性の基板の表面の評価を行った場合、次のような問題点がある。光透過性の基板に計測光を照射すると、基板の表面で反射された反射光と基板の表面のグルーブによる回折光とともに、基板の表面を透過して基板の裏面で反射された反射光が検出される。従来の方法では、図6に示すように、表面の反射光REF1または回折光と、裏面からの反射光REF2が重畳されて検出される。 However, when the surface of a light-transmitting substrate is evaluated by these methods, there are the following problems. When measuring light is irradiated onto a light-transmitting substrate, the reflected light reflected by the substrate surface and reflected by the back surface of the substrate is detected along with the reflected light reflected by the substrate surface and the diffracted light from the groove on the substrate surface. Is done. In the conventional method, as shown in FIG. 6, the reflected light REF1 or diffracted light on the front surface and the reflected light REF2 from the back surface are superimposed and detected.

この裏面からの反射光REF2は、裏面の凹凸を反映したものであるとともに、表面の反射光REF1と略同じレベルである。そのため、表面の反射光REF1と裏面の反射光REF2とが多重干渉を起こすと、表面の凹凸の正確な計測ができなくなってしまう。 The reflected light REF2 from the back surface reflects the unevenness of the back surface and is at substantially the same level as the reflected light REF1 on the front surface. For this reason, if the reflected light REF1 on the front surface and the reflected light REF2 on the back surface cause multiple interference, it becomes impossible to accurately measure the surface irregularities.

そこで本発明では、裏面からの反射光の影響を受けない光ディスクの表面評価方法を提案するとともに、そのような評価方法を実現することができる表面評価装置を提案するものである。 Therefore, the present invention proposes a method for evaluating the surface of an optical disk that is not affected by the reflected light from the back surface, and also proposes a surface evaluation apparatus that can realize such an evaluation method.

本発明では第一の解決手段として、一方の面に螺旋状の案内溝が形成された基板を有する光ディスクの表面を評価する方法において、計測光を発生する光源と、前記光源から発せられた計測光の一部を反射しその他を透過することにより分割するとともに前記基板から返ってきた回折光を反射するビームスプリッタと、前記基板から返ってきた前記回折光と前記計測光の一部とを干渉させて形成された干渉縞を撮影する撮像装置と、前記ビームスプリッタによって反射された前記計測光の一部または前記回折光を前記撮像装置に向けて反射する反射板と、を有する干渉計を用い、前記干渉計の光軸を前記基板の表面に対して傾斜させた状態で計測光の照射を行い、このときの前記干渉計の光軸の傾きと、前記回折光の光路の傾斜角と、が同じになるようにした光ディスクの表面評価方法を提案する。   In the present invention, as a first solving means, in a method for evaluating the surface of an optical disc having a substrate having a spiral guide groove formed on one surface, a light source that generates measurement light, and a measurement emitted from the light source A beam splitter that reflects a diffracted light returned from the substrate while reflecting a part of the light and transmitting the other, and interferes with the diffracted light returned from the substrate and a part of the measurement light. An interferometer having an imaging device that captures the interference fringes formed and a reflector that reflects a part of the measurement light reflected by the beam splitter or the diffracted light toward the imaging device. The measurement light is irradiated with the optical axis of the interferometer tilted with respect to the surface of the substrate, the tilt of the optical axis of the interferometer at this time, and the tilt angle of the optical path of the diffracted light, Are the same Suggest surface evaluation method of the optical disk was made to be.

上記第一の解決手段に開示された干渉計は、光源から発せられた計測光の一部を参照光として用い、被測定物から返ってきた光と干渉させて計測する構造を有している。このような干渉計を被測定物である基板に対して傾斜させた状態にすると、基板からの反射光は干渉計に返ってこなくなる。しかしながら、回折光は、反射光とは異なる方向例えば干渉計のある方向に返ってくる。このとき干渉計の光軸の傾きと回折光の光路の傾斜角とが同じになるようにすると、回折光の光路が計測光の光路と一致し、参照光と回折光が干渉して撮像装置で撮影される。こうして撮影された干渉縞によって表面の凹凸を評価することができる。上記第一の解決手段によれば、基板の裏面からの反射光の影響を受けずに基板の表面の凹凸を評価することができる。 The interferometer disclosed in the first solution has a structure in which a part of the measurement light emitted from the light source is used as reference light and is measured by causing interference with the light returned from the object to be measured. . When such an interferometer is tilted with respect to the substrate to be measured, the reflected light from the substrate does not return to the interferometer. However, the diffracted light returns in a direction different from the reflected light, for example, in a direction where the interferometer is located. At this time, if the tilt of the optical axis of the interferometer and the tilt angle of the optical path of the diffracted light are made the same, the optical path of the diffracted light coincides with the optical path of the measurement light, and the reference light and the diffracted light interfere with each other to capture the image Taken at. The surface irregularities can be evaluated by the interference fringes thus photographed. According to the first solving means, the unevenness on the surface of the substrate can be evaluated without being affected by the reflected light from the back surface of the substrate.

また、本発明では第ニの解決手段として、上記の第一の解決手段に加えて、前記基板の仮想垂線に対する前記干渉計の光軸の傾斜角をΦ、前記基板の仮想垂線に対する前記回折光の光路の傾斜角をΦ、前記基板の案内溝の間隔をP、計測光の波長をλとしたとき、Φ=Φ=sin−1(nλ/2P)(nは回折光の次数)である光ディスクの表面評価方法を提案する。上記第二の解決手段によれば、Φ=Φ=sin−1(nλ/2P)を満たした場合に、基板の表面から返ってきた回折光が計測光の光路に沿って干渉計に入射されるようになる。 Further, in the present invention, as a second solution, in addition to the first solution, the tilt angle of the optical axis of the interferometer with respect to the virtual perpendicular of the substrate is Φ 0 , and the diffraction with respect to the virtual perpendicular of the substrate Φ 0 = Φ 1 = sin −1 (nλ / 2P) (n is the diffracted light) where Φ 1 is the inclination angle of the optical path of the light, P is the distance between the guide grooves of the substrate, and λ is the wavelength of the measurement light. A method for evaluating the surface of an optical disc is proposed. According to the second solving means, when Φ 0 = Φ 1 = sin −1 (nλ / 2P) is satisfied, the diffracted light returned from the surface of the substrate is transferred to the interferometer along the optical path of the measurement light. It becomes incident.

また、本発明では第三の解決手段として、一方の面に螺旋状の案内溝形成された基板を有する光ディスクの表面評価装置において、計測光を発生する光源と、前記光源から発せられた計測光の一部を反射しその他を透過することにより分割するとともに前記基板から返ってきた回折光を反射するビームスプリッタと、前記基板から返ってきた前記回折光と前記計測光の一部とを干渉させて形成された干渉縞を撮影する撮像装置と、前記ビームスプリッタによって反射された前記計測光の一部または前記回折光を前記撮像装置に向けて反射する反射板と、を有する干渉計を備え、前記干渉計は前記基板の表面に対して光軸が傾斜するように設置され、前記基板の表面から伸びる仮想垂線に対する前記干渉計の光軸の傾斜角をΦ、前記基板の表面から伸びる仮想垂線に対する前記回折光の光路の傾斜角をΦ、前記基板の案内溝の間隔をP、計測光の波長をλとしたとき、Φ=Φ=sin−1(nλ/2P)(nは回折光の次数)である光ディスクの表面評価装置を提案する。 Further, in the present invention, as a third solution, in a surface evaluation apparatus for an optical disc having a substrate having a spiral guide groove formed on one surface, a light source that generates measurement light and measurement light emitted from the light source A beam splitter that reflects a part of the light beam and reflects the diffracted light returned from the substrate, and causes the diffracted light returned from the substrate to interfere with a part of the measurement light. An interferometer having an imaging device that captures the interference fringes formed and a reflector that reflects part of the measurement light reflected by the beam splitter or the diffracted light toward the imaging device, The interferometer is installed such that its optical axis is inclined with respect to the surface of the substrate, and the angle of inclination of the optical axis of the interferometer with respect to a virtual perpendicular extending from the surface of the substrate is Φ 0 , Φ 0 = Φ 1 = sin −1 (nλ /) where Φ 1 is the tilt angle of the optical path of the diffracted light with respect to a virtual perpendicular extending from the surface, P is the distance between the guide grooves of the substrate, and λ is the wavelength of the measurement light. 2P) (n is the order of the diffracted light), an optical disk surface evaluation apparatus is proposed.

上記第三の解決手段によれば、上記第一の解決手段及び第二の解決手段を用いて基板の裏面からの反射光の影響を受けずに基板の表面の凹凸を評価することができる。 According to the third solving means, the unevenness on the surface of the substrate can be evaluated without being affected by the reflected light from the back surface of the substrate using the first and second solving means.

本発明によれば、裏面からの反射光の影響を受けずに表面の凹凸を評価することができる光ディスクの表面評価方法を実現することができる。また、そのような評価方法を実現することができる表面評価装置を得ることができる。   ADVANTAGE OF THE INVENTION According to this invention, the surface evaluation method of the optical disk which can evaluate the unevenness | corrugation of a surface, without being influenced by the reflected light from a back surface is realizable. Moreover, the surface evaluation apparatus which can implement | achieve such an evaluation method can be obtained.

本発明の光ディスクの表面評価方法及び評価装置に係る実施形態について、図面に基づいて説明する。図1に本発明の光ディスクの評価装置の概略図を示す。 An embodiment according to a surface evaluation method and an evaluation apparatus for an optical disc of the present invention will be described with reference to the drawings. FIG. 1 shows a schematic diagram of an optical disk evaluation apparatus according to the present invention.

本発明の評価装置は、計測光を発生する光源101と、入射された光の一部を反射しその他を透過することにより分割するビームスプリッタ102と、被測定物から返ってきた光と参照光とを干渉させて形成された干渉縞を撮影する撮像装置103と、ビームスプリッタ102によって反射された光を撮像装置103に向けて反射する反射板104と、を有する干渉計100を備えている。光源101は図示しない制御手段に接続されている。また撮像装置103は図示しない表示装置例えばモニター等に接続されており、観測した干渉縞を表示させる。光源101としてはレーザ光等を用いることができる。また、撮像装置103としてはCCDやCMOSセンサ等を用いたカメラを用いることができる。なお、図1ではコリメータレンズや集光レンズ等のレンズ類を便宜上省略してある。   The evaluation apparatus of the present invention includes a light source 101 that generates measurement light, a beam splitter 102 that divides a part of incident light by reflecting and transmitting others, and light returned from the object to be measured and reference light. Is provided with an interferometer 100 having an imaging device 103 that captures interference fringes formed by interference with each other and a reflecting plate 104 that reflects light reflected by the beam splitter 102 toward the imaging device 103. The light source 101 is connected to control means (not shown). The imaging device 103 is connected to a display device (not shown) such as a monitor, and displays the observed interference fringes. As the light source 101, laser light or the like can be used. As the imaging device 103, a camera using a CCD, a CMOS sensor, or the like can be used. In FIG. 1, lenses such as a collimator lens and a condenser lens are omitted for convenience.

本発明の評価装置は、この干渉計100が被測定物である光ディスク基板150の表面に対して計測光の光軸が傾斜するように設置されている。その傾斜角は基板150の表面から伸びる仮想垂線VLに対してΦにされている。このように干渉計100を傾斜させることにより、基板150の裏面からの反射光が干渉計に返ってこなくなる。一方、基板150の表面は所定のトラックピッチで案内溝が形成されているので回折格子と同じになる。そのため回折光が発生する。発生した回折光の光路は仮想垂線VLに対してΦの傾斜角を有している。回折光の光路は、一部は反射光と同じ方向であるが、他の一部は干渉計100のある方向である。ここでΦ=Φとなるように干渉計の傾斜角を設定すると、干渉計100に回折光が入射されるようになる。なお、基板150は半径方向において回折格子と同様になるので、干渉計100からの計測光の照射は基板150の半径方向から行われる。 In the evaluation apparatus of the present invention, the interferometer 100 is installed such that the optical axis of the measurement light is inclined with respect to the surface of the optical disk substrate 150 that is the object to be measured. The inclination angle is set to Φ 0 with respect to a virtual perpendicular VL extending from the surface of the substrate 150. By tilting the interferometer 100 in this way, the reflected light from the back surface of the substrate 150 does not return to the interferometer. On the other hand, the surface of the substrate 150 is the same as the diffraction grating because guide grooves are formed at a predetermined track pitch. Therefore, diffracted light is generated. The optical path of the generated diffracted light has an inclination angle of Φ 1 with respect to the virtual perpendicular VL. The optical path of the diffracted light is partly in the same direction as the reflected light, but the other part is in the direction in which the interferometer 100 is present. Here, when the tilt angle of the interferometer is set so that Φ 0 = Φ 1 , the diffracted light enters the interferometer 100. Since the substrate 150 is similar to the diffraction grating in the radial direction, the measurement light from the interferometer 100 is irradiated from the radial direction of the substrate 150.

次にこのような評価装置の動作について説明する。まず光源101から計測光MB1が出射される。計測光MB1はビームスプリッタ102で一部の光MB2が反射され、残りが透過して基板150へ照射される。一部の光MB2は反射板104で反射され、参照光RFとなって撮像装置103へ入射される。   Next, the operation of such an evaluation apparatus will be described. First, the measurement light MB1 is emitted from the light source 101. A part of the light MB2 is reflected by the beam splitter 102 and the rest of the measurement light MB1 is transmitted and irradiated onto the substrate 150. A part of the light MB2 is reflected by the reflecting plate 104 and is incident on the imaging device 103 as reference light RF.

一方計測光MB1は基板150へ傾斜角Φで照射される。続いて基板150の表面の案内溝によって回折光DFが発生し、傾斜角Φで出射される。ここでΦ=Φなので回折光DFは干渉計100に入射される。干渉計100に入射された回折光DFは、ビームスプリッタ102に反射されて撮像装置103へ入射される。このとき回折光DFと参照光RFとが干渉を起こす。回折光DFと参照光RFとの干渉によって生じた像は撮像装置103によって撮影される。 On the other hand the measurement light MB1 is irradiated at an inclination angle [Phi 0 to the substrate 150. Subsequently, the diffracted light DF is generated by the guide groove on the surface of the substrate 150 and is emitted at an inclination angle Φ 0 . Here, since Φ 0 = Φ 1, the diffracted light DF enters the interferometer 100. The diffracted light DF incident on the interferometer 100 is reflected by the beam splitter 102 and incident on the imaging device 103. At this time, the diffracted light DF and the reference light RF cause interference. An image generated by the interference between the diffracted light DF and the reference light RF is taken by the imaging device 103.

続いて回転機構151及び図示しないターンテーブル等の固定手段によって回転可能に設置されている基板150を回転させて、基板150の表面を走査させる。これにより図2または図3に示すような干渉縞が観測される。なお、回転機構151は評価装置と連動させたり、一体化させる必要は特にないが、評価装置と連動させたり一体化させても良い。回転機構151としては、スピンドルモータ等が用いられる。   Subsequently, the surface of the substrate 150 is scanned by rotating the substrate 150 rotatably installed by a rotation mechanism 151 and a fixing means such as a turntable (not shown). Thereby, interference fringes as shown in FIG. 2 or FIG. 3 are observed. Note that the rotation mechanism 151 is not particularly required to be interlocked with or integrated with the evaluation apparatus, but may be interlocked with or integrated with the evaluation apparatus. As the rotating mechanism 151, a spindle motor or the like is used.

このようにして観測される干渉縞を図2または図3に模式的に示す。図2は基板150の表面に凹凸欠陥のない状態を示すものである。基板150の表面に凹凸欠陥がない場合、略同じ幅の縞が略等間隔で同心円状に並ぶ干渉縞が観測される。   The interference fringes observed in this way are schematically shown in FIG. 2 or FIG. FIG. 2 shows a state in which the surface of the substrate 150 has no irregularities. When there is no uneven defect on the surface of the substrate 150, interference fringes are observed in which stripes having substantially the same width are arranged concentrically at substantially equal intervals.

図3は基板150の表面に凹凸欠陥がある状態を示すものである。基板150の表面に凹凸欠陥がある場合、縞の間隔が変化したり縞の幅が変化する等の、縞の形状が歪んだ部分A、B、C及びDが発生する。このような干渉縞の歪んだ部分の大きさは、凹凸欠陥の高さや面積によって変化する。基板150の評価は干渉縞の歪んだ部分の数や大きさによって行うことができる。すなわち基板150の表面の評価が干渉縞の状態を目視することによって行うことができるようになる。   FIG. 3 shows a state where the surface of the substrate 150 has irregularities. When the surface of the substrate 150 has a concavo-convex defect, portions A, B, C, and D in which the shape of the stripe is distorted, such as the interval between the stripes or the width of the stripe, are generated. The size of the distorted portion of such interference fringes varies depending on the height and area of the concavo-convex defect. The evaluation of the substrate 150 can be performed based on the number and size of the distorted portions of the interference fringes. That is, the surface of the substrate 150 can be evaluated by visually observing the state of interference fringes.

ここで、干渉計の傾斜角Φと回折光の光路の傾斜角Φとを一致させる方法について図4に基づいて説明する。表面に案内溝GVがトラックピッチPで形成されている基板150に波長λの計測光MBを入射角Φで照射すると、回折光DFが出射角Φで出射される。このときの関係は、Φ及びΦを基板150の表面から伸びる仮想垂線VLに対する角度とすると、
P×sinΦ+P×sinΦ=nλ・・・・(1)
の式で表すことができる。なお、nλのnは回折光の次数を示すもので、一次回折光であればn=1である。
Here, a method for matching the tilt angle Φ 0 of the interferometer with the tilt angle Φ 1 of the optical path of the diffracted light will be described with reference to FIG. When the measurement light MB having the wavelength λ is irradiated at the incident angle Φ 0 onto the substrate 150 having the guide grooves GV formed on the surface with the track pitch P, the diffracted light DF is emitted at the output angle Φ 1 . The relationship at this time is as follows: Φ 0 and Φ 1 are angles with respect to a virtual perpendicular VL extending from the surface of the substrate 150.
P × sinΦ 0 + P × sinΦ 1 = nλ (1)
It can be expressed by the following formula. Note that n in nλ indicates the order of the diffracted light, and n = 1 if it is the first-order diffracted light.

ここで、Φ=Φとすると、(1)式は
sinΦ=nλ/2P・・・・(2)
となる。(2)式からΦ=Φ=sin−1(nλ/2P)が得られる。すなわちこの式を満たす条件であれば干渉計の傾斜角Φと回折光の光路の傾斜角Φとを一致させることができる。例えば、トラックピッチ0.32μmのBD−Rの基板の表面を波長405nmのレーザ光で一次回折光にて計測する場合、n=1、λ=405(nm)、P=320(nm)とすると、Φ=Φ≒39.25°となる。
Here, assuming that Φ 0 = Φ 1 , the equation (1) is expressed as follows: sin Φ 0 = nλ / 2P (2)
It becomes. From the equation (2), Φ 0 = Φ 1 = sin −1 (nλ / 2P) is obtained. That is, if the condition satisfies this equation, the tilt angle Φ 0 of the interferometer and the tilt angle Φ 1 of the optical path of the diffracted light can be matched. For example, when the surface of a BD-R substrate with a track pitch of 0.32 μm is measured with a first-order diffracted light with a laser beam having a wavelength of 405 nm, n = 1, λ = 405 (nm), and P = 320 (nm). Φ 0 = Φ 1 ≈39.25 °.

次に本発明の評価装置に係る実施形態の別例について図5に基づいて説明する。前出の実施形態と異なる点は、ビームスプリッタ102向きが逆になっている点である。別例の評価装置の動作は以下のようになる。   Next, another example of the embodiment according to the evaluation apparatus of the present invention will be described with reference to FIG. The difference from the previous embodiment is that the direction of the beam splitter 102 is reversed. The operation of another example evaluation apparatus is as follows.

まず光源101から計測光MB1が出射される。計測光MB1はビームスプリッタ102で一部が透過して基板150へ照射される。残りの一部はビームスプリッタ102で反射され、参照光RFとなって撮像装置103へ入射される。   First, the measurement light MB1 is emitted from the light source 101. A part of the measurement light MB1 is transmitted through the beam splitter 102 and irradiated onto the substrate 150. The remaining part is reflected by the beam splitter 102 and enters the imaging device 103 as reference light RF.

一方計測光MB1は基板150へ傾斜角Φで照射される。続いて基板150の表面の案内溝によって回折光DFが発生し、傾斜角Φで出射される。ここでΦ=Φなので回折光DFは干渉計100に入射される。干渉計100に入射された回折光DFは、ビームスプリッタ102に反射されて反射板104へ入射される。 On the other hand the measurement light MB1 is irradiated at an inclination angle [Phi 0 to the substrate 150. Subsequently, the diffracted light DF is generated by the guide groove on the surface of the substrate 150 and is emitted at an inclination angle Φ 0 . Here, since Φ 0 = Φ 1, the diffracted light DF enters the interferometer 100. The diffracted light DF incident on the interferometer 100 is reflected by the beam splitter 102 and incident on the reflector 104.

次いで回折光DFは反射板104によって反射され、撮像装置103へ入射される。このとき回折光DFと参照光RFとが干渉を起こす。回折光DFと参照光RFとの干渉によって生じた像は撮像装置103によって撮影される。なお、作用及び効果は前出の実施形態と同様である。   Next, the diffracted light DF is reflected by the reflecting plate 104 and enters the imaging device 103. At this time, the diffracted light DF and the reference light RF cause interference. An image generated by the interference between the diffracted light DF and the reference light RF is taken by the imaging device 103. The operation and effect are the same as in the previous embodiment.

以上、本発明の光ディスクの表面評価方法と評価装置の実施形態について説明してきたが、上記に開示されているものに限定されることはなく、本発明の範囲内で適宜変更可能である。例えば干渉計100を基板150に対して傾斜させるのではなく、基板150の方を傾斜させても良い。   The embodiments of the optical disk surface evaluation method and the evaluation apparatus according to the present invention have been described above, but are not limited to those disclosed above, and can be appropriately changed within the scope of the present invention. For example, instead of inclining the interferometer 100 with respect to the substrate 150, the substrate 150 may be inclined.

本発明の評価装置を示す概略図である。It is the schematic which shows the evaluation apparatus of this invention. 本発明の評価装置で観測された干渉縞の一例である。It is an example of the interference fringe observed with the evaluation apparatus of this invention. 本発明の評価装置で観測された干渉縞の一例である。It is an example of the interference fringe observed with the evaluation apparatus of this invention. 計測光の入射角と回折光の出射角とを一致させる方法を説明するための略図である。It is the schematic for demonstrating the method to make the incident angle of measurement light and the output angle of diffracted light correspond. 本発明の評価装置の別例を示す概略図である。It is the schematic which shows another example of the evaluation apparatus of this invention. 従来の干渉計を用いた評価方法の問題点を説明するための略図である。It is the schematic for demonstrating the problem of the evaluation method using the conventional interferometer.

符号の説明Explanation of symbols

100 干渉計
101 光源
102 ビームスプリッタ
103 撮像装置
104 反射板
150 光ディスク基板
151 回転機構
DESCRIPTION OF SYMBOLS 100 Interferometer 101 Light source 102 Beam splitter 103 Image pick-up device 104 Reflector 150 Optical disk board 151 Rotation mechanism

Claims (3)

一方の面に螺旋状の案内溝が形成された基板を有する光ディスクの表面評価方法において、
計測光を発生する光源と、前記光源から発せられた計測光の一部を反射しその他を透過することにより分割するとともに前記基板から返ってきた回折光を反射するビームスプリッタと、前記基板から返ってきた前記回折光と前記計測光の一部とを干渉させて形成された干渉縞を撮影する撮像装置と、前記ビームスプリッタによって反射された前記計測光の一部または前記回折光を前記撮像装置に向けて反射する反射板と、を有する干渉計を用い、
前記干渉計の光軸を前記基板の表面に対して傾斜させた状態で計測光の照射を行い、
このときの前記干渉計の光軸の傾きと、前記回折光の光路の傾斜角と、が同じになるようにした
ことを特徴とする光ディスクの表面評価方法。
In the method for evaluating the surface of an optical disc having a substrate with a spiral guide groove formed on one side,
A light source for generating measurement light, a beam splitter for reflecting a part of the measurement light emitted from the light source and transmitting the others and splitting the reflected light and reflecting the diffracted light returned from the substrate; An imaging device that captures interference fringes formed by causing the diffracted light and a part of the measurement light to interfere with each other, and a part of the measurement light or the diffracted light reflected by the beam splitter as the imaging device Using an interferometer having a reflector that reflects toward
Irradiating measurement light with the optical axis of the interferometer inclined with respect to the surface of the substrate,
A method for evaluating the surface of an optical disc, wherein the inclination of the optical axis of the interferometer at this time is the same as the inclination angle of the optical path of the diffracted light.
前記基板の仮想垂線に対する前記干渉計の光軸の傾斜角をΦ、前記基板の仮想垂線に対する前記回折光の光路の傾斜角をΦ、前記基板の案内溝の間隔をP、計測光の波長をλとしたとき、
Φ=Φ=sin−1(nλ/2P)
(nは回折光の次数)
であることを特徴とする請求項1に記載の光ディスクの表面評価方法。
The tilt angle of the optical axis of the interferometer with respect to the virtual perpendicular of the substrate is Φ 0 , the tilt angle of the optical path of the diffracted light with respect to the virtual perpendicular of the substrate is Φ 1 , the distance between the guide grooves of the substrate is P, When the wavelength is λ,
Φ 0 = Φ 1 = sin −1 (nλ / 2P)
(N is the order of diffracted light)
The surface evaluation method for an optical disc according to claim 1, wherein
一方の面に螺旋状の案内溝が形成された基板を有する光ディスクの表面評価装置において、
計測光を発生する光源と、前記光源から発せられた計測光の一部を反射しその他を透過することにより分割するとともに前記基板から返ってきた回折光を反射するビームスプリッタと、前記基板から返ってきた前記回折光と前記計測光の一部とを干渉させて形成された干渉縞を撮影する撮像装置と、前記ビームスプリッタによって反射された前記計測光の一部または前記回折光を前記撮像装置に向けて反射する反射板と、を有する干渉計を備え、
前記干渉計は前記基板の表面に対して光軸が傾斜するように設置され、前記基板の表面から伸びる仮想垂線に対する前記干渉計の光軸の傾斜角をΦ、前記基板の表面から伸びる仮想垂線に対する前記回折光の光路の傾斜角をΦ、前記基板の案内溝の間隔をP、計測光の波長をλとしたとき、
Φ=Φ=sin−1(nλ/2P)
(nは回折光の次数)
であることを特徴とする光ディスクの表面評価装置。
In the surface evaluation apparatus for an optical disc having a substrate on which a spiral guide groove is formed on one surface,
A light source for generating measurement light, a beam splitter for reflecting a part of the measurement light emitted from the light source and transmitting the others and splitting the reflected light and reflecting the diffracted light returned from the substrate; An imaging device that captures interference fringes formed by causing the diffracted light and a part of the measurement light to interfere with each other, and a part of the measurement light or the diffracted light reflected by the beam splitter as the imaging device An interferometer having a reflector that reflects toward the
The interferometer is installed such that the optical axis is inclined with respect to the surface of the substrate, and the inclination angle of the optical axis of the interferometer with respect to a virtual perpendicular extending from the surface of the substrate is Φ 0 , and the virtual angle extending from the surface of the substrate When the tilt angle of the optical path of the diffracted light with respect to the perpendicular is Φ 1 , the distance between the guide grooves of the substrate is P, and the wavelength of the measurement light is λ,
Φ 0 = Φ 1 = sin −1 (nλ / 2P)
(N is the order of diffracted light)
An apparatus for evaluating the surface of an optical disc, wherein
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WO2025009931A1 (en) * 2023-07-06 2025-01-09 파크시스템스 주식회사 Sliding-type white light interferometer
WO2025048613A1 (en) * 2023-09-01 2025-03-06 파크시스템스 주식회사 Instantaneous white light interferometer and method of white light interferometer for capturing instantaneous white light interference pattern images
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