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JP2009290044A - Wiring substrate - Google Patents

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JP2009290044A
JP2009290044A JP2008141919A JP2008141919A JP2009290044A JP 2009290044 A JP2009290044 A JP 2009290044A JP 2008141919 A JP2008141919 A JP 2008141919A JP 2008141919 A JP2008141919 A JP 2008141919A JP 2009290044 A JP2009290044 A JP 2009290044A
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layer
wiring conductor
insulating layer
electronic component
wiring
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Seiichi Abe
誠一 阿部
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Kyocera SLC Technologies Corp
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Kyocera SLC Technologies Corp
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Abstract

【課題】 配線基板に搭載する電子部品に出し入れする信号にノイズの発生が少なく、搭載する電子部品を正常に作動させることが可能な配線基板を提供すること。
【解決手段】 絶縁基板1の上面に配線導体層2の一部から成る信号用、接地用および電源用の電子部品接続パッド5が形成されているとともに、絶縁基板1の下面に配線導体層2および貫通導体4を介して電子部品接続パッド5に電気的に接続された信号用,接地用および電源用の外部接続パッド6が形成されて成る配線基板であって、接地用または電源用の外部接続パッド6の一方は、下面側の最外層の絶縁層1bに設けた開口A内にそれよりも内側の配線導体2の一部を露出させることにより形成されている配線基板である。
【選択図】 図1
PROBLEM TO BE SOLVED: To provide a wiring board capable of operating a mounted electronic component normally with less noise generated in a signal to be taken in and out of the electronic component mounted on the wiring board.
An electronic component connection pad for signal, grounding, and power supply composed of a part of a wiring conductor layer is formed on an upper surface of an insulating substrate, and a wiring conductor layer is formed on a lower surface of the insulating substrate. And a wiring board formed with signal, grounding and power supply external connection pads 6 electrically connected to the electronic component connection pads 5 through the through conductors 4 and external to the grounding or power supply One of the connection pads 6 is a wiring board formed by exposing a part of the wiring conductor 2 inside the opening A provided in the outermost insulating layer 1b on the lower surface side.
[Selection] Figure 1

Description

本発明は、半導体素子等の電子部品を搭載するために用いられる配線基板に関する。   The present invention relates to a wiring board used for mounting electronic components such as semiconductor elements.

従来、半導体素子等の電子部品を搭載するために用いられる配線基板は、図3に示すように、例えばガラス−エポキシ板等から成るコア用の絶縁層11aとエポキシ樹脂等から成るビルドアップ用の絶縁層11bとを複数層積層して成る絶縁基板11の各絶縁層11a,11bの表面に銅箔や銅めっき膜等の導体層から成る複数の配線導体層12を設けるとともにコア用の絶縁層11aを貫通する貫通導体(以下スルーホール導体と呼ぶ)13およびビルドアップ用の各絶縁層11bを貫通する貫通導体(以下ビア導体と呼ぶ)14により上下の配線導体層12を接続して成る。このような配線基板においては、絶縁基板11の上面側における最外層の絶縁層11bの表面に設けた配線導体層12の一部が半導体素子等の電子部品Eの電極に半田バンプBを介して電気的に接続される電子部品接続パッド15を形成しているとともに絶縁基板11の下面側における最外層の絶縁層11bの表面に設けた配線導体層12の一部が外部電気回路基板(不図示)に半田ボール等の外部接続端子Tを介して電気的に接続される外部接続パッド16を形成しており、これらの電子部品接続パッド15と外部接続パッド16とは絶縁基板11の上下面の間に設けた配線導体層12およびスルーホール導体13,ビア導体14を介してそれぞれ互いに電気的に接続されている。なお、最外層の絶縁層11bの表面には電子部品接続パッド15や外部接続パッド16を所定の形状および大きさで露出させるソルダーレジスト層17が積層されている。   Conventionally, as shown in FIG. 3, a wiring board used for mounting an electronic component such as a semiconductor element is a build-up layer made of a core insulating layer 11a made of, for example, a glass-epoxy plate, and an epoxy resin. A plurality of wiring conductor layers 12 made of a conductor layer such as a copper foil or a copper plating film are provided on the surface of each insulating layer 11a, 11b of an insulating substrate 11 formed by laminating a plurality of insulating layers 11b, and an insulating layer for a core The upper and lower wiring conductor layers 12 are connected by a through conductor (hereinafter referred to as a through-hole conductor) 13 penetrating 11a and a through conductor (hereinafter referred to as a via conductor) 14 penetrating each build-up insulating layer 11b. In such a wiring substrate, a part of the wiring conductor layer 12 provided on the surface of the outermost insulating layer 11b on the upper surface side of the insulating substrate 11 is connected to an electrode of an electronic component E such as a semiconductor element via a solder bump B. A part of the wiring conductor layer 12 formed on the surface of the outermost insulating layer 11b on the lower surface side of the insulating substrate 11 is formed as an external electric circuit board (not shown). The external connection pads 16 that are electrically connected via the external connection terminals T such as solder balls are formed. The electronic component connection pads 15 and the external connection pads 16 are formed on the upper and lower surfaces of the insulating substrate 11. The wiring conductor layer 12, the through-hole conductor 13, and the via conductor 14 provided therebetween are electrically connected to each other. A solder resist layer 17 that exposes the electronic component connection pads 15 and the external connection pads 16 in a predetermined shape and size is laminated on the surface of the outermost insulating layer 11b.

そして、この配線基板は、電子部品Eの電極を半田バンプBを介して電子部品接続パッド15に電気的に接続した後、外部接続パッド16を半田ボール等の外部接続端子Tを介して外部電気回路基板(不図示)の配線導体に接続することにより搭載する電子部品Eが外部電気回路に電気的に接続されることとなる。   In this wiring board, after the electrodes of the electronic component E are electrically connected to the electronic component connection pads 15 via the solder bumps B, the external connection pads 16 are connected to the external electric terminals via the external connection terminals T such as solder balls. By connecting to a wiring conductor of a circuit board (not shown), the mounted electronic component E is electrically connected to an external electric circuit.

ところで、このような配線基板における配線導体層12は、用途によって信号用の配線導体層12(S)と接地用の配線導体層12(G)と電源用の配線導体12(P)とに機能化されている。このうち信号用の配線導体層12(S)は、半導体素子等の電子部品Eと外部電気回路基板との間で電気信号を伝播させるための導電路として機能し、細い帯状の導体パターンを有している。   By the way, the wiring conductor layer 12 in such a wiring board functions as a signal wiring conductor layer 12 (S), a grounding wiring conductor layer 12 (G), and a power wiring conductor 12 (P) depending on applications. It has become. Among them, the signal wiring conductor layer 12 (S) functions as a conductive path for propagating an electric signal between the electronic component E such as a semiconductor element and the external electric circuit board, and has a thin strip-like conductor pattern. is doing.

また、接地用の配線導体層12(G)や電源用の配線導体層12(P)は、配線基板に搭載される電子部品Eにそれぞれ接地電位や電源電位を供給する供給路としての機能を有しているとともに信号用の配線導体層12(S)に対する電磁シールド機能や特性インピーダンスの調整機能を有しており、信号用の配線導体層12(S)に対向または隣接する広面積の導体パターンを有している。   Further, the grounding conductor layer 12 (G) and the power source conductor layer 12 (P) function as a supply path for supplying a ground potential and a power source potential to the electronic component E mounted on the wiring board, respectively. A large-area conductor that has an electromagnetic shielding function and a characteristic impedance adjustment function for the signal wiring conductor layer 12 (S) and is opposite to or adjacent to the signal wiring conductor layer 12 (S). Has a pattern.

そしてこれらの信号用,接地用および電源用の配線導体層12(S),12(G),12(P)に接続された電子部品接続パッド15や外部接続パッド16もそれぞれに対応して信号用,接地用および電源用の電子部品接続パッド15(S),15(G),15(P)や信号用,接地用および電源用の外部接続パッド16(S),16(G),16(P)に分類されるが、これらは最外層の絶縁層11b表面に設けた配線導体層12の一部がそれぞれ同じ形状および大きさでソルダーレジスト層17から露出することで形成されている。
特開2004−273718号公報
The electronic component connection pads 15 and the external connection pads 16 connected to the wiring conductor layers 12 (S), 12 (G), and 12 (P) for signal, grounding, and power supply also correspond to the signals. , Grounding and power supply electronic component connection pads 15 (S), 15 (G), 15 (P) and signal, grounding and power supply external connection pads 16 (S), 16 (G), 16 Although classified into (P), these are formed by exposing a part of the wiring conductor layer 12 provided on the surface of the outermost insulating layer 11b from the solder resist layer 17 in the same shape and size.
JP 2004-273718 A

しかしながら、従来の配線基板によると、電子部品接続パッドおよび外部接続パッドは、それぞれ最外層の絶縁層の表面に設けた配線導体層の一部から形成されており、その内側に位置する配線導体層にビア導体を介して接続されている。このようなビア導体はその直径が30〜100μm程度あり、1個あたり数十pH程度のインダクタンス成分として作用するので、その分、電子部品接続パッドと外部接続パッドとの間の電気的な経路におけるインダクタンスを高めることになる。接地用や電源用の電子部品接続パッドと外部接続用パッドとの間の電気的な経路におけるインダクタンスが高い場合、配線基板に搭載する電子部品に外部接続パッドを通して例えば3GHz以上の高速の信号を出し入れすると、信号にリンギングノイズと呼ばれるノイズが発生して搭載する電子部品を正常に作動させることが困難となる。   However, according to the conventional wiring board, the electronic component connection pad and the external connection pad are each formed from a part of the wiring conductor layer provided on the surface of the outermost insulating layer, and the wiring conductor layer positioned inside thereof. Is connected to the via conductor. Such a via conductor has a diameter of about 30 to 100 μm and acts as an inductance component of about several tens of pH per piece, and accordingly, in the electrical path between the electronic component connection pad and the external connection pad. The inductance will be increased. When the inductance in the electrical path between the electronic component connection pad for grounding and power supply and the external connection pad is high, a high-speed signal of, for example, 3 GHz or more is input / output through the external connection pad to the electronic component mounted on the wiring board. As a result, noise called ringing noise is generated in the signal, and it becomes difficult to normally operate the mounted electronic component.

本発明は、かかる従来の問題点に鑑み案出されたものであり、その目的は、配線基板に搭載する電子部品に3Hz以上の高速の信号を出し入れした場合であっても、信号にノイズの発生が少なく、搭載する電子部品を正常に作動させることが可能な配線基板を提供することにある。   The present invention has been devised in view of such conventional problems. The purpose of the present invention is to reduce noise in a signal even when a high-speed signal of 3 Hz or higher is input / output to / from an electronic component mounted on a wiring board. An object of the present invention is to provide a wiring board that is less likely to occur and can normally operate electronic components to be mounted.

本発明の配線基板は、複数の絶縁層が積層されて成る絶縁基板と、該絶縁基板の表面および各絶縁層間に配設された配線導体層と、前記各絶縁層をそれぞれ貫通し、上下の前記配線導体層同士を接続する貫通導体とを有し、前記絶縁基板の上面に前記配線導体層の一部から成る信号用、接地用および電源用の電子部品接続パッドが形成されているとともに、前記絶縁基板の下面に前記配線導体層および前記貫通導体を介して前記電子部品接続パッドに電気的に接続された前記配線導体層の一部から成る信号用,接地用および電源用の外部接続パッドが形成されて成る配線基板であって、前記接地用または電源用の外部接続パッドの一方は、前記下面側の最外層の前記絶縁層に設けた開口内に該絶縁層よりも内側の前記配線導体層の一部を露出させることにより形成されていることを特徴とするものである。   The wiring board according to the present invention includes an insulating substrate formed by laminating a plurality of insulating layers, a wiring conductor layer disposed between the surface of the insulating substrate and each insulating layer, and each of the insulating layers. The wiring conductor layers have through conductors connecting the wiring conductor layers, and signal connection, grounding and power supply electronic component connection pads made of a part of the wiring conductor layers are formed on the upper surface of the insulating substrate, External connection pads for signal, grounding and power supply comprising a part of the wiring conductor layer electrically connected to the electronic component connection pad via the wiring conductor layer and the through conductor on the lower surface of the insulating substrate The wiring board formed by forming one of the external connection pads for grounding or power supply inside the insulating layer in an opening provided in the insulating layer of the outermost layer on the lower surface side Exposed part of the conductor layer And it is characterized in that it is formed by causing.

本発明の配線基板によれば、接地用または電源用の外部接続パッドの一方は、絶縁基板の下面側の最外層の絶縁層に設けた開口内に該絶縁層よりも内側の配線導体層の一部を露出させることにより形成されていることから、接地および電源用の外部接続パッドの両方が絶縁基板の下面側の最外層の表面に設けた配線導体層の一部から成る場合に比べて接地用または電源用の電子部品接続パッドと外部接続パッドとを接続するための貫通導体を絶縁層の一層分だけ少ないものとすることができる。したがってその分だけ接地用または電源用の電子部品接続パッドと外部接続パッドとの間の電気的な経路におけるインダクタンスを低いものとすることができる。これにより、配線基板に搭載する電子部品に3GHz以上の高速の信号を出し入れした場合であっても、信号にノイズの発生が少なく、搭載する電子部品を正常に作動させることが可能な配線基板を提供することができる。   According to the wiring board of the present invention, one of the external connection pads for grounding or power supply is provided in the opening provided in the outermost insulating layer on the lower surface side of the insulating substrate in the wiring conductor layer inside the insulating layer. Compared to the case where both the grounding and power supply external connection pads are made of a part of the wiring conductor layer provided on the outermost layer surface on the lower surface side of the insulating substrate because it is formed by exposing a part. The number of through conductors for connecting the electronic component connection pads for grounding or power supply and the external connection pads can be reduced by one layer of the insulating layer. Accordingly, the inductance in the electrical path between the grounding or power supply electronic component connection pad and the external connection pad can be reduced accordingly. As a result, even when a high-speed signal of 3 GHz or more is input / output to / from an electronic component mounted on the wiring board, a wiring board that generates less noise in the signal and can normally operate the mounted electronic component. Can be provided.

次に、本発明の配線基板を添付の図面に基づき詳細に説明する。
図1は、本発明の配線基板の実施形態の一例を示す断面模式図である。図1において1は絶縁基板、2は配線導体、3,4は貫通導体、5は電子部品接続パッド、6は外部接続パッドであり、主としてこれらで半導体素子等の電子部品Eを搭載するための配線基板が構成される。
Next, the wiring board of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a schematic cross-sectional view showing an example of an embodiment of a wiring board according to the present invention. In FIG. 1, 1 is an insulating substrate, 2 is a wiring conductor, 3 and 4 are through conductors, 5 is an electronic component connection pad, and 6 is an external connection pad. These are mainly used for mounting an electronic component E such as a semiconductor element. A wiring board is configured.

絶縁基板1は、例えばガラス繊維を縦横に織り込んだガラス織物にエポキシ樹脂やビスマレイミドトリアジン樹脂等の熱硬化性樹脂を含浸させて成るコア用の絶縁層1aの上下面にエポキシ樹脂やビスマレイミドトリアジン樹脂等の熱硬化性樹脂から成るビルドアップ用の絶縁層1bがそれぞれ複数層ずつ積層されて成り、各絶縁層1a,1bの表面に銅箔や銅めっき膜等の導体層から成る複数の配線導体層2が形成されているとともに、コア用の絶縁層1aを貫通して貫通導体(以下スルーホール導体と呼ぶ)3および各ビルドアップ用の絶縁層1bを貫通して貫通導体(以下ビア導体と呼ぶ)4が形成されている。   The insulating substrate 1 is made of, for example, epoxy resin or bismaleimide triazine on the upper and lower surfaces of a core insulating layer 1a formed by impregnating a glass fabric in which glass fibers are woven vertically and horizontally with a thermosetting resin such as epoxy resin or bismaleimide triazine resin. A plurality of build-up insulating layers 1b made of a thermosetting resin such as a resin are laminated, and a plurality of wirings made of a conductor layer such as a copper foil or a copper plating film on the surface of each insulating layer 1a, 1b. A conductor layer 2 is formed, and penetrates through the core insulating layer 1a and penetrates through conductors (hereinafter referred to as through-hole conductors) 3 and each build-up insulating layer 1b. 4) is formed.

絶縁基板1を構成するコア用の絶縁層1aは、厚みが0.3〜1.5mm程度であり、その上面から下面にかけて直径が0.2〜1.0mm程度の複数の貫通孔(以下スルーホールと呼ぶ)7を有している。そして、その上下面には配線導体層2が被着されているとともに各スルーホール7の内面には、スルーホール導体3が被着されており、絶縁層1aの上下面の配線導体層2がスルーホール導体3を介して電気的に接続されている。   The core insulating layer 1a constituting the insulating substrate 1 has a thickness of about 0.3 to 1.5 mm, and has a plurality of through holes (hereinafter referred to as through holes) having a diameter of about 0.2 to 1.0 mm from the upper surface to the lower surface. 7). And the wiring conductor layer 2 is attached to the upper and lower surfaces, and the through-hole conductor 3 is attached to the inner surface of each through-hole 7, and the wiring conductor layers 2 on the upper and lower surfaces of the insulating layer 1a are formed. They are electrically connected through the through-hole conductor 3.

このような絶縁層1aは、ガラス織物に未硬化の熱硬化性樹脂を含浸させたシートを熱硬化させた後、これに上面から下面にかけてドリル加工を施すことにより製作される。なお、絶縁層1a上下面の配線導体層2は、絶縁層1a用のシートの上下全面に厚みが5〜50μm程度の銅箔を貼着しておくとともに、この銅箔をシートの硬化後にエッチング加工することにより所定のパターンに形成される。また、スルーホール7内面のスルーホール導体3は、絶縁層1aにスルーホール7を設けた後に、このスルーホール7内面に無電解めっき法および電解めっき法により厚みが5〜50μm程度の銅めっき膜を析出させることにより形成される。   Such an insulating layer 1a is manufactured by thermally curing a sheet in which a glass fabric is impregnated with an uncured thermosetting resin, and then drilling the sheet from the upper surface to the lower surface. In addition, the wiring conductor layer 2 on the upper and lower surfaces of the insulating layer 1a has a copper foil having a thickness of about 5 to 50 μm attached to the entire upper and lower surfaces of the sheet for the insulating layer 1a, and the copper foil is etched after the sheet is cured. A predetermined pattern is formed by processing. The through-hole conductor 3 on the inner surface of the through-hole 7 is provided with a copper plating film having a thickness of about 5 to 50 μm by electroless plating and electrolytic plating on the inner surface of the through-hole 7 after providing the through-hole 7 in the insulating layer 1a. It is formed by precipitating.

さらに、絶縁層1aは、そのスルーホール7の内部にエポキシ樹脂やビスマレイミドトリアジン樹脂等の熱硬化性樹脂から成る孔埋め樹脂8が充填されている。孔埋め樹脂8は、スルーホール7を塞ぐことによりスルーホール7の直上および直下にビルドアップ用の絶縁層1bを形成可能とするためのものであり、未硬化のペースト状の熱硬化性樹脂をスルーホール7内にスクリーン印刷法により充填し、これを熱硬化させた後、その上下面を略平坦に研磨することにより形成される。そして、この孔埋め樹脂8を含む絶縁層1aの上下面に絶縁層1bが積層されている。   Furthermore, the insulating layer 1 a is filled with a hole filling resin 8 made of a thermosetting resin such as an epoxy resin or a bismaleimide triazine resin in the through hole 7. The hole-filling resin 8 is for making it possible to form a build-up insulating layer 1b directly above and below the through-hole 7 by closing the through-hole 7, and an uncured paste-like thermosetting resin is used. The through hole 7 is formed by filling the through hole 7 by screen printing and thermally curing it, and then polishing the upper and lower surfaces thereof substantially flatly. The insulating layer 1b is laminated on the upper and lower surfaces of the insulating layer 1a including the hole filling resin 8.

絶縁層1aの上下面に積層された絶縁層1bは、それぞれの厚みが20〜50μm程度であり、各層の上面から下面にかけて直径が30〜100μm程度の複数の貫通孔(以下ビアホールと呼ぶ)9を有している。これらの絶縁層1bは、複数の配線導体層2を高密度に配線するための絶縁間隔を提供するためのものであり、絶縁層1bにはその表面に配線導体層2およびビアホール9内にビア導体4が形成されている。そして、上層の配線導体層2と下層の配線導体層2とをビアホール9内のビア導体4を介して電気的に接続することにより高密度配線を立体的に形成可能としている。   The insulating layer 1b laminated on the upper and lower surfaces of the insulating layer 1a has a thickness of about 20 to 50 μm and a plurality of through holes (hereinafter referred to as via holes) 9 having a diameter of about 30 to 100 μm from the upper surface to the lower surface of each layer. have. These insulating layers 1b are provided to provide an insulating interval for wiring the plurality of wiring conductor layers 2 with high density, and the insulating layer 1b has vias in the wiring conductor layers 2 and via holes 9 on the surface thereof. A conductor 4 is formed. The upper wiring conductor layer 2 and the lower wiring conductor layer 2 are electrically connected via the via conductor 4 in the via hole 9 so that a high-density wiring can be formed in three dimensions.

このような絶縁層1bは、厚みが20〜50μm程度の未硬化の熱硬化性樹脂フィルムを絶縁層1aの上下面に貼着し、これを熱硬化させるとともにレーザ加工によりビアホール9を穿孔し、さらにその上に同様にして次の絶縁層1bを順次積み重ねることによって形成される。なお、各絶縁層1b表面に形成された配線導体層2およびビアホール9内に形成されたビア導体4は、各絶縁層1bを形成する毎に各絶縁層1bの表面およびビアホール9内に5〜50μm程度の厚みの銅めっき膜を公知のセミアディティブ法やサブトラクティブ法等のパターン形成法により所定のパターンに被着させることによって形成される。   Such an insulating layer 1b is obtained by sticking an uncured thermosetting resin film having a thickness of about 20 to 50 μm to the upper and lower surfaces of the insulating layer 1a, thermosetting it, and drilling the via hole 9 by laser processing, Further, the next insulating layer 1b is sequentially stacked thereon in the same manner. The wiring conductor layer 2 formed on the surface of each insulating layer 1b and the via conductor 4 formed in the via hole 9 are added to the surface of each insulating layer 1b and the via hole 9 every time each insulating layer 1b is formed. It is formed by depositing a copper plating film having a thickness of about 50 μm in a predetermined pattern by a known pattern forming method such as a semi-additive method or a subtractive method.

さらに、この例では最外層の絶縁層1b上にソルダーレジスト層10が被着されている。ソルダーレジスト層10は、例えばアクリル変性エポキシ樹脂にシリカやタルク等の無機物粉末フィラーを30〜70質量%程度分散させた絶縁材料から成り、最外層の配線導体層2同士の電気的絶縁信頼性を高める作用をなす。   Further, in this example, the solder resist layer 10 is deposited on the outermost insulating layer 1b. The solder resist layer 10 is made of an insulating material in which an inorganic powder filler such as silica or talc is dispersed in an acrylic-modified epoxy resin, for example, and has an electrical insulation reliability between the outermost wiring conductor layers 2. It works to increase.

このようなソルダーレジスト層10は、その厚みが10〜50μm程度であり、感光性を有するソルダーレジスト層10用の未硬化樹脂ペーストをロールコーター法やスクリーン印刷法を採用して最外層の絶縁層1b上に塗布し、これを乾燥させた後、露光および現像処理を行なって電子部品接続パッド5や外部接続パッド6を露出させる開口を形成した後、これを熱硬化させることによって形成される。あるいは、ソルダーレジスト層10用の未硬化の樹脂フィルムを最上層の絶縁層1b上に貼着した後、これを熱硬化させ、しかる後、電子部品接続パッド5や外部接続パッド6に対応する位置にレーザ光を照射し、硬化した樹脂フィルムを部分的に除去することによって電子部品接続パッド5や外部接続パッド6を露出させる開口を有するように形成される。   Such a solder resist layer 10 has a thickness of about 10 to 50 μm, and an uncured resin paste for the solder resist layer 10 having photosensitivity is applied to the outermost insulating layer by using a roll coater method or a screen printing method. It is formed by applying on 1b and drying it, then performing exposure and development processes to form openings for exposing the electronic component connection pads 5 and external connection pads 6, and then thermally curing them. Alternatively, after an uncured resin film for the solder resist layer 10 is stuck on the uppermost insulating layer 1b, this is thermally cured, and then the positions corresponding to the electronic component connection pads 5 and the external connection pads 6 Are formed so as to have openings for exposing the electronic component connection pads 5 and the external connection pads 6 by partially removing the cured resin film.

絶縁基板1の絶縁層1a,1bの表面に形成された配線導体層2は、半導体素子等の電子部品Eの各電極(信号用,接地用および電源用電極)を外部電気回路基板(不図示)に電気的に接続するための導電路として機能し、電子部品Eの各電極に対応して信号用の配線導体層2(S),接地用の配線導体層2(G),電源用の配線導体層2(P)をそれぞれ有しており、絶縁基板1の上面側における最外層の絶縁層1bの表面に設けた配線導体層2の一部が半導体素子等の電子部品Eの電極に半田バンプBを介して電気的に接続される電子部品接続パッド5を形成しているとともに絶縁基板1の下面側における最外層の絶縁層1bの表面に設けた配線導体層2の一部が外部電気回路基板(不図示)に半田ボール等の外部接続端子Tを介して電気的に接続される外部接続パッド6を形成しており、これらの電子部品接続パッド5と外部接続パッド6とは絶縁基板1の上下面の間に設けた配線導体層2およびスルーホール導体3,ビア導体4を介してそれぞれ互いに電気的に接続されている。なお、電子部品接続パッド5および外部接続パッド6も、これらに接続される配線導体層2に対応して信号用の電子部品接続パッド5(S),接地用の電子部品接続パッド5(G)および電源用の電子部品接続パッド5(P)と信号用の外部接続パッド6(S),接地用の外部接続パッド6(G)および電源用の外部接続パッド6(P)を有している。   The wiring conductor layer 2 formed on the surfaces of the insulating layers 1a and 1b of the insulating substrate 1 is used to connect each electrode (signal, ground and power supply electrode) of the electronic component E such as a semiconductor element to an external electric circuit board (not shown). ) Function as a conductive path for electrical connection, and corresponding to each electrode of the electronic component E, the signal wiring conductor layer 2 (S), the ground wiring conductor layer 2 (G), and the power supply Each has a wiring conductor layer 2 (P), and a part of the wiring conductor layer 2 provided on the surface of the outermost insulating layer 1 b on the upper surface side of the insulating substrate 1 serves as an electrode of an electronic component E such as a semiconductor element. An electronic component connection pad 5 electrically connected via the solder bump B is formed, and a part of the wiring conductor layer 2 provided on the surface of the outermost insulating layer 1b on the lower surface side of the insulating substrate 1 is externally provided. Electricity is supplied to an electric circuit board (not shown) via external connection terminals T such as solder balls External connection pads 6 that are connected to each other are formed, and these electronic component connection pads 5 and external connection pads 6 are formed between the wiring conductor layer 2 and the through-hole conductors 3 provided between the upper and lower surfaces of the insulating substrate 1. They are electrically connected to each other via via conductors 4. The electronic component connection pad 5 and the external connection pad 6 also correspond to the wiring conductor layer 2 connected to them, and the signal electronic component connection pad 5 (S) and the grounding electronic component connection pad 5 (G). And a power supply electronic component connection pad 5 (P), a signal external connection pad 6 (S), a ground external connection pad 6 (G), and a power supply external connection pad 6 (P). .

信号用の配線導体層2(S)は、搭載される電子部品Eと外部電気回路基板(不図示)との間で周波数が100M〜10GHz程度の高速の電気信号を伝播させるための細い帯状パターンを例えば絶縁基板1の上面側における最外層の絶縁層1bと次層の絶縁層1bとの間に有している。そして、この帯状パターンの一端部は絶縁基板1の上面側における最外層の絶縁層1bを貫通するビア導体4を介して最外層の絶縁層1bの表面に設けた信号用の電子部品接続パッド5(S)に接続されており、他端部はこの帯状パターンより下側の絶縁層1bに設けたビア導体4および絶縁層1aに設けたスルーホール導体3を介して絶縁基板1の下面側における最外層の絶縁層1bの表面に設けた信号用の外部接続パッド6(S)に電気的に接続されている。   The signal wiring conductor layer 2 (S) is a thin strip pattern for propagating a high-speed electric signal having a frequency of about 100 M to 10 GHz between the electronic component E to be mounted and an external electric circuit board (not shown). For example, between the outermost insulating layer 1 b and the next insulating layer 1 b on the upper surface side of the insulating substrate 1. One end of the belt-like pattern is connected to a signal electronic component connection pad 5 provided on the surface of the outermost insulating layer 1b through a via conductor 4 penetrating the outermost insulating layer 1b on the upper surface side of the insulating substrate 1. The other end is connected to the lower surface side of the insulating substrate 1 via the via conductor 4 provided in the insulating layer 1b below the band-like pattern and the through-hole conductor 3 provided in the insulating layer 1a. It is electrically connected to a signal external connection pad 6 (S) provided on the surface of the outermost insulating layer 1b.

接地用の配線導体層2(G)は、搭載される電子部品Eに接地電位を供給するとともに信号用の配線導体層2(S)に対する電磁シールド機能や特性インピーダンス調整機能をもたらすために二次元的な広がりを有して延在する広面積の導体プレーンを例えば絶縁基板1の上面側および下面側における最外層の絶縁層1bの表面ならびに絶縁層1aの下面に有している。このうち、絶縁基板1の上面側における最外層の絶縁層1bの表面に形成された接地用の配線導体層2(G)の一部はソルダーレジスト層10から露出して接地用の電子部品接続パッド5(G)を形成しており、絶縁基板1の下面側における最外層の絶縁層1bの表面に形成された接地用の配線導体層2(G)の一部はソルダーレジスト層10から露出して接地用の外部接続パッド6(G)を形成している。そして、絶縁層1aに設けたスルーホール導体3および絶縁層1bに設けたビア導体4を介して互に電気的に接続されている。なお、絶縁基板1の上面側および下面側における最外層の絶縁層1bの表面ならびに絶縁層1aの下面に延在する導体プレーンから成る接地用の配線導体層2(G)は、同一面上に信号用および電源用の配線導体層2(S),2(P)が存在する位置では、それらの配線導体層2(S),2(P)を所定の間隔で取り囲むクリアランスを有して延在している。   The ground wiring conductor layer 2 (G) is two-dimensional in order to supply a ground potential to the electronic component E to be mounted and to provide an electromagnetic shield function and a characteristic impedance adjustment function for the signal wiring conductor layer 2 (S). A wide-area conductor plane extending with a general spread is provided on the surface of the outermost insulating layer 1b and the lower surface of the insulating layer 1a on the upper surface side and the lower surface side of the insulating substrate 1, for example. Among these, a part of the grounding wiring conductor layer 2 (G) formed on the surface of the outermost insulating layer 1 b on the upper surface side of the insulating substrate 1 is exposed from the solder resist layer 10 and connected to the grounding electronic component. A pad 5 (G) is formed, and a part of the ground wiring conductor layer 2 (G) formed on the surface of the outermost insulating layer 1 b on the lower surface side of the insulating substrate 1 is exposed from the solder resist layer 10. Thus, an external connection pad 6 (G) for grounding is formed. And they are electrically connected to each other through a through-hole conductor 3 provided in the insulating layer 1a and a via conductor 4 provided in the insulating layer 1b. The surface of the outermost insulating layer 1b on the upper surface side and the lower surface side of the insulating substrate 1 and the ground wiring conductor layer 2 (G) composed of the conductor plane extending on the lower surface of the insulating layer 1a are on the same surface. At positions where the signal and power wiring conductor layers 2 (S) and 2 (P) are present, the wiring conductor layers 2 (S) and 2 (P) are extended with a clearance surrounding the wiring conductor layers 2 (S) and 2 (P) at a predetermined interval. Exist.

電源用の配線導体層2(P)は、搭載される電子部品Eに電源電位を供給するとともに信号用の配線導体層2(S)に対する電磁シールド機能や特性インピーダンス調整機能をもたらすために二次元的な広がりを有して延在する広面積の導体プレーンを例えば絶縁層1aの上面および絶縁基板1の下面側における最外層の絶縁層1bと次の絶縁層1bとの間に有している。このうち、絶縁層1aの上面に形成された電源用の配線導体層2(P)はそれより上側の絶縁層1bを貫通するビア導体4を介して電源用の電子部品接続パッド5(P)に接続されており、絶縁基板1の下面側における最外層の絶縁層1bと次の絶縁層1bとの間に設けられた配線導体層2(P)の一部は電源用の外部接続パッド6(P)を形成している。そして、絶縁層1aに設けたスルーホール導体3および絶縁層1bに設けたビア導体4を介して互に電気的に接続されている。なお、絶縁層1aの上面および絶縁基板1の下面側における最外層の絶縁層1bと次の絶縁層1bとの間に延在する導体プレーンから成る電源用の配線導体層2(P)は、同一面上に信号用および接地用の配線導体層2(S),2(G)が存在する位置では、それらの配線導体層2(S),2(G)を所定の間隔で取り囲むクリアランスを有して延在している。   The power supply wiring conductor layer 2 (P) is two-dimensional in order to supply a power supply potential to the mounted electronic component E and to provide an electromagnetic shielding function and a characteristic impedance adjustment function for the signal wiring conductor layer 2 (S). For example, a conductor plane having a wide area extending with a general spread is provided between the outermost insulating layer 1b and the next insulating layer 1b on the upper surface of the insulating layer 1a and the lower surface side of the insulating substrate 1, for example. . Among these, the power supply wiring conductor layer 2 (P) formed on the upper surface of the insulating layer 1 a is connected to the power supply electronic component connection pad 5 (P) via the via conductor 4 penetrating the insulating layer 1 b above it. A part of the wiring conductor layer 2 (P) provided between the outermost insulating layer 1 b and the next insulating layer 1 b on the lower surface side of the insulating substrate 1 is an external connection pad 6 for power supply. (P) is formed. And they are electrically connected to each other through a through-hole conductor 3 provided in the insulating layer 1a and a via conductor 4 provided in the insulating layer 1b. In addition, the wiring conductor layer 2 (P) for power supply composed of a conductor plane extending between the outermost insulating layer 1b and the next insulating layer 1b on the upper surface of the insulating layer 1a and the lower surface side of the insulating substrate 1 is: At positions where the signal and ground wiring conductor layers 2 (S) and 2 (G) are present on the same surface, a clearance surrounding the wiring conductor layers 2 (S) and 2 (G) at a predetermined interval is provided. Have and extend.

そして本発明においては、絶縁基板1の下面側における最外層の絶縁層1bに、それよりも内側に設けられた電源用の配線導体層2(P)の一部を露出させる開口Aが形成されており、この開口A内に露出する電源用の配線導体層2(P)が電源用の外部接続パッド6(P)を形成している。このように、電源用の外部接続パッド6(P)が絶縁基板1の下面側における最外層の絶縁層1bに設けた開口A内にそれよりも内側の電源用配線導体層2(P)の一部を露出させることにより形成されていることから、電源用の外部接続パッド6(P)が絶縁基板1の下面側における最外層の絶縁層1b表面に設けられた場合と比較して、電源用の電子部品接続パッド5(P)と外部接続パッド6(P)とを接続するためのビア導体4を絶縁層1bの一層分だけ少なくすることができる。したがって、その分だけ電源用の電子部品接続パッド5(P)と外部接続パッド6(P)との間の電気的な経路におけるインダクタンスを低いものとすることができるので、配線基板に搭載する電子部品Eに3GHz以上の高速の信号を出し入れした場合であっても、信号にノイズの発生が少なく、搭載する電子部品Eを正常に作動させることが可能な配線基板を提供することができる。   In the present invention, the outermost insulating layer 1b on the lower surface side of the insulating substrate 1 is formed with an opening A that exposes a part of the power supply wiring conductor layer 2 (P) provided on the inner side of the insulating layer 1b. The power supply wiring conductor layer 2 (P) exposed in the opening A forms a power supply external connection pad 6 (P). In this manner, the power supply external connection pad 6 (P) is formed in the power supply wiring conductor layer 2 (P) inside the opening A provided in the outermost insulating layer 1 b on the lower surface side of the insulating substrate 1. Compared with the case where the external connection pad 6 (P) for power supply is provided on the surface of the outermost insulating layer 1 b on the lower surface side of the insulating substrate 1 because it is formed by exposing a part. The number of via conductors 4 for connecting the electronic component connection pads 5 (P) and the external connection pads 6 (P) can be reduced by one layer of the insulating layer 1b. Accordingly, the inductance in the electrical path between the electronic component connection pad 5 (P) for power supply and the external connection pad 6 (P) can be reduced by that much, so that the electronic mounted on the wiring board can be reduced. Even when a high-speed signal of 3 GHz or more is input / output to / from the component E, it is possible to provide a wiring board that generates less noise in the signal and can normally operate the mounted electronic component E.

このとき、電源用の外部接続パッド6(P)を形成する配線導体層2(P)が絶縁層1b間に二次元的な広がりを有して延在する導体プレーンである場合、この導体プレーンにより電源用の電子部品接続パッド5(P)と外部接続パッド6(P)との間の電気的な経路におけるインダクタンスをさらに低いものとすることができる。したがって、電源用の外部接続パッド6(P)を形成する配線導体層2(P)は絶縁層1b間に二次元的な広がりを有して延在する導体プレーンであることが好ましい。   At this time, when the wiring conductor layer 2 (P) forming the external connection pad 6 (P) for power supply is a conductor plane extending with a two-dimensional extension between the insulating layers 1 b, this conductor plane Thus, the inductance in the electrical path between the power supply electronic component connection pad 5 (P) and the external connection pad 6 (P) can be further reduced. Therefore, the wiring conductor layer 2 (P) forming the external connection pad 6 (P) for power supply is preferably a conductor plane extending with a two-dimensional extension between the insulating layers 1 b.

なお、絶縁基板1の下面側における最外層の絶縁層1bに、それよりも内側に設けられた電源用の配線導体層2(P)の一部を電源用の外部接続パッド6(P)として露出させる開口Aを形成するには、図2(a)に示すように、最外層の絶縁層1bの表面にソルダーレジスト層10を形成した後、図2(b)に示すように、絶縁基板1の下面側の最下層の絶縁層1bにレーザ加工を施し、開口Aを形成した後、電源用の外部接続パッド6(P)の表面に残る樹脂残渣を化学的あるいは物理的に除去する方法が採用される。   A part of the power supply conductor layer 2 (P) provided on the outermost insulating layer 1 b on the lower surface side of the insulating substrate 1 is used as a power supply external connection pad 6 (P). In order to form the opening A to be exposed, as shown in FIG. 2A, after forming the solder resist layer 10 on the surface of the outermost insulating layer 1b, as shown in FIG. A method of chemically or physically removing the resin residue remaining on the surface of the external connection pad 6 (P) for power supply after laser processing is performed on the lowermost insulating layer 1b on the lower surface side of the substrate 1 and the opening A is formed. Is adopted.

なお、本発明は上述の実施形態例に限定されるものではなく、本発明の要旨を逸脱しない範囲であれば、種々の変更は可能であり、例えば上述の実施形態例では電源用の外部接続パッド6(P)を形成するための配線導体層2(P)を絶縁基板1の下面側における最外層の絶縁層1bとその次の絶縁層1bとの間に設け、その一部を最外層の絶縁層1bに設けた開口A内に露出させることにより電源用の外部接続パッド6(P)を形成した例を示したが、上述の例における接地用の配線導体層2(G)と電源用の配線導体層2(P)とを入替え、接地用の外部接続パッド6(G)を形成するための配線導体層2(G)を絶縁基板1の下面側における最外層の絶縁層1bとその次の絶縁層1bとの間に設け、その一部を最外層の絶縁層1bに設けた開口A内に露出させることにより接地用の外部接続パッド6(G)を形成した構成としても良い。さらには電子部品接続パッド5においても同様の構成により接地用または電源用の電子部品接続パッド5(G),5(P)を形成してもよい。   The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention. For example, in the above-described embodiment, an external connection for a power source is possible. A wiring conductor layer 2 (P) for forming the pad 6 (P) is provided between the outermost insulating layer 1 b and the next insulating layer 1 b on the lower surface side of the insulating substrate 1, and a part thereof is the outermost layer. Although an example in which the external connection pad 6 (P) for power supply is formed by exposing it in the opening A provided in the insulating layer 1b is shown, the wiring conductor layer 2 (G) for grounding and the power supply in the above example are shown. The wiring conductor layer 2 (P) is replaced with the wiring conductor layer 2 (G) for forming the external connection pad 6 (G) for grounding with the outermost insulating layer 1 b on the lower surface side of the insulating substrate 1. Provided between it and the next insulating layer 1b, and part of it is provided on the outermost insulating layer 1b. Was by exposed in the opening A may be configured to form an external connection pad 6 (G) for grounding. Further, the electronic component connection pads 5 (G) and 5 (P) for grounding or power supply may be formed in the electronic component connection pads 5 with the same configuration.

本発明の配線基板の一実施形態例を示す断面模式図である。It is a cross-sectional schematic diagram which shows one example of embodiment of the wiring board of this invention. (a),(b)は、図1に示す配線基板の製造方法を説明するための断面模式図である。(A), (b) is a cross-sectional schematic diagram for demonstrating the manufacturing method of the wiring board shown in FIG. 従来の配線基板を示す断面模式図である。It is a cross-sectional schematic diagram which shows the conventional wiring board.

符号の説明Explanation of symbols

1:絶縁基板
1a,1b:絶縁層
2:配線導体層
2(S):信号用の配線導体層
2(G):接地用の配線導体層
2(P):電源用の配線導体層
3:貫通導体(スルーホール導体)
4:貫通導体(ビア導体)
5:電子部品接続パッド
5(S):信号用の電子部品接続パッド
5(G):接地用の電子部品接続パッド
5(P):電源用の電子部品接続パッド
6:外部接続パッド
6(S):信号用の外部接続パッド
6(G):接地用の外部接続パッド
6(P):電源用の外部接続パッド
A:絶縁層1bに設けた開口
1: Insulating substrate 1a, 1b: Insulating layer 2: Wiring conductor layer 2 (S): Wiring conductor layer for signals 2 (G): Wiring conductor layer for grounding 2 (P): Wiring conductor layer for power supply 3: Through conductor (through hole conductor)
4: Through conductor (via conductor)
5: Electronic component connection pad 5 (S): Signal electronic component connection pad 5 (G): Ground electronic component connection pad 5 (P): Power supply electronic component connection pad 6: External connection pad 6 (S ): External connection pad for signal 6 (G): External connection pad for grounding 6 (P): External connection pad for power supply A: Opening provided in insulating layer 1b

Claims (2)

複数の絶縁層が積層されて成る絶縁基板と、該絶縁基板の表面および各絶縁層間に配設された配線導体層と、前記各絶縁層をそれぞれ貫通し、上下の前記配線導体層同士を接続する貫通導体とを有し、前記絶縁基板の上面に前記配線導体層の一部から成る信号用、接地用および電源用の電子部品接続パッドが形成されているとともに、前記絶縁基板の下面に前記配線導体層および前記貫通導体を介して前記電子部品接続パッドに電気的に接続された前記配線導体層の一部から成る信号用,接地用および電源用の外部接続パッドが形成されて成る配線基板であって、前記接地用または電源用の外部接続パッドの一方は、前記下面側の最外層の前記絶縁層に設けた開口内に該絶縁層よりも内側の前記配線導体層の一部を露出させることにより形成されていることを特徴とする配線基板。   An insulating substrate formed by laminating a plurality of insulating layers, a wiring conductor layer disposed between the surface of the insulating substrate and each insulating layer, and penetrating each of the insulating layers, and connecting the upper and lower wiring conductor layers to each other A signal conductor, a grounding and a power supply electronic component connection pad formed of a part of the wiring conductor layer on the upper surface of the insulating substrate, and the lower surface of the insulating substrate A wiring board comprising signal wiring, grounding and power supply external connection pads formed of a part of the wiring conductor layer electrically connected to the electronic component connection pad via the wiring conductor layer and the through conductor One of the external connection pads for grounding or power supply exposes a part of the wiring conductor layer inside the insulating layer in an opening provided in the insulating layer on the outermost layer on the lower surface side. By forming Wiring board, characterized by being. 前記接地用または電源用の外部接続パッドを形成する前記配線導体層は、前記絶縁層間に二次元的な広がりを有して延在する導体プレーンであることを特徴とする請求項1記載の配線基板。   2. The wiring according to claim 1, wherein the wiring conductor layer forming the external connection pad for grounding or power supply is a conductor plane extending two-dimensionally between the insulating layers. substrate.
JP2008141919A 2008-05-30 2008-05-30 Wiring substrate Pending JP2009290044A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008141919A JP2009290044A (en) 2008-05-30 2008-05-30 Wiring substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
JP2009290044A true JP2009290044A (en) 2009-12-10

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Country Status (1)

Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012023362A1 (en) * 2010-08-20 2012-02-23 シャープ株式会社 Ion generation device and electrical device
JP2017174931A (en) * 2016-03-23 2017-09-28 京セラ株式会社 Wiring board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012023362A1 (en) * 2010-08-20 2012-02-23 シャープ株式会社 Ion generation device and electrical device
JP2012043702A (en) * 2010-08-20 2012-03-01 Sharp Corp Ion generator and electrical equipment
US9142378B2 (en) 2010-08-20 2015-09-22 Sharp Kabushiki Kaisha Ion generating device and electrical apparatus which can easily be reduced in size and thickness
JP2017174931A (en) * 2016-03-23 2017-09-28 京セラ株式会社 Wiring board

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