JP2009276508A - Liquid crystal device and electronic device - Google Patents

Abstract

In a conventional liquid crystal display device, it is difficult to improve display quality.
SOLUTION: A first substrate 51, a second substrate 81 facing the first substrate 51, a liquid crystal 19 interposed between the first substrate 51 and the second substrate 81, and between the first substrate 51 and the liquid crystal 19 are provided. A reflective film 67 that reflects the light incident on the liquid crystal 19 through the second substrate 81 toward the second substrate 81, a plurality of wirings interposed between the first substrate 51 and the reflective film 67, and a plane A relaxation layer 65 that is provided between the wirings adjacent to each other in view and relaxes a step due to the wiring, and the relaxation layer 65 is interposed between the first substrate 51 and the reflective film 67, The liquid crystal device is provided at least in a region overlapping with the reflective film 67 in plan view.
[Selection] Figure 4

Description

  The present invention relates to a liquid crystal device and an electronic apparatus.

  Conventionally, a liquid crystal device capable of performing reflective display is known (for example, see Patent Document 1).

JP 2008-33371 A

In the liquid crystal device described in Patent Document 1, a concavo-convex pattern is provided in a region where reflection display is performed. In this liquid crystal device, the concavo-convex pattern is reflected in the liquid crystal layer, and the thickness of the liquid crystal differs between the convex and concave portions of the concavo-convex pattern.
The difference in thickness of the liquid crystal means that the retardation (product of birefringence and thickness) of the liquid crystal is different. If the retardation of the liquid crystal is different, the modulation state of the light modulated by the liquid crystal is different.
For this reason, in the liquid crystal device described in Patent Document 1, the modulation state of light by the liquid crystal tends to vary. As a result, the contrast in display tends to decrease.

Therefore, it is conceivable to reduce the reflection of the uneven pattern on the liquid crystal layer by interposing a planarizing layer between the uneven pattern and the liquid crystal.
As a configuration in which a planarization layer is interposed between the uneven pattern and the liquid crystal, for example, a configuration of an element substrate 601 shown in FIG. 24 can be considered.
In the element substrate 601, a TFT element 607, a reflective film 609, and a pixel electrode 611 are provided on the substrate 603 corresponding to each pixel 605.

The TFT element 607 is provided on the substrate 603 and is covered with an insulating film 613. A resin layer 615 is provided over the insulating film 613. The resin layer 615 is provided with an uneven pattern 617. The reflective film 609 is provided on the uneven pattern 617. The planarization layer 619 is provided over the resin layer 615 and the reflective film 609. The pixel electrode 611 is provided over the planarization layer 619. The pixel electrode 611 is covered with an alignment film 621.
With the above structure, reflection of the uneven pattern 617 on the liquid crystal layer can be reduced.

Incidentally, in the element substrate 601 shown in FIG. 24, wirings such as a gate line connected to the gate electrode 623 and a source line connected to the source electrode 625 are interposed between the substrate 603 and the resin layer 615.
As shown in FIG. 25, the gate line 627 is provided on the substrate 603 and is covered with a gate insulating film 629.
The source line 631 is provided on the gate insulating film 629 and covered with the insulating film 613 as shown in FIG. 26 which is a cross-sectional view taken along the line VV in FIG.

  In the gate insulating film 629, as shown in FIG. 25, a convex portion reflecting the thickness of the gate line 627 is formed in a portion overlapping the gate line 627 in plan view. The convex portions of the gate insulating film 629 are reflected in the insulating film 613, the resin layer 615, the planarization layer 619, and the alignment film 621. As a result, the thickness of the liquid crystal on the alignment film 621 varies.

  In addition, as illustrated in FIG. 26, the insulating film 613 is provided with a convex portion reflecting the thickness of the source line 631 at a portion overlapping the source line 631 in plan view. The convex portions of the insulating film 613 are reflected in the resin layer 615, the planarization layer 619, and the alignment film 621, respectively. As a result, the thickness of the liquid crystal on the alignment film 621 varies.

  That is, in the conventional liquid crystal device, the thickness of the wiring is easily reflected in the liquid crystal layer. For this reason, the conventional liquid crystal device has a problem that it is difficult to improve display quality.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example 1 A first substrate, a second substrate facing the first substrate, a liquid crystal interposed between the first substrate and the second substrate, and interposed between the first substrate and the liquid crystal. A reflective film that reflects light incident on the liquid crystal through the second substrate toward the second substrate, a plurality of wirings interposed between the first substrate and the reflective film, and the first substrate And between the reflective films, between the adjacent wirings in plan view, including a region that overlaps at least the reflective film in plan view, a relaxation layer that relaxes the step due to the wirings, and A liquid crystal device comprising:

  The liquid crystal device of Application Example 1 includes a first substrate, a second substrate, a liquid crystal, a reflective film, a plurality of wirings, and a relaxation layer. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate. The reflective film is interposed between the first substrate and the liquid crystal, and reflects light incident on the liquid crystal through the second substrate toward the second substrate. The plurality of wirings are interposed between the first substrate and the reflective film. The relaxation layer is provided between the first substrate and the reflective film. The relaxing layer is formed in a pattern between adjacent wirings in plan view, including at least a region overlapping the reflective film in plan view, and relaxes a step due to the wiring. For this reason, it can reduce that the thickness of wiring is reflected in the liquid crystal in the area | region which overlaps with a reflecting film in planar view. Thereby, the dispersion | variation in the modulation state of the light reflected on the 2nd board | substrate side by the reflecting film can be reduced. As a result, it is possible to easily improve the display quality in the display using the light reflected by the reflective film.

  Application Example 2 In the above-described liquid crystal device, a plurality of pixels are set, and each of the pixels is set with a transmissive region for performing transmissive display and a reflective region for performing reflective display. Is provided for each reflection region, and the relaxation layer is selectively formed corresponding to the reflection region.

  In Application Example 2, a transmissive region for performing transmissive display and a reflective region for performing reflective display are set for each pixel of the plurality of pixels. The reflective film is provided for each reflective region. The relaxation layer is selectively formed corresponding to the reflective region. With this configuration, this liquid crystal device can perform transmissive display and reflective display.

  Application Example 3 In the above-described liquid crystal device, the liquid crystal device includes a concavo-convex forming layer provided with a concavo-convex portion in a region overlapping the reflective region in plan view, and the concavo-convex forming layer includes the plurality of wirings and the reflection A liquid crystal device, wherein the reflective film is provided between the films, and the reflective films are provided on the liquid crystal side of the concavo-convex portions in the reflective regions.

  The liquid crystal device of Application Example 3 has a concavo-convex forming layer. The concavo-convex forming layer is interposed between the plurality of wirings and the reflective film. The unevenness forming layer is provided with an uneven portion. The concavo-convex portion is provided in a region overlapping each reflective region in plan view. In this liquid crystal device, each reflection film is provided on the liquid crystal side of each uneven portion in each reflection region. For this reason, the shape of the uneven portion can be reflected in the reflective film. Thereby, light can be irregularly reflected by the reflective film.

  Application Example 4 In the above-described liquid crystal device, the relaxation layer is also provided in a region overlapping the transmission region in plan view.

  In the application example 4, the relaxation layer is also provided in the region overlapping the transmission region in plan view. For this reason, the display quality in the transmissive display can be easily improved.

  Application Example 5 In the above-described liquid crystal device, the relaxation layer corresponding to the reflection region and the relaxation layer corresponding to the transmission region have different thicknesses from each other.

  In Application Example 5, the relaxation layer corresponding to the reflection region and the relaxation layer corresponding to the transmission region have different thicknesses. Thereby, each relaxation layer can be easily set to an appropriate thickness for each of the reflective region and the transmissive region.

  Application Example 6 In the above liquid crystal device, the thickness of the relaxation layer corresponding to the reflection region is larger than the thickness of the relaxation layer corresponding to the transmission region.

In Application Example 6, the thickness of the relaxation layer corresponding to the reflection region is larger than the thickness of the relaxation layer corresponding to the transmission region.
Here, in the concavo-convex formation layer, the thickness of the concavo-convex formation layer in the reflection region may be smaller than the thickness of the concavo-convex formation layer in the transmission region due to the presence of the concavo-convex portion.
Even in such a case, in the liquid crystal device of Application Example 6, since the thickness of the relaxation layer corresponding to the reflection region is larger than the thickness of the relaxation layer corresponding to the transmission region, the thickness of the liquid crystal in the reflection region and the transmission region This makes it easy to align the thickness of the liquid crystal.

  Application Example 7 In the above-described liquid crystal device, the relaxation layer corresponding to the reflection region and the relaxation layer corresponding to the transmission region are made of different materials.

In Application Example 7, the material of the relaxation layer corresponding to the reflection region and the relaxation layer corresponding to the transmission region are different from each other.
Here, for example, even if the material of the relaxation layer corresponding to the reflection region has a light shielding property, the relaxation display is not hindered because the relaxation layer is interposed between the first substrate and the reflection film. For this reason, the relaxation layer corresponding to the reflective region can be made of a light-shielding material. On the other hand, the relaxing layer corresponding to the transmissive region may be made of a material having optical transparency.
Thus, even if the material of the relaxation layer is different between the reflective region and the transmissive region, the reflective display and the transmissive display can be performed.

  Application Example 8 In the above liquid crystal device, the liquid crystal device is characterized in that at least the relaxing layer corresponding to the transmission region is made of a material having optical transparency.

  In Application Example 8, at least the relaxing layer corresponding to the transmissive region is made of a light-transmitting material, so that transmissive display can be performed with light from the transmissive region.

  Application Example 9 In the above-described liquid crystal device, the relaxation layer corresponding to the reflection region is made of a light-absorbing material.

  In Application Example 9, the relaxation layer corresponding to the reflective region is made of a material having a light absorption property. Thereby, at least a part of the light incident on the reflection region via the first substrate can be absorbed by the relaxation layer. For this reason, it can suppress low that the light which injected into the reflective area via the 1st board | substrate is irregularly reflected by a reflective film, and is inject | emitted out of a reflective area. As a result, it is possible to suppress leakage of light incident on the reflection region through the first substrate.

  Application Example 10 In the above-described liquid crystal device, the liquid crystal device includes a TFT element that is provided corresponding to each pixel and controls driving of the liquid crystal for each pixel, and the wiring is connected to the TFT element. A liquid crystal device, wherein the liquid crystal device is a gate line for supplying a driving signal.

  The liquid crystal device of Application Example 10 includes a TFT (Thin Film Transistor) element provided corresponding to each pixel. The TFT element controls driving of the liquid crystal for each pixel. In this liquid crystal device, the wiring is a gate line that supplies a drive signal to the TFT element. With this configuration, it is possible to reduce the reflection of the thickness of the gate line in the liquid crystal in the region overlapping the reflective film in plan view. Thereby, the dispersion | variation in the modulation state of the light reflected on the 2nd board | substrate side by the reflecting film can be reduced. As a result, it is possible to easily improve the display quality in the display using the light reflected by the reflective film.

  Application Example 11 In the above-described liquid crystal device, the liquid crystal device includes a TFT element that is provided corresponding to each pixel and controls driving of the liquid crystal for each pixel, and the wiring is connected to the TFT element. A liquid crystal device characterized by being a source line for supplying an image signal.

  The application example 11 includes a TFT element provided corresponding to each pixel. The TFT element controls driving of the liquid crystal for each pixel. In this liquid crystal device, the wiring is a source line that supplies an image signal to the TFT element. With this configuration, it is possible to reduce the reflection of the thickness of the source line in the liquid crystal in the region overlapping the reflective film in plan view. Thereby, the dispersion | variation in the modulation state of the light reflected on the 2nd board | substrate side by the reflecting film can be reduced. As a result, it is possible to easily improve the display quality in the display using the light reflected by the reflective film.

  Application Example 12 A first substrate, a second substrate facing the first substrate, a liquid crystal interposed between the first substrate and the second substrate, a transmissive region for performing transmissive display, and a reflective for performing reflective display A plurality of pixels in which a region is set, a reflective film that is interposed between the first substrate and the liquid crystal and that overlaps the reflective region for each pixel; and the first substrate and the reflective film Having a concavo-convex forming layer provided with a concavo-convex portion in a region overlapping with each of the reflection regions in plan view, and a relaxing layer interposed between the first substrate and the concavo-convex forming layer, The uneven part is provided on the liquid crystal side of the uneven part forming layer, the reflective film is provided on the liquid crystal side of the uneven part, and the relaxing layer overlaps at least the uneven part in plan view. A liquid crystal device provided in a region.

The liquid crystal device of Application Example 12 includes a first substrate, a second substrate, a liquid crystal, a plurality of pixels, a reflective film, a concavo-convex forming layer, and a relaxation layer. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate. In each pixel, a transmissive region for transmissive display and a reflective region for reflective display are set. The reflective film is interposed between the first substrate and the liquid crystal, and is provided in a region that overlaps the reflective region for each pixel. The concavo-convex forming layer is interposed between the first substrate and the reflective film. The concavo-convex forming layer is provided with concavo-convex portions in regions overlapping with the reflective regions in plan view. The uneven portion is provided on the liquid crystal side of the uneven forming layer. The reflective film is provided on the liquid crystal side of the uneven portion. The relaxation layer is interposed between the first substrate and the unevenness forming layer.
Here, in the concavo-convex formation layer, the thickness of the concavo-convex formation layer in the reflection region may be smaller than the thickness of the concavo-convex formation layer in the transmission region due to the presence of the concavo-convex portion.
On the other hand, in this liquid crystal device, the relaxation layer is provided in a region that overlaps at least the uneven portion in plan view. For this reason, it is possible to easily align the thickness of the liquid crystal in the reflective region and the thickness of the liquid crystal in the transmissive region. Accordingly, it is possible to easily set the light modulation state in the reflection region and the light modulation state in the transmission region to appropriate states. As a result, it is possible to easily improve display quality in reflective display and transmissive display.

  Application Example 13 Electronic equipment having the above-described liquid crystal device as a display portion.

In the electronic device according to the application example 13, the liquid crystal device as the display unit includes a first substrate, a second substrate, a liquid crystal, a reflective film, a plurality of wirings, and a relaxation layer. The second substrate faces the first substrate. The liquid crystal is interposed between the first substrate and the second substrate. The reflective film is interposed between the first substrate and the liquid crystal, and reflects light incident on the liquid crystal through the second substrate toward the second substrate. The plurality of wirings are interposed between the first substrate and the reflective film. The relaxation layer is provided between the wirings adjacent to each other in plan view, and relaxes a step due to the wiring. With this configuration, the thickness of the wiring can be reduced from being reflected in the liquid crystal.
In this liquid crystal device, the relaxation layer is interposed between the first substrate and the reflective film, and is provided at least in a region overlapping the reflective film in plan view. For this reason, it can reduce that the thickness of wiring is reflected in the liquid crystal in the area | region which overlaps with a reflecting film in planar view. Thereby, the dispersion | variation in the modulation state of the light reflected on the 2nd board | substrate side by the reflecting film can be reduced. As a result, it is possible to easily improve the display quality in the display using the light reflected by the reflective film.
And since this electronic device has said liquid crystal device as a display part, it can make it easy to improve the display quality in a display part.

The first embodiment will be described with reference to the drawings, taking as an example a reflective liquid crystal device which is one of display devices.
As shown in FIG. 1, the display device 1 in the first embodiment includes a liquid crystal panel 3, a phase difference plate 5, and a polarizing plate 7.

  Here, a plurality of pixels 9 are set in the display device 1. The plurality of pixels 9 are arranged in the X direction and Y direction in the drawing within the display area 11, and constitute a matrix M in which the X direction is the row direction and the Y direction is the column direction. The display device 1 reflects light incident on the liquid crystal panel 3 from the display surface 13 via the polarizing plate 7 to the display surface 13 side by a reflection film described later, and selectively displays the display surface 13 from the plurality of pixels 9. It can be injected out of the liquid crystal panel 3 via. As a result, the display device 1 can display an image on the display surface 13. The display area 11 is an area where an image can be displayed. In FIG. 1, the pixels 9 are exaggerated and the number of the pixels 9 is reduced for easy understanding of the configuration.

The liquid crystal panel 3 includes an element substrate 15, a counter substrate 17, a liquid crystal 19, and a sealing material 21 as shown in FIG. 2, which is a cross-sectional view taken along line AA in FIG. 1.
The element substrate 15 is provided with a switching element, which will be described later, corresponding to each of the plurality of pixels 9 on the display surface 13 side, that is, the liquid crystal 19 side.
The counter substrate 17 faces the element substrate 15 on the display surface 13 side with respect to the element substrate 15, and is provided with a gap between the counter substrate 17 and the element substrate 15. The counter substrate 17 is provided with a color filter, which will be described later, on the bottom surface 23 side, that is, the liquid crystal 19 side, which corresponds to the back surface of the display surface 13 in the display device 1.

  The liquid crystal 19 is interposed between the element substrate 15 and the counter substrate 17, and is sealed between the element substrate 15 and the counter substrate 17 by a sealing material 21 that surrounds the display region 11 inside the periphery of the liquid crystal panel 3. Has been. In the present embodiment, an FFS (Fringe Field Switching) type driving method is employed as the driving method of the liquid crystal 19.

  The retardation plate 5 is provided on the display surface 13 side of the counter substrate 17, that is, on the opposite side of the liquid crystal 19 side. The polarizing plate 7 is provided closer to the display surface 13 than the phase difference plate 5. In the display device 1, the phase difference plate 5 gives a phase difference of ½ wavelength to the incident light. The polarizing plate 7 can transmit light having a polarization axis in the direction of the transmission axis.

  In addition, the structure which provided the optical compensation film between the display surface 13 side from the polarizing plate 7 or between the polarizing plate 7 and the phase difference plate 5 may be employ | adopted. By providing the optical compensation film, it is possible to compensate for the phase difference of the liquid crystal 19 when the liquid crystal 19 is viewed from the normal direction of the display surface 13 or from the direction inclined from the normal direction. Thereby, light leakage can be reduced and the contrast can be improved.

  As the optical compensation film, a negative uniaxial medium (for example, a WV film manufactured by Fuji Film) in which discotic liquid crystal molecules having negative refractive index anisotropy or the like are hybrid-aligned can be used. Also, a positive uniaxial medium (for example, NH film manufactured by Nippon Petroleum) in which nematic liquid crystal molecules having a positive refractive index anisotropy are hybrid-aligned may be employed. Further, a configuration in which a negative uniaxial medium and a positive uniaxial medium are combined may be employed. In addition, a biaxial medium in which the refractive index in each direction satisfies nx> ny> nz, a negative C-Plate, or the like can be employed.

Each of the plurality of pixels 9 set in the display device 1 has a red color (R), a green color (G), and a blue color (B) as shown in FIG. ). That is, the plurality of pixels 9 constituting the matrix M include a pixel 9r that emits R light, a pixel 9g that emits G light, and a pixel 9b that emits B light.
In the following description, the term “pixel 9” and the term “pixels 9r, 9g, and 9b” are appropriately used.

  Here, the color of R is not limited to a pure red hue, and includes orange and the like. The color of G is not limited to a pure green hue, and includes blue-green and yellow-green. The color of B is not limited to a pure blue hue, and includes bluish purple and blue-green. From another viewpoint, light exhibiting the color of R can be defined as light having a light wavelength peak in a range of 570 nm or more in the visible light region. The light exhibiting the color G can be defined as light having a light wavelength peak in the range of 500 nm to 565 nm. Light exhibiting the color B can be defined as light having a light wavelength peak in the range of 415 nm to 495 nm.

In the matrix M, a plurality of pixels 9 arranged along the Y direction form one pixel column 41. A plurality of pixels 9 arranged in the X direction constitute one pixel row 42.
Each pixel 9 in one pixel column 41 has a light color set to one of R, G, and B. That is, the matrix M includes a pixel column 41r in which a plurality of pixels 9r are arranged in the Y direction, a pixel column 41g in which a plurality of pixels 9g are arranged in the Y direction, and a pixel column 41b in which a plurality of pixels 9b are arranged in the Y direction. have. In the matrix M, the pixel column 41r, the pixel column 41g, and the pixel column 41b are arranged repeatedly in this order along the X direction.
In the following, the notation of the pixel column 41 and the notation of the pixel column 41r, the pixel column 41g, and the pixel column 41b are appropriately used.

  In the display device 1, the external light incident on the liquid crystal 19 through the display surface 13 is reflected on the display surface 13 side by a reflection film described later, and the reflected light is emitted to the display surface 13 side to be reflected. Display is performed. The external light is any light incident from the display surface 13 of the display device 1. The outside light includes, for example, indoor and outdoor illumination light, sunlight, and light from an illumination device.

Here, the configuration of each of the element substrate 15 and the counter substrate 17 of the liquid crystal panel 3 will be described in detail.
The element substrate 15 includes a first substrate 51 and an element layer 52 as shown in FIG. 4 which is a cross-sectional view taken along the line CC in FIG.
The first substrate 51 is made of a light-transmitting material such as glass or quartz, for example, and includes a first surface 51a directed to the display surface 13 side and a second surface 51b directed to the bottom surface 23 side. have.

  The element layer 52 is provided on the first surface 51 a of the first substrate 51. The element layer 52 includes a gate insulating film 53, a resin layer 55, a planarizing film 57, an insulating film 59, and an alignment film 61. The element layer 52 includes, for each pixel 9, a TFT (Thin Film Transistor) element 63 that is one of the switching elements, a relaxation layer 65, a reflective film 67, a common electrode 69, and a pixel electrode 71. include.

The gate insulating film 53 is provided on the first surface 51 a of the first substrate 51. The resin layer 55 is provided on the display surface 13 side of the gate insulating film 53. The planarizing film 57 is provided on the display surface 13 side of the resin layer 55. The insulating film 59 is provided on the display surface 13 side of the planarizing film 57. The alignment film 61 is provided on the display surface 13 side of the insulating film 59.
The TFT element 63, the relaxation layer 65, the reflective film 67, the common electrode 69, and the pixel electrode 71 are provided corresponding to each pixel 9.

The TFT element 63 has a gate electrode 72, a semiconductor layer 73, a source electrode 74, and a drain electrode 75. The gate electrode 72 is provided on the first surface 51 a of the first substrate 51 and is covered with the gate insulating film 53 from the display surface 13 side. In addition, as a material of the gate electrode 72, metals, such as molybdenum, tungsten, and chromium, an alloy containing these, etc. can be employ | adopted, for example. Further, as the material of the gate insulating film 53, for example, a light transmissive material such as silicon oxide or silicon nitride can be adopted.
The semiconductor layer 73 is made of amorphous silicon, for example, and is provided at a position facing the gate electrode 72 with the gate insulating film 53 interposed therebetween.

The source electrode 74 is provided on the display surface 13 side of the gate insulating film 53 and partly overlaps the semiconductor layer 73. The drain electrode 75 is provided on the display surface 13 side of the gate insulating film 53, and partly overlaps the semiconductor layer 73. The TFT element 63 having the above configuration is a so-called bottom gate type in which the semiconductor layer 73 is located between the gate electrode 72 and the source electrode 74 and drain electrode 75.
The TFT element 63 having the above configuration is covered with the resin layer 55 from the display surface 13 side.

The relaxing layer 65 is provided on the first surface 51 a of the first substrate 51 and is covered from the display surface 13 side by the gate insulating film 53. The relaxing layer 65 is provided between two gate electrodes 72 adjacent in the Y direction. Relaxing layer 65 and gate electrode 72 are provided in a state spaced from each other in the Y direction.
As the material of the relaxing layer 65, for example, various materials such as an inorganic material such as silicon oxide and silicon nitride, and a resin material such as acrylic and epoxy can be employed. The relaxing layer 65 may have a light shielding property or a light transmissive property.

The reflective film 67 is provided in a region that overlaps the region of each pixel 9 in plan view. The reflective film 67 is provided on the display surface 13 side of the resin layer 55. In addition, as a material of the resin layer 55, the material which has light transmittances, such as an acrylic resin and an epoxy resin, can be employ | adopted, for example.
The resin layer 55 and the reflective film 67 are covered with the planarizing film 57 from the display surface 13 side. As the material of the planarization film 57, for example, a light transmissive material such as an acrylic or epoxy resin can be employed.

The common electrode 69 is provided on the display surface 13 side of the planarizing film 57 and overlaps the area of each pixel 9 in plan view. As the material of the common electrode 69, for example, a light transmissive material such as ITO (Indium Tin Oxide) can be adopted.
The common electrode 69 is covered with the insulating film 59 from the display surface 13 side. As the material of the insulating film 59, for example, a light transmissive material such as silicon oxide, silicon nitride, acrylic resin, or the like can be employed.

The pixel electrode 71 is provided on the display surface 13 side of the insulating film 59. The pixel electrode 71 is connected to the drain electrode 75 through a contact hole 76 provided in the insulating film 59, the planarizing film 57, and the resin layer 55. As a material of the pixel electrode 71, for example, a material having optical transparency such as ITO can be adopted.
The alignment film 61 is made of a light-transmitting material such as polyimide, and covers the insulating film 59 and the pixel electrode 71 from the display surface 13 side. The alignment film 61 is subjected to an alignment process.

The counter substrate 17 includes a second substrate 81 and a counter layer 82. The second substrate 81 is made of a light-transmitting material such as glass or quartz, for example, and has an outward surface 83a directed to the display surface 13 side and an opposing surface 83b directed to the bottom surface 23 side. is doing.
The facing layer 82 is provided on the facing surface 83 b of the second substrate 81. The counter layer 82 includes a light absorption layer 85, a color filter 87, an overcoat layer 91, and an alignment film 97.

The light absorption layer 85 is provided on the facing surface 83 b of the second substrate 81 and extends over the region 86. The light absorption layer 85 is provided in a lattice shape in a plan view and partitions each pixel 9. In the display device 1, each pixel 9 can be defined as a region surrounded by the light absorption layer 85.
As a material of the light absorption layer 85, for example, a resin containing a material having a high light absorption property such as carbon black or chromium can be employed.

The color filter 87 is provided corresponding to each pixel 9. The color filter 87 is provided on the opposing surface 83b side of the second substrate 81, and covers each region surrounded by the light absorption layer 85, that is, the region of each pixel 9, from the bottom surface 23 side.
Here, the color filter 87 can transmit light in a predetermined wavelength region of incident light. The color filter 87 is made of a resin colored in a different color for each of the pixel 9r, the pixel 9g, and the pixel 9b. The color filter 87 corresponding to the pixel 9r can transmit R light. The color filter 87 corresponding to the pixel 9g can transmit G light, and the color filter 87 corresponding to the pixel 9b can transmit B light. In the following, when R, G, and B are identified for each color filter 87, the notation of color filters 87r, 87g, and 87b is used.

The overcoat layer 91 is provided on the bottom surface 23 side of the light absorption layer 85 and the color filter 87. The overcoat layer 91 is made of a light-transmitting resin or the like, and covers the light absorption layer 85 and the color filter 87 from the bottom surface 23 side.
The alignment film 97 is provided on the bottom surface 23 side of the overcoat layer 91. The alignment film 97 is made of a light-transmitting material such as polyimide, and covers the overcoat layer 91 from the bottom surface 23 side. The alignment film 97 is subjected to an alignment process on the bottom surface 23 side.
The liquid crystal 19 interposed between the element substrate 15 and the counter substrate 17 is interposed between the alignment film 61 and the alignment film 97.

Here, the arrangement of the TFT element 63, the common electrode 69, and the pixel electrode 71 in each pixel 9 will be described.
As shown in FIG. 5 which is a plan view, the pixel electrode 71 is provided over the region of the pixel 9 and has a plurality of slit portions 111. In FIG. 5, the pixel electrode 71 is hatched for easy understanding of the configuration.
The plurality of slit portions 111 are arranged at predetermined intervals in the Y direction. Each slit 111 extends along a direction intersecting the Y direction. In addition, the direction in which each slit part 111 extends is inclined from the X direction.

The common electrode 69 is provided in a region that covers the pixel electrode 71. Between the pixels 9 adjacent in the X direction, the common electrodes 69 are connected by a common line 113.
In each pixel 9, the common electrode 69 and the pixel electrode 71 have their peripheral portions overlapping the region 86.
The TFT element 63 is provided in a region 86 on the left side of the region of the pixel 9 as viewed in FIG. The pixel electrode 71 extends from the region of the pixel 9 to the region 86, and is connected to the drain electrode 75 through a contact hole 76 provided in the region 86. Between the pixels 9 adjacent to each other in the X direction, the gate electrodes 72 are connected to each other by a gate line 117. Further, between the pixels 9 adjacent in the Y direction, the source electrodes 74 are connected by a source line 119.

The reflective film 67 is provided in a region surrounded by two gate lines 117 adjacent in the Y direction and two source lines 119 adjacent in the X direction. In FIG. 5, the region of the reflective film 67 extends outside the region of the common electrode 69 in order to easily show the configuration. The area of the reflective film 67 is not limited to this, and it is sufficient that the area of the reflective film 67 extends to at least the area of the pixel 9.
The relaxation layer 65 is provided between two gate lines 117 adjacent in the Y direction, and is patterned for each pixel 9. The relaxing layer 65 extends to a region outside the region of the common electrode 69. That is, the relaxing layer 65 is provided over a region wider than the region of the reflective film 67. Therefore, the unevenness between the relaxing layer 65 and the gate line 117 is not easily reflected in the reflective film 67.

Note that the thickness of the relaxing layer 65 is set substantially equal to the thickness of the gate line 117.
Further, the cross sections of the TFT element 63, the common electrode 69, and the pixel electrode 71 in FIG. 4 correspond to the cross section along the line JJ in FIG.
Further, the relaxing layer 65 is not limited to the configuration in which the pattern is formed for each pixel 9. As the configuration of the relaxing layer 65, a configuration in which a pattern is formed in a state of being arranged in units of pixel rows 42 of the matrix M illustrated in FIG. 3 between two gate lines 117 adjacent in the Y direction may be employed.

When a voltage is applied between the common electrode 69 and the pixel electrode 71, an electric field is generated between the common electrode 69 and the pixel electrode 71. In the liquid crystal panel 3, when the TFT element 63 changes from the OFF state to the ON state, an electric field is generated between the common electrode 69 and the pixel electrode 71. The alignment state of the liquid crystal 19 can be changed by this electric field.
In the display device 1, the display is controlled by changing the alignment state of the liquid crystal 19 for each pixel 9. The alignment state of the liquid crystal 19 can be changed by switching between the OFF state and the ON state of the TFT element 63.

Each of the alignment film 61 and the alignment film 97 is subjected to an alignment process. The initial alignment state of the liquid crystal 19 is regulated by the alignment film 61 and the alignment film 97 that have been subjected to the alignment treatment.
FIG. 6A is a diagram illustrating a polarization state when the TFT element 63 is in an OFF state, and FIG. 6B is a diagram illustrating a polarization state when the TFT element 63 is in an ON state.
In the display device 1, the initial alignment direction 121 of the liquid crystal 19 is set in a direction orthogonal to the transmission axis 123 of the polarizing plate 7 as shown in FIG.
When the TFT element 63 is switched to the ON state, the alignment direction 121 of the liquid crystal 19 is seen in this figure with respect to the direction orthogonal to the transmission axis 123 of the polarizing plate 7 in plan view, as shown in FIG. Thus, it changes in a direction having an inclination of 45 degrees counterclockwise. In the display device 1, the liquid crystal 19 gives a phase difference of ¼ wavelength to incident light when the TFT element 63 is in the ON state.

6A and 6B, the X ′ direction and the Y ′ direction indicate directions in which the X ′ direction is orthogonal to the transmission axis 123 of the polarizing plate 7, and the Y ′ direction is the polarizing plate 7. The direction along the transmission axis 123 is shown. The X ′ direction and the Y ′ direction are arbitrary two directions orthogonal to each other in the XY plane.
Here, the slow axis 131 of the phase difference plate 5 is set in a direction having an inclination of 67.5 degrees counterclockwise as viewed in these drawings with respect to the X ′ direction in plan view.
Accordingly, the linearly polarized light 129 incident on the phase difference plate 5 is given a half-wave phase difference and is incident on the liquid crystal 19 as the linearly polarized light 133. The polarization axis of the linearly polarized light 133 is along a direction having an inclination of 45 degrees counterclockwise as viewed in FIGS. 6A and 6B with respect to the X ′ direction in plan view.

The linearly polarized light 133 incident on the liquid crystal 19 has a polarization axis that intersects the alignment direction 121 of the liquid crystal 19 as shown in FIG. 6A when the TFT element 63 is in the OFF state. For this reason, the linearly polarized light 133 incident on the liquid crystal 19 is given a phase difference of ¼ wavelength, and is emitted toward the reflection film 67 as a counterclockwise circularly polarized light 135 as seen in this figure.
The circularly polarized light 135 is reflected by the reflective film 67, and enters the liquid crystal 19 as circularly polarized light 137 that rotates clockwise as viewed in FIG.
The circularly polarized light 137 incident on the liquid crystal 19 is given a phase difference of ¼ wavelength, and is along a direction having a tilt of 135 degrees counterclockwise as viewed in this figure with respect to the X ′ direction in plan view. The light enters the phase difference plate 5 as linearly polarized light 139 having a polarization axis.

The linearly polarized light 139 incident on the phase difference plate 5 is given a phase difference of ½ wavelength, and is incident on the polarizing plate 7 as a linearly polarized light 141 having a polarization axis along the X ′ direction in plan view.
The linearly polarized light 141 incident on the polarizing plate 7 is absorbed by the polarizing plate 7 because the polarization axis is orthogonal to the transmission axis 123 of the polarizing plate 7.

On the other hand, when the TFT element 63 is in the ON state, the linearly polarized light 133 incident on the liquid crystal 19 has a polarization axis along the alignment direction 121 of the liquid crystal 19 as shown in FIG. While maintaining the state, it is emitted toward the reflection film 67 as linearly polarized light 133.
The linearly polarized light 133 emitted toward the reflective film 67 is reflected by the reflective film 67 while maintaining the polarization state, and is incident on the liquid crystal 19.

The linearly polarized light 133 incident on the liquid crystal 19 from the reflective film 67 is incident on the phase difference plate 5 while maintaining the polarization state. The linearly polarized light 133 incident on the phase difference plate 5 is given a phase difference of ½ wavelength, and is incident on the polarizing plate 7 as a linearly polarized light 143 having a polarization axis along the Y ′ direction in plan view. The linearly polarized light 143 incident on the polarizing plate 7 passes through the polarizing plate 7 because the polarization axis is along the direction of the transmission axis 123 of the polarizing plate 7.
As described above, in the display device 1, display is controlled by switching between the ON state and the OFF state of the TFT element 63.

In the first embodiment, the gate line 117 (gate electrode 72) corresponds to a gate line as a wiring.
In the display device 1 of the first embodiment, a relaxation layer 65 is provided between the first substrate 51 and the reflective film 67 for each pixel 9. Each relaxing layer 65 is provided on the same level as the gate line 117 (the first surface 51a of the first substrate 51), and is interposed between two adjacent gate lines 117. For this reason, it is possible to reduce the reflection of the thickness of the gate line 117 on the liquid crystal 19. Thereby, the variation in the modulation state of the light reflected to the second substrate 81 side by the reflective film 67 can be reduced. As a result, the display quality in the reflective display can be easily improved.

  In the first embodiment, the thickness of the relaxing layer 65 is set to be substantially equal to the thickness of the gate line 117, but the thickness of the relaxing layer 65 is not limited to this. As the thickness of the relaxing layer 65, a value obtained by subtracting the thickness of the reflective film 67 from the thickness of the gate line 117 may be employed. As a result, the step between the resin layer 55 and the reflective film 67 can be easily reduced, so that the reflection of the thickness of the reflective film 67 on the liquid crystal 19 can be reduced. For this reason, it is possible to further improve the display quality.

  In the first embodiment, the configuration in which the relaxing layer 65 is provided in the same level as the gate line 117 (the first surface 51a of the first substrate 51) is illustrated, but the level in which the relaxing layer 65 is provided is not limited thereto. As the layer on which the relaxing layer 65 is provided, for example, the same layer as the source line 119 (source electrode 74) may be employed. In this case, the relaxation layer 65 is provided for each pixel 9 in a region overlapping the region of the pixel 9 in plan view, and is adjacent to the source line 119 for each pixel 9. Even in this configuration, the same effect as the first embodiment can be obtained.

The second embodiment will be described with reference to the drawings, taking a transflective liquid crystal device as an example. In the following, the same components as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.
As shown in FIG. 7, the display device 10 according to the second embodiment includes a display panel 20 and a lighting device 30.

  Here, a plurality of pixels 9 are set on the display panel 20. Similar to the first embodiment, the plurality of pixels 9 are arranged in the display region 11 in the X direction and the Y direction in the figure, and the matrix M has the X direction as the row direction and the Y direction as the column direction. Is configured. The display device 10 selectively emits light incident on the display panel 20 from the illumination device 30 from the plurality of pixels 9 to the outside of the display panel 20 via the display surface 13, thereby displaying an image on the display surface 13. Can be displayed.

The display panel 20 includes a liquid crystal panel 40 and polarizing plates 7a and 7b as shown in FIG. 8 which is a cross-sectional view taken along the line DD in FIG.
The liquid crystal panel 40 includes an element substrate 60, a counter substrate 70, a liquid crystal 19, and a sealing material 21.
The element substrate 60 is provided with a TFT element 63 and the like corresponding to each pixel 9 on the display surface 13 side, that is, the liquid crystal 19 side.

  The counter substrate 70 faces the element substrate 60 on the display surface 13 side of the element substrate 60 and is provided in a state where there is a gap between the counter substrate 70 and the element substrate 60. The counter substrate 70 is provided with a later-described retardation film on the bottom surface 23 side, that is, the liquid crystal 19 side.

  The liquid crystal 19 is interposed between the element substrate 60 and the counter substrate 70, and is sealed between the element substrate 60 and the counter substrate 70 by the sealing material 21 that surrounds the display region 11 inside the periphery of the liquid crystal panel 40. Has been. In the present embodiment, an FFS (Fringe Field Switching) type driving method is employed as the driving method of the liquid crystal 19.

The polarizing plate 7 a is provided closer to the display surface 13 than the counter substrate 70. The polarizing plate 7 b is provided closer to the bottom surface 23 than the element substrate 60. In the display device 10, the polarizing plates 7a and 7b are set such that the direction of the light transmission axis in the polarizing plate 7a and the direction of the light transmission axis in the polarizing plate 7b are orthogonal to each other.
In addition, the structure which provided the optical compensation film mentioned above between the polarizing plate 7a and the counter substrate 70, or between the polarizing plate 7b and the element substrate 60 may be employ | adopted.

The lighting device 30 is provided on the bottom surface 23 side of the display panel 20 and includes a light guide plate 31 and a light source 33. The light guide plate 31 is provided on the lower side of the display panel 20 as viewed in FIG. 8 and has a light emission surface 35 b facing the bottom surface 23 of the display panel 20.
The light source 33 is, for example, an LED (Light Emitting Diode) or a cold cathode tube, and is provided on the left side of the side surface 35a of the light guide plate 31 as viewed in FIG.

  Light from the light source 33 enters the side surface 35 a of the light guide plate 31. The light incident on the light guide plate 31 is emitted from the light exit surface 35 b while being repeatedly reflected in the light guide plate 31. The light emitted from the light emission surface 35b enters the display panel 20 from the bottom surface 23 of the display panel 20 via the polarizing plate 7b. The light guide plate 31 is provided with a diffuser plate on the light exit surface 35b and a reflector plate on the bottom surface 35c as necessary.

The plurality of pixels 9 set in the display panel 20 includes a pixel 9r, a pixel 9g, and a pixel 9b, as in the first embodiment.
Each pixel 9 has a transmissive region T and a reflective region H as shown in FIG. 9 which is an enlarged view of an E portion in FIG. In FIG. 9, the reflection region H is hatched for easy understanding of the configuration.
In the transmissive region T, transmissive display is performed by transmitting light incident on the liquid crystal 19 from the illumination device 30 illustrated in FIG. 8 through the bottom surface 23 to the display surface 13 side.

In the reflection region H, the external light incident on the liquid crystal 19 via the display surface 13 is reflected by the reflection film described later to the display surface 13 side, and the reflected light is emitted to the display surface 13 side to reflect. Display is performed.
Here, the configuration of each of the element substrate 60 and the counter substrate 70 of the liquid crystal panel 40 will be described in detail.
The element substrate 60 includes a first substrate 51 and an element layer 52, as shown in FIG. 10 which is a cross-sectional view taken along line FF in FIG.

The relaxing layer 65 is provided on the first surface 51 a of the first substrate 51 and is covered from the display surface 13 side by the gate insulating film 53. The relaxation layer 65 is provided between two gate electrodes 72 adjacent in the Y direction, and is provided in a region overlapping the reflection region H in plan view. Relaxing layer 65 and gate electrode 72 are provided in a state spaced from each other in the Y direction.
As the material of the relaxing layer 65, for example, various materials such as an inorganic material such as silicon oxide and silicon nitride, and a resin material such as acrylic and epoxy can be employed. The relaxing layer 65 may have a light shielding property or a light transmissive property. In the display device 10, the relaxing layer 65 is made of a material having a light absorption property. For this reason, the relaxing layer 65 has a light shielding property against the light from the illumination device 30.

  The relaxing layer 65 has a light-shielding property and a light-absorbing property in that light incident on the first substrate 51 from the illumination device 30 through the bottom surface 23 (FIG. 8) can be reduced from being diffusely reflected by a reflective film 67 described later. Having it is preferred. This is because it is possible to easily reduce the decrease in contrast caused by the irregularly reflected light entering the transmission region T.

Here, on the display surface 13 side of the resin layer 55, an uneven portion 79 is provided in a region overlapping the reflective region H in plan view.
The reflective film 67 is provided in a region overlapping the reflective region H in plan view. The reflective film 67 is provided on the display surface 13 side of the uneven portion 79. Therefore, the reflection film 67 reflects the uneven shape of the uneven portion 79. That is, the reflective film 67 is provided in an uneven shape following the uneven shape of the uneven portion 79.
For this reason, the light incident on the liquid crystal panel 40 from the display surface 13 side can be irregularly reflected to the liquid crystal 19 side by the reflective film 67 provided in an uneven shape.

The counter substrate 70 includes a second substrate 81 and a counter layer 82.
The counter layer 82 includes a light absorption layer 85, a color filter 87, an overcoat layer 91, an alignment film 93, a retardation film 95, and an alignment film 97.
The alignment film 93 is provided on the bottom surface 23 side of the overcoat layer 91. The alignment film 93 is made of a light-transmitting material such as polyimide, and covers the overcoat layer 91 from the bottom surface 23 side. The alignment film 93 is subjected to an alignment process on the bottom surface 23 side.

  The retardation film 95 is provided on the bottom surface 23 side of the alignment film 93. The retardation film 95 is made of, for example, a material containing a liquid crystal compound, and is provided in a region overlapping the reflection region H in plan view. The retardation film 95 gives a half-wave phase difference to the light incident on the retardation film 95.

The liquid crystal 19 interposed between the element substrate 60 and the counter substrate 70 is interposed between the alignment film 61 and the alignment film 97. In the liquid crystal panel 40, a so-called multi-gap structure in which the thickness of the liquid crystal 19 is different between the transmission region T and the reflection region H is adopted in each pixel 9.
In the transmissive region T, the liquid crystal 19 has a thickness of L1. On the other hand, in the reflection region H, the thickness of the retardation film 95 is set so that the thickness L2 of the liquid crystal 19 satisfies L1> L2. In the liquid crystal panel 40, L1 is set to approximately twice L2.

  Here, as shown in FIG. 11, which is a cross-sectional view taken along the line KK in FIG. That is, the retardation film 95 overlaps the plurality of reflection regions H arranged in the X direction in units of pixel rows 42 of the matrix M shown in FIG.

  Here, the reflective film 67 and the retardation film 95 overlap the common electrode 69 on the reflective region H side with respect to the boundary 115 shown in FIG. Therefore, the reflective region H can be defined as a region where the reflective film 67 and the retardation film 95 overlap in a plan view in the region of each pixel 9. In FIG. 12, the region of the reflective film 67 extends outside the region of the common electrode 69 on the reflective region H side in order to easily show the configuration. The region of the reflective film 67 is not limited to this, and it is sufficient that the reflective film 67 extends at least in the region of the pixel 9 on the reflective region H side.

Further, the transmissive region T can be defined as a region where a region obtained by removing the reflective region H from the region of each pixel 9 and the common electrode 69 overlap in plan view.
The relaxation layer 65 is selectively provided corresponding to the reflection region H for each pixel 9. The relaxation layer 65 extends to a region outside the region of the common electrode 69 on the reflective region H side. That is, the relaxing layer 65 is provided over a region wider than the region of the reflective film 67. Therefore, the unevenness between the relaxing layer 65 and the gate line 117 is not easily reflected in the reflective film 67.
The relaxing layer 65 is not limited to the configuration in which the pattern is formed for each pixel 9. As the configuration of the relaxing layer 65, a configuration in which a pattern is formed in a series of states over a plurality of reflection regions H in units of pixel rows 42 of the matrix M shown in FIG.

  The TFT element 63 is provided in a region 86 on the left side of the reflection region H as viewed in FIG. The pixel electrode 71 extends from the reflection region H to the region 86, and is connected to the drain electrode 75 through a contact hole 76 provided in the region 86.

In the display device 10, the display is controlled by changing the alignment state of the liquid crystal 19 for each pixel 9 in a state in which light is irradiated from the illumination device 30 to the display panel 20. The alignment state of the liquid crystal 19 can be changed by switching between the OFF state and the ON state of the TFT element 63.
FIG. 13A is a diagram illustrating a polarization state in the transmission region T when the TFT element 63 is in the OFF state, and FIG. 13B is a polarization state in the transmission region T when the TFT element 63 is in the ON state. FIG.

In the display device 10, the initial alignment direction 121 of the liquid crystal 19 is set to a direction along the transmission axis 123b of the polarizing plate 7b as shown in FIG.
When the TFT element 63 is switched to the ON state, the alignment direction 121 of the liquid crystal 19 is counterclockwise as viewed in this figure with respect to the transmission axis 123b of the polarizing plate 7b in plan view, as shown in FIG. 13B. It changes in a direction having an inclination of 45 degrees.

FIG. 14A is a diagram illustrating a polarization state in the reflection region H when the TFT element 63 is in the OFF state, and FIG. 14B is a polarization state in the reflection region H when the TFT element 63 is in the ON state. FIG.
The alignment direction 121 of the liquid crystal 19 in the reflective region H is the same as that of the transmissive region T as shown in FIGS. 14A and 14B.

  13A and 13B, and FIGS. 14A and 14B, the X ′ direction and the Y ′ direction are along the transmission axis 123b of the polarizing plate 7b. Y ′ direction indicates the direction along the transmission axis 123a of the polarizing plate 7a. The X ′ direction and the Y ′ direction are arbitrary two directions orthogonal to each other in the XY plane.

In the transmission region T, the incident light incident from the bottom surface 23 side through the polarizing plate 7b has a polarization axis along the transmission axis 123b of the polarizing plate 7b as shown in FIGS. 13 (a) and 13 (b). The linearly polarized light 125 is incident on the liquid crystal 19.
When the TFT element 63 is in the OFF state, the linearly polarized light 125 incident on the liquid crystal 19 has a polarization axis along the alignment direction 121 of the liquid crystal 19 as shown in FIG. Therefore, the linearly polarized light 125 incident on the liquid crystal 19 is incident on the polarizing plate 7a as the linearly polarized light 125 while maintaining the polarization state.
The linearly polarized light 125 incident on the polarizing plate 7a is absorbed by the polarizing plate 7a because the polarization axis is orthogonal to the transmission axis 123a of the polarizing plate 7a.

On the other hand, when the TFT element 63 is in the ON state, the polarization axis of the linearly polarized light 125 intersects the alignment direction 121 of the liquid crystal 19 as shown in FIG. Therefore, the linearly polarized light 125 incident on the liquid crystal 19 is given a phase difference of ½ wavelength by the liquid crystal 19 and is incident on the polarizing plate 7 a as the linearly polarized light 127 having a polarization axis orthogonal to the polarization axis of the linearly polarized light 125. Is done.
The linearly polarized light 127 incident on the polarizing plate 7a passes through the polarizing plate 7a because the polarization axis is along the direction of the transmission axis 123a of the polarizing plate 7a.
Thus, in the transmissive region T, transmissive display is controlled by switching the TFT element 63 between the ON state and the OFF state.

In the reflection region H, the incident light incident from the display surface 13 side through the polarizing plate 7a is polarized along the transmission axis 123a of the polarizing plate 7a as shown in FIGS. 14 (a) and 14 (b). Is incident on the retardation film 95 as linearly polarized light 129 having
Here, the slow axis 131 of the retardation film 95 is set in a direction having an inclination of 67.5 degrees counterclockwise as viewed in these drawings with respect to the X ′ direction in plan view.
Accordingly, the linearly polarized light 129 incident on the retardation film 95 is given a half-wave phase difference and is incident on the liquid crystal 19 as the linearly polarized light 133. The polarization axis of the linearly polarized light 133 is along a direction having an inclination of 45 degrees counterclockwise as viewed in FIGS. 14 (a) and 14 (b) with respect to the X ′ direction in plan view.

As shown in FIG. 14A, the linearly polarized light 133 incident on the liquid crystal 19 intersects the alignment direction 121 of the liquid crystal 19 when the TFT element 63 is in the OFF state. For this reason, the linearly polarized light 133 incident on the liquid crystal 19 is given a phase difference of ¼ wavelength, and is emitted toward the reflection film 67 as a counterclockwise circularly polarized light 135 as seen in this figure.
The circularly polarized light 135 is reflected by the reflective film 67, and enters the liquid crystal 19 as circularly polarized light 137 that rotates clockwise as viewed in FIG.
The circularly polarized light 137 incident on the liquid crystal 19 is given a phase difference of ¼ wavelength, and is along a direction having a tilt of 135 degrees counterclockwise as viewed in this figure with respect to the X ′ direction in plan view. The light is incident on the retardation film 95 as linearly polarized light 139 having a polarization axis.

The linearly polarized light 139 incident on the retardation film 95 is given a half-wave phase difference, and is incident on the polarizing plate 7a as a linearly polarized light 141 having a polarization axis along the X ′ direction in plan view.
The linearly polarized light 141 incident on the polarizing plate 7a is absorbed by the polarizing plate 7a because the polarization axis is orthogonal to the transmission axis 123a of the polarizing plate 7a.

On the other hand, when the TFT element 63 is in the ON state, the linearly polarized light 133 incident on the liquid crystal 19 has a polarization axis along the alignment direction 121 of the liquid crystal 19 as shown in FIG. While maintaining the state, it is emitted toward the reflection film 67 as linearly polarized light 133.
The linearly polarized light 133 emitted toward the reflective film 67 is reflected by the reflective film 67 while maintaining the polarization state, and is incident on the liquid crystal 19.

The linearly polarized light 133 incident on the liquid crystal 19 from the reflective film 67 is incident on the retardation film 95 while maintaining the polarization state. The linearly polarized light 133 incident on the retardation film 95 is given a half-wave phase difference, and is incident on the polarizing plate 7a as a linearly polarized light 143 having a polarization axis along the Y ′ direction in plan view. The linearly polarized light 143 incident on the polarizing plate 7a passes through the polarizing plate 7a because the polarization axis is along the direction of the transmission axis 123a of the polarizing plate 7a.
As described above, also in the reflective area H, the reflective display is controlled by switching the TFT element 63 between the ON state and the OFF state as in the transmissive area T.

Here, a method for manufacturing the display device 10 will be described.
The manufacturing method of the display device 10 is roughly divided into a substrate manufacturing process, a liquid crystal panel 40 manufacturing process, a display panel 20 manufacturing process, and a display device 10 manufacturing process.
First, the manufacturing process of a board | substrate is demonstrated.
The manufacturing process of the substrate is roughly divided into a manufacturing process of the element substrate 60 and a manufacturing process of the counter substrate 70. Any of the manufacturing process of the element substrate 60 and the manufacturing process of the counter substrate 70 may be performed first or later.

In the manufacturing process of the element substrate 60, as shown in FIG. 15A, first, the gate electrode 72 (gate line 117) and the relaxing layer 65 are formed on the first surface 51a of the first substrate 51.
The gate electrode 72 (gate line 117) is formed by forming a metal film on the first surface 51a using, for example, a sputtering technique and then patterning the metal film using, for example, a photolithography technique or an etching technique. Can be formed.

The relaxing layer 65 can be formed by a process including a film forming process and a patterning process.
For example, when the relaxing layer 65 is made of an inorganic material such as silicon oxide or silicon nitride, a CVD (Chemical Vapor Deposition) technique, a PVD (Physical Vapor Deposition) technique, a vapor deposition technique, or the like can be used in the film forming process. In the patterning step, for example, a photolithography technique or an etching technique can be used.
For example, when the relaxation layer 65 is made of a resin material, a liquid film is formed of a photosensitive liquid resin material by utilizing a spin coating technique or the like in the film forming process. In the patterning step, the liquid film can be patterned on the relaxation layer 65 by utilizing, for example, a photolithography technique.

Next, as shown in FIG. 15B, a gate insulating film 53 is formed to cover the gate electrode 72 (gate line 117) and the relaxing layer 65 from the first surface 51a side. The gate insulating film 53 can be formed of silicon nitride, silicon oxide, or the like by utilizing, for example, CVD technology, PVD technology, vapor deposition technology, or the like.
Here, a step 147 is formed in the transmission region T in the gate insulating film 53. This is because the uneven shape on the base side of the gate insulating film 53 (on the first substrate 51 side in FIG. 15B) is easily reflected. Therefore, a step 147 is easily formed in the gate insulating film 53 between the relaxing layer 65 and the gate line 117 that are adjacent to each other with the transmission region T interposed therebetween.

Next, as illustrated in FIG. 15C, the semiconductor layer 73 is formed on the gate insulating film 53, and then the source electrode 74 and the drain electrode 75 that overlap with part of the semiconductor layer 73 are formed. Thereby, the TFT element 63 is formed.
The source electrode 74 and the drain electrode 75 are formed by forming a metal film on the gate insulating film 53 using, for example, a sputtering technique, and then patterning the metal film using, for example, a photolithography technique or an etching technique. Can be formed.

Next, as shown in FIG. 15D, a liquid film 55 b is formed on the TFT element 63 and the gate insulating film 53 with a liquid 55 a containing a material constituting the resin layer 55. The liquid film 55b has positive photosensitivity, and can be formed by utilizing, for example, a spin coating technique.
Here, a step 149 is formed in the transmission region T in the liquid film 55b. This is because the step 147 (FIG. 15B) of the gate insulating film 53 is easily reflected in the liquid film 55b.

  Next, as shown in FIG. 16A, the liquid film 55 b is exposed with ultraviolet light 153 through a photomask 151. Here, the photomask 151 is provided with a plurality of openings 155 in a region overlapping the reflective region H. The liquid film 55 b is irradiated with the ultraviolet light 153 through the plurality of openings 155.

At this time, the ultraviolet light 153 is also irradiated to a portion 76a where the contact hole 76 is to be formed in the liquid film 55b.
Next, the liquid film 55b is developed. Thereby, the site | part exposed through the some opening part 155 and the site | part 76a are removed among the liquid film 55b.
Next, by baking the liquid film 55b, the resin layer 55 having the uneven portions 79 and the contact holes 76 can be formed as shown in FIG.

Next, a metal film such as aluminum is formed on the resin layer 55 using, for example, a sputtering technique.
Next, the reflective film 67 shown in FIG. 16C is formed by patterning the metal film formed on the resin layer 55 using, for example, a photolithography technique or an etching technique.

Here, when the uneven portion 79 is formed in the resin layer 55 by utilizing the photolithography technique, a step is formed between the surface of the resin layer 55 and the convex portion of the uneven portion 79 as shown in FIG. 157 is easily formed. The step 157 is set larger than the step 149. This is because the thickness of the reflective film 67 provided on the uneven portion 79 is taken into consideration.
In the liquid crystal panel 40, the surface of the resin layer 55 in the transmission region T and the reflective film 67 provided on the convex portion of the concave and convex portion 79 are set to substantially the same level as shown in FIG. ing. That is, the amount obtained by subtracting the thickness of the reflective film 67 from the amount of the step 157 is set to be approximately equal to the amount of the step 149. This can be realized by setting the thickness of the relaxing layer 65 to an amount obtained by subtracting the thickness of the reflective film 67 from the amount of the step 157.

Next, as shown in FIG. 17A, a liquid film 57 b is formed on the resin layer 55 and the reflective film 67 with a liquid 57 a containing a material constituting the planarizing film 57. The liquid film 57b has negative photosensitivity and can be formed by utilizing, for example, a spin coating technique.
Next, the liquid film 57b is exposed. At this time, the exposure light is shielded in a portion 76b of the liquid film 57b that overlaps the contact hole 76 in plan view. As a result, the portion excluding the portion 76b in the liquid film 57b is cured, and the cured layer 57c shown in FIG. 17B can be formed.

Next, as shown in FIG. 17B, the common electrode 69 is formed on the hardened layer 57c. The common electrode 69 is formed by forming an ITO film on the hardened layer 57c using, for example, a sputtering technique and then patterning the ITO film using, for example, a photolithography technique or an etching technique. obtain.
Next, an insulating film 59 that covers the cured layer 57 c and the common electrode 69 is formed on the cured layer 57 c and the common electrode 69. The insulating film 59 can be formed of silicon nitride, silicon oxide, or the like by utilizing, for example, CVD technology, PVD technology, vapor deposition technology, or the like. The insulating film 59 can also be formed of an acrylic resin or the like by utilizing, for example, a spin coating technique.

Next, a contact hole 76 that overlaps the drain electrode 75 in plan view is formed in the insulating film 59 by using a photolithography technique, an etching technique, and the like.
Next, the planarizing film 57 can be formed as shown in FIG. 17C by removing the portion 76b of the hardened layer 57c. As a result, a contact hole 76 extending from the insulating film 59 to the drain electrode 75 through the planarizing film 57 and the resin layer 55 can be formed.

  Next, as shown in FIG. 10, the pixel electrode 71 is formed on the insulating film 59. The pixel electrode 71 is formed by forming an ITO film on the insulating film 59 using, for example, a sputtering technique and then patterning the ITO film using, for example, a photolithography technique or an etching technique. obtain.

Next, an alignment film 61 that covers the pixel electrode 71 is formed on the insulating film 59 and the pixel electrode 71. The alignment film 61 can be formed by forming a resin film covering the pixel electrode 71 with a resin such as polyimide on the pixel electrode 71 and the insulating film 59 and then performing an alignment process such as a rubbing process on the resin film. . The resin film covering the pixel electrode 71 can be formed by utilizing, for example, a spin coating technique or a printing technique.
Thereby, the element substrate 60 can be manufactured.

  In the manufacturing process of the counter substrate 70, as shown in FIG. 18A, first, the light absorption layer 85 is formed on the counter surface 83b of the second substrate 81 in a lattice shape in plan view. The light absorption layer 85 can be formed by forming a resin film containing carbon black, chromium, or the like and then patterning the resin film using, for example, a photolithography technique.

Next, a color filter 87 is formed in the region of each pixel 9 surrounded by the light absorption layer 85. The color filter 87 can be formed by disposing a resin containing a colorant corresponding to each of R, G, and B light in the region of each pixel 9. In addition, arrangement | positioning of resin in the area | region of each pixel 9 can be performed by utilizing an inkjet technique or a vapor deposition technique, for example.
Next, an overcoat layer 91 is formed on the light absorption layer 85 and the color filter 87. The overcoat layer 91 can be formed of a resin having light transparency by utilizing, for example, a spin coat technique.

  Next, as shown in FIG. 18B, an alignment film 93 is formed on the overcoat layer 91. In forming the alignment film 93, for example, a spin coating technique is used to form a resin film on the overcoat layer 91 with a resin such as polyimide, and then an alignment process such as a rubbing process is performed on the resin film. Thereby, the alignment film 93 can be formed.

Next, as shown in FIG. 18C, a liquid film 95 b is formed on the alignment film 93 by using the liquid body 95 a containing a negative photosensitive liquid crystal compound. The liquid film 95b can be formed by utilizing, for example, a spin coating technique.
In addition, as the liquid body 95a, the structure which added the photoinitiator to what mixed the liquid crystal compound and the solvent may be employ | adopted.

As the liquid crystal compound, for example, LC242 manufactured by BASF may be employed. As the solvent, for example, PGMEA (propylene glycol monomethyl ether acetate) may be employed. As the photopolymerization initiator, for example, Irgacure 907 manufactured by Ciba Specialty Chemicals may be employed.
Here, the alignment state of the molecules of the liquid crystal compound contained in the liquid film 95b is regulated by the alignment film 93 subjected to the alignment treatment. As a result, the liquid film 95b exhibits anisotropy in the refractive index.

  Next, as shown in FIG. 18D, the liquid film 95 b is exposed with ultraviolet light 166 through a photomask 165. Here, the photomask 165 has an opening 167 in a region overlapping the reflective region H. The liquid film 95 b is irradiated with ultraviolet light 166 through the opening 167. Then, the exposed portion of the liquid film 95b is cured.

  Next, the liquid film 95b is developed with a developer such as PGMEA. As a result, the liquid film 95b in the region shielded from light by the photomask 165 is peeled off, and the retardation film 95 shown in FIG. 10 can be formed.

Next, as shown in FIG. 10, an alignment film 97 that covers the alignment film 93 and the retardation film 95 from the bottom surface 23 side is formed.
In the formation of the alignment film 97, a resin film is formed on the alignment film 93 and the retardation film 95 with a resin such as polyimide, and then an alignment process such as a rubbing process is performed on the resin film.
Thereby, the alignment film 97 is formed, and the counter substrate 70 can be manufactured.

In the manufacturing process of the liquid crystal panel 40, first, the element substrate 60 and the counter substrate 70 are joined via the annular sealing material 21 (FIG. 8) in plan view. At this time, the sealing material 21 is provided in a state where a part of the annular contour is missing in a plan view. A portion of the sealing material 21 lacking a part of the annular contour becomes an inlet for the liquid crystal 19.
Next, after the liquid crystal 19 is injected from the injection port, the liquid crystal 19 is sealed by closing the injection port. Thereby, the liquid crystal panel 40 shown in FIG. 8 can be manufactured.

In the manufacturing process of the display panel 20, the polarizing plates 7a and 7b shown in FIG. The polarizing plate 7a is provided on the outward surface 83a (FIG. 10) of the second substrate 81, and the polarizing plate 7b is provided on the second surface 51b (FIG. 10) of the first substrate 51. Thereby, the display panel 20 shown in FIG. 8 can be manufactured.
Note that the polarizing plate 7 a and the polarizing plate 7 b may be provided on the first substrate 51 and the second substrate 81 before the manufacturing process of the liquid crystal panel 40.
In the manufacturing process of the display device 10, the display device 10 can be manufactured by combining the display panel 20 and the illumination device 30.

In the second embodiment, the gate line 117 (gate electrode 72) corresponds to a gate line as a wiring, and the resin layer 55 corresponds to an unevenness forming layer.
In the display device 10 of the second embodiment, each pixel 9 is provided with a relaxation layer 65 that overlaps the reflection region H in plan view. Each relaxing layer 65 is provided on the same level as the gate line 117 (the first surface 51a of the first substrate 51), and is adjacent to the gate line 117 for each pixel 9. For this reason, it is possible to reduce the reflection of the thickness of the gate line 117 on the liquid crystal 19 in the reflection region H. Thereby, the variation in the modulation state of the light reflected to the second substrate 81 side by the reflective film 67 can be reduced. As a result, the display quality in the reflective display can be easily improved.

  In the display device 10 of the second embodiment, the step 157 is set larger than the step 149 (FIG. 16B) by setting the thickness of the relaxing layer 65. For this reason, it is possible to easily set the reflective film 67 provided on the uneven portion 79 and the surface of the resin layer 55 in the transmission region T to substantially the same level. Thereby, the retardation of the liquid crystal 19 in the transmission region T and the retardation of the liquid crystal 19 in the reflection region H can be easily set appropriately. As a result, the display quality can be easily improved in each of the reflective display and the transmissive display.

  Further, in the display device 10 of the second embodiment, the relaxing layer 65 has a light shielding property against the light from the lighting device 30. For this reason, it can be reduced that the light incident on the first substrate 51 from the illumination device 30 via the bottom surface 23 is irregularly reflected by the reflection film 67. Thereby, it is possible to suppress the irregularly reflected light from entering the transmission region T. As a result, it is possible to suppress a decrease in contrast in transmissive display.

A third embodiment will be described.
The display device 10 according to the third embodiment includes a liquid crystal panel 50 as shown in FIG. 19 which is a cross-sectional view taken along the line DD in FIG. The display device 10 in the third embodiment has the same configuration as the display device 10 in the second embodiment, except that the liquid crystal panel 40 in the second embodiment is replaced with a liquid crystal panel 50. .
Therefore, in the following third embodiment, in order to avoid redundant description, the same components as those in the second embodiment are denoted by the same reference numerals, detailed description thereof is omitted, and only differences from the second embodiment are described. Will be described.

The liquid crystal panel 50 includes an element substrate 80 instead of the element substrate 60 in the second embodiment, as shown in FIG. 20 which is a cross-sectional view taken along line FF in FIG.
In the liquid crystal panel 50, the relaxation layer 65 is provided in the reflection region H, and the relaxation layer 171 is provided in the transmission region T.
The relaxing layer 171 is provided on the first surface 51 a of the first substrate 51 and is covered with the gate insulating film 53 from the display surface 13 side. The relaxing layer 171 is provided between two gate electrodes 72 adjacent in the Y direction, and is provided in a region overlapping the transmission region T in plan view. The relaxing layer 65, the relaxing layer 171 and the gate electrode 72 are provided in the same layer with a space therebetween in the Y direction.

As the material of the relaxation layer 171, various materials such as inorganic materials such as silicon oxide and silicon nitride, and resin materials such as acrylic and epoxy can be employed. In the liquid crystal panel 50, the relaxing layer 171 is made of a light transmissive material. For this reason, the relaxing layer 171 has light transmittance with respect to the light from the illumination device 30.
In the manufacturing process of the element substrate 80, as shown in FIG. 21A, the gate electrode 72 (gate line 117), the relaxing layer 65, and the relaxing layer 171 are formed on the first surface 51a of the first substrate 51. To do.

The relaxation layer 171 can be formed by a process including a film forming process and a patterning process.
For example, when the relaxation layer 171 is made of an inorganic material such as silicon oxide or silicon nitride, a CVD technique, a PVD technique, a vapor deposition technique, or the like can be used in the film forming process. In the patterning step, for example, a photolithography technique or an etching technique can be used.
For example, when the relaxation layer 171 is made of a resin material, in the film forming process, a liquid film is formed of a liquid resin material having photosensitivity by utilizing a spin coating technique or the like. In the patterning step, the liquid film can be patterned on the relaxation layer 65 by utilizing, for example, a photolithography technique.

The thickness of the relaxing layer 171 is set to be thinner than the thickness of the relaxing layer 65.
Next, as shown in FIG. 21B, a gate insulating film 53 is formed to cover the gate electrode 72 (gate line 117), the relaxing layer 65, and the relaxing layer 171 from the first surface 51a side.
Here, a step 173 is formed in the transmission region T in the gate insulating film 53. This is because the uneven shape on the base side of the gate insulating film 53 (on the first substrate 51 side in FIG. 21B) is easily reflected. Therefore, in the gate insulating film 53, a step 173 is easily formed between the relaxing layer 65 and the relaxing layer 171 adjacent to each other with the transmission region T interposed therebetween, and between the gate line 117 and the relaxing layer 65.

When the liquid film 55b is formed on the TFT element 63 and the gate insulating film 53, a step 175 is formed in the transmission region T in the liquid film 55b as shown in FIG.
When the concavo-convex portion 79 and the contact hole 76 are formed by performing exposure processing and development processing on the liquid film 55b, a step 177 is easily formed in the resin layer 55 as shown in FIG. The step 177 is set larger than the step 175 in consideration of the thickness of the reflective film 67 provided on the uneven portion 79.

  When the reflective film 67 is formed on the uneven portion 79, the surface of the resin layer 55 in the transmission region T and the reflective film 67 provided on the convex portion of the uneven portion 79 are as shown in FIG. In other words, the level is almost equivalent.

Here, assuming that the thickness of the gate line 117 (gate electrode 72) is H1, the amount of the step 177 is H2, and the thickness of the reflective film 67 is H3, the thickness H4 of the relaxing layer 65 is calculated by the following equation (1). obtain.
Thickness H4 of relaxation layer 65 = H1 + H2-H3 (1)
Further, the thickness H5 of the relaxation layer 171 can be calculated by the following equation (2).
Thickness H5 = H4-H2 = H1-H3 of relaxation layer 171 (2)

  By setting the thickness H4 of the relaxation layer 65 and the thickness H5 of the relaxation layer 171 based on the above formulas (1) and (2), the surface of the resin layer 55 in the transmission region T and the convex portions of the concave and convex portions 79 are formed. The reflective film 67 provided on the top can be set to a substantially equivalent level.

Also in the display device 10 in the third embodiment, the same effects as those of the display device 1 in the first embodiment and the display device 10 in the second embodiment are obtained.
Providing the relaxing layer 171 in the transmission region T is effective when the viscosity of the liquid 55a containing the material constituting the resin layer 55 is low. This is because when the viscosity of the liquid 55a is low, the uneven shape is remarkably reflected in the liquid film 55b.

  In the second embodiment and the third embodiment, the configuration in which the relaxing layer 65 is provided in the same layer (the first surface 51a of the first substrate 51) as the gate line 117 is illustrated. However, the relaxing layer 65 is provided. The hierarchy is not limited to this. As the layer on which the relaxing layer 65 is provided, for example, the same layer as the source line 119 (source electrode 74) may be employed. In this case, the relaxing layer 65 is provided for each pixel 9 in a region overlapping the reflection region H in plan view, and is adjacent to the source line 119 for each pixel 9. Even in this configuration, the same effects as those of the first and second embodiments can be obtained.

  In the third embodiment, the configuration in which the relaxing layer 171 is provided in the same layer as the gate line 117 (the first surface 51a of the first substrate 51) is illustrated, but the layer in which the relaxing layer 171 is provided is not limited thereto. For example, the same layer as the source line 119 (source electrode 74) may be employed as the layer on which the relaxing layer 171 is provided. In this case, the relaxation layer 171 is provided for each pixel 9 in a region overlapping the transmission region T in plan view, and is adjacent to the source line 119 for each pixel 9. Even in this configuration, the same effect as the third embodiment can be obtained.

  In the first embodiment, the second embodiment, and the third embodiment, the FFS type driving method is adopted as the driving method of the liquid crystal 19, but the driving method is not limited to this. As the driving method of the liquid crystal 19, various methods such as a TN (Twisted Nematic) type, an IPS (In Plane Switching) type, and a VA (Vertical Alignment) type can be adopted.

In the second and third embodiments, the case where the retardation film 95 is provided on the counter substrate 70 side has been described as an example. However, the retardation film 95 is not limited to this, and the element substrate is used. It may be provided on the 60, 80 side.
In the first embodiment, a configuration in which the uneven portion 79 is provided in the resin layer 55 may be employed. Thereby, since the light reflected by the reflective film 67 can be diffused, the display quality in the display device 1 can be further improved.

  In the second and third embodiments, the configuration having the alignment film 93 and the retardation film 95 has been described as an example. However, the configuration is not limited thereto, and the alignment film 93 and the retardation film 95 are replaced. A configuration in which a phase difference sheet (phase difference plate) is attached can also be adopted. In this configuration, the alignment film 93 is omitted, and a retardation sheet is provided instead of the retardation film 95. With this configuration, the alignment film 93 can be omitted, so that the display device 10 can be thinned.

  In the second embodiment and the third embodiment, the phase difference film 95 that gives a phase difference of ½ wavelength with respect to incident light has been described as an example. However, the present invention is not limited to this, and various phase differences such as ¼ wavelength and １ ／ wavelength can be adopted.

  In addition, as the display device 1 in the first embodiment, a front light type configuration in which the illumination device 30 is provided on the display surface 13 side with respect to the counter substrate 17 may be employed.

  The display device 1 and the display device 10 described above can be applied to, for example, the display unit 510 of the electronic device 500 illustrated in FIG. This electronic device 500 is a mobile phone. This electronic device 500 has operation buttons 511. The display unit 510 can display various information including information input by the operation buttons 511 and incoming call information. In this electronic apparatus 500, since the display device 1 or the display device 10 is applied to the display unit 510, the display quality in the display unit 510 can be easily improved.

  The electronic device 500 is not limited to a mobile phone, and includes various electronic devices such as mobile computers, digital still cameras, digital video cameras, in-vehicle devices such as display devices for car navigation systems, and audio devices. The display device 1, the display panel 20, and the liquid crystal panels 3, 40, and 50 can be applied as light valves to a projection display device such as a projector.

The disassembled perspective view which shows the main structures of the display apparatus in 1st Embodiment. Sectional drawing in the AA in FIG. FIG. 3 is a plan view showing a part of a plurality of pixels in the first embodiment. Sectional drawing in the CC line | wire in FIG. The top view explaining arrangement | positioning of the TFT element in 1st Embodiment, a common electrode, and a pixel electrode. The figure explaining the polarization state of the display apparatus in 1st Embodiment. The disassembled perspective view which shows the main structures of the display apparatus in 2nd Embodiment. Sectional drawing in the DD line | wire in FIG. The enlarged view of the E section in FIG. Sectional drawing in the FF line | wire in FIG. Sectional drawing in the KK line | wire in FIG. The top view explaining arrangement | positioning of the TFT element in 2nd Embodiment, a common electrode, and a pixel electrode. The figure explaining the polarization state in the transmissive area | region of the display panel in 2nd Embodiment. The figure explaining the polarization state in the reflective area | region of the display panel in 2nd Embodiment. The figure explaining the manufacturing process of the element substrate in 2nd Embodiment. The figure explaining the manufacturing process of the element substrate in 2nd Embodiment. The figure explaining the manufacturing process of the element substrate in 2nd Embodiment. The figure explaining the manufacturing process of the opposing board | substrate in 2nd Embodiment. Sectional drawing in the DD line in FIG. 7 of the display apparatus in 3rd Embodiment. Sectional drawing in the FF line | wire in FIG. 9 of the liquid crystal panel in 3rd Embodiment. The figure explaining the manufacturing process of the element substrate in 3rd Embodiment. The figure explaining the manufacturing process of the element substrate in 3rd Embodiment. The perspective view of the electronic device to which the display apparatus in this embodiment was applied. Sectional drawing explaining the structure of the conventional liquid crystal device. Sectional drawing explaining the subject in the conventional liquid crystal device. Sectional drawing explaining the subject in the conventional liquid crystal device.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1,10 ... Display apparatus, 3,40,50 ... Liquid crystal panel, 9 ... Pixel, 11 ... Display area, 13 ... Display surface, 15, 60, 80 ... Element substrate, 17, 70 ... Counter substrate, 19 ... Liquid crystal, DESCRIPTION OF SYMBOLS 20 ... Display panel, 23 ... Bottom surface, 51 ... 1st board | substrate, 51a ... 1st surface, 51b ... 2nd surface, 55 ... Resin layer, 55a ... Liquid material, 55b ... Liquid material film, 63 ... TFT element, 65, 171 ... Relaxation layer, 67 ... Reflective film, 72 ... Gate electrode, 74 ... Source electrode, 75 ... Drain electrode, 79 ... Uneven portion, 117 ... Gate line, 119 ... Source line, 500 ... Electronic device, H ... Reflection region, T: Transmission region, M: Matrix.

Claims (13)

A first substrate;
A second substrate facing the first substrate;
Liquid crystal interposed between the first substrate and the second substrate;
A reflective film interposed between the first substrate and the liquid crystal and reflecting light incident on the liquid crystal through the second substrate toward the second substrate;
A plurality of wirings interposed between the first substrate and the reflective film;
A pattern is formed between the first substrate and the reflective film between the adjacent wirings in plan view so as to include at least a region overlapping with the reflective film in plan view, thereby reducing a step due to the wiring. And a relaxation layer. Multiple pixels are set,
In each of the pixels, a transmissive region for performing transmissive display and a reflective region for performing reflective display are set.
The liquid crystal device according to claim 1, wherein the reflection film is provided for each of the reflection regions, and the relaxation layer is selectively formed corresponding to the reflection region. Having a concavo-convex forming layer provided with a concavo-convex portion in a region overlapping each reflective region in plan view;
The irregularity forming layer is interposed between the plurality of wirings and the reflective film,
3. The liquid crystal device according to claim 2, wherein each of the reflection films is provided on the liquid crystal side of each of the uneven portions in each of the reflection regions.   The liquid crystal device according to claim 3, wherein the relaxation layer is also provided in a region overlapping the transmission region in plan view.   The liquid crystal device according to claim 4, wherein the relaxation layer corresponding to the reflection region and the relaxation layer corresponding to the transmission region have different thicknesses.   The liquid crystal device according to claim 5, wherein a thickness of the relaxation layer corresponding to the reflection region is larger than a thickness of the relaxation layer corresponding to the transmission region.   The liquid crystal device according to claim 2, wherein the relaxation layer corresponding to the reflection region and the relaxation layer corresponding to the transmission region are made of different materials.   The liquid crystal device according to claim 7, wherein at least the relaxing layer corresponding to the transmissive region is made of a light transmissive material.   9. The liquid crystal device according to claim 7, wherein the relaxation layer corresponding to the reflective region is made of a light-absorbing material. Provided corresponding to each of the pixels, each pixel has a TFT element that controls driving of the liquid crystal,
The liquid crystal device according to claim 1, wherein the wiring is a gate line that supplies a driving signal to the TFT element. Provided corresponding to each of the pixels, each pixel has a TFT element that controls driving of the liquid crystal,
The liquid crystal device according to claim 1, wherein the wiring is a source line that supplies an image signal to the TFT element. A first substrate;
A second substrate facing the first substrate;
Liquid crystal interposed between the first substrate and the second substrate;
A plurality of pixels in which a transmissive region for transmissive display and a reflective region for reflective display are set;
A reflective film interposed between the first substrate and the liquid crystal and provided in a region overlapping the reflective region for each pixel;
An irregularity-forming layer provided between the first substrate and the reflective film and having an irregularity in a region overlapping each reflective region in plan view;
A relaxation layer interposed between the first substrate and the unevenness forming layer,
The concavo-convex portion is provided on the liquid crystal side of the concavo-convex forming layer,
The reflective film is provided on the liquid crystal side of the uneven portion,
The liquid crystal device according to claim 1, wherein the relaxation layer is provided in a region overlapping at least the uneven portion in plan view.   An electronic apparatus comprising the liquid crystal device according to claim 1 as a display unit.

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