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JP2009268973A - Coating apparatus - Google Patents

Coating apparatus Download PDF

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Publication number
JP2009268973A
JP2009268973A JP2008122020A JP2008122020A JP2009268973A JP 2009268973 A JP2009268973 A JP 2009268973A JP 2008122020 A JP2008122020 A JP 2008122020A JP 2008122020 A JP2008122020 A JP 2008122020A JP 2009268973 A JP2009268973 A JP 2009268973A
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Prior art keywords
substrate
coating
backing roll
cleaning
applicator
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JP2008122020A
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JP4644726B2 (en
Inventor
Tsutomu Nishio
勤 西尾
Masanori Koda
正紀 甲田
Masakazu Kajitani
雅一 梶谷
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Chugai Ro Co Ltd
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Chugai Ro Co Ltd
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Priority to JP2008122020A priority Critical patent/JP4644726B2/en
Priority to TW098102021A priority patent/TWI372659B/en
Priority to KR1020090009243A priority patent/KR101077319B1/en
Priority to CN2009100047416A priority patent/CN101574685B/en
Publication of JP2009268973A publication Critical patent/JP2009268973A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • B05C11/1023Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to velocity of target, e.g. to web advancement rate
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a coating apparatus capable of stabilizing the gap between a substrate and a coater, controlling the speed of a substrate one by one, carrying out frame coating, and forming no scratch in the rear face of a substrate. <P>SOLUTION: The coating apparatus includes a coater 3b for applying a coating liquid to top of a substrate P, a backing roll 5 rotably and drivably disposed below the coater 3b, having suction holes 7 in the outer circumference and transporting the substrate P with suction, transporting rollers 6a and 6b installed at positions lower than the backing roll 5 upstream and downstream of the backing roll 5 and for transporting the substrate P with suction, a carrying-in conveyer installed upstream of the upstream transporting roller 6a for carrying the substrate P into the backing roll 5, and a carrying-out conveyer installed downstream of the downstream transporting roller 6b for carrying the substrate P out of the backing roll 5. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、液晶ディスプレイ用カラーフィルタ、プラズマディスプレイ用ガラス基板、光学フィルタ、プリント基板等の製造に使用されるもので、基板上に塗布液を塗布して塗膜を形成する塗布装置に関する。   The present invention is used for manufacturing a color filter for a liquid crystal display, a glass substrate for a plasma display, an optical filter, a printed board, and the like, and relates to a coating apparatus that forms a coating film by coating a coating liquid on the substrate.

この種の塗布装置は、基板を移載装置(基板移載ロボット)により移載する基板移載式と、基板を搬送ベルトにより搬送する基板連続搬送式とがある。   This type of coating apparatus includes a substrate transfer type in which a substrate is transferred by a transfer device (substrate transfer robot) and a substrate continuous transfer type in which the substrate is transferred by a transfer belt.

基板移載式の塗布装置として、特許文献1には、移載装置(基板搬送ロボット)により基板を載置台に搬入し、載置台又は塗布器のいずれかを相対的に移動させて基板上に塗膜を形成した後、移載装置により基板を搬出する塗布装置が記載されている。   As a substrate transfer type coating device, Patent Document 1 discloses that a substrate is carried into a mounting table by a transfer device (substrate transport robot), and either the mounting table or the applicator is moved relative to the substrate. An application device is described in which a substrate is unloaded by a transfer device after a coating film is formed.

また、特許文献2には、テーブルに複数の基板を載置できるようにし、テーブルの任意の位置に載置された基板に塗膜を形成する間に、他の位置で移載装置により基板の排出及び/又は載置を行うことで、1枚の基板の処理に要する時間を短縮した塗布装置が記載されている。   Further, in Patent Document 2, a plurality of substrates can be placed on a table, and while a coating film is formed on a substrate placed at an arbitrary position of the table, the substrate is transferred by another transfer device at another position. A coating apparatus is described in which the time required for processing one substrate is shortened by discharging and / or placing.

しかし、これらの基板移載式の塗布装置は、基板の取り換えに時間を要し、1枚の基板の処理に要するタクト時間が長く、生産性の向上を見込めない。   However, these substrate transfer type coating apparatuses require time for replacing the substrate, and the tact time required for processing one substrate is long, so that improvement in productivity cannot be expected.

基板連続搬送式の塗布装置としては、特許文献3に、塗布器の前後に搬送ベルトを設け、前工程より搬入されてきた基板に弾性体枠をセットし、該弾性体枠を前部搬送ベルトに設けた穴を介して真空吸着しながら搬送し、塗布器を通過させて基板に塗布した後、後部搬送ベルトで排出する塗布装置が記載されている。   As a substrate continuous conveyance type coating apparatus, in Patent Document 3, a conveyance belt is provided before and after the applicator, an elastic frame is set on the substrate carried in from the previous process, and the elastic frame is attached to the front conveyance belt. A coating apparatus is described that transports while vacuum-sucking through a hole provided in the substrate, passes the coating device through the hole, coats the substrate, and then discharges it with a rear conveyor belt.

しかし、この引用文献3の塗布装置では、塗布器の部分で基板の吸引力が無くなるため、基板と塗布器のダイとの隙間が一定しないという問題がある。   However, the coating apparatus disclosed in the cited document 3 has a problem that the gap between the substrate and the die of the applicator is not constant because the suction force of the substrate disappears in the applicator portion.

また、特許文献4には、図5に示すように、塗布器101の上流側に基板Pを移動させるための駆動コンベア102と、下流側に基板Pが互いに押し合うようにするための回転抵抗をもった駆動コンベア103と、これらのコンベア102,103の間に定回転抵抗をもったコンベア104とを設け、複数の基板Pを各コンベア102,103,104のベルトの直下に設けた吸引テーブル105により吸引しながら、隙間を空けることなく連続して移動させて塗布器101により各基板Pに塗料106を塗布する塗布装置が記載されている。   Further, in Patent Document 4, as shown in FIG. 5, a driving conveyor 102 for moving the substrate P to the upstream side of the applicator 101 and a rotational resistance for causing the substrate P to press against each other on the downstream side. And a conveyor 104 having a constant rotational resistance between the conveyors 102 and 103, and a plurality of substrates P provided immediately below the belts of the conveyors 102, 103, and 104. A coating apparatus is described in which the coating device 106 is applied to each substrate P by the applicator 101 while being suctioned by 105 and continuously moved without leaving a gap.

しかし、この引用文献4の塗布装置では、駆動コンベア102,103,104のベルト上で塗布するので、ベルトの平面度を所定の公差内(例えば10μm)に保つことが難しく、やはり基板Pと塗布器101のダイとの隙間が一定しないという問題がある。また、連続移動する基板Pと隣接する基板Pの間に隙間を空けずに連続して塗布するので、基板Pの全周に把持用の余白を残す所謂額縁塗装(図6参照)ができないという問題がある。また、駆動コンベア102,103,104に速度差があるので、基板Pの裏面と駆動コンベア102,103,104のベルトとの間で滑りが生じ、基板Pに疵が発生する虞がある。   However, in the coating apparatus of the cited document 4, since the coating is performed on the belts of the drive conveyors 102, 103, and 104, it is difficult to keep the flatness of the belt within a predetermined tolerance (for example, 10 μm). There is a problem that the gap between the vessel 101 and the die is not constant. In addition, since the coating is continuously performed without leaving a gap between the substrate P that moves continuously and the adjacent substrate P, so-called frame coating (see FIG. 6) that leaves a margin for gripping on the entire periphery of the substrate P cannot be performed. There's a problem. Further, since there is a speed difference between the drive conveyors 102, 103, and 104, there is a possibility that slip occurs between the back surface of the substrate P and the belt of the drive conveyors 102, 103, and 104 and wrinkles occur on the substrate P.

また、引用文献5,6のようにフィルム状の被塗布体をローラで吸引しながら塗布を行う方法もあるが、この場合は、ガラス基板等には用いることができない。
特開2000−197844号公報 特開2002−102771号公報 特開2000−151074号公報 特開2002−45775号公報 特開平5−277418号公報 特開平6−039333号公報
In addition, there is a method of performing application while sucking a film-like object to be applied with a roller as in References 5 and 6, but in this case, it cannot be used for a glass substrate or the like.
JP 2000-197844 A JP 2002-102771 A JP 2000-151074 A JP 2002-45775 A Japanese Patent Application Laid-Open No. 5-277418 JP-A-6-039333

本発明は、前記従来の問題点に鑑みてなされたもので、基板と塗布器の間の隙間を安定させることができる塗装装置、基板を1枚ずつ速度制御することができ、これにより額縁塗装が可能な塗装装置、及び基板の裏面に疵が発生することがない塗装装置を提供することを課題とする。   The present invention has been made in view of the above-described conventional problems. A coating apparatus that can stabilize the gap between the substrate and the applicator, and can control the speed of the substrates one by one. It is an object of the present invention to provide a coating apparatus capable of performing the above and a coating apparatus in which wrinkles are not generated on the back surface of the substrate.

前記課題を解決するために、本発明は、
基板上に塗布液を塗布する塗布器と、
前記塗布器と対向する位置に回転駆動可能に配置され、外周に吸引孔を有し、前記基板を吸引しつつ搬送するバッキングロールと、
前記バッキングロールの上流側と下流側に、前記基板を搬送する搬送ローラと、
からなることを特徴としている。
In order to solve the above problems, the present invention provides:
An applicator for applying a coating solution on a substrate;
A backing roll that is rotatably arranged at a position facing the applicator, has a suction hole on the outer periphery, and transports the substrate while sucking;
A transport roller for transporting the substrate to the upstream side and the downstream side of the backing roll;
It is characterized by consisting of.

前記搬送ローラは、前記基板を吸引しつつ搬送するものであることが好ましい。この場合、前記搬送ローラは前記バッキングロールより低い位置に配置することが好ましい。   It is preferable that the conveyance roller conveys the substrate while sucking it. In this case, it is preferable that the transport roller is disposed at a position lower than the backing roll.

前記塗布装置はさらに、前記上流側の搬送ローラの上流側に配置され、前記基板をバッキングロールに搬入する搬入コンベアと、
前記下流側の搬送ローラの下流側に配置され、前記バッキングローラから前記基板を搬出する搬出コンベアと、
を有することが好ましい。
The coating apparatus is further disposed on the upstream side of the upstream side conveyance roller, and a carry-in conveyor for carrying the substrate into a backing roll;
An unloading conveyor disposed on the downstream side of the downstream conveying roller, and unloading the substrate from the backing roller;
It is preferable to have.

前記塗布器は、塗布位置と洗浄位置に交互に位置を切り替え可能に設けた1対の塗布ヘッドを有することが好ましい。この場合、前記上流側の搬送ローラと前記搬入コンベアの間に、又は前記下流側の搬送ローラと前記搬出コンベアの間に、洗浄位置にある前記塗布ヘッドを洗浄する洗浄装置を設けることが好ましい。   It is preferable that the applicator has a pair of application heads that can be alternately switched between an application position and a cleaning position. In this case, it is preferable to provide a cleaning device for cleaning the coating head at the cleaning position between the upstream-side transport roller and the carry-in conveyor or between the downstream-side transport roller and the carry-out conveyor.

前記塗布器又は前記洗浄装置は前記洗浄位置で昇降可能に設けることが好ましい。   It is preferable that the applicator or the cleaning device is provided to be movable up and down at the cleaning position.

前記手段からなる本発明によれば、塗布器の下方にバッキングロールが配置されているので、ベルトバッキングロール上を搬送される基板と塗布器との間の隙間が安定し、塗布精度が向上する。   According to the present invention comprising the above means, since the backing roll is disposed below the applicator, the gap between the substrate transported on the belt backing roll and the applicator is stabilized, and the coating accuracy is improved. .

また、バッキングロールと搬送コンベアで基板を吸引しながら、1枚ずつ一定に速度制御できる。このため、基板とバッキングロール又は搬送コンベアとの間に滑りがなく、基板の裏面に疵が発生しない。   In addition, the speed can be controlled constant one by one while sucking the substrate with the backing roll and the conveyor. For this reason, there is no slip between the substrate and the backing roll or the conveyor, and no wrinkles are generated on the back surface of the substrate.

さらに、搬送する基板間に間隔を設けて1枚ずつ搬送し、塗工の始端と終端で速度制御しながら、基板の先端から一定距離の位置から塗工を開始し、後端から一定距離残した位置で塗工を終了することで、所謂額縁塗装が可能となる。   Furthermore, the substrate is transported one by one with a gap between the substrates to be transported, and the coating is started from a certain distance from the front end of the substrate while controlling the speed at the start and end of coating, while leaving a certain distance from the rear end. By finishing the coating at the position, so-called frame painting becomes possible.

さらに、1対の塗布ヘッドと洗浄装置を設けることで、塗布位置にある塗布ヘッドで基板に塗布液を塗布している間に、清掃位置にある塗布ヘッドを清掃装置により清掃することができるので、タクト時間をより短縮することができる。   Furthermore, by providing a pair of coating heads and a cleaning device, the coating head at the cleaning position can be cleaned by the cleaning device while the coating liquid is applied to the substrate by the coating head at the coating position. The tact time can be further shortened.

以下、本発明の実施の形態を添付図面に従って説明する。
図1は本発明に係る塗布装置1を示す。塗布装置1は、支持フレーム2に昇降可能に設けられた1対の塗布ヘッド3a,3bを有する。支持フレーム2は縦軸4を中心に180度回動可能であり、1対の塗布ヘッド3a,3bを矢印aで示す基板Pの搬送方向の下流側の塗布位置と上流側の洗浄位置に交互に位置を切り替え可能になっている。1対の塗布ヘッド3a,3bは、それぞれスリットダイからなり、塗布位置において一定速度で搬送される基板P上に塗布液を所望の厚さに塗布可能になっている。
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
FIG. 1 shows a coating apparatus 1 according to the present invention. The coating apparatus 1 has a pair of coating heads 3a and 3b provided on a support frame 2 so as to be movable up and down. The support frame 2 can be rotated 180 degrees about the vertical axis 4, and the pair of coating heads 3a and 3b are alternately arranged at a downstream coating position and an upstream cleaning position in the conveyance direction of the substrate P indicated by an arrow a. The position can be switched to. Each of the pair of coating heads 3a and 3b is composed of a slit die, and can apply the coating liquid to a desired thickness on the substrate P transported at a constant speed at the coating position.

下流側の塗布ヘッド3bの下方には、バッキングロール5とその上流側と下流側に搬送ローラ6a,6bが配置されている。   Below the coating head 3b on the downstream side, the backing roll 5 and conveying rollers 6a and 6b are arranged on the upstream side and the downstream side thereof.

バッキングロール5は、その軸心が塗布ヘッド3bの長手方向と平行になるように、両端の軸が矢印r方向に回転駆動可能に支持されている。バッキングロール5は、図2に示すように、直径約400〜500mmの中空円筒形の金属製ロールで、その外表面には好ましくは0.5〜2.0mmの多数の吸引孔7が規則的に形成されている。バッキングロール5の両端の軸8には貫通孔9が形成され、該貫通孔9は真空ポンプなどの吸引装置10に接続されている。吸引装置10を駆動すると、バッキングロール5の外周近傍の空気が吸引孔7を通して吸引されて、バッキングロール5の内部に引き込まれ、貫通孔9を経て吸引装置10に導かれるように構成されている。   The backing roll 5 is supported so that the shafts at both ends can be driven to rotate in the direction of the arrow r so that the axis of the backing roll 5 is parallel to the longitudinal direction of the coating head 3b. As shown in FIG. 2, the backing roll 5 is a hollow cylindrical metal roll having a diameter of about 400 to 500 mm, and a large number of suction holes 7 preferably 0.5 to 2.0 mm are regularly formed on the outer surface thereof. Is formed. A through hole 9 is formed in the shaft 8 at both ends of the backing roll 5, and the through hole 9 is connected to a suction device 10 such as a vacuum pump. When the suction device 10 is driven, air in the vicinity of the outer periphery of the backing roll 5 is sucked through the suction hole 7, drawn into the backing roll 5, and guided to the suction device 10 through the through hole 9. .

図2に示すように、基板Pの塗布部分を局部的に吸引するように、基板Pの近傍の吸引口7をカバー11で囲ってもよい。また、バッキングロール5及び搬送ローラ6a,6bの吸引力を一定にするため、吸引装置10への配管途中に電磁弁10a.10b,10cを設け、バッキングロール5及び搬送ローラ6a,6b上部に基板Pが無い場合は電磁弁10a.10b,10cを閉じて吸引しないようにしてもよい。   As shown in FIG. 2, the suction port 7 in the vicinity of the substrate P may be surrounded by a cover 11 so as to locally suck the coated portion of the substrate P. Further, in order to make the suction force of the backing roll 5 and the transport rollers 6a and 6b constant, the electromagnetic valves 10a. 10b, 10c, and when there is no substrate P above the backing roll 5 and the transport rollers 6a, 6b, the solenoid valves 10a. You may make it not suck | suck by closing 10b and 10c.

バッキングロール5の上流側と下流側の搬送ローラ6a,6bは、それぞれバッキングロール5と平行に配置された直径約100mmの1本又は2本のローラ12からなり、基板Pを前記バッキングロール5と同じ搬送力で矢印a方向に搬送可能になっている。搬送ローラ6a,6bの下方には、吸引装置10に接続された上向きの開口するダクト13が配設されている。これにより、搬送ローラ6a,6bの上方の空気がローラ12間の隙間から吸引されて、バッキングロール5と同じ吸引装置10に導かれるように構成されている。   The upstream and downstream transport rollers 6 a and 6 b of the backing roll 5 are each composed of one or two rollers 12 having a diameter of about 100 mm arranged in parallel to the backing roll 5, and the substrate P is connected to the backing roll 5. It can be conveyed in the direction of arrow a with the same conveying force. An upward opening duct 13 connected to the suction device 10 is disposed below the transport rollers 6a and 6b. Thereby, the air above the transport rollers 6 a and 6 b is sucked from the gap between the rollers 12 and guided to the same suction device 10 as the backing roll 5.

バッキングロール5の外周の最上部の高さは、搬送ローラ6a,6bの外周の最上部の高さより、0〜500μmだけ高く設置されている。この高さの差は、上流側搬送ローラ6aからバッキングロール5を通って下流側搬送ローラ6bに搬送される基板Pに損傷を与えずに基板Pの反りが矯正でき、かつ、基板Pがバッキングロール5と各ローラ12への密着力を確保できる程度である。   The height of the uppermost part of the outer periphery of the backing roll 5 is set higher by 0 to 500 μm than the height of the uppermost part of the outer periphery of the transport rollers 6a and 6b. This difference in height can correct the warp of the substrate P without damaging the substrate P conveyed from the upstream conveying roller 6a through the backing roll 5 to the downstream conveying roller 6b, and the substrate P is backed. It is a level which can ensure the adhesive force to the roll 5 and each roller 12.

図1を参照すると、上流側の塗布ヘッド3aの下方には、洗浄装置14が昇降可能に配置されている。洗浄装置14は、塗布ヘッド3aの吐出口に沿って往復移動可能で、掻き取りブレード、洗浄ブラシ、洗浄ノズル、又は洗浄ロールを備えた任意のタイプのものを採用することができる。   Referring to FIG. 1, a cleaning device 14 is disposed below the upstream application head 3a so as to be movable up and down. The cleaning device 14 can be reciprocated along the discharge port of the coating head 3a, and can employ any type including a scraping blade, a cleaning brush, a cleaning nozzle, or a cleaning roll.

基板Pの搬送方向において洗浄装置14より上流側には、搬入コンベア15が配置されている。同様に、基板Pの搬送方向においてバッキングロール5及び搬送ローラ6bより下流側には、搬出コンベア16が配置されている。搬入コンベア15は、前の工程から基板Pをバッキングロール5に搬入するようになっている。搬出コンベア16は、バッキングロール5から基板Pを搬出して次の工程に搬送するようになっている。   A carry-in conveyor 15 is disposed upstream of the cleaning device 14 in the conveyance direction of the substrate P. Similarly, a carry-out conveyor 16 is disposed downstream of the backing roll 5 and the conveyance roller 6b in the conveyance direction of the substrate P. The carry-in conveyor 15 carries the board | substrate P in the backing roll 5 from the previous process. The unloading conveyor 16 unloads the substrate P from the backing roll 5 and conveys it to the next process.

次に、前記構成からなる塗布装置1の動作を図3に従って説明する。   Next, operation | movement of the coating device 1 which consists of the said structure is demonstrated according to FIG.

図3(a)に示すように、一方の塗布ヘッド3bを塗布位置(すなわち、バッキングロール5の上方)、他方の塗布ヘッド3aを洗浄位置(すなわち、洗浄装置14の上方)に置く。この状態で搬入コンベア15により基板Pを搬入し、基板Pの前端を塗布ヘッド3bの下方に位置させる。ここで、額縁塗装を可能にするために、基板Pの前端は塗布ヘッド3bの直下よりも下流側に位置するようにする。基板Pの後端は、洗浄装置14の上昇を妨げないように、洗浄装置14の真上の地点から下流側にあるようにする。   As shown in FIG. 3A, one application head 3b is placed at the application position (ie, above the backing roll 5), and the other application head 3a is placed at the cleaning position (ie, above the cleaning device 14). In this state, the substrate P is carried in by the carry-in conveyor 15, and the front end of the substrate P is positioned below the coating head 3b. Here, in order to enable the frame painting, the front end of the substrate P is positioned downstream of the coating head 3b. The rear end of the substrate P is located downstream from the point directly above the cleaning device 14 so as not to prevent the cleaning device 14 from rising.

この状態で、図3(b)に示すように、塗布位置の塗布ヘッド3bを下降し、バッキングロール5及び搬送ローラ6a,6bを駆動するとともに、吸引装置10を駆動して、基板Pを裏面から吸引しつつ、矢印aで示す搬送方向に搬送し、塗布ヘッド3bから塗布液を吐出して塗工し、基板P上に塗膜を形成する。一方、洗浄装置14を上昇し、さらに洗浄位置にある塗布ヘッド3aの長手方向に沿って移動させ、塗布ヘッド3aの洗浄を行う。これにより、塗布位置にある塗布ヘッド3bによる基板Pの塗工と、洗浄位置にある塗布ヘッド3aの洗浄が同時に行え、タクト時間を短縮することができる。なお、この塗工及び洗浄の処理中は、次に処理する基板Pは搬入コンベア15上で待機させておく。また、洗浄装置14を上昇させる代わりに、塗布ヘッド3aを下降させてもよい。   In this state, as shown in FIG. 3B, the coating head 3b at the coating position is lowered, the backing roll 5 and the transport rollers 6a and 6b are driven, and the suction device 10 is driven so that the substrate P is placed on the back surface. Then, the coating liquid is transported in the transport direction indicated by the arrow a, and the coating liquid is discharged from the coating head 3 b to be coated, and a coating film is formed on the substrate P. On the other hand, the cleaning device 14 is moved up and moved along the longitudinal direction of the coating head 3a at the cleaning position to clean the coating head 3a. Thereby, the coating of the substrate P by the coating head 3b at the coating position and the cleaning of the coating head 3a at the cleaning position can be performed simultaneously, and the tact time can be shortened. Note that the substrate P to be processed next is kept on the carry-in conveyor 15 during the coating and cleaning processes. Further, instead of raising the cleaning device 14, the coating head 3a may be lowered.

塗布ヘッド3bによる基板Pの塗工中、基板Pはバッキングロール5の吸引孔7と搬送ローラ6a,6bの隙間から吸引されるので、基板Pの裏面はバッキングロール5と搬送ローラ6a,6bに密着して搬送される。このため、基板Pと塗布ヘッド3bの間の隙間が安定し、高精度の膜圧で塗膜を形成することができる。   During the coating of the substrate P by the coating head 3b, the substrate P is sucked from the gap between the suction hole 7 of the backing roll 5 and the transport rollers 6a and 6b. It is transported in close contact. For this reason, the clearance gap between the board | substrate P and the application | coating head 3b is stabilized, and a coating film can be formed with a highly accurate film | membrane pressure.

また、バッキングロール5と搬送ローラ6a,6bで基板Pを吸引しながら、1枚ずつ一定に速度制御できる。このため、基板Pとバッキングロール5及び搬送ロール6a,6bとの間に滑りが生じず、基板Pの裏に疵が発生することはない。   Also, the substrate P can be sucked by the backing roll 5 and the transport rollers 6a and 6b, and the speed can be controlled constant one by one. For this reason, no slip occurs between the substrate P, the backing roll 5 and the transport rolls 6a and 6b, and no wrinkles occur on the back of the substrate P.

基板Pの後端が塗布ヘッド3bの下方に近づくと、図3(c)に示すように、後端まで所定の距離を残した状態で、基板Pの搬送を停止し、塗布ヘッド3bを上昇させる。一方、洗浄位置にある塗布ヘッド3aの洗浄を終えた洗浄装置14は下降させる。続いて、縦軸4を中心に支持フレーム2を180°回動させることにより、洗浄を終えた塗布ヘッド3aを塗布位置に、塗工を終えた塗布ヘッド3bを洗浄位置に切り替える。この状態で、搬出コンベア16を駆動して塗工された基板Pを次の工程に向けて搬出し、搬入コンベア15上で待機していた次の基板Pを搬入する。これにより、図3(a)に示す状態となり、以下同様の工程を繰り返す。   When the rear end of the substrate P approaches the lower side of the coating head 3b, as shown in FIG. 3C, the transport of the substrate P is stopped and the coating head 3b is raised while leaving a predetermined distance to the rear end. Let On the other hand, the cleaning device 14 that has finished cleaning the coating head 3a at the cleaning position is lowered. Subsequently, by rotating the support frame 2 about the vertical axis 4 by 180 °, the coating head 3a after cleaning is switched to the coating position, and the coating head 3b after coating is switched to the cleaning position. In this state, the carry-out conveyor 16 is driven to carry out the coated substrate P toward the next process, and the next substrate P that has been waiting on the carry-in conveyor 15 is carried in. Thereby, it will be in the state shown to Fig.3 (a), and the same process is repeated hereafter.

なお、前記実施形態では、バッキングロール5の上流側及び下流側に基板Pを吸引しつつ搬送する搬送ローラ6a,6bを設けたが、基板Pが小さくて大きな吸引力を必要としない場合には、これら搬送ローラ6a,6bを省略し、図4に示すように、バッキングロール5の上流側及び下流側の近傍まで搬送コンベア15,16を延長してもよい。また、図4に示すように塗布ヘッド3を単体としてもよい。   In the above embodiment, the transport rollers 6a and 6b that transport the substrate P while sucking the upstream side and the downstream side of the backing roll 5 are provided. However, when the substrate P is small and a large suction force is not required. These conveyance rollers 6a and 6b may be omitted, and the conveyance conveyors 15 and 16 may be extended to the vicinity of the upstream and downstream sides of the backing roll 5, as shown in FIG. Further, the coating head 3 may be a single unit as shown in FIG.

本発明に係る塗布装置の側面図。The side view of the coating device which concerns on this invention. 図1の要部の拡大断面図。The expanded sectional view of the principal part of FIG. 1対の塗布ヘッドを用いて基板の塗布を行う工程を順に示す側面図。The side view which shows in order the process of apply | coating a board | substrate using a pair of application | coating head. 本発明に係る塗布装置の変形例を示す側面図。The side view which shows the modification of the coating device which concerns on this invention. 従来の塗布装置の側面図。The side view of the conventional coating device. 額縁塗装した基板の斜視図。The perspective view of the board | substrate which carried out frame painting.

符号の説明Explanation of symbols

1…塗布装置
3a,3b…塗布ヘッド
5…バッキングロール
6a,6b…搬送ローラ
7…吸引孔
14…洗浄装置
15…搬入コンベア
16…搬出コンベア
P…基板
DESCRIPTION OF SYMBOLS 1 ... Coating apparatus 3a, 3b ... Coating head 5 ... Backing roll 6a, 6b ... Conveyance roller 7 ... Suction hole 14 ... Cleaning apparatus 15 ... Carry-in conveyor 16 ... Carry-out conveyor P ... Board | substrate

Claims (6)

基板上に塗布液を塗布する塗布器と、
前記塗布器と対向する位置に回転駆動可能に配置され、外周に吸引孔を有し、前記基板を吸引しつつ搬送するバッキングロールと、
前記バッキングロールの上流側と下流側に前記基板を搬送する搬送ローラと、
からなることを特徴とする塗布装置。
An applicator for applying a coating solution on a substrate;
A backing roll that is rotatably arranged at a position facing the applicator, has a suction hole on the outer periphery, and transports the substrate while sucking;
A transport roller for transporting the substrate to the upstream side and the downstream side of the backing roll;
An applicator characterized by comprising:
前記搬送ローラは、前記基板を吸引しつつ搬送する請求項1に記載の塗布装置。   The coating apparatus according to claim 1, wherein the transport roller transports the substrate while sucking the substrate. 前記搬送ローラは前記バッキングロールより低い位置に配置することを特徴とする請求項2に記載の塗布装置。   The coating apparatus according to claim 2, wherein the transport roller is disposed at a position lower than the backing roll. 前記上流側の搬送ローラの上流側に配置され、前記基板をバッキングロールに搬入する搬入コンベアと、
前記下流側の搬送ローラの下流側に配置され、前記バッキングローラから前記基板を搬出する搬出コンベアと、
を有することを特徴とする請求項1から3のいずれかに記載の塗布装置。
A carry-in conveyor that is arranged on the upstream side of the carry roller on the upstream side and carries the substrate into a backing roll;
An unloading conveyor disposed on the downstream side of the downstream conveying roller, and unloading the substrate from the backing roller;
The coating apparatus according to claim 1, comprising:
前記塗布器は、塗布位置と洗浄位置に交互に位置を切り替え可能に設けた1対の塗布ヘッドを有し、
前記上流側の搬送ローラと前記搬入コンベアの間、又は前記下流側の搬送ローラと前記搬出コンベアの間に、洗浄位置にある前記塗布ヘッドを洗浄する洗浄装置を設けたことを特徴とする請求項4に記載の塗布装置。
The applicator has a pair of application heads provided to be able to switch positions alternately between an application position and a cleaning position,
The cleaning device for cleaning the coating head at a cleaning position is provided between the upstream transport roller and the carry-in conveyor or between the downstream transport roller and the carry-out conveyor. 4. The coating apparatus according to 4.
前記塗布器又は前記洗浄装置は前記洗浄位置で昇降可能に設けたことを特徴とする請求項5に記載の塗布装置。   The coating device according to claim 5, wherein the applicator or the cleaning device is provided to be movable up and down at the cleaning position.
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CN103990578A (en) * 2013-02-15 2014-08-20 中外炉工业株式会社 Roller carrying type coater
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CN103639100A (en) * 2011-09-22 2014-03-19 迪士博机械制造有限公司 Profile coating machine
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KR101077319B1 (en) 2011-10-26
TWI372659B (en) 2012-09-21

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