JP2009109550A - Direct writing exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem of the conventional direct writing exposure apparatus wherein the mechanism is complicated and the apparatus is expensive. <P>SOLUTION: An exposure head part 1 includes a plurality of exposure heads 10, 11, 12, 13, wherein the exposure heads are arranged at equal head spaces W in the sub-scanning direction y substantially parallel to each other. An exposure table 5 can move in the sub-scanning direction y below the exposure head part 1, and a substrate 90 placed thereon is transferred to the lower side of the respective exposure heads 10, 11, 12, 13. Thus, the substrate 90 is sequentially exposed by the respective exposure heads 10, 11, 12, 13. Each exposure head 10, 11, 12, 13 has an array of LEDs 20 arranged at equal pitch P in the main scanning direction x on a straight line, and the LEDs 20 are disposed with a pitch shift d in the main scanning direction x between the exposure heads 10, 11, 12, 13. The same part in the sub-scanning direction y is exposed in layers by the respective exposure heads 10, 11, 12, 13 so that the exposed parts overlap, whereby exposure is performed with high positional accuracy. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a direct drawing exposure apparatus.

The direct exposure method includes a combination of a polygon mirror and a UV laser light source (Patent Documents 1 and 2), and a combination of a laser light source or a UV light source such as a high-pressure mercury lamp and a DMD (digital micro mirror device) (Patent Document 3). , 4) etc.
In the former, the semiconductor laser is turned ON / OFF directly, or a laser is scanned on a straight line (main scan) with a polygon mirror while turning on / off the laser in combination with a solid laser and an AOM (acoustic optical modulator). This is a method for realizing direct drawing by moving (sub-scanning) the exposure target.
The latter does not perform ON / OFF control of the light source, and the light source irradiates DMD as a surface light source, and controls the tilt of the DMD micromirror to control the arrival of light rays to the exposure target and realize direct drawing It is. In this case, the tilt control of the DMD is the main scanning, and in the sub scanning, the exposure target is moved in the same manner as the former.

Special table 2004-523101 JP 2000-338432 A Patent 324248 JP 2000-93624 A

However, in the method using the polygon mirror, even if good drawing quality is obtained at the center portion of the main scanning, the exposure quality tends to deteriorate as the distance from the center increases. In addition, when there is a polygon mirror that rotates at high speed and the exposure width is wide, the optical system tends to be very large. This deteriorates the maintainability of the apparatus and also causes dust generation during operation. In the method using DMD, since the number of DMD micromirrors is limited, the range that can be directly drawn by one DMD is about several tens to hundreds of millimeters depending on the resolution. In order to widen, it is necessary to perform a plurality of sub-scans by arranging a plurality of exposure units equipped with DMDs or moving the exposure units in the main scanning direction. In addition, since the DMD does not have an optical system for image formation, there is a problem that an optical system composed of a plurality of lenses needs to be arranged between the DMD and an object to be exposed. In any case, the exposure apparatus has a complicated mechanism and is expensive.
The object of the present invention is to solve the problems of the prior art.

In order to achieve the above object, a direct drawing exposure apparatus of the present invention includes an exposure table on which an object to be exposed is placed, a plurality of exposure heads arranged in one direction substantially in parallel, and the exposure head. A light emitter that outputs exposure light linearly arranged in another direction substantially orthogonal to the one direction, and one or two of the exposure head and the exposure table are relatively moved in the one direction, A moving device that positions an arbitrary position of the object to be exposed at a position that can be exposed by the light emitter, and exposing a predetermined position of the object to be exposed by exposure light from the light emitter. Features.
Further, in the direct drawing exposure apparatus of the invention of claim 2, an exposure table for placing an object to be exposed, a plurality of exposure heads arranged in one direction substantially in parallel, and the exposure head, A light emitter that outputs exposure light linearly arranged at a predetermined pitch P in another direction substantially orthogonal to the one direction, and one or two of the exposure head and the exposure table are relatively moved in the one direction. And a moving device for positioning an arbitrary position of the object to be exposed at a position where the light emitter can be exposed, and a position in the other direction of the light emitter is shifted by a predetermined pitch shift amount d between exposure heads It is characterized by that.
In a preferred embodiment, the apparatus further includes a control device that controls on / off of the light emitter and controls a lighting timing of the light emitter, and the moving device includes one or two of the exposure head and an exposure table in the one or the other. Exposure is performed while controlling the lighting timing of the light-emitting body on an object to be exposed that is continuously moved relative to the exposure direction and is continuously moved relative to the exposure head mounted on the exposure table. A predetermined pattern is exposed to the exposure target by irradiating light.

According to the direct drawing exposure apparatus of the present invention, a linear array of light emitters such as LEDs is provided in the width direction (main scanning direction x) of an exposure object, and main lighting is controlled by performing individual lighting control of the light emitters. The object to be exposed is placed on an exposure table that moves on a straight line in the sub-scanning direction y substantially perpendicular to the main scanning direction x, and the sub-scanning is performed in the sub-scanning direction y by moving the exposure table. Arbitrary patterns can be exposed directly.
Further, the direct drawing exposure apparatus according to the present invention has no mechanical movement in the main scanning direction x side, and the exposure head has or does not require an optical system necessary for imaging, and the exposure head and the object to be exposed are several mm. Therefore, the apparatus can be downsized and maintainability can be improved. In addition, since a long exposure head can be manufactured, it is possible to configure the apparatus with a small number of parts even for a wide exposure target by manufacturing according to the width of the exposure target. There are effects such as.
The individual output profiles such as LEDs that are light emitters have a distorted shape due to the influence of the electrodes constituting the light emitter, but the effect of the output profile is canceled by overwriting, enabling high-quality drawing exposure. Become. In addition, it is possible to suppress the influence of the positional accuracy of the positional relationship between a plurality of heads by overwriting.
In general, the exposure head is manufactured at a pitch of about 600 DPI, 1200 DPI, 2400 DPI and can draw with a line width and a gap width (L / S) corresponding to the pitch P of a light emitting body such as an LED. Position accuracy cannot be obtained.
In the present invention, a plurality of (N) exposure heads are provided with light emitters such as LEDs that are shifted by a shift amount d in the main scanning direction. The shift amount d is, for example, 1 / N of the LED pitch P, and the sub scanning direction. While moving the object to be exposed to y, direct illumination is performed N times by lighting control of the LED with a deviation amount P / N deviation, and N LEDs in the vicinity of the drawing position of the LED to be lit are turned on. by controlling the main scanning direction x with respect to a point on the exposed object, irradiation deviation P / N is overlaid ^twice N in the sub-scanning direction y, respectively. This operation makes it possible to improve the positional accuracy to 1 / N of the pitch P with the line width and gap width corresponding to the pitch P.

1 and 2 show an embodiment of the direct drawing exposure apparatus of the present invention.
The direct drawing exposure apparatus A has a base 6 on which an exposure head unit 1 is disposed along a main scanning direction x via a support 14 and printed under the exposure head unit 1. An exposure table 5 on which a wiring substrate 90 is placed is provided so as to be movable in the sub-scanning direction y.
That is, the main scanning required for direct drawing exposure is performed by controlling lighting of individual light emitters such as LEDs of the exposure head 1, and the sub scanning is performed by moving the exposure table 5.

The exposure head unit 1 has a plurality of exposure heads 10, 11, 12, and 13. In this embodiment, four exposure heads 10, 11, 12, and 13 are provided, but they can be increased or decreased as necessary.
The exposure heads 10, 11, 12, and 13 are arranged in the main scanning direction x, and are substantially parallel to each other with a head interval W equal to the sub-scanning direction y.
The exposure table 5 can move the lower side of the exposure head unit 1 in the sub-scanning direction y, and transports the placed substrate 90 to the lower side of the exposure heads 10, 11, 12, and 13, respectively. The substrate 90 is sequentially exposed by the exposure heads 10, 11, 12, and 13.
Note that it is possible to move the exposure head unit 1 instead of the exposure table 5, or it is possible to move both the exposure table 5 and the exposure head unit 1. The exposure head unit 1 may be relatively moved in the sub-scanning direction y.

Each exposure head 10, 11, 12, 13 has an array of LEDs 20, which are light emitters arranged in a straight line at a uniform pitch P in the main scanning direction x, and the wavelength required for exposure from each LED 20. It is configured to output. Although ultraviolet light is normally used for exposure, it may output light of other wavelengths as necessary. Further, instead of the LED 20, another light source may be used.
The LEDs 20 are arranged between the exposure heads 10, 11, 12, and 13 with a pitch shift amount d shifted in the main scanning direction x. The pitch shift amount d, when the exposure head number N, a d = P / N, performs exposure main scanning direction x, upon irradiation of N approximately ^twice shifted d respectively in the sub-scanning direction y.

  As described above, the exposure table 5 relatively moves below the exposure heads 10, 11, 12, 13 in the sub-scanning direction y, and the substrate 90 placed thereon is moved to the exposure heads 10, 11, 12. , And 13 exposure light. Since the LEDs 20 of the exposure heads 10, 11, 12, and 13 are arranged so as to be shifted by a pitch deviation amount d in the main scanning direction x, the exposure heads 10, 11, 12, and 13 are arranged in the same part in the sub-scanning direction y. By exposing in an overlapping manner, exposure with high positional accuracy is possible.

  FIG. 3 shows the state of exposure. The substrate 90 is exposed by the exposure head 10 to be in the state of (a) of FIG. 3, and then the same position in the sub-scanning direction y is exposed by the exposure head 11 having the LEDs 20 shifted by the pitch shift amount d ( B) state. Similarly, exposure is sequentially performed by the exposure head 12 and the exposure head 13, and the exposure state of (c) and (d) is obtained. By repeating this exposure while shifting by d in the sub-scanning direction y, the overall exposure shown in (e) is performed. Obtainable. When actually drawing a pattern, lighting and extinguishing of LEDs and the like are controlled according to the pattern, and arbitrary pattern drawing is performed.

  The number of normal exposure heads 10, 11, 12, and 13 may be determined in accordance with the required exposure accuracy, the output of LEDs, the direct drawing exposure time, and the like. In the present embodiment, four exposure heads 1 are provided, but usually about ten exposure heads 10, 11, 12, 13 are mounted.

  Further, the output intensity of the LED 20 may be about one-fifth to several tenths of the energy density required for exposure with one lighting since it is overwritten.

In this embodiment, an exposure head position adjusting device 15 for adjusting the position of the exposure head 1 is provided. By moving the exposure head unit 1 up and down, the distance (usually several mm) between the LED 20 and the substrate 90 is set. It can be adjusted according to the focal length of the exposure head unit 1. It is also possible to adjust the plurality of exposure heads 1 in the main scanning direction x and the sub-scanning direction y.
Further, the exposure table 5 is provided with an exposure table position adjusting device 51 for adjusting the position of the exposure table 5, and the position adjustment in the main scanning direction x and the position adjustment in the rotation direction on the xy plane can be performed. ing. However, the rotation direction adjustment mechanism can be removed by rotating the drawing data.

FIG. 4 shows a block diagram.
The direct drawing exposure apparatus A is entirely controlled by the control device 30. The control device 30 individually controls the LEDs 20 of the exposure head unit 1 via the LED driver 21, controls the lighting and non-lighting of the LEDs 20 according to the pattern to be drawn, and draws a predetermined pattern on the substrate 90. It is configured as follows.
The pattern to be drawn is stored in the pattern storage device 40, and the control device 30 is configured to read the pattern in response to a predetermined command.

The control device 30 also includes a lighting timing correction device 31 and a lighting intensity correction device 32, and is configured to be able to correct the lighting timing of the LED 20 and the lighting intensity.
The output detection device 22 detects the actual lighting position and lighting intensity of the LED 20 using an imaging device or the like, and sends the detected value to the control device 30. The control device 30 detects the positional deviation of the LED 20 based on the detected actual lighting position of the LED 20, and the lighting timing correction device 31 corrects the lighting timing of the LED 20 based on the deviation in the sub-scanning direction y. The position deviation is corrected.
The lighting timing correction device 31 can correct the positional deviation of the LED 20 in the sub-scanning direction y, and can compensate for a mechanical error.

The lighting intensity correction device 32 further corrects the lighting intensity of each LED 20 according to the detected value of the lighting intensity from the output detection device 22 so that a uniform output can be obtained. With this configuration, it is possible to compensate for variations in the brightness of the LEDs 20.
The exposure head position adjusting device 15 is for adjusting the vertical position, the main scanning direction x position, and the sub-scanning direction y position of the exposure head unit 1 as described above, and is similarly controlled by the control device 30.

The control device 30 also controls the exposure table moving device 50 to control the movement of the exposure table 5 in the sub-scanning direction y. The exposure table 5 is controlled to complete acceleration immediately before starting direct drawing exposure and to move at a constant speed during direct drawing exposure. In actuality, there is a possibility that a shift in the moving speed may occur. Therefore, the control device 30 is configured to detect the moving amount and correct the control timing.
The exposure table position adjusting device 51 adjusts the position of the exposure table 5 in the main scanning direction x and the position in the rotation direction as described above.

FIG. 5 is an irradiation profile of the LED 20 used for the simulation. In this simulation, it is assumed that ten LED arrays of the exposure head unit 1 are used, and the deviation of the LED irradiation position is assumed to be 1/10 of the pitch P.
FIG. 6 shows an irradiation pattern, which is drawing data for drawing a vertical line of vertical 81 pixels × horizontal 10 pixels substantially at the center of an area of vertical 100 pixels × horizontal 50 pixels. Black indicates pixels that are illuminated, and white indicates pixels that are not illuminated. The interval between the pixel positions is 1/10 of the pitch P.
FIG. 7 shows the stored energy when the irradiation profile of FIG. If it is assumed that half the height of the figure is the energy required for exposure, it can be seen that a pattern corresponding to FIG. 6 is drawn by overwriting.

In the present embodiment, a straitizer 33 is further provided, and the stubner 33 will be described.
In the method of performing direct drawing by energy accumulation by overwriting as in this embodiment, there is a problem that the drawing line becomes thick in drawing of an L-shaped part or drawing of an arc having a small radius.
FIG. 8 shows a pattern having an L-shaped portion, and FIG. 9 shows the simulation result. The scoring device 33 prevents the line from becoming thick by thinning the drawing data in advance for such an L-shaped part or an arc part having a small radius.
FIG. 10 shows a correction pattern when drawing an L-shaped part, and FIG. 11 shows the simulation result.
In this way, by using the scoring device 33, it is possible to solve the problem that the drawing line becomes thick in the L-shaped portion or the arc.

1 is a schematic perspective view showing an embodiment of the present invention. 1 is a detailed explanatory view of an exposure head unit 1 according to an embodiment of the present invention. Explanatory drawing which shows operation | movement of one Embodiment of this invention. The functional block diagram of one Embodiment of this invention. LED irradiation profile explanatory drawing. Explanatory drawing of drawing data. 3D graph of irradiation simulation. Explanatory drawing of L-shaped pattern data. Contour line graph of L-shaped irradiation simulation. Explanatory drawing of correction data. Contour graph of corrected irradiation simulation.

Explanation of symbols

1: exposure head section, 5: exposure table, 6: base, 10: exposure head, 11: exposure head, 12: exposure head, 13: exposure head, 14: support, 15: exposure head position adjusting device, 20: LED: 21: LED driver, 22: output detection device, 30: control device, 31: lighting timing correction device, 32: lighting intensity correction device, 33: staring device, 40: pattern storage device, 50: exposure table movement Device: 51: Exposure table position adjusting device, 90: Substrate.

Claims (7)

An exposure table for placing an object to be exposed;
A plurality of exposure heads arranged in one direction substantially in parallel;
A light emitter that is arranged in the exposure head and outputs exposure light arranged in a straight line in the other direction substantially orthogonal to the one direction;
A moving device that relatively moves one or two of the exposure head and the exposure table in the one direction, and positions an arbitrary position of the object to be exposed at a position that can be exposed by the light emitter;
Exposing a predetermined position of an object to be exposed with exposure light from the light emitter by the moving device;
A direct drawing exposure apparatus characterized by that. An exposure table for placing an object to be exposed;
A plurality of exposure heads arranged in one direction substantially in parallel;
A light emitter that is disposed in the exposure head and outputs exposure light linearly arranged at a predetermined pitch P in the other direction substantially orthogonal to the one direction;
A moving device that relatively moves one or two of the exposure head and the exposure table in the one direction, and positions an arbitrary position of the object to be exposed at a position that can be exposed by the light emitter;
A position in the other direction of the light emitter is shifted by a predetermined pitch shift amount d between the exposure heads;
A direct drawing exposure apparatus characterized by that. A control device for controlling on / off of the light emitter;
The direct drawing exposure apparatus according to claim 1 or 2. A control device for controlling the lighting timing of the light emitter;
The direct drawing exposure apparatus according to claim 1, 2 or 3. A control device for controlling on / off of the light emitter and controlling the lighting timing of the light emitter;
The moving device continuously moves one or two of the exposure head and the exposure table in the one direction continuously,
The exposure target placed on the exposure table and continuously moving relative to the exposure head is subjected to on / off control of the light emitter, and exposure light is irradiated while controlling a lighting timing to form a predetermined pattern. Exposing the object to be exposed;
The direct drawing exposure apparatus according to claim 1 or 2. A control device for controlling the output of the light emitter;
The direct drawing exposure apparatus according to claim 1, 2, 3, 4 or 5. A correction device for correcting in advance the pattern to be exposed on the exposure target is further provided.
The direct drawing exposure apparatus according to claim 1, 2, 3, 4, 5, or 6.

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