JP2009149461A - Paste composition - Google Patents
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- Publication number
- JP2009149461A JP2009149461A JP2007327881A JP2007327881A JP2009149461A JP 2009149461 A JP2009149461 A JP 2009149461A JP 2007327881 A JP2007327881 A JP 2007327881A JP 2007327881 A JP2007327881 A JP 2007327881A JP 2009149461 A JP2009149461 A JP 2009149461A
- Authority
- JP
- Japan
- Prior art keywords
- inorganic oxide
- composition
- black
- black inorganic
- paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 87
- 229910052809 inorganic oxide Inorganic materials 0.000 claims abstract description 72
- 239000011230 binding agent Substances 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims description 13
- 229920005989 resin Polymers 0.000 description 31
- 239000011347 resin Substances 0.000 description 31
- 239000002002 slurry Substances 0.000 description 30
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 25
- 239000011572 manganese Substances 0.000 description 24
- 239000011521 glass Substances 0.000 description 23
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 22
- 239000011248 coating agent Substances 0.000 description 15
- 238000000576 coating method Methods 0.000 description 15
- 239000002270 dispersing agent Substances 0.000 description 15
- 239000000843 powder Substances 0.000 description 15
- 239000007864 aqueous solution Substances 0.000 description 14
- 239000002245 particle Substances 0.000 description 14
- 238000005259 measurement Methods 0.000 description 13
- 238000011161 development Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 239000011164 primary particle Substances 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 8
- 238000010304 firing Methods 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 150000008065 acid anhydrides Chemical class 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 239000003999 initiator Substances 0.000 description 7
- -1 methacryloyl groups Chemical group 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000011324 bead Substances 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 229910052748 manganese Inorganic materials 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- 150000007519 polyprotic acids Polymers 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 238000000016 photochemical curing Methods 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 3
- 229910018060 Ni-Co-Mn Inorganic materials 0.000 description 3
- 229910018209 Ni—Co—Mn Inorganic materials 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 239000011256 inorganic filler Substances 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000004135 Bone phosphate Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- KFDQGLPGKXUTMZ-UHFFFAOYSA-N [Mn].[Co].[Ni] Chemical compound [Mn].[Co].[Ni] KFDQGLPGKXUTMZ-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910000428 cobalt oxide Inorganic materials 0.000 description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000010587 phase diagram Methods 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- XKSUVRWJZCEYQQ-UHFFFAOYSA-N 1,1-dimethoxyethylbenzene Chemical compound COC(C)(OC)C1=CC=CC=C1 XKSUVRWJZCEYQQ-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- OTKCEEWUXHVZQI-UHFFFAOYSA-N 1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(=O)CC1=CC=CC=C1 OTKCEEWUXHVZQI-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- JKVSAZTYCZKNDX-UHFFFAOYSA-N 1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C1=CC(C(=O)CCC)=CC=C1N1CCOCC1 JKVSAZTYCZKNDX-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- QZKVUSSYPPWURQ-UHFFFAOYSA-N 1-methylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C QZKVUSSYPPWURQ-UHFFFAOYSA-N 0.000 description 1
- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical class NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- SNZYOYGFWBZAQY-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2-methyloxirane Chemical compound CC1CO1.CCC(CO)(CO)CO SNZYOYGFWBZAQY-UHFFFAOYSA-N 0.000 description 1
- RSROEZYGRKHVMN-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;oxirane Chemical compound C1CO1.CCC(CO)(CO)CO RSROEZYGRKHVMN-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- ARXVXVOLXMVYIT-UHFFFAOYSA-N 3-methylbutyl 2-(dimethylamino)benzoate Chemical compound CC(C)CCOC(=O)C1=CC=CC=C1N(C)C ARXVXVOLXMVYIT-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 241000282341 Mustela putorius furo Species 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- VJFCXDHFYISGTE-UHFFFAOYSA-N O=[Co](=O)=O Chemical compound O=[Co](=O)=O VJFCXDHFYISGTE-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- INSXADAKBSCPPL-UHFFFAOYSA-L [OH-].[OH-].[Co].[Co++] Chemical compound [OH-].[OH-].[Co].[Co++] INSXADAKBSCPPL-UHFFFAOYSA-L 0.000 description 1
- PEHHOFPYNORZNA-UHFFFAOYSA-N [PH2](OC1=C(C=CC=C1)C(C1(CC=C(C=C1C)C)C)=O)=O Chemical compound [PH2](OC1=C(C=CC=C1)C(C1(CC=C(C=C1C)C)C)=O)=O PEHHOFPYNORZNA-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- VNACESCBYXLGBN-UHFFFAOYSA-N acetic acid;1-methoxypropan-2-yl acetate Chemical class CC(O)=O.COCC(C)OC(C)=O VNACESCBYXLGBN-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 230000003254 anti-foaming effect Effects 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- CKQGKSPXCTWTCX-UHFFFAOYSA-N butanoic acid;2,2,4-trimethylpentane-1,3-diol Chemical compound CCCC(O)=O.CC(C)C(O)C(C)(C)CO CKQGKSPXCTWTCX-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- UBEWDCMIDFGDOO-UHFFFAOYSA-N cobalt(2+);cobalt(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[Co+2].[Co+3].[Co+3] UBEWDCMIDFGDOO-UHFFFAOYSA-N 0.000 description 1
- SAXCKUIOAKKRAS-UHFFFAOYSA-N cobalt;hydrate Chemical compound O.[Co] SAXCKUIOAKKRAS-UHFFFAOYSA-N 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical compound [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- ORBFAMHUKZLWSD-UHFFFAOYSA-N ethyl 2-(dimethylamino)benzoate Chemical compound CCOC(=O)C1=CC=CC=C1N(C)C ORBFAMHUKZLWSD-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000000445 field-emission scanning electron microscopy Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007603 infrared drying Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002696 manganese Chemical class 0.000 description 1
- 229940099596 manganese sulfate Drugs 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 235000013372 meat Nutrition 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229940053662 nickel sulfate Drugs 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- MOWNZPNSYMGTMD-UHFFFAOYSA-N oxidoboron Chemical class O=[B] MOWNZPNSYMGTMD-UHFFFAOYSA-N 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- LXTZRIBXKVRLOA-UHFFFAOYSA-N padimate a Chemical compound CCCCCOC(=O)C1=CC=C(N(C)C)C=C1 LXTZRIBXKVRLOA-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C09D17/004—Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
- C09D17/007—Metal oxide
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/62—Metallic pigments or fillers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Materials For Photolithography (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Abstract
Description
本発明は、黒色無機酸化物を含むペースト組成物の改良に関する。 The present invention relates to an improvement in a paste composition containing a black inorganic oxide.
黒色無機酸化物を含むペースト組成物は、塗料用、インキ用、トナー用、ゴム・プラスチック用、電子材料用等に広く使用されている。 Paste compositions containing black inorganic oxides are widely used for paints, inks, toners, rubber / plastics, electronic materials and the like.
黒色顔料である黒色無機酸化物としては、カーボンブラック、銅・鉄・マンガン系複合酸化物、四三酸化コバルトなどが知られている。その中でも四三酸化コバルトは、赤みや黄色みを呈しない黒色度に優れ、更には熱的、力学的に過酷な使用条件下においても安定であることが知られている。 Known black inorganic oxides that are black pigments include carbon black, copper / iron / manganese composite oxide, and cobalt trioxide. Among them, cobalt tetroxide is known to be excellent in blackness that does not exhibit redness or yellowness, and is stable even under severe use conditions thermally and mechanically.
近年、これらの材料等に用いられる黒色顔料などにおいては、さらに赤みや黄色みを帯びない黒色顔料に対する要求が益々強くなってきている。 In recent years, with respect to black pigments and the like used for these materials, there has been an increasing demand for black pigments that are not reddish or yellowish.
このような要求に対して、特許文献1には、熱的及び力学的に過酷な使用条件においても安定で、かつ赤みや黄色みを呈しない黒色度を改善する目的として、ヒドロオキシ炭酸コバルト又は水酸化コバルトを酸化性雰囲気中で加熱して200℃〜500℃未満の温度で焼成した後、200℃未満の温度まで冷却し、再度酸化性雰囲気中で加熱して500℃〜800℃の温度で焼成して得られる四三酸化コバルト粉末からなる黒色顔料が開示されている。しかしながら、特許文献1に開示されている四三酸化コバルトは、近年の黒色度に対する高い要求を十分に満足できていなかった。
In response to such a requirement,
また、四三酸化コバルトを用いたペースト組成物は、白黒2層構造のバス電極の下層(黒層)ペーストに使用した場合、Ag層(白の上層)と透明電極の接触抵抗値が必ずしも所望する十分な低さを有していない。すなわち、上記用途に用いられるペースト組成物は、電極の発光のムラ、画像の欠陥、消費電力の増大等の問題が発生する可能性がある。このためAg層と透明電極の接触抵抗値がより低くなるペースト組成物が求められていた。
本発明の課題は、具体的には、白黒2層構造のバス電極におけるAg層(白層)と透明電極との接触抵抗値がより低く、かつ黒色度に優れる黒層を形成し得るペースト組成物を提供することにある。 Specifically, the subject of the present invention is a paste composition capable of forming a black layer having a lower contact resistance value between an Ag layer (white layer) and a transparent electrode in a bus electrode having a black and white two-layer structure and having excellent blackness. To provide things.
本発明者らは、上記課題を解決すべく鋭意研究を重ねた結果、特定組成のマンガンを含有する複合酸化物を用いることによって上記課題を解決できることを見出し、本発明の完成に至った。 As a result of intensive studies to solve the above problems, the present inventors have found that the above problems can be solved by using a composite oxide containing manganese having a specific composition, and have completed the present invention.
即ち、上記課題を解決することができる本発明のペースト組成物は以下のとおりである。 That is, the paste composition of the present invention that can solve the above problems is as follows.
(1)黒色無機酸化物(A)、及び有機バインダー(B)を含有し、黒色無機酸化物(A)は、Ni3xCo3yMn3(1−x−y)O4(0≦x≦0.6、0≦y≦0.6、0.4≦(1−x−y))の組成式で表現されることを特徴とするペースト組成物。 (1) black inorganic oxide (A), and contains an organic binder (B), a black inorganic oxide (A) is, Ni 3x Co 3y Mn 3 ( 1-x-y) O 4 (0 ≦ x ≦ 0.6, 0 ≦ y ≦ 0.6, 0.4 ≦ (1-x−y)).
(2)(1)に記載のペースト組成物の焼成物からなる、基板上に形成された焼成物パターン。 (2) A fired product pattern formed on a substrate, comprising a fired product of the paste composition according to (1).
(3)基板上に形成された焼成物層が、Ni3xCo3yMn3(1−x−y)O4(0≦x≦0.6、0≦y≦0.6、0.4≦(1−x−y))の組成式で表現される黒色無機酸化物(A)を含むことを特徴とする焼成物パターン。 (3) The fired product layer formed on the substrate is Ni 3x Co 3y Mn 3 (1-xy) O 4 (0 ≦ x ≦ 0.6, 0 ≦ y ≦ 0.6, 0.4 ≦ A fired product pattern comprising a black inorganic oxide (A) represented by a composition formula of (1-xy)).
(4)(2)または(3)の焼成物パターンは、プラズマディスプレイパネルの前面板におけるバス電極を構成することを特徴とする。 (4) The fired product pattern of (2) or (3) constitutes a bus electrode on the front plate of the plasma display panel.
なお、特許請求の範囲及び明細書の記載において、x,y,zの値は、ICP発光分析法にて測定されたCo,Ni,及びMn含有率の値に基づく。 In the claims and the specification, the values of x, y, and z are based on the values of Co, Ni, and Mn contents measured by ICP emission analysis.
本発明によれば、例えば、白黒2層構造のバス電極におけるAg層(白層)と透明電極との接触抵抗値がより低く、かつ黒色度に優れる黒層を形成し得るペースト組成物を提供することができる。 According to the present invention, for example, there is provided a paste composition that can form a black layer having a lower contact resistance value between an Ag layer (white layer) and a transparent electrode in a black and white two-layer bus electrode and having excellent blackness. can do.
以下に本発明のペースト組成物について詳細に説明する。
黒色無機酸化物(A)
本発明の黒色無機酸化物は、実質的にNi3xCo3yMn3(1−x−y)O4(0≦x≦0.6、0≦y≦0.6、0.4≦(1−x−y))で表される。図1はその組成を示すNi−Co−Mn3元系状態図である。本発明の範囲内であれば、白黒2層構造のバス電極におけるAg層と透明電極との接触抵抗値と、黒層の黒色度がともに優れる。例えば、接触抵抗値は15〜25Ωと低く、かつ黒層の黒色度はL値で6〜12、a値で0〜3、b値で0〜4であり、優れた値となる。ここで、上記L値、a値、b値が上記範囲から外れると、赤みや黄色みが強くなり、黒層の黒色度が悪くなる。一方、黒色無機酸化物の組成が本発明の範囲から外れると、接触抵抗値、黒色度のいずれか又は両方が本発明に劣る。
Hereinafter, the paste composition of the present invention will be described in detail.
Black inorganic oxide (A)
The black inorganic oxide of the present invention is substantially Ni 3x Co 3y Mn 3 (1-xy) O 4 (0 ≦ x ≦ 0.6, 0 ≦ y ≦ 0.6, 0.4 ≦ (1 -Xy)). FIG. 1 is a Ni—Co—Mn ternary phase diagram showing the composition. Within the scope of the present invention, both the contact resistance value between the Ag layer and the transparent electrode in the black and white two-layer bus electrode and the blackness of the black layer are excellent. For example, the contact resistance value is as low as 15 to 25Ω, and the blackness of the black layer is 6 to 12 for the L value, 0 to 3 for the a value, and 0 to 4 for the b value. Here, when the L value, the a value, and the b value are out of the above ranges, redness and yellowness become strong, and the blackness of the black layer deteriorates. On the other hand, when the composition of the black inorganic oxide deviates from the scope of the present invention, either or both of the contact resistance value and the blackness are inferior to the present invention.
本発明にかかる黒色無機酸化物は、緑色を呈するNiO等の不純物相を生成することにより、黒色度が悪くなるので、NiOの不純物相は、黒色無機酸化物のX線回折において、2θ=62.9度の回折ピークの強度と、2θ=61〜66度の最大強度を有する回折ピークの強度比率が0.9よりも小さいことが好ましい。更には、上記強度比率が0.7よりも小さいことが特に好ましい。 The black inorganic oxide according to the present invention deteriorates in blackness by generating an impurity phase such as NiO exhibiting a green color. Therefore, the impurity phase of NiO is 2θ = 62 in the X-ray diffraction of the black inorganic oxide. It is preferable that the intensity ratio of the diffraction peak having an intensity of .9 degrees and a maximum intensity of 2θ = 61 to 66 degrees is smaller than 0.9. Furthermore, it is particularly preferable that the intensity ratio is smaller than 0.7.
また、本発明に係るペースト組成物中の黒色無機酸化物の粒子は、一次粒径D50(一次粒径の個数分布曲線において、その累積頻度が50%の粒径を意味する)が0.10〜0.60μmであることが好ましく、より好ましくは、0.16〜0.60μmであり、更に好ましくは0.20〜0.40μmであり、かつ最大一次粒径が2.0μm以下であることが好ましい。一次粒径D50が0.10μmよりも小さくなると、粒子の赤み、黄色みが強くなり、0.60μmよりも大きくなると、粒子の黒さが低くなるので、共に好ましくない。また、最大一次粒径が2.0μmよりも大きくなると、粒子の黒さが低くなる傾向にあるため、最大一次粒径2.0μm以下が好ましい。 Further, the black inorganic oxide particles in the paste composition according to the present invention have a primary particle size D50 (meaning a particle size having a cumulative frequency of 50% in the number distribution curve of the primary particle size) of 0.10. It is preferably ˜0.60 μm, more preferably 0.16 to 0.60 μm, still more preferably 0.20 to 0.40 μm, and the maximum primary particle size is 2.0 μm or less. Is preferred. When the primary particle size D50 is smaller than 0.10 μm, the redness and yellowness of the particles become strong, and when the primary particle size D50 is larger than 0.60 μm, the blackness of the particles becomes low. Further, when the maximum primary particle size is larger than 2.0 μm, the blackness of the particles tends to be lowered, and therefore the maximum primary particle size is preferably 2.0 μm or less.
このような黒色無機酸化物の粒子は、反応槽において、不活性ガス雰囲気下、反応温度30〜70℃に維持しつつ、十分な攪拌を加えながら、ニッケル塩、コバルト塩およびマンガン塩の混合水溶液に錯化剤としてアンモニア水溶液を添加し、かつpHを9〜12に維持するようアルカリ金属水酸化物の水溶液を加えて、ニッケルコバルトマンガン複合水酸化物を生成し、このニッケルコバルトマンガン複合水酸化物を固液分離、水洗、乾燥後、空気雰囲気下または酸素雰囲気下、温度600〜800℃で熱処理することにより得ることができる。 Such a black inorganic oxide particle is a mixed aqueous solution of nickel salt, cobalt salt and manganese salt in a reaction vessel, while maintaining a reaction temperature of 30 to 70 ° C. under an inert gas atmosphere and adding sufficient stirring. An aqueous solution of ammonia as a complexing agent is added to the solution, and an aqueous solution of an alkali metal hydroxide is added so as to maintain the pH at 9 to 12 to produce a nickel cobalt manganese composite hydroxide. The product can be obtained by solid-liquid separation, water washing and drying, followed by heat treatment at a temperature of 600 to 800 ° C. in an air atmosphere or an oxygen atmosphere.
本発明の黒色無機酸化物を用いたペースト組成物によれば、バス電極の比抵抗値に影響を及ぼすことなく、Ag層と透明電極との接触抵抗値をより低くすることができる。その結果、接触抵抗値を低く抑えることによりパネルの発光ムラの改善、発光特性の向上、低消費電力を達成することができる。 According to the paste composition using the black inorganic oxide of the present invention, the contact resistance value between the Ag layer and the transparent electrode can be further lowered without affecting the specific resistance value of the bus electrode. As a result, by suppressing the contact resistance value to a low level, it is possible to improve the light emission unevenness of the panel, improve the light emission characteristics, and reduce the power consumption.
黒色無機酸化物(A)は、分散性と黒色度とを考慮して、ペースト中に1〜30質量%、好ましくは5〜25質量%とするのがよい。 In consideration of dispersibility and blackness, the black inorganic oxide (A) is 1 to 30% by mass, preferably 5 to 25% by mass in the paste.
また、黒色無機酸化物(A)は、焼成後においては、接触抵抗値と黒色度を考慮して、黒層中に10〜100質量%の割合で含まれていることが好ましい。 Moreover, it is preferable that the black inorganic oxide (A) is contained in the black layer at a ratio of 10 to 100% by mass in consideration of the contact resistance value and the blackness after firing.
有機バインダー(B)
次に、前記有機バインダー(B)としては、カルボキシル基を有する樹脂、具体的にはそれ自体がエチレン性不飽和二重結合を有するカルボキシル基含有感光性樹脂及びエチレン性不飽和二重結合を有さないカルボキシル基含有樹脂のいずれも使用可能である。好適に使用できる樹脂(オリゴマー及びポリマーのいずれでもよい)としては、以下のようなものが挙げられる。
Organic binder (B)
Next, as the organic binder (B), a carboxyl group-containing resin, specifically, a carboxyl group-containing photosensitive resin having an ethylenically unsaturated double bond and an ethylenically unsaturated double bond. Any carboxyl group-containing resin that is not used can be used. Examples of the resin (which may be either an oligomer or a polymer) that can be suitably used include the following.
(1)(a)不飽和カルボン酸と(b)不飽和二重結合を有する化合物を共重合させることによって得られるカルボキシル基含有樹脂
(2)(a)不飽和カルボン酸と(b)不飽和二重結合を有する化合物の共重合体にエチレン性不飽和基をペンダントとして付加させることによって得られるカルボキシル基含有感光性樹脂
(3)(c)エポキシ基と不飽和二重結合を有する化合物と(b)不飽和二重結合を有する化合物の共重合体に、(a)不飽和カルボン酸を反応させ、生成した2級の水酸基に(d)多塩基酸無水物を反応させて得られるカルボキシル基含有感光性樹脂
(4)(e)不飽和二重結合を有する酸無水物と(b)不飽和二重結合を有する化合物の共重合体に、(f)水酸基と不飽和二重結合を有する化合物を反応させて得られるカルボキシル基含有感光性樹脂
(5)(g)エポキシ化合物と(h)不飽和モノカルボン酸を反応させ、生成した2級の水酸基に(d)多塩基酸無水物を反応させて得られるカルボキシル基含有感光性樹脂
(6)(b)不飽和二重結合を有する化合物とグリシジル(メタ)アクリレートの共重合体のエポキシ基に、(i)1分子中に1つのカルボキシル基を有し、エチレン性不飽和結合を持たない有機酸を反応させ、生成した2級の水酸基に(d)多塩基酸無水物を反応させて得られるカルボキシル基含有樹脂
(7)(j)水酸基含有ポリマーに(d)多塩基酸無水物を反応させて得られるカルボキシル基含有樹脂
(8)(j)水酸基含有ポリマーに(d)多塩基酸無水物を反応させて得られるカルボキシル基含有樹脂に、(c)エポキシ基と不飽和二重結合を有する化合物をさらに反応させて得られるカルボキシル基含有感光性樹脂
前記したようなカルボキシル基含有感光性樹脂及びカルボキシル基含有樹脂は、単独で又は混合して用いてもよいが、いずれの場合でもこれらは合計で組成物全量の10〜80質量%の割合で配合することが好ましい。これらの有機バインダーの配合割合が上記範囲よりも少な過ぎる場合、形成する塗膜中の上記樹脂の分布が不均一になり易く、充分な光硬化性及び光硬化深度が得られ難く、選択的露光、現像によるパターニングが困難となる。一方、上記範囲よりも多過ぎると、焼成時のパターンのよれや線幅収縮を生じ易くなるので好ましくない。
(1) A carboxyl group-containing resin obtained by copolymerizing (a) an unsaturated carboxylic acid and (b) a compound having an unsaturated double bond (2) (a) an unsaturated carboxylic acid and (b) unsaturated A carboxyl group-containing photosensitive resin obtained by adding an ethylenically unsaturated group as a pendant to a copolymer of a compound having a double bond (3) (c) a compound having an epoxy group and an unsaturated double bond ( b) A carboxyl group obtained by reacting a copolymer of a compound having an unsaturated double bond with (a) an unsaturated carboxylic acid, and reacting the resulting secondary hydroxyl group with (d) a polybasic acid anhydride. Containing photosensitive resin (4) (e) a copolymer of an acid anhydride having an unsaturated double bond and (b) a compound having an unsaturated double bond, (f) having a hydroxyl group and an unsaturated double bond Obtained by reacting compounds Carboxyl group-containing photosensitive resin (5) (g) A carboxyl obtained by reacting an epoxy compound with (h) an unsaturated monocarboxylic acid and reacting the resulting secondary hydroxyl group with (d) a polybasic acid anhydride Group-containing photosensitive resin (6) (b) An epoxy group of a copolymer of an unsaturated double bond and a glycidyl (meth) acrylate copolymer, (i) having one carboxyl group in one molecule, ethylene (D) a carboxyl group-containing resin (7) (j) obtained by reacting an organic acid not having a polymerizable unsaturated bond and reacting the resulting secondary hydroxyl group with (d) a polybasic acid anhydride (d) ) A carboxyl group-containing resin obtained by reacting a polybasic acid anhydride (8) (j) A carboxyl group-containing resin obtained by reacting a hydroxyl group-containing polymer with (d) a polybasic acid anhydride, (c) Epoxy Carboxyl group-containing photosensitive resin obtained by further reacting a group and a compound having an unsaturated double bond The carboxyl group-containing photosensitive resin and the carboxyl group-containing resin as described above may be used alone or in combination. However, in any case, these are preferably blended in a proportion of 10 to 80% by mass of the total amount of the composition. When the blending ratio of these organic binders is less than the above range, the distribution of the resin in the coating film to be formed tends to be non-uniform, and it is difficult to obtain sufficient photocurability and photocuring depth, and selective exposure. Patterning by development becomes difficult. On the other hand, if it is more than the above range, it is not preferable because the pattern during baking and the shrinkage of the line width are likely to occur.
また、上記カルボキシル基含有感光性樹脂及びカルボキシル基含有樹脂としては、それぞれ重量平均分子量1,000〜100,000、好ましくは5,000〜70,000、及び酸価50〜250mgKOH/g、かつ、カルボキシル基含有感光性樹脂の場合、その二重結合当量が350〜2,000、好ましくは400〜1,500のものを好適に用いることができる。上記樹脂の分子量が1,000より低い場合、現像時の塗膜の密着性に悪影響を与え、一方、100,000よりも高い場合、現像不良を生じ易いので好ましくない。また、酸価が50mgKOH/gより低い場合、アルカリ水溶液に対する溶解性が不充分で現像不良を生じ易く、一方、250mgKOH/gより高い場合、現像時に塗膜の密着性の劣化や光硬化部(露光部)の溶解が生じるので好ましくない。さらに、カルボキシル基含有感光性樹脂の場合、感光性樹脂の二重結合当量が350よりも小さいと、焼成時に残渣が残り易くなり、一方、2,000よりも大きいと、現像時の作業余裕度が狭く、また光硬化時に高露光量を必要とするので好ましくない。 The carboxyl group-containing photosensitive resin and the carboxyl group-containing resin each have a weight average molecular weight of 1,000 to 100,000, preferably 5,000 to 70,000, and an acid value of 50 to 250 mgKOH / g, and In the case of a carboxyl group-containing photosensitive resin, those having a double bond equivalent of 350 to 2,000, preferably 400 to 1,500 can be suitably used. When the molecular weight of the resin is lower than 1,000, the adhesion of the coating film during development is adversely affected. On the other hand, when the molecular weight is higher than 100,000, poor development is likely to occur, which is not preferable. On the other hand, when the acid value is lower than 50 mgKOH / g, the solubility in an alkaline aqueous solution is insufficient, and development failure tends to occur. This is not preferable because dissolution of the exposed portion occurs. Further, in the case of a carboxyl group-containing photosensitive resin, if the double bond equivalent of the photosensitive resin is less than 350, a residue is likely to remain at the time of baking, whereas if it is greater than 2,000, a work margin at the time of development. Is narrow, and a high exposure amount is required at the time of photocuring.
水溶性分散剤
本発明に好適に使用される水溶性分散剤は、酸価が30mgKOH/g以上、且つアミン価が20mgKOH/g以上の両性系の分散剤である。このような分散剤を用いることにより、分散性の高い長期に安定なペーストを得ることができる。この理由は、酸価が30mgKOH/g、アミン価が20mgKOH/gよりもいずれかが小さい分散剤を用いた場合、黒色無機酸化物と有機バインダーとの分散性が低下し、そのため現像性が低下し残渣が発生しやすくなる。また、保存安定性が低下し、経時で分離が発生しやすくなる。
Water-soluble dispersant
The water-soluble dispersant suitably used in the present invention is an amphoteric dispersant having an acid value of 30 mgKOH / g or more and an amine value of 20 mgKOH / g or more. By using such a dispersant, a paste having high dispersibility and a long-term stability can be obtained. The reason for this is that when a dispersant having an acid value of 30 mgKOH / g or an amine value of less than 20 mgKOH / g is used, the dispersibility between the black inorganic oxide and the organic binder is lowered, and thus the developability is lowered. Residues are likely to occur. In addition, the storage stability is lowered, and separation tends to occur over time.
また、本発明に用いる分散剤は水溶性のものを用いる。その理由は、分散剤が水溶性でないと、無機酸化物スラリーの長期保存時に、スラリー中の溶剤と無機酸化物との間で分離が生じやすくなり、長期に安定な分散性の高い無機酸化物スラリーとなりにくいからである。 Moreover, the dispersing agent used for this invention uses a water-soluble thing. The reason is that if the dispersant is not water-soluble, when the inorganic oxide slurry is stored for a long period of time, separation between the solvent in the slurry and the inorganic oxide is likely to occur, and the inorganic oxide is highly stable for a long period of time. This is because it is difficult to form a slurry.
上記水溶性分散剤は、その10質量%水溶液pHが6.0〜10.0であることが好ましい。分散剤の10質量%水溶液pHが6.0よりも小さくなると黒色無機酸化物ペースト中の無機酸化物と分散剤が反応することにより、長期保存した場合、黒色無機酸化物ペースト中の無機酸化物の溶解を生ずる可能性がある。一方、分散剤の10質量%水溶液pHが10.0よりも大きくなると黒色無機酸化物ペーストの長期保存時に、黒色無機酸化物ペーストの溶剤と無機酸化物の分離が生じやすくなり、分散性の高い長期に安定な黒色無機酸化物ペーストとならない。 The water-soluble dispersant preferably has a 10% by mass aqueous solution pH of 6.0 to 10.0. When the pH of the 10% by weight aqueous solution of the dispersant is less than 6.0, the inorganic oxide in the black inorganic oxide paste reacts with the dispersant, so that the inorganic oxide in the black inorganic oxide paste when stored for a long period of time. May occur. On the other hand, when the pH of the 10% by weight aqueous solution of the dispersant is higher than 10.0, the black inorganic oxide paste tends to be separated from the solvent and inorganic oxide during long-term storage of the black inorganic oxide paste, and the dispersibility is high. It will not be a long-term stable black inorganic oxide paste.
このような特性を有する分散剤としては、Disperbyk-180, Disperbyk-187,Disperbyk-191,(いずれもビックケミー社製、商品名)が挙げられる。 Examples of the dispersant having such characteristics include Disperbyk-180, Disperbyk-187, and Disperbyk-191 (all of which are trade names, manufactured by BYK Chemie).
水溶性分散剤は、分散性と黒色度とを考慮して、有機バインダー(B)100質量部に対して、0.1〜20質量部が好ましい。より好ましくは0.5〜10質量部、更に好ましくは1〜6質量部とする。 In consideration of dispersibility and blackness, the water-soluble dispersant is preferably 0.1 to 20 parts by mass with respect to 100 parts by mass of the organic binder (B). More preferably, it is 0.5-10 mass parts, More preferably, it is 1-6 mass parts.
光重合性モノマー
次に、本発明のペースト組成物は、組成物の光硬化性の促進及び現像性を向上させるために光重合性モノマーを配合することができる。この光重合性モノマーとしては、例えば、2−ヒドロキシエチルアクリレート,2−ヒドロキシプロピルアクリレート、ジエチレングリコールジアクリレート、トリエチレングリコールジアクリレート、ポリエチレングリコールジアクリレート、ポリウレタンジアクリレート、トリメチロールプロパントリアクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、トリメチロールプロパンエチレンオキサイド変性トリアクリレート、トリメチロールプロパンプロピレンオキサイド変性トリアクリレート、ジペンタエリスリトールペンタアクリレート、ジペンタエリスリトールヘキサアクリレート及び上記アクリレートに対応する各メタクリレート類;フタル酸、アジピン酸、マレイン酸、イタコン酸、こはく酸、トリメリット酸、テレフタル酸等の多塩基酸とヒドロキシアルキル(メタ)アクリレートとのモノ−、ジ−、トリ−又はそれ以上のポリエステルなどが挙げられるが、特定のものに限定されるものではなく、またこれらを単独で又は2種以上を組み合わせて用いることができる。これらの光重合性モノマーの中でも、1分子中に2個以上のアクリロイル基又はメタクリロイル基を有する多官能モノマーが好ましい。
Photopolymerizable monomer
Next, the paste composition of the present invention can be blended with a photopolymerizable monomer in order to promote photocurability and improve developability of the composition. Examples of the photopolymerizable monomer include 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, polyurethane diacrylate, trimethylolpropane triacrylate, and pentaerythritol triacrylate. Acrylate, pentaerythritol tetraacrylate, trimethylolpropane ethylene oxide modified triacrylate, trimethylolpropane propylene oxide modified triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate and each methacrylate corresponding to the above acrylate; phthalic acid, adipine Acid, maleic acid, itacone Mono-, di-, tri- or higher polyesters of polybasic acids such as succinic acid, trimellitic acid, terephthalic acid and the like and hydroxyalkyl (meth) acrylates, but are limited to specific ones. It is not a thing, and these can be used individually or in combination of 2 or more types. Among these photopolymerizable monomers, polyfunctional monomers having two or more acryloyl groups or methacryloyl groups in one molecule are preferable.
このような光重合性モノマーの配合量は、前記有機バインダー(カルボキシル基含有感光性樹脂及び/又はカルボキシル基含有樹脂)(B)100質量部当り20〜100質量部が適当である。光重合性モノマーの配合量が上記範囲よりも少ない場合、組成物の充分な光硬化性が得られ難くなり、一方、上記範囲を超えて多量になると、塗膜の深部に比べて表面部の光硬化が早くなるため硬化むらを生じ易くなる。 The blending amount of such a photopolymerizable monomer is suitably 20 to 100 parts by mass per 100 parts by mass of the organic binder (carboxyl group-containing photosensitive resin and / or carboxyl group-containing resin) (B). When the blending amount of the photopolymerizable monomer is less than the above range, it is difficult to obtain sufficient photocurability of the composition. On the other hand, when the amount exceeds the above range, the surface portion is more than the deep portion of the coating film. Unevenness of curing is likely to occur due to faster photocuring.
光重合開始剤
次に、本発明のペースト組成物は、さらに光重合開始剤を配合することができる。この光重合開始剤としては、例えば、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル等のベンゾインとベンゾインアルキルエーテル類;アセトフェノン、2,2−ジメトキシー2−フェニルアセトフェノン、2,2−ジエトキシー2−フェニルアセトフェノン、1,1−ジクロロアセトフェノン等のアセトフェノン類;2−メチル−1−[4−(メチルチオ)フェニル]−2−モルフォリノプロパン−1−オン、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−ブタノン−1等のアミノアセトフェノン類;2−メチルアントラキノン、2−エチルアントラキノン、2−t−ブチルアントラキノン、1−クロロアントラキノン等のアントラキノン類;2,4−ジメチルチオキサントン、2,4−ジエチルチオキサントン、2−クロロチオキサントン、2,4−ジイソプロピルチオキサントン等のチオキサントン類;アセトフェノンジメチルケタール、ベンジルジメチルケタール等のケタール類;ベンゾフェノン等のベンゾフェノン類;又はキサントン類;(2,6−ジメトキシベンゾイル)−2,4,4−ペンチルホスフィンオキサイド、ビス(2,4,6−トリメチルベンゾイル)−フェニルフォスフィンオキサイド、2,4,6−トリメチルベンゾイルジフェニルフォスフィンオキサイド、エチル−2,4,6−トリメチルベンゾイルフェニルフォスフィネイト等のフォスフィンオキサイド類;各種パーオキサイド類などが挙げられ、これら公知慣用の光重合開始剤を単独で又は2種以上を組み合わせて用いることができる。
Photopolymerization initiator
Next, the paste composition of the present invention can further contain a photopolymerization initiator. Examples of the photopolymerization initiator include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2 Acetophenones such as phenylacetophenone and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1 Aminoacetophenones such as-(4-morpholinophenyl) -butanone-1; anthraquinones such as 2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, 1-chloroanthraquinone; 2,4- Thioxanthones such as methylthioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-diisopropylthioxanthone; ketals such as acetophenone dimethyl ketal and benzyldimethyl ketal; benzophenones such as benzophenone; or xanthones; , 6-Dimethoxybenzoyl) -2,4,4-pentylphosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, ethyl-2 Phosphine oxides such as 1,4,6-trimethylbenzoylphenyl phosphinate; various peroxides, etc., and these known and commonly used photopolymerization initiators may be used alone or in combination of two or more. It can be used Te Align.
これらの光重合開始剤の配合割合は、前記有機バインダー(カルボキシル基含有感光性樹脂及び/又はカルボキシル基含有樹脂)(B)100質量部当り1〜30質量部が適当であり、好ましくは、5〜20質量部である。 The mixing ratio of these photopolymerization initiators is suitably 1 to 30 parts by mass, preferably 5 parts per 100 parts by mass of the organic binder (carboxyl group-containing photosensitive resin and / or carboxyl group-containing resin) (B). ˜20 parts by mass.
また、上記のような光重合開始剤は、N,N−ジメチルアミノ安息香酸エチルエステル、N,N−ジメチルアミノ安息香酸イソアミルエステル、ペンチル−4−ジメチルアミノベンゾエート、トリエチルアミン、トリエタノールアミン等の三級アミン類のような光増感剤の1種あるいは2種以上と組み合わせて用いることができる。さらに、より深い光硬化深度を要求される場合、必要に応じて、可視領域でラジカル重合を開始するチバ・スペシャルティ・ケミカルズ社製イルガキュアー784等のチタノセン系光重合開始剤、ロイコ染料等を硬化助剤として組み合わせて用いることができる。 In addition, the above photopolymerization initiator includes three kinds such as N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylaminobenzoate, triethylamine, and triethanolamine. It can be used in combination with one or more of photosensitizers such as secondary amines. Furthermore, when a deeper photocuring depth is required, a titanocene photopolymerization initiator such as Irgacure 784 manufactured by Ciba Specialty Chemicals, which starts radical polymerization in the visible region, and leuco dyes are cured as necessary. It can be used in combination as an auxiliary agent.
本発明において、ペースト組成物に多量の無機フィラーやガラス粉末を配合した場合、得られる組成物の保存安定性は悪く、ゲル化や流動性の低下により塗布作業性が悪くなる傾向がある。従って、本発明の組成物では、組成物の保存安定性向上のため、無機フィラーやガラス粉末の成分である金属あるいは酸化物粉末との錯体化あるいは塩形成などに効果のある化合物、例えば有機酸などの安定剤を添加することが好ましい。この安定剤の添加量は前記の無機フィラーやガラス粉末100質量部当り0.1〜10質量部の割合が好ましい。 In the present invention, when a large amount of inorganic filler or glass powder is blended in the paste composition, the storage stability of the resulting composition is poor, and the coating workability tends to be poor due to gelation or fluidity deterioration. Accordingly, in the composition of the present invention, in order to improve the storage stability of the composition, a compound effective for complexing or forming a salt with a metal or oxide powder as a component of an inorganic filler or glass powder, such as an organic acid. It is preferable to add a stabilizer such as The amount of the stabilizer added is preferably 0.1 to 10 parts by mass per 100 parts by mass of the inorganic filler or glass powder.
ガラス粉末
本発明のペースト組成物は、焼成後におけるパターンの密着性向上のため、必要に応じて軟化点400〜600℃のガラス粉末を、本発明のペースト組成物の特性を損なわない量的割合で配合することができる。このガラス粉末としては、ガラス転移点(Tg)300〜500℃、ガラス軟化点(Ts)400〜600℃のものが好ましい。また、解像度の点からは、平均粒径20μm以下、好ましくは5μm以下のガラス粉末を用いることが好ましい。
Glass powder
The paste composition of the present invention contains glass powder having a softening point of 400 to 600 ° C., if necessary, in a quantitative ratio that does not impair the characteristics of the paste composition of the present invention, in order to improve the adhesion of the pattern after firing. can do. The glass powder preferably has a glass transition point (Tg) of 300 to 500 ° C. and a glass softening point (Ts) of 400 to 600 ° C. From the viewpoint of resolution, it is preferable to use glass powder having an average particle size of 20 μm or less, preferably 5 μm or less.
このようなガラス粉末としては、酸化鉛、酸化ビスマス、又は酸化亜鉛などを主成分とする非結晶性フリットが好適に使用できる。 As such a glass powder, an amorphous frit mainly composed of lead oxide, bismuth oxide, zinc oxide or the like can be suitably used.
ガラス粉末は、ペースト中に1〜25質量%、好ましくは5〜20質量%配合することができる。 The glass powder can be blended in the paste in an amount of 1 to 25% by mass, preferably 5 to 20% by mass.
他の配合成分
本発明においては、組成物のペースト化のための希釈剤、あるいは、各種塗布工程に応じた粘度調整のための希釈剤として、適宜の量の有機溶剤を配合することができる。具体的には、メチルエチルケトン、シクロヘキサノンなどのケトン類;トルエン、キシレン、テトラメチルベンゼンなどの芳香族炭化水素類;セロソルブ、メチルセロソルブ、カルビトール、メチルカルビトール、ブチルカルビトール、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、トリエチレングリコールモノエチルエーテルなどのグリコールエーテル類;酢酸エチル、酢酸ブチル、セロソルブアセテート、ブチルセロソルブアセテート、カルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールモノメチルエーテルアセテートなどの酢酸エステル類;エタノール、プロパノール、エチレングリコール、プロピレングリコール、テルピネオールなどのアルコール類;オクタン、デカンなどの脂肪族炭化水素;石油エーテル、石油ナフサ、水添石油ナフサ、ソルベントナフサなどの石油系溶剤が挙げられ、これらを単独で又は2種以上を組み合わせて用いることができる。
Other ingredients
In the present invention, an appropriate amount of an organic solvent can be blended as a diluent for pasting the composition or a diluent for adjusting the viscosity according to various coating steps. Specifically, ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as toluene, xylene and tetramethylbenzene; cellosolve, methyl cellosolve, carbitol, methyl carbitol, butyl carbitol, propylene glycol monomethyl ether, di Glycol ethers such as propylene glycol monomethyl ether, dipropylene glycol monoethyl ether, triethylene glycol monoethyl ether; ethyl acetate, butyl acetate, cellosolve acetate, butyl cellosolve acetate, carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether acetate Acetic acid esters such as ethanol, propanol, ethylene glycol, propylene glycol And alcohols such as terpineol; aliphatic hydrocarbons such as octane and decane; petroleum solvents such as petroleum ether, petroleum naphtha, hydrogenated petroleum naphtha, and solvent naphtha. These may be used alone or in combination of two or more. Can be used.
本発明のペースト組成物は、さらに必要に応じて、シリコーン系、アクリル系等の消泡・レベリング剤、塗膜の密着性向上のためのシランカップリング剤、等の他の添加剤を配合することもできる。さらにまた、必要に応じて、公知慣用の酸化防止剤や、焼成時における基板との結合成分としての金属酸化物、ケイ素酸化物、ホウ素酸化物などの微粒子を添加することもできる。 If necessary, the paste composition of the present invention further contains other additives such as silicone-based and acrylic-based antifoaming / leveling agents, silane coupling agents for improving the adhesion of coating films, and the like. You can also. Furthermore, if necessary, fine particles such as metal oxides, silicon oxides, boron oxides, and the like, which are known and commonly used antioxidants, and as binding components to the substrate during firing may be added.
ペースト組成物の使用
本発明のペースト組成物は、予めフィルム状に成膜されている場合には基板上にラミネートすればよいが、ペースト状組成物の場合、スクリーン印刷法、バーコーター、ブレードコーターなど適宜の塗布方法で基板、例えばPDPの前面基板となるガラス基板に塗布し、次いで指触乾燥性を得るために熱風循環式乾燥炉、遠赤外線乾燥炉等で例えば約60〜120℃で5〜40分程度乾燥させて有機溶剤を蒸発させ、タックフリーの塗膜を得る。その後、選択的露光、現像、焼成を行なって所定のパターンを形成する。
Use of paste composition
The paste composition of the present invention may be laminated on a substrate when it is previously formed into a film, but in the case of a paste-like composition, an appropriate application method such as screen printing, bar coater, blade coater, etc. Apply to a glass substrate, for example, a front substrate of a PDP, and then dry in a hot-air circulating drying furnace, a far-infrared drying furnace, etc. for about 5 to 40 minutes at about 60 to 120 ° C. The organic solvent is evaporated to obtain a tack-free coating film. Thereafter, selective exposure, development, and baking are performed to form a predetermined pattern.
露光工程としては、所定の露光パターンを有するネガマスクを用いた接触露光及び非接触露光が可能である。露光光源としては、ハロゲンランプ、高圧水銀灯、レーザー光、メタルハライドランプ、ブラックランプ、無電極ランプなどが使用される。露光量としては50〜1000mJ/cm2程度が好ましい。 As the exposure step, contact exposure and non-contact exposure using a negative mask having a predetermined exposure pattern are possible. As the exposure light source, a halogen lamp, a high-pressure mercury lamp, a laser beam, a metal halide lamp, a black lamp, an electrodeless lamp, or the like is used. The exposure amount is preferably about 50 to 1000 mJ / cm 2 .
現像工程としてはスプレー法、浸漬法等が用いられる。現像液としては、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、珪酸ナトリウムなどの金属アルカリ水溶液や、モノエタノールアミン、ジエタノールアミン、トリエタノールアミンなどのアミン水溶液、特に約1.5質量%以下の濃度の希アルカリ水溶液が好適に用いられるが、組成物中のカルボキシル基含有樹脂のカルボキシル基がケン化され、未硬化部(未露光部)が除去されればよく、上記のような現像液に限定されるものではない。また、現像後に不要な現像液の除去のため、水洗や酸中和を行なうことが好ましい。 As the development process, a spray method, an immersion method, or the like is used. Developers include aqueous alkali metal solutions such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate and sodium silicate, and aqueous amine solutions such as monoethanolamine, diethanolamine and triethanolamine, especially about 1.5% by mass or less. A dilute alkaline aqueous solution having a concentration of 1 is preferably used, as long as the carboxyl group of the carboxyl group-containing resin in the composition is saponified and the uncured part (unexposed part) is removed. It is not limited to. Further, it is preferable to perform washing with water and acid neutralization in order to remove unnecessary developer after development.
焼成工程においては、現像後の基板を空気中又は窒素雰囲気下で約400〜600℃の加熱処理を行ない、所望のパターンを形成する。なお、この時の昇温速度は、20℃/分以下に設定することが好ましい。 In the baking step, the substrate after development is subjected to heat treatment at about 400 to 600 ° C. in air or in a nitrogen atmosphere to form a desired pattern. In addition, it is preferable to set the temperature increase rate at this time to 20 degrees C / min or less.
(本発明に係る実施例及び比較例)
以下に実施例及び比較例を示して本発明について具体的に説明するが、本発明が下記実施例に限定されるものでないことはもとよりである。なお、「部」及び「%」とあるのは、特に断りがない限り全て質量基準である。
(Examples and comparative examples according to the present invention)
EXAMPLES Hereinafter, the present invention will be described in detail with reference to examples and comparative examples, but the present invention is not limited to the following examples. “Parts” and “%” are based on mass unless otherwise specified.
下記作製例で得られた黒色無機酸化物スラリーと、合成例で得られた有機バインダーと作製例で得られたガラススラリーを用いて、ペースト化を行ない、その評価を行なった。 Using the black inorganic oxide slurry obtained in the following production example, the organic binder obtained in the synthesis example, and the glass slurry obtained in the production example, a paste was formed and evaluated.
(Ni−Co−Mn黒色無機酸化物の作製)
硫酸ニッケルと硫酸コバルトと硫酸マンガンとが、下記実施例1〜3、比較例1−5に対応する所定のモル比率になるようにイオン交換水に溶解してニッケル、コバルト、マンガンの1.5mol/L金属塩水溶液を作製した。
(Preparation of Ni-Co-Mn black inorganic oxide)
Nickel sulfate, cobalt sulfate, and manganese sulfate are dissolved in ion-exchanged water so as to have predetermined molar ratios corresponding to the following Examples 1 to 3 and Comparative Example 1-5, and 1.5 mol of nickel, cobalt, and manganese are dissolved. / L metal salt aqueous solution was prepared.
窒素雰囲気下、反応槽温度が50℃になるように制御しながら、10Lのイオン交換水の入った有効容積15L反応槽に十分な攪拌を行った。 While controlling the reactor temperature to be 50 ° C. under a nitrogen atmosphere, sufficient stirring was performed in an effective volume 15 L reactor containing 10 L of ion exchange water.
上記攪拌を行っている反応槽に1.5mol/L金属塩水溶液及び硫酸アンモニウム水溶液を滴下しながら、pHが10.8を維持するように水酸化ナトリウム水溶液を滴下することで、球状のニッケルコバルトマンガン複合水酸化物を得た。 While adding 1.5 mol / L metal salt aqueous solution and ammonium sulfate aqueous solution dropwise to the reaction vessel performing the stirring, a sodium hydroxide aqueous solution is dropped so as to maintain a pH of 10.8. A composite hydroxide was obtained.
この球状のニッケルコバルトマンガン複合水酸化物を焼成温度650℃で5時間熱処理し粉砕することにより、黒色無機酸化物を得た。 The spherical nickel cobalt manganese composite hydroxide was heat treated at a firing temperature of 650 ° C. for 5 hours and pulverized to obtain a black inorganic oxide.
得られた黒色無機酸化物のCo、Ni、及びMn含有率については、試料である黒色無機酸化物を塩酸溶解し、ICP発光分析法にてCo、Ni、及びMnの測定を行った。 Regarding the Co, Ni, and Mn contents of the obtained black inorganic oxide, the black inorganic oxide as a sample was dissolved in hydrochloric acid, and Co, Ni, and Mn were measured by ICP emission analysis.
一次粒径D50については、FE SEM(電界放射型走査型電子顕微鏡)で20,000〜70,000倍の写真を撮影し、200個の一次粒子のフェレー径を測定した。 For the primary particle size D50, a 20,000-70,000-fold photograph was taken with an FE SEM (field emission scanning electron microscope), and the ferret diameter of 200 primary particles was measured.
(黒色無機酸化物スラリーの作製)
上記で得られた黒色無機酸化物15kgを溶剤トリプロピレングリコールモノメチルエーテル5.09kgと分散剤BYK180(商品名、ビックケミー社製)0.21kgの混合溶液に黒色無機酸化物粉末の凝集した粉末塊が混合溶液中に残らないように攪拌機を用いて1時間攪拌し予備スラリーを得た。
尚、ビーズミルベッセル内及び配管等に溶剤トリプロピレングリコールモノメチルエーテルが1.12kg存在することを確認した。
このようにして得られた予備スラリーを直径0.1mmジルコニアビーズを体積換算で充填率85%充填されたローターの回転周速12m/sビーズミル(アシザワ・ファインテック社製LMZ4型)へポンプにて導入して循環、湿式粉砕を行ない黒色無機酸化物スラリーを得た。
レーザー回折法による粒子径測定でスラリーの平均粒径が0.26〜0.31μmに達したところを終点とした。
(Preparation of black inorganic oxide slurry)
15 kg of the black inorganic oxide obtained above was mixed into a mixed solution of 5.09 kg of solvent tripropylene glycol monomethyl ether and a dispersant BYK180 (trade name, manufactured by BYK Chemie) 0.21 kg. The mixture was stirred for 1 hour using a stirrer so as not to remain in the mixed solution to obtain a preliminary slurry.
It was confirmed that 1.12 kg of the solvent tripropylene glycol monomethyl ether was present in the bead mill vessel and piping.
The preliminary slurry thus obtained was pumped to a rotating peripheral speed 12 m / s bead mill (LMZ4 type manufactured by Ashizawa Finetech Co., Ltd.) filled with zirconia beads having a diameter of 0.1 mm and a filling rate of 85%. It was introduced and circulated and wet pulverized to obtain a black inorganic oxide slurry.
The end point was determined when the average particle size of the slurry reached 0.26 to 0.31 μm in the particle size measurement by laser diffraction method.
(有機バインダー(B−1)の合成)
温度計、攪拌機、滴下ロート、及び還流冷却機を備えたフラスコに、メチルメタクリレートとメタクリル酸を0.87:0.13のモル比で仕込み、溶媒としてジエチレングリコールモノメチルエーテルアセテート、触媒としてアゾビスイソブチロニトリルを入れ窒素雰囲気下、80℃で2〜6時間攪拌し、有機バインダー(B−1)を得た。この有機バインダー(B−1)は、重量平均分子量が約30,000、酸価が90mgKOH/g、固形分50%であった。なお、得られた有機バインダー(B−1)(共重合樹脂)の重量平均分子量の測定は、島津製作所製ポンプLC−6ADと昭和電工製カラムShodex(登録商標)KF−804、KF−803、KF−802を三本つないだ高速液体クロマトグラフィーにより測定した。
(Synthesis of organic binder (B-1))
A flask equipped with a thermometer, stirrer, dropping funnel, and reflux condenser is charged with methyl methacrylate and methacrylic acid in a molar ratio of 0.87: 0.13, diethylene glycol monomethyl ether acetate as a solvent, and azobisisobutyrate as a catalyst. Ronitrile was added and stirred at 80 ° C. for 2 to 6 hours under a nitrogen atmosphere to obtain an organic binder (B-1). This organic binder (B-1) had a weight average molecular weight of about 30,000, an acid value of 90 mgKOH / g, and a solid content of 50%. In addition, the measurement of the weight average molecular weight of the obtained organic binder (B-1) (copolymer resin) was performed using Shimadzu pump LC-6AD and Showa Denko column Shodex (registered trademark) KF-804, KF-803, Measurement was performed by high performance liquid chromatography using three KF-802s.
(ガラススラリーの作製)
ガラス粉末としては、Bi2O3 50%、B2O3 16%、ZnO 14%、SiO2 2%、BaO 18%、熱膨張係数α300=86×10−7/℃、ガラス軟化点501℃のものを使用した。
また、ビーズミルでの粉砕は、三井鉱山株式会社製SC50を用い、メディア径を0.3〜0.8mmΦのZrO2製のビーズを使用し、回転数2,000〜3,300rpmで、3〜9時間粉砕を実施した。
尚、粒度測定は、堀場レーザー回折/散乱式粒度分布測定装置LA−920を、使用した。
ガラス粉末を粗粉砕した後、300メッシュのスクリーンにてフィルタリングを行ない、このガラス粉末70質量部と2,2,4−トリメチル−1,3−ペンタンジオールモノブチレートを29.16質量部、それに分散剤として、BYK−410を0.14質量部、BYK−182を0.7質量部加えて、ビーズミルにて微粉砕し、D50:1.0μm、Dmax:3.9μmのガラス粉末の含有量が70質量%のスラリーを作製した。
作製したガラススラリーを、更にSUS製200×1400綾畳織りのメッシュにてろ過を行ったが、粒度分布に変化は見られなかった。
(Production of glass slurry)
As the glass powder, Bi 2 O 3 50%, B 2 O 3 16%, ZnO 14%,
Further, grinding in a bead mill, the Mitsui Mining using manufactured SC50 Co., media size using the ZrO 2 beads made of 0.3~0.8Mmfai, at a rotation speed of 2,000~3,300Rpm,. 3 to Milling was carried out for 9 hours.
In addition, the Horiba laser diffraction / scattering type particle size distribution measuring device LA-920 was used for the particle size measurement.
After roughly pulverizing the glass powder, it was filtered with a 300 mesh screen, and 70 parts by mass of this glass powder and 29.16 parts by mass of 2,2,4-trimethyl-1,3-pentanediol monobutyrate were added thereto. As a dispersant, 0.14 parts by mass of BYK-410 and 0.7 parts by mass of BYK-182 were added and finely pulverized with a bead mill. D50: 1.0 μm, Dmax: 3.9 μm glass powder content Produced a 70% by weight slurry.
The produced glass slurry was further filtered through a SUS 200 × 1400 twill mat mesh, but no change was observed in the particle size distribution.
(組成物例1)
有機バインダー(B−1) 100.0部
ジエチレングリコールモノメチルエーテルアセテート 110.0部
トリメチロールプロパンEO変性トリアクリレート 30.0部
ジベンタエリスリトールヘキサアクリレート 15.0部
ポリエステルアクリレート(商品名M−7100、東亜合成社製) 50.0部
レベリング剤(商品名モダフロー、モンサント社製) 3.0部
リン酸エステル 1.0部
ガラススラリー 43.0部
黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=20:20:60) 67.0部
2-メチル-1-(4-メチルチオフェニル)-2-モリフォリノプロパン-1-オン 10.0部
2,4-ジエチルチオキサントン 3.0部
4,4-ビス(ジエチルアミノ)ベンゾフェノン 1.0部
γ−メタクリロキシプロピルトリメトキシシラン 3.0部
(組成物例2)
黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=20:20:60)を黒色無機酸化物スラリー(黒色無機酸化物組成 Co:Mn=50:50)に置き換えたこと以外は組成物例1と同様の組成にてペースト化を行なった。
(Composition Example 1)
Organic binder (B-1) 100.0 parts diethylene glycol monomethyl ether acetate 110.0 parts trimethylolpropane EO-modified triacrylate 30.0 parts diventaerythritol hexaacrylate 15.0 parts polyester acrylate (trade name M-7100, Toa Gosei) 50.0 parts leveling agent (trade name Modaflow, manufactured by Monsanto) 3.0 parts phosphoric acid ester 1.0 part glass slurry 43.0 parts black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 20: 20: 60) 67.0 parts
10.0 parts of 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one
2,4-Diethylthioxanthone 3.0 parts
4,4-bis (diethylamino) benzophenone 1.0 part γ-methacryloxypropyltrimethoxysilane 3.0 parts (Composition Example 2)
Composition other than replacing black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 20: 20: 60) with black inorganic oxide slurry (black inorganic oxide composition Co: Mn = 50: 50) Pasting was performed with the same composition as in Example 1.
(組成物例3)
黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=20:20:60)を黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=10:45:45)に置き換えたこと以外は組成物例1と同様の組成にてペースト化を行なった。
(Composition Example 3)
Black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 20: 20: 60) was replaced with black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 10: 45: 45) Except for this, pasting was performed with the same composition as in Composition Example 1.
(比較組成物例1)
黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=20:20:60)を黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=33:33:33)に置き換えたこと以外は組成物例1と同様の組成にてペースト化を行なった。
(Comparative composition example 1)
Black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 20: 20: 60) was replaced with black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 33: 33: 33) Except for this, pasting was performed with the same composition as in Composition Example 1.
(比較組成物例2)
黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=20:20:60)を黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=20:60:20)に置き換えたこと以外は組成物例1と同様の組成にてペースト化を行なった。
(Comparative composition example 2)
Black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 20: 20: 60) was replaced with black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 20: 60: 20) Except for this, pasting was performed with the same composition as in Composition Example 1.
(比較組成物例3)
黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=20:20:60)を黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=60:20:20)に置き換えたこと以外は組成物例1と同様の組成にてペースト化を行なった。
(Comparative composition example 3)
Black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 20: 20: 60) was replaced with black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 60: 20: 20) Except for this, pasting was performed with the same composition as in Composition Example 1.
(比較組成物例4)
黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=20:20:60)を黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=70:10:20)に置き換えたこと以外は組成物例1と同様の組成にてペースト化を行なった。
(Comparative composition example 4)
Black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 20: 20: 60) was replaced with black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 70: 10: 20) Except for this, pasting was performed with the same composition as in Composition Example 1.
(比較組成物例5)
黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=20:20:60)を黒色無機酸化物スラリー(黒色無機酸化物組成 Ni:Co:Mn=0:100:0)に置き換えたこと以外は組成物例1と同様の組成にてペースト化を行なった。
(Comparative composition example 5)
Black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 20: 20: 60) was replaced with black inorganic oxide slurry (black inorganic oxide composition Ni: Co: Mn = 0: 100: 0) Except for this, pasting was performed with the same composition as in Composition Example 1.
(ペーストの分散)
組成物例1〜3及び比較組成物例1〜5の各ペースト成分をポリ容器に各配合し、ディゾルバーにて500rpm10分間攪拌を行なう。その後、セラミック製3本ロールにて2回練肉を行ない、ペーストを作製した。
(Dispersion of paste)
Each paste component of Composition Examples 1 to 3 and Comparative Composition Examples 1 to 5 is blended in a plastic container and stirred with a dissolver at 500 rpm for 10 minutes. Thereafter, the paste was prepared by performing kneaded meat twice with three ceramic rolls.
このようにして得られた組成物例、比較組成物例の各感光性ペーストについて、それぞれ試験片を作製し、黒色度ならびに接触抵抗値について評価した。 A test piece was prepared for each of the photosensitive pastes of the composition examples and the comparative composition examples thus obtained, and the blackness and the contact resistance value were evaluated.
(試験片の作製方法)
ガラス基板上に、評価用の各感光性ペーストを300メッシュのポリエステルスクリーンを用いて全面に塗布し、次いで、熱風循環式乾燥炉にて90℃で20分間乾燥して約4μmの塗膜を形成した。次に、光源として超高圧水銀灯を用い、乾燥塗膜上の積算光量が600mJ/cm2となるように露光した後、液温25℃の0.4wt%Na2CO3水溶液を用いて現像を行ない、水洗した。こうして得たヘ゛タ膜を昇温:14℃/min.温度:590℃で10分間焼成を行った。焼成後の膜上に誘電体(商品名:YPT-065F(AP5655AE)、旭硝子社製)を100メッシュのポリエステルスクリーンを用いて全面に塗布した。次いで、熱風循環式乾燥炉にて90℃で20分間乾燥した後、14℃/min.温度:580℃で10分間焼成を行ない、試験片を得た。
(Test piece preparation method)
Each photosensitive paste for evaluation is applied on the entire surface of a glass substrate using a 300-mesh polyester screen, and then dried at 90 ° C. for 20 minutes in a hot-air circulating drying oven to form a coating film of about 4 μm. did. Next, using an ultra-high pressure mercury lamp as a light source and exposing so that the integrated light quantity on the dried coating film becomes 600 mJ / cm 2 , development is performed using a 0.4 wt% Na 2 CO 3 aqueous solution at a liquid temperature of 25 ° C. Done, washed with water. The solid film thus obtained was heated to 14 ° C./min. Temperature: baked at 590 ° C. for 10 minutes. A dielectric (trade name: YPT-065F (AP5655AE), manufactured by Asahi Glass Co., Ltd.) was applied over the entire surface of the fired film using a 100 mesh polyester screen. Subsequently, after drying at 90 degreeC for 20 minute (s) with a hot-air circulation type drying furnace, 14 degreeC / min. Temperature: baked at 580 ° C. for 10 minutes to obtain a test piece.
(黒色度の測定)
上記方法によって作製した試験片について、色彩色差計(ミノルタカメラ(株)製、CR−221)を用いてL*a*b*表色系の値をJIS−Z−8729にしたがって測定し、明度を表す指数であるL*値を黒色度の指標として評価した。このL*値が小さいほど黒色度に優れる。
(Measurement of blackness)
About the test piece produced by the said method, the value of L * a * b * color system was measured according to JIS-Z-8729 using the color difference meter (the Minolta camera Co., Ltd. product, CR-221), and the brightness The L * value, which is an index representing, was evaluated as an index of blackness. The smaller the L * value, the better the blackness.
(接触抵抗値測定用基板の作製)
あらかじめITO皮膜が形成されているガラス基板(旭ガラス社製PD200)上に、評価用の各感光性ペーストを200メッシュのポリエステルスクリーンを用いて全面に塗布し、次いで、熱風循環式乾燥炉にて90℃で20分間乾燥して約5μmの塗膜を形成した。次に、光源として超高圧水銀灯を用い、乾燥塗膜上の積算光量が600mJ/cm2となるように露光した後、露光塗膜上にAgペースト(配合組成は後記する)を200メッシュのポリエステルスクリーンを用いて全面に塗布し、次いで、熱風循環式乾燥炉にて90℃で20分間乾燥して約10μmの塗膜を形成した。さらに光源に超高圧水銀灯を用い、乾燥塗膜上に400mJ/cm2となるようにパターン露光した後、液温25℃の0.4wt%Na2CO3水溶液を用いて現像を行ない、水洗した。こうして得た基板を昇温:14℃/min.温度:590℃で10分間焼成を行ない図2のようなパターンを形成した試験片を得た。
(Preparation of contact resistance measurement substrate)
On the glass substrate (PD200 manufactured by Asahi Glass Co., Ltd.) on which an ITO film has been formed in advance, each photosensitive paste for evaluation was applied to the entire surface using a 200 mesh polyester screen, and then in a hot air circulation drying oven. The film was dried at 90 ° C. for 20 minutes to form a coating film of about 5 μm. Next, after using an ultra-high pressure mercury lamp as a light source and exposing so that the integrated light quantity on the dried coating film becomes 600 mJ / cm 2 , Ag paste (compounding composition will be described later) on the exposed coating film is 200 mesh polyester. It was coated on the entire surface using a screen, and then dried at 90 ° C. for 20 minutes in a hot air circulating drying oven to form a coating film of about 10 μm. Furthermore, using an ultra-high pressure mercury lamp as a light source, pattern exposure was performed on the dried coating film so as to be 400 mJ / cm 2 , development was performed using a 0.4 wt% Na 2 CO 3 aqueous solution at a liquid temperature of 25 ° C., and washing was performed. . The temperature of the substrate thus obtained was 14 ° C./min. Temperature: baked at 590 ° C. for 10 minutes to obtain a test piece having a pattern as shown in FIG.
(接触抵抗値の測定)
図2の焼成パターンXは、接触抵抗値の測定に用いられたもので、をHIOKI社製:HIOKI3540mΩハイテスタを用いてこの焼成パターンの接触抵抗値の測定((1)〜(5))を行い、その平均値を求めた。
尚、「測定不能」の表示は、該測定器で計れる限界の数値を超えていることを意味する。
(Measurement of contact resistance value)
The firing pattern X in FIG. 2 was used for the measurement of the contact resistance value, and the contact resistance value of this firing pattern was measured ((1) to (5)) using a HIOKI 3540 mΩ HiTester manufactured by HIOKI. The average value was obtained.
The indication “impossible to measure” means that the limit value that can be measured by the measuring instrument is exceeded.
(比抵抗値の測定)
図2の焼成パターンYは、比抵抗値の測定に用いられたもので、HIOKI社製:HIOKI3540mΩハイテスタを用いてこの焼成パターンの抵抗値の測定及び比抵抗値算出を行なった。比抵抗値の算出は次の通りである。
(Measurement of resistivity value)
The firing pattern Y in FIG. 2 was used for measurement of the specific resistance value, and the resistance value of the fired pattern was measured and the specific resistance value was calculated using a Hioki 3540 mΩ Hitester manufactured by HIOKI. The specific resistance value is calculated as follows.
比抵抗値(Ω・cm)=ライン抵抗値(Ω)×膜厚(cm)×ライン幅(cm)/ライン長さ(cm)
尚、「測定不能」の表示は、該測定器で計れる限界の数値を超えていることを意味する。
Specific resistance (Ω · cm) = Line resistance (Ω) × film thickness (cm) × line width (cm) / line length (cm)
The indication “impossible to measure” means that the limit value that can be measured by the measuring instrument is exceeded.
黒色度測定、接触抵抗値測定、比抵抗値測定の結果について表1に示す。 The results of blackness measurement, contact resistance value measurement, and specific resistance value measurement are shown in Table 1.
この表1に示す結果から明らかなように、本発明の感光性ペーストを使用することにより、黒色度が良好であり、かつ接触抵抗値の低い焼成膜を提供できることが確認された。 As is clear from the results shown in Table 1, it was confirmed that by using the photosensitive paste of the present invention, a fired film having good blackness and low contact resistance can be provided.
なお、実施例の組成物例1〜3について、ペーストの分散性を調べたところ、分散性の高い長期に安定なペーストを得ることができることが確認された。 In addition, about the composition examples 1-3 of the Example, when the dispersibility of the paste was investigated, it was confirmed that a stable paste with a high dispersibility can be obtained for a long time.
(露光塗膜上に塗布するAgペーストの配合組成)
Agペーストは、有機バインダー(B−2)、銀粉等を配合して作製された。
(Composition composition of Ag paste applied on the exposed coating film)
The Ag paste was prepared by blending an organic binder (B-2), silver powder, and the like.
(有機バインダー(B−2)の合成)
温度計、攪拌機、滴下ロート、及び還流冷却器を備えたフラスコに、溶媒としてジエチレングリコールモノエチルエーテルアセテート、触媒としてアゾビスイソブチロニトリルをいれ窒素雰囲気下、80℃に加熱し、メタクリル酸及びメチルメタアクリレートを、メタクリル酸:0.4mol、メチルメタアクリレート:0.6molのモル比で混合したモノマーを約2時間かけて滴下し、さらに1時間攪拌後、温度を115℃まで上げて失活させ、樹脂溶液を得た。この樹脂溶液を冷却後、触媒として臭化テトラブチルアンモニウムを用い95〜115℃、30時間の条件で、ブチルグリジルエーテル:0.4molを、得られた樹脂のカルボキシル基の等量と付加反応させ、冷却した。さらに、得られた樹脂のOH基に対して、95〜105℃、8時間の条件で、無水テトラヒドロフタル酸0.26molを付加反応させ、冷却後取り出して固形分の55%の有機バインダー(B−2)を得た。
(Synthesis of organic binder (B-2))
In a flask equipped with a thermometer, stirrer, dropping funnel, and reflux condenser, diethylene glycol monoethyl ether acetate as a solvent and azobisisobutyronitrile as a catalyst are added and heated to 80 ° C. in a nitrogen atmosphere. A monomer mixed with methacrylic acid: 0.4 mol and methyl methacrylate: 0.6 mol in a molar ratio is added dropwise over about 2 hours, and further stirred for 1 hour, and then the temperature is raised to 115 ° C. to deactivate. A resin solution was obtained. After cooling this resin solution, tetrabutylammonium bromide was used as a catalyst at 95 to 115 ° C. for 30 hours, and butyl glycidyl ether: 0.4 mol was added with an equivalent amount of carboxyl group of the obtained resin and addition reaction. And cooled. Further, 0.26 mol of tetrahydrophthalic anhydride was added to the OH group of the obtained resin under the conditions of 95 to 105 ° C. and 8 hours, cooled and taken out, and an organic binder having a solid content of 55% (B -2) was obtained.
銀粉は、平均粒径(D50)2.2μm、最大粒径(Dmax)6.3μm、表面積0.3m2/gのものを使用した。 Silver powder having an average particle size (D50) of 2.2 μm, a maximum particle size (Dmax) of 6.3 μm and a surface area of 0.3 m 2 / g was used.
(Agペーストの配合組成)
有機バインダー(B−2) 100.0部
ジエチレングリコールモノエチルエーテルアセテート 90.0部
トリメチロールプロパントリアクリレート 25.0部
トリメチロールプロパンEO変性トリアクリレート 25.0部
2−ベンジル−2−ジメチルアミノ−1−
(4−モルフォリノフェニル)ブタン−1−オン 10.0部
銀粉 450.0部
ガラススラリー 22.0部
リン酸エステル 1.0部
消泡剤(BYK−354:ビックケミージャパン製) 1.0部
(Ag paste composition)
Organic binder (B-2) 100.0 parts
Diethylene glycol monoethyl ether acetate 90.0 parts
Trimethylolpropane triacrylate 25.0 parts
Trimethylolpropane EO-modified triacrylate 25.0 parts
2-Benzyl-2-dimethylamino-1-
10.0 parts of (4-morpholinophenyl) butan-1-one
450.0 parts of silver powder
Glass slurry 22.0 parts
Phosphate ester 1.0 part
Antifoaming agent (BYK-354: manufactured by Big Chemie Japan) 1.0 part
Claims (4)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007327881A JP2009149461A (en) | 2007-12-19 | 2007-12-19 | Paste composition |
| KR1020080129532A KR101069463B1 (en) | 2007-12-19 | 2008-12-18 | Paste Compositions and Firing Patterns |
| CN2008101864566A CN101464630B (en) | 2007-12-19 | 2008-12-19 | Paste composition and fired material pattern |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2007327881A JP2009149461A (en) | 2007-12-19 | 2007-12-19 | Paste composition |
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| Publication Number | Publication Date |
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| JP2009149461A true JP2009149461A (en) | 2009-07-09 |
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| KR (1) | KR101069463B1 (en) |
| CN (1) | CN101464630B (en) |
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| JP2023512535A (en) * | 2020-08-28 | 2023-03-27 | エルジー エナジー ソリューション リミテッド | Electrode drying quality evaluation device and electrode drying quality evaluation method |
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|---|---|---|---|---|
| JP2003187692A (en) * | 2001-12-20 | 2003-07-04 | Taiyo Ink Mfg Ltd | Black paste component, and a plasma display panel with black pattern formed by using the same |
| JP2005289653A (en) * | 2004-03-31 | 2005-10-20 | Mitsui Mining & Smelting Co Ltd | Composite black oxide particles, method for producing the same, black paint and black matrix |
| JP2006306710A (en) * | 2005-04-01 | 2006-11-09 | Mitsui Mining & Smelting Co Ltd | Black composite oxide particles, production method thereof, black paste and black matrix |
| WO2007063816A1 (en) * | 2005-11-30 | 2007-06-07 | Toray Industries, Inc. | Glass paste, method for producing display by using same, and display |
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| JP4290918B2 (en) * | 2002-02-15 | 2009-07-08 | 太陽インキ製造株式会社 | Photocurable composition and plasma display panel formed with black pattern using the same |
| JP4895502B2 (en) * | 2004-12-28 | 2012-03-14 | 日本ペイント株式会社 | Pigment dispersion and paint |
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2007
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2008
- 2008-12-18 KR KR1020080129532A patent/KR101069463B1/en not_active Expired - Fee Related
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003187692A (en) * | 2001-12-20 | 2003-07-04 | Taiyo Ink Mfg Ltd | Black paste component, and a plasma display panel with black pattern formed by using the same |
| JP2005289653A (en) * | 2004-03-31 | 2005-10-20 | Mitsui Mining & Smelting Co Ltd | Composite black oxide particles, method for producing the same, black paint and black matrix |
| JP2006306710A (en) * | 2005-04-01 | 2006-11-09 | Mitsui Mining & Smelting Co Ltd | Black composite oxide particles, production method thereof, black paste and black matrix |
| WO2007063816A1 (en) * | 2005-11-30 | 2007-06-07 | Toray Industries, Inc. | Glass paste, method for producing display by using same, and display |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023512535A (en) * | 2020-08-28 | 2023-03-27 | エルジー エナジー ソリューション リミテッド | Electrode drying quality evaluation device and electrode drying quality evaluation method |
| JP7655620B2 (en) | 2020-08-28 | 2025-04-02 | エルジー エナジー ソリューション リミテッド | Electrode drying quality evaluation device and electrode drying quality evaluation method |
| US12298229B2 (en) | 2020-08-28 | 2025-05-13 | Lg Energy Solution, Ltd. | Dry quality evaluation device for electrode and dry quality evaluation method for electrode |
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| Publication number | Publication date |
|---|---|
| CN101464630A (en) | 2009-06-24 |
| KR101069463B1 (en) | 2011-09-30 |
| KR20090067090A (en) | 2009-06-24 |
| CN101464630B (en) | 2012-04-04 |
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