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JP2009147030A - Semiconductor device - Google Patents

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Publication number
JP2009147030A
JP2009147030A JP2007321443A JP2007321443A JP2009147030A JP 2009147030 A JP2009147030 A JP 2009147030A JP 2007321443 A JP2007321443 A JP 2007321443A JP 2007321443 A JP2007321443 A JP 2007321443A JP 2009147030 A JP2009147030 A JP 2009147030A
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resin
insulating base
frame body
frame
solid
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Shinya Marumo
伸也 丸茂
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Panasonic Corp
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Panasonic Corp
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  • Solid State Image Pick-Up Elements (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

【課題】封止樹脂に内包する気泡を抑制する。
【解決手段】外部接続用の配線部4が設けられた絶縁基体1と、絶縁基体1に接着材料5にて接合され、配線部4に金属細線7にて電気的に接続された半導体素子6と、半導体素子6に接着材料8にて接合された保護体9と、絶縁基体1の周縁部に設けられた枠体2と、金属細線7を覆う封止樹脂10とを有する半導体装置13において、枠体2を貫通する樹脂注入経路12を具備しており、樹脂注入経路12が枠体2の外壁面に樹脂注入口11を有し、枠体2の内壁面に樹脂流入口13を有し、樹脂流入口13が枠体2の内壁面と絶縁基体1との接合面に接する。
【選択図】図1
An object of the present invention is to suppress bubbles included in a sealing resin.
An insulating substrate provided with a wiring portion for external connection, and a semiconductor element bonded to the insulating substrate with an adhesive material and electrically connected to the wiring portion with a thin metal wire. A semiconductor device 13 having a protective body 9 bonded to the semiconductor element 6 with an adhesive material 8, a frame 2 provided at the peripheral edge of the insulating base 1, and a sealing resin 10 covering the metal thin wire 7. The resin injection path 12 passes through the frame 2, and the resin injection path 12 has a resin injection port 11 on the outer wall surface of the frame body 2, and has a resin inlet 13 on the inner wall surface of the frame body 2. The resin inlet 13 is in contact with the joint surface between the inner wall surface of the frame 2 and the insulating substrate 1.
[Selection] Figure 1

Description

本発明は、CCDやCMOS等の撮像素子を用いた固体撮像装置等の光学デバイスに係り、絶縁基体に半導体素子を搭載して構成する半導体装置に関するものである。   The present invention relates to an optical device such as a solid-state imaging device using an imaging element such as a CCD or CMOS, and more particularly to a semiconductor device configured by mounting a semiconductor element on an insulating substrate.

近年、携帯端末をはじめとする電子機器の小型化に伴い、半導体装置の小型化が要求されている。また、半導体装置には、小型化および薄型化だけでなく、その性能の信頼性向上を図るために封止樹脂内の気泡を除去することが要求されている。半導体装置のなかでも特に、ビデオカメラやスチルカメラ等に広く用いられている固体撮像装置等の光学デバイスにはこの市場要求が強い。   In recent years, along with miniaturization of electronic devices such as portable terminals, miniaturization of semiconductor devices is required. In addition, semiconductor devices are required not only to be reduced in size and thickness, but also to remove bubbles in the sealing resin in order to improve the reliability of their performance. Among semiconductor devices, in particular, there is a strong market demand for optical devices such as solid-state imaging devices widely used in video cameras, still cameras, and the like.

従来の固体撮像装置の構成を図6に示す。図6(a)は同固体撮像装置の平面図、図6(b)は図6(a)におけるC−C’断面図である。
図6において、固体撮像装置60は、絶縁基体1と、絶縁基体1の周縁部に設けられた枠体2と、枠体2で囲われた内側の絶縁基体表面に設けられた素子搭載部3と、素子搭載部3の周囲から絶縁基体1の下面に導出された複数の配線部4と、素子搭載部3に接着剤5により固定された固体撮像素子6と、固体撮像素子6と配線部4とを電気的に接続している金属細線7と、固体撮像素子6上に接着剤8により接合された透光性の保護体9と、金属細線7を覆うように枠体2と固体撮像素子6の間に充填されている封止樹脂10を有する構造である。尚、図6(a)は図6(b)に示す樹脂10を透視した状態で示している。
A configuration of a conventional solid-state imaging device is shown in FIG. FIG. 6A is a plan view of the solid-state imaging device, and FIG. 6B is a cross-sectional view taken along the line CC ′ in FIG.
In FIG. 6, the solid-state imaging device 60 includes an insulating base 1, a frame 2 provided on the peripheral edge of the insulating base 1, and an element mounting portion 3 provided on the surface of the inner insulating base surrounded by the frame 2. A plurality of wiring parts 4 led out from the periphery of the element mounting part 3 to the lower surface of the insulating base 1, a solid-state imaging element 6 fixed to the element mounting part 3 with an adhesive 5, a solid-state imaging element 6 and a wiring part 4, a thin metal wire 7 that is electrically connected to 4, a translucent protective body 9 bonded to the solid-state imaging element 6 by an adhesive 8, and the frame 2 and the solid-state imaging so as to cover the thin metal wire 7. In this structure, the sealing resin 10 is filled between the elements 6. FIG. 6A shows the resin 10 shown in FIG. 6B as seen through.

かかる固体撮像装置においては、封止樹脂10に気泡を内包することなく充填するために、封止樹脂10を充填した後に減圧チャンバに入れることで脱泡処理を行っていた。
また、特許文献1には、基板裏面に一対の貫通孔を形成し、その一方の貫通孔から封止樹脂を充填する方法が提案されている。
特開平8−236738号公報
In such a solid-state imaging device, in order to fill the sealing resin 10 without enclosing air bubbles, the defoaming process is performed by filling the sealing resin 10 and then placing it in a decompression chamber.
Patent Document 1 proposes a method of forming a pair of through holes on the back surface of a substrate and filling a sealing resin from one of the through holes.
JP-A-8-236738

しかしながら、上記のように減圧チャンバを用いる手法では、減圧時間にタクトがかかるために製造コストが増大化する虞があり、一般的なものでない。
また特許文献1に提案された充填方法では、上方から樹脂を充填し、上方へエアを抜く構成であるために、樹脂の流動とエアの排出方向が一致しない。そのために、樹脂充填後に枠体のコーナー部に気泡残りが発生していた。
However, the method using the decompression chamber as described above is not general because there is a possibility that the manufacturing cost may increase due to the tact time required for decompression.
Further, in the filling method proposed in Patent Document 1, since the resin is filled from above and the air is extracted upward, the flow of the resin does not coincide with the air discharge direction. For this reason, bubbles remain in the corners of the frame after filling with the resin.

本発明は、上記問題に鑑みてなされたものであり、その目的とするところは、封止樹脂内に内包される気泡を抑制させることができる半導体装置を提供することにある。   The present invention has been made in view of the above problems, and an object thereof is to provide a semiconductor device capable of suppressing bubbles encapsulated in a sealing resin.

上記課題を解決するために、本発明の半導体装置は、外部接続用の配線部を設けた絶縁基体と、前記絶縁基体に接着材料で接合し、前記配線部と金属細線で電気的に接続する半導体素子と、前記半導体素子に接着材料で接合した保護体と、前記絶縁基体の周縁部に設けた枠体と、前記金属細線を覆う封止樹脂とを有する半導体装置であって、前記枠体を貫通する樹脂注入経路を具備し、前記樹脂注入経路が前記枠体の外壁面に樹脂注入口を有し、かつ前記枠体の内壁面に樹脂流入口を有し、樹脂流入口が前記枠体の内壁面と前記絶縁基体との接合面に接することを特徴とする。   In order to solve the above-described problems, a semiconductor device according to the present invention includes an insulating base provided with a wiring portion for external connection, an adhesive material bonded to the insulating base, and an electrical connection with the wiring portion through a thin metal wire. A semiconductor device comprising: a semiconductor element; a protector bonded to the semiconductor element with an adhesive material; a frame provided on a peripheral edge of the insulating base; and a sealing resin that covers the metal thin wire. The resin injection path has a resin injection port on the outer wall surface of the frame body, and has a resin inlet on the inner wall surface of the frame body, and the resin inlet port is the frame. It is in contact with the joint surface between the inner wall surface of the body and the insulating substrate.

本発明の半導体装置では、樹脂流入口が絶縁基体に接しているので、流入する樹脂の液面が絶縁基体の表面から上方へ徐々に上がりながら、樹脂が枠体に囲われた領域に充填され、樹脂の流動方向は絶縁基体表面から上方へ向かっているので、エアの排出を妨げることはない。よって、封止樹脂内の気泡が抑制されているので、製品信頼性を向上させることができる。また製品品質の安定と製造歩留りの向上をすることができる。更に減圧チャンバ等の設備投資が不要であり、工程削減できる為、従来より製造コストを削減することが可能である。   In the semiconductor device of the present invention, since the resin inflow port is in contact with the insulating base, the resin level is gradually filled upward from the surface of the insulating base, and the resin is filled in the region surrounded by the frame. Since the flow direction of the resin is directed upward from the surface of the insulating base, the discharge of air is not hindered. Therefore, since air bubbles in the sealing resin are suppressed, product reliability can be improved. In addition, the product quality can be stabilized and the production yield can be improved. Furthermore, capital investment such as a decompression chamber is unnecessary, and the number of processes can be reduced, so that the manufacturing cost can be reduced as compared with the prior art.

以下、本発明の実施の形態を図面を参照して説明する。ここでは半導体装置の一例として固体撮像装置について説明する。
(実施形態1)
図1(a)は本発明の実施形態1の固体撮像装置の平面図、図1(b)は図1(a)におけるA−A’断面図、図1(c)は図1(a)におけるX−X’断面図である。
Hereinafter, embodiments of the present invention will be described with reference to the drawings. Here, a solid-state imaging device will be described as an example of a semiconductor device.
(Embodiment 1)
1A is a plan view of the solid-state imaging device according to the first embodiment of the present invention, FIG. 1B is a cross-sectional view taken along the line AA ′ in FIG. 1A, and FIG. 1C is FIG. It is XX 'sectional drawing in.

この固体撮像装置14は、セラミックや樹脂等により形成した絶縁基体1と、絶縁基体1の周縁部に設けた枠体2と、枠体2で囲んだ内側の絶縁基体表面に設けた素子搭載部3と、素子搭載部3の周囲から絶縁基体1の下面に導出させた複数のメタライズ配線体等で形成した配線部4と、素子搭載部2に銀ペースト等の接着剤5により固定したCCD等の固体撮像素子6と、固体撮像素子6の電極パッドと配線部4とを電気的に接続しているAuワイヤー等の金属細線7と、固体撮像素子6の上にエポキシ樹脂等を主材とするUV接着剤などの接着剤8により接合させた透光性の保護体9と、金属細線7を覆うように枠体2と固体撮像素子6の間に充填したエポキシ樹脂を主材とする封止樹脂10とを有する構造である。尚、図1(a)は、図1(b)、(c)における樹脂10を透視した状態で示している。   This solid-state imaging device 14 includes an insulating base 1 formed of ceramic, resin, or the like, a frame 2 provided on the peripheral edge of the insulating base 1, and an element mounting portion provided on the surface of the inner insulating base surrounded by the frame 2 3, a wiring part 4 formed of a plurality of metallized wiring bodies led out from the periphery of the element mounting part 3 to the lower surface of the insulating substrate 1, a CCD fixed to the element mounting part 2 with an adhesive 5 such as silver paste, etc. The solid-state imaging device 6, the metal wire 7 such as an Au wire that electrically connects the electrode pad of the solid-state imaging device 6 and the wiring portion 4, and an epoxy resin or the like as a main material on the solid-state imaging device 6. A transparent protective body 9 joined by an adhesive 8 such as a UV adhesive, and an epoxy resin filled between the frame 2 and the solid-state imaging device 6 so as to cover the metal thin wire 7. This is a structure having a stop resin 10. FIG. 1A shows the resin 10 in FIGS. 1B and 1C seen through.

この固体撮像装置が先に図6を用いて説明した従来のものと相違するところは、枠体2を貫通する樹脂注入経路12を具備する点である。樹脂注入経路12は枠体2の外壁面に樹脂注入口11を有し、枠体2の内壁面に樹脂流入口13を有しており、樹脂流入口13が絶縁基体1と枠体2との接合面に接している。   This solid-state imaging device is different from the conventional one described with reference to FIG. 6 in that a resin injection path 12 that penetrates the frame 2 is provided. The resin injection path 12 has a resin injection port 11 on the outer wall surface of the frame body 2, and a resin inlet 13 on the inner wall surface of the frame body 2. It is in contact with the joint surface.

これによれば、枠体2の外壁面の樹脂注入口11から注入した樹脂10は、樹脂注入経路12を通り、樹脂流入口13から枠体2で囲われた絶縁基体1の上方へ流入する。したがって、封止樹脂10は気泡を内包することなく、枠体2と固体撮像素子6の間に充填することができ、製品の信頼性を向上させることができる。
(実施形態2)
図2(a)は本発明の実施形態2の固体撮像装置の平面図、図2(b)は図2(a)におけるB−B’断面図、図2(c)は図2(a)におけるY−Y’断面図である。
According to this, the resin 10 injected from the resin injection port 11 on the outer wall surface of the frame body 2 flows through the resin injection path 12 and above the insulating substrate 1 surrounded by the frame body 2 from the resin inlet port 13. . Therefore, the sealing resin 10 can be filled between the frame 2 and the solid-state imaging element 6 without enclosing bubbles, and the reliability of the product can be improved.
(Embodiment 2)
2A is a plan view of the solid-state imaging device according to the second embodiment of the present invention, FIG. 2B is a cross-sectional view taken along line BB ′ in FIG. 2A, and FIG. 2C is FIG. It is YY 'sectional drawing in.

この固体撮像装置20が上記の実施形態1のものと相違するところは、樹脂注入口11が枠体2の上面に形成されている点である。この構成により、樹脂注入後に樹脂注入口11からの液垂れが生じないので、樹脂硬化前における液垂れ防止として耐熱テープ等で樹脂注入口11をふさぐ必要がなく、簡便な製造工程となる。   The difference between the solid-state imaging device 20 and that of the first embodiment is that the resin injection port 11 is formed on the upper surface of the frame body 2. With this configuration, no dripping occurs from the resin injection port 11 after resin injection, so that it is not necessary to block the resin injection port 11 with a heat-resistant tape or the like as a liquid dripping prevention before resin curing, and the manufacturing process is simple.

この樹脂注入口11の配置例を図3(a)、(b)に示す。図3(a)に示す固体撮像装置30では、枠体2の外壁上面に直線状に延びる樹脂注入口11を形成しており、複数個のニードルを並列させたマルチノズルや平型のノズルを樹脂注入口11に挿入して樹脂を注入することで、樹脂の充填速度を向上させることができる。   An arrangement example of the resin injection port 11 is shown in FIGS. In the solid-state imaging device 30 shown in FIG. 3A, a resin injection port 11 extending linearly is formed on the upper surface of the outer wall of the frame body 2, and a multi-nozzle or a flat type nozzle in which a plurality of needles are arranged in parallel is provided. The resin filling speed can be improved by inserting the resin into the resin injection port 11 and injecting the resin.

図3(b)に示す固体撮像装置31では、枠体2の外壁上面に複数個の樹脂注入口11を形成しており、樹脂の充填速度を向上させることができる。この場合、特殊なマルチノズルや平型ノズルが必要なく、一般的な1つ穴ノズルを使用するので、コストメリットがある。   In the solid-state imaging device 31 shown in FIG. 3B, a plurality of resin injection ports 11 are formed on the upper surface of the outer wall of the frame body 2, and the resin filling speed can be improved. In this case, there is no need for a special multi-nozzle or flat type nozzle, and a general one-hole nozzle is used, so there is a cost merit.

固体撮像素子6は一般的に長方形の形状をしているので、樹脂流入口13は枠体2の辺の中央部に形成することが好ましい。この場合固体撮像素子6の周囲において樹脂10の流動量に偏りがなく、均等に分岐して濡れ広がるので、樹脂充填品質が向上する。
(実施形態3)
図4は本発明の実施形態3の固体撮像装置の平面図である。但し、図4では固体撮像素子6を透視した状態で示す。
Since the solid-state image sensor 6 has a generally rectangular shape, the resin inlet 13 is preferably formed at the center of the side of the frame 2. In this case, the flow amount of the resin 10 is not biased around the solid-state imaging element 6 and is evenly branched and spreads, so that the resin filling quality is improved.
(Embodiment 3)
FIG. 4 is a plan view of a solid-state imaging device according to Embodiment 3 of the present invention. However, in FIG. 4, the solid-state imaging element 6 is shown in a transparent state.

この固体撮像装置40が上記の実施形態1のものと相違するところは、素子搭載部3となる絶縁基体1の表面に溝41を形成されている点である。
先に説明したものでは、樹脂流入口13から流入してくる樹脂10は、固体撮像素子6の周囲を流動して充填されるので、樹脂流入量を増加させた場合は、樹脂流入口13の近傍と固体撮像素子6を介した反対側とでは、樹脂液面の上昇速度に差異が出てしまい、樹脂流入口13の近傍での樹脂液面上昇が早くなり、樹脂流入口13の近傍で枠体2の上面へ樹脂10がはみ出す。
The difference between the solid-state imaging device 40 and that of the first embodiment is that a groove 41 is formed on the surface of the insulating substrate 1 to be the element mounting portion 3.
In the above description, since the resin 10 flowing in from the resin inlet 13 flows and fills around the solid-state imaging device 6, if the amount of resin inflow is increased, There is a difference in the rising speed of the resin liquid level between the vicinity and the opposite side through the solid-state imaging device 6, the resin liquid level rises in the vicinity of the resin inlet 13, and the resin inlet 13 near the resin inlet 13. The resin 10 protrudes from the upper surface of the frame 2.

しかしながら、図4に示すものでは、素子搭載部2となる絶縁基体1の表面に、格子状に溝41を形成しているので、樹脂流入量を増加させた場合にも、固体撮像素子6の周囲だけでなく、固体撮像素子6の下に形成した溝41を通って樹脂10が流動して、樹脂流入口13の近傍と固体撮像素子6を介した反対側とにおいて均等に樹脂液面が上昇する。   However, in the case shown in FIG. 4, since the grooves 41 are formed in a lattice pattern on the surface of the insulating base 1 that becomes the element mounting portion 2, even when the resin inflow amount is increased, The resin 10 flows not only around but also through the groove 41 formed under the solid-state image sensor 6, and the resin liquid level is evenly distributed in the vicinity of the resin inlet 13 and on the opposite side through the solid-state image sensor 6. To rise.

このため、枠体2上面からの樹脂はみだしを防止することができ、樹脂充填の速度向上と共に品質安定性が向上する。この場合に、固体撮像素子6を素子搭載部3に固定するための接着剤は、ACF等のテープ状の接着剤を使用すれば、溝41を塞ぐことなく固体撮像素子6を素子搭載部3に固定することができ、樹脂流動を妨げることなく充分な効果が得られる。   For this reason, the resin from the upper surface of the frame body 2 can be prevented from protruding, and the quality stability is improved as the resin filling speed is improved. In this case, as the adhesive for fixing the solid-state imaging element 6 to the element mounting portion 3, if a tape-like adhesive such as ACF is used, the solid-state imaging element 6 is not blocked by the element mounting portion 3. A sufficient effect can be obtained without hindering resin flow.

この絶縁基体1及び枠体2は、図5(a)、(b)、(c)に示すように、複数のセラミックグリーンシートを積層させた多層セラミック基板で形成しても良い。
図5(a)の場合には、樹脂注入経路12を型抜きした第2層目のシート52を、第1層目のシート51と第3層目のシート53で挟んで積層して焼成することで、容易に樹脂注入経路12を持つパッケージを作製することができる。
The insulating base 1 and the frame 2 may be formed of a multilayer ceramic substrate in which a plurality of ceramic green sheets are laminated, as shown in FIGS.
In the case of FIG. 5 (a), the second layer sheet 52 from which the resin injection path 12 is cut is sandwiched between the first layer sheet 51 and the third layer sheet 53 and fired. Thus, a package having the resin injection path 12 can be easily manufactured.

図5(b)の場合には、第1層目のシート51と第2層目のシート52の間に棒状の例えば木材等の可燃性物質54を挟んで積層して焼成する。可燃物質54は焼成により消失するので、可燃物質54に対応する部位に樹脂注入経路となる空洞を容易に作製することができる。   In the case of FIG. 5B, a rod-like combustible material 54 such as wood is sandwiched between the first layer sheet 51 and the second layer sheet 52 and fired. Since the combustible material 54 disappears by firing, a cavity serving as a resin injection path can be easily formed in a portion corresponding to the combustible material 54.

図5(c)の場合には、第1層目のシート51に、例えば金型治具等で押圧することで溝41を形成し、その上に第2層目のシート52を積層して焼成することで、樹脂注入経路12及び素子搭載部の溝41を持つパッケージを容易に作製することができる。   In the case of FIG.5 (c), the groove | channel 41 is formed in the sheet | seat 51 of the 1st layer, for example by pressing with a metal jig | tool etc., and the sheet | seat 52 of the 2nd layer is laminated | stacked on it. By baking, a package having the resin injection path 12 and the groove 41 of the element mounting portion can be easily manufactured.

尚、上述の本実施形態をとる場合も、脱泡のための減圧チャンバ等の設備が不要になるので、コストメリットが大きく有益である。   Even in the case of adopting the above-described embodiment, since a facility such as a decompression chamber for defoaming is not necessary, a cost merit is greatly advantageous.

本発明は、固体撮像装置以外の光デバイス、さらには光デバイスでない半導体装置にも適用することができ、加工も容易である。製品信頼性を向上し且つ製造コストを抑えることができるから、かかる半導体装置を実装する電子機器、たとえばビデオカメラやスチルカメラ等も、従来品に比較して信頼性を向上することができ、且つ低コストで製造することが可能である。   The present invention can be applied to an optical device other than a solid-state imaging device, and also to a semiconductor device that is not an optical device, and is easy to process. Since the product reliability can be improved and the manufacturing cost can be reduced, the electronic equipment on which such a semiconductor device is mounted, such as a video camera or a still camera, can also improve the reliability compared to the conventional products, and It can be manufactured at low cost.

本発明の実施形態1としての固体撮像装置を示し、(a)は平面図、(b)は(a)のA−A’断面図、(c)は(a)のX−X’断面図1 shows a solid-state imaging device as Embodiment 1 of the present invention, in which (a) is a plan view, (b) is a sectional view taken along line A-A 'in (a), and (c) is a sectional view taken along line X-X' in (a). 本発明の実施形態2としての固体撮像装置を示し、(a)は平面図、(b)は(a)のB−B’断面図、(c)は(a)のY−Y’断面図2 shows a solid-state imaging device as Embodiment 2 of the present invention, where (a) is a plan view, (b) is a B-B ′ sectional view of (a), and (c) is a Y-Y ′ sectional view of (a). FIG. それぞれ本発明の実施形態2の樹脂注入口の配置例Example of arrangement of resin injection port according to Embodiment 2 of the present invention 本発明の実施形態3としての固体撮像装置を示す平面図The top view which shows the solid-state imaging device as Embodiment 3 of this invention 本発明の実施形態としてセラミックグリーンシートを積層した作製例を示す模式図The schematic diagram which shows the preparation example which laminated | stacked the ceramic green sheet as embodiment of this invention 従来の固体撮像装置を示し、(a)は平面図、(b)は(a)のC−C’断面図1 shows a conventional solid-state imaging device, where (a) is a plan view and (b) is a cross-sectional view taken along line C-C ′ of (a).

符号の説明Explanation of symbols

1 絶縁基体
2 枠体
3 素子搭載部
4 配線部
5 接着剤
6 固体撮像素子
7 金属細線
8 接着剤
9 保護体
10 封止樹脂
11 樹脂注入口
12 樹脂注入経路
13 樹脂流入経路
14、20、30、40、60 固体撮像装置
41 溝
51 第1層目シート
52 第2層目シート
53 第3層目シート
54 可燃性物質
DESCRIPTION OF SYMBOLS 1 Insulation base | substrate 2 Frame 3 Element mounting part 4 Wiring part 5 Adhesive 6 Solid-state image sensor 7 Metal thin wire 8 Adhesive 9 Protector 10 Sealing resin 11 Resin injection port 12 Resin injection path 13 Resin inflow path 14, 20, 30 , 40, 60 Solid-state imaging device 41 Groove 51 First layer sheet 52 Second layer sheet 53 Third layer sheet 54 Combustible substance

Claims (5)

外部接続用の配線部を設けた絶縁基体と、前記絶縁基体に接着材料で接合し、前記配線部と金属細線で電気的に接続する半導体素子と、前記半導体素子に接着材料で接合した保護体と、前記絶縁基体の周縁部に設けた枠体と、前記金属細線を覆う封止樹脂とを有する半導体装置であって、
前記枠体を貫通する樹脂注入経路を具備し、前記樹脂注入経路が前記枠体の外壁面に樹脂注入口を有し、かつ前記枠体の内壁面に樹脂流入口を有し、樹脂流入口が前記枠体の内壁面と前記絶縁基体との接合面に接することを特徴とする半導体装置。
An insulating base provided with a wiring part for external connection, a semiconductor element bonded to the insulating base with an adhesive material, and electrically connected to the wiring part with a fine metal wire, and a protector bonded to the semiconductor element with an adhesive material And a semiconductor device having a frame body provided on a peripheral edge of the insulating base and a sealing resin covering the metal thin wire,
A resin injection path penetrating the frame body, the resin injection path having a resin injection port on the outer wall surface of the frame body, and a resin inlet port on the inner wall surface of the frame body; Is in contact with the joint surface between the inner wall surface of the frame and the insulating base.
樹脂注入口が前記枠体の外壁上面に形成されていることを特徴とする請求項1記載の半導体装置。   The semiconductor device according to claim 1, wherein a resin injection port is formed on an upper surface of the outer wall of the frame body. 前記枠体に囲まれた内側となる前記絶縁基体の表面に溝が形成されていることを特徴とする請求項1記載の半導体装置。   The semiconductor device according to claim 1, wherein a groove is formed on a surface of the insulating base that is an inner side surrounded by the frame body. 前記絶縁基体は、複数枚のセラミックグリーンシートを積層して形成された多層セラミック基板であることを特徴とする請求項1から3の何れか1項に記載の半導体装置。   4. The semiconductor device according to claim 1, wherein the insulating base is a multilayer ceramic substrate formed by laminating a plurality of ceramic green sheets. 5. 前記半導体素子は受光または発光する光学素子であり、前記保護体は透光性部材であることを特徴とする請求項1から4の何れか1項に記載の半導体装置。   5. The semiconductor device according to claim 1, wherein the semiconductor element is an optical element that receives or emits light, and the protective body is a translucent member.
JP2007321443A 2007-12-13 2007-12-13 Semiconductor device Pending JP2009147030A (en)

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JP2017022305A (en) * 2015-07-14 2017-01-26 日亜化学工業株式会社 Method of manufacturing light emitting device
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JP2020021800A (en) * 2018-07-31 2020-02-06 三菱電機株式会社 Semiconductor device, power conversion device, and manufacturing method of semiconductor device
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JP2020074421A (en) * 2020-01-06 2020-05-14 日亜化学工業株式会社 Method for manufacturing light emitting device
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