JP2009021240A - プラズマ処理装置 - Google Patents
プラズマ処理装置 Download PDFInfo
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- JP2009021240A JP2009021240A JP2008174723A JP2008174723A JP2009021240A JP 2009021240 A JP2009021240 A JP 2009021240A JP 2008174723 A JP2008174723 A JP 2008174723A JP 2008174723 A JP2008174723 A JP 2008174723A JP 2009021240 A JP2009021240 A JP 2009021240A
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- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Abstract
【解決手段】周波数整合器の演算処理回路には、記憶部を利用し、供給電力とプラズマの共振周波数の関係データ、および、真空チャンバーの電気的特性と電源側の発振周波数の関係データが予め記憶される。そして、周波数整合器は、高周波電源から高周波電力を供給する際、出力される電力の大きさに応じて真空チャンバーにおける共振周波数が適切な周波数となる様に発振周波数を調整する。
【選択図】図8
Description
2 :高周波電源
3 :周波数整合器
32:演算処理回路
33:D/Aコンバータ
34:電圧制御発振器
35:デジタルI/O
36:周波数発生器
4 :増幅器(RF増幅器)
5 :伝送線路
6 :反射波パワーメータ
7 :位相検出器
8 :進行波パワーメータ
9 :圧力検出手段
Claims (1)
- 誘導性結合によりプラズマを励起する螺旋共振装置に電力供給する高周波電源と、当該高周波電源の発振周波数を負荷インピーダンスに整合させる周波数整合器とを有するプラズマ処理装置であって、前記周波数整合器は、高周波電源から高周波電力を供給する際、出力される電力の大きさに応じて発信周波数を調整することを特徴とするプラズマ処理装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008174723A JP2009021240A (ja) | 2008-07-03 | 2008-07-03 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008174723A JP2009021240A (ja) | 2008-07-03 | 2008-07-03 | プラズマ処理装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007139116A Division JP4176813B2 (ja) | 2007-05-25 | 2007-05-25 | プラズマ処理装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010170441A Division JP2011023356A (ja) | 2010-07-29 | 2010-07-29 | プラズマ処理装置及び基板処理方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2009021240A true JP2009021240A (ja) | 2009-01-29 |
Family
ID=40360680
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008174723A Pending JP2009021240A (ja) | 2008-07-03 | 2008-07-03 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
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| JP (1) | JP2009021240A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011023356A (ja) * | 2010-07-29 | 2011-02-03 | Hitachi Kokusai Electric Inc | プラズマ処理装置及び基板処理方法 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6116314A (ja) * | 1984-07-02 | 1986-01-24 | Matsushita Electric Ind Co Ltd | 高周波電源装置 |
| JPH04299282A (ja) * | 1991-03-28 | 1992-10-22 | Japan Atom Energy Res Inst | 高周波加熱装置 |
| JPH07191764A (ja) * | 1993-12-27 | 1995-07-28 | Fujitsu Ltd | 高周波電源装置及びプラズマ発生装置 |
| JPH07201496A (ja) * | 1993-12-29 | 1995-08-04 | Matsushita Electric Ind Co Ltd | プラズマ発生方法及びプラズマ発生装置 |
| JPH08316759A (ja) * | 1995-05-16 | 1996-11-29 | Saitama Nippon Denki Kk | 広帯域増幅器 |
| JPH0955347A (ja) * | 1995-02-15 | 1997-02-25 | Applied Materials Inc | 誘導結合プラズマ反応器のrf電力ソースの自動周波数同調装置及び方法 |
| WO1997021332A1 (en) * | 1995-12-04 | 1997-06-12 | Mc Electronics Co., Ltd. | A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced |
| JPH09161994A (ja) * | 1995-12-07 | 1997-06-20 | Pearl Kogyo Kk | 放電プラズマ発生用高周波電源装置及び半導体製造装置 |
| JPH10130850A (ja) * | 1996-10-31 | 1998-05-19 | Kokusai Electric Co Ltd | 高周波電力発生装置、プラズマcvd装置及び高周波電力監視方法 |
| JP2000049000A (ja) * | 1998-07-31 | 2000-02-18 | Kem Kk | 周波数整合器 |
-
2008
- 2008-07-03 JP JP2008174723A patent/JP2009021240A/ja active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6116314A (ja) * | 1984-07-02 | 1986-01-24 | Matsushita Electric Ind Co Ltd | 高周波電源装置 |
| JPH04299282A (ja) * | 1991-03-28 | 1992-10-22 | Japan Atom Energy Res Inst | 高周波加熱装置 |
| JPH07191764A (ja) * | 1993-12-27 | 1995-07-28 | Fujitsu Ltd | 高周波電源装置及びプラズマ発生装置 |
| JPH07201496A (ja) * | 1993-12-29 | 1995-08-04 | Matsushita Electric Ind Co Ltd | プラズマ発生方法及びプラズマ発生装置 |
| JPH0955347A (ja) * | 1995-02-15 | 1997-02-25 | Applied Materials Inc | 誘導結合プラズマ反応器のrf電力ソースの自動周波数同調装置及び方法 |
| JPH08316759A (ja) * | 1995-05-16 | 1996-11-29 | Saitama Nippon Denki Kk | 広帯域増幅器 |
| WO1997021332A1 (en) * | 1995-12-04 | 1997-06-12 | Mc Electronics Co., Ltd. | A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced |
| JPH09161994A (ja) * | 1995-12-07 | 1997-06-20 | Pearl Kogyo Kk | 放電プラズマ発生用高周波電源装置及び半導体製造装置 |
| JPH10130850A (ja) * | 1996-10-31 | 1998-05-19 | Kokusai Electric Co Ltd | 高周波電力発生装置、プラズマcvd装置及び高周波電力監視方法 |
| JP2000049000A (ja) * | 1998-07-31 | 2000-02-18 | Kem Kk | 周波数整合器 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011023356A (ja) * | 2010-07-29 | 2011-02-03 | Hitachi Kokusai Electric Inc | プラズマ処理装置及び基板処理方法 |
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