JP2009084654A - Wear-resistant film, and tool provided with same, and apparatus for manufacturing wear-resistant film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a wear-resistant film capable of exhibiting wear resistance even at a high temperature, a tool provided with the same, and an apparatus for manufacturing the film having the excellent wear resistance at a high temperature. <P>SOLUTION: The wear-resistant film is provided with a surface layer formed on a substrate and made into a metal nitride and the surface layer is provided thereon with the outermost surface layer coating the surface layer. The outermost surface layer is a multi-component oxide including at least Li solutionized with carbon and Al. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a wear-resistant coating, a tool provided with the same, and an apparatus for producing the wear-resistant coating.

  For example, gear cutting for machining gears is suitable for mass production and is excellent in terms of environment, and therefore dry cut processing that performs processing without using cutting oil is often used. In such dry cut processing, a surface of a high-speed tool steel with a TiAlN coating or an AlCrSiN coating is known so that the tool exhibits wear resistance even when the tool becomes hot due to processing heat. . However, even the tools with the above coating cannot sufficiently meet the high-speed requirements for further processing, and in high-speed processing, the coating is oxidized by the processing heat and fine dropout occurs, so there is a problem that the life is short. .

In order to further improve the wear resistance of cutting tools, an oxide ceramic coating with excellent wear resistance at higher temperatures is formed on the outermost surface of the TiAlN coating, etc., to prevent oxidation of the TiAlN coating, etc. , Has improved wear resistance. For example, Patent Document 1 discloses a tool in which an alumina film containing yttrium is formed on the outermost surface of a metal nitride film containing Ti as a main component by a CVD method.
JP 2004-1154 A

  However, even with a tool in which an alumina film is formed as the outermost layer as in Patent Document 1, the hardness and wear resistance of the alumina film are insufficient for use in high-speed machining. In addition, since alumina has poor lubricity, there is a problem that processing heat is easily generated by high-speed processing, and the tool becomes high temperature due to processing, the surface layer is oxidized, and the tool life is shortened.

  The present invention has been made in view of the above problems, and is a wear-resistant film that can exhibit wear resistance even at high temperatures, a tool including the same, and a film that has excellent wear resistance at high temperatures. An object of the present invention is to provide an apparatus for manufacturing the apparatus.

  In order to solve the above problems, an abrasion-resistant film according to the present invention is an abrasion-resistant film that is formed on a substrate and includes a surface layer that is a metal nitride, and the surface layer is formed on the surface layer. An outermost layer to be coated is provided, and the outermost layer is a composite oxide containing at least Li and Al in which carbon is dissolved.

  A composite oxide containing Li and Al has high hardness and oxidation resistance, and is formed on the outermost layer to improve the wear resistance of the coating and prevent peeling or cracking of the outermost layer. Moreover, lubricity is imparted to the outermost layer by dissolving carbon in the composite oxide, and frictional heat generated during processing is reduced. As a result, the oxidation of the surface layer can be prevented and the loss of the wear resistant film can be prevented.

  The wear-resistant film of the present invention is characterized in that carbon dissolved in the outermost layer is 0.1 to 10 at%.

  If the carbon dissolved in the outermost layer is less than 0.1 at%, sufficient lubricity cannot be exhibited. When the amount of carbon solid-solved in the outermost layer exceeds 10 at%, internal stress is generated in the outermost layer, and the outermost layer is cracked.

  Furthermore, the abrasion-resistant film of the present invention is characterized in that the outermost layer has a thickness of 0.5 to 2 μm. If the thickness of the outermost layer is 0.5 μm or more, the thickness is sufficient to prevent oxidation of the surface layer, and sufficient film strength that can withstand processing can be obtained, so that the outermost layer is less likely to crack. . On the other hand, when the thickness exceeds 2 μm, the internal stress of the outermost layer increases and fine cracks are generated in the outermost layer.

  In the wear resistant film of the present invention, the metal nitride is preferably any one selected from TiAlN, AlCrSiN, AlZrSiN, AlCrN, and TiN.

  Furthermore, in the wear resistant coating of the present invention, it is preferable that an intermediate layer of a CrN or TiN layer is provided between the base material and the surface layer. Thereby, the adhesive strength of a base material and a surface layer can be improved.

  Furthermore, the abrasion-resistant film of the present invention is preferably formed by a CVD method using an organometallic complex. Since the organometallic complex contains carbon, carbon can be easily dissolved in the composite oxide.

  In addition, the tool of the present invention is characterized in that the wear-resistant film described in any of the above is formed on the processed surface. Thereby, the tool excellent in abrasion resistance can be provided.

  Furthermore, the tool of the present invention is preferably used for dry cut processing in which cutting is performed without using cutting oil.

  In addition, a cutting device in which a cutting part such as a drill or a metal saw blade is formed using the tool of the present invention is excellent in wear resistance of the cutting part, and is suitable for dry cutting without using cutting oil. .

  An apparatus for forming an abrasion-resistant film according to the present invention includes at least a plurality of vaporizers for vaporizing the organometallic complex, the organometallic complex vaporized by the plurality of vaporizers, and an additive gas. A mixing tank for mixing, a nozzle for injecting the vaporized organometallic complex and the additive gas mixed in the mixing tank into a film forming furnace, and the vaporized gas injected from the nozzle A film-forming furnace for reacting the organometallic complex with the additive gas at atmospheric pressure to provide the outermost layer on the surface layer formed on the substrate is provided.

  Since the apparatus of the present invention includes a plurality of vaporizers, the amount of evaporation of each raw material can be reliably controlled even when the evaporation temperature of the composite oxide film raw material is different, and the composition control of the composite oxide film becomes easy. . In addition, since the vaporized raw material and the additive gas are mixed in the mixing tank and injected from the nozzle to the film forming furnace, the composition control of the composite oxide becomes easy, and the vaporized raw material and the additive gas can be mixed uniformly. A complex oxide having a uniform composition can be obtained. Further, since the apparatus of the present invention performs film formation at atmospheric pressure, an apparatus necessary for film formation in a vacuum such as a vacuum vessel or a vacuum pump can be omitted, and the apparatus cost is greatly reduced.

  According to the present invention, the organometallic complex is vaporized by the plurality of vaporizers, the vaporized organometallic complex and an additive gas are mixed in the mixing tank, and the vaporized organometallic complex is used. And the additive gas is injected into the film forming furnace from the nozzle, the vaporized organometallic complex and the additive gas are reacted at atmospheric pressure, and a composite containing at least Li and Al in which carbon is dissolved. There is provided a method for producing an abrasion-resistant film, wherein the outermost layer made of an oxide is provided on the surface layer formed on the substrate.

  As a result, a composite oxide film having a predetermined composition can be accurately formed. In addition, a suitable amount of carbon can be reliably added to the composite oxide. Furthermore, since film formation is performed at atmospheric pressure, it is not necessary to maintain the film formation furnace in vacuum during film formation. Therefore, since the time required for film formation can be greatly reduced as compared with vacuum film formation, the film formation cost is reduced.

  The apparatus for forming an abrasion-resistant film of the present invention includes at least a plurality of vaporizers for vaporizing the organometallic complex, the organometallic complex vaporized by the plurality of vaporizers, and an additive gas. And the vaporized organometallic complex injected from the nozzle and the additive gas are reacted at atmospheric pressure to form the nozzle formed on the substrate. And a film forming furnace for providing the outermost layer on a surface layer.

  Since the apparatus of the present invention includes a plurality of vaporizers, the composition of the composite oxide film can be controlled by controlling the evaporation amount of the raw material according to the target composition even when the evaporation temperatures of the raw materials of the composite oxide film are different. Easy to control. Since each raw material is mixed with an additive gas and injected from a nozzle to a film forming furnace, composition control can be performed with high accuracy, and a separate layer does not need to be separately provided, thereby simplifying the apparatus. In addition, since film formation is performed at atmospheric pressure, an apparatus necessary for film formation in a vacuum such as a vacuum vessel or a vacuum pump can be omitted, and the apparatus cost is greatly reduced.

  According to the present invention, using the above apparatus, the organometallic complex is vaporized by the plurality of vaporizers, the vaporized organometallic complex and an additive gas are injected from a nozzle into a film forming furnace, and the vaporized The outermost layer made of a complex oxide containing at least Li and Al in which carbon is solid-dissolved by reacting the organometallic complex and the additive gas at atmospheric pressure is formed on the surface layer formed on the substrate. A method for producing a wear-resistant film is provided.

  As a result, a composite oxide film having a predetermined composition can be formed with high accuracy. In addition, since film formation is performed at atmospheric pressure, it is not necessary to maintain a film formation furnace in vacuum during film formation, and the time required for film formation can be greatly reduced as compared to vacuum film formation. Can be reduced.

As described above, since the wear-resistant film of the present invention uses a composite oxide containing at least Li and Al having high hardness and excellent oxidation resistance as the outermost layer, it prevents cracking and peeling of the outermost layer. be able to. Further, since carbon is dissolved in the composite oxide, a film having excellent lubricity is obtained, and frictional heat generated during processing can be reduced. Therefore, it becomes a film excellent in abrasion resistance that prevents the surface layer from being lost due to oxidation, and sufficiently satisfies the high-speed processing requirements.
In addition, the apparatus for forming the film is excellent in composition controllability and composition uniformity, and is low in manufacturing cost. If the manufacturing apparatus of this invention is used, the abrasion-resistant film | membrane which has the complex oxide which controlled the composition with high precision can be manufactured at low cost.

Embodiments according to the present invention will be described below with reference to the drawings.
FIG. 1 shows a cross-sectional view of one embodiment when the abrasion-resistant film of the present invention is applied on a substrate. On the base material 10, the intermediate layer 11, the surface layer 12, and the outermost layer 13 are laminated in this order.

  The substrate 10 may be high speed tool steel (SKH), carbide tool steel, or the like.

  As the surface layer 12, a metal nitride is used. Specifically, it is any one selected from TiAlN, AlCrSiN, AlZrSiN, AlCrN, and TiN. The thickness of the surface layer 5 is preferably 3 to 5 μm. This surface layer exhibits wear resistance and provides a tool suitable for dry cutting.

The intermediate layer 11 includes a base layer and a composition gradient layer formed on the base layer.
As the underlayer, TiN or CrN is used in consideration of adhesion with the surface layer 12. For example, when TiAlN is used for the surface layer 12, TiN is preferably used as the underlayer, and when AlCrSiN is used for the surface layer 12, CrN is preferably used.
The composition gradient layer has a composition corresponding to the composition of the lower base layer and the upper surface layer. For example, when AlCrSiN is used for the surface layer 12 and CrN is used for the underlayer, the AlCrSiN and CrN are uniformly mixed. The composition ratio of the composition gradient layer is the ratio of the composition component of the underlayer to the composition component of the surface layer 12 and is adjusted in the range of 1: 5 to 5: 1.

  The outermost layer 13 is formed of a composite oxide containing at least Li and Al in which carbon is dissolved. For example, an oxide containing Li and Al, an oxide containing Li, Al, and Mg can be given. Such a complex oxide has high hardness, excellent oxidation resistance of about 1300 ° C. oxidation start temperature, and high wear resistance.

  As described above, a composite oxide containing at least Li and Al in which carbon is solid-dissolved has high hardness, excellent oxidation resistance and wear resistance, and exhibits good lubricity. Therefore, the outermost layer 13 is prevented from being cracked or peeled off, and the friction between the tool and the work piece is reduced to reduce the frictional heat generated during the processing to prevent the surface layer 12 from being oxidized and wear resistant. A film with excellent properties.

  The carbon dissolved in the outermost layer 12 is preferably 0.1 to 10 at%. If it is less than 0.1 at%, sufficient lubricity is not exhibited, and peeling of the outermost layer 13 occurs during processing. On the other hand, if it exceeds 10 at%, an internal stress is generated in the outermost layer 13 and the outermost layer 13 is cracked. More preferably, it is 0.1 to 3 at%.

  The thickness of the outermost layer 13 is preferably in the range of 0.5 to 2 μm. When the thickness is less than 0.5 μm, it is not possible to obtain a sufficient thickness to prevent the surface layer 12 from being oxidized, and the outermost layer 13 is sufficiently cracked during processing or when a large external force is applied. The film strength cannot be obtained. On the other hand, when the thickness exceeds 2 μm, the internal stress of the outermost layer 13 becomes large and fine cracks are likely to occur.

  Oxygen reaches the surface layer 12 from cracks and peeling that occurred in the outermost layer and causes the surface layer 12 to oxidize, so the ratio of carbon dissolved in the outermost layer and the thickness of the outermost layer are adjusted as described above. It is preferable to do.

  The complex oxide is preferably formed by a CVD method using an organometallic complex. Since the organometallic complex as a raw material contains carbon in the structure, carbon derived from the raw material remains in the film when the organometallic complex is oxidized to form an oxide film on the substrate. Therefore, the CVD method using an organometallic complex has an advantage that carbon can be easily dissolved in the composite oxide.

Next, a CVD apparatus for producing the wear resistant film of the present invention will be described.
2 includes a plurality of vaporizers 21a, 21b, and 21c, carrier gas supply devices 22a, 22b, and 22c connected to the plurality of vaporizers, a mixed layer 23, an injection nozzle 24, and a film formation. A furnace 25.

  The vaporizers 21a, 21b, and 21c evaporate and vaporize the organometallic complex that is the raw material of the outermost layer. In addition, although the apparatus 20 of FIG. 2 includes three vaporizers, it can include vaporizers corresponding to the number of evaporation raw materials to be used.

  Carrier gas supply devices 22a, 22b, and 22c are connected upstream of the vaporizers 21a, 21b, and 21c, respectively. The evaporated raw material is sent to the mixing tank 23 by the carrier gas supplied from the carrier gas supply devices 22a, 22b, and 22c.

  In the mixing tank 23, each vaporized raw material and the additive gas supplied from the additive gas supply device (not shown) are mixed.

  From the nozzle 24, a gas mixture of vaporized raw material and additive gas is injected into the film forming furnace 25. In the film forming furnace 25, a fixed base 31 on which a film forming object 26 such as a tool is disposed is installed. The fixed base 31 can be rotated by a motor 32. The fixed base 31 is moved in and out by a fixed base lifting mechanism (not shown) such as a hydraulic lifter installed under the motor 32. Carrier gas, excess vaporized raw material, additive gas, and the like are discharged out of the film forming furnace through the exhaust port 33.

The manufacturing method of the abrasion-resistant film using the CVD apparatus of FIG. 2 is as follows.
The intermediate layer 11 and the surface layer 12 are formed by subjecting the base material 10 to arc ion plating, high frequency sputtering, or the like.
For example, when a film is formed by arc type ion plating, a holder for holding the substrate 10 and a target provided at a position facing the holder are arranged in a vacuum vessel, and a direct current is provided between the holder and the target. A plasma is generated by applying a voltage, and then an arc discharge is generated by supplying nitrogen gas, thereby forming a film on the substrate 10. The type and number of targets are changed according to the composition of the intermediate layer 11 and the surface layer 12. For example, when CrN is formed as a base layer of the intermediate layer 11, pure chromium (Cr: 100%) is used as the target, and when AlCrSiN is formed as the surface layer 12, it is made of Al, Cr, Si. Use an alloy.

  On the surface layer 12 formed by the above method, the outermost layer 13 is formed by the atmospheric pressure CVD apparatus 20 shown in FIG. Hereinafter, a case where a LiMgAlO-based composite oxide is formed as the outermost layer 13 will be described as an example.

  The deposition target 26 is placed on the fixed base 31 and introduced into the deposition furnace 25. The inside of the film forming furnace is heated by a heater 30 arranged around the film forming furnace 25.

  The vaporizers 21a, 21b, and 21c are heated by a heater (not shown) to near the vaporization temperature of the organometallic complex. After the vaporizer temperature reaches the set value, the organometallic complex that is the raw material of the composite oxide film is put into the vaporizers 21a, 21b, and 21c. For example, the vaporizer 21a contains an organometallic complex containing Li such as lithium dipivaloylmethanate, t-butoxylithium, lithium acetylacetonate. The vaporizer 21b is charged with an organometallic complex containing Al such as aluminum acetylacetonate, aluminum isopropoxide, aluminum tridipivaloylmethanate. The vaporizer 21c is charged with an organometallic complex containing Mg such as magnesium bisacetylacetonate and magnesium bisdipivaloylmethanate.

Each vaporized raw material is conveyed to the mixing tank 23 by N ₂ gas or Ar gas as a carrier gas supplied from the carrier gas supply devices 22a, 22b, and 22c. By adjusting the temperature of the vaporizer and the flow rate of the carrier gas, a composite oxide in which Li, Al, and Mg have a predetermined molar ratio can be obtained. The carrier gas flow rate is controlled by flow meters 28a, 28b, 28c. Here, if the pipes 27a, 27b, and 27c are heated about 10 ° C. higher than the set temperature of each vaporizer, it is possible to prevent the raw material from condensing inside the pipes during the conveyance.

In the mixing tank 23, the vaporized raw material conveyed and the additive gas supplied from the additive gas supply device (not shown) are mixed. As the additive gas, O ₂ gas, water vapor, or air is used. The additive gas flow rate is adjusted by the flow meter 29 so that a predetermined oxygen molar ratio is obtained and a predetermined amount of carbon is contained in the composite oxide.

  The mixed vaporized raw material and additive gas are conveyed to the nozzle 24 and injected from the nozzle 24 into the film forming furnace 25. The source gas reacts with the additive gas in the film forming furnace 25, and a LiMgAlO-based composite oxide is formed on the surface of the film formation object 26. At this time, since all functional groups of the organometallic complex are decomposed and do not react with oxygen, carbon derived from the raw material remains in the composite oxide.

After film formation to a predetermined film thickness, supply of the source gas is stopped and film formation is completed. After cooling the inside of the furnace in an N ₂ gas atmosphere, the film formation target 26 is taken out from the film formation furnace 25.

Next, another CVD apparatus for producing the wear-resistant film of the present invention will be described.
3 includes a plurality of vaporizers 41a, 41b, and 41c, carrier gas supply devices 42a, 42b, and 42c connected to each of the plurality of vaporizers, a nozzle 44, and a film forming furnace 45. Compared with the CVD apparatus of FIG. 2, the CVD apparatus of FIG. 3 has no mixing tank, and is configured to mix the evaporated raw material with the additive gas between the nozzle and the vaporizer.

The manufacturing method of the abrasion-resistant film using the CVD apparatus of FIG. 3 is as follows.
The intermediate layer 11 and the surface layer 12 are formed on the substrate 10 by arc type ion plating in the same manner as in the above manufacturing method.

  On the surface layer 12 formed by the above method, the outermost layer 13 is formed by the atmospheric pressure CVD apparatus 40 shown in FIG. Hereinafter, the case where the outermost layer 13 is a LiMgAlO-based composite oxide will be described as an example.

  The vaporizers 41a, 41b, and 41c are heated to near the vaporization temperature of each organometallic complex by a heater (not shown). Thereafter, the organometallic complexes listed above are put into the vaporizers 41a, 41b, and 41c to vaporize the organometallic complexes.

Each vaporized raw material is conveyed to the nozzle 44 by N ₂ gas or Ar gas as a carrier gas supplied from the carrier gas supply devices 42a, 42b, 42c. By adjusting the temperature of the vaporizer and the flow rate of the carrier gas with the flow meters 48a, 48b, and 48c, a composite oxide in which Li, Mg, and Al have a predetermined molar ratio can be obtained. Here, the pipes 47a, 47b, 47c through which the raw material is conveyed from the vaporizers 41a, 41b, 41c to the nozzle 44 are heated to about 10 ° C. higher than the set temperature of each vaporizer, and the raw material is condensed inside the pipe. To prevent.

  Between the vaporizers 41a, 41b, and 41c and the nozzle 44, the additive gas supplied from the additive gas supply device (not shown) and the raw material vaporized in the vaporizers 41a, 41b, and 41c are mixed. The additive gas flow rate is adjusted by the flow meters 49a, 49b, and 49c so that a predetermined oxygen molar ratio is obtained and a predetermined amount of carbon is included in the composite oxide.

  The mixed vaporized raw material and additive gas are injected from the nozzle 44 into the film forming furnace 45. The vaporized raw material reacts with the additive gas in the film forming furnace, and a LiMgAlO-based composite oxide is formed on the surface of the film formation target 46. At this time, carbon derived from the raw material remains in the composite oxide.

After film formation to a predetermined film thickness, supply of the source gas is stopped and film formation is completed. After cooling the inside of the furnace in an N ₂ gas atmosphere, the film formation object 46 is taken out from the film formation furnace 45.

Example 1
On the high-speed tool steel (SKH51), TiN was deposited in a thickness of 1 μm using an arc ion plating apparatus, and then 4 μm of TiAlN was continuously formed using the apparatus. The film formation was performed at an N ₂ gas pressure of 2.7 Pa, a substrate temperature of 400 ° C., and a bias voltage of −40V.

Next, an outermost layer made of a composite oxide containing Li and Al was formed using the CVD apparatus shown in FIG.
[Film formation conditions]
Base material: TiAlN film formed on the surface of high-speed tool steel Size: 20 mm × 20 mm × 3 mm
Substrate temperature: 450 ° C
Film forming pressure: Atmospheric pressure film Raw material: Lithium dipivaloylmethanate (vaporizer 21a), aluminum acetylacetonate (vaporizer 21b)
Vaporizer temperature: 350 ° C. (vaporizer 21a), 230 ° C. (vaporizer 21b)
Carrier gas: Nitrogen gas (N ₂ )
Carrier gas flow rate: 2-50 L / min
Additive gas: Oxygen gas (O ₂ )
Additive gas flow rate: 0 to 10 L / min

[Deposition procedure]
(1) The substrate 10 on which the intermediate layer 11 and the surface layer 12 were formed was heated to 450 ° C. by the heater 30 in the film forming furnace 25 in an N ₂ gas atmosphere.
(2) The vaporizer 21a was heated to 350 ° C and the vaporizer 21b was heated to 230 ° C.
(3) The pipes 27a and 27b supplied with the gas were heated to the set temperature of the vaporizers 21a and 21b + 10 ° C., respectively.
(4) When the temperature of the substrate, the temperatures of the vaporizers 21a and 21b, and the temperature in the film forming furnace 25 reach the respective target temperatures, lithium dipivaloylmethanate is added to the vaporizer 21a and aluminum acetylacetate. put inert to the vaporizer 21b, as the composite oxide becomes a predetermined composition ratio, carrier gas supply unit 22a, from 22b to each vaporizer allowed to flow into predetermined flow rate of N ₂ gas.
(5) O ₂ gas was supplied to the mixing tank 23 at a flow rate at a predetermined composition ratio.
(6) A mixed gas of raw material gas and O ₂ gas was injected from the nozzle 24 into the film forming furnace, and carbon 1 at% solid solution LiAlO ₂ was formed on the substrate.
(7) After the LiAlO ₂ film was formed to 1 μm, the supply of the source gas was stopped. After the furnace was cooled to 200 ° C. in an N ₂ gas atmosphere, the substrate was taken out from the film formation container to obtain a substrate on which an abrasion-resistant film was formed.

(Example 2)
In the same manner as in Example 1, a 1 at% carbon solid solution LiAl _2.33 O ₄ film was formed.

(Example 3)
In the same manner as in Example 1, TiN and TiAlN were formed on high-speed tool steel.
Next, an outermost layer made of a composite oxide containing Li, Mg, and Al was formed using the CVD apparatus shown in FIG. In addition to the cases of Examples 1 and 2, the film forming conditions and the film forming procedure were such that the temperature of the vaporizer 21c was 140 ° C., magnesium bisacetylacetonate was vaporized as a film raw material in the vaporizer 21c, and carbon A 1 at% solid solution LiMg _0.25 Al _1.5 O ₃ film was formed to 1 μm.

Example 4
In the same manner as in Example 3, a 1 at% carbon solid solution LiMg _0.25 Al ₂ O ₄ film was formed.

The hardness of the abrasion-resistant films of Examples 1 to 4 was measured at 10 g for 10 seconds using a micro Vickers hardness meter.
The oxidation start temperature was obtained by forming TiAlN and a composite oxide film described in Examples 1 to 4 on a platinum plate having a size of 12 × 5 × 0.05 mm and using a differential thermal balance (TG-DTA). The temperature at which the weight increase due to oxidation and the exotherm began were analyzed and determined. The measurement conditions were a maximum heating temperature of 1400 ° C. and a temperature increase temperature of 10 ° C./min.

実施例１から４の複合酸化膜を最表層に形成した耐摩耗性皮膜は、３０００〜３６００Ｈｖと非常に高い硬度を有するので割れが発生しにくい。また、酸化開始温度が１３００℃前後と高温である。そのため、耐摩耗性に優れ、高速加工時に切削温度が上昇しても表層が酸化されて剥離が生じにくい皮膜となる。さらに、摩擦係数が０．２０〜０．２３と小さく、加工時に発生する摩擦熱が小さいので、高速加工を行っても皮膜の温度上昇を抑えることができ、表層の酸化を防止することができる。 Table 1 shows the hardness, oxidation start temperature, and coefficient of friction calculated by calculation of the wear-resistant coating formed with the composite oxide film described in Examples 1 to 4 as the outermost layer.

The wear-resistant film in which the composite oxide film of Examples 1 to 4 is formed on the outermost layer has a very high hardness of 3000 to 3600 Hv, so that it is difficult for cracks to occur. The oxidation start temperature is as high as around 1300 ° C. Therefore, it is excellent in wear resistance, and even if the cutting temperature rises during high-speed machining, the surface layer is oxidized and a film that does not easily peel off is obtained. Furthermore, since the friction coefficient is as small as 0.20 to 0.23 and the frictional heat generated during processing is small, the temperature rise of the film can be suppressed even when high-speed processing is performed, and oxidation of the surface layer can be prevented. .

  Therefore, the dry cut tool having the wear-resistant film of the present invention on the machined surface and the cutting apparatus using this dry-cut tool are less likely to crack or peel off the wear-resistant film even when used for high-speed machining. So the tool life is extended.

It is sectional drawing at the time of giving the abrasion-resistant film | membrane concerning one Embodiment of this invention on a base material. It is an apparatus for manufacturing the abrasion-resistant film of the present invention. It is another apparatus for manufacturing the abrasion-resistant film of the present invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Base material 11 Intermediate | middle layer 12 Surface layer 13 Outermost layer 20, 40 CVD apparatus 21, 41 Vaporizer 22, 42 Carrier gas supply apparatus 23 Mixing tank 24, 44 Injection nozzle 25, 45 Film-forming furnace 26, 46 Film-forming object 27 , 47 Piping 28, 29, 48, 49 Flow meter 30, 50 Heater 31, 51 Fixing base 32, 52 Motor
33,53 Exhaust port

Claims (13)

  A wear-resistant film formed on a substrate and having a surface layer formed of a metal nitride, the outermost layer coating the surface layer is provided on the surface layer, and the outermost layer is a solid solution of carbon. A wear-resistant film characterized by being a composite oxide containing at least Li and Al.   The wear-resistant film according to claim 1, wherein carbon dissolved in the outermost layer is 0.1 to 10 at%.   The abrasion-resistant film according to claim 1 or 2, wherein the outermost layer has a thickness of 0.5 to 2 µm.   The wear-resistant coating film according to any one of claims 1 to 3, wherein the metal nitride is any one selected from TiAlN, AlCrSiN, AlZrSiN, AlCrN, and TiN. .   The wear resistant film according to any one of claims 1 to 4, wherein an intermediate layer of a CrN or TiN layer is further provided between the base material and the surface layer.   6. The wear-resistant film according to claim 1, wherein the outermost layer is formed by a CVD method using an organometallic complex.   A tool characterized in that the wear-resistant coating according to any one of claims 1 to 6 is formed on a machined surface.   The tool according to claim 7, wherein the tool is used for dry cut processing in which cutting is performed without using cutting oil. A cutting device, wherein a cutting portion is configured using the cutting tool according to claim 7 or 8.   An apparatus for forming an abrasion-resistant film according to any one of claims 1 to 6, wherein at least a plurality of vaporizers for vaporizing the organometallic complex, and the plurality of vaporizers A mixing tank for mixing the organometallic complex vaporized by the vaporizer and the additive gas, and the vaporized organometallic complex and the additive gas mixed in the mixing tank are injected into the film forming furnace. For providing the outermost layer on the surface layer formed on the substrate by reacting the vaporized organometallic complex injected from the nozzle with the additive gas at atmospheric pressure. An apparatus comprising: a film forming furnace.   The apparatus according to claim 10, wherein the organometallic complex is vaporized by the plurality of vaporizers, the vaporized organometallic complex and an additive gas are mixed in the mixing tank, and the vaporized organometallic complex is mixed. And the additive gas is injected into the film forming furnace from the nozzle, the vaporized organometallic complex and the additive gas are reacted at atmospheric pressure, and a composite containing at least Li and Al in which carbon is dissolved. A method for producing an abrasion-resistant film, wherein the outermost layer made of an oxide is provided on the surface layer formed on the substrate.   An apparatus for forming an abrasion-resistant film according to any one of claims 1 to 6, wherein at least a plurality of vaporizers for vaporizing the organometallic complex, and the plurality of vaporizers A nozzle for injecting the vaporized organometallic complex and the additive gas into the film forming furnace with a vaporizer, and the vaporized organometallic complex and the additive gas injected from the nozzle at atmospheric pressure. An apparatus comprising: a film-forming furnace for reacting and providing the outermost layer on the surface layer formed on the substrate.   The apparatus according to claim 12, wherein the organometallic complex is vaporized by the plurality of vaporizers, the vaporized organometallic complex and an additive gas are injected from a nozzle into a film forming furnace, and the vaporized The outermost layer made of a complex oxide containing at least Li and Al in which carbon is solid-dissolved by reacting the organometallic complex and the additive gas at atmospheric pressure is formed on the surface layer formed on the substrate. A method for producing a wear-resistant coating, comprising:

Images