JP2009076583A - Stage apparatus, exposure apparatus, exposure method, and device manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a stage system which can suppress the reduction of performance. <P>SOLUTION: The stage system arranged within a chamber includes: a plate member; a movable member that is movable on the upper surface side of the plate member; a supporting section that supports the plate member at three positions; and a stopper device that is provided at the installation section within the chamber opposite to the lower surface of the plate member and includes an opposite section that can touch at least two positions of the lower surface of the plate member. The opposite section in the direction crossing the lower surface varies in position depending on a pressure inside the chamber. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a stage apparatus, an exposure apparatus, an exposure method, and a device manufacturing method.

An exposure apparatus used in the photolithography process includes a stage apparatus that holds a predetermined member movably with respect to exposure light. The stage apparatus of the exposure apparatus includes at least one of a mask stage that holds a mask on which a pattern is formed with respect to exposure light, and a substrate stage that holds a photosensitive substrate so as to be movable. The stage apparatus includes a plate member such as a stage base and a movable member that moves on the plate member. The exposure apparatus also has an environment control device called a chamber, for example, and controls the environment of the space where the exposure light travels. The following patent document discloses an example of a technique related to a stage device disposed inside a chamber.
US Patent Application Publication No. 2003/0058426 JP 2004-335510 A

  For example, the plate member may be deformed in accordance with the movement of the movable member. In that case, there is a possibility that the performance of the stage apparatus is deteriorated, for example, an operation failure occurs in the movable member. As a result, an exposure failure may occur on the substrate exposed using the stage apparatus, or a defective device may occur.

  An object of this invention is to provide the stage apparatus which can suppress the fall of performance. It is another object of the present invention to provide an exposure apparatus and an exposure method that can suppress the occurrence of exposure failure. Moreover, an object of this invention is to provide the device manufacturing method which can suppress generation | occurrence | production of a defective device.

  According to the first aspect of the present invention, the stage device is disposed inside the chamber, and includes a plate member, a movable member movable on the upper surface side of the plate member, and a support that supports the plate member at three locations. And a stopper device that is provided in an installation portion inside the chamber facing the lower surface of the plate member and has a facing portion that can contact at least two places on the lower surface of the plate member, and according to the pressure inside the chamber Thus, a stage apparatus is provided in which the position of the facing portion in the direction intersecting the lower surface changes.

  According to the second aspect of the present invention, the stage device is disposed inside the chamber, and includes a plate member, a movable member movable on the upper surface side of the plate member, and a support that supports the plate member at three locations. And a stopper device that is provided at an installation portion inside the chamber facing the lower surface of the plate member and is capable of contacting at least two locations on the lower surface of the plate member in order to suppress deformation of the plate member. Is arranged between an elastic member having an internal space of a predetermined pressure that expands and contracts in a direction intersecting the lower surface of the plate member according to the pressure inside the chamber, and the lower surface of the plate member and the upper end of the elastic member, There is provided a stage device having an opposing member that moves in accordance with the expansion and contraction of the expansion and contraction member and can contact the lower surface of the plate member.

  According to a third aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with exposure light, which includes the stage apparatus of the above aspect.

  According to a fourth aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus of the above aspect and developing the exposed substrate.

  According to a fifth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light, wherein a plate member and a movable member movable on the upper surface side of the plate member are disposed inside the chamber. Supporting at least two first parts provided on the plate member, and at least two second parts provided on the lower surface of the plate member on the installation surface inside the chamber facing the lower surface of the plate member A plurality of stopper devices each having a facing portion that can come into contact with each other, adjusting the pressure inside the chamber, and the position of the facing portion in the direction intersecting the lower surface according to the pressure inside the chamber An exposure method is provided that includes changing the plate member to suppress deformation and exposing the substrate with exposure light using a movable member.

  According to a sixth aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure method of the above aspect and developing the exposed substrate.

  According to the present invention, it is possible to suppress a decrease in performance of the stage apparatus. In addition, according to the present invention, it is possible to suppress the occurrence of defective exposure and suppress the generation of defective devices.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. The predetermined direction in the horizontal plane is the X-axis direction, the direction orthogonal to the X-axis direction in the horizontal plane is the Y-axis direction, and the direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, the vertical direction) is the Z-axis direction. To do. In addition, the rotation (inclination) directions around the X, Y, and Z axes are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an exposure apparatus EX according to the first embodiment. In the present embodiment, a case where the exposure apparatus EX is an EUV exposure apparatus that exposes the substrate P with extreme ultra-violet (EUV) light will be described as an example. Extreme ultraviolet light is an electromagnetic wave in a soft X-ray region having a wavelength of about 5 to 50 nm, for example. In the following description, extreme ultraviolet light is appropriately referred to as EUV light. As an example, in the present embodiment, EUV light having a wavelength of 13.5 nm is used as the exposure light EL.

  In FIG. 1, an exposure apparatus EX illuminates a mask stage 1 movable while holding a mask M on which a pattern is formed, a substrate stage 2 movable while holding a substrate P, and the mask M with exposure light EL. An illumination optical system IL, a projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, and a control device 4 that controls the operation of the entire exposure apparatus EX. The substrate P includes a substrate in which a film such as a photosensitive material (resist) is formed on the surface of a base material such as a semiconductor wafer. The mask M includes a reticle on which a device pattern projected onto the substrate P is formed.

  In the present embodiment, the mask M is a reflective mask having a multilayer film capable of reflecting EUV light. The exposure apparatus EX illuminates the surface (reflection surface) of the mask M, on which the pattern is formed of the multilayer film, with the exposure light EL (EUV light), and the substrate P having photosensitivity with the exposure light EL reflected by the mask M. Exposure.

  The exposure apparatus EX of the present embodiment includes a chamber apparatus 6 that can set the space 5 in which the exposure light EL travels to an environment in a predetermined state. The chamber device 6 includes a chamber member 7 that forms a space 5 in which the exposure light EL travels, and an adjustment device 8 that adjusts the environment of the space 5. The space 5 is a space inside the chamber member 7. In the present embodiment, the chamber member 7 is supported by a support mechanism 7S provided on the floor F of the clean room, for example. The support mechanism 7S includes a vibration isolation unit. In the present embodiment, the shape of the chamber member 7 in the XY plane is substantially quadrangular, and the support mechanism 7S supports the four corners of the bottom surface of the chamber member 7.

The adjusting device 8 can adjust the pressure inside the chamber member 7, that is, the pressure in the space 5. In the present embodiment, the adjustment device 8 includes a vacuum system and can adjust the space 5 to a substantially vacuum state. The control device 4 can adjust the space 5 to a substantially vacuum state by adjusting the pressure inside the chamber member 7 at a predetermined timing using the adjusting device 8. As an example, in the present embodiment, the pressure in the space 5 is adjusted to a reduced pressure atmosphere of about 1 × 10 ⁻⁴ [Pa].

  In the following description, the space 5 inside the chamber member 7 is appropriately referred to as a chamber space 5. In the present embodiment, at least a part of the illumination optical system IL, the mask stage 1, the projection optical system PL, and the substrate stage 2 are disposed in the chamber space 5 inside the chamber member 7.

  The illumination optical system IL illuminates the mask M with exposure light EL from a light source device (not shown). The light source device is a so-called LPP (Laser Produced Prasma) type light source device that irradiates a target material such as xenon (Xe) with a laser beam, converts the target material into plasma, and generates EUV light. Including equipment. The light source device may be a discharge generated plasma light source device that generates EUV light by generating a discharge in a predetermined gas and plasmaating the predetermined gas, that is, a so-called DPP (Discharge Produced Prasma) type light source device. EUV light (exposure light EL) generated by the light source device enters the illumination optical system IL.

  The illumination optical system IL includes a plurality of optical elements, and illuminates a predetermined illumination area on the mask M with the exposure light EL having a uniform illuminance distribution. The optical element of the illumination optical system IL includes a multilayer film reflecting mirror including a multilayer film capable of reflecting EUV light. The multilayer film of the optical element includes, for example, a Mo / Si multilayer film.

  The mask stage 1 includes a stage main body 9 and a table 10 that is movable with respect to the stage main body 9 while holding the mask M. The table 10 is disposed on the −Z side of the stage body 9. The stage main body 9 is movable in three directions including the X axis, the Y axis, and the θZ direction. The table 10 is movable in six directions including the X-axis, Y-axis, Z-axis, θX, θY, and θZ directions while holding the mask M.

  In the present embodiment, the mask stage 1 holds the mask M so that the reflective surface of the mask M faces the −Z side. In the present embodiment, the mask stage 1 holds the mask M so that the reflective surface of the mask M and the XY plane are substantially parallel. The exposure light EL emitted from the illumination optical system IL is applied to the reflective surface of the mask M held on the mask stage 1.

  The mask stage 1 is moved by the operation of the mask stage driving device 3. The mask stage driving device 3 includes a coarse motion actuator unit 3A including a linear motor that can move the stage main body 9, and a fine motion actuator including a voice coil motor, for example, that can move the table 10 relative to the stage main body 9. Unit 3B. In this embodiment, an interferometer system (not shown) having a laser interferometer capable of measuring position information of the mask stage 1 (mask M) and focus leveling detection capable of detecting surface position information of the reflecting surface of the mask M A system (not shown) is provided. The control device 4 operates the mask stage driving device 3 based on the measurement result of the interferometer system and the detection result of the focus / leveling detection system, and controls the position of the mask M held on the mask stage 1.

  Projection optical system PL includes a plurality of optical elements, and projects an image of the pattern of mask M onto substrate P at a predetermined projection magnification. The optical element of the projection optical system PL includes a multilayer reflector having a multilayer film capable of reflecting EUV light. The multilayer film of the optical element includes, for example, a Mo / Si multilayer film.

  Next, the substrate stage 2 will be described with reference to FIGS. FIG. 2 is a perspective view showing an example of the substrate stage 2 according to the present embodiment.

  1 and 2, the substrate stage 2 includes a plate member 14 having an upper surface 14A and a lower surface 14B. The upper surface 14A of the plate member 14 is a surface facing the + Z side, and the lower surface 14B is a surface facing the −Z side. In the present embodiment, the upper surface 14A and the lower surface 14B of the plate member 14 are substantially parallel to the XY plane.

  The substrate stage 2 includes a first stage body 11 that can move on the upper surface 14A side (+ Z side) of the plate member 14, a second stage body 12 that can move on the upper surface 14A side of the plate member 14, and a plate member 14. On the upper surface 14A side, the table 13 that can be moved while holding the substrate P, the support portion 15 that supports the lower surface 14B of the plate member 14 at three locations, and the lower surface 14B of the plate member 14 can be contacted at two locations. And a stopper device 18 having a facing portion 17. The support portion 15 and the stopper device 18 are provided in the installation portion 19 inside the chamber member 7 facing the lower surface 14B of the plate member 14. In the present embodiment, the installation part 19 includes a substantially flat surface provided inside the chamber member 7.

  In the present embodiment, the substrate stage 2 holds the substrate P so that the surface (exposure surface) of the substrate P faces the + Z side. In the present embodiment, the substrate stage 2 holds the substrate P so that the surface of the substrate P and the XY plane are substantially parallel. The exposure light EL emitted from the projection optical system PL is irradiated on the surface of the substrate P held on the substrate stage 2.

  The substrate stage 2 includes a substrate stage driving device 20 that can move the first stage body 11, the second stage body 12, and the table 13. The substrate stage driving device 20 includes a first actuator unit 21 that includes a linear motor that can move the first stage main body 11, and a second actuator unit 22 that includes, for example, a linear motor that can move the second stage main body 12. The third actuator unit 23 including a voice coil motor or the like that can move the table 13 is included.

  The first stage main body 11 is movable in the Y axis direction. In the present embodiment, two first stage main bodies 11 are provided. In order for the first stage body 11 to move in the Y-axis direction, a first guide member 24 for guiding the movement of the first stage body 11 in the Y-axis direction is provided on the upper surface 14A of the plate member 14. The first guide member 24 is long in the Y-axis direction. Both ends of the first guide member 24 are supported by the support member 25. The support member 25 supports the first guide member 24 so that the first guide member 24 and the plate member 14 are separated from each other. Each end of the first guide member 24 is fixed to the support member 25. The support member 25 is fixed to the plate member 14. The first guide member 24 is fixed to a support member 25 fixed to the plate member 14.

  Two first guide members 24 are provided so as to correspond to the two first stage bodies 11. On the upper surface 14A of the plate member 14, each of the two first guide members 24 is disposed along the Y-axis direction. Further, on the upper surface 14A of the plate member 14, the two first guide members 24 are arranged at a predetermined distance in the X-axis direction.

  The first actuator unit 21 includes a linear motor stator 21 </ b> S disposed on the first guide member 24 and a linear motor mover 21 </ b> M disposed on the first stage body 11.

  In the present embodiment, the first stage main body 11 has an opening 26 in which the first guide member 24 is disposed. The first stage body 11 is disposed around the first guide member 24. The first stage body 11 has an inner surface facing the outer surface of the first guide member 24 inside the opening 26.

  The stator 21S is disposed on the outer surface of the first guide member 24 or in the vicinity thereof. The mover 21M is disposed on the inner surface of the first stage main body 11 or in the vicinity thereof. The first stage main body 11 is movable in the Y-axis direction while being guided by the first guide member 24 by the operation of the first actuator unit 21 including the stator 21S and the movable element 21M.

  In the present embodiment, the stator 21S of the first actuator unit 21 includes a coil, and the mover 21M includes a magnet. That is, the first actuator unit 21 of the present embodiment includes a so-called moving magnet type linear motor. The first actuator unit 21 may be a so-called moving coil type linear motor in which the stator 21S includes a magnet and the mover 21M includes a coil.

  In the present embodiment, the substrate stage 2 includes a gas bearing 27 disposed between the inner surface of the first stage body 11 and the outer surface of the first guide member 24. By the operation of the gas bearing 27, the first stage main body 11 (movable element 21M) is supported in a non-contact manner with respect to the first guide member 24 (stator 21S).

  FIG. 3 is a cross-sectional view of the first stage body 11 and the first guide member 24. As shown in FIG. 3, the substrate stage 2 includes a gas bearing 27 that brings the first stage body 11 and the first guide member 24 into a non-contact state. The gas bearing 27 of this embodiment is a differential exhaust type. The gas bearing 27 of the present embodiment is disposed on the inner surface of the first stage main body 11, and an air supply port 28 that supplies gas between the inner surface of the first stage main body 11 and the first guide member 24, and an air supply port 28 is disposed at a predetermined position on the inner surface of the first stage main body 11, and is disposed at a predetermined position on the inner surface of the first stage main body 11 with respect to the exhaust port 29 for discharging gas, and the air supply port 28 and the exhaust port 29. And a first suction port 30 and a second suction port 31 for sucking gas. In the present embodiment, the air supply port 28 is on one side with respect to the center of the first stage body 11 in the Y axis direction so as to supply gas to at least two locations on the outer surface of the first guide member 24 in the Y axis direction. It is arranged at a predetermined position on the inner surface of the first stage body 11 on each of the (+ Y side) and the other side (−Y side).

  The exhaust port 29 is disposed outside the air supply port 28 with respect to the center of the first stage body 11 in the Y-axis direction. Specifically, the exhaust port 29 is located between the + Y side air supply port 28 and the + Y side end of the first stage main body 11 with respect to the center of the first stage main body 11 in the Y-axis direction, and −Y. The air supply port 28 on the side and the end portion on the −Y side of the first stage main body 11 are disposed respectively. The exhaust port 29 is disposed near the air supply port 28. In the present embodiment, the exhaust port 29 is connected to the atmospheric space outside the chamber member 7 via an exhaust pipe (not shown). That is, in the present embodiment, the exhaust port 29 is open to the atmosphere. The gas between the inner surface of the first stage body 11 and the outer surface of the first guide member 24 is discharged from the exhaust port 29 to the outside of the chamber member 7 through an exhaust pipe (not shown).

  The first suction port 30 is disposed outside the exhaust port 29 with respect to the center of the first stage main body 11 in the Y-axis direction. Specifically, the first suction port 30 is between the + Y side exhaust port 29 and the + Y side end of the first stage body 11 with respect to the center of the first stage body 11 in the Y-axis direction, and − The Y-side exhaust port 29 and the -Y side end of the first stage main body 11 are disposed respectively. In the present embodiment, the first suction port 30 is connected to a suction device including a vacuum system via a suction pipe (not shown). The suction device can suck the gas between the inner surface of the first stage body 11 and the outer surface of the first guide member 24 via the first suction port 30.

  The second suction port 31 is disposed outside the first suction port 30 with respect to the center of the first stage body 11 in the Y-axis direction. Specifically, the second suction port 31 is between the + Y side first suction port 30 and the + Y side end of the first stage body 11 with respect to the center of the first stage body 11 with respect to the Y-axis direction. And the first suction port 30 on the -Y side and the -Y side end of the first stage main body 11. In the present embodiment, the second suction port 31 is connected to a suction device including a vacuum system via a suction tube (not shown). The suction device can suck the gas between the inner surface of the first stage body 11 and the outer surface of the first guide member 24 via the second suction port 31.

  In order to form a predetermined gap between the inner surface of the first stage main body 11 and the outer surface of the first guide member 24, the gas bearing 27 is connected to the inner surface of the first stage main body 11 and the first guide member from the air supply port 28. A gas is supplied between 24 and the outer surface. At least a part of the gas supplied from the air supply port 28 between the inner surface of the first stage main body 11 and the outer surface of the first guide member 24 is discharged from the exhaust port 29. As a result, a predetermined gap is formed between the inner surface of the first stage body 11 and the outer surface of the first guide member 24, and the first stage body 11 is supported in a non-contact manner with respect to the first guide member 24. The Further, the gas bearing 27 sucks gas from the first suction port 30 and the second suction port 31, so that, for example, the gas between the inner surface of the first stage body 11 and the outer surface of the first guide member 24 is Outflow from the space between the inner surface of the first stage body 11 and the outer surface of the first guide member 24 to the outer space (that is, the chamber space 5) can be suppressed. That is, the suction operation using the first suction port 30 and the second suction port 31 suppresses the gas supplied from the air supply port 28 of the gas bearing 27 from flowing into the chamber space 5, and the vacuum of the chamber space 5. State is maintained.

  Returning to FIG. 1 and FIG. 2, the second stage main body 12 is movable in the X-axis direction. In the present embodiment, in order for the second stage main body 12 to move in the X-axis direction, a second guide member 32 that guides the movement of the second stage main body 12 in the X-axis direction is provided. The second guide member 32 is long in the X-axis direction. Both ends of the second guide member 32 are connected to the first stage body 11.

  The second actuator unit 22 includes a linear motor stator 22 </ b> S disposed on the second guide member 32 and a linear motor mover 22 </ b> M disposed on the second stage body 12.

  In the present embodiment, the second stage main body 12 has an opening 33 in which the second guide member 32 is disposed. The second stage body 12 is disposed around the second guide member 32. The second stage body 12 has an inner surface facing the outer surface of the second guide member 32 inside the opening 32.

  The stator 22S is disposed on the outer surface of the second guide member 32 or in the vicinity thereof. The mover 22M is disposed on the inner surface of the second stage main body 12 or in the vicinity thereof. The second stage main body 12 is movable in the X-axis direction while being guided by the second guide member 32 by the operation of the second actuator unit 22 including the stator 22S and the mover 22M.

  In the present embodiment, the stator 22S of the second actuator unit 22 includes a coil, and the mover 22M includes a magnet. That is, the second actuator unit 22 of the present embodiment includes a so-called moving magnet type linear motor. The second actuator unit 22 may be a so-called moving coil type linear motor in which the stator 22S includes a magnet and the mover 22M includes a coil.

  In this embodiment, the substrate stage 2 includes a gas bearing 34 disposed between the inner surface of the second stage body 12 and the outer surface of the second guide member 32. By the operation of the gas bearing 34, the second stage main body 12 (movable element 22M) is supported in a non-contact manner with respect to the second guide member 32 (stator 22S).

  The gas bearing 34 disposed between the inner surface of the second stage main body 12 and the outer surface of the second guide member 32 has the inner surface of the first stage main body 11 and the first guide member 24 described with reference to FIG. It has the same configuration as the gas bearing 27 arranged between the outer surface. A description of the gas bearing 34 is omitted.

  The table 13 is mounted on the second stage body 12. The table 13 is movable in the six directions of the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the third actuator unit 23 while holding the substrate P. The third actuator unit 23 includes a voice coil motor disposed between the second stage body 12 and the table 13.

  When the first stage main body 11 is moved in the Y-axis direction by the operation of the first actuator unit 21, the second guide member 32 and the second stage main body 12 connected to the first stage main body 11 are also connected to the first stage main body. 11 and move in the Y-axis direction. Further, by making the movement amount of one of the two first stage bodies 11 different from the movement amount of the other, the second guide member 32 and the second stage body 12 move (rotate) in the θZ direction. Further, the second stage body 12 moves in the X-axis direction by the operation of the second actuator unit 22. That is, the second stage main body 12 is movable in the X axis, Y axis, and θZ directions by the operation of the first and second actuator units 21 and 22. Further, the table 13 is movable on the second stage main body 12 in six directions of X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the third actuator unit 23.

  In the present embodiment, an interferometer system (not shown) having a laser interferometer capable of measuring position information of the substrate stage 2 (substrate P) and a focus / leveling detection system capable of detecting surface position information of the surface of the substrate P (Not shown) is provided. The control device 4 operates the substrate stage driving device 20 based on the measurement result of the laser interferometer and the detection result of the focus / leveling detection system, and controls the position of the substrate P held on the substrate stage 2.

  The support part 15 supports the plate member 14 at three places. In the present embodiment, the support portion 15 supports three first portions B1 provided on the lower surface 14B of the plate member 14, respectively. The support part 15 includes a spherical bearing. In this embodiment, the spherical bearing is a contact-type spherical bearing, but may be a differential exhaust type non-contact-type spherical bearing. The support portions 15 are arranged at three locations inside the chamber member 7, and the plate member 14 is supported at three points by the support portions 15. That is, in the present embodiment, the support portion 15 constructs a three-point support structure that supports the plate member 14 at three points.

  The stopper device 18 has opposing portions 17 that can be contacted at two places on the lower surface 14B of the plate member 14. In the present embodiment, the stopper device 18 can contact the two second portions B2 provided on the lower surface 14B of the plate member 14 and the facing portion 17 respectively. The stopper device 18 brings the two portions of the lower surface 14 </ b> B of the plate member 14 into contact with the facing portion 17 in order to suppress deformation of the plate member 14.

  In the present embodiment, the position of the facing portion 17 in the Z-axis direction changes according to the pressure inside the chamber member 7. In the present embodiment, the stopper device 18 changes the position of the facing portion 17 with respect to the Z-axis direction in order to suppress deformation of the plate member 14, so that the two portions of the lower surface 14 </ b> B of the plate member 14 and the facing portion 17 are connected. Make contact.

  The deformation of the plate member 14 includes a decrease in flatness of the upper surface 14A of the plate member 14. The decrease in flatness of the upper surface 14A of the plate member 14 includes inclination, distortion, and the like of the upper surface 14A of the plate member 14. The stopper device 18 changes the position of the facing portion 17 in the Z-axis direction so that the upper surface 14A of the plate member 14 is substantially horizontal, that is, the upper surface 14A and the XY plane are substantially parallel.

  FIG. 4 is a side sectional view showing an example of the stopper device 18 according to the present embodiment. In FIG. 4, the stopper device 18 is connected to a bellows member 36 having an internal space 35 of a predetermined pressure that can be elastically deformed at least in the Z-axis direction, and an upper end (+ Z side end) of the bellows member 36. A first member 37 having a facing portion 17 that can contact the lower surface 14B of the first member 37 and a second member 38 connected to a lower end (end on the −Z side) of the bellows member 36.

  In the present embodiment, the bellows member 36 is made of stainless steel. Stainless steel has less outgassing. Therefore, the influence which the bellows member 36 has on the chamber space 5 can be suppressed. In the present embodiment, the first member 37 and the second member 38 are also made of stainless steel.

  The first member 37 is disposed between the lower surface 14 </ b> B of the plate member 14 and the upper end of the bellows member 36. The second member 38 is disposed between the lower end of the bellows member 36 and the installation portion 19 and supports the bellows member 36. In the present embodiment, the first member 37 has a convex portion 39 that protrudes toward the + Z side and has a curved surface. In the present embodiment, the facing portion 17 that can contact the lower surface 14 </ b> B of the plate member 14 includes the surface (curved surface) of the convex portion 39. The facing portion 17 can make point contact with the lower surface 14B of the plate member 14.

  In the present embodiment, the internal space 35 of the bellows member 36 is substantially sealed. In the present embodiment, the bellows member 36 expands and contracts in the Z-axis direction according to the pressure inside the chamber member 7. FIG. 4A shows a state where the bellows member 36 is contracted. FIG. 4B shows a state in which the bellows member 36 is extended. In the present embodiment, the second member 38 is provided in the installation portion 19, and the first member 37 moves in the Z-axis direction according to the expansion and contraction of the bellows member 36.

The pressure inside the chamber member 7 (pressure in the chamber space 5) is adjusted by the adjusting device 8 to a reduced pressure atmosphere of about 1 × 10 ⁻⁴ [Pa], for example, at a predetermined timing. In other words, the pressure inside the chamber member 7 is adjusted to be lower than the outside pressure (pressure in the clean room) at a predetermined timing. In the present embodiment, the pressure in the inner space 35 of the bellows member 36 is higher than the pressure inside the chamber member 7 (pressure in the chamber space 5). That is, in a state where at least the pressure inside the chamber member 7 is adjusted to be lower than the pressure outside, the pressure in the internal space 35 of the bellows member 36 is the pressure inside the chamber member 7 (pressure in the chamber space 5). It is adjusted in advance so as to be higher. In the present embodiment, the pressure in the inner space 35 of the bellows member 36 is, for example, substantially the same as the pressure outside the chamber member 7 (pressure in the clean room). In the present embodiment, the pressure in the internal space 35 of the bellows member 36 (pressure outside the chamber member 7) is substantially atmospheric pressure.

  For example, when the pressure inside the chamber member 7 is decreased by the operation of the adjusting device 8, the bellows member 36 is moved to Z according to the decrease in the pressure inside the chamber member 7 as shown in FIG. Extends in the axial direction. Thereby, the opposing part 17 of the 1st member 37 moves along the Z-axis direction toward the direction of the lower surface 14B of the plate member 14. FIG. In other words, as the pressure inside the chamber member 7 (pressure in the chamber space 5) decreases, the bellows member 36 extends and the facing portion 17 moves so as to approach the lower surface 14B of the plate member 14.

  In the present embodiment, the first member 37 is larger than the bellows member 36 in the XY plane. Further, the second member 38 is larger than the bellows member 36 in the XY plane. The second member 38 has an upper surface 38A that can come into contact with the lower surface 37A disposed in a part of the first member 37, and can support the first member 37 by bringing the upper surface 38A and the lower surface 37A into contact with each other. . As shown in FIG. 4A, the second member 38 supports the first member 37 when the bellows member 36 contracts in the Z-axis direction and the first member 37 moves in the −Z direction. it can. Moreover, the 2nd member 38 can regulate the shrinkage | contraction of the bellows member 36 by making the upper surface 38A and the lower surface 37A contact.

  FIG. 5 is a schematic diagram for explaining the positional relationship among the support portion 15, the facing portion 17 of the stopper device 18, the plate member 14, and the substrate stage driving device 20. As described above, the support portion 15 constructs a three-point support structure. In the present embodiment, the first portion B1 of the lower surface 14B of the plate member 14 supported by the support portion 15 is provided around the center of gravity G of the plate member 14 in the XY plane. In addition, the shape of the plate member 14 in the XY plane is substantially quadrangular, and + X of the two sides (+ X side side, −X side side) of the plate member 14 that is long in the Y-axis direction in the XY plane. Two first parts B1 are arranged in the Y-axis direction in the vicinity of the side on the side, and one first part B2 is arranged almost in the center in the Y-axis direction in the vicinity of the side on the -X side. .

  In this embodiment, when the lower surface 14B of the plate member 14 is divided into a first region AR1 including one first portion B1 and a second region AR2 including the remaining two portions by a virtual line VL, the stopper device The positional relationship among the plate member 14, the support portion 15, and the stopper device 18 is adjusted so that two second portions B <b> 2 that can come into contact with the 18 opposing portions 17 are arranged in the first region AR <b> 1. The virtual line VL passes through the center of gravity G of the plate member 14 and is substantially parallel to the Y axis.

  In the present embodiment, the two first parts B1 arranged in the second region AR2 and the two second parts B2 arranged in the first region AR1 are substantially line symmetric with respect to the virtual line VL. It is.

  In the present embodiment, in the first region AR1, the plate member 14, the support portion 15, and the stopper device are arranged such that one first portion B1 and two second portions B2 are arranged on a substantially straight line SL1. The positional relationship with 18 is adjusted. The straight line SL1 is substantially parallel to the Y axis.

  In this embodiment, on the upper surface 14A side of the plate member 14, the plate member 14, the support portion 15, the stopper device 18, and the substrate stage driving device 20 are arranged so that the first stage main body 11 moves along the straight line SL1. The positional relationship with the (first guide member 24) is adjusted. That is, the plate member 14 is provided with a first guide member 24 for the first stage main body 11 to move along the straight line SL <b> 1, and the first stage main body 11 is guided by the first guide member 24. And move along the straight line SL1.

  In the present embodiment, the positional relationship between the plate member 14 and the support portion 15 is adjusted so that the two first portions B1 are aligned on the straight line SL2 substantially parallel to the Y axis in the second region AR2. Has been.

  Next, an example of the operation of the exposure apparatus EX having the above-described configuration will be described.

  Inside the chamber member 7, a plate member 14, a first stage main body 11, a second stage main body 12, a table 13, and the like that are movable on the upper surface 14 </ b> A side of the plate member 14 are disposed, and provided on the plate member 14. Each of the three first portions B1 is supported by the support portion 15. The support portion 15 is provided in the installation portion 19 inside the chamber member 7.

  Further, the stopper device having the facing portion 17 at a predetermined position of the installation portion 19 inside the chamber member 17 so that each of the two second portions B2 provided on the plate member 14 can come into contact with the facing portion 17. 18 is arranged. The internal space 35 of the bellows member 36 of the stopper device 18 is adjusted to atmospheric pressure and is almost sealed.

  FIG. 6 is a schematic diagram showing a state in the vicinity of the substrate stage 2 when the pressure inside the chamber member 7 (pressure in the chamber space 5) is almost atmospheric pressure. As shown in FIG. 6, when the pressure in the chamber space 5 is atmospheric pressure, the pressure inside the chamber member 7 and the pressure outside the chamber member 7 are almost the same, and are caused by the pressure difference between the inside and outside of the chamber member 7. It is considered that the deformation of the chamber member 7 does not occur. Moreover, it is thought that the installation part 19 inside the chamber member 7 does not deform. When the pressure inside the chamber member 7 (pressure in the chamber space 5) is substantially atmospheric pressure, the second portion of the lower surface 14B of the plate member 14 that supports the first portion B1 by the support portion 15 (supports three points). The part B2 and the facing part 17 of the stopper device 18 are in contact with each other with a predetermined force. The predetermined force acting between the second portion B2 of the lower surface 14B of the plate member 14 and the facing portion 17 of the stopper device 18 can suppress the deformation of the plate member 14, and the upper surface 14A of the plate member 14 is substantially deformed. It is a force that can be leveled and a small force.

  In the present embodiment, when the pressure in the chamber space 5 is substantially atmospheric pressure, the second portion B2 of the lower surface 14B of the plate member 14 that supports the first portion B1 by the support portion 15 and the stopper device 18 are opposed to each other. The stopper device 18 is adjusted in advance so that it can come into contact with the portion 17 with a predetermined force. When the pressure in the chamber space 5 is substantially atmospheric pressure, the lower surface 37A of the first member 37 and the upper surface 38A of the second member 38 of the stopper device 18 are in contact with each other, and the first member 37 is in contact with the second member 38. Supported by In the present embodiment, when the pressure in the chamber space 5 is almost atmospheric pressure, the first member 37 and the second member 38 are fixed, and the stopper device 18 supports the plate member 14 firmly.

  After the substrate stage 2 including the plate member 14, the first stage main body 11, the second stage main body 12, the table 13, the support unit 15, and the stopper device 18 is disposed inside the chamber member 7, the control device 4 performs adjustment. The environment of the chamber space 5 is adjusted using the device 8. The control device 4 uses the adjusting device 8 to adjust the pressure inside the chamber member 7 and adjust the inside of the chamber member 7 to a substantially vacuum state.

  FIG. 7 is a schematic diagram showing a state in the vicinity of the substrate stage 2 when the pressure inside the chamber member 7 (pressure in the chamber space 5) is reduced so that the chamber space 5 is almost in a vacuum state. As shown in FIG. 7, when the chamber space 5 is substantially in a vacuum state, the pressure outside the chamber member 7 is almost atmospheric pressure, and therefore, due to the pressure difference between the inside and outside of the chamber member 7, the chamber member 7. There is a possibility that at least a part of the lens is deformed. For example, at least a part of the installation part 19 inside the chamber member 7 may be deformed.

  There is a possibility that the distance in the Z-axis direction between the lower surface 14B of the plate member 14 and at least a part of the installation part 19 may change due to the deformation of at least a part of the installation part 19. For example, as shown in FIG. 7, when the installation portion 19 is deformed so as to protrude inside the chamber member 7 (so as to be recessed with respect to the space outside the chamber member 7), the lower surface 14 </ b> B of the plate member 14 is installed There is a possibility that the distance in the Z-axis direction with the substantially central portion of the portion 19 is shortened. In the present embodiment, the plate member 14 is supported by three support portions 15 that construct a three-point support structure, and one of the three support portions 15 (one support portion 15 ( The support part 15 that supports the first part B1 of the first area AR1 can move to the + Z side from the remaining two support parts 15 (support part 15 that supports the first part B1 of the second area AR2). There is sex. The support portion 15 that supports the first portion B1 of the first region AR1 is a support portion 15 that is disposed at substantially the center of the installation portion 19 (substantially the center in the Y-axis direction in the present embodiment), and is an XY plane. The distance to the four corners of the chamber member 7 is longer in the support portion 15 that supports the first portion B1 of the first region AR1 than in the support portion 15 that supports the first portion B1 of the second region AR2.

  Further, due to the deformation of the installation portion 19, the distance in the Z-axis direction between the substantially central portion of the installation portion 19 and the lower surface 14 </ b> B (first portion B <b> 1) of the plate member 14 is the distance of the installation portion 19 where the stopper device 18 is disposed. There is a possibility that the distance between the portion and the lower surface 14B (second portion B2) of the plate member 14 is shorter than the distance in the Z-axis direction.

  In the present embodiment, even when the pressure inside the chamber member 7 (pressure in the chamber space 5) is reduced and the chamber space 5 is adjusted to a substantially vacuum state, the first portion B1 is supported by the support portion 15 ( The second portion B2 of the lower surface 14B of the plate member 14 that is supported at three points is in contact with the facing portion 17 of the stopper device 18 with a predetermined force.

  The pressure in the inner space 35 of the bellows member 36 of the stopper device 18 is atmospheric pressure, and when the pressure inside the chamber member 7 (the pressure in the chamber space 5) decreases, the inner space 35 of the bellows member 36 and the chamber space outside thereof. The bellows member 36 extends in the Z-axis direction due to the pressure difference from 5. As the bellows member 36 extends, the first member 37 connected to the upper end of the bellows member 36 moves along the Z-axis direction in the direction of the lower surface 14B of the plate member 14 (+ Z direction). That is, due to the pressure difference between the inner space 35 of the bellows member 36 and the outer chamber space 5 that is generated in response to a decrease in the pressure in the chamber space 5, the facing portion 17 of the stopper device 18 is brought into contact with the lower surface 14B of the plate member 14. It moves along the Z-axis direction toward the direction.

  Thereby, due to the deformation of the installation portion 19, the distance in the Z-axis direction between the substantially central portion of the installation portion 19 and the lower surface 14 </ b> B (first portion B <b> 1) of the plate member 14 is the installation portion 19 where the stopper device 18 is disposed. Of the plate member 14 that is supported (three-point supported) by the support portion 15 even when the distance is shorter than the distance in the Z-axis direction between a part of the plate member 14 and the lower surface 14B (second portion B2) of the plate member 14. The second portion B2 of the lower surface 14B and the facing portion 17 of the stopper device 18 can contact with a predetermined force.

  In the present embodiment, the positional relationship between the plate member 14, the support portion 15, and the stopper device 18, and the stopper device 18 so that the upper surface 14 </ b> A of the plate member 14 is substantially horizontal when the chamber space 5 is in a substantially vacuum state. The structure etc. have been adjusted.

  After the chamber space 5 is adjusted to a vacuum state, the mask M is held on the mask stage 1, and the substrate P is held on the substrate stage 2, the control device 4 starts an exposure process for the substrate P. In order to illuminate the mask M with the exposure light EL, the control device 4 starts the light emission operation of the light source device. The exposure light EL emitted from the light source device by the light emitting operation of the light source device enters the illumination optical system IL. The exposure light EL that has entered the illumination optical system IL travels through the illumination optical system IL and then enters the mask M held on the mask stage 1. The mask M held on the mask stage 1 is illuminated with exposure light EL (EUV light) from the illumination optical system IL. The exposure light EL that is irradiated onto the reflective surface of the mask M and reflected by the reflective surface enters the projection optical system PL. The exposure light EL that has entered the projection optical system PL travels through the projection optical system PL, and is then irradiated onto the substrate P held on the substrate stage 2.

  The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In this embodiment, the scanning direction (synchronous movement direction) of the mask M is the Y-axis direction, and the scanning direction (synchronous movement direction) of the substrate P is also the Y-axis direction. The exposure apparatus EX moves the shot area of the substrate P in the Y-axis direction with respect to the projection area of the projection optical system PL, and synchronizes with the movement of the shot area of the substrate P in the Y-axis direction. The mask M is illuminated with the exposure light EL while moving the pattern formation region of the mask M in the Y-axis direction with respect to the illumination region of IL. As a result, the exposure light EL from the mask M is irradiated onto the substrate P, the substrate P is exposed with the exposure light EL, and the pattern image of the mask M is projected onto the substrate P.

  In the present embodiment, the stopper device 18 suppresses deformation of the plate member 14. As described above, the deformation of the plate member 14 includes a decrease in the flatness of the upper surface 14A of the plate member 14, and the stopper device 18 is positioned at the position of the facing portion 17 so that the upper surface 14A of the plate member 14 is substantially horizontal. To change.

  In the present embodiment, the stopper device 18 includes a chamber for suppressing deformation of the plate member 14 due to movement of the first stage main body 11, the second stage main body 12, and the table 13 that can move on the upper surface 14 </ b> A side of the plate member 14. The position of the facing portion 17 is changed according to the pressure inside the member 7.

  8 and 9 are schematic views showing comparative examples. FIGS. 8 and 9 are schematic views showing an example in which the stopper device 18 is omitted, and the plate member 14 is supported (supported at three points) by the support portion 15. 8A and 9A are plan views of the substrate stage 2J according to the comparative example, and FIGS. 8B and 9B are side views of FIGS. 8A and 9A. FIG. For example, as shown in FIG. 8, when the first stage main body 11 moves to the + Y side on the upper surface 14 </ b> A side of the plate member 14 supported by the support portion 15, the weight (uneven load) of the first stage main body 11 As shown in FIG. 8B, the upper surface 14A of the plate member 14 may be inclined or deformed. That is, as the first stage main body 11 moves, of the two sides (+ X side side, −X side side) of the plate member 14 that is long in the Y-axis direction in the XY plane, In the vicinity, the plate member 14 is inclined (rotated) with the support portion 15 supporting one first part B1 (the first part B1 of the first region AR1) provided approximately in the center in the Y-axis direction as a fulcrum. Or the possibility of deformation. Similarly, as shown in FIG. 9, when the first stage main body 11 moves to the −Y side on the upper surface 14A side of the plate member 14 supported by the support portion 15, as shown in FIG. There is a possibility that the upper surface 14A of the plate member 14 may be inclined (rotated) or deformed.

  In the present embodiment, since the facing portion 17 of the stopper device 18 is disposed at a position where it can come into contact with the second portion B2 of the lower surface 14B of the plate member 14, for example, due to the movement of the first stage main body 11. Even if the plate member 14 is to be deformed, the stopper device 18 supports the opposing portion 17 so as to press against the second portion B2 of the lower surface 14B of the plate member 14, so that deformation of the plate member 14 can be suppressed. In the present embodiment, since the second part B2 supported by the stopper device 18 is provided on both sides in the Y-axis direction with respect to the first part B1 of the first area AR1, the first stage body 11 can be moved. The accompanying deformation of the plate member 14 can be effectively suppressed.

  By suppressing the deformation of the plate member 14, it is possible to suppress the occurrence of malfunctions of the first stage main body 11, the second stage main body 12, the table 13, and the like. When the plate member 14 is deformed, for example, the first guide member 24 supported by the plate member 14 may be deformed (twisted). For example, when the first guide member 24 is deformed, the gap between the inner surface of the first stage main body 11 and the outer surface of the first guide member 24 (the static pressure flying height of the gas bearing 27) changes, and the static pressure rigidity of the gas bearing 27 is increased. The gas between the inner surface of the first stage body 11 and the outer surface of the first guide member 24 is reduced from the space between the inner surface of the first stage body 11 and the outer surface of the first guide member 24 to the outer space. That is, there is a possibility that a phenomenon (so-called galling phenomenon) in which the inner surface of the first stage main body 11 and the outer surface of the first guide member 24 come into contact with each other may occur. In that case, at least one malfunction of the first stage body 11, the second stage body 12, and the table 13 may occur, and the performance of the substrate stage 2 may be degraded. Further, not limited to the first guide member 24, when the plate member 14 is deformed, the second guide member 32 is deformed, and as a result, at least one of the first stage main body 11, the second stage main body 12 and the table 13 malfunctions. May occur, and the performance of the substrate stage 2 may deteriorate.

  If malfunctions of the first stage main body 11, the second stage main body 12, the table 13, etc. occur and the performance of the substrate stage 2 decreases, for example, the operation rate of the substrate stage 2 decreases, and as a result, the operation of the exposure apparatus EX The rate may decrease. Further, when the performance of the substrate stage 2 is deteriorated, exposure failure may occur.

  In the present embodiment, since the deformation of the plate member 14 is suppressed by the stopper device 18, it is possible to suppress the occurrence of malfunctions of the first stage body 11, the second stage body 12, the table 13, etc. A decrease in the performance of the substrate stage 2 can be suppressed.

  In particular, in the present embodiment, as described with reference to FIG. 5, the stopper device 18 is disposed along the straight line SL <b> 1 that is the movement path of the first stage body 11, and thus the first stage body 11. It is possible to effectively suppress the deformation of the plate member 14 accompanying the movement of.

  In the present embodiment, the bellows member 36 of the stopper device 18 expands and contracts in the Z-axis direction according to the pressure inside the chamber member 7 (pressure in the chamber space 5). The lower surface 14B of the plate member 14 and the facing portion 17 of the stopper device 18 can be kept in contact with each other with a predetermined force regardless of the atmospheric pressure or the reduced pressure state (vacuum state). Therefore, the stopper device 18 can suppress deformation of the plate member 14 regardless of whether the pressure in the chamber space 5 is atmospheric or vacuum.

  If the force acting between the lower surface 14B of the plate member 14 and the facing portion 17 of the stopper device 18 (the force by which the stopper device 18 pushes up the plate member 14) is too strong, the plate member 14 is deformed by the force. There is a possibility that. In the present embodiment, the bellows member 36 that expands and contracts using the pressure difference with respect to the chamber space 5 is used as a mechanism for changing the position of the facing portion 17 in the Z-axis direction. However, even in a vacuum state, the lower surface 14B of the plate member 14 and the facing portion 17 of the stopper device 18 can be kept in contact with each other with a predetermined force (substantially constant force). As described above, the predetermined force is a small force that can suppress the deformation of the plate member 14 and can make the upper surface 14A of the plate member 14 substantially horizontal.

  Thus, the stopper device 18 of the present embodiment is opposed to the lower surface 14B of the plate member 14 in order to suppress deformation of the upper surface 14A of the plate member 14 (in order to make the upper surface 14A of the plate member 14 substantially horizontal). The position of the facing portion 17 is changed according to the pressure inside the chamber member 7 so as to keep in contact with 17 with a predetermined force. Therefore, it is possible to suppress the occurrence of malfunction of members that are movable on the upper surface 14A side of the plate member 14, such as the first stage main body 11, the second stage main body 12, and the table 13, due to the deformation of the plate member 14. Further, the stopper device 18 can suppress deformation of the plate member 14 while suppressing the displacement (deformation) of the chamber member 7 (installation portion 19) from being transmitted to the plate member 14.

  As described above, according to the present embodiment, the stopper device 18 that changes the position of the facing portion 17 in the Z-axis direction according to the pressure inside the chamber member 7 is provided. Even when the pressure changes, the plate member 14 and the facing portion 17 can be kept in contact with each other with a predetermined force. Therefore, the deformation of the plate member 14 can be suppressed, and the deterioration of the performance of the substrate stage 2 can be suppressed. Therefore, it is possible to satisfactorily expose the substrate P using the substrate stage 2, and to suppress the occurrence of exposure failure, the generation of defective devices, and the like.

  Further, according to the present embodiment, the position of the facing portion 17 in the Z-axis direction automatically (passively) changes as the pressure in the chamber space 5 decreases. Therefore, for example, occurrence of a situation where the lower surface 14B of the plate member 14 and the facing portion 17 are separated can be suppressed with a simple configuration.

Second Embodiment
Next, a second embodiment will be described. Constituent parts that are the same as or equivalent to those in the above-described embodiment are given the same reference numerals, and descriptions thereof are simplified or omitted.

  FIG. 10 is a view showing a stopper device 18B according to the second embodiment. As in the above-described embodiment, the stopper device 18B is connected to the bellows member 36 having the internal space 35 and the upper end (end on the + Z side) of the bellows member 36, and the facing portion 17 that can contact the lower surface 14B of the plate member 14. And a second member 38 connected to the lower end (−Z side end) of the bellows member 36. The second member 38 can regulate the contraction of the bellows member 36 by bringing the upper surface 38A and the lower surface 37A into contact with each other.

  Further, the stopper device 18 </ b> B of the present embodiment includes a third member 40 that regulates the expansion of the bellows member 36. The third member 40 can contact the upper surface 41 of the first member 37 disposed around the convex portion 39. The third member 40 can contact the upper surface 41 of the first member 37 when the bellows member 36 extends in the Z-axis direction and the first member 37 moves in the + Z direction. The third member 40 can regulate the expansion of the bellows member 36 by bringing the lower surface 42 of the third member 40 into contact with the upper surface 41 of the first member 37.

  In the present embodiment, the substrate stage 2 includes a pressure adjusting device 43 that adjusts the pressure in the internal space 35 of the bellows member 36. The pressure adjusting device 43 includes a gas supply device and a gas recovery device, and is connected to the internal space 35 of the bellows member 36 via a flow path 44 formed by a tube. The pressure adjusting device 43 can adjust the pressure of the internal space 35 by supplying gas to the internal space 35 of the bellows member 36 or collecting the gas via the flow path 44. The pressure adjusting device 43 can expand and contract the bellows member 36 in the Z-axis direction by adjusting the pressure in the internal space 35, and the opposed portion 17 of the first member 37 connected to the upper end of the bellows member 36. The position in the Z-axis direction can be changed. Further, the pressure adjusting device 43 can adjust the position of the facing portion 17 in the Z-axis direction by adjusting the pressure in the internal space 35 and adjusting the amount of expansion and contraction of the bellows member 36. In the present embodiment, the pressure adjusting device 43 is disposed outside the chamber member 7. FIG. 10 schematically shows one stopper device 18B, but the stopper device 18B has two second portions B2 on the lower surface 14B of the plate member 14 as in the above-described embodiment. It is arranged so that it can touch.

  FIG. 11 is a plan view of the plate member 14 according to the present embodiment as viewed from above (+ Z side). As shown in FIG. 11, in the present embodiment, the substrate stage 2 includes an inclination sensor 45 that detects the inclination of the upper surface 14 </ b> A of the plate member 14. The inclination sensor 45 can detect the inclination of the upper surface 14A with respect to the XY plane. The inclination sensor 45 is disposed at a plurality of predetermined positions on the upper surface 14A of the plate member 14. The detection results of each of the inclination sensors 45 are output to the control device 4. Based on the detection results of the plurality of inclination sensors 45, the control device 4 can acquire the flatness information of the upper surface 14A including the inclination, deformation, and the like of the upper surface 14A of the plate member 14.

  Next, an example of the operation of the exposure apparatus EX according to the present embodiment will be described.

  After the substrate stage 2 including the plate member 14, the first stage main body 11, the second stage main body 12, the table 13, the support unit 15, and the stopper device 18 </ b> B is disposed inside the chamber member 7, the control device 4 performs adjustment. The apparatus 8 is used to adjust the pressure inside the chamber member 7 to adjust the chamber space 5 to a substantially vacuum state.

  When the pressure inside the chamber member 7 decreases, as described in the above-described embodiment, due to the pressure difference between the inside and outside of the chamber member 7, the substantially central portion of the installation portion 19 becomes less in the chamber member 7. The distance in the Z-axis direction between the substantially central portion of the installation portion 19 and the lower surface 14B (first portion B1) of the plate member 14 due to the deformation of the installation portion 19 is determined by the stopper device. There is a possibility that the distance is shorter than the distance in the Z-axis direction between a part of the installation portion 19 where the 18 is disposed and the lower surface 14B (second portion B2) of the plate member 14.

  In the present embodiment, the control device 4 includes the second portion B2 on the lower surface 14B of the plate member 14 supported by the support portion 15 (supported at three points) by the support portion 15 and the facing portion 17 of the stopper device 18B. The pressure in the internal space 35 of the bellows member 36 is adjusted using the pressure adjusting device 43 so that the pressure continues to contact with a predetermined force. As described above, the position of the facing portion 17 in the Z-axis direction can be adjusted by adjusting the pressure in the internal space 35 of the bellows member 36. Therefore, the control device 4 can keep the second portion B2 of the lower surface 14B of the plate member 14 and the facing portion 17 of the stopper device 18B in contact with each other with a predetermined force, and can suppress deformation of the plate member 14.

  In the present embodiment, the control device 4 monitors the detection result of the inclination sensor 45 so that the upper surface 14A of the plate member 14 is substantially horizontal, and the internal space of the bellows member 36 using the pressure adjusting device 43. 35 pressure adjustment operations are executed. In other words, the control device 4 uses the pressure adjustment device 43 so that the upper surface 14A of the plate member 14 is substantially horizontal based on the detection result of the inclination sensor 45, and the bellows member 36 of each of the two stopper devices 18B. The pressure in the internal space 35 is adjusted to adjust the position of the facing portion 17 in the Z-axis direction. Thereby, a deformation | transformation of the plate member 14 can be suppressed and the upper surface 14A of the plate member 14 can be made substantially horizontal.

  Then, after the process for suppressing the deformation of the plate member 14 is completed, the exposure process for the substrate P is started. Since the plate member 14 is supported by the support portion 15 and the stopper device 18B, even if the first stage main body 11 moves on the upper surface 14A side of the plate member 14, for example, the plate accompanying the movement of the first stage main body 11 The deformation of the member 14 is suppressed.

  As described above, also in the present embodiment, the deformation of the plate member 14 can be suppressed, and the deterioration of the performance of the substrate stage 2 can be suppressed.

  Further, according to the present embodiment, since the third member 40 is arranged, for example, even if the pressure in the internal space 35 increases and the bellows member 36 tends to extend excessively, the expansion of the bellows member 36 is restricted, The movement of the facing portion 17 can be restricted. Therefore, it is possible to suppress an excessive increase in the force acting between the lower surface 14B of the plate member 14 and the facing portion 17 of the stopper device 18B.

<Third Embodiment>
Next, a third embodiment will be described. Constituent parts that are the same as or equivalent to those in the above-described embodiment are given the same reference numerals, and descriptions thereof are simplified or omitted.

  FIG. 12 is a view showing the substrate stage 2 including the stopper device 18C according to the third embodiment. The stopper device 18C of the present embodiment has an actuator 46 that can move the facing portion 17 in the Z-axis direction. As the actuator 46, for example, a piezoelectric actuator, a voice coil motor, or the like can be used.

  The actuator 46 is controlled by the control device 4. In order to suppress deformation of the plate member 14, the control device 4 operates the actuator 46 to adjust the position of the facing portion 17 in the Z-axis direction, and the second portion B 2 of the lower surface 14 B of the plate member 14 and the stopper The facing portion 17 of the device 18C can be kept in contact with a predetermined force. Thereby, even if the pressure inside the chamber member 7 falls, for example, the deformation of the plate member 14 can be suppressed, and the deterioration of the performance of the substrate stage 2 can be suppressed.

  Further, as in the second embodiment described above, in this embodiment, an inclination sensor 45 that detects the inclination of the upper surface 14A is disposed on the upper surface 14A of the plate member 14. Based on the detection result of the inclination sensor 45, the control device 4 uses the actuator 46 to move the opposing portions 17 of the two stopper devices 18 </ b> C in the Z-axis direction so that the upper surface 14 </ b> A of the plate member 14 is substantially horizontal. It moves and adjusts the position of the opposing part 17 in the Z-axis direction. Thereby, a deformation | transformation of the plate member 14 can be suppressed and the upper surface 14A of the plate member 14 can be made substantially horizontal.

<Fourth embodiment>
Next, a fourth embodiment will be described. Constituent parts that are the same as or equivalent to those in the above-described embodiment are given the same reference numerals, and descriptions thereof are simplified or omitted.

  FIG. 13 is a schematic diagram for explaining the positional relationship between the support portion 15, the facing portion 17 of the stopper device 18, and the plate member 14 according to the fourth embodiment. As shown in FIG. 13, the lower surface 14B of the plate member 14 is defined by a virtual line VL passing through the center of gravity G of the plate member 14, and the first region AR1 including one first portion B1 and the second region AR2 including the remaining two portions. When divided into two, two second portions B2 are arranged in the first region AR1.

  In the present embodiment, in the first region AR1, one first part B1 and two second parts B2 are not aligned on the straight line SL1.

  Even when the positional relationship between the support portion 15 and the facing portion 17 of the stopper device 18 and the plate member 14 is the positional relationship shown in FIG. 13, the deformation of the plate member 14 can be suppressed and the deterioration of the performance of the substrate stage 2 can be suppressed. can do.

<Fifth Embodiment>
Next, a fifth embodiment will be described. Constituent parts that are the same as or equivalent to those in the above-described embodiment are given the same reference numerals, and descriptions thereof are simplified or omitted.

  FIG. 14 is a schematic diagram for explaining the positional relationship between the support portion 15, the facing portion 17 of the stopper device 18, and the plate member 14 according to the fifth embodiment. As shown in FIG. 14, when the lower surface 14B of the plate member 14 is divided into a first region AR1 including one first portion B1 and a second region AR2 including the remaining two portions by a virtual line VL, two locations are provided. The second part B2 is arranged in the first area AR1.

  In the first region AR1, one first part B1 and two second parts B2 are arranged on a straight line SL1.

  In the present embodiment, the virtual line VL that separates the first area AR1 and the second area AR2 does not pass through the center of gravity G of the plate member 14.

  Even when the positional relationship between the support portion 15 and the facing portion 17 of the stopper device 18 and the plate member 14 is the positional relationship shown in FIG. 14, the deformation of the plate member 14 can be suppressed and the deterioration of the performance of the substrate stage 2 can be suppressed. can do.

<Sixth Embodiment>
Next, a sixth embodiment will be described. Constituent parts that are the same as or equivalent to those in the above-described embodiment are given the same reference numerals, and descriptions thereof are simplified or omitted.

  FIG. 15 is a schematic diagram for explaining the positional relationship between the support portion 15, the facing portion 17 of the stopper device 18, and the plate member 14 according to the sixth embodiment. As shown in FIG. 15, when the lower surface 14B of the plate member 14 is divided into a first area AR1 including one first part B1 and a second area AR2 including the remaining two parts by a virtual line VL, two places are provided. The second part B2 is arranged in the first area AR1.

  In the first region AR1, one first part B1 and two second parts B2 are arranged on a straight line SL1.

  A virtual line VL that separates the first area AR1 and the second area AR2 passes through the center of gravity G of the plate member 14.

  In the present embodiment, the second region B2 is also disposed in the second region AR2, and the stopper device 18 that can contact the second region B2 is provided.

  In the second region AR2, two first parts B2 and one second part B2 are arranged on a straight line SL2.

  Thus, the second region B2 can also be provided in the second region AR2. Further, as shown in FIG. 15, the second part AR <b> 2 may be provided at three places on the lower surface 14 </ b> B of the plate member 14.

  In addition, in each above-mentioned embodiment, 2nd site | part AR2 is not restricted to 2 places or 3 places, You may provide in arbitrary multiple places of 4 or more places.

  In each of the embodiments described above, the case where the pressure inside the chamber member 7 is made lower than the pressure outside the chamber member 7 until the inside of the chamber member 7 is almost in a vacuum state has been described as an example. May be. Further, in each of the above-described embodiments, the case where the pressure outside the chamber member 7 is substantially atmospheric pressure has been described as an example, but it may not be atmospheric pressure. The pressure outside the chamber member 7 may be lower than atmospheric pressure or higher.

  In each of the above-described embodiments, the case where the pressure inside the chamber member 7 is made lower than the pressure outside is described as an example, but the pressure inside the chamber member 7 may be made higher than the pressure outside. . In that case, for example, there is a possibility that the substantially center of the installation portion 19 is deformed so as to protrude to the outside of the chamber member 7 (so as to be recessed with respect to the space inside the chamber member 7). Even in such a case, the stopper device 18 (18B, 18C) described in each of the above-described embodiments applies a predetermined force between the lower surface 14B of the plate member 14 and the facing portion 17 according to the pressure inside the chamber member 7. By continuing the contact at, deformation of the plate member 14 can be suppressed.

In the present embodiment, the case where the exposure light EL is EUV light has been described as an example. However, as the exposure light EL, for example, bright lines (g-line, h-line, i-line) emitted from a mercury lamp and KrF. excimer laser beam (wavelength 248 nm) far ultraviolet light such as (DUV light), ArF excimer laser beam (wavelength 193 nm) and _{F 2} laser beam (wavelength 157 nm) vacuum ultraviolet light (VUV light) can also be used. In that case, the chamber space 5 is not necessarily adjusted to a vacuum state, and for example, the chamber space 5 can be filled with a predetermined gas.

  In addition, as the substrate P in each of the above embodiments, not only a semiconductor wafer for manufacturing a semiconductor device, but also a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an original mask (reticle) used in an exposure apparatus ( Synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise.

  Further, in the step-and-repeat exposure, after the reduced image of the first pattern is transferred onto the substrate P using the projection optical system in a state where the first pattern and the substrate P are substantially stationary, the second pattern With the projection optical system, the reduced image of the second pattern may be partially overlapped with the first pattern and collectively exposed on the substrate P (stitch type batch exposure apparatus). ). Further, the stitch type exposure apparatus can be applied to a step-and-stitch type exposure apparatus in which at least two patterns are partially transferred on the substrate P, and the substrate P is sequentially moved.

  Further, as disclosed in, for example, US Pat. No. 6,611,316, two mask patterns are synthesized on a substrate via a projection optical system, and one shot area on the substrate is obtained by one scanning exposure. The present invention can also be applied to an exposure apparatus that performs double exposure almost simultaneously. The present invention can also be applied to proximity type exposure apparatuses, mirror projection aligners, and the like.

  In addition, the present invention is disclosed in US Pat. No. 6,341,007, US Pat. No. 6,400,491, US Pat. No. 6,549,269, US Pat. No. 6,590,634, US Pat. The present invention can also be applied to a twin-stage type exposure apparatus having a plurality of substrate stages as disclosed in the specification and the like.

  Further, as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application No. 1713113, a reference stage on which a substrate stage for holding the substrate and a reference mark are formed, and / or various photoelectric devices. The present invention can also be applied to an exposure apparatus that includes a measurement stage equipped with a sensor.

  The above-described embodiment can also be applied to an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, but an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). ), An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, a reticle, a mask, or the like.

  In each of the above embodiments, the position information of the mask stage 1 and the substrate stage 2 is measured using the interferometer system. However, the present invention is not limited to this, and for example, a scale (diffraction grating) provided in each stage An encoder system for detection may be used. In this case, it is preferable that a hybrid system including both the interferometer system and the encoder system is used, and the measurement result of the encoder system is calibrated using the measurement result of the interferometer system. Further, the position of the stage may be controlled by switching between the interferometer system and the encoder system or using both.

  As described above, the exposure apparatus EX according to the embodiment of the present application maintains various mechanical subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Manufactured by assembling. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 16, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a substrate of the device. Manufacturing step 203, substrate processing step 204 including substrate processing (exposure processing) for exposing the mask pattern to the substrate and developing the exposed substrate according to the above-described embodiment, device assembly step (dicing process, bonding process, (Including a processing process such as a packaging process) 205, an inspection step 206, and the like.

  In the above-described embodiment, the case where the stage apparatus according to the present invention is the movable substrate stage 2 while holding the substrate P irradiated with the exposure light EL has been described as an example. It can also be applied to a mask stage 1 that is movable while being held.

  In each of the above-described embodiments, the case where the stage apparatus of the present invention is applied to an exposure apparatus that generates a pattern by irradiating the substrate P with the exposure light EL has been described as an example. The apparatus can be applied to various pattern forming apparatuses that form a pattern on a substrate. As such a pattern forming apparatus, for example, an ink jet apparatus that forms a pattern on a substrate by ejecting ink droplets onto the substrate, an original plate on which a concavo-convex pattern is formed, and a substrate on which an organic material is applied And a nanoimprinting apparatus for transferring the pattern of the original plate onto the substrate by separating the original plate and the substrate and then cooling the substrate. When these apparatuses are provided with a stage apparatus for holding a substrate, and the stage apparatus is disposed inside the chamber, the pattern can be favorably formed by applying the stage apparatus of the present invention. .

  As long as it is permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  Although the embodiments of the present invention have been described as described above, the present invention can be used by appropriately combining all the above-described constituent elements, and some constituent elements may not be used.

It is a schematic block diagram which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a perspective view which shows an example of the substrate stage which concerns on 1st Embodiment. It is a sectional side view which shows the gas bearing which concerns on 1st Embodiment. It is a sectional side view which shows the stopper apparatus which concerns on 1st Embodiment. It is a schematic diagram for demonstrating the positional relationship of the support part which concerns on 1st Embodiment, an opposing part, and a plate member. It is a figure which shows an example of operation | movement of the substrate stage which concerns on 1st Embodiment. It is a figure which shows an example of operation | movement of the substrate stage which concerns on 1st Embodiment. It is a figure which shows an example of operation | movement of the substrate stage which concerns on a comparative example. It is a figure which shows an example of operation | movement of the substrate stage which concerns on a comparative example. It is a sectional side view which shows the stopper apparatus which concerns on 2nd Embodiment. It is a figure which shows the inclination sensor which concerns on 2nd Embodiment. It is a figure which shows an example of the substrate stage which concerns on 3rd Embodiment. It is a schematic diagram for demonstrating the positional relationship of the support part, opposing part, and plate member which concern on 4th Embodiment. It is a schematic diagram for demonstrating the positional relationship of the support part which concerns on 5th Embodiment, an opposing part, and a plate member. It is a schematic diagram for demonstrating the positional relationship of the support part, opposing part, and plate member which concern on 6th Embodiment. It is a flowchart figure which shows an example of the manufacturing process of a microdevice.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Mask stage, 2 ... Substrate stage, 4 ... Control apparatus, 5 ... Chamber space, 6 ... Chamber apparatus, 7 ... Chamber member, 8 ... Adjustment apparatus, 11 ... 1st stage main body, 12 ... 2nd stage main body, 13 ... Table, 14 ... Plate member, 14A ... Upper surface, 14B ... Lower surface, 15 ... Supporting part, 17 ... Opposing part, 18 ... Stopper device, 19 ... Installation part, 35 ... Internal space, 36 ... Bellows member, 37 ... First 38, second member, 40, third member, 43, pressure adjusting device, 45, tilt sensor, 46, actuator, AR1, first region, AR2, second region, B1, first portion, B2, first member. 2 sites, EX ... exposure device, M ... mask, P ... substrate, VL ... virtual line

Claims (22)

A stage device disposed inside the chamber,
A plate member;
A movable member movable on the upper surface side of the plate member;
A support portion for supporting the plate member at three locations;
A stopper device provided in an installation portion inside the chamber facing the lower surface of the plate member, and having a facing portion capable of contacting at least two places on the lower surface of the plate member,
A stage apparatus in which a position of the facing portion in a direction intersecting with the lower surface changes according to a pressure inside the chamber. The pressure inside the chamber is adjusted to be lower than the pressure outside,
The stage apparatus according to claim 1, wherein the facing portion moves along the intersecting direction toward the lower surface of the plate member in accordance with a decrease in pressure inside the chamber.   The stage apparatus according to claim 1, wherein the position of the facing portion is changed so that an upper surface of the plate member is substantially horizontal.   The stage device according to any one of claims 1 to 3, wherein the stopper device includes a deformable member having an internal space of a predetermined pressure that is elastically deformable at least in the intersecting direction.   The stage device according to claim 4, wherein the deformable member expands and contracts in the intersecting direction according to a pressure inside the chamber.   The stage apparatus according to claim 5, wherein the pressure in the internal space is higher than the pressure inside the chamber.   The stage device according to claim 5 or 6, wherein the stopper device includes a regulating member that regulates expansion and contraction of the deformable member.   The stage apparatus as described in any one of Claims 4-7 provided with the pressure adjustment apparatus which adjusts the pressure of the said interior space. An inclination sensor for detecting the inclination of the upper surface of the plate member;
The stage device according to claim 8, wherein the pressure adjusting device adjusts the pressure in the internal space based on a detection result of the tilt sensor.   The stage device according to claim 1, wherein the stopper device includes an actuator that can move the facing portion. An inclination sensor for detecting the inclination of the upper surface of the plate member;
The stage device according to claim 10, wherein the actuator moves the facing portion based on a detection result of the tilt sensor. A stage device disposed inside the chamber,
A plate member;
A movable member movable on the upper surface side of the plate member;
A support portion for supporting the plate member at three locations;
A stopper device provided in an installation portion inside the chamber facing the lower surface of the plate member, and capable of contacting at least two places on the lower surface of the plate member in order to suppress deformation of the plate member;
The stopper device expands and contracts in a direction intersecting with the lower surface of the plate member according to the pressure inside the chamber, and an expandable member having an internal space of a predetermined pressure;
A stage device comprising: an opposing member that is disposed between the lower surface of the plate member and an upper end of the elastic member, and moves in accordance with the expansion and contraction of the elastic member and can contact the lower surface of the plate member. The support portion supports three first parts on the lower surface of the plate member, and the stopper device can contact at least two second parts on the lower surface of the plate member;
When the lower surface of the plate member is divided into a first region including the first portion and a second region including the remaining two portions by virtual lines, at least two of the second portions are the first region. The stage apparatus as described in any one of Claims 1-12 arrange | positioned at 1 area | region.   The stage according to claim 13, wherein the two first portions arranged in the second region and the two second portions arranged in the first region are substantially line symmetric with respect to the virtual line. apparatus.   The stage device according to claim 13 or 14, wherein the virtual line passes through the center of gravity of the plate member.   The stage device according to any one of claims 13 to 15, wherein in the first region, the one first portion and the two second portions are arranged substantially in a straight line.   The stage apparatus according to claim 16, wherein the plate member is provided with a guide portion for moving the movable member along the straight line.   The stage device according to any one of claims 13 to 17, wherein the second region is also disposed in the second region. An exposure apparatus that exposes a substrate with exposure light,
An exposure apparatus including the stage apparatus according to claim 1. Exposing the substrate using the exposure apparatus according to claim 19;
Developing the exposed substrate. A device manufacturing method comprising: An exposure method for exposing a substrate with exposure light,
Arranging a plate member and a movable member movable on the upper surface side of the plate member inside the chamber;
Respectively supporting the three first parts provided on the plate member;
A plurality of stopper devices each having opposing portions that can come into contact with at least two second portions provided on the lower surface of the plate member are disposed on an installation surface inside the chamber facing the lower surface of the plate member. To do
Adjusting the pressure inside the chamber;
Changing the position of the facing portion with respect to the direction intersecting the lower surface according to the pressure inside the chamber to suppress deformation of the plate member;
Exposing the substrate with exposure light using the movable member. Exposing the substrate using the exposure method of claim 21;
Developing the exposed substrate. A device manufacturing method comprising:

Images