JP2008529068A - 高速に波長スキャンする小型マルチモードレーザ - Google Patents
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- 230000003287 optical effect Effects 0.000 claims description 111
- 230000006870 function Effects 0.000 claims description 50
- 230000003321 amplification Effects 0.000 claims description 28
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 28
- 230000003595 spectral effect Effects 0.000 claims description 25
- 230000008859 change Effects 0.000 claims description 16
- 239000006185 dispersion Substances 0.000 claims description 9
- 239000013307 optical fiber Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 9
- 230000005540 biological transmission Effects 0.000 claims description 8
- 241000282326 Felis catus Species 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 238000012634 optical imaging Methods 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 1
- 238000013461 design Methods 0.000 description 17
- 238000001228 spectrum Methods 0.000 description 14
- 230000007246 mechanism Effects 0.000 description 12
- 238000002310 reflectometry Methods 0.000 description 10
- 238000012360 testing method Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 239000000835 fiber Substances 0.000 description 8
- 238000003384 imaging method Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000012014 optical coherence tomography Methods 0.000 description 8
- 230000010287 polarization Effects 0.000 description 7
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 6
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 6
- 238000013459 approach Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 230000008878 coupling Effects 0.000 description 6
- 238000010168 coupling process Methods 0.000 description 6
- 238000005859 coupling reaction Methods 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 238000005286 illumination Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000003068 static effect Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 235000008694 Humulus lupulus Nutrition 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000007493 shaping process Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 3
- 230000001427 coherent effect Effects 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 230000002441 reversible effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000875 corresponding effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- 210000003644 lens cell Anatomy 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- -1 rare earth ions Chemical class 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 239000002419 bulk glass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000002059 diagnostic imaging Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 210000003238 esophagus Anatomy 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000000153 supplemental effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910001428 transition metal ion Inorganic materials 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
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- H01S5/14—External cavity lasers
- H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
- H01S5/143—Littman-Metcalf configuration, e.g. laser - grating - mirror
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Abstract
【解決手段】小型レーザシステムは広い範囲にわたってスキャンされることができる。小型レーザシステムは、速いスキャン速度でスキャンされることができる。小型レーザシステムは可変コヒーレンス長を有することができる。特に、約1nm/sに達する連続可変スキャン速度で140nmにわたる波長スキャンと、約10nm/sに達するスキャン速度の離散的な上昇と、1mmから約30mmまでの可変コヒーレンス長が実現されることができる。
【選択図】図8
Description
NλN = 2L …(2)
式(1)及び式(2)において、λNはレーザの平均瞬間出力波長であり、Nはレーザの縦モードの数であり、dは波長と同じ単位で測定された格子定数であり、αは回折格子に対する光照野の入射角であり、βは回折格子からの光照野の回折角度であり、Lはレーザのキャビティの光路長である。Nを固定して波長チューニングしている間、式(1)及び式(2)の二つの条件が同時に満たされている場合、結果としてレーザは連続的に同調し、いかなる縦モードホップも生じない。上記2式の条件を満たす機械的な解決方法はいくつかあるものの、サイズや所望のチューニング速度を大幅に下回るチューニング速度のために、市販されているものや学術誌に掲載されたものは限られている。Nを固定し、上記式(2)に満たすために鏡や回折格子を回転させるために要される機構は、たいてい常に複雑な機構であり、大きな内部質量を有する。そしてそれは、高速チューニングに必要な高速駆動を妨げる。
これらのモードジャンプが存在する場合、レーザはもはや連続同調可能レーザでなくなる。そしてレーザの動的コヒーレンス長が不規則になり、システムの静的コヒーレンス長以下に悪くなる。モードジャンプの大きさを低減するためには、キャビティの長さを長くすることができる。しかしそれはレーザをよりマルチモード態様にし、そのためコヒーレンス長を短くもする。
ここでHWHMは、最大値の100%から最大値の50%まで干渉図形を変えるために要する干渉計中の複数の鏡の一つの移動である。2という係数は、マイケルソン干渉計の可動アームにおける往復(前進と後進)を意味することに注意されたい。
られた。縦モード数Nの放射状の上昇がレーザの中心波長に生じる最小を有するように、’355特許は注意深くバランスをとられたキャビティ構造を有する。波長の関数であるNがシステムのチューニング範囲内の最小を通らないよう構成されたシステムは、良好に動作する。この構成は、レーザがその波長範囲にわたってスイープされる時に、波長の単位変化あたりのNの顕著な変化を有したことを確実にした。Nのこの変化を提供する構造を用いた操作は、レーザの全チューニング範囲にわたる高度に安定したコヒーレンス長を与えることが示された。一方、’355特許のように、1次の補償を提供するためにバランスがとられた同じレーザを操作することは、この同じパフォーマンスを一般的に与えなかった。さらにマルチモードシステムは、’355特許に開示されたシングルモードシステムより良好に動作する。
101…光生成セクション
102…伝搬セクション
103…チューニング素子セクション
Claims (19)
- 二つの反射器の間に形成された光学キャビティであって、複数の光学モードをサポートする前記の光学キャビティと、
前記光学キャビティ内に配置された光増幅媒体と、
前記光学キャビティに配置されたチューニングセクションであって、前記増幅媒体から光を受け、前記複数の光学モードのモードの間でチューニングする前記のチューニングセクション
とを備える同調可能マルチモードレーザ光源であって、
約2mmより大きいコヒーレンス長で、外部キャビティにおいて波長同調されたマルチモードレーザが形成される前記の同調可能マルチモードレーザ光源。 - 前記チューニングセクションが、前記光増幅媒体の中心波長の約5%より広いチューニング範囲にわたってチューニングすることが可能であり、約20kHzから約50kHzの間の波長スキャン周期でスキャンすることが可能である請求項1に記載の光源。
- 出力パワーが0.5mWより大きい請求項1に記載の同調可能マルチモードレーザ光源。
- 前記キャビティのフィルタ機能によって、前記複数のモードの平均が、前記チューニングセクションで同調された前記波長に依存する請求項1に記載の光源。
- 前記チューニングセクションが、前記光学キャビティでサポートされる複数のモードに含まれるモードの一式の間で変える請求項4に記載の光源。
- 前記光学キャビティの長さが、前記チューニングセクションの前記チューニング範囲を通して、ほぼ一定である請求項1に記載の光源。
- 前記チューニングセクションが、前記光学キャビティの前記長さをほぼ一定に保つ請求項6に記載の光源。
- 前記キャビティの部分の長さが、前記チューニングセクションによって生じた長さの変化を相殺するよう調整される請求項1に記載の光源。
- 前記光増幅媒体及び前記チューニングセクションの間の前記キャビティに配置された光伝達媒体を更に備える請求項1に記載の光源。
- 前記光伝達媒体が自由空間である請求項9に記載の光源。
- 前記光伝達媒体が光を透過させる液体、ガス、又は固体である請求項9に記載の光源。
- 前記光伝達媒体が光ファイバである請求項9に記載の光源。
- 前記光増幅媒体が半導体増幅素子である請求項1に記載の光源。
- 光学スキャナに配置された分散素子であって、前記増幅素子から光を受ける前記の分散素子と、
前記分散素子から光を受けるためのレンズ系と、
前記レンズ系に光学的に向けられたスリット鏡であって、前記レンズ系の焦点面に配置された前記のスリット鏡
とを備える可変波長選択セクションを更に備えることを特徴とする請求項1に記載の光源。 - 前記高速機械式波長チューニングセクションが、分散部、分光光学フィルタ部、及び反射部を備える請求項1に記載の光源。
- 前記反射部が前記分散部である請求項15に記載の光源。
- 前記反射部が前記キャビティの第2のエンドリフレクタとして機能する請求項15又は16に記載の光源。
- 前記反射部が前記分光光学フィルタ部と結合されている請求項15乃至17のいずれか1項に記載の光源。
- 前記高速機械式波長チューニングセクションが、分散部、分光光学フィルタ部、光学画像化部、及び反射部を備え、前記光学画像化部及び前記反射部が、光学キャッツアイ配置に構成されている請求項1に記載の光源。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US64707805P | 2005-01-24 | 2005-01-24 | |
| PCT/US2006/002609 WO2006079100A2 (en) | 2005-01-24 | 2006-01-24 | Compact multimode laser with rapid wavelength scanning |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014124965A Division JP5923555B2 (ja) | 2005-01-24 | 2014-06-18 | 高速波長走査の小型多モードレーザ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008529068A true JP2008529068A (ja) | 2008-07-31 |
| JP2008529068A5 JP2008529068A5 (ja) | 2012-02-16 |
Family
ID=36693020
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007552393A Pending JP2008529068A (ja) | 2005-01-24 | 2006-01-24 | 高速に波長スキャンする小型マルチモードレーザ |
| JP2014124965A Expired - Fee Related JP5923555B2 (ja) | 2005-01-24 | 2014-06-18 | 高速波長走査の小型多モードレーザ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
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| JP2014124965A Expired - Fee Related JP5923555B2 (ja) | 2005-01-24 | 2014-06-18 | 高速波長走査の小型多モードレーザ |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US7843976B2 (ja) |
| EP (1) | EP1856777A4 (ja) |
| JP (2) | JP2008529068A (ja) |
| CN (1) | CN101194402B (ja) |
| WO (1) | WO2006079100A2 (ja) |
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| KR101415918B1 (ko) * | 2013-10-15 | 2014-08-06 | (주)엘투케이플러스 | 레이저 멀티 스캔 장치 |
| JP2017135315A (ja) * | 2016-01-29 | 2017-08-03 | 浜松ホトニクス株式会社 | 波長可変光源 |
| WO2018105549A1 (ja) * | 2016-12-09 | 2018-06-14 | 日本電信電話株式会社 | 波長掃引光源、波長掃引光源のための駆動データ作成方法および光偏向器 |
| JPWO2018105549A1 (ja) * | 2016-12-09 | 2019-04-11 | 日本電信電話株式会社 | 波長掃引光源、波長掃引光源のための駆動データ作成方法および光偏向器 |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN101194402A (zh) | 2008-06-04 |
| WO2006079100A3 (en) | 2007-11-15 |
| JP2014209646A (ja) | 2014-11-06 |
| EP1856777A4 (en) | 2009-04-29 |
| US20110032957A1 (en) | 2011-02-10 |
| US7843976B2 (en) | 2010-11-30 |
| EP1856777A2 (en) | 2007-11-21 |
| US20060203859A1 (en) | 2006-09-14 |
| CN101194402B (zh) | 2011-04-20 |
| US8351474B2 (en) | 2013-01-08 |
| WO2006079100A2 (en) | 2006-07-27 |
| JP5923555B2 (ja) | 2016-05-24 |
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