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JP2008213210A - Transfer method and optical element manufactured thereby - Google Patents

Transfer method and optical element manufactured thereby Download PDF

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JP2008213210A
JP2008213210A JP2007051178A JP2007051178A JP2008213210A JP 2008213210 A JP2008213210 A JP 2008213210A JP 2007051178 A JP2007051178 A JP 2007051178A JP 2007051178 A JP2007051178 A JP 2007051178A JP 2008213210 A JP2008213210 A JP 2008213210A
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resin
mold
transfer surface
resin layer
transfer
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Masaki Shirakawa
正樹 白川
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Olympus Corp
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Olympus Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To obtain a fine uneven part not mixed with air bubbles by transferring a mold transfer surface to a resin material after the resin material is temporarily cured. <P>SOLUTION: A resin 12 is interposed between a glass base material 11 and the mold transfer surface arranged in a counter relation to the glass base material 11 and having a fine uneven part 14 formed thereto and the fine uneven part 14 is transferred to the surface of the resin 12. Accordingly, a transfer method includes a process of dripping the resin 12 of low viscosity on the molding surface of the glass base material 11 to uniformly coat the molding surface of the glass base material 11, a process of temporarily curing the coated resin 12 before the resin 12 comes into contact with the transfer surface, a process of pressing the transfer surface to the temporarily cured resin 12, a process of finally curing the resin 12 in the pressed state and a process of releasing a composite 22 containing the finally cured resin 12. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、樹脂材料の表面に微細凹凸部を転写する転写方法及びその転写方法によって製造された光学素子に関する。   The present invention relates to a transfer method for transferring fine irregularities on the surface of a resin material and an optical element manufactured by the transfer method.

光学系のレンズにおいて、1点から出た光線がレンズを通過した後、1点に集まらずに散らばってしまう現象(「収差」という)が生じる。この収差のうち、色収差は、光の波長によって屈折率が異なる性質があることに起因する。この光学系の色収差を補正する方法として、従来、回折光学素子を用いた技術が公知である。   In a lens of an optical system, after a light beam emitted from one point passes through the lens, a phenomenon (called “aberration”) occurs that the light rays are scattered without being collected at one point. Among these aberrations, chromatic aberration is caused by the property that the refractive index varies depending on the wavelength of light. As a method for correcting the chromatic aberration of this optical system, a technique using a diffractive optical element is conventionally known.

例えば、特許文献1には、微細凹凸部を転写する技術が開示されている。この技術では、まず、平面状の透明基板の表面に光硬化樹脂を塗布している。そして、この光硬化樹脂に微細な凹凸部の原版を序々に密着させている。次に、透明基板に原版と反対側から光線を照射して光硬化樹脂を硬化させている。なお、硬化の際、原版を序々に移動させている。   For example, Patent Document 1 discloses a technique for transferring a fine uneven portion. In this technique, first, a photo-curing resin is applied to the surface of a flat transparent substrate. And the original of a fine uneven part is made to adhere to this photocuring resin gradually. Next, the light curing resin is cured by irradiating the transparent substrate with light from the side opposite to the original. In addition, the original plate is moved gradually during curing.

また、特許文献2には、フレア光の発生を抑える技術が開示されている。この技術では、回折格子の縦面に艶消し処理を施している。すなわち、表面粗さの異なる2層の炭素系膜を成膜することで、回折格子部分の縦面のみを微細構造化する。この形状を成形品に転写することで、回折光学素子の縦面に艶消し処理が施される。
特開2004−205924号公報 特開2006−162863号公報
Patent Document 2 discloses a technique for suppressing the generation of flare light. In this technique, the vertical surface of the diffraction grating is matted. That is, by forming two layers of carbon-based films having different surface roughnesses, only the vertical surface of the diffraction grating portion is made fine. By transferring this shape to the molded product, the vertical surface of the diffractive optical element is matted.
JP 2004-205924 A JP 2006-162863 A

特許文献1では、平面状のガラス基板上に紫外線硬化樹脂を滴下し、微細凹凸部を有する金型により紫外線硬化樹脂を拡げている。このとき、ガラス基板の表面には微細凹凸部がないため、紫外線硬化樹脂の滴下時における気泡の巻込みはあまり問題とならない。   In Patent Document 1, an ultraviolet curable resin is dropped on a flat glass substrate, and the ultraviolet curable resin is spread by a mold having fine irregularities. At this time, since there are no fine uneven portions on the surface of the glass substrate, the entrainment of bubbles at the time of dropping the ultraviolet curable resin is not a problem.

しかしながら、ガラス基板上に滴下された樹脂と微細凹凸部を有する金型とが接触した瞬間に、微細凹凸部に対し樹脂が拡がるため、気泡を巻き込み易い。そして、この気泡が光学性能に悪影響を及ぼすため、製品の歩留りが低下する。   However, since the resin spreads on the fine irregularities at the moment when the resin dropped on the glass substrate comes into contact with the mold having the fine irregularities, it is easy to entrain bubbles. And since this bubble has a bad influence on optical performance, the yield of a product falls.

特許文献2では、微細凹凸部(回折格子)を有する金型に紫外線硬化型樹脂を滴下し、ガラス基板により紫外線硬化型樹脂を拡げた後に紫外線を照射して硬化させている。
しかし、微細凹凸部を有する金型に紫外線硬化型樹脂を滴下する場合、該紫外線硬化型樹脂が微細凹凸部に接して拡がる時に気泡を巻き込み易い。このため、特許文献1と同様に歩留りが低下する。また、この気泡混入を除去するために、真空容器内を減圧して気泡を抜く脱泡工程を入れている。このため、生産性が低下する。
In Patent Document 2, an ultraviolet curable resin is dropped onto a mold having a fine uneven portion (diffraction grating), and the ultraviolet curable resin is spread by a glass substrate and then cured by irradiation with ultraviolet rays.
However, when an ultraviolet curable resin is dropped onto a mold having fine uneven portions, bubbles are easily involved when the ultraviolet curable resin spreads in contact with the fine uneven portions. For this reason, a yield falls like patent document 1. Moreover, in order to remove this bubble mixing, the deaeration process which decompresses the inside of a vacuum vessel and extracts a bubble is put. For this reason, productivity falls.

また、特許文献1及び特許文献2の両技術ともに、基材と金型の間に硬化性樹脂を介在させた後、硬化を行っているため、樹脂硬化時の樹脂収縮(硬化収縮)量が大きく、微細凹凸部の破損が発生する。   Moreover, since both the techniques of Patent Document 1 and Patent Document 2 are cured after a curable resin is interposed between the substrate and the mold, the amount of resin shrinkage (curing shrinkage) during resin curing is small. Large and fine irregularities are damaged.

本発明は斯かる課題を解決するためになされたもので、樹脂材料を仮硬化した後に微細凹凸部が形成された金型転写面を樹脂材料に転写することにより、気泡混入のない微細凹凸部を得ることのできる転写方法及びその転写方法によって製造された光学素子を提供することを目的とする。   The present invention has been made in order to solve such a problem, and by transferring a mold transfer surface on which a fine uneven portion has been formed to a resin material after temporarily curing the resin material, the fine uneven portion having no air bubbles mixed therein. It is an object of the present invention to provide a transfer method capable of obtaining the above and an optical element manufactured by the transfer method.

また、微細凹凸部を確実に成形できる転写方法及びその転写方法によって製造された光学素子を提供することを目的とする。   It is another object of the present invention to provide a transfer method capable of reliably forming fine irregularities and an optical element manufactured by the transfer method.

前記目的を達成するため、請求項1に係る発明は、
微細凹凸部が形成された金型の転写面を用いて樹脂材料の表面に前記微細凹凸部を転写する転写方法において、
基材の成形面に前記樹脂材料を滴下して塗布する工程と、
該塗布した前記樹脂材料が前記金型転写面に接触する前に仮硬化する工程と、
該仮硬化した前記樹脂材料に前記金型転写面を押圧する工程と、
該押圧した状態で前記樹脂材料を本硬化する工程と、
該本硬化した前記樹脂材料及び前記基材を含む複合体を離型する工程と、を備えることを特徴とする。
In order to achieve the object, the invention according to claim 1
In the transfer method of transferring the fine irregularities on the surface of the resin material using the transfer surface of the mold in which the fine irregularities are formed,
Dropping and applying the resin material on the molding surface of the substrate;
A step of temporarily curing the applied resin material before contacting the mold transfer surface;
Pressing the mold transfer surface against the temporarily cured resin material;
A step of fully curing the resin material in the pressed state;
And releasing the composite containing the resin material and the base material that have been cured.

請求項2に係る発明は、請求項1に記載の転写方法において、
前記仮硬化する工程は、前記樹脂材料の硬化率を20%〜70%にすることを特徴とする。
The invention according to claim 2 is the transfer method according to claim 1,
The temporary curing step is characterized in that the curing rate of the resin material is 20% to 70%.

請求項3に係る発明は、請求項1又は2に記載の転写方法において、
前記押圧する工程は、最初に前記仮硬化した前記樹脂材料と前記金型転写面の一部を接触させ、その後、徐々に接触面を拡げるように押圧することを特徴とする。
The invention according to claim 3 is the transfer method according to claim 1 or 2,
In the pressing step, the temporarily cured resin material and a part of the mold transfer surface are brought into contact with each other, and thereafter, the pressing is performed so as to gradually widen the contact surface.

請求項4に係る発明は、請求項1〜3のいずれかに記載の転写方法において、
前記押圧する工程では、前記基材成形面の曲率半径をR1、前記金型転写面の曲率半径の曲率半径をR2としたとき、
前記金型転写面が平面あるいは凹面の場合、該基材成形面を|R1|<|R2|を満足する凸面とし、
前記金型転写面が凸面の場合、該基材成形面を|R1|>|R2|を満足する凹面としたことを特徴とする。
The invention according to claim 4 is the transfer method according to any one of claims 1 to 3,
In the pressing step, when the curvature radius of the base material molding surface is R1, and the curvature radius of the mold transfer surface is R2,
When the mold transfer surface is flat or concave, the substrate molding surface is a convex surface satisfying | R1 | <| R2 |
When the mold transfer surface is a convex surface, the base material molding surface is a concave surface satisfying | R1 |> | R2 |.

請求項5に係る発明は、請求項1〜4のいずれかに記載の転写方法において、
前記本硬化の際に、前記基材と前記金型転写面とを近接方向に移動しながら押圧することを特徴とする。
The invention according to claim 5 is the transfer method according to any one of claims 1 to 4,
In the main curing, the substrate and the mold transfer surface are pressed while moving in the proximity direction.

請求項6に係る発明は、請求項1〜5のいずれかに記載の転写方法によって製造された光学素子において、
前記基板と前記樹脂材料を備えていることを特徴とする。
The invention according to claim 6 is the optical element manufactured by the transfer method according to any one of claims 1 to 5,
It comprises the substrate and the resin material.

本発明によれば、気泡混入のない微細凹凸部を得ることができる。また、成形が確実に行われた微細凹凸部を得ることができる。   According to the present invention, a fine concavo-convex portion free from bubbles can be obtained. Moreover, the fine uneven | corrugated | grooved part by which shaping | molding was performed reliably can be obtained.

以下、図面に基づき本発明の実施の形態を説明する。
(概要説明)
図1(a)〜(g)は、本発明の実施形態の概要を示す図である。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
(Overview)
1A to 1G are diagrams showing an outline of an embodiment of the present invention.

本実施形態では、図1(a)に示すように、ガラス基材11の成形面11a上に、ノズル10からエネルギー硬化型樹脂1を滴下して塗布する(塗布工程)。エネルギー硬化型樹脂1としては、熱硬化型樹脂12や紫外線硬化型樹脂13(後述の実施の形態を参照)がある。また、ガラス基材11の成形面11aは、本実施形態では滑らかな凹曲面になっている。   In this embodiment, as shown to Fig.1 (a), the energy curable resin 1 is dripped and apply | coated on the molding surface 11a of the glass base material 11 from the nozzle 10 (application | coating process). Examples of the energy curable resin 1 include a thermosetting resin 12 and an ultraviolet curable resin 13 (see the embodiments described later). Moreover, the molding surface 11a of the glass base material 11 is a smooth concave curved surface in this embodiment.

そして、図1(b)に示すように、塗布したエネルギー硬化型樹脂1を、ほぼ均一の厚みに展延する(展延工程)。次いで、図1(c)に示すように、エネルギー硬化型樹脂1に、紫外線ランプ15によってエネルギー(紫外線)を照射して、このエネルギー硬化型樹脂1を半硬化状(仮硬化)にする(仮硬化工程)。   Then, as shown in FIG. 1B, the applied energy curable resin 1 is spread to a substantially uniform thickness (a spreading step). Next, as shown in FIG. 1C, the energy curable resin 1 is irradiated with energy (ultraviolet light) by an ultraviolet lamp 15 to make the energy curable resin 1 semi-cured (temporarily cured) (temporary). Curing step).

更に、図1(d)に示すように、この半硬化したエネルギー硬化型樹脂1と金型16の転写面を接触させ、さらに、半硬化したエネルギー硬化型樹脂1に、金型16の転写面を押し付ける(押圧工程)。なお、この金型16の転写面には、微細凹凸部14が形成されている。   Further, as shown in FIG. 1D, the semi-cured energy curable resin 1 and the transfer surface of the mold 16 are brought into contact with each other, and the semi-cured energy curable resin 1 is further contacted with the transfer surface of the mold 16. Is pressed (pressing step). A fine uneven portion 14 is formed on the transfer surface of the mold 16.

そして、図1(e)に示すように、エネルギー硬化型樹脂1に、紫外線ランプ15によってエネルギー(紫外線)を照射して、エネルギー硬化型樹脂1を硬化させる(本硬化工程)。その際、金型16をガラス基材11に近接させながら、エネルギー照射を行う。最後に、図1(f)に示すように、ガラス基材11とエネルギー硬化型樹脂1(複合体)を金型16から離型する(離型工程)。   Then, as shown in FIG. 1 (e), the energy curable resin 1 is irradiated with energy (ultraviolet light) by an ultraviolet lamp 15 to cure the energy curable resin 1 (main curing step). At that time, energy irradiation is performed while bringing the mold 16 close to the glass substrate 11. Finally, as shown in FIG. 1F, the glass substrate 11 and the energy curable resin 1 (composite) are released from the mold 16 (release process).

上記のように、本実施形態では、エネルギー硬化型樹脂1と微細凹凸部14を接触させる前に、エネルギー硬化型樹脂1を半硬化状にしている。この点について説明する。
エネルギー硬化型樹脂1は、未硬化の状態では液体である。そのため、エネルギー硬化型樹脂1を微細凹凸部14に接触させると、微細凹凸部14と樹脂の「ぬれ性」により、エネルギー硬化型樹脂1に気泡が巻き込まれるおそれがある。この「ぬれ性」とは、例えば液体を固体表面に滴下した場合、液体が気体を押しのけながら周囲に拡がっていく現象のことをいう。
As described above, in the present embodiment, the energy curable resin 1 is made semi-cured before the energy curable resin 1 and the fine uneven portion 14 are brought into contact with each other. This point will be described.
The energy curable resin 1 is a liquid in an uncured state. For this reason, when the energy curable resin 1 is brought into contact with the fine concavo-convex portion 14, there is a possibility that bubbles are caught in the energy curable resin 1 due to the “wetting properties” of the fine concavo-convex portion 14 and the resin. The “wetting property” refers to a phenomenon in which, for example, when a liquid is dropped on the surface of a solid, the liquid spreads around the gas while pushing the gas.

エネルギー硬化型樹脂1が、未硬化(液体)の状態で微細凹凸部14に接触すると、エネルギー硬化型樹脂1は、自身(エネルギー硬化型樹脂1)と微細凹凸部14の間にある空気を押しのけながら、素早く周囲に拡がっていく。しかしながら、微細凹凸部14では凹部18が存在する(図1(g)参照)。   When the energy curable resin 1 comes into contact with the fine concavo-convex portion 14 in an uncured (liquid) state, the energy curable resin 1 pushes the air between itself (energy curable resin 1) and the fine concavo-convex portion 14. While spreading quickly around. However, there are recesses 18 in the fine irregularities 14 (see FIG. 1G).

そのため、図1(g)に示すように、凹部18内にエネルギー硬化型樹脂1が充填する前に樹脂が拡がり、凹部18内に空気20が閉じ込められてしまう。そして、この閉じ込められた空気が、気泡となってエネルギー硬化型樹脂1内に残ってしまう。   Therefore, as shown in FIG. 1G, the resin expands before the energy curable resin 1 is filled in the recess 18, and the air 20 is trapped in the recess 18. Then, the trapped air becomes bubbles and remains in the energy curable resin 1.

そこで、本実施形態では、エネルギー硬化型樹脂13と微細凹凸部14を接触させる前、すなわち仮硬化する工程において、エネルギー硬化型樹脂1を半硬化状(硬化率が20%〜70%、好ましくは30%〜50%)に仮硬化している。そして、その後に、エネルギー硬化型樹脂1と微細凹凸部14を接触させている。なお、硬化率については後述する。   Therefore, in the present embodiment, the energy curable resin 1 is semi-cured (the curing rate is 20% to 70%, preferably before the energy curable resin 13 and the fine uneven portion 14 are brought into contact with each other, that is, in the step of temporarily curing. 30% to 50%). Thereafter, the energy curable resin 1 and the fine concavo-convex portion 14 are brought into contact with each other. The curing rate will be described later.

このようにすると、エネルギー硬化型樹脂1が拡がっていく速さは、未硬化の状態に比べて遅くなる。そのため、エネルギー硬化型樹脂1は、自身(エネルギー硬化型樹脂1)と微細凹凸部14の間にある空気20を、確実に押しのけながら周囲に拡がっていく。すなわち、凹部18内の空気20も確実に押しのけることができる。その結果、気泡混入のない微細凹凸部14を得ることができる。   If it does in this way, the speed which the energy curable resin 1 spreads will become slow compared with an uncured state. Therefore, the energy curable resin 1 spreads around the air 20 between the self (energy curable resin 1) and the fine concavo-convex portion 14 while reliably pushing away. That is, the air 20 in the recess 18 can also be reliably pushed away. As a result, the fine concavo-convex portion 14 free from bubbles can be obtained.

ここで、微細凹凸部14をエネルギー硬化型樹脂1に押し付けても良いが、エネルギー硬化型樹脂1を微細凹凸部14に押し付けても良い。
また、押圧する工程においては、仮硬化したエネルギー硬化型樹脂1と微細凹凸部14の接触は、両者の一部を最初に接触させ、その後、徐々に接触面を拡げるように押圧するのが好ましい。
Here, although the fine uneven part 14 may be pressed against the energy curable resin 1, the energy curable resin 1 may be pressed against the fine uneven part 14.
In the pressing step, it is preferable that the temporarily cured energy curable resin 1 and the fine concavo-convex portion 14 are pressed so that a part of both contacts first and then the contact surface is gradually expanded. .

例えば、エネルギー硬化型樹脂1の樹脂層の表面の形状と、微細凹凸部14の基本形状(微細凹凸を除いたときの形状)が同じだとする。この場合、樹脂層の一端と微細凹凸部14の一端が最初に接触するように、微細凹凸部14側とエネルギー硬化型樹脂1側の少なくとも一方を傾ければよい。   For example, it is assumed that the shape of the surface of the resin layer of the energy curable resin 1 is the same as the basic shape (the shape when the fine unevenness is removed) of the fine unevenness 14. In this case, at least one of the fine concavo-convex portion 14 side and the energy curable resin 1 side may be inclined so that one end of the resin layer and one end of the fine concavo-convex portion 14 contact each other first.

また、例えば、エネルギー硬化型樹脂1の表面形状が曲面の場合、樹脂層の中心と微細凹凸部14の中心が最初に接触するように、微細凹凸部14の基本形状を設定すればよい。   Further, for example, when the surface shape of the energy curable resin 1 is a curved surface, the basic shape of the fine uneven portion 14 may be set so that the center of the resin layer and the center of the fine uneven portion 14 are in contact first.

具体的には、後述する図11に示すように、ガラス基材11の成形面11aの曲率半径をR1、金型転写面の曲率半径をR2としたとき、金型転写面が平面あるいは凹面の場合、ガラス基材11の成形面11aを|R1|<|R2|を満足する凸面とし、また、後述する図9に示すように、金型転写面が凸面の場合、ガラス基材11の成形面11aを|R1|>|R2|を満足する凹面とする。なお、金型転写面とは、微細凹凸部14の基本形状のことである。   Specifically, as shown in FIG. 11 described later, when the curvature radius of the molding surface 11a of the glass substrate 11 is R1, and the curvature radius of the mold transfer surface is R2, the mold transfer surface is flat or concave. In this case, if the molding surface 11a of the glass substrate 11 is a convex surface satisfying | R1 | <| R2 |, and the mold transfer surface is a convex surface as shown in FIG. The surface 11a is a concave surface that satisfies | R1 |> | R2 |. The mold transfer surface is a basic shape of the fine uneven portion 14.

ここで、エネルギー硬化型樹脂1が上記の硬化率を有する場合、金型16の転写面に形成された微細凹凸部14でエネルギー硬化型樹脂1を押圧すると、エネルギー硬化型樹脂1は微細凹凸部14に合わせて徐々に変形する。その結果、そのままの形状が転写される。   Here, when the energy curable resin 1 has the above-described curing rate, when the energy curable resin 1 is pressed by the fine concavo-convex portion 14 formed on the transfer surface of the mold 16, the energy curable resin 1 becomes the fine concavo-convex portion. Deforms gradually in accordance with 14. As a result, the shape as it is is transferred.

このように、エネルギー硬化型樹脂1を仮硬化した後に押圧を行うことで、微細凹凸部14の一部がエネルギー硬化型樹脂1に点接触または線接触する。そして、接触面(接触範囲)が徐々に拡がっていくようになる。従って、微細凹凸部14の凹部18に介在する空気20が、樹脂層内に入り込む余地はなく、よって気泡の巻き込みが防止される。   In this way, by pressing after the energy curable resin 1 is temporarily cured, a part of the fine concavo-convex portion 14 is in point contact or line contact with the energy curable resin 1. Then, the contact surface (contact range) gradually expands. Therefore, there is no room for the air 20 intervening in the concave portion 18 of the fine concave and convex portion 14 to enter the resin layer, so that entrainment of bubbles is prevented.

すなわち、金型16の転写面に形成された微細凹凸部14の多数の凹部18に樹脂が充填される際、該凹部18内の空気20は半硬化状の樹脂内に巻き込まれずに押しのけられて外部に逃げだすものと思料される。これにより、微細凹凸部14が転写された樹脂層には、気泡の巻き込みのない微細凹凸部14’(図4等参照)が得られる。   That is, when the resin is filled into the many concave portions 18 of the fine uneven portions 14 formed on the transfer surface of the mold 16, the air 20 in the concave portions 18 is pushed away without being caught in the semi-cured resin. It seems to run away. As a result, a fine uneven portion 14 ′ (see FIG. 4 and the like) free from bubbles is obtained in the resin layer to which the fine uneven portion 14 has been transferred.

また、エネルギー硬化型樹脂1が上記の硬化率を有することで、エネルギー硬化型樹脂1の厚さの均一性が失われないようにすることもできる。
なお、硬化率とは、例えば(エネルギー硬化型)樹脂の硬化がどの程度進んでいるか、その割合を表す値である。ここで、これ以上硬化が進まない状態(完全硬化状態)を100%とし、全く硬化が進んでいない状態(未硬化状態)を0%とする。例えば、示差走査熱量測定法を用いた熱分析により、樹脂が硬化する際に発生する熱量から硬化率を測定する場合、硬化率は、次式で定義される。
Moreover, since the energy curable resin 1 has the above-described curing rate, the uniformity of the thickness of the energy curable resin 1 can be prevented from being lost.
The curing rate is a value representing, for example, how much curing of the (energy curable) resin has progressed. Here, a state where the curing does not proceed further (completely cured state) is 100%, and a state where the curing is not progressing (uncured state) is 0%. For example, when the curing rate is measured from the amount of heat generated when the resin is cured by thermal analysis using a differential scanning calorimetry method, the curing rate is defined by the following equation.

硬化率=(1−(半硬化樹脂を完全硬化させるまでに発生する熱量)/(未硬化樹脂を完全硬化させるまでに発生する全熱量))×100
このように、エネルギー硬化型樹脂1の熱量を測定することで、硬化率を求めることができる。
Curing rate = (1− (amount of heat generated until the semi-cured resin is completely cured) / (total amount of heat generated until the uncured resin is completely cured)) × 100
Thus, the curing rate can be obtained by measuring the amount of heat of the energy curable resin 1.

なお、硬化率の測定は、示差走査熱量測定法による以外にも、例えば赤外吸収スペクトル法、溶剤抽出法、機械的物性値による測定法等が知られている。
(第1の実施の形態)
図2(a)〜(e)は、平面研磨したガラス基材(外径Φ15mm、厚さ2mm)11上にエネルギー硬化型樹脂としての熱硬化型樹脂12を塗布し、この樹脂に微細凹凸部14を転写する実施の形態を示す図である。
In addition to the differential scanning calorimetry method, for example, an infrared absorption spectrum method, a solvent extraction method, and a measurement method using mechanical property values are known for the measurement of the curing rate.
(First embodiment)
2 (a) to 2 (e) illustrate a case where a thermosetting resin 12 as an energy curable resin is applied on a glass substrate 11 (outer diameter Φ15 mm, thickness 2 mm) 11 that has been polished flat, and fine uneven portions are applied to the resin. 14 is a diagram showing an embodiment in which 14 is transferred.

すなわち、図2(a)に示すように、平板状のガラス基材11の成形面11aに、熱硬化型樹脂12とガラス基材11との密着性を上げるためのカップリング処理を行なう。その後、図2(b)に示すように、スピンナ一によりガラス基材11を1500rpmで回転し、その成形面11aにウレタン系の熱硬化型樹脂12を均一に塗布する。こうして、塗布された熱硬化型樹脂12を均等に引き伸ばして、樹脂厚さが約0.1mmの樹脂層を形成する。なお、本実施の形態で用いた樹脂は、25℃における粘度が約500cpsである。   That is, as shown in FIG. 2A, a coupling process for increasing the adhesion between the thermosetting resin 12 and the glass substrate 11 is performed on the molding surface 11 a of the flat glass substrate 11. Thereafter, as shown in FIG. 2B, the glass substrate 11 is rotated at 1500 rpm by a spinner, and the urethane-based thermosetting resin 12 is uniformly applied to the molding surface 11a. In this way, the applied thermosetting resin 12 is uniformly stretched to form a resin layer having a resin thickness of about 0.1 mm. The resin used in this embodiment has a viscosity at 25 ° C. of about 500 cps.

次に、この樹脂層に対して80℃で4分間加熱を行い、樹脂層を仮硬化する。この時、樹脂の硬化率は、本実施形態では約30%とした。この硬化率では、弱い圧力を加えると変形する程度のゲル状態(弾性体)となっている。   Next, this resin layer is heated at 80 ° C. for 4 minutes to temporarily cure the resin layer. At this time, the curing rate of the resin was about 30% in this embodiment. At this curing rate, the gel state (elastic body) is such that it deforms when a weak pressure is applied.

次に、図2(c)に示すように、転写面に微細凹凸部14が形成された金型16を、樹脂層にほぼ平行に対向配置する。更に、図2(d)に示すように、樹脂層の厚さが0.08mm程度になるまで、金型16の転写面を樹脂層に押し付ける。   Next, as shown in FIG. 2 (c), the mold 16 having the fine irregularities 14 formed on the transfer surface is arranged to face the resin layer substantially in parallel. Further, as shown in FIG. 2D, the transfer surface of the mold 16 is pressed against the resin layer until the thickness of the resin layer becomes about 0.08 mm.

その後、図2(d)に示した状態のまま、80℃で30分間加熱を行い、樹脂層を完全に硬化させる。
更に、図2(e)に示すように、金型16の転写面を樹脂層から剥離することで、樹脂層の転写面側には微細凹凸部14が反転された微細凹凸部14’が形成される。こうして、ガラス基材11と微細凹凸部14’を有する熱硬化型樹脂12とからなる複合体(微細構造体)22が得られる。
Thereafter, in the state shown in FIG. 2 (d), heating is performed at 80 ° C. for 30 minutes to completely cure the resin layer.
Further, as shown in FIG. 2 (e), by separating the transfer surface of the mold 16 from the resin layer, a fine uneven portion 14 'in which the fine uneven portion 14 is inverted is formed on the transfer surface side of the resin layer. Is done. In this way, a composite body (microstructure) 22 composed of the glass substrate 11 and the thermosetting resin 12 having the fine uneven portions 14 ′ is obtained.

なお、本実施形態において、金型16の転写面に形成された微細凹凸部14は、反射防止構造である。その製法は、石英基板上に電子ビームによってレジストパターンを形成した後、エッチングすることで、石英基板上に微細な四角錐の周期構造を形成する。   In the present embodiment, the fine irregularities 14 formed on the transfer surface of the mold 16 have an antireflection structure. In the manufacturing method, a resist pattern is formed on a quartz substrate by an electron beam and then etched to form a periodic structure of a fine quadrangular pyramid on the quartz substrate.

図3は、金型16の転写面の微細凹凸部14の外観図である。この微細凹凸部14は、多数の凹部18と凸部19を有し、ピッチpが150nm,高さhが250nmとなっている。   FIG. 3 is an external view of the fine uneven portion 14 on the transfer surface of the mold 16. The fine concavo-convex portion 14 has a large number of concave portions 18 and convex portions 19, and the pitch p is 150 nm and the height h is 250 nm.

図4は、熱硬化型樹脂12に転写により形成された微細凹凸部14’の外観図である。この微細凹凸部14’は、多数の凹部18’と凸部19’を有し、しかも凸部19’の内部に気泡の巻き込みがない点が特徴である。   FIG. 4 is an external view of the fine concavo-convex portion 14 ′ formed by transfer on the thermosetting resin 12. This fine concavo-convex portion 14 ′ has a feature that it has a large number of concave portions 18 ′ and convex portions 19 ′, and there is no bubble entrainment inside the convex portions 19 ′.

本実施形態によれば、気泡の巻き込みがない微細凹凸部14’を得ることができる。これにより、この微細凹凸部14の転写方法を、例えば光学系に応用することで光学性能の良い複合光学素子を得ることができる。   According to the present embodiment, it is possible to obtain a fine concavo-convex portion 14 ′ in which no bubbles are involved. Thus, a composite optical element having good optical performance can be obtained by applying the transfer method of the fine uneven portion 14 to, for example, an optical system.

また、本実施形態では、金型16の転写面に熱硬化型樹脂12を接触させる前に、該熱硬化型樹脂12の仮硬化を行っている。このため、既に熱硬化型樹脂12の硬化収縮が進行しており、本硬化時の硬化収縮量が小さい。これにより、微細凹凸部14’が不用意に破損するのを防止することができる。
(第2の実施の形態)
図5(a)〜(d)は、平面研磨したガラス基材(外径Φ15mm、厚さ2mm)11上に熱硬化型樹脂12を塗布し、この樹脂に微細凹凸部14を転写する実施の形態を示す図である。なお、第1の実施の形態と同一又は相当する部材には同一の符号を付して説明する。
In the present embodiment, the thermosetting resin 12 is temporarily cured before the thermosetting resin 12 is brought into contact with the transfer surface of the mold 16. For this reason, the curing shrinkage of the thermosetting resin 12 has already progressed, and the amount of curing shrinkage during the main curing is small. Thereby, it can prevent that fine uneven | corrugated | grooved part 14 'is damaged carelessly.
(Second Embodiment)
5 (a) to 5 (d) show an embodiment in which a thermosetting resin 12 is applied on a glass substrate 11 (outer diameter Φ15 mm, thickness 2 mm) 11 that has been flat-polished, and fine irregularities 14 are transferred to this resin. It is a figure which shows a form. In addition, the same code | symbol is attached | subjected and demonstrated to the member which is the same as that of 1st Embodiment, or corresponds.

また、第1の実施の形態とは、熱硬化型樹脂12と金型16の接触のさせ方が相違している。
図5(a)に示すように、平板状のガラス基材11の成形面11aに、熱硬化型樹脂12とガラス基材11の密着性を上げるためのカップリング処理を行なう。その後、スピンナ一によりガラス基材11を1500rpmで回転し、ウレタン系の熱硬化型樹脂12を均一に塗布する。こうして、樹脂厚さが約0.1mmの樹脂層を形成する。なお、本実施の形態で用いた樹脂は、25℃における粘度が約500cpsである。
Further, the method of contacting the thermosetting resin 12 and the mold 16 is different from that of the first embodiment.
As shown in FIG. 5A, a coupling process for increasing the adhesion between the thermosetting resin 12 and the glass substrate 11 is performed on the molding surface 11 a of the flat glass substrate 11. Thereafter, the glass substrate 11 is rotated at 1500 rpm by a spinner to uniformly apply the urethane-based thermosetting resin 12. Thus, a resin layer having a resin thickness of about 0.1 mm is formed. The resin used in this embodiment has a viscosity at 25 ° C. of about 500 cps.

そして、この樹脂層に対して80℃で4分間加熱を行い、樹脂層を仮硬化する。この時、樹脂の硬化率は約30%とした。この状態では、樹脂に弱い圧力を加えると変形する程度のゲル状態となっている。   Then, the resin layer is heated at 80 ° C. for 4 minutes to temporarily cure the resin layer. At this time, the curing rate of the resin was about 30%. In this state, the gel state is such that it deforms when a weak pressure is applied to the resin.

なお、本実施形態に用いた金型転写面の微細凹凸部14は、第1の実施の形態と同様である。
そして、図5(a)に示すように、転写面に微細凹凸部14が形成された金型16を、樹脂面に対して約2°傾けた状態で対向配置する。次いで、図5(b)に示すように、樹脂層の一端(図の右端)から金型16の転写面を接触させる。更に、金型16の転写面の一端を中心として他端を回転させるようにして、金型転写面が樹脂層を平行に押し付ける。すなわち、金型16の傾きを徐々に平行に戻すようにする。
Note that the fine irregularities 14 on the mold transfer surface used in this embodiment are the same as those in the first embodiment.
Then, as shown in FIG. 5 (a), the mold 16 having the fine irregularities 14 formed on the transfer surface is opposed to the resin surface in an inclined state of about 2 °. Next, as shown in FIG. 5B, the transfer surface of the mold 16 is brought into contact with one end (the right end in the figure) of the resin layer. Further, the mold transfer surface presses the resin layer in parallel so that the other end is rotated around one end of the transfer surface of the mold 16. That is, the inclination of the mold 16 is gradually returned to parallel.

すると、図5(c)に示すように、傾斜した金型転写面は、当初は樹脂層に対し点接触又は線接触の状態から、徐々に樹脂層の接触面を拡げるように作用する。こうして、樹脂層の厚さが均一に0.08mm程度になるまで金型転写面を樹脂層に押し付ける。   Then, as shown in FIG. 5C, the inclined mold transfer surface acts to gradually expand the contact surface of the resin layer from the point contact or line contact state to the resin layer. In this way, the mold transfer surface is pressed against the resin layer until the thickness of the resin layer is uniformly about 0.08 mm.

その後、80℃で30分間加熱を行い、樹脂層を完全に硬化させる。
更に、図5(d)に示すように、金型16の転写面を樹脂層からほぼ平行に剥離することで、気泡の巻き込みがない微細凹凸部14’を得ることができる。こうして、ガラス基材11と微細凹凸部14’が形成された複合体22が得られる。
Thereafter, heating is performed at 80 ° C. for 30 minutes to completely cure the resin layer.
Furthermore, as shown in FIG. 5 (d), by separating the transfer surface of the mold 16 from the resin layer substantially in parallel, a fine uneven portion 14 ′ free from entrainment of bubbles can be obtained. In this way, the composite body 22 in which the glass substrate 11 and the fine concavo-convex portions 14 ′ are formed is obtained.

本実施形態によれば、金型16の転写面の一部が樹脂に接触した後、該金型転写面が徐々に接触面を拡げるように押圧するため、微細凹凸部14’を形成する時の気泡の巻込みを防止することができる。
(変形例)
第1及び第2の実施の形態においては、金型16の転写面に形成された微細凹凸部14が、四角錐の凸部19を有する場合を例として説明したが、これに限らず、円錐や六角錐等の多角錐であっても良い。さらに、微細凹凸部は規則的な凹凸パターン形状である必要も無く、数ミクロン以下のピッチと高さを有する不規則的な凹凸構造であっても良い。
According to this embodiment, after a part of the transfer surface of the mold 16 comes into contact with the resin, the mold transfer surface is pressed so as to gradually expand the contact surface. It is possible to prevent entrainment of bubbles.
(Modification)
In the first and second embodiments, the case where the fine uneven portion 14 formed on the transfer surface of the mold 16 has the convex portion 19 of the quadrangular pyramid has been described as an example. Or a polygonal pyramid such as a hexagonal pyramid. Furthermore, the fine concavo-convex portion does not need to have a regular concavo-convex pattern shape, and may have an irregular concavo-convex structure having a pitch and height of several microns or less.

また、微細凹凸部14は、例えば図6(a)に示すように、ピッチp及び高さhが数ミクロン以下の直線的な矩形形状の凹凸部であっても良い。また、微細凹凸部14は、図6(b)に示すように、ピッチp及び高さhが数ミクロン以下の直線的な鋸歯形状の凹凸部であっても良い。   Moreover, the fine uneven | corrugated | grooved part 14 may be a linear rectangular uneven | corrugated | grooved part whose pitch p and height h are several microns or less, for example, as shown to Fig.6 (a). Further, as shown in FIG. 6B, the fine uneven portion 14 may be a linear saw-tooth uneven portion having a pitch p and a height h of several microns or less.

この場合、樹脂層に金型16の転写面を押圧する際、微細凹凸部14の直線方向と樹脂の接触面の広がる方向を同一にすることで、さらに気泡の混入を防止することができる。
(第3の実施の形態)
図7(a)〜(e)は、平面研磨したガラス基材(外径Φ15mm、厚さ2mm)11上に熱硬化型樹脂12を塗布し、この樹脂に微細凹凸部14を転写する実施の形態を示す図である。なお、第1の実施の形態と同一又は相当する部材には同一の符号を付して説明する。
In this case, when the transfer surface of the mold 16 is pressed against the resin layer, the linear direction of the fine concavo-convex portion 14 and the direction in which the resin contact surface spreads can be made the same to further prevent bubbles from being mixed.
(Third embodiment)
FIGS. 7A to 7E show an implementation in which a thermosetting resin 12 is applied on a glass substrate 11 (outer diameter Φ15 mm, thickness 2 mm) 11 that has been subjected to planar polishing, and fine uneven portions 14 are transferred to this resin. It is a figure which shows a form. In addition, the same code | symbol is attached | subjected and demonstrated to the member which is the same as that of 1st Embodiment, or corresponds.

また、第1の実施の形態と異なる点は、ガラス基材11の厚さが最大厚2mm、最小厚1.9mmの楔形状となっている点である。すなわち、ガラス基材11の成形面11aは、略水平なガラス基材11の底面に対して傾斜している。   The difference from the first embodiment is that the glass substrate 11 has a wedge shape with a maximum thickness of 2 mm and a minimum thickness of 1.9 mm. That is, the molding surface 11 a of the glass substrate 11 is inclined with respect to the bottom surface of the substantially horizontal glass substrate 11.

図7(a)に示すように、楔形状のガラス基材11の成形面11aに、熱硬化型樹脂12とガラス基材11の密着性を上げるためのカップリング処理を行なう。その後、図7(b)に示すように、スピンナ一によりガラス基材11を1000rpmで回転し、その樹脂層形成面11aにエポキシ系の熱硬化型樹脂12を均一に塗布する。こうして、樹脂厚さが約0.2mmの樹脂層を形成する。なお、本実施の形態で用いた樹脂は、25℃における粘度が約1000cpsである。   As shown in FIG. 7A, a coupling process for increasing the adhesion between the thermosetting resin 12 and the glass substrate 11 is performed on the molding surface 11 a of the wedge-shaped glass substrate 11. Thereafter, as shown in FIG. 7B, the glass substrate 11 is rotated at 1000 rpm by a spinner, and the epoxy thermosetting resin 12 is uniformly applied to the resin layer forming surface 11a. Thus, a resin layer having a resin thickness of about 0.2 mm is formed. The resin used in this embodiment has a viscosity at 25 ° C. of about 1000 cps.

次に、この樹脂層に対して80℃で4分間加熱を行い、樹脂層を仮硬化する。この時、樹脂の硬化率は約30%とした。この状態では、樹脂に弱い圧力を加えると変形する程度のゲル状態となっている。   Next, this resin layer is heated at 80 ° C. for 4 minutes to temporarily cure the resin layer. At this time, the curing rate of the resin was about 30%. In this state, the gel state is such that it deforms when a weak pressure is applied to the resin.

次に、図7(c)に示すように、微細凹凸部14が形成された金型16の転写面を、略水平なガラス基材11の底面と平行に対向配置する。このとき、金型転写面は樹脂層の一端(図の右端)にて点接触又は線接触状態となっている。   Next, as shown in FIG. 7 (c), the transfer surface of the mold 16 on which the fine irregularities 14 are formed is disposed opposite to and parallel to the bottom surface of the substantially horizontal glass substrate 11. At this time, the mold transfer surface is in a point contact or line contact state at one end (right end in the figure) of the resin layer.

更に、図7(d)に示すように、樹脂層の厚さが最薄部で0.08mm程度になるまで金型転写面を樹脂層に平行に押し付ける。こうして、樹脂層に対し傾斜した状態の金型16の転写面が、徐々に接触面を拡げるように押圧する。これにより、樹脂層に微細凹凸部14’を形成する時の気泡の巻込みが防止される。   Further, as shown in FIG. 7D, the mold transfer surface is pressed in parallel with the resin layer until the thickness of the resin layer is about 0.08 mm at the thinnest portion. Thus, the transfer surface of the mold 16 inclined with respect to the resin layer is pressed so as to gradually expand the contact surface. This prevents entrainment of bubbles when forming the fine uneven portion 14 ′ in the resin layer.

なお、本実施形態に用いた金型16の微細凹凸部14は、第1の実施の形態と同様である。
その後、図7(d)に示した状態のまま、樹脂層に対して80℃で30分間加熱を行い、樹脂層を完全に硬化させる。
The fine irregularities 14 of the mold 16 used in the present embodiment are the same as those in the first embodiment.
Thereafter, in the state shown in FIG. 7D, the resin layer is heated at 80 ° C. for 30 minutes to completely cure the resin layer.

更に、図7(e)に示すように、金型16の転写面を樹脂層から剥離することで、樹脂層の転写面側には微細凹凸部14が反転した微細凹凸部14’が形成される。こうして、ガラス基材11と、微細凹凸部14’が形成された熱硬化型樹脂12とを有する複合体22が得られる。   Further, as shown in FIG. 7E, by separating the transfer surface of the mold 16 from the resin layer, a fine uneven portion 14 ′ in which the fine uneven portion 14 is inverted is formed on the transfer surface side of the resin layer. The In this way, a composite 22 having the glass substrate 11 and the thermosetting resin 12 having the fine irregularities 14 ′ is obtained.

本実施形態によれば、微細凹凸部14’を形成する時の気泡の混入を防止することができる。また、金型16の転写面とガラス基材11の樹脂層形成面11aとは、当初から傾斜しているため、転写面を樹脂層に近接する際、金型16の動作が直線的で済む。このため、装置構成を簡略化することができる。
(第4の実施の形態)
図8(a)〜(e)は、滑らかに研磨したガラス基材(外径Φ15mm、厚さ2mm)11上に熱硬化型樹脂12を塗布し、この樹脂に微細凹凸部14を転写する実施の形態を示す図である。
According to the present embodiment, it is possible to prevent air bubbles from being mixed when the fine uneven portion 14 ′ is formed. Further, since the transfer surface of the mold 16 and the resin layer forming surface 11a of the glass substrate 11 are inclined from the beginning, the operation of the mold 16 is linear when the transfer surface is brought close to the resin layer. . For this reason, an apparatus structure can be simplified.
(Fourth embodiment)
8A to 8E show an implementation in which a thermosetting resin 12 is applied on a smoothly polished glass substrate (outer diameter Φ15 mm, thickness 2 mm) 11 and fine uneven portions 14 are transferred to the resin. It is a figure which shows the form of.

第3の実施の形態と異なる点は、ガラス基材11の成形面11aが曲率半径R1=800mmの凸面形状を有し、中心部の肉厚が最も厚い2mmで、また、金型16の転写面が平面である点である。すなわち、金型16の転写面の曲率半径R2(∞)よりも、ガラス基材11の成形面の曲率半径R1の方が小さい凸面となっている。   The difference from the third embodiment is that the molding surface 11a of the glass substrate 11 has a convex shape with a radius of curvature R1 = 800 mm, the thickness of the central portion is 2 mm, and the transfer of the mold 16 is performed. The point is that the plane is a plane. That is, the curvature radius R1 of the molding surface of the glass substrate 11 is a convex surface that is smaller than the curvature radius R2 (∞) of the transfer surface of the mold 16.

なお、ガラス基材11の成形面11aと反対面(底面)側は水平面となっている。また、第1の実施の形態と同一又は相当する部材には同一の符号を付して説明する。
図8(a)に示すように、ガラス基材11の成形面11aに、熱硬化型樹脂12とガラス基材11の密着性を上げるためのカップリング処理を行なう。その後、図8(b)に示すように、スピンナ一によりガラス基材11を1000rpmで回転し、その成形面11aにエポキシ系の熱硬化型樹脂12を均一に塗布する。こうして、樹脂厚さが約0.2mmの樹脂層が形成され、樹脂層転写面の曲率半径は、ほぼR1と等しくなる。次に、この樹脂層に対して80℃で8分間加熱を行い、樹脂層を仮硬化する。
In addition, the surface (bottom surface) side opposite to the molding surface 11a of the glass substrate 11 is a horizontal plane. Further, the same or corresponding members as those in the first embodiment will be described with the same reference numerals.
As shown in FIG. 8A, a coupling process for increasing the adhesion between the thermosetting resin 12 and the glass substrate 11 is performed on the molding surface 11 a of the glass substrate 11. Thereafter, as shown in FIG. 8B, the glass substrate 11 is rotated at 1000 rpm by a spinner, and the epoxy thermosetting resin 12 is uniformly applied to the molding surface 11a. Thus, a resin layer having a resin thickness of about 0.2 mm is formed, and the radius of curvature of the resin layer transfer surface is substantially equal to R1. Next, the resin layer is heated at 80 ° C. for 8 minutes to temporarily cure the resin layer.

この時、樹脂の硬化率は約50%であり、この状態では、圧力を加えると変形する程度の硬度となっている。
次に、図8(c)に示すように、微細凹凸部14が形成された金型16の転写面を、ガラス基材11の底面にほぼ平行に対向配置する。更に、図8(d)に示すように、樹脂層の中心部厚さが0.1mm程度になるまで、金型16の転写面を平行に近接移動させて樹脂層に押し付ける。
At this time, the curing rate of the resin is about 50%, and in this state, the hardness is such that it deforms when pressure is applied.
Next, as shown in FIG. 8C, the transfer surface of the mold 16 on which the fine irregularities 14 are formed is disposed so as to face the bottom surface of the glass substrate 11 substantially in parallel. Further, as shown in FIG. 8D, the transfer surface of the mold 16 is moved in parallel and pressed against the resin layer until the center thickness of the resin layer becomes about 0.1 mm.

このとき、中央部が高い樹脂層に対し、水平状態の金型16の転写面が、徐々に接触面を拡げるように押圧する。これにより、樹脂層に微細凹凸部14’を形成する時の気泡の巻込みが防止される。   At this time, the transfer surface of the mold 16 in a horizontal state is pressed against the resin layer having a high central portion so that the contact surface is gradually expanded. This prevents entrainment of bubbles when forming the fine uneven portion 14 ′ in the resin layer.

なお、本実施形態に用いた金型16の微細凹凸部14は、第1の実施の形態と同様である。
その後、図8(d)に示した状態のまま、80℃で25分間加熱を行い、樹脂層を完全に硬化させる。
The fine irregularities 14 of the mold 16 used in the present embodiment are the same as those in the first embodiment.
Thereafter, in the state shown in FIG. 8D, heating is performed at 80 ° C. for 25 minutes to completely cure the resin layer.

更に、図8(e)に示すように、金型16の転写面を樹脂層から剥離することで、樹脂層の転写面側には微細凹凸部14が反転した微細凹凸部14’が形成される。こうして、ガラス基材11と、微細凹凸部14’が形成された熱硬化型樹脂12とを有する複合体22が得られる。   Further, as shown in FIG. 8E, by separating the transfer surface of the mold 16 from the resin layer, a fine uneven portion 14 ′ in which the fine uneven portion 14 is inverted is formed on the transfer surface side of the resin layer. The In this way, a composite 22 having the glass substrate 11 and the thermosetting resin 12 having the fine irregularities 14 ′ is obtained.

本実施形態によれば、金型16の転写面の曲率半径R2よりもガラス基材11の成形面11aの曲率半径R1の方が小さい凸面となっているので、樹脂層転写面の曲率半径も金型転写面の曲率半径R2より小さい凸面となり、金型16の転写面が徐々に樹脂層の接触面を拡げつつ押圧する。このため、樹脂層に微細凹凸部14’を形成する際、該微細凹凸部14’に気泡が巻き込まれるのを防止することができる。
(第5の実施の形態)
図9(a)〜(c)は、研磨ガラス基材(外径Φ20mm、中心厚2mm)11上にエネルギー硬化型樹脂としての紫外線硬化型樹脂13を塗布し、この樹脂に微細凹凸部14を転写する実施の形態を示す図である。
According to this embodiment, since the curvature radius R1 of the molding surface 11a of the glass substrate 11 is smaller than the curvature radius R2 of the transfer surface of the mold 16, the curvature radius of the resin layer transfer surface is also reduced. The convex surface is smaller than the radius of curvature R2 of the mold transfer surface, and the transfer surface of the mold 16 is pressed while gradually expanding the contact surface of the resin layer. For this reason, when forming fine uneven part 14 'in a resin layer, it can prevent that a bubble is caught in this fine uneven part 14'.
(Fifth embodiment)
9 (a) to 9 (c), an ultraviolet curable resin 13 as an energy curable resin is applied on a polished glass substrate (outer diameter Φ20 mm, center thickness 2 mm) 11, and fine uneven portions 14 are formed on the resin. It is a figure which shows embodiment which transfers.

このガラス基材(外径Φ20mm、中心厚2mm)11は、一方の光学機能面が平面と他方の光学機能面が曲率半径R1=42mmの凹面を有している。このガラス基材11は、紫外線(波長365nm)の透過率が50%以上の性質を有している。なお、このガラス基材の成形面曲率半径R1は、金型16の転写面の曲率半径R2よりも大きい値となっている。   This glass substrate (outer diameter Φ20 mm, center thickness 2 mm) 11 has one optical functional surface having a flat surface and the other optical functional surface having a concave surface with a radius of curvature R1 = 42 mm. This glass substrate 11 has the property that the transmittance of ultraviolet rays (wavelength 365 nm) is 50% or more. In addition, the molding surface curvature radius R1 of the glass substrate is larger than the curvature radius R2 of the transfer surface of the mold 16.

なお、第1の実施の形態と同一又は相当する部材には同一の符号を付して説明する。
図9(a)に示すように、ガラス基材の成形面(凹面)11aに、紫外線硬化型樹脂13とガラス基材11の密着性を上げるためのカップリング処理を行なう。その後、スピンナ一によりガラス基材を2000rpmで回転し、その成形面11aにアクリル系の紫外線硬化型樹脂13を均一に塗布する。
In addition, the same code | symbol is attached | subjected and demonstrated to the member which is the same as that of 1st Embodiment, or corresponds.
As shown to Fig.9 (a), the coupling process for raising the adhesiveness of the ultraviolet curable resin 13 and the glass base material 11 is performed to the molding surface (concave surface) 11a of a glass base material. Thereafter, the glass substrate is rotated at 2000 rpm by a spinner, and the acrylic ultraviolet curable resin 13 is uniformly applied to the molding surface 11a.

その後、回転数を1000rpmに回転を落とし、回転した状態で20mWの紫外線を10秒間照射する。こうして、樹脂厚さが約0.15mmの仮硬化された樹脂層が形成され、樹脂層転写面の曲率半径は、ほぼR1と等しくなる。なお、本実施の形態で用いた樹脂は、25℃における粘度が約800cpsである。   Thereafter, the rotation speed is reduced to 1000 rpm, and 20 mW ultraviolet rays are irradiated for 10 seconds in the rotated state. Thus, a temporarily cured resin layer having a resin thickness of about 0.15 mm is formed, and the radius of curvature of the resin layer transfer surface is substantially equal to R1. The resin used in this embodiment has a viscosity at 25 ° C. of about 800 cps.

この時、樹脂の硬化率は約50%であり、圧力を加えると変形する程度の硬度となっている。また、微細凹凸部14が形成された金型16の凸面状の転写面を、ガラス基材11の成形面(凹面)11aに対向配置する。   At this time, the curing rate of the resin is about 50%, and the hardness is such that it deforms when pressure is applied. Further, the convex transfer surface of the mold 16 on which the fine irregularities 14 are formed is disposed opposite to the molding surface (concave surface) 11 a of the glass substrate 11.

次に、図9(b)に示すように、転写面に微細凹凸部14が形成された金型16を、樹脂層の中心部厚さが0.1mm程度になるまで樹脂層に押し付ける。
このとき、金型16の転写面が凸面で、該金型転写面の曲率半径R2よりもガラス基材11の成形面(凹面)11aの曲率半径R1の方が大きいので、樹脂層転写面の曲率半径も金型転写面の曲率半径R2より大きい凹面となり、金型転写面の中央部が樹脂層の中央部に接触した後、徐々に接触面を拡げるように作用する。これにより、樹脂層に微細凹凸部14’を形成する時の気泡の巻込みが防止される。
Next, as shown in FIG. 9B, the mold 16 having the fine irregularities 14 formed on the transfer surface is pressed against the resin layer until the center thickness of the resin layer becomes about 0.1 mm.
At this time, the transfer surface of the mold 16 is convex, and the curvature radius R1 of the molding surface (concave surface) 11a of the glass substrate 11 is larger than the curvature radius R2 of the mold transfer surface. The radius of curvature also becomes a concave surface larger than the radius of curvature R2 of the mold transfer surface, and acts so that the contact surface gradually expands after the central portion of the mold transfer surface contacts the central portion of the resin layer. This prevents entrainment of bubbles when forming the fine uneven portion 14 ′ in the resin layer.

その後、図9(b)の状態のまま、ガラス基材11の底面側から150mWの紫外線を2分間照射することで、樹脂層を完全に硬化させる。
その際、紫外線の照射開始と同時に、金型16を5μm/秒の速度で4秒間ガラス基材11に近接する方向に移動させた。このように、本硬化中に金型16を近接移動させることで、本硬化中に樹脂層に発生するわずかな硬化収縮の影響を受けることがない。このため、微細凹凸部14の形状転写性が一層向上する。
Thereafter, the resin layer is completely cured by irradiating with 150 mW ultraviolet light for 2 minutes from the bottom surface side of the glass substrate 11 in the state of FIG. 9B.
At that time, simultaneously with the start of irradiation with ultraviolet rays, the mold 16 was moved at a speed of 5 μm / second for 4 seconds in the direction approaching the glass substrate 11. Thus, by moving the mold 16 close to each other during the main curing, there is no influence of slight curing shrinkage generated in the resin layer during the main curing. For this reason, the shape transferability of the fine irregularities 14 is further improved.

更に、図9(c)に示すように、金型16を樹脂層から剥離することで、ガラス基材11と、微細凹凸部14’が転写された紫外線硬化型樹脂13とからなる複合体22が得られる。   Further, as shown in FIG. 9 (c), the mold 22 is peeled off from the resin layer, whereby the composite 22 composed of the glass substrate 11 and the ultraviolet curable resin 13 to which the fine irregularities 14 ′ are transferred. Is obtained.

ところで、図10(a)〜(c)に示すように、図9の実施形態に用いた金型16の微細凹凸部14は、曲率半径R2=40mmの球面凸形状の表面に、鋸歯形状の回折格子構造が機械加工によって形成されている。この鋸歯形状のピッチpは1.5μmから5μm、高さhは0.8μmから3μmとなっている。   By the way, as shown in FIGS. 10A to 10C, the fine uneven portion 14 of the mold 16 used in the embodiment of FIG. 9 has a sawtooth shape on a spherical convex surface having a curvature radius R2 = 40 mm. A diffraction grating structure is formed by machining. The sawtooth-shaped pitch p is 1.5 μm to 5 μm, and the height h is 0.8 μm to 3 μm.

本実施形態によれば、樹脂を硬化させるのに紫外線を用いていることで、硬化時間を短縮することができる。また、樹脂の本硬化中に金型16の転写面を接近移動させて樹脂層に押し付けることで、本硬化中に発生するわずかな硬化収縮の影響を受けることがない。このため、微細凹凸部14の形状転写性を一層向上することができる。   According to this embodiment, the curing time can be shortened by using ultraviolet rays to cure the resin. Further, by moving the transfer surface of the mold 16 close to the resin layer during the main curing of the resin and pressing it against the resin layer, there is no influence of slight curing shrinkage generated during the main curing. For this reason, the shape transferability of the fine irregularities 14 can be further improved.

更に、本実施形態では、金型16の転写面が凸面で、その曲率半径R2よりも基材成形
面の曲率半径R1の方が大きい凹面としたので、樹脂層転写面の曲率半径も金型転写面の曲率半径R2より大きい凹面となり、金型16の転写面が徐々に樹脂層の接触面を拡げつつ圧接するため、樹脂層に微細凹凸部14’を形成するときの気泡の巻き込みを防止することができる。
(第6の実施の形態)
図11(a)〜(e)は、基材成形面11aの曲率半径がR1=72mmの凸面と、反成形面の曲率半径がR3=82mmの凸面を有する研磨ガラス基材(硝材:BSL−7、外径Φ20mm、中心層5mm)11上に紫外線硬化型樹脂13を塗布し、この樹脂に微細凹凸構造14を転写する実施の形態を示す図である。
Furthermore, in the present embodiment, the transfer surface of the mold 16 is a convex surface, and since the curvature radius R1 of the substrate molding surface is larger than the curvature radius R2, the curvature radius of the resin layer transfer surface is also the mold. Since the concave surface is larger than the radius of curvature R2 of the transfer surface and the transfer surface of the mold 16 is pressed while gradually expanding the contact surface of the resin layer, it is possible to prevent entrainment of bubbles when forming the fine uneven portion 14 'on the resin layer. can do.
(Sixth embodiment)
11 (a) to 11 (e) show a polished glass substrate (glass material: BSL-) having a convex surface with a curvature radius of the base material molding surface 11a of R1 = 72 mm and a convex surface with a curvature radius of the non-molding surface of R3 = 82 mm. 7 is a view showing an embodiment in which an ultraviolet curable resin 13 is applied onto an outer diameter Φ 20 mm and a center layer 5 mm) 11 and a fine concavo-convex structure 14 is transferred to the resin.

なお、第1の実施の形態と同一又は相当する部材には同一の符号を付して説明する。
図11(a)に示すように、両凸レンズ状のガラス基材11の成形面11aに、紫外線硬化型樹脂13とガラス基材11の密着性を上げるためのカップリング処理を行なう。その後、図11(b)に示すように、スピンナ一によりガラス基材11を1500rpmで回転し、ウレタンアクリレート系の紫外線硬化型樹脂13を均一に塗布する。こうして、樹脂厚さが約0.2mmの樹脂層が形成され、樹脂層転写面の曲率半は、ほぼ基材成形面曲率半径R1と等しくなる。なお、本実施の形態で用いた樹脂は、25℃における粘度が約1500cpsである。
In addition, the same code | symbol is attached | subjected and demonstrated to the member which is the same as that of 1st Embodiment, or corresponds.
As shown in FIG. 11A, a coupling process for increasing the adhesion between the ultraviolet curable resin 13 and the glass substrate 11 is performed on the molding surface 11 a of the biconvex lens-shaped glass substrate 11. Thereafter, as shown in FIG. 11B, the glass substrate 11 is rotated at 1500 rpm by a spinner to uniformly apply the urethane acrylate-based ultraviolet curable resin 13. In this way, a resin layer having a resin thickness of about 0.2 mm is formed, and the curvature half of the resin layer transfer surface is substantially equal to the curvature radius R1 of the substrate molding surface. The resin used in this embodiment has a viscosity at 25 ° C. of about 1500 cps.

更に、ガラス基材11の回転を停止した後、30mWの紫外線を15秒間照射することで、樹脂層を仮硬化する。この時、樹脂の硬化率は約60%であり、強い圧力を加えると変形する程度の硬度となっている。   Furthermore, after stopping the rotation of the glass substrate 11, the resin layer is temporarily cured by irradiating with 30 mW ultraviolet rays for 15 seconds. At this time, the curing rate of the resin is about 60%, and the hardness is such that it deforms when a strong pressure is applied.

次に、図11(c)に示すように、転写面に微細凹凸部14が形成された金型16を、樹脂層にほぼ均等に接触させる。更に、図11(d)に示すように、樹脂層の中心部厚さが0.1mm程度になるまで、金型16の転写面を樹脂層に押し付ける。   Next, as shown in FIG. 11C, the mold 16 having the fine irregularities 14 formed on the transfer surface is brought into substantially uniform contact with the resin layer. Further, as shown in FIG. 11D, the transfer surface of the mold 16 is pressed against the resin layer until the thickness of the central portion of the resin layer becomes about 0.1 mm.

このとき、金型16の転写面が凹面で、該金型転写面の曲率半径R2よりも基材成形面(凸面)の曲率半径R1の方が小さいので、樹脂層転写面の曲率半径も金型転写面の曲率半径R2より小さい凸面となり、金型転写面の中央部が樹脂層の中央部に接触した後、徐々に接触面を拡げるように作用する。これにより、樹脂層に微細凹凸部14’を形成する時の気泡の巻込みが防止される。   At this time, the transfer surface of the mold 16 is concave, and the curvature radius R1 of the base material molding surface (convex surface) is smaller than the curvature radius R2 of the mold transfer surface. The convex surface is smaller than the radius of curvature R2 of the mold transfer surface, and acts so that the contact surface gradually expands after the central portion of the mold transfer surface contacts the central portion of the resin layer. This prevents entrainment of bubbles when forming the fine uneven portion 14 ′ in the resin layer.

なお、本実施形態では、金型16の転写面よりも樹脂層の面積の方が大きくなっている。このため、樹脂層の外周部には微細凹凸部14が転写されない部分が生じている。
その後、図11(d)のままで、基材側から150mWの紫外線を2分間照射することで、樹脂層を完全に硬化させる。
In the present embodiment, the area of the resin layer is larger than the transfer surface of the mold 16. For this reason, the part which the fine uneven | corrugated | grooved part 14 is not transcribe | transferred has arisen in the outer peripheral part of the resin layer.
After that, the resin layer is completely cured by irradiating with 150 mW ultraviolet rays for 2 minutes from the base material side as it is in FIG.

更に、図11(e)に示すように、金型16の転写面を樹脂層から剥離することで、樹脂層の転写面側には微細凹凸部14が反転した微細凹凸部14’が形成された複合体22が得られる。   Further, as shown in FIG. 11 (e), by separating the transfer surface of the mold 16 from the resin layer, a fine uneven portion 14 ′ in which the fine uneven portion 14 is inverted is formed on the transfer surface side of the resin layer. A composite 22 is obtained.

本実施形態に用いた金型16の微細凹凸部14は、図12(a)〜(c)に示すように、曲率半径R2=80mmの球面凹形状の表面に、微細凹凸部14として、中心側が凸形状の同心円状に鋸歯形状の回折格子構造を有している。具体的には、この微細凹凸部14は、機械加工により格子高さh=2〜10μm、格子幅w=2〜30μmの形状に加工する。   As shown in FIGS. 12A to 12C, the fine uneven portion 14 of the mold 16 used in the present embodiment has a spherical concave surface with a radius of curvature R2 = 80 mm as a fine uneven portion 14. It has a sawtooth-shaped diffraction grating structure in a concentric shape with convex sides. Specifically, the fine uneven portion 14 is machined into a shape having a lattice height h = 2 to 10 μm and a lattice width w = 2 to 30 μm.

本実施形態では、金型16の転写面が凹面で該転写面の曲率半径R2よりも基材成形面の曲率半径R1が小さい凸面とした。そして、樹脂層を半硬化状態とした後、該樹脂層に金型16の転写面を押し付けるため、該微細凹凸部14は中心部から外周部に向かって拡がるように徐々に形成される。このため、樹脂層に微細凹凸部14’を形成する時の気泡の巻込みを防止することができる。   In the present embodiment, the transfer surface of the mold 16 is a concave surface, and the convex surface has a curvature radius R1 of the substrate molding surface smaller than the curvature radius R2 of the transfer surface. And after making a resin layer into a semi-hardened state, in order to press the transfer surface of the metal mold | die 16 against this resin layer, this fine uneven | corrugated | grooved part 14 is gradually formed so that it may spread toward an outer peripheral part from a center part. For this reason, it is possible to prevent entrainment of bubbles when forming the fine uneven portion 14 ′ in the resin layer.

なお、以上説明した微細凹凸部14の構造は、各実施形態に記載の反射防止構造、回折格子構造に限定するものではない。また、エネルギー硬化型樹脂としても、熱硬化型樹脂12や紫外線硬化型樹脂13以外に、可視光硬化型樹脂や電子線硬化型樹脂等であっても良い。   In addition, the structure of the fine uneven | corrugated | grooved part 14 demonstrated above is not limited to the reflection preventing structure and diffraction grating structure as described in each embodiment. In addition to the thermosetting resin 12 and the ultraviolet curable resin 13, the energy curable resin may be a visible light curable resin, an electron beam curable resin, or the like.

(a)は、塗布工程を示す図、(b)は、展延工程を示す図、(c)は、仮硬化工程を示す図、(d)は、押圧工程を示す図、(e)は、本硬化工程を示す図、(f)は、離型工程を示す図、(g)は、凹部内に空気が閉じ込められてしまう状態を示す図である。(A) is a figure which shows an application process, (b) is a figure which shows a spreading process, (c) is a figure which shows a temporary hardening process, (d) is a figure which shows a press process, (e) is The figure which shows a main hardening process, (f) is a figure which shows a mold release process, (g) is a figure which shows the state by which air is confine | sealed in a recessed part. (a)は、第1の実施形態のガラス基材の断面正面図、(b)は、ガラス基材の成形面に熱硬化型樹脂を塗布した状態を示す図、(c)は、樹脂層に金型を対面配置した状態を示す図、(d)は、樹脂層に金型転写面を押し付けた状態を示す図、(e)は、金型の転写面を樹脂層から剥離した状態を示す図である。(A) is a sectional front view of the glass substrate of the first embodiment, (b) is a diagram showing a state in which a thermosetting resin is applied to the molding surface of the glass substrate, and (c) is a resin layer. The figure which shows the state which faced and arrange | positioned the metal mold | die, (d) is a figure which shows the state which pressed the mold transfer surface to the resin layer, (e) is the state which peeled the transfer surface of the metal mold | die from the resin layer. FIG. 金型転写面を拡大した状態を示す図である。It is a figure which shows the state which expanded the metal mold | die transfer surface. 熱硬化型樹脂に転写された微細凹凸部の拡大を示す図である。It is a figure which shows expansion of the fine uneven | corrugated | grooved part transcribe | transferred to the thermosetting resin. (a)は、第2の実施形態のガラス基材の成形面に熱硬化型樹脂を塗布し、この樹脂層に対し金型を対面配置した状態を示す図、(b)は、この樹脂層に対し金型転写面を傾斜して押し付けるようにした状態を示す図、(c)は、樹脂層と金型転写面とを平行になるように押し付けた状態を示す図、(d)は、金型の転写面を樹脂層から剥離した状態を示す図である。(A) is a figure which shows the state which apply | coated thermosetting resin to the molding surface of the glass base material of 2nd Embodiment, and has arrange | positioned the metal mold | die with respect to this resin layer, (b) is this resin layer The figure which shows the state which inclined and pressed the metal mold | transfer surface with respect to (c) is a figure which shows the state which pressed the resin layer and the metal mold | die transfer surface so that it might become parallel, (d), It is a figure which shows the state which peeled the transfer surface of the metal mold | die from the resin layer. (a)は、矩形状の微細凹凸部の外観を示す図、(b)は、鋸歯形状の微細凹凸部の外観を示す図である。(A) is a figure which shows the external appearance of a rectangular fine uneven part, (b) is a figure which shows the external appearance of a sawtooth-shaped fine uneven part. (a)は、第3の実施形態のガラス基材の正面図、(b)は、ガラス基材の成形面に熱硬化型樹脂を塗布した状態を示す図、(c)は、樹脂層に対し金型を対面配置した状態を示す図、(d)は、樹脂層に金型転写面を押し付けた状態を示す図、(e)は、金型の転写面を樹脂層から剥離した状態を示す図である。(A) is a front view of the glass base material of 3rd Embodiment, (b) is a figure which shows the state which apply | coated the thermosetting resin to the molding surface of a glass base material, (c) is a resin layer The figure which shows the state which has arrange | positioned the metal mold | die facing, (d) is a figure which shows the state which pressed the mold transfer surface against the resin layer, (e) is the state which peeled the transfer surface of the metal mold | die from the resin layer. FIG. (a)は、第4の実施形態のガラス基材の正面図、(b)は、ガラス基材の成形面に熱硬化型樹脂を塗布した状態を示す図、(c)は、樹脂層に対し金型を対面配置した状態を示す図、(d)は、樹脂層に金型転写面を押し付けた状態を示す図、(e)は、金型の転写面を樹脂層から剥離した状態を示す図である。(A) is a front view of the glass substrate of the fourth embodiment, (b) is a diagram showing a state where a thermosetting resin is applied to the molding surface of the glass substrate, and (c) is a resin layer. The figure which shows the state which has arrange | positioned the metal mold | die facing, (d) is a figure which shows the state which pressed the mold transfer surface against the resin layer, (e) is the state which peeled the transfer surface of the metal mold | die from the resin layer. FIG. (a)は、第5の実施形態のガラス基材の凹面に紫外線硬化型樹脂を塗布し、この樹脂層に対し金型を対面配置した状態を示す図、(b)は、樹脂層に金型転写面を押し付けた状態を示す図、(c)は、金型の転写面を樹脂層から剥離した状態を示す図である。(A) is the figure which shows the state which apply | coated the ultraviolet curable resin to the concave surface of the glass base material of 5th Embodiment, and has arrange | positioned the metal mold | die with respect to this resin layer, (b) is gold | metal | money to a resin layer. The figure which shows the state which pressed the mold transfer surface, (c) is a figure which shows the state which peeled the transfer surface of the metal mold | die from the resin layer. (a)は、同上の金型転写面の断面正面図、(b)は、その拡大平面図、(c)は、その拡大斜視図である。(A) is a sectional front view of the same mold transfer surface, (b) is an enlarged plan view thereof, and (c) is an enlarged perspective view thereof. (a)は、第6の実施形態のガラス基材の断面正面図、(b)は、ガラス基材の成形面に紫外線硬化型樹脂を塗布した状態を示す図、(c)は、樹脂層に対し金型を対面配置して接触させた状態を示す図、(d)は、樹脂層に金型転写面を押し付けた状態を示す図、(e)は、金型の転写面を樹脂層から剥離した状態を示す図である。(A) is a sectional front view of the glass substrate of the sixth embodiment, (b) is a diagram showing a state in which an ultraviolet curable resin is applied to the molding surface of the glass substrate, and (c) is a resin layer The figure which shows the state which faced and arrange | positioned the metal mold | die with respect to FIG., (D) is a figure which shows the state which pressed the metal mold | die transfer surface against the resin layer, (e) is a resin layer It is a figure which shows the state which peeled from. (a)は、同上の金型転写面の断面正面図、(b)は、その拡大平面図、(c)は、その拡大斜視図である。(A) is a sectional front view of the same mold transfer surface, (b) is an enlarged plan view thereof, and (c) is an enlarged perspective view thereof.

符号の説明Explanation of symbols

1 エネルギー硬化型樹脂
11 ガラス基材
11a 成形面
12 熱硬化型樹脂
13 紫外線硬化型樹脂
14 微細凹凸部
15 紫外線ランプ
16 金型
18 凹部
19 凸部
20 空気
22 複合体
DESCRIPTION OF SYMBOLS 1 Energy curable resin 11 Glass base material 11a Molding surface 12 Thermosetting resin 13 Ultraviolet curable resin 14 Fine uneven part 15 Ultraviolet lamp 16 Mold 18 Concave part 19 Convex part 20 Air 22 Composite

Claims (6)

微細凹凸部が形成された金型の転写面を用いて樹脂材料の表面に前記微細凹凸部を転写する転写方法において、
基材の成形面に前記樹脂材料を滴下して塗布する工程と、
該塗布した前記樹脂材料が前記金型転写面に接触する前に仮硬化する工程と、
該仮硬化した前記樹脂材料に前記金型転写面を押圧する工程と、
該押圧した状態で前記樹脂材料を本硬化する工程と、
該本硬化した前記樹脂材料及び前記基材を含む複合体を離型する工程と、を備える
ことを特徴とする転写方法。
In the transfer method of transferring the fine irregularities on the surface of the resin material using the transfer surface of the mold in which the fine irregularities are formed,
Dropping and applying the resin material on the molding surface of the substrate;
A step of temporarily curing the applied resin material before contacting the mold transfer surface;
Pressing the mold transfer surface against the temporarily cured resin material;
A step of fully curing the resin material in the pressed state;
A step of releasing the composite containing the resin material and the base material that has been fully cured.
前記仮硬化する工程は、前記樹脂材料の硬化率を20%〜70%にする
ことを特徴とする請求項1に記載の転写方法。
The transfer method according to claim 1, wherein the temporary curing step sets the curing rate of the resin material to 20% to 70%.
前記押圧する工程は、最初に前記仮硬化した前記樹脂材料と前記金型転写面の一部を接触させ、その後、徐々に接触面を拡げるように押圧する
ことを特徴とする請求項1又は2に記載の転写方法。
3. The pressing step includes contacting the part of the mold transfer surface with the temporarily cured resin material first, and then pressing to gradually widen the contact surface. The transfer method described in 1.
前記押圧する工程では、前記基材成形面の曲率半径をR1、前記金型転写面の曲率半径の曲率半径をR2としたとき、
前記金型転写面が平面あるいは凹面の場合、該基材成形面を|R1|<|R2|を満足する凸面とし、
前記金型転写面が凸面の場合、該基材成形面を|R1|>|R2|を満足する凹面とした
ことを特徴とする請求項1〜3のいずれかに記載の転写方法。
In the pressing step, when the curvature radius of the base material molding surface is R1, and the curvature radius of the mold transfer surface is R2,
When the mold transfer surface is flat or concave, the substrate molding surface is a convex surface satisfying | R1 | <| R2 |
4. The transfer method according to claim 1, wherein when the mold transfer surface is a convex surface, the base material molding surface is a concave surface satisfying | R 1 |> | R 2 |.
前記本硬化の際に、前記基材と前記金型転写面とを近接方向に移動しながら押圧する
ことを特徴とする請求項1〜4のいずれかに記載の転写方法。
5. The transfer method according to claim 1, wherein, during the main curing, the substrate and the mold transfer surface are pressed while moving in a proximity direction.
前記基板と前記樹脂材料を備え、請求項1〜5のいずれかに記載の転写方法によって製造された光学素子。   An optical element comprising the substrate and the resin material and manufactured by the transfer method according to claim 1.
JP2007051178A 2007-03-01 2007-03-01 Transfer method and optical element manufactured thereby Withdrawn JP2008213210A (en)

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