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JP2008270594A - Electronic equipment - Google Patents

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JP2008270594A
JP2008270594A JP2007112818A JP2007112818A JP2008270594A JP 2008270594 A JP2008270594 A JP 2008270594A JP 2007112818 A JP2007112818 A JP 2007112818A JP 2007112818 A JP2007112818 A JP 2007112818A JP 2008270594 A JP2008270594 A JP 2008270594A
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annular
brazing material
electronic device
annular conductor
electronic component
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Mitsutaka Touden
光隆 嶌田
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Kyocera Corp
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Kyocera Corp
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    • H10W72/20
    • H10W90/724

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  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

【課題】 実装用基板上に実装後に特性が変動しにくい電子装置を提供する。
【解決手段】 下面に複数の端子電極2bおよび環状導体2cが形成されている電子部品2が、上面に端子電極パッド1bおよび環状導体パッド1cが形成されている実装用基板1上に、端子電極2bと端子電極パッド1bとがロウ材4を介し、環状導体2cと環状導体パッド1cとが環状ロウ材3を介してそれぞれ接続されて搭載されており、環状ロウ材3の外側の表面を覆うように環状ロウ材3よりも融点が高いメッキ膜6が形成され、メッキ膜6よりも外側で、電子部品2および実装用基板1の間に樹脂5が埋められている電子装置10である。メッキ膜6が再溶融されずに硬度を保って外側からの圧力に対して壁の役割を果たすので、再溶融した環状ロウ材3が内側に押し出されにくくなり、実装後に電子装置2の特性が変動することを抑えることができる。
【選択図】 図2
PROBLEM TO BE SOLVED: To provide an electronic device whose characteristics hardly change after mounting on a mounting substrate.
An electronic component 2 having a plurality of terminal electrodes 2b and an annular conductor 2c formed on a lower surface thereof is mounted on a mounting substrate 1 having a terminal electrode pad 1b and an annular conductor pad 1c formed on an upper surface thereof. 2b and terminal electrode pad 1b are connected and mounted via brazing material 4 and annular conductor 2c and annular conductor pad 1c via annular brazing material 3, respectively, and cover the outer surface of annular brazing material 3. Thus, the electronic device 10 is formed with the plating film 6 having a melting point higher than that of the annular brazing material 3 and with the resin 5 buried between the electronic component 2 and the mounting substrate 1 outside the plating film 6. Since the plated film 6 is not remelted and maintains hardness and acts as a wall against pressure from the outside, the remelted annular brazing material 3 is difficult to be pushed inward, and the characteristics of the electronic device 2 after mounting are improved. Fluctuation can be suppressed.
[Selection] Figure 2

Description

本発明は、小型で実装後の特性安定性に優れた弾性表面波装置等の電子装置に関するものである。   The present invention relates to an electronic device such as a surface acoustic wave device having a small size and excellent characteristic stability after mounting.

従来から通信機器などの電子機器に用いられる電子装置として、弾性表面波素子を利用したものが広く用いられている。弾性表面波は、圧電基板の一方の主面に形成されたIDT(Inter Digital Transducer)電極によって得られる振動波であり、弾性表面波素子はQ値が高いことからレゾネータ,フィルタ,デュプレクサ等に利用されている。弾性表面波素子を利用する電子装置は、弾性表面波素子のIDT電極付近で発生する振動を阻害しないようにするため、IDT電極付近に空間を確保するとともに、この空間を封止した構造とする必要がある。   2. Description of the Related Art Conventionally, electronic devices using surface acoustic wave elements have been widely used as electronic devices used in electronic devices such as communication devices. A surface acoustic wave is a vibration wave obtained by an IDT (Inter Digital Transducer) electrode formed on one main surface of a piezoelectric substrate. Since a surface acoustic wave element has a high Q value, it is used for a resonator, filter, duplexer, etc. Has been. An electronic device using a surface acoustic wave element has a structure in which a space is secured in the vicinity of the IDT electrode and the space is sealed in order not to inhibit vibrations generated in the vicinity of the IDT electrode of the surface acoustic wave element. There is a need.

弾性表面波素子を利用した電子装置の一例として、例えば、下面にIDT電極,複数の端子電極およびこの複数の端子電極を取り囲む環状導体が形成されている弾性表面波素子としての電子部品が、上面に端子電極に対応する端子電極パッドおよび環状導体に対応する環状導体パッドが形成されている実装用基板上に、端子電極と端子電極パッドとがロウ材を介し、環状導体と環状導体パッドとが環状ロウ材を介してそれぞれ接続され、環状ロウ材よりも外側で電子部品および実装用基板の間に樹脂が埋められた構成の電子装置が知られている(例えば、特許文献1を参照。)。そのロウ材および環状ロウ材には、材料としては同じ材料を用いることが可能であり、例えばハンダが好適に用いられる。また、電子部品および実装用基板の間に埋められる樹脂は、材料としてはエポキシ樹脂等の強度・絶縁性が高い樹脂材料が用いられる。   As an example of an electronic device using a surface acoustic wave element, for example, an electronic component as a surface acoustic wave element in which an IDT electrode, a plurality of terminal electrodes, and an annular conductor surrounding the plurality of terminal electrodes are formed on the bottom surface On the mounting substrate on which the terminal electrode pad corresponding to the terminal electrode and the annular conductor pad corresponding to the annular conductor are formed, the terminal electrode and the terminal electrode pad are interposed between the annular conductor and the annular conductor pad via the brazing material. 2. Description of the Related Art There is known an electronic device having a configuration in which a resin is buried between an electronic component and a mounting substrate on the outer side of an annular brazing material, each connected via an annular brazing material (see, for example, Patent Document 1). . For the brazing material and the annular brazing material, the same material can be used. For example, solder is preferably used. The resin buried between the electronic component and the mounting substrate is made of a resin material having high strength and insulation, such as an epoxy resin.

以上の電子装置の例によれば、IDT電極付近の空間を、電子部品と実装用基板との間隙,環状導体,環状導体パッドおよび環状導体と環状導体パッドとを接続するロウ材で取り囲むことにより封止した構成となっている。また、前述の電子部品の例においては、IDT電極の近くに形成されている複数の端子電極についても、酸化を防ぐ等の目的で、IDT電極と同じ空間内に封止されている。   According to the example of the electronic device described above, the space near the IDT electrode is surrounded by the gap between the electronic component and the mounting substrate, the annular conductor, the annular conductor pad, and the brazing material connecting the annular conductor and the annular conductor pad. It has a sealed configuration. In the example of the electronic component described above, the plurality of terminal electrodes formed near the IDT electrode are also sealed in the same space as the IDT electrode for the purpose of preventing oxidation.

また、前述の電子装置における電子部品および実装用基板の間に埋められた樹脂は、電子装置をマザーボード等の回路基板上に実装用ハンダを用いて実装する工程の際に、この実装用ハンダを加熱して電子装置のロウ材および環状ロウ材が再溶融して軟化したときに、電子部品が自重により降下してきて電子部品と実装用基板との距離が短くなることを防ぐための支柱としての機能を備えている。   In addition, the resin buried between the electronic component and the mounting board in the above-described electronic device is used for mounting the electronic device on a circuit board such as a mother board using the mounting solder. When the brazing material and the annular brazing material of the electronic device are remelted and softened by heating, the electronic component falls as a result of its own weight and serves as a support for preventing the distance between the electronic component and the mounting board from becoming shorter. It has a function.

また、前述の電子装置は、下面または側面には実装用の外部端子が形成されており、この外部端子が実装用ハンダを介してマザーボード等の回路基板上の回路パターンと接続するようになっている。
特開2007−6110号公報
The electronic device described above has a mounting external terminal formed on the lower surface or side surface, and the external terminal is connected to a circuit pattern on a circuit board such as a mother board through the mounting solder. Yes.
Japanese Patent Laid-Open No. 2007-6110

しかしながら、このような電子装置は、従来から、回路基板上に実装するときに特性が変動しやすいという問題点があった。   However, such an electronic device has conventionally had a problem that its characteristics are likely to fluctuate when mounted on a circuit board.

例えば、前述した電子装置の例であれば、電子装置を回路基板上に実装する工程において、電子装置を加熱したときに、再溶融した環状ロウ材が環状導体および環状導体パッドの内側に押し出され、端子電極,端子電極パッドまたはこれらを接続するロウ材と接触することがあり、これにより電子装置の特性が変動するという問題点があった。   For example, in the example of the electronic device described above, in the process of mounting the electronic device on the circuit board, when the electronic device is heated, the re-melted annular brazing material is pushed inside the annular conductor and the annular conductor pad. There is a problem that the terminal electrode, the terminal electrode pad, or the brazing material connecting them may come into contact with the terminal electrode, the terminal electrode pad, and the characteristics of the electronic device.

再溶融した環状ロウ材が内側に押し出される原因の1つとして、電子装置を製造する過程で電子部品および実装用基板の間に埋められた樹脂に残留する水分やガスによる影響をあげることができる。すなわち、電子装置を回路基板上に実装する工程において、電子装置を加熱したときには、前述したように電子装置のロウ材および環状ロウ材が再溶融して軟化することと相俟って、一方では、樹脂に残留した水分やガスも加熱されて急激に膨張することから、環状ロウ材が外側から環状導体および環状導体パッドの内側に押し出されてしまうというものである。   One of the causes of the remelted annular brazing material being pushed inward can be the effect of moisture and gas remaining on the resin buried between the electronic component and the mounting substrate in the process of manufacturing the electronic device. . That is, in the process of mounting the electronic device on the circuit board, when the electronic device is heated, the brazing material and the annular brazing material of the electronic device are remelted and softened as described above. Since the moisture and gas remaining in the resin are also heated and rapidly expanded, the annular brazing material is pushed out from the outside to the inside of the annular conductor and the annular conductor pad.

本発明はこのような従来の電子部品の実装構造における問題点に鑑み案出されたものであり、その目的は、実装用基板上に実装する際に特性が変動しにくい電子装置を提供することにある。   The present invention has been devised in view of such problems in the conventional electronic component mounting structure, and an object of the present invention is to provide an electronic device whose characteristics are unlikely to vary when mounted on a mounting board. It is in.

本発明の電子装置は、下面に複数の端子電極および該複数の端子電極を取り囲む環状導体が形成されている電子部品が、上面に前記端子電極に対応する端子電極パッドおよび前記環状導体に対応する環状導体パッドが形成されている実装用基板上に、前記端子電極と前記端子電極パッドとがロウ材を介し、前記環状導体と前記環状導体パッドとが環状ロウ材を介してそれぞれ接続されて搭載されており、前記環状ロウ材の外側の表面を覆うように前記環状ロウ材よりも融点が高いメッキ膜が形成され、該メッキ膜よりも外側で、前記電子部品および前記実装用基板の間に樹脂が埋められていることを特徴とするものである。   In the electronic device according to the present invention, an electronic component in which a plurality of terminal electrodes and an annular conductor surrounding the plurality of terminal electrodes are formed on a lower surface corresponds to a terminal electrode pad corresponding to the terminal electrode and the annular conductor on an upper surface. On the mounting substrate on which the annular conductor pad is formed, the terminal electrode and the terminal electrode pad are connected via a brazing material, and the annular conductor and the annular conductor pad are connected via an annular brazing material, respectively. A plating film having a melting point higher than that of the annular brazing material is formed so as to cover the outer surface of the annular brazing material, and between the electronic component and the mounting substrate outside the plating film. The resin is buried.

また、本発明の電子装置は、上記構成において、前記メッキ膜は、前記環状導体の外周の少なくとも前記環状ロウ材側の一部および前記環状導体パッドの外周の少なくとも前記環状ロウ材側の一部も覆うように形成されていることを特徴とするものである。   In the electronic device according to the aspect of the invention, in the configuration described above, the plating film may include at least a part of the outer periphery of the annular conductor on the annular brazing material side and a part of the outer periphery of the annular conductor pad on the annular brazing material side. It is also characterized by being formed so as to cover.

本発明の電子装置によれば、電子装置を実装用基板上に実装する工程において、環状導体と環状導体パッドとを接続する環状ロウ材が再溶融して軟化し、電子部品および実装用基板の間に埋められている樹脂等に残留した水分やガスが加熱されて急激に膨張することによって環状ロウ材を外側から環状導体および環状導体パッドの内側に押し出そうとしても、樹脂の内側で、環状ロウ材の外側の表面を覆うように環状ロウ材よりも融点が高いメッキ膜が形成されていることにから、このメッキ膜が再溶融されずに硬度を保って外側からの圧力に対して壁の役割を果たし、再溶融した環状ロウ材が環状導体および環状導体パッドの内側に押し出されて流れ出すことが起こりにくくなり、端子電極,端子電極パッドまたはこれらを接続するロウ材との接触の発生が少なくなるので、実装後に電子装置の特性が変動するという不具合を少なくすることができる。   According to the electronic device of the present invention, in the step of mounting the electronic device on the mounting substrate, the annular brazing material connecting the annular conductor and the annular conductor pad is remelted and softened, and the electronic component and the mounting substrate Even if it tries to push the annular brazing material from the outside to the inside of the annular conductor and the annular conductor pad by heating and suddenly expanding the moisture and gas remaining in the resin buried in between, the inside of the resin, Since a plating film having a melting point higher than that of the annular brazing material is formed so as to cover the outer surface of the annular brazing material, the plating film is not remelted and maintains hardness without being subjected to pressure from the outside. It plays the role of a wall, and it becomes difficult for the remelted annular brazing material to be pushed out of the annular conductor and the annular conductor pad to flow out, and the terminal electrode, the terminal electrode pad, or the brazing material connecting them. Since the occurrence of contact is reduced, the characteristics of the electronic device after mounting can be reduced disadvantageously varies.

また、本発明の電子装置によれば、メッキ膜は、環状導体の外周の少なくとも環状ロウ材側の一部および環状導体パッドの外周の少なくとも環状ロウ材側の一部も覆うように形成されているときには、環状ロウ材が再溶融し軟化したときにおいても、メッキ膜は、環状導体の外周の少なくとも環状ロウ材側の一部および環状導体パッドの外周の少なくとも環状ロウ材側の一部で固定されることになるので、壁の役割を果たすメッキ膜が動きにくくなり、再溶融した環状ロウ材が環状導体および環状導体パッドの内側に押し出されて流れ出すことがよりいっそう起こりにくいものとなる。   According to the electronic device of the present invention, the plating film is formed so as to cover at least a part of the outer periphery of the annular conductor on the annular brazing material side and at least a part of the outer periphery of the annular conductor pad on the annular brazing material side. When the annular brazing material is remelted and softened, the plating film is fixed at least on the annular brazing material side of the outer periphery of the annular conductor and at least on the annular brazing material side of the outer periphery of the annular conductor pad. As a result, the plating film serving as a wall becomes difficult to move, and the remelted annular brazing material is more unlikely to flow out by being pushed inside the annular conductor and the annular conductor pad.

以下に、本発明の電子装置について添付図面を参照しつつ詳細に説明する。   Hereinafter, an electronic device of the present invention will be described in detail with reference to the accompanying drawings.

図1は本発明の電子装置の実施の形態の一例を示す外観斜視図であり、図2は図1のA−A’線断面図である。これらの図に示す電子装置10は、基本的な構成として、実装用基板1上にロウ材4および環状ロウ材3を介して電子部品2が搭載されており、実装用基板1と電子部品2との間の4隅付近には樹脂5が埋められた構成となっている。   FIG. 1 is an external perspective view showing an example of an embodiment of an electronic device according to the present invention, and FIG. 2 is a cross-sectional view taken along the line A-A 'of FIG. In the electronic device 10 shown in these drawings, as a basic configuration, an electronic component 2 is mounted on a mounting substrate 1 via a brazing material 4 and an annular brazing material 3, and the mounting substrate 1 and the electronic component 2 are mounted. The resin 5 is buried in the vicinity of the four corners.

図3は電子部品2を下方から見た外観斜視図である。本例における電子部品2は弾性表面波素子であり、圧電基板2aの下面には、IDT電極2d、一対の反射器電極2e、複数の端子電極2bおよびこれらを取り囲む環状導体2c等の導体パターンが形成されている。   FIG. 3 is an external perspective view of the electronic component 2 as viewed from below. The electronic component 2 in this example is a surface acoustic wave element, and a conductor pattern such as an IDT electrode 2d, a pair of reflector electrodes 2e, a plurality of terminal electrodes 2b, and an annular conductor 2c surrounding them is formed on the lower surface of the piezoelectric substrate 2a. Is formed.

圧電基板2aは、厚みが0.1〜0.5mの四角形状の平板であり、材料としては、例えば、水晶,タンタル酸リチウム単結晶,ニオブ酸リチウム単結晶,四ホウ酸リチウム単結晶等の圧電性の単結晶が用いられる。導体パターンは、厚みが0.1〜1μm程度の導体膜であり、材料としては、例えば、アルミニウムやアルミニウムを主成分とする合金等の金属材料が用いられる。   The piezoelectric substrate 2a is a rectangular flat plate having a thickness of 0.1 to 0.5 m. As a material, for example, a piezoelectric material such as quartz, lithium tantalate single crystal, lithium niobate single crystal, lithium tetraborate single crystal, etc. A single crystal is used. The conductor pattern is a conductor film having a thickness of about 0.1 to 1 μm, and as a material, for example, a metal material such as aluminum or an alloy containing aluminum as a main component is used.

以上の電子部品2は、例えば、以下のような方法により作製することができる。   The above electronic component 2 can be manufactured by the following methods, for example.

先ず、圧電単結晶材料のインゴット(母材)を所定の結晶方向となるように切断・研磨し、タンタル酸リチウム単結晶およびニオブ酸リチウム単結晶などの強誘電体単結晶の場合は電界下徐冷法などによって単一分域化処理することにより、所望の圧電特性を有した圧電母基板を作製することができる。次に、圧電母基板の主面に、例えば、アルミニウム等の導体膜を、例えば、蒸着やスパッタリングによって形成し、スピンコート等により電極膜上にレジストを形成し、導体パターンに対応する部分が遮光されるようにしたパターンフィルムを重ねてからステッパー装置などを用いてレジストを露光・現像し、しかる後に、RIE(Reactive Ion Etching)装置などを用いて導体膜をエッチングし、レジストを剥離することによって導体パターンを形成することができる。また、本発明の電子装置10に用いたような四角形状の電子部品2は、圧電母基板の主面に、複数の導体パターン群が縦横に並ぶように形成しておいて、圧電母基板をダイシングソーによって個々の圧電基板2aに切断・分割することにより作製することができる。   First, an ingot (base material) of a piezoelectric single crystal material is cut and polished so as to have a predetermined crystal direction, and in the case of a ferroelectric single crystal such as a lithium tantalate single crystal and a lithium niobate single crystal, a slow cooling method under an electric field By performing the single domain processing by, for example, a piezoelectric mother substrate having desired piezoelectric characteristics can be manufactured. Next, a conductor film such as aluminum is formed on the main surface of the piezoelectric mother substrate by, for example, vapor deposition or sputtering, and a resist is formed on the electrode film by spin coating or the like, and a portion corresponding to the conductor pattern is shielded from light. The resist film is exposed and developed using a stepper device after overlaying the patterned film, and then the conductive film is etched using a RIE (Reactive Ion Etching) device and the resist is removed. A conductor pattern can be formed. In addition, the rectangular electronic component 2 used in the electronic device 10 of the present invention is formed so that a plurality of conductor pattern groups are arranged vertically and horizontally on the main surface of the piezoelectric mother substrate. It can be manufactured by cutting and dividing into individual piezoelectric substrates 2a with a dicing saw.

以上の電子部品2において、IDT電極2dは、弾性表面波の伝搬方向に沿って配設した複数の電極指の一端が共通電極で接続されて成る一対の櫛歯状電極が、それぞれの櫛歯状電極の電極指が弾性表面波の伝搬方向に交互に配置されるように噛み合わせた状態で対向配置された構成となっており、このIDT電極2dに所定の電気信号が印加されると圧電基板2aの表面に電極指の配列ピッチに対応した弾性表面波を発生させる機能を有している。また、反射器電極2eは、弾性表面波の伝搬方向に沿ってIDT電極2dの電極指とほぼ同じピッチで等間隔に配設した複数の反射電極の両端を共通電極で接続した構成となっており、IDT電極2dの形成領域で発生する弾性表面波を反射して、一対の反射器電極2eの間に閉じ込める機能を有している。また、複数の端子電極2bは、外部の回路と接続してIDT電極2dと電気信号の入出力を行なう。なお、環状導体2cの役割については後述する。   In the electronic component 2 described above, the IDT electrode 2d includes a pair of comb-like electrodes formed by connecting one end of a plurality of electrode fingers arranged along the propagation direction of the surface acoustic wave with a common electrode. The electrode fingers of the electrode-like electrode are arranged to face each other so as to be alternately arranged in the propagation direction of the surface acoustic wave. When a predetermined electrical signal is applied to the IDT electrode 2d, the piezoelectric electrode It has a function of generating surface acoustic waves corresponding to the arrangement pitch of the electrode fingers on the surface of the substrate 2a. The reflector electrode 2e has a configuration in which both ends of a plurality of reflective electrodes arranged at equal intervals at substantially the same pitch as the electrode fingers of the IDT electrode 2d are connected by a common electrode along the propagation direction of the surface acoustic wave. The surface acoustic wave generated in the region where the IDT electrode 2d is formed is reflected and confined between the pair of reflector electrodes 2e. The plurality of terminal electrodes 2b are connected to an external circuit to input / output electric signals with the IDT electrode 2d. The role of the annular conductor 2c will be described later.

図4は実装用基板1を上方から見た外観斜視図である。本例において、実装用基板1は、絶縁基板1aの上面に、端子電極2bに対応する端子電極パッド1bおよび環状導体2cに対応する環状導体パッド1c等の導体パッドが形成され、下面に実装用の外部端子1dが形成されている構成とした。   FIG. 4 is an external perspective view of the mounting substrate 1 as viewed from above. In this example, the mounting substrate 1 has conductor pads such as a terminal electrode pad 1b corresponding to the terminal electrode 2b and an annular conductor pad 1c corresponding to the annular conductor 2c formed on the upper surface of the insulating substrate 1a and mounted on the lower surface. The external terminal 1d is formed.

絶縁基板1aは、厚みが0.1〜0.5mmの四角形状の単層回路基板あるいは多層回路基板であり、材料としては、例えば、ガラスセラミックスやアルミナセラミックス等のセラミック材料やエポキシ樹脂等の樹脂材料が用いられる。絶縁基板1aの材料としてセラミック材料を用いる場合は、例えば、原料粉末にバインダを加えてプレスする方法、あるいは原料粉末を水や分散剤と共にボールミルを用いて混合した後に乾燥し、バインダ,溶剤,可塑剤等を加えてドクターブレード法により成型する方法などによってシート状と成し、それを必要に応じて積層しプレスした後に、800℃〜1400℃のピーク温度で0.5〜8時間程度焼成することによって作製することができる。   The insulating substrate 1a is a rectangular single-layer circuit board or a multilayer circuit board having a thickness of 0.1 to 0.5 mm. As the material, for example, a ceramic material such as glass ceramic or alumina ceramic, or a resin material such as epoxy resin is used. It is done. In the case of using a ceramic material as the material of the insulating substrate 1a, for example, a method in which a binder is added to the raw material powder and pressed, or the raw material powder is mixed with water and a dispersant using a ball mill and dried, and then the binder, solvent, plastic By adding a chemical agent etc. and forming it into a sheet by the method of molding by the doctor blade method, etc., after laminating and pressing it as necessary, by baking at a peak temperature of 800 ° C. to 1400 ° C. for about 0.5 to 8 hours Can be produced.

端子電極パッド1b、環状導体パッド1cおよび外部端子1dは、厚みが5〜15μmの導体膜であり、材料としては、例えば、銀,銅等の良導電性の金属材料が用いられる。端子電極パッド1b、環状導体パッド1cおよび外部端子1dは、例えば、銀,銅等から成る導電ペーストを従来周知のスクリーン印刷法やローラー転写等を用いて塗布して、500〜900℃程度で焼成することにより形成することができる。さらに、表面にニッケル,錫,金などハンダとの接合性の高い金属膜をメッキ等によって形成すると、ハンダとの接合性を良好なものとすることができる。   The terminal electrode pad 1b, the annular conductor pad 1c, and the external terminal 1d are conductor films having a thickness of 5 to 15 μm, and as the material, for example, a highly conductive metal material such as silver or copper is used. For the terminal electrode pad 1b, the annular conductor pad 1c and the external terminal 1d, for example, a conductive paste made of silver, copper or the like is applied by using a conventionally known screen printing method or roller transfer, and baked at about 500 to 900 ° C. Can be formed. Furthermore, when a metal film having high bondability with solder such as nickel, tin, and gold is formed on the surface by plating or the like, the bondability with solder can be improved.

実装用基板1上への電子部品2の搭載は、端子電極2bと端子電極パッド1bとがロウ材4を介し、環状導体2cと環状導体パッド1cとが環状ロウ材3を介してそれぞれ接続されることにより行なわれる。ロウ材4および環状ロウ材3は、例えば、90%以上の錫を含む錫−アンチモン系または錫−銀系のハンダ材料が用いられる。   When the electronic component 2 is mounted on the mounting substrate 1, the terminal electrode 2b and the terminal electrode pad 1b are connected via the brazing material 4, and the annular conductor 2c and the annular conductor pad 1c are connected via the annular brazing material 3, respectively. It is done by doing. As the brazing material 4 and the annular brazing material 3, for example, a tin-antimony or tin-silver solder material containing 90% or more of tin is used.

ロウ材4および環状ロウ材3が同じハンダ材料からなる場合は、例えば、実装用基板1上に、端子電極パッド1bおよび環状導体パッド1cを覆うようにしてスクリーン印刷等によりハンダペーストを塗布し、加熱溶融してハンダバンプを形成しておき、端子電極パッド1bと端子電極2bとが、また環状導体パッド1cと環状導体2cとがそれぞれ一対一に対応するようにして電子部品2を実装用基板1上に載せ、ハンダバンプが溶融しない程度に加熱した上で、電子部品2に上から圧力と超音波振動を与えて端子電極2bおよび環状導体2cとハンダバンプとを超音波融着して仮固定し、チャンバー内に投入してN雰囲気中で加熱してハンダバンプを再溶融させた後に固化させて、ロウ材4および環状ロウ材3を形成することができる。なお、このような工程は、複数の実装用基板1aが縦横の並びに配置してなる集合基板を用意しておいて、この集合基板上に複数の電子部品2の搭載を行なうことによって工程時間を合理的に短縮することができる。 When the brazing material 4 and the annular brazing material 3 are made of the same solder material, for example, a solder paste is applied on the mounting substrate 1 by screen printing or the like so as to cover the terminal electrode pad 1b and the annular conductor pad 1c, Solder bumps are formed by heating and melting, and the electronic component 2 is mounted on the mounting substrate 1 so that the terminal electrode pads 1b and the terminal electrodes 2b correspond to the annular conductor pads 1c and the annular conductors 2c, respectively. It is placed on top and heated to such an extent that the solder bumps do not melt, and pressure and ultrasonic vibration are applied to the electronic component 2 from above to ultrasonically bond the terminal electrode 2b and the annular conductor 2c and the solder bumps, and temporarily fix them. It is possible to form the brazing material 4 and the annular brazing material 3 by putting them into the chamber and heating them in an N 2 atmosphere to remelt the solder bumps and then solidifying them. . In this process, a process substrate is prepared by preparing a collective board in which a plurality of mounting boards 1a are arranged in a vertical and horizontal manner, and mounting a plurality of electronic components 2 on the collective board. Reasonably shortened.

本発明の電子装置10は、前述したIDT電極2dおよび一対の反射器電極2e付近の空間7を、電子部品2と実装用基板1との間隙における、環状導体2c,環状導体パッド1cおよび環状導体2cと環状導体パッド1cとを接続する環状ロウ材3で取り囲むことにより封止した構成となっている。これにより、空間7への外部からの異物の侵入が防がれ、振動が阻害されないようにした構成となっている。また、同じく電子部品2の下面に形成されている複数の端子電極2bについても、酸化を防ぐ等の目的で、IDT電極2dと同じ空間7内に封止されている。   In the electronic device 10 of the present invention, the annular conductor 2c, the annular conductor pad 1c, and the annular conductor in the space 7 between the electronic component 2 and the mounting substrate 1 are disposed in the space 7 near the IDT electrode 2d and the pair of reflector electrodes 2e. 2c and the annular conductor pad 1c are sealed by surrounding them with an annular brazing material 3. This prevents foreign matter from entering the space 7 from the outside and prevents the vibration from being hindered. Similarly, the plurality of terminal electrodes 2b formed on the lower surface of the electronic component 2 are sealed in the same space 7 as the IDT electrode 2d for the purpose of preventing oxidation.

そして、本発明の電子装置10は、環状ロウ材3の外側の表面を覆うようにメッキ膜6が形成されており、このメッキ膜6よりも外側で、電子部品2および実装用基板1の間に樹脂5が埋められている。図5に図2の要部Zを拡大した図を示す。   In the electronic device 10 of the present invention, the plating film 6 is formed so as to cover the outer surface of the annular brazing material 3, and between the electronic component 2 and the mounting substrate 1 outside the plating film 6. The resin 5 is embedded in the surface. FIG. 5 shows an enlarged view of the main part Z of FIG.

メッキ膜6は、例えば厚みが0.5〜4μmの導体膜であり、材料としては環状ロウ材3よりも融点が高い金属材料、例えばニッケル等が用いられる。樹脂5は、材料としては、例えば、耐熱性に優れたエポキシ樹脂やポリイミド樹脂等の熱硬化性樹脂が用いられる。   The plating film 6 is a conductor film having a thickness of 0.5 to 4 μm, for example, and a metal material having a melting point higher than that of the annular brazing material 3, such as nickel, is used as the material. As the resin 5, for example, a thermosetting resin such as an epoxy resin or a polyimide resin excellent in heat resistance is used.

メッキ膜6は、前述の集合基板上に電子部品2を搭載した搭載済み集合基板を用意しておいて、これらを全体的にニッケルメッキ液に浸漬して無電解メッキ処理することにより形成することができる。   The plating film 6 is formed by preparing a mounted aggregate substrate on which the electronic components 2 are mounted on the above-described aggregate substrate, and immersing them entirely in a nickel plating solution and performing an electroless plating process. Can do.

そして、以上の方法により形成したメッキ膜6よりも外側で、搭載済み集合基板の上面と電子部品2との間に未硬化のエポキシ樹脂を塗布し、高温槽中に放置して硬化させ、さらに、搭載済み集合基板の隣り合う電子部品2同士の間をダイシングソーを用いて切断することにより、本発明の電子装置10を作製することができる。なお、本例における電子装置10は、搭載済み集合基板を切断するときに、ある程度の切断幅を有したダイシングソーを用いて、電子部品2の外側の一部および環状ロウ材3の外側の一部を同時に切除することにより、環状ロウ材3の外側の一部が実装用基板1の側面および電子部品2の側面と同一面を成すように露出するとともに、図3および図4に示すように角を丸めたパターン形状の環状導体2cおよび環状導体パッド1cの各角部の外側において、樹脂5が実装用基板1と電子部品2との間の4隅に形成された構成となっている。   Then, on the outer side of the plating film 6 formed by the above method, an uncured epoxy resin is applied between the upper surface of the mounted assembly board and the electronic component 2, and is left to cure in the high temperature bath. The electronic device 10 of the present invention can be manufactured by cutting between adjacent electronic components 2 of the mounted aggregate substrate using a dicing saw. The electronic device 10 in this example uses a dicing saw having a certain cutting width when cutting the mounted aggregate substrate, and uses a part of the outside of the electronic component 2 and the outside of the annular brazing material 3. By simultaneously cutting the portions, a part of the outer side of the annular brazing material 3 is exposed so as to be flush with the side surface of the mounting substrate 1 and the side surface of the electronic component 2, and as shown in FIGS. The resin 5 is formed at the four corners between the mounting substrate 1 and the electronic component 2 outside the corners of the circular conductor 2c and the circular conductor pad 1c having a pattern shape with rounded corners.

以上の方法により形成された樹脂5は、電子部品2を実装用基板1上で支える支柱としての機能を備えている。例えば、電子装置10をマザーボード等の回路基板上に実装用ハンダを用いて実装する工程において、この実装用ハンダを加熱した際に電子装置10のロウ材4および環状ロウ材3が再溶融して軟化したときに、電子部品2が下降してきて電子部品2と実装用基板1との間の距離が短くなる(空間7の高さが低くなる)ことを防ぐために、電子部品2および実装用基板1の間に埋められた熱硬化性の樹脂5が、その加熱によっては軟化することなく電子部品2を支えるように働く。このように、本発明の電子装置10は、上方から見た面積を電子装置2の寸法と同じとした小型の構成のものであり、しかも、実装する工程において、電子部品2と実装用基板1との距離が短く(空間7の高さが低く)ならないようにして、実装後も安定した特性が得られるものとしている。   The resin 5 formed by the above method has a function as a support for supporting the electronic component 2 on the mounting substrate 1. For example, in the process of mounting the electronic device 10 on a circuit board such as a mother board using mounting solder, when the mounting solder is heated, the brazing material 4 and the annular brazing material 3 of the electronic device 10 are remelted. In order to prevent the electronic component 2 from descending and the distance between the electronic component 2 and the mounting substrate 1 from being shortened (the height of the space 7 is reduced) when softened, the electronic component 2 and the mounting substrate are prevented. The thermosetting resin 5 buried between 1 works to support the electronic component 2 without being softened by the heating. As described above, the electronic device 10 of the present invention has a small configuration in which the area viewed from above is the same as the size of the electronic device 2, and in addition, in the mounting process, the electronic component 2 and the mounting substrate 1. In order to prevent the distance from being short (the height of the space 7 is low), stable characteristics can be obtained even after mounting.

さらに、同じく電子装置10をマザーボード等の回路基板上に実装用ハンダを用いて実装する工程において、電子部品2および実装用基板1の間に埋められている樹脂5に残留している水分やガスが加熱されて急激に膨張し、再溶融して軟化した環状ロウ材3を外側から環状導体2cおよび環状導体パッド1cの内側に押し出そうとしても、本発明の電子装置10によれば、樹脂5の内側で、環状ロウ材3の外側の表面を覆うように環状ロウ材3よりも融点が高いメッキ膜6が形成されていることから、このメッキ膜6が再溶融されずに硬度を保って外側からの圧力に対して壁の役割を果たし、再溶融した環状ロウ材3が環状導体2cおよび環状導体パッド1cの内側に押し出されて流れ出すことが起こりにくくなり、環状ロウ材3と端子電極2b,端子電極パッド1bまたはこれらを接続するロウ材4との接触の発生が少なくなるので、実装後に電子装置10の特性が変動することを抑えることができる。   Further, in the process of mounting the electronic device 10 on a circuit board such as a mother board using mounting solder, moisture and gas remaining in the resin 5 buried between the electronic component 2 and the mounting board 1 are also shown. Even if the annular brazing material 3 that is heated and rapidly expanded and is remelted and softened is pushed from the outside to the inside of the annular conductor 2c and the annular conductor pad 1c, according to the electronic device 10 of the present invention, the resin 5, a plating film 6 having a higher melting point than the annular brazing material 3 is formed so as to cover the outer surface of the annular brazing material 3, so that the plating film 6 is not remelted and maintains its hardness. It acts as a wall against the pressure from the outside, and it becomes difficult for the remelted annular brazing material 3 to be pushed out of the annular conductor 2c and the annular conductor pad 1c and to flow out. 2b , The occurrence of contact with the terminal electrode pad 1b or the brazing material 4 connecting them is reduced, so that fluctuations in the characteristics of the electronic device 10 after mounting can be suppressed.

また、本発明の電子装置10においては、メッキ膜6の形成を、搭載済み集合基板を全体的にニッケルメッキ液に浸漬して無電解メッキ処理することにより行なっているので、環状導体2cの外周および環状導体パッド1cの外周を露出させておけば、この露出している部分にもメッキ膜6を環状ロウ材3の外側の表面から連続して形成することができる。従って、メッキ膜6は、環状導体2cの外周の少なくとも環状ロウ材3側の一部および環状導体パッド1cの外周の少なくとも環状ロウ材3側の一部も覆うように形成されるようになり、これにより、環状ロウ材3が再溶融し軟化したときにおいても、メッキ膜6は、環状導体2cの外周の少なくとも環状ロウ材3側の一部および環状導体パッド1cの外周の少なくとも環状ロウ材3側の一部で固定されることになるので、壁の役割を果たすメッキ膜6が動きにくくなり、再溶融した環状ロウ材3が環状導体2cおよび環状導体パッド1cの内側に押し出されて流れ出すことがよりいっそう起こりにくいものとなる。なお、メッキ処理する際に環状導体2cの外周および環状導体パッド1cの外周を露出させるためには、搭載済み集合基板を全体的にニッケルメッキ液に浸漬する前に、酸性またはアルカリ性の溶液に浸し、環状導体2cおよび環状導体パッド1cの外周にまで回り込んでいる環状ロウ材3(通常は数μm程度の厚みで周りこんでいる。)を溶かして取り除くようにすればよい。   Further, in the electronic device 10 of the present invention, the plating film 6 is formed by electroless plating by immersing the mounted aggregate substrate as a whole in a nickel plating solution. If the outer periphery of the annular conductor pad 1 c is exposed, the plating film 6 can be continuously formed on the exposed portion from the outer surface of the annular brazing material 3. Accordingly, the plating film 6 is formed so as to cover at least part of the outer periphery of the annular conductor 2c on the annular brazing material 3 side and at least part of the outer periphery of the annular conductor pad 1c on the annular brazing material 3 side, As a result, even when the annular brazing material 3 is remelted and softened, the plating film 6 has at least a part of the outer circumference of the annular conductor 2c on the annular brazing material 3 side and at least the annular brazing material 3 on the outer circumference of the annular conductor pad 1c. Since the plating film 6 serving as a wall is difficult to move, the re-melted annular brazing material 3 is pushed out of the annular conductor 2c and the annular conductor pad 1c and flows out. Is more difficult to occur. In order to expose the outer periphery of the annular conductor 2c and the outer periphery of the annular conductor pad 1c during plating, the mounted assembly board is immersed in an acidic or alkaline solution before being entirely immersed in the nickel plating solution. The annular brazing material 3 (usually enveloping with a thickness of about several μm) that wraps around the outer periphery of the annular conductor 2c and the annular conductor pad 1c may be melted and removed.

かくして、本例の電子装置10は、弾性表面波を利用したQ値の高い電子装置として用いることが可能である。しかも、小型で面実装タイプとしているので、特に携帯電話等の小型化が要求される携帯情報端末のマザーボードに実装して用いる電子装置として適したものである。   Thus, the electronic device 10 of this example can be used as an electronic device having a high Q value using surface acoustic waves. In addition, since it is small and surface-mounted, it is particularly suitable as an electronic device that is mounted on a mother board of a portable information terminal that is required to be miniaturized, such as a mobile phone.

なお、本発明は以上に説明した実施の形態の例に限定されるものではなく、本発明の要旨を逸脱しない範囲において種々の変更や改良等が可能である。   It should be noted that the present invention is not limited to the embodiments described above, and various modifications and improvements can be made without departing from the scope of the present invention.

例えば、前述の本発明の電子装置10の一例は電子部品2として弾性表面波素子を用いた電子装置10としているが、本発明の電子装置10は、この他に、電子部品2として薄膜バルク弾性波素子を用いたものなどの実装用基板1との間に所定の空間7を確保することが必要な素子とすることも可能である。   For example, an example of the electronic device 10 of the present invention is an electronic device 10 using a surface acoustic wave element as the electronic component 2. In addition, the electronic device 10 of the present invention is a thin film bulk elastic as the electronic component 2. It is also possible to use an element that requires a predetermined space 7 between the mounting substrate 1 and the like using a wave element.

また、前述の一例においては、樹脂5は、実装用基板1と電子部品2との間の4隅に形成された構成となっているが、環状ロウ材3の外周全体を取り囲むような形状に形成して樹脂5を環状に一体化させ、樹脂5の形状の安定化を図るようにしてもよい。   In the above example, the resin 5 is formed at the four corners between the mounting substrate 1 and the electronic component 2, but has a shape surrounding the entire outer periphery of the annular brazing material 3. The resin 5 may be formed in a ring shape to stabilize the shape of the resin 5.

また、前述の一例においては、樹脂5は、実装用基板1の上面から電子部品2の側面および上面にかけて被覆した形状に形成してもよく、このような構成であれば、樹脂5は電子部品2の保護を兼ねることもできる。   In the above-described example, the resin 5 may be formed in a shape that covers from the upper surface of the mounting substrate 1 to the side surface and the upper surface of the electronic component 2. With such a configuration, the resin 5 is an electronic component. It can also serve as protection of 2.

本発明の電子装置10として、電子部品2に弾性表面波素子を用い、実装用基板1に多層回路基板を用いたサンプルを作製し、回路基板上に実装した後の環状ロウ材3の流れ出し状態を評価した。   As the electronic device 10 of the present invention, a sample using a surface acoustic wave element for the electronic component 2 and a multilayer circuit board for the mounting substrate 1 is produced, and the annular brazing material 3 flows out after being mounted on the circuit board Evaluated.

電子部品2に用いる圧電基板2aとしてはタンタル酸リチウム単結晶を用いた。また、圧電基板2aの下面に形成されたIDT電極2d,一対の反射器電極2e,複数の端子電極2bおよびこれらを取り囲む環状導体2c等の導体パターンは、厚みが6nmのチタン薄膜と厚みが130nmのアルミニウム−銅薄膜とを交互に各3層ずつ積層してなる積層膜とした。   As the piezoelectric substrate 2a used for the electronic component 2, a lithium tantalate single crystal was used. The conductor pattern such as the IDT electrode 2d, the pair of reflector electrodes 2e, the plurality of terminal electrodes 2b, and the annular conductor 2c surrounding them formed on the lower surface of the piezoelectric substrate 2a has a titanium thin film with a thickness of 6 nm and a thickness of 130 nm. The laminated film was formed by alternately laminating three aluminum and copper thin films.

実装用基板1は集合基板とし、絶縁基板1aの材料としてはガラスセラミックスを用いた。また、絶縁基板1aの上面に形成された端子電極パッド1bおよび環状導体パッド1c,絶縁基板1aの下面に形成された実装用の外部端子1d等の導体パッドは、厚みが10μmの銀を主成分とする導体膜の表面に2μmのニッケル膜が形成され、さらにその表面に1μm以下の金膜が形成されたものとした。   The mounting substrate 1 was a collective substrate, and glass ceramics was used as the material of the insulating substrate 1a. Further, the terminal electrode pad 1b and the annular conductor pad 1c formed on the upper surface of the insulating substrate 1a, and the conductor pads such as the external terminal 1d for mounting formed on the lower surface of the insulating substrate 1a are mainly composed of silver having a thickness of 10 μm. A 2 μm nickel film was formed on the surface of the conductor film, and a gold film of 1 μm or less was further formed on the surface.

集合基板の各実装用基板1上に、端子電極パッド1bおよび環状導体パッド1cを覆うようにしてスクリーン印刷等により錫−アンチモン系のハンダペーストを塗布し、210〜230℃で加熱溶融してハンダバンプを形成した。次に、端子電極パッド1bと端子電極2b、環状導体パッド1cと環状導体2cがそれぞれ一対一に対応するようにして電子部品2をそれぞれ各実装用基板1上に載せ、120〜180℃に加熱した上で、電子部品2に上から圧力と超音波振動を与えて端子電極2bおよび環状導体2cとハンダバンプとを超音波融着して仮固定した。次に、仮固定した複数の電子部品2および集合基板をチャンバー内に投入してN雰囲気中で210〜230℃で加熱してハンダバンプを再溶融させた後に固化させてロウ材4および環状ロウ材3を形成し、搭載済み集合基板を作製した。そして、この搭載済み集合基板を全体的にニッケルメッキ液に浸漬して無電解メッキ処理することにより環状ロウ材3の外側の表面を覆うようにメッキ膜6を形成した。さらに、メッキ膜6よりも外側で、搭載済み集合基板の上面と電子部品2との間に、溶剤,エポキシ樹脂,熱硬化剤等を混合してなる樹脂ペーストを塗布し、150℃のオーブンで1時間加熱して硬化させ、さらに、搭載済み集合基板の隣り合う電子部品2同士の間をダイシングソーを用いて切断することにより、本発明の電子装置10の実施例のサンプルを作製した。サンプルの数は5個用意した。 A tin-antimony solder paste is applied to each mounting substrate 1 of the collective substrate by screen printing or the like so as to cover the terminal electrode pads 1b and the annular conductor pads 1c, and then heated and melted at 210 to 230 ° C. to form solder bumps. Formed. Next, the electronic component 2 is placed on each mounting substrate 1 so that the terminal electrode pad 1b and the terminal electrode 2b, the annular conductor pad 1c and the annular conductor 2c correspond to each other one by one, and heated to 120 to 180 ° C. Then, pressure and ultrasonic vibration were applied to the electronic component 2 from above, and the terminal electrode 2b, the annular conductor 2c, and the solder bump were ultrasonically fused and temporarily fixed. Next, a plurality of temporarily fixed electronic components 2 and an assembly board are put into a chamber, heated at 210 to 230 ° C. in an N 2 atmosphere to remelt the solder bumps, and then solidified to be brazed material 4 and annular brazing. The material 3 was formed, and a mounted aggregate substrate was produced. Then, the mounted aggregate substrate was entirely immersed in a nickel plating solution and subjected to electroless plating, thereby forming a plating film 6 so as to cover the outer surface of the annular brazing material 3. Furthermore, a resin paste made by mixing a solvent, an epoxy resin, a thermosetting agent, and the like is applied between the upper surface of the mounted assembly board and the electronic component 2 outside the plating film 6, and is then heated in an oven at 150 ° C. A sample of an example of the electronic device 10 of the present invention was produced by heating and curing for 1 hour, and further cutting between adjacent electronic components 2 of the mounted assembly board using a dicing saw. Five samples were prepared.

また、比較例として、環状ロウ材3の外側の表面にメッキ膜6を形成しない電子装置を5個作製した。   Further, as a comparative example, five electronic devices in which the plating film 6 was not formed on the outer surface of the annular brazing material 3 were produced.

本発明の電子装置10の実施例のサンプルおよび比較例のサンプルについて、ピーク温度220℃で回路基板上に実装し、それぞれのサンプルについて、電子部品2と実装用基板1との間隙(空間7)の中間位置で電子部品2および実装用基板1を切り離すように環状ロウ材3を切断し、環状ロウ材3の環状導体2cおよび環状導体パッド1cの内側への流れ出し状態を観察した。観察した結果、本発明の電子装置10の実施例のサンプルについては、環状ロウ材3の環状導体2cおよび環状導体パッド1cの内側への流れ出しは見られなかった。これに対して、環状ロウ材3の外側の表面にメッキ膜6を形成していない比較例のサンプルについては、いずれにも樹脂5が配置された箇所に対応した位置のいくつかに、環状ロウ材3の環状導体2cおよび環状導体パッド1cの内側への流れ出し箇所が見つかった。   The sample of the embodiment of the electronic device 10 of the present invention and the sample of the comparative example are mounted on a circuit board at a peak temperature of 220 ° C., and the gap (space 7) between the electronic component 2 and the mounting board 1 for each sample. The annular brazing material 3 was cut so as to separate the electronic component 2 and the mounting substrate 1 at an intermediate position, and the state of the annular brazing material 3 flowing into the annular conductor 2c and the annular conductor pad 1c was observed. As a result of observation, in the sample of the example of the electronic device 10 of the present invention, the flow of the annular brazing material 3 to the inside of the annular conductor 2c and the annular conductor pad 1c was not observed. On the other hand, with respect to the sample of the comparative example in which the plating film 6 is not formed on the outer surface of the annular brazing material 3, the annular brazing material is placed at some positions corresponding to the locations where the resin 5 is disposed. A portion of the material 3 flowing out to the inside of the annular conductor 2c and the annular conductor pad 1c was found.

すなわち、本発明の電子装置10の実施例のサンプルでは、樹脂5の内側で、環状ロウ材3の外側の表面を覆うように環状ロウ材3よりも融点が高いメッキ膜6が形成されていることから、このメッキ膜6が再溶融されずに硬度を保って外側からの圧力に対して壁の役割を果たすので、再溶融した環状ロウ材3が環状導体2cおよび環状導体パッド1cの内側に押し出されて流れ出すことが起こりにくくなることが確認できた。従って、本発明の電子装置10によれば、環状ロウ材3と端子電極2b,端子電極パッド1bまたはこれらを接続するロウ材4との接触の発生が少なくなるので、実装後に電子装置10の特性が変動するという不具合を少なくすることができることが確認できた。   That is, in the sample of the embodiment of the electronic device 10 of the present invention, the plating film 6 having a higher melting point than the annular brazing material 3 is formed inside the resin 5 so as to cover the outer surface of the annular brazing material 3. Therefore, since the plating film 6 is not remelted and maintains hardness and acts as a wall against pressure from the outside, the remelted annular brazing material 3 is placed inside the annular conductor 2c and the annular conductor pad 1c. It was confirmed that it was less likely to be pushed out and flow out. Therefore, according to the electronic device 10 of the present invention, the occurrence of contact between the annular brazing material 3 and the terminal electrode 2b, the terminal electrode pad 1b or the brazing material 4 connecting them is reduced. It was confirmed that the problem of fluctuations can be reduced.

本発明の電子装置の実施の形態の一例を示す外観斜視図である。It is an external appearance perspective view which shows an example of embodiment of the electronic device of this invention. 図1のA−A’線断面図である。FIG. 2 is a cross-sectional view taken along line A-A ′ of FIG. 1. 電子部品を下方から見た外観斜視図である。It is the external appearance perspective view which looked at the electronic component from the downward direction. 実装用基板を上方から見た外観斜視図である。It is the external appearance perspective view which looked at the board | substrate for mounting from upper direction. 図2の要部Zを拡大した図である。It is the figure which expanded the principal part Z of FIG.

符号の説明Explanation of symbols

1・・・実装用基板
1a・・・絶縁基板
1b・・・端子電極パッド
1c・・・環状導体パッド
1d・・・外部端子
2・・・電子部品
2a・・・圧電基板
2b・・・端子電極
2c・・・環状導体
2d・・・IDT電極
2e・・・反射器電極
3・・・環状ロウ材
4・・・ロウ材
5・・・樹脂
6・・・メッキ膜
7・・・空間
10・・・電子装置
DESCRIPTION OF SYMBOLS 1 ... Mounting board 1a ... Insulating substrate 1b ... Terminal electrode pad 1c ... Annular conductor pad 1d ... External terminal 2 ... Electronic component 2a ... Piezoelectric substrate 2b ... Terminal Electrode 2c ... annular conductor 2d ... IDT electrode 2e ... reflector electrode 3 ... annular brazing material 4 ... brazing material 5 ... resin 6 ... plating film 7 ... space
10 ... Electronic device

Claims (2)

下面に複数の端子電極および該複数の端子電極を取り囲む環状導体が形成されている電子部品が、上面に前記端子電極に対応する端子電極パッドおよび前記環状導体に対応する環状導体パッドが形成されている実装用基板上に、前記端子電極と前記端子電極パッドとがロウ材を介し、前記環状導体と前記環状導体パッドとが環状ロウ材を介してそれぞれ接続されて搭載されており、前記環状ロウ材の外側の表面を覆うように前記環状ロウ材よりも融点が高いメッキ膜が形成され、該メッキ膜よりも外側で、前記電子部品および前記実装用基板の間に樹脂が埋められていることを特徴とする電子装置。   An electronic component in which a plurality of terminal electrodes and an annular conductor surrounding the plurality of terminal electrodes are formed on the lower surface, a terminal electrode pad corresponding to the terminal electrode and an annular conductor pad corresponding to the annular conductor are formed on the upper surface. On the mounting substrate, the terminal electrode and the terminal electrode pad are mounted with a brazing material, and the annular conductor and the annular conductor pad are connected to each other via an annular brazing material. A plating film having a melting point higher than that of the annular brazing material is formed so as to cover the outer surface of the material, and resin is buried between the electronic component and the mounting substrate outside the plating film. An electronic device characterized by the above. 前記メッキ膜は、前記環状導体の外周の少なくとも前記環状ロウ材側の一部および前記環状導体パッドの外周の少なくとも前記環状ロウ材側の一部も覆うように形成されていることを特徴とする請求項1に記載の電子装置。   The plating film is formed so as to cover at least a part of the outer periphery of the annular conductor on the annular brazing material side and at least a part of the outer periphery of the annular conductor pad on the annular brazing material side. The electronic device according to claim 1.
JP2007112818A 2007-04-23 2007-04-23 Electronic equipment Pending JP2008270594A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013090228A (en) * 2011-10-20 2013-05-13 Kyocera Corp Elastic wave device, electronic component, and manufacturing method of elastic wave device
JP2014143640A (en) * 2013-01-25 2014-08-07 Taiyo Yuden Co Ltd Acoustic wave device and method of manufacturing the same
JP2015130601A (en) * 2014-01-07 2015-07-16 太陽誘電株式会社 module

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013090228A (en) * 2011-10-20 2013-05-13 Kyocera Corp Elastic wave device, electronic component, and manufacturing method of elastic wave device
JP2014143640A (en) * 2013-01-25 2014-08-07 Taiyo Yuden Co Ltd Acoustic wave device and method of manufacturing the same
JP2015130601A (en) * 2014-01-07 2015-07-16 太陽誘電株式会社 module

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