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JP2008136895A - Method and apparatus for treating aqueous cleaning liquid containing temperature-responsive polymer compound - Google Patents

Method and apparatus for treating aqueous cleaning liquid containing temperature-responsive polymer compound Download PDF

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JP2008136895A
JP2008136895A JP2006323240A JP2006323240A JP2008136895A JP 2008136895 A JP2008136895 A JP 2008136895A JP 2006323240 A JP2006323240 A JP 2006323240A JP 2006323240 A JP2006323240 A JP 2006323240A JP 2008136895 A JP2008136895 A JP 2008136895A
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temperature
responsive polymer
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cleaning liquid
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JP5512914B2 (en
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Masanao Watanabe
正直 渡辺
Kenichi Hagiwara
健一 萩原
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Dai Nippon Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for washing a substrate having an immobilized temperature-responsive polymer and a free temperature-responsive polymer present on its surface. <P>SOLUTION: The washing method of the substrate having the immobilized temperature-responsive polymer and the free temperature-responsive polymer present on its surface comprises the washing process of washing the surface of the substrate with an aqueous washing liquid having a temperature less than the lower critical solution temperature of the temperature-responsive polymers to obtain the washing liquid containing the free temperature-responsive polymer, the precipitation process of increasing the temperature of the aqueous washing liquid after the washing to a temperature equal to or more than the lower critical solution temperature of the temperature-responsive polymers to precipitate the temperature-responsive polymer in the aqueous washing liquid, and the separation process of separating the temperature-responsive polymer precipitated in the precipitation process from the aqueous washing liquid. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、温度応答性高分子化合物を含む水系洗浄液の処理方法及び装置、並びに、固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材の洗浄方法及び装置に関する。   The present invention relates to a method and apparatus for treating an aqueous cleaning liquid containing a temperature-responsive polymer compound, and a substrate having a surface on which a fixed temperature-responsive polymer compound and a free temperature-responsive polymer compound are present. The present invention relates to a cleaning method and apparatus.

細胞シートとは、細胞間結合で細胞同士が少なくとも単層で連結されたシート状の細胞集合体である。細胞シートは再生医療などで用いられる。細胞シートはシャーレなどの支持体上で細胞培養を行うことにより得られるが、支持体上で形成された細胞シートは接着分子などを介して支持体表面と強固に結合しているため、細胞−細胞間の結合を壊さずに培養支持体から細胞シートを迅速に剥離することは容易ではない。   The cell sheet is a sheet-like cell aggregate in which cells are connected to each other in at least a single layer by intercellular bonding. Cell sheets are used in regenerative medicine. The cell sheet can be obtained by culturing cells on a support such as a petri dish, but the cell sheet formed on the support is firmly bonded to the support surface via an adhesion molecule or the like. It is not easy to quickly peel the cell sheet from the culture support without breaking the bonds between the cells.

そこで、細胞培養支持体から細胞シートを効率的に剥離する方法として、温度応答性高分子化合物を細胞接着面に固定化した細胞培養支持体を用いる方法が提案されている(特許文献1及び2)。温度応答性高分子化合物は、水系溶液中において下限臨界溶解温度未満の温度で親水性を示し、下限臨界溶解温度以上の温度で疎水性を示すことから、温度応答性高分子化合物が固定化された細胞培養支持体表面は下限臨界溶解温度以上の温度条件では細胞シートの形成に好適な環境であり、下限臨界溶解温度未満の温度では形成された細胞シートの剥離に好適な環境となる。   Thus, as a method for efficiently peeling the cell sheet from the cell culture support, methods using a cell culture support in which a temperature-responsive polymer compound is immobilized on a cell adhesion surface have been proposed (Patent Documents 1 and 2). ). The temperature-responsive polymer compound is hydrophilic at a temperature lower than the lower critical solution temperature and hydrophobic at a temperature equal to or higher than the lower critical solution temperature in an aqueous solution, so that the temperature-responsive polymer compound is immobilized. The surface of the cell culture support is an environment suitable for the formation of a cell sheet under a temperature condition equal to or higher than the lower critical lysis temperature, and an environment suitable for the peeling of the formed cell sheet at a temperature lower than the lower critical lysis temperature.

特公平6−104061号公報Japanese Patent Publication No. 6-104061 特開2005−27532号公報JP 2005-27532 A

細胞培養支持体表面への温度応答性高分子化合物の固定化は、例えば、温度応答性高分子化合物の前駆物質であるモノマーを重合開始剤等の必要な試薬と共に細胞培養支持体の基材表面に存在させた状態で電子線照射(EB)等を施すことにより、モノマー同士の重合反応と、重合物の基材表面への結合反応とを進行させることにより行うことができる。この手順により温度応答性高分子化合物を細胞培養支持体の基材表面に固定化すると、基材表面には基材表面と固定化していない遊離の温度応答性高分子化合物も多量に存在することとなる。そこで基材表面を水系洗浄液により洗浄し、遊離の温度応答性高分子化合物を除去することが行われている。   Immobilization of the temperature-responsive polymer compound on the surface of the cell culture support, for example, the monomer that is a precursor of the temperature-responsive polymer compound together with the necessary reagents such as a polymerization initiator, By carrying out electron beam irradiation (EB) or the like in the state of being present in the polymer, the polymerization reaction between the monomers and the binding reaction of the polymer to the substrate surface can proceed. When the temperature-responsive polymer compound is immobilized on the substrate surface of the cell culture support by this procedure, a large amount of free temperature-responsive polymer compound that is not immobilized on the substrate surface exists on the substrate surface. It becomes. Therefore, the surface of the substrate is washed with an aqueous cleaning solution to remove the free temperature-responsive polymer compound.

こうして発生する洗浄液はBOD(生物化学的酸素要求量)が高いことから、直接環境廃棄することは好ましくない。また、洗浄後の水が再利用できれば水の消費量を抑制することができる。   Since the cleaning liquid generated in this way has a high BOD (biochemical oxygen demand), it is not preferable to directly dispose of it in the environment. Moreover, if the water after washing | cleaning can be reused, the consumption of water can be suppressed.

そこで本発明は、温度応答性高分子化合物を含む水系洗浄液から温度応答性高分子化合物を除去するとともに、除去後の洗浄液を再利用するために有効な手段を提供することを目的とする。   Accordingly, an object of the present invention is to provide an effective means for removing the temperature-responsive polymer compound from the aqueous cleaning liquid containing the temperature-responsive polymer compound and reusing the cleaning liquid after the removal.

本発明は以下の発明を包含する。
(1)温度応答性高分子化合物を含む水系洗浄液の処理方法であって、温度応答性高分子化合物を含む水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高めることにより水系洗浄液中の温度応答性高分子を析出させる析出工程と、前記析出工程で析出した温度応答性高分子を水系洗浄液から分離する分離工程とを含む前記方法。
The present invention includes the following inventions.
(1) A method for treating an aqueous cleaning solution containing a temperature-responsive polymer compound, wherein the temperature of the aqueous cleaning solution containing the temperature-responsive polymer compound is increased to a temperature equal to or higher than the lower critical solution temperature of the temperature-responsive polymer compound. The method comprising: a precipitation step of precipitating a temperature-responsive polymer in an aqueous cleaning solution; and a separation step of separating the temperature-responsive polymer precipitated in the precipitation step from the aqueous cleaning solution.

(2)固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材の洗浄方法であって、前記基材の表面を、前記温度応答性高分子化合物の下限臨界溶解温度未満の温度の水系洗浄液により洗浄して遊離の温度応答性高分子化合物を含む水系洗浄液を得る洗浄工程と、洗浄後の前記水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高めることにより水系洗浄液中の温度応答性高分子を析出させる析出工程と、前記析出工程で析出した温度応答性高分子を水系洗浄液から分離する分離工程とを含む前記方法。 (2) A method for cleaning a substrate in which an immobilized temperature-responsive polymer compound and a free temperature-responsive polymer compound are present on the surface, wherein the surface of the substrate is coated with the temperature-responsive polymer A washing step of obtaining an aqueous washing solution containing a free temperature-responsive polymer compound by washing with an aqueous washing solution having a temperature lower than the lower critical solution temperature of the compound, and the temperature-responsive polymer compound after the washing The method comprising the precipitation step of precipitating the temperature-responsive polymer in the aqueous cleaning liquid by raising the temperature to the lower critical solution temperature or higher, and the separation step of separating the temperature-responsive polymer precipitated in the precipitation step from the aqueous cleaning liquid .

(3)分離工程後の水系洗浄液の温度を下限臨界溶解温度未満に低下させた後、洗浄工程において再利用する、(2)記載の方法。
(4)固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材が、基材表面に、温度応答性高分子化合物の前駆物質であるモノマーを存在せしめ、基材表面上において重合反応と基材表面への結合反応とを進行させることにより形成されたものである(2)又は(3)記載の方法。
(3) The method according to (2), wherein the temperature of the aqueous cleaning liquid after the separation step is reduced to less than the lower critical solution temperature and then reused in the cleaning step.
(4) The base material on which the immobilized temperature-responsive polymer compound and the free temperature-responsive polymer compound exist on the surface has a monomer that is a precursor of the temperature-responsive polymer compound on the surface of the base material. The method according to (2) or (3), which is formed by causing the polymerization reaction and the binding reaction to the substrate surface to proceed on the substrate surface.

(5)固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材が、基材表面に、温度応答性高分子化合物の前駆物質であるモノマー及びプレポリマーを存在せしめ、基材表面上において重合反応と基材表面への結合反応とを進行させることにより形成されたものである(2)又は(3)記載の方法。
(6)前記基材が細胞培養支持体である(2)〜(5)のいずれかに記載の方法。
(5) The substrate on which the immobilized temperature-responsive polymer compound and the free temperature-responsive polymer compound are present on the surface has a monomer that is a precursor of the temperature-responsive polymer compound on the substrate surface, and The method according to (2) or (3), which is formed by allowing a prepolymer to exist and causing a polymerization reaction and a binding reaction to the substrate surface to proceed on the substrate surface.
(6) The method according to any one of (2) to (5), wherein the substrate is a cell culture support.

(7)温度応答性高分子化合物を含む水系洗浄液の処理装置であって、前記水系洗浄液を収容する液槽と、前記液槽に収容された水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高める加温手段と、前記加温により形成される温度応答性高分子の析出物を水系洗浄液から分離する分離手段とを備える前記装置。 (7) An apparatus for treating an aqueous cleaning liquid containing a temperature-responsive polymer compound, the liquid tank storing the aqueous cleaning liquid, and the temperature of the aqueous cleaning liquid stored in the liquid tank of the temperature-responsive polymer compound The said apparatus provided with the heating means which raises more than a lower critical solution temperature, and the isolation | separation means which isolate | separates the deposit of the temperature-responsive polymer formed by the said heating from an aqueous cleaning liquid.

(8)固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材を洗浄するための洗浄装置であって、前記基材の表面を、前記温度応答性高分子化合物の下限臨界溶解温度未満の温度の水系洗浄液により洗浄して遊離の温度応答性高分子化合物を基材表面から除去する洗浄手段と、前記洗浄により発生する温度応答性高分子化合物を含む水系洗浄液を収容する液槽と、前記液槽に収容された水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高める加温手段と、前記加温により形成される温度応答性高分子の析出物を水系洗浄液から分離する分離手段とを備える前記装置。 (8) A cleaning apparatus for cleaning a substrate on which the immobilized temperature-responsive polymer compound and the free temperature-responsive polymer compound are present, the surface of the substrate being subjected to the temperature Cleaning means for removing free temperature-responsive polymer compound from the surface of the substrate by washing with an aqueous cleaning solution having a temperature lower than the lower critical solution temperature of the responsive polymer compound, and temperature-responsive polymer compound generated by the washing A liquid tank containing a water-based cleaning liquid containing, a heating means for raising the temperature of the water-based cleaning liquid stored in the liquid tank to a temperature equal to or higher than a lower critical solution temperature of the temperature-responsive polymer compound, and the heating. Separating means for separating the temperature-responsive polymer precipitate from the aqueous cleaning liquid.

(9)前記分離後の水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度未満に低下させる冷却手段と、前記冷却後の水系洗浄液を前記洗浄手段に供給する供給手段とを更に備える(8)記載の装置。 (9) A cooling means for lowering the temperature of the aqueous cleaning liquid after the separation below the lower critical solution temperature of the temperature-responsive polymer compound, and a supply means for supplying the aqueous cleaning liquid after cooling to the cleaning means A device according to (8).

本発明により、温度応答性高分子化合物が表面に固定化された基材を製造する際に発生する洗浄排水のBODを低くすることができる。また、本発明により温度応答性高分子化合物が除去された洗浄液は、温度応答性高分子化合物を洗浄除去する目的で再利用することが可能である。   According to the present invention, it is possible to reduce the BOD of washing wastewater generated when a substrate having a temperature-responsive polymer compound immobilized on the surface thereof is produced. The cleaning liquid from which the temperature-responsive polymer compound has been removed according to the present invention can be reused for the purpose of washing and removing the temperature-responsive polymer compound.

(温度応答性高分子化合物及び基材)
本発明に用いられる温度応答性高分子化合物は水中において温度条件に応じて疎水性状態と親水性状態とが可逆的に変化する高分子化合物を指す。本発明に用いられる温度応答性高分子化合物は、所定の温度以上では疎水性となって水に不溶であり、所定の温度未満であれば親水性となって水に可溶となる高分子化合物である。当該所定の温度を「下限臨界溶解温度」と称する。温度応答性高分子化合物の挙動を図1に模式的に示す。
(Temperature responsive polymer compound and substrate)
The temperature-responsive polymer compound used in the present invention refers to a polymer compound in which a hydrophobic state and a hydrophilic state reversibly change in water according to temperature conditions. The temperature-responsive polymer compound used in the present invention is a polymer compound that becomes hydrophobic and insoluble in water above a predetermined temperature and becomes hydrophilic and soluble in water below a predetermined temperature. It is. The predetermined temperature is referred to as a “lower critical solution temperature”. The behavior of the temperature-responsive polymer compound is schematically shown in FIG.

本発明に好適に使用できる温度応答性高分子化合物としては、下限臨界溶解温度が細胞培養温度(通常は37℃程度)よりも低く、細胞培養温度条件において疎水性のものが好ましい。好適な温度応答性高分子化合物としては、例えば特許文献1に記載の高分子化合物が挙げられ、具体的には、例えばポリ−N−イソ,プロピルアクリルアミド(下限臨界溶解温度(LCST)=32℃)、ポリ−N−n−プロピルアクリルアミド(LCST=21℃)、ポリ−N−n−プロピルメタクリルアミド(LCST=32℃)、ポリ−N−エトキシエチルアクリルアミド(LCST=約35℃)、ポリ−N−テトラヒドロフルフリルアクリルアミド(LCST=約28℃)、ポリ−N−テトラヒドロフルフリルメタクリルアミド(LCST=約35℃)、及びポリ−N,N−ジエチルアクリルアミド(LCST=32℃)等が挙げられる。その他のポリマーとしては、例えばポリ−N−エチルアクリルアミド、ポリ−N−イソプロピルメタクリルアミド、ポリ−N−シクロプロピルアクリルアミド、ポリ−N−シクロプロピルメタクリルアミド、ポリ−N−アクリロイルピロリジン、ポリ−N−アクリロイルピペリジン、ポリメチルビニルエーテル、メチルセルロース、エチルセルロース、ヒドロキシプロピルセルロース等のアルキル置換セルロース誘導体や、ポリポリプロピレンオキサイドとポリエチレンオキサイドとのブロック共重合体等に代表されるポリアルキレンオキサイドブロック共重合体や、ポリアルキレンオキサイドブロック共重合体が挙げられる。これらのポリマーは、例えばモノマーの単独重合体がLCST=0〜80℃を有するようなモノマーの単独重合若しくは共重合により調製される。モノマーとしては例えば、(メタ)アクリルアミド化合物、N−(若しくはN,N−ジ)アルキル置換(メタ)アクリルアミド誘導体、環状基を有する(メタ)アクリルアミド誘導体、及びビニルエーテル誘導体等が挙げられ、これらの1種以上を使用してよい。また、増殖細胞の種類によってLCSTを調節する必要がある場合や、被覆物質と細胞培養支持体との相互作用を高める必要が生じた場合や、細胞支持体の親水・疎水性のバランスを調整する必要がある場合などには、上記以外の他のモノマー類を更に加えて共重合してよい。更に本発明に使用する上記ポリマーとその他のポリマーとのグラフトまたはブロック共重合体、あるいは上記ポリマーと他のポリマーとの混合物を用いてもよい。また、ポリマー本来の性質が損なわれない範囲で架橋することも可能である。   As the temperature-responsive polymer compound that can be suitably used in the present invention, a lower critical solution temperature is lower than the cell culture temperature (usually about 37 ° C.) and is hydrophobic under the cell culture temperature conditions. Suitable temperature-responsive polymer compounds include, for example, polymer compounds described in Patent Document 1, and specifically, for example, poly-N-iso, propylacrylamide (lower critical solution temperature (LCST) = 32 ° C. ), Poly-Nn-propyl acrylamide (LCST = 21 ° C.), poly-Nn-propyl methacrylamide (LCST = 32 ° C.), poly-N-ethoxyethyl acrylamide (LCST = about 35 ° C.), poly- N-tetrahydrofurfuryl acrylamide (LCST = about 28 ° C.), poly-N-tetrahydrofurfuryl methacrylamide (LCST = about 35 ° C.), poly-N, N-diethylacrylamide (LCST = 32 ° C.) and the like . Examples of other polymers include poly-N-ethylacrylamide, poly-N-isopropylmethacrylamide, poly-N-cyclopropylacrylamide, poly-N-cyclopropylmethacrylamide, poly-N-acryloylpyrrolidine, poly-N- Polyalkylene oxide block copolymers represented by alkyl-substituted cellulose derivatives such as acryloyl piperidine, polymethyl vinyl ether, methyl cellulose, ethyl cellulose, hydroxypropyl cellulose, block copolymers of polypolypropylene oxide and polyethylene oxide, and polyalkylenes An oxide block copolymer is mentioned. These polymers are prepared, for example, by homopolymerization or copolymerization of monomers such that the monomer homopolymer has LCST = 0-80 ° C. Examples of the monomer include (meth) acrylamide compounds, N- (or N, N-di) alkyl-substituted (meth) acrylamide derivatives, (meth) acrylamide derivatives having a cyclic group, and vinyl ether derivatives. More than seeds may be used. In addition, when it is necessary to regulate LCST depending on the type of proliferating cells, when it is necessary to enhance the interaction between the coating substance and the cell culture support, or to adjust the hydrophilic / hydrophobic balance of the cell support. If necessary, other monomers other than those described above may be further added for copolymerization. Further, a graft or block copolymer of the above polymer and other polymer used in the present invention, or a mixture of the above polymer and another polymer may be used. Moreover, it is also possible to crosslink within a range where the original properties of the polymer are not impaired.

本発明において「基材」とは、その表面に上述の温度応答性高分子化合物を化学的又は物理的に固定化できるものである限り特に限定されないが、具体的にはポリスチレン、ポリエチレン、ポリカーボネート、ウレタンアクリレート、ナイロン等からなる基材が挙げられる。基材は典型的には細胞培養支持体である。細胞培養支持体の形状としては、シート形状やシャーレ形状が挙げられる。シャーレ形状の細胞培養支持体は、少なくともその底部として、シャーレ内に面した表面に温度応答性高分子化合物が固定化された基材を含む。   In the present invention, the “substrate” is not particularly limited as long as the above-described temperature-responsive polymer compound can be chemically or physically immobilized on the surface thereof. Specifically, polystyrene, polyethylene, polycarbonate, Examples of the base material include urethane acrylate and nylon. The substrate is typically a cell culture support. Examples of the shape of the cell culture support include a sheet shape and a petri dish shape. The petri dish-shaped cell culture support includes, as at least the bottom thereof, a base material on which a temperature-responsive polymer compound is immobilized on the surface facing the petri dish.

本発明は、固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材の洗浄方法、或いは当該洗浄により排水として生じる水系洗浄液の処理方法に関する。ここでいう「固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材」は、典型的には、基材表面に、温度応答性高分子化合物の前駆物質であるモノマーを存在せしめ、或いはモノマーとある程度重合が進んだプレポリマーとを存在せしめ、基材表面上において重合反応と基材表面への結合反応とを進行させることにより形成される。基材表面上において重合反応と基材表面への結合反応とを進行させる方法としては、電子線照射(EB)、γ線照射、紫外線照射、プラズマ処理、コロナ処理等の各種処理、好ましくは電子線照射処理により、重合反応と、生成された重合化合物と基材構成材料との間の共有結合形成反応とを進行させる方法が挙げられる。この場合、必要に応じて重合開始剤等を共存させることができる。こうして処理された基材表面には固定化された温度応答性高分子化合物と、固定化されなかった遊離の温度応答性高分子化合物とが存在することとなる。   The present invention relates to a method for cleaning a substrate on which a fixed temperature-responsive polymer compound and a free temperature-responsive polymer compound are present on the surface, or a method for treating an aqueous cleaning solution generated as waste water by the cleaning. The “substrate having the immobilized temperature-responsive polymer compound and the free temperature-responsive polymer compound on the surface” as used herein is typically a temperature-responsive polymer compound on the substrate surface. It is formed by allowing the monomer, which is a precursor, to be present, or the monomer and a prepolymer that has been polymerized to some extent, to advance the polymerization reaction and the binding reaction to the substrate surface on the substrate surface. Various methods such as electron beam irradiation (EB), γ-ray irradiation, ultraviolet irradiation, plasma treatment, corona treatment, etc., preferably electrons are used as a method for proceeding the polymerization reaction and the binding reaction to the substrate surface on the substrate surface. The method of advancing a polymerization reaction and the covalent bond formation reaction between the produced | generated polymerization compound and a base-material constituent material by an irradiation process is mentioned. In this case, a polymerization initiator or the like can coexist as necessary. On the surface of the base material treated in this manner, there are immobilized temperature-responsive polymer compounds and free temperature-responsive polymer compounds that have not been immobilized.

(水系洗浄液)
本発明において「水系洗浄液」とは典型的には水であるが、それには限られず、各種水溶性塩や、親水性有機溶媒(例えばアルコール類)が溶解された水溶液であってもよい。
(Aqueous cleaning solution)
In the present invention, the “aqueous cleaning liquid” is typically water, but is not limited thereto, and may be an aqueous solution in which various water-soluble salts and hydrophilic organic solvents (for example, alcohols) are dissolved.

(温度応答性高分子化合物を含む水系洗浄液の処理方法及び装置)
本発明は、温度応答性高分子化合物を含む水系洗浄液の処理方法であって、温度応答性高分子化合物を含む水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高めることにより水系洗浄液中の温度応答性高分子を析出させる析出工程と、前記析出工程で析出した温度応答性高分子を水系洗浄液から分離する分離工程とを含む前記方法に関する。本発明はまた当該方法を実施するための装置に関する。処理の対象となる「温度応答性高分子化合物を含む水系洗浄液」は、典型的には、固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材を、当該温度応答性高分子化合物の下限臨界溶解温度未満の温度の水系洗浄液により洗浄する際の排出液として発生する。以下、本発明の一実施形態について図2に基づいて説明する。
(Method and apparatus for treating aqueous cleaning liquid containing temperature-responsive polymer compound)
The present invention is a method for treating an aqueous cleaning solution containing a temperature-responsive polymer compound, wherein the temperature of the aqueous cleaning solution containing the temperature-responsive polymer compound is increased to a temperature equal to or higher than the lower critical solution temperature of the temperature-responsive polymer compound. The method includes a precipitation step of precipitating the temperature-responsive polymer in the aqueous cleaning solution by the step, and a separation step of separating the temperature-responsive polymer deposited in the precipitation step from the aqueous cleaning solution. The invention also relates to an apparatus for carrying out the method. The “aqueous cleaning solution containing a temperature-responsive polymer compound” to be treated is typically a group in which an immobilized temperature-responsive polymer compound and a free temperature-responsive polymer compound are present on the surface. It is generated as a discharged liquid when the material is washed with an aqueous washing liquid having a temperature lower than the lower critical solution temperature of the temperature-responsive polymer compound. Hereinafter, an embodiment of the present invention will be described with reference to FIG.

温度応答性高分子化合物を含む水系洗浄液は液槽21に収容される。液槽21には加熱装置(加熱手段)22が備えられており、ヒーター(加温手段)22により液槽21中の水系洗浄液の温度が、温度応答性高分子化合物の下限臨界溶解温度以上に高められる。加熱を効率的に行うためには、液槽21中には処理すべき水系洗浄液を攪拌するための攪拌手段(典型的にはマグネチックスターラー、攪拌翼等)が更に設けられていてもよい。液槽21中での加温により水系洗浄液中の温度応答性高分子化合物は固形分として析出する。析出工程において、水系洗浄液の温度は、温度応答性高分子化合物の下限臨界溶解温度がT℃である場合、T+0〜20℃まで高められることが好ましい。加温により生じた析出物を含む水系洗浄液をろ過器(分離手段)23に移してろ過を行い、温度応答性高分子化合物が除去された洗浄水をろ液として回収し、温度応答性高分子を残留固形分として回収する。分離手段としてはろ過器には限定されず、析出した温度応答性高分子を沈殿物として回収し、温度応答性高分子化合物が除去された洗浄水を上清として回収する沈殿分離槽を用いることができる。また、分離手段として遠沈管と遠心分離器との組み合わせを使用することもできる。分離手段は、分離操作のあいだ分離対象物の温度を下限臨界溶解温度以上に保持できるものであることが好ましい。   The aqueous cleaning liquid containing the temperature-responsive polymer compound is stored in the liquid tank 21. The liquid tank 21 is provided with a heating device (heating means) 22, and the temperature of the aqueous cleaning liquid in the liquid tank 21 is higher than the lower critical solution temperature of the temperature-responsive polymer compound by the heater (heating means) 22. Enhanced. In order to perform heating efficiently, the liquid tank 21 may further be provided with stirring means (typically, a magnetic stirrer, a stirring blade, etc.) for stirring the aqueous cleaning liquid to be processed. The temperature-responsive polymer compound in the aqueous cleaning liquid is precipitated as a solid by heating in the liquid tank 21. In the precipitation step, the temperature of the aqueous cleaning liquid is preferably increased to T + 0 to 20 ° C. when the lower critical solution temperature of the temperature-responsive polymer compound is T ° C. The aqueous cleaning liquid containing the precipitate generated by heating is transferred to a filter (separation means) 23 and filtered, and the cleaning water from which the temperature-responsive polymer compound has been removed is recovered as a filtrate, and the temperature-responsive polymer is recovered. Is recovered as a residual solid. The separation means is not limited to a filter, and a precipitation separation tank that collects the precipitated temperature-responsive polymer as a precipitate and collects washing water from which the temperature-responsive polymer compound has been removed as a supernatant is used. Can do. Moreover, the combination of a centrifuge tube and a centrifuge can also be used as a separating means. It is preferable that the separation means be capable of maintaining the temperature of the separation object above the lower critical solution temperature during the separation operation.

また、加温手段を備える液槽と分離手段とは一体化することも容易である。例えば、加温手段を備える沈殿分離槽に直接、温度応答性高分子化合物を含む水系洗浄液を投入し、当該沈殿分離槽中で温度応答性高分子化合物を沈殿として析出させ、析出した温度応答性高分子化合物を沈殿物として回収し、温度応答性高分子化合物が除去された洗浄水を上清として回収する実施形態では、沈殿分離槽は液槽と分離手段とが一体化されたものとみなすことができる。   Moreover, it is easy to integrate the liquid tank provided with the heating means and the separation means. For example, an aqueous cleaning solution containing a temperature-responsive polymer compound is directly put into a precipitation separation tank equipped with a heating means, and the temperature-responsive polymer compound is precipitated as a precipitate in the precipitation separation tank, and the deposited temperature responsiveness In the embodiment in which the polymer compound is recovered as a precipitate and the washing water from which the temperature-responsive polymer compound has been removed is recovered as a supernatant, the precipitation separation tank is regarded as an integrated liquid tank and separation means. be able to.

(固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材の洗浄方法及び装置)
本発明はまた、固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材の洗浄方法であって、前記基材の表面を、前記温度応答性高分子化合物の下限臨界溶解温度未満の温度の水系洗浄液により洗浄して遊離の温度応答性高分子化合物を含む水系洗浄液を得る洗浄工程と、洗浄後の前記水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高めることにより水系洗浄液中の温度応答性高分子を析出させる析出工程と、前記析出工程で析出した温度応答性高分子を水系洗浄液から分離する分離工程とを含む前記方法に関する。本発明はまた当該方法を実施するための装置に関する。以下、本発明の一実施形態について図3に基づいて説明する。図3中、図2と同じ符号が付記されている構成要素の名称及び機能は図2に関して説明した構成要素と同じである。
(Cleaning method and apparatus for base material having immobilized temperature-responsive polymer compound and free temperature-responsive polymer compound on the surface)
The present invention also provides a cleaning method for a substrate in which an immobilized temperature-responsive polymer compound and a free temperature-responsive polymer compound are present on the surface, the surface of the substrate being subjected to the temperature-responsive property. A washing step of washing with an aqueous washing liquid having a temperature lower than the lower critical solution temperature of the polymer compound to obtain an aqueous washing liquid containing a free temperature-responsive polymer compound, and the temperature of the aqueous washing liquid after washing is set to a high temperature responsiveness. A precipitation step of precipitating the temperature-responsive polymer in the aqueous cleaning liquid by raising the molecular compound to a temperature lower than the lower critical solution temperature of the molecular compound; and a separation step of separating the temperature-responsive polymer precipitated in the precipitation step from the aqueous cleaning liquid. It relates to said method. The invention also relates to an apparatus for carrying out the method. Hereinafter, an embodiment of the present invention will be described with reference to FIG. In FIG. 3, the names and functions of the components having the same reference numerals as those in FIG. 2 are the same as those described with reference to FIG.

下限臨界溶解温度未満の温度の水系洗浄液を、洗浄水噴射装置(洗浄手段)31を用いて固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する細胞培養支持体(基材)32に噴射する。ただし、洗浄方法は図3に示すような洗浄水の噴射には限定されない。たとえば、洗浄水を蓄えた液槽を用意し、当該液槽に洗浄対象の基材を浸して洗浄を行うこともできる。洗浄に使用される水系洗浄液の温度は、温度応答性高分子化合物の下限臨界溶解温度がT℃である場合、T−1〜32℃であることが好ましい。図3において洗浄対象の基材はシャーレ形状の細胞培養支持体32であるが、これには限定されない。図3ではシャーレ形状の細胞培養支持体32が複数個同時に洗浄されるように描写されているが、これには限定されず、一つずつ洗浄することも可能である。洗浄により発生する排出液は基材表面に由来する温度応答性高分子化合物を含む。排出液は捕集器33により捕集され、液槽21に収容される。液槽21に収容された排出液の処理の手順は前記「温度応答性高分子化合物を含む水系洗浄液の処理方法及び装置」の章で説明した通りである。最終的には温度応答性高分子化合物が除去された水系洗浄液と、温度応答性高分子化合物とが分離される。   A cell having a temperature-responsive polymer compound and a free temperature-responsive polymer compound immobilized on a surface of a water-based cleaning solution having a temperature lower than the lower critical solution temperature using a cleaning water jet device (cleaning means) 31 It sprays on the culture support body (base material) 32. However, the cleaning method is not limited to the injection of cleaning water as shown in FIG. For example, it is also possible to prepare a liquid tank in which cleaning water is stored and perform the cleaning by immersing the substrate to be cleaned in the liquid tank. The temperature of the aqueous cleaning solution used for cleaning is preferably T-1 to 32 ° C when the lower critical solution temperature of the temperature-responsive polymer compound is T ° C. In FIG. 3, the substrate to be cleaned is a petri dish-shaped cell culture support 32, but is not limited thereto. In FIG. 3, a plurality of petri dish-shaped cell culture supports 32 are depicted as being simultaneously washed, but the present invention is not limited to this, and it is possible to wash one by one. The discharged liquid generated by the cleaning contains a temperature-responsive polymer compound derived from the surface of the substrate. The discharged liquid is collected by the collector 33 and stored in the liquid tank 21. The procedure for treating the discharged liquid stored in the liquid tank 21 is as described in the section “Method and apparatus for treating aqueous cleaning liquid containing temperature-responsive polymer compound”. Finally, the aqueous cleaning liquid from which the temperature-responsive polymer compound has been removed is separated from the temperature-responsive polymer compound.

上記手順により温度応答性高分子化合物が除去された水系洗浄液は、洗浄工程において再利用することも可能である。図4には再利用する場合の典型的な装置の構成を図示する。図4中、図2又は図3と同じ符号が付記されている構成要素の名称及び機能は図2又は図3に関して説明した構成要素と同じである。温度応答性高分子化合物が除去された水系洗浄液は冷却器(冷却手段)41により洗浄対象の基材上に存在する遊離の温度応答性高分子化合物の下限臨界溶解温度未満の温度、好ましくは下限臨界溶解温度がT℃である場合T−1〜32℃、まで冷却される。冷却された洗浄液はポンプ(供給手段)42により洗浄水噴射装置(洗浄手段)31に供給され、洗浄工程において再利用される。   The aqueous cleaning liquid from which the temperature-responsive polymer compound has been removed by the above procedure can be reused in the cleaning process. FIG. 4 shows a typical apparatus configuration in the case of reuse. In FIG. 4, the names and functions of the constituent elements to which the same reference numerals as those in FIG. 2 or FIG. 3 are added are the same as the constituent elements described with reference to FIG. The aqueous cleaning liquid from which the temperature-responsive polymer compound has been removed is a temperature below the lower critical solution temperature of the free temperature-responsive polymer compound present on the substrate to be cleaned by the cooler (cooling means) 41, preferably the lower limit. When the critical melting temperature is T ° C., it is cooled to T-1 to 32 ° C. The cooled cleaning liquid is supplied to the cleaning water injection device (cleaning means) 31 by the pump (supply means) 42 and reused in the cleaning process.

図3に示すような基板洗浄システムを構築し以下の試験を行った。
洗浄水として水温25℃の水を使用した。
A substrate cleaning system as shown in FIG. 3 was constructed and the following tests were performed.
Water having a water temperature of 25 ° C. was used as washing water.

洗浄対象の基板は次の手順で作成した。N−イソプロピルアクリルアミド(40重量%)、ポリイソプロピルアクリルアミド(2重量%)のイソプロピルアルコール溶液をワイヤーバー#4にて約5g/mの塗工厚になるように130μmポリスチレンシート(1m)に塗工し、ドライヤーにて60℃、1分間乾燥させた。次に塗工面に電子線を2回に分けて照射した。照射量を初回5Mrad、2回目25Mradとした。電子線照射後、5℃の水に12時間浸漬した。 The substrate to be cleaned was prepared by the following procedure. An isopropyl alcohol solution of N-isopropylacrylamide (40 wt%) and polyisopropylacrylamide (2 wt%) is applied to a 130 μm polystyrene sheet (1 m 2 ) with a wire bar # 4 so that the coating thickness is about 5 g / m 2. It was coated and dried with a dryer at 60 ° C. for 1 minute. Next, the coated surface was irradiated with an electron beam in two portions. The irradiation amount was 5 Mrad for the first time and 25 Mrad for the second time. After electron beam irradiation, it was immersed in water at 5 ° C. for 12 hours.

上記手順で作成された基板に水温25℃の水を噴射して洗浄し、排水を1000ml回収した。   The substrate prepared in the above procedure was washed by spraying water with a water temperature of 25 ° C., and 1000 ml of waste water was collected.

回収した排水の温度を、前記高分子の下限臨界溶解温度(32℃)より高い45℃に高めたところ温度応答性高分子が固形分として析出し沈殿した。   When the temperature of the collected waste water was increased to 45 ° C. higher than the lower critical solution temperature (32 ° C.) of the polymer, the temperature-responsive polymer was precipitated and precipitated as a solid content.

沈殿後排水を吸引ろ過する(ろ紙No.3 150mm)ことにより、沈殿した温度応答性高分子を分離した。   The precipitated temperature-responsive polymer was separated by suction filtration of the drained water after precipitation (filter paper No. 3 150 mm).

ろ過前の排水の水分蒸発後の固形分重量を測定することにより、排水中の温度応答性高分子化合物の量を定量した。また同様の手順により、ろ過後のろ液中の温度応答性高分子の量を定量した。こうして定量されたろ過前後の洗浄液中の温度応答性高分子の量を比較することにより除去量(減少率)を評価した。   The amount of the temperature-responsive polymer compound in the wastewater was quantified by measuring the solid content weight of the wastewater before evaporation after evaporation of water. Further, the amount of the temperature-responsive polymer in the filtrate after filtration was quantified by the same procedure. The removal amount (reduction rate) was evaluated by comparing the amount of the temperature-responsive polymer in the washing liquid before and after the filtration determined in this way.

比較例として、洗浄排水を45℃に加温しない以外は上記実験(実施例)と同様の操作を行い、温度応答性高分子化合物の除去量を評価した。   As a comparative example, the same operation as in the above experiment (Example) was performed except that the washing waste water was not heated to 45 ° C., and the removal amount of the temperature-responsive polymer compound was evaluated.

結果を表1に示す。洗浄後の排水を冷却することで排水中の温度応答性高分子化合物を除去できることが明らかとなった。   The results are shown in Table 1. It became clear that the temperature-responsive polymer compound in the waste water can be removed by cooling the waste water after washing.

Figure 2008136895
Figure 2008136895

下限臨界溶解温度を有する温度応答性高分子化合物の、当該温度未満或いは以上の温度条件下での挙動を模式的に示す図である。It is a figure which shows typically the behavior under the temperature conditions of the temperature-responsive high molecular compound which has a lower limit critical solution temperature below the said temperature or above. 本発明に係る、温度応答性高分子化合物を含む水系洗浄液の処理方法を行うための装置の構成を示す図である。It is a figure which shows the structure of the apparatus for performing the processing method of the aqueous cleaning liquid containing a temperature-responsive high molecular compound based on this invention. 本発明に係る、固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材の洗浄方法を行うための装置の構成を示す図である。It is a figure which shows the structure of the apparatus for performing the washing | cleaning method of the base material which the fixed temperature responsive high molecular compound and free temperature responsive high molecular compound which exist on the surface based on this invention exist. 本発明に係る、固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材の洗浄方法であって、洗浄水を再利用する方法を行うための装置の構成を示す図である。In accordance with the present invention, there is provided a method for cleaning a substrate on which a fixed temperature-responsive polymer compound and a free temperature-responsive polymer compound are present on the surface, the method for reusing cleaning water It is a figure which shows the structure of an apparatus.

符号の説明Explanation of symbols

21:液槽、22:ヒーター、23:ろ過器、31:洗浄水噴射装置、32:細胞培養支持体、33:捕集器、41:冷却器、42:ポンプ 21: liquid tank, 22: heater, 23: filter, 31: washing water injection device, 32: cell culture support, 33: collector, 41: cooler, 42: pump

Claims (9)

温度応答性高分子化合物を含む水系洗浄液の処理方法であって、温度応答性高分子化合物を含む水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高めることにより水系洗浄液中の温度応答性高分子を析出させる析出工程と、前記析出工程で析出した温度応答性高分子を水系洗浄液から分離する分離工程とを含む前記方法。   A method for treating an aqueous cleaning solution containing a temperature-responsive polymer compound, wherein the temperature of the aqueous cleaning solution containing a temperature-responsive polymer compound is increased to a temperature equal to or higher than the lower critical solution temperature of the temperature-responsive polymer compound. The method comprising: a precipitation step of precipitating the temperature-responsive polymer; and a separation step of separating the temperature-responsive polymer precipitated in the precipitation step from the aqueous cleaning liquid. 固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材の洗浄方法であって、前記基材の表面を、前記温度応答性高分子化合物の下限臨界溶解温度未満の温度の水系洗浄液により洗浄して遊離の温度応答性高分子化合物を含む水系洗浄液を得る洗浄工程と、洗浄後の前記水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高めることにより水系洗浄液中の温度応答性高分子を析出させる析出工程と、前記析出工程で析出した温度応答性高分子を水系洗浄液から分離する分離工程とを含む前記方法。   A method for cleaning a substrate in which a fixed temperature-responsive polymer compound and a free temperature-responsive polymer compound are present on the surface, the surface of the substrate being a lower limit of the temperature-responsive polymer compound A washing step of washing with an aqueous washing liquid having a temperature lower than the critical dissolution temperature to obtain an aqueous washing liquid containing a free temperature-responsive polymer compound, and the temperature of the aqueous washing liquid after washing is a lower criticality of the temperature-responsive polymer compound The method comprising: a precipitation step of precipitating a temperature-responsive polymer in the aqueous cleaning liquid by raising the temperature to a melting temperature or higher; and a separation step of separating the temperature-responsive polymer precipitated in the precipitation step from the aqueous cleaning liquid. 分離工程後の水系洗浄液の温度を下限臨界溶解温度未満に低下させた後、洗浄工程において再利用する、請求項2記載の方法。   The method according to claim 2, wherein the temperature of the aqueous cleaning liquid after the separation step is reduced to less than the lower critical solution temperature and then reused in the cleaning step. 固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材が、基材表面に、温度応答性高分子化合物の前駆物質であるモノマーを存在せしめ、基材表面上において重合反応と基材表面への結合反応とを進行させることにより形成されたものである請求項2又は3記載の方法。   The substrate on which the immobilized temperature-responsive polymer compound and the free temperature-responsive polymer compound exist on the surface causes the monomer that is a precursor of the temperature-responsive polymer compound to exist on the substrate surface, The method according to claim 2 or 3, wherein the method is formed by advancing a polymerization reaction and a binding reaction to the substrate surface on the substrate surface. 固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材が、基材表面に、温度応答性高分子化合物の前駆物質であるモノマー及びプレポリマーを存在せしめ、基材表面上において重合反応と基材表面への結合反応とを進行させることにより形成されたものである請求項2又は3記載の方法。   The substrate on which the immobilized temperature-responsive polymer compound and the free temperature-responsive polymer compound are present on the surface is coated with a monomer and a prepolymer that are precursors of the temperature-responsive polymer compound on the substrate surface. The method according to claim 2 or 3, wherein the method is formed by causing the polymerization reaction and the binding reaction to the substrate surface to proceed on the surface of the substrate. 前記基材が細胞培養支持体である請求項2〜5のいずれか1項記載の方法。   The method according to any one of claims 2 to 5, wherein the substrate is a cell culture support. 温度応答性高分子化合物を含む水系洗浄液の処理装置であって、前記水系洗浄液を収容する液槽と、前記液槽に収容された水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高める加温手段と、前記加温により形成される温度応答性高分子の析出物を水系洗浄液から分離する分離手段とを備える前記装置。   An apparatus for treating a water-based cleaning liquid containing a temperature-responsive polymer compound, the liquid tank storing the water-based cleaning liquid, and the temperature of the water-based cleaning liquid stored in the liquid tank is the lower critical solution of the temperature-responsive polymer compound The said apparatus provided with the heating means which raises more than temperature, and the isolation | separation means which isolate | separates the deposit of the temperature-responsive polymer formed by the said heating from an aqueous cleaning liquid. 固定化された温度応答性高分子化合物と遊離の温度応答性高分子化合物とが表面に存在する基材を洗浄するための洗浄装置であって、前記基材の表面を、前記温度応答性高分子化合物の下限臨界溶解温度未満の温度の水系洗浄液により洗浄して遊離の温度応答性高分子化合物を基材表面から除去する洗浄手段と、前記洗浄により発生する温度応答性高分子化合物を含む水系洗浄液を収容する液槽と、前記液槽に収容された水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度以上に高める加温手段と、前記加温により形成される温度応答性高分子の析出物を水系洗浄液から分離する分離手段とを備える前記装置。   A cleaning apparatus for cleaning a substrate on which a fixed temperature-responsive polymer compound and a free temperature-responsive polymer compound are present, wherein the surface of the substrate has a high temperature-responsive property. Washing means for removing free temperature-responsive polymer compound from the surface of the substrate by washing with an aqueous washing solution having a temperature lower than the lower critical solution temperature of the molecular compound, and an aqueous system containing the temperature-responsive polymer compound generated by the washing A liquid tank for storing the cleaning liquid, a heating means for increasing the temperature of the aqueous cleaning liquid stored in the liquid tank to be equal to or higher than a lower critical solution temperature of the temperature-responsive polymer compound, and a temperature responsiveness formed by the heating Separating means for separating the polymer precipitate from the aqueous cleaning liquid. 前記分離後の水系洗浄液の温度を前記温度応答性高分子化合物の下限臨界溶解温度未満に低下させる冷却手段と、前記冷却後の水系洗浄液を前記洗浄手段に供給する供給手段とを更に備える請求項8記載の装置。   The cooling means for lowering the temperature of the water-based cleaning liquid after the separation below the lower critical solution temperature of the temperature-responsive polymer compound, and the supply means for supplying the water-based cleaning liquid after cooling to the cleaning means. 8. The apparatus according to 8.
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