JP2008110369A - Cream solder flux and cream solder - Google Patents
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Abstract
【課題】寒暖差の大きい環境下でも、はんだ付け後のフラックス残さ膜にクラックが発生せず、また、絶縁性に優れたフラックス残さ膜を形成することのできるフラックス組成物およびクリームはんだを提供すること。
【解決手段】フラックスベース、溶剤、チキソ剤および活性剤を含有するクリームはんだ用フラックスにおいて、フラックスベースが、ガラス転移温度が−100〜−50℃のアクリル樹脂(A)を含有することを特徴とするクリームはんだ用フラックス;はんだ粉末および当該クリームはんだ用フラックスを含有してなるクリームはんだを用いる。
【選択図】なしThe present invention provides a flux composition and a cream solder that are capable of forming a flux residue film that is excellent in insulation without causing cracks in a flux residue film after soldering even in an environment with a large temperature difference. thing.
A cream solder flux containing a flux base, a solvent, a thixotropic agent and an activator, wherein the flux base contains an acrylic resin (A) having a glass transition temperature of -100 to -50 ° C. A cream solder flux containing solder powder and the cream solder flux.
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Description
本発明は、クリームはんだ用フラックスおよびクリームはんだに関する。 The present invention relates to a flux for cream solder and cream solder.
電子部品などの実装に用いられるフラックスとしては、スプレー方式などにより塗布して用いる液状フラックスと、フラックス組成物とはんだ粉末を混練した、いわゆるクリームはんだ組成物として用いるためのペースト状フラックスが知られている。 As the flux used for mounting electronic parts, etc., a liquid flux that is applied by spraying or the like, and a paste-like flux for use as a so-called cream solder composition in which a flux composition and solder powder are kneaded are known. Yes.
当該液状フラックスは、一般的にロジン類、活性剤、溶剤などから構成され、またペースト状フラックスは、一般的にロジン類、溶剤、活性剤、チキソ剤、はんだ粉末などから構成されている。 The liquid flux is generally composed of a rosin, an activator, a solvent, and the like, and the paste flux is generally composed of a rosin, a solvent, an activator, a thixotropic agent, a solder powder, and the like.
液状フラックスやペースト状フラックスに用いられるベース樹脂としては、上記のようにロジン類(ロジンまたはその誘導体)が一般的である。この理由としては、ロジン類は、ロジン骨格に起因して耐腐食性に優れるとともに、電気絶縁抵抗、誘電特性などの電気特性に優れているためと考えられる。ところが、ロジン類は硬くて脆いため、ロジン類含有フラックスをはんだ付けした後に得られるフラックス残さ膜は、寒暖差が大きい環境下、たとえば−40℃程度の低温雰囲気下と125℃程度の高温雰囲気下とに交互に繰り返して曝される場合には、容易にクラックが発生するという問題があった。フラックス残さ膜にクラックが発生すると、クラック部に大気中の水分などが付着・浸透し、絶縁抵抗の低下、マイグレーションの発生などの重大な問題を引き起こすことになる。 As described above, rosins (rosin or derivatives thereof) are generally used as the base resin used for liquid flux and paste-like flux. This is probably because rosins are excellent in corrosion resistance due to the rosin skeleton, and are excellent in electrical properties such as electrical insulation resistance and dielectric properties. However, since rosins are hard and brittle, a flux residue film obtained after soldering a rosin-containing flux is used in an environment with a large temperature difference, for example, in a low temperature atmosphere of about −40 ° C. and a high temperature atmosphere of about 125 ° C. In the case of repeated exposure to each other, there is a problem that cracks are easily generated. When cracks occur in the flux residue film, moisture in the atmosphere adheres to and penetrates into the cracks, causing serious problems such as a decrease in insulation resistance and the occurrence of migration.
上記問題の発生を防止するため、はんだ付け後のフラックス残さ膜をフロン、代替フロン、有機溶剤類等の有機溶剤系洗浄液で洗浄除去したり、防湿コーティング処理したりする等の手段が講じられてきた。しかし、当該洗浄液を使用することは、地球環境保護の観点からは望ましくなく、また、生産コストの低減という点からも、洗浄工程や防湿コーティング工程を必要としないフラックス残さ膜、すなわち防湿コーティングの役割も兼ね備えたフラックス残さ膜が求められている。より詳細には、優れた電気的信頼性があり、寒暖差が大きい環境下においてもクラックが発生せず、しかもはんだ付け後にはんだ表面および回路面を覆って防湿効果を発揮できるフラックス残さ膜を提供し得る、優れたフラックス組成物やクリームはんだ組成物の出現が望まれている。 In order to prevent the occurrence of the above problems, measures such as cleaning and removing the flux residue film after soldering with an organic solvent-based cleaning liquid such as chlorofluorocarbon, alternative chlorofluorocarbon, and organic solvents, and a moisture-proof coating treatment have been taken. It was. However, the use of the cleaning solution is not desirable from the viewpoint of protecting the global environment, and also from the viewpoint of reducing production costs, the role of the flux residual film that does not require a cleaning process or a moisture-proof coating process, that is, the role of the moisture-proof coating. There is also a need for a flux residue film that also combines. More specifically, a flux residue film that has excellent electrical reliability, does not crack even in an environment with a large temperature difference, and covers the solder surface and circuit surface after soldering to provide a moisture-proof effect is provided. The appearance of excellent flux compositions and cream solder compositions that can be made is desired.
なお、本出願人らは、先にポリエーテルエステルアミド樹脂、溶剤、活性剤およびチキソ剤からなるクリームはんだ付け用フラックス組成物を提案している(特許文献1参照)が、さらなる印刷安定性、保存安定性の向上が求められていた。 The present applicants have previously proposed a flux composition for cream soldering comprising a polyether ester amide resin, a solvent, an activator and a thixotropic agent (see Patent Document 1), but further printing stability, There has been a demand for improved storage stability.
本発明は、寒暖差の大きい環境下でも、はんだ付け後のフラックス残さ膜にクラックが発生せず、また、絶縁性に優れたフラックス残さ膜を形成することのできるフラックス組成物およびクリームはんだを提供することを目的とする。 The present invention provides a flux composition and cream solder capable of forming a flux residue film having excellent insulation without cracking in the flux residue film after soldering even in an environment with a large temperature difference. The purpose is to do.
本発明者は、前記課題を解決すべく、はんだ付け用フラックス組成物中のベース樹脂に注目し、フラックス残さのクラックの発生を制御するために、フラックス残さのガラス転移温度 (Tg)を低くして、低温時でも残さの柔軟性を保ち、冷熱サイクルにより生じる応力を効率よく緩和し、また、リフロー時に高温にさらされることによって組成が変化してTgの上昇に繋がらないようにし、使用環境を想定している冷熱サイクル時の高温側で劣化が起こらないように耐熱性を有するベース樹脂について鋭意検討を重ねた結果、特定のモノマーを用いて得られるアクリル樹脂が、低Tgと耐熱性を兼ね備えた材料であり、当該樹脂を用いることにより前記課題を解決し得ることを見出し、本発明を完成するに至った。 In order to solve the above problems, the present inventor pays attention to the base resin in the soldering flux composition, and lowers the glass transition temperature (Tg) of the flux residue in order to control the occurrence of cracks in the flux residue. In addition, the flexibility of the residue is maintained even at low temperatures, the stress caused by the thermal cycle is efficiently relieved, and the composition is not changed by exposure to high temperature during reflow so that the Tg is not increased. As a result of intensive studies on heat-resistant base resins so that deterioration does not occur on the high temperature side during the assumed cooling cycle, acrylic resins obtained using specific monomers have both low Tg and heat resistance It has been found that the above problems can be solved by using the resin, and the present invention has been completed.
すなわち、本発明は、フラックスベース、溶剤、チキソ剤および活性剤を含有するクリームはんだ用フラックスにおいて、フラックスベースが、ガラス転移温度が−100〜−50℃のアクリル樹脂を含有することを特徴とするクリームはんだ用フラックス;はんだ粉末および当該クリームはんだ用フラックスを含有してなるクリームはんだに関する。 That is, the present invention is characterized in that in a flux for cream solder containing a flux base, a solvent, a thixotropic agent and an activator, the flux base contains an acrylic resin having a glass transition temperature of −100 to −50 ° C. The present invention relates to a cream solder containing a solder powder and the cream solder flux.
本発明によれば、寒暖差の大きい環境下においても、はんだ付け後のフラックス残さ膜にクラックが発生せず、また、絶縁性に優れたフラックス残さ膜を形成することのできるフラックス組成物およびクリームはんだを提供することができる。 According to the present invention, a flux composition and a cream that are capable of forming a flux residue film that is excellent in insulation without cracking in the flux residue film after soldering even in an environment with a large temperature difference. Solder can be provided.
本発明に用いられるガラス転移温度が−100〜−50℃のアクリル樹脂(A)(以下、(A)成分という)は、(メタ)アクリルモノマーを重合することにより得られる。ガラス転移温度が−100℃より低くなると、耐熱性が維持できなくなるため好ましくなく、−50℃を超えると低温時の残さの柔軟性が不足するため好ましくない。本発明において、ガラス転移温度とは、JIS K7121 プラスチックの転位温度測定方法に従って測定した値である。 The acrylic resin (A) having a glass transition temperature of −100 to −50 ° C. (hereinafter referred to as “component (A)”) used in the present invention is obtained by polymerizing a (meth) acrylic monomer. When the glass transition temperature is lower than −100 ° C., the heat resistance cannot be maintained, which is not preferable. When the glass transition temperature exceeds −50 ° C., the flexibility of the residue at low temperatures is insufficient, which is not preferable. In the present invention, the glass transition temperature is a value measured according to a JIS K7121 plastic transition temperature measurement method.
(A)成分を製造する際に用いられるアクリルモノマーとしては、得られる(A)成分のガラス転移温度が−100〜−50℃となるものであれば特に限定されず公知のものを用いることができるが、アルキル基の炭素数が13以上の(メタ)アクリル酸アルキル類(a)(以下、(a)成分という)を用いることが低温時の残さの柔軟性と耐熱性の点から好ましい。なお、アルキル基は直鎖状のものでも分岐構造を有するものであってもよい。また、フェニル基等の芳香族系官能基やシクロヘキシル基等の脂環構造を有するものであってもよい(ただし、この場合、炭素数を数える際には、芳香族基、脂環構造の炭素数は数えないものとする。)。(a)成分としては、具体的には、例えば、(メタ)アクリル酸トリデシル、(メタ)アクリル酸テトラデシル、(メタ)アクリル酸ペンタデシル、(メタ)アクリル酸ヘキサデシル、(メタ)アクリル酸ヘプタデシル、(メタ)アクリル酸オクタデシル、(メタ)アクリル酸ノナデシルなどが挙げられる。これらは1種を単独で用いても、2種以上を併用してもよい。なお、アルキル基の炭素数は、13〜18とすることが、当該原料の入手が容易なため好ましい。 The acrylic monomer used when the component (A) is produced is not particularly limited as long as the glass transition temperature of the component (A) to be obtained is -100 to -50 ° C. However, it is preferable to use alkyl (meth) acrylates (a) (hereinafter referred to as component (a)) having 13 or more carbon atoms in the alkyl group from the viewpoint of flexibility and heat resistance of the residue at low temperatures. The alkyl group may be linear or have a branched structure. Moreover, it may have an alicyclic structure such as an aromatic functional group such as a phenyl group or a cyclohexyl group (however, in this case, when counting the number of carbon atoms, an aromatic group or an alicyclic carbon Numbers shall not be counted.) Specific examples of the component (a) include tridecyl (meth) acrylate, tetradecyl (meth) acrylate, pentadecyl (meth) acrylate, hexadecyl (meth) acrylate, heptadecyl (meth) acrylate, ( Examples thereof include octadecyl (meth) acrylate and nonadecyl (meth) acrylate. These may be used alone or in combination of two or more. In addition, it is preferable that the carbon number of the alkyl group is 13 to 18 because the raw material is easily available.
また、前記(a)成分に加え、アルキル基の炭素数が12以下の(メタ)アクリル酸アルキル類(b)(以下、(b)成分という)を用いてもよい。(b)成分を用いることにより、フラックスに用いた場合の粘度などの物性を調整し易くなるため好ましい。(b)成分としては、具体的には、例えば、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸t−ブチル、(メタ)アクリル酸オクチル、(メタ)アクリル酸ノニル、(メタ)アクリル酸デシル、(メタ)アクリル酸ドデシル、(メタ)アクリル酸2-エチルヘキシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸イソボルニルなどが挙げられる。これらは1種を単独で用いても、2種以上を併用してもよい。 In addition to the component (a), alkyl (meth) acrylates (b) (hereinafter referred to as the component (b)) having 12 or less carbon atoms in the alkyl group may be used. It is preferable to use the component (b) because it is easy to adjust physical properties such as viscosity when used in the flux. Specific examples of the component (b) include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, and t-butyl (meth) acrylate. , Octyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, dodecyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, (meth) acrylic acid And isobornyl. These may be used alone or in combination of two or more.
さらに、前記(a)成分、(b)成分に加え、アニオン性モノマー(c)(以下、(c)成分という)を用いてもよい。(c)成分としては、少なくとも1つのアニオン性官能基及び1つのビニル基を有するものであれば特に限定されず公知のものを用いることができる。具体的には、例えば、(メタ)アクリル酸、クロトン酸等のモノカルボン酸;マレイン酸、フマル酸、イタコン酸、ムコン酸、シトラコン酸等のジカルボン酸;ビニルスルホン酸、スチレンスルホン酸、2−アクリルアミド−2−メチルプロパンスルホン酸などの有機スルホン酸;またはこれら各種有機酸のナトリウム塩、カリウム塩等が挙げられる。これらは1種を単独で用いても、2種以上を併用してもよい。 Furthermore, in addition to the component (a) and the component (b), an anionic monomer (c) (hereinafter referred to as the component (c)) may be used. The component (c) is not particularly limited as long as it has at least one anionic functional group and one vinyl group, and known components can be used. Specifically, for example, monocarboxylic acids such as (meth) acrylic acid and crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, itaconic acid, muconic acid and citraconic acid; vinyl sulfonic acid, styrene sulfonic acid, 2- Examples thereof include organic sulfonic acids such as acrylamido-2-methylpropanesulfonic acid; and sodium salts and potassium salts of these various organic acids. These may be used alone or in combination of two or more.
(A)成分を得るために用いられる各成分の使用量は特に限定されないが、通常、(a)成分を5〜100重量%程度含有するモノマー成分を重合させることが、低温時の残さの柔軟性と耐熱性が良好になることから好ましい。また、(b)成分の使用量/(a)成分の使用量(重量比)を0.01〜0.5とすることで、(a)成分による柔軟性と耐熱性を損なわずにフラックスに用いた場合の粘度などの物性を調整し易くなるため、好ましい。 (A) Although the usage-amount of each component used in order to obtain a component is not specifically limited, Usually, polymerizing the monomer component which contains about 5 to 100 weight% of (a) component is flexible of the residue at the time of low temperature This is preferable because the heat resistance and heat resistance are improved. In addition, the amount of component (b) used / the amount of component (a) used (weight ratio) is set to 0.01 to 0.5, so that the flexibility and heat resistance of component (a) are not impaired. Since it becomes easy to adjust physical properties, such as a viscosity at the time of using, it is preferable.
これらモノマー成分を重合する方法としては特に限定されず、公知の方法を採用することができる。具体的には、例えば、前記モノマー成分を、必要に応じて、重合開始剤、溶媒、連鎖移動剤等の存在下で重合させればよい。 The method for polymerizing these monomer components is not particularly limited, and a known method can be employed. Specifically, for example, the monomer component may be polymerized in the presence of a polymerization initiator, a solvent, a chain transfer agent or the like, if necessary.
このようにして得られた(A)成分の物性は、ガラス転移温度が−100〜−50℃であれば特に限定されないが、通常、重量平均分子量は、1,000〜1,000,000程度、好ましくは2,000〜200,000である。 The physical properties of the component (A) thus obtained are not particularly limited as long as the glass transition temperature is −100 to −50 ° C. Usually, the weight average molecular weight is about 1,000 to 1,000,000. , Preferably it is 2,000-200,000.
また、フラックスベースには、(A)成分以外の公知のフラックスベースを併用することもできる。具体的には、例えば、ガムロジン、重合ロジン、水添ロジン、不均化ロジン、変性ロジン(例えば、アクリル酸変性ロジン等)、ロジンエステル類、その他各種ロジン誘導体等のロジン系樹脂や、ポリエステル樹脂、ポリエーテルエステルアミド樹脂、ポリアミド樹脂、ポリイミド樹脂、フェノキシ樹脂、テルペン樹脂等の合成樹脂等があげられる。これらは1種を単独で用いても、2種以上を併用してもよい。これら公知のフラックスベースを用いる場合には、通常、(A)成分の使用量がフラックスベース中、20重量%以上程度含まれるようにすることが好ましい。 Moreover, well-known flux bases other than (A) component can also be used together for a flux base. Specifically, for example, rosin resins such as gum rosin, polymerized rosin, hydrogenated rosin, disproportionated rosin, modified rosin (for example, acrylic acid-modified rosin), rosin esters, and other various rosin derivatives, and polyester resins And synthetic resins such as polyetheresteramide resin, polyamide resin, polyimide resin, phenoxy resin, and terpene resin. These may be used alone or in combination of two or more. When these known flux bases are used, it is usually preferable that the amount of the component (A) used is about 20% by weight or more in the flux base.
溶剤としては、特に限定されず公知のものを使用することができる。具体的には、エタノール、n−プロパノール、イソプロパノール、イソブタノール等のアルコール類、ブチルカルビトール、ヘキシルカルビトール、フェニルグリコール、ヘキシルジグリコール等のグリコールエーテル類、酢酸イソプロピル、プロピオン酸エチル、安息香酸ブチル、アジピン酸ジエチル等のエステル類、n−ヘキサン、ドデカン、テトラデセン等の炭化水素類等があげられる。これらは1種を単独で用いても、2種以上を併用してもよい。 The solvent is not particularly limited, and known solvents can be used. Specifically, alcohols such as ethanol, n-propanol, isopropanol, isobutanol, glycol ethers such as butyl carbitol, hexyl carbitol, phenyl glycol, hexyl diglycol, isopropyl acetate, ethyl propionate, butyl benzoate And esters such as diethyl adipate and hydrocarbons such as n-hexane, dodecane and tetradecene. These may be used alone or in combination of two or more.
チキソ剤としては、フラックスの製造に用いられるチキソ剤であれば特に限定されず、公知のものを使用することができる。具体的には、例えば、硬化ひまし油、蜜ロウ、カルナバワックス、ステアリン酸アミド、ヒドロキシステアリン酸エチレンビスアミド、ヒドロキシステアリン酸ヘキサメチレンビスアミド等を使用することができる。これらは1種を単独で用いても、2種以上を併用してもよい。 The thixotropic agent is not particularly limited as long as it is a thixotropic agent used in the production of a flux, and known ones can be used. Specifically, for example, hardened castor oil, beeswax, carnauba wax, stearic acid amide, hydroxystearic acid ethylene bisamide, hydroxystearic acid hexamethylene bisamide, and the like can be used. These may be used alone or in combination of two or more.
これら各成分の使用量は用途に応じて適宜調節すればよいが、通常、フラックスベース30〜75重量部程度、溶剤20〜60重量部程度、チキソ剤1〜10重量部程度、活性剤0.1〜20部程度である。なお、本発明のクリームはんだ用フラックス中には、必要に応じて酸化防止剤、防黴剤、防錆剤、艶消し剤等の添加剤を含有させることができる。 The amount of each of these components may be appropriately adjusted according to the application, but is usually about 30 to 75 parts by weight of flux base, about 20 to 60 parts by weight of solvent, about 1 to 10 parts by weight of thixotropic agent, and 0. About 1 to 20 parts. In addition, in the flux for cream solder of this invention, additives, such as antioxidant, an antifungal agent, a rust preventive agent, and a matting agent, can be contained as needed.
本発明の、クリームはんだは、はんだ粉末および前記クリームはんだ用フラックスを含有するものである。 The cream solder of the present invention contains solder powder and the cream solder flux.
本発明のはんだ粉末の合金組成は特に限定されず、各種公知のものを使用できる。たとえば、はんだ合金としては、従来公知の錫−鉛合金や、鉛フリーはんだとして開発されている錫−銀合金、錫−亜鉛系合金等のはんだ合金組成;さらには前記はんだ合金に、銅、ビスマス、インジウム、アンチモン等を添加したもの等を使用できる。 The alloy composition of the solder powder of the present invention is not particularly limited, and various known ones can be used. For example, as a solder alloy, a conventionally known tin-lead alloy, a solder alloy composition such as a tin-silver alloy and a tin-zinc-based alloy that have been developed as a lead-free solder; , Indium, antimony and the like can be used.
また、はんだ粉末の形状も特に限定されるものではなく、真球、不定形および両者の混合等、いずれの形状も使用できる。 Further, the shape of the solder powder is not particularly limited, and any shape such as a true sphere, an indefinite shape, or a mixture of both can be used.
各成分の使用量は、用途等に応じて適宜決定すれば良いが、通常は、はんだ粉末が80〜95重量部程度、クリームはんだ用フラックスが5〜20重量部程度である。また、必要に応じて、各種公知の添加剤を添加してもよい。 Although the usage-amount of each component should just be determined suitably according to a use etc., a solder powder is about 80-95 weight part normally, and the flux for cream solder is about 5-20 weight part. Moreover, you may add various well-known additives as needed.
以下、実施例を挙げて本発明をさらに詳しく説明するが、本発明は、下記実施例に限定されるものではない。ガラス転移温度は、「JIS K7121 プラスチックの転位温度測定方法」に準拠し、示差走査熱量計(セイコー電子工業(株)製、DSC220C)を用いて、試料10mgを、昇温速度10℃/秒の条件で測定し、接線法により交点を求め定めた。 EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated in more detail, this invention is not limited to the following Example. The glass transition temperature conforms to “JIS K7121 Plastic Dislocation Temperature Measurement Method”, and a differential scanning calorimeter (Seiko Denshi Kogyo Co., Ltd., DSC220C) is used to prepare a 10 mg sample at a heating rate of 10 ° C./second. The measurement was performed under the conditions, and the intersection point was determined by the tangent method.
製造例1
温度計、攪拌装置、滴下ロート、窒素導入管を付したガラス製反応容器に、ブチルグリコール100重量部を仕込み、窒素気流下にこれを攪拌しながら115℃にした後、ブチルグリコール250重量部、メタアクリル酸ドデシル125重量部、メタアクリル酸オクタデシル125重量部、アゾイソブチロニトリル(AIBN)15重量部の混合溶液を滴下した。温度を100℃に保ったまま、さらに4時間反応を行った後、減圧下で未反応物を留去し、ガラス転移温度が−56℃のアクリル樹脂1を得た。
Production Example 1
A glass reaction vessel equipped with a thermometer, a stirrer, a dropping funnel, and a nitrogen introduction tube was charged with 100 parts by weight of butyl glycol, and this was stirred at 115 ° C. under a nitrogen stream, and then 250 parts by weight of butyl glycol, A mixed solution of 125 parts by weight of dodecyl methacrylate, 125 parts by weight of octadecyl methacrylate and 15 parts by weight of azoisobutyronitrile (AIBN) was added dropwise. The reaction was further continued for 4 hours while maintaining the temperature at 100 ° C., and then unreacted substances were distilled off under reduced pressure to obtain an acrylic resin 1 having a glass transition temperature of −56 ° C.
製造例2
温度計、攪拌装置、滴下ロート、窒素導入管を付したガラス製反応容器に、メチルイソブチルケトン100重量部を仕込み、窒素気流下にこれを攪拌しながら100℃した後、メチルイソブチルケトン250重量部、アクリル酸ドデシル200重量部、アクリル酸2−エチルヘキシル50重両部、AIBN20重量部の混合溶液を滴下した。温度を100℃に保ったまま、さらに4時間反応を行った後、減圧下で未反応物を留去し、ガラス転移温度が−72℃のアクリル樹脂2を得た。
Production Example 2
A glass reaction vessel equipped with a thermometer, a stirrer, a dropping funnel and a nitrogen introduction tube was charged with 100 parts by weight of methyl isobutyl ketone, and after stirring at 100 ° C. under a nitrogen stream, 250 parts by weight of methyl isobutyl ketone A mixed solution of 200 parts by weight of dodecyl acrylate, 50 parts by weight of 2-ethylhexyl acrylate, and 20 parts by weight of AIBN was added dropwise. The reaction was further continued for 4 hours while maintaining the temperature at 100 ° C., and then unreacted substances were distilled off under reduced pressure to obtain an acrylic resin 2 having a glass transition temperature of −72 ° C.
製造例3
温度計、攪拌装置、滴下ロート、窒素導入管を付したガラス製反応容器に、ヘキシルグリコール100重量部を仕込み、窒素気流下にこれを攪拌しながら110℃した後、メタアクリル酸ドデシル100重量部、メタアクリル酸オクタデシル80重量部、アクリル酸2−エチルヘキシル50重両部、アクリル酸ブチル20重量部、AIBN20重量部の混合溶液を滴下した。温度を100℃に保ったまま、さらに4時間反応を行った後、減圧下で未反応物を留去し、ガラス転移温度が−68℃のアクリル樹脂3を得た。
Production Example 3
A glass reaction vessel equipped with a thermometer, a stirrer, a dropping funnel, and a nitrogen introducing tube was charged with 100 parts by weight of hexyl glycol, and the mixture was stirred at 110 ° C. in a nitrogen stream, and then 100 parts by weight of dodecyl methacrylate. A mixed solution of 80 parts by weight of octadecyl methacrylate, 50 parts by weight of 2-ethylhexyl acrylate, 20 parts by weight of butyl acrylate and 20 parts by weight of AIBN was added dropwise. The reaction was further continued for 4 hours while maintaining the temperature at 100 ° C., and then unreacted substances were distilled off under reduced pressure to obtain an acrylic resin 3 having a glass transition temperature of −68 ° C.
実施例1〜3および比較例1〜2
(フラックス組成物の調製)
表1に示したフラックスの各成分(表中の各成分の使用量は重量部である)を容器に仕込み、200℃程度に加熱溶解後、冷却してクリームはんだ用フラックスを得た。
Examples 1-3 and Comparative Examples 1-2
(Preparation of flux composition)
Each component of the flux shown in Table 1 (the amount used of each component in the table is parts by weight) was charged into a container, heated and dissolved at about 200 ° C., and then cooled to obtain a cream solder flux.
(クリームはんだ組成物の調製)
はんだ粉末(粒径20〜40μmのSn−Ag−Cu合金、Sn/Ag/Cuの含有量は、96.5重量%/3重量%/0.5重量%である。)89重量部と前記方法により調製した各フラックス組成物11重量部とを容器に取り、撹拌してクリームはんだ組成物を調製した
(Preparation of cream solder composition)
89 parts by weight of solder powder (Sn—Ag—Cu alloy having a particle size of 20 to 40 μm, Sn / Ag / Cu content is 96.5 wt% / 3 wt% / 0.5 wt%) 11 parts by weight of each flux composition prepared by the method was placed in a container and stirred to prepare a cream solder composition.
(評価)
(冷熱サイクル試験)
ガラスエポキシ基板上に設けたQFPパターン上に上記で得たクリームはんだ組成物を印刷し、リフローした後、−40℃、30分間と、125℃、30分間を1サイクルとして、1000〜2500サイクルの冷熱サイクルをかけた後のフラックス残さ膜のクラック発生の有無を観察した。判定基準は以下の通りである。結果を表1に示す。
○:良好(クラック無し)、△:使用可能(クラックが観察されるが、基板面やはんだ面まで貫通していない)、×:不良(クラックが基板面やはんだ面まで貫通している)
(Evaluation)
(Cooling cycle test)
After the cream solder composition obtained above is printed on the QFP pattern provided on the glass epoxy substrate and reflowed, -40 ° C., 30 minutes, 125 ° C., 30 minutes as one cycle, 1000-2500 cycles The presence or absence of cracks in the flux residue film after the cooling cycle was observed. Judgment criteria are as follows. The results are shown in Table 1.
○: Good (no crack), △: Usable (crack is observed, but does not penetrate to the substrate surface or solder surface), ×: Bad (crack penetrates to the substrate surface or solder surface)
(絶縁抵抗試験)
櫛形電極基板JISII型(レジストなし)に、クリームはんだ組成物を印刷し、リフローした後、温度85℃、相対湿度85%恒温恒湿槽に投入し、1000時間後の絶縁抵抗値を絶縁抵抗計を用いて測定した。
○:1×109Ω以上
×:1×109Ω未満
(Insulation resistance test)
A cream solder composition is printed on a comb-shaped electrode substrate JISII type (no resist), reflowed, put into a constant temperature and humidity chamber at a temperature of 85 ° C and a relative humidity of 85%, and the insulation resistance value after 1000 hours is measured by an insulation resistance meter. It measured using.
○: 1 × 10 9 Ω or more ×: Less than 1 × 10 9 Ω
(はんだ付け性)
「JIS Z 3284 附属書10 ぬれ効力及びディウェッティング試験」に準拠。判定基準は広がり度合いの区分に従った。結果を表1に示す。
○:広がり度合いの区分2以上
×:広がり度合いの区分3以下
(Solderability)
Conforms to “JIS Z 3284 Annex 10 Wetting Efficacy and Dewetting Test”. Judgment criteria followed the extent of spread. The results are shown in Table 1.
○: Spread degree category 2 or more ×: Spread degree category 3 or less
表中、水添ロジンは、荒川化学工業(株)製、商品名「KR−614」、重合ロジンは、荒川化学工業(株)製、商品名「中国重合ロジン140」、ポリエーテルエステルアミド樹脂は、直鎖ジアミン、重合脂肪酸及びポリエチレングリコールの反応生成物であって、ガラス転移温度−60℃、数平均分子量30,000(ゲル浸透クロマトグラフィーによるポリスチレン換算値)のもの、水添ダイマー酸は、ユニケマ社製、商品名「プリポール1010」、硬化ひまし油は、豊国製油(株)製、商品名「カスターワックス」を用いた。
In the table, hydrogenated rosin is manufactured by Arakawa Chemical Industries, Ltd., trade name “KR-614”, and polymerized rosin is manufactured by Arakawa Chemical Industries, Ltd., trade name “China Polymerized Rosin 140”, polyether ester amide resin. Is a reaction product of linear diamine, polymerized fatty acid and polyethylene glycol having a glass transition temperature of −60 ° C. and a number average molecular weight of 30,000 (polystyrene conversion value by gel permeation chromatography), and hydrogenated dimer acid is The product name “Pripol 1010” manufactured by Unikema Co., Ltd., and the castor wax produced by Toyokuni Oil Co., Ltd. were used as the hardened castor oil.
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| JP2011020157A (en) * | 2009-07-17 | 2011-02-03 | Denso Corp | Sheet material for brazing, sheet constituting body for brazing, composition for brazing, brazing method and heat exchanger made of stainless steel |
| WO2011071006A1 (en) * | 2009-12-08 | 2011-06-16 | 荒川化学工業株式会社 | Flux for solder paste, and solder paste |
| WO2012018037A1 (en) * | 2010-08-04 | 2012-02-09 | ユニチカ株式会社 | Resin composition containing a copolymerized polyester resin |
| WO2012132034A1 (en) | 2011-03-28 | 2012-10-04 | ハリマ化成株式会社 | Flux for soldering and solder paste composition |
| CN103537822A (en) * | 2013-10-25 | 2014-01-29 | 广州汉源新材料有限公司 | High-concentration scaling powder for pre-forming soldering lug spraying |
| CN106271221A (en) * | 2016-09-09 | 2017-01-04 | 成都九十度工业产品设计有限公司 | A kind of scaling powder for leadless soldering tin paste |
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| KR101414296B1 (en) * | 2009-12-08 | 2014-07-02 | 아라까와 가가꾸 고교 가부시끼가이샤 | Flux for solder paste, and solder paste |
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| CN103537822A (en) * | 2013-10-25 | 2014-01-29 | 广州汉源新材料有限公司 | High-concentration scaling powder for pre-forming soldering lug spraying |
| CN106271221A (en) * | 2016-09-09 | 2017-01-04 | 成都九十度工业产品设计有限公司 | A kind of scaling powder for leadless soldering tin paste |
| CN106271221B (en) * | 2016-09-09 | 2018-08-17 | 成都九十度工业产品设计有限公司 | A kind of scaling powder for leadless soldering tin paste |
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