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JP2008104974A - Acoustic surface wave atomizer - Google Patents

Acoustic surface wave atomizer Download PDF

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JP2008104974A
JP2008104974A JP2006291277A JP2006291277A JP2008104974A JP 2008104974 A JP2008104974 A JP 2008104974A JP 2006291277 A JP2006291277 A JP 2006291277A JP 2006291277 A JP2006291277 A JP 2006291277A JP 2008104974 A JP2008104974 A JP 2008104974A
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liquid
surface acoustic
acoustic wave
film forming
forming member
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JP4915567B2 (en
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Masahiro Kirigatani
昌広 桐ヶ谷
Masahiro Sato
正博 佐藤
Yohei Ishigami
陽平 石上
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Panasonic Electric Works Co Ltd
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Matsushita Electric Works Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers

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  • Special Spraying Apparatus (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To stably atomize a large number of particulates with less power consumption while keeping the balance between an amount of fed liquid and an amount of atomization in an acoustic surface wave atomizer. <P>SOLUTION: An acoustic surface wave atomizer 1 is provided with a piezoelectric transducer 2 which includes a pair of interdigital electrodes 21 and generates acoustic surface waves by applying high-frequency voltage to the interdigital electrodes 21 and a liquid feeding means 3 which feeds a liquid to the surface S of the piezoelectric transducer 2, and atomizes the liquid fed to the surface S of the piezoelectric transducer 2 by the liquid feeding means 3 by the acoustic surface waves w formed on the surface S. The liquid feeding means 3 is provided with a liquid film forming member 30 forming a film forming gap G for distributing the fed liquid on the surface of the piezoelectric transducer 2 in a film form. The film forming gap G is shaped so that the length b in the direction of movement x of the acoustic surface waves w is shorter than the length a in a width direction y orthogonal to the direction of movement x of the acoustic surface waves w formed on the surface S of the piezoelectric transducer 2. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、弾性表面波を用いた霧化装置に関する。   The present invention relates to an atomization apparatus using surface acoustic waves.

従来、弾性表面波が伝搬している圧電材料などからなる基板の表面に液体を供給すると、液体が弾性表面波のエネルギを受け取って流動したり、振動したりして、微小粒子となって飛翔する現象が知られている。この現象を利用して液体を霧化する装置が種々提案されている。このような装置における霧化の原理として、例えば、基板表面を伝搬している弾性表面波(レイリー波)が、液体内部に進入してその表面を伝搬する表面張力波(キャピラリ波)となり、その結果、液体の表面から霧が発生するとの説明が成されている。なお、超音波振動によって発生するキャビテーション効果による霧化なども考えられる。   Conventionally, when a liquid is supplied to the surface of a substrate made of a piezoelectric material or the like through which surface acoustic waves are propagated, the liquid receives surface acoustic wave energy and flows or vibrates to fly as fine particles. The phenomenon is known. Various devices for atomizing a liquid using this phenomenon have been proposed. As a principle of atomization in such an apparatus, for example, a surface acoustic wave (Rayleigh wave) propagating on the surface of a substrate becomes a surface tension wave (capillary wave) that enters the liquid and propagates through the surface. As a result, it is explained that fog is generated from the surface of the liquid. Note that atomization due to a cavitation effect generated by ultrasonic vibration is also conceivable.

このような弾性表面波霧化装置において、安定した霧化を小電力で効率的に行うためには、液体を薄く延ばすと共に、液体供給量と噴霧量とのバランスを良好に保つことが必要である。そこで、弾性表面波が伝搬する振動面の一部に振動面との間に隙間を形成するカバーを設け、前記隙間に供給した液体が隙間から弾性表面波の振動源の方向に出るようにした霧化装置がある。この装置では、カバーに達した弾性表面波が、薄く広がった液体にキャピラリ波を生じさせ、そこから霧化が行われるとされている(例えば、特許文献1参照)。   In such a surface acoustic wave atomizer, in order to efficiently perform stable atomization with low power, it is necessary to extend the liquid thinly and maintain a good balance between the liquid supply amount and the spray amount. is there. Therefore, a cover that forms a gap between the vibration surface and a part of the vibration surface on which the surface acoustic wave propagates is provided so that the liquid supplied to the gap exits from the gap toward the vibration source of the surface acoustic wave. There is an atomizer. In this apparatus, the surface acoustic wave that reaches the cover generates capillary waves in the thinly spread liquid, and atomization is performed from the capillary waves (see, for example, Patent Document 1).

また、無数の貫通孔を有する多孔薄板を、弾性表面波が伝搬する振動面の上方に、振動面との間に微小間隙をあけて配置し、振動面と多孔薄板とが成す微小間隙内に液体を供給するようにした霧化装置がある。この装置では、表面弾性波による振動が微小間隙内の液体を介して多孔薄板に伝達され、多孔薄板の振動によって、貫通孔に浸透した微量の液が霧化され、噴霧されるので、小電力の電池駆動で噴霧が可能とされている(例えば、特許文献2参照)。
特開平7−232114号公報 特許第3341023号公報
In addition, a porous thin plate having an infinite number of through-holes is arranged above the vibration surface where the surface acoustic wave propagates with a small gap between the vibration surface and within the minute gap formed by the vibration surface and the porous thin plate. There is an atomizer that supplies liquid. In this device, vibration due to surface acoustic waves is transmitted to the porous thin plate through the liquid in the micro gap, and a small amount of liquid that has penetrated the through-hole is atomized and sprayed by the vibration of the porous thin plate. (See, for example, Patent Document 2).
JP-A-7-232114 Japanese Patent No. 3341023

しかしながら、上述した特許文献1,2に示されるような弾性表面波霧化装置においては、液体を薄く延ばすことはできるが、霧化に関与しない液体が、依然として弾性表面波の伝搬面に多量に存在するので、これらの液体によって弾性表面波のエネルギが無駄に消費されてしまい、霧化の効率が悪いという問題がある。   However, in the surface acoustic wave atomization apparatus as shown in Patent Documents 1 and 2 described above, the liquid can be spread thinly, but a large amount of liquid that is not involved in the atomization still remains on the propagation surface of the surface acoustic wave. Therefore, there is a problem that the energy of the surface acoustic wave is wasted by these liquids and the efficiency of atomization is poor.

本発明は、上記課題を解消するものであって、簡単な構成により、液体供給量と霧化量のバランスを保ち、より少ない消費電力で大量の微細粒子を安定して噴霧できる弾性表面波霧化装置を提供することを目的とする。   The present invention solves the above-mentioned problems, and with a simple configuration, the surface acoustic wave mist can maintain a balance between the liquid supply amount and the atomization amount, and can stably spray a large amount of fine particles with less power consumption. An object of the present invention is to provide a device.

上記課題を達成するために、請求項1の発明は、一対の櫛形電極が形成された圧電材料から成り、前記櫛形電極に高周波電圧を印加することにより弾性表面波が生成される振動子と、前記振動子の表面に液体を供給する液体供給手段と、を備え、前記液体供給手段によって前記振動子の表面に供給される液体を前記表面に生成される弾性表面波によって霧化する弾性表面波霧化装置において、前記液体供給手段は、前記振動子の表面に対向して配置され、供給液体を前記振動子の表面に膜状に分布させるための膜形成隙間を形成する液膜形成部材を備え、前記液膜形成部材の膜形成隙間の形状が、前記振動子の表面に生成される弾性表面波の進行方向に直交する幅方向の長さよりも、前記弾性表面波の進行方向の長さを短く形成されているものである。   In order to achieve the above object, the invention of claim 1 comprises a vibrator made of a piezoelectric material in which a pair of comb-shaped electrodes are formed, and a surface acoustic wave is generated by applying a high-frequency voltage to the comb-shaped electrodes; A surface acoustic wave that atomizes the liquid supplied to the surface of the vibrator by the surface acoustic wave generated on the surface. In the atomization apparatus, the liquid supply means is disposed opposite to the surface of the vibrator, and a liquid film forming member that forms a film formation gap for distributing the supply liquid in a film shape on the surface of the vibrator. And the shape of the film forming gap of the liquid film forming member is longer in the direction of travel of the surface acoustic wave than in the width direction perpendicular to the direction of travel of the surface acoustic wave generated on the surface of the vibrator. The short is also formed It is.

請求項2の発明は、請求項1に記載の弾性表面波霧化装置において、前記液体供給手段は、局在した供給点から前記膜形成隙間に液体を供給し、前記液膜形成部材は、前記供給点から離れるほど弾性表面波の進行方向下流側に位置するように前記膜形成隙間を形成しているものである。   According to a second aspect of the present invention, in the surface acoustic wave atomization device according to the first aspect, the liquid supply means supplies a liquid to the film formation gap from a localized supply point, and the liquid film formation member includes: The film forming gap is formed so as to be located downstream of the supply point in the traveling direction of the surface acoustic wave.

請求項3の発明は、請求項1に記載の弾性表面波霧化装置において、前記液体供給手段は、局在した供給点から前記膜形成隙間に液体を供給し、前記液膜形成部材は、前記供給点から離れるに従って隙間が狭くなるように前記膜形成隙間を形成しているものである。   According to a third aspect of the present invention, in the surface acoustic wave atomization device according to the first aspect, the liquid supply means supplies liquid to the film formation gap from a localized supply point, and the liquid film formation member includes: The film formation gap is formed so that the gap becomes narrower as the distance from the supply point increases.

請求項4の発明は、請求項1乃至請求項3のいずれか一項に記載の弾性表面波霧化装置において、前記液膜形成部材は、前記振動子の表面との相対位置を変化させることにより前記膜形成隙間の形状を変化させて霧化量を調整するものである。   According to a fourth aspect of the present invention, in the surface acoustic wave atomization device according to any one of the first to third aspects, the liquid film forming member changes a relative position with the surface of the vibrator. Thus, the amount of atomization is adjusted by changing the shape of the film forming gap.

請求項5の発明は、請求項1に記載の弾性表面波霧化装置において、前記液膜形成部材は、弾性表面波進行方向に沿って複数設けられ、前記液体供給手段は、弾性表面波進行方向の上流側の液膜形成部材に対して液体を供給し、前記上流側の液膜形成部材部分で霧化できずに弾性表面波によって搬送された液体が下流側の膜形成部材に対して供給されるものである。   According to a fifth aspect of the present invention, in the surface acoustic wave atomization device according to the first aspect, a plurality of the liquid film forming members are provided along a surface acoustic wave traveling direction, and the liquid supply means is a surface acoustic wave traveling The liquid is supplied to the liquid film forming member on the upstream side in the direction, and the liquid transported by the surface acoustic wave without being atomized in the upstream liquid film forming member portion is directed to the downstream film forming member. To be supplied.

請求項6の発明は、請求項1乃至請求項4のいずれか一項に記載の弾性表面波霧化装置において、前記振動子は、弾性表面波の進行方向線上に互いに離間し対向して形成された前記櫛形電極の2つの対を備え、前記液膜形成部材は前記櫛形電極の2つの対の間に設けられ、前記膜形成隙間に供給する液体が両側の櫛形電極からの弾性表面波によって霧化されるものである。   According to a sixth aspect of the present invention, in the surface acoustic wave atomization device according to any one of the first to fourth aspects, the vibrators are formed to be spaced apart from each other on a traveling direction line of the surface acoustic wave. The liquid film forming member is provided between the two pairs of comb electrodes, and the liquid supplied to the film forming gap is caused by surface acoustic waves from the comb electrodes on both sides. It will be atomized.

請求項7の発明は、請求項6に記載の弾性表面波霧化装置において、前記櫛形電極の2つの対の間に前記液膜形成部材を複数設け、前記液体供給手段は、前記複数の液膜形成部材による膜形成隙間に液体を供給するものである。   A seventh aspect of the present invention is the surface acoustic wave atomization device according to the sixth aspect, wherein a plurality of the liquid film forming members are provided between two pairs of the comb-shaped electrodes, and the liquid supply means includes the plurality of liquids A liquid is supplied to a film forming gap formed by the film forming member.

請求項8の発明は、請求項7に記載の弾性表面波霧化装置において、前記複数の液膜形成部材が一体的に構成されているものである。   The invention according to claim 8 is the surface acoustic wave atomization device according to claim 7, wherein the plurality of liquid film forming members are integrally formed.

請求項9の発明は、請求項8に記載の弾性表面波霧化装置において、前記振動子は、前記櫛形電極の2つの対から成る組を弾性表面波進行方向を異ならせて複数組備えるものである。   According to a ninth aspect of the present invention, in the surface acoustic wave atomization device according to the eighth aspect, the vibrator includes a plurality of pairs of pairs of the comb-shaped electrodes with different surface acoustic wave traveling directions. It is.

請求項10の発明は、請求項9に記載の弾性表面波霧化装置において、前記互いに組を成す櫛形電極の対を弾性表面波の進行方向に直交する幅方向に沿って互い反対向きにずらして形成したものである。   According to a tenth aspect of the present invention, in the surface acoustic wave atomization device according to the ninth aspect, the pair of comb-shaped electrodes forming a pair is shifted in the opposite direction along the width direction orthogonal to the traveling direction of the surface acoustic wave. Is formed.

請求項1の発明によれば、液膜形成部材が形成する膜形成隙間の形状が、弾性表面波の進行方向に直交する幅方向の長さよりも、前記弾性表面波の進行方向の長さを短く形成されているので、この膜形成隙間に液体を膜状に分布させて表面張力によって保持させると、弾性表面波がこの分布した液体を通過する距離よりも、弾性表面波の波面が液体と相互作用する距離が長くなり、従って、広い面積で効率的に霧化することができる。すなわち、弾性表面波の波面に沿って細長い液体分布を形成する液膜形成部材によって、液体供給量と霧化量のバランスを保つと共に、霧化に関与しない液体の存在を抑えることができ、より少ない消費電力で大量の微細粒子を安定して噴霧することができる。   According to the first aspect of the present invention, the shape of the film forming gap formed by the liquid film forming member is longer than the length in the width direction perpendicular to the traveling direction of the surface acoustic wave. Since the liquid is distributed in the form of a film in this film formation gap and is held by surface tension, the surface wave of the surface acoustic wave is less than the distance that the surface acoustic wave passes through the distributed liquid. The interaction distance becomes longer, and therefore, it can be efficiently atomized over a large area. That is, the liquid film forming member that forms an elongated liquid distribution along the wavefront of the surface acoustic wave can maintain the balance between the liquid supply amount and the atomization amount, and can suppress the presence of the liquid not involved in the atomization. A large amount of fine particles can be stably sprayed with low power consumption.

請求項2の発明によれば、弾性表面波の進行方向上流側から供給された液体が、弾性表面波によって、膜形成隙間に沿って下流側に輸送される。この輸送は、霧化に使われなかった弾性表面波エネルギによって、液体供給量を自動調整するように行われるので、液体供給量と霧化量のバランスを安定に保って、液膜の薄い範囲を広げることができ、より少ない消費電力で大量の微細粒子を噴霧できる。   According to the second aspect of the present invention, the liquid supplied from the upstream side in the traveling direction of the surface acoustic wave is transported downstream along the film formation gap by the surface acoustic wave. This transportation is performed so that the liquid supply amount is automatically adjusted by the surface acoustic wave energy that was not used for atomization. Therefore, the balance between the liquid supply amount and the atomization amount is kept stable, and the liquid film has a thin range. A large amount of fine particles can be sprayed with less power consumption.

請求項3の発明によれば、表面張力によって、供給点の液体を供給点から離れた部分に輸送することができるので、液膜の供給を強制的に送る手段が不要になり、コンパクトな構造で液膜の薄い範囲を広げ大量に効率的に霧化することができる。   According to the invention of claim 3, since the liquid at the supply point can be transported to the part away from the supply point by surface tension, a means for forcibly feeding the liquid film is not required, and the structure is compact. With this, the thin area of the liquid film can be widened and atomized efficiently in large quantities.

請求項4の発明によれば、弾性表面波を生成するための電源電圧値を変化することなく容易に霧化量を調整することができる。   According to the fourth aspect of the present invention, the atomization amount can be easily adjusted without changing the power supply voltage value for generating the surface acoustic wave.

請求項5の発明によれば、新たな液体の供給点を設けることなく、コンパクトな構造で大量に霧化することができる。また、上流側の液膜形成部材部分で消費されなかった弾性表面波を下流側の液膜形成部材部分で利用できるので、エネルギ効率良く霧化できる。   According to invention of Claim 5, it can atomize in large quantities with a compact structure, without providing the supply point of a new liquid. Further, since the surface acoustic wave that has not been consumed in the upstream liquid film forming member portion can be used in the downstream liquid film forming member portion, it can be atomized efficiently.

請求項6の発明によれば、1つの液膜形成部材の両側から伝搬する弾性表面波によって霧化できるので、片側からだけの場合に比べて、より強力かつ大量に霧化できる。   According to invention of Claim 6, since it can atomize with the surface acoustic wave which propagates from the both sides of one liquid film formation member, compared with the case where it is only from one side, it can atomize more strongly and in large quantities.

請求項7の発明によれば、複数の液膜形成部材部分および各部材間の表面領域において、弾性表面波のエネルギを液体に吸収させて霧化することができるので、エネルギと液体を無駄にすることなく、安定に効率良く液体を霧化できる。   According to the seventh aspect of the present invention, the energy of the surface acoustic wave can be absorbed into the liquid and atomized in the plurality of liquid film forming member portions and the surface region between the members, so that energy and liquid are wasted. The liquid can be atomized stably and efficiently.

請求項8の発明によれば、液膜形成部材、従って膜形成隙間を振動子の表面上でひと繋がりのものとすることができるので、液膜形成部材に沿って効率良く液を広げることができ、より大量の霧化ができる。また、部品点数を減らすことができる。   According to the invention of claim 8, since the liquid film forming member, and hence the film forming gap, can be connected on the surface of the vibrator, the liquid can be efficiently spread along the liquid film forming member. And more atomization. In addition, the number of parts can be reduced.

請求項9の発明によれば、膜状に分布させた液体に対して、周囲から弾性表面波を送り込むことができるので、コンパクトで強力な霧化が可能となる。   According to the ninth aspect of the present invention, surface acoustic waves can be sent from the surroundings to the liquid distributed in the form of a film, so that compact and powerful atomization is possible.

請求項10の発明によれば、膜状に分布させた液体に対して、弾性表面波を周囲から渦巻き状に送り込むようにすることにより、渦巻き状に分布した弾性表面波によって、液体を、液膜形成部材に沿って広げることができ、さらには、循環させることができるので、より大量の液体を、効率的かつ安定に霧化できる。   According to the tenth aspect of the present invention, a surface acoustic wave is spirally sent from the surroundings to a liquid distributed in a film shape, so that the liquid is liquidated by the surface acoustic wave distributed in a spiral shape. Since it can be spread along the film forming member and further circulated, a larger amount of liquid can be atomized efficiently and stably.

以下、本発明の実施形態に係る弾性表面波霧化装置を、図面を参照して説明する。   Hereinafter, a surface acoustic wave atomization apparatus according to an embodiment of the present invention will be described with reference to the drawings.

(第1の実施形態)
図1(a)(b)は第1の実施形態に係る弾性表面波霧化装置を示し、図2はその要部断面を示す。弾性表面波霧化装置1は、一対の櫛形電極21が形成され、その櫛形電極21に高周波電圧を印加することにより弾性表面波が生成される振動子2と、振動子2の表面Sに液体を供給する液体供給手段3と、を備え、液体供給手段3によって振動子2の表面Sに供給される液体4を表面Sに生成される弾性表面波wによって液体4の微粒子41として飛翔させて霧化する装置である。弾性表面波霧化装置1は、例えば、小電力の乾電池によって駆動する医療用の吸霧器として用いられる。この場合、霧化される液体4は、水や、水に薬品を溶かした薬液などである。また、弾性表面波霧化装置1を比較的大電力で駆動する場合は、例えば、乾燥防止用の湿度調整装置として用いられる。
(First embodiment)
FIGS. 1A and 1B show a surface acoustic wave atomization apparatus according to the first embodiment, and FIG. The surface acoustic wave atomization apparatus 1 includes a vibrator 2 in which a pair of comb-shaped electrodes 21 are formed and a surface acoustic wave is generated by applying a high-frequency voltage to the comb-shaped electrodes 21. The liquid 4 supplied to the surface S of the vibrator 2 by the liquid supply means 3 is caused to fly as the fine particles 41 of the liquid 4 by the surface acoustic wave w generated on the surface S. It is an atomizing device. The surface acoustic wave atomizer 1 is used as, for example, a medical atomizer that is driven by a low-power dry battery. In this case, the atomized liquid 4 is water or a chemical solution in which a chemical is dissolved in water. Moreover, when driving the surface acoustic wave atomizer 1 with comparatively high electric power, it is used as a humidity adjusting device for preventing drying, for example.

液体供給手段3は、供給液体を溜める液体容器31と、液体容器31から液体を導出する液導出部材32と、振動子2の表面Sに対向して配置され、液導出部材32を介して供給される供給液体4を振動子2の表面に膜状に分布させるための膜形成隙間Gを形成する液膜形成部材30と、を備えている。液膜形成部材30の膜形成隙間Gは、その形状が、振動子2の表面Sに生成される弾性表面波wの進行方向xに直交する幅方向yの長さaよりも、弾性表面波wの進行方向xの長さbを短くして形成されている。以下、詳細説明する。   The liquid supply means 3 is disposed to face the surface S of the vibrator 2 and is supplied via the liquid lead-out member 32. And a liquid film forming member 30 that forms a film forming gap G for distributing the supplied liquid 4 in a film shape on the surface of the vibrator 2. The film forming gap G of the liquid film forming member 30 has a surface acoustic wave more than the length a in the width direction y perpendicular to the traveling direction x of the surface acoustic wave w generated on the surface S of the vibrator 2. The length b in the traveling direction x of w is shortened. Details will be described below.

振動子2を構成する圧電材料は、例えば、LiNbO3(ニオブ酸リチウム)のような圧電体そのものからなる基板である。また、圧電材料は、非圧電基板の表面に圧電薄膜、例えば、PZT薄膜(鉛、ジルコニューム、チタン合金薄膜)を形成したものでもよい。その表面の圧電体薄膜の表面部分において、弾性表面波が励振される。従って、振動子2を構成する圧電材料は、弾性表面波が励振される圧電体部分を表面に備えた基板であればよい。   The piezoelectric material constituting the vibrator 2 is a substrate made of a piezoelectric body itself such as LiNbO3 (lithium niobate), for example. The piezoelectric material may be a piezoelectric thin film formed on the surface of a non-piezoelectric substrate, for example, a PZT thin film (lead, zirconium, titanium alloy thin film). A surface acoustic wave is excited in the surface portion of the piezoelectric thin film on the surface. Therefore, the piezoelectric material constituting the vibrator 2 may be a substrate provided with a piezoelectric portion on the surface where surface acoustic waves are excited.

一対の櫛形電極21は、圧電材料の表面に2つの櫛形の電極を互いに噛み合わせて形成した電極(IDT:インター・ディジタル・トランスジューサ)である。櫛形電極21のy方向の幅は、安定した弾性表面波wを生成するには、波長λの20倍程度にする必要があることがわかっているが、それ以下でもよい。櫛形電極21の互いに隣り合う櫛の歯は互いに異なる電極に属し、励振する弾性表面波wの波長λの半分の長さのピッチで配列されている。   The pair of comb electrodes 21 are electrodes (IDT: inter digital transducer) formed by engaging two comb electrodes on the surface of the piezoelectric material. It has been found that the width of the comb electrode 21 in the y direction needs to be about 20 times the wavelength λ in order to generate a stable surface acoustic wave w, but it may be less than that. Comb teeth adjacent to each other of the comb-shaped electrode 21 belong to different electrodes, and are arranged at a pitch of half the wavelength λ of the surface acoustic wave w to be excited.

2つの櫛形電極21に高周波電圧印加用の電気回路23から高周波(例えば、MHz帯)電圧を印加することにより、櫛形電極21によって電気的エネルギが波の機械的エネルギに変換されて、振動子2の表面にレイリー波と呼ばれる弾性表面波wが励振される。励振された弾性表面波wの振幅は、櫛形電極21に印加する電圧の大きさで決まる。励振された弾性表面波wの波束の長さは、電圧の印加時間の長さに対応する。   By applying a high-frequency (for example, MHz band) voltage from the electric circuit 23 for applying a high-frequency voltage to the two comb-shaped electrodes 21, the electric energy is converted into wave mechanical energy by the comb-shaped electrode 21, and the vibrator 2. A surface acoustic wave w called Rayleigh wave is excited on the surface. The amplitude of the excited surface acoustic wave w is determined by the magnitude of the voltage applied to the comb electrode 21. The length of the wave packet of the excited surface acoustic wave w corresponds to the length of voltage application time.

櫛形電極21によって励振された弾性表面波wは、一対の櫛形電極21の歯が交差した幅に対応する幅の波となって、櫛の歯に垂直な方向xに伝搬(以下、進行ともいう)する。櫛形電極21は、その両側に伝搬する弾性表面波を生成するので、図1(a)に示すように、櫛形電極21の左方に反射用櫛形電極22が配置されている。反射用櫛形電極22は、弾性表面波を全反射する、いわゆる反射器を構成する。櫛形電極21は、この反射用櫛形電極22と組み合わされて、x方向にのみ伝搬する弾性表面波wを生成する、いわゆる一方向性電極を構成する。なお、一方向性電極の構成は、本実施形態に示したものに限られない。   The surface acoustic wave w excited by the comb-shaped electrode 21 becomes a wave having a width corresponding to the width at which the teeth of the pair of comb-shaped electrodes 21 intersect, and propagates in the direction x perpendicular to the teeth of the comb (hereinafter also referred to as progression). ) Since the comb-shaped electrode 21 generates surface acoustic waves propagating on both sides thereof, a reflective comb-shaped electrode 22 is disposed on the left side of the comb-shaped electrode 21 as shown in FIG. The reflective comb electrode 22 constitutes a so-called reflector that totally reflects the surface acoustic wave. The comb-shaped electrode 21 is combined with the reflective comb-shaped electrode 22 to form a so-called unidirectional electrode that generates a surface acoustic wave w that propagates only in the x direction. The configuration of the unidirectional electrode is not limited to that shown in this embodiment.

液膜形成部材30と、膜形成隙間Gの形状を説明する。液膜形成部材30は、細長い部材であって、図2に示すように、振動子2の表面Sに対向する面を表面Sから一様な距離gだけ隔てて、表面Sに近接して配置されている。液膜形成部材30と表面Sとの互いの対向面、および距離gによって定義される空間が、膜形成隙間Gを形成している。液体4は、この膜形成隙間Gに自身の表面張力によって保持されると共に、距離gで定まる厚さに規制されて、表面S上に膜状に分布する。なお、表面張力によって保持された液体は、霧化によって消費されると、表面張力によって自動的に液体を補充するように動作する。   The shapes of the liquid film forming member 30 and the film forming gap G will be described. The liquid film forming member 30 is an elongated member, and is disposed close to the surface S with a surface facing the surface S of the vibrator 2 spaced apart from the surface S by a uniform distance g as shown in FIG. Has been. The opposing surfaces of the liquid film forming member 30 and the surface S and the space defined by the distance g form a film forming gap G. The liquid 4 is held in the film formation gap G by its surface tension, and is regulated to a thickness determined by the distance g, and is distributed in a film shape on the surface S. When the liquid held by the surface tension is consumed by atomization, the liquid is automatically replenished by the surface tension.

ところで、弾性表面波wによる霧化は、液体4の表面を伝搬する、いわゆる表面張力波(キャピラリ波)によって、液体4の表面から液滴が離脱飛翔することによって行われる。従って、液体4の膜厚が厚いと弾性表面波のエネルギが液体4の表面に到達する前に減衰してしまい、霧化することができない。そこで、できるだけ液体の膜厚を薄くする必要がある。膜厚は、上述の距離gを調整することによって最適化することができる。   By the way, the atomization by the surface acoustic wave w is performed by the droplets separating and flying from the surface of the liquid 4 by a so-called surface tension wave (capillary wave) propagating on the surface of the liquid 4. Therefore, if the film thickness of the liquid 4 is thick, the energy of the surface acoustic wave is attenuated before reaching the surface of the liquid 4 and cannot be atomized. Therefore, it is necessary to make the film thickness of the liquid as thin as possible. The film thickness can be optimized by adjusting the distance g described above.

また、液膜形成部材30によって覆われている膜形成隙間Gの上部からは霧化しないので、この部分を減らすことによって、効率的かつ安定に霧化することができる。これを説明する。液膜形成部材30が形成する膜形成隙間Gの形状は、y方向の長さaを櫛形電極21の幅と大体同じ長さとし、x方向の長さbを波長λの10倍以下とされている。つまり、これらの長さa,bは、b<a、の関係を満たしている。   Moreover, since it does not atomize from the upper part of the film formation clearance gap G covered with the liquid film formation member 30, it can atomize efficiently and stably by reducing this part. This will be explained. The shape of the film forming gap G formed by the liquid film forming member 30 is such that the length a in the y direction is approximately the same as the width of the comb-shaped electrode 21 and the length b in the x direction is not more than 10 times the wavelength λ. Yes. That is, these lengths a and b satisfy the relationship b <a.

上述のような形状の膜形成隙間Gにより、弾性表面波wの進行方向xの、液膜形成部材30によって覆われた液体4の量を少なくし、幅方向yに薄く延ばして液体4の有効表面積を増大させることができるので、弾性表面波wのエネルギ損失を抑制し、液体4の供給量を少なくすることができると共に、効率的に大量の微細な粒に霧化することができる。   By the film forming gap G having the shape as described above, the amount of the liquid 4 covered with the liquid film forming member 30 in the traveling direction x of the surface acoustic wave w is reduced, and the liquid 4 is effectively extended by thinly extending in the width direction y. Since the surface area can be increased, energy loss of the surface acoustic wave w can be suppressed, the supply amount of the liquid 4 can be reduced, and atomization into a large amount of fine particles can be efficiently performed.

膜形成隙間Gに液体4を供給する手段について説明する。また、液体供給手段3として、液体4の微小量を送るポンプを備えてもよく、毛細管現象を利用する方法としてもよい。毛細管現象を利用する場合に、液膜形成部材30を親水性部材にしたり、液膜形成部材30の表面に親水性薄膜をコーティングしたりすることが有効である。   A means for supplying the liquid 4 to the film forming gap G will be described. Further, the liquid supply means 3 may be provided with a pump for sending a minute amount of the liquid 4 or may be a method utilizing a capillary phenomenon. When utilizing the capillary phenomenon, it is effective to make the liquid film forming member 30 a hydrophilic member or coat the surface of the liquid film forming member 30 with a hydrophilic thin film.

また、図1(a)(b)に示した液導出部材32は、極細パイプとすることができる。
その端部は、膜形成隙間Gに対向して開口させて直接その膜形成隙間Gに液体4を供給する構造や、液膜形成部材30の一部に液体4を垂らすと共に液膜形成部材30を介して膜形成隙間Gに液体4を供給する構造とすることができる。また、毛細管現象を利用する場合、液導出部材32の一部、特に端部などに、毛細管現象によって液体4を導く繊維部材や多孔部材を取り付けるようにしてもよい。これらの部材は、交換可能とすることが清潔さを保つために有効である。
Moreover, the liquid derivation | leading-out member 32 shown to Fig.1 (a) (b) can be used as a very fine pipe.
The end portion of the liquid film forming member 30 is opened while facing the film forming gap G and the liquid 4 is supplied directly to the film forming gap G. The liquid 4 can be supplied to the film forming gap G through the gap. Further, when utilizing the capillary phenomenon, a fiber member or a porous member that guides the liquid 4 by the capillary phenomenon may be attached to a part of the liquid outlet member 32, particularly an end portion. It is effective for these members to be replaceable to maintain cleanliness.

膜形成隙間Gに液体4を供給する点(液供給点)は、液膜形成部材30によって形成される膜形成隙間Gの一部に少なくとも1箇所以上設ける。その位置は、膜形成隙間Gの中央であっても端であってもよい。液膜形成部材30の長さを、膜形成隙間Gの長さaや櫛形電極21の幅よりも長くし、端から液体4を供給すれば、弾性表面波wの進行を妨げることなく、また、霧化を邪魔することがない。   At least one or more points (liquid supply points) for supplying the liquid 4 to the film forming gap G are provided in a part of the film forming gap G formed by the liquid film forming member 30. The position may be the center or the end of the film forming gap G. If the length of the liquid film forming member 30 is made longer than the length a of the film forming gap G or the width of the comb-shaped electrode 21 and the liquid 4 is supplied from the end, the progress of the surface acoustic wave w is not hindered. , Do not disturb the atomization.

上述のような膜形成隙間Gを形成する液膜形成部材30を備えた弾性表面波霧化装置1によれば、膜形成隙間Gに液体4を膜状に分布させて表面張力によって保持させることにより、弾性表面波wがこの分布した液体4を通過する距離よりも、弾性表面波wの波面が液体4と相互作用する距離が長くなり、従って、広い面積で効率的に霧化することができる。すなわち、弾性表面波wの波面に沿って細長い液体分布を形成する液膜形成部材30によって、液体供給量と霧化量のバランスを保つと共に、霧化に関与しない液体4の存在を抑えることができ、より少ない消費電力で大量の微細粒子を安定に噴霧できる。   According to the surface acoustic wave atomizing apparatus 1 including the liquid film forming member 30 that forms the film forming gap G as described above, the liquid 4 is distributed in the film forming gap G in a film shape and is held by the surface tension. Thus, the distance that the wavefront of the surface acoustic wave w interacts with the liquid 4 is longer than the distance that the surface acoustic wave w passes through the distributed liquid 4, and thus the atomization can be efficiently atomized over a wide area. it can. That is, the liquid film forming member 30 that forms a slender liquid distribution along the wavefront of the surface acoustic wave w can maintain the balance between the liquid supply amount and the atomization amount and suppress the presence of the liquid 4 that is not involved in the atomization. It is possible to stably spray a large amount of fine particles with less power consumption.

次に、図3(a)〜(g)、図4(a)(b)を参照して、第1の実施形態の弾性表面波霧化装置1に用いられる液膜形成部材30の種々の変形例を説明する。これらの図に示す液膜形成部材30は、振動子2の表面Sと表面Sに対向する液膜形成部材30の面とによって膜形成隙間Gを形成し、膜形成隙間Gに表面張力によって液体4を保持する。これらの液膜形成部材30は、保持される液体4が、薄く分布され、また、液膜形成部材30によって覆われる表面積を抑制して、液滴が離脱飛翔する表面積を広くされることを意図するものである。   Next, with reference to FIGS. 3A to 3G and FIGS. 4A and 4B, various types of liquid film forming members 30 used in the surface acoustic wave atomization device 1 of the first embodiment are described. A modification will be described. In the liquid film forming member 30 shown in these drawings, a film forming gap G is formed by the surface S of the vibrator 2 and the surface of the liquid film forming member 30 facing the surface S, and liquid is formed in the film forming gap G by surface tension. 4 is held. These liquid film forming members 30 are intended to widen the surface area from which the liquid 4 to be held is distributed thinly, and the surface area covered by the liquid film forming member 30 is suppressed, so that the droplets fly off. To do.

また、図3(a)(b)に示す液膜形成部材30は、図4(a)(b)に示すように、振動子2の表面Sに向けて開口する複数の微小貫通孔33を有する中空部材を用いて、中空部に液体を通すと共に微小貫通孔33から液体を供給するものである。このような液膜形成部材30によって、容易に安定に液体を供給することができる。   Also, the liquid film forming member 30 shown in FIGS. 3A and 3B has a plurality of minute through holes 33 that open toward the surface S of the vibrator 2 as shown in FIGS. The hollow member is used to pass the liquid through the hollow portion and to supply the liquid from the minute through hole 33. With such a liquid film forming member 30, it is possible to supply the liquid easily and stably.

(第2の実施形態)
図5(a)(b)は第2の実施形態に係る弾性表面波霧化装置1を示し、図6(a)(b)は前記弾性表面波霧化装置1の変形例を示す。この第2の実施形態の弾性表面波霧化装置1は、上述の実施形態の弾性表面波霧化装置1とは、液膜形成部材30、従って膜形成隙間Gの表面Sに対する平面構造が異なっており、他の点は同様である。すなわち、弾性表面波霧化装置1において、液体供給手段3(図1(a)(b)参照、以下同様)は、局在した供給点Pから膜形成隙間Gに液体を供給し、液膜形成部材30は、供給点Pから離れるほど弾性表面波wの進行方向下流側、すなわち方向x側に位置するように膜形成隙間Gを形成している。
(Second Embodiment)
FIGS. 5A and 5B show a surface acoustic wave atomizer 1 according to the second embodiment, and FIGS. 6A and 6B show a modification of the surface acoustic wave atomizer 1. The surface acoustic wave atomization device 1 of the second embodiment is different from the surface acoustic wave atomization device 1 of the above-described embodiment in the planar structure with respect to the surface S of the liquid film forming member 30 and thus the film formation gap G. The other points are the same. That is, in the surface acoustic wave atomization apparatus 1, the liquid supply means 3 (see FIGS. 1A and 1B, the same applies hereinafter) supplies the liquid from the localized supply point P to the film formation gap G, and the liquid film The forming member 30 forms the film forming gap G so as to be located on the downstream side in the traveling direction of the surface acoustic wave w, that is, on the direction x side as the distance from the supply point P increases.

図5(a)(b)に示す弾性表面波霧化装置1の液膜形成部材30は、端部に供給点Pが配置された直線形状であって、櫛形電極21に対して斜めに配置されている。また、図6(a)(b)に示す弾性表面波霧化装置1の液膜形成部材30は、その中央部に供給点Pが配置され、供給点Pの位置で上流側に屈曲した形状となっている。そして、これらの液膜形成部材30の形状に対応して、膜形成隙間Gが振動子2の表面Sに形成される。   The liquid film forming member 30 of the surface acoustic wave atomizing device 1 shown in FIGS. 5A and 5B has a linear shape in which a supply point P is disposed at an end, and is disposed obliquely with respect to the comb-shaped electrode 21. Has been. 6 (a) and 6 (b), the liquid film forming member 30 of the surface acoustic wave atomizing device 1 has a supply point P disposed at the center thereof and a shape bent upstream at the position of the supply point P. It has become. A film forming gap G is formed on the surface S of the vibrator 2 in accordance with the shape of the liquid film forming member 30.

上述のような弾性表面波霧化装置1によれば、弾性表面波wの進行方向上流側から供給された液体が、弾性表面波wによって、膜形成隙間Gに沿って下流側に輸送される。この輸送は、霧化に使われなかった弾性表面波エネルギによって、液体供給量を自動調整するように行われるので、液体供給量と霧化量のバランスを安定に保って、液膜の薄い範囲を広げることができ、より少ない消費電力で大量の微細粒子を噴霧できる。   According to the surface acoustic wave atomization apparatus 1 as described above, the liquid supplied from the upstream side in the traveling direction of the surface acoustic wave w is transported downstream along the film formation gap G by the surface acoustic wave w. . This transportation is performed so that the liquid supply amount is automatically adjusted by the surface acoustic wave energy that was not used for atomization. Therefore, the balance between the liquid supply amount and the atomization amount is kept stable, and the liquid film has a thin range. A large amount of fine particles can be sprayed with less power consumption.

(第3の実施形態)
図7(a)(b)(c)は第3の実施形態に係る弾性表面波霧化装置1を示し、図8(a)(b)(c)は前記弾性表面波霧化装置1の変形例を示す。この第3の実施形態の弾性表面波霧化装置1は、上述の実施形態の弾性表面波霧化装置1とは、液膜形成部材30、従って膜形成隙間Gの表面Sに対する立体構造が異なっており、他の点は同様である。すなわち、弾性表面波霧化装置1において、液体供給手段3は、局在した供給点Pから膜形成隙間Gに液体を供給し、液膜形成部材30は、供給点Pから離れるに従って隙間が狭くなるように膜形成隙間Gを形成している。
(Third embodiment)
FIGS. 7A, 7B, and 7C show the surface acoustic wave atomizer 1 according to the third embodiment, and FIGS. 8A, 8B, and 8C show the surface acoustic wave atomizer 1. FIG. A modification is shown. The surface acoustic wave atomization device 1 according to the third embodiment is different from the surface acoustic wave atomization device 1 according to the above-described embodiment in the three-dimensional structure of the liquid film forming member 30 and thus the film formation gap G with respect to the surface S. The other points are the same. That is, in the surface acoustic wave atomization apparatus 1, the liquid supply means 3 supplies liquid from the localized supply point P to the film forming gap G, and the liquid film forming member 30 narrows as the distance from the supply point P increases. The film formation gap G is formed so as to be.

図7(a)(b)(c)に示す弾性表面波霧化装置1の液膜形成部材30は、端部に供給点Pが配置された外形が直線形状であって、表面Sとの隙間が、供給点Pのところで大きくされている。また、図8(a)(b)(c)に示す弾性表面波霧化装置1の液膜形成部材30は、図7(a)(b)(c)に示した液膜形成部材30を、さらに、上述の第2の実施形態の液膜形成部材30と同様に、櫛形電極21に対して斜めにして、配置されている。   The liquid film forming member 30 of the surface acoustic wave atomizing device 1 shown in FIGS. 7A, 7B, and 7C has an outer shape in which the supply point P is arranged at the end, and has a linear shape. The gap is enlarged at the supply point P. Moreover, the liquid film formation member 30 of the surface acoustic wave atomization apparatus 1 shown to Fig.8 (a) (b) (c) is the liquid film formation member 30 shown to Fig.7 (a) (b) (c). Further, like the liquid film forming member 30 of the above-described second embodiment, the liquid film forming member 30 is disposed obliquely with respect to the comb-shaped electrode 21.

上述のような弾性表面波霧化装置1によれば、表面張力と毛細管現象とによって、供給点Pに供給された液体を供給点Pから離れた部分に輸送することができるので、液膜の供給を強制的に送る手段が不要になり、コンパクトな構造で液膜の薄い範囲を広げ大量に効率的に霧化することができる。   According to the surface acoustic wave atomization apparatus 1 as described above, the liquid supplied to the supply point P can be transported to a part away from the supply point P by the surface tension and the capillary phenomenon. A means for forcibly feeding the supply becomes unnecessary, and the thin area of the liquid film can be widened with a compact structure to efficiently atomize a large amount.

(第4の実施形態)
図9(a)(b)は第4の実施形態に係る弾性表面波霧化装置1を示し、図10(a)(b)、図11(a)(b)は前記弾性表面波霧化装置1の変形例を示す。これらの弾性表面波霧化装置1は、液膜形成部材30を、振動子2の表面Sとの相対位置を変化させて膜形成隙間Gの空間形状を変化させる不図示の隙間変化手段を備えており、この点が上述の第1の実施形態の弾性表面波霧化装置1と異なり、他の点は同様である。
(Fourth embodiment)
FIGS. 9A and 9B show a surface acoustic wave atomization apparatus 1 according to the fourth embodiment, and FIGS. 10A and 10B show the surface acoustic wave atomization. The modification of the apparatus 1 is shown. These surface acoustic wave atomization apparatuses 1 include gap changing means (not shown) that changes the relative position of the liquid film forming member 30 with the surface S of the vibrator 2 to change the spatial shape of the film forming gap G. This point is different from the surface acoustic wave atomizer 1 of the first embodiment described above, and the other points are the same.

上述の隙間変化手段は、膜形成隙間Gの空間形状、すなわち表面Sに対する配置や膜形成隙間Gの容積を変化させることにより、その膜形成隙間Gに保持させる液体の量、厚み、表面積等を変化させて霧化量を調整する。   The gap changing means described above changes the spatial shape of the film forming gap G, that is, the arrangement with respect to the surface S and the volume of the film forming gap G, thereby changing the amount, thickness, surface area, etc. of the liquid held in the film forming gap G. Change the atomization amount by changing.

図9(a)(b)に示す液膜形成部材30は、表面Sとの距離が変化されるものであり、図10(a)(b)、図11(a)(b)に示す液膜形成部材30は、表面Sに対する平面的配置、従って櫛形電極21との平行度が変化されるものである。   The liquid film forming member 30 shown in FIGS. 9 (a) and 9 (b) has a different distance from the surface S, and the liquid shown in FIGS. 10 (a), 10 (b), 11 (a) and 11 (b). The film forming member 30 has a planar arrangement with respect to the surface S, and thus the degree of parallelism with the comb-shaped electrode 21 is changed.

上述のような弾性表面波霧化装置1によれば、弾性表面波wを生成するための電源電圧値を変化することなく容易に霧化量を調整することができる。一般に、霧化量の調整方法として、弾性表面波の振幅を増大させる方法がある。振幅の調整は櫛形電極への入力電源の電圧調整で行われるが、電圧を大きくし過ぎると圧電材料に熱が蓄積して振動子2が割れることがある。また、振幅調整によって霧化量を微小調整することは難しい。   According to the surface acoustic wave atomization apparatus 1 as described above, the atomization amount can be easily adjusted without changing the power supply voltage value for generating the surface acoustic wave w. In general, there is a method for increasing the amplitude of a surface acoustic wave as a method for adjusting the atomization amount. The amplitude is adjusted by adjusting the voltage of the input power supply to the comb electrode. However, if the voltage is increased too much, heat may accumulate in the piezoelectric material and the vibrator 2 may break. In addition, it is difficult to finely adjust the atomization amount by adjusting the amplitude.

本実施形態の弾性表面波霧化装置1では、液膜形成部材30の位置や姿勢を変えることにより、液体を薄く広げて霧化量を増やしたり、逆に減らしたりして、微小に霧化量を調整することができる。また、霧化中に液膜形成部材30の位置や姿勢を調整することにより、表面S上における発熱場所を変えることができるので、熱の局在によって振動子2を割ってしまうことを回避できる。   In the surface acoustic wave atomization apparatus 1 of the present embodiment, by changing the position and orientation of the liquid film forming member 30, the liquid is spread thinly to increase the amount of atomization, or conversely, to decrease the amount finely. The amount can be adjusted. Further, by adjusting the position and posture of the liquid film forming member 30 during atomization, it is possible to change the heat generation location on the surface S, so that it is possible to avoid breaking the vibrator 2 due to heat localization. .

(第5の実施形態)
図12(a)(b)は第5の実施形態に係る弾性表面波霧化装置1を示し、図13は弾性表面波霧化装置1の要部を示し、図14は前記弾性表面波霧化装置1の変形例を示す。この第5の実施形態の弾性表面波霧化装置1は、上述の第1の実施形態の弾性表面波霧化装置1において、液膜形成部材30、従って膜形成隙間Gを複数備えたものであり、他の点は同様である。すなわち、弾性表面波霧化装置1において、液膜形成部材30は、弾性表面波進行方向xに沿って2つ設けられている。弾性表面波進行方向xの上流側の液膜形成部材30に対して液体4を供給し、上流側の液膜形成部材30部分で霧化できずに弾性表面波によって搬送された液体4が下流側の液膜形成部材30に対して供給される。
(Fifth embodiment)
12 (a) and 12 (b) show a surface acoustic wave atomizer 1 according to a fifth embodiment, FIG. 13 shows a main part of the surface acoustic wave atomizer 1, and FIG. 14 shows the surface acoustic wave fog. The modification of the chemical-ized apparatus 1 is shown. The surface acoustic wave atomization device 1 according to the fifth embodiment is the same as the surface acoustic wave atomization device 1 according to the first embodiment described above, but includes a plurality of liquid film forming members 30 and thus a plurality of film formation gaps G. There are other points. That is, in the surface acoustic wave atomization apparatus 1, two liquid film forming members 30 are provided along the surface acoustic wave traveling direction x. The liquid 4 is supplied to the upstream liquid film forming member 30 in the surface acoustic wave traveling direction x, and the liquid 4 transported by the surface acoustic wave without being atomized by the upstream liquid film forming member 30 is downstream. It is supplied to the liquid film forming member 30 on the side.

図14に示す弾性表面波霧化装置1は、上流側の液膜形成部材30と表面Sとの隙間g1よりも、下流側の液膜形成部材30と表面Sとの隙間g2の方が狭く、g2<g1、とされている。このような構成により、下流の液膜形成部材30が、より少ない液体を捕捉し易くなる。   In the surface acoustic wave atomization device 1 shown in FIG. 14, the gap g2 between the liquid film forming member 30 on the downstream side and the surface S is narrower than the gap g1 between the liquid film forming member 30 on the upstream side and the surface S. , G2 <g1. With such a configuration, the downstream liquid film forming member 30 can easily capture less liquid.

上述のような弾性表面波霧化装置1によれば、新たな液体の供給点を設けることなく、コンパクトな構造で大量に霧化することができる。また、上流側の液膜形成部材30部分で消費されなかった弾性表面波wを下流側の液膜形成部材30部分、または液体4の輸送途中において利用できるので、エネルギ効率良く霧化できる。液膜形成部材30は、2つ以上設けることができる。   According to the surface acoustic wave atomization apparatus 1 as described above, a large amount of atomization can be performed with a compact structure without providing a new liquid supply point. Further, since the surface acoustic wave w that has not been consumed in the upstream liquid film forming member 30 portion can be used in the downstream liquid film forming member 30 portion or in the course of transporting the liquid 4, atomization can be performed efficiently. Two or more liquid film forming members 30 can be provided.

(第6の実施形態)
図15(a)(b)は第6の実施形態に係る弾性表面波霧化装置1を示し、図16は弾性表面波霧化装置1の要部を示す。この第6の実施形態の弾性表面波霧化装置1は、上述の第1の実施形態の弾性表面波霧化装置1において、櫛形電極21を液膜形成部材30の両側に設けたものであり、他の点は同様である。すなわち、弾性表面波霧化装置1において、振動子2は、弾性表面波の進行方向線上(図15(a)のx軸方向)に互いに離間し対向して形成された櫛形電極21の2つの対(21A,21B)を備え、液膜形成部材30は櫛形電極21A,21Bの間に設けられ、膜形成隙間Gに供給する液体4が両側の櫛形電極21A,21Bからの(x1,x2方向からの)弾性表面波w1,w2によって霧化される。
(Sixth embodiment)
FIGS. 15A and 15B show a surface acoustic wave atomizer 1 according to the sixth embodiment, and FIG. 16 shows a main part of the surface acoustic wave atomizer 1. The surface acoustic wave atomization device 1 of the sixth embodiment is such that the comb-shaped electrodes 21 are provided on both sides of the liquid film forming member 30 in the surface acoustic wave atomization device 1 of the first embodiment described above. The other points are the same. That is, in the surface acoustic wave atomization apparatus 1, the vibrator 2 includes two comb-shaped electrodes 21 that are formed so as to be spaced apart from each other on the surface line of the surface acoustic wave (the x-axis direction in FIG. 15A). The liquid film forming member 30 is provided between the comb-shaped electrodes 21A and 21B, and the liquid 4 supplied to the film-forming gap G is supplied from the comb-shaped electrodes 21A and 21B on both sides (in the x1 and x2 directions). Atomized by surface acoustic waves w1, w2 (from).

上述のような弾性表面波霧化装置1によれば、1つの液膜形成部材30の両側から伝搬する弾性表面波によって液体4を霧化できるので、片側からだけの場合に比べて、より強力かつ大量に霧化できる。   According to the surface acoustic wave atomization apparatus 1 as described above, the liquid 4 can be atomized by the surface acoustic waves propagating from both sides of one liquid film forming member 30, so that it is more powerful than the case from only one side. It can be atomized in large quantities.

(第7の実施形態)
図17(a)(b)は第7の実施形態に係る弾性表面波霧化装置1を示し、図18は弾性表面波霧化装置1の要部を示す。この第7の実施形態の弾性表面波霧化装置1は、上述の第6の実施形態の弾性表面波霧化装置1において、液膜形成部材30を複数設けるものであり、他の点は同様である。すなわち、弾性表面波霧化装置1において、櫛形電極21A,21Bの間に液膜形成部材30を2つ設け、液体供給手段3は、それぞれの液膜形成部材30による膜形成隙間Gに液体4を供給する。
(Seventh embodiment)
FIGS. 17A and 17B show a surface acoustic wave atomizer 1 according to the seventh embodiment, and FIG. 18 shows a main part of the surface acoustic wave atomizer 1. The surface acoustic wave atomization device 1 of the seventh embodiment is provided with a plurality of liquid film forming members 30 in the surface acoustic wave atomization device 1 of the sixth embodiment described above, and the other points are the same. It is. That is, in the surface acoustic wave atomization apparatus 1, two liquid film forming members 30 are provided between the comb-shaped electrodes 21 </ b> A and 21 </ b> B. Supply.

上述のような弾性表面波霧化装置1によれば、複数の液膜形成部材30部分および各部材間の表面領域において、弾性表面波w1,w2のエネルギを液体4に吸収させて霧化することができるので、エネルギと液体を無駄にすることなく、安定に効率良く液体4を霧化できる。   According to the surface acoustic wave atomization device 1 as described above, the liquid 4 absorbs the energy of the surface acoustic waves w1 and w2 and atomizes the liquid film forming member 30 and the surface region between the members. Therefore, the liquid 4 can be atomized stably and efficiently without wasting energy and liquid.

図18において、左からx1方向に進行する弾性表面波w1は、左方の液膜形成部材30に供給された液体4を霧化する。右からx2方向へ進行する弾性表面波w2は右方の液膜形成部材30に供給された液体4を霧化する。左右の液膜形成部材30に供給された液体4の量に過多がある場合、多い方の液体4が分離されて少ない方の液膜形成部材30に向けて輸送される。このように、液体4が自動的に動いて液体量のバランスが取られると共に、離された液体4が、移動中に霧化されるので、安定に効率良く霧化できる。   In FIG. 18, the surface acoustic wave w1 traveling in the x1 direction from the left atomizes the liquid 4 supplied to the liquid film forming member 30 on the left side. The surface acoustic wave w2 traveling in the x2 direction from the right atomizes the liquid 4 supplied to the liquid film forming member 30 on the right side. When the amount of the liquid 4 supplied to the left and right liquid film forming members 30 is excessive, the larger liquid 4 is separated and transported toward the smaller liquid film forming member 30. In this way, the liquid 4 automatically moves to balance the amount of liquid, and the separated liquid 4 is atomized during movement, so that it can be atomized stably and efficiently.

(第8の実施形態)
図19(a)(b)は第8の実施形態に係る弾性表面波霧化装置1を示し、図20(a)〜(g)は弾性表面波霧化装置1で用いられる液膜形成部材30の変形例を示す。この第8の実施形態の弾性表面波霧化装置1は、上述の第7の実施形態の弾性表面波霧化装置1において、液膜形成部材30を一体化したものであり、他の点は同様である。一体化した液膜形成部材30の他の例として、図20(a)〜(g)に示すようなものがあげられる。
(Eighth embodiment)
FIGS. 19A and 19B show a surface acoustic wave atomizer 1 according to the eighth embodiment, and FIGS. 20A to 20G are liquid film forming members used in the surface acoustic wave atomizer 1. 30 modification examples are shown. The surface acoustic wave atomization device 1 according to the eighth embodiment is obtained by integrating the liquid film forming member 30 in the surface acoustic wave atomization device 1 according to the seventh embodiment described above. It is the same. Other examples of the integrated liquid film forming member 30 include those shown in FIGS.

上述のような弾性表面波霧化装置1によれば、液膜形成部材30、従って膜形成隙間Gを振動子2の表面S上でひと繋がりのものとできるので、液膜形成部材30に沿って液体を広げることができ、より大量の霧化ができる。また、液膜形成部材30の部品点数を減らすことができる。   According to the surface acoustic wave atomization apparatus 1 as described above, the liquid film forming member 30, and thus the film forming gap G, can be connected on the surface S of the vibrator 2. The liquid can be spread and a larger amount of atomization can be achieved. Further, the number of parts of the liquid film forming member 30 can be reduced.

(第9の実施形態)
図21は第9の実施形態に係る弾性表面波霧化装置1を示す。この第9の実施形態の弾性表面波霧化装置1は、液膜形成部材30を取り囲むように櫛形電極21を複数設けたものであり、他の点は上述の第8の実施形態の弾性表面波霧化装置1などと同様である。
(Ninth embodiment)
FIG. 21 shows a surface acoustic wave atomizer 1 according to a ninth embodiment. The surface acoustic wave atomization device 1 of the ninth embodiment is provided with a plurality of comb-shaped electrodes 21 so as to surround the liquid film forming member 30, and the other points are the elastic surfaces of the above-described eighth embodiment. This is similar to the wave atomizer 1 and the like.

図21に示す弾性表面波霧化装置1における振動子2は、櫛形電極21A,21Cの組、および櫛形電極21B,21Dの組という2つの組を、弾性表面波進行方向を異ならせて備えている。つまり、各櫛形電極21A,21B,21C,21Dは、それぞれ、x1,y2,x2,y1方向に進行する弾性表面波w1,w4,w2,w3を生成する。これらの弾性表面波w1,w4,w2,w3は、振動子2の中央部分に設けられた液膜形成部材30による膜形成隙間G(不図示)に向けて進行する。   The vibrator 2 in the surface acoustic wave atomization apparatus 1 shown in FIG. 21 includes two sets, that is, a pair of comb-shaped electrodes 21A and 21C and a pair of comb-shaped electrodes 21B and 21D, with different surface acoustic wave traveling directions. Yes. That is, the comb electrodes 21A, 21B, 21C, and 21D generate surface acoustic waves w1, w4, w2, and w3 that travel in the x1, y2, x2, and y1 directions, respectively. These surface acoustic waves w 1, w 4, w 2, and w 3 travel toward a film formation gap G (not shown) by the liquid film forming member 30 provided in the central portion of the vibrator 2.

液膜形成部材30は、渦巻状に一体化された形状を有し、その下部に形成される膜形成隙間Gも同様の形状に形成される。この、液膜形成部材30における、各櫛形電極21A〜21Dに対向する位置に液体の供給点P(不図示)を設けることにより、それぞれの液膜形成部材30部分で液体が霧化される。液膜形成部材30における外周部で霧化されなかった液体は、各弾性表面波w1〜w4によって渦巻状の液膜形成部材30の中心部側に輸送されると共に霧化される。   The liquid film forming member 30 has a spiral integrated shape, and the film forming gap G formed in the lower part thereof is also formed in the same shape. By providing a liquid supply point P (not shown) at a position facing each of the comb electrodes 21A to 21D in the liquid film forming member 30, the liquid is atomized at each liquid film forming member 30 portion. The liquid that has not been atomized at the outer peripheral portion of the liquid film forming member 30 is transported to the central portion side of the spiral liquid film forming member 30 and atomized by the surface acoustic waves w1 to w4.

上述のような弾性表面波霧化装置1によれば、膜状に分布させた液体4に対して、周囲から弾性表面波w1〜w4を送り込むことができるので、コンパクトで強力な霧化が可能となる。   According to the surface acoustic wave atomization apparatus 1 as described above, since the surface acoustic waves w1 to w4 can be fed from the surroundings to the liquid 4 distributed in a film shape, compact and powerful atomization is possible. It becomes.

図22は上述の弾性表面波霧化装置1の変形例を示す。この弾性表面波霧化装置1は、図21の弾性表面波霧化装置1における液膜形成部材30を回転させ、各櫛形電極21A〜21Dに対向する液膜形成部材30部分を斜めに配置して、図5(a)に示した第2の実施形態における弾性表面波による液体の輸送効果を組み入れたものである。この構成によると、液膜形成部材30の最外部の端部に液体の供給点Pを設けて、ここから液体を供給すれば、矢印Rで示すように、液体が液膜形成部材30に沿って輸送される。   FIG. 22 shows a modification of the surface acoustic wave atomizer 1 described above. This surface acoustic wave atomizing device 1 rotates the liquid film forming member 30 in the surface acoustic wave atomizing device 1 of FIG. 21, and obliquely arranges the liquid film forming member 30 portion facing each of the comb-shaped electrodes 21A to 21D. Thus, the liquid transport effect by the surface acoustic wave in the second embodiment shown in FIG. 5A is incorporated. According to this configuration, when the liquid supply point P is provided at the outermost end of the liquid film forming member 30 and the liquid is supplied from here, the liquid flows along the liquid film forming member 30 as indicated by an arrow R. Transported.

(第10の実施形態)
図23は第10の実施形態に係る弾性表面波霧化装置1を示す。この第10の実施形態の弾性表面波霧化装置1は、上述の第9の実施形態の弾性表面波霧化装置1における各櫛形電極21A〜21Dを、振動子2における中心軸(液膜形成部材30の中心軸)を外して配置し、液膜形成部材30を略四角形とし、液体の供給点Pを液膜形成部材30の角部に配置したものであり、他の点は第9の実施形態の弾性表面波霧化装置1と同様である。
(Tenth embodiment)
FIG. 23 shows a surface acoustic wave atomizer 1 according to a tenth embodiment. In the surface acoustic wave atomization device 1 of the tenth embodiment, the comb-shaped electrodes 21A to 21D in the surface acoustic wave atomization device 1 of the ninth embodiment described above are connected to the central axis (liquid film formation) in the vibrator 2. The central axis of the member 30 is removed, the liquid film forming member 30 is substantially square, and the liquid supply point P is arranged at the corner of the liquid film forming member 30. This is the same as the surface acoustic wave atomization device 1 of the embodiment.

この弾性表面波霧化装置1は、互いに対向して組を成す櫛形電極21A,21C、櫛形電極21B,21D、を弾性表面波の進行方向に直交する幅方向に沿って互い反対向きにずらして、全体として、中央の液膜形成部材30によって膜状に分布させれた液体に対して、弾性表面波を周囲から渦巻状に送り込む構成となっている。この構成によると、1つの供給点Pから供給した液体を、液膜形成部材30の回りで循環させて広げることができる。すなわち、この構成は、上述の図22に示した弾性表面波霧化装置1が、渦巻状の液膜形成部材30によって液体を循環させるのに対して、渦巻状に分布する弾性表面波によって循環させるものである。   This surface acoustic wave atomization apparatus 1 is configured by shifting comb electrodes 21A and 21C and comb electrodes 21B and 21D, which are opposed to each other, in opposite directions along the width direction orthogonal to the traveling direction of the surface acoustic waves. As a whole, a surface acoustic wave is spirally sent from the periphery to the liquid distributed in a film shape by the liquid film forming member 30 at the center. According to this configuration, the liquid supplied from one supply point P can be circulated around the liquid film forming member 30 and spread. That is, in this configuration, the surface acoustic wave atomization apparatus 1 shown in FIG. 22 circulates the liquid by the spiral liquid film forming member 30, but circulates by the surface acoustic waves distributed in a spiral shape. It is something to be made.

上述の循環は以下のように行われる。例えば、櫛形電極21Aからx1方向に進行する弾性表面波は、液膜形成部材30の対向する辺3aに保持された液体を霧化すると共に、辺3bに保持された液体を辺3bに沿ってx1方向に輸送する。また、櫛形電極21Bからy2方向に進行する弾性表面波は、液膜形成部材30の対向する辺3bに保持された液体を霧化すると共に、辺3cに保持された液体を辺3cに沿ってy2方向に輸送する。以下同様にして、液膜形成部材30に保持された液体は、矢印Rで示すように、液膜形成部材30に沿って循環する。   The above-described circulation is performed as follows. For example, the surface acoustic wave traveling in the x1 direction from the comb-shaped electrode 21A atomizes the liquid held on the opposite side 3a of the liquid film forming member 30, and the liquid held on the side 3b along the side 3b. Transport in x1 direction. Further, the surface acoustic wave traveling in the y2 direction from the comb-shaped electrode 21B atomizes the liquid held on the opposite side 3b of the liquid film forming member 30, and the liquid held on the side 3c along the side 3c. Transport in y2 direction. Similarly, the liquid held in the liquid film forming member 30 circulates along the liquid film forming member 30 as indicated by an arrow R.

上述のような弾性表面波霧化装置1によれば、膜状に分布させた液体に対して、弾性表面波を周囲から渦巻き状に送り込むことができ、液体を、液膜形成部材30に沿って広げると共に、液体を洪給しながら霧化し、霧化されない残りの液体は循環させながら搬送し、搬送中に液体を霧化することができるので、大量の液体を、効率的かつ安定に霧化することができる。   According to the surface acoustic wave atomization apparatus 1 as described above, surface acoustic waves can be spirally sent from the surroundings to the liquid distributed in a film shape, and the liquid is moved along the liquid film forming member 30. In addition, the liquid can be atomized while being spilled, and the remaining liquid that is not atomized can be circulated and transported, and the liquid can be atomized during transport. Can be

なお、本発明は、上記構成に限られることなく種々の変形が可能である。例えば、振動子2は、弾性表面波が励振される圧電体部分を表面に備えた基板であればよいので、その面形状は、平面の他に、円柱面やさらに一般的な曲面からなる面形状とすることができる。また、霧化するための液体を膜形成隙間Gに表面張力によって保持できるので、膜形成隙間Gを水平に保つ必要がなく、任意の形状面から、液体粒子を脱離飛翔させて霧化することができる。そこで、垂直円筒の内面や外面から霧化する振動子2を備えた弾性表面波霧化装置1としてもよい。   The present invention is not limited to the above-described configuration, and various modifications can be made. For example, since the vibrator 2 may be a substrate having a piezoelectric body portion on which a surface acoustic wave is excited on its surface, the surface shape may be a cylindrical surface or a more general curved surface in addition to a plane. It can be a shape. Further, since the liquid for atomization can be held in the film forming gap G by surface tension, it is not necessary to keep the film forming gap G horizontal, and liquid particles are desorbed and ejected from any shape surface to be atomized. be able to. Therefore, the surface acoustic wave atomizer 1 including the vibrator 2 that atomizes from the inner surface and the outer surface of the vertical cylinder may be used.

また、液膜を広げる振動子2の表面Sを親水性処理することによって、より薄い液膜を形成して霧化効率を上げるようにしてもよい。また、複数の櫛形電極21を用いる場合、これらを交互、または順番に動作、停止させることにより、熱負荷の集中を回避して高パワーで運転するようにしてもよく、また、渦巻状の液体循環を効率的に行うようにしてもよい。また、上述した複数の櫛形電極21を用いる場合において、それぞれの櫛形電極21A,21B等に、高周波電圧印加用の電気回路23を接続した例を図示したが、これらの電気回路23は、共用とすることができる。   Alternatively, the surface S of the vibrator 2 that spreads the liquid film may be subjected to a hydrophilic treatment to form a thinner liquid film to increase the atomization efficiency. Further, when a plurality of comb-shaped electrodes 21 are used, they may be operated at high power while avoiding concentration of heat load by operating or stopping them alternately or sequentially. Circulation may be performed efficiently. Further, in the case where the plurality of comb electrodes 21 described above are used, an example in which an electric circuit 23 for applying a high-frequency voltage is connected to each of the comb electrodes 21A, 21B, etc. is shown. can do.

(a)は本発明の第1の実施形態に係る弾性表面波霧化装置の平面図、(b)は同側面図。(A) is a top view of the surface acoustic wave atomization apparatus which concerns on the 1st Embodiment of this invention, (b) is the same side view. 同上弾性表面波霧化装置の液膜形成部材を含む要部断面図。The principal part sectional drawing containing the liquid film formation member of a surface acoustic wave atomization apparatus same as the above. (a)〜(g)は同上弾性表面波霧化装置における液膜形成部材の種々の変形例を示す要部断面図。(A)-(g) is principal part sectional drawing which shows the various modifications of the liquid film formation member in a surface acoustic wave atomization apparatus same as the above. (a)は同上弾性表面波霧化装置における液膜形成部材の他の変形例を示す要部縦断面図、(b)は同横断面図。(A) is a principal part longitudinal cross-sectional view which shows the other modification of the liquid film formation member in a surface acoustic wave atomization apparatus same as the above, (b) is the cross-sectional view. (a)は第2の実施形態に係る弾性表面波霧化装置の平面図、(b)は同側面図。(A) is a top view of the surface acoustic wave atomization apparatus which concerns on 2nd Embodiment, (b) is the same side view. (a)は同上弾性表面波霧化装置の変形例を示す平面図、(b)は同側面図。(A) is a top view which shows the modification of a surface acoustic wave atomizer same as the above, (b) is the side view. (a)は第3の実施形態に係る弾性表面波霧化装置の平面図、(b)は同側面図、(c)は同正面図。(A) is a top view of the surface acoustic wave atomization apparatus which concerns on 3rd Embodiment, (b) is the side view, (c) is the front view. (a)は同上弾性表面波霧化装置の変形例を示す平面図、(b)は同側面図、(c)は同正面図。(A) is a top view which shows the modification of a surface acoustic wave atomizer same as the above, (b) is the side view, (c) is the front view. (a)は第4の実施形態に係る弾性表面波霧化装置の平面図、(b)は同側面図。(A) is a top view of the surface acoustic wave atomization apparatus which concerns on 4th Embodiment, (b) is the same side view. (a)は同上弾性表面波霧化装置の変形例を示す平面図、(b)は同側面図。(A) is a top view which shows the modification of a surface acoustic wave atomizer same as the above, (b) is the side view. (a)は同上弾性表面波霧化装置の他の変形例を示す平面図、(b)は同側面図。(A) is a top view which shows the other modification of a surface acoustic wave atomizer same as the above, (b) is the side view. (a)は第5の実施形態に係る弾性表面波霧化装置の平面図、(b)は同側面図。(A) is a top view of the surface acoustic wave atomization apparatus which concerns on 5th Embodiment, (b) is the same side view. 同上弾性表面波霧化装置の液膜形成部材を含む要部断面図。The principal part sectional drawing containing the liquid film formation member of a surface acoustic wave atomization apparatus same as the above. 同上弾性表面波霧化装置の変形例を示す側面図。The side view which shows the modification of a surface acoustic wave atomization apparatus same as the above. (a)は第6の実施形態に係る弾性表面波霧化装置の平面図、(b)は同側面図。(A) is a top view of the surface acoustic wave atomization apparatus which concerns on 6th Embodiment, (b) is the same side view. 同上弾性表面波霧化装置の液膜形成部材を含む要部断面図。The principal part sectional drawing containing the liquid film formation member of a surface acoustic wave atomization apparatus same as the above. (a)は第7の実施形態に係る弾性表面波霧化装置の平面図、(b)は同側面図。(A) is a top view of the surface acoustic wave atomization apparatus which concerns on 7th Embodiment, (b) is the same side view. 同上弾性表面波霧化装置の液膜形成部材を含む要部断面図。The principal part sectional drawing containing the liquid film formation member of a surface acoustic wave atomization apparatus same as the above. (a)は第8の実施形態に係る弾性表面波霧化装置の平面図、(b)は同側面図。(A) is a top view of the surface acoustic wave atomization apparatus which concerns on 8th Embodiment, (b) is the same side view. (a)〜(g)は同上弾性表面波霧化装置の液膜形成部材の種々の変形例を示す平面図。(A)-(g) is a top view which shows the various modifications of the liquid film formation member of a surface acoustic wave atomization apparatus same as the above. 第9の実施形態に係る弾性表面波霧化装置の平面図。The top view of the surface acoustic wave atomization apparatus which concerns on 9th Embodiment. 同上弾性表面波霧化装置の変形例を示す平面図。The top view which shows the modification of a surface acoustic wave atomizer same as the above. 第10の実施形態に係る弾性表面波霧化装置の平面図。The top view of the surface acoustic wave atomization apparatus which concerns on 10th Embodiment.

符号の説明Explanation of symbols

1 弾性表面波霧化装置
2 振動子
3 液体供給手段
4 液体
21,21A〜21D 櫛形電極
30 膜形成部材
w,w1〜w4 弾性表面波
G 膜形成隙間
P 供給点
S 表面
DESCRIPTION OF SYMBOLS 1 Surface acoustic wave atomizer 2 Vibrator 3 Liquid supply means 4 Liquid 21,21A-21D Comb-shaped electrode 30 Film formation member w, w1-w4 Surface acoustic wave G Film formation gap P Supply point S Surface

Claims (10)

一対の櫛形電極が形成された圧電材料から成り、前記櫛形電極に高周波電圧を印加することにより弾性表面波が生成される振動子と、前記振動子の表面に液体を供給する液体供給手段と、を備え、前記液体供給手段によって前記振動子の表面に供給される液体を前記表面に生成される弾性表面波によって霧化する弾性表面波霧化装置において、
前記液体供給手段は、前記振動子の表面に対向して配置され、供給液体を前記振動子の表面に膜状に分布させるための膜形成隙間を形成する液膜形成部材を備え、
前記液膜形成部材の膜形成隙間の形状が、前記振動子の表面に生成される弾性表面波の進行方向に直交する幅方向の長さよりも、前記弾性表面波の進行方向の長さを短く形成されていることを特徴とする弾性表面波霧化装置。
A vibrator comprising a piezoelectric material having a pair of comb-shaped electrodes formed, and generating a surface acoustic wave by applying a high frequency voltage to the comb-shaped electrodes; and a liquid supply means for supplying a liquid to the surface of the vibrator; In the surface acoustic wave atomization device that atomizes the liquid supplied to the surface of the vibrator by the liquid supply means by the surface acoustic wave generated on the surface,
The liquid supply means includes a liquid film forming member that is disposed to face the surface of the vibrator and forms a film formation gap for distributing the supply liquid in a film shape on the surface of the vibrator.
The shape of the film forming gap of the liquid film forming member is shorter than the length in the width direction perpendicular to the direction of travel of the surface acoustic wave generated on the surface of the vibrator. A surface acoustic wave atomization device characterized by being formed.
前記液体供給手段は、局在した供給点から前記膜形成隙間に液体を供給し、前記液膜形成部材は、前記供給点から離れるほど弾性表面波の進行方向下流側に位置するように前記膜形成隙間を形成していることを特徴とする請求項1に記載の弾性表面波霧化装置。   The liquid supply means supplies liquid from the localized supply point to the film forming gap, and the liquid film forming member is positioned on the downstream side in the traveling direction of the surface acoustic wave as the distance from the supply point increases. The surface acoustic wave atomization device according to claim 1, wherein a formation gap is formed. 前記液体供給手段は、局在した供給点から前記膜形成隙間に液体を供給し、前記液膜形成部材は、前記供給点から離れるに従って隙間が狭くなるように前記膜形成隙間を形成していることを特徴とする請求項1に記載の弾性表面波霧化装置。   The liquid supply means supplies liquid to the film formation gap from a localized supply point, and the liquid film formation member forms the film formation gap so that the gap becomes narrower as the distance from the supply point increases. The surface acoustic wave atomizer according to claim 1. 前記液膜形成部材は、前記振動子の表面との相対位置を変化させることにより前記膜形成隙間の形状を変化させて霧化量を調整することを特徴とする請求項1乃至請求項3のいずれか一項に記載の弾性表面波霧化装置。   The liquid film forming member adjusts an atomization amount by changing a shape of the film forming gap by changing a relative position with respect to a surface of the vibrator. The surface acoustic wave atomization apparatus as described in any one of Claims. 前記液膜形成部材は、弾性表面波進行方向に沿って複数設けられ、前記液体供給手段は、弾性表面波進行方向の上流側の液膜形成部材に対して液体を供給し、前記上流側の液膜形成部材部分で霧化できずに弾性表面波によって搬送された液体が下流側の膜形成部材に対して供給されることを特徴とする請求項1に記載の弾性表面波霧化装置。   The liquid film forming member is provided in a plurality along the surface acoustic wave traveling direction, and the liquid supply means supplies the liquid to the liquid film forming member on the upstream side in the surface acoustic wave traveling direction. 2. The surface acoustic wave atomization device according to claim 1, wherein the liquid which is not atomized by the liquid film forming member and is conveyed by the surface acoustic wave is supplied to the downstream film forming member. 前記振動子は、弾性表面波の進行方向線上に互いに離間し対向して形成された前記櫛形電極の2つの対を備え、前記液膜形成部材は前記櫛形電極の2つの対の間に設けられ、前記膜形成隙間に供給する液体が両側の櫛形電極からの弾性表面波によって霧化されることを特徴とする請求項1乃至請求項4のいずれか一項に記載の弾性表面波霧化装置。   The vibrator includes two pairs of the comb-shaped electrodes that are formed to be spaced apart from each other on a traveling direction line of the surface acoustic wave, and the liquid film forming member is provided between the two pairs of the comb-shaped electrodes. 5. The surface acoustic wave atomizer according to claim 1, wherein the liquid supplied to the film forming gap is atomized by surface acoustic waves from comb electrodes on both sides. 6. . 前記櫛形電極の2つの対の間に前記液膜形成部材を複数設け、前記液体供給手段は、前記複数の液膜形成部材による膜形成隙間に液体を供給することを特徴とする請求項6に記載の弾性表面波霧化装置。   The liquid film forming member is provided in plural between two pairs of the comb-shaped electrodes, and the liquid supply means supplies liquid to a film forming gap formed by the plurality of liquid film forming members. The surface acoustic wave atomization apparatus as described. 前記複数の液膜形成部材が一体的に構成されていることを特徴とする請求項7に記載の弾性表面波霧化装置。   The surface acoustic wave atomization device according to claim 7, wherein the plurality of liquid film forming members are integrally formed. 前記振動子は、前記櫛形電極の2つの対から成る組を弾性表面波進行方向を異ならせて複数組備えることを特徴とする請求項8に記載の弾性表面波霧化装置。   9. The surface acoustic wave atomization device according to claim 8, wherein the vibrator includes a plurality of pairs each including two pairs of the comb-shaped electrodes with different surface acoustic wave traveling directions. 前記互いに組を成す櫛形電極の対を弾性表面波の進行方向に直交する幅方向に沿って互い反対向きにずらして形成したことを特徴とする請求項9に記載の弾性表面波霧化装置。   10. The surface acoustic wave atomization device according to claim 9, wherein the pair of comb-shaped electrodes forming a pair with each other is formed to be shifted in opposite directions along a width direction orthogonal to a traveling direction of the surface acoustic wave.
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WO2013166542A1 (en) * 2012-05-11 2013-11-14 Monash University Microfluidic apparatus for the atomisation of a liquid using surface acoustic waves
KR101420228B1 (en) * 2012-11-30 2014-07-17 주식회사 나래나노텍 Improved Surface Acoustic Wave Atomizer for Electrostatic Deposition, and Spray-Type Pattern Forming Apparatus and Substrate Coating Apparatus Having the Same
JP2014214165A (en) * 2013-04-22 2014-11-17 富士通株式会社 Bonding method using adhesive
EP3017876A1 (en) * 2014-11-06 2016-05-11 Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden e.V. Liquid atomizing device and method for its preparation
CN107921457A (en) * 2015-05-13 2018-04-17 皇家墨尔本理工大学 The sound wave microfluidic device of acoustic wave energy utilization rate with increase
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CN108906461A (en) * 2018-08-01 2018-11-30 哈尔滨工业大学(深圳) A kind of droplet ejection device and microdrop spraying method based on surface acoustic wave
JPWO2021059923A1 (en) * 2019-09-26 2021-04-01
WO2021200124A1 (en) * 2020-03-31 2021-10-07 パナソニックIpマネジメント株式会社 Liquid atomization system
CN114223967A (en) * 2022-02-14 2022-03-25 云南中烟工业有限责任公司 Detachable oil guide piece and electronic cigarette using same
CN115151292A (en) * 2019-10-04 2022-10-04 墨尔本皇家理工大学 Acoustic nebulizer for delivery of active agents
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US11717845B2 (en) 2016-03-30 2023-08-08 Altria Client Services Llc Vaping device and method for aerosol-generation
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EP4240452A4 (en) * 2020-11-06 2024-09-25 Trudell Medical International Inc. SURFACE WAVE ATOMIZER WITH LIQUID DIRECTION AND MIGRATION PREVENTION

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07232114A (en) * 1994-02-21 1995-09-05 Kanagawa Kagaku Gijutsu Akad Ultrasonic atomizer using elastic surface wave
JPH11207224A (en) * 1998-01-21 1999-08-03 Sharp Corp Particle size variable generation device and particle size variable generation method
JP2003136005A (en) * 2001-11-05 2003-05-13 Inst Of Physical & Chemical Res Immobilization device
JP2006022663A (en) * 2004-07-06 2006-01-26 Fuji Xerox Co Ltd Liquid transfer device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07232114A (en) * 1994-02-21 1995-09-05 Kanagawa Kagaku Gijutsu Akad Ultrasonic atomizer using elastic surface wave
JPH11207224A (en) * 1998-01-21 1999-08-03 Sharp Corp Particle size variable generation device and particle size variable generation method
JP2003136005A (en) * 2001-11-05 2003-05-13 Inst Of Physical & Chemical Res Immobilization device
JP2006022663A (en) * 2004-07-06 2006-01-26 Fuji Xerox Co Ltd Liquid transfer device

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